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TWI770314B - Composition, film, infrared transmission filter, solid-state imaging element, and optical sensor - Google Patents

Composition, film, infrared transmission filter, solid-state imaging element, and optical sensor Download PDF

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TWI770314B
TWI770314B TW107141537A TW107141537A TWI770314B TW I770314 B TWI770314 B TW I770314B TW 107141537 A TW107141537 A TW 107141537A TW 107141537 A TW107141537 A TW 107141537A TW I770314 B TWI770314 B TW I770314B
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TW201925360A (en
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森全弘
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日商富士軟片股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B45/00Complex metal compounds of azo dyes
    • C09B45/02Preparation from dyes containing in o-position a hydroxy group and in o'-position hydroxy, alkoxy, carboxyl, amino or keto groups
    • C09B45/14Monoazo compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B45/00Complex metal compounds of azo dyes
    • C09B45/02Preparation from dyes containing in o-position a hydroxy group and in o'-position hydroxy, alkoxy, carboxyl, amino or keto groups
    • C09B45/24Disazo or polyazo compounds
    • C09B45/28Disazo or polyazo compounds containing copper
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B45/00Complex metal compounds of azo dyes
    • C09B45/02Preparation from dyes containing in o-position a hydroxy group and in o'-position hydroxy, alkoxy, carboxyl, amino or keto groups
    • C09B45/24Disazo or polyazo compounds
    • C09B45/32Disazo or polyazo compounds containing other metals
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
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Abstract

本發明提供一種能夠製造出膜厚均勻性高且高溫高濕環境下的異物缺陷的產生得到抑制之膜之組成物、膜、紅外線透射濾波器、固體攝像元件及光學感測器。該組成物含有:特定的金屬偶氮顏料;在波長400~700nm的範圍內具有吸收極大之色料;及具有乙烯性不飽和鍵結基之化合物和/或具有環狀醚基之化合物。而且,該組成物的波長400~600nm的範圍內之吸光度的最小值A與波長1000~1300nm的範圍內之吸光度的最大值B之比A/B為4.5以上。前述金屬偶氮顏料含有選自由式(I)表示之偶氮化合物及其互變異構結構的偶氮化合物之至少1種陰離子、2種以上的金屬離子及三聚氰胺化合物。The present invention provides a composition, a film, an infrared transmission filter, a solid-state imaging element, and an optical sensor capable of producing a film with high film thickness uniformity and suppressed occurrence of foreign matter defects in a high-temperature and high-humidity environment. The composition contains: a specific metal azo pigment; a colorant with a maximum absorption in the wavelength range of 400-700 nm; and a compound with an ethylenically unsaturated bond group and/or a compound with a cyclic ether group. Furthermore, the ratio A/B of the minimum value A of the absorbance in the wavelength range of 400 to 600 nm and the maximum value B of the absorbance in the wavelength range of 1000 to 1300 nm of the composition is 4.5 or more. The aforementioned metal azo pigment contains at least one anion selected from the azo compound represented by the formula (I) and the azo compound having a tautomeric structure, two or more metal ions, and a melamine compound.

Description

組成物、膜、紅外線透射濾波器、固體攝像元件及光學感測器Composition, film, infrared transmission filter, solid-state imaging element, and optical sensor

本發明係有關一種在紅外線透射濾波器等的製造中使用之組成物及使用了前述組成物之膜。又,係有關一種具有前述膜之紅外線透射濾波器、固體攝像元件及光學感測器。The present invention relates to a composition used in the manufacture of infrared transmission filters and the like, and a film using the composition. Furthermore, it relates to an infrared transmission filter, a solid-state imaging device, and an optical sensor having the above-mentioned film.

黃色顏料在濾色器等中,作為用於顯出基本顏色或補色的色料而使用。作為黃色顏料的一種,已知有一種比色指數(C.I.)Pigment Yellow150等偶氮巴比妥酸鎳錯合物。Yellow pigments are used as colorants for expressing basic colors or complementary colors in color filters and the like. A nickel azobarbiturate complex such as a color index (C.I.) Pigment Yellow 150 is known as one of the yellow pigments.

又,專利文獻1~4中對有關含有偶氮巴比妥酸、2種以上的金屬離子及三聚氰胺化合物之金屬偶氮顏料之發明有所記載。專利文獻1~4中記載之金屬偶氮顏料相對於以往的偶氮巴比妥酸鎳錯合物等具有得到改進之著色性能。 [先前技術文獻] [專利文獻]In addition, Patent Documents 1 to 4 describe inventions about metal azo pigments containing azobarbituric acid, two or more kinds of metal ions, and a melamine compound. The metal azo pigments described in Patent Documents 1 to 4 have improved coloring performance compared to conventional nickel azobarbiturate complexes and the like. [Prior Art Literature] [Patent Literature]

[專利文獻1]日本特開2017-171912號公報 [專利文獻2]日本特開2017-171913號公報 [專利文獻3]日本特開2017-171914號公報 [專利文獻4]日本特開2017-171915號公報[Patent Document 1] JP 2017-171912 A Bulletin No.

本發明人對使用了含有偶氮巴比妥酸、2種以上的金屬離子及三聚氰胺化合物之金屬偶氮顏料之膜進行了深入研究,結果得知具有在將該膜暴露於高溫高濕環境下之情況下容易產生異物缺陷的傾向。The inventors of the present invention have intensively studied films using metal azo pigments containing azobarbituric acid, two or more types of metal ions, and melamine compounds, and as a result, have found that the film has a high performance in exposing the film to a high temperature and high humidity environment. In this case, foreign matter defects tend to occur.

又,得知使用含有偶氮巴比妥酸、2種以上的金屬離子及三聚氰胺化合物之色料之組成物來製造膜之情況下,塗佈組成物來形成塗佈膜時,膜厚容易產生不均之事實。In addition, it was found that when a film is produced using a composition containing azobarbituric acid, two or more kinds of metal ions, and a colorant of a melamine compound, when the composition is applied to form a coating film, the film thickness tends to occur. Uneven facts.

藉此,本發明的目的在於提供一種能夠製造出膜厚均勻性高且高溫高濕環境下的異物缺陷的產生得到抑制之膜之組成物。又,在於提供一種使用了該組成物之膜、紅外線透射濾波器、固體攝像元件及光學感測器。Accordingly, an object of the present invention is to provide a composition capable of producing a film with high uniformity of film thickness and suppressed occurrence of foreign matter defects in a high-temperature and high-humidity environment. Furthermore, it is to provide a film, an infrared transmission filter, a solid-state imaging element, and an optical sensor using the composition.

依本發明人的研究,發現藉由使用後述組成物,能夠實現上述目的,藉此完成了本發明。本發明提供以下。 <1>一種組成物,其含有: 金屬偶氮顏料,含有選自由下述式(I)表示之偶氮化合物及其互變異構結構的偶氮化合物之至少1種陰離子、2種以上的金屬離子及三聚氰胺化合物; 色料,其為上述金屬偶氮顏料以外的色料,且在波長400~700nm的範圍具有吸收極大;及 至少1種化合物,選自具有乙烯性不飽和鍵結基之化合物及具有環狀醚基之化合物, 組成物的波長400~600nm的範圍內之吸光度的最小值A與波長1000~1300nm的範圍內之吸光度的最大值B之比A/B為4.5以上, [化學式1]

Figure 02_image003
式中,R1 及R2 分別獨立,為OH或NR5 R6 , R3 及R4 分別獨立,為=O或=NR7 , R5 ~R7 分別獨立,為氫原子或烷基。 <2>如<1>所述之組成物,其中金屬偶氮顏料含有上述陰離子、至少含有Zn2+ 及Cu2+ 之金屬離子、及三聚氰胺化合物。 <3>如<2>所述之組成物,其中以金屬偶氮顏料中的總金屬離子的1莫耳為基準,合計含有95~100莫耳%的Zn2+ 及Cu2+ 。 <4>如<2>或<3>所述之組成物,其中金屬偶氮顏料中的Zn2+ 與Cu2+ 的莫耳比為Zn2+ :Cu2+ =199:1~1:15。 <5>如<1>至<4>中任一項所述之組成物,其中金屬偶氮顏料中之三聚氰胺化合物為由下述式(II)表示之化合物; [化學式2]
Figure 02_image005
式中R11 ~R13 分別獨立,為氫原子或烷基。 <6>如<1>至<5>中任一項所述之組成物,其中在波長400~700nm的範圍具有吸收極大之色料含有選自藍色著色劑及紫色著色劑之至少1種。 <7>如<1>至<6>中任一項所述之組成物,其還含有近紅外線吸收色素。 <8>>如<7>所述之組成物,其中近紅外線吸收色素在波長800~900nm的範圍具有吸收極大。 <9>如<7>或<8>所述之組成物,其中近紅外線吸收色素為選自吡咯并吡咯化合物、花菁化合物、方酸菁化合物、酞菁化合物、萘酞菁化合物及克酮鎓化合物之至少1種。 <10>如<1>至<9>中任一項所述之組成物,其用於紅外線透射濾波器。 <11>一種膜,其使用<1>至<10>中任一項所述之組成物而獲得。 <12>一種紅外線透射濾波器,其具有<11>所述之膜。 <13>一種固體攝像元件,其具有<11>所述之膜。 <14>一種光學感測器,其具有<11>所述之膜。 [發明效果]According to the research of the present inventors, it was found that the above-mentioned object can be achieved by using the composition described later, and the present invention has been completed thereby. The present invention provides the following. <1> A composition comprising: a metal azo pigment containing at least one anion and two or more metals selected from an azo compound represented by the following formula (I) and an azo compound having a tautomeric structure thereof Ionic and melamine compounds; colorants other than the above-mentioned metal azo pigments, and having an absorption maximum in the range of wavelengths from 400 to 700 nm; and at least one compound selected from compounds having ethylenically unsaturated bonding groups and a compound having a cyclic ether group, the ratio A/B of the minimum value A of the absorbance in the wavelength range of 400 to 600 nm and the maximum value B of the absorbance in the wavelength range of 1000 to 1300 nm of the composition is 4.5 or more, [chemical formula 1]
Figure 02_image003
In the formula, R 1 and R 2 are independently OH or NR 5 R 6 , R 3 and R 4 are independently =O or =NR 7 , and R 5 to R 7 are independently hydrogen atoms or alkyl groups. <2> The composition according to <1>, wherein the metal azo pigment contains the above-mentioned anion, a metal ion containing at least Zn 2+ and Cu 2+ , and a melamine compound. <3> The composition according to <2>, which contains 95 to 100 mol % of Zn 2+ and Cu 2+ in total based on 1 mol of total metal ions in the metal azo pigment. <4> The composition according to <2> or <3>, wherein the molar ratio of Zn 2+ to Cu 2+ in the metal azo pigment is Zn 2+ :Cu 2+ =199:1~1: 15. <5> The composition according to any one of <1> to <4>, wherein the melamine compound in the metal azo pigment is a compound represented by the following formula (II); [Chemical formula 2]
Figure 02_image005
In the formula, R 11 to R 13 are each independently and represent a hydrogen atom or an alkyl group. <6> The composition according to any one of <1> to <5>, wherein the colorant having an absorption maximum in the wavelength range of 400 to 700 nm contains at least one selected from a blue colorant and a purple colorant . <7> The composition according to any one of <1> to <6>, which further contains a near-infrared absorbing dye. <8>> The composition according to <7>, wherein the near-infrared absorbing dye has an absorption maximum in a wavelength range of 800 to 900 nm. <9> The composition according to <7> or <8>, wherein the near-infrared absorbing dye is selected from the group consisting of pyrrolopyrrole compounds, cyanine compounds, squaraine compounds, phthalocyanine compounds, naphthalocyanine compounds and ketones At least one of the onium compounds. <10> The composition according to any one of <1> to <9>, which is used for an infrared transmission filter. <11> A film obtained using the composition according to any one of <1> to <10>. <12> An infrared transmission filter having the film described in <11>. <13> A solid-state imaging element having the film described in <11>. <14> An optical sensor having the film described in <11>. [Inventive effect]

依本發明,能夠提供一種能夠製造出膜厚均勻性高且高溫高濕環境下的異物缺陷的產生得到抑制之膜之組成物、膜、紅外線透射濾波器、固體攝像元件及光學感測器。According to the present invention, it is possible to provide a composition, a film, an infrared transmission filter, a solid-state imaging device, and an optical sensor capable of producing a film with high uniformity of film thickness and suppressed occurrence of foreign matter defects in a high-temperature and high-humidity environment.

以下,對本發明的內容進行詳細說明。 本說明書中,“~”以包括將其前後記載之數值作為下限值及上限值之含義來使用。 本說明書中之基團(原子團)的標記中,未記載取代及未取代的標記包含不具有取代基的基團以及具有取代基之基團(原子團)。例如,“烷基”指,不僅包含不具有取代基的烷基(未取代之烷基),亦包含具有取代基之烷基(取代之烷基)。 本說明書中“曝光”除非另有說明,否則不僅表示使用光之曝光,使用電子束、離子束等粒子束之描繪亦屬於曝光。又,作為在曝光中使用之光,可列舉水銀燈的明線光譜、準分子雷射所代表之遠紫外線、極紫外線(EUV光)、X射線、電子束等光化射線或放射線。 本說明書中,“(甲基)丙烯酸酯”表示丙烯酸酯及甲基丙烯酸酯這兩者或任一個,“(甲基)丙烯酸”表示丙烯酸及甲基丙烯酸這兩者或任一個,“(甲基)丙烯醯”表示丙烯醯及甲基丙烯醯這兩者或任一個。 本說明書中,重量平均分子量及數量平均分子量被定義為藉由凝膠滲透層析法(GPC)測量之聚苯乙烯換算值。 本說明書中,化學式中的Me表示甲基,Et表示乙基,Bu表示丁基,Ph表示苯基。 本說明書中,紅外線是指波長700~2500nm的光(電磁波)。 本說明書中,總固體成分是指從組成物的總成分去除溶劑之成分的總質量。 本說明書中,“步驟”這一詞不僅表示獨立的步驟,即使在無法與其他步驟明確區分之情況下,只要實現該步驟的預期作用,則亦包含於本術語中。Hereinafter, the content of the present invention will be described in detail. In this specification, "-" is used to include the numerical value described before and after it as a lower limit value and an upper limit value. In the notation of groups (atomic groups) in this specification, the notation of unsubstituted and unsubstituted references includes groups without substituents and groups (atomic groups) with substituents. For example, "alkyl" means not only an unsubstituted alkyl group (unsubstituted alkyl group) but also a substituted alkyl group (substituted alkyl group). In this specification, "exposure" means not only exposure using light, but also drawing using particle beams such as electron beams and ion beams, unless otherwise specified. Further, examples of the light used for exposure include the bright line spectrum of a mercury lamp, extreme ultraviolet rays represented by excimer lasers, extreme ultraviolet rays (EUV light), X-rays, and electron beams and other actinic rays and radiation. In this specification, "(meth)acrylate" means both or either of acrylate and methacrylate, "(meth)acrylic" means both or either of acrylic acid and methacrylic acid, "(meth)acrylate" "base) acryl" means both or either of acryl and methacryl. In this specification, the weight average molecular weight and the number average molecular weight are defined as polystyrene conversion values measured by gel permeation chromatography (GPC). In this specification, Me in the chemical formula represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group. In this specification, infrared rays refer to light (electromagnetic waves) having a wavelength of 700 to 2500 nm. In this specification, the total solid content refers to the total mass of the components excluding the solvent from the total components of the composition. In this specification, the word "step" not only refers to an independent step, but even if it cannot be clearly distinguished from other steps, as long as the intended function of the step is achieved, it is also included in this term.

<組成物> 本發明的組成物的特徵為,其含有:金屬偶氮顏料,含有選自由後述式(I)表示之偶氮化合物及其互變異構結構的偶氮化合物之至少1種陰離子、2種以上的金屬離子及三聚氰胺化合物; 色料,其為上述金屬偶氮顏料以外的色料,且在波長400~700nm的範圍具有吸收極大;及 至少1種化合物,選自具有乙烯性不飽和鍵結基之化合物及具有環狀醚基之化合物, 組成物的波長400~600nm的範圍內之吸光度的最小值A與波長1000~1300nm的範圍內之吸光度的最大值B之比A/B為4.5以上。<Composition> The composition of the present invention is characterized in that it contains a metal azo pigment, at least one anion selected from the group consisting of an azo compound represented by the formula (I) and azo compounds having a tautomeric structure described later, Two or more kinds of metal ions and melamine compounds; colorants, which are colorants other than the above-mentioned metal azo pigments, and have an absorption maximum in the wavelength range of 400-700 nm; and at least one compound selected from ethylenically unsaturated The compound with a bonding group and a compound with a cyclic ether group, the ratio A/B of the minimum value A of the absorbance within the wavelength range of 400 to 600 nm and the maximum value B of the absorbance within the wavelength range of 1000 to 1300 nm is: 4.5 and above.

本發明人對含有偶氮巴比妥酸、2種以上的金屬離子及三聚氰胺化合物之金屬偶氮顏料進行了深入研究,結果得知該金屬偶氮顏料具有硬度低的傾向,且容易微細化,但將具有產生活性面而容易凝聚的傾向。又,推測為在金屬偶氮顏料中之鎳離子(Ni2+ )的含量少或金屬偶氮顏料不含鎳離子的情況下,能量上處於不穩定的狀態,且推測為金屬偶氮顏料具有更容易凝聚的傾向。又,該金屬偶氮顏料含有2種以上的金屬離子,但依據金屬離子的種類,由上述陰離子和金屬離子構成之金屬偶氮化合物(金屬錯合物)的構形有所不同。例如,為Cu2+ 時形成平面構形的金屬錯合物,為Zn2+ 時形成正八面體構形的金屬錯合物。因此,推測為上述金屬偶氮顏料存在於不穩定的狀態中。因此,推測為上述金屬偶氮顏料具有在高溫高濕環境下容易促進凝聚的傾向。 依本發明人的研究,藉由將上述金屬偶氮顏料與作為上述金屬偶氮顏料以外的色料而在波長400~700nm的範圍具有吸收極大之色料(以下亦稱為其他色料)併用來製備波長400~600nm的範圍內之吸光度的最小值A與波長1000~1300nm的範圍內之吸光度的最大值B之比A/B為4.5以上之組成物,結果驚人地發現即使將使用該組成物獲得之膜暴露於高溫高濕環境下,亦不易產生異物缺陷。作為可獲得該種效果之理由,進行了推測,認為在於金屬偶氮顏料以外的其他色料與金屬偶氮顏料的偶氮部位相互作用,藉此得以提高金屬偶氮顏料的穩定性。The inventors of the present invention have conducted intensive studies on metal azo pigments containing azobarbituric acid, two or more metal ions, and melamine compounds. As a result, it was found that the metal azo pigments tend to have low hardness and are easy to micronize. However, there will be a tendency to generate active surfaces and to aggregate easily. In addition, it is presumed that when the content of nickel ions (Ni 2+ ) in the metal azo pigment is small or the metal azo pigment does not contain nickel ions, the metal azo pigment is in an energetically unstable state, and it is presumed that the metal azo pigment has Tendency to coalesce more easily. In addition, the metal azo pigment contains two or more kinds of metal ions, but the configuration of the metal azo compound (metal complex) composed of the anion and the metal ion is different depending on the type of the metal ion. For example, when it is Cu 2+ , it forms a metal complex with a planar configuration, and when it is Zn 2+ , it forms a metal complex with a regular octahedral configuration. Therefore, it is presumed that the above-mentioned metal azo pigment exists in an unstable state. Therefore, it is presumed that the above-mentioned metal azo pigment tends to promote aggregation easily in a high-temperature and high-humidity environment. According to the research of the present inventors, the above-mentioned metal azo pigments are used in combination with colorants other than the above-mentioned metal azo pigments that have a maximum absorption in the wavelength range of 400 to 700 nm (hereinafter also referred to as other colorants). To prepare a composition in which the ratio A/B of the minimum value A of the absorbance in the wavelength range of 400 to 600 nm and the maximum value B of the absorbance in the wavelength range of 1000 to 1300 nm is 4.5 or more, it was surprisingly found that even if this composition is used The film obtained from the material is exposed to high temperature and high humidity environment, and it is not easy to produce foreign matter defects. As a reason why such an effect can be obtained, it is presumed that other colorants other than the metal azo pigment interact with the azo site of the metal azo pigment, thereby improving the stability of the metal azo pigment.

另一方面,得知在塗佈含有上述金屬偶氮顏料和其他色料之組成物來形成膜時,具有容易產生膜厚的不均的傾向。認為其原因在於,因其他色料等的影響,組成物中之金屬偶氮顏料的分散狀態變得不穩定。又,得知具有上述分光特性之組成物具有含有較多色料的傾向,因此具有比金屬偶氮顏料的分散狀態更容易變得不穩定且容易產生膜厚不均的傾向。然而,本發明的組成物除了上述金屬偶氮顏料和其他色料之外,進一步含有選自具有乙烯性不飽和鍵結基化合物及具有環狀醚基之化合物之至少1種化合物,藉此還能夠有效地抑制該種膜厚的不均。作為可獲得該種效果之理由推測在於以下幾點。亦即,推測為在組成物中含有具有乙烯性不飽和鍵結基之化合物時,具有乙烯性不飽和鍵結基之化合物與金屬偶氮顏料的顏料活性面(尤其偶氮部位)相互作用,使得具有乙烯性不飽和鍵結基之化合物被吸附於金屬偶氮顏料的表面,從而能夠使金屬偶氮顏料變得穩定。又,推測為在組成物中含有具有環狀醚基之化合物時,環狀醚基相對於金屬偶氮顏料而配位並作為螯合劑發揮作用,其結果推測為能夠使金屬偶氮顏料變得穩定。因此,推測為依本發明的組成物來優化膜厚的均勻性。On the other hand, it was found that when a composition containing the above-mentioned metal azo pigment and other colorants is applied to form a film, unevenness in film thickness tends to occur easily. The reason for this is considered to be that the dispersion state of the metal azo pigment in the composition becomes unstable due to the influence of other colorants and the like. In addition, it was found that the composition having the above-described spectral characteristics tends to contain a large amount of colorant, and therefore, the dispersion state is more likely to become unstable than the metal azo pigment, and the film thickness unevenness tends to be easily generated. However, the composition of the present invention further contains at least one compound selected from the group consisting of compounds having an ethylenically unsaturated bond group and compounds having a cyclic ether group, in addition to the above-mentioned metallic azo pigments and other colorants, thereby also Such unevenness in film thickness can be effectively suppressed. The following points are presumed as the reason why such an effect can be obtained. That is, it is presumed that when a compound having an ethylenically unsaturated bond group is contained in the composition, the compound having an ethylenically unsaturated bond group interacts with the pigment active surface (especially the azo site) of the metal azo pigment, The compound having an ethylenically unsaturated bond group is adsorbed on the surface of the metal azo pigment, so that the metal azo pigment can be stabilized. In addition, it is presumed that when a compound having a cyclic ether group is contained in the composition, the cyclic ether group is coordinated to the metal azo pigment to function as a chelating agent, and as a result, it is presumed that the metal azo pigment can become Stablize. Therefore, it is presumed that the uniformity of the film thickness is optimized by the composition of the present invention.

因此,依本發明的組成物,能夠製造出膜厚均勻性高且高溫高濕環境下的異物缺陷的產生得到抑制之膜。又,使用該組成物獲得之膜的波長400~600nm的光的遮光性高並且波長1000~1300nm的光的透射性優異,因此能夠較佳地用於紅外線透射濾波器等。又,本發明的組成物中所含之上述金屬偶氮顏料為著色力高的色料。因此,藉由使用本發明的組成物,能夠形成膜厚薄但波長400~600nm的範圍下之遮光性高的膜。又,亦能夠減少組成物中的色料的含量,因此配方設計的靈活性亦優異。Therefore, according to the composition of the present invention, it is possible to produce a film with high uniformity of film thickness and suppressed occurrence of foreign matter defects in a high-temperature and high-humidity environment. Moreover, since the film obtained using this composition has high light shielding property for light with a wavelength of 400 to 600 nm and excellent transmittance for light with a wavelength of 1000 to 1300 nm, it can be preferably used for an infrared transmission filter or the like. Moreover, the said metal azo pigment contained in the composition of this invention is a coloring material with high coloring power. Therefore, by using the composition of the present invention, it is possible to form a film having a thin film thickness but high light-shielding properties in the range of wavelengths of 400 to 600 nm. In addition, since the content of the colorant in the composition can be reduced, the flexibility of formulation design is also excellent.

本發明的組成物的波長400~600nm的範圍內之吸光度的最小值A與波長1000~1300nm的範圍內之吸光度的最大值B之比A/B為4.5以上,7.5以上為較佳,15以上為更佳,30以上為進一步較佳。只要上述吸光度比為4.5以上,便能夠形成波長400~600nm的光的遮光性高並且波長1000~1300nm的光的透射性優異的膜。The composition of the present invention has a ratio A/B of the minimum absorbance value A in the wavelength range of 400 to 600 nm to the absorbance maximum value B in the wavelength range of 1000 to 1300 nm A/B is 4.5 or more, preferably 7.5 or more, and 15 or more More preferably, 30 or more is more preferable. As long as the above-mentioned absorbance ratio is 4.5 or more, it is possible to form a film having high light shielding properties for light having a wavelength of 400 to 600 nm and excellent transmittance for light having a wavelength of 1000 to 1300 nm.

一種波長λ下之吸光度Aλ藉由以下式(1)被定義。 Aλ=-log(Tλ/100) ……(1) Aλ為波長λ下之吸光度,Tλ為波長λ下之透射率(%)。 本發明中,吸光度的值可以是在溶液狀態下測量之值,亦可以是使用組成物來進行製膜之膜的值。在膜的狀態下測量吸光度時,使用在玻璃基板上藉由旋塗法等方法來塗佈組成物並利用用加熱板等乾燥100℃、120秒鐘而獲得之膜來進行測量為較佳。The absorbance Aλ at a wavelength λ is defined by the following formula (1). Aλ=-log(Tλ/100) ... (1) Aλ is the absorbance at wavelength λ, and Tλ is the transmittance (%) at wavelength λ. In the present invention, the value of absorbance may be a value measured in a solution state, or may be a value of a film formed using the composition. When measuring the absorbance in the state of a film, it is preferable to measure using a film obtained by coating the composition on a glass substrate by a method such as spin coating and drying with a hot plate or the like at 100° C. for 120 seconds.

又,吸光度能夠使用以往公知的分光光度計來測量。吸光度的測量條件並無特別限定,但在調整為波長400~600nm的範圍內之吸光度的最小值A達到0.1~3.0之條件下測量波長1000~1300nm的範圍內之吸光度的最大值B為較佳。藉由在該種條件下測量吸光度,能夠進一步減小測量誤差。作為調整為波長400~600nm的範圍內之吸光度的最小值A達到0.1~3.0之方法,並無特別限定。例如,在溶液狀態下測量吸光度時,可列舉調整樣品試池的光路長度之方法。又,在膜的狀態下測量吸光度時,可列舉調整膜厚之方法等。In addition, the absorbance can be measured using a conventionally known spectrophotometer. The measurement conditions of the absorbance are not particularly limited, but it is preferable to measure the maximum value B of the absorbance in the wavelength range of 1000 to 1300 nm under the condition that the minimum value A of the absorbance in the wavelength range of 400 to 600 nm becomes 0.1 to 3.0. . By measuring the absorbance under such conditions, the measurement error can be further reduced. It does not specifically limit as a method of adjusting so that the minimum value A of the absorbance in the wavelength range of 400-600 nm may become 0.1-3.0. For example, when measuring the absorbance in a solution state, a method of adjusting the optical path length of the sample cell can be cited. Moreover, when measuring absorbance in the state of a film, the method of adjusting a film thickness, etc. are mentioned.

本發明的組成物滿足以下(1)~(3)中的任一個分光特性為較佳,從容易製造出高溫高濕環境下的異物缺陷的產生進一步得到抑制之膜這一理由考慮,滿足(2)或(3)的分光特性為更佳,滿足(3)的分光特性為進一步較佳。作為可獲得該種效果之理由,推測在於以下幾點。能夠按照(1)、(2)、(3)的順序形成能夠阻斷更長波長側的光之膜,但為了阻斷更長波長的光,有時作為其他色料使用吸收更長波長的色料或者進一步含有近紅外線吸收色素。推測為該種素材大多具有很廣的共軛系,且具有容易與金屬偶氮顏料相互作用的傾向。因此,推測為能夠使金屬偶氮顏料進一步變得穩定,其結果能夠製造出高溫高濕環境下的異物缺陷的產生進一步得到抑制之膜。The composition of the present invention preferably satisfies any one of the following spectroscopic properties (1) to (3), and satisfies ( The spectroscopic properties of 2) or (3) are more preferable, and the spectroscopic properties satisfying (3) are further preferable. The reason why such an effect can be obtained is presumed to be as follows. A film capable of blocking light on the longer wavelength side can be formed in the order of (1), (2), and (3), but in order to block light with a longer wavelength, a film that absorbs longer wavelengths is sometimes used as another colorant. The coloring material may further contain a near-infrared absorbing coloring matter. It is presumed that many of these materials have a wide conjugated system and tend to easily interact with metal azo pigments. Therefore, it is presumed that the metal azo pigment can be further stabilized, and as a result, a film in which the occurrence of foreign matter defects in a high-temperature and high-humidity environment can be further suppressed can be produced.

(1):波長400~600nm的範圍內之吸光度的最小值A1與波長800~1300nm的範圍內之吸光度的最大值B1之比A1/B1為4.5以上,7.5以上為較佳,15以上為更佳,30以上為進一步較佳。依該態樣,能夠形成阻斷波長400~600nm的範圍的光而能夠使超過波長650nm之光透射的膜。 (2):波長400~720nm的範圍內之吸光度的最小值A2與波長900~1300nm的範圍內之吸光度的最大值B2之比A2/B2為4.5以上,7.5以上為較佳,15以上為更佳,30以上為進一步較佳。依該態樣,能夠形成阻斷波長400~750nm的範圍的光而能夠使超過波長800nm之光透射的膜。 (3):波長400~830nm的範圍內之吸光度的最小值A3與波長1000~1300nm的範圍內之吸光度的最大值B3之比A3/B3為4.5以上,7.5以上為較佳,15以上為更佳,30以上為進一步較佳。依該態樣,能夠形成阻斷波長400~830nm的範圍的光而能夠使超過波長900nm之光透射的膜。(1): The ratio A1/B1 of the minimum absorbance value A1 in the wavelength range of 400 to 600 nm and the absorbance maximum value B1 in the wavelength range of 800 to 1300 nm is 4.5 or more, preferably 7.5 or more, and more preferably 15 or more. Preferably, more than 30 is more preferable. According to this aspect, it is possible to form a film that blocks light in the range of wavelengths of 400 to 600 nm and can transmit light exceeding wavelengths of 650 nm. (2): The ratio A2/B2 of the minimum value A2 of the absorbance within the wavelength range of 400 to 720 nm and the maximum value B2 of the absorbance within the wavelength range of 900 to 1300 nm is 4.5 or more, preferably 7.5 or more, and more preferably 15 or more. Preferably, more than 30 is more preferable. According to this aspect, it is possible to form a film that blocks light in a wavelength range of 400 to 750 nm and can transmit light exceeding a wavelength of 800 nm. (3): The ratio A3/B3 of the minimum absorbance value A3 in the wavelength range of 400 to 830 nm and the maximum absorbance value B3 in the wavelength range of 1000 to 1300 nm is 4.5 or more, preferably 7.5 or more, and more preferably 15 or more. Preferably, more than 30 is more preferable. According to this aspect, it is possible to form a film that blocks light in a wavelength range of 400 to 830 nm and can transmit light exceeding a wavelength of 900 nm.

製作本發明的組成物的乾燥後的膜厚為10.0μm以下(較佳為5.0μm以下,更佳為3.0μm以下,進一步較佳為2.5μm以下,更進一步較佳為2.0μm以下,特佳為1.5μm以下。又,下限值能夠設為0.4μm以上,亦能夠設為0.5μm以上,亦能夠設為0.6μm以上,亦能夠設為0.7μm以上,亦能夠設為0.8μm以上,亦能夠設為0.9μm以上。)的膜時,前述至少一個膜厚滿足膜的厚度方向上之光的透射率的波長400~600nm的範圍內之最大值為20%以下(較佳為15%以下,更佳為10%以下)且波長1000~1300nm的範圍內之最小值為70%以上(較佳為75%以上,更佳為80%以上)之分光特性為較佳。The film thickness after drying to produce the composition of the present invention is 10.0 μm or less (preferably 5.0 μm or less, more preferably 3.0 μm or less, further preferably 2.5 μm or less, still more preferably 2.0 μm or less, particularly preferably Also, the lower limit can be 0.4 μm or more, 0.5 μm or more, 0.6 μm or more, 0.7 μm or more, 0.8 μm or more, or 0.8 μm or more. In the case of a film having a thickness of 0.9 μm or more, the maximum value within the wavelength range of 400 to 600 nm at which the at least one film thickness satisfies the transmittance of light in the thickness direction of the film is 20% or less (preferably 15% or less). , more preferably 10% or less) and the minimum value within the wavelength range of 1000 to 1300 nm is 70% or more (preferably 75% or more, more preferably 80% or more) Spectral characteristics are preferred.

又,本發明的組成物滿足以下(11)~(13)中的任一個分光特性為較佳,從容易製造出高溫高濕環境下的異物缺陷的產生進一步得到抑制膜之理由考慮,滿足(12)或(13)的分光特性為更佳,滿足(13)的分光特性為進一步較佳。In addition, the composition of the present invention preferably satisfies any one of the following spectroscopic properties (11) to (13), and from the viewpoint of easily producing a film that suppresses the occurrence of foreign matter defects in a high-temperature and high-humidity environment, it satisfies ( The spectral characteristics of 12) or (13) are more preferred, and the spectral characteristics satisfying (13) are further preferred.

(11):一種態樣,使用本發明的組成物來製造出乾燥後的膜厚為0.4~3.0μm(較佳為0.5~2.5μm,更佳為0.6~2.0μm,進一步較佳為0.7~1.5μm)的膜時,膜的厚度方向上之光的透射率的波長400~600nm的範圍內之最大值為20%以下(較佳為15%以下,更佳為10%以下)且膜的厚度方向上之光的透射率的波長800~1300nm的範圍內之最小值為70%以上(較佳為75%以上,更佳為80%以上)。 (12):一種態樣,使用本發明的組成物來製造出乾燥後的膜厚為0.5~5.0μm(較佳為0.6~3.0μm,更佳為0.7~2.5μm,進一步較佳為0.8~2.0μm)的膜時,膜的厚度方向上之光的透射率的波長400~720nm的範圍內之最大值為20%以下(較佳為15%以下,更佳為10%以下)且膜的厚度方向上之光的透射率的波長900~1300nm的範圍內之最小值為70%以上(較佳為75%以上,更佳為80%以上)。 (13):一種態樣,使用本發明的組成物來製造乾燥後的膜厚為0.6~10μm(較佳為0.7~5.0μm,更佳為0.8~3.0μm,進一步較佳為0.9~2.5μm)的膜時,膜的厚度方向上之光的透射率的波長400~830nm的範圍內之最大值為20%以下(較佳為15%以下,更佳為10%以下)且膜的厚度方向上之光的透射率的波長1000~1300nm的範圍內之最小值為70%以上(較佳為75%以上,更佳為80%以上)。(11): An aspect that uses the composition of the present invention to produce a film thickness after drying of 0.4 to 3.0 μm (preferably 0.5 to 2.5 μm, more preferably 0.6 to 2.0 μm, further preferably 0.7 to 3.0 μm) 1.5 μm), the maximum value of the transmittance of light in the thickness direction of the film in the wavelength range of 400 to 600 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the The minimum value of the transmittance of light in the thickness direction within the wavelength range of 800 to 1300 nm is 70% or more (preferably 75% or more, more preferably 80% or more). (12): An aspect that uses the composition of the present invention to produce a film having a thickness of 0.5 to 5.0 μm (preferably 0.6 to 3.0 μm, more preferably 0.7 to 2.5 μm, further preferably 0.8 to 5.0 μm) after drying. 2.0 μm), the maximum value of the transmittance of light in the thickness direction of the film in the wavelength range of 400 to 720 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the The minimum value of the transmittance of light in the thickness direction within the wavelength range of 900 to 1300 nm is 70% or more (preferably 75% or more, more preferably 80% or more). (13): An aspect wherein the film thickness after drying is 0.6 to 10 μm (preferably 0.7 to 5.0 μm, more preferably 0.8 to 3.0 μm, further preferably 0.9 to 2.5 μm) using the composition of the present invention ), the maximum value of the transmittance of light in the thickness direction of the film in the wavelength range of 400 to 830 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the thickness direction of the film The minimum value in the wavelength range of 1000-1300 nm of the transmittance of the light above is 70% or more (preferably 75% or more, more preferably 80% or more).

以下,對在本發明的組成物中使用之各成分進行說明。Hereinafter, each component used in the composition of the present invention will be described.

<<金屬偶氮顏料A>> 本發明的組成物含有選自由下述式(I)表示之偶氮化合物及其互變異構結構的偶氮化合物之至少1種陰離子、2種以上的金屬離子及三聚氰胺化合物之金屬偶氮顏料A。 [化學式3]

Figure 02_image007
<<Metal Azo Pigment A>> The composition of the present invention contains at least one kind of anion and two or more kinds of metal ions selected from the azo compound represented by the following formula (I) and the azo compound of the tautomeric structure thereof And metal azo pigment A of melamine compound. [Chemical formula 3]
Figure 02_image007

式中,R1 及R2 分別獨立,為OH或NR5 R6 ,R3 及R4 分別獨立,為=O或=NR7 ,R5 ~R7 分別獨立,為氫原子或烷基。R5 ~R7 所表示之烷基的碳數為1~10為較佳,1~6為更佳,1~4為進一步較佳。烷基可以是直鏈、支鏈及環狀中的任一個,直鏈或支鏈為較佳,直鏈為更佳。烷基可以具有取代基。作為取代基,可列舉後述取代基T,鹵原子、羥基、烷氧基、氰基及胺基為較佳。In the formula, R 1 and R 2 are independently OH or NR 5 R 6 , R 3 and R 4 are independently =O or =NR 7 , and R 5 to R 7 are independently hydrogen atoms or alkyl groups. The number of carbon atoms of the alkyl group represented by R 5 to R 7 is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. The alkyl group may be any of straight chain, branched chain and cyclic chain, straight chain or branched chain is preferred, straight chain is more preferred. The alkyl group may have a substituent. As a substituent, the substituent T mentioned later is mentioned, and a halogen atom, a hydroxyl group, an alkoxy group, a cyano group, and an amine group are preferable.

式(I)中,R1 及R2 為OH為較佳。又,R3 及R4 為=O為較佳。In formula (I), R 1 and R 2 are preferably OH. Moreover, R 3 and R 4 are preferably =0.

金屬偶氮顏料A中之三聚氰胺化合物為由下述式(II)表示之化合物為較佳。 [化學式4]

Figure 02_image009
The melamine compound in the metal azo pigment A is preferably a compound represented by the following formula (II). [Chemical formula 4]
Figure 02_image009

式中R11 ~R13 分別獨立,為氫原子或烷基。烷基的碳數為1~10為較佳,1~6為更佳,1~4為進一步較佳。烷基可以是直鏈、支鏈及環狀中的任一個,直鏈或支鏈為較佳,直鏈為更佳。烷基可以具有取代基。作為取代基,可列舉後述的取代基T,羥基為較佳。R11 ~R13 中的至少一個為氫原子為較佳,R11 ~R13 均為氫原子為更佳。In the formula, R 11 to R 13 are each independently and represent a hydrogen atom or an alkyl group. The number of carbon atoms of the alkyl group is preferably 1-10, more preferably 1-6, and even more preferably 1-4. The alkyl group may be any of straight chain, branched chain and cyclic chain, straight chain or branched chain is preferred, straight chain is more preferred. The alkyl group may have a substituent. As a substituent, the substituent T mentioned later can be mentioned, and a hydroxyl group is preferable. It is preferable that at least one of R 11 to R 13 is a hydrogen atom, and it is more preferable that all of R 11 to R 13 are hydrogen atoms.

金屬偶氮顏料A中,選自由式(I)表示之偶氮化合物及其互變異構結構的偶氮化合物中之至少1種陰離子的每1莫耳含有0.05~4莫耳的三聚氰胺化合物(較佳為由式(II)表示之化合物)為較佳,含有0.5~2.5莫耳為更佳,含有1.0~2.0莫耳為進一步較佳。In the metal azo pigment A, at least one anion selected from the azo compound represented by the formula (I) and the azo compound having a tautomeric structure contains 0.05 to 4 mol of melamine compound (compared to 1 mol). It is preferably a compound represented by formula (II)), more preferably 0.5 to 2.5 mol, and still more preferably 1.0 to 2.0 mol.

金屬偶氮顏料A的比表面積為20~200m2 /g為較佳。下限為60m2 /g以上為較佳,90m2 /g以上為更佳。上限為160m2 /g以下為較佳,150m2 /g以下為更佳。金屬偶氮顏料A的比表面積的值為以BET(Brunauer、Emmett及Teller(布厄特法))法為基準,按照DIN 66131:determination of the specific surface area of solids by gas adsorption(基於氣體吸附之固體的比表面積的測量)而測量之值。The specific surface area of the metal azo pigment A is preferably 20 to 200 m 2 /g. The lower limit is preferably 60 m 2 /g or more, and more preferably 90 m 2 /g or more. The upper limit is preferably 160 m 2 /g or less, more preferably 150 m 2 /g or less. The value of the specific surface area of the metal azo pigment A is based on the BET (Brunauer, Emmett and Teller (Buett method)) method, according to DIN 66131: determination of the specific surface area of solids by gas adsorption. measurement of the specific surface area of a solid).

(取代基T) 作為上述取代基T,可列舉下列基團。烷基(較佳為碳數1~30的烷基)、烯基(較佳為碳數2~30的烯基)、炔基(較佳為碳數2~30的炔基)、芳基(較佳為碳數6~30的芳基)、胺基(較佳為碳數0~30的胺基)、烷氧基(較佳為碳數1~30的烷氧基)、芳氧基(較佳為碳數6~30的芳氧基)、雜芳氧基、醯基(較佳為碳數1~30的醯基)、烷氧羰基(較佳為碳數2~30的烷氧羰基)、芳氧羰基(較佳為碳數7~30的芳氧羰基)、雜芳氧羰基、醯氧基(較佳為碳數2~30的醯氧基)、醯胺基(較佳為碳數2~30的醯胺基)、烷氧羰基胺基(較佳為碳數2~30的烷氧羰基胺基)、芳氧羰基胺基(較佳為碳數7~30的芳氧羰基胺基)、胺磺醯基(較佳為碳數0~30的胺磺醯基)、胺基甲醯基(較佳為碳數1~30的胺基甲醯基)、烷硫基(較佳為碳數1~30的烷硫基)、芳硫基(較佳為碳數6~30的芳硫基)、雜芳硫基(較佳為碳數1~30)、烷基磺醯基(較佳為碳數1~30)、芳基磺醯基(較佳為碳數6~30)、雜芳基磺醯基(較佳為碳數1~30)、烷基亞磺醯基(較佳為碳數1~30)、芳基亞磺醯基(較佳為碳數6~30)、雜芳基亞磺醯基(較佳為碳數1~30)、脲基(較佳為碳數1~30)、羥基、羧基、磺基、磷酸基、羧酸胺基、磺酸胺基、醯亞胺酸基、巰基、鹵原子、氰基、烷基亞磺酸基、芳基亞磺酸基、肼基、亞胺基、雜芳基(較佳為碳數1~30)。該等基團為能夠進一步取代的基團時,可以進一步具有取代基。作為其他取代基,可列舉在上述取代基T中說明之基團。(Substituent T) As said substituent T, the following groups are mentioned. Alkyl group (preferably an alkyl group having 1 to 30 carbon atoms), alkenyl group (preferably an alkenyl group having 2 to 30 carbon atoms), alkynyl group (preferably an alkynyl group having 2 to 30 carbon atoms), aryl group (preferably an aryl group having 6 to 30 carbon atoms), an amine group (preferably an amine group having 0 to 30 carbon atoms), an alkoxy group (preferably an alkoxy group having 1 to 30 carbon atoms), an aryloxy group group (preferably aryloxy with 6 to 30 carbon atoms), heteroaryloxy, acyl group (preferably with 1 to 30 carbon atoms), alkoxycarbonyl (preferably with 2 to 30 carbon atoms) alkoxycarbonyl), aryloxycarbonyl (preferably aryloxycarbonyl having 7 to 30 carbon atoms), heteroaryloxycarbonyl, acyloxy (preferably aryloxy having 2 to 30 carbons), acylamino ( It is preferably an amide group with 2-30 carbon atoms), an alkoxycarbonylamino group (preferably an alkoxycarbonylamino group with a carbon number of 2-30), an aryloxycarbonylamino group (preferably with a carbon number of 7-30). aryloxycarbonylamino group), sulfamoyl group (preferably sulfasulfonyl group with 0-30 carbon atoms), aminocarbamoyl group (preferably carbamidocarboxylate group with 1-30 carbon atoms), Alkylthio group (preferably an alkylthio group having 1 to 30 carbon atoms), arylthio group (preferably an arylthio group having 6 to 30 carbon atoms), and a heteroarylthio group (preferably having 1 to 30 carbon atoms) , alkylsulfonyl group (preferably carbon number 1-30), arylsulfonyl group (preferably carbon number 6-30), heteroarylsulfonyl group (preferably carbon number 1-30), Alkylsulfinyl (preferably having 1 to 30 carbon atoms), arylsulfinyl (preferably having 6 to 30 carbon atoms), and heteroarylsulfinyl (preferably having 1 to 30 carbon atoms) ), urea group (preferably carbon number from 1 to 30), hydroxyl group, carboxyl group, sulfo group, phosphoric acid group, carboxylic acid amine group, sulfonic acid amine group, imidic acid group, mercapto group, halogen atom, cyano group, alkane sulfinic acid group, arylsulfinic acid group, hydrazine group, imino group, heteroaryl group (preferably carbon number 1-30). When these groups are further substitutable groups, they may further have a substituent. As other substituents, the groups described in the above-mentioned substituent T can be exemplified.

金屬偶氮顏料A中,選自由以式(I)表示之偶氮化合物及其互變異構結構的偶氮化合物中之至少1種陰離子和金屬離子形成金屬錯合物為較佳。例如,為2價的金屬離子Me時,能夠由上述陰離子和金屬離子Me形成由下述式(Ia)表示之結構的金屬錯合物。又,金屬離子Me可以經由式(Ia)的互變異構標記中之氮原子鍵結而形成錯合物。 [化學式5]

Figure 02_image011
In the metal azo pigment A, it is preferable that at least one anion selected from the azo compound represented by the formula (I) and the azo compound having a tautomeric structure form a metal complex with a metal ion. For example, in the case of a divalent metal ion Me, a metal complex having a structure represented by the following formula (Ia) can be formed from the above-mentioned anion and the metal ion Me. In addition, the metal ion Me can form a complex by bonding via the nitrogen atom in the tautomeric label of formula (Ia). [Chemical formula 5]
Figure 02_image011

作為金屬偶氮顏料A的較佳態樣,可列舉以下(Az1)~(Az4)的態樣的金屬偶氮顏料,從容易獲得更顯著的本發明的效果且進而能夠進一步提高分光特性這一理由考慮,為(Az1)的態樣金屬偶氮顏料為較佳。As a preferable aspect of the metal azo pigment A, the metal azo pigments of the following aspects (Az1) to (Az4) are exemplified, since it is easy to obtain a more pronounced effect of the present invention and further improve the spectroscopic characteristics. For this reason, the metal azo pigment in the form of (Az1) is preferable.

(Az1)一種態樣的金屬偶氮顏料,其含有上述選自由式(I)表示之偶氮化合物及其互變異構結構的偶氮化合物中之至少1種陰離子、至少含有Zn2+ 及Cu2+ 之金屬離子、三聚氰胺化合物。該態樣中,以金屬偶氮顏料的總金屬離子的1莫耳為基準,合計含有95~100莫耳%的Zn2+ 及Cu2+ 為較佳,含有98~100莫耳%為更佳,含有99.9~100莫耳%為進一步較佳,為100莫耳%為特佳。又,金屬偶氮顏料中的Zn2+ 與Cu2+ 的莫耳比為Zn2+ :Cu2+ =199:1~1:15為較佳,19:1~1:1為更佳,9:1~2:1為進一步較佳。又,該態樣中,金屬偶氮顏料可以進一步含有除Zn2+ 及Cu2+ 以外的二價或三價的金屬離子(以下,亦稱為金屬離子Me1)。作為金屬離子Me1,可列舉Ni2+ 、Al3+ 、Fe2+ 、Fe3+ 、Co2+ 、Co3+ 、La3+ 、Ce3+ 、Pr3+ 、Nd2+ 、Nd3+ 、Sm2+ 、Sm3+ 、Eu2+ 、Eu3+ 、Gd3+ 、Tb3+ 、Dy3+ 、Ho3+ 、Yb2+ 、Yb3+ 、Er3+ 、Tm3+ 、Mg2+ 、Ca2+ 、Sr2+ 、Mn2+ 、Y3+ 、Sc3+ 、Ti2+ 、Ti3+ 、Nb3+ 、Mo2+ 、Mo3+ 、V2+ 、V3+ 、Zr2+ 、Zr3+ 、Cd2+ 、Cr3+ 、Pb2+ 、Ba2+ ,選自Al3+ 、Fe2+ 、Fe3+ 、Co2+ 、Co3+ 、La3+ 、Ce3+ 、Pr3+ 、Nd3+ 、Sm3+ 、Eu3+ 、Gd3+ 、Tb3+ 、Dy3+ 、Ho3+ 、Yb3+ 、Er3+ 、Tm3+ 、Mg2+ 、Ca2+ 、Sr2+ 、Mn2+ 及Y3+ 之至少1種為較佳,選自Al3+ 、Fe2+ 、Fe3+ 、Co2+ 、Co3+ 、La3+ 、Ce3+ 、Pr3+ 、Nd3+ 、Sm3+ 、Tb3+ 、Ho3+ 及Sr2+ 之至少1種為進一步較佳,選自Al3+ 、Fe2+ 、Fe3+ 、Co2+ 及Co3+ 之至少1種為特佳。金屬離子Me1的含量以金屬偶氮顏料的總金屬離子的1莫耳為基準為5莫耳%以下為較佳,2莫耳%以下為更佳,0.1莫耳%以下為進一步較佳。(Az1) A metal azo pigment of one aspect, which contains at least one anion selected from the above-mentioned azo compounds represented by formula (I) and azo compounds having tautomeric structures thereof, at least Zn 2+ and Cu 2+ metal ions, melamine compounds. In this aspect, based on 1 mol of the total metal ions of the metal azo pigment, it is preferable to contain 95-100 mol % of Zn 2+ and Cu 2+ in total, more preferably 98-100 mol % Preferably, it contains 99.9 to 100 mol %, more preferably, 100 mol % is particularly preferred. In addition, the molar ratio of Zn 2+ and Cu 2+ in the metal azo pigment is preferably Zn 2+ :Cu 2+ =199:1~1:15, more preferably 19:1~1:1, 9:1 to 2:1 is more preferable. In addition, in this aspect, the metal azo pigment may further contain divalent or trivalent metal ions (hereinafter, also referred to as metal ions Me1 ) other than Zn 2+ and Cu 2+ . Examples of the metal ion Me1 include Ni 2+ , Al 3+ , Fe 2+ , Fe 3+ , Co 2+ , Co 3+ , La 3+ , Ce 3+ , Pr 3+ , Nd 2+ , Nd 3+ . , Sm 2+ , Sm 3+ , Eu 2+ , Eu 3+ , Gd 3+ , Tb 3+ , Dy 3+ , Ho 3+ , Yb 2+ , Yb 3+ , Er 3+ , Tm 3+ , Mg 2+ , Ca 2+ , Sr 2+ , Mn 2+ , Y 3+ , Sc 3+ , Ti 2+ , Ti 3+ , Nb 3+ , Mo 2+ , Mo 3+ , V 2+ , V 3+ , Zr 2+ , Zr 3+ , Cd 2+ , Cr 3+ , Pb 2+ , Ba 2+ , selected from Al 3+ , Fe 2+ , Fe 3+ , Co 2+ , Co 3+ , La 3+ , Ce 3+ , Pr 3+ , Nd 3+ , Sm 3+ , Eu 3+ , Gd 3+ , Tb 3+ , Dy 3+ , Ho 3+ , Yb 3+ , Er 3+ , Tm 3+ , Mg Preferably, at least one of 2+ , Ca 2+ , Sr 2+ , Mn 2+ and Y 3+ is selected from Al 3+ , Fe 2+ , Fe 3+ , Co 2+ , Co 3+ , La 3 At least one of + , Ce 3+ , Pr 3+ , Nd 3+ , Sm 3+ , Tb 3+ , Ho 3+ and Sr 2+ is further preferred, selected from Al 3+ , Fe 2+ , Fe 3 At least one of + , Co 2+ and Co 3+ is particularly preferred. The content of the metal ion Me1 is preferably 5 mol% or less based on 1 mol of the total metal ions of the metal azo pigment, more preferably 2 mol% or less, and further preferably 0.1 mol% or less.

(Az2)一種態樣的金屬偶氮顏料,其含有上述選自由式(I)表示之偶氮化合物及其互變異構結構的偶氮化合物中之至少1種陰離子、金屬離子及三聚氰胺化合物,金屬離子含有Ni2+ 、Zn2+ 及至少1種其他金屬離子Me2,金屬離子Me2為選自La3+ 、Ce3+ 、Pr3+ 、Nd2+ 、Nd3+ 、Sm2+ 、Sm3+ 、Eu2+ 、Eu3+ 、Gd3+ 、Tb3+ 、Dy3+ 、Ho3+ 、Er3+ 、Tm3+ 、Yb2+ 、Yb3+ 、Mg2+ 、Ca2+ 、Sr2+ 、Ba2+ 、Sc3+ 、Y3+ 、Ti2+ 、Ti3+ 、Zr2+ 、Zr3+ 、V2+ 、V3+ 、Nb3+ 、Cr3+ 、Mo2+ 、Mo3+ 、Mn2+ 、Cd2+ 及Pb2+ 之至少1種。金屬離子Me2為選自La3+ 、Ce3+ 、Pr3+ 、Nd3+ 、Sm3+ 、Eu3+ 、Gd3+ 、Tb3+ 、Dy3+ 、Ho3+ 、Er3+ 、Tm3+ 、Yb3+ 、Mg2+ 、Ca2+ 、Sr2+ 、Y3+ 及Mn2+ 之至少1種為較佳,選自La3+ 、Ce3+ 、Pr3+ 、Nd3+ 、Sm3+ 、Tb3+ 、Ho3+ 及Sr2+ 之至少1種為更佳。該態樣中,以金屬偶氮顏料的總金屬離子的1莫耳為基準,合計含有75~99.5莫耳%的Zn2+ 及Ni2+ 並且含有0.5~25莫耳%的金屬離子Me2為較佳,合計含有78~95莫耳%的Zn2+ 及Ni2+ 並且含有5~22莫耳%的金屬離子Me2為更佳,合計含有82~90莫耳%的Zn2+ 及Ni2+ 並且含有10~18莫耳%的金屬離子Me2為進一步較佳。又,金屬偶氮顏料中的Zn2+ 與Ni2+ 的莫耳比為Zn2+ :Ni2+ =90:3~3:90為較佳,80:5~5:80為更佳,60:33~33:60為進一步較佳。(Az2) A metal azo pigment of one aspect, which contains at least one anion, a metal ion, and a melamine compound selected from the above-mentioned azo compounds represented by the formula (I) and azo compounds having a tautomeric structure thereof, a metal The ion contains Ni 2+ , Zn 2+ and at least one other metal ion Me2, the metal ion Me2 is selected from La 3+ , Ce 3+ , Pr 3+ , Nd 2+ , Nd 3+ , Sm 2+ , Sm 3 + , Eu 2+ , Eu 3+ , Gd 3+ , Tb 3+ , Dy 3+ , Ho 3+ , Er 3+ , Tm 3+ , Yb 2+ , Yb 3+ , Mg 2+ , Ca 2+ , Sr 2+ , Ba 2+ , Sc 3+ , Y 3+ , Ti 2+ , Ti 3+ , Zr 2+ , Zr 3+ , V 2+ , V 3+ , Nb 3+ , Cr 3+ , Mo 2 At least one of + , Mo 3+ , Mn 2+ , Cd 2+ and Pb 2+ . The metal ion Me2 is selected from La 3+ , Ce 3+ , Pr 3+ , Nd 3+ , Sm 3+ , Eu 3+ , Gd 3+ , Tb 3+ , Dy 3+ , Ho 3+ , Er 3+ , Preferably at least one of Tm 3+ , Yb 3+ , Mg 2+ , Ca 2+ , Sr 2+ , Y 3+ and Mn 2+ is selected from La 3+ , Ce 3+ , Pr 3+ , Nd More preferably, at least one of 3+ , Sm 3+ , Tb 3+ , Ho 3+ and Sr 2+ . In this aspect, based on 1 mol of the total metal ions of the metal azo pigment, 75 to 99.5 mol % of Zn 2+ and Ni 2+ are contained in total, and 0.5 to 25 mol % of the metal ion Me2 is contained as Preferably, it contains 78-95 mol% of Zn 2+ and Ni 2+ in total and 5-22 mol% of metal ions Me2 is more preferably, and contains 82-90 mol% of Zn 2+ and Ni 2 in total + and it is more preferable to contain 10-18 mol% of metal ions Me2. In addition, the molar ratio of Zn 2+ and Ni 2+ in the metal azo pigment is preferably Zn 2+ :Ni 2+ =90:3~3:90, more preferably 80:5~5:80, 60:33~33:60 is more preferable.

(Az3)一種態樣的金屬偶氮顏料,其含有上述選自由式(I)表示之偶氮化合物及其互變異構結構的偶氮化合物中之至少1種陰離子、金屬離子及三聚氰胺化合物,金屬離子含有Ni2+ 、Cu2+ 及至少1種其他金屬離子Me3,金屬離子Me3為選自La3+ 、Ce3+ 、Pr3+ 、Nd2+ 、Nd3+ 、Sm2+ 、Sm3+ 、Eu2+ 、Eu3+ 、Gd3+ 、Tb3+ 、Dy3+ 、Ho3+ 、Yb2+ 、Yb3+ 、Er3+ 、Tm3+ 、Mg2+ 、Ca2+ 、Sr2+ 、Mn2+ 、Y3+ 、Sc3+ 、Ti2+ 、Ti3+ 、Nb3+ 、Mo2+ 、Mo3+ 、V2+ 、V3+ 、Zr2+ 、Zr3+ 、Cd2+ 、Cr3+ 、Pb2+ 及Ba2+ 之至少1種。金屬離子Me3為選自La3+ 、Ce3+ 、Pr3+ 、Nd3+ 、Sm3+ 、Eu3+ 、Gd3+ 、Tb3+ 、Dy3+ 、Ho3+ 、Yb3+ 、Er3+ 、Tm3+ 、Mg2+ 、Ca2+ 、Sr2+ 、Mn2+ 及Y3+ 之至少1種為較佳,選自La3+ 、Ce3+ 、Pr3+ 、Nd3+ 、Sm3+ 、Tb3+ 、Ho3+ 及Sr2+ 之至少1種為更佳。該態樣中,以金屬偶氮顏料的總金屬離子的1莫耳為基準,合計含有70~99.5莫耳%的Cu2+ 及Ni2+ 並且含有0.5~30莫耳%的金屬離子Me3為較佳,合計含有75~95莫耳%的Cu2+ 及Ni2+ 並且含有5~25莫耳%的金屬離子Me3為更佳,合計含有80~90莫耳%的Cu2+ 及Ni2+ 並且含有10~20莫耳%的金屬離子Me3為進一步較佳。又,金屬偶氮顏料中的Cu2+ 與Ni2+ 的莫耳比為Cu2+ :Ni2+ =42:1~1:42為較佳,10:1~1:10為更佳,3:1~1:3為進一步較佳。(Az3) A metal azo pigment of one aspect, which contains at least one anion, a metal ion, and a melamine compound selected from the azo compound represented by the formula (I) and the azo compound having a tautomeric structure above, a metal The ions contain Ni 2+ , Cu 2+ and at least one other metal ion Me3, the metal ion Me3 is selected from La 3+ , Ce 3+ , Pr 3+ , Nd 2+ , Nd 3+ , Sm 2+ , Sm 3 + , Eu 2+ , Eu 3+ , Gd 3+ , Tb 3+ , Dy 3+ , Ho 3+ , Yb 2+ , Yb 3+ , Er 3+ , Tm 3+ , Mg 2+ , Ca 2+ , Sr 2+ , Mn 2+ , Y 3+ , Sc 3+ , Ti 2+ , Ti 3+ , Nb 3+ , Mo 2+ , Mo 3+ , V 2+ , V 3+ , Zr 2+ , Zr 3 At least one of + , Cd 2+ , Cr 3+ , Pb 2+ and Ba 2+ . The metal ion Me3 is selected from La 3+ , Ce 3+ , Pr 3+ , Nd 3+ , Sm 3+ , Eu 3+ , Gd 3+ , Tb 3+ , Dy 3+ , Ho 3+ , Yb 3+ , At least one of Er 3+ , Tm 3+ , Mg 2+ , Ca 2+ , Sr 2+ , Mn 2+ and Y 3+ is preferably selected from La 3+ , Ce 3+ , Pr 3+ , Nd More preferably, at least one of 3+ , Sm 3+ , Tb 3+ , Ho 3+ and Sr 2+ . In this aspect, based on 1 mol of the total metal ions of the metal azo pigment, Cu 2+ and Ni 2+ are contained in a total of 70 to 99.5 mol % and 0.5 to 30 mol % of the metal ion Me3 are contained as Preferably, Cu 2+ and Ni 2+ are contained in a total of 75-95 mol %, and metal ions Me3 are contained in a total of 5-25 mol %, and Cu 2+ and Ni 2 are contained in a total of 80-90 mol % . + and it is further preferable to contain 10-20 mol% of metal ions Me3. In addition, the molar ratio of Cu 2+ and Ni 2+ in the metal azo pigment is preferably Cu 2+ :Ni 2+ =42:1~1:42, more preferably 10:1~1:10, 3:1 to 1:3 is more preferable.

(Az4)一種態樣的金屬偶氮顏料,其含有上述選自由式(I)表示之偶氮化合物及其互變異構結構的偶氮化合物中之至少1種陰離子、金屬離子及三聚氰胺化合物,金屬離子含有Ni2+ 和金屬離子Me4a,金屬離子Me4a為選自La3+ 、Ce3+ 、Pr3+ 、Nd2+ 、Nd3+ 、Sm2+ 、Sm3+ 、Eu2+ 、Eu3+ 、Gd3+ 、Tb3+ 、Dy3+ 、Ho3+ 、Er3+ 、Tm3+ 、Yb2+ 及Yb3+ 之至少1種。金屬離子Me4a為選自La3+ 、Ce3+ 、Pr3+ 、Nd3+ 、Sm3+ 、Eu3+ 、Gd3+ 、Tb3+ 、Dy3+ 、Ho3+ 、Er3+ 、Tm3+ 及Yb3+ 之至少1種為較佳,為選自La3+ 、Ce3+ 、Pr3+ 、Nd3+ 、Sm3+ 、Tb3+ 及Ho3+ 之至少1種為更佳。該態樣中,以金屬偶氮顏料的總金屬離子的1莫耳為基準,合計含有95~100莫耳%的Ni2+ 及金屬離子Me4a為較佳,含有98~100莫耳%為更佳,含有99.9~100莫耳%為進一步較佳,100莫耳%為特佳。又,金屬偶氮顏料中的Ni2+ 與金屬離子Me4a的莫耳比為Ni2+ :金屬離子Me4a=1:1~19:1為較佳,2:1~4:1為更佳,2.3:1~3:1為進一步較佳。又,該態樣中,金屬偶氮顏料可以進一步含有Ni2+ 及金屬離子Me4a以外的金屬離子(以下,亦稱為金屬離子Me4b)。作為金屬離子Me4b,可列舉Mg2+ 、Ca2+ 、Sr2+ 、Ba2+ 、Sc3+ 、Y3+ 、Ti2+ 、Ti3+ 、Zr2+ 、Zr3+ 、V2+ 、V3+ 、Nb3+ 、Cr3+ 、Mo2+ 、Mo3+ 、Mn2+ 、Fe2+ 、Fe3+ 、Co2+ 、Co3+ 、Cu2+ 、Zn2+ 、Cd2+ 、Al3+ 及Pb2+ ,選自Mg2+ 、Ca2+ 、Sr2+ 、Y3+ 、Mn2+ 、Fe2+ 、Fe3+ 、Co2+ 、Co3+ 、Cu2+ 、Zn2+ 及Al3+ 之至少1種為較佳,選自Sr2+ 、Fe2+ 、Fe3+ 、Co2+ 、Co3+ 、Cu2+ 、Zn2+ 及Al3+ 之至少1種為更佳。又,金屬離子Me4b的含量以金屬偶氮顏料的總金屬離子的1莫耳為基準為5莫耳%以下為較佳,2莫耳%以下為更佳,0.1莫耳%以下為進一步較佳。(Az4) A metal azo pigment of one aspect, which contains at least one anion, a metal ion and a melamine compound selected from the above-mentioned azo compounds represented by the formula (I) and azo compounds having a tautomeric structure thereof, a metal The ion contains Ni 2+ and metal ion Me4a, the metal ion Me4a is selected from La 3+ , Ce 3+ , Pr 3+ , Nd 2+ , Nd 3+ , Sm 2+ , Sm 3+ , Eu 2+ , Eu 3 At least one of + , Gd 3+ , Tb 3+ , Dy 3+ , Ho 3+ , Er 3+ , Tm 3+ , Yb 2+ and Yb 3+ . The metal ion Me4a is selected from La 3+ , Ce 3+ , Pr 3+ , Nd 3+ , Sm 3+ , Eu 3+ , Gd 3+ , Tb 3+ , Dy 3+ , Ho 3+ , Er 3+ , At least one of Tm 3+ and Yb 3+ is preferably at least one selected from La 3+ , Ce 3+ , Pr 3+ , Nd 3+ , Sm 3+ , Tb 3+ and Ho 3+ . better. In this aspect, based on 1 mol of the total metal ions of the metal azo pigment, it is preferable to contain 95-100 mol % of Ni 2+ and metal ion Me4a in total, more preferably 98-100 mol % Preferably, it contains 99.9 to 100 mol %, which is further preferred, and 100 mol % is particularly preferred. In addition, the molar ratio of Ni 2+ and metal ion Me4a in the metal azo pigment is preferably Ni 2+ : metal ion Me4a=1:1~19:1, more preferably 2:1~4:1, 2.3:1~3:1 is more preferable. In addition, in this aspect, the metal azo pigment may further contain metal ions other than Ni 2+ and metal ions Me4a (hereinafter, also referred to as metal ions Me4b). Examples of the metal ion Me4b include Mg 2+ , Ca 2+ , Sr 2+ , Ba 2+ , Sc 3+ , Y 3+ , Ti 2+ , Ti 3+ , Zr 2+ , Zr 3+ , V 2+ , V 3+ , Nb 3+ , Cr 3+ , Mo 2+ , Mo 3+ , Mn 2+ , Fe 2+ , Fe 3+ , Co 2+ , Co 3+ , Cu 2+ , Zn 2+ , Cd 2+ , Al 3+ and Pb 2+ , selected from Mg 2+ , Ca 2+ , Sr 2+ , Y 3+ , Mn 2+ , Fe 2+ , Fe 3+ , Co 2+ , Co 3+ , Cu At least one of 2+ , Zn 2+ and Al 3+ is preferably selected from Sr 2+ , Fe 2+ , Fe 3+ , Co 2+ , Co 3+ , Cu 2+ , Zn 2+ and Al 3 At least one of + is better. In addition, the content of the metal ion Me4b is preferably 5 mol% or less based on 1 mol of the total metal ions of the metal azo pigment, more preferably 2 mol% or less, and further preferably 0.1 mol% or less. .

金屬偶氮顏料A由金屬偶氮化合物及三聚氰胺化合物(較佳為由上述式(II)表示之化合物)形成加成物為較佳,其中該金屬偶氮化合物由上述選自由式(I)表示之偶氮化合物及其互變異構結構的偶氮化合物中之至少1種陰離子及金屬離子構成。可將加成物理解為是分子集合體。該等分子間的鍵結例如可以基於分子間相互作用,亦可以基於路易斯酸-鹼性相互作用,還可以基於配位鍵結或鏈鍵結。又,加成物可以為如客體分子嵌入構成主體分子之晶格之晶龍化合物(籠合物)那樣的結構。又,加成物可以為如複合層間結晶(包括晶格間化合物)那樣的結構。複合層間結晶係指由至少2個要素構成之化學性的非化學計量的結晶化合物。又,加成物可以為如由2個物質形成共同結晶且在第二成分的原子位於第一成分的規則性晶格的位置的混合取代結晶。The metal azo pigment A is preferably an adduct formed of a metal azo compound and a melamine compound (preferably a compound represented by the above formula (II)), wherein the metal azo compound is represented by the above-mentioned formula (I) It consists of at least one anion and a metal ion in the azo compound and its tautomeric azo compound. Adducts can be understood as molecular aggregates. Such intermolecular bonds may be based on, for example, intermolecular interactions, Lewis acid-base interactions, or coordinative bonds or chain bonds. In addition, the adduct may have a structure such as a crystal dragon compound (clathrate) in which a guest molecule is inserted into a crystal lattice constituting a host molecule. In addition, the adduct may have a structure such as a composite interlayer crystal (including an interlattice compound). The composite interlayer crystal refers to a chemically non-stoichiometric crystalline compound composed of at least two elements. In addition, the adduct may be, for example, a mixed substituted crystal in which a common crystal is formed from two substances and the atoms of the second component are located in the regular lattice of the first component.

在本發明中使用之金屬偶氮顏料可以是物理性混合物,亦可以是化學性複合化合物。較佳為物理性混合物。The metallic azo pigments used in the present invention may be physical mixtures or chemical composite compounds. A physical mixture is preferred.

作為上述(Az1)的態樣的金屬偶氮顏料的情況下之物理性混合物的較佳例,可列舉以下(Az1-1)、(Az1-2)。又,(Az1)的態樣的金屬偶氮顏料為化學性複合化合物時,Zn2+ 、Cu2+ 以及任意的其他金屬離子Me1嵌入共用的結晶晶格為較佳。 (Az1-1)由上述陰離子和Zn2+ 構成之金屬偶氮化合物與三聚氰胺化合物的加成物1a、由上述陰離子和Cu2+ 構成之金屬偶氮化合物與三聚氰胺化合物的加成物1b的物理性混合物。 (Az1-2)在(Az1-1)的物理性混合物中還含有由上述陰離子和金屬離子Me1構成之金屬偶氮化合物與三聚氰胺化合物的加成物1c之物理性混合物。The following (Az1-1) and (Az1-2) are mentioned as a preferable example of the physical mixture in the case of the metal azo pigment of the aspect of said (Az1). Moreover, when the metal azo pigment of the aspect of (Az1) is a chemical composite compound, it is preferable that Zn 2+ , Cu 2+ , and any other metal ion Me1 are embedded in a common crystal lattice. ( Az1-1 ) Physical Properties Sexual mixture. (Az1-2) The physical mixture of (Az1-1) further contains a physical mixture of an adduct 1c of a metal azo compound and a melamine compound composed of the above-mentioned anion and a metal ion Me1.

作為上述(Az2)的態樣的金屬偶氮顏料的情況下之物理性混合物的較佳例,可列舉以下(Az2-1)。又,(Az2)的態樣的金屬偶氮顏料為化學性複合化合物時,Ni2+ 、Zn2+ 及金屬離子Me2嵌入共用的結晶晶格為較佳。 (Az2-1)含有由上述陰離子和Ni2+ 構成之金屬偶氮化合物與三聚氰胺化合物的加成物2a、由上述陰離子和Zn2+ 構成之金屬偶氮化合物與三聚氰胺化合物的加成物2b、由上述陰離子和金屬離子Me2構成之金屬偶氮化合物與三聚氰胺化合物的加成物2c之物理性混合物。The following (Az2-1) is mentioned as a preferable example of the physical mixture in the case of the metal azo pigment of the aspect of said (Az2). Moreover, when the metal azo pigment of the aspect of (Az2) is a chemical composite compound, it is preferable that Ni 2+ , Zn 2+ and the metal ion Me 2 are embedded in a common crystal lattice. (Az2-1) contains the adduct 2a of a metal azo compound composed of the above anion and Ni 2+ and a melamine compound, an adduct 2b of a metal azo compound composed of the above anion and Zn 2+ and a melamine compound, A physical mixture of the adduct 2c of a metal azo compound and a melamine compound composed of the above-mentioned anion and metal ion Me2.

作為上述(Az3)的態樣的金屬偶氮顏料的情況下之物理性混合物的較佳例,可列舉以下(Az3-1)。又,(Az3)的態樣的金屬偶氮顏料為化學性複合化合物時,Ni2+ 、Cu2+ 及金屬離子Me3嵌入於共用的結晶晶格為較佳。 (Az3-1)含有由上述陰離子和Ni2+ 構成之金屬偶氮化合物與三聚氰胺化合物的加成物3a、由上述陰離子和Cu2+ 構成之金屬偶氮化合物與三聚氰胺化合物的加成物3b、由上述陰離子和金屬離子Me3構成之金屬偶氮化合物與三聚氰胺化合物的加成物3c之物理性混合物。The following (Az3-1) is mentioned as a preferable example of the physical mixture in the case of the metal azo pigment of the aspect of said (Az3). Moreover, when the metal azo pigment of the aspect of (Az3) is a chemical composite compound, it is preferable that Ni 2+ , Cu 2+ and metal ion Me3 are embedded in a common crystal lattice. (Az3-1) Adduct 3a comprising a metal azo compound composed of the above anion and Ni 2+ and a melamine compound, an adduct 3b of a metal azo compound composed of the above anion and Cu 2+ and a melamine compound, The physical mixture of the adduct 3c of the metal azo compound and the melamine compound composed of the above-mentioned anion and the metal ion Me3.

作為上述(Az4)的態樣的金屬偶氮顏料的情況下之物理性混合物的較佳例,可列舉以下(Az4-1)、(Az4-2)。又,(Az4)的態樣的金屬偶氮顏料為化學性複合化合物時,Ni2+ 、金屬離子Me4a以及任意的其他金屬離子Me4b嵌入於共用的結晶晶格為較佳。 (Az4-1)由上述陰離子和Ni2+ 構成之金屬偶氮化合物與三聚氰胺化合物的加成物4a、由上述陰離子和金屬離子Me4a構成之金屬偶氮化合物與三聚氰胺化合物的加成物4b的物理性混合物。 (Az4-2)在(Az4-1)的物理性混合物中還含有由上述陰離子和金屬離子Me4b構成之金屬偶氮化合物與三聚氰胺化合物的加成物4c之物理性混合物。The following (Az4-1) and (Az4-2) are mentioned as a preferable example of the physical mixture in the case of the metal azo pigment of the aspect of the said (Az4). Moreover, when the metal azo pigment of the aspect of (Az4) is a chemical composite compound, it is preferable that Ni 2+ , the metal ion Me4a, and any other metal ion Me4b are embedded in a common crystal lattice. ( Az4-1 ) Physical Properties Sexual mixture. (Az4-2) The physical mixture of (Az4-1) further contains a physical mixture of an adduct 4c of a metal azo compound and a melamine compound composed of the above-mentioned anion and a metal ion Me4b.

上述(Az1)的態樣的金屬偶氮顏料能夠藉由在存在三聚氰胺化合物(較佳為由式(II)表示之化合物)的條件下,使式(III)或其互變異構體的化合物與鋅鹽及銅鹽以及任一種進一步與上述金屬離子Me1的鹽進行反應來製造。鋅鹽的使用量相對於式(III)或其互變異構體的化合物的1莫耳為0.05~0.995莫耳為較佳,0.05~0.5莫耳為更佳,0.1~0.3莫耳為進一步較佳。又,銅鹽的使用量相對於式(III)或其互變異構體的化合物的1莫耳為0.005~0.95莫耳為較佳,0.49~0.95莫耳為更佳,0.7~0.9莫耳為進一步較佳。又,金屬離子Me1的鹽的使用量相對於式(III)或其互變異構體的化合物的1莫耳為0.05莫耳以下為較佳,0.01莫耳以下為更佳。又,相對於式(III)的化合物1莫耳,鋅鹽、銅鹽及金屬離子Me1的鹽的合計量為1莫耳為較佳。又,三聚氰胺化合物的使用量相對於式(III)或其互變異構體的化合物的1莫耳為0.05~4莫耳為較佳,0.5~2.5莫耳為更佳,1.0~2.0莫耳為進一步較佳。The metal azo pigment of the aspect of the above (Az1) can be obtained by mixing the compound of the formula (III) or its tautomer with the compound of the formula (III) or a tautomer thereof in the presence of a melamine compound (preferably a compound represented by the formula (II)). A zinc salt, a copper salt, and any one of the salts of the above-mentioned metal ion Me1 are further reacted and produced. The amount of zinc salt used is preferably 0.05-0.995 mol, preferably 0.05-0.5 mol, and more preferably 0.1-0.3 mol, relative to 1 mol of the compound of formula (III) or its tautomer. good. In addition, the amount of the copper salt used is preferably 0.005 to 0.95 mol, more preferably 0.49 to 0.95 mol, and 0.7 to 0.9 mol per 1 mol of the compound of formula (III) or its tautomer. Further preferred. Further, the amount of the salt of the metal ion Me1 to be used is preferably 0.05 mol or less, more preferably 0.01 mol or less, relative to 1 mol of the compound of formula (III) or its tautomer. In addition, the total amount of the zinc salt, the copper salt, and the salt of the metal ion Me1 is preferably 1 mol relative to 1 mol of the compound of the formula (III). In addition, the amount of the melamine compound used is preferably 0.05 to 4 mol, more preferably 0.5 to 2.5 mol, and 1.0 to 2.0 mol per 1 mol of the compound of formula (III) or its tautomer. Further preferred.

[化學式6]

Figure 02_image013
[Chemical formula 6]
Figure 02_image013

式中,X1 及X2 分別獨立,為氫原子或鹼金屬離子,X1 及X2 中的至少一個為鹼金屬離子。R1 及R2 分別獨立,為OH或NR5 R6 。R3 及R4 分別獨立,為=O或=NR7 ,R5 ~R7 分別獨立,為氫原子或烷基。R1 ~R7 與式(I)的R1 ~R7 含義相同,較佳範圍亦相同。作為X1 及X2 所表示之鹼金屬離子,Na+ 及K+ 為較佳。In the formula, X 1 and X 2 are independently hydrogen atoms or alkali metal ions, and at least one of X 1 and X 2 is an alkali metal ion. R 1 and R 2 are each independently, and are OH or NR 5 R 6 . R 3 and R 4 are each independently and are =O or =NR 7 , and R 5 to R 7 are each independently a hydrogen atom or an alkyl group. R 1 to R 7 have the same meanings as R 1 to R 7 in formula (I), and the preferred ranges are also the same. As the alkali metal ions represented by X 1 and X 2 , Na + and K + are preferred.

又,上述(Az1)的態樣的金屬偶氮顏料能夠藉由混合上述加成物1a、加成物1b、加成物1c來製造。Moreover, the metal azo pigment of the aspect of the said (Az1) can be manufactured by mixing the said adduct 1a, the adduct 1b, and the adduct 1c.

上述(Az2)的態樣的金屬偶氮顏料、(Az3)的態樣的金屬偶氮顏料及(Az4)的態樣的金屬偶氮顏料亦能夠以與上述方法等相同的方法來製造。The metal azo pigment of the aspect of (Az2), the metal azo pigment of the aspect of (Az3), and the metal azo pigment of the aspect of (Az4) can also be produced by the same method as the method described above.

關於上述金屬偶氮顏料,能夠參閱日本特開2017-171912號公報的段落號0011~0062、0137~0276、日本特開2017-171913號公報的段落號0010~0062、0138~0295、日本特開2017-171914號公報的段落號0011~0062、0139~0190、日本特開2017-171915號公報的段落號0010~0065、0142~0222中的記載,且該等內容被併入本說明書中。Regarding the above-mentioned metal azo pigments, reference can be made to paragraph numbers 0011 to 0062 and 0137 to 0276 of JP 2017-171912 A, paragraph numbers 0010 to 0062, 0138 to 0295 of JP 2017-171913 A, and JP 2017-171913 A. The descriptions in paragraph numbers 0011 to 0062 and 0139 to 0190 of JP 2017-171914 A, and paragraphs 0010 to 0065 and 0142 to 0222 of JP 2017-171915 A, and these contents are incorporated into the present specification.

本發明的組成物中,金屬偶氮顏料A的含量在本發明的組成物的總固體成分中為1~50質量%為較佳。下限為2質量%以上為較佳,3質量%以上為更佳。上限為45質量%以下為較佳,40質量%以下為更佳。本發明的組成物含有2種以上的金屬偶氮顏料A時,該等的合計量為上述範圍為較佳。In the composition of the present invention, the content of the metal azo pigment A is preferably 1 to 50% by mass in the total solid content of the composition of the present invention. The lower limit is preferably 2 mass % or more, and more preferably 3 mass % or more. The upper limit is preferably 45 mass % or less, more preferably 40 mass % or less. When the composition of the present invention contains two or more metal azo pigments A, it is preferable that the total amount of these is within the above-mentioned range.

<<其他色料>> 本發明的組成物含有上述金屬偶氮顏料A以外的色料,該色料為在波長400~700nm的範圍具有吸收極大之色料(以下,亦稱為其他色料)。作為其他色料,可列舉彩色著色劑、黑色著色劑等。作為被用作其他色料之彩色著色劑,只要是上述金屬偶氮顏料A以外的色料,則並無特別限定,可列舉紅色著色劑、綠色著色劑、藍色著色劑、黃色著色劑、紫色著色劑、橙色著色劑等。本發明的組成物含有2種以上其他色料為較佳。依該態樣,能夠使金屬偶氮顏料A進一步變得穩定,從而能夠更有效地抑制高溫高濕環境下的異物缺陷的產生。又,本發明的組成物含有2種以上其他色料時,含有2種以上的不同色調的色料為較佳。<<Other coloring materials>> The composition of the present invention contains a coloring material other than the above-mentioned metal azo pigment A, and the coloring material is a coloring material having a maximum absorption in the wavelength range of 400 to 700 nm (hereinafter, also referred to as other coloring materials. ). As other colorants, chromatic colorants, black colorants, etc. are mentioned. The colorant used as another colorant is not particularly limited as long as it is a colorant other than the above-mentioned metal azo pigment A, and examples thereof include red colorants, green colorants, blue colorants, yellow colorants, Purple colorant, orange colorant, etc. The composition of the present invention preferably contains two or more other colorants. According to this aspect, the metal azo pigment A can be further stabilized, and the occurrence of foreign matter defects in a high-temperature and high-humidity environment can be suppressed more effectively. Moreover, when the composition of this invention contains 2 or more types of other color materials, it is preferable to contain 2 or more types of color materials of different hues.

本發明的組成物作為其他色料含有選自藍色著色劑及紫色著色劑之至少1種為較佳。該等色調的色料在可見光的波長區域的波長長的一側具有吸收極大,因此具有比較廣的共軛系。因此,該等色料容易與金屬偶氮顏料A相互作用,能夠使金屬偶氮顏料A進一步變得穩定從而能夠更有效地抑制高溫高濕環境下的異物缺陷的產生。此外,容易獲得具有波長400~600nm的範圍內之吸光度的最小值A與波長1000~1300nm的範圍內之吸光度的最大值B之比A/B為4.5以上的分光特性之組成物。作為藍色著色劑,可列舉三芳基甲烷化合物、酞菁化合物等,從容易獲得更顯著的本發明的效果這一理由考慮,酞菁化合物為較佳。作為紫色著色劑,可列舉 口山口星(xanthene)化合物、三芳基甲烷化合物、蒽醌化合物、噁嗪化合物、喹吖酮化合物、苯并咪唑酮化合物等,從容易獲得更顯著的本發明的效果這一理由考慮噁嗪化合物為較佳。It is preferable that the composition of this invention contains at least 1 sort(s) chosen from a blue coloring agent and a purple coloring agent as another coloring material. The colorant of these hues has an absorption maximum on the longer wavelength side of the visible light wavelength region, and therefore has a relatively wide conjugated system. Therefore, these colorants easily interact with the metal azo pigment A, and the metal azo pigment A can be further stabilized to more effectively suppress the occurrence of foreign matter defects in a high-temperature and high-humidity environment. In addition, it is easy to obtain a composition having a spectral characteristic in which the ratio A/B of the minimum value A of the absorbance in the wavelength range of 400 to 600 nm to the maximum value B of the absorbance in the wavelength range of 1000 to 1300 nm is 4.5 or more. As a blue colorant, a triarylmethane compound, a phthalocyanine compound, etc. are mentioned, and a phthalocyanine compound is preferable because it is easy to acquire the effect of this invention more prominently. Examples of the purple colorant include xanthene compounds, triarylmethane compounds, anthraquinone compounds, oxazine compounds, quinacridone compounds, benzimidazolone compounds, and the like, from which the effect of the present invention is more pronounced easily. For this reason, an oxazine compound is considered to be preferable.

本發明的組成物作為其他色料含有選自藍色著色劑及紫色著色劑之至少1種時,其他色料的總量中之藍色著色劑的含量為5質量%以上為較佳,10質量%以上為更佳,20質量%以上為進一步較佳。上限並無特別限定。能夠設為100質量%,亦能夠設為90質量%以下,亦能夠設為80質量%以下。又,其他色料的總量中之紫色著色劑的含量為1質量%以上為較佳,5質量%以上為更佳,10質量%以上為進一步較佳。上限並無特別限定。能夠設為100質量%,亦能夠設為90質量%以下,亦能夠設為80質量%以下。又,其他色料的總量中之藍色著色劑與紫色著色劑的合計含量為10質量%以上為較佳,20質量%以上為更佳,30質量%以上為進一步較佳。上限並無特別限定。能夠設為100質量%,亦能夠設為90質量%以下,亦能夠設為80質量%以下。When the composition of the present invention contains at least one selected from a blue colorant and a purple colorant as other colorants, the content of the blue colorant in the total amount of the other colorants is preferably 5% by mass or more, 10% by mass or more. It is more preferable that it is more than 20 mass %, and it is more preferable that it is more than 20 mass %. The upper limit is not particularly limited. It can be 100 mass %, 90 mass % or less, and 80 mass % or less. In addition, the content of the purple colorant in the total amount of other colorants is preferably 1% by mass or more, more preferably 5% by mass or more, and even more preferably 10% by mass or more. The upper limit is not particularly limited. It can be 100 mass %, 90 mass % or less, and 80 mass % or less. Moreover, the total content of the blue colorant and the purple colorant in the total amount of other colorants is preferably 10% by mass or more, more preferably 20% by mass or more, and even more preferably 30% by mass or more. The upper limit is not particularly limited. It can be 100 mass %, 90 mass % or less, and 80 mass % or less.

(彩色著色劑) 用作其他色料之彩色著色劑可以是顏料,亦可以是染料,顏料為較佳。作為顏料,可列舉有機顏料及無機顏料,有機顏料為較佳。作為有機顏料可列舉以下者。(Colorful Colorant) The colorant used for other colorants can be either pigments or dyes, and pigments are preferred. Examples of the pigment include organic pigments and inorganic pigments, and organic pigments are preferred. The following are mentioned as an organic pigment.

比色指數(C.I.)PigMent Yellow 1,2,3,4,5,6,10,11,12,13,14,15,16,17,18,20,24,31,32,34,35,35:1,36,36:1,37,37:1,40,42,43,53,55,60,61,62,63,65,73,74,77,81,83,86,93,94,95,97,98,100,101,104,106,108,109,110,113,114,115,116,117,118,119,120,123,125,126,127,128,129,137,138,139,147,148,150,151,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173,174,175,176,177,179,180,181,182,185,187,188,193,194,199,213,214等(以上為黃色顏料)、 C.I.PigMent Orange 2,5,13,16,17:1,31,34,36,38,43,46,48,49,51,52,55,59,60,61,62,64,71,73等(以上為橙色顏料)、 C.I.PigMent Red 1,2,3,4,5,6,7,9,10,14,17,22,23,31,38,41,48:1,48:2,48:3,48:4,49,49:1,49:2,52:1,52:2,53:1,57:1,60:1,63:1,66,67,81:1,81:2,81:3,83,88,90,105,112,119,122,123,144,146,149,150,155,166,168,169,170,171,172,175,176,177,178,179,184,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,270,272,279等(以上為紅色顏料)、 C.I.PigMent Green 7,10,36,37,58,59等(以上為綠色顏料)、 C.I.PigMent Violet 1,19,23,27,32,37,42等(以上為紫色顏料)、 C.I.PigMent Blue 1,2,15,15:1,15:2,15:3,15:4,15:6,16,22,60,64,66,79,80等(以上為藍色顏料)、Color Index (C.I.) PigMent Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, etc. (the above are yellow pigments), C.I.PigMent Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, etc. (the above are orange pigments), C.I.PigMent Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3, 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 270, 272, 279, etc. (the above are red pigments), C.I.PigMent Green 7, 10, 36, 37, 58, 59, etc. (the above are green pigments), C.I.PigMent Violet 1, 19, 23, 27, 32, 37, 42, etc. (the above are purple pigments), C.I.PigMent Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6 , 16, 22, 60, 64, 66, 79, 80, etc. (the above are blue pigments),

又,作為紅色顏料,亦能夠使用具有對芳香族環導入鍵結有氧原子、硫原子或氮原子之基團而成之芳香族環基與二酮吡咯并吡咯骨架鍵結之結構之化合物。作為該種化合物,由式(DPP1)表示之化合物為較佳,由式(DPP2)表示之化合物為更佳。 [化學式7]

Figure 02_image015
Moreover, as a red pigment, the compound which has the structure which the aromatic ring group which introduce|transduced the group which couple|bonded with an oxygen atom, a sulfur atom, or a nitrogen atom, and a diketopyrrolopyrrole skeleton can also be used. As such a compound, the compound represented by the formula (DPP1) is preferable, and the compound represented by the formula (DPP2) is more preferable. [Chemical formula 7]
Figure 02_image015

上述式中,R11 及R13 分別獨立地表示取代基,R12 及R14 分別獨立地表示氫原子、烷基、芳基或雜芳基,n11及n13分別獨立地表示0~4的整數,X12 及X14 分別獨立地表示氧原子、硫原子或氮原子,X12 為氧原子或硫原子時,m12表示1,X12 為氮原子時,m12表示2,X14 為氧原子或硫原子時,m14表示1,X14 為氮原子時,m14表示2。作為R11 及R13 所表示之取代基,可列舉在上述取代基T中列舉之基團,作為較佳具體例可列舉烷基、芳基、鹵原子、醯基、烷氧羰基、芳氧羰基、雜芳氧羰基、胺基、氰基、硝基、三氟甲基、亞碸基、磺基等。In the above formula, R 11 and R 13 each independently represent a substituent, R 12 and R 14 each independently represent a hydrogen atom, an alkyl group, an aryl group or a heteroaryl group, and n11 and n13 each independently represent an integer of 0 to 4 , X 12 and X 14 respectively independently represent an oxygen atom, a sulfur atom or a nitrogen atom, when X 12 is an oxygen atom or a sulfur atom, m12 represents 1, when X 12 is a nitrogen atom, m12 represents 2, and X 14 is an oxygen atom or When a sulfur atom is used, m14 represents 1, and when X 14 is a nitrogen atom, m14 represents 2. Examples of the substituents represented by R 11 and R 13 include those listed for the aforementioned substituent T, and preferred specific examples include an alkyl group, an aryl group, a halogen atom, an acyl group, an alkoxycarbonyl group, and an aryloxy group. Carbonyl, heteroaryloxycarbonyl, amine, cyano, nitro, trifluoromethyl, arylene, sulfo, etc.

作為染料並無特別限制,能夠使用公知的染料。例如能夠使用吡唑偶氮系、苯胺基偶氮系、三芳基甲烷系、蒽醌系、蒽吡啶酮、苯亞甲基系、氧雜菁(oxonol)系、吡唑并三唑偶氮系、吡啶酮偶氮系、花菁系、吩噻嗪系、吡咯并吡唑次甲基偶氮、 口山口星系、酞菁系、苯并哌喃系、靛藍系、吡咯亞甲基(Pyrromethene)系等的染料。The dye is not particularly limited, and known dyes can be used. For example, pyrazole azo series, anilino azo series, triarylmethane series, anthraquinone series, anthrapyridone series, benzylidene series, oxonol series, pyrazolotriazole series can be used , pyridone azo series, cyanine series, phenothiazine series, pyrrolopyrazole methine azo, mouth Yamaguchi galaxy, phthalocyanine series, benzopyran series, indigo series, pyrrolomethylene (Pyrromethene) dyes, etc.

又,作為其他著色劑亦能夠使用色素多聚體。色素多聚體為溶解於溶劑中來使用之染料為較佳,色素多聚體可以形成粒子,色素多聚體為粒子時,通常以分散於溶劑中之狀態使用。粒子狀態的色素多聚體例如能夠藉由乳化聚合而獲得,作為具體例可列舉日本特開2015-214682號公報中記載之化合物及製造方法。作為色素多聚體,還能夠使用日本特開2011-213925號公報、日本特開2013-041097號公報、日本特開2015-028144號公報、日本特開2015-030742號公報等中記載之化合物。Moreover, a dye multimer can also be used as another coloring agent. The dye multimer is preferably a dye that is dissolved in a solvent. The dye multimer can form particles. When the dye multimer is in the form of particles, it is usually used in a state of being dispersed in a solvent. The dye multimer in the particle state can be obtained, for example, by emulsion polymerization, and specific examples thereof include the compounds and production methods described in JP-A No. 2015-214682. As the dye multimer, compounds described in JP 2011-213925 A, JP 2013-041097 A, JP 2015-028144 A, JP 2015-030742 A, and the like can also be used.

(黑色著色劑) 作為用作其他色料之黑色著色劑,可列舉雙苯并呋喃酮化合物、甲亞胺化合物、苝化合物、偶氮化合物等有機黑色著色劑。黑色著色劑為雙苯并呋喃酮化合物、苝化合物為較佳。可列舉日本特表2010-534726號公報、日本特表2012-515233號公報、日本特表2012-515234號公報等中所記載之化合物,例如能夠作為BASF公司製的“Irgaphor Black”而獲得。作為苝化合物,可列舉C.I.Pigment Black 31、32等。作為甲亞胺化合物,可列舉日本特開平1-170601號公報、日本特開平2-034664號公報等中記載的化合物,例如能夠作為Dainichiseika Color & Chemicals Mfg.Co.,Ltd.製的“CHROMOFINEBLACK A1103”而獲得。雙苯并呋喃酮化合物為由下述式表示之化合物及該等的混合物為較佳。 [化學式8]

Figure 02_image017
(Black Colorant) Examples of the black colorant used as other colorants include organic black colorants such as bisbenzofuranone compounds, methaneimine compounds, perylene compounds, and azo compounds. The black colorant is preferably a bisbenzofuranone compound or a perylene compound. Examples of compounds described in JP 2010-534726 A, JP 2012-515233 A, JP 2012-515234 A, etc. can be obtained as "Irgaphor Black" manufactured by BASF Corporation, for example. As a perylene compound, CI Pigment Black 31, 32, etc. are mentioned. Examples of the methimine compound include compounds described in JP-A-1-170601, JP-A-2-034664, etc. For example, "CHROMOFINEBLACK A1103" manufactured by Dainichiseika Color & Chemicals Mfg. Co., Ltd. can be used. " and obtained. The bisbenzofuranone compound is preferably a compound represented by the following formula and a mixture thereof. [Chemical formula 8]
Figure 02_image017

式中,R1 及R2 分別獨立地表示氫原子或取代基,R3 及R4 分別獨立地表示取代基,a及b分別獨立地表示0~4的整數,a為2以上時,複數個R3 可以相同,亦可以不同,複數個R3 亦可以經鍵結而形成環,b為2以上時,複數個R4 可以相同,亦可以不同,複數個R4 亦可以經鍵結而形成環。R1 ~R4 所表示之取代基表示鹵原子、氰基、硝基、烷基、鏈烯基、炔基、芳烷基、芳基、雜芳基、-OR301 、-COR302 、-COOR303 、-OCOR304 、-NR305 R306 、-NHCOR307 、-CONR308 R309 、-NHCONR310 R311 、-NHCOOR312 、-SR313 、-SO2 R314 、-SO2 OR315 、-NHSO2 R316 或-SO2 NR317 R318 ,R301 ~R318 分別獨立地表示氫原子、烷基、鏈烯基、炔基、芳基或雜芳基。雙苯并呋喃酮化合物的詳細內容能夠參閱日本特表2010-534726號公報的段落號0014~0037中的記載,該內容被併入本說明書中。In the formula, R 1 and R 2 each independently represent a hydrogen atom or a substituent, R 3 and R 4 each independently represent a substituent, a and b each independently represent an integer of 0 to 4, and when a is 2 or more, a plural number R 3 may be the same or different, and a plurality of R 3 may be bonded to form a ring. When b is 2 or more, a plurality of R 4 may be the same or different, and a plurality of R 4 may also be bonded to form a ring. form a ring. The substituents represented by R 1 to R 4 represent halogen atoms, cyano groups, nitro groups, alkyl groups, alkenyl groups, alkynyl groups, aralkyl groups, aryl groups, heteroaryl groups, -OR 301 , -COR 302 , - COOR 303 , -OCOR 304 , -NR 305 R 306 , -NHCOR 307 , -CONR 308 R 309 , -NHCONR 310 R 311 , -NHCOOR 312 , -SR 313 , -SO 2 R 314 , -SO 2 OR 315 , - NHSO 2 R 316 or -SO 2 NR 317 R 318 , and R 301 to R 318 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heteroaryl group. Details of the bisbenzofuranone compound can be referred to the descriptions in paragraphs 0014 to 0037 of JP 2010-534726 A, which are incorporated in the present specification.

本發明的組成物中,組合金屬偶氮顏料A與其他色料來形成黑色為較佳。作為金屬偶氮顏料A與其他色料的較佳組合,可列舉以下(C1)~(C6)。為以下(C1)的組合時,容易獲得上述(1)的分光特性的組成物。為以下(C2)~(C6)的組合時,容易獲得上述(2)的分光特性的組成物。In the composition of the present invention, it is preferable to combine the metallic azo pigment A and other colorants to form black color. The following (C1)-(C6) are mentioned as a preferable combination of the metal azo pigment A and another coloring material. In the case of the combination of the following (C1), the composition having the spectral characteristics of the above (1) can be easily obtained. In the case of a combination of the following (C2) to (C6), the composition having the spectral characteristics of the above (2) is easily obtained.

(C1)含有金屬偶氮顏料A與紫色著色劑之態樣。此外,亦可以含有作為其他色料的黃色著色劑。 (C2)含有金屬偶氮顏料A、紅色著色劑、藍色著色劑及紫色著色劑之態樣。此外,亦可以含有作為其他色料的黃色著色劑。 (C3)含有金屬偶氮顏料A、紅色著色劑及藍色著色劑之態樣。此外,亦可以含有作為其他色料的黃色著色劑。 (C4)含有金屬偶氮顏料A、藍色著色劑及紫色著色劑之態樣。此外,亦可以含有作為其他色料的黃色著色劑。 (C5)含有金屬偶氮顏料A、紫色著色劑及黑色著色劑之態樣。此外,亦可以含有作為其他色料的黃色著色劑。 (C6)含有金屬偶氮顏料A、藍色著色劑及黑色著色劑之態樣。此外,亦可以含有作為其他色料的黃色著色劑。(C1) An aspect containing metallic azo pigment A and a purple colorant. Moreover, you may contain a yellow coloring agent as another coloring material. (C2) An aspect containing metal azo pigment A, red colorant, blue colorant, and purple colorant. Moreover, you may contain a yellow coloring agent as another coloring material. (C3) An aspect containing metal azo pigment A, a red colorant, and a blue colorant. Moreover, you may contain a yellow coloring agent as another coloring material. (C4) An aspect containing metallic azo pigment A, a blue colorant, and a purple colorant. Moreover, you may contain a yellow coloring agent as another coloring material. (C5) An aspect containing metallic azo pigment A, a purple colorant, and a black colorant. Moreover, you may contain a yellow coloring agent as another coloring material. (C6) An aspect containing metallic azo pigment A, a blue colorant, and a black colorant. Moreover, you may contain a yellow coloring agent as another coloring material.

作為金屬偶氮顏料A,上述(Az1)的態樣的金屬偶氮顏料為較佳。作為紫色著色劑,C.I.Pigment Violet 23為較佳。作為黃色著色劑,C.I.Pigment Yellow 139、150、185為較佳,C.I.Pigment Yellow 139、150為更佳,C.I.Pigment Yellow 139為進一步較佳。作為紅色著色劑,Pigment Red 122、177、224、254、264為較佳,Pigment Red 122、177、254、264為更佳,Pigment Red 254為進一步較佳。作為藍色著色劑,C.I.Pigment Blue 15:6、16為較佳。作為黑色著色劑,Irgaphor Black(BASF公司)、C.I.Pigment Black 31、32為較佳。As the metal azo pigment A, the metal azo pigment of the aspect of the above-mentioned (Az1) is preferable. As the purple colorant, C.I. Pigment Violet 23 is preferred. As the yellow colorant, C.I. Pigment Yellow 139, 150, and 185 are preferable, C.I. Pigment Yellow 139 and 150 are more preferable, and C.I. Pigment Yellow 139 is further preferable. As the red colorant, Pigment Red 122, 177, 224, 254, and 264 are preferable, Pigment Red 122, 177, 254, and 264 are more preferable, and Pigment Red 254 is further preferable. As the blue colorant, C.I. Pigment Blue 15:6 and 16 are preferred. As the black colorant, Irgaphor Black (BASF Corporation) and C.I. Pigment Black 31 and 32 are preferable.

上述(C1)的組合中,相對於金屬偶氮顏料A的100質量份含有50~500質量份的紫色著色劑為較佳,含有75~400質量份為更佳,含有100~350質量份為進一步較佳。又,進一步含有作為其他色料的黃色著色劑時,作為其他色料的黃色著色劑的含量相對於金屬偶氮顏料A的100質量份為10~200質量份為較佳,20~150質量份為更佳。亦能夠設為不含有作為其他色料的黃色著色劑的態樣。In the combination of the above (C1), it is preferable to contain 50 to 500 parts by mass of the purple colorant relative to 100 parts by mass of the metallic azo pigment A, more preferably to contain 75 to 400 parts by mass, and to contain 100 to 350 parts by mass of Further preferred. Furthermore, when a yellow colorant as another colorant is further contained, the content of the yellow colorant as another colorant is preferably 10 to 200 parts by mass, preferably 20 to 150 parts by mass with respect to 100 parts by mass of the metal azo pigment A for better. The aspect which does not contain the yellow coloring agent which is another coloring material can also be set.

上述(C2)的組合中,相對於金屬偶氮顏料A的100質量份含有100~800質量份的紅色著色劑為較佳,含有200~700質量份為更佳。又,含有100~1000質量份的藍色著色劑為較佳,含有200~800質量份之為更佳。又,含有50~500質量份的紫色著色劑為較佳,含有70~400質量份為更佳。又,進一步含有作為其他色料的黃色著色劑時,作為其他色料的黃色著色劑的含量相對於金屬偶氮顏料A的100質量份為10~200質量份為較佳,20~150質量份為更佳。亦能夠設為不含有作為其他色料的黃色著色劑的態樣。In the combination of the above (C2), it is preferable to contain 100 to 800 parts by mass of the red colorant with respect to 100 parts by mass of the metal azo pigment A, and more preferably 200 to 700 parts by mass. Moreover, it is preferable to contain 100-1000 mass parts of blue coloring agents, and it is more preferable to contain 200-800 mass parts. Moreover, it is preferable to contain 50-500 mass parts of purple coloring agents, and it is more preferable to contain 70-400 mass parts. Furthermore, when a yellow colorant as another colorant is further contained, the content of the yellow colorant as another colorant is preferably 10 to 200 parts by mass, preferably 20 to 150 parts by mass with respect to 100 parts by mass of the metal azo pigment A for better. The aspect which does not contain the yellow coloring agent which is another coloring material can also be set.

上述(C3)的組合中,相對於金屬偶氮顏料A的100質量份含有100~800質量份的紅色著色劑為較佳,含有200~700質量份為更佳。又,含有100~1000質量份的藍色著色劑為較佳,含有200~800質量份為更佳。又,進一步含有作為其他色料的黃色著色劑時,作為其他色料的黃色著色劑的含量相對於金屬偶氮顏料A的100質量份為10~200質量份為較佳,20~150質量份為更佳。亦能夠設為不含有作為其他色料的黃色著色劑的態樣。In the combination of the above (C3), it is preferable to contain 100 to 800 parts by mass of the red colorant with respect to 100 parts by mass of the metal azo pigment A, and more preferably 200 to 700 parts by mass. Moreover, it is preferable to contain 100-1000 mass parts of blue coloring agents, and it is more preferable to contain 200-800 mass parts. Furthermore, when a yellow colorant as another colorant is further contained, the content of the yellow colorant as another colorant is preferably 10 to 200 parts by mass, preferably 20 to 150 parts by mass with respect to 100 parts by mass of the metal azo pigment A for better. The aspect which does not contain the yellow coloring agent which is another coloring material can also be set.

上述(C4)的組合中,相對於金屬偶氮顏料A的100質量份含有100~1000質量份的藍色著色劑為較佳,含有200~800質量份為更佳。又,含有50~500質量份的紫色著色劑為較佳,含有75~400質量份為更佳。又,進一步含有作為其他色料的黃色著色劑時,作為其他色料的黃色著色劑的含量相對於金屬偶氮顏料A的100質量份為10~200質量份為較佳,20~150質量份為更佳。亦能夠設為不含有作為其他色料的黃色著色劑的態樣。In the combination of the above (C4), it is preferable to contain 100 to 1000 parts by mass of the blue colorant with respect to 100 parts by mass of the metal azo pigment A, and it is more preferable to contain 200 to 800 parts by mass. Moreover, it is preferable to contain 50-500 mass parts of purple coloring agents, and it is more preferable to contain 75-400 mass parts. Furthermore, when a yellow colorant as another colorant is further contained, the content of the yellow colorant as another colorant is preferably 10 to 200 parts by mass, preferably 20 to 150 parts by mass with respect to 100 parts by mass of the metal azo pigment A for better. The aspect which does not contain the yellow coloring agent which is another coloring material can also be set.

上述(C5)的組合中,相對於金屬偶氮顏料A的100質量份含有50~500質量份的紫色著色劑為較佳,含有75~400質量份為更佳。又,含有50~1000質量份的黑色著色劑為較佳,含有100~800質量份為更佳。又,進一步含有作為其他色料的黃色著色劑時,作為其他色料的黃色著色劑的含量相對於金屬偶氮顏料A的100質量份為10~200質量份為較佳,20~150質量份為更佳。亦能夠設為不含有作為其他色料的黃色著色劑的態樣。In the combination of the above (C5), it is preferable to contain 50 to 500 parts by mass of the purple colorant with respect to 100 parts by mass of the metal azo pigment A, and it is more preferable to contain 75 to 400 parts by mass. Moreover, it is preferable to contain 50-1000 mass parts of black coloring agents, and it is more preferable to contain 100-800 mass parts. Furthermore, when a yellow colorant as another colorant is further contained, the content of the yellow colorant as another colorant is preferably 10 to 200 parts by mass, preferably 20 to 150 parts by mass with respect to 100 parts by mass of the metal azo pigment A for better. The aspect which does not contain the yellow coloring agent which is another coloring material can also be set.

上述(C6)的組合中,相對於金屬偶氮顏料A的100質量份含有100~1000質量份的藍色著色劑為較佳,含有200~800質量份為更佳。又,含有50~1000質量份的黑色著色劑為較佳,含有100~800質量份為更佳。又,進一步含有作為其他色料的黃色著色劑時,作為其他色料的黃色著色劑的含量相對於金屬偶氮顏料A的100質量份為10~200質量份為較佳,20~150質量份為更佳。亦能夠設為不含有作為其他色料的黃色著色劑的態樣。In the combination of the above (C6), it is preferable to contain 100 to 1000 parts by mass of the blue colorant with respect to 100 parts by mass of the metal azo pigment A, and it is more preferable to contain 200 to 800 parts by mass. Moreover, it is preferable to contain 50-1000 mass parts of black coloring agents, and it is more preferable to contain 100-800 mass parts. Furthermore, when a yellow colorant as another colorant is further contained, the content of the yellow colorant as another colorant is preferably 10 to 200 parts by mass, preferably 20 to 150 parts by mass with respect to 100 parts by mass of the metal azo pigment A for better. The aspect which does not contain the yellow coloring agent which is another coloring material can also be set.

本發明的組成物中,其他色料的含量在本發明的組成物的總固體成分中為10~80質量%為較佳。下限為20質量%以上為較佳,30質量%以上為更佳。上限為70質量%以下為較佳,60質量%以下為更佳。又,其他色料的含量相對於金屬偶氮顏料A的100質量份為50~1000質量份為較佳。下限為70質量份以上為較佳,100質量份以上為更佳。上限為500質量份以下為較佳。又,金屬偶氮顏料A與其他色料的合計含量在本發明的組成物的總固體成分中為10~70質量%為較佳。下限為20質量%以上為較佳,30質量%以上為更佳,40質量%以上為進一步較佳。本發明的組成物含有2種以上其他色料時,該等的合計量為上述範圍為較佳。In the composition of the present invention, the content of other colorants is preferably 10 to 80% by mass in the total solid content of the composition of the present invention. The lower limit is preferably 20% by mass or more, and more preferably 30% by mass or more. The upper limit is preferably 70% by mass or less, more preferably 60% by mass or less. Moreover, it is preferable that content of other coloring material is 50-1000 mass parts with respect to 100 mass parts of metal azo pigments A. The lower limit is preferably 70 parts by mass or more, and more preferably 100 parts by mass or more. The upper limit is preferably 500 parts by mass or less. Moreover, it is preferable that the total content of the metal azo pigment A and other coloring materials is 10-70 mass % in the total solid content of the composition of this invention. The lower limit is preferably 20% by mass or more, more preferably 30% by mass or more, and even more preferably 40% by mass or more. When the composition of the present invention contains two or more other colorants, it is preferable that the total amount of these is within the above range.

<<近紅外線吸收色素>> 本發明的組成物能夠含有近紅外線吸收色素。紅外線透射濾波器中,近紅外線吸收色素具有將透射之光(紅外線)限定於波長更長的一側之作用。本發明的組成物含有近紅外線吸收色素時,容易獲得上述(3)的分光特性的組成物。尤其,以上述(C2)~(C6)的組合含有金屬偶氮顏料A與其他色料時,藉由進一步含有近紅外線吸收色素,容易獲得上述(3)的分光特性的組成物。又,本發明的組成物含有近紅外線吸收色素時,能夠有效地抑制高溫高濕環境下的異物缺陷的產生。<<Near-infrared absorbing dye>> The composition of the present invention can contain a near-infrared absorbing dye. In the infrared transmissive filter, the near-infrared absorbing dye has the function of limiting the transmitted light (infrared rays) to the longer wavelength side. When the composition of the present invention contains a near-infrared absorbing dye, it is easy to obtain a composition having the spectral characteristics of the above (3). In particular, when the metal azo pigment A and other colorants are contained in a combination of the above (C2) to (C6), the composition having the spectral characteristics of the above (3) can be easily obtained by further containing a near-infrared absorbing dye. In addition, when the composition of the present invention contains a near-infrared absorbing dye, the occurrence of foreign matter defects in a high temperature and high humidity environment can be effectively suppressed.

本發明中,作為近紅外線吸收色素,可列舉在近紅外區域(較佳為波長700~1100nm,更佳為波長700~1000nm,進一步較佳為波長800~900nm)的範圍具有吸收極大之化合物。近紅外線吸收色素可以是顏料,亦可以是染料。In the present invention, as the near-infrared absorbing dye, a compound having a maximum absorption in the range of the near-infrared region (preferably a wavelength of 700 to 1100 nm, more preferably a wavelength of 700 to 1000 nm, and still more preferably a wavelength of 800 to 900 nm) can be mentioned. The near-infrared absorbing dye may be a pigment or a dye.

近紅外線吸收色素能夠較佳地使用具有包含單環或稠環的芳香族環之π共軛平面之化合物。構成近紅外線吸收色素所具有之π共軛平面之氫以外的原子數為14個以上為較佳,20個以上為更佳,25個以上為進一步較佳,30個以上為特佳。上限例如為80個以下為較佳,50個以下為更佳。又,近紅外線吸收色素所具有之π共軛平面包含2個以上的單環或稠環的芳香族環為較佳,包含3個以上的前述芳香族環為更佳,包含4個以上的前述芳香族環為更佳,包含5個以上的前述芳香族環為特佳。上限為100個以下為較佳,50個以下為更佳,30個以下為進一步較佳。作為前述芳香族環,可列舉苯環、萘環、茚環、薁環、庚搭烯環、茚烯環、苝環、稠五苯環、夸特銳烯環、乙烷合萘環、菲環、蒽環、稠四苯環、䓛環、聯伸三苯環、茀環、吡啶環、喹啉環、異喹啉環、咪唑環、苯并咪唑環、吡唑環、噻唑環、苯并噻唑環、三唑環、苯并三氮唑環、噁唑環、苯并噁唑環、咪唑啉環、吡嗪環、喹喔啉環、嘧啶環、喹唑啉環、噠嗪環、三嗪環、吡咯環、吲哚環、異吲哚環、咔唑環及具有該等環之稠環。As the near-infrared absorbing dye, a compound having a π-conjugated plane containing a monocyclic or condensed aromatic ring can be preferably used. The number of atoms other than hydrogen constituting the π-conjugated plane of the near-infrared absorbing dye is preferably 14 or more, more preferably 20 or more, further preferably 25 or more, and particularly preferably 30 or more. For example, the upper limit is preferably 80 or less, and more preferably 50 or less. In addition, the π-conjugated plane possessed by the near-infrared absorbing dye preferably contains two or more monocyclic or condensed aromatic rings, more preferably three or more of the above-mentioned aromatic rings, and four or more of the above-mentioned aromatic rings. An aromatic ring is more preferable, and it is especially preferable that it contains 5 or more of the said aromatic rings. The upper limit is preferably 100 or less, more preferably 50 or less, and even more preferably 30 or less. Examples of the above-mentioned aromatic ring include a benzene ring, a naphthalene ring, an indene ring, an azulene ring, a heptavine ring, an indene ring, a perylene ring, a condensed pentabenzene ring, a quartane ring, an ethanenaphthalene ring, a phenanthrene ring. Ring, anthracene ring, fused tetraphenyl ring, triphenyl ring, biextended triphenyl ring, perylene ring, pyridine ring, quinoline ring, isoquinoline ring, imidazole ring, benzimidazole ring, pyrazole ring, thiazole ring, benzo Thiazole ring, triazole ring, benzotriazole ring, oxazole ring, benzoxazole ring, imidazoline ring, pyrazine ring, quinoxaline ring, pyrimidine ring, quinazoline ring, pyridazine ring, three An oxazine ring, a pyrrole ring, an indole ring, an isoindole ring, a carbazole ring, and a fused ring having these rings.

近紅外線吸收色素為選自吡咯并吡咯化合物、花菁化合物、方酸菁化合物、酞菁化合物、萘酞菁化合物、夸特銳烯化合物、部花菁化合物、克酮鎓化合物、氧雜化合物、二亞銨化合物、二硫醇化合物、三芳基甲烷化合物、吡咯甲川化合物、甲亞胺化合物、蒽醌化合物、靛藍化合物及二苯并呋喃酮化合物之至少1種為較佳,選自吡咯并吡咯化合物、花菁化合物、方酸菁化合物、酞菁化合物、萘酞菁化合物、克酮鎓化合物及靛藍化合物之至少1種為更佳,選自吡咯并吡咯化合物、花菁化合物及方酸菁化合物之至少1種為更佳,吡咯并吡咯化合物為特佳。作為二亞銨化合物,例如,可列舉日本特表2008-528706號公報中記載的化合物,且該內容被併入本說明書中。作為酞菁化合物,例如可列舉日本特開2012-077153號公報的段落號0093中記載的化合物、日本特開2006-343631號公報中記載的酞菁氧鈦、日本特開2013-195480號公報的段落號0013~0029中記載的化合物、日本專利第6081771號公報中記載的釩酞菁,且該等內容被併入本說明書中。作為萘酞菁化合物,例如可列舉日本特開2012-077153號公報的段落號0093中記載的化合物,且該內容被併入本說明書中。靛藍化合物為靛藍硼錯合物化合物為較佳。作為靛藍化合物,可列舉日本專利第5642013號公報中記載之化合物,且該內容被併入本說明書中。又,近紅外線吸收色素亦能夠使用日本特開2016-146619號公報中記載之化合物、日本特開2016-079331號公報中記載之化合物、日本特開2017-082029號公報中記載之化合物、日本特開2015-040176號公報中記載之化合物、日本專利第5539676號公報中記載之化合物。又,近紅外線吸收色素亦能夠使用下述結構的化合物。 [化學式9]

Figure 02_image019
The near-infrared absorbing dye is selected from the group consisting of pyrrolopyrrole compounds, cyanine compounds, squaraine compounds, phthalocyanine compounds, naphthalocyanine compounds, quartane compounds, merocyanine compounds, ketonium compounds, oxa compounds, Preferably, at least one of diimmonium compounds, dithiol compounds, triarylmethane compounds, pyrromethine compounds, methaneimine compounds, anthraquinone compounds, indigo compounds and dibenzofuranone compounds is selected from pyrrolopyrrole Compounds, cyanine compounds, squaraine compounds, phthalocyanine compounds, naphthalocyanine compounds, ketonium compounds and indigo compounds are preferably at least one selected from the group consisting of pyrrolopyrrole compounds, cyanine compounds and squaraine compounds At least one of them is more preferred, and a pyrrolopyrrole compound is particularly preferred. As a diimmonium compound, the compound described in Unexamined-Japanese-Patent No. 2008-528706 is mentioned, for example, and the content is incorporated in this specification. Examples of the phthalocyanine compound include compounds described in paragraph No. 0093 of JP 2012-077153 A, titanium phthalocyanine described in JP 2006-343631 A, and compounds described in JP 2013-195480 A. The compounds described in Paragraph Nos. 0013 to 0029, the vanadium phthalocyanine described in Japanese Patent No. 6081771, and these contents are incorporated into the present specification. As a naphthalocyanine compound, the compound described in the paragraph No. 0093 of Unexamined-Japanese-Patent No. 2012-077153 is mentioned, for example, and the content is incorporated in this specification. Preferably, the indigo compound is an indigo boron complex compound. Examples of the indigo compound include compounds described in Japanese Patent No. 5642013, and the contents thereof are incorporated into the present specification. In addition, as the near-infrared absorbing dye, the compound described in JP 2016-146619 A, the compound described in JP 2016-079331 A, the compound described in JP 2017-082029 A, the The compound described in Kokai Publication No. 2015-040176 and the compound described in Japanese Patent Publication No. 5539676. Moreover, the compound of the following structure can also be used for a near-infrared absorption dye. [Chemical formula 9]
Figure 02_image019

作為吡咯并吡咯化合物,由式(PP)表示之化合物為較佳。 [化學式10]

Figure 02_image021
式中,R1a 及R1b 分別獨立地表示烷基、芳基或雜芳基,R2 及R3 分別獨立地表示氫原子或取代基,R2 及R3 亦可以相互鍵結而形成環,R4 分別獨立地表示氫原子、烷基、芳基、雜芳基、-BR4A R4B 或金屬原子,R4 亦可以與選自R1a 、R1b 及R3 之至少一個共價鍵結或配位鍵結,R4A 及R4B 分別獨立地表示取代基。關於式(PP)的詳細內容,能夠參閱日本特開2009-263614號公報的段落號0017~0047、日本特開2011-068731號公報的段落號0011~0036、國際公開WO2015/166873號公報的段落號0010~0024中的記載,且該等內容被併入本說明書中。As the pyrrolopyrrole compound, a compound represented by the formula (PP) is preferable. [Chemical formula 10]
Figure 02_image021
In the formula, R 1a and R 1b each independently represent an alkyl group, an aryl group or a heteroaryl group, R 2 and R 3 each independently represent a hydrogen atom or a substituent, and R 2 and R 3 can also be bonded to each other to form a ring. , R 4 independently represents hydrogen atom, alkyl group, aryl group, heteroaryl group, -BR 4A R 4B or metal atom, R 4 can also be selected from R 1a , R 1b and R 3 at least one covalent bond A bond or a coordinate bond, R 4A and R 4B each independently represent a substituent. For details of formula (PP), refer to paragraphs 0017 to 0047 of JP 2009-263614 A, paragraphs 0011 to 0036 of JP 2011-068731 A, and paragraphs of International Publication WO2015/166873 Nos. 0010 to 0024, and these contents are incorporated into this specification.

式(PP)中,R1a 及R1b 分別獨立地表示芳基或雜芳基為較佳,芳基為更佳。又,R1a 及R1b 所表示之烷基、芳基及雜芳基可以具有取代基,亦可以不被取代。作為取代基,可列舉日本特開2009-263614號公報的段落號0020~0022中記載之取代基、上述取代基T。又,R1a 及R1b 所表示之烷基、芳基及雜芳基具有2個以上的取代基時,取代基彼此亦可以鍵結而形成環。In formula (PP), it is preferable that R 1a and R 1b each independently represent an aryl group or a heteroaryl group, and an aryl group is more preferable. In addition, the alkyl group, aryl group and heteroaryl group represented by R 1a and R 1b may have a substituent or may not be substituted. Examples of the substituent include the substituents described in paragraphs 0020 to 0022 of JP-A No. 2009-263614, and the above-mentioned substituent T. In addition, when the alkyl group, aryl group, and heteroaryl group represented by R 1a and R 1b have two or more substituents, the substituents may be bonded to each other to form a ring.

作為以R1a 、R1b 表示之基團的具體例,可列舉作為取代基具有烷氧基之芳基、作為取代基具有羥基之芳基、作為取代基具有醯氧基之芳基等。Specific examples of the groups represented by R 1a and R 1b include an aryl group having an alkoxy group as a substituent, an aryl group having a hydroxyl group as a substituent, and an aryl group having an alkoxy group as a substituent.

式(PP)中,R2 及R3 分別獨立地表示氫原子或取代基。作為取代基可列舉上述取代基T。R2 及R3 中的至少一個為吸電子基為較佳。哈米特取代基常數σ值(西格瑪值)為正的取代基作為吸電子基而發揮作用。在此,利用哈米特法則求出之取代基常數中存在σp值和σm值。該等值能夠在很多的一般出版物中查到。本發明中,作為吸電子基能夠例示出哈米特取代基常數σ值為0.2以上的取代基。σ值為0.25以上為較佳,0.3以上為更佳,0.35以上為進一步較佳。上限並無特別限制,較佳為0.80以下。作為吸電子基的具體例,可列舉氰基(-CN:σp值=0.66)、羧基(-COOH:σp值=0.45)、烷氧羰基(例如,-COOMe:σp值=0.45)、芳氧羰基(例如,-COOPh:σp值=0.44)、胺基甲醯基(例如,-CONH2 :σp值=0.36)、烷基羰基(例如,-COMe:σp值=0.50)、芳基羰基(例如,-COPh:σp值=0.43)、烷基磺醯基(例如,-SO2 Me:σp值=0.72)、芳基磺醯基(例如,-SO2 Ph:σp值=0.68)等,氰基為較佳。在此,Me表示甲基,Ph表示苯基。另外,關於哈米特取代基常數σ值,例如能夠參閱日本特開2011-068731號公報的段落號0017~0018,且該內容被併入本說明書中。In formula (PP), R 2 and R 3 each independently represent a hydrogen atom or a substituent. Examples of the substituent include the above-mentioned substituent T. Preferably, at least one of R 2 and R 3 is an electron withdrawing group. A substituent having a positive Hammett substituent constant σ value (sigma value) acts as an electron withdrawing group. Here, a σp value and a σm value exist in the substituent constant obtained by Hammett's law. Such equivalents can be found in many general publications. In the present invention, as the electron withdrawing group, a substituent having a Hammett substituent constant σ value of 0.2 or more can be exemplified. The σ value is preferably 0.25 or more, more preferably 0.3 or more, and even more preferably 0.35 or more. The upper limit is not particularly limited, but is preferably 0.80 or less. Specific examples of the electron withdrawing group include a cyano group (-CN: σp value=0.66), a carboxyl group (-COOH: σp value=0.45), an alkoxycarbonyl group (for example, -COOMe: σp value=0.45), an aryloxy group Carbonyl (eg, -COOPh:σp value=0.44), Aminocarboxy (eg, -CONH 2 :σp value=0.36), Alkylcarbonyl (eg, -COMe:σp value=0.50), Arylcarbonyl (eg, -COMe:σp value=0.50) For example, -COPh: σp value = 0.43), alkylsulfonyl group (eg, -SO 2 Me: σp value = 0.72), arylsulfonyl group (eg, -SO 2 Ph: σp value = 0.68), etc., Cyano is preferred. Here, Me represents a methyl group, and Ph represents a phenyl group. In addition, regarding the value of the Hammett substituent constant σ, for example, paragraph numbers 0017 to 0018 of Japanese Patent Laid-Open No. 2011-068731 can be referred to, and the contents thereof are incorporated into the present specification.

式(PP)中,R2 表示吸電子基(較佳為氰基),R3 表示雜芳基為較佳。雜芳基為5員環或6員環為較佳。又,雜芳基係單環或稠環為較佳,單環或縮合數為2~8的稠環為較佳,單環或縮合數為2~4的稠環為更佳。構成雜芳基之雜原子的數為1~3為較佳,1~2為更佳。作為雜原子,例如例示出氮原子、氧原子、硫原子。雜芳基具有1個以上氮原子為較佳。式(PP)中之2個R2 彼此可以相同,亦可以不同。又,式(PP)中之2個R3 彼此可以相同,亦可以不同。In formula (PP), R 2 represents an electron withdrawing group (preferably a cyano group), and R 3 preferably represents a heteroaryl group. The heteroaryl group is preferably a 5-membered ring or a 6-membered ring. In addition, the heteroaryl group is preferably a monocyclic or fused ring, preferably a monocyclic or a fused ring with a condensation number of 2 to 8, and more preferably a single ring or a fused ring with a condensation number of 2 to 4. The number of hetero atoms constituting the heteroaryl group is preferably 1-3, more preferably 1-2. As a hetero atom, a nitrogen atom, an oxygen atom, and a sulfur atom are illustrated, for example. The heteroaryl group preferably has one or more nitrogen atoms. The two R 2 in the formula (PP) may be the same or different from each other. In addition, the two R 3 in formula (PP) may be the same or different from each other.

式(PP)中,R4 為氫原子、烷基、芳基、雜芳基或由-BR4A R4B 表示之基團為較佳,氫原子、烷基、芳基或由-BR4A R4B 表示之基團為更佳,由-BR4A R4B 表示之基團為進一步較佳。作為R4A 及R4B 所表示之取代基,鹵原子、烷基、烷氧基、芳基或雜芳基為較佳,烷基、芳基或雜芳基為更佳,芳基為特佳。該等基團亦可以進一步具有取代基。式(PP)中之2個R4 彼此可以相同,亦可以不同。R4A 及R4B 亦可以相互鍵結而形成環。In formula (PP), R 4 is preferably a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group or a group represented by -BR 4A R 4B , a hydrogen atom, an alkyl group, an aryl group or a group represented by -BR 4A R The group represented by 4B is more preferable, and the group represented by -BR 4A R 4B is further preferable. As the substituent represented by R 4A and R 4B , a halogen atom, an alkyl group, an alkoxy group, an aryl group or a heteroaryl group is preferable, an alkyl group, an aryl group or a heteroaryl group is more preferable, and an aryl group is particularly preferable . These groups may further have a substituent. The two R 4 in the formula (PP) may be the same or different from each other. R 4A and R 4B may be bonded to each other to form a ring.

作為由式(PP)表示之化合物的具體例,可列舉下述化合物。以下結構式中,Me表示甲基,Ph表示苯基。又,作為吡咯并吡咯化合物,可列舉日本特開2009-263614號公報的段落號0016~0058中記載的化合物、日本特開2011-68731號公報的段落號0037~0052中記載的化合物、國際公開WO2015/166873號公報的段落號0010~0033中記載的化合物等,且該等內容被併入本說明書中。 [化學式11]

Figure 02_image023
Specific examples of the compound represented by the formula (PP) include the following compounds. In the following structural formula, Me represents a methyl group, and Ph represents a phenyl group. In addition, examples of the pyrrolopyrrole compound include the compounds described in paragraphs 0016 to 0058 of JP 2009-263614 A, the compounds described in paragraphs 0037 to 0052 of JP 2011-68731 A, and international publications. Compounds and the like described in Paragraph Nos. 0010 to 0033 of WO2015/166873, and these contents are incorporated into the present specification. [Chemical formula 11]
Figure 02_image023

作為方酸菁化合物,由下述式(SQ)表示之化合物為較佳。 [化學式12]

Figure 02_image025
式(SQ)中,A1 及A2 分別獨立地表示芳基、雜芳基或由式(A-1)表示之基團; [化學式13]
Figure 02_image027
式(A-1)中,Z1 表示形成含氮雜環之非金屬原子團,R2 表示烷基、烯基或芳烷基,d表示0或1,波浪線表示連接鍵。關於式(SQ)的詳細內容,能夠參閱日本特開2011-208101號公報的段落號0020~0049、日本專利第6065169號公報的段落號0043~0062、國際公開WO2016/181987號公報的段落號0024~0040中的記載,且該等內容被併入本說明書中。As the squaraine compound, a compound represented by the following formula (SQ) is preferable. [Chemical formula 12]
Figure 02_image025
In the formula (SQ), A 1 and A 2 each independently represent an aryl group, a heteroaryl group or a group represented by the formula (A-1); [Chemical formula 13]
Figure 02_image027
In formula (A-1), Z 1 represents a non-metallic atomic group forming a nitrogen-containing heterocycle, R 2 represents an alkyl group, an alkenyl group or an aralkyl group, d represents 0 or 1, and a wavy line represents a connecting bond. For details of formula (SQ), refer to paragraphs 0020 to 0049 of Japanese Patent Laid-Open No. 2011-208101, paragraphs 0043 to 0062 of Japanese Patent No. 6065169, and paragraph 0024 of International Publication WO2016/181987 ~0040, and these contents are incorporated into this specification.

另外,式(SQ)中陽離子以如下非定域化而存在。 [化學式14]

Figure 02_image029
In addition, the cation in the formula (SQ) exists in the following delocalized manner. [Chemical formula 14]
Figure 02_image029

作為方酸菁化合物,可列舉下述結構的化合物。又,可列舉日本特開2011-208101號公報的段落號0044~0049中記載的化合物、日本專利第6065169號公報的段落號0060~0061中記載的化合物、國際公開WO2016/181987號公報的段落號0040中記載的化合物、國際公開WO2013/133099號公報中記載的化合物、國際公開WO2014/088063號公報中記載的化合物、日本特開2014-126642號公報中記載的化合物、日本特開2016-146619號公報中記載的化合物、日本特開2015-176046號公報中記載的化合物、日本特開2017-025311號公報中記載的化合物、國際公開WO2016/154782號公報中記載的化合物、日本專利第5884953號公報中記載的化合物、日本專利第6036689號公報中記載的化合物、日本專利第5810604號公報中記載的化合物、日本特開2017-068120號公報中記載的化合物等,且該等內容被併入本說明書中。 [化學式15]

Figure 02_image031
As a squaraine compound, the compound of the following structure is mentioned. In addition, the compounds described in paragraphs 0044 to 0049 of JP 2011-208101 A, the compounds described in paragraphs 0060 to 0061 of Japanese Patent No. 6065169, and the paragraphs of International Publication WO2016/181987 Compounds described in 0040, compounds described in International Publication WO2013/133099 A, compounds described in International Publication WO2014/088063, compounds described in JP 2014-126642 A, JP 2016-146619 A Compounds described in the publications, compounds described in JP 2015-176046 A, compounds described in JP 2017-025311 A, compounds described in International Publication WO 2016/154782, JP 5884953 The compounds described in, the compound described in Japanese Patent No. 6036689, the compound described in Japanese Patent No. 5810604, the compound described in Japanese Patent Laid-Open No. 2017-068120, etc., and the contents of which are incorporated into this specification middle. [Chemical formula 15]
Figure 02_image031

花菁化合物為由式(C)表示之化合物為較佳。 式(C) [化學式16]

Figure 02_image033
式中,Z1 及Z2 分別獨立地為形成可以縮環的5員或6員的含氮雜環之非金屬原子團, R101 及R102 分別獨立地烷基、烯基、炔基、芳烷基或芳基, L1 表示具有奇數個次甲基之次甲鏈, a及b分別獨立,為0或1, a為0時,碳原子與氮原子以雙鍵形式鍵結,b為0時,碳原子與氮原子以單鍵形式鍵結, 式中由Cy表示之部位為陽離子部時,X1 表示陰離子,c表示用於確保電荷的平衡所需的數,式中由Cy表示之部位為陰離子部時,X1 表示陽離子,c表示用於確保電荷的平衡所需的數,式中由Cy表示之部位的電荷在分子內中和時,c為0。The cyanine compound is preferably a compound represented by formula (C). Formula (C) [Chemical Formula 16]
Figure 02_image033
In the formula, Z 1 and Z 2 are respectively independently a non-metallic atomic group that forms a 5-membered or 6-membered nitrogen-containing heterocyclic ring that can be condensed, and R 101 and R 102 are independently alkyl, alkenyl, alkynyl, aryl, respectively. Alkyl or aryl, L 1 represents a methine chain with an odd number of methine groups, a and b are independently 0 or 1, when a is 0, a carbon atom and a nitrogen atom are bonded in the form of double bonds, and b is When it is 0, the carbon atom and the nitrogen atom are bonded by a single bond, and when the part represented by Cy in the formula is a cation part, X 1 represents an anion, and c represents a number required to ensure the balance of electric charges, and in the formula, it is represented by Cy When the moiety is an anion moiety, X 1 represents a cation, and c represents a number necessary for securing the balance of charges. In the formula, when the charges of the moiety represented by Cy are neutralized in the molecule, c is 0.

作為花菁化合物,可列舉日本特開2009-108267號公報的段落號0044~0045中記載的化合物、日本特開2002-194040號公報的段落號0026~0030中記載的化合物、日本特開2015-172004號公報中記載的化合物、日本特開2015-172102號公報中記載的化合物、日本特開2008-088426號公報中記載的化合物、日本特開2017-031394號公報中記載的化合物等,且該等內容被併入本說明書中。Examples of the cyanine compound include compounds described in paragraphs 0044 to 0045 of JP 2009-108267 A, compounds described in paragraphs 0026 to 0030 of JP 2002-194040 A, and JP 2015- The compound described in JP 172004 A, the compound described in JP 2015-172102 A, the compound described in JP 2008-088426 A, the compound described in JP 2017-031394 A, etc., and the and the like are incorporated into this specification.

本發明中,近紅外線吸收色素亦能夠使用市售品。例如可列舉SDO-C33(ARIMOTO CHEMICAL Co.,Ltd.製)、EXcolor IR-14、EXcolor IR-10A、EXcolor TX-EX-801B、EXcolor TX-EX-805K(Nippon Shokubai Co., Ltd.製)、ShigenoxNIA-8041、ShigenoxNIA-8042、ShigenoxNIA-814、ShigenoxNIA-820、ShigenoxNIA-839(Kyowa Hakko ChemicalCo., Ltd. 製)、EpoliteV-63、Epolight3801、Epolight3036(Epolin, Inc. 製)、PRO-JET825LDI(Fujifilm Corporation製)、NK-3027、NK-5060(HAYASHIBARA CO., LTD.製)、YKR-3070(Mitsui Chemicals, Inc.製)、FDN-003(YAMADA CHEMICAL CO., LTD.製)等。In this invention, a commercial item can also be used for a near-infrared absorption dye. For example, SDO-C33 (manufactured by ARIMOTO CHEMICAL Co., Ltd.), EXcolor IR-14, EXcolor IR-10A, EXcolor TX-EX-801B, EXcolor TX-EX-805K (manufactured by Nippon Shokubai Co., Ltd.) , ShigenoxNIA-8041, ShigenoxNIA-8042, ShigenoxNIA-814, ShigenoxNIA-820, ShigenoxNIA-839 (manufactured by Kyowa Hakko Chemical Co., Ltd.), EpoliteV-63, Epolight3801, Epolight3036 (manufactured by Epolin, Inc.), PRO-JET825LDI (manufactured by Epolin, Inc.) Fujifilm Corporation), NK-3027, NK-5060 (manufactured by HAYASHIBARA CO., LTD.), YKR-3070 (manufactured by Mitsui Chemicals, Inc.), FDN-003 (manufactured by YAMADA CHEMICAL CO., LTD.), and the like.

本發明的組成物含有近紅外線吸收色素時,近紅外線吸收色素的含量在本發明的組成物的總固體成分中為1~30質量%為較佳。上限為20質量%以下為較佳,10質量%以下為更佳。下限為3質量%以上為較佳,5質量%以上為更佳。又,近紅外線吸收色素的含量相對於金屬偶氮顏料A與其他色料的合計100質量份為5~50質量份為較佳。上限為45質量%以下為較佳,40質量%以下為更佳。下限為10質量%以上為較佳,15質量%以上為更佳。又,金屬偶氮顏料A、其他色料及近紅外線吸收色素的合計含量在本發明的組成物的總固體成分中為10~70質量%為較佳。下限為20質量%以上為較佳,30質量%以上為更佳,40質量%以上為進一步較佳。本發明的組成物可以含有1種近紅外線吸收色素,亦可以含有2種以上。含有2種以上的近紅外線吸收色素時,該等的合計量成為上述範圍為較佳。When the composition of the present invention contains a near-infrared absorbing dye, the content of the near-infrared absorbing dye is preferably 1 to 30% by mass in the total solid content of the composition of the present invention. The upper limit is preferably 20 mass % or less, more preferably 10 mass % or less. The lower limit is preferably 3 mass % or more, and more preferably 5 mass % or more. Moreover, the content of the near-infrared absorbing dye is preferably 5 to 50 parts by mass relative to 100 parts by mass of the total of the metal azo pigment A and other colorants. The upper limit is preferably 45 mass % or less, more preferably 40 mass % or less. The lower limit is preferably 10% by mass or more, and more preferably 15% by mass or more. Moreover, it is preferable that the total content of the metal azo pigment A, other coloring materials, and a near-infrared absorbing dye is 10-70 mass % in the total solid content of the composition of this invention. The lower limit is preferably 20% by mass or more, more preferably 30% by mass or more, and even more preferably 40% by mass or more. The composition of the present invention may contain one type of near-infrared absorbing dye, or may contain two or more types. When two or more types of near-infrared absorbing dyes are contained, it is preferable that the total amount of these is in the above-mentioned range.

<<硬化性化合物>> 本發明的組成物含有選自具有乙烯性不飽和鍵結基之化合物及具有環狀醚基之化合物之至少1種化合物。以下,將兩者亦統稱為硬化性化合物。作為乙烯性不飽和鍵結基可列舉乙烯基、(甲基)烯丙基、(甲基)丙烯醯基等。作為環狀醚基可列舉環氧基、氧雜環丁基等。<<hardenable compound>> The composition of this invention contains at least 1 sort(s) of compound chosen from the compound which has an ethylenically unsaturated bond group, and the compound which has a cyclic ether group. Hereinafter, both are also collectively referred to as a curable compound. A vinyl group, a (meth)allyl group, a (meth)acryloyl group, etc. are mentioned as an ethylenically unsaturated bond group. As a cyclic ether group, an epoxy group, an oxetanyl group, etc. are mentioned.

(具有乙烯性不飽和鍵結基之化合物) 本發明中使用之具有乙烯性不飽和鍵結基化合物可以是單體,亦可以聚合物。以下,亦將具有乙烯性不飽和鍵結基之單體稱為聚合性單體。又,亦可將具有乙烯性不飽和鍵結基之聚合物稱為聚合性聚合物。(Compound having an ethylenically unsaturated bond group) The compound having an ethylenically unsaturated bond group used in the present invention may be a monomer or a polymer. Hereinafter, the monomer having an ethylenically unsaturated bond group is also referred to as a polymerizable monomer. Moreover, the polymer which has an ethylenically unsaturated bond group can also be called a polymerizable polymer.

聚合性單體的分子量小於3000為較佳。上限為2000以下為更佳,1500以下為進一步較佳。下限為100以上為較佳,150以上為更佳,250以上為進一步較佳。聚合性單體為含有3個以上的乙烯性不飽和鍵結基之化合物為較佳,為含有3~15個乙烯性不飽和鍵結基之化合物為更佳,為含有3~6個乙烯性不飽和鍵結基之化合物為進一步較佳。又,聚合性單體為3~15官能的(甲基)丙烯酸酯化合物為較佳,3~6官能的(甲基)丙烯酸酯化合物為更佳。作為聚合性單體的具體例,可列舉日本特開2009-288705號公報的段落號0095~0108、日本特開2013-029760號公報的段落0227、日本特開2008-292970號公報的段落號0254~0257中記載的化合物,且該等內容被併入本說明書中。The molecular weight of the polymerizable monomer is preferably less than 3000. The upper limit is more preferably 2000 or less, and further more preferably 1500 or less. The lower limit is preferably 100 or more, more preferably 150 or more, and still more preferably 250 or more. The polymerizable monomer is preferably a compound containing 3 or more ethylenically unsaturated bond groups, more preferably a compound containing 3-15 ethylenically unsaturated bond groups, and preferably a compound containing 3-6 ethylenically unsaturated bond groups The compound of an unsaturated bond group is more preferable. Moreover, the (meth)acrylate compound whose polymerizable monomer is 3-15 functional is more preferable, and the (meth)acrylate compound which is 3-6 functional is more preferable. Specific examples of the polymerizable monomer include paragraphs 0095 to 0108 of JP 2009-288705 A, paragraph 0227 of JP 2013-029760 A, and paragraph 0254 of JP 2008-292970 A ~0257, and the contents are incorporated into this specification.

聚合性單體的C=C當量(聚合性單體的分子量[g/mol]/聚合性單體中所含之乙烯性不飽和鍵結基的數)為50~1000為較佳。下限為60以上為較佳,70以上為更佳。上限為700以下為較佳,500以下為更佳,200以下為進一步較佳,150以下為更進一步較佳,140以下為特佳。若聚合性單體的C=C當量為上述範圍,則能夠有效地吸附於顏料活性面,從而能夠更顯著地抑制金屬偶氮顏料A的凝聚。The C=C equivalent of the polymerizable monomer (the molecular weight of the polymerizable monomer [g/mol]/the number of ethylenically unsaturated bond groups contained in the polymerizable monomer) is preferably 50 to 1,000. The lower limit is preferably 60 or more, and more preferably 70 or more. The upper limit is preferably 700 or less, more preferably 500 or less, further more preferably 200 or less, still more preferably 150 or less, and particularly preferably 140 or less. When the C=C equivalent of the polymerizable monomer is in the above range, it can be effectively adsorbed on the active surface of the pigment, and the aggregation of the metal azo pigment A can be suppressed more significantly.

作為聚合性單體,可列舉二新戊四醇三丙烯酸酯(作為市售品為KAYARAD D-330;Nippon Kayaku Co.,Ltd.製)、二新戊四醇四丙烯酸酯(作為市售品為KAYARAD D-320;Nippon Kayaku Co.,Ltd.製)、二新戊四醇五(甲基)丙烯酸酯(作為市售品為KAYARAD D-310;Nippon Kayaku Co.,Ltd.製)、二新戊四醇六(甲基)丙烯酸酯(作為市售品為KAYARAD DPHA;Nippon Kayaku Co.,Ltd.製、NK Ester A-DPH-12E;Shin Nakamura Chemical Co., Ltd.製)及該等(甲基)丙烯醯基經由乙二醇和/或丙二醇殘基而鍵結之結構的化合物(例如,SARTOMER公司銷售之SR454、SR499)、NK Ester A-TMMT(Shin Nakamura Chemical Co., Ltd.製)、KAYARAD RP-1040、DPCA-20(Nippon Kayaku Co.,Ltd.製)等。又,作為聚合性單體,使用三羥甲基丙烷三(甲基)丙烯酸酯、三羥甲基丙烷環氧丙烷改質三(甲基)丙烯酸酯、三羥甲基丙烷環氧乙烷改質三(甲基)丙烯酸酯、异氰脲酸環氧乙烷改質三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯等3官能的(甲基)丙烯酸酯化合物亦較佳。作為3官能的(甲基)丙烯酸酯化合物的市售品,可列舉ARONIX M-309、M-310、M-321、M-350、M-360、M-313、M-315、M-306、M-305、M-303、M-452、M-450(TOAGOSEI CO.,LTD.製)、NK Ester A9300、A-GLY-9E、A-GLY-20E、A-TMM-3、A-TMM-3L、A-TMM-3LM-N、A-TMPT、TMPT(SHIN-NAKAMURA CHEMICAL CO.,LTD.製)、KAYARAD GPO-303、TMPTA、THE-330、TPA-330、PET-30(NIPPON KAYAKU CO.,LTD.製)、TMPEOTA(DAICEL-ALLNEX LTD.製)等。As a polymerizable monomer, dipeotaerythritol triacrylate (a commercial item: KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipeotaerythritol tetraacrylate (a commercial item) can be mentioned. It is KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), dipipentaerythritol penta(meth)acrylate (commercially available as KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), two Neotaerythritol hexa(meth)acrylate (commercially available as KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., NK Ester A-DPH-12E; manufactured by Shin Nakamura Chemical Co., Ltd.) and the like (Meth)acryloyl group bonded via ethylene glycol and/or propylene glycol residues ), KAYARAD RP-1040, DPCA-20 (manufactured by Nippon Kayaku Co., Ltd.), etc. In addition, as the polymerizable monomer, trimethylolpropane tri(meth)acrylate, trimethylolpropane propylene oxide modified tri(meth)acrylate, trimethylolpropane ethylene oxide modified Trifunctional (meth)acrylate compounds such as mass tri(meth)acrylate, isocyanurate-modified ethylene oxide tri(meth)acrylate, and pentaerythritol tri(meth)acrylate are also preferred. As a commercial item of a trifunctional (meth)acrylate compound, ARONIX M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306 are mentioned , M-305, M-303, M-452, M-450 (manufactured by TOAGOSEI CO., LTD.), NK Ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A- TMM-3L, A-TMM-3LM-N, A-TMPT, TMPT (manufactured by SHIN-NAKAMURA CHEMICAL CO., LTD.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 (NIPPON KAYAKU CO., LTD.), TMPEOTA (DAICEL-ALLNEX LTD.), etc.

作為聚合性單體,使用具有酸基之聚合性單體亦較佳。藉由使用具有酸基之聚合性單體,顯影時容易去除未曝光部的組成物層,從而能夠有效地抑制顯影殘渣的發生。作為酸基,可列舉羧基、磺基、磷酸基等,羧基為較佳。作為具有酸基之聚合性單體的市售品,可列舉aronix M-510、M-520、aronix TO-2349(TOAGOSEI CO., LTD.製)等。作為具有酸基之聚合性單體的酸值為0.1~40mgKOH/g為較佳,5~30mgKOH/g為更佳。只要聚合性單體的酸值為0.1mgKOH/g以上,則對顯影液之溶解性便良好,從而可獲得更優異的顯影性。只要聚合性單體的酸值為40mgKOH/g以下,便有利於製造和操作。As the polymerizable monomer, it is also preferable to use a polymerizable monomer having an acid group. By using a polymerizable monomer having an acid group, the composition layer of the unexposed portion can be easily removed during development, and the occurrence of development residues can be effectively suppressed. As an acid group, a carboxyl group, a sulfo group, a phosphoric acid group, etc. are mentioned, A carboxyl group is preferable. As a commercial item of the polymerizable monomer which has an acid group, aronix M-510, M-520, aronix TO-2349 (made by TOAGOSEI CO., LTD.) etc. are mentioned. The acid value of the polymerizable monomer having an acid group is preferably 0.1 to 40 mgKOH/g, more preferably 5 to 30 mgKOH/g. As long as the acid value of the polymerizable monomer is 0.1 mgKOH/g or more, the solubility to a developing solution is good, and more excellent developability can be obtained. As long as the acid value of the polymerizable monomer is 40 mgKOH/g or less, production and handling are favorable.

作為聚合性單體,使用由下述式(MO-1)~(MO-6)表示之化合物亦較佳。另外,式中,T為氧化烯基時,碳原子側的末端與R鍵結。It is also preferable to use compounds represented by the following formulae (MO-1) to (MO-6) as the polymerizable monomer. In addition, in the formula, when T is an oxyalkylene group, the terminal on the carbon atom side is bonded to R.

[化學式17]

Figure 02_image035
[Chemical formula 17]
Figure 02_image035

上述式中,n為0~14,m為1~8。在1個分子內存在複數個之R、T各自可以相同,亦可以不同。 由上述式(MO-1)~(MO-6)表示之各個化合物中,複數個R中的至少1個表示-OC(=O)CH=CH2 、-OC(=O)C(CH3 )=CH2 、-NHC(=O)CH=CH2 或-NHC(=O)C(CH3 )=CH2 。作為由上述式(MO-1)~(MO-6)表示之聚合性化合物的具體例,可列舉日本特開2007-269779號公報的段落0248~0251中記載之化合物。In the above formula, n is 0-14, and m is 1-8. A plurality of R and T may be the same or different from each other in one molecule. In each of the compounds represented by the above formulae (MO-1) to (MO-6), at least one of the plurality of R represents -OC(=O)CH=CH 2 , -OC(=O)C(CH 3 )=CH 2 , -NHC(=O)CH=CH 2 or -NHC(=O)C(CH 3 )=CH 2 . Specific examples of the polymerizable compounds represented by the above formulae (MO-1) to (MO-6) include compounds described in paragraphs 0248 to 0251 of JP 2007-269779 A.

又,作為聚合性單體,使用具有己內酯結構之化合物亦較佳。作為具有己內酯結構之化合物,並非特別限定於在分子內具有己內酯結構者,例如能夠列舉藉由將三羥甲基乙烷、二三羥甲基乙烷、三羥甲基丙烷、二三羥甲基丙烷、季戊四醇、二新戊四醇、三季戊四醇、甘油、二甘油、三羥甲基三聚氰胺等多元醇和(甲基)丙烯酸及ε-己內酯進行酯化來獲得之、ε-己內酯改性多官能(甲基)丙烯酸酯。具有己內酯結構之化合物為由下述式(Z-1)表示之化合物為較佳。Moreover, it is also preferable to use the compound which has a caprolactone structure as a polymerizable monomer. The compound having a caprolactone structure is not particularly limited to those having a caprolactone structure in the molecule, and examples thereof include trimethylolethane, ditrimethylolethane, trimethylolpropane, Ditrimethylolpropane, pentaerythritol, dipeptaerythritol, tripentaerythritol, glycerol, diglycerol, trimethylolmelamine and other polyols are esterified with (meth)acrylic acid and ε-caprolactone, ε -Caprolactone-modified polyfunctional (meth)acrylates. The compound having a caprolactone structure is preferably a compound represented by the following formula (Z-1).

[化學式18]

Figure 02_image037
[Chemical formula 18]
Figure 02_image037

式(Z-1)中,6個R均為由式(Z-2)表示之基團或6個R中1~5個為由式(Z-2)表示之基團,剩餘為由式(Z-3)表示之基團、酸基或羥基。In formula (Z-1), 6 Rs are all groups represented by formula (Z-2) or 1 to 5 of 6 Rs are groups represented by formula (Z-2), and the rest are groups represented by formula (Z-2) (Z-3) represents a group, an acid group or a hydroxyl group.

[化學式19]

Figure 02_image039
式(Z-2)中,R1 表示氫原子或甲基,m表示1或2的整數,“*”表示鍵結鍵。[Chemical formula 19]
Figure 02_image039
In formula (Z-2), R 1 represents a hydrogen atom or a methyl group, m represents an integer of 1 or 2, and "*" represents a bond.

[化學式20]

Figure 02_image041
式(Z-3)中,R1 表示氫原子或甲基,“*”表示鍵結鍵。[Chemical formula 20]
Figure 02_image041
In formula (Z-3), R 1 represents a hydrogen atom or a methyl group, and "*" represents a bond.

作為聚合性單體,亦可列舉由式(Z-4)或(Z-5)表示之化合物。As a polymerizable monomer, the compound represented by formula (Z-4) or (Z-5) can also be mentioned.

[化學式21]

Figure 02_image043
[Chemical formula 21]
Figure 02_image043

式(Z-4)及(Z-5)中,E各自獨立地表示-((CH2y CH2 O)-或-((CH2y CH(CH3 )O)-,y各自獨立地表示0~10的整數,X各自獨立地表示(甲基)丙烯醯基、氫原子或羧基。式(Z-4)中,(甲基)丙烯醯基合計為3個或4個,m各自獨立地表示0~10的整數,各m合計為0~40的整數。式(Z-5)中,(甲基)丙烯醯基合計為5個或6個,n各自獨立地表示0~10的整數,各n合計為0~60的整數。In formulas (Z-4) and (Z-5), E each independently represents -((CH 2 ) y CH 2 O)- or -((CH 2 ) y CH(CH 3 )O)-, and y each independently Each independently represents an integer of 0 to 10, and X each independently represents a (meth)acryloyl group, a hydrogen atom, or a carboxyl group. In formula (Z-4), the total number of (meth)acryloyl groups is 3 or 4, m each independently represents an integer of 0 to 10, and each m is an integer of 0 to 40 in total. In formula (Z-5), the total number of (meth)acryloyl groups is 5 or 6, n each independently represents an integer of 0 to 10, and each n is an integer of 0 to 60 in total.

式(Z-4)中,m為0~6的整數為較佳,0~4的整數為更佳。又,各m合計為2~40的整數為較佳,2~16的整數為更佳,4~8的整數為特佳。 式(Z-5)中,n為0~6的整數為較佳,0~4的整數為更佳。又,各n合計為3~60的整數為較佳,3~24的整數為更佳,6~12的整數為特佳。 又,式(Z-4)或式(Z-5)中的E亦即-((CH2y CH2 O)-或-((CH2y CH(CH3 )O)-為氧原子側的末端鍵結於X之形態為較佳。In formula (Z-4), m is preferably an integer of 0 to 6, more preferably an integer of 0 to 4. In addition, each m is preferably an integer of 2 to 40 in total, more preferably an integer of 2 to 16, and particularly preferably an integer of 4 to 8. In formula (Z-5), n is preferably an integer of 0 to 6, more preferably an integer of 0 to 4. In addition, each n is preferably an integer of 3 to 60 in total, more preferably an integer of 3 to 24, and particularly preferably an integer of 6 to 12. In addition, E in formula (Z-4) or formula (Z-5), that is, -((CH 2 ) y CH 2 O)- or -((CH 2 ) y CH(CH 3 )O)- is oxygen The form in which the terminal on the atom side is bonded to X is preferable.

作為聚合性單體,亦能夠使用具有伸烷基氧基之化合物。具有伸烷基氧基之聚合性單體為具有伸乙基氧基和/或伸丙基氧基之化合物為較佳,具有伸乙基氧基之化合物為更佳,具有4~20個伸乙基氧基之3~6官能(甲基)丙烯酸酯化合物為進一步較佳。作為具有伸烷基氧基之聚合性單體的市售品,例如可列舉SARTOMER公司製的具有4個乙烯氧基之4官能(甲基)丙烯酸酯之SR-494、具有3個異丁烯氧基之3官能(甲基)丙烯酸酯之KAYARAD TPA-330等。As the polymerizable monomer, a compound having an alkyleneoxy group can also be used. The polymerizable monomer having an alkyleneoxy group is preferably a compound having an ethylideneoxy group and/or a propylideneoxy group, more preferably a compound having an ethylideneoxy group, and has 4 to 20 extension groups. The 3- to 6-functional (meth)acrylate compound of an ethyloxy group is more preferable. As a commercial item of the polymerizable monomer which has an alkyleneoxy group, the SR-494 which has a tetrafunctional (meth)acrylate which has 4 vinyloxy groups made by SARTOMER, the SR-494 which has 3 isobutenyloxy groups is mentioned, for example The KAYARAD TPA-330 of the 3-functional (meth)acrylate, etc.

作為聚合性單體,亦可列舉日本特公昭48-041708號公報、日本特開昭51-037193號公報、日本特公平2-032293號公報、日本特公平2-016765號公報中記載之胺酯丙烯酸酯類和日本特公昭58-049860號公報、日本特公昭56-017654號公報、日本特公昭62-039417號公報、日本特公昭62-039418號公報中記載之具有環氧乙烷系骨架之胺酯化合物、日本特開昭63-277653號公報、日本特開昭63-260909號公報、日本特開平1-105238號公報中記載之在分子內具有胺結構和硫醚結構,使用該等化合物亦較佳。作為市售品,可列舉UA-7200(Shin Nakamura Chemical Co., Ltd.製)、DPHA-40H(Nippon Kayaku Co.,Ltd.製)、UA-306H、UA-306T、UA-306I、AH-600、T-600、AI-600(kyoeisha Chemical Co.,Ltd.製)等。 又,作為聚合性單體,使用8UH-1006、8UH-1012(以上為Taisei Fine Chemical Co., Ltd.製)、LIGHT ACRYLATE POB-A0(kyoeisha Chemical Co.,Ltd.製)等亦較佳。 又,作為聚合性單體,亦能夠使用日本特開2017-048367號公報、日本專利第6057891號公報、日本專利第6031807號公報中記載之化合物。Examples of the polymerizable monomer include urethanes described in Japanese Patent Publication No. 48-041708, Japanese Patent Publication No. 51-037193, Japanese Patent Publication No. 2-032293, and Japanese Patent Publication No. 2-016765. Acrylates and those having ethylene oxide-based skeletons described in Japanese Patent Publication No. 58-049860, Japanese Patent Publication No. 56-017654, Japanese Patent Publication No. 62-039417, and Japanese Patent Publication No. 62-039418 Amine ester compounds, described in Japanese Patent Laid-Open No. 63-277653, Japanese Patent Laid-Open No. 63-260909, and Japanese Patent Laid-Open No. Hei 1-105238, have an amine structure and a thioether structure in the molecule, and these compounds are used Also better. Commercially available products include UA-7200 (manufactured by Shin Nakamura Chemical Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH- 600, T-600, AI-600 (manufactured by Kyoeisha Chemical Co., Ltd.), and the like. In addition, as the polymerizable monomer, 8UH-1006, 8UH-1012 (the above are manufactured by Taisei Fine Chemical Co., Ltd.), LIGHT ACRYLATE POB-A0 (manufactured by Kyoeisha Chemical Co., Ltd.), etc. are also preferably used. Moreover, as a polymerizable monomer, the compound described in Unexamined-Japanese-Patent No. 2017-048367, Unexamined-Japanese-Patent No. 6057891, and Unexamined-Japanese-Patent No. 6031807 can also be used.

聚合性聚合物的重量平均分子量為3000以上為較佳,5000以上為更佳,7000以上為進一步較佳,10000以上為特佳。又,聚合性聚合物的重量平均分子量為50000以下為較佳,40000以下為更佳,30000以下為進一步較佳。The weight average molecular weight of the polymerizable polymer is preferably 3,000 or more, more preferably 5,000 or more, further preferably 7,000 or more, and particularly preferably 10,000 or more. In addition, the weight average molecular weight of the polymerizable polymer is preferably 50,000 or less, more preferably 40,000 or less, and even more preferably 30,000 or less.

聚合性聚合物的C=C當量(聚合性聚合物的分子量/聚合性聚合物中所含之乙烯性不飽和鍵結基的數)為100~5000為較佳。下限為150以上為較佳,200以上為更佳。上限為4500以下為較佳,4000以下為更佳。只要聚合性聚合物的C=C當量為上述範圍,則能夠有效地吸附到顏料活性面,從而能夠更顯著地抑制金屬偶氮顏料A的凝聚。The C=C equivalent of the polymerizable polymer (the molecular weight of the polymerizable polymer/the number of ethylenically unsaturated bond groups contained in the polymerizable polymer) is preferably 100 to 5,000. The lower limit is preferably 150 or more, and more preferably 200 or more. The upper limit is preferably 4500 or less, and more preferably 4000 or less. As long as the C=C equivalent of the polymerizable polymer is in the above range, it can be effectively adsorbed to the active surface of the pigment, and the aggregation of the metal azo pigment A can be suppressed more significantly.

聚合性聚合物包含在側鏈上具有乙烯性不飽和鍵結基之重複單元為較佳,包含由下述式(A-1-1)表示之重複單元為更佳。又,聚合性聚合物在聚合性聚合物的總重複單元中包含10莫耳%以上的具有乙烯性不飽和鍵結基之重複單元為較佳,包含10~80莫耳%為更佳,包含20~70莫耳%為進一步較佳。 [化學式22]

Figure 02_image045
式(A-1-1)中,X1 表示重複單元的主鏈,L1 表示單鍵或2價的連結基,Y1 表示乙烯性不飽和鍵結基。The polymerizable polymer preferably contains a repeating unit having an ethylenically unsaturated bond group in a side chain, and more preferably contains a repeating unit represented by the following formula (A-1-1). In addition, the polymerizable polymer preferably contains 10 mol% or more of repeating units having an ethylenically unsaturated bond group in the total repeating units of the polymerizable polymer, more preferably 10 to 80 mol%, including 20-70 mol% is more preferable. [Chemical formula 22]
Figure 02_image045
In formula (A-1-1), X 1 represents the main chain of the repeating unit, L 1 represents a single bond or a divalent linking group, and Y 1 represents an ethylenically unsaturated linking group.

式(A-1-1)中,作為X1 所表示之重複單元的主鏈,並無特別限定。只要是公知的由能夠聚合之單體形成之連接基,則並無特別限制。例如,可列舉聚(甲基)丙烯酸系連結基、聚伸烷基亞胺系連結基、聚酯系連結基、聚胺酯系連結基、聚脲系連結基、聚醯胺系連結基、聚醚系連結基、聚苯乙烯系連結基等,從原料素材的可得性和製造適合度的觀點考慮,聚(甲基)丙烯酸系連結基、聚伸烷基亞胺系連結基為較佳,聚(甲基)丙烯酸系連結基為更佳。In formula (A-1-1), the main chain of the repeating unit represented by X 1 is not particularly limited. There is no particular limitation as long as it is a known linking group formed from a polymerizable monomer. For example, a poly(meth)acrylic-based linking group, a polyalkyleneimide-based linking group, a polyester-based linking group, a polyurethane-based linking group, a polyurea-based linking group, a polyamide-based linking group, and a polyether From the viewpoints of availability of raw materials and suitability for production, poly(meth)acrylic acid-based linking groups and polyalkyleneimine-based linking groups are preferred as linking groups, polystyrene-based linking groups, and the like. A poly(meth)acrylic linking group is more preferable.

式(A-1-1)中,作為L1 所表示之2價的連結基,可列舉伸烷基(較佳為碳數1~12的伸烷基)、伸烷基氧基(較佳為碳數1~12的伸烷基氧基)、氧化烯基羰基(較佳為碳數1~12的氧化烯基羰基)、伸芳基(較佳為碳數6~20的伸芳基)、-NH-、-SO-、-SO2 -、-CO-、-O-、-COO-、OCO-、-S-及組合2個以上該等而成之基團。In the formula (A-1-1), the divalent linking group represented by L 1 includes an alkylene group (preferably an alkylene group having 1 to 12 carbon atoms), an alkyleneoxy group (preferably an alkylene group having 1 to 12 carbon atoms). alkylene oxy with 1 to 12 carbon atoms), oxyalkylenecarbonyl (preferably oxyalkylene carbonyl with 1 to 12 carbons), aryl extended (preferably aryl extended with 6 to 20 carbons) ), -NH-, -SO-, -SO 2 -, -CO-, -O-, -COO-, OCO-, -S-, and groups formed by combining two or more of them.

式(A-1-1)中,作為Y1 所表示之乙烯性不飽和鍵結基,可列舉乙烯基、(甲基)烯丙基、(甲基)丙烯醯基等,(甲基)丙烯醯基為較佳,丙烯醯基為更佳。In the formula (A-1-1), examples of the ethylenically unsaturated bond group represented by Y 1 include vinyl, (meth)allyl, (meth)acryloyl, and the like, (methyl) Acryloyl group is preferable, and acryl group is more preferable.

聚合性聚合物進一步包含具有接枝鏈之重複單元為較佳。藉由聚合性聚合物包含具有接枝鏈之重複單元,能夠藉由基於接枝鏈之位阻效應來更有效地抑制金屬偶氮顏料A等的凝聚等。聚合性聚合物在聚合性聚合物的總重複單元中含有1.0~60莫耳%的具有接枝鏈之重複單元為較佳,含有1.5~50莫耳%為更佳。作為分散劑較佳地使用含有具有接枝鏈之重複單元之聚合性聚合物。It is preferable that the polymerizable polymer further contains repeating units having a graft chain. When the polymerizable polymer includes a repeating unit having a graft chain, aggregation of the metal azo pigment A and the like can be more effectively suppressed by the steric hindrance effect based on the graft chain. The polymerizable polymer preferably contains 1.0 to 60 mol% of repeating units having a graft chain in the total repeating units of the polymerizable polymer, more preferably 1.5 to 50 mol%. As the dispersing agent, a polymerizable polymer containing a repeating unit having a graft chain is preferably used.

本發明中,接枝鏈表示從重複單元的主鏈支化而伸展之聚合物鏈。接枝鏈的長度並無特別限制,若接枝鏈變長,則立體排斥效果增強,從而能夠提高金屬偶氮顏料A等的分散性。作為接枝鏈,除了氫原子之外之原子數為40~10000為較佳,除了氫原子之外之原子數為50~2000為更佳,除了氫原子之外之原子數為60~500為進一步較佳。In the present invention, the graft chain refers to a polymer chain branched and extended from the main chain of the repeating unit. The length of the graft chain is not particularly limited, but when the graft chain becomes longer, the steric repulsion effect is enhanced, and the dispersibility of the metal azo pigment A and the like can be improved. As the graft chain, the number of atoms other than hydrogen atoms is preferably 40 to 10,000, the number of atoms other than hydrogen atoms is more preferably 50 to 2,000, and the number of atoms other than hydrogen atoms is preferably 60 to 500. Further preferred.

聚合性聚合物所具有之接枝鏈包含選自聚酯結構、聚醚結構、聚(甲基)丙烯結構、聚胺酯結構、聚脲結構及聚醯胺結構之至少1種結構為較佳,包含選自聚酯結構、聚醚結構及聚(甲基)丙烯結構之至少1種結構為更佳,包含聚酯結構為進一步較佳。作為聚酯結構,可列舉由下述式(G-1)、式(G-4)或式(G-5)表示之結構。又,作為聚醚結構,可列舉由下述式(G-2)表示之結構。又,作為聚(甲基)丙烯結構,可列舉由下述式(G-3)表示之結構。 [化學式23]

Figure 02_image047
Preferably, the graft chain of the polymerizable polymer comprises at least one structure selected from the group consisting of polyester structure, polyether structure, poly(meth)propylene structure, polyurethane structure, polyurea structure and polyamide structure, including At least one structure selected from a polyester structure, a polyether structure and a poly(meth)propylene structure is more preferable, and it is further preferable to include a polyester structure. As a polyester structure, the structure represented by following formula (G-1), formula (G-4), or formula (G-5) is mentioned. Moreover, as a polyether structure, the structure represented by following formula (G-2) is mentioned. Moreover, as a poly(meth)propylene structure, the structure represented by following formula (G-3) is mentioned. [Chemical formula 23]
Figure 02_image047

上述式中,RG1 及RG2 分別表示伸烷基。作為由RG1 及RG2 表示之伸烷基並無特別限制,碳數1~20的直鏈狀或支鏈狀的伸烷基為較佳,碳數2~16的直鏈狀或支鏈狀的伸烷基為更佳,碳數3~12的直鏈狀或支鏈狀的伸烷基為進一步較佳。 上述式中,RG3 表示氫原子或甲基。 上述式中,QG1 表示-O-或-NH-,LG1 表示單鍵或2價的連結基。作為2價的連結基,可列舉伸烷基(較佳為碳數1~12的伸烷基)、伸烷基氧基(較佳為碳數1~12的伸烷基氧基)、氧化烯基羰基(較佳為碳數1~12的氧化烯基羰基)、伸芳基(較佳為碳數6~20的伸芳基)、-NH-、-SO-、-SO2 -、-CO-、-O-、-COO-、OCO-、-S-及組合2個以上該等而成之基團。 上述式中,RG4 表示氫原子或取代基。作為取代基,可列舉烷基、芳基、雜芳基、烷氧基、芳氧基、雜芳氧基、烷硫基醚基、芳硫基醚基、雜芳硫基醚基等。In the above formula, R G1 and R G2 each represent an alkylene group. The alkylene group represented by R G1 and R G2 is not particularly limited, but a linear or branched alkylene group having 1 to 20 carbon atoms is preferable, and a linear or branched alkyl group having 2 to 16 carbon atoms is preferable. A linear or branched alkylene group having 3 to 12 carbon atoms is more preferable. In the above formula, R G3 represents a hydrogen atom or a methyl group. In the above formula, Q G1 represents -O- or -NH-, and L G1 represents a single bond or a divalent linking group. Examples of the divalent linking group include an alkylene group (preferably an alkylene group having 1 to 12 carbon atoms), an alkyleneoxy group (preferably an alkylene group having 1 to 12 carbon atoms), an oxyalkylene group. Alkenylcarbonyl (preferably oxyalkylenecarbonyl with 1 to 12 carbons), aryl extended (preferably with 6 to 20 carbons), -NH-, -SO-, -SO 2 -, -CO-, -O-, -COO-, OCO-, -S- and groups formed by combining two or more of them. In the above formula, R G4 represents a hydrogen atom or a substituent. As a substituent, an alkyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an alkylthio ether group, an arylthio ether group, a heteroarylthio ether group, etc. are mentioned.

作為接枝鏈的末端結構,並無特別限定。可以是氫原子,亦可以是取代基。作為取代基,可列舉烷基、芳基、雜芳基、烷氧基、芳氧基、雜芳氧基、烷硫基醚基、芳硫基醚基、雜芳硫基醚基等。其中,從提高色材等的分散性的觀點考慮,具有立體排斥效果之基團為較佳,碳數5~24的烷基或烷氧基為較佳。烷基及烷氧基可以是直鏈狀、支鏈狀及環狀中的任一個,直鏈狀或支鏈狀為較佳。The terminal structure of the graft chain is not particularly limited. It may be a hydrogen atom or a substituent. As a substituent, an alkyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an alkylthio ether group, an arylthio ether group, a heteroarylthio ether group, etc. are mentioned. Among them, from the viewpoint of improving the dispersibility of the color material and the like, a group having a steric repulsion effect is preferable, and an alkyl group or an alkoxy group having 5 to 24 carbon atoms is preferable. The alkyl group and the alkoxy group may be linear, branched, or cyclic, and linear or branched is preferred.

本發明中,作為接枝鏈,由下述式(G-1a)、式(G-2a)、式(G-3a)、式(G-4a)或式(G-5a)表示之結構為較佳。 [化學式24]

Figure 02_image049
In the present invention, as the graft chain, the structure represented by the following formula (G-1a), formula (G-2a), formula (G-3a), formula (G-4a) or formula (G-5a) is: better. [Chemical formula 24]
Figure 02_image049

上述式中,RG1 及RG2 分別表示伸烷基,RG3 表示氫原子或甲基,QG1 表示-O-或-NH-,LG1 表示單鍵或2價的連結基,RG4 表示氫原子或取代基,W100 表示氫原子或取代基。n1~n5分別獨立地表示2以上的整數。RG1 ~RG4 、QG1 、LG1 與在式(G-1)~(G-5)中說明之RG1 ~RG4 、QG1 、LG1 含義相同,較佳範圍亦相同。In the above formula, R G1 and R G2 respectively represent an alkylene group, R G3 represents a hydrogen atom or a methyl group, Q G1 represents -O- or -NH-, L G1 represents a single bond or a divalent linking group, and R G4 represents A hydrogen atom or a substituent, W 100 represents a hydrogen atom or a substituent. n1 to n5 each independently represent an integer of 2 or more. R G1 to R G4 , Q G1 , and L G1 have the same meanings as R G1 to R G4 , Q G1 , and L G1 described in the formulae (G-1) to (G-5), and the preferred ranges are also the same.

式(G-1a)~(G-5a)中,W100 為取代基為較佳。作為取代基,可列舉烷基、芳基、雜芳基、烷氧基、芳氧基、雜芳氧基、烷硫基醚基、芳硫基醚基、雜芳硫基醚基等。其中,從提高色材等的分散性的觀點考慮,具有立體排斥效果之基團為較佳,碳數5~24的烷基或烷氧基為較佳。烷基及烷氧基可以是直鏈狀、支鏈狀及環狀中的任一個,直鏈狀或支鏈狀為較佳。In the formulae (G-1a) to (G-5a), it is preferable that W 100 is a substituent. As a substituent, an alkyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an alkylthio ether group, an arylthio ether group, a heteroarylthio ether group, etc. are mentioned. Among them, from the viewpoint of improving the dispersibility of the color material and the like, a group having a steric repulsion effect is preferable, and an alkyl group or an alkoxy group having 5 to 24 carbon atoms is preferable. The alkyl group and the alkoxy group may be linear, branched, or cyclic, and linear or branched is preferred.

式(G-1a)~(G-5a)中,n1~n5分別獨立地表示2以上的整數,3以上為更佳,5以上為進一步較佳。上限例如為100以下為較佳,80以下為更佳,60以下為進一步較佳。In the formulae (G-1a) to (G-5a), n1 to n5 each independently represent an integer of 2 or more, more preferably 3 or more, and even more preferably 5 or more. For example, the upper limit is preferably 100 or less, more preferably 80 or less, and even more preferably 60 or less.

作為具有接枝鏈之重複單元,可列舉由下述式(A-1-2)表示之重複單元。 [化學式25]

Figure 02_image051
As a repeating unit which has a graft chain, the repeating unit represented by following formula (A-1-2) is mentioned. [Chemical formula 25]
Figure 02_image051

式(A-1-2)中,X2 表示重複單元的主鏈,L2 表示單鍵或2價的連結基,W1 表示接枝鏈。In formula (A-1-2), X 2 represents the main chain of the repeating unit, L 2 represents a single bond or a divalent linking group, and W 1 represents a graft chain.

作為式(A-1-2)中之X2 所表示之重複單元的主鏈,可列舉在式(A-1-1)的X1 中說明之結構,較佳範圍亦相同。作為式(A-1-2)中之L2 所表示之2價的連結基,可列舉伸烷基(較佳為碳數1~12的伸烷基)、伸芳基(較佳為碳數6~20的伸芳基)、-NH-、-SO-、-SO2 -、-CO-、-O-、-COO-、OCO-、-S-及組合2個以上該等而成之基團。作為式(A-1-2)中之W1 所表示之接枝鏈,可列舉上述接枝鏈。As the main chain of the repeating unit represented by X 2 in the formula (A-1-2), the structures described for X 1 in the formula (A-1-1) can be mentioned, and the preferred range is also the same. Examples of the divalent linking group represented by L 2 in the formula (A-1-2) include an alkylene group (preferably an alkylene group having 1 to 12 carbon atoms), an arylidene group (preferably a carbon 6-20 aryl groups), -NH-, -SO-, -SO 2 -, -CO-, -O-, -COO-, OCO-, -S-, and combinations of two or more of these the group. Examples of the graft chain represented by W 1 in the formula (A-1-2) include the above-mentioned graft chains.

聚合性聚合物包含具有接枝鏈之重複單元時,具有接枝鏈之重複單元的重量平均分子量(Mw)為1000以上為較佳,1000~10000為更佳,1000~7500為進一步較佳。另外,本發明中,具有接枝鏈之重複單元的重量平均分子量為依據在該重複單元的聚合中使用之原料單體的重量平均分子量計算之值。例如,具有接枝鏈之重複單元能夠藉由聚合大分子單體來形成。在此,大分子單體表示在聚合物末端導入有聚合性基團之高分子化合物。使用大分子單體來形成具有接枝鏈之重複單元時,大分子單體的重量平均分子量相當於具有接枝鏈之重複單元的重量平均分子量。When the polymerizable polymer contains a repeating unit having a graft chain, the weight average molecular weight (Mw) of the repeating unit having a graft chain is preferably 1,000 or more, more preferably 1,000 to 10,000, and even more preferably 1,000 to 7,500. Moreover, in this invention, the weight average molecular weight of the repeating unit which has a graft chain is a value calculated based on the weight average molecular weight of the raw material monomer used for the polymerization of this repeating unit. For example, repeating units with grafted chains can be formed by polymerizing macromonomers. Here, the macromonomer refers to a polymer compound having a polymerizable group introduced into a polymer terminal. When a macromonomer is used to form a repeating unit having a graft chain, the weight average molecular weight of the macromonomer corresponds to the weight average molecular weight of the repeating unit having a graft chain.

聚合性聚合物進一步包含具有酸基之重複單元亦較佳。藉由聚合性聚合物進一步包含具有酸基之重複單元,能夠進一步提高金屬偶氮顏料A等的分散性。此外,還能夠提高顯影性。作為酸基,可列舉羧基、磺基、磷酸基。It is also preferable that the polymerizable polymer further contains a repeating unit having an acid group. When the polymerizable polymer further includes a repeating unit having an acid group, the dispersibility of the metal azo pigment A and the like can be further improved. In addition, developability can also be improved. Examples of the acid group include a carboxyl group, a sulfo group, and a phosphoric acid group.

作為具有酸基之重複單元,可列舉由下述式(A-1-3)表示之重複單元。 [化學式26]

Figure 02_image053
As a repeating unit which has an acid group, the repeating unit represented by following formula (A-1-3) is mentioned. [Chemical formula 26]
Figure 02_image053

式(A-1-3)中,X3 表示重複單元的主鏈,L3 表示單鍵或2價的連結基,A1 表示酸基。In formula (A-1-3), X 3 represents the main chain of the repeating unit, L 3 represents a single bond or a divalent linking group, and A 1 represents an acid group.

作為式(A-1-3)中之X3 所表示之重複單元的主鏈,可列舉在式(A-1-1)的X1 中說明之結構,較佳範圍亦相同。 作為式(A-1-3)中之L3 所表示之2價的連結基,可列舉伸烷基(較佳為碳數1~12的伸烷基)、亞烷基氧基(較佳為碳數2~12的亞烷基氧基)、伸烷基氧基(較佳為碳數1~12的伸烷基氧基)、氧化烯基羰基(較佳為碳數1~12的氧化烯基羰基)、伸芳基(較佳為碳數6~20的伸芳基)、-NH-、-SO-、-SO2 -、-CO-、-O-、-COO-、OCO-、-S-及組合2個以上該等而成之基團。伸烷基、伸烷基氧基中之伸烷基、氧化烯基羰基中之伸烷基可以是直鏈狀、支鏈狀及環狀中的任一個,直鏈狀或支鏈狀為較佳。又,伸烷基、伸烷基氧基中之伸烷基、氧化烯基羰基中之伸烷基可以具有取代基,亦可以不被取代。作為取代基,可列舉羥基等。 作為式(A-1-3)中之A1 所表示之酸基,可列舉羧基、磺基、磷酸基。As the main chain of the repeating unit represented by X 3 in the formula (A-1-3), the structures described for X 1 in the formula (A-1-1) can be exemplified, and the preferred range is also the same. Examples of the divalent linking group represented by L 3 in the formula (A-1-3) include an alkylene group (preferably an alkylene group having 1 to 12 carbon atoms), an alkyleneoxy group (preferably an alkylene group having 1 to 12 carbon atoms). is an alkyleneoxy group having 2 to 12 carbon atoms), an alkyleneoxy group (preferably an alkyleneoxy group having 1 to 12 carbon atoms), an oxyalkylenecarbonyl group (preferably an alkylene group having 1 to 12 carbon atoms) oxyalkylene carbonyl), aryl extended (preferably aryl extended with 6 to 20 carbon atoms), -NH-, -SO-, -SO 2 -, -CO-, -O-, -COO-, OCO -, -S-, and a group formed by combining two or more of these. The alkylene group in the alkylene group, the alkylene group in the alkylene groupoxy, and the alkylene group in the oxyalkylene carbonyl group can be any one of straight chain, branched chain and cyclic, and the straight chain or branched chain is relatively good. In addition, the alkylene group in the alkylene group, the alkylene group in the alkylene groupoxy, and the alkylene group in the oxyalkylene carbonyl group may have a substituent or may not be substituted. As a substituent, a hydroxyl group etc. are mentioned. Examples of the acid group represented by A 1 in the formula (A-1-3) include a carboxyl group, a sulfo group, and a phosphoric acid group.

聚合性聚合物的酸值為20~150mgKOH/g為較佳。上限為100mgKOH/g以下為更佳。下限為30mgKOH/g以上為較佳,35mgKOH/g以上為更佳。只要聚合性聚合物的酸值為上述範圍,則容易獲得尤其優異的分散性。此外,容易獲得優異的顯影性。The acid value of the polymerizable polymer is preferably 20 to 150 mgKOH/g. The upper limit is more preferably 100 mgKOH/g or less. The lower limit is preferably 30 mgKOH/g or more, and more preferably 35 mgKOH/g or more. As long as the acid value of the polymerizable polymer is within the above-mentioned range, particularly excellent dispersibility can be easily obtained. In addition, excellent developability is easily obtained.

又,聚合性聚合物作為其他重複單元能夠包含如下重複單元,該重複單元來自於含有由下述式(ED1)表示之化合物和/或由下述式(ED2)表示之化合物(以下,有時亦將該等化合物稱為“醚二聚物”。)之單體成分。In addition, the polymerizable polymer can contain, as another repeating unit, a repeating unit derived from a compound represented by the following formula (ED1) and/or a compound represented by the following formula (ED2) (hereinafter, sometimes These compounds are also referred to as "ether dimers".) monomer components.

[化學式27]

Figure 02_image055
[Chemical formula 27]
Figure 02_image055

式(ED1)中,R1 及R2 分別獨立地表示氫原子或可以具有取代基之碳原子數1~25的烴基。 [化學式28]

Figure 02_image057
式(ED2)中,R表示氫原子或碳數1~30的有機基團。作為式(ED2)的具體例,能夠參閱日本特開2010-168539號公報中的記載。In formula (ED1), R 1 and R 2 each independently represent a hydrogen atom or an optionally substituted hydrocarbon group having 1 to 25 carbon atoms. [Chemical formula 28]
Figure 02_image057
In formula (ED2), R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms. As a specific example of Formula (ED2), the description in Unexamined-Japanese-Patent No. 2010-168539 can be referred to.

作為醚二聚體的具體例,例如,能夠參閱日本特開2013-029760號公報的段落號0317,該內容被併入本說明書中。醚二聚物可以是僅1種,亦可以是2種以上。As a specific example of the ether dimer, for example, paragraph No. 0317 of JP 2013-029760 A can be referred to, the content of which is incorporated in the present specification. Only one type of ether dimer may be used, or two or more types may be used.

作為聚合性聚合物的具體例,可列舉以下。 [化學式29]

Figure 02_image059
Specific examples of the polymerizable polymer include the following. [Chemical formula 29]
Figure 02_image059

(具有環狀醚基之化合物) 作為在本發明中使用之具有環狀醚基之化合物,可列舉在1個分子內具有2個以上的環狀醚基之化合物。具有環狀醚基之化合物中所含之環狀醚基的數為100個以下為較佳,10個以下為更佳,5個以下為進一步較佳。作為環狀醚基,可列舉環氧基、氧雜環丁基等,環氧基為較佳。亦即,具有環狀醚基之化合物為具有環氧基之化合物(以下,亦稱為環氧化合物)為較佳。(Compound which has a cyclic ether group) As a compound which has a cyclic ether group used for this invention, the compound which has two or more cyclic ether groups in 1 molecule is mentioned. The number of cyclic ether groups contained in the compound having a cyclic ether group is preferably 100 or less, more preferably 10 or less, and even more preferably 5 or less. As a cyclic ether group, an epoxy group, an oxetanyl group, etc. are mentioned, An epoxy group is preferable. That is, it is preferable that the compound having a cyclic ether group is a compound having an epoxy group (hereinafter, also referred to as an epoxy compound).

環氧化合物的環氧當量(=具有環氧基之化合物的分子量/環氧基的數)為500以下為較佳,100~400為更佳,100~300為進一步較佳。環氧化合物可以是低分子化合物(例如分子量小於1000),亦可以是高分子化合物(macromolecule)(例如,分子量1000以上,為聚合物時,重量平均分子量為1000以上)。環氧化合物的分子量(為聚合物時,重量平均分子量)為200~100000為較佳,500~50000為更佳。分子量(為聚合物時,重量平均分子量)的上限為3000以下為較佳,2000以下為更佳,1500以下為進一步較佳。The epoxy equivalent of the epoxy compound (=the molecular weight of the compound having an epoxy group/the number of epoxy groups) is preferably 500 or less, more preferably 100 to 400, and even more preferably 100 to 300. The epoxy compound may be a low molecular weight compound (for example, a molecular weight of less than 1000) or a macromolecule compound (for example, a molecular weight of 1000 or more, and in the case of a polymer, the weight average molecular weight is 1000 or more). The molecular weight of the epoxy compound (in the case of a polymer, the weight average molecular weight) is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the molecular weight (in the case of a polymer, the weight average molecular weight) is preferably 3,000 or less, more preferably 2,000 or less, and even more preferably 1,500 or less.

環氧化合物能夠使用日本特開2013-011869號公報的段落號0034~0036、日本特開2014-043556號公報的段落號0147~0156、日本特開2014-089408號公報的段落號0085~0092中所記載之化合物。該等內容被併入本說明書中。作為環氧化合物的市售品,例如作為雙酚A型環氧樹脂,為jER825、jER827、jER828、jER834、jER1001、jER1002、jER1003、jER1055、jER1007、jER1009、jER1010(以上為Mitsubishi Chemical Corporation製)、EPICLON860、EPICLON1050、EPICLON1051、EPICLON1055(以上為DIC CORPORATION製)等,作為雙酚F型環氧樹脂,為jER806、jER807、jER4004、jER4005、jER4007、jER4010(以上為Mitsubishi Chemical Corporation製)、EPICLON830、EPICLON835(以上為DIC CORPORATION製)、LCE-21、RE-602S(以上為NIPPON KAYAKU CO.,LTD.製)等,作為苯酚酚醛清漆型環氧樹脂,為jER152、jER154、jER157S70、jER157S65(以上為Mitsubishi Chemical Corporation製)、EPICLON N-740、EPICLON N-770、EPICLON N-775(以上為DIC CORPORATION製)等,作為甲酚酚醛清漆型環氧樹脂,為EPICLON N-660、EPICLON N-665、EPICLON N-670、EPICLON N-673、EPICLON N-680、EPICLON N-690、EPICLON N-695(以上為DIC CORPORATION製)、EOCN-1020(NIPPON KAYAKU CO.,LTD.製)等,作為脂肪環氧樹脂,為ADEKA RESIN EP-4080S、ADEKA RESIN EP-4085S、ADEKA RESIN EP-4088S(以上為ADEKA CORPORATION製)、CELLOXIDE 2021P、CELLOXIDE 2081、CELLOXIDE 2083、CELLOXIDE 2085、EHPE3150、EPOLEAD PB 3600、EPOLEAD PB 4700(以上為Daicel Corporation製)、Denacol EX-212L、EX-214L、EX-216L、EX-321L、EX-850L(以上為Nagase Chemtex Corporation)等。此外,可列舉ADEKA RESIN EP-4000S、ADEKA RESIN EP-4003S、ADEKA RESIN EP-4010S、ADEKA RESIN EP-4011S(以上為ADEKA CORPORATION製)、NC-2000、NC-3000、NC-7300、XD-1000、EPPN-501、EPPN-502(以上為ADEKA CORPORATION製)、jER1031S(Mitsubishi Chemical Corporation製)、MARPROOF G-0150M、G-0105SA、G-0130SP、G-0250SP、G-1005S、G-1005SA、G-1010S、G-2050M、G-01100、G-01758(以上為NOF CORPORATION.製、含環氧基的聚合物)等。As the epoxy compound, the paragraph numbers 0034 to 0036 of JP 2013-011869 A, the paragraph numbers 0147 to 0156 of JP 2014-043556 A, and the paragraph numbers 0085 to 0092 of JP 2014-089408 A can be used. Compounds described. These contents are incorporated into this specification. Commercially available epoxy compounds include jER825, jER827, jER828, jER834, jER1001, jER1002, jER1003, jER1055, jER1007, jER1009, jER1010 (manufactured by Mitsubishi Chemical Corporation), EPICLON860, EPICLON1050, EPICLON1051, EPICLON1055 (the above are manufactured by DIC CORPORATION), etc. As bisphenol F type epoxy resins, jER806, jER807, jER4004, jER4005, jER4007, jER4010 (the above are manufactured by Mitsubishi Chemical Corporation), EPICLON830, EPICLON835 ( The above are made by DIC CORPORATION), LCE-21, RE-602S (the above are made by NIPPON KAYAKU CO., LTD.), etc., as phenol novolak epoxy resins, jER152, jER154, jER157S70, jER157S65 (the above are Mitsubishi Chemical Corporation), EPICLON N-740, EPICLON N-770, EPICLON N-775 (the above are manufactured by DIC CORPORATION), etc., as cresol novolak epoxy resins, EPICLON N-660, EPICLON N-665, EPICLON N As fatty epoxy resin , for ADEKA RESIN EP-4080S, ADEKA RESIN EP-4085S, ADEKA RESIN EP-4088S (made by ADEKA CORPORATION), CELLOXIDE 2021P, CELLOXIDE 2081, CELLOXIDE 2083, CELLOXIDE 2085, EHPE3150, EPOLEAD PB 3600, EPOLEAD PB 4700 Daicel Corporation), Denacol EX-212L, EX-214L, EX-216L, EX-321L, EX-850L (the above are Nagase Ch emtex Corporation), etc. In addition, ADEKA RESIN EP-4000S, ADEKA RESIN EP-4003S, ADEKA RESIN EP-4010S, ADEKA RESIN EP-4011S (the above are manufactured by ADEKA CORPORATION), NC-2000, NC-3000, NC-7300, XD-1000 , EPPN-501, EPPN-502 (the above are manufactured by ADEKA CORPORATION), jER1031S (manufactured by Mitsubishi Chemical Corporation), MARPROOF G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G -1010S, G-2050M, G-01100, G-01758 (the above are NOF CORPORATION. manufactured, epoxy group-containing polymers) and the like.

本發明的組成物中,具有乙烯性不飽和鍵結基之化合物的含量在組成物的總固體成分中為1~50質量%為較佳。下限為3質量%以上為較佳,5質量%以上為更佳。上限為45質量%以下為較佳,40質量%以下為更佳。又,具有乙烯性不飽和鍵結基之化合物的含量相對於上述金屬偶氮顏料A的100質量份為30質量份以上為較佳,40質量份以上為更佳,50質量份以上為進一步較佳。上限為750質量份以下為較佳,700質量份以下為更佳,650質量份以下為進一步較佳,600質量份以下為特佳。只要金屬偶氮顏料A與具有乙烯性不飽和鍵結基之化合物的比例在上述範圍,則可更顯著地獲得本發明的效果。又,作為具有乙烯性不飽和鍵結基之化合物,併用聚合性單體與聚合性聚合物時,聚合性聚合物的含量相對於聚合性單體的100質量份為5~500質量份為較佳。下限為8質量份以上為較佳,10質量份以上為更佳。上限為450質量份以下為較佳,400質量份以下為更佳。In the composition of the present invention, the content of the compound having an ethylenically unsaturated bond group is preferably 1 to 50% by mass in the total solid content of the composition. The lower limit is preferably 3 mass % or more, and more preferably 5 mass % or more. The upper limit is preferably 45 mass % or less, more preferably 40 mass % or less. In addition, the content of the compound having an ethylenically unsaturated bond group is preferably 30 parts by mass or more, more preferably 40 parts by mass or more, and still more preferably 50 parts by mass or more with respect to 100 parts by mass of the metal azo pigment A. good. The upper limit is preferably 750 parts by mass or less, more preferably 700 parts by mass or less, more preferably 650 parts by mass or less, and particularly preferably 600 parts by mass or less. As long as the ratio of the metal azo pigment A to the compound having an ethylenically unsaturated bond group is within the above range, the effect of the present invention can be more remarkably obtained. Furthermore, when a polymerizable monomer and a polymerizable polymer are used in combination as a compound having an ethylenically unsaturated bond group, the content of the polymerizable polymer is preferably 5 to 500 parts by mass relative to 100 parts by mass of the polymerizable monomer. good. The lower limit is preferably 8 parts by mass or more, and more preferably 10 parts by mass or more. The upper limit is preferably 450 parts by mass or less, more preferably 400 parts by mass or less.

本發明的組成物中,具有環狀醚基之化合物的含量在組成物的總固體成分中為1~50質量%為較佳。下限為3質量%以上為較佳,5質量%以上為更佳。上限為45質量%以下為較佳,40質量%以下為更佳。又,具有環狀醚基之化合物的含量相對於上述金屬偶氮顏料A的100質量份為30質量份以上為較佳,40質量份以上為更佳,50質量份以上為進一步較佳。上限為750質量份以下為較佳,700質量份以下為更佳,650質量份以下為進一步較佳,600質量份以下為特佳。只要金屬偶氮顏料A與具有環狀醚基之化合物的比例在上述範圍,則可更顯著地獲得本發明的效果。In the composition of the present invention, the content of the compound having a cyclic ether group is preferably 1 to 50% by mass in the total solid content of the composition. The lower limit is preferably 3 mass % or more, and more preferably 5 mass % or more. The upper limit is preferably 45 mass % or less, more preferably 40 mass % or less. The content of the compound having a cyclic ether group is preferably 30 parts by mass or more, more preferably 40 parts by mass or more, and even more preferably 50 parts by mass or more, relative to 100 parts by mass of the metal azo pigment A. The upper limit is preferably 750 parts by mass or less, more preferably 700 parts by mass or less, more preferably 650 parts by mass or less, and particularly preferably 600 parts by mass or less. As long as the ratio of the metal azo pigment A to the compound having a cyclic ether group is within the above range, the effects of the present invention can be more remarkably obtained.

本發明的組成物中,具有乙烯性不飽和鍵結基之化合物與具有環狀醚基之化合物的合計含量在組成物的總固體成分中為1~50質量%為較佳。下限為3質量%以上為較佳,5質量%以上為更佳。上限為45質量%以下為較佳,40質量%以下為更佳。又,具有乙烯性不飽和鍵結基之化合物與具有環狀醚基之化合物的合計含量相對於上述金屬偶氮顏料A的100質量份為30質量份以上為較佳,40質量份以上為更佳,50質量份以上為進一步較佳。上限為750質量份以下為較佳,700質量份以下為更佳,650質量份以下為進一步較佳,600質量份以下為特佳。只要含量在上述範圍,則可更顯著地獲得本發明的效果。又,本發明的組成物含有具有乙烯性不飽和鍵結基之化合物與具有環狀醚基之化合物時,相對於具有乙烯性不飽和鍵結基之化合物100質量份含有1~50質量份的具有環狀醚基之化合物為較佳。上限為40質量份以下為較佳,30質量份以下為更佳。下限為5質量份以上為較佳,7質量份以上為更佳,10質量份以上為進一步較佳。In the composition of the present invention, the total content of the compound having an ethylenically unsaturated bond group and the compound having a cyclic ether group is preferably 1 to 50% by mass in the total solid content of the composition. The lower limit is preferably 3 mass % or more, and more preferably 5 mass % or more. The upper limit is preferably 45 mass % or less, more preferably 40 mass % or less. In addition, the total content of the compound having an ethylenically unsaturated bond group and the compound having a cyclic ether group is preferably 30 parts by mass or more, more preferably 40 parts by mass or more, with respect to 100 parts by mass of the metal azo pigment A. Preferably, 50 parts by mass or more is further preferable. The upper limit is preferably 750 parts by mass or less, more preferably 700 parts by mass or less, more preferably 650 parts by mass or less, and particularly preferably 600 parts by mass or less. As long as the content is within the above-mentioned range, the effect of the present invention can be obtained more remarkably. Furthermore, when the composition of the present invention contains a compound having an ethylenically unsaturated bond group and a compound having a cyclic ether group, it contains 1 to 50 parts by mass relative to 100 parts by mass of the compound having an ethylenically unsaturated bond group. Compounds having a cyclic ether group are preferred. The upper limit is preferably 40 parts by mass or less, more preferably 30 parts by mass or less. The lower limit is preferably 5 parts by mass or more, more preferably 7 parts by mass or more, and still more preferably 10 parts by mass or more.

<<其他樹脂>> 本發明的組成物能夠進一步含有上述硬化性化合物以外的樹脂(以下,亦稱為其他樹脂)。其他樹脂例如以使顏料等粒子分散於組成物中之用途或黏合劑的用途摻合。另外,將主要為了使顏料等的粒子分散而使用之樹脂亦稱為分散劑。但是,如樹脂之類的用途為一例,亦能夠以該種用途以外的目的使用樹脂。<<Other resins>> The composition of the present invention can further contain resins other than the above-mentioned curable compounds (hereinafter, also referred to as other resins). Other resins are blended, for example, for the purpose of dispersing particles such as pigments in the composition or for the purpose of a binder. In addition, resins used mainly for dispersing particles such as pigments are also referred to as dispersants. However, the application such as resin is an example, and resin can be used for purposes other than such applications.

其他樹脂的重量平均分子量(Mw)為2000~2000000為較佳。上限為1000000以下為較佳,500000以下為更佳。下限為3000以上為較佳,5000以上為更佳。The weight average molecular weight (Mw) of other resins is preferably 2,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit is preferably 3,000 or more, and more preferably 5,000 or more.

作為其他樹脂,可列舉(甲基)丙烯酸樹脂、烯-硫醇樹脂、聚碳酸酯樹脂、聚醚樹脂、聚芳酯樹脂、聚碸樹脂、聚醚碸樹脂、聚苯樹脂、聚伸芳基醚氧化膦樹脂、聚醯亞胺樹脂、聚醯胺醯亞胺樹脂、聚烯烴樹脂、環狀烯烴樹脂、聚酯樹脂、苯乙烯樹脂等。亦可以使用該等樹脂中的1種,亦可以混合使用2種以上。又,樹脂能夠使用國際公開WO2016/088645號公報的實施例中記載之樹脂、日本特開2017-057265號公報中記載之樹脂、日本特開2017-032685號公報中記載之樹脂、日本特開2017-075248號公報中記載之樹脂、日本特開2017-066240號公報中記載之樹脂。又,亦能夠使用具有茀骨架之樹脂。作為具有茀骨架之樹脂,可列舉下述結構的樹脂。以下結構式中,A為選自均苯四甲酸二酐、二苯甲酮四羧酸二酐、聯苯四羧酸二酐及二苯基醚基四羧酸二酐之羧酸二的殘基,M為苯基或芐基。關於具有茀骨架之樹脂,能夠參閱美國專利申請公開第2017/0102610號公報中的記載,且該內容被併入本說明書中。 [化學式30]

Figure 02_image061
Examples of other resins include (meth)acrylic resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polyarylene resins, polyether resins, polyphenylene resins, polyarylenes Ether phosphine oxide resin, polyimide resin, polyimide imide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, etc. One type of these resins may be used, or two or more types may be mixed and used. In addition, the resin described in the examples of International Publication WO2016/088645, the resin described in JP 2017-057265 A, the resin described in JP 2017-032685 A, JP 2017 A can be used as the resin. - Resin described in Gazette No. 075248, and resin described in JP-A No. 2017-066240. Moreover, resin which has a skeleton can also be used. As resins having a pyrene skeleton, resins having the following structures are exemplified. In the following structural formula, A is the residue of carboxylic acid two selected from pyromellitic dianhydride, benzophenone tetracarboxylic dianhydride, biphenyl tetracarboxylic dianhydride and diphenyl ether tetracarboxylic dianhydride group, M is phenyl or benzyl. Regarding the resin having a pyrene skeleton, the description in US Patent Application Publication No. 2017/0102610 can be referred to, and the content is incorporated into the present specification. [Chemical formula 30]
Figure 02_image061

其他樹脂可以具有酸基。作為酸基,例如可列舉羧基、磷酸基、磺基、酚性羥基等,羧基為較佳。該等酸基可以是僅1種,亦可以是2種以上。具有酸基之樹脂亦能夠用作鹼溶性樹脂。Other resins may have acid groups. As an acid group, a carboxyl group, a phosphoric acid group, a sulfo group, a phenolic hydroxyl group etc. are mentioned, for example, A carboxyl group is preferable. Only one type of these acid groups may be used, or two or more types may be used. Resins having acid groups can also be used as alkali-soluble resins.

作為具有酸基之樹脂,在側鏈上具有羧基之聚合物為較佳。作為具體例,可列舉甲基丙烯酸共聚物、丙烯酸共聚物、伊康酸共聚物、巴豆酸共聚物、馬來酸共聚物、局部酯化馬來酸共聚物、酚醛清漆樹脂等鹼溶性酚樹脂、在側鏈上具有羧基之酸性纖維素衍生物、在具有羥基之聚合物加成有酸酐之樹脂。(甲基)丙烯酸和能夠與此共聚之其他單體的共聚物作為鹼溶性樹脂尤為佳。作為能夠與(甲基)丙烯酸共聚之其他單體,可列舉烷基(甲基)丙烯酸酯、芳基(甲基)丙烯酸酯、乙烯基化合物等。作為烷基(甲基)丙烯酸酯及芳基(甲基)丙烯酸酯,可列舉甲基(甲基)丙烯酸酯、乙基(甲基)丙烯酸酯、丙基(甲基)丙烯酸酯、丁基(甲基)丙烯酸酯、異丁基(甲基)丙烯酸酯、戊基(甲基)丙烯酸酯、己基(甲基)丙烯酸酯、辛基(甲基)丙烯酸酯、苯基(甲基)丙烯酸酯、苄基(甲基)丙烯酸酯、甲苯基(甲基)丙烯酸酯、萘基(甲基)丙烯酸酯、環己基(甲基)丙烯酸酯、縮水甘油基(甲基)丙烯酸酯等。作為乙烯化合物,可列舉苯乙烯、α-甲基苯乙烯、乙烯甲苯、丙烯腈、乙酸乙烯酯、N-乙烯吡咯啶酮、聚苯乙烯大分子單體、聚甲基丙烯酸甲酯大分子單體等。又,其他單體亦能夠使用N-苯基馬來醯亞胺、N-環環己基馬來醯亞胺等馬來醯亞胺單體。能夠與該等(甲基)丙烯酸共聚之其他單體可以是僅1種,亦可以是2種以上。As the resin having an acid group, a polymer having a carboxyl group in a side chain is preferable. Specific examples include alkali-soluble phenol resins such as methacrylic acid copolymers, acrylic acid copolymers, itonic acid copolymers, crotonic acid copolymers, maleic acid copolymers, partially esterified maleic acid copolymers, and novolak resins. , Acidic cellulose derivatives with carboxyl groups on the side chain, resins with acid anhydrides added to polymers with hydroxyl groups. Copolymers of (meth)acrylic acid and other monomers which can be copolymerized therewith are particularly preferred as alkali-soluble resins. As another monomer which can be copolymerized with (meth)acrylic acid, an alkyl (meth)acrylate, an aryl (meth)acrylate, a vinyl compound, etc. are mentioned. Examples of alkyl (meth)acrylate and aryl (meth)acrylate include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, butyl (Meth)acrylate, Isobutyl (meth)acrylate, Amyl (meth)acrylate, Hexyl (meth)acrylate, Octyl (meth)acrylate, Phenyl (meth)acrylate ester, benzyl (meth)acrylate, tolyl (meth)acrylate, naphthyl (meth)acrylate, cyclohexyl (meth)acrylate, glycidyl (meth)acrylate, etc. Examples of the vinyl compound include styrene, α-methylstyrene, vinyltoluene, acrylonitrile, vinyl acetate, N-vinylpyrrolidone, polystyrene macromonomer, and polymethyl methacrylate macromonomer body etc. In addition, maleimide monomers such as N-phenylmaleimide and N-cyclocyclohexylmaleimide can also be used as other monomers. Only 1 type may be sufficient as the other monomer which can be copolymerized with these (meth)acrylic acid, and 2 or more types may be sufficient as it.

具有酸基之樹脂,能夠較佳地使用苄基(甲基)丙烯酸酯/(甲基)丙烯酸共聚物、苄基(甲基)丙烯酸酯/(甲基)丙烯酸/2-羥乙基(甲基)丙烯酸酯共聚物、由苄基(甲基)丙烯酸酯/(甲基)丙烯酸/其他單體構成之多元共聚物。又,還能夠較佳地使用將2-羥乙基(甲基)丙烯酸酯共聚而獲得者、日本特開平7-140654號公報中記載之2-羥丙基(甲基)丙烯酸酯/聚苯乙烯大分子單體/甲基丙烯酸苄酯/甲基丙烯酸共聚物、2-羥基-3-苯氧基丙基丙烯酸酯/聚甲基丙烯酸甲酯大分子單體/甲基丙烯酸苄酯/甲基丙烯酸共聚物、2-甲基丙烯酸羥乙酯/聚苯乙烯大分子單體/甲基丙烯酸甲酯/甲基丙烯酸共聚物、2-甲基丙烯酸羥乙酯/聚苯乙烯大分子單體/甲基丙烯酸苄酯/甲基丙烯酸共聚物等。For resins with acid groups, benzyl (meth)acrylate/(meth)acrylic acid copolymer, benzyl (meth)acrylate/(meth)acrylic acid/2-hydroxyethyl (meth)acrylic acid can be preferably used. base) acrylate copolymer, a multi-component copolymer composed of benzyl (meth)acrylate/(meth)acrylic acid/other monomers. In addition, 2-hydroxypropyl (meth)acrylate/polyphenylene described in Japanese Patent Laid-Open No. 7-140654 obtained by copolymerizing 2-hydroxyethyl (meth)acrylate can also be preferably used. Ethylene macromonomer/benzyl methacrylate/methacrylic acid copolymer, 2-hydroxy-3-phenoxypropyl acrylate/polymethyl methacrylate macromonomer/benzyl methacrylate/methyl methacrylate acrylic acid copolymer, 2-hydroxyethyl methacrylate/polystyrene macromonomer/methyl methacrylate/methacrylic acid copolymer, 2-hydroxyethyl methacrylate/polystyrene macromonomer /benzyl methacrylate/methacrylic acid copolymer, etc.

具有酸基之樹脂為包含來自於上述含有醚二聚物之單體成分之重複單元之聚合物亦較佳。It is also preferable that the resin having an acid group is a polymer containing repeating units derived from the above-mentioned ether dimer-containing monomer component.

具有酸基之樹脂可以包含來自於由下述式(X)表示之化合物之重複單元。 [化學式31]

Figure 02_image063
式(X)中,R1 表示氫原子或甲基,R2 表示碳數為2~10的伸烷基,R3 表示氫原子或可以包含苯環之碳數為1~20的烷基。n表示1~15的整數。The resin having an acid group may contain repeating units derived from a compound represented by the following formula (X). [Chemical formula 31]
Figure 02_image063
In formula (X), R 1 represents a hydrogen atom or a methyl group, R 2 represents an alkylene group having 2 to 10 carbon atoms, and R 3 represents a hydrogen atom or an alkyl group having 1 to 20 carbon atoms which may contain a benzene ring. n represents an integer of 1-15.

關於具有酸基之樹脂,能夠參閱日本特開2012-208494號公報的段落號0558~0571(對應之美國專利申請公開第2012/0235099號說明書的段落號0685~0700)中的記載、日本特開2012-198408號公報的段落號0076~0099中的記載,且該等內容被併入本說明書中。又,具有酸基之樹脂亦能夠使用市售品。Regarding resins having an acid group, reference can be made to the descriptions in paragraphs 0558 to 0571 of JP-A No. 2012-208494 (corresponding to paragraphs 0685-0700 of the specification of U.S. Patent Application Laid-Open No. 2012/0235099 ), JP-A The descriptions in paragraph numbers 0076 to 0099 of Gazette No. 2012-198408 are incorporated into the present specification. Moreover, a commercial item can also be used for resin which has an acid group.

具有酸基之樹脂的酸值為30~200mgKOH/g為較佳。下限為50mgKOH/g以上為較佳,70mgKOH/g以上為更佳。上限為150mgKOH/g以下為較佳,120mgKOH/g以下為更佳。The acid value of the resin having an acid group is preferably 30 to 200 mgKOH/g. The lower limit is preferably 50 mgKOH/g or more, and more preferably 70 mgKOH/g or more. The upper limit is preferably 150 mgKOH/g or less, more preferably 120 mgKOH/g or less.

作為具有酸基之樹脂,例如可列舉下述結構的樹脂等。 [化學式32]

Figure 02_image065
As resin which has an acid group, the resin etc. of the following structure are mentioned, for example. [Chemical formula 32]
Figure 02_image065

本發明的組成物,亦能夠含有作為分散劑的樹脂。分散劑可列舉酸性分散劑(酸性樹脂)、鹼性分散劑(鹼性樹脂)。在此,酸性分散劑(酸性樹脂)表示酸基的量比鹼性基的量多的樹脂。酸性分散劑(酸性樹脂)為在將酸基的量與鹼性基的量的合計量設為100莫耳%時,酸基的量佔70莫耳%以上之樹脂為較佳,為實質上僅由酸基構成之樹脂為更佳。酸性分散劑(酸性樹脂)所具有之酸基為羧基為較佳。酸性分散劑(酸性樹脂)的酸值為40~105mgKOH/g為較佳,50~105mgKOH/g為更佳,60~105mgKOH/g為進一步較佳。又,鹼性分散劑(鹼性樹脂)表示鹼性基的量比酸基的量多的樹脂。鹼性分散劑(鹼性樹脂)為將酸基的量與鹼性基的量的合計量設為100莫耳%時,鹼性基的量超過50莫耳%之樹脂為較佳。鹼性分散劑所具有之鹼性基為胺基為較佳。The composition of the present invention can also contain a resin as a dispersant. The dispersing agent includes an acidic dispersing agent (acidic resin) and a basic dispersing agent (basic resin). Here, the acidic dispersant (acidic resin) means a resin in which the amount of acid groups is larger than the amount of basic groups. The acidic dispersant (acidic resin) is a resin in which the amount of the acid group accounts for 70 mol% or more, when the total amount of the amount of the acid group and the amount of the basic group is 100 mol%, and is substantially A resin composed of only acid groups is more preferable. It is preferable that the acid group which the acidic dispersant (acidic resin) has is a carboxyl group. The acid value of the acidic dispersant (acidic resin) is preferably 40 to 105 mgKOH/g, more preferably 50 to 105 mgKOH/g, and even more preferably 60 to 105 mgKOH/g. In addition, the basic dispersant (basic resin) refers to a resin in which the amount of basic groups is larger than the amount of acid groups. The basic dispersant (basic resin) is preferably a resin in which the amount of basic groups exceeds 50 mol % when the total amount of the amount of acid groups and the amount of basic groups is 100 mol %. Preferably, the basic group of the basic dispersant is an amine group.

用作分散劑之樹脂包含具有酸基之重複單元為較佳。藉由包含用作分散劑之樹脂具有酸基之重複單元,在藉由光微影法進行圖案形成時能夠進一步減少產生於像素的基底之殘渣。It is preferable that the resin used as a dispersant contains a repeating unit having an acid group. By including a repeating unit having an acid group in the resin used as a dispersant, it is possible to further reduce the residues generated on the substrate of the pixel when patterning is performed by the photolithography method.

用作分散劑之樹脂為包含在側鏈上具有接枝鏈之重複單元之樹脂(以下,亦稱為接枝樹脂)為較佳。依該態樣,能夠進一步提高金屬偶氮顏料A等的分散性。在此,接枝鏈表示從重複單元的主鏈支化而伸展之聚合物鏈。接枝鏈的長度並無特別限制,若接枝鏈變長,則立體排斥效果增強,從而能夠提高顏料等分散性。接枝鏈中,除了氫原子之外之原子數為40~10000為較佳,除了氫原子之外之原子數為50~2000為更佳,除了氫原子之外之原子數為60~500為進一步較佳。The resin used as a dispersant is preferably a resin containing a repeating unit having a graft chain in a side chain (hereinafter, also referred to as a graft resin). According to this aspect, the dispersibility of the metal azo pigment A and the like can be further improved. Here, the graft chain means a polymer chain that is branched and extended from the main chain of the repeating unit. The length of the graft chain is not particularly limited, but when the graft chain becomes longer, the steric repulsion effect is enhanced, and the dispersibility of pigments and the like can be improved. In the graft chain, the number of atoms other than hydrogen atoms is preferably 40 to 10,000, the number of atoms other than hydrogen atoms is more preferably 50 to 2,000, and the number of atoms other than hydrogen atoms is 60 to 500. Further preferred.

接枝鏈包含選自聚酯鏈、聚醚鏈、聚(甲基)丙烯鏈、聚胺酯鏈、聚脲鏈及聚醯胺鏈之至少1種結構為較佳,包含選自聚酯鏈、聚醚鏈及聚(甲基)丙烯鏈之至少1種結構為更佳,包含聚酯鏈為進一步較佳。Preferably, the graft chain includes at least one structure selected from polyester chain, polyether chain, poly(meth)propylene chain, polyurethane chain, polyurea chain and polyamide chain, and includes a structure selected from polyester chain, polyamide chain and polyamide chain. At least one structure of an ether chain and a poly(meth)propylene chain is more preferable, and it is more preferable to include a polyester chain.

作為接枝鏈的末端結構,並無特別限定。可以是氫原子,亦可以是取代基。作為取代基,可列舉烷基、芳基、雜芳基、烷氧基、芳氧基、雜芳氧基、烷硫基醚基、芳硫基醚基、雜芳硫基醚基等。其中,從提高金屬偶氮顏料A等的分散性的觀點考慮,具有立體排斥效果之基為較佳,碳數5~24的烷基或烷氧基為較佳。烷基及烷氧基可以是直鏈狀、支鏈狀及環狀中的任一個,直鏈狀或支鏈狀為較佳。The terminal structure of the graft chain is not particularly limited. It may be a hydrogen atom or a substituent. As a substituent, an alkyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an alkylthio ether group, an arylthio ether group, a heteroarylthio ether group, etc. are mentioned. Among them, from the viewpoint of improving the dispersibility of the metal azo pigment A and the like, a group having a steric repulsion effect is preferable, and an alkyl group or an alkoxy group having 5 to 24 carbon atoms is preferable. The alkyl group and the alkoxy group may be linear, branched, or cyclic, and linear or branched is preferred.

作為接枝樹脂,例如可列舉下述結構的樹脂等。又,接枝樹脂的詳細資料能夠參閱日本特開2012-255128號公報的段落號0025~0094中的記載,且該內容被併入本說明書中。 [化學式33]

Figure 02_image067
As a graft resin, the resin etc. of the following structures are mentioned, for example. In addition, the details of the graft resin can be referred to the descriptions in paragraph numbers 0025 to 0094 of JP 2012-255128 A, and the contents are incorporated in the present specification. [Chemical formula 33]
Figure 02_image067

用作分散劑之樹脂為在主鏈及側鏈中的至少一個上含有氮原子之寡聚亞胺系樹脂亦較佳。作為寡聚亞胺系樹脂,具有如下結構單元和側鏈,並且在主鏈及側鏈中的至少一方具有鹼性氮原子之樹脂為較佳,其中前述結構單位具備具有pKa14以下的官能基之部分結構X,前述側鏈包含原子數40~10,000的側鏈Y。鹼性氮原子只要是呈鹼性之氮原子,則並無特別限制。關於寡聚亞胺系樹脂,能夠參閱日本特開2012-255128號公報的段落號0102~0166中的記載,本說明書中併入有上述內容。作為寡聚亞胺系樹脂的具體例,例如可列舉以下。又,能夠使用日本特開2012-255128號公報的段落號0168~0174中記載的樹脂。 [化學式34]

Figure 02_image069
It is also preferable that the resin used as the dispersant is an oligoimine-based resin containing a nitrogen atom in at least one of the main chain and the side chain. The oligoimine-based resin is preferably a resin having the following structural unit and side chain, and having a basic nitrogen atom in at least one of the main chain and the side chain, wherein the structural unit has a functional group having a pKa of 14 or less. In the partial structure X, the aforementioned side chain includes a side chain Y having 40 to 10,000 atoms. The basic nitrogen atom is not particularly limited as long as it is a basic nitrogen atom. Regarding the oligoimine-based resin, the descriptions in paragraph numbers 0102 to 0166 of JP 2012-255128 A can be referred to, and the above-mentioned contents are incorporated in the present specification. As a specific example of an oligoimine-type resin, the following are mentioned, for example. In addition, the resins described in paragraphs 0168 to 0174 of Japanese Patent Laid-Open No. 2012-255128 can be used. [Chemical formula 34]
Figure 02_image069

亦能夠以市售品的形態獲得分散劑,作為該種具體例,可列舉BYK-Chemie GmbH製的Disperbyk系列(例如,Disperbyk-111等)、Boyd & Moore Executive Search K.K.製的Solsperse系列(例如,Solsperse76500等)等。又,亦能夠使用日本特開2014-130338號公報的段落號0041~0130中記載之顏料分散劑,該內容被併入本說明書中。又,亦能夠將上述具有酸基之樹脂和聚合性聚合物等用作分散劑。另外,作為上述分散劑而說明之樹脂亦能夠以分散劑以外的用途使用。例如,亦能夠用作黏合劑。The dispersant can also be obtained in the form of a commercial item, and as such specific examples, the Disperbyk series (for example, Disperbyk-111, etc.) manufactured by BYK-Chemie GmbH, and the Solsperse series (for example, the Solsperse series manufactured by Boyd & Moore Executive Search K.K.) Solsperse76500 etc.) etc. In addition, the pigment dispersants described in paragraphs 0041 to 0130 of JP 2014-130338 A can also be used, and the contents are incorporated in this specification. Moreover, the resin which has the said acid group, a polymerizable polymer, etc. can also be used as a dispersing agent. Moreover, the resin demonstrated as the said dispersing agent can also be used for the application other than a dispersing agent. For example, it can also be used as an adhesive.

本發明的組成物含有其他樹脂時,其他樹脂的含量在本發明的組成物的總固體成分中為1~50質量%為較佳。上限為45質量%以下為較佳,40質量%以下為更佳。下限為2質量%以上為較佳,3質量%以上為更佳,5質量%以上為進一步較佳。又,含有2種以上的其他樹脂時,該等合計量成為上述範圍為較佳。 又,本發明的組成物亦能夠實質上不含其他樹脂。本發明的組成物實質上不含其他樹脂的情況下,本發明的組成物的總固體成分中之其他樹脂的含量為0.1質量%以下為較佳,0.05質量%以下為更佳,不含有為特佳。 又,上述具有硬化性化合物與其他樹脂的合計含量在本發明的組成物的總固體成分中為5~50質量%為較佳。下限為8質量%以上為較佳,10質量%以上為更佳。上限為45質量%以下為較佳,40質量%以下為更佳。 又,含有2種以上的其他樹脂時,該等的合計量成為上述範圍為較佳。When the composition of the present invention contains other resins, the content of the other resins is preferably 1 to 50% by mass in the total solid content of the composition of the present invention. The upper limit is preferably 45 mass % or less, more preferably 40 mass % or less. The lower limit is preferably 2 mass % or more, more preferably 3 mass % or more, and even more preferably 5 mass % or more. Moreover, when containing 2 or more types of other resins, it is preferable that these total amounts fall into the said range. Moreover, the composition of this invention can also contain other resin substantially. When the composition of the present invention does not substantially contain other resins, the content of the other resins in the total solid content of the composition of the present invention is preferably 0.1 mass % or less, more preferably 0.05 mass % or less, and does not contain Excellent. Moreover, it is preferable that the total content of the said compound which has a curable property and other resin is 5-50 mass % in the total solid content of the composition of this invention. The lower limit is preferably 8% by mass or more, and more preferably 10% by mass or more. The upper limit is preferably 45 mass % or less, more preferably 40 mass % or less. Moreover, when 2 or more types of other resins are contained, it is preferable that the total amount of these is in the said range.

<<溶劑>> 本發明的組成物含有溶劑。溶劑為有機溶劑為較佳。溶劑只要滿足各成分的溶解性和組成物的塗佈性,則並無特別限制。<<Solvent>> The composition of the present invention contains a solvent. The solvent is preferably an organic solvent. The solvent is not particularly limited as long as it satisfies the solubility of each component and the coatability of the composition.

作為有機溶劑的例,例如可列舉以下有機溶劑。作為酯類,例如可列舉乙酸乙酯、乙酸正丁酯、乙酸異丁酯、乙酸環己酯、甲酸戊酯、乙酸異戊酯、丙酸丁酯、丁酸異丙酯、丁酸乙酯、丁酸丁酯、乳酸甲酯、乳酸乙酯、氧基乙酸烷基酯(例如氧基乙酸甲酯、氧基乙酸乙酯、氧基乙酸丁酯(例如甲氧基乙酸甲酯、甲氧基乙酸乙酯、甲氧基乙酸丁酯、乙氧基乙酸甲酯、乙氧基乙酸乙酯等))、3-氧基丙酸烷基酯類(例如3-氧基丙酸甲酯、3-氧基丙酸乙酯等(例如3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯等))、2-氧基丙酸烷基酯類(例如2-氧基丙酸甲酯、2-氧基丙酸乙酯、2-氧基丙酸丙酯等(例如2-甲氧基丙酸甲酯、2-甲氧基丙酸乙酯、2-甲氧基丙酸丙酯、2-乙氧基丙酸甲酯、2-乙氧基丙酸乙酯))、2-氧基-2-甲基丙酸甲酯及2-氧基-2-甲基丙酸乙酯(例如2-甲氧基-2-甲基丙酸甲酯、2-乙氧基-2-甲基丙酸乙酯等)、丙酮酸甲酯(methyl pyruvate)、丙酮酸乙酯、丙酮酸丙酯、乙醯乙酸甲酯、乙醯乙酸乙酯、2-氧代丁酸甲酯(Methyl 2-oxobutanoate)、2-氧代丁酸乙酯等。作為醚類,例如可列舉二乙二醇二甲醚、四氫呋喃、乙二醇單甲醚、乙二醇單乙醚、甲基溶纖劑乙酸酯、乙基溶纖劑乙酸酯、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單丁醚、丙二醇單甲醚、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、丙二醇單丙醚乙酸酯等。作為酮類,例如可列舉甲基乙基酮、環己酮、環戊酮、2-庚酮、3-庚酮等。作為芳香族烴類,例如可較佳地舉出甲苯、二甲苯等。又,從溶解性提高之觀點考慮,3-甲氧基-N,N-二甲基丙醯胺、3-丁氧基-N,N-二甲基丙醯胺亦較佳。有機溶劑可以單獨使用1種,亦可將2種以上組合使用。As an example of an organic solvent, the following organic solvent is mentioned, for example. Examples of esters include ethyl acetate, n-butyl acetate, isobutyl acetate, cyclohexyl acetate, amyl formate, isoamyl acetate, butyl propionate, isopropyl butyrate, and ethyl butyrate. , butyl butyrate, methyl lactate, ethyl lactate, alkyl oxyacetate (e.g. methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate (e.g. methyl methoxyacetate, methoxyacetate) Ethoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, etc.), alkyl 3-oxypropionate (such as methyl 3-oxypropionate, Ethyl 3-oxypropionate, etc. (eg methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate etc.), alkyl 2-oxypropionate (such as methyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate, etc. (such as 2-methoxypropionate) Methyl propionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate)), 2-oxopropionate Methyl-2-methylpropanoate and ethyl 2-oxy-2-methylpropanoate (such as methyl 2-methoxy-2-methylpropanoate, 2-ethoxy-2-methylpropanoate ethyl propionate, etc.), methyl pyruvate (methyl pyruvate), ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl 2-oxobutyrate (Methyl 2 -oxobutanoate), ethyl 2-oxobutanoate, etc. Examples of ethers include diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethyl Glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, etc. As ketones, methyl ethyl ketone, cyclohexanone, cyclopentanone, 2-heptanone, 3-heptanone, etc. are mentioned, for example. As aromatic hydrocarbons, toluene, xylene, etc. are mentioned preferably, for example. In addition, 3-methoxy-N,N-dimethylpropionamide and 3-butoxy-N,N-dimethylpropionamide are also preferred from the viewpoint of improving solubility. An organic solvent may be used individually by 1 type, and may be used in combination of 2 or more types.

在本發明中,作為溶劑使用金屬含量少的溶劑為較佳。溶劑中的金屬含量例如為10質量ppb(十億分點:parts per billion)以下為較佳。依據需要可以使用金屬含量為質量ppt(parts per trillion,兆分率)級別的溶劑,該種高純度溶劑例如由Toyo Gosei Co.,Ltd.提供(化學工業日報,2015年11月13日)。作為從溶劑中去除金屬等雜質之方法,例如能夠舉出蒸餾(分子蒸餾或薄膜蒸餾等)或使用了過濾器之過濾。作為過濾中所使用之過濾器的過濾器孔徑,10μm以下為較佳,5μm以下為更佳,3μm以下為進一步較佳。過濾器的材質為聚四氟乙烯、聚乙烯或尼龍為較佳。In the present invention, it is preferable to use a solvent with a small metal content as the solvent. It is preferable that the metal content in a solvent is 10 mass ppb (parts per billion) or less, for example. A solvent with a metal content of parts per trillion (parts per trillion) can be used as needed, such a high-purity solvent is provided by Toyo Gosei Co., Ltd. (Chemical Industry Daily, November 13, 2015). As a method of removing impurities such as metals from the solvent, for example, distillation (molecular distillation, thin-film distillation, etc.) and filtration using a filter can be mentioned. The filter pore diameter of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The material of the filter is preferably polytetrafluoroethylene, polyethylene or nylon.

溶劑亦可以包含異構物(原子數相同但結構不同之化合物)。又,異構體可以僅包含1種,亦可包含複數種。The solvent may also contain isomers (compounds with the same number of atoms but different structures). In addition, only one type of isomer may be contained, or a plurality of types may be contained.

在本發明中使用之有機溶劑中過氧化物的含有率為0.8mmol/L以下為較佳,實質上不含過氧化物為更佳。The content of peroxide in the organic solvent used in the present invention is preferably 0.8 mmol/L or less, and it is more preferably substantially free of peroxide.

溶劑的含量為使組成物的固體成分濃度(總固體成分)成為5~50質量%之量為較佳。上限為45質量%以下為較佳,40質量%以下為更佳。下限為8質量%以上為較佳,10質量%以上為較佳。The content of the solvent is preferably such an amount that the solid content concentration (total solid content) of the composition is 5 to 50% by mass. The upper limit is preferably 45 mass % or less, more preferably 40 mass % or less. The lower limit is preferably 8% by mass or more, and more preferably 10% by mass or more.

又,本發明的組成物從環境規制的觀點考慮實質上不含環境規制物質為較佳。另外,本發明中,實質上不含環境規制物質表示組成物中之環境規制物質的含量為50質量ppm以下,30質量ppm以下為較佳,10質量ppm以下為進一步較佳、1質量ppm以下為特佳。環境規制物質例如可列舉苯;甲苯、二甲苯等烷基苯類;氯苯等鹵化苯類等。該等作以REACH(Registration Evaluation Authorization and Restriction of CHemicals)規則、PRTR(Pollutant Release and Transfer Register)法、VOC(Volatile Organic Compounds)規制等為基礎並且記載於其中,並嚴格規定了用量和用法。該等化合物有時在製造本發明的組成物中使用之各成分等時被用作溶劑,作為殘留溶劑混入於組成物中。從人體安全性、環保的觀點考慮,盡可能減少該等物質為較佳。作為減少環境規制物質之方法,可列舉對反應體系中進行加熱和減壓使其成為環境規制物質的沸點以上,便從反應體系中蒸餾去除環境規制物質以減少其量之方法。又,蒸餾去除少量的環境規制物質時,為了提高效率使與具有和該溶劑相同的沸點之溶劑一起沸騰時亦有用。又,含有具有自由基聚合性之化合物時,為了抑制在減壓蒸餾去除過程中因自由基聚合反應導致分子間交聯,亦可以添加聚合抑制劑等來進行減壓蒸餾去除。該等蒸餾去除方法能夠在原料的階段、使原料反應之產物(例如聚合之後的樹脂溶液和多官能單體溶液)的階段或混合該等化合物而製成之組成物的階段中的任一個階段實施。Moreover, it is preferable that the composition of this invention does not contain an environmental regulation substance substantially from a viewpoint of environmental regulation. In addition, in the present invention, substantially no environmental regulation substance means that the content of the environmental regulation substance in the composition is 50 mass ppm or less, preferably 30 mass ppm or less, more preferably 10 mass ppm or less, and 1 mass ppm or less Excellent. Examples of the environmental regulation substances include benzene; alkylbenzenes such as toluene and xylene; halogenated benzenes such as chlorobenzene, and the like. These works are based on REACH (Registration Evaluation Authorization and Restriction of Chemicals) rules, PRTR (Pollutant Release and Transfer Register) law, VOC (Volatile Organic Compounds) regulations, etc. and are recorded in them, and strictly stipulate the dosage and usage. These compounds may be used as a solvent in the production of each component and the like used in the composition of the present invention, and may be mixed into the composition as a residual solvent. From the viewpoint of human safety and environmental protection, it is better to reduce these substances as much as possible. As a method of reducing the environmental regulation substance, there is a method of reducing the amount of the environmental regulation substance by distilling off the environmental regulation substance from the reaction system by heating and depressurizing the reaction system so as to be equal to or higher than the boiling point of the environmental regulation substance. In addition, when a small amount of environmental regulation substances are distilled off, it is also useful to boil together with a solvent having the same boiling point as the solvent in order to improve the efficiency. In addition, when a compound having radical polymerizability is contained, in order to suppress intermolecular crosslinking due to radical polymerization reaction during the removal by distillation under reduced pressure, a polymerization inhibitor or the like may be added and removed by distillation under reduced pressure. These distillation removal methods can be performed at any stage of the stage of raw materials, the stage of products obtained by reacting the raw materials (for example, the resin solution after polymerization and the polyfunctional monomer solution), or the stage of mixing these compounds to obtain a composition. implement.

<<光聚合起始劑>> 本發明的組成物能夠進一步含有光聚合起始劑。尤其,本發明的組成物含有具有乙烯性不飽和鍵結基之化合物時,含有光聚合起始劑為較佳。作為光聚合起始劑並無特別限制,能夠從公知的光聚合起始劑中適當選擇。例如,對從紫外線區域至可見區域的光線具有感光性之化合物為較佳。光聚合起始劑為光自由基聚合起始劑為較佳。<<Photopolymerization initiator>> The composition of the present invention can further contain a photopolymerization initiator. In particular, when the composition of the present invention contains a compound having an ethylenically unsaturated bond group, it is preferable to contain a photopolymerization initiator. The photopolymerization initiator is not particularly limited, and can be appropriately selected from known photopolymerization initiators. For example, compounds having photosensitivity to light from the ultraviolet region to the visible region are preferred. Preferably, the photopolymerization initiator is a photoradical polymerization initiator.

作為光聚合起始劑,例如可列舉鹵化烴衍生物(例如,具有三口井骨架之化合物、具有㗁二唑骨架之化合物等)、醯基膦化合物、六芳基聯咪唑、肟化合物、有機過氧化物、硫代化合物、酮化合物、芳香族鎓鹽、α-羥基酮化合物、α-胺基酮化合物等。從曝光靈敏度的觀點而言,光聚合引發劑為選自三鹵甲基三口井化合物、苄基二甲基縮酮化合物、α-羥基酮化合物、α-胺基酮化合物、醯基膦化合物、氧化膦化合物、茂金屬化合物、肟化合物、三芳咪唑二聚物、鎓化合物、苯并噻唑化合物、二苯甲酮化合物、苯乙酮化合物、環戊二烯-苯-鐵錯合物、鹵甲基㗁二唑化合物及3-芳基取代香豆素化合物中之化合物為較佳,選自肟化合物、α-羥基酮化合物、α-胺基酮化合物及醯基膦化合物之化合物為更佳,肟化合物為進一步較佳。作為光聚合起始劑藉由使用肟化合物而可獲得優異的硬化性。此外,即使在低溫環境下長期保管組成物之情況下,亦能夠製造出缺陷亦進一步得到抑制之膜。作為可獲得該種效果之理由推測在於以下。本發明的組成物中所含之金屬偶氮顏料A含有2種以上的金屬離子,但依據金屬離子的種類,由上述陰離子與金屬離子構成之金屬偶氮化合物(金屬錯合物)的構形有所不同。例如,為Cu2+ 時形成平面構形的金屬錯合物,為Zn2+ 時形成正八面體構形的金屬錯合物。因此,含有溶劑等之組成物中,推測為上述金屬偶氮顏料A以難以締合且不穩定的狀態下存在,並推測為保管組成物時,金屬偶氮顏料A具有容易凝聚的傾向。又,尤其,金屬偶氮顏料A中之鎳離子(Ni2+ )的含量少或金屬偶氮顏料A不含鎳離子時,推測為能量上處於不穩定的狀態,且推測為保管組成物時金屬偶氮顏料A具有更容易凝聚的傾向。然而,推測為藉由摻合肟化合物,肟化合物相對於金屬偶氮顏料A配位而起到螯合劑的作用,其結果,推測為能夠使金屬偶氮顏料A變得穩定,從而能夠更有效地抑制金屬偶氮顏料A的凝聚等。因此,推測為即使在低溫環境下長期保管組成物之情況下,亦能夠製造出缺陷亦得到抑制之膜。Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (for example, compounds having a three-hole skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazoles, oxime compounds, organic peroxides, etc. Oxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxy ketone compounds, α-amino ketone compounds, and the like. From the viewpoint of exposure sensitivity, the photopolymerization initiator is selected from the group consisting of trihalomethyl three well compounds, benzyl dimethyl ketal compounds, α-hydroxy ketone compounds, α-amino ketone compounds, acylphosphine compounds, Phosphine oxide compounds, metallocene compounds, oxime compounds, triarylimidazole dimers, onium compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds, cyclopentadiene-benzene-iron complexes, halomethyl compounds The compounds among the oxadiazole compounds and the 3-aryl-substituted coumarin compounds are preferred, and the compounds selected from the group consisting of oxime compounds, α-hydroxy ketone compounds, α-amino ketone compounds and acylphosphine compounds are more preferred, Oxime compounds are further preferred. Excellent hardenability can be obtained by using an oxime compound as a photopolymerization initiator. In addition, even when the composition is stored for a long time in a low temperature environment, a film in which defects are further suppressed can be produced. The reason why such an effect can be obtained is presumed to be as follows. The metal azo pigment A contained in the composition of the present invention contains two or more types of metal ions, but depending on the type of metal ions, the configuration of the metal azo compound (metal complex) composed of the above-mentioned anions and metal ions different. For example, when it is Cu 2+ , it forms a metal complex with a planar configuration, and when it is Zn 2+ , it forms a metal complex with a regular octahedral configuration. Therefore, in a composition containing a solvent or the like, the metal azo pigment A is presumed to exist in an unstable state with little association, and it is presumed that the metal azo pigment A tends to aggregate easily when the composition is stored. In addition, in particular, when the content of nickel ions (Ni 2+ ) in the metal azo pigment A is small or the metal azo pigment A does not contain nickel ions, it is presumed that the state is unstable in terms of energy, and it is presumed that the composition is stored. Metal azo pigment A tends to aggregate more easily. However, it is presumed that by blending the oxime compound, the oxime compound functions as a chelating agent by coordinating with the metal azo pigment A, and as a result, it is presumed that the metal azo pigment A can be stabilized, thereby being more effective. Agglomeration of metal azo pigment A and the like are suppressed. Therefore, even when the composition is stored in a low temperature environment for a long period of time, it is estimated that a film in which defects are suppressed can be produced.

作為α-羥基酮化合物的市售品,可列舉IRGACURE-184、DAROCUR-1173、IRGACURE-500、IRGACURE-2959,IRGACURE-127(以上,BASF公司製)等。作為α-胺基酮化合物的市售品,可列舉IRGACURE-907、IRGACURE-369、IRGACURE-379及IRGACURE-379EG(以上為BASF公司製)等。作為醯基膦化合物的市售品,可列舉IRGACURE-819、DAROCUR-TPO(以上為BASF公司製)等。Commercially available products of the α-hydroxyketone compound include IRGACURE-184, DAROCUR-1173, IRGACURE-500, IRGACURE-2959, and IRGACURE-127 (the above, manufactured by BASF Corporation). As a commercial item of an α-amino ketone compound, IRGACURE-907, IRGACURE-369, IRGACURE-379, and IRGACURE-379EG (the above are manufactured by BASF Corporation), etc. are mentioned. As a commercial item of an acylphosphine compound, IRGACURE-819, DAROCUR-TPO (the above are manufactured by BASF Corporation), etc. are mentioned.

作為肟化合物,例如可列舉日本特開2001-233842號公報中記載的化合物、日本特開2000-080068號公報中記載的化合物、日本特開2006-342166號公報中記載的化合物、J.C.S.Perkin II(1979年、pp.1653-1660)中記載的化合物、J.C.S.Perkin II(1979年、pp.156-162)中記載的化合物、Journal of Photopolymer Science and Technology(1995年、pp.202-232)中記載的化合物、日本特開2000-066385號公報中記載的化合物、日本特開2000-080068號公報中記載的化合物、日本特表2004-534797號公報中記載的化合物、日本特開2006-342166號公報中記載的化合物、日本特開2017-019766號公報中記載的化合物、日本專利第6065596號公報中記載的化合物、國際公開WO2015/152153號公報中記載的化合物、國際公開WO2017/051680公報中記載的化合物等。作為肟化合物的具體例,例如可列舉3-苯甲醯氧基亞胺基丁烷-2-酮、3-乙醯氧基亞胺基丁烷-2-酮、3-乙醯氧基亞胺基丁烷-2-酮、2-乙醯氧基亞胺基戊烷-3-酮、2-乙醯氧基亞胺基-1-苯基丙烷-1-酮、2-苯甲醯氧基亞胺基-1-苯基丙烷-1-酮、3-(4-甲苯磺醯氧基)亞胺基丁烷-2-酮及2-乙氧基羰氧基亞胺基-1-苯基丙烷-1-酮等。作為肟化合物的市售品,可列舉IRGACURE-OXE01、IRGACURE-OXE02、IRGACURE-OXE03、IRGACURE-OXE04(以上,BASF公司製)、TRONLY TR-PBG-304、TRONLY TR-PBG-309、TRONLY TR-PBG-305(常州強力電子新材料股份有限公司(CHANGZHOU TRONLY NEW ELECTRONIC MATERIALS CO.,LTD)製)、Adeka Arkls NCI-930、Adeka OptoMer N-1919(日本特開2012-014052號公報的光聚合起始劑2)(以上,ADEKA CORPORATION製)。Examples of the oxime compound include compounds described in JP 2001-233842 A, compounds described in JP 2000-080068 A, compounds described in JP 2006-342166 A, J.C.S. Perkin II ( Compounds described in J.C.S. Perkin II (1979, pp. 156-162), Journal of Photopolymer Science and Technology (1995, pp. 202-232) , the compound described in JP 2000-066385 A, the compound described in JP 2000-080068 A, the compound described in JP 2004-534797 A, JP 2006-342166 A The compounds described in JP 2017-019766 A, the compounds described in JP 6065596 A, the compounds described in International Publication WO2015/152153, the compounds described in International Publication WO2017/051680 compounds, etc. Specific examples of the oxime compound include, for example, 3-benzyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, and 3-acetoxyiminobutane-2-one. Aminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzyl Oxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one and 2-ethoxycarbonyloxyimino-1 -Phenylpropan-1-one, etc. Commercially available oxime compounds include IRGACURE-OXE01, IRGACURE-OXE02, IRGACURE-OXE03, IRGACURE-OXE04 (the above, manufactured by BASF), TRONLY TR-PBG-304, TRONLY TR-PBG-309, TRONLY TR- PBG-305 (manufactured by CHANGZHOU TRONLY NEW ELECTRONIC MATERIALS CO., LTD), Adeka Arkls NCI-930, Adeka OptoMer N-1919 (from photopolymerization of Japanese Patent Laid-Open No. 2012-014052) Starter 2) (above, manufactured by ADEKA CORPORATION).

又,作為上述以外的肟化合物,亦可使用肟連接於咔唑環的N位之日本特表2009-519904號公報中記載的化合物、在二苯甲酮部位導入有雜取代基之美國專利第7626957號公報中記載的化合物、在色素部位導入有硝基之日本特開2010-015025號公報及美國專利公開2009-292039號公報中記載的化合物、國際公開WO2009/131189號公報中記載的酮肟化合物、在同一分子內含有三口井骨架和肟骨架之在美國專利7556910號公報中記載之化合物、在405nm具有吸收極大且對g射線光源具有良好的感度之日本特開2009-221114號公報中記載的化合物等。In addition, as the oxime compound other than the above, the compounds described in JP-A No. 2009-519904 in which the oxime is linked to the N-position of the carbazole ring, and the U.S. Patent No. Compounds described in Gazette 7626957, compounds described in JP 2010-015025 A and U.S. Patent Publication No. 2009-292039 in which nitro groups are introduced into pigment sites, ketoximes described in International Publication WO 2009/131189 Compounds, compounds described in U.S. Patent No. 7,556,910 that contain a triple-well skeleton and an oxime skeleton in the same molecule, and Japanese Patent Laid-Open No. 2009-221114 having a maximum absorption at 405 nm and good sensitivity to a g-ray light source compounds, etc.

本發明作為光聚合起始劑亦能夠使用具有茀環之肟化合物。作為具有茀環之肟化合物的具體例,可列舉日本特開2014-137466號公報中記載之化合物。In the present invention, an oxime compound having a perylene ring can also be used as a photopolymerization initiator. As a specific example of the oxime compound which has a perylene ring, the compound described in Unexamined-Japanese-Patent No. 2014-137466 is mentioned.

本發明作為光聚合起始劑,亦能夠使用具有苯并呋喃骨架之肟化合物。作為具體例,可列舉國際公開WO2015/036910號公報中記載之化合物OE-01~OE-75。In the present invention, an oxime compound having a benzofuran skeleton can also be used as a photopolymerization initiator. Specific examples include compounds OE-01 to OE-75 described in International Publication WO2015/036910.

本發明作為光聚合起始劑,亦可使用具有咔唑環的至少一個苯環成為萘環之骨架之肟化合物。作為該種肟化合物的具體例,可列舉國際公開WO2013/083505號公報中記載之化合物。In the present invention, as a photopolymerization initiator, an oxime compound having at least one benzene ring of a carbazole ring serving as a skeleton of a naphthalene ring can also be used. Specific examples of such oxime compounds include compounds described in International Publication WO2013/083505.

本發明中,作為光聚合引發劑亦能夠使用具有氟原子之肟化合物。作為具有氟原子之肟化合物的具體例,可列舉日本特開2010-262028號公報中記載之化合物、日本特表2014-500852號公報中記載之化合物24和化合物36~40、日本特開2013-164471號公報中記載之化合物(C-3)等。In the present invention, an oxime compound having a fluorine atom can also be used as a photopolymerization initiator. Specific examples of the oxime compound having a fluorine atom include the compounds described in JP 2010-262028 A, compound 24 and compounds 36 to 40 described in JP 2014-500852 A, and JP 2013-A Compound (C-3) and the like described in Gazette No. 164471.

本發明作為光聚合起始劑亦能夠使用具有硝基之肟化合物。具有硝基之肟化合物為二聚體亦較佳。作為具有硝基之肟化合物的具體例,可列舉日本特開2013-114249號公報的段落號0031~0047、日本特開2014-137466號公報的段落號0008~0012、段落號0070~0079中所記載之化合物、日本專利4223071號公報的段落號0007~0025中所記載之化合物、ADEKA ARKLS NCI-831(ADEKA CORPORATION製)等。In the present invention, an oxime compound having a nitro group can also be used as a photopolymerization initiator. It is also preferable that the oxime compound having a nitro group is a dimer. Specific examples of the oxime compound having a nitro group include those described in paragraphs 0031 to 0047 of JP 2013-114249 A, paragraphs 0008 to 0012, and paragraphs 0070 to 0079 of JP 2014-137466 A The compounds described, the compounds described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071, ADEKA ARKLS NCI-831 (manufactured by ADEKA CORPORATION), and the like.

以下示出本發明中較佳地使用之肟化合物的具體例,但本發明並不限定於該等。Specific examples of the oxime compound preferably used in the present invention are shown below, but the present invention is not limited to these.

[化學式35]

Figure 02_image071
[化學式36]
Figure 02_image073
[Chemical formula 35]
Figure 02_image071
[Chemical formula 36]
Figure 02_image073

肟化合物為在波長350~500nm的範圍具有吸收極大之化合物為較佳,在波長360~480nm的範圍具有吸收極大之化合物為更佳。又,肟化合物為365nm及405nm的吸光度高的化合物為較佳。The oxime compound is preferably a compound having an absorption maximum in the wavelength range of 350-500 nm, and more preferably a compound having an absorption maximum in the wavelength range of 360-480 nm. In addition, the oxime compound is preferably a compound having high absorbance at 365 nm and 405 nm.

從靈敏度的觀點考慮,肟化合物在365nm或405nm下之莫耳吸光係數為1,000~300,000為較佳,2,000~300,000為更佳,5,000~200,000為特佳。化合物的莫耳吸光係數能夠利用公知的方法來測量。例如,藉由紫外可見分光光度計(Varian公司製造之Cary-5 spectrophotometer),並使用乙酸乙酯溶劑,以0.01g/L的濃度進行測量為較佳。From the viewpoint of sensitivity, the molar absorption coefficient of the oxime compound at 365 nm or 405 nm is preferably 1,000 to 300,000, more preferably 2,000 to 300,000, and particularly preferably 5,000 to 200,000. The molar absorption coefficient of the compound can be measured by a known method. For example, it is preferable to measure at a concentration of 0.01 g/L by an ultraviolet-visible spectrophotometer (Cary-5 spectrophotometer manufactured by Varian Corporation) using an ethyl acetate solvent.

本發明亦可以使用2官能或3官能以上的光聚合起始劑。藉由使用該種光聚合起始劑,從光聚合起始劑的1個分子生出2個以上的自由基,從而可獲得良好的靈敏度。又,使用非對稱結構的化合物時,因結晶性下降使得溶解於溶劑等的溶解性提高,經過時間亦不易析出,從而能夠提高組成物的經時穩定性。作為2官能或3官能以上的光聚合起始劑的具體例,可列舉日本特表2010-527339號公報、日本特表2011-524436號公報、國際公開WO2015/004565號公報、日本特表2016-532675號公報的段落號0417~0412、國際公開WO2017/033680號公報的段落號0039~0055中記載之肟化合物的二聚體、日本特表2013-522445號公報中記載之化合物(E)及化合物(G)、國際公開WO2016/034963號公報中記載之Cmpd1~7、日本特表2017-523465號公報的段落號0007中記載之肟酯類光起始劑、日本特開2017-167399號公報的段落號0020~0033中之光起始劑、日本特開2017-151342號公報的段落號0017~0026中記載之光聚合起始劑(A)等。In the present invention, a bifunctional or trifunctional or more photopolymerization initiator can also be used. By using such a photopolymerization initiator, two or more radicals are generated from one molecule of the photopolymerization initiator, so that good sensitivity can be obtained. In addition, when a compound having an asymmetric structure is used, the solubility in a solvent or the like is improved due to the decrease in crystallinity, and precipitation is not easy to occur over time, so that the temporal stability of the composition can be improved. Specific examples of the bifunctional or trifunctional or more than trifunctional photopolymerization initiators include JP 2010-527339 A, JP 2011-524436 A, International Publication WO 2015/004565 A, JP 2016-A Dimers of oxime compounds described in paragraphs 0417 to 0412 of Japanese Patent Publication No. 532675, paragraphs 0039 to 0055 of International Publication No. WO2017/033680, and compounds (E) and compounds described in Japanese Patent Application Publication No. 2013-522445 (G), Cmpd1 to 7 described in International Publication WO2016/034963, the oxime ester-based photoinitiator described in paragraph No. 0007 of JP 2017-523465 A, and JP 2017-167399 A. The photoinitiators described in paragraphs 0020 to 0033, the photopolymerization initiators (A) described in paragraphs 0017 to 0026 of JP-A No. 2017-151342, and the like.

本發明的組成物含有光聚合起始劑時,光聚合起始劑A的含量在組成物的總固體成分中為0.1~30質量%為較佳。下限例如為0.5質量%以上為更佳,1質量%以上為進一步較佳。上限例如為20質量%以下為更佳,10質量%以下為進一步較佳。 又,光聚合起始劑的含量相對於上述金屬偶氮顏料的100質量份為1~200質量份為較佳。下限為3質量份以上為較佳,5質量份以上為進一步較佳。上限為100質量份以下為較佳,80質量份以下為更佳。 又,作為光聚合起始劑使用肟化合物時,肟化合物的含量相對於上述金屬偶氮顏料A的100質量份為1~200質量份為較佳。下限為3質量份以上為較佳,5質量份以上為進一步較佳。上限為100質量份以下為較佳,80質量份以下為更佳。依該態樣,具有更顯著地獲得上述本發明的效果之傾向。 本發明的組成物可以含有1種光聚合起始劑,亦可以含有2種以上。含有2種以上的光聚合起始劑時,它們的合計量成為上述範圍為較佳。When the composition of the present invention contains a photopolymerization initiator, the content of the photopolymerization initiator A is preferably 0.1 to 30% by mass in the total solid content of the composition. The lower limit is, for example, more preferably 0.5 mass % or more, and even more preferably 1 mass % or more. For example, the upper limit is more preferably 20 mass % or less, and even more preferably 10 mass % or less. Moreover, it is preferable that content of a photopolymerization initiator is 1-200 mass parts with respect to 100 mass parts of said metal azo pigments. The lower limit is preferably 3 parts by mass or more, and more preferably 5 parts by mass or more. The upper limit is preferably 100 parts by mass or less, and more preferably 80 parts by mass or less. Moreover, when an oxime compound is used as a photopolymerization initiator, it is preferable that content of an oxime compound is 1-200 mass parts with respect to 100 mass parts of said metal azo pigments A. The lower limit is preferably 3 parts by mass or more, and more preferably 5 parts by mass or more. The upper limit is preferably 100 parts by mass or less, and more preferably 80 parts by mass or less. In this aspect, the effect of the present invention described above tends to be obtained more remarkably. The composition of the present invention may contain one type of photopolymerization initiator, or may contain two or more types. When two or more types of photopolymerization initiators are contained, it is preferable that the total amount of them is in the above-mentioned range.

<<多官能硫醇>> 本發明的組成物能夠含有多官能硫醇。多官能硫醇為具有2個以上的硫醇(SH)基之化合物。多官能硫醇與上述光聚合起始劑一起使用,藉此在照射光之後的自由基聚合過程中,發揮鏈轉移劑的作用,產生不易因氧聚合受阻的硫基,因此能夠提高組成物的靈敏度。尤為SH基為亞甲基、亞乙基等鍵結於脂肪族基之多官能脂肪族硫醇為較佳。<<Polyfunctional thiol>> The composition of the present invention can contain a polyfunctional thiol. A polyfunctional thiol is a compound having two or more thiol (SH) groups. The polyfunctional thiol is used together with the above-mentioned photopolymerization initiator to function as a chain transfer agent in the radical polymerization process after irradiation with light to generate a sulfur group that is not easily hindered by oxygen polymerization, so that the composition can be improved. sensitivity. In particular, the SH group is preferably a polyfunctional aliphatic thiol bonded to an aliphatic group such as a methylene group or an ethylene group.

作為多官能硫醇,例如可列舉己基二硫醇、癸烷二硫醇、1,4-丁二醇雙硫丙酸酯、1,4-丁二醇雙硫乙酸酯、乙二醇雙硫乙酸酯、乙二醇雙硫丙酸酯、三羥甲基丙烷三硫乙酸酯、三羥甲基丙烷三硫丙酸酯、三羥甲基乙烷三(3-巰基丁酸酯)、三羥甲基丙烷三(3-巰基丁酸酯)、三羥甲基丙烷三(3-巰基丙酸酯)、新戊四醇四硫乙酸酯、新戊四醇四硫丙酸酯、新戊四醇四(3-巰基丙酸酯)、二季戊四醇六(3-巰基丙酸酯)、三巰基丙酸三(2-羥乙基)異氰脲酸酯、1,4-二甲基巰基苯、2、4、6-三巰基-s-三嗪、2-(N,N-二丁基胺基)-4,6-二巰基-s-三嗪等。又,亦可列舉下述結構的化合物。Examples of polyfunctional thiols include hexyl dithiol, decane dithiol, 1,4-butanediol dithiopropionate, 1,4-butanediol dithioacetate, and ethylene glycol dithioacetate. Thioacetate, ethylene glycol dithiopropionate, trimethylolpropane trithioacetate, trimethylolpropane trithiopropionate, trimethylolethane tris(3-mercaptobutyrate) ), trimethylolpropane tris(3-mercaptobutyrate), trimethylolpropane tris(3-mercaptopropionate), neotaerythritol tetrathioacetate, neotaerythritol tetrathiopropionic acid Esters, neotaerythritol tetrakis(3-mercaptopropionate), dipentaerythritol hexa(3-mercaptopropionate), trimercaptopropionate tris(2-hydroxyethyl) isocyanurate, 1,4- Dimethylmercaptobenzene, 2、4、6-trimercapto-s-triazine, 2-(N,N-dibutylamino)-4,6-dimercapto-s-triazine, etc. Moreover, the compound of the following structure can also be mentioned.

[化學式37]

Figure 02_image075
[Chemical formula 37]
Figure 02_image075

多官能硫醇的含量相對於本發明的組成物的總固體成分為0.1~20質量%為較佳,0.1~15質量%為更佳,0.1~10質量%為進一步較佳。本發明的組成物可以含有1種多官能硫醇,亦可以含有2種以上。含有2種以上的多官能硫醇時,該等的合計量成為上述範圍為較佳。The content of the polyfunctional thiol is preferably 0.1 to 20% by mass, more preferably 0.1 to 15% by mass, and even more preferably 0.1 to 10% by mass relative to the total solid content of the composition of the present invention. The composition of this invention may contain 1 type of polyfunctional thiol, and may contain 2 or more types. When two or more types of polyfunctional thiols are contained, it is preferable that the total amount of these be in the above-mentioned range.

<<顏料衍生物>> 本發明的組成物能夠含有顏料衍生物。依該態樣,能夠形成相對於溫度變化的分光變動得到抑制之膜。作為顏料衍生物,可列舉顏料的一部份具有被酸基、鹼性基或苯二甲醯亞胺基等取代之結構之化合物。顏料衍生物為由下述式(syn1)表示之化合物為較佳。 [化學式38]

Figure 02_image077
式(syn1)中,P表示色素結構,L表示單鍵或連結基,X表示酸基、鹼性基或鄰苯二甲醯亞胺基,m表示1以上的整數,n表示1以上的整數,m為2以上時,複數個L及X可以彼此不同,n為2以上時,複數個X可以彼此不同。<<Pigment Derivative>> The composition of the present invention can contain a pigment derivative. According to this aspect, it is possible to form a film in which spectral fluctuations with respect to temperature changes are suppressed. Examples of the pigment derivatives include compounds having a structure in which a part of the pigment is substituted with an acid group, a basic group, a phthalimide group, or the like. The pigment derivative is preferably a compound represented by the following formula (syn1). [Chemical formula 38]
Figure 02_image077
In formula (syn1), P represents a pigment structure, L represents a single bond or a linking group, X represents an acid group, a basic group or a phthalimide group, m represents an integer of 1 or more, and n represents an integer of 1 or more , when m is 2 or more, a plurality of L and X may be different from each other, and when n is 2 or more, a plurality of X may be different from each other.

作為式(syn1)中之P所表示之色素結構,選自吡咯并吡咯色素結構、二酮吡咯并吡咯色素結構、喹啉色素結構、喹吖酮色素結構、異吲哚啉色素結構、異吲哚啉酮色素結構、蒽醌色素結構、聯蒽醌色素結構、苯并異吲哚色素結構、噻嗪靛藍色素結構、偶氮色素結構、喹啉黃色素結構、酞菁色素結構、萘酞菁色素結構、二噁嗪色素結構、苝色素結構、紫環酮色素結構、苯并咪唑酮色素結構、苯并噻唑色素結構、苯并咪唑色素結構及苯并噁唑色素結構之至少1種為較佳,選自吡咯并吡咯色素結構、二酮吡咯并吡咯色素結構、喹吖酮色素結構及苯并咪唑酮色素結構之至少1種為進一步較佳,吡咯并吡咯色素結構為特佳。The pigment structure represented by P in the formula (syn1) is selected from the group consisting of pyrrolopyrrole pigment structure, diketopyrrolopyrrole pigment structure, quinoline pigment structure, quinacridone pigment structure, isoindoline pigment structure, isoindoline pigment structure Dolinone pigment structure, anthraquinone pigment structure, dianthraquinone pigment structure, benzoisoindole pigment structure, thiazine indigo pigment structure, azo pigment structure, quinoline yellow pigment structure, phthalocyanine pigment structure, naphthalocyanine At least one of pigment structure, dioxazine pigment structure, perylene pigment structure, peronene pigment structure, benzimidazolone pigment structure, benzothiazole pigment structure, benzimidazole pigment structure and benzoxazole pigment structure is compared Preferably, at least one selected from the group consisting of pyrrolopyrrole pigment structure, diketopyrrolopyrrole pigment structure, quinacridone pigment structure and benzimidazolone pigment structure is further preferred, and pyrrolopyrrole pigment structure is particularly preferred.

式(syn1)中,作為L所表示之連結基,可列舉碳化氫基、雜環基、-NR-、-SO2 -、-S-、-O-、-CO-、-COO-、-OCO-或由該等組合構成之基團。R表示氫原子、烷基或芳基。碳化氫基可以是脂肪族碳化氫基,亦可以是芳香族碳化氫基。又,可以是組合脂肪族碳化氫基與芳香族碳化氫基之基團。碳化氫基的碳數為1~30為較佳,1~15為更佳,1~10為進一步較佳。雜環基為5員環或6員環為較佳。雜環基可以是單環,亦可以是稠環。稠環的縮合數為2~8為較佳,2~4為更佳。作為構成雜環基的環之雜原子,可列舉氮原子、硫原子及氧原子,氮原子為較佳。In the formula (syn1), the linking group represented by L includes a hydrocarbon group, a heterocyclic group, -NR-, -SO 2 -, -S-, -O-, -CO-, -COO-, - OCO- or a group consisting of these combinations. R represents a hydrogen atom, an alkyl group or an aryl group. The hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group. Moreover, it may be a group combining an aliphatic hydrocarbon group and an aromatic hydrocarbon group. The number of carbon atoms in the hydrocarbon group is preferably 1 to 30, more preferably 1 to 15, and even more preferably 1 to 10. The heterocyclic group is preferably a 5-membered ring or a 6-membered ring. The heterocyclic group may be a single ring or a fused ring. The condensation number of the fused ring is preferably 2-8, more preferably 2-4. A nitrogen atom, a sulfur atom, and an oxygen atom are mentioned as a hetero atom of the ring which comprises a heterocyclic group, A nitrogen atom is preferable.

式(syn1)中,X表示酸基、鹼性基或苯二甲醯亞胺基。作為X所表示之酸基,可列舉羧基、磺基、羧酸胺基、磺酸胺基、醯亞胺酸基等。作為羧酸胺基,由-NHCORX1 表示之基團為較佳。作為磺酸胺基,由-NHSO2 RX2 表示之基團為較佳。作為醯亞胺酸基,由-SO2 NHSO2 RX3 、-CONHSO2 RX4 、-CONHCORX5 或-SO2 NHCORX6 表示之基團為較佳。RX1 ~RX6 分別獨立地表示碳化氫基或雜環基。RX1 ~RX6 所表示之碳化氫基及雜環基可以具有取代基。作為取代基,可列舉上述取代基T,鹵原子為較佳,氟原子為更佳。作為X所表示之鹼性基,可列舉胺基。胺基為由-NR100 R101 表示之基團為較佳。R100 及R101 分別獨立地表示氫原子、碳化氫基或雜環基。R100 及R101 所表示之碳化氫基及雜環基可以具有取代基。作為取代基,可列舉上述取代基T。X所表示之苯二甲醯亞胺基可以不被取代,亦可以具有取代基。作為取代基,可列舉上述取代基T。In formula (syn1), X represents an acid group, a basic group or a phthalimide group. As an acid group represented by X, a carboxyl group, a sulfo group, a carboxylic acid amine group, a sulfonic acid amine group, an imidic acid group, etc. are mentioned. As the carboxylic acid amine group, a group represented by -NHCOR X1 is preferable. As the sulfonic acid amine group, a group represented by -NHSO 2 R X2 is preferable. As the imidic acid group, a group represented by -SO 2 NHSO 2 R X3 , -CONHSO 2 R X4 , -CONHCOR X5 or -SO 2 NHCOR X6 is preferable. R X1 to R X6 each independently represent a hydrocarbon group or a heterocyclic group. The hydrocarbon group and the heterocyclic group represented by R X1 to R X6 may have a substituent. As a substituent, the above-mentioned substituent T is mentioned, a halogen atom is preferable, and a fluorine atom is more preferable. An amino group is mentioned as a basic group represented by X. The amine group is preferably a group represented by -NR 100 R 101 . R 100 and R 101 each independently represent a hydrogen atom, a hydrocarbon group or a heterocyclic group. The hydrocarbon group and the heterocyclic group represented by R 100 and R 101 may have a substituent. As a substituent, the above-mentioned substituent T can be mentioned. The phthalimide group represented by X may be unsubstituted or may have a substituent. As a substituent, the above-mentioned substituent T can be mentioned.

式(syn1)中,m為1~10為較佳,1~5為更佳,1~2為進一步較佳。式(syn1)中,n為1~4為較佳,1~3為更佳,1~2為進一步較佳。In formula (syn1), m is preferably 1 to 10, more preferably 1 to 5, and even more preferably 1 to 2. In formula (syn1), n is preferably 1 to 4, more preferably 1 to 3, and further preferably 1 to 2.

作為顏料衍生物,可列舉下述結構的化合物。以下結構式中,Me表示甲基,Ph表示苯基。又,作為顏料衍生物,可列舉日本特開昭56-118462號公報、日本特開昭63-264674號公報、日本特開平1-217077號公報、日本特開平3-009961號公報、日本特開平3-026767號公報、日本特開平3-153780號公報、日本特開平3-045662號公報、日本特開平4-285669號公報、日本特開平6-145546號公報、日本特開平6-212088號公報、日本特開平6-240158號公報、日本特開平10-30063號公報、日本特開平10-195326號公報、國際公開WO2011/024896號公報的段落號0086~0098、國際公開WO2012/102399號公報的段落號0063~0094、國際公開WO2017/038252號公報的段落號0082、日本專利第5299151號公報中的記載。 [化學式39]

Figure 02_image079
As a pigment derivative, the compound of the following structure is mentioned. In the following structural formula, Me represents a methyl group, and Ph represents a phenyl group. In addition, as pigment derivatives, Japanese Patent Laid-Open No. 56-118462, Japanese Patent Laid-Open No. 63-264674, Japanese Patent Laid-Open No. 1-217077, Japanese Patent Laid-Open No. 3-009961, Japanese Patent Laid-Open No. 3-009961, Japanese Patent Laid-Open No. 3-026767, Japanese Patent Laid-Open No. 3-153780, Japanese Patent Laid-Open No. 3-045662, Japanese Patent Laid-Open No. 4-285669, Japanese Patent Laid-Open No. 6-145546, Japanese Patent Laid-Open No. 6-212088 , Japanese Patent Laid-Open No. 6-240158, Japanese Patent Laid-Open No. 10-30063, Japanese Patent Laid-Open No. 10-195326, Paragraph Nos. 0086 to 0098 of International Publication WO2011/024896, and International Publication No. WO2012/102399 Paragraph Nos. 0063 to 0094, Paragraph No. 0082 of International Publication WO2017/038252, and Japanese Patent No. 5299151. [Chemical formula 39]
Figure 02_image079

本發明的組成物含有顏料衍生物時,顏料衍生物的含量相對於組成物中所含之顏料的100質量份為1~30質量份為較佳,3~20質量份為進一步較佳。又,顏料衍生物的含量相對於金屬偶氮顏料A的100質量份為1~30質量份為較佳,3~20質量份為進一步較佳。本發明的組成物可以僅含有1種顏料衍生物,亦可以含有2種以上。含有2種以上顏料衍生物時,該等的合計量成為上述範圍為較佳。When the composition of the present invention contains a pigment derivative, the content of the pigment derivative is preferably 1 to 30 parts by mass, more preferably 3 to 20 parts by mass relative to 100 parts by mass of the pigment contained in the composition. Moreover, it is preferable that content of a pigment derivative is 1-30 mass parts with respect to 100 mass parts of metal azo pigments A, and 3-20 mass parts is more preferable. The composition of the present invention may contain only one type of pigment derivative, or may contain two or more types. When two or more kinds of pigment derivatives are contained, it is preferable that the total amount of these is in the above-mentioned range.

<<界面活性劑>> 本發明的組成物能夠含有界面活性劑。關於界面活性劑,能夠參閱國際公開WO2015/166779號公報的段落號0238~0245中的記載,且該內容被併入本說明書中。作為界面活性劑,可列舉氟系界面活性劑、非離子系界面活性劑、陽離子系界面活性劑、陰離子系界面活性劑、矽酮系界面活性劑等,氟系界面活性劑為較佳。本發明的組成物中含有氟系界面活性劑,藉此液特性(尤其,流動性)提高,從而能夠進一步改善省液性。又,亦能夠形成厚度不均小的膜。<<surfactant>> The composition of the present invention can contain a surfactant. Regarding the surfactant, the descriptions in Paragraph Nos. 0238 to 0245 of International Publication WO2015/166779 can be referred to, and the contents are incorporated in the present specification. Examples of the surfactant include fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, silicone-based surfactants, and the like, and fluorine-based surfactants are preferred. The composition of the present invention contains a fluorine-based surfactant, whereby the liquid properties (especially, fluidity) are improved, so that the liquid saving property can be further improved. Moreover, a film with small thickness unevenness can also be formed.

氟系界面活性劑中的氟含有率為3~40質量%為較佳,5~30質量%為更佳,7~25質量%為進一步較佳。氟含有率在該範圍內之氟系界面活性劑在塗佈膜的厚度的均勻性和省液性這一點上有效。The fluorine content in the fluorine-based surfactant is preferably 3 to 40% by mass, more preferably 5 to 30% by mass, and even more preferably 7 to 25% by mass. The fluorine-based surfactant having the fluorine content in this range is effective in terms of uniformity of the thickness of the coating film and liquid saving.

作為氟系界面活性劑,可列舉日本特開2014-041318號公報的段落號0060~0064(對應之國際公開WO2014/017669號公報的段落號0060~0064)中記載的界面活性劑、日本特開2011-132503號公報的段落號0117~0132中記載的界面活性劑等。又,作為氟系界面活性劑的市售品,可列舉MEGAFACE F171、F172、F173、F176、F177、F141、F142、F143、F144、R30、F437、F475、F479、F482、F554、F780、EXP、MFS-330(以上,DIC CORPORATION製)、FLUORAD FC430、FC431、FC171(以上,Sumitomo 3M Limited製)、SURFLON S-382、SC-101、SC-103、SC-104、SC-105、SC-1068、SC-381、SC-383、S-393、KH-40(以上,ASAHI GLASS CO.,LTD.製)、PolyFox PF636、PF656、PF6320、PF6520、PF7002(以上,OMNOVA SOLUTIONS INC.製)等。Examples of the fluorine-based surfactant include those described in paragraphs 0060 to 0064 of JP-A No. 2014-041318 (corresponding to paragraphs 0060-0064 of International Publication WO 2014/017669), Japanese Patent Laid-Open Publication No. 0060-0064 The surfactants and the like described in paragraphs 0117 to 0132 of the 2011-132503 publication. Moreover, as a commercial item of a fluorine-based surfactant, MEGAFACE F171, F172, F173, F176, F177, F141, F142, F143, F144, R30, F437, F475, F479, F482, F554, F780, EXP, MFS-330 (above, manufactured by DIC CORPORATION), FLUORAD FC430, FC431, FC171 (above, manufactured by Sumitomo 3M Limited), SURFLON S-382, SC-101, SC-103, SC-104, SC-105, SC-1068 , SC-381, SC-383, S-393, KH-40 (above, manufactured by ASAHI GLASS CO., LTD.), PolyFox PF636, PF656, PF6320, PF6520, PF7002 (above, manufactured by OMNOVA SOLUTIONS INC.), etc.

又,氟系界面活性劑能夠使用具有含有氟原子之官能基之分子結構的丙烯酸系化合物,若對該丙烯酸系化合物加熱則含有氟原子之官能基的部分被切斷使得氟原子揮發。作為該種氟系界面活性劑,可列舉DIC CORPORATION製的MEGAFACE DS系列(例如MEGAFACE DS-21)。In addition, as the fluorine-based surfactant, an acrylic compound having a molecular structure of a functional group containing a fluorine atom can be used, and when the acrylic compound is heated, the portion of the functional group containing a fluorine atom is cleaved and the fluorine atom is volatilized. Examples of such fluorine-based surfactants include MEGAFACE DS series (for example, MEGAFACE DS-21) manufactured by DIC CORPORATION.

又,氟系界面活性劑能夠使用具有氟化烷基或氟化伸烷基醚基之含氟原子的乙烯基醚化合物與親水性的乙烯基醚化合物的共聚物。關於該種氟系界面活性劑,能夠參閱日本特開2016-216602號公報中的記載,且該內容被併入本說明書中。Further, as the fluorine-based surfactant, a copolymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound can be used. Regarding such a fluorine-based surfactant, the description in JP 2016-216602 A can be referred to, and the content thereof is incorporated into the present specification.

氟系界面活性劑能夠使用嵌段聚合物。作為嵌段聚合物,例如可列舉日本特開2011-089090號公報中記載之化合物。又,氟系界面活性劑能夠使用含氟共聚物,該含氟共聚物包含:來自於具有氟原子之(甲基)丙烯酸酯化合物之重複單元;及來自於具有2個以上(較佳為5個以上)伸烷氧基(較佳為伸乙基氧基、伸丙基氧基)之(甲基)丙烯酸酯化合物重複單元。作為本發明中所使用之氟系界面活性劑,還例示出下述化合物。 [化學式40]

Figure 02_image081
上述化合物的重量平均分子量較佳為3,000~50,000,例如為14,000。上述化合物中表示重複單元的比例之%為莫耳%。As the fluorine-based surfactant, a block polymer can be used. As a block polymer, the compound described in Unexamined-Japanese-Patent No. 2011-089090 is mentioned, for example. In addition, as the fluorine-based surfactant, a fluorine-containing copolymer can be used, and the fluorine-containing copolymer includes: a repeating unit derived from a (meth)acrylate compound having a fluorine atom; (meth)acrylate compound repeating unit of more than one) alkeneoxy group (preferably ethylideneoxy group, propylideneoxy group). The following compounds are also exemplified as the fluorine-based surfactant used in the present invention. [Chemical formula 40]
Figure 02_image081
The weight average molecular weight of the above-mentioned compound is preferably 3,000 to 50,000, for example, 14,000. The % representing the ratio of the repeating unit in the above compound is mol%.

又,氟系界面活性劑能夠使用包含在側鏈上具有乙烯性不飽和基之重複單元之含氟共聚物。作為具體例,可列舉日本特開2010-164965號公報的段落號0050~0090及段落號0289~0295中記載之化合物、DIC CORPORATION製的MEGAFACE RS-101、RS-102、RS-718K、RS-72-K等。又,氟系界面活性劑亦能夠使用日本特開2015-117327號公報的段落號0015~0158中記載的化合物。Moreover, the fluorine-containing copolymer containing the repeating unit which has an ethylenically unsaturated group in a side chain can be used as a fluorine-type surfactant. Specific examples include the compounds described in paragraphs 0050 to 0090 and paragraphs 0289 to 0295 of JP 2010-164965 A, MEGAFACE RS-101, RS-102, RS-718K, RS- 72-K et al. In addition, the compounds described in paragraphs 0015 to 0158 of JP 2015-117327 A can also be used as the fluorine-based surfactant.

作為非離子系界面活性劑,可列舉甘油、三羥甲基丙烷、三羥甲基乙烷及該等的乙氧基化物及丙氧基化物(例如,甘油丙氧基化物、甘油乙氧基化物等)、聚氧乙烯月桂基醚、聚氧乙烯硬脂基醚、聚氧乙烯油基醚、聚氧乙烯辛基苯基醚、聚氧乙烯壬基苯基醚、聚乙二醇二月桂酸酯、聚乙二醇二硬脂酸酯、脫水山梨糖醇脂肪酸酯、Pluronic L10、L31、L61、L62、10R5、17R2、25R2(BASF公司製)、Tetronic 304、701、704、901、904、150R1(BASF公司製)、Solsperse 20000(Japan Lubrizol Corporation製)、NCW-101、NCW-1001、NCW-1002(Wako Pure Chemical Industries,Ltd.製)、PIONIN D-6112、D-6112-W、D-6315(Takemoto Oil & Fat Co.,Ltd.製)、OLFIN E1010、Surfynol 104、400、440(Nissin Chemical Co.,Ltd.製)等。Examples of nonionic surfactants include glycerin, trimethylolpropane, trimethylolethane, and their ethoxylates and propoxylates (for example, glycerol propoxylate, glycerol ethoxylate) compound, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene nonyl phenyl ether, polyethylene glycol dilauryl ether acid ester, polyethylene glycol distearate, sorbitan fatty acid ester, Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2 (manufactured by BASF), Tetronic 304, 701, 704, 901, 904, 150R1 (manufactured by BASF Corporation), Solsperse 20000 (manufactured by Japan Lubrizol Corporation), NCW-101, NCW-1001, NCW-1002 (manufactured by Wako Pure Chemical Industries, Ltd.), PIONIN D-6112, D-6112-W , D-6315 (manufactured by Takemoto Oil & Fat Co., Ltd.), OLFIN E1010, Surfynol 104, 400, 440 (manufactured by Nissin Chemical Co., Ltd.), etc.

界面活性劑的含量在組成物的總固體成分中0.001~5質量%為較佳。上限為3質量%以下為較佳,1質量%以下為更佳。下限為0.05質量%以上為較佳,0.01質量%以上為更佳。本發明的組成物可以僅含有1種界面活性劑,亦可以含有2種以上。含有2種以上界面活性劑時,該等的合計量成為上述範圍為較佳。The content of the surfactant is preferably 0.001 to 5% by mass in the total solid content of the composition. The upper limit is preferably 3 mass % or less, more preferably 1 mass % or less. The lower limit is preferably 0.05 mass % or more, and more preferably 0.01 mass % or more. The composition of the present invention may contain only one type of surfactant, or may contain two or more types. When two or more types of surfactants are contained, it is preferable that the total amount of these be in the above-mentioned range.

<<紫外線吸收劑>> 本發明的組成物能夠含有紫外線吸收劑。紫外線吸收劑能夠使用共軛二烯化合物、胺基二烯化合物、水楊酸酯化合物、二苯甲酮化合物、苯并三唑化合物、丙烯腈化合物、羥苯基三口井三嗪化合物、吲哚化合物、三嗪化合物等。關於該等的詳細內容,能夠參閱日本特開2012-208374號公報的段落號0052~0072、日本特開2013-068814號公報的段落號0317~0334、日本特開2016-162946號公報的段落號0061~0080中的記載,且該等內容被併入本說明書中。作為紫外線吸收劑的具體例,可列舉下述結構的化合物等。作為紫外線吸收劑的市售品,例如可列舉UV-503(DAITO CHEMICAL CO.,LTD.製)等。又,作為苯并三唑化合物,可列舉MIYOSHI OIL & FAT CO.,LTD.製的MYUA系列(化學工業日報、2016年2月1日)。 [化學式41]

Figure 02_image083
<<Ultraviolet absorber>> The composition of the present invention can contain an ultraviolet absorber. As the ultraviolet absorber, conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyl triazine compounds, indole compounds can be used. compounds, triazine compounds, etc. For details of these, refer to paragraph numbers 0052 to 0072 of JP 2012-208374 A, paragraph numbers 0317 to 0334 of JP 2013-068814 A, and paragraph numbers of JP 2016-162946 A 0061 to 0080, and these contents are incorporated into this specification. As a specific example of an ultraviolet absorber, the compound etc. of the following structures are mentioned. As a commercial item of an ultraviolet absorber, UV-503 (made by DAITO CHEMICAL CO., LTD.) etc. are mentioned, for example. Moreover, as a benzotriazole compound, the MYUA series (Chemical Industry Daily, February 1, 2016) manufactured by MIYOSHI OIL & FAT CO., LTD. can be mentioned. [Chemical formula 41]
Figure 02_image083

本發明的組成物含有紫外線吸收劑時,紫外線吸收劑的含量在組成物的總固體成分中為0.1~10質量%為較佳,0.1~5質量%為更佳,0.1~3質量%為特佳。本發明的組成物可以含有1種紫外線吸收劑,亦可以含有2種以上。含有2種以上的紫外線吸收劑時,該等的合計量成為上述範圍為較佳。When the composition of the present invention contains an ultraviolet absorber, the content of the ultraviolet absorber in the total solid content of the composition is preferably 0.1 to 10% by mass, more preferably 0.1 to 5% by mass, and particularly 0.1 to 3% by mass good. The composition of this invention may contain 1 type of ultraviolet absorber, and may contain 2 or more types. When two or more types of ultraviolet absorbers are contained, it is preferable that the total amount of these be in the above-mentioned range.

<<矽烷偶聯劑>> 本發明的組成物能夠含有矽烷偶聯劑。本發明中,矽烷偶聯劑是指具有水解性基和其之外的官能基之矽烷化合物。又,水解性基是指可與矽原子直接連結並藉由水解反應及縮合反應中的至少任一種而產生矽氧烷鍵結之取代基。作為水解性基,例如可列舉鹵原子、烷氧基、醯氧基等,烷氧基為較佳。亦即,矽烷偶聯劑為具有烷氧基甲矽烷基之化合物為較佳。又,作為水解性基以外的官能基,例如可列舉乙烯基、(甲基)丙烯醯基、巰基、環氧基、氧雜環丁基、胺基、脲基、硫醚基、異氰酸酯基等,(甲基)丙烯醯基及環氧基為較佳。矽烷偶聯劑可列舉日本特開2009-288703號公報的段落號0018~0036中記載的化合物、日本特開2009-242604號公報的段落號0056~0066中記載的化合物,且該等內容被併入本說明書中。<<Silane coupling agent>> The composition of the present invention can contain a silane coupling agent. In the present invention, the silane coupling agent refers to a silane compound having a hydrolyzable group and a functional group other than that. In addition, the hydrolyzable group refers to a substituent which can be directly linked to a silicon atom and generate a siloxane bond by at least any one of a hydrolysis reaction and a condensation reaction. As a hydrolyzable group, a halogen atom, an alkoxy group, an acyloxy group, etc. are mentioned, for example, An alkoxy group is preferable. That is, it is preferable that the silane coupling agent is a compound having an alkoxysilyl group. Moreover, as a functional group other than a hydrolyzable group, a vinyl group, a (meth)acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amine group, a urea group, a thioether group, an isocyanate group, etc. are mentioned, for example , (meth)acryloyl and epoxy groups are preferred. Examples of the silane coupling agent include the compounds described in paragraphs 0018 to 0036 of JP-A No. 2009-288703 and the compounds described in paragraphs 0056-0066 of JP-A 2009-242604, and these contents are combined. into this manual.

矽烷偶聯劑的含量在本發明的組成物的總固體成分中為0.001~20質量%為較佳,0.01~10質量%為更佳,0.1~5質量%為特佳。本發明的組成物可以僅含有1種矽烷偶聯劑,亦可以含有2種以上。含有2種以上的矽烷偶聯劑時,該等的合計量成為上述範圍為較佳。The content of the silane coupling agent is preferably 0.001 to 20 mass %, more preferably 0.01 to 10 mass %, and particularly preferably 0.1 to 5 mass % in the total solid content of the composition of the present invention. The composition of the present invention may contain only one type of silane coupling agent, or may contain two or more types. When two or more types of silane coupling agents are contained, it is preferable that the total amount of these be within the above-mentioned range.

<<聚合抑制劑>> 本發明的組成物含有聚合抑制劑為較佳。本發明的組成物含有聚合抑制劑,藉此即使在低溫環境下長期保管組成物之情況下,亦能夠製造出缺陷進一步得到抑制之膜。可獲得該種效果之詳細理由雖不明確,推測在於以下原因。亦即,本發明的組成物中所含之金屬偶氮顏料A含有2種以上的金屬離子,因此在保管組成物時,推測為由上述陰離子與金屬離子構成之金屬偶氮化合物彼此產生金屬交換而生成析出物,推測為然而藉由含有聚合抑制劑,降低金屬偶氮化合物的活性化度而使金屬偶氮化合物彼此不易產生金屬交換,其結果推測為獲得了上述效果。<<Polymerization inhibitor>> It is preferable that the composition of the present invention contains a polymerization inhibitor. The composition of the present invention contains a polymerization inhibitor, whereby even when the composition is stored in a low temperature environment for a long period of time, a film with further suppressed defects can be produced. Although the detailed reason why such an effect can be obtained is not clear, the following reason is presumed. That is, the metal azo pigment A contained in the composition of the present invention contains two or more kinds of metal ions. Therefore, when the composition is stored, it is presumed that the metal azo compounds composed of the above-mentioned anions and metal ions undergo metal exchange with each other. It is presumed that the precipitates are formed, however, by including a polymerization inhibitor, the activation degree of the metal azo compounds is lowered, and metal exchange between the metal azo compounds is less likely to occur. As a result, it is presumed that the above-mentioned effects are obtained.

作為聚合抑制劑,可列舉對苯二酚、對甲氧基苯酚、二-三級丁基對甲酚、鄰苯三酚、三級丁基鄰苯二酚、對苯醌、4,4’-硫代雙(3-甲基-6-三級丁基苯酚)、2,2’-亞甲基雙(4-甲基-6-三級丁基苯酚)、N-亞硝基苯基羥基胺鹽(銨鹽、亞鈰鹽等)等、2,2,6,6-四甲基哌啶1-氧基等。 本發明的組成物含有聚合抑制劑時,聚合抑制劑的含量在組成物中為0.0001~1質量%為較佳。下限為0.0005質量%以上為較佳,0.001質量%以上為更佳。上限為0.5質量%以下為較佳,0.1質量%以下為更佳。本發明的組成物可以僅含有1種聚合抑制劑,亦可以含有2種以上。含有2種以上的聚合抑制劑時,該等的合計量成為上述範圍為較佳。Examples of the polymerization inhibitor include hydroquinone, p-methoxyphenol, di-tertiary butyl-p-cresol, pyrogallol, tertiary butyl catechol, p-benzoquinone, 4,4' - Thiobis(3-methyl-6-tertiarybutylphenol), 2,2'-methylenebis(4-methyl-6-tertiarybutylphenol), N-nitrosophenyl Hydroxylamine salts (ammonium salts, cerium salts, etc.), etc., 2,2,6,6-tetramethylpiperidine 1-oxyl, etc. When the composition of the present invention contains a polymerization inhibitor, the content of the polymerization inhibitor in the composition is preferably 0.0001 to 1% by mass. The lower limit is preferably 0.0005 mass % or more, and more preferably 0.001 mass % or more. The upper limit is preferably 0.5 mass % or less, more preferably 0.1 mass % or less. The composition of the present invention may contain only one type of polymerization inhibitor, or may contain two or more types. When two or more kinds of polymerization inhibitors are contained, it is preferable that the total amount of these be within the above-mentioned range.

<<其他添加劑>> 本發明的組成物能夠依據需要摻合各種添加劑,例如填充劑、密合促進劑、抗氧化劑、潛在抗氧化劑、熱聚合起始劑等。關於該等添加劑,能夠參閱日本特開2012-003225號公報的段落號0183(對應之美國專利申請公開第2013/0034812號說明書的段落號0237)中的記載、日本特開2008-250074號公報的段落號0101~0104、0107~0109等中的記載,且該等內容被併入本說明書中。又,作為抗氧化劑,例如能夠使用酚化合物、磷系化合物(例如日本特開2011-090147號公報的段落號0042中記載的化合物)、硫醚化合物等。作為市售品,例如可列舉ADEKA CORPORATION製的Adekastab系列(AO-20、AO-30、AO-40、AO-50、AO-50F、AO-60、AO-60G、AO-80、AO-330等)。作為潛在抗氧化劑,可列舉起到抗氧化劑的功能之部位被保護基保護之化合物,該化合物為以100~250℃加熱或在存在酸/鹽基觸媒下以80~200℃加熱,藉此保護基脫離而起到抗氧化劑的功能之化合物。作為潛在抗氧化劑,可列舉國際公開WO2014/021023號公報、國際公開WO2017/030005號公報、日本特開2017-008219號公報中記載之化合物。作為市售品,可列舉ADEKA ARKLS GPA-5001(ADEKA CORPORATION製)等。作為熱聚合起始劑,可列舉頻哪醇化合物、有機過氧化物、偶氮化合物等,頻哪醇化合物為較佳。作為頻哪醇化合物,可列舉苯頻哪醇、1,2-二甲氧基-1,1,2,2-四苯乙烷、1,2-二乙氧基-1,1,2,2-四苯乙烷、1,2-二苯氧基-1,1,2,2-四苯乙烷、1,2-二甲氧基-1,1,2,2-四(4-甲基苯基)乙烷、1,2-二苯氧基-1,1,2,2-四(4-甲氧基苯基)乙烷、1,2-雙(三甲基矽氧基)-1,1,2,2-四苯乙烷、1,2-雙(三乙基矽氧基)-1,1,2,2-四苯乙烷、1,2-雙(三級丁基二甲基矽氧基)-1,1,2,2-四苯乙烷、1-羥基-2-三甲基矽氧基-1,1,2,2-四苯乙烷、1-羥基-2-三乙基矽氧基-1,1,2,2-四苯乙烷、1-羥基-2-三級丁基二甲基矽氧基-1,1,2,2-四苯乙烷等。又,關於頻哪醇化合物,能夠參閱日本特表2014-521772號公報、日本特表2014-523939號公報及日本特表2014-521772號公報中的記載,且該等內容被併入本說明書中。<<Other additives>> The composition of the present invention can incorporate various additives, for example, fillers, adhesion promoters, antioxidants, latent antioxidants, thermal polymerization initiators, and the like as necessary. Regarding these additives, reference can be made to the description in paragraph No. 0183 of JP 2012-003225 A (corresponding to paragraph No. 0237 in the specification of US Patent Application Laid-Open No. 2013/0034812 ) and the description in JP 2008-250074 A The descriptions in paragraph numbers 0101 to 0104, 0107 to 0109, etc., and these contents are incorporated into this specification. Moreover, as an antioxidant, a phenol compound, a phosphorus compound (for example, the compound described in the paragraph No. 0042 of Unexamined-Japanese-Patent No. 2011-090147), a thioether compound, etc. can be used, for example. Examples of commercially available products include Adekastab series (AO-20, AO-30, AO-40, AO-50, AO-50F, AO-60, AO-60G, AO-80, AO-330 manufactured by ADEKA CORPORATION) Wait). Examples of potential antioxidants include compounds whose sites that function as antioxidants are protected by protective groups, and the compounds are heated at 100 to 250°C or heated at 80 to 200°C in the presence of an acid/salt-based catalyst, whereby A compound in which the protective group is removed to function as an antioxidant. Examples of potential antioxidants include compounds described in International Publication No. WO2014/021023, International Publication No. WO2017/030005, and JP 2017-008219 A. As a commercial item, ADEKA ARKLS GPA-5001 (made by ADEKA CORPORATION) etc. are mentioned. As a thermal polymerization initiator, a pinacol compound, an organic peroxide, an azo compound, etc. are mentioned, A pinacol compound is preferable. Examples of the pinacol compound include benzopinacol, 1,2-dimethoxy-1,1,2,2-tetraphenylethane, 1,2-diethoxy-1,1,2, 2-Tetraphenylethane, 1,2-diphenoxy-1,1,2,2-tetraphenylethane, 1,2-dimethoxy-1,1,2,2-tetra(4- Methylphenyl)ethane, 1,2-diphenoxy-1,1,2,2-tetrakis(4-methoxyphenyl)ethane, 1,2-bis(trimethylsiloxy) )-1,1,2,2-tetraphenylethane, 1,2-bis(triethylsiloxy)-1,1,2,2-tetraphenylethane, 1,2-bis(tertiary Butyldimethylsiloxy)-1,1,2,2-tetraphenylethane, 1-hydroxy-2-trimethylsiloxy-1,1,2,2-tetraphenylethane, 1 -Hydroxy-2-triethylsiloxy-1,1,2,2-tetraphenylethane, 1-hydroxy-2-tert-butyldimethylsiloxy-1,1,2,2- Tetraphenylethane, etc. In addition, regarding the pinacol compound, reference can be made to the descriptions in JP 2014-521772 A, JP 2014-523939 A, and JP 2014-521772 A, and these contents are incorporated into this specification .

本發明的組成物的固體成分濃度為5~50質量%為較佳。上限為45質量%以下為較佳,40質量%以下為更佳。下限為8質量%以上為較佳,10質量%以上為較佳。The solid content concentration of the composition of the present invention is preferably 5 to 50 mass %. The upper limit is preferably 45 mass % or less, more preferably 40 mass % or less. The lower limit is preferably 8% by mass or more, and more preferably 10% by mass or more.

本發明的組成物的黏度(23℃)例如藉由塗佈來形成膜時為1~100mPa・s為較佳。下限為2mPa・s以上為更佳,3mPa・s以上為進一步較佳。上限為50mPa・s以下為更佳,30mPa・s以下為進一步較佳,15mPa・s以下為特佳。The viscosity (23° C.) of the composition of the present invention is preferably 1 to 100 mPa·s when, for example, a film is formed by coating. The lower limit is more preferably 2 mPa・s or more, and more preferably 3 mPa・s or more. The upper limit is more preferably 50 mPa・s or less, more preferably 30 mPa・s or less, and particularly preferably 15 mPa・s or less.

作為本發明的組成物的收容容器,並無特別限定,能夠使用公知的收容容器。又,作為收容容器,以抑制雜質混入原材料或組成物中為目的,使用由6種6層的樹脂構成容器內壁之多層瓶或將6種樹脂設為7層結構之瓶亦較佳。作為該種容器例如可列舉日本特開2015-123351號公報中記載的容器。It does not specifically limit as a container of the composition of this invention, A well-known container can be used. In addition, as the container, it is also preferable to use a multilayer bottle in which the inner wall of the container is constituted by 6 types of 6-layer resins or a bottle in which 6 types of resins have a 7-layer structure for the purpose of suppressing the contamination of impurities into the raw material or the composition. As such a container, the container described in Unexamined-Japanese-Patent No. 2015-123351 is mentioned, for example.

本發明的組成物能夠較佳地用作用於形成紅外線透射濾波器的組成物The composition of the present invention can be preferably used as a composition for forming an infrared transmission filter

<組成物的製備方法> 本發明的組成物能夠混合前述成分來製備。製備組成物時,可以將全部成分同時溶解或分散於溶劑中來製備組成物,亦可以依據需要預先製備出適當摻合各成分之2個以上的溶液或分散液,使用時(塗佈時)再將該等混合而製備出組成物。<Method for preparing composition> The composition of the present invention can be prepared by mixing the aforementioned components. When preparing a composition, the composition can be prepared by dissolving or dispersing all the components in a solvent at the same time, or a solution or dispersion in which two or more components of each component are appropriately blended can be prepared in advance as required. These are then mixed to prepare a composition.

又,製備組成物時,包括分散顏料之製程為較佳。分散顏料之製程中,作為在顏料的分散中使用之機械力,可列舉壓縮、壓榨、衝擊、剪切、氣蝕等。作為用於實施該等製程的具體例,可列舉球磨、砂磨、輥磨、球磨、油漆攪拌、微射流、高速葉輪、混砂、噴射流混合、高壓濕式微粒化、超聲波分散等。又,砂磨(球磨)中之顏料的粉碎中,在藉由使用直徑小的珠、將珠的填充率設為較大等而提高粉碎效率之條件下進行處理為較佳。又,粉碎處理之後藉由過濾、離心分離等去除粗粒子為較佳。又,關於分散顏料之製程及分散機能夠使用“分散技術大全、JOHOKIKO CO.,LTD.發行、2005年7月15日”和“以懸浮液(suspension)(固/液分散系)為中心之分散技術和工業應用的實際綜合資料集、經營開發中心出版部發行、1978年10月10日”、日本特開2015-157893號公報的段落號0022中記載的製程及分散機。又,分散顏料之製程中,可以在鹽磨步驟中進行顏料的微細化處理。在鹽磨步驟中使用之素材、機器、處理條件等例如能夠參閱日本特開2015-194521號公報、日本特開2012-046629號公報中的記載。In addition, when preparing the composition, it is preferable to include the process of dispersing the pigment. In the process of dispersing pigments, compression, pressing, impact, shearing, cavitation, etc. may be mentioned as the mechanical force used in the dispersion of pigments. Specific examples for carrying out these processes include ball milling, sand milling, roller milling, ball milling, paint stirring, micro-jet, high-speed impeller, sand mixing, jet mixing, high-pressure wet micronization, ultrasonic dispersion, and the like. In addition, in the grinding of the pigment in the sand mill (ball mill), it is preferable to carry out the treatment under the conditions that the grinding efficiency is improved by using beads with a small diameter, increasing the filling rate of the beads, and the like. In addition, it is preferable to remove coarse particles by filtration, centrifugation, or the like after the pulverization treatment. Also, regarding the process of dispersing pigments and the dispersing machine, the "Encyclopedia of Dispersion Technology, Published by JOHOKIKO CO., LTD., July 15, 2005" and "Suspension (solid/liquid dispersion system) as the center" can be used. The process and dispersing machine described in the actual comprehensive data collection of dispersion technology and industrial application, issued by the Publishing Department of the Management Development Center, October 10, 1978", Japanese Patent Application Laid-Open No. 2015-157893, Paragraph No. 0022. In addition, in the process of dispersing the pigment, the micronization treatment of the pigment may be performed in the salt milling step. For materials, machines, processing conditions and the like used in the salt milling step, for example, the descriptions in Japanese Patent Application Laid-Open No. 2015-194521 and Japanese Patent Application Laid-Open No. 2012-046629 can be referred to.

製備組成物時,以去除異物和減少缺陷等為目的,藉由過濾器來過濾組成物為較佳。作為過濾器,只要是現有的用於過濾用途等之過濾器,則能夠不受特別限定地使用。例如,可列舉使用了聚四氟乙烯(PTFE)等氟樹脂、尼龍(例如尼龍-6、尼龍-6,6)等聚醯胺系樹脂、聚乙烯、聚丙烯(PP)等聚烯烴樹脂(包括高密度、超高分子量的聚烯烴樹脂)等的素材之過濾器。該等素材中聚丙烯(包括高密度聚丙烯)及尼龍為較佳。When preparing the composition, it is preferable to filter the composition with a filter for the purpose of removing foreign matter and reducing defects. The filter can be used without particular limitation as long as it is an existing filter used for filtering purposes or the like. For example, fluororesins such as polytetrafluoroethylene (PTFE), polyamide resins such as nylon (for example, nylon-6, nylon-6,6), and polyolefin resins such as polyethylene and polypropylene (PP) are used ( Including high-density, ultra-high molecular weight polyolefin resin) and other materials of the filter. Among these materials, polypropylene (including high density polypropylene) and nylon are preferred.

過濾器的孔徑為0.01~7.0μm為較佳,0.01~3.0μm為更佳,0.05~0.5μm為進一步較佳。若過濾器的孔徑在上述範圍,則能夠更可靠地去除微細的異物。關於過濾器的孔徑值,能夠參閱過濾器製造商的標稱值。過濾器能夠使用NIHON PALL LTD.(DFA4201NIEY等)、Advantec Toyo Kaisha, Ltd.、Nihon Entegris K.K.(forMerly Nippon Mykrolis Corporation)或KITZ MICROFILTER CORPORATION等所提供之各種過濾器。The pore size of the filter is preferably 0.01 to 7.0 μm, more preferably 0.01 to 3.0 μm, and even more preferably 0.05 to 0.5 μm. When the pore diameter of the filter is within the above range, fine foreign matter can be removed more reliably. For filter pore size values, you can refer to the filter manufacturer's nominal value. As the filter, various filters provided by NIHON PALL LTD. (DFA4201NIEY, etc.), Advantec Toyo Kaisha, Ltd., Nihon Entegris K.K. (for Merly Nippon Mykrolis Corporation), or KITZ MICROFILTER CORPORATION can be used.

又,作為過濾器使用纖維狀的濾材之過濾器亦較佳。作為纖維狀的濾材,例如可列舉聚丙烯纖維、尼龍纖維、玻璃纖維等。作為市售品可列舉ROKI TECHNO CO.,LTD製的SBP類型系列(SBP008等)、TPR類型系列(TPR002、TPR005等)、SHPX類型系列(SHPX003等)。Moreover, a filter using a fibrous filter medium as a filter is also preferable. As a fibrous filter medium, polypropylene fiber, nylon fiber, glass fiber, etc. are mentioned, for example. Commercially available products include SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.), and SHPX type series (SHPX003, etc.) manufactured by ROKI TECHNO CO., LTD.

使用過濾器時,可以組合不同的過濾器(例如,第1過濾器與第2過濾器等)。此時,使用各過濾器進行的過濾可以僅進行1次,亦可以進行2次以上。又,可以在上述範圍內組合不同孔徑的過濾器。又,可以是使用第1過濾器進行的過濾僅針對分散液進行,混合其他成分之後,再使用第2過濾器來進行過濾。When using filters, you can combine different filters (eg, 1st filter vs. 2nd filter, etc.). At this time, the filtration using each filter may be performed only once, or may be performed twice or more. Also, filters of different pore sizes may be combined within the above-mentioned range. Moreover, the filtration using the 1st filter may be performed only with respect to the dispersion liquid, and after mixing other components, filtration may be performed using the 2nd filter.

<膜> 接著,對本發明的膜進行說明。本發明的膜係由上述本發明的組成物獲得者。本發明的膜能夠較佳地用作紅外線透射濾波器。<Film> Next, the film of this invention is demonstrated. The film of the present invention is obtained from the composition of the present invention described above. The film of the present invention can be preferably used as an infrared transmission filter.

本發明的膜滿足膜的厚度方向上之光的透射率的波長400~600nm的範圍內之最大值為20%以下(較佳為15%以下,更佳為10%以下)且波長1000~1300nm的範圍內之最小值為70%以上(較佳為75%以上,更佳為80%以上)之分光特性為較佳:The film of the present invention satisfies the maximum value within the wavelength range of 400 to 600 nm for the transmittance of light in the thickness direction of the film is 20% or less (preferably 15% or less, more preferably 10% or less) and wavelength 1000 to 1300 nm The minimum value within the range of 70% or more (preferably 75% or more, more preferably 80% or more) is better for spectral characteristics:

本發明的膜滿足以下(111)~(113)中的任一個分光特性為更佳。 (111):膜的厚度方向上之光的透射率的波長400~600nm的範圍內之最大值為20%以下(較佳為15%以下,更佳為10%以下),且膜的厚度方向上之光的透射率的波長800~1300nm的範圍內之最小值為70%以上(較佳為75%以上,更佳為80%以上)之態樣。依該態樣,能夠設為阻斷波長400~600nm的範圍的光而能夠透射超過波長650nm之光的膜。 (112):膜的厚度方向上之光的透射率的波長400~720nm的範圍內之最大值為20%以下(較佳為15%以下,更佳為10%以下),且膜的厚度方向上之光的透射率的波長900~1300nm的範圍內之最小值為70%以上(較佳為75%以上,更佳為80%以上)之態樣。依該態樣,能夠設為阻斷波長400~750nm的範圍的光而能夠透射超過波長800nm之光的膜。 (113):膜的厚度方向上之光的透射率的波長400~830nm的範圍內之最大值為20%以下(較佳為15%以下,更佳為10%以下),膜的厚度方向上之光的透射率的波長1000~1300nm的範圍內之最小值為70%以上(較佳為75%以上,更佳為80%以上)之態樣。依該態樣,能夠設為阻斷波長400~830nm的範圍的光而能夠透射超過波長900nm之光的膜。More preferably, the film of the present invention satisfies any one of the spectroscopic properties in the following (111) to (113). (111): The maximum value of the transmittance of light in the thickness direction of the film in the wavelength range of 400 to 600 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the film thickness direction The minimum value in the wavelength range of 800-1300nm of the transmittance|permeability of the light above is the aspect which is 70% or more (preferably 75% or more, more preferably 80% or more). According to this aspect, it can be set as a film which can block the light of the range of wavelength 400-600nm, and can transmit the light exceeding a wavelength of 650nm. (112): The maximum value of the transmittance of light in the thickness direction of the film in the wavelength range of 400 to 720 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the film thickness direction The minimum value in the wavelength range of 900-1300nm of the transmittance|permeability of the light above is an aspect which is 70% or more (preferably 75% or more, more preferably 80% or more). According to this aspect, it can be set as a film which can block the light of the range of wavelength 400-750nm, and can transmit the light exceeding wavelength 800nm. (113): The maximum value of the transmittance of light in the thickness direction of the film in the wavelength range of 400 to 830 nm is 20% or less (preferably 15% or less, more preferably 10% or less) in the thickness direction of the film The minimum value in the wavelength range of 1000-1300nm of the transmittance|permeability of light is an aspect which is 70% or more (preferably 75% or more, more preferably 80% or more). According to this aspect, it can be set as a film which can block the light of the range of wavelength 400-830nm, and can transmit the light exceeding wavelength 900nm.

本發明的膜的膜厚能夠依據目的適當調整。10.0μm以下為較佳,5.0μm以下為更佳,3.0μm以下為進一步較佳,2.5μm以下為更進一步較佳2.0μm以下為更進一步較佳,1.5μm以下為特佳。膜厚的下限為0.4μm以上為較佳,0.5μm以上為更佳,0.6μm以上為進一步較佳,0.7μm以上為更進一步較佳,0.8μm以上為更進一步較佳,0.9μm以上為特佳。The film thickness of the film of the present invention can be appropriately adjusted according to the purpose. 10.0 μm or less is preferred, 5.0 μm or less is more preferred, 3.0 μm or less is further preferred, 2.5 μm or less is still more preferred, 2.0 μm or less is further preferred, and 1.5 μm or less is particularly preferred. The lower limit of the film thickness is preferably 0.4 μm or more, more preferably 0.5 μm or more, still more preferably 0.6 μm or more, still more preferably 0.7 μm or more, still more preferably 0.8 μm or more, and especially 0.9 μm or more. good.

<膜的製造方法> 接著,對本發明的膜的製造方法進行說明。本發明的膜能夠經過塗佈本發明的組成物之步驟來製造。<The manufacturing method of a film> Next, the manufacturing method of the film of this invention is demonstrated. The film of the present invention can be produced through a step of coating the composition of the present invention.

本發明的膜的製造方法中,組成物塗佈於支撐體上為較佳。作為支撐體,例如可列舉由矽、無鹼性玻璃、鈉玻璃、Pyrex(註冊商標)玻璃、石英玻璃等材質構成之基板。亦可以在該等基板形成有機膜和無機膜等。作為有機膜的材料,例如可列舉在上述組成物的欄中說明之樹脂。又,支撐體亦能夠使用由樹脂構成之基板。又,可以在支撐體形成有電荷耦合元件(CCD)、互補金屬氧化膜半導體(CMOS)、透明導電膜等。又,有時在支撐體形成有將各像素進行隔離之黑矩陣。又,可以在支撐體上依據需要設置下塗層,該下塗層用於改進與上部層與的密合性、防止物質的擴散或基板表面的平坦化。又,作為支撐體使用玻璃基板時,在玻璃基板上形成無機膜或將玻璃基板進行脫鹼處理來使用為較佳。In the manufacturing method of the film of this invention, it is preferable that a composition is apply|coated on a support body. Examples of the support include substrates made of materials such as silicon, alkali-free glass, soda glass, Pyrex (registered trademark) glass, and quartz glass. An organic film, an inorganic film, etc. may be formed on these substrates. As a material of an organic film, the resin demonstrated in the column of the said composition is mentioned, for example. Moreover, the board|substrate which consists of resins can also be used for a support body. In addition, a charge coupled element (CCD), a complementary metal oxide semiconductor (CMOS), a transparent conductive film, and the like may be formed on the support. Moreover, the black matrix which isolate|separates each pixel may be formed in a support body. In addition, an undercoat layer may be provided on the support as necessary for improving adhesion to the upper layer, preventing diffusion of substances, or flattening the surface of the substrate. Moreover, when using a glass substrate as a support body, it is preferable to form an inorganic film on a glass substrate, or to perform a dealkalization process on a glass substrate and use it.

作為組成物的塗佈方法,能夠採用公知的方法。例如,可列舉滴加法(滴鑄);狹縫塗佈法;噴塗法;輥塗法;旋轉塗佈法(旋塗);流延塗佈法;狹縫旋塗法;預濕法(例如,日本特開2009-145395號公報中記載之方法);噴墨(例如按需方式、壓電方式、熱方式)、噴嘴噴射等吐出系印刷、柔版印刷、網版印刷、凹版印刷、逆轉偏移印刷、金屬遮罩印刷法等各種印刷法;利用模具等之轉印法;納米壓印法等。作為噴墨中的塗佈,並無特別限定,例如可列舉“廣泛使用之噴墨-日本專利中的無限可能性-、2005年2月發行、S.B. RESEARCH CO., LTD.”所示之方法(尤其115頁~133頁)和日本特開2003-262716號公報、日本特開2003-185831號公報、日本特開2003-261827號公報、日本特開2012-126830號公報、日本特開2006-169325號公報等中記載的方法。又,旋塗法中的塗佈以1000~2000rpm的轉速進行為較佳。又,關於旋塗法中的塗佈,如日本特開平10-142603號公報、日本特開平11-302413號公報、日本特開2000-157922號公報中所記載,可以在塗佈過程中提高轉速。又,亦能夠較佳地使用“尖端濾色器的製程技術與化學製劑”2006年1月31日、CMC Publishing Co.,Ltd. 記載的旋塗製程。又,關於組成物的塗佈方法,可列舉、國際公開WO2017/030174號公報、國際公開WO2017/018419號公報中記載的方法,且該等內容被併入本說明書中。As a coating method of the composition, a known method can be adopted. For example, drop coating method (drop casting); slot coating method; spray coating method; roll coating method; spin coating method (spin coating); , the method described in Japanese Patent Laid-Open No. 2009-145395); inkjet (such as on-demand method, piezoelectric method, thermal method), nozzle jetting and other ejection printing, flexographic printing, screen printing, gravure printing, reverse printing Various printing methods such as offset printing and metal mask printing method; transfer method using molds, etc.; nanoimprinting method, etc. It does not specifically limit as coating in inkjet, For example, the method shown in "Inkjet widely used - Unlimited possibilities in Japanese patent-, issued in February 2005, S.B. RESEARCH CO., LTD." can be mentioned. (particularly pages 115 to 133) and JP 2003-262716 A, JP 2003-185831 A, JP 2003-261827 A, JP 2012-126830 A, JP 2006-A The method described in Gazette 169325 and the like. Moreover, it is preferable to carry out the application|coating in a spin-coating method at the rotation speed of 1000-2000 rpm. In addition, regarding the coating in the spin coating method, as described in Japanese Patent Laid-Open No. 10-142603, Japanese Patent Laid-Open No. 11-302413, and Japanese Patent Laid-Open No. 2000-157922, the rotational speed can be increased during the coating process. . In addition, the spin coating process described in "Process Technology and Chemical Preparation of Advanced Color Filters", CMC Publishing Co., Ltd., January 31, 2006 can also be preferably used. Moreover, about the coating method of a composition, the method described in International Publication WO2017/030174 A and International Publication WO2017/018419 A can be exemplified, and these contents are incorporated into the present specification.

塗佈組成物而形成之組成物層(塗佈膜)可以進行乾燥(預烘烤)。藉由低溫製程製造膜時,可以不進行預烘烤。進行預烘烤時,預烘烤溫度為150℃以下為較佳,120℃以下為更佳,110℃以下為進一步較佳。下限例如能夠設為50℃以上,亦能夠設為80℃以上。預烘烤時間為10~3000秒為較佳,40~2500秒為更佳,80~220秒為進一步較佳。預烘烤能夠使用加熱板、烘烤箱等來進行。The composition layer (coating film) formed by applying the composition may be dried (pre-baking). When the film is fabricated by a low temperature process, prebaking may not be performed. When pre-baking is performed, the pre-baking temperature is preferably 150°C or lower, more preferably 120°C or lower, and even more preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, or 80°C or higher. The pre-baking time is preferably 10 to 3000 seconds, more preferably 40 to 2500 seconds, and even more preferably 80 to 220 seconds. The prebaking can be performed using a hot plate, an oven, or the like.

膜的製造方法中,進一步包括形成圖案之步驟亦較佳。作為圖案形成方法,可列舉採用了光微影法之圖案形成方法、採用了乾式蝕刻法之圖案形成方法,採用了光微影法之圖案形成方法為較佳。另外,將本發明的膜用作平坦膜時,可以不進行形成圖案之步驟。以下,對形成圖案之步驟進行詳細說明。In the manufacturing method of the film, it is also preferable to further include the step of forming a pattern. As a pattern formation method, the pattern formation method using a photolithography method, the pattern formation method using a dry etching method, and the pattern formation method using a photolithography method is preferable. In addition, when the film of the present invention is used as a flat film, the step of forming a pattern may not be performed. Hereinafter, the steps of forming a pattern will be described in detail.

(以光微影法進行圖案形成之情況) 採用光微影法的圖案形成方法包括以下步驟為較佳:對於塗佈本發明的組成物而形成之組成物層以圖案狀進行曝光之步驟(曝光步驟);及將未曝光部的組成物層進行顯影去除而形成圖案之步驟(顯影步驟)。依據需要,亦可以設置對已顯影之圖案進行烘烤之步驟(後烘烤步驟)。以下,對各步驟進行說明。(The case of pattern formation by photolithography) The pattern formation method by photolithography preferably includes the following steps: the step of exposing the composition layer formed by coating the composition of the present invention in a pattern ( Exposure step); and the step of developing and removing the composition layer of the unexposed portion to form a pattern (development step). According to needs, a step of baking the developed pattern (post-baking step) can also be provided. Hereinafter, each step will be described.

<<曝光步驟>> 在曝光步驟中將組成物層以圖案狀進行曝光(曝光步驟)。例如,對於組成物層,使用步進曝光機和掃描曝光機等而經由具有規定的遮罩圖案之遮罩來進行曝光,藉此能夠進行圖案曝光。藉此,能夠使曝光部分硬化。作為能夠在進行曝光時使用之放射線(光),可列舉g射線、i射線等。又,亦能夠使用波長300nm以下的光(較佳為波長180~300nm的光)。作為波長300nm以下的光,可列舉KrF射線(波長248nm)、ArF射線(波長193nm)等,KrF射線(波長248nm)為較佳。照射量(曝光量)例如為0.03~2.5J/cm2 為較佳,0.05~1.0J/cm2 為更佳,0.08~0.5J/cm2 為最佳。關於曝光時之氧濃度,能夠適當選擇。例如,可以在大氣下進行曝光,亦可以在氧濃度為19體積%以下的低氧氣氛下(例如,15體積%、5體積%、實質上無氧)進行曝光,亦可以在氧濃度超過21體積%之高氧氣氛下(例如,22體積%、30體積%、50體積%)下進行曝光。又,能夠適當設定曝光照度,從1000~100000W/m2 的範圍選擇為較佳。氧濃度與曝光照度可以組合適當條件,例如能夠設為氧濃度10體積%下照度為10000W/m2 、氧濃度35體積%下照度為20000W/m2 等。<<Exposure Step>> In the exposure step, the composition layer is exposed in a pattern (exposure step). For example, pattern exposure can be performed by exposing the composition layer through a mask having a predetermined mask pattern using a stepper, a scanner, or the like. Thereby, the exposed part can be hardened. Examples of radiation (light) that can be used for exposure include g-rays, i-rays, and the like. In addition, light having a wavelength of 300 nm or less (preferably, light having a wavelength of 180 to 300 nm) can also be used. As light with a wavelength of 300 nm or less, KrF rays (wavelength 248 nm), ArF rays (wavelength 193 nm), etc. are mentioned, and KrF rays (wavelength 248 nm) are preferred. The irradiation dose (exposure dose) is, for example, preferably 0.03 to 2.5 J/cm 2 , more preferably 0.05 to 1.0 J/cm 2 , and most preferably 0.08 to 0.5 J/cm 2 . The oxygen concentration at the time of exposure can be appropriately selected. For example, exposure can be performed in the atmosphere, or in a low-oxygen atmosphere with an oxygen concentration of 19 vol % or less (eg, 15 vol %, 5 vol %, substantially oxygen-free), or an oxygen concentration exceeding 21 vol. Exposure is performed under a high oxygen atmosphere (eg, 22 vol%, 30 vol%, 50 vol%) by volume. In addition, the exposure illuminance can be appropriately set, and it is preferably selected from the range of 1000 to 100000 W/m 2 . The oxygen concentration and exposure illuminance can be combined with appropriate conditions. For example, the illuminance can be 10,000 W/m 2 at an oxygen concentration of 10 vol %, and 20,000 W/m 2 at an oxygen concentration of 35 vol %.

<<顯影步驟>> 接著,將曝光後的組成物層中之未曝光部的組成物層進行顯影去除而形成圖案。未曝光部的組成物層的顯影去除能夠使用顯影液來進行。藉此,曝光步驟中之未曝光部的組成物層在顯影液中溶出,而僅剩下光硬化之部分殘留於支撐體上。顯影液的溫度例如為20~30℃為較佳。顯影時間為20~180秒鐘為較佳。又,為了提高殘渣去除性,可以重複進行數次每60秒鐘甩去顯影液進而供給新的顯影液之步驟。<<Development Step>> Next, among the exposed composition layers, the composition layer of the unexposed portion is developed and removed to form a pattern. The development and removal of the composition layer of the unexposed portion can be performed using a developing solution. Thereby, the composition layer of the unexposed part in the exposure step is eluted in the developing solution, and only the photohardened part remains on the support. The temperature of the developer is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. In addition, in order to improve the residue removal property, the step of shaking off the developer every 60 seconds and supplying a new developer may be repeated several times.

顯影液為以純水稀釋鹼劑而得之鹼性水溶液為較佳。作為鹼劑,例如可列舉氨、乙胺、二乙胺、二甲基乙醇胺、二甘醇胺、二乙醇胺、羥胺、乙二胺、四甲基氫氧化銨、四乙基氫氧化銨、四丙基氫氧化銨、四丁基氫氧化銨、氫氧化乙基三甲基銨、苄基三甲基氫氧化銨、二甲基雙(2-羥乙基)氫氧化銨、膽鹼、吡咯、哌啶、1,8-二氮雜雙環[5.4.0]-7-十一烯等有機鹼性化合物、氫氧化鈉、氫氧化鉀、碳酸鈉、碳酸氫鈉、矽酸鈉、偏矽酸鈉等無機鹼性化合物。鹼劑從環境和安全性考慮,分子量大的化合物為較佳。鹼性水溶液的鹼劑的濃度為0.001~10質量%為較佳,0.01~1質量%為更佳。又,顯影液可以進一步含有界面活性劑。作為界面活性劑,可列舉上述界面活性劑,非離子性系界面活性劑為較佳。從方便運輸和保管等觀點考慮,顯影液可以暫且作為濃縮液製造,並在使用時稀釋成所需之濃度。對於稀釋倍率並無特別限定,但例如能夠設定在1.5~100倍的範圍。另外,將鹼性水溶液用作顯影液之情況下,顯影後用純水進行洗淨(沖洗)為較佳。又,關於沖洗,使形成有顯影後的組成物層之支撐體旋轉的同時,向顯影後的組成物層供給沖洗液來進行為較佳。又,使吐出沖洗液之噴嘴從支撐體的中心部向支撐體的周緣部移動來進行亦較佳。此時,從噴嘴的支撐體中心部向周緣部移動之時,可以使噴嘴的移動速度慢慢下降而進行移動。藉由如此進行沖洗,能夠抑制沖洗的面內不均。又,即使一邊從噴嘴的支撐體中心部向周緣部移動的同時使支撐體的轉速慢慢下降,亦可獲得相同的效果。The developer is preferably an alkaline aqueous solution obtained by diluting the alkaline agent with pure water. Examples of the alkaline agent include ammonia, ethylamine, diethylamine, dimethylethanolamine, diethylene glycolamine, diethanolamine, hydroxylamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium Propylammonium hydroxide, tetrabutylammonium hydroxide, ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, choline, pyrrole , piperidine, 1,8-diazabicyclo[5.4.0]-7-undecene and other organic basic compounds, sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium silicate, metasilicon Inorganic basic compounds such as sodium. Alkali agents Considering the environment and safety, compounds with large molecular weights are preferred. The concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.001 to 10% by mass, more preferably 0.01 to 1% by mass. In addition, the developer may further contain a surfactant. As a surfactant, the above-mentioned surfactant is mentioned, and a nonionic type surfactant is preferable. From the viewpoints of convenient transportation and storage, the developer can be temporarily manufactured as a concentrated solution, and then diluted to a desired concentration when used. The dilution ratio is not particularly limited, but can be set in the range of, for example, 1.5 to 100 times. Moreover, when an alkaline aqueous solution is used as a developing solution, it is preferable to wash (rinse) with pure water after image development. In addition, it is preferable to perform rinsing by supplying a rinse liquid to the developed composition layer while rotating the support on which the developed composition layer is formed. Moreover, it is also preferable to carry out by moving the nozzle which discharges a rinse liquid from the center part of a support body to the peripheral part of a support body. In this case, when moving from the center portion of the support body of the nozzle to the peripheral portion, the nozzle can be moved by gradually decreasing the moving speed. By rinsing in this way, unevenness in the surface of the rinse can be suppressed. In addition, even if the rotational speed of the support body is gradually decreased while moving from the center portion of the support body to the peripheral portion of the nozzle, the same effect can be obtained.

顯影之後,亦能夠在實施乾燥之後進行加熱處理(後烘烤)。後烘烤為用於使膜完全硬化的顯影後的加熱處理。進行後烘烤時,後烘烤溫度例如為100~240℃為較佳。從膜硬化的觀點考慮,200~230℃為更佳。後烘烤能夠以如下方式進行,對於顯影後的膜,為了成為上述條件而使用加熱板或對流式烘烤箱(熱風循環式乾燥機)、高頻加熱機等加熱機構,以連續式或間歇式進行。After image development, heat treatment (post-baking) can also be performed after drying. The post-baking is a heat treatment after development for completely hardening the film. When post-baking is performed, the post-baking temperature is preferably 100 to 240° C., for example. From a viewpoint of film hardening, 200-230 degreeC is more preferable. The post-baking can be carried out by using a heating mechanism such as a hot plate, a convection oven (hot air circulation type dryer), and a high-frequency heater in order to achieve the above-mentioned conditions for the film after development, in a continuous or intermittent manner. carried out.

(採用乾式蝕刻法進行圖案形成之情況) 採用乾式蝕刻法進行的圖案形成能夠藉由如下方法來進行:使將本發明的組成物塗佈於支撐體上而形成之組成物層硬化而形成硬化物層,接著,在該硬化物層上形成進行圖案形成之光阻劑層,再接著,將進行圖案形成之光阻劑層作為遮罩而對硬化物層使用蝕刻氣體進行乾式蝕刻等的方法。關於採用乾式蝕刻法進行的圖案形成,能夠參閱日本特開2013-064993號公報的段落號0010~0067中的記載,且該內容被併入本說明書中。(In the case of pattern formation by dry etching method) The pattern formation by dry etching method can be performed by a method of hardening a composition layer formed by applying the composition of the present invention on a support to form a hardening A method of forming a patterned photoresist layer on the cured material layer, and then using the patterned photoresist layer as a mask to dry-etch the cured material layer using an etching gas, etc. . Regarding the patterning by the dry etching method, the descriptions in paragraph numbers 0010 to 0067 of JP 2013-064993 A can be referred to, and the contents are incorporated in the present specification.

<紅外線透射濾波器> 接著,對本發明的紅外線透射濾波器進行說明。本發明的紅外線透射濾波器具有上述本發明的膜。<Infrared transmission filter> Next, the infrared transmission filter of this invention is demonstrated. The infrared transmissive filter of the present invention has the film of the present invention described above.

本發明的紅外線透射濾波器亦能夠與含有彩色著色劑之濾色器組合使用。濾色器能夠使用含有彩色著色劑之著色組成物來製造。作為彩色著色劑,可列舉在本發明的組成物中說明之彩色著色劑。著色組成物能夠進一步含有硬化性化合物、樹脂、光聚合起始劑、界面活性劑、溶劑、聚合抑制劑、紫外線吸收劑等。關於該等的詳細內容,可列舉在本發明的組成物中說明之材料,且能夠使用該等。The infrared transmission filter of the present invention can also be used in combination with a color filter containing a colorant. A color filter can be manufactured using the coloring composition containing a coloring agent. As the coloring agent, the coloring agent described in the composition of the present invention can be mentioned. The coloring composition can further contain a curable compound, a resin, a photopolymerization initiator, a surfactant, a solvent, a polymerization inhibitor, an ultraviolet absorber, and the like. As for the details of these, the materials described in the composition of the present invention can be listed, and these can be used.

又,關於本發明的紅外線透射濾波器的態樣,具有本發明的膜的像素與選自紅、綠、藍、紫紅、黃、藍綠、黑及無色中之像素亦為較佳態樣。In addition, regarding the aspect of the infrared transmission filter of the present invention, a pixel having the film of the present invention and a pixel selected from the group consisting of red, green, blue, magenta, yellow, cyan, black and colorless are also preferred.

<固體攝像元件> 本發明的固體攝像元件包含上述本發明的膜。作為固體攝像元件的構成,只要是具有本發明的膜之結構且發揮固體攝像元件的功能之結構,則並無特別限定。例如,可列舉如下結構。<Solid-state imaging element> The solid-state imaging element of the present invention includes the film of the present invention described above. The structure of the solid-state imaging element is not particularly limited as long as it has the structure of the film of the present invention and functions as a solid-state imaging element. For example, the following structures can be mentioned.

為結構如下:支撐體上具有包括構成固體攝像元件的受光區之複數個光電二極體及聚矽等之轉送電極,光電二極體及轉送電極上具有僅有光電二極體的受光部開口之由鎢等構成之遮光膜,遮光膜上具有以覆蓋整個遮光膜及光電二極體受光部的方式形成之由氮化矽等構成之元件保護膜,元件保護膜上具有本發明中之膜。此外,亦可以是元件保護膜上亦即本發明中之膜之下(靠近支撐體的一側)具有保護聚光機構(例如,微透鏡等。以下相同)之結構和本發明中之膜上具有保護聚光機構之結構等。又,濾色器可以具有在藉由隔板分隔例如格柵狀之空間埋入有形成各像素之膜之結構。此時的隔板為折射率低於各像素為較佳。具有該種結構之攝像裝置的例,可列舉日本特開2012-227478號公報、日本特開2014-179577號公報中記載的裝置。The structure is as follows: the support body is provided with a plurality of photodiodes and polysilicon and other transfer electrodes that constitute the light receiving area of the solid-state imaging element, and the photodiode and the transfer electrode are provided with only photodiodes. The light-receiving part opening The light-shielding film composed of tungsten or the like is provided with an element protective film composed of silicon nitride or the like formed so as to cover the entire light-shielding film and the photodiode light-receiving portion, and the element protective film has the film of the present invention. . In addition, it is also possible to have a protective condensing mechanism (for example, a microlens, etc., the same below) on the element protective film, that is, under the film in the present invention (the side close to the support), and on the film in the present invention. It has a structure to protect the condensing mechanism, etc. In addition, the color filter may have a structure in which a film for forming each pixel is embedded in a space partitioned by a spacer such as a grid. In this case, it is preferable that the refractive index of the spacer is lower than that of each pixel. Examples of the imaging device having such a structure include devices described in Japanese Patent Laid-Open No. 2012-227478 and Japanese Patent Laid-Open No. 2014-179577.

<光學感測器> 本發明的光學感測器包含上述本發明的膜。作為光學感測器的結構,只要是發揮光學感測器的功能之結構,則並無特別限定。以下,利用圖示對本發明的光學感測器的一實施形態進行說明。<Optical Sensor> The optical sensor of the present invention includes the film of the present invention described above. The structure of the optical sensor is not particularly limited as long as it is a structure that functions as an optical sensor. Hereinafter, an embodiment of the optical sensor of the present invention will be described with reference to the drawings.

圖1中,符號110為固體攝像元件。設置於固體攝像元件110上之攝像區域具有近紅外截止過濾器111和紅外線透射濾波器114。又,近紅外截止過濾器111上層疊有濾色器112。濾色器112及紅外線透射濾波器114的入射光hν側配置有微透鏡115。以覆蓋微透鏡115的方式形成有平坦化層116。In FIG. 1, reference numeral 110 is a solid-state imaging element. The imaging region provided on the solid-state imaging element 110 has a near-infrared cut filter 111 and an infrared transmission filter 114 . In addition, the color filter 112 is laminated on the near-infrared cut filter 111 . A microlens 115 is arranged on the incident light hν side of the color filter 112 and the infrared transmission filter 114 . A planarization layer 116 is formed so as to cover the microlenses 115 .

近紅外截止過濾器111的分光特性依據所使用之紅外發光二極體(紅外LED)的發光波長而選擇。濾色器112為形成有透射及吸收可見區域中之特定波長的光之像素之濾色器,並無特別限定,能夠使用以往公知的像素形成用濾色器。例如,使用形成有紅色(R)、綠色(G)、藍色(B)的像素之濾色器等。例如,能夠參閱日本特開2014-043556號公報的段落號0214~0263中的記載,且該內容被併入本說明書中。紅外線透射濾波器114依據所使用之紅外LED的發光波長而選擇其特性。The spectral characteristics of the near-infrared cut filter 111 are selected according to the emission wavelength of the infrared light emitting diode (infrared LED) used. The color filter 112 is a color filter in which a pixel that transmits and absorbs light of a specific wavelength in a visible region is formed, and is not particularly limited, and a conventionally known color filter for pixel formation can be used. For example, a color filter or the like in which red (R), green (G), and blue (B) pixels are formed is used. For example, the descriptions in paragraph Nos. 0214 to 0263 of Japanese Patent Laid-Open No. 2014-043556 can be referred to, and the contents are incorporated into the present specification. The characteristics of the infrared transmission filter 114 are selected according to the emission wavelength of the infrared LED used.

圖1所示之紅外線感測器中,可以在平坦化層116上進一步配置有與近紅外截止過濾器111不同的近紅外截止過濾器(其他近紅外截止過濾器)。作為其他近紅外截止過濾器,可列舉含有銅之層和/或介電質多層膜者等。關於該等的詳細內容,可列舉上述者。又,作為其他近紅外截止過濾器,亦可以使用雙通帶濾波器。 [實施例]In the infrared sensor shown in FIG. 1 , a near-infrared cut-off filter (other near-infrared cut-off filter) different from the near-infrared cut-off filter 111 may be further disposed on the planarization layer 116 . As another near-infrared cut filter, a layer containing copper and/or a dielectric multilayer film etc. are mentioned. As for these details, the above-mentioned ones can be mentioned. Also, as another near-infrared cut filter, a double-pass band filter may be used. [Example]

以下,依據實施例對本發明更具體地進行說明,但本發明只要不脫離其宗旨則並非限定於以下實施例。另外,若無特別說明,“份”為質量基準。Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited to the following examples unless it deviates from the gist of the present invention. In addition, unless otherwise specified, "part" is a mass basis.

<重量平均分子量的測量> 樹脂的重量平均分子量按照以下條件,藉由凝膠滲透層析儀(GPC)進行了測量。 管柱的種類:將TOSOH TSkgel Super HZM-H、TOSOH TSkgel Super HZ4000及TOSOH TSKgel Super HZ2000進行連結之管柱 顯影溶劑:四氫呋喃 管柱溫度:40℃ 流量(樣品注入量):1.0μL(樣品濃度0.1質量%) 裝置名稱:TOSOH CORPORATION製 HLC-8220GPC 檢測器:RI(折射率)檢測器 校準曲線基本樹脂:聚苯乙烯樹脂<Measurement of Weight Average Molecular Weight> The weight average molecular weight of the resin was measured by gel permeation chromatography (GPC) under the following conditions. Type of column: Column connecting TOSOH TSkgel Super HZM-H, TOSOH TSkgel Super HZ4000 and TOSOH TSKgel Super HZ2000 Development solvent: Tetrahydrofuran Column temperature: 40°C Flow rate (sample injection amount): 1.0 μL (sample concentration 0.1 mass %) Device name: HLC-8220GPC manufactured by TOSOH CORPORATION Detector: RI (refractive index) detector calibration curve Base resin: Polystyrene resin

<金屬偶氮顏料的製造> (金屬偶氮顏料1的製造) 將46.2g的二偶氮巴比妥酸及38.4g的巴比妥酸添加於85℃的蒸餾水1100g中。接著,在該溶液中添加氫氧化鉀水溶液而將pH設為大致5之後,攪拌90分鐘而製造出偶氮巴比妥酸前驅物。 接著,在按照上述方法製造之偶氮巴比妥酸前驅物中添加了82℃的蒸餾水1500g。接著,藉由滴加方式添加了10g的30%鹽酸。接著,添加了79.4g的三聚氰胺。接著,藉由滴加方式添加了0.282莫耳的大致25%鹽化鋅溶液與0.0015莫耳的大致30%鹽化銅(II)溶液的混合物。接著,在82℃的溫度下將添加該等之溶液保持3小時之後,添加KOH而將pH設為了大致5.5。接著,使該溶液的溫度升溫至90℃,並維持90℃的溫度,同時添加100g的蒸餾水而進行了稀釋。接著,藉由滴加方式在該溶液中添加21g的30%鹽酸之後,在90℃的溫度下進行了12小時的加熱處理。接著,在加熱處理後的溶液中添加氫氧化鉀水溶液而將pH設為了大致5。接著,在抽吸過濾器上從該溶液中單分離出顏料進行清洗,並在80℃下的真空乾燥箱中進行乾燥之後,使用標準實驗室磨機搗碎大致2分鐘,從而製造出金屬偶氮顏料1。<Production of Metal Azo Pigment> (Production of Metal Azo Pigment 1) 46.2 g of disazobarbituric acid and 38.4 g of barbituric acid were added to 1100 g of distilled water at 85°C. Next, an aqueous potassium hydroxide solution was added to this solution to adjust the pH to approximately 5, followed by stirring for 90 minutes to produce an azobarbituric acid precursor. Next, 1500 g of distilled water at 82° C. was added to the azobarbituric acid precursor produced by the above method. Next, 10 g of 30% hydrochloric acid was added by dropwise addition. Next, 79.4 g of melamine was added. Next, a mixture of 0.282 moles of approximately 25% salted zinc solution and 0.0015 moles of approximately 30% salted copper(II) solution was added dropwise. Next, after holding the solution to which these were added at a temperature of 82° C. for 3 hours, KOH was added to adjust the pH to approximately 5.5. Next, the temperature of the solution was raised to 90°C, and 100 g of distilled water was added and diluted while maintaining the temperature of 90°C. Next, after adding 21 g of 30% hydrochloric acid to the solution by dropwise addition, heat treatment was performed at a temperature of 90° C. for 12 hours. Next, a potassium hydroxide aqueous solution was added to the solution after the heat treatment, and the pH was set to approximately 5. Next, the pigment was isolated from the solution on a suction filter, washed, dried in a vacuum oven at 80°C, and then mashed for approximately 2 minutes using a standard laboratory grinder to produce a metal coupler. Nitrogen Pigment 1.

(金屬偶氮顏料2的製造) 將154.1g的二偶氮巴比妥酸及128.1g的巴比妥酸添加於85℃的蒸餾水3600g中。接著,在該溶液中添加氫氧化鉀水溶液而將pH設為大致5之後,攪拌90分鐘而製造出偶氮巴比妥酸前驅物。 接著,在按照上述方法製造之偶氮巴比妥酸前驅物中添加了82℃的蒸餾水5000g。接著,添加了252.2g三聚氰胺。接著,藉由滴加方式添加了0.68莫耳的大致30%鹽化鎳(II)溶液、0.02莫耳的大致30%鹽化銅(II)溶液及0.200莫耳的大致20%鹽化鑭(III)溶液的混合物。接著,在82℃在將添加有該等之溶液保持3小時之後,添加KOH而將pH設為了大致5.5。接著,使該溶液的溫度升溫至90℃,並維持90℃溫度,同時添加1000g的蒸餾水進行了稀釋。接著,藉由滴加方式在該溶液中添加113g的30%鹽酸之後,在90℃的溫度下進行了12小時的加熱處理。接著,在加熱處理後和溶液中添加氫氧化鉀水溶液而將pH設為了大致5。接著,在抽吸過濾器上從該溶液中單分離出顏料進行清洗,並在80℃的真空乾燥箱中進行乾燥之後,使用標準實驗室磨機搗碎大致2分鐘,從而製造出金屬偶氮顏料2。(Production of Metal Azo Pigment 2) 154.1 g of disazobarbituric acid and 128.1 g of barbituric acid were added to 3600 g of distilled water at 85°C. Next, an aqueous potassium hydroxide solution was added to this solution to adjust the pH to approximately 5, followed by stirring for 90 minutes to produce an azobarbituric acid precursor. Next, 5000 g of distilled water at 82° C. was added to the azobarbituric acid precursor produced by the above method. Next, 252.2 g of melamine was added. Next, 0.68 moles of approximately 30% salted nickel (II) solution, 0.02 moles of approximately 30% salted copper (II) solution, and 0.200 moles of approximately 20% salted lanthanum ( III) Mixtures of solutions. Next, after holding the solution to which these were added at 82° C. for 3 hours, KOH was added to adjust the pH to approximately 5.5. Next, the temperature of the solution was raised to 90°C, and 1000 g of distilled water was added and diluted while maintaining the temperature at 90°C. Next, after adding 113 g of 30% hydrochloric acid to the solution by dropwise addition, heat treatment was performed at a temperature of 90° C. for 12 hours. Next, after the heat treatment, an aqueous potassium hydroxide solution was added to the solution to adjust the pH to approximately 5. Next, the pigment was isolated from the solution on a suction filter, washed, dried in a vacuum drying oven at 80°C, and then mashed for approximately 2 minutes using a standard laboratory grinder to produce metal azo Pigment 2.

(金屬偶氮顏料3的製造) 將154.1g的二偶氮巴比妥酸及128.1g的巴比妥酸添加於85℃的蒸餾水3600g中。接著,在該溶液中添加氫氧化鉀水溶液而將pH設為大致5之後,攪拌90分鐘而製造出偶氮巴比妥酸前驅物。 接著,在按照上述方法製造之偶氮巴比妥酸前驅物中添加了82℃的蒸餾水5000g。接著,添加了252.2g的三聚氰胺。接著,藉由滴加方式添加了0.70莫耳的大致30%鹽化鎳(II)溶液、0.05莫耳的大致30%鹽化鋅(II)溶液及0.167莫耳的大致20%鹽化鑭(III)溶液的混合物。接著,在82℃下將添加有該等之溶液保持3小時之後,添加KOH而將pH設為了大致5.5。接著,使該溶液的溫度升溫至90℃,並維持90℃的溫度,同時添加1000g的蒸餾水而進行了稀釋。接著,藉由滴加方式在該溶液中添加113g的30%鹽酸之後,在90℃的溫度小進行了12小時的加熱處理。接著,在加熱處理後的溶液中添加氫氧化鉀水溶液而將pH設為了大致5。接著,在抽吸過濾器上從該溶液中單分離出顏料進行清洗,並在80℃的真空乾燥箱中進行乾燥之後,使用標準實驗室磨機搗碎大致2分鐘,從而製造出金屬偶氮顏料3。(Production of Metal Azo Pigment 3) 154.1 g of disazobarbituric acid and 128.1 g of barbituric acid were added to 3600 g of distilled water at 85°C. Next, an aqueous potassium hydroxide solution was added to this solution to adjust the pH to approximately 5, followed by stirring for 90 minutes to produce an azobarbituric acid precursor. Next, 5000 g of distilled water at 82° C. was added to the azobarbituric acid precursor produced by the above method. Next, 252.2 g of melamine was added. Next, 0.70 moles of approximately 30% salted nickel (II) solution, 0.05 moles of approximately 30% salted zinc (II) solution, and 0.167 moles of approximately 20% salted lanthanum ( III) Mixtures of solutions. Next, after holding the solution to which these were added at 82° C. for 3 hours, KOH was added to adjust the pH to approximately 5.5. Next, the temperature of the solution was raised to 90° C., and while maintaining the temperature of 90° C., 1000 g of distilled water was added and diluted. Next, after adding 113 g of 30% hydrochloric acid to the solution by dropwise addition, heat treatment was performed at a temperature of 90° C. for 12 hours. Next, a potassium hydroxide aqueous solution was added to the solution after the heat treatment, and the pH was set to approximately 5. Next, the pigment was isolated from the solution on a suction filter, washed, dried in a vacuum drying oven at 80°C, and then mashed for approximately 2 minutes using a standard laboratory grinder to produce metal azo Pigment 3.

(金屬偶氮顏料4的製造) 將46.2g的二偶氮巴比妥酸及38.4g巴比妥酸添加於85℃的蒸餾水1100g中。接著,在該溶液中添加氫氧化鉀水溶液而將pH設為大致5之後,攪拌90分鐘而製造出偶氮巴比妥酸前驅物。 接著,在按照上述方法製造之偶氮巴比妥酸前驅物中添加了82℃的蒸餾水5000g。接著,添加了252.2g的三聚氰胺。接著,藉由滴加方式添加了0.285莫耳的大致25%鹽化鎳溶液及0.010莫耳的大致10%鹽化釓(III)溶液的混合物。接著,在82℃下將添加有該等之溶液保持3小時之後,添加KOH而將pH設為了大致5.5。接著,使該溶液的溫度升溫至90℃,並維持90℃的溫度,同時添加1000g的蒸餾水進行了稀釋。接著,藉由滴加方式在該溶液中添加113g的30%鹽酸之後,在90℃的溫度下進行了12小時的加熱處理。接著,在加熱處理後的溶液中添加氫氧化鉀水溶液而將pH設為了大致5。接著,在抽吸過濾器上從該溶液中單分離出顏料進行清洗,並在80℃的真空乾燥箱中進行乾燥之後,使用標準實驗室磨機搗碎大致2分鐘,從而製造出金屬偶氮顏料4。(Production of Metal Azo Pigment 4) 46.2 g of disazobarbituric acid and 38.4 g of barbituric acid were added to 1100 g of distilled water at 85°C. Next, an aqueous potassium hydroxide solution was added to this solution to adjust the pH to approximately 5, followed by stirring for 90 minutes to produce an azobarbituric acid precursor. Next, 5000 g of distilled water at 82° C. was added to the azobarbituric acid precursor produced by the above method. Next, 252.2 g of melamine was added. Next, a mixture of 0.285 moles of approximately 25% nickel salt solution and 0.010 moles of approximately 10% gadolinium (III) salt solution was added dropwise. Next, after holding the solution to which these were added at 82° C. for 3 hours, KOH was added to adjust the pH to approximately 5.5. Next, the temperature of the solution was raised to 90°C, and 1000 g of distilled water was added and diluted while maintaining the temperature of 90°C. Next, after adding 113 g of 30% hydrochloric acid to the solution by dropwise addition, heat treatment was performed at a temperature of 90° C. for 12 hours. Next, a potassium hydroxide aqueous solution was added to the solution after the heat treatment, and the pH was set to approximately 5. Next, the pigment was isolated from the solution on a suction filter, washed, dried in a vacuum drying oven at 80°C, and then mashed for approximately 2 minutes using a standard laboratory grinder to produce metal azo Pigment 4.

<環境規制物質的蒸餾去除方法> (製造例1)聚合性單體D5的製造 在燒瓶中作為殘留溶劑加入含有238質量ppm的甲苯之多官能丙烯酸酯(KAYARAD DPHA、Nippon Kayaku Co.,Ltd.製)的50g、丙二醇單甲醚乙酸酯(PGMEA)50g及2,2,6,6-四甲基哌啶1-氧基(TEMPO)80mg,並將外部設備溫度設定為90℃,使燒瓶內部的壓力從常壓逐漸減壓至68mmHg,歷經4小時進行了減壓蒸餾去除。之後,以PGMEA調整反應體系內的重量使其達到100g,從而獲得了多官能丙烯酸酯溶液1(聚合性單體D5)。藉由氣相色譜分析測量多官能丙烯酸酯溶液1中所含之殘留溶劑(甲苯)量,確認到降至11質量ppm。又,藉由1 H-NMR(nuclear magnetic resonance,核磁共振)檢測來自於多官能丙烯酸酯(KAYARAD DPHA、Nippon Kayaku Co.,Ltd.製)的峰值,確認到未產生由自由基聚合引起之交聯反應。<Method of Removing Environmental Regulation Substances by Distillation> (Production Example 1) Production of Polymerizable Monomer D5 Polyfunctional acrylate (KAYARAD DPHA, Nippon Kayaku Co., Ltd.) containing 238 mass ppm of toluene was added to the flask as a residual solvent. manufactured), 50 g of propylene glycol monomethyl ether acetate (PGMEA), and 80 mg of 2,2,6,6-tetramethylpiperidine 1-oxyl (TEMPO), and the temperature of the external equipment was set to 90°C to make The pressure inside the flask was gradually reduced from normal pressure to 68 mmHg, and was distilled off under reduced pressure over 4 hours. Then, the weight in the reaction system was adjusted with PGMEA so that it might become 100 g, and the polyfunctional acrylate solution 1 (polymerizable monomer D5) was obtained. The amount of the residual solvent (toluene) contained in the polyfunctional acrylate solution 1 was measured by gas chromatography, and it was confirmed that it was reduced to 11 mass ppm. In addition, peaks derived from polyfunctional acrylate (KAYARAD DPHA, manufactured by Nippon Kayaku Co., Ltd.) were detected by 1 H-NMR (nuclear magnetic resonance), and it was confirmed that no crossover caused by radical polymerization occurred. linked reaction.

(製造例2) 分散劑C5的製造 在燒瓶中作為殘留溶劑加入含有835質量ppm的甲苯之丙烯酸酯化合物(ARONIX M-5300、TOAGOSEI CO., LTD.製)50g、PGMEA50g及TEMPO40mg,並將外部設備溫度設定為90℃,使燒瓶內部的壓力從常壓逐漸減壓至66mmHg,歷經4小時進行了減壓蒸餾去除。之後,以PGMEA調整反應體系內的重量使其達到100g,從而獲得了單體溶液1。藉由氣相色譜分析測量單體溶液1中所含之殘留溶劑(甲苯)量,確認降至9質量ppm。又,藉由1 H-NMR檢測來自於丙烯酸酯化合物(ARONIX M-5300、TOAGOSEI CO., LTD.製)的峰值,確認到未產生由自由基聚合引起之交聯反應。(Production Example 2) Production of Dispersant C5 50 g of an acrylate compound (ARONIX M-5300, manufactured by TOAGOSEI CO., LTD.) containing 835 mass ppm of toluene, 50 g of PGMEA, and 40 mg of TEMPO were added to a flask as a residual solvent, and the external The equipment temperature was set to 90° C., the pressure inside the flask was gradually reduced from normal pressure to 66 mmHg, and the pressure was distilled off under reduced pressure over 4 hours. Then, the weight in the reaction system was adjusted to 100 g with PGMEA, and the monomer solution 1 was obtained. The amount of the residual solvent (toluene) contained in the monomer solution 1 was measured by gas chromatography analysis, and it was confirmed that it was reduced to 9 mass ppm. In addition, the peak derived from the acrylate compound (ARONIX M-5300, manufactured by TOAGOSEI CO., LTD.) was detected by 1 H-NMR, and it was confirmed that the crosslinking reaction by radical polymerization did not occur.

向三口燒瓶中導入ε-己內酯1044.2g、δ-戊內酯184.3g及2-乙基-1-己醇71.6g,從而獲得了混合物。接著,一邊吹入氮,一邊攪拌了上述混合物。接著,向混合物添加單丁基氧化錫0.61g,並將所獲得之混合物加熱至90℃。6小時之後,使用1 H-NMR確認混合物中來自於2-乙基-1-己醇之峰消失之後,將混合物加熱至110℃。在氮氣氣氛下以110℃連續進行12小時聚合反應之後,以1 H-NMR確認來自於ε-己內酯及δ-戊內酯之峰消失之後,對所獲得之化合物藉由GPC法進行了分子量測量。確認到化合物的分子量達到所希望的值之後,向含有上述化合物之混合物中添加了2,6-二-丁基-4-甲基苯酚0.35g。再之後,對所獲得之混合物花費30分鐘滴加了2-甲基丙烯醯氧乙基異氰酸酯87.0g。自滴加結束經過6小時之後,藉由1 H-NMR確認來自於2-甲基丙烯醯氧乙基異氰酸酯(MOI)之峰消失之後,將PGMEA1387.0g添加於混合物中,從而獲得了濃度為50質量%的大分子單體A-1溶液2770g。大分子單體A-1的結構(式(A-1)中示出)藉由1 H-NMR得以確認。所獲得之大分子單體A-1的重量平均分子量為6,000。 [化學式42]

Figure 02_image085
Into the three-necked flask, 1044.2 g of ε-caprolactone, 184.3 g of δ-valerolactone, and 71.6 g of 2-ethyl-1-hexanol were introduced to obtain a mixture. Next, the above-mentioned mixture was stirred while blowing in nitrogen. Next, 0.61 g of monobutyltin oxide was added to the mixture, and the obtained mixture was heated to 90°C. After 6 hours, after confirming the disappearance of the peak derived from 2-ethyl-1-hexanol in the mixture using 1 H-NMR, the mixture was heated to 110°C. After the polymerization reaction was carried out continuously at 110° C. for 12 hours under a nitrogen atmosphere, the disappearance of peaks derived from ε-caprolactone and δ-valerolactone was confirmed by 1 H-NMR, and the obtained compound was subjected to a GPC method. Molecular weight measurement. After confirming that the molecular weight of the compound reached a desired value, 0.35 g of 2,6-di-butyl-4-methylphenol was added to the mixture containing the above-mentioned compound. After that, 87.0 g of 2-methacryloyloxyethyl isocyanate was added dropwise to the obtained mixture over 30 minutes. After 6 hours elapsed from the end of the dropwise addition, the disappearance of the peak derived from 2-methacryloyloxyethyl isocyanate (MOI) was confirmed by 1 H-NMR, and PGMEA1387.0 g was added to the mixture to obtain a concentration of 2770 g of 50 mass % macromonomer A-1 solution. The structure of macromonomer A-1 (shown in formula (A-1)) was confirmed by 1 H-NMR. The weight average molecular weight of the obtained macromonomer A-1 was 6,000. [Chemical formula 42]
Figure 02_image085

向三口燒瓶添加120g上述大分子單體A-1溶液、280g上述單體溶液1及PGMEA266.7g,從而獲得了混合物。一邊吹入氮,一邊攪拌了上述混合物。接著,一邊使氮流入燒瓶內,一邊使混合物升溫至75℃。接著,向混合物中添加十二烷基硫醇1.65g、2,2’-偶氮雙(2-甲基丙酸甲酯)(以下亦稱為“V-601”。)0.83g,開始了聚合反應。將混合物以75℃加熱2小時之後,進一步將0.83g的V-601補加到了混合物中。2小時之後,進一步將0.83g的V-601補加到了混合物中。再反應2小時之後,使混合物升溫至90℃,並攪拌了3小時。藉由上述操作,結束了聚合反應。 反應結束之後,在空氣氣氛下加入二甲基十二烷胺6.0g及TEMPO2.46g之後,添加了甲基丙烯酸縮水甘油酯15.7g。空氣氣氛下,以90℃連續進行24小時反應之後,藉由酸值測量確認到反應結束。冷卻至60℃為止之後,向所獲得之混合物中進一步添加2-異氰酸根合乙基丙烯酸酯(AOI)15.6g,並在60℃下進行了6小時反應。藉由1 H-NMR測量確認到AOI的消失。藉由向所獲得之混合物中添加適量的PGMEA,從而獲得了20質量%的分散劑C-5的溶液。所獲得之樹脂C-5的重量平均分子量為25000、酸值為80mgKOH/mg、C=C價為0.9mmol/g。又,對樹脂C-5中所含之甲苯量進行了測量,結果確認到為5質量ppm以下。A mixture was obtained by adding 120 g of the above-mentioned macromonomer A-1 solution, 280 g of the above-mentioned monomer solution 1, and 266.7 g of PGMEA to the three-necked flask. The above mixture was stirred while blowing in nitrogen. Next, while flowing nitrogen into the flask, the temperature of the mixture was raised to 75°C. Next, 1.65 g of dodecyl mercaptan and 0.83 g of 2,2'-azobis(methyl 2-methylpropionate) (hereinafter also referred to as "V-601") were added to the mixture, and the Polymerization. After the mixture was heated at 75°C for 2 hours, 0.83 g of V-601 was further added to the mixture. After 2 hours, a further 0.83 g of V-601 was added to the mixture. After an additional 2 hours of reaction, the mixture was warmed to 90°C and stirred for 3 hours. By the above operation, the polymerization reaction was completed. After completion of the reaction, 6.0 g of dimethyldodecylamine and 2.46 g of TEMPO were added in an air atmosphere, and then 15.7 g of glycidyl methacrylate was added. After the reaction was continuously performed at 90° C. for 24 hours in an air atmosphere, it was confirmed by the acid value measurement that the reaction was completed. After cooling to 60 degreeC, 2-isocyanatoethyl acrylate (AOI) 15.6g was further added to the obtained mixture, and it was made to react at 60 degreeC for 6 hours. The disappearance of AOI was confirmed by 1 H-NMR measurement. By adding an appropriate amount of PGMEA to the obtained mixture, a 20 mass % solution of dispersant C-5 was obtained. The obtained resin C-5 had a weight average molecular weight of 25,000, an acid value of 80 mgKOH/mg, and a C=C valence of 0.9 mmol/g. Moreover, when the amount of toluene contained in resin C-5 was measured, it was confirmed that it was 5 mass ppm or less.

[試驗例1] <顏料分散液的製造> 將下述表1中記載的原料進行混合之後,添加直徑0.3mm的氧化鋯珠230質量份,使用油漆攪拌進行5小時分散處理,並藉由過濾來將珠分離而製造出顏料分散液。下述表中記載的數值為質量份。[Test Example 1] <Production of Pigment Dispersion Liquid> After mixing the raw materials described in the following Table 1, 230 parts by mass of zirconia beads having a diameter of 0.3 mm were added, and the dispersion treatment was performed by stirring with paint for 5 hours, and filtered by filtration. to separate the beads to produce a pigment dispersion. Numerical values described in the following tables are parts by mass.

[表1]

Figure 107141537-A0304-0001
[Table 1]
Figure 107141537-A0304-0001

<組成物的製備> 將下述表2~5中記載的原料進行混合而製備出實施例1~25、比較例1~3的組成物。下述表中記載的數值為質量份。<Preparation of composition> The compositions of Examples 1 to 25 and Comparative Examples 1 to 3 were prepared by mixing the raw materials described in Tables 2 to 5 below. Numerical values described in the following tables are parts by mass.

[表2]

Figure 107141537-A0304-0002
[Table 2]
Figure 107141537-A0304-0002

[表3]

Figure 107141537-A0304-0003
[table 3]
Figure 107141537-A0304-0003

[表4]

Figure 107141537-A0304-0004
[Table 4]
Figure 107141537-A0304-0004

[表5]

Figure 107141537-A0304-0005
[table 5]
Figure 107141537-A0304-0005

上述表1~5中記載的原料如下。The raw materials described in the above Tables 1 to 5 are as follows.

(色料) 金屬偶氮顏料1~4:上述金屬偶氮顏料1~4 PR254 : C.I.Pigment Red 254 PY139 : C.I.Pigment Yellow 139 PV23 : C.I.Pigment Violet 23 PB15:6 : C.I.Pigment Blue 15:6 PB16 : C.I.Pigment Blue 16 IB: Irgaphor Black(BASF公司製) PBk32: C.I.Pigment Black 32(Colorant) Metal Azo Pigments 1 to 4: Metal Azo Pigments 1 to 4 above C.I.Pigment Blue 16 IB: Irgaphor Black (manufactured by BASF) PBk32: C.I.Pigment Black 32

(近紅外線吸收色素) K1、K2、K5、K6、K7、K8、K10:下述結構的化合物。以下式中,Me表示甲基,Ph表示苯基。 K9:FDN-003(YAMADA CHEMICAL CO., LTD.製) [化學式43]

Figure 02_image087
[化學式44]
Figure 02_image089
(Near-infrared absorbing dyes) K1, K2, K5, K6, K7, K8, K10: compounds of the following structures. In the following formula, Me represents a methyl group, and Ph represents a phenyl group. K9: FDN-003 (manufactured by YAMADA CHEMICAL CO., LTD.) [Chemical formula 43]
Figure 02_image087
[Chemical formula 44]
Figure 02_image089

(顏料衍生物) B1、K3、K4:下述結構的化合物。以下結構式中,Ph表示苯基,Me表示甲基。 [化學式45]

Figure 02_image091
(Pigment Derivatives) B1, K3, K4: Compounds of the following structures. In the following structural formula, Ph represents a phenyl group, and Me represents a methyl group. [Chemical formula 45]
Figure 02_image091

(分散劑) C1:下述結構的樹脂(主鏈上附註之數值為莫耳比,側鏈上附註之數值為重複單元的數。Mw=20,000) C2:下述結構的樹脂(主鏈上附註之數值為莫耳比,側鏈上附註之數值為重複單元的數。Mw=24,000) C3:下述結構的樹脂(主鏈上附註之數值為莫耳比,側鏈上附註之數值為重複單元的數。Mw=20,000) C4:BYK2000(固體成分濃度40質量%、BYK Japan KK 製) C5:上述製造例2中製造之分散劑C5(固體成分濃度20質量%) [化學式46]

Figure 02_image093
(Dispersant) C1: Resin of the following structure (The value noted on the main chain is molar ratio, and the value noted on the side chain is the number of repeating units. Mw=20,000) C2: Resin of the following structure (On the main chain The value of the note is the mole ratio, the value of the note on the side chain is the number of repeating units. Mw=24,000) C3: Resin of the following structure (the value of the note on the main chain is the mole ratio, and the value of the note on the side chain is Number of repeating units. Mw=20,000) C4: BYK2000 (solid content concentration 40% by mass, manufactured by BYK Japan KK) C5: Dispersant produced in Production Example 2 above C5 (solid content concentration 20% by mass) [Chemical formula 46]
Figure 02_image093

(樹脂) P1:下述結構的樹脂(Mw=11000、主鏈上附註之數值為莫耳比。Me為甲基。) P2:下述結構的樹脂。(Mw=4400、酸值=95mgKOH/g、以下結構式中,M為苯基,A為聯苯四羧酸酐殘基。) P3: CYCLOMER ACA250(固體成分濃度45質量%、Daicel Corporation製) P4:下述結構的樹脂(Mw=30000、主鏈上附註之數值為莫耳比。) [化學式47]

Figure 02_image095
(Resin) P1: Resin of the following structure (Mw=11000, the numerical value noted on the main chain is a molar ratio. Me is a methyl group.) P2: Resin of the following structure. (Mw=4400, acid value=95 mgKOH/g, in the following structural formula, M is a phenyl group, and A is a biphenyl tetracarboxylic anhydride residue.) P3: CYCLOMER ACA250 (solid content concentration 45 mass %, manufactured by Daicel Corporation) P4 : Resin with the following structure (Mw=30000, the value in the note on the main chain is molar ratio.) [Chemical formula 47]
Figure 02_image095

(聚合性單體) D1:下述結構的化合物(a+b+c=3) D2:下述結構的化合物(a+b+c=4) D3:下述結構的化合物的混合物(a+b+c=5的化合物:a+b+c=6的化合物=3:1(莫耳比)) [化學式48]

Figure 02_image097
D4:下述結構的化合物 [化學式49]
Figure 02_image099
D5:上述製造例1中製造之聚合性單體D5(固體成分濃度50質量%) D6:ARONIX M-520(TOAGOSEI CO., LTD.製)(Polymerizable monomer) D1: Compound of the following structure (a+b+c=3) D2: Compound of the following structure (a+b+c=4) D3: Mixture of compounds of the following structure (a+ Compounds with b+c=5: Compounds with a+b+c=6 = 3:1 (mol ratio) [Chem. 48]
Figure 02_image097
D4: Compound of the following structure [Chemical formula 49]
Figure 02_image099
D5: Polymerizable monomer D5 (solid content concentration: 50% by mass) produced in Production Example 1 above D6: ARONIX M-520 (manufactured by TOAGOSEI CO., LTD.)

(矽烷偶聯劑) H1:下述結構的化合物(以下的結構式中,Et為乙基) [化學式50]

Figure 02_image101
(Silane coupling agent) H1: a compound of the following structure (in the following structural formula, Et is an ethyl group) [Chemical formula 50]
Figure 02_image101

(光聚合起始劑) I1~I5:下述結構的化合物(肟化合物) [化學式51]

Figure 02_image103
I6:Adeka Arkls NCI-831(ADEKA CORPORATION製、肟化合物) I7:IRGACURE-379(BASF公司製、α-胺基酮化合物) I8:日本特表2017-523465號公報的段落號0007中記載之化合物NO.12 I9:日本特開2017-151342號公報的段落號0025中記載之式(2)的化合物 I10:日本特開2017-167399號公報的段落號0031中記載之化合物6 (紫外線吸收劑) L1:下述結構的化合物 [化學式52]
Figure 02_image105
(Photopolymerization initiator) I1 to I5: Compounds of the following structures (oxime compounds) [Chemical formula 51]
Figure 02_image103
I6: Adeka Arkls NCI-831 (manufactured by ADEKA CORPORATION, oxime compound) I7: IRGACURE-379 (manufactured by BASF, α-amino ketone compound) I8: The compound described in paragraph No. 0007 of JP 2017-523465 A NO.12 I9: Compound of formula (2) described in paragraph No. 0025 of JP 2017-151342 A L1: Compound of the following structure [Chemical formula 52]
Figure 02_image105

(多官能硫醇) M1:三羥甲基丙烷三(3-巰基丁酸酯)(polyfunctional thiol) M1: Trimethylolpropane tris(3-mercaptobutyrate)

(界面活性劑) F1:下述混合物(Mw=14000)。下述式中,表示重複單元的比例之%為莫耳%。 [化學式53]

Figure 02_image107
(Surfactant) F1: The following mixture (Mw=14000). In the following formula, the % representing the ratio of the repeating unit is mol%. [Chemical formula 53]
Figure 02_image107

(環氧化合物) N1:EHPE3150(Daicel Corporation製) (聚合抑制劑) G1:p-對甲氧基苯酚 (溶劑) J1:丙二醇單甲醚乙酸酯(PGMEA) J2:環己酮 J3:3-甲氧基-N,N-二甲基丙醯胺 J4:3-丁氧基-N,N-二甲基丙醯胺(Epoxy compound) N1: EHPE3150 (manufactured by Daicel Corporation) (polymerization inhibitor) G1: p-p-methoxyphenol (solvent) J1: propylene glycol monomethyl ether acetate (PGMEA) J2: cyclohexanone J3: 3 -Methoxy-N,N-dimethylpropionamide J4: 3-butoxy-N,N-dimethylpropionamide

<分光特性的評價> 後烘烤之後的膜厚達到下述表中記載的膜厚的方式使用旋塗機在玻璃基板上塗佈各組成物,並使用100℃的加熱板進行了120秒鐘預烘烤。接著,在預烘烤之後的整個塗佈膜的面以1000mJ/cm2 的曝光量照射i射線進行曝光之後,使用加熱板在220℃下進行5分鐘後烘烤而形成了膜。 使用分光光度計(U-4100、(Hitachi High-Technologies Corporation製)來測量所獲得之膜的波長400~1300nm的吸光度及透射率,從而測量了波長400~600nm的範圍內之透射率的最大值(透射率T1)、波長1000~1300nm的範圍內之透射率的最小值(透射率T2)、波長400~600nm的範圍內之吸光度的最小值(吸光度A)、波長1000~1300nm的範圍內之吸光度的最大值(吸光度B)、波長400~600nm的範圍內之吸光度的最小值與波長1000~1300nm的範圍內之吸光度的最大值之比(吸光度A/吸光度B)。<Evaluation of spectroscopic properties> Each composition was applied on a glass substrate using a spin coater so that the film thickness after post-baking reached the film thickness described in the following table, and the composition was applied for 120 seconds using a 100° C. hot plate. Pre-baked. Next, the entire surface of the coating film after prebaking was exposed to i-rays at an exposure amount of 1000 mJ/cm 2 , and then post-baking was performed at 220° C. for 5 minutes using a hot plate to form a film. The absorbance and transmittance of the obtained film at wavelengths of 400 to 1300 nm were measured using a spectrophotometer (U-4100, manufactured by Hitachi High-Technologies Corporation), and the maximum value of transmittance in the wavelength range of 400 to 600 nm was measured. (Transmittance T1), the minimum value of transmittance within the wavelength range of 1000 to 1300 nm (transmittance T2), the minimum value of absorbance within the wavelength range of 400 to 600 nm (absorbance A), and the minimum value of the absorbance within the wavelength range of 1000 to 1300 nm The ratio of the maximum absorbance (absorbance B), the minimum absorbance in the wavelength range of 400 to 600 nm, and the maximum absorbance in the wavelength range of 1000 to 1300 nm (absorbance A/absorbance B).

<膜厚均勻性> 藉由旋塗法將各組成物塗佈到了8英吋(20.32cm)的矽晶圓上。接著,使用加熱板在100℃下進行了2分鐘加熱。使用光學膜厚計(Filmetrics Japan, Inc. 、F50)測量所獲得之膜的膜厚,計算出最薄部分的膜厚與最後部分的膜厚之差(以下,稱為膜厚差)。膜厚差越小,則說明膜厚均勻性越良好。 5:膜厚差為0.02μm以下。 4:膜厚差大於0.02μm且為0.03μm以下 3:膜厚差大於0.03μm且為0.04μm以下 2:膜厚差大於0.04μm且為0.05μm以下 1:膜厚差大於0.05μm<Film thickness uniformity> Each composition was applied on an 8-inch (20.32 cm) silicon wafer by spin coating. Next, it heated at 100 degreeC for 2 minutes using a hotplate. The film thickness of the obtained film was measured using an optical film thickness meter (Filmetrics Japan, Inc., F50), and the difference between the film thickness of the thinnest part and the film thickness of the last part (hereinafter, referred to as film thickness difference) was calculated. The smaller the film thickness difference, the better the film thickness uniformity. 5: The difference in film thickness is 0.02 μm or less. 4: The difference in film thickness is greater than 0.02 μm and not more than 0.03 μm 3: The difference in film thickness is greater than 0.03 μm and not more than 0.04 μm 2: The difference in film thickness is greater than 0.04 μm and not more than 0.05 μm 1: The difference in film thickness is greater than 0.05 μm

<耐濕性> 使用旋塗機塗佈各組成物,使後烘烤後的膜厚在玻璃基板上成為下述表中記載的膜厚,並使用100℃的加熱板進行了120秒鐘預烘烤。接著,在預烘烤後的整個塗佈膜的面,以1000mJ/cm2 的曝光量照射i射線進行曝光之後,使用加熱板在220℃下進行5分鐘後烘烤而形成了膜。在溫度135℃、濕度85%的條件下將所獲得之膜保管300小時,而進行了高溫高濕試驗。關於高溫高濕試驗後的膜,以光學顯微鏡對四方1cm部分進行觀察,對尺寸為0.5μm以上的結晶狀的缺陷的數量進行計數而評價了耐濕性。 5:缺陷的數量為0個 4:缺陷的數量為1~4個 3:缺陷的數量為5~9個 2:缺陷的數量為10~15個 1:缺陷的數量為16個以上<Moisture resistance> Each composition was coated using a spin coater, and the film thickness after post-baking was the film thickness described in the following table on the glass substrate. bake. Next, the entire surface of the pre-baked coating film was exposed to i-rays at an exposure amount of 1000 mJ/cm 2 , and then post-baked at 220° C. for 5 minutes using a hot plate to form a film. The obtained film was stored for 300 hours under the conditions of a temperature of 135° C. and a humidity of 85%, and a high-temperature and high-humidity test was performed. The film after the high-temperature and high-humidity test was observed with an optical microscope at a 1 cm square portion, and the number of crystalline defects having a size of 0.5 μm or more was counted to evaluate moisture resistance. 5: The number of defects is 0 4: The number of defects is 1 to 4 3: The number of defects is 5 to 9 2: The number of defects is 10 to 15 1: The number of defects is 16 or more

[表6]

Figure 107141537-A0304-0006
[Table 6]
Figure 107141537-A0304-0006

如上述表所示,實施例的膜厚均勻性及耐濕性優異。又,實施例的組成物的波長400~600nm的範圍的光的遮光性優異,能夠較佳地用作紅外線透射濾波器。 又,實施例1~4的組成物能夠形成阻斷波長400~600nm的範圍的光而能夠透射超過波長650nm之光的膜。 又,實施例5~13的組成物能夠形成阻斷波長400~720nm的範圍的光而能夠透射超過波長800nm之光的膜。 又,實施例14~25的組成物能夠形成阻斷波長400~830nm的範圍的光而能夠透射超過波長900nm之光的膜。As shown in the above table, the examples were excellent in film thickness uniformity and moisture resistance. Moreover, the composition of the Example is excellent in the light shielding property of the light of the wavelength range of 400-600 nm, and can be used suitably as an infrared transmission filter. Moreover, the composition of Examples 1-4 can form the film which blocks the light of the range of wavelength 400-600nm, and can transmit the light exceeding the wavelength of 650nm. Moreover, the composition of Examples 5-13 can form the film which blocks the light of the wavelength range of 400-720 nm, and can transmit the light exceeding the wavelength of 800 nm. Moreover, the composition of Examples 14-25 can form the film which blocks the light of the wavelength range of 400-830 nm, and can transmit the light exceeding the wavelength of 900 nm.

各實施例中,即使組成物的總固體成分中進一步含有1質量%、2質量%、3質量%、4質量%或5質量%的四苯乙醇,亦可獲得與各實施例相同的效果。In each example, even if 1 mass %, 2 mass %, 3 mass %, 4 mass % or 5 mass % of tetraphenylethanol is further contained in the total solid content of the composition, the same effect as in each example can be obtained.

[試驗例2] 使用旋塗機塗佈實施例1~25的組成物使後烘烤後的膜厚在矽晶圓上分別成為表6中記載的膜厚,並使用100℃的加熱板進行了120秒鐘預烘烤。接著,在預烘烤後的整個塗佈膜的面以1000mJ/cm2 的曝光量照射i射線而進行曝光之後,使用加熱板在220℃下進行5分鐘後烘烤而形成了膜。接著,在所獲之膜的表面使用旋塗機塗佈以下吸收層形成用組成物,並使用100℃的加熱板進行了120秒鐘預烘烤。接著,在預烘烤後的整個塗佈膜的面以1000mJ/cm2 的曝光量照射i射線而進行曝光之後,使用加熱板在220℃下進行5分鐘後烘烤而形成吸收層,從而形成了層疊體。該層疊體能夠阻斷並透射與試驗例1相同波長範圍的光。而且,耐光性亦優異。[Test Example 2] The compositions of Examples 1 to 25 were applied using a spin coater so that the film thickness after post-baking was the film thickness described in Table 6, respectively, on a silicon wafer, and the composition was applied using a 100° C. hot plate. pre-bake for 120 seconds. Next, the entire surface of the pre-baked coating film was exposed to i-rays at an exposure amount of 1000 mJ/cm 2 , and then post-baked at 220° C. for 5 minutes using a hot plate to form a film. Next, the following composition for absorbing layer formation was applied on the surface of the obtained film using a spin coater, and prebaking was performed for 120 seconds using a hot plate at 100°C. Next, the entire surface of the pre-baked coating film was exposed to i-rays at an exposure amount of 1000 mJ/cm 2 , and then post-baked at 220° C. for 5 minutes using a hot plate to form an absorption layer, thereby forming laminated body. This laminate can block and transmit light in the same wavelength range as in Test Example 1. Furthermore, light resistance is also excellent.

(吸收層形成用組成物) 將C.I.Pigment Yellow 150為12質量份、分散劑C5為37質量份、PGMEA為51質量份添加到直徑0.3mm的氧化鋯珠230質量份中,使用油漆攪拌進行5小時分散處理,並藉由過濾分離珠而製造出Yellow顏料分散液。 混合所獲得之35質量份的Yellow顏料分散液、12質量份的樹脂P1、4質量份的聚合性單體D5、1.8質量份的光聚合起始劑I1、47.2質量份的PGMEA而製造出吸收層形成用組成物。(Composition for absorbing layer formation) 12 parts by mass of C.I. Pigment Yellow 150, 37 parts by mass of dispersant C5, and 51 parts by mass of PGMEA were added to 230 parts by mass of zirconia beads with a diameter of 0.3 mm, and the mixture was stirred with paint for 5 parts by mass. Dispersion treatment was carried out for 2 hours, and the Yellow Pigment Dispersion was produced by separating the beads by filtration. 35 parts by mass of the obtained Yellow pigment dispersion liquid, 12 parts by mass of resin P1, 4 parts by mass of polymerizable monomer D5, 1.8 parts by mass of photopolymerization initiator I1, and 47.2 parts by mass of PGMEA were mixed to produce absorber A composition for forming a layer.

[試驗例3] 以旋塗法在矽晶圓上塗佈IR組成物使製膜後的膜厚成為了1.0μm。接著,使用加熱板在100℃下進行了2分鐘加熱。接著,使用i射線步進機曝光裝置(FPA-3000i5+、Canon Inc.製)以1000mJ/cm2 的曝光量經由具有四方為2μm的拜耳圖案之遮罩進行了曝光。 接著,使用氫氧化四鉀銨(TMAH)0.3質量%水溶液,並在23℃進行了60秒鐘旋覆浸沒顯影。之後,利用旋轉噴淋器進行沖洗,進一步用純水進行了水洗。接著,使用加熱板在200℃下加熱5分鐘,藉此形成了四方為2μm的拜耳圖案(近紅外截止過濾器)。 接著,以旋塗法在近紅外截止過濾器的拜耳圖案上塗佈Red組成物使製膜後的膜厚成為1.0μm。接著,使用加熱板在100℃下進行了2分鐘加熱。接著,使用i射線步進機曝光裝置(FPA-3000i5+、Canon Inc.製)以1000mJ/cm2 的曝光量經由具有四方為2μm的圖案之遮罩進行了曝光。接著,使用氫氧化四鉀銨(TMAH)0.3質量%水溶液在23℃進行了60秒鐘旋覆浸沒顯影。之後,利用旋轉噴淋器進行沖洗,進一步用純水進行了水洗。接著,使用加熱板在200℃下進行5分鐘加熱,藉此在近紅外截止過濾器的Bayer圖案上進行Red組成物的圖案形成。同樣,依次進行Green組成物、Blue組成物的圖案形成,從而形成了紅、綠及藍色的著色圖案。 接著,以旋塗法在上述圖案形成的膜上塗佈實施例14~25的組成物使製膜後的膜厚成為2.0μm。接著,使用加熱板在100℃下進行了2分鐘加熱。接著,使用i射線步進機曝光裝置(FPA-3000i5+、Canon Inc.製)以1000mJ/cm2 的曝光量經由具有四方為2μm的圖案之遮罩進行了曝光。接著,使用氫氧化四鉀銨(TMAH)0.3質量%水溶液在23℃下進行了60秒鐘旋覆浸沒顯影。之後,利用旋轉噴淋器進行沖洗,進一步用純水進行了水洗。接著,使用加熱板在200℃下進行了5分鐘加熱,在近紅外截止過濾器的Bayer圖案的缺失部分形成了實施例14~25的組成物的膜(紅外線透射濾波器)。按照公知的方法將此組裝到了固體攝像元件中。 關於所獲得之固體攝像元件,在低照度的環境下(0.001Lux)從紅外發光二極體(紅外LED)光源照射光,進行圖像的捕獲,並對圖像性能進行了評價。能夠在圖像上清晰地識別到了被攝體。又,入射角依賴性良好。又,紅外線透射濾波器藉由多層塗佈而實現所記載的膜厚亦可獲得相同的效果。例如實施例14的情況下,可以反覆多次以旋塗法塗佈組成物而形成塗佈膜,接著在100℃下將塗佈膜加熱120秒鐘,接著進行曝光及顯影,接著在200℃下加熱5分鐘之一連串操作,從而將膜厚調整為2.0μm。[Test Example 3] The IR composition was applied on a silicon wafer by a spin coating method so that the film thickness after film formation was 1.0 μm. Next, it heated at 100 degreeC for 2 minutes using a hotplate. Next, exposure was performed through a mask having a Bayer pattern with a square of 2 μm at an exposure amount of 1000 mJ/cm 2 using an i-ray stepper exposure apparatus (FPA-3000i5+, manufactured by Canon Inc.). Next, using a 0.3 mass % aqueous solution of tetrapotassium ammonium hydroxide (TMAH), spin immersion development was performed at 23° C. for 60 seconds. After that, it was rinsed with a rotary shower, and further rinsed with pure water. Next, by heating at 200° C. for 5 minutes using a hot plate, a Bayer pattern (near-infrared cut filter) having a square of 2 μm was formed. Next, the Red composition was applied on the Bayer pattern of the near-infrared cut filter by spin coating so that the film thickness after film formation was 1.0 μm. Next, it heated at 100 degreeC for 2 minutes using a hotplate. Next, exposure was performed with an exposure amount of 1000 mJ/cm 2 using an i-ray stepper exposure apparatus (FPA-3000i5+, manufactured by Canon Inc.) through a mask having a pattern of 2 μm square. Next, spin immersion development was performed at 23° C. for 60 seconds using a 0.3 mass % aqueous solution of tetrapotassium ammonium hydroxide (TMAH). After that, it was rinsed with a rotary shower, and further rinsed with pure water. Next, patterning of the Red composition was performed on the Bayer pattern of the near-infrared cut filter by heating at 200° C. for 5 minutes using a hot plate. Similarly, patterning of the Green composition and the Blue composition was performed in this order, thereby forming colored patterns of red, green, and blue. Next, the compositions of Examples 14 to 25 were applied on the film formed in the pattern by spin coating so that the film thickness after film formation was 2.0 μm. Next, it heated at 100 degreeC for 2 minutes using a hotplate. Next, exposure was performed with an exposure amount of 1000 mJ/cm 2 using an i-ray stepper exposure apparatus (FPA-3000i5+, manufactured by Canon Inc.) through a mask having a pattern of 2 μm square. Next, spin immersion development was performed at 23° C. for 60 seconds using a 0.3 mass % aqueous solution of tetrapotassium ammonium hydroxide (TMAH). After that, it was rinsed with a rotary shower, and further rinsed with pure water. Next, it heated at 200 degreeC for 5 minutes using a hotplate, and formed the film (infrared transmission filter) of the composition of Examples 14-25 in the missing part of the Bayer pattern of a near-infrared cut filter. This was assembled into a solid-state imaging element according to a known method. The obtained solid-state imaging element was irradiated with light from an infrared light emitting diode (infrared LED) light source in a low-illuminance environment (0.001 Lux) to capture an image, and the image performance was evaluated. The subject can be clearly recognized on the image. In addition, the incident angle dependence is good. In addition, the same effect can be obtained even if the infrared transmissive filter realizes the described film thickness by multilayer coating. For example, in the case of Example 14, a coating film may be formed by applying the composition by spin coating several times, and then heating the coating film at 100° C. for 120 seconds, followed by exposure and development, and then at 200° C. The film thickness was adjusted to 2.0 μm by performing a series of operations under heating for 5 minutes.

試驗例3中使用之Red組成物、Green組成物、Blue組成物及IR組成物如下。The Red composition, Green composition, Blue composition, and IR composition used in Test Example 3 are as follows.

(Red組成物) 混合下述成分,攪拌之後利用孔徑0.45μm的尼龍製過濾器(Pall Corporation製)進行過濾,從而製備出Red組成物。 Red顏料分散液 ……51.7質量份 樹脂P1 ……0.6質量份 聚合性單體D6 ……0.6質量份 光聚合起始劑I1 ……0.4質量份 界面活性劑F1 ……0.2質量份 紫外線吸收劑(UV-503、DAITO CHEMICAL CO.,LTD.製) ……0.3質量份 PGMEA ……46.6質量份(Red composition) The following components were mixed, and after stirring, it was filtered through a nylon filter (manufactured by Pall Corporation) having a pore diameter of 0.45 μm to prepare a Red composition. Red pigment dispersion liquid...51.7 parts by mass resin P1...0.6 parts by mass polymerizable monomer D6...0.6 parts by mass Photopolymerization initiator I1...0.4 parts by mass Surfactant F1...0.2 parts by mass UV absorber ( UV-503, manufactured by DAITO CHEMICAL CO., LTD.) ……0.3 parts by mass PGMEA ……46.6 parts by mass

(Green組成物) 混合下述成分,攪拌之後利用孔徑0.45μm的尼龍製過濾器(Pall Corporation製)進行過濾,從而製備出Green組成物。 Green顏料分散液 ……73.7質量份 樹脂P1 ……0.3質量份 聚合性單體D6 ……1.2質量份 光聚合起始劑I1 ……0.6質量份 界面活性劑F1 ……0.2質量份 紫外線吸收劑(UV-503、DAITO CHEMICAL CO.,LTD.製) ……0.5質量份 PGMEA ……23.5質量份(Green composition) The following components were mixed, and after stirring, it was filtered through a nylon filter (manufactured by Pall Corporation) having a pore diameter of 0.45 μm to prepare a Green composition. Green pigment dispersion liquid... 73.7 parts by mass resin P1... 0.3 parts by mass polymerizable monomer D6... 1.2 parts by mass photopolymerization initiator I1... 0.6 parts by mass Surfactant F1... 0.2 parts by mass ultraviolet absorber ( UV-503, manufactured by DAITO CHEMICAL CO., LTD.) ...... 0.5 parts by mass PGMEA ...... 23.5 parts by mass

(Blue組成物) 混合下述成分,攪拌之後利用孔徑0.45μm的尼龍製過濾器(Pall Corporation製)進行過濾,從而製備出Blue組成物。 Blue顏料分散液 44.9質量份 樹脂P1 ……2.1質量份 聚合性單體D6 ……2.2質量份 光聚合起始劑I1 ……0.8質量份 界面活性劑F1 ……0.2質量份 紫外線吸收劑(UV-503、DAITO CHEMICAL CO.,LTD.製) ……0.3質量份 PGMEA ……49.8質量份(Blue composition) The following components were mixed, and after stirring, it was filtered through a nylon filter (manufactured by Pall Corporation) having a pore diameter of 0.45 μm to prepare a Blue composition. Blue Pigment Dispersion Liquid 44.9 parts by mass Resin P1 ...... 2.1 parts by mass Polymerizable monomer D6 ...... 2.2 parts by mass Photopolymerization initiator I1 ...... 0.8 parts by mass Surfactant F1 ...... 0.2 parts by mass Ultraviolet absorber (UV- 503, manufactured by DAITO CHEMICAL CO., LTD.) ... 0.3 parts by mass PGMEA ... 49.8 parts by mass

(IR組成物) 混合下述成分,攪拌之後利用孔徑0.45μm的尼龍製過濾器(Pall Corporation製)進行過濾,從而製備出IR組成物。 IR顏料分散液 ……85質量份 聚合性單體D6 ……1.8質量份 樹脂P1 ……1.1質量份 光聚合起始劑I1 ……0.9質量份 界面活性劑F1 ……0.2質量份 聚合抑制劑(p-對甲氧基苯酚) ……0.001質量份 PGMEA ……11.0質量份(IR Composition) The following components were mixed and stirred, and then filtered through a nylon filter (manufactured by Pall Corporation) having a pore diameter of 0.45 μm to prepare an IR composition. IR pigment dispersion liquid... 85 parts by mass of polymerizable monomer D6... 1.8 parts by mass of resin P1... 1.1 parts by mass of photopolymerization initiator I1... 0.9 parts by mass of surfactant F1... 0.2 parts by mass of polymerization inhibitor ( p-p-methoxyphenol) ... 0.001 parts by mass PGMEA ... 11.0 parts by mass

使用於Red組成物、Green組成物、Blue組成物及IR組成物之顏料分散液如下。Pigment dispersion liquids used for the Red composition, Green composition, Blue composition and IR composition are as follows.

・Red顏料分散液 藉由球磨(氧化鋯珠直徑0.3mm)將由C.I.Pigment Red 254為9.6質量份、C.I.Pigment Yellow 139為4.3質量份、分散劑(Disperbyk-161、BYK-Chemie GmbH製)為6.8質量份、PGMEA為79.3質量份而成之混合液進行了3小時混合及分散。之後,進一步使用附帶減壓機構的高壓分散機NANO-3000-10(Beryu Corporation製)在2000kg/cm3 的壓力下設為流量500g/min而進行了分散處理。反覆進行10次該分散處理,從而獲得了Red顏料分散液。・Red pigment dispersion liquid was ball milled (zirconia bead diameter: 0.3 mm) into 9.6 parts by mass of CI Pigment Red 254, 4.3 parts by mass of CI Pigment Yellow 139, and 6.8 parts by mass of a dispersant (Disperbyk-161, manufactured by BYK-Chemie GmbH) , The mixed solution of 79.3 parts by mass of PGMEA was mixed and dispersed for 3 hours. After that, dispersion treatment was further performed at a flow rate of 500 g/min under a pressure of 2000 kg/cm 3 using a high-pressure disperser NANO-3000-10 (manufactured by Beryu Corporation) with a decompression mechanism. This dispersion treatment was repeated 10 times to obtain a Red pigment dispersion liquid.

・Green顏料分散液 藉由球磨(氧化鋯珠直徑0.3mm)將由C.I.Pigment Green 36為6.4質量份、C.I.Pigment Yellow 150為5.3質量份、分散劑(Disperbyk-161、BYK-Chemie GmbH製)為5.2質量份、PGMEA為83.1質量份而成之混合液進行了3小時混合及分散。之後,進一步使用附帶減壓機構的高壓分散機NANO-3000-10(Beryu Corporation製)在2000kg/cm3 的壓力下設為流量500g/min而進行了分散處理。反覆進行10次該分散處理,從而獲得了Green顏料分散液。・Green pigment dispersion liquid was ball milled (zirconia bead diameter: 0.3 mm) into 6.4 parts by mass of CI Pigment Green 36, 5.3 parts by mass of CI Pigment Yellow 150, and 5.2 parts by mass of a dispersant (Disperbyk-161, manufactured by BYK-Chemie GmbH) , PGMEA was 83.1 parts by mass of the mixed solution, which was mixed and dispersed for 3 hours. After that, dispersion treatment was further performed at a flow rate of 500 g/min under a pressure of 2000 kg/cm 3 using a high-pressure disperser NANO-3000-10 (manufactured by Beryu Corporation) with a decompression mechanism. This dispersion treatment was repeated 10 times to obtain a Green pigment dispersion liquid.

・Blue顏料分散液 藉由球磨(氧化鋯珠直徑0.3mm)將由C.I.Pigment Blue 15:6的9.7質量份、C.I.Pigment Violet 23為2.4質量份、分散劑(Disperbyk-161、BYK-Chemie GmbH製)為5.5質量份、PGMEA為82.4質量份而成之混合液進行了3小時混合及分散。之後,進一步使用附帶減壓機構的高壓分散機NANO-3000-10(Beryu Corporation製)在2000kg/cm3 的壓力下設為流量500g/min而進行了分散處理。反覆進行10次該分散處理,從而獲得了Blue顏料分散液。・Blue Pigment Dispersion Liquid: 9.7 parts by mass of CI Pigment Blue 15:6, 2.4 parts by mass of CI Pigment Violet 23, and 5.5 parts by mass of a dispersant (Disperbyk-161, manufactured by BYK-Chemie GmbH) by ball milling (zirconia bead diameter: 0.3 mm). The mixed liquid containing 82.4 parts by mass of PGMEA was mixed and dispersed for 3 hours. After that, dispersion treatment was further performed at a flow rate of 500 g/min under a pressure of 2000 kg/cm 3 using a high-pressure disperser NANO-3000-10 (manufactured by Beryu Corporation) with a decompression mechanism. This dispersion treatment was repeated 10 times to obtain a Blue pigment dispersion liquid.

・IR顏料分散液 藉由球磨(氧化鋯珠直徑0.3mm)將由近紅外線吸收色素K2為6.25質量份、顏料衍生物K4為1.25質量份、分散劑C3為6質量份、PGMEA為86.5質量份構成之混合液進行了3小時混合及分散。之後,進一步使用附帶減壓機構的高壓分散機NANO-3000-10(Beryu Corporation製)在2000kg/cm3 的壓力下設為流量500g/min而進行了分散處理。反覆進行10次該分散處理,從而獲得了IR顏料分散液。・The IR pigment dispersion is composed of 6.25 parts by mass of near-infrared absorbing pigment K2, 1.25 parts by mass of pigment derivative K4, 6 parts by mass of dispersant C3, and 86.5 parts by mass of PGMEA by ball milling (zirconia bead diameter: 0.3 mm). The mixed solution was mixed and dispersed for 3 hours. After that, dispersion treatment was further performed at a flow rate of 500 g/min under a pressure of 2000 kg/cm 3 using a high-pressure disperser NANO-3000-10 (manufactured by Beryu Corporation) with a decompression mechanism. This dispersion treatment was repeated 10 times to obtain an IR pigment dispersion.

110‧‧‧固體攝像元件111‧‧‧近紅外截止過濾器112‧‧‧濾色器114‧‧‧紅外線透射濾波器115‧‧‧微透鏡116‧‧‧平坦化層hn‧‧‧照射光110‧‧‧Solid-state imaging element 111‧‧‧Near infrared cut-off filter 112‧‧‧Color filter 114‧‧‧Infrared transmission filter 115‧‧‧Micro lens 116‧‧‧Planarization layer hn‧‧‧Irradiation light

圖1係表示光學感測器的一實施形態之示意圖。FIG. 1 is a schematic diagram showing an embodiment of an optical sensor.

Figure 107141537-A0101-11-0002-1
Figure 107141537-A0101-11-0002-1

110‧‧‧固體攝像元件 110‧‧‧Solid-state imaging element

111‧‧‧近紅外截止過濾器 111‧‧‧NIR cut-off filter

112‧‧‧濾色器 112‧‧‧Color Filters

114‧‧‧紅外線透射濾波器 114‧‧‧Infrared transmission filter

115‧‧‧微透鏡 115‧‧‧Micro lens

116‧‧‧平坦化層 116‧‧‧Planarization layer

hν‧‧‧照射光 hν‧‧‧Irradiation light

Claims (15)

一種組成物,其含有:金屬偶氮顏料,含有選自由下述式(I)表示之偶氮化合物及其互變異構結構的偶氮化合物中之至少1種陰離子、2種以上的金屬離子及三聚氰胺化合物;色料,作為該金屬偶氮顏料以外的色料,在波長400nm~700nm的範圍具有吸收極大;及至少1種化合物,選自具有乙烯性不飽和鍵之化合物及具有環狀醚基之化合物,該組成物的波長400nm~600nm的範圍內之吸光度的最小值A與波長1000nm~1300nm的範圍內之吸光度的最大值B之比A/B為4.5以上,該金屬偶氮顏料為金屬偶氮顏料Az1~金屬偶氮顏料Az4之至少1種,該金屬偶氮顏料Az1含有該陰離子、至少含有Zn2+及Cu2+之金屬離子、三聚氰胺化合物,該金屬偶氮顏料Az2含有該陰離子、含有Ni2+、Zn2+及至少1種其他金屬離子Me2之金屬離子、該三聚氰胺化合物,金屬離子Me2為選自La3+、Ce3+、Pr3+、Nd2+、Nd3+、Sm2+、Sm3+、Eu2+、Eu3+、Gd3+、Tb3+、Dy3+、Ho3+、Er3+、Tm3+、Yb2+、Yb3+、Mg2+、Ca2+、Sr2+、Ba2+、Sc3+、Y3+、Ti2+、Ti3+、Zr2+、Zr3+、V2+、V3+、Nb3+、Cr3+、Mo2+、Mo3+、Mn2+、Cd2+及Pb2+之至少1種,該金屬偶氮顏料Az3含有該陰離子、含有Ni2+、Cu2+及至少1種其他金屬離子Me3之金屬離子、該三聚氰胺化合物,金屬離子Me3為選自La3 +、Ce3+、Pr3+、Nd2+、Nd3+、Sm2+、Sm3+、Eu2+、Eu3+、Gd3+、Tb3+、Dy3+、Ho3+、Yb2+、Yb3+、Er3+、Tm3+、Mg2+、Ca2+、Sr2+、Mn2+、Y3+、Sc3+、Ti2+、Ti3+、Nb3+、Mo2+、Mo3+、V2+、V3+、Zr2+、Zr3+、Cd2+、Cr3+、Pb2+及Ba2+之至少1種,該金屬偶氮顏料Az4含有該陰離子、含有Ni2+及金屬離子Me4a之金屬離子、該三聚氰胺化合物,金屬離子Me4a為選自La3+、Ce3+、Pr3+、Nd2+、Nd3+、Sm2+、Sm3+、Eu2+、Eu3+、Gd3+、Tb3+、Dy3+、Ho3+、Er3+、Tm3+、Yb2+及Yb3+之至少1種;
Figure 107141537-A0305-02-0129-1
式中,R1及R2分別獨立為OH或NR5R6,R3及R4分別獨立為=O或=NR7,R5~R7分別獨立為氫原子或烷基。
A composition comprising: a metal azo pigment containing at least one anion, two or more metal ions and A melamine compound; a colorant, as a colorant other than the metal azo pigment, having an absorption maximum in the wavelength range of 400nm to 700nm; and at least one compound selected from compounds with ethylenically unsaturated bonds and cyclic ether groups The compound, the ratio A/B of the minimum value A of the absorbance within the wavelength range of 400nm to 600nm and the maximum value B of the absorbance within the wavelength range of 1000nm to 1300nm of the composition is 4.5 or more, and the metal azo pigment is a metal At least one of azo pigment Az1~metal azo pigment Az4, the metal azo pigment Az1 contains the anion, at least metal ions containing Zn 2+ and Cu 2+ , melamine compound, the metal azo pigment Az2 contains the anion , a metal ion containing Ni 2+ , Zn 2+ and at least one other metal ion Me2, the melamine compound, the metal ion Me2 is selected from La 3+ , Ce 3+ , Pr 3+ , Nd 2+ , Nd 3+ , Sm 2+ , Sm 3+ , Eu 2+ , Eu 3+ , Gd 3+ , Tb 3+ , Dy 3+ , Ho 3+ , Er 3+ , Tm 3+ , Yb 2+ , Yb 3+ , Mg 2+ , Ca 2+ , Sr 2+ , Ba 2+ , Sc 3+ , Y 3+ , Ti 2+ , Ti 3+ , Zr 2+ , Zr 3+ , V 2+ , V 3+ , Nb 3+ At least one of , Cr 3+ , Mo 2+ , Mo 3+ , Mn 2+ , Cd 2+ and Pb 2+ , the metal azo pigment Az3 contains the anion, Ni 2+ , Cu 2+ and at least 1 A metal ion of other metal ions Me3, the melamine compound, the metal ion Me3 is selected from La 3 + , Ce 3+ , Pr 3+ , Nd 2+ , Nd 3+ , Sm 2+ , Sm 3+ , Eu 2+ , Eu 3+ , Gd 3+ , Tb 3+ , Dy 3+ , Ho 3+ , Yb 2+ , Yb 3+ , Er 3+ , Tm 3+ , Mg 2+ , Ca 2+ , Sr 2+ , Mn 2+ , Y 3+ , Sc 3+ , Ti 2+ , Ti 3+ , Nb 3+ , Mo 2+ , Mo 3+ , V 2+ , V 3+ , Zr 2+ , Zr 3+ , Cd 2+ , at least one of Cr 3+ , Pb 2+ and Ba 2+ , the metal azo pigment Az4 contains the anion, the metal ion containing Ni 2+ and the metal ion Me4a, the melamine compound, The metal ion Me4a is selected from La 3+ , Ce 3+ , Pr 3+ , Nd 2+ , Nd 3+ , Sm 2+ , Sm 3+ , Eu 2+ , Eu 3+ , Gd 3+ , Tb 3+ , At least one of Dy 3+ , Ho 3+ , Er 3+ , Tm 3+ , Yb 2+ and Yb 3+ ;
Figure 107141537-A0305-02-0129-1
In the formula, R 1 and R 2 are each independently OH or NR 5 R 6 , R 3 and R 4 are each independently =O or =NR 7 , and R 5 to R 7 are each independently a hydrogen atom or an alkyl group.
如申請專利範圍第1項所述之組成物,其中該金屬偶氮顏料Az1以金屬偶氮顏料中的總金屬離子的1莫耳為基準合計含有95莫耳%~100莫耳%的Zn2+及Cu2+,該金屬偶氮顏料Az2以金屬偶氮顏料中的總金屬離子的1莫耳為基準合計含有75莫耳%~99.5莫耳%的Zn2+及Cu2+,且含有0.5莫耳%~25莫耳%的該金屬離子Me2,該金屬偶氮顏料Az3以金屬偶氮顏料中的總金屬離子的1莫耳為基準合計含有70莫耳%~99.5莫耳%的Cu2+及Ni2+,且含有0.5莫耳%~30莫耳%的該金屬離子Me3, 該金屬偶氮顏料Az4以金屬偶氮顏料中的總金屬離子的1莫耳為基準合計含有95莫耳%~100莫耳%的Ni2+及該金屬離子Me4a,且Ni2+與該金屬離子Me4a的莫耳比為Ni2+:金屬離子Me4a=1:1~19:1。 The composition of claim 1, wherein the metal azo pigment Az1 is based on 1 mole of the total metal ions in the metal azo pigment and contains a total of 95 mol % to 100 mol % of Zn 2 + and Cu 2+ , the metal azo pigment Az2 contains 75 mol % to 99.5 mol % of Zn 2+ and Cu 2+ in total based on 1 mol of the total metal ions in the metal azo pigment, and contains 0.5 mol% to 25 mol% of the metal ion Me2, the metal azo pigment Az3 is based on 1 mol of the total metal ions in the metal azo pigment and contains 70 mol% to 99.5 mol% of Cu in total 2+ and Ni 2+ , and contains 0.5 mol% to 30 mol% of the metal ion Me3, the metal azo pigment Az4 is based on 1 mol of the total metal ions in the metal azo pigment, and contains a total of 95 mol% %~100 mol% of Ni 2+ and the metal ion Me4a, and the molar ratio of Ni 2+ to the metal ion Me4a is Ni 2+ : metal ion Me4a=1:1~19:1. 如申請專利範圍第1項所述之組成物,其中該金屬偶氮顏料為該金屬偶氮顏料Az1。 The composition of claim 1, wherein the metal azo pigment is the metal azo pigment Az1. 如申請專利範圍第1項所述之組成物,其中該金屬離子Me2為選自La3+、Ce3+、Pr3+、Nd3+、Sm3+、Tb3+、Ho3+及Sr2+之至少1種,該金屬離子Me3為選自La3+、Ce3+、Pr3+、Nd3+、Sm3+、Tb3+、Ho3+及Sr2+之至少1種,該金屬離子Me4a為選自La3+、Ce3+、Pr3+、Nd3+、Sm3+、Tb3+及Ho3+之至少1種。 The composition of claim 1, wherein the metal ion Me2 is selected from La 3+ , Ce 3+ , Pr 3+ , Nd 3+ , Sm 3+ , Tb 3+ , Ho 3+ and Sr At least one of 2+ , the metal ion Me3 is at least one selected from La 3+ , Ce 3+ , Pr 3+ , Nd 3+ , Sm 3+ , Tb 3+ , Ho 3+ and Sr 2+ , The metal ion Me4a is at least one selected from La 3+ , Ce 3+ , Pr 3+ , Nd 3+ , Sm 3+ , Tb 3+ and Ho 3+ . 如申請專利範圍第1項所述之組成物,其中該金屬偶氮顏料Az1中的Zn2+與Cu2+的莫耳比為Zn2+:Cu2+=199:1~1:15。 The composition according to claim 1, wherein the molar ratio of Zn 2+ to Cu 2+ in the metal azo pigment Az1 is Zn 2+ :Cu 2+ =199:1~1:15. 如申請專利範圍第1項至第5項中任一項所述之組成物,其中該金屬偶氮顏料中之該三聚氰胺化合物為由下述式(II)表示之化合物;
Figure 107141537-A0305-02-0130-2
式中R11~R13分別獨立為氫原子或烷基。
The composition according to any one of items 1 to 5 of the claimed scope, wherein the melamine compound in the metal azo pigment is a compound represented by the following formula (II);
Figure 107141537-A0305-02-0130-2
In the formula, R 11 to R 13 are each independently a hydrogen atom or an alkyl group.
如申請專利範圍第1項至第5項中任一項所述之組成物,其中 在該波長400nm~700nm的範圍具有吸收極大之色料含有選自藍色著色劑及紫色著色劑之至少1種。 The composition according to any one of items 1 to 5 of the scope of the application, wherein The colorant having an absorption maximum in the wavelength range of 400 nm to 700 nm contains at least one selected from a blue colorant and a violet colorant. 如申請專利範圍第1項至第5項中任一項所述之組成物,其進一步含有近紅外線吸收色素。 The composition according to any one of claims 1 to 5 of the claimed scope, further comprising a near-infrared absorbing dye. 如申請專利範圍第8項所述之組成物,其中該近紅外線吸收色素在波長800nm~900nm的範圍具有吸收極大。 The composition according to claim 8, wherein the near-infrared absorbing dye has an absorption maximum in the wavelength range of 800nm-900nm. 如申請專利範圍第8項所述之組成物,其中該近紅外線吸收色素為選自吡咯并吡咯化合物、花菁化合物、方酸菁化合物、酞菁化合物、萘酞菁化合物及克酮鎓化合物之至少1種。 The composition according to claim 8, wherein the near-infrared absorbing dye is selected from the group consisting of pyrrolopyrrole compounds, cyanine compounds, squaraine compounds, phthalocyanine compounds, naphthalocyanine compounds and ketonium compounds At least 1 species. 如申請專利範圍第1項至第5項中任一項所述之組成物,其用於紅外線透射濾波器。 The composition according to any one of items 1 to 5 of the claimed scope, which is used in an infrared transmission filter. 一種膜,其使用申請專利範圍第1項至第11項中任一項所述之組成物而獲得。 A film obtained by using the composition described in any one of items 1 to 11 of the claimed scope. 一種紅外線透射濾波器,其具有申請專利範圍第12項所述之膜。 An infrared transmission filter having the film described in item 12 of the patent application scope. 一種固體攝像元件,其具有申請專利範圍第12項所述之膜。 A solid-state imaging element having the film described in claim 12 of the scope of application. 一種光學感測器,其具有申請專利範圍第12項所述之膜。 An optical sensor having the film described in item 12 of the patent application scope.
TW107141537A 2017-11-29 2018-11-21 Composition, film, infrared transmission filter, solid-state imaging element, and optical sensor TWI770314B (en)

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