TWI756040B - Display device - Google Patents
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Abstract
Description
本發明是有關於一種顯示裝置,且特別是有關於一種具有穩定資料線電位的顯示裝置。The present invention relates to a display device, and more particularly, to a display device with stable data line potential.
在以異型切割方式生產的顯示器中,需要將閘極與源極的訊號源放置於同一側,以便於切割。因此,在顯示器的顯示區內會有垂直的閘極轉接線設置於相鄰的畫素之間,且閘極轉接線通常與資料線平行。然而,平行且相鄰的資料線與閘極轉接線之間會存在固定的電容,此電容會造成訊號之電容耦合,而在閘極訊號開啟或關閉時影響資料線的電位,使資料線的電位產生變動而不穩定,導致顯示亮度異常。In the display produced by the special-shaped cutting method, the signal source of the gate electrode and the source electrode need to be placed on the same side to facilitate cutting. Therefore, in the display area of the display, there are vertical gate transition lines disposed between adjacent pixels, and the gate transition lines are usually parallel to the data lines. However, there will be a fixed capacitance between the parallel and adjacent data lines and the gate transfer line, which will cause capacitive coupling of the signal, and affect the potential of the data line when the gate signal is turned on or off, making the data line The potential of the device fluctuates and becomes unstable, resulting in abnormal display brightness.
本發明提供一種顯示裝置,具有穩定的資料線電位。The present invention provides a display device with stable data line potential.
本發明的一個實施例提出一種顯示裝置,具有周邊區以及顯示區,且包括:多條資料線,自周邊區延伸進入顯示區,其中資料線沿著第一方向延伸;多條掃描線,位於顯示區,且沿著交錯於第一方向的第二方向延伸;多條轉接線,自周邊區延伸進入顯示區,且分別電性連接至掃描線;多個畫素,分別電性連接至掃描線以及資料線,其中第一資料線以及至少二轉接線位於畫素中的相鄰兩者之間;以及多條屏蔽導線,其中第一屏蔽導線位於第一資料線與上述的至少二轉接線之間,第二屏蔽導線位於上述的至少二轉接線中的相鄰兩者之間。An embodiment of the present invention provides a display device, which has a peripheral area and a display area, and includes: a plurality of data lines extending from the peripheral area into the display area, wherein the data lines extend along a first direction; and a plurality of scan lines located at The display area extends along a second direction interlaced with the first direction; a plurality of transfer lines extend from the peripheral area into the display area and are respectively electrically connected to the scan lines; a plurality of pixels are electrically connected to the A scan line and a data line, wherein the first data line and at least two transfer lines are located between two adjacent ones of the pixels; and a plurality of shielded wires, wherein the first shielded wire is located between the first data line and the above at least two Between the transfer wires, the second shielded wire is located between two adjacent ones of the above at least two transfer wires.
在本發明的一實施例中,上述的屏蔽導線相互電性連接。In an embodiment of the present invention, the above-mentioned shielded wires are electrically connected to each other.
在本發明的一實施例中,上述的第二屏蔽導線具有開口。In an embodiment of the present invention, the above-mentioned second shielded wire has an opening.
在本發明的一實施例中,上述的畫素中的相鄰兩者之間設有四條轉接線以及五條屏蔽導線。In an embodiment of the present invention, four transfer wires and five shielded wires are arranged between two adjacent ones of the above-mentioned pixels.
在本發明的一實施例中,上述的畫素包括多個子畫素,各子畫素包括開關元件以及畫素電極,畫素電極電性連接至開關元件,且屏蔽導線與畫素電極屬於相同膜層。In an embodiment of the present invention, the above-mentioned pixel includes a plurality of sub-pixels, each sub-pixel includes a switching element and a pixel electrode, the pixel electrode is electrically connected to the switching element, and the shielding wire and the pixel electrode belong to the same film layer.
在本發明的一實施例中,上述的顯示裝置還包括共用電極,其中屏蔽導線電性連接至共用電極。In an embodiment of the present invention, the above-mentioned display device further includes a common electrode, wherein the shielding wire is electrically connected to the common electrode.
在本發明的一實施例中,上述的顯示裝置還包括虛設資料線,其中至少二轉接線位於第一資料線與虛設資料線之間。In an embodiment of the present invention, the above-mentioned display device further includes a dummy data line, wherein at least two transfer lines are located between the first data line and the dummy data line.
在本發明的一實施例中,上述的屏蔽導線中的第三屏蔽導線位於虛設資料線與轉接線之間。In an embodiment of the present invention, the third shielded wire among the above-mentioned shielded wires is located between the dummy data wire and the patch wire.
在本發明的一實施例中,上述的虛設資料線與第一資料線經由導電層連接,且導電層與掃描線屬於相同膜層。In an embodiment of the present invention, the dummy data line and the first data line are connected through a conductive layer, and the conductive layer and the scan line belong to the same film layer.
在本發明的一實施例中,上述的資料線、轉接線以及虛設資料線屬於相同膜層。In an embodiment of the present invention, the above-mentioned data lines, transition lines and dummy data lines belong to the same film layer.
在本發明的一實施例中,上述的資料線、轉接線以及虛設資料線屬於不同膜層。In an embodiment of the present invention, the above-mentioned data lines, transition lines and dummy data lines belong to different layers.
在本發明的一實施例中,上述的至少二轉接線屬於不同膜層。In an embodiment of the present invention, the above-mentioned at least two patch cables belong to different layers.
本發明的一個實施例提出一種顯示裝置,具有周邊區以及顯示區,且顯示區具有轉接線區,轉接線區具有側邊區以及中央區,側邊區位於周邊區與中央區之間,其中顯示裝置包括:多條資料線,自周邊區延伸進入顯示區,其中資料線沿著第一方向延伸;多條掃描線,位於顯示區,且沿著交錯於第一方向的第二方向延伸;多條轉接線,自周邊區延伸進入轉接線區,且分別電性連接至掃描線;多個畫素,分別電性連接至掃描線以及資料線,其中第一資料線以及至少二轉接線位於畫素中的相鄰兩者之間;多條屏蔽導線,位於中央區;以及多個屏蔽圖案,位於中央區;其中第一屏蔽導線位於第一資料線與至少二轉接線之間,第二屏蔽導線位於至少二轉接線中的相鄰兩者之間,各屏蔽圖案位於各轉接線與對應的掃描線連接之處,且各屏蔽圖案同時重疊至少二轉接線以及對應的掃描線。An embodiment of the present invention provides a display device having a peripheral area and a display area, the display area has a patch cord area, the patch cord area has a side area and a center area, and the side area is located between the peripheral area and the center area , wherein the display device includes: a plurality of data lines extending from the peripheral area into the display area, wherein the data lines extend along a first direction; a plurality of scan lines, located in the display area, and along a second direction staggered in the first direction extension; a plurality of transfer lines, extending from the peripheral area into the transfer line area, and electrically connected to the scan lines respectively; a plurality of pixels, respectively electrically connected to the scan lines and the data lines, wherein the first data line and at least Two transfer wires are located between two adjacent ones of the pixels; a plurality of shielded wires are located in the central area; and a plurality of shielding patterns are located in the central area; wherein the first shielded wire is located between the first data line and the at least two transfer wires Between lines, the second shielded wire is located between two adjacent ones of the at least two transfer lines, each shielding pattern is located at the connection between each transfer line and the corresponding scan line, and each shielding pattern overlaps at least two transfer lines at the same time. line and the corresponding scan line.
在本發明的一實施例中,上述的各屏蔽圖案連接第一屏蔽導線以及第二屏蔽導線。In an embodiment of the present invention, each of the above-mentioned shielding patterns is connected to the first shielded wire and the second shielded wire.
在本發明的一實施例中,上述的顯示裝置還包括虛設資料線,其中至少二轉接線位於第一資料線與虛設資料線之間。In an embodiment of the present invention, the above-mentioned display device further includes a dummy data line, wherein at least two transfer lines are located between the first data line and the dummy data line.
在本發明的一實施例中,上述的第一資料線與虛設資料線於側邊區連接。In an embodiment of the present invention, the above-mentioned first data line and the dummy data line are connected in the side region.
在本發明的一實施例中,上述的顯示區還具有非轉接線區,非轉接線區位於轉接線區與周邊區之間,於非轉接線區,虛設資料線與第二資料線位於畫素中的相鄰兩者之間。In an embodiment of the present invention, the above-mentioned display area further has a non-patch line area, the non-patch line area is located between the transition line area and the peripheral area, and in the non-patch line area, the dummy data line and the second The data line is located between two adjacent ones in the pixel.
在本發明的一實施例中,上述的第二資料線與虛設資料線電性連接。In an embodiment of the present invention, the above-mentioned second data line is electrically connected to the dummy data line.
在本發明的一實施例中,上述的顯示裝置還包括多條共用電極線,其中至少二共用電極線位於第二資料線與虛設資料線之間。In an embodiment of the present invention, the above-mentioned display device further includes a plurality of common electrode lines, wherein at least two common electrode lines are located between the second data line and the dummy data line.
在本發明的一實施例中,上述的至少二共用電極線與至少二轉接線的數量相同。In an embodiment of the present invention, the number of the above-mentioned at least two common electrode lines and at least two transition lines is the same.
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above-mentioned features and advantages of the present invention more obvious and easy to understand, the following embodiments are given and described in detail with the accompanying drawings as follows.
圖1是本發明一實施例的顯示裝置10的上視示意圖。圖2是圖1中區域I的放大圖。顯示裝置10具有周邊區NA以及顯示區AA。顯示裝置10包括多條資料線DL、多條掃描線GL、多條轉接線Gn、多個畫素PX以及多條屏蔽導線Sn。多條資料線DL自周邊區NA延伸進入顯示區AA,其中資料線DL沿著第一方向D1延伸。多條掃描線GL位於顯示區AA,且沿著第二方向D2延伸,其中第二方向D2交錯於第一方向D1。多條轉接線Gn自周邊區NA延伸進入顯示區AA,且分別電性連接至掃描線GL。多個畫素PX分別電性連接至掃描線GL以及資料線DL,其中資料線DL1以及至少二轉接線Gn位於多個畫素PX中的相鄰兩個畫素PX之間。多條屏蔽導線Sn中的屏蔽導線S1位於資料線DL1與轉接線Gn之間,屏蔽導線S2位於相鄰的兩條轉接線Gn之間。FIG. 1 is a schematic top view of a
在本實施例中,利用屏蔽導線S1來隔開轉接線Gn與資料線DL1,以降低轉接線Gn與資料線DL1之間的電容耦合,從而避免資料線DL1的電位產生變動,而能夠使資料線DL1具有穩定的電位。此外,相鄰的轉接線Gn之間的屏蔽導線S2可以使各轉接線Gn的負載較為相近,以避免顯示裝置10的亮度不均。In this embodiment, the shielded wire S1 is used to separate the patch cord Gn and the data line DL1, so as to reduce the capacitive coupling between the patch cord Gn and the data line DL1, thereby preventing the potential of the data line DL1 from changing, and enabling The data line DL1 has a stable potential. In addition, the shielded wires S2 between adjacent patch wires Gn can make the loads of the patch wires Gn relatively similar, so as to avoid uneven brightness of the
以下,配合圖式,繼續說明顯示裝置10的各個元件與膜層的實施方式,但本發明不以此為限。Hereinafter, the embodiments of each element and film layer of the
請參照圖1,在本實施例中,顯示裝置10的形狀為圓形,但本發明不限於此。在一些實施例中,顯示裝置10可以具有矩形、橢圓形、多角形、或不規則的形狀,可以視需要選擇顯示裝置10的形狀。Referring to FIG. 1 , in this embodiment, the shape of the
顯示裝置10可以具有周邊區NA以及顯示區AA,且周邊區NA圍繞顯示區AA。在本實施例中,顯示裝置10還包括位於周邊區NA的驅動電路DC。在本實施例中,顯示裝置10為單邊區動,且驅動電路DC位於顯示區AA的上側,但本發明不以此為限。在一些實施例中,顯示裝置10可為雙邊驅動,且驅動電路DC可位於顯示區AA的上、下兩側或左、右兩側。The
在本實施例中,顯示區AA可以具有轉接線區TA以及非轉接線區NTA,其中轉接線區TA為設置有轉接線Gn的區域,且轉接線Gn不設置於非轉接線區NTA。在本實施例中,轉接線區TA位於顯示區AA的中央區域,且非轉接線區NTA位於轉接線區TA的兩側,但本發明不以此為限,轉接線區TA以及非轉接線區NTA的配置可以視需要進行變更。在本實施例中,轉接線區TA可以具有側邊區EA1以及中央區CA1,其中側邊區EA1位於周邊區NA與中央區CA1之間。另外,非轉接線區NTA也可以具有側邊區EA2以及中央區CA2,而且側邊區EA2位於周邊區NA與中央區CA2之間。In this embodiment, the display area AA may have a patch cord area TA and a non-transit cord area NTA, wherein the patch cord area TA is an area provided with patch cords Gn, and the patch cord Gn is not set in the non-transition cord area. Connection area NTA. In this embodiment, the patch cord area TA is located in the central area of the display area AA, and the non patch cord area NTA is located on both sides of the patch cord area TA, but the present invention is not limited to this, the patch cord area TA And the configuration of the non-patch line area NTA can be changed as needed. In this embodiment, the patch cord area TA may have a side area EA1 and a central area CA1, wherein the side area EA1 is located between the peripheral area NA and the central area CA1. In addition, the non-patch line area NTA may also have a side area EA2 and a center area CA2, and the side area EA2 is located between the peripheral area NA and the center area CA2.
請同時參照圖1與圖2,顯示裝置10包括位於基板SB上的多條資料線DL、多條掃描線GL、多條轉接線Gn、多個畫素PX以及多條屏蔽導線Sn。資料線DL電性連接至驅動電路DC。舉例來說,資料線DL電性連接至驅動電路DC中的源極驅動元件(未繪出)。資料線DL自周邊區NA延伸進入顯示區AA,位於顯示區AA的資料線DL沿著第一方向D1延伸,而位於周邊區NA的資料線DL可以彼此不平行。1 and 2 at the same time, the
掃描線GL位於顯示區AA,且沿著交錯於第一方向D1的第二方向D2延伸。轉接線Gn自周邊區NA延伸進入顯示區AA的轉接線區TA,且轉接線Gn的一端分別電性連接至掃描線GL,轉接線Gn的另一端電性連接至驅動電路DC,舉例來說,轉接線Gn可電性連接至驅動電路DC中的閘極驅動元件(未繪出)。如此一來,轉接線Gn可分別將來自驅動電路DC的閘極驅動訊號傳送至對應的掃描線GL。The scan line GL is located in the display area AA and extends along the second direction D2 which is intersected with the first direction D1. The patch cord Gn extends from the peripheral area NA into the patch cord area TA of the display area AA, and one end of the patch cord Gn is electrically connected to the scan line GL respectively, and the other end of the patch cord Gn is electrically connected to the driving circuit DC For example, the switching wire Gn can be electrically connected to a gate driving element (not shown) in the driving circuit DC. In this way, the switching wires Gn can respectively transmit the gate driving signals from the driving circuit DC to the corresponding scanning lines GL.
請參照圖2,在本實施例中,顯示裝置10包括多個子畫素SP,且每個子畫素SP電性連接至對應的掃描線GL以及資料線DL。舉例來說,每個子畫素SP包括開關元件SW以及電性連接至開關元件SW的畫素電極PE,其中開關元件SW電性連接至對應的一條掃描線以及對應的一條資料線。在本實施例中,子畫素SP包括紅色子畫素、綠色子畫素以及藍色子畫素。舉例來說,重疊於紅色濾光元件(未繪出)的子畫素SP為紅色子畫素,重疊於綠色濾光元件(未繪出)的子畫素SP為綠色子畫素,重疊於藍色濾光元件(未繪出)的子畫素SP為藍色子畫素。在本實施例中,子畫素SP陣列成多個畫素PX。舉例來說,每個畫素PX包括一個紅色子畫素、一個綠色子畫素以及一個藍色子畫素。在一些實施例中,每個畫素PX還可以包括其他顏色的子畫素。在本實施例中,每個畫素PX包括三個子畫素SP,且每個畫素PX電性連接至一條掃描線以及三條資料線。Referring to FIG. 2 , in this embodiment, the
於轉接線區TA,相鄰的兩個畫素PX之間可以設置一條資料線DL以及至少二條轉接線Gn。舉例而言,在本實施例中,相鄰的兩個畫素PX1、PX2之間設置一條資料線DL1以及四條轉接線G1~G4。在一些實施例中,相鄰的畫素PX1、PX2之間可以設置一條資料線DL1以及三條轉接線Gn。在一些實施例中,相鄰的畫素PX1、PX2之間可以設置一條資料線DL以及五條轉接線Gn。In the patch cord area TA, one data line DL and at least two patch cords Gn may be set between two adjacent pixels PX. For example, in this embodiment, one data line DL1 and four transition lines G1 to G4 are set between two adjacent pixels PX1 and PX2 . In some embodiments, one data line DL1 and three transition lines Gn may be set between adjacent pixels PX1 and PX2. In some embodiments, one data line DL and five transition lines Gn may be set between adjacent pixels PX1 and PX2.
在本實施例中,資料線DL1位於畫素PX1與轉接線G1之間。顯示裝置10還可以包括虛設資料線DDL,且轉接線G1~G4位於資料線DL1與虛設資料線DDL之間,虛設資料線DDL位於轉接線G4與畫素PX2之間。在本實施例中,資料線DL1、轉接線G1~G4以及虛設資料線DDL可以屬於相同膜層,但本發明不以此為限。藉由設置虛設資料線DDL,資料線DL1與畫素PX1之間產生的電容耦合可以被虛設資料線DDL與畫素PX2之間的電容耦合抵消。In this embodiment, the data line DL1 is located between the pixel PX1 and the transition line G1. The
於轉接線區TA的中央區CA1,顯示裝置10的多條屏蔽導線Sn可以分別設置於資料線DL1、轉接線G1~G4以及虛設資料線DDL之間。舉例而言,在本實施例中,顯示裝置10包括三條屏蔽導線S1~S3,其中屏蔽導線S1位於資料線DL1與轉接線G1之間;屏蔽導線S2位於轉接線G2與轉接線G3之間;且屏蔽導線S3位於轉接線G4與虛設資料線DDL之間,但本發明不以此為限。如此一來,屏蔽導線S1可以將資料線DL1與轉接線G1隔開,以減小資料線DL1與轉接線G1之間的電容耦合,且屏蔽導線S2與屏蔽導線S3可以使轉接線G2~G4的負載與轉接線G1相近,而避免亮度不均。In the central area CA1 of the patch cord area TA, a plurality of shielded wires Sn of the
圖3是本發明一實施例的顯示裝置20的上視示意圖。與如圖1至圖2的顯示裝置10相比,如圖3所示的顯示裝置20的不同之處在於:顯示裝置20包括五條屏蔽導線S1~S5,其中屏蔽導線S1位於資料線DL1與轉接線G1之間;屏蔽導線S2位於轉接線G1與轉接線G2之間;屏蔽導線S3位於轉接線G2與轉接線G3之間;屏蔽導線S4位於轉接線G3與轉接線G4之間;且屏蔽導線S5位於轉接線G4與虛設資料線DDL之間。在資料線DL1、轉接線G1~G4以及虛設資料線DDL中任意兩者之間皆設置屏蔽導線Sn可以全面地均勻化轉接線G1~G4的負載,且避免製程中的些微對位偏差導致負載不均的狀況更加嚴重。FIG. 3 is a schematic top view of the
圖4A是本發明一實施例的顯示裝置30的上視示意圖。圖4B是圖4A的顯示裝置30的區域V的放大示意圖。圖4C是沿圖4B的剖面線A-A’所作的剖面示意圖。與圖3的顯示裝置20相比,如圖4A至圖4C所示的顯示裝置30的不同之處在於:屏蔽導線S2具有開口O2,屏蔽導線S4具有開口O4,其中屏蔽導線S2包括子導線S21以及子導線S22,且開口O2位於子導線S21與子導線S22之間;同時屏蔽導線S4包括子導線S41以及子導線S42,且開口O4位於子導線S41與子導線S42之間。在本實施例中,開口O2、O4可以減小屏蔽導線S2以及屏蔽導線S4與附近的導電層之間的電容,且避免屏蔽導線S2以及屏蔽導線S4與附近的導電層之間發生短路。FIG. 4A is a schematic top view of a
請同時參照圖4B與圖4C,在本實施例中,開關元件SW包括閘極GE、半導體層CH、源極SE以及汲極DE。閘極GE重疊半導體層CH,半導體層CH重疊閘極GE的區域可視為開關元件SW的通道區。開關元件SW的源極SE與汲極DE彼此分離,且源極SE與汲極DE分別接觸半導體層CH。畫素電極PE電性連接至汲極DE。開關元件SW可透過掃描線GL所傳遞的訊號而開啟或關閉,並且開關元件SW開啟時可將資料線DL上所傳遞的訊號傳遞給畫素電極PE。4B and 4C at the same time, in this embodiment, the switching element SW includes a gate electrode GE, a semiconductor layer CH, a source electrode SE and a drain electrode DE. The gate electrode GE overlaps the semiconductor layer CH, and the region where the semiconductor layer CH overlaps the gate electrode GE can be regarded as a channel region of the switching element SW. The source SE and the drain DE of the switching element SW are separated from each other, and the source SE and the drain DE respectively contact the semiconductor layer CH. The pixel electrode PE is electrically connected to the drain electrode DE. The switching element SW can be turned on or off through the signal transmitted by the scan line GL, and when the switching element SW is turned on, the signal transmitted on the data line DL can be transmitted to the pixel electrode PE.
開關元件SW的源極SE與汲極DE可以屬於相同膜層,而且開關元件SW的源極SE、汲極DE以及閘極GE的材質可包括導電性良好的金屬,例如鋁、鉬、鈦等金屬,但本發明不以此為限。為了避免各構件之間發生不必要的短路,在閘極GE與半導體層CH之間設置閘極絕緣層GI,且在形成源極SE和汲極DE的膜層與畫素電極PE之間設置鈍化層PV。雖然本實施例中的閘極GE位於半導體層CH下方,使得開關元件SW為底閘極電晶體。然而,在其他實施例中,閘極GE也可以位於半導體層CH上方,使得開關元件SW為頂閘極電晶體。The source electrode SE and the drain electrode DE of the switching element SW may belong to the same film layer, and the material of the source electrode SE, the drain electrode DE and the gate electrode GE of the switching element SW may include metals with good conductivity, such as aluminum, molybdenum, titanium, etc. metal, but the present invention is not limited to this. In order to avoid unnecessary short circuits between components, a gate insulating layer GI is provided between the gate electrode GE and the semiconductor layer CH, and between the film layer forming the source electrode SE and the drain electrode DE and the pixel electrode PE Passivation layer PV. Although the gate GE in this embodiment is located under the semiconductor layer CH, the switching element SW is a bottom gate transistor. However, in other embodiments, the gate GE may also be located above the semiconductor layer CH, so that the switching element SW is a top gate transistor.
在本實施例中,屏蔽導線S1~S5與畫素電極PE屬於相同膜層,且屏蔽導線S1~S5的材質包括透明導電材料。在一些實施例中,屏蔽導線S1~S5可以使用合金、金屬材料的氮化物、金屬材料的氧化物、金屬材料的氮氧化物或其它合適的材料、或是上述導電材料的堆疊層,例如銦錫氧化物、銦鋅氧化物、鋁錫氧化物、鋁鋅氧化物、銦鎵鋅氧化物或其他合適的氧化物或者是上述至少二者之堆疊層,但本發明不限於此。In this embodiment, the shielding wires S1-S5 and the pixel electrodes PE belong to the same film layer, and the materials of the shielding wires S1-S5 include transparent conductive materials. In some embodiments, the shielding wires S1-S5 can be made of alloys, nitrides of metal materials, oxides of metal materials, oxynitrides of metal materials or other suitable materials, or stacked layers of the above conductive materials, such as indium Tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium gallium zinc oxide, or other suitable oxides or a stacked layer of at least two of the above, but the invention is not limited thereto.
顯示裝置30還包括共用電極CL,且屏蔽導線S1~S5分別電性連接至共用電極CL,因此,屏蔽導線S1~S5具有與共用電極CL相同的電位。舉例而言,在本實施例中,共用電極CL包括共用電極CL1與共用電極CL2,且共用電極CL1與共用電極CL2分別位於掃描線GL的兩側。屏蔽導線S1~S5可以藉由導線ML1相互電性連接,且導線ML1可通過通孔V1連接至共用電極CL1。另外,導線ML1還可通過通孔V2連接導線ML2,且導線ML2可通過通孔V3、導線ML3以及通孔V4連接共用電極CL2,使得共用電極CL1以及共用電極CL2可連接形成網狀電極。如此一來,即使在顯示裝置30經過異型切割之後,共用電極CL1以及共用電極CL2仍然能夠電性電接。The
圖5是圖4A的顯示裝置30於如圖1所示的區域II的放大圖。於顯示裝置30的轉接線區TA的側邊區EA1中,虛設資料線DDL與資料線DL1經由導電層M1連接,以使虛設資料線DDL與資料線DL1具有相同電位。在一些實施例中,導電層M1可與掃描線GL屬於相同膜層,但本發明不以此為限。在一些實施例中,資料線DL1可以藉由導電圖案P1連接導電層M1,且虛設資料線DDL可以藉由導電圖案P2連接導電層M1。導電圖案P1以及導電圖案P2可以與圖4A的顯示裝置30的屏蔽導線S1~S5屬於相同膜層,且屏蔽導線S1~S5未延伸至側邊區EA1,以避免與導電圖案P1以及導電圖案P2短路。FIG. 5 is an enlarged view of the
圖6是圖4A的顯示裝置30於如圖1所示的區域III的放大圖。在本實施例中,於轉接線區TA的中央區CA1,轉接線G1~G4可以連接四條掃描線GL,其中每條轉接線G1~G4各自連接對應的一條掃描線GL。轉接線G1~G4連接的四條掃描線GL可以沿著第一方向D1依序排列,但本發明不限於此。另外,在轉接線G1~G4連接掃描線GL之處,可以設置屏蔽圖案SM。FIG. 6 is an enlarged view of the
舉例而言,在本實施例中,屏蔽圖案SM位於資料線DL1以及虛設資料線DDL之間,且屏蔽圖案SM可以包括屏蔽區塊SM1以及屏蔽區塊SM2。For example, in this embodiment, the shielding pattern SM is located between the data line DL1 and the dummy data line DDL, and the shielding pattern SM may include a shielding block SM1 and a shielding block SM2.
在一些實施例中,屏蔽區塊SM1連接屏蔽導線S1~S5,且屏蔽區塊SM1同時重疊公用電極CL1、公用電極CL2、轉接線G1~G4以及掃描線GL1。利用屏蔽區塊SM1來覆蓋轉接線G1~G4,能夠避免轉接線G1~G4的電場影響鄰近的畫素電極PE。在一些實施例中,轉接線G1可以通過通孔V5連接屏蔽區塊SM2,且屏蔽區塊SM2可以通過通孔V6連接掃描線GL1。由於通孔V5以及通孔V6為現有製程即可形成,因此,可以免除在轉接線G1與掃描線GL1的重疊區域VI形成通孔的製程步驟與光罩。In some embodiments, the shielding block SM1 is connected to the shielding wires S1 - S5 , and the shielding block SM1 overlaps the common electrode CL1 , the common electrode CL2 , the transition lines G1 - G4 and the scan line GL1 at the same time. Using the shielding block SM1 to cover the patch cords G1 to G4 can prevent the electric field of the patch cords G1 to G4 from affecting the adjacent pixel electrodes PE. In some embodiments, the patch line G1 can be connected to the shield block SM2 through the through hole V5, and the shield block SM2 can be connected to the scan line GL1 through the through hole V6. Since the through hole V5 and the through hole V6 can be formed by the existing process, the process steps and mask of forming the through hole in the overlapping region VI of the transition line G1 and the scan line GL1 can be omitted.
圖7是圖4A的顯示裝置30於如圖1所示的區域IV的放大圖。在本實施例中,非轉接線區NTA位於轉接線區TA與周邊區NA之間。於非轉接線區NTA,相鄰的畫素之間可設置資料線DL2以及虛設資料線DDL,且資料線DL2與虛設資料線DDL於側邊區EA2電性連接。FIG. 7 is an enlarged view of the
由於非轉接線區NTA並無設置轉接線Gn,因此,於非轉接線區NTA,可在資料線DL2與虛設資料線DDL之間設置多條共用電極線,且共用電極線的數量可與轉接線區TA中相鄰畫素之間的轉接線的數量相同,以使非轉接線區NTA的電容負載與轉接線區TA相近。舉例而言,在本實施例中,資料線DL2與虛設資料線DDL之間設置四條共用電極線CM1、CM2、CM3、CM4。Since the non-transfer line area NTA is not provided with the transfer line Gn, in the non-transfer line area NTA, a plurality of common electrode lines can be set between the data line DL2 and the dummy data line DDL, and the number of common electrode lines It may be the same as the number of patch lines between adjacent pixels in the patch line area TA, so that the capacitive load of the non- patch line area NTA is similar to that of the patch line area TA. For example, in this embodiment, four common electrode lines CM1 , CM2 , CM3 , and CM4 are disposed between the data line DL2 and the dummy data line DDL.
此外,在資料線DL2與共用電極線CM1之間可設置屏蔽導線S6,且在虛設資料線DDL與共用電極線CM4之間可設置屏蔽導線S7,以降低共用電極線CM1、CM4與資料線DL2、虛設資料線DDL之間的電容耦合,從而避免資料線DL2以及虛設資料線DDL的電位產生變動,而能夠使資料線DL2具有穩定的電位。In addition, a shielded wire S6 can be arranged between the data line DL2 and the common electrode line CM1, and a shielded wire S7 can be arranged between the dummy data line DDL and the common electrode line CM4, so as to reduce the reduction of the common electrode lines CM1, CM4 and the data line DL2 , Capacitive coupling between the dummy data lines DDL, so as to avoid the potential variation of the data line DL2 and the dummy data line DDL, so that the data line DL2 can have a stable potential.
圖8A是本發明一實施例的顯示裝置40的上視示意圖。圖8B是沿圖8A的剖面線B-B’所作的剖面示意圖。圖8C是沿圖8A的剖面線C-C’所作的剖面示意圖。與圖3所示的顯示裝置20相比,如圖8A至圖8C所示的顯示裝置40的不同之處在於:於轉接線區TA的中央區CA1,資料線DL1、轉接線G1~G4以及虛設資料線DDL屬於不同膜層。FIG. 8A is a schematic top view of a
舉例而言,在本實施例中,轉接線G1、轉接線G3以及虛設資料線DDL屬於導電層M0,且資料線DL1、轉接線G2以及轉接線G4屬於導電層M2。因此,轉接線G1~G4也屬於不同膜層。導電層M0位於基板SB上,導電層M0與導電層M2之間設置緩衝層BF以及閘極絕緣層GI,且鈍化層PV位於導電層M2上。藉由資料線DL1、轉接線G1~G4以及虛設資料線DDL中的任意相鄰走線皆屬於不同膜層,能夠排除相鄰走線由於製程誤差而產生短路的可能性,從而最小化相鄰走線之間的間距。For example, in this embodiment, the patch line G1, the patch wire G3, and the dummy data line DDL belong to the conductive layer M0, and the data line DL1, the patch wire G2, and the patch wire G4 belong to the conductive layer M2. Therefore, the patch cords G1~G4 also belong to different film layers. The conductive layer M0 is located on the substrate SB, the buffer layer BF and the gate insulating layer GI are disposed between the conductive layer M0 and the conductive layer M2, and the passivation layer PV is located on the conductive layer M2. Since any adjacent traces in the data line DL1, the transition lines G1~G4, and the dummy data line DDL belong to different layers, the possibility of short-circuiting of adjacent traces due to process errors can be eliminated, thereby minimizing the phase difference. Spacing between adjacent traces.
請參照圖8C,於顯示裝置40的轉接線區TA的側邊區EA1中,虛設資料線DDL與資料線DL1經由導電層M4連接,以使虛設資料線DDL與資料線DL1具有相同電位。8C, in the side area EA1 of the patch line area TA of the
圖9是本發明一實施例的顯示裝置50的剖面示意圖。與圖8B所示的顯示裝置40相比,如圖9所示的顯示裝置50的不同之處在於:轉接線G1、轉接線G3以及虛設資料線DDL屬於導電層M3,且資料線DL1、轉接線G2以及轉接線G4屬於導電層M2。FIG. 9 is a schematic cross-sectional view of a
在本實施例中,閘極絕緣層GI位於基板SB上,導電層M2設置於閘極絕緣層GI上,鈍化層PV位於導電層M2與導電層M3之間,且絕緣層BP位於導電層M3上。藉由資料線DL1、轉接線G1~G4以及虛設資料線DDL中的任意相鄰走線皆屬於不同膜層,能夠排除相鄰走線由於製程誤差而產生短路的可能性,從而最小化相鄰走線之間的距離。In this embodiment, the gate insulating layer GI is located on the substrate SB, the conductive layer M2 is disposed on the gate insulating layer GI, the passivation layer PV is located between the conductive layer M2 and the conductive layer M3, and the insulating layer BP is located on the conductive layer M3 superior. Since any adjacent traces in the data line DL1, the transition lines G1~G4, and the dummy data line DDL belong to different layers, the possibility of short-circuiting of adjacent traces due to process errors can be eliminated, thereby minimizing the phase difference. The distance between adjacent traces.
綜上所述,本發明利用屏蔽導線來隔開轉接線與資料線,能夠降低轉接線與資料線之間的電容耦合,而避免資料線的電位產生變動,使得資料線的電位能夠保持穩定。此外,在相鄰的轉接線之間設置屏蔽導線可以使各轉接線的負載相近,而能夠避免顯示裝置的亮度不均。To sum up, the present invention utilizes shielded wires to separate the patch cables and the data cables, which can reduce the capacitive coupling between the patch cables and the data cables, and avoid the potential variation of the data cables, so that the potential of the data cables can be maintained. Stablize. In addition, by arranging shielded wires between adjacent patch cables, the load of the patch cables can be similar, and the uneven brightness of the display device can be avoided.
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed above by the embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, The protection scope of the present invention shall be determined by the scope of the appended patent application.
10、20、30、40、50:顯示裝置 A-A’、B-B’、C-C’:剖面線 AA:顯示區 BF:緩衝層 BP:絕緣層 CA1、CA2:中央區 CH:半導體層 CL、CL1、CL2:共用電極 CM1、CM2、CM3、CM4:共用電極線 D1:第一方向 D2:第二方向 DC:驅動電路 DDL:虛設資料線 DE:汲極 DL、DL1、DL2:資料線 EA1、EA2:側邊區 G1、G2、G3、G4、Gn:轉接線 GE:閘極 GI:閘極絕緣層 GL、GL1:掃描線 I、II、III、IV、V、VI:區域 M0、M1、M2、M3、M4:導電層 ML1、ML2、ML3:導線 NA:周邊區 NTA:非轉接線區 O2、O4:開口 P1:導電圖案 P2:導電圖案 PE:畫素電極 PV:鈍化層 PX、PX1、PX2:畫素 S1、S2、S3、S4、S5、S6、S7、Sn:屏蔽導線 S21、S22、S41、S42:子導線 SB:基板 SE:源極 SM:屏蔽圖案 SM1、SM2:屏蔽區塊 SP:子畫素 SW:開關元件 TA:轉接線區 V1、V2、V3、V4、V5、V6:通孔 10, 20, 30, 40, 50: Display device A-A', B-B', C-C': hatching AA: display area BF: buffer layer BP: insulating layer CA1, CA2: Central District CH: semiconductor layer CL, CL1, CL2: Common electrodes CM1, CM2, CM3, CM4: Common electrode lines D1: first direction D2: second direction DC: drive circuit DDL: dummy data line DE: drain DL, DL1, DL2: data lines EA1, EA2: side area G1, G2, G3, G4, Gn: Adapter cable GE: gate GI: gate insulating layer GL, GL1: scan line I, II, III, IV, V, VI: Regions M0, M1, M2, M3, M4: Conductive layer ML1, ML2, ML3: Wires NA: Surrounding area NTA: Non-patch line area O2, O4: Opening P1: Conductive Pattern P2: Conductive Pattern PE: pixel electrode PV: Passivation layer PX, PX1, PX2: Pixels S1, S2, S3, S4, S5, S6, S7, Sn: Shielded conductors S21, S22, S41, S42: Sub-conductors SB: Substrate SE: source SM: Shield Pattern SM1, SM2: Blocking blocks SP: Subpixel SW: switching element TA: patch cord area V1, V2, V3, V4, V5, V6: Through holes
圖1是本發明一實施例的顯示裝置10的上視示意圖。
圖2是圖1中區域I的放大圖。
圖3是本發明一實施例的顯示裝置20的上視示意圖。
圖4A是本發明一實施例的顯示裝置30的上視示意圖。
圖4B是圖4A的顯示裝置30的區域V的放大示意圖。
圖4C是沿圖4B的剖面線A-A’所作的剖面示意圖。
圖5是圖4A的顯示裝置30於如圖1所示的區域II的放大圖。
圖6是圖4A的顯示裝置30於如圖1所示的區域III的放大圖。
圖7是圖4A的顯示裝置30於如圖1所示的區域IV的放大圖。
圖8A是本發明一實施例的顯示裝置40的上視示意圖。
圖8B是沿圖8A的剖面線B-B’所作的剖面示意圖。
圖8C是沿圖8A的剖面線C-C’所作的剖面示意圖。
圖9是本發明一實施例的顯示裝置50的剖面示意圖。
FIG. 1 is a schematic top view of a
A-A’:剖面線 CH:半導體層 CL1:共用電極 DE:汲極 DDL:虛設資料線 DL1:資料線 G1、G2、G3、G4:轉接線 GE:閘極 GI:閘極絕緣層 GL:掃描線 ML1、ML2:導線 PE:畫素電極 PV:鈍化層 S1、S2、S3、S4、S5:屏蔽導線 S21、S22、S41、S42:子導線 SB:基板 SE:源極 SW:開關元件 30:顯示裝置 A-A': hatch line CH: semiconductor layer CL1: Common electrode DE: drain DDL: dummy data line DL1: Data Line G1, G2, G3, G4: Adapter cable GE: gate GI: gate insulating layer GL: scan line ML1, ML2: Wire PE: pixel electrode PV: Passivation layer S1, S2, S3, S4, S5: Shielded conductors S21, S22, S41, S42: Sub-conductors SB: Substrate SE: source SW: switching element 30: Display device
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US20100066967A1 (en) * | 2008-09-18 | 2010-03-18 | Toshiba Mobile Display Co., Ltd. | Liquid crystal display device |
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CN105372891A (en) * | 2015-12-04 | 2016-03-02 | 上海天马微电子有限公司 | Array substrate and display device |
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US20010022572A1 (en) * | 1997-10-31 | 2001-09-20 | Seiko Epson Corporation | Electro-optical apparatus and electronic device |
US20100066967A1 (en) * | 2008-09-18 | 2010-03-18 | Toshiba Mobile Display Co., Ltd. | Liquid crystal display device |
CN103208248A (en) * | 2012-01-17 | 2013-07-17 | 元太科技工业股份有限公司 | Display panel |
CN105825811A (en) * | 2015-01-27 | 2016-08-03 | 三星显示有限公司 | Non-rectangular display |
CN105372891A (en) * | 2015-12-04 | 2016-03-02 | 上海天马微电子有限公司 | Array substrate and display device |
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