TWI788202B - Electronic component heating and pressure treatment furnace rapid preparation device - Google Patents
Electronic component heating and pressure treatment furnace rapid preparation device Download PDFInfo
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- TWI788202B TWI788202B TW111102886A TW111102886A TWI788202B TW I788202 B TWI788202 B TW I788202B TW 111102886 A TW111102886 A TW 111102886A TW 111102886 A TW111102886 A TW 111102886A TW I788202 B TWI788202 B TW I788202B
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- 238000010438 heat treatment Methods 0.000 title claims abstract description 59
- 238000002360 preparation method Methods 0.000 title claims abstract description 44
- 238000009413 insulation Methods 0.000 claims abstract description 48
- 230000005540 biological transmission Effects 0.000 claims abstract description 6
- 239000000126 substance Substances 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 239000004809 Teflon Substances 0.000 claims description 2
- 229920006362 Teflon® Polymers 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 239000011521 glass Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 238000005192 partition Methods 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 17
- 238000012423 maintenance Methods 0.000 abstract description 6
- 230000000694 effects Effects 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000003344 environmental pollutant Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 231100000719 pollutant Toxicity 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005728 strengthening Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000004308 accommodation Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any of groups F27B1/00 - F27B15/00
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D1/00—Casings; Linings; Walls; Roofs
- F27D1/10—Monolithic linings; Supports therefor
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D1/00—Casings; Linings; Walls; Roofs
- F27D1/18—Door frames; Doors, lids or removable covers
- F27D1/1858—Doors
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Furnace Details (AREA)
- Muffle Furnaces And Rotary Kilns (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Tunnel Furnaces (AREA)
Abstract
一種電子元件加熱加壓處理爐快速整備裝置,包括爐內設一容置空間;至少一加熱裝置,設於容置空間中用以將容置空間內的溫度調變至一預定溫度;至少一加壓裝置,用以將容置空間內的壓力調變至大於1atm的一預定壓力;至少一替換式隔熱襯套,包含一外層及一內層;以及一風扇,設置在容置空間中,並且經由凸伸出腔體的一傳動軸而連接至一驅動馬達,藉此,受污染的及乾淨的替換式隔熱襯套間可以快速更換,並利用複數徑向擴張結構及複數C型環圈迫緊於爐內,如此得以快速完成整備工作,使停機維護時間大幅縮短,有效增加生產效率與產能。 A rapid preparation device for heating and pressurizing a furnace for electronic components, comprising an accommodating space in the furnace; at least one heating device installed in the accommodating space to adjust the temperature in the accommodating space to a predetermined temperature; at least one a pressurizing device, used to adjust the pressure in the accommodating space to a predetermined pressure greater than 1 atm; at least one replaceable thermal insulation liner, including an outer layer and an inner layer; and a fan, arranged in the accommodating space , and is connected to a drive motor through a transmission shaft protruding out of the cavity, whereby the contaminated and clean replacement heat insulation liners can be replaced quickly, and multiple radial expansion structures and multiple C-type The ring is tight in the furnace, so that the maintenance work can be completed quickly, the shutdown maintenance time is greatly shortened, and the production efficiency and production capacity are effectively increased.
Description
本發明提供一種電子元件處理爐之技術領域,尤指其技術上提供一種電子元件加熱加壓處理爐快速整備裝置,其受污染的及乾淨的替換式隔熱襯套間可以快速更換者。 The present invention provides a technical field of an electronic component processing furnace, especially a rapid preparation device for a heating and pressurizing processing furnace for electronic components. The polluted and clean replacement heat insulation linings can be quickly replaced.
按,在製造電子元件的過程中經常會使用到具有加熱與加壓功能的處理爐,而習知的加熱與加壓功能的處理爐其加熱製程中有部份的製程化學品會因揮發或蒸發而瀰漫於處理腔室中,當冷卻製程時,飄散在處理腔室中的氣態製程化學品發生冷凝而形成污染物附著在腔體內壁,造成機台一段時間後就要停機進行清潔維護,如此其爐內清潔維護成本高且耗時,造成可生產時間被壓縮及產能的下降,然而在電子元件的加工是不允許停機過久,容易造成整個產線無法順利運作的情形,除了效率低下,也使產能遭受嚴重影響,因此習知清潔工作停機太久,實有改進的必要。 According to, in the process of manufacturing electronic components, a treatment furnace with heating and pressurization functions is often used, and some process chemicals in the heating process of the known heating and pressurization function of the treatment furnace will be due to volatilization or Evaporate and diffuse in the processing chamber. When the process is cooled, the gaseous process chemicals floating in the processing chamber condense and form pollutants that adhere to the inner wall of the chamber, causing the machine to be shut down for cleaning and maintenance after a period of time. In this way, the cleaning and maintenance of the furnace is costly and time-consuming, resulting in reduced production time and a decrease in production capacity. However, in the processing of electronic components, it is not allowed to stop for too long, which may easily cause the entire production line to fail to operate smoothly. In addition to low efficiency , It also seriously affects the production capacity, so it is known that the cleaning work has been shut down for too long, and there is a need for improvement.
是以,針對上述習知結構所存在之問題點,如何開發一種更具理想實用性之創新結構,實消費者所殷切企盼,亦係相關業者須努力研發突破之目標及方向。 Therefore, in view of the problems existing in the above-mentioned conventional structures, how to develop a more ideal and practical innovative structure is what consumers are eagerly looking forward to, and it is also the goal and direction that related businesses must work hard to develop breakthroughs.
有鑑於此,發明人本於多年從事相關產品之製造開發與設計經驗,針對上述之目標,詳加設計與審慎評估後,終得一確具實用性之本發明。 In view of this, the inventor has been engaged in the manufacture, development and design of related products for many years. After careful design and careful evaluation for the above-mentioned goals, he finally obtained a practical invention.
本發明之主要目的在於提供一種電子元件加熱加壓處理爐快速整備裝置,其中爐內生產過程中會有污染物附著,本發明之容置空間周面的隔熱襯套設成替換式隔熱襯套,所以當其污染物附著使其成為受污染的替換式隔熱襯套時,只需替換乾淨的替換式隔熱襯套,即可再繼續生產作業,使停機的時間壓縮至極短的時間,如此可以增加生產效率與產能者。 The main purpose of the present invention is to provide a rapid preparation device for heating and pressurizing a furnace for electronic components, in which pollutants will adhere during the production process in the furnace. Lining, so when its contaminants adhere to make it a contaminated replacement thermal insulation liner, only need to replace the clean replacement thermal insulation liner, and then continue the production operation, so that the downtime can be compressed to a very short time Time, which can increase production efficiency and capacity.
為達上述目的,本發明提供一種電子元件加熱加壓處理爐快速整備裝置,係包含有:一腔體,該腔體包含一門與一筒身,該筒身內部形成一容置空間;至少一加熱裝置,設置在該容置空間中,並且用以將該容置空間內的溫度調變至一預定溫度;至少一加壓裝置,用以將該容置空間內的壓力調變至大於1atm的一預定壓力;至少一替換式隔熱襯套,包含一外層及一內層,其中該外層與內層之間的間距係大於1μm;以及一風扇,設置在該容置空間中,並且經由凸伸出該筒身的一傳動軸而連接至一驅動馬達。據此,受污染的及乾淨的替換式隔熱襯套間可以快速更換,並可利用複數徑向擴張結構及複數C型環圈迫緊於爐內,如此得以快速完成整備工作,使停機維護時間大幅縮短,有效增加生產效率與產能者。 In order to achieve the above purpose, the present invention provides a rapid preparation device for heating and pressurizing a furnace for electronic components. a heating device, arranged in the accommodating space, and used to adjust the temperature in the accommodating space to a predetermined temperature; at least one pressurizing device, used to adjust the pressure in the accommodating space to be greater than 1 atm a predetermined pressure; at least one replaceable thermal insulation liner, comprising an outer layer and an inner layer, wherein the distance between the outer layer and the inner layer is greater than 1 μm; and a fan, arranged in the accommodating space, and via A transmission shaft protruding from the barrel body is connected to a drive motor. According to this, the polluted and clean replacement heat insulation linings can be quickly replaced, and can be pressed tightly in the furnace by using multiple radially expanding structures and multiple C-shaped rings, so that the maintenance work can be completed quickly and the shutdown maintenance The time is greatly shortened, and the production efficiency and production capacity are effectively increased.
有關本發明所採用之技術、手段及其功效,茲舉一較佳實施例並配合圖式詳細說明於後,相信本發明上述之目的、構造及特徵,當可由之得一深入而具體的瞭解。 Regarding the technology, means and effects used in the present invention, a preferred embodiment will be described in detail in conjunction with the drawings. It is believed that the above-mentioned purpose, structure and characteristics of the present invention can be gained a deep and specific understanding. .
10:腔體 10: Cavity
11:門 11: door
12:筒身 12: cylinder body
13:容置空間 13:Accommodating space
14:傳動軸 14: Drive shaft
15:驅動馬達 15: Drive motor
20:加熱裝置 20: Heating device
30:替換式隔熱襯套 30: Replacement heat insulation bushing
31:外層 31: outer layer
32:內層 32: inner layer
33:圍閉隔熱空間 33:Enclosed and insulated space
35:槽隙 35: slot
351:徑向擴張結構 351: radial expansion structure
36:C型環圈 36: C-shaped ring
37:撐張結構 37: Stretching structure
30a:替換式隔熱襯套 30a: Replacement thermal insulation bushing
31a:外層 31a: outer layer
32a:內層 32a: inner layer
33a:圍閉隔熱空間 33a: Enclosing an insulated space
35a:槽隙 35a: slot
351a:徑向擴張結構 351a: radial expansion structure
36a:C型環圈 36a: C-shaped ring
37a:撐張結構 37a: Stretched structure
38a:板片組 38a: plate group
41:第一加壓裝置 41: The first pressurizing device
42:第二加壓裝置 42: Second pressurizing device
50:風扇 50: fan
60:微粒偵測器 60: Particle detector
70:分隔件 70:Separator
〔第1圖〕係為本發明其一實施例之立體示意圖。 [Fig. 1] is a three-dimensional schematic diagram of an embodiment of the present invention.
〔第2圖〕係為本發明其一實施例之前視平面示意圖。 [Fig. 2] is a schematic plan view of the front view of one embodiment of the present invention.
〔第3圖〕係為第2圖之A-A剖面示意圖。 [Fig. 3] is a schematic cross-sectional view of A-A in Fig. 2.
〔第3A圖〕係為第3圖之局部放大圖。 [Fig. 3A] is a partially enlarged view of Fig. 3.
〔第4圖〕係為本發明其一實施例更換替換式隔熱襯套之動作剖示圖。 [Fig. 4] is a cross-sectional view showing the action of replacing the replaceable heat-insulating bushing in one embodiment of the present invention.
〔第5圖〕係為本發明其一實施例之替換式隔熱襯套立體示意圖。 [Fig. 5] is a three-dimensional schematic diagram of a replaceable heat-insulating bushing according to one embodiment of the present invention.
〔第6圖〕係為本發明其一實施例之替換式隔熱襯套側剖面示意圖。 [Fig. 6] is a schematic side sectional view of a replaceable heat-insulating bushing according to an embodiment of the present invention.
〔第7圖〕係為本發明另一實施例之側剖面示意圖。 [Fig. 7] is a schematic side sectional view of another embodiment of the present invention.
〔第7A圖〕係為第7圖之局部放大圖。 [Fig. 7A] is a partially enlarged view of Fig. 7.
〔第8圖〕係為本發明另一實施例之替換式隔熱襯套立體示意圖。 [Fig. 8] is a three-dimensional schematic diagram of a replaceable heat-insulating bushing according to another embodiment of the present invention.
〔第9圖〕係為本發明另一實施例之替換式隔熱襯套側剖面示意圖。 [Fig. 9] is a schematic side sectional view of a replacement heat-insulation bushing according to another embodiment of the present invention.
〔第10圖〕係為本發明又一實施例之側剖面示意圖。 [Fig. 10] is a schematic side sectional view of yet another embodiment of the present invention.
〔第11圖〕係為本發明再一實施例之側剖面示意圖。 [Fig. 11] is a schematic side sectional view of yet another embodiment of the present invention.
本發明係提供一種電子元件加熱加壓處理爐快速整備裝置之設計者。 The present invention provides a designer of a rapid preparation device for heating and pressurizing a furnace for electronic components.
為使 貴審查委員對本發明之目的、特徵及功效能夠有更進一步之瞭解與認識,茲配合實施方式及圖式詳述如後:參閱第1至第6圖所示,本發明一實施例提供一種電子元件加熱加壓處理爐快速整備裝置,係包含有:一腔體10,該腔體10包含一門11與一筒身12,該筒身12內部形成一容置空間13;至少一加熱裝置20,設置在該容置空間13中,並且用以將該容置空間13內的溫度調變至一預定溫度;
至少一替換式隔熱襯套30,設成斷面呈現C形狀,包含一外層31以及一內層32,其中該外層31係設置於該筒身12內壁上,以及該內層32係相對於該外層31而往該容置空間13內部設置,以在該外層31與該內層32之間形成一圍閉隔熱空間33,以及其中該外層31與該內層32之間的間距係大於1μm,該內層32的厚度係小於與該替換式隔熱襯套30相對應之該筒身12部分的厚度,該替換式隔熱襯套30斷開的一槽隙35內,得以軸向排設數徑向擴張結構351,使該替換式隔熱襯套30具備徑向擴張力量支撐,得以固定在該筒身12內,或者自該筒身12內壁反向拆離該替換式隔熱襯套30;一第一加壓裝置41,用以將該容置空間13內的壓力調變至大於1atm的一預定壓力;以及一風扇50,設置在該容置空間13中,並且經由凸伸出該筒身12的一傳動軸14而連接至一驅動馬達15,透過該驅動馬達15驅動該風扇50轉動,以促進該加熱裝置20對該容置空間13的溫度調變效率。
In order to enable your review committee members to have a further understanding and understanding of the purpose, characteristics and effects of the present invention, the detailed description of the implementation and drawings is as follows: refer to Figures 1 to 6, an embodiment of the present invention provides A rapid preparation device for heating and pressurizing a furnace for electronic components, which includes: a
參閱第1及第7至9圖所示,本發明另一實施例提供一種電子元件加熱加壓處理爐快速整備裝置,係包含有:一腔體10,該腔體10包含一門11與一筒身12,該筒身12內部形成一容置空間13;至少一加熱裝置20,設置在該容置空間13中,並且用以將該容置空間13內的溫度調變至一預定溫度;至少一替換式隔熱襯套30a,設成斷面呈現C形狀,包含一外層31a以及一內層32a,其中該外層31a係設置於該筒身12內壁上,以及該內層32a係相對於該外層31a而往該容置空間13內部設置,以在該外層31a與該內層32a之間形成一圍閉隔熱空間33a,以及其中該外層
31a與該內層32a之間的間距係大於1μm,該內層32a的厚度係小於與該替換式隔熱襯套30a相對應之該筒身12部分的厚度;該替換式隔熱襯套30a兩端斷開的槽隙35a處設有往該容置空間13突出的一板片組38a,該板片組38a結合數徑向擴張結構351a,使該替換式隔熱襯套30a具備徑向擴張力量支撐,得以固定在該筒身12內壁,或者自該筒身12內壁反向拆離該替換式隔熱襯套30a;一第一加壓裝置41,用以將該容置空間13內的壓力調變至大於1atm的一預定壓力;以及一風扇50,設置在該容置空間13中,並且經由凸伸出該筒身12的一傳動軸14而連接至一驅動馬達15,透過該驅動馬達15驅動該風扇50轉動,以促進該加熱裝置20對該容置空間13的溫度調變效率。
Referring to Figures 1 and 7 to 9, another embodiment of the present invention provides a rapid preparation device for heating and pressurizing a furnace for electronic components, which includes: a cavity 10, which includes a door 11 and a barrel body 12, forming an accommodating space 13 inside the cylinder body 12; at least one heating device 20 is arranged in the accommodating space 13, and is used to adjust the temperature in the accommodating space 13 to a predetermined temperature; at least A replaceable heat-insulating bushing 30a, which is set to present a C-shape in section, includes an outer layer 31a and an inner layer 32a, wherein the outer layer 31a is arranged on the inner wall of the cylinder body 12, and the inner layer 32a is opposite to The outer layer 31a is disposed inside the accommodating space 13 to form an enclosed heat-insulating space 33a between the outer layer 31a and the inner layer 32a, and wherein the outer layer
The distance between 31a and the inner layer 32a is greater than 1 μm, and the thickness of the inner layer 32a is smaller than the thickness of the part of the cylinder body 12 corresponding to the replacement heat-insulation bushing 30a; the replacement heat-insulation bushing 30a A plate group 38a protruding toward the accommodating space 13 is provided at the slot 35a that is disconnected at both ends. The
參閱第1至第6圖所示,所述之電子元件加熱加壓處理爐快速整備裝置,其中該圍閉隔熱空間33呈非密封性設置,藉由該第一加壓裝置41使該替換式隔熱襯套30之該圍閉隔熱空間33內的壓力調變至與該容置空間13內之壓力實質相同的一壓力,藉以防止該替換式隔熱襯套30在該容置空間13內之壓力改變時產生變形。
Referring to Figures 1 to 6, the described electronic component heating and pressure treatment furnace rapid preparation device, wherein the enclosed
參閱第1至第6圖所示,所述之電子元件加熱加壓處理爐快速整備裝置,其中該內層32往該容置空間13軸向排設數C型環圈36,該C型環圈36兩端可鎖設一撐張結構37,得以撐張固定該替換式隔熱襯套30或自該替換式隔熱襯套30反向拆離該C型環圈36,該撐張結構37可視該替換式隔熱襯套30的抗壓強度調整撐張固定力道,使該C型環圈36將該替換式隔熱襯套30緊固於該內層32表面,藉由強化該替換式隔熱襯套30的固設效果。
Referring to Figures 1 to 6, the rapid preparation device for heating and pressurizing a furnace for electronic components, wherein the
參閱第1至第6圖所示,所述之電子元件加熱加壓處理爐
快速整備裝置,其中該撐張結構37一端設有右旋螺紋,另一端設有左旋螺紋,藉由快速鎖緊或放鬆該C型環圈36。
Referring to Figures 1 to 6, the described electronic component heating and pressure treatment furnace
Quick preparation device, wherein one end of the stretching
參閱第1至第6圖所示,所述之電子元件加熱加壓處理爐快速整備裝置,其中各該C型環圈36呈均勻設置,使各該C型環圈36對該替換式隔熱襯套30均勻施力,將該替換式隔熱襯套30緊固於該內層32表面,藉由強化該替換式隔熱襯套30的固設效果。
Referring to Figures 1 to 6, the described electronic component heating and pressure treatment furnace rapid preparation device, wherein each of the C-shaped
參閱第7至第9圖所示,所述之電子元件加熱加壓處理爐快速整備裝置,其中該圍閉隔熱空間33a呈非密封性設置,藉由該第一加壓裝置41使該替換式隔熱襯套30a之該圍閉隔熱空間33a內的壓力調變至與該容置空間13內之壓力實質相同的一壓力,藉以防止該替換式隔熱襯套30a在該容置空間13內之壓力改變時產生變形。
Referring to Figures 7 to 9, the described electronic component heating and pressure treatment furnace rapid preparation device, wherein the enclosed
參閱第7至第9圖所示,所述之電子元件加熱加壓處理爐快速整備裝置,其中該內層32a往該容置空間13軸向排設數C型環圈36a,該C型環圈36a兩端可鎖設一撐張結構37a,得以撐張固定該替換式隔熱襯套30a或自該替換式隔熱襯套30a反向拆離該C型環圈36a,該撐張結構37a可視該替換式隔熱襯套30a的抗壓強度調整撐張固定力道,使該C型環圈36a將該替換式隔熱襯套30a緊固於該內層32a表面,藉由強化該替換式隔熱襯套30a的固設效果。
Referring to Figures 7 to 9, the described electronic component heating and pressure treatment furnace rapid preparation device, wherein the
參閱第3、3A、7及7A圖所示,所述之電子元件加熱加壓處理爐快速整備裝置,其中該第一加壓裝置41係以使該容置空間13內之壓力與該圍閉隔熱空間33、33a內之壓力實質上同時調變至該預定壓力的方式來進行操作。
Referring to Figures 3, 3A, 7 and 7A, the described electronic component heating and pressure treatment furnace rapid preparation device, wherein the
參閱第1至第6及第11圖所示,所述之電子元件加熱加壓處理爐快速整備裝置,更包含一第二加壓裝置42,且該圍閉隔熱空間
33呈密封性設置,該第二加壓裝置42係以使該容置空間13內之壓力與該圍閉隔熱空間33內之壓力實質上同時調變至該預定壓力的方式來進行操作。
Referring to Figures 1 to 6 and Figure 11, the described electronic component heating and pressure treatment furnace rapid preparation device further includes a second pressurization device 42, and the enclosed
參閱第3、3A、10圖及第11圖所示,所述之電子元件加熱加壓處理爐快速整備裝置,更包含一微粒偵測器60,連接至該圍閉隔熱空間33內,以偵測排出該圍閉隔熱空間33的微粒含量,藉以判斷是否需要補充或更換圍閉隔熱空間33中的填充材料進行快速更換該替換式隔熱襯套30。
Referring to Figures 3, 3A, 10 and Figure 11, the described electronic component heating and pressure treatment furnace rapid preparation device further includes a
參閱第6圖及第9圖所示,所述之電子元件加熱加壓處理爐快速整備裝置,其中在該圍閉隔熱空間33、33a中填充具有低於16W/mK之導熱係數的一物質。
Referring to Fig. 6 and Fig. 9, the above-mentioned electronic component heating and pressure treatment furnace rapid preparation device, wherein the enclosed
所述之電子元件加熱加壓處理爐快速整備裝置,其中該物質為氣體。 Said electronic component heating and pressure treatment furnace rapid preparation device, wherein the substance is gas.
所述之電子元件加熱加壓處理爐快速整備裝置,其中該氣體為空氣或氮氣。 Said electronic component heating and pressurizing furnace rapid preparation device, wherein the gas is air or nitrogen.
所述之電子元件加熱加壓處理爐快速整備裝置,其中該物質為碳、玻璃、鐵氟龍或水。 Said electronic component heating and pressure treatment furnace rapid preparation device, wherein the substance is carbon, glass, Teflon or water.
參閱第5至第9圖所示,所述之電子元件加熱加壓處理爐快速整備裝置,其中該替換隔熱襯套30、30a係由金屬所製成。
Referring to Figures 5 to 9, the rapid preparation device for heating and pressurizing a furnace for electronic components, wherein the replacement heat-insulating
參閱第3、4、6、10及11圖所示,所述之電子元件加熱加壓處理爐快速整備裝置,更包含至少一分隔件70,用以將該圍閉隔熱空間33分隔成複數區域。
Referring to Figures 3, 4, 6, 10 and 11, the rapid preparation device for the heating and pressure treatment furnace of electronic components further includes at least one
參閱第3、4、6、10及11圖所示,所述之電子元件加熱加壓處理爐快速整備裝置,其中該分隔件70係由金屬所製成。
Referring to Figures 3, 4, 6, 10 and 11, the described electronic component heating and pressure treatment furnace rapid preparation device, wherein the
由其上述可知,本發明之電子元件加熱加壓處理爐快速整備裝置,確為業界首見而符合發明專利之新穎性要件者,而其全面性之創新設計,符合發明專利之進步性要件,而其中爐內生產過程中會有污染物附著,本發明之容置空間周面的隔熱襯套設成替換式隔熱襯套,所以當其污染物附著使其成為受污染的替換式隔熱襯套時,只需替換乾淨的替換式隔熱襯套,即可再繼續生產作業,使停機的時間壓縮至極短的時間,如此可以增加生產效率與產能,符合較佳之產業利用性者。 From the above, it can be seen that the rapid preparation device for heating and pressurizing the electronic component furnace of the present invention is indeed the first in the industry and meets the novelty requirements of the invention patent, and its comprehensive innovative design meets the progressive requirements of the invention patent. Wherein, there will be pollutants attached during the production process in the furnace, and the heat-insulating bushing on the surrounding surface of the accommodating space of the present invention is set as a replaceable heat-insulated bushing, so when the pollutants adhere to it, it becomes a polluted replacement insulation When heating the liner, only need to replace the clean replacement heat-insulating liner, and the production operation can be continued, so that the downtime can be reduced to a very short time, which can increase the production efficiency and production capacity, which is in line with the better industrial utilization.
前文係針對本發明之較佳實施例為本發明之技術特徵進行具體之說明;惟,熟悉此項技術之人士當可在不脫離本發明之精神與原則下對本發明進行變更與修改,而該等變更與修改,皆應涵蓋於如下申請專利範圍所界定之範疇中。 The above is a specific description of the technical characteristics of the present invention for the preferred embodiments of the present invention; however, those who are familiar with this technology should be able to change and modify the present invention without departing from the spirit and principles of the present invention. Such changes and modifications shall all be covered in the scope defined by the scope of the patent application as follows.
綜上所述,本發明係提供一種電子元件加熱加壓處理爐快速整備裝置,其確已達到本發明之所有目的,另其組合結構之空間型態未見於同類產品,亦未曾公開於申請前,已符合專利法之規定,爰依法提出申請。 In summary, the present invention provides a rapid preparation device for heating and pressurizing furnaces for electronic components, which has indeed achieved all the objectives of the present invention, and the spatial form of its combined structure has not been seen in similar products, nor has it been disclosed before the application , has complied with the provisions of the Patent Law, and filed an application according to the law.
12:筒身 12: cylinder body
30:替換式隔熱襯套 30: Replacement heat insulation bushing
31:外層 31: outer layer
32:內層 32: inner layer
33:圍閉隔熱空間 33:Enclosed and insulated space
36:C型環圈 36: C-shaped ring
37:撐張結構 37: Stretching structure
351:徑向擴張結構 351: radial expansion structure
70:分隔件 70:Separator
Claims (18)
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09280738A (en) * | 1996-04-16 | 1997-10-31 | Nippon Steel Corp | Rotary kiln lining refractory construction method |
JP2001208478A (en) * | 2000-01-31 | 2001-08-03 | Tokyo Electron Ltd | Thermal processor |
TW201518665A (en) * | 2013-11-11 | 2015-05-16 | Ablego Technology Co Ltd | Heating and pressurizing treatment oven for manufacturing electronic devices |
CN107990725A (en) * | 2017-11-29 | 2018-05-04 | 慈溪市舒润卫浴实业有限公司 | A kind of new electromagnetic induction furnace |
-
2022
- 2022-01-24 TW TW111102886A patent/TWI788202B/en active
- 2022-11-14 CN CN202211425057.7A patent/CN116481311A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09280738A (en) * | 1996-04-16 | 1997-10-31 | Nippon Steel Corp | Rotary kiln lining refractory construction method |
JP2001208478A (en) * | 2000-01-31 | 2001-08-03 | Tokyo Electron Ltd | Thermal processor |
TW201518665A (en) * | 2013-11-11 | 2015-05-16 | Ablego Technology Co Ltd | Heating and pressurizing treatment oven for manufacturing electronic devices |
CN107990725A (en) * | 2017-11-29 | 2018-05-04 | 慈溪市舒润卫浴实业有限公司 | A kind of new electromagnetic induction furnace |
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