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TWI739091B - Selection circuitries and method for preventing latch-up of memory storage system - Google Patents

Selection circuitries and method for preventing latch-up of memory storage system Download PDF

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TWI739091B
TWI739091B TW108113794A TW108113794A TWI739091B TW I739091 B TWI739091 B TW I739091B TW 108113794 A TW108113794 A TW 108113794A TW 108113794 A TW108113794 A TW 108113794A TW I739091 B TWI739091 B TW I739091B
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voltage signal
operable voltage
transistor
operable
maximum
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TW108113794A
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TW202002519A (en
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林松傑
國原 許
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台灣積體電路製造股份有限公司
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Abstract

Various embodiments of selection circuitries and a method for preventing latch-up of a memory storage system are disclosed. The selection circuitry selectively choose an operational voltage signal from among multiple operational voltage signals to dynamically control various operational parameters. For example, the selection circuitry selectively choose a maximum operational voltage signal from among the multiple operational voltage signals to maximize read/write speed. As another example, the selection circuitry selectively choose a minimum operational voltage signal from among the multiple operational voltage signals to minimize power consumption. Moreover, the selection circuitry selectively provide the maximum operational voltage signal to bulk (B) terminals of some of their transistors to prevent latch-up of these transistors. In some situations, the selection circuitry can dynamically adjust the maximum operational voltage signal to compensate for fluctuations in the maximum operational voltage signal.

Description

選擇電路以及用於預防記憶體儲存系統閂鎖的 方法 Selection circuit and the one used to prevent latch-up of the memory storage system method

本揭露是有關於一種選擇電路以及用於預防記憶體儲存系統閂鎖的方法。 This disclosure relates to a selection circuit and a method for preventing latch-up of a memory storage system.

記憶體儲存系統為用於讀取及/或寫入電子資料的電子裝置。記憶體儲存系統包含記憶體單元陣列,所述記憶體單元陣列可實施為需要電源來維持其所儲存資訊的揮發性記憶體單元,諸如隨機存取記憶體(random-access memory;RAM)單元,或即使不供電也可維持其所儲存資訊的非揮發性記憶體單元,諸如唯讀記憶體(read-only memory;ROM)單元。電子資料可被讀取及/或寫入記憶體單元陣列中,上述記憶體單元陣列可通過各種控制線來進行存取。由記憶體裝置所執行的兩個基礎操作分別為「讀取」及「寫入」,在讀取中,讀出儲存於記憶體單元陣列中的電子資料,在寫入中,電子資料寫入於記憶體單元陣列中。 The memory storage system is an electronic device used to read and/or write electronic data. The memory storage system includes an array of memory cells, which can be implemented as volatile memory cells that require power to maintain their stored information, such as random-access memory (RAM) cells, Or a non-volatile memory unit such as a read-only memory (ROM) unit that can maintain the stored information even if it is not powered. Electronic data can be read and/or written into a memory cell array, which can be accessed through various control lines. The two basic operations performed by the memory device are " read " and " write ". In reading, the electronic data stored in the memory cell array is read, and in writing, the electronic data is written In the memory cell array.

本揭露的選擇電路用以將可操作電壓信號選擇性地提供 至記憶體儲存系統的選擇電路。選擇電路包括開關電路以及閂鎖預防電路。開關電路具有多個電晶體。開關電路經設置以從多個可操作電壓信號當中選擇可操作電壓信號,所述多個可操作電壓信號當中的最大可操作電壓信號選擇性地施加於所述多個電晶體的基極端。閂鎖預防電路經設置以動態地調節最大可操作電壓信號,以補償最大可操作電壓信號的波動。 The selection circuit of the present disclosure is used to selectively provide an operable voltage signal The selection circuit to the memory storage system. The selection circuit includes a switch circuit and a latch-up prevention circuit. The switching circuit has multiple transistors. The switch circuit is configured to select an operable voltage signal from among a plurality of operable voltage signals, and a maximum operable voltage signal among the plurality of operable voltage signals is selectively applied to the base terminal of the plurality of transistors. The latch-up prevention circuit is configured to dynamically adjust the maximum operable voltage signal to compensate for fluctuations in the maximum operable voltage signal.

本揭露的另一選擇電路用於記憶體儲存系統。選擇電路包括開關電路以及閂鎖預防電路。開關電路具有多個電晶體。開關電路經設置以將從多個可操作電壓信號中選擇的可操作電壓信號提供至記憶體儲存系統。閂鎖預防電路具有第一二極體連接電晶體及第二二極體連接電晶體。閂鎖預防電路經設置以將從所述多個可操作電壓信號中選擇的最大可操作電壓信號施加於第一二極體連接電晶體的第一基極端及第二二極體連接電晶體的第二基極端。第一二極體連接電晶體經設置以在啟動時設置自第一可操作電壓信號獲得第一電流,以調節最大可操作電壓信號,以補償最大可操作電壓信號的波動。第二二極體連接電晶體經設置以在啟動時設置自第二可操作電壓信號獲得第二電流,以調節最大可操作電壓信號,以補償最大可操作電壓信號的波動。 Another selection circuit of the present disclosure is used in a memory storage system. The selection circuit includes a switch circuit and a latch-up prevention circuit. The switching circuit has multiple transistors. The switch circuit is configured to provide an operable voltage signal selected from the plurality of operable voltage signals to the memory storage system. The latch-up prevention circuit has a first diode connected to the transistor and a second diode connected to the transistor. The latch-up prevention circuit is configured to apply the maximum operable voltage signal selected from the plurality of operable voltage signals to the first base terminal of the first diode connection transistor and the second diode connection transistor. The second base extreme. The first diode connected to the transistor is configured to obtain the first current from the first operable voltage signal when it is started, so as to adjust the maximum operable voltage signal to compensate for the fluctuation of the maximum operable voltage signal. The second diode connected to the transistor is set to obtain the second current from the second operable voltage signal when it is started, so as to adjust the maximum operable voltage signal to compensate for the fluctuation of the maximum operable voltage signal.

本揭露的用於預防記憶體儲存系統閂鎖的方法包括:藉由記憶體儲存系統,將從多個可操作電壓信號中選擇的最大可操作電壓信號施加於記憶體儲存系統的至少一個電晶體的至少一個基極區及施加於至少一個電晶體的至少一個閘極區;以及當最大可操作電壓信號在所述多個可操作電壓信號當中的第一可操作電壓信號下方波動時,藉由記憶體儲存系統增加最大可操作電壓信 號。 The disclosed method for preventing the latch-up of a memory storage system includes: applying a maximum operable voltage signal selected from a plurality of operable voltage signals to at least one transistor of the memory storage system by the memory storage system And at least one gate area applied to at least one transistor; and when the maximum operable voltage signal fluctuates below the first operable voltage signal among the plurality of operable voltage signals, by The memory storage system increases the maximum operable voltage No.

100、500:記憶體儲存系統 100, 500: memory storage system

102:電壓產生器電路 102: Voltage generator circuit

104.1、104.x、200.1~200.m、220.1~220.n、400:選擇電路 104.1, 104. x , 200.1~200. m , 220.1~220. n , 400: select circuit

106、202、222:記憶體裝置 106, 202, 222: memory device

150:偏壓控制信號 150: Bias control signal

152:選擇控制信號 152: Select control signal

204、224:記憶體陣列 204, 224: memory array

210.1.1~210.m.n、226.1.1~226.m.n:記憶體單元 210.1.1 ~ 210 m n, 226.1.1 ~ 226 m n:.... The memory unit

212.1~212.n、350:字線 212.1~212. n , 350: word line

214.1、214.m、352:位元線 214.1, 214. m , 352: bit line

300:SRAM單元 300: SRAM cell

402:開關電路 402: switch circuit

404:閂鎖預防電路 404: Latch Prevention Circuit

452、452:偏壓控制信號 452, 452: Bias control signal

502、504、506:操作 502, 504, 506: Operation

IDD、IDDM:電流 I DD , I DDM : current

N1~N3、N4:n型金屬氧化物半導體電晶體 N1~N3, N4: n-type metal oxide semiconductor transistor

P1、P2、P4、P5、P6、P7:p型金屬氧化物半導體電晶體 P1, P2, P4, P5, P6, P7: p-type metal oxide semiconductor transistor

V1、VDD、VDDM、VDDM_INT、VDDM_INT.1、VDDM_INT.m 、VDDM_INT.n 、VDDM_INT.x 、V m :可操作電壓信號 V 1 , V DD , V DDM , V DDM_INT , V DDM_INT.1 , V DDM_INT. m , V DDM_INT. n , V DDM_INT. x , V m : operable voltage signals

VDDMAX:最大可操作電壓信號 V DDMAX : Maximum operable voltage signal

結合隨附圖式閱讀以下詳細描述會最佳地理解本揭露的態樣。應注意,根據業界中的標準慣例,各種特徵未按比例繪製。 事實上,可出於論述清楚起見,而任意地增加或減小各種特徵的尺寸。 Reading the following detailed description in conjunction with the accompanying drawings will best understand the aspect of the present disclosure. It should be noted that according to standard practices in the industry, various features are not drawn to scale. In fact, the size of various features can be arbitrarily increased or decreased for clarity of discussion.

圖1示出根據本揭露的例示性實施例的例示性記憶體儲存系統的方塊圖。 FIG. 1 shows a block diagram of an exemplary memory storage system according to an exemplary embodiment of the present disclosure.

圖2A示出可實施於根據本揭露的例示性實施例的例示性記憶體儲存系統內的第一例示性記憶體裝置的方塊圖。 FIG. 2A shows a block diagram of a first exemplary memory device that can be implemented in an exemplary memory storage system according to an exemplary embodiment of the present disclosure.

圖2B示出可實施於根據本揭露的例示性實施例的例示性記憶體儲存系統內的第二例示性記憶體裝置的方塊圖。 2B shows a block diagram of a second exemplary memory device that can be implemented in an exemplary memory storage system according to an exemplary embodiment of the present disclosure.

圖3示出可實施於根據揭露的例示性實施例的例示性記憶體裝置內的例示性靜態隨機存取記憶體(static random-access memory;SRAM)單元的方塊圖。 FIG. 3 shows a block diagram of an exemplary static random-access memory (SRAM) cell that may be implemented in an exemplary memory device according to the disclosed exemplary embodiment.

圖4示出可實施於根據本揭露的例示性實施例的例示性記憶體裝置內的例示性選擇電路的方塊圖。 FIG. 4 shows a block diagram of an exemplary selection circuit that may be implemented in an exemplary memory device according to an exemplary embodiment of the present disclosure.

圖5示出根據本揭露的例示性實施例的例示性記憶體儲存系統的例示性操作的流程圖。 FIG. 5 shows a flowchart of an exemplary operation of an exemplary memory storage system according to an exemplary embodiment of the present disclosure.

以下揭露內容提供用於實施所提供的標的的不同特徵的許多不同實施例或實例。下文描述組件及配置的特定實例以簡化 本揭露。當然,這些組件及配置僅為實例且並不意欲為限制性的。舉例而言,在以下描述中,第一特徵在第二特徵上方的形成可包含第一特徵及第二特徵直接接觸地形成的實施例,且亦可包含額外特徵可在第一特徵與第二特徵之間形成以使得第一特徵與第二特徵可不直接接觸的實施例。另外,本揭露可在各種實例中重複附圖標號及/或字母。此重複本身不指示所描述的各種實施例與設置之間的關係。 The following disclosure provides many different embodiments or examples for implementing different features of the provided subject matter. Specific examples of components and configurations are described below to simplify This disclosure. Of course, these components and configurations are only examples and are not intended to be limiting. For example, in the following description, the formation of the first feature above the second feature may include an embodiment in which the first feature and the second feature are formed in direct contact, and may also include additional features that may be formed between the first feature and the second feature. An embodiment in which features are formed so that the first feature and the second feature may not directly contact each other. In addition, the present disclosure may repeat icon numbers and/or letters in various examples. This repetition itself does not indicate the relationship between the various embodiments and settings described.

概述 Overview

本發明揭露可設置記憶體儲存系統的各種實施例。可設置記憶體儲存器從多個可操作電壓信號中選擇性地選擇可操作電壓信號以動態地控制各種操作參數。舉例而言,可設置記憶體儲存系統從多個可操作電壓信號中選擇性地選擇最大可操作電壓信號以將讀取/寫入速度最大化。作為另一實例,可設置記憶體儲存系統從多個可操作電壓信號中選擇性地選擇最小可操作電壓信號以將功率消耗最小化。此外,可設置記憶體儲存系統將最大可操作電壓信號選擇性地提供至其電晶體中的一些的基極(bulk;B)端,以防止閂鎖這些電晶體。在一些情況下,可設置記憶體儲存系統可動態地調節最大可操作電壓信號以補償最大可操作電壓信號的波動。 The present invention discloses various embodiments in which a memory storage system can be provided. The memory storage can be set to selectively select the operable voltage signal from a plurality of operable voltage signals to dynamically control various operating parameters. For example, the memory storage system can be set to selectively select the maximum operable voltage signal from a plurality of operable voltage signals to maximize the read/write speed. As another example, the memory storage system can be configured to selectively select the smallest operable voltage signal from a plurality of operable voltage signals to minimize power consumption. In addition, the memory storage system can be configured to selectively provide the maximum operable voltage signal to the bulk (B) terminals of some of its transistors to prevent these transistors from latching up. In some cases, the memory storage system can be configured to dynamically adjust the maximum operable voltage signal to compensate for fluctuations in the maximum operable voltage signal.

例示性記憶體儲存系統 Exemplary memory storage system

圖1示出根據本揭露的例示性實施例的例示性記憶體儲存系統的方塊圖。在圖1中所示出的例示性實施例中,記憶體儲存系統100在多個可操作電壓信號之間選擇性地選擇以動態地控制操作。舉例而言,記憶體儲存系統100可從多個可操作電壓信 號中選擇可操作電壓信號以設置記憶體儲存系統100動態地控制(例如,最小化或最大化)來自記憶體儲存系統100的多個操作參數中的一個或多個操作參數,諸如功率消耗及/或讀取/寫入速度。如圖1中所示出,記憶體儲存系統100包含電壓產生器電路102、選擇電路104.1~104.x以及記憶體裝置106。 FIG. 1 shows a block diagram of an exemplary memory storage system according to an exemplary embodiment of the present disclosure. In the exemplary embodiment shown in FIG. 1, the memory storage system 100 selectively selects among a plurality of operable voltage signals to dynamically control the operation. For example, the memory storage system 100 may select an operable voltage signal from a plurality of operable voltage signals to configure the memory storage system 100 to dynamically control (for example, minimize or maximize) the amount from the memory storage system 100. One or more of the operating parameters, such as power consumption and/or read/write speed. As shown in FIG. 1, the memory storage system 100 includes a voltage generator circuit 102, selection circuits 104.1 to 104. x, and a memory device 106.

電壓產生器電路102根據偏壓控制信號150從可操作電壓信號V1至可操作電壓信號V m 中將最大可操作電壓信號VDDMAX選擇性地提供至選擇電路104.1~104.x。舉例而言,最大可操作電壓信號VDDMAX可表示可操作電壓信號V1~V m 當中的最大可操作電壓信號。在一些情況下,可操作電壓信號V1~V m 當中的最大可操作電壓信號為憑經驗已知的。在例示性實施例中,電壓產生器電路102包含多個開關以從可操作電壓信號V1~V m 中選擇性地提供最大可操作電壓信號作為最大可操作電壓信號VDDMAX。在此例示性實施例中,偏壓控制信號150包含一個或多個控制位元,其中一個或多個控制位元的各種組合對應於可操作電壓信號V1~V m 當中的各種可操作電壓信號。在此例示性實施例中,偏壓控制信號150可設定為對應於可操作電壓信號V1~V m 當中的最大可操作電壓信號的控制位元的組合,以設置電壓產生器電路102從可操作電壓信號V1~V m 中將最大可操作電壓信號作為最大可操作電壓信號VDDMAX選擇性地提供至選擇電路104.1~104.x。在此例示性實施例中,控制位元的此組合啟動(亦即,閉合)多個開關當中的一個或多個開關,以從可操作電壓信號V1~V m 中提供最大可操作電壓信號作為最大可操作電壓信號VDDMAX,同時阻斷(亦即,開路)多個開關當中的剩餘開關。 The voltage generator circuit 102 selectively provides the maximum operable voltage signal V DDMAX from the operable voltage signal V 1 to the operable voltage signal V m according to the bias voltage control signal 150 to the selection circuits 104.1 to 104. x . For example, the maximum operable voltage signal V DDMAX may represent the maximum operable voltage signal among the operable voltage signals V 1 to V m. In some cases, the maximum operable voltage signal among the operable voltage signals V 1 to V m is known empirically. In an exemplary embodiment, the voltage generator circuit 102 includes a plurality of switches to selectively provide a maximum operable voltage signal from the operable voltage signals V 1 to V m as the maximum operable voltage signal V DDMAX . In this exemplary embodiment, the bias control signal 150 includes one or more control bits, and various combinations of the one or more control bits correspond to various operable voltages among the operable voltage signals V 1 ~V m. Signal. In this exemplary embodiment, the bias voltage control signal 150 may be set to a combination of control bits corresponding to the maximum operable voltage signal among the operable voltage signals V 1 ~V m , so as to set the voltage generator circuit 102 from the operable voltage signal. Among the operating voltage signals V 1 to V m , the maximum operable voltage signal is selectively provided as the maximum operable voltage signal V DDMAX to the selection circuits 104.1 to 104. x . In this exemplary embodiment, this combination of control bits activates (ie, closes) one or more of the plurality of switches to provide the maximum operable voltage signal from the operable voltage signals V 1 to V m As the maximum operable voltage signal V DDMAX , the remaining switches among the plurality of switches are simultaneously blocked (ie, opened).

在圖1中所示出的例示性實施例中,選擇電路104.1~104.x反應於選擇控制信號152而選擇性地提供可操作電壓信號V1~V m 中的一者作為可操作電壓信號VDDM_INT.1~VDDM_INT.x ,以控制記憶體裝置106的一個或多個操作參數。選擇控制信號152可設定為一個或多個控制位元的各種組合以選擇性地提供可操作電壓信號V1~V m 中的一者作為可操作電壓信號VDDM_INT.1~VDDM_INT.x,以動態地控制記憶體裝置106的多個操作參數。舉例而言,一個或多個控制位元可設定為第一位元組合以從可操作電壓信號V1~V m 中選擇最小可操作電壓信號,以動態地控制(例如,最小化)記憶體裝置106的功率消耗。在此實例中,當與可操作電壓信號V1~V m 中的其他可操作電壓信號相比時,最小可操作電壓信號使得記憶體裝置106的各種電晶體中較少不想要的漏電。作為另一實例,一個或多個控制位元可設定為第二位元組合以從可操作電壓信號V1~V m 中選擇最大可操作電壓信號,以動態地控制(例如,最大化)記憶體裝置106的讀取/寫入速度。在一些情況下,選擇控制信號152可在操作記憶體儲存系統100期間切換以在運作中動態地設置記憶體裝置106,以控制一個或多個操作參數。在此其他實例中,當與可操作電壓信號V1~V m 當中的其他可操作電壓信號相比時,最大可操作電壓信號可使得記憶體裝置106的記憶體單元的各種電晶體以更快速率斷開及/或接通。作為另一實例,選擇控制信號152可設定為第二位元組合以將記憶體裝置106的讀取/寫入速度最大化且在運作中經動態地重設置為不同位元組合,從而降低記憶體裝置106的讀取/寫入速度。 In the exemplary embodiment shown in FIG. 1, the selection circuits 104.1 to 104. x react to the selection control signal 152 to selectively provide one of the operable voltage signals V 1 to V m as the operable voltage signal V DDM_INT.1 ~V DDM_INT. x to control one or more operating parameters of the memory device 106. The selection control signal 152 can be set to various combinations of one or more control bits to selectively provide one of the operable voltage signals V 1 ~V m as the operable voltage signal V DDM_INT.1 ~V DDM_INT.x , In order to dynamically control multiple operating parameters of the memory device 106. For example, one or more control bits can be set as the first bit combination to select the minimum operable voltage signal from the operable voltage signals V 1 ~V m to dynamically control (for example, minimize) the memory The power consumption of the device 106. In this example, when compared with other operable voltage signals among the operable voltage signals V 1 ˜V m , the minimum operable voltage signal results in less unwanted leakage in various transistors of the memory device 106. As another example, one or more control bits can be set as the second bit combination to select the maximum operable voltage signal from the operable voltage signals V 1 ~V m to dynamically control (for example, maximize) the memory The read/write speed of the physical device 106. In some cases, the selection control signal 152 can be switched during the operation of the memory storage system 100 to dynamically set the memory device 106 during operation to control one or more operating parameters. In this other example, when compared with other operable voltage signals among the operable voltage signals V 1 ~V m , the maximum operable voltage signal can make the various transistors of the memory cell of the memory device 106 faster The rate is off and/or on. As another example, the selection control signal 152 can be set to a second bit combination to maximize the read/write speed of the memory device 106 and dynamically reset to a different bit combination during operation, thereby reducing memory The read/write speed of the physical device 106.

在例示性實施例中,選擇電路104.1~104.x包含多個開關 以選擇性地提供可操作電壓信號V1~V m 中的一者作為可操作電壓信號VDDM_INT.1~VDDM_INT.x。在此例示性實施例中,選擇控制信號152包含一個或多個控制位元,其中一個或多個控制位元的各種組合對應於可操作電壓信號V1~V m 當中的各種可操作電壓信號。在此例示性實施例中,選擇控制信號152可設定為對應於可操作電壓信號V1~V m 當中的最大可操作電壓信號的控制位元的組合,以設置選擇電路104.1~104.x,從可操作電壓信號V1~V m 中將最大可操作電壓信號作為可操作電壓信號V1~V m 作為可操作電壓信號VDDM_INT.1~VDDM_INT.x,選擇性地提供至記憶體裝置106。在此例示性實施例中,控制位元的此組合從多個開關當中啟動(亦即,閉合)一個或多個開關,以從可操作電壓信號V1~V m 當中提供最大可操作電壓信號及為最大可操作電壓信號VDDMAX,同時阻斷(亦即,開路)多個開關當中的剩餘開關。在此例示性實施例中,可使用電晶體實施多個開關,所述電晶體諸如p型金屬氧化物半導體(p-type metal-oxide-semiconductor;PMOS)電晶體,其具有形成於半導體基底的井區內的源極端、汲極端、閘極端以及基極(B)端。如下文將進一步詳細描述,選擇電路104.1~104.x自電壓產生器電路102將最大可操作電壓信號VDDMAX提供至電晶體的基極(B)端,以使得形成於這些電晶體的源極(source;S)端與井區之間的寄生二極體反向偏置,亦即,非導電,以防止閂鎖這些電晶體。在一些情況下,最大可操作電壓信號VDDMAX可例如反應於電晶體的井區與半導體基底之間的不想要的電磁耦接及/或漏電而波動。在這些情況下,選擇電路104.1~104.x可動態地調節最大可操作電壓信號VDDMAX,以補償最大可操作電壓信號VDDMAX的這 些波動,如下文將進一步詳細論述。 In an exemplary embodiment, the selection circuits 104.1 to 104. x include a plurality of switches to selectively provide one of the operable voltage signals V 1 to V m as the operable voltage signal V DDM_INT.1 to V DDM_INT.x . In this exemplary embodiment, the selection control signal 152 includes one or more control bits, and various combinations of the one or more control bits correspond to various operable voltage signals among the operable voltage signals V 1 to V m. . In this exemplary embodiment, the selection control signal 152 may be set to a combination of control bits corresponding to the maximum operable voltage signal among the operable voltage signals V 1 ~V m to set the selection circuit 104.1~104. x , The maximum operable voltage signal from the operable voltage signals V 1 ~V m is used as the operable voltage signal V 1 ~V m as the operable voltage signal V DDM_INT.1 ~V DDM_INT.x , which is selectively provided to the memory device 106. In this exemplary embodiment, this combination of control bits activates (ie, closes) one or more switches from among a plurality of switches to provide a maximum operable voltage signal from among the operable voltage signals V 1 ~V m And is the maximum operable voltage signal V DDMAX , simultaneously blocking (that is, opening) the remaining switches among the plurality of switches. In this exemplary embodiment, multiple switches may be implemented using transistors, such as p-type metal-oxide-semiconductor (PMOS) transistors, which have a semiconductor substrate formed on a semiconductor substrate. The source terminal, drain terminal, gate terminal and base (B) terminal in the well area. As will be described in further detail below, the selection circuits 104.1 to 104. x provide the maximum operable voltage signal V DDMAX from the voltage generator circuit 102 to the base (B) terminal of the transistors, so that the source of these transistors is formed The parasitic diodes between the (source; S) terminal and the well are reverse biased, that is, non-conductive, to prevent latching of these transistors. In some cases, the maximum operable voltage signal V DDMAX may fluctuate, for example, in response to unwanted electromagnetic coupling and/or leakage between the well region of the transistor and the semiconductor substrate. In these cases, the selection circuits 104.1 to 104. x can dynamically adjust the maximum operable voltage signal V DDMAX to compensate for these fluctuations of the maximum operable voltage signal V DDMAX , as will be discussed in further detail below.

記憶體裝置106接收從可操作電壓信號V1~V m 中選擇性地選擇的可操作電壓信號VDDM_INT.1~VDDM_INT.x。在圖1中所示出的例示性實施例中,記憶體裝置106包含配置成m個行及n個列的陣列的記憶體單元。在此例示性實施例中,記憶體裝置106將可操作電壓信號VDDM_INT.1~VDDM_INT.x中的每一者提供至如下文圖2A中將進一步詳細論述的記憶體陣列的m個行當中的對應行及/或提供至如下文圖2B中將進一步詳細論述的記憶體單元陣列的n列當中的對應列。 The memory device 106 receives the operable voltage signals V DDM_INT.1 to V DDM_INT.x which are selectively selected from the operable voltage signals V 1 to V m . In the exemplary embodiment shown in FIG. 1, the memory device 106 includes memory cells arranged in an array of m rows and n columns. In this exemplary embodiment, the memory device 106 provides each of the operable voltage signals V DDM_INT.1 to V DDM_INT.x to m rows of the memory array as discussed in further detail in FIG. 2A below The corresponding rows therein and/or are provided to corresponding columns among the n columns of the memory cell array as discussed in further detail in FIG. 2B below.

可實施於例示性記憶體儲存系統內的例示性記憶體裝置 Exemplary memory device that can be implemented in an exemplary memory storage system

圖2A示出可實施於根據本揭露的例示性實施例的例示性記憶體儲存系統內的第一例示性記憶體裝置的方塊圖。在圖2A中所示出的例示性實施例中,選擇電路200.1~200.m以與如上文圖1中所描述的選擇電路104.1~104.x實質上類似的方式來選擇性地提供可操作電壓信號VDDM_INT.1~VDDM_INT.m 以設置記憶體裝置202的操作。記憶體裝置202可表示如上文圖1中所描述的記憶體裝置106的例示性實施例。在例示性實施例中,選擇電路200.1~200.m從多個可操作電壓信號中選擇性地提供第一可操作電壓信號作為可操作電壓信號VDDM_INT.1~VDDM_INT.m ,以設置記憶體裝置202動態地控制(例如,最小化)記憶體裝置202的多個操作參數當中的一個或多個操作參數,諸如功率消耗及/或讀取/寫入速度。作為另一實例,選擇電路200.1~200.m從多個可操作電壓信號中選擇性地提供第二可操作電壓信號,以設置記憶體裝置202動態地控制(例如,最大化)記憶體裝置202的一個或多個操作參數。 FIG. 2A shows a block diagram of a first exemplary memory device that can be implemented in an exemplary memory storage system according to an exemplary embodiment of the present disclosure. In the exemplary embodiment shown in FIG. 2A, the selection circuits 200.1 to 200. m selectively provide operable in a manner substantially similar to the selection circuits 104.1 to 104. x described in FIG. 1 above. The voltage signals V DDM_INT.1 to V DDM_INT. m are used to set the operation of the memory device 202. The memory device 202 may represent an exemplary embodiment of the memory device 106 as described in FIG. 1 above. In an exemplary embodiment, the selection circuit 200.1 to 200. m selectively provides the first operable voltage signal as the operable voltage signal V DDM_INT.1 to V DDM_INT. m from the plurality of operable voltage signals to set the memory The body device 202 dynamically controls (eg, minimizes) one or more of the multiple operating parameters of the memory device 202, such as power consumption and/or read/write speed. As another example, the selection circuit 200.1~200. m selectively provides a second operable voltage signal from a plurality of operable voltage signals, so as to set the memory device 202 to dynamically control (for example, maximize) the memory device 202 One or more operating parameters.

在圖2A中所示出的例示性實施例中,記憶體裝置202包含記憶體陣列204。儘管在圖2A中未示出,記憶體裝置202可包含其他電子電路,諸如提供一些實例的感測放大器、列位址解碼器及/或行位址解碼器,其在不脫離本揭露的精神及範疇的情況下將對相關技術領域中具通常知識者顯而易見。如圖2A中所示出,記憶體陣列204包含經設置及配置到m行及n列的陣列中的記憶體單元210.1.1~10.m.n。然而,記憶體單元210.1.1~210.m.n的其他配置可能不背離本揭露的精神及範疇。在圖2A中所示出的例示性實施例中,記憶體單元210.1.1~210.m.n連接至字線212.1~字線212.n當中的對應字線(wordline;WL)及位元線214.1~位元線214.m當中的對應位元線(bitline;BL)。字線212.1~字線212.n及/或位元線214.1~位元線214.m可用於以「讀取」操作模式讀取儲存於記憶體陣列204中的電子資料且/或以「寫入」操作模式將電子資料寫入記憶體陣列204中。「讀取」操作模式及「寫入」操作模式表示習知讀取及寫入操作,且將不進一步詳細描述。 In the exemplary embodiment shown in FIG. 2A, the memory device 202 includes a memory array 204. Although not shown in FIG. 2A, the memory device 202 may include other electronic circuits, such as a sense amplifier, a column address decoder, and/or a row address decoder to provide some examples, which do not deviate from the spirit of the present disclosure. In the case of and category, it will be obvious to those with general knowledge in the relevant technical field. As shown in FIG. 2A, the memory array 204 includes memory cells 210.1.1 to 10. m . n arranged and arranged in an array of m rows and n columns. However, other configurations of the memory unit 210.1.1 to 210. m . n may not deviate from the spirit and scope of this disclosure. In the exemplary embodiment shown in FIG. 2A, the memory cells 210.1.1 to 210. m . n are connected to corresponding word lines (wordline; WL) and bits among the word lines 212.1 to 212. n Corresponding bit line (bitline; BL) among the line 214.1~bit line 214. m. Word lines 212.1 and 212. n ~ word line / bit line or bit line 214. m ~ 214.1 may be used to "read" mode of operation to read data stored in an electronic memory array 204 and / or to "write The "in" operation mode writes electronic data into the memory array 204. The " read " operation mode and the " write " operation mode represent conventional read and write operations, and will not be described in further detail.

如圖2A中所示出,選擇電路200.1~200.m將可操作電壓信號VDDM_INT.1~VDDM_INT.m 選擇性地提供至記憶體單元210.1.1~210.m.n當中的m個行的一個或多個對應行。舉例而言,選擇電路200.1將可操作電壓信號VDDM_INT.1選擇性地提供至記憶體單元210.1.1~210.1.n的第一行,且選擇電路200.m將可操作電壓信號VDDM_INT.m 選擇性地提供至記憶胞210.m.1~210.m.n的第m行儘管在圖2A中未示出,選擇電路200.1~200.m中的每一者可將可操作電壓信號VDDM_INT.1~VDDM_INT.m 當中的其對應可操作電壓信號選擇性地提供至記憶體單元210.1.1~210.m.nm個行當中的大 於一行。在例示性實施例中,可使用一個或多個電晶體實施記憶體單元210.m.1~210.m.n,所述電晶體諸如一個或多個p型金屬氧化物半導體(PMOS)電晶體、一個或多個n型金屬氧化物半導體(n-type metal-oxide-semiconductor;NMOS)電晶體或PMOS電晶體與NMOS電晶體的任何組合,在不脫離本揭露的精神及範疇的情況下其將對相關技術領域中具通常知識者顯而易見。在此例示性實施例中,選擇電路200.1~200.m可將可操作電壓信號VDDM_INT.1~VDDM_INT.m 選擇性地提供至記憶體單元210.1.1~210.m.nm個行當中的其對應行內的電晶體的基極(B)端。可操作電壓信號VDDM_INT.1~VDDM_INT.m 有效使得本例中的形成於這些電晶體的源極(S)端與井區之間的寄生二極體反向偏置(亦即,非導電),以防止閂鎖,如下文圖3中將進一步詳細論述。 2A, the selection circuit 200.1 ~ 200. M operably voltage signal V DDM_INT.1 ~ V DDM_INT. M is selectively supplied to the memory cell 210.1.1 ~ 210. M. N among the m One or more corresponding rows of the row. For example, the selection circuit 200.1 selectively provides the operable voltage signal V DDM_INT.1 to the first row of the memory cells 210.1.1 to 210.1. n , and the selection circuit 200. m will operate the voltage signal V DDM_INT. m is selectively provided to the m- th row of the memory cell 210. m. 1 to 210. m . n . Although not shown in FIG. 2A, each of the selection circuits 200.1 to 200. m can transmit an operable voltage signal The corresponding operable voltage signal among V DDM_INT.1 to V DDM_INT. m is selectively provided to more than one row among the m rows of memory cells 210.1.1 to 210. m . n. In an exemplary embodiment, the memory cell 210. m. 1 to 210. m . n may be implemented using one or more transistors, such as one or more p-type metal oxide semiconductor (PMOS) transistors. Crystal, one or more n-type metal-oxide-semiconductor (NMOS) transistors or any combination of PMOS transistors and NMOS transistors, without departing from the spirit and scope of this disclosure It will be obvious to those with ordinary knowledge in the relevant technical field. In this exemplary embodiment, the selection circuit 200.1 ~ 200. M may be operable voltage signal V DDM_INT.1 ~ V DDM_INT. M is selectively supplied to the memory cell 210.1.1 ~ 210. M. N of the m The base (B) terminal of the transistor in the corresponding row in the row. The operable voltage signal V DDM_INT.1 ~V DDM_INT. m is effective so that the parasitic diodes formed between the source (S) terminals of these transistors and the well region in this example are reverse biased (that is, non- Conductive) to prevent latch-up, as will be discussed in further detail in Figure 3 below.

圖2B示出可實施於根據本揭露的例示性實施例的例示性記憶體儲存系統內的第二例示性記憶體裝置的方塊圖。在圖2B中所示出的例示性實施例中,選擇電路220.1~220.n以與如上文圖1中所描述的選擇電路104.1~104.x實質上類似的方式來選擇性地提供可操作電壓信號VDDM_INT.1~VDDM_INT.n 以設置記憶體裝置222的操作。記憶體裝置222可表示如上文圖1中所描述的記憶體裝置106的例示性實施例。在例示性實施例中,選擇電路220.1~220.n從多個可操作電壓信號中選擇性地提供第一可操作電壓信號作為可操作電壓信號VDDM_INT.1~VDDM_INT.n ,以設置記憶體裝置222動態地控制(例如,最小化)記憶體裝置222的多個操作參數當中的一個或多個操作參數,諸如功率消耗及/或讀取/寫入速度。作為另一實例,選擇電路220.1~220.n從多個可操作電壓信號中選擇性 地提供第二可操作電壓信號,以設置記憶體裝置222動態地控制(例如,最大化)記憶體裝置222的一個或多個操作參數。 2B shows a block diagram of a second exemplary memory device that can be implemented in an exemplary memory storage system according to an exemplary embodiment of the present disclosure. In the exemplary embodiment shown in FIG. 2B, the selection circuits 220.1 to 220. n selectively provide operable in a manner substantially similar to the selection circuits 104.1 to 104. x described in FIG. 1 above. The voltage signals V DDM_INT.1 to V DDM_INT. n are used to set the operation of the memory device 222. The memory device 222 may represent an exemplary embodiment of the memory device 106 as described in FIG. 1 above. In an exemplary embodiment, the selection circuit 220.1 to 220. n selectively provides the first operable voltage signal as the operable voltage signal V DDM_INT.1 to V DDM_INT. n from the plurality of operable voltage signals to set the memory The body device 222 dynamically controls (eg, minimizes) one or more of the multiple operation parameters of the memory device 222, such as power consumption and/or read/write speed. As another example, the selection circuits 220.1 to 220. n selectively provide a second operable voltage signal from a plurality of operable voltage signals to set the memory device 222 to dynamically control (for example, maximize) the memory device 222 One or more operating parameters.

在圖2B中所示出的例示性實施例中,記憶體裝置222包含記憶體陣列224。儘管圖2B中未示出,記憶體裝置222可包含其他電子電路,諸如提供一些實例的感測放大器、列位址解碼器及/或行位址解碼器,在不脫離本揭露的精神及範疇的情況下,其將對相關技術領域中具通常知識者顯而易見。如圖2B中所示出,記憶體陣列224包含經設置及配置到m個行以及n個列的陣列中的記憶體單元226.1.1~226.m.n。然而,記憶體單元226.1.1~226.m.n的其他配置可能不背離本揭露的精神及範疇。在圖2B中所示出的例示性實施例中,記憶體單元226.1.1~226.m.n連接至字線212.1~字線212.n當中的對應字線(WL)及位元線214.1~位元線214.m當中的對應位元線(BL)。 In the exemplary embodiment shown in FIG. 2B, the memory device 222 includes a memory array 224. Although not shown in FIG. 2B, the memory device 222 may include other electronic circuits, such as a sense amplifier, a column address decoder, and/or a row address decoder to provide some examples, without departing from the spirit and scope of the present disclosure. In the case of, it will be obvious to those with ordinary knowledge in the relevant technical field. As shown in FIG. 2B, the memory array 224 includes memory cells 226.1. 1 to 226. m . n arranged and arranged in an array of m rows and n columns. However, other configurations of the memory unit 226.1.1 to 226. m . n may not deviate from the spirit and scope of this disclosure. In the exemplary embodiment shown in FIG. 2B, the memory cells 226.1.1 to 226. m . n are connected to the corresponding word line (WL) and bit line 214.1 among word lines 212.1 to 212. n ~ The corresponding bit line (BL) among the bit lines 214. m.

如圖2B中所示出,選擇電路220.1~220.m將可操作電壓信號VDDM_INT.1~VDDM_INT.n 選擇性地提供至記憶體單元226.1.1~226.m.n當中的n列的一個或多個對應列。舉例而言,選擇電路220.1將可操作電壓信號VDDM_INT.1選擇性地提供至第一列記憶體單元226.1.1~226.m.1,且選擇電路220.n將可操作電壓信號VDDM_INT.n 選擇性地提供至第n列記憶體單元226.1.n~226.m.n。儘管圖2B中未示出,選擇電路220.1~220.m中的每一者可將可操作電壓信號VDDM_INT.1~VDDM_INT.n 當中的其對應可操作電壓信號選擇性地提供至記憶體單元226.1.1~226.m.nn個列當中的大於一個列。在例示性實施例中,可使用一個或多個電晶體實施記憶體單元226.m.1~226.m.n,所述電晶體諸如一個或多個p型金屬氧化 物半導體(PMOS)電晶體、一個或多個n型金屬氧化物半導體(NMOS)電晶體或PMOS電晶體與NMOS電晶體的任何組合,在不脫離本揭露的精神及範疇的情況下,其將對相關技術領域中具通常知識者顯而易見。在此例示性實施例中,選擇電路220.1~220.n可將可操作電壓信號VDDM_INT.1~VDDM_INT.n 選擇性地提供至記憶體單元226.1.1~226.m.nm個行當中的其對應行內的電晶體的基極(B)端。可操作電壓信號VDDM_INT.1~VDDM_INT.n 有效使得,提供實例的形成於這些電晶體的源極(S)端與井區之間的寄生二極體反向偏置(亦即,非導電),以防止閂鎖這些電晶體,如下文圖3中將進一步詳細論述。 As shown in FIG. 2B, the selection circuit 220.1 ~ 220. m selectively provides the operable voltage signal V DDM_INT.1 ~ V DDM_INT. n to n rows among the memory cells 226.1.1 ~ 226. m . n One or more corresponding columns of. For example, the selection circuit operatively 220.1 V DDM_INT.1 voltage signal is selectively supplied to the first column of the memory unit 226.1.1 ~ 226.m.1, and the selection circuit 220. n the operable voltage signal V DDM_INT . n is selectively provided to the n-th row of memory cells 226.1. n ~226. m . n . Although not shown in FIG. 2B, each of the selection circuits 220.1 to 220. m can selectively provide its corresponding operable voltage signal among the operable voltage signals V DDM_INT.1 to V DDM_INT. n to the memory More than one column among the n columns of cells 226.1.1 to 226. m . n. In an exemplary embodiment, the memory cell 226. m. 1 to 226. m . n may be implemented using one or more transistors, such as one or more p-type metal oxide semiconductor (PMOS) transistors. Crystals, one or more n-type metal oxide semiconductor (NMOS) transistors, or any combination of PMOS transistors and NMOS transistors, without departing from the spirit and scope of this disclosure, will be useful in related technical fields. Usually the knowledgeable person is obvious. In this exemplary embodiment, the selection circuit 220.1 ~ 220. N may be operable voltage signal V DDM_INT.1 ~ V DDM_INT. N is selectively provided to the memory cell 226.1.1 ~ 226. M. N of the m The base (B) terminal of the transistor in the corresponding row in the row. The operable voltage signals V DDM_INT.1 to V DDM_INT. n are effective so that the parasitic diodes formed between the source (S) terminals of these transistors and the well region are reverse biased (that is, non- Conductive) to prevent latching of these transistors, as will be discussed in further detail in Figure 3 below.

可實施於例示性記憶體裝置內的例示性記憶體單元 An exemplary memory unit that can be implemented in an exemplary memory device

如上文圖1、圖2A以及圖2B中所描述,其中所描述的例示性記憶體裝置,諸如提供一些實例的如上文圖1中所描述的記憶體裝置106、如上文圖2A中所描述的記憶體裝置202及/或如上文圖2B中所描述的記憶體裝置222,包含記憶體單元陣列,所述記憶體單元諸如提供一些實例的如上文圖2A中所描述的記憶體單元210.1.1~210.m.n及/或如上文圖2B中所描述的記憶體單元226.1.1~226.m.n。以下圖3的論述描述這些記憶體單元的各種實施例。然而,在相關技術領域中具通常知識者將認識到,在不脫離本揭露的精神及範疇的情況下,下文將描述的這些記憶體單元的各種實施例的教示可易於修改以用於任何適合的揮發性記憶體單元,諸如任何隨機存取記憶體(RAM)單元,及/或任何適合的非揮發性記憶胞,諸如任何唯讀記憶體(ROM)單元。RAM單元可實施為動態隨機存取記憶體(dynamic random-access memory; DRAM)單元、靜態隨機存取記憶體(SRAM)單元及/或非揮發性隨機存取記憶體(non-volatile random-access memory;NVRAM)單元,諸如提供實例的快閃記憶胞。ROM單元可實施為提供一些實例的可程式化唯讀記憶體(programmable read-only memory;PROM)單元、單次可程式化ROM(one-time programmable ROM;OTP)單元、可擦除可程式化唯讀記憶體(erasable programmable read-only memory;EPROM)單元及/或電可擦除可程式化唯讀記憶體(electrically erasable programmable read-only memory;EEPROM)單元。 As described above in FIGS. 1, 2A, and 2B, the exemplary memory device described therein, such as the memory device 106 described in FIG. 1 above, as described in FIG. 2A above, which provides some examples The memory device 202 and/or the memory device 222 as described in FIG. 2B above include an array of memory cells such as the memory cell 210.1.1 described in FIG. 2A above to provide some examples. ~210. m . n and/or the memory unit 226.1. 1 ~ 226. m . n as described in Figure 2B above. The discussion of Figure 3 below describes various embodiments of these memory cells. However, those with ordinary knowledge in the relevant technical field will recognize that without departing from the spirit and scope of the present disclosure, the teachings of the various embodiments of these memory units described below can be easily modified for any suitable use. The volatile memory cell, such as any random access memory (RAM) cell, and/or any suitable non-volatile memory cell, such as any read-only memory (ROM) cell. The RAM unit can be implemented as a dynamic random-access memory (DRAM) unit, a static random-access memory (SRAM) unit, and/or a non-volatile random-access memory (non-volatile random-access memory) unit. memory; NVRAM) cells, such as flash memory cells to provide examples. The ROM unit can be implemented as a programmable read-only memory (PROM) unit, one-time programmable ROM (OTP) unit, erasable programmable ROM (OTP) unit providing some examples Erasable programmable read-only memory (EPROM) units and/or electrically erasable programmable read-only memory (EEPROM) units.

圖3示出可實施於根據本揭露的例示性實施例的例示性記憶體裝置內的例示性靜態隨機存取記憶體(SRAM)單元的方塊圖。在圖3中所示出的例示性實施例中,SRAM單元300可用於實施如上文圖1中所描述的記憶體裝置106的一個或多個記憶體單元、如上文圖2A中所描述的記憶體裝置202的記憶體單元210.1.1~210.m.n中的一個或多個及/或如上文圖2B中所描述的記憶體裝置222的記憶體單元226.1.1~226.m.n中的一個或多個。如圖3中所示出,SRAM單元300包含p型金屬氧化物半導體(PMOS)電晶體P1及p型金屬氧化物半導體電晶體P2以及n型金屬氧化物半導體(NMOS)電晶體N1~N4。 FIG. 3 shows a block diagram of an exemplary static random access memory (SRAM) cell that can be implemented in an exemplary memory device according to an exemplary embodiment of the present disclosure. In the exemplary embodiment shown in FIG. 3, the SRAM cell 300 may be used to implement one or more memory cells of the memory device 106 as described in FIG. 1 above, and the memory as described in FIG. 2A above. memory device body unit 202 210.1.1 ~ 210. m. n or a plurality and / or the memory described above in FIG. 2B apparatus described memory cell 222 226.1.1 ~ 226. m. n One or more of. As shown in FIG. 3, the SRAM cell 300 includes p-type metal oxide semiconductor (PMOS) transistors P1 and p-type metal oxide semiconductor transistors P2, and n-type metal oxide semiconductor (NMOS) transistors N1 to N4.

在圖3中所示出的例示性實施例中,PMOS電晶體P1及NMOS電晶體N1經配置以形成第一邏輯反相器(INVERTER)閘極,且PMOS電晶體P2及NMOS電晶體N2經配置以形成第二邏輯反相器閘極。第一邏輯反相器閘極如圖3中所示出與第二邏輯反相器閘極交叉耦接。舉例而言,第一邏輯反相器閘極的輸入耦 接至第二邏輯反相器閘極的輸出,且第一邏輯反相器閘極的輸出耦接至第二邏輯反相器閘極的輸入。在此交叉耦接設置中,第一邏輯反相器及第二邏輯反相器在功能上協作以強化儲存於SRAM單元300中的資訊。 In the exemplary embodiment shown in FIG. 3, the PMOS transistor P1 and the NMOS transistor N1 are configured to form a first logic inverter (INVERTER) gate, and the PMOS transistor P2 and the NMOS transistor N2 are It is configured to form a second logic inverter gate. The gate of the first logic inverter is cross-coupled with the gate of the second logic inverter as shown in FIG. 3. For example, the input coupling of the gate of the first logic inverter The output of the gate of the second logic inverter is connected, and the output of the gate of the first logic inverter is coupled to the input of the gate of the second logic inverter. In this cross-coupling configuration, the first logical inverter and the second logical inverter cooperate in function to enhance the information stored in the SRAM cell 300.

在圖3中所示出的例示性實施例中,儲存於第一邏輯反相器閘極及第二邏輯反相器閘極內的資訊在邏輯0(logical zero)與邏輯1(logical one)之間循環地轉化,諸如可操作電壓信號VDDM_INT。在例示性實施例中,可操作電壓信號VDDM_INT表示如上文圖1中所描述的可操作電壓信號VDDM_INT.1~VDDM_INT.x 中的一者、如上文圖2A中所描述的可操作電壓信號VDDM_INT.1~VDDM_INT.m 中的一者及/或如上文圖2B中所描述的可操作電壓信號VDDM_INT.1~VDDM_INT.n 中的一者的例示性實施例。在另一例示性實施例中,第一邏輯反相器及第二邏輯反相器從選擇電路接收可操作電壓信號VDDM_INT,所述選擇電路諸如提供一些實例的如上文圖1中所描述的選擇電路104.1~104.x中的一者、如上文圖2A中所描述的選擇電路200.1~200.m中的一者及/或如上文圖2B中所描述的選擇電路220.1~220.n中的一者。 In the exemplary embodiment shown in FIG. 3, the information stored in the gate of the first logic inverter and the gate of the second logic inverter is at a logic 0 (logical zero) and a logic 1 (logical one). Cyclically convert between, such as the operable voltage signal V DDM_INT. Operable embodiment, the voltage signal V DDM_INT operable operable voltage signals represented in FIG. 1 described above the V DDM_INT.1 ~ V DDM_INT exemplary embodiment in. X of one, as described above in FIG 2A An exemplary embodiment of one of the voltage signals V DDM_INT.1 to V DDM_INT. m and/or one of the operable voltage signals V DDM_INT.1 to V DDM_INT. n as described in FIG. 2B above. In another exemplary embodiment, the first logic inverter and the second logic inverter receive the operable voltage signal V DDM_INT from a selection circuit such as the one described in FIG. 1 above to provide some examples the selection circuit 104.1 ~ 104. x of one, as described above in FIG selection circuit 2A described in 200.1 ~ 200. m of one and / or the above FIG selection circuit 2B described in 220.1 ~ 220. n in One of them.

在「讀取」操作期間,NMOS電晶體N3及NMOS電晶體N4藉由確證字線(WL)350而啟動。NMOS電晶體N3及NMOS電晶體N4的此啟動將第一邏輯反相器及第二邏輯反相器耦接至位元線(BL)352。在例示性實施例中,字線350可表示如上文圖2A及圖2B中所描述的字線212.1~字線212.n中的一者,且位元線352可表示如上文圖2A及圖2B中所描述的位元線214.1~位元線214.m中的一者。其後,儲存於第一邏輯反相器及第二邏輯反 相器內的資傳遞至位元線(BL)352上。類似地,在「寫入」操作期間,NMOS電晶體N3及NMOS電晶體N4藉由確證字線350而啟動,以將第一邏輯反相器及第二邏輯反相器耦接至位元線352。其後,將位元線352的狀態傳遞至第一邏輯反相器及第二邏輯反相器上,以儲存為第一邏輯反相器及第二邏輯反相器內的資訊。 During the " read " operation, NMOS transistor N3 and NMOS transistor N4 are activated by verifying word line (WL) 350. This activation of NMOS transistor N3 and NMOS transistor N4 couples the first logic inverter and the second logic inverter to the bit line (BL) 352. In an exemplary embodiment, the word line 350 may represent one of the word lines 212.1 to 212. n as described in FIGS. 2A and 2B above, and the bit line 352 may represent one of the word lines 212.1 to 212. n as described in FIGS. 2A and 2B above. One of the bit line 214.1 to the bit line 214. m described in 2B. Thereafter, the data stored in the first logic inverter and the second logic inverter are transferred to the bit line (BL) 352. Similarly, during the " write " operation, the NMOS transistor N3 and the NMOS transistor N4 are activated by verifying the word line 350 to couple the first logic inverter and the second logic inverter to the bit line 352. After that, the state of the bit line 352 is transferred to the first logic inverter and the second logic inverter to be stored as information in the first logic inverter and the second logic inverter.

此外,如圖3中所示出,可操作電壓信號VDDM_INT耦接至PMOS電晶體P1的第一基極(B)端及PMOS電晶體P2的第二基極(B)端。在圖3中所示出的例示性實施例中,PMOS電晶體P1位於p型半導體基底內的第一n型井區內,且PMOS電晶體P2位於p型半導體基底內的第二n型井區內。在此例示性實施例中,可操作電壓信號VDDM_INT將電荷從PMOS電晶體P1的基極(B)端及PMOS電晶體P2的基極(B)端分別轉移至第一n型井區及第二n型井區。 In addition, as shown in FIG. 3, the operable voltage signal V DDM_INT is coupled to the first base (B) terminal of the PMOS transistor P1 and the second base (B) terminal of the PMOS transistor P2. In the exemplary embodiment shown in FIG. 3, the PMOS transistor P1 is located in the first n-type well in the p-type semiconductor substrate, and the PMOS transistor P2 is located in the second n-type well in the p-type semiconductor substrate. Area. In this exemplary embodiment, the operable voltage signal V DDM_INT transfers the charge from the base (B) end of the PMOS transistor P1 and the base (B) end of the PMOS transistor P2 to the first n-type well region and The second n-type well area.

例示性記憶體儲存系統內的例示性選擇電路 An exemplary selection circuit in an exemplary memory storage system

如上文圖1中所描述,選擇電路104.1~104.x選擇性地提供可操作電壓信號V1~V m 中的一者作為可操作電壓信號VDDM_INT.1~VDDM_INT.x ,以控制記憶體裝置106的一個或多個操作參數。以下圖4的論述描述選擇電路104.1~104.x中的一者的例示性實施例。 As described in Figure 1 above, the selection circuit 104.1~104. x selectively provides one of the operable voltage signals V 1 ~V m as the operable voltage signal V DDM_INT.1 ~V DDM_INT. x to control the memory One or more operating parameters of the body device 106. The following discussion of FIG. 4 describes an exemplary embodiment of one of the selection circuits 104.1 to 104. x.

圖4示出可實施於根據本揭露的例示性實施例的例示性記憶體裝置內的例示性選擇電路的方塊圖。在圖4中所示出的例示性實施例中,選擇電路400從可操作電壓信號VDD及可操作電壓信號VDDM中選擇性地提供可操作電壓信號VDDM_INT,以控制記 憶體裝置的一個或多個操作參數,所述記憶體裝置諸如提供實例的記憶體裝置106。在例示性實施例中,可操作電壓信號VDDM及可操作電壓信號VDD可表示如上文圖1中所描述的可操作電壓信號V1~V m 中的兩者的例示性實施例。在另一例示性實施例中,可操作電壓信號VDD對應於分配至以通信方式耦接至記憶體裝置的其他數位電路的可操作電壓信號,且可操作電壓信號VDDM對應於分配至記憶體裝置的可操作電壓信號。在一些情況下,可操作電壓信號VDD大於可操作電壓信號VDDM;然而,在其他情況下,可操作電壓信號VDD可小於可操作電壓信號VDDM。在圖4中所示出的例示性實施例中,選擇電路400選擇可操作電壓信號VDDM及可操作電壓信號VDD中的更大者作為可操作電壓信號VDDM_INT,以將記憶體裝置106的如上文圖2A中所描述的對應行記憶體單元及/或如上文圖2B中所描述的對應列記憶體單元的讀取/寫入速度最大化。否則,選擇電路400選擇可操作電壓信號VDDM及可操作電壓信號VDD中的更小者作為可操作電壓信號VDDM_INT,以將記憶體裝置106的對應行記憶體單元及/或對應列記憶體單元的功率消耗最小化。 FIG. 4 shows a block diagram of an exemplary selection circuit that may be implemented in an exemplary memory device according to an exemplary embodiment of the present disclosure. In the exemplary embodiment shown in FIG. 4, the selection circuit 400 selectively provides the operable voltage signal V DDM_INT from the operable voltage signal V DD and the operable voltage signal V DDM to control one of the memory devices Or a plurality of operating parameters, the memory device such as the memory device 106 to provide examples. In an exemplary embodiment, the operable voltage signal V DDM and the operable voltage signal V DD may represent exemplary embodiments of both of the operable voltage signals V 1 ˜V m as described in FIG. 1 above. In another exemplary embodiment, the operable voltage signal V DD corresponds to the operable voltage signal allocated to other digital circuits that are communicatively coupled to the memory device, and the operable voltage signal V DDM corresponds to the operable voltage signal allocated to the memory device. The operable voltage signal of the body device. In some cases, the operable voltage signal V DD is greater than the operable voltage signal V DDM ; however, in other cases, the operable voltage signal V DD may be less than the operable voltage signal V DDM . In the exemplary embodiment shown in FIG. 4, the selection circuit 400 selects the larger of the operable voltage signal V DDM and the operable voltage signal V DD as the operable voltage signal V DDM_INT to connect the memory device 106 The read/write speed of the corresponding row of memory cells as described in FIG. 2A above and/or the corresponding column of memory cells as described in FIG. 2B above is maximized. Otherwise, the selection circuit 400 selects the smaller of the operable voltage signal V DDM and the operable voltage signal V DD as the operable voltage signal V DDM_INT to store the corresponding row memory cell and/or the corresponding column of the memory device 106 The power consumption of the body unit is minimized.

此外,如下文將進一步詳細論述,選擇電路400包含多個開關以選擇性地提供可操作電壓信號VDD或可操作電壓信號VDDM作為可操作電壓信號VDDM_INT。且如下文將進一步詳細論述,選擇電路400將最大可操作電壓信號VDDMAX提供至多個開關的電晶體的基極(B)端,以使得形成於這些電晶體的源極(S)端與井區之間的寄生二極體反向偏置(亦即,非導電),以防止閂鎖這些電晶體。在一些情況下,最大可操作電壓信號VDDMAX可例 如反應於電晶體的井區與半導體基底之間的不想要的電磁耦接及/或漏電而波動。在這些情況下,選擇電路400可動態地調節最大可操作電壓信號VDDMAX,以補償最大可操作電壓信號VDDMAX的這些波動,如下文將進一步詳細論述。在圖4中所示出的例示性實施例中,選擇電路400包含開關電路402及閂鎖預防電路404。 In addition, as will be discussed in further detail below, the selection circuit 400 includes a plurality of switches to selectively provide the operable voltage signal V DD or the operable voltage signal V DDM as the operable voltage signal V DDM_INT . And as will be discussed in further detail below, the selection circuit 400 provides the maximum operable voltage signal V DDMAX to the base (B) terminals of the transistors of the plurality of switches, so that the source (S) terminals and wells of the transistors are formed The parasitic diodes between the regions are reverse biased (ie, non-conductive) to prevent latch-up of these transistors. In some cases, the maximum operable voltage signal V DDMAX may fluctuate, for example, in response to unwanted electromagnetic coupling and/or leakage between the well region of the transistor and the semiconductor substrate. In these cases, the selection circuit 400 can dynamically adjust the maximum operable voltage signal V DDMAX to compensate for these fluctuations of the maximum operable voltage signal V DDMAX , as will be discussed in further detail below. In the exemplary embodiment shown in FIG. 4, the selection circuit 400 includes a switch circuit 402 and a latch-up prevention circuit 404.

在圖4中所示出的例示性實施例中,開關電路402從可操作電壓信號VDD及可操作電壓信號VDDM中選擇性地提供可操作電壓信號VDDM_INT,以控制記憶體裝置的一個或多個操作參數。如圖4中所示出,開關電路402包含p型金屬氧化物半導體(PMOS)電晶體P4及p型金屬氧化物半導體電晶體P5。如圖4中所示出,PMOS電晶體P4及PMOS電晶體P5選擇性地提供其對應可操作電壓信號VDDM及可操作電壓信號VDD作為可操作電壓信號VDDM_INT。在例示性實施例中,偏壓控制信號452及偏壓控制信號452在處於第一邏輯準位(諸如提供實例的邏輯0)時啟動(亦即,閉合)PMOS電晶體P4及PMOS電晶體P5中的第一電晶體,及/或在處於第二邏輯準位(諸如提供實例的邏輯1)時阻斷(亦即開路)PMOS電晶體P4及PMOS電晶體P5中的第二電晶體。在此例示性實施例中,偏壓控制信號452及偏壓控制信號452表示差分偏壓控制信號,其中偏壓控制信號452為偏壓控制信號452的補充。在此例示性實施例中,PMOS電晶體P4及PMOS電晶體P5在啟動時選擇性地提供其對應可操作電壓信號VDDM及可操作電壓信號VDD作為可操作電壓信號VDDM_INT。並且,在此例示性實施例中,在阻斷時選擇性地禁止PMOS電晶體P4及PMOS電晶體P5提供其對應可操作電壓信號VDDM及可操作電壓信號VDD。 此外,如圖4中所示出的PMOS電晶體P4及PMOS電晶體P5可實施為具有源極(S)端、汲極(drain;D)端、閘極(gate;G)端以及基極(B)端。如圖4中所示出,源極(S)端、汲極(D)端、基極(B)端形成於半導體基底的井區內。在圖4中所示出的例示性實施例中,開關電路402可將最大可操作電壓信號VDDMAX提供至PMOS電晶體P4及PMOS電晶體P5的基極(B)端,以使得形成於PMOS電晶體P4及PMOS電晶體P5的源極(S)端與n型井區之間的寄生二極體反向偏置(亦即,非導電),以防止閂鎖PMOS電晶體P4及PMOS電晶體P5。 In the exemplary embodiment shown in FIG. 4, the switch circuit 402 selectively provides the operable voltage signal V DDM_INT from the operable voltage signal V DD and the operable voltage signal V DDM to control one of the memory devices Or multiple operating parameters. As shown in FIG. 4, the switch circuit 402 includes a p-type metal oxide semiconductor (PMOS) transistor P4 and a p-type metal oxide semiconductor (PMOS) transistor P5. As shown in FIG. 4, the PMOS transistor P4 and the PMOS transistor P5 selectively provide their corresponding operable voltage signal V DDM and the operable voltage signal V DD as the operable voltage signal V DDM_INT . In an exemplary embodiment, the bias control signal 452 and the bias control signal 452 activate (ie, close) the PMOS transistor P4 and the PMOS transistor P5 when they are at the first logic level (such as the logic 0 provided in the example). The first transistor in the PMOS transistor and/or the second transistor in the PMOS transistor P4 and PMOS transistor P5 when it is at a second logic level (such as the logic 1 provided in the example). In this exemplary embodiment, the bias control signal 452 and the bias control signal 452 represent differential bias control signals, where the bias control signal 452 is a supplement to the bias control signal 452. In this exemplary embodiment, the PMOS transistor P4 and the PMOS transistor P5 selectively provide their corresponding operable voltage signal V DDM and the operable voltage signal V DD as the operable voltage signal V DDM_INT when activated . Moreover, in this exemplary embodiment, PMOS transistor P4 and PMOS transistor P5 are selectively prohibited from providing their corresponding operable voltage signal V DDM and operable voltage signal V DD when blocking. In addition, the PMOS transistor P4 and PMOS transistor P5 as shown in FIG. 4 can be implemented to have a source (S) terminal, a drain (drain; D) terminal, a gate (gate; G) terminal, and a base. (B) End. As shown in FIG. 4, the source (S) terminal, the drain (D) terminal, and the base (B) terminal are formed in the well region of the semiconductor substrate. In the exemplary embodiment shown in FIG. 4, the switch circuit 402 can provide the maximum operable voltage signal V DDMAX to the base (B) end of the PMOS transistor P4 and the PMOS transistor P5, so as to be formed in the PMOS The parasitic diode between the source (S) end of the transistor P4 and the PMOS transistor P5 and the n-well region is reverse biased (that is, non-conductive) to prevent latching of the PMOS transistor P4 and PMOS transistor Crystal P5.

在圖4中所示出的例示性實施例中,閂鎖預防電路404可動態地調節最大可操作電壓信號VDDMAX,以補償最大可操作電壓信號VDDMAX的波動。這些波動可由各種電晶體的各種區域之間的不需要的電磁耦接及/或漏電造成。如圖4中所示出,閂鎖預防電路404包含p型金屬氧化物半導體(PMOS)電晶體P6及p型金屬氧化物半導體電晶體P7。在圖4中所示出的例示性實施例中,PMOS電晶體P6及PMOS電晶體P7表示二極體連接電晶體,其使其對應源極(S)端耦接至其對應閘極(G)端。在操作期間,最大可操作電壓信號VDDMAX通常大於或等於可操作電壓信號VDDM及可操作電壓信號VDD。然而,在一些情況下,最大可操作電壓信號VDDMAX的波動可使得最大可操作電壓信號VDDMAX小於可操作電壓信號VDDM及可操作電壓信號VDD。在圖4中所示出的例示性實施例中,PMOS電晶體P4、P5的特徵在於電晶體P4、P5的臨限電壓大於PMOS電晶體P6、P7的臨限電壓。例如,PMOS晶體管P4和P5具有約0.7伏的臨限電壓,並且PMOS晶體管P6 和P7具有約0.2伏的臨限電壓。當這些波動導致最大可操作電壓信號VDDMAX小於可操作電壓信號VDDM及可操作電壓信號VDD時,PMOS電晶體P4、P5的臨限電壓與PMOS電晶體P6、P7的臨限電壓之間的差異使PMOS電晶體P6、P7啟動。在這些情況下,當最大可操作電壓信號VDDMAX小於可操作電壓信號VDDM及可操作電壓信號VDD時,PMOS電晶體P6及PMOS電晶體P7藉由其對應臨限電壓啟動(亦即,閉合)。PMOS電晶體P6在啟動時從可操作電壓信號VDD獲得電流IDD,以調節(亦即,增加)最大可操作電壓信號VDDMAX。類似地,PMOS電晶體P7在啟動時從可操作電壓信號VDDM獲得電流IDDM,以調節(亦即,增加)最大可操作電壓信號VDDMAX。藉由閂鎖預防電路404的最大可操作電壓信號VDDMAX的此調節確保最大可操作電壓信號VDDMAX足以防止閂鎖電晶體P5~P7。 In the exemplary embodiment shown in FIG. 4, the latch-up prevention circuit 404 can dynamically adjust the maximum operable voltage signal V DDMAX to compensate for fluctuations in the maximum operable voltage signal V DDMAX. These fluctuations can be caused by unwanted electromagnetic coupling and/or leakage between various regions of various transistors. As shown in FIG. 4, the latch-up prevention circuit 404 includes a p-type metal oxide semiconductor (PMOS) transistor P6 and a p-type metal oxide semiconductor (PMOS) transistor P7. In the exemplary embodiment shown in FIG. 4, PMOS transistor P6 and PMOS transistor P7 represent diode-connected transistors, which have their corresponding source (S) terminals coupled to their corresponding gates (G )end. During operation, the maximum operable voltage signal V DDMAX is usually greater than or equal to the operable voltage signal V DDM and the operable voltage signal V DD . However, in some cases, the maximum operable voltage fluctuation signal V DDMAX may be operable such that the maximum signal voltage V DDMAX operable voltage signal is less than the operable voltage signal V DDM and V DD. In the exemplary embodiment shown in FIG. 4, the PMOS transistors P4 and P5 are characterized in that the threshold voltages of the transistors P4 and P5 are greater than the threshold voltages of the PMOS transistors P6 and P7. For example, the PMOS transistors P4 and P5 have a threshold voltage of about 0.7 volts, and the PMOS transistors P6 and P7 have a threshold voltage of about 0.2 volts. When these fluctuations cause the maximum operable voltage signal V DDMAX to be less than the operable voltage signal V DDM and the operable voltage signal V DD , the threshold voltages of PMOS transistors P4 and P5 are between the threshold voltages of PMOS transistors P6 and P7 The difference causes the PMOS transistors P6 and P7 to start. Under these conditions, when the maximum operable voltage signal V DDMAX is less than the operable voltage signal V DDM and the operable voltage signal V DD , PMOS transistor P6 and PMOS transistor P7 are activated by their corresponding threshold voltages (that is, closure). The PMOS transistor P6 obtains the current I DD from the operable voltage signal V DD at startup to adjust (ie, increase) the maximum operable voltage signal V DDMAX . Similarly, the PMOS transistor P7 obtains the current I DDM from the operable voltage signal V DDM at startup to adjust (ie, increase) the maximum operable voltage signal V DDMAX . This adjustment of the maximum operable voltage signal V DDMAX of the latch-up prevention circuit 404 ensures that the maximum operable voltage signal V DDMAX is sufficient to prevent the transistors P5 to P7 from latching up.

例示性記憶體儲存系統的例示性操作 Exemplary operation of an exemplary memory storage system

圖5示出根據本揭露的例示性實施例的例示性記憶體儲存系統的例示性操作的流程圖。本揭露不限於此操作描述。實情為,相關技術領域中具通常知識者顯而易見的是,其他可操作控制流程在本揭露的範疇及精神內。以下論述描述記憶體儲存系統的例示性可操作流程500,諸如提供實例的記憶體儲存系統100或記憶體儲存系統500。 FIG. 5 shows a flowchart of an exemplary operation of an exemplary memory storage system according to an exemplary embodiment of the present disclosure. This disclosure is not limited to this operation description. As a matter of fact, it is obvious to a person with ordinary knowledge in the relevant technical field that other operable control processes are within the scope and spirit of this disclosure. The following discussion describes an exemplary operational process 500 of a memory storage system, such as the memory storage system 100 or the memory storage system 500 that provide examples.

在操作502處,例示性可操作流程500從多個可操作電壓信號中選擇最大可操作電壓信號。在例示性實施例中,操作502可藉由如上文圖1中所描述的電壓產生器電路102來執行。 At operation 502, the exemplary operable process 500 selects a maximum operable voltage signal from a plurality of operable voltage signals. In an exemplary embodiment, operation 502 may be performed by the voltage generator circuit 102 as described in FIG. 1 above.

在操作504處,例示性可操作流程500將諸如如上文所 描述的最大可操作電壓信號VDDMAX的最大可操作電壓信號施加於記憶體儲存系統的至少一個電晶體的至少一個基極(B)端,所述記憶體儲存系統諸如如上文圖4中所描述的PMOS電晶體P4、PMOS電晶體P5、PMOS電晶體P6以及PMOS電晶體P7,及/或施加於記憶體儲存系統的至少一個電晶體的至少一個閘極(G)端,所述記憶體儲存系統諸如如上文圖4中所描述的PMOS電晶體P6及PMOS電晶體P7。在例示性實施例中,操作504可藉由如上文圖1中所描述的選擇電路104.1~104.x、如上文圖2A中所描述的選擇電路200.1~200.m、如上文圖2B中所描述的選擇電路220.1~200.n及/或如上文圖4中所描述的選擇電路400來執行。 At operation 504, the exemplary operable process 500 applies a maximum operable voltage signal, such as the maximum operable voltage signal V DDMAX as described above, to at least one base of at least one transistor of the memory storage system (B) At the end, the memory storage system, such as the PMOS transistor P4, PMOS transistor P5, PMOS transistor P6, and PMOS transistor P7 as described in FIG. 4 above, and/or at least one circuit applied to the memory storage system At least one gate (G) terminal of the crystal, the memory storage system such as PMOS transistor P6 and PMOS transistor P7 as described in FIG. 4 above. In an exemplary embodiment, operation 504 may be performed by selecting circuits 104.1 to 104. x as described in FIG. 1 above, selecting circuits 200.1 to 200.m as described in FIG. 2A above, as described in FIG. 2B above The described selection circuits 220.1 to 200. n and/or the selection circuit 400 described above in FIG. 4 are executed.

在操作506處,當最大可操作電壓信號在來自多個可操作電壓信號的第一可操作電壓信號下方波動時,例示性可操作流程500調節(例如,增加)最大可操作電壓信號。在例示性實施例中,操作504可藉由如上文圖1中所描述的選擇電路104.1~104.x、如上文圖2A中所描述的選擇電路200.1~200.m、如上文圖2B中所描述的選擇電路220.1~200.n及/或如上文圖4中所描述的選擇電路400來執行。在一些情況下,最大可操作電壓信號可波動。這些波動可由記憶體儲存系統的各種電晶體的各種區域之間的不想要的電磁耦接及/或漏電造成。例示性可操作流程500可使得自第一可操作電壓信號獲得電流,以當最大可操作電壓信號在第一可操作電壓信號下方波動時增加最大可操作電壓信號。 At operation 506, when the maximum operable voltage signal fluctuates below the first operable voltage signal from the plurality of operable voltage signals, the exemplary operable process 500 adjusts (eg, increases) the maximum operable voltage signal. In an exemplary embodiment, operation 504 may be performed by selecting circuits 104.1 to 104. x as described in FIG. 1 above, selecting circuits 200.1 to 200.m as described in FIG. 2A above, as described in FIG. 2B above The described selection circuits 220.1 to 200. n and/or the selection circuit 400 described above in FIG. 4 are executed. In some cases, the maximum operable voltage signal may fluctuate. These fluctuations can be caused by unwanted electromagnetic coupling and/or leakage between various regions of various transistors of the memory storage system. The exemplary operable process 500 can obtain a current from the first operable voltage signal to increase the maximum operable voltage signal when the maximum operable voltage signal fluctuates below the first operable voltage signal.

結論 in conclusion

前述具體實施方式揭露將可操作電壓信號選擇性地提供 至記憶體儲存系統的選擇電路。選擇電路包括開關電路及閂鎖預防電路。具有多個電晶體的開關電路從可操作電壓信號中選擇可操作電壓信號。將可操作電壓信號當中的最大可操作電壓信號選擇性地施加於電晶體的基極端。閂鎖預防電路動態地調節最大可操作電壓信號,以補償最大可操作電壓信號的波動。 The foregoing specific embodiments disclose that the operable voltage signal is selectively provided The selection circuit to the memory storage system. The selection circuit includes a switch circuit and a latch prevention circuit. The switch circuit with a plurality of transistors selects an operable voltage signal from the operable voltage signal. The maximum operable voltage signal among the operable voltage signals is selectively applied to the base terminal of the transistor. The latch-up prevention circuit dynamically adjusts the maximum operable voltage signal to compensate for fluctuations in the maximum operable voltage signal.

在前述具體實施方式中,所述多個電晶體包括第一電晶體以及第二電晶體。第一電晶體經設置以從所述多個可操作電壓信號中選擇性地提供第一可操作電壓信號。第二電晶體經設置以從所述多個可操作電壓信號中選擇性地提供第二可操作電壓信號。最大可操作電壓信號選擇性地施加於所述第一電晶體的第一基極端及所述第二電晶體的第二基極端。 In the foregoing specific embodiments, the plurality of transistors include a first transistor and a second transistor. The first transistor is configured to selectively provide a first operable voltage signal from the plurality of operable voltage signals. The second transistor is configured to selectively provide a second operable voltage signal from the plurality of operable voltage signals. The maximum operable voltage signal is selectively applied to the first base terminal of the first transistor and the second base terminal of the second transistor.

在前述具體實施方式中,第一電晶體及所述第二電晶體包括p型金屬氧化物半導體(PMOS)電晶體。 In the foregoing specific embodiments, the first transistor and the second transistor include p-type metal oxide semiconductor (PMOS) transistors.

在前述具體實施方式中,第一電晶體經設置以反應於偏壓控制信號處於第一邏輯準位而選擇性地提供所述第一可操作電壓信號。第二電晶體經設置以反應於所述偏壓控制信號處於第二邏輯準位而選擇性地提供所述第二可操作電壓信號,所述第二邏輯準位不同於所述第一邏輯準位。 In the foregoing specific embodiments, the first transistor is configured to selectively provide the first operable voltage signal in response to the bias control signal being at the first logic level. The second transistor is configured to selectively provide the second operable voltage signal in response to the bias control signal being at a second logic level, the second logic level being different from the first logic level Bit.

在前述具體實施方式中,閂鎖預防電路包括第一二極體連接電晶體及第二二極體連接電晶體。第一二極體連接電晶體及所述第二二極體連接電晶體分別耦接至所述多個可操作電壓信號當中的第一可操作電壓信號及第二可操作電壓信號。第一二極體連接電晶體經設置以在啟動時設置自所述第一可操作電壓信號獲得第一電流,以調節所述最大可操作電壓信號,以補償所述最大 可操作電壓信號的所述波動。所述第二二極體連接電晶體經設置以在啟動時設置自所述第二可操作電壓信號獲得第二電流,以調節所述最大可操作電壓信號,以補償所述最大可操作電壓信號的所述波動。 In the foregoing specific embodiments, the latch-up prevention circuit includes a first diode connected to the transistor and a second diode connected to the transistor. The first diode-connected transistor and the second diode-connected transistor are respectively coupled to a first operable voltage signal and a second operable voltage signal among the plurality of operable voltage signals. The first diode connected to the transistor is set to obtain a first current from the first operable voltage signal when it is activated, so as to adjust the maximum operable voltage signal to compensate for the maximum The fluctuation of the voltage signal can be manipulated. The second diode connected to the transistor is configured to obtain a second current from the second operable voltage signal at startup to adjust the maximum operable voltage signal to compensate for the maximum operable voltage signal The fluctuations.

在前述具體實施方式中,所述第一電晶體的第一臨限電壓以及所述第二電晶體的第二臨限電壓大於所述第一二極體連接電晶體的第三臨限電壓以及所述第二二極體連接電晶體的第四臨限電壓。 In the foregoing specific embodiments, the first threshold voltage of the first transistor and the second threshold voltage of the second transistor are greater than the third threshold voltage of the first diode connected to the transistor and The second diode is connected to the fourth threshold voltage of the transistor.

在前述具體實施方式中,當所述最大可操作電壓信號小於所述第一可操作電壓信號時,所述第一二極體連接電晶體經設置以藉由所述第一二極體連接電晶體的所述第三臨限電壓啟動。當所述最大可操作電壓信號小於所述第二可操作電壓信號時,所述第二二極體連接電晶體經設置以藉由所述第二二極體連接電晶體的所述第四臨限電壓啟動。 In the foregoing specific embodiment, when the maximum operable voltage signal is less than the first operable voltage signal, the first diode connection transistor is configured to connect to the electricity through the first diode. The third threshold voltage of the crystal is activated. When the maximum operable voltage signal is less than the second operable voltage signal, the second diode connected to the transistor is configured to connect to the fourth terminal of the transistor through the second diode. Limit voltage start.

前述具體實施方式亦揭露用於記憶體儲存系統的選擇電路。選擇電路包含開關電路及閂鎖預防電路。具有多個電晶體的開關電路將從多個可操作電壓信號中選擇的可操作電壓信號提供至記憶體儲存系統。具有第一二極體連接電晶體及第二二極體連接電晶體的閂鎖預防電路將從多個可操作電壓信號中選擇的最大可操作電壓信號施加於第一二極體連接電晶體的第一基極端及第二二極體連接電晶體的第二基極端。第一二極體連接電晶體及第二二極體連接電晶體分別耦接至多個可操作電壓信號中的第二可操作電壓信號及第三可操作電壓信號。第一二極體連接電晶體在啟動時從第二可操作電壓信號獲得第一電流,以調節第二可操作 電壓信號,從而補償最大可操作電壓信號的波動。第二二極體連接電晶體在啟動時從第三可操作電壓信號獲得第二電流,以調節第二可操作電壓信號,從而補償最大可操作電壓信號的波動。 The foregoing specific embodiments also disclose a selection circuit used in a memory storage system. The selection circuit includes a switch circuit and a latch prevention circuit. The switch circuit with a plurality of transistors provides an operable voltage signal selected from the plurality of operable voltage signals to the memory storage system. A latch-up prevention circuit having a first diode connected transistor and a second diode connected transistor applies a maximum operable voltage signal selected from a plurality of operable voltage signals to the first diode connected transistor The first base terminal and the second diode are connected to the second base terminal of the transistor. The first diode-connected transistor and the second diode-connected transistor are respectively coupled to the second operable voltage signal and the third operable voltage signal among the plurality of operable voltage signals. The first diode is connected to the transistor to obtain the first current from the second operable voltage signal when it is activated to adjust the second operable Voltage signal to compensate for fluctuations in the maximum operable voltage signal. The second diode-connected transistor obtains the second current from the third operable voltage signal when it is started, so as to adjust the second operable voltage signal, thereby compensating for the fluctuation of the maximum operable voltage signal.

在前述具體實施方式中,閂鎖預防電路進一步經設置以將所述最大可操作電壓信號施加於所述多個電晶體當中的至少一個電晶體的至少一個基極端。 In the foregoing specific embodiment, the latch-up prevention circuit is further configured to apply the maximum operable voltage signal to at least one base terminal of at least one transistor among the plurality of transistors.

在前述具體實施方式中,第二可操作電壓信號經設置以反向偏置位於所述至少一個電晶體的源極端與所述至少一個電晶體的井區之間的寄生二極體。 In the foregoing specific embodiment, the second operable voltage signal is configured to reverse bias the parasitic diode located between the source terminal of the at least one transistor and the well region of the at least one transistor.

在前述具體實施方式中,至少一個電晶體包括p型金屬氧化物半導體(PMOS)電晶體。最大可操作電壓信號經設置以反向偏置位於所述至少一個電晶體的所述源極端與所述至少一個電晶體的n型井區之間的所述寄生二極體。 In the foregoing specific embodiments, the at least one transistor includes a p-type metal oxide semiconductor (PMOS) transistor. The maximum operable voltage signal is configured to reverse bias the parasitic diode located between the source terminal of the at least one transistor and the n-type well region of the at least one transistor.

前述具體實施方式中,第一二極體連接電晶體及所述第二二極體連接電晶體包括二極體連接p型金屬氧化物半導體(PMOS)電晶體。 In the foregoing specific embodiments, the first diode-connected transistor and the second diode-connected transistor include a diode-connected p-type metal oxide semiconductor (PMOS) transistor.

在前述具體實施方式中,關電路經設置以從所述多個可操作電壓信號中選擇性地提供所述最大可操作電壓信號作為所述可操作電壓信號,以將所述記憶體儲存系統的讀取/寫入速度最大化,或從所述多個可操作電壓信號中選擇性地提供最小可操作電壓信號作為所述可操作電壓信號,以將所述記憶體儲存系統的功率消耗最小化。 In the foregoing specific embodiment, the shutdown circuit is configured to selectively provide the maximum operable voltage signal as the operable voltage signal from the plurality of operable voltage signals, so as to reduce the power of the memory storage system Maximize the read/write speed, or selectively provide a minimum operable voltage signal from the plurality of operable voltage signals as the operable voltage signal, so as to minimize the power consumption of the memory storage system .

在前述具體實施方式中,第一二極體連接電晶體包括耦接至所述第二可操作電壓信號的第一源極端、耦接至所述最大可 操作電壓信號的第一閘極端以及耦接至所述最大可操作電壓信號的第一汲極端。第二二極體連接電晶體包括耦接至所述第三可操作電壓信號的第二源極端、耦接至所述最大可操作電壓信號的第二閘極端以及耦接至所述最大可操作電壓信號的第二汲極端。 In the foregoing specific embodiments, the first diode-connected transistor includes a first source terminal coupled to the second operable voltage signal, and a first source terminal coupled to the maximum possible voltage signal. The first gate terminal of the operating voltage signal and the first drain terminal coupled to the maximum operable voltage signal. The second diode connected transistor includes a second source terminal coupled to the third operable voltage signal, a second gate terminal coupled to the maximum operable voltage signal, and a second gate terminal coupled to the maximum operable voltage signal. The second drain terminal of the voltage signal.

在前述具體實施方式中,多個電晶體當中的第一電晶體經設置以從所述多個可操作電壓信號中選擇性地提供所述最大可操作電壓信號作為所述可操作電壓信號。多個電晶體當中的第二電晶體經設置以從所述多個可操作電壓信號中選擇性地提供最小可操作電壓信號作為所述可操作電壓信號。 In the foregoing specific embodiment, the first transistor among the plurality of transistors is configured to selectively provide the maximum operable voltage signal as the operable voltage signal from the plurality of operable voltage signals. The second transistor among the plurality of transistors is configured to selectively provide a minimum operable voltage signal as the operable voltage signal from the plurality of operable voltage signals.

在前述具體實施方式中,第一電晶體經設置以反應於偏壓控制信號處於第一邏輯準位而選擇性地提供所述最大可操作電壓信號。第二電晶體經設置以反應於所述偏壓控制信號處於第二邏輯準位而選擇性地提供所述最小可操作電壓信號,所述第二邏輯準位不同於所述第一邏輯準位。 In the foregoing specific embodiments, the first transistor is configured to selectively provide the maximum operable voltage signal in response to the bias control signal being at the first logic level. The second transistor is configured to selectively provide the minimum operable voltage signal in response to the bias control signal being at a second logic level, the second logic level being different from the first logic level .

前述具體實施方式進一步揭露一種用於防止閂鎖記憶體儲存系統的方法。所述方法將最大可操作電壓信號施加於記憶體儲存系統的至少一個電晶體的至少一個基極區且施加於至少一個電晶體的至少一個閘極區,並當最大可操作電壓信號在多個可操作電壓信號中的第一可操作電壓信號下方波動時增加最大可操作電壓信號。 The foregoing specific embodiments further disclose a method for preventing latching of a memory storage system. The method applies a maximum operable voltage signal to at least one base region of at least one transistor of a memory storage system and to at least one gate region of at least one transistor, and when the maximum operable voltage signal is in a plurality of When the first operable voltage signal in the operable voltage signals fluctuates below, the maximum operable voltage signal is increased.

在前述具體實施方式中,上述增加的步驟包括:當所述最大可操作電壓信號在所述第一可操作電壓信號下方波動時,自所述第一可操作電壓信號獲得電流,以增加所述最大可操作電壓信號。 In the foregoing specific embodiment, the step of adding includes: when the maximum operable voltage signal fluctuates below the first operable voltage signal, obtaining a current from the first operable voltage signal to increase the Maximum operable voltage signal.

在前述具體實施方式中,用於防止閂鎖記憶體儲存系統的方法更包括:藉由所述記憶體儲存系統從所述多個可操作電壓信號中選擇可操作電壓信號,以動態地控制所述記憶體儲存系統的操作參數。 In the foregoing specific embodiments, the method for preventing a memory storage system from latching up further includes: selecting an operable voltage signal from the plurality of operable voltage signals by the memory storage system to dynamically control all the operating voltage signals. The operating parameters of the memory storage system are described.

在前述具體實施方式中,選擇所述可操作電壓信號的步驟包括:藉由所述記憶體儲存系統從所述多個可操作電壓信號中選擇所述最大可操作電壓信號,以將所述記憶體儲存系統的讀取/寫入速度最大化,或從所述多個可操作電壓信號中選擇最小可操作電壓信號,以將所述記憶體儲存系統的功率消耗最小化。 In the foregoing specific embodiment, the step of selecting the operable voltage signal includes: selecting the maximum operable voltage signal from the plurality of operable voltage signals by the memory storage system to store the memory The read/write speed of the volume storage system is maximized, or the smallest operable voltage signal is selected from the plurality of operable voltage signals, so as to minimize the power consumption of the memory storage system.

前述具體實施方式參看附圖以說明與本揭露內容一致的例示性實施例。前述具體實施方式對「例示性實施例」的參考指示,所描述的例示性實施例可包含特定特徵、結構或特性,但每一例示性實施例可能未必包含特定特徵、結構或特性。此外,此類片語未必指代相同例示性實施例。另外,無論是否明確地描述其他例示性實施例的特徵、結構或特性,皆可獨立地包含或以任何組合形式包含結合例示性實施例所描述的任何特徵、結構或特性。 The foregoing specific embodiments refer to the accompanying drawings to illustrate exemplary embodiments consistent with the present disclosure. The foregoing specific embodiments refer to the "exemplary embodiments" as reference indications. The described exemplary embodiments may include specific features, structures, or characteristics, but each exemplary embodiment may not necessarily include specific features, structures, or characteristics. Furthermore, such phrases do not necessarily refer to the same exemplary embodiment. In addition, regardless of whether the features, structures, or characteristics of other exemplary embodiments are explicitly described, they may independently or in any combination include any of the features, structures, or characteristics described in combination with the exemplary embodiments.

前述具體實施方式並不意謂是限制性的。實情為,本揭露內容的範疇僅根據以下申請專利範圍及其等效物定義。應瞭解,前述具體實施方式而非以下發明摘要章節意欲用以解譯申請專利範圍。發明摘要章節可闡述本揭露內容的一個或多個但並非所有例示性實施例,且由此不意欲以任何方式限制本揭露內容及以下申請專利範圍及其等效物。 The foregoing specific embodiments are not meant to be limiting. The fact is that the scope of this disclosure is only defined according to the scope of the following patent applications and their equivalents. It should be understood that the foregoing specific embodiments rather than the following abstract chapters are intended to interpret the scope of the patent application. The summary of the invention section may describe one or more but not all exemplary embodiments of the present disclosure, and therefore it is not intended to limit the present disclosure and the scope of the following patent applications and their equivalents in any way.

前述具體實施方式內描述的例示性實施例已經出於說明 的目的提供,且不意欲為限制性的。其他例示性實施例為可能的,且可在保持於本揭露的精神及範疇內時對例示性實施例進行修改。已憑藉用以說明特定功能及其關係的實施方式的功能建置區塊來描述前述具體實施方式。為了便於描述,本文已任意地定義這些功能建置區塊的邊界。只要恰當地執行指定功能及其關係,便可定義替代邊界。 The exemplary embodiments described in the foregoing specific embodiments have been for illustration Is provided for the purpose and is not intended to be limiting. Other exemplary embodiments are possible, and may be modified while remaining within the spirit and scope of the present disclosure. The foregoing specific implementations have been described with the function building blocks used to describe implementations of specific functions and their relationships. For ease of description, this article has arbitrarily defined the boundaries of these functional building blocks. As long as the specified functions and their relationships are properly performed, alternative boundaries can be defined.

本揭露的實施例可以硬體、韌體、軟體或其任何組合實施。本揭露的實施例亦可實施為儲存於機器可讀媒體上的可由一個或多個處理器讀取並執行的指令。機器可讀媒體可包含用於以可由機器(例如,計算電路)讀取的形式儲存或傳輸資訊的任何機構。舉例而言,機器可讀媒體可包含非暫時性機器可讀媒體,諸如唯讀記憶體(ROM);隨機存取記憶體(RAM);磁碟儲存媒體;光學儲存媒體;閃存裝置;以及其他媒體。作為另一實例,機器可讀媒體可包含暫時性機器可讀媒體,諸如電學、光學、聲學或其他形式的傳播信號(例如,載波、紅外線信號、數位信號等)。另外,韌體、軟體、常式、指令可在本文中描述為執行特定動作。然而,應瞭解,此類描述僅僅出於方便起見,且此類動作事實上是由計算裝置、處理器、控制器或執行韌體、軟體、常式、指令等的其他裝置引起。 The embodiments of the present disclosure can be implemented by hardware, firmware, software, or any combination thereof. The embodiments of the present disclosure can also be implemented as instructions stored on a machine-readable medium that can be read and executed by one or more processors. A machine-readable medium may include any mechanism for storing or transmitting information in a form readable by a machine (for example, a computing circuit). For example, machine-readable media may include non-transitory machine-readable media, such as read-only memory (ROM); random access memory (RAM); magnetic disk storage media; optical storage media; flash memory devices; and others media. As another example, machine-readable media may include transitory machine-readable media, such as electrical, optical, acoustic, or other forms of propagated signals (eg, carrier waves, infrared signals, digital signals, etc.). In addition, firmware, software, routines, and commands may be described herein as performing specific actions. However, it should be understood that such descriptions are only for convenience, and such actions are actually caused by computing devices, processors, controllers, or other devices that execute firmware, software, routines, commands, etc.

前述具體實施方式充分揭露本揭露的一般性質:其他人可藉由應用對相關技術領域中具通常知識者瞭解而在不背離本揭露的精神及範疇的情況下,且無需進行過度實驗下輕易地修改及/或調適各種應用此類例示性實施例。因此,基於本文所呈現的教示及指導,意欲在這些例示性實施例的含義及多個等同物的範疇 內進行此類調適及修改。應理解,本文中的措詞或術語是出於描述而非限制的目的,使得本說明書的術語或措詞應由相關領域中具通常知識者鑑於本文中的教示予以解譯。 The foregoing specific implementations fully reveal the general nature of the disclosure: others can easily understand the general knowledge in the relevant technical field by application without departing from the spirit and scope of the disclosure and without excessive experimentation. Such exemplary embodiments are modified and/or adapted for various applications. Therefore, based on the teaching and guidance presented herein, it is intended that the meaning of these exemplary embodiments and the scope of multiple equivalents Make such adjustments and modifications within. It should be understood that the terms or terms in this article are for the purpose of description rather than limitation, so that the terms or terms in this specification should be interpreted by persons with ordinary knowledge in the relevant field in view of the teachings in this article.

100:記憶體儲存系統 100: Memory storage system

102:電壓產生器電路 102: Voltage generator circuit

104.1、104.x:選擇電路 104.1, 104. x : Selection circuit

106:記憶體裝置 106: memory device

150:偏壓控制信號 150: Bias control signal

152:選擇控制信號 152: Select control signal

V1、VDDM_INT.1、VDDM_INT.x 、V m :可操作電壓信號 V 1 , V DDM_INT.1 , V DDM_INT. x , V m : operable voltage signal

VDDMAX:最大可操作電壓信號 V DDMAX : Maximum operable voltage signal

Claims (9)

一種選擇電路,用以將可操作電壓信號選擇性地提供至記憶體儲存系統的選擇電路,所述選擇電路包括:開關電路,具有多個電晶體,經設置以從多個可操作電壓信號當中選擇所述可操作電壓信號,所述多個可操作電壓信號當中的最大可操作電壓信號選擇性地施加於所述多個電晶體的基極端;以及閂鎖預防電路,包括:第一二極體連接電晶體及第二二極體連接電晶體,所述第一二極體連接電晶體及所述第二二極體連接電晶體分別耦接至所述多個可操作電壓信號當中的第一可操作電壓信號及第二可操作電壓信號,其中所述第一二極體連接電晶體經設置以在啟動時設置自所述第一可操作電壓信號獲得第一電流,以調節所述最大可操作電壓信號,以補償所述最大可操作電壓信號的所述波動,以及其中所述第二二極體連接電晶體經設置以在啟動時設置自所述第二可操作電壓信號獲得第二電流,以調節所述最大可操作電壓信號,以補償所述最大可操作電壓信號的所述波動。 A selection circuit for selectively providing an operable voltage signal to a selection circuit of a memory storage system. The selection circuit includes: a switch circuit having a plurality of transistors, and is configured to select from a plurality of operable voltage signals Selecting the operable voltage signal, the largest operable voltage signal among the plurality of operable voltage signals is selectively applied to the base terminal of the plurality of transistors; and a latch-up prevention circuit including: a first two pole The body-connected transistor and the second diode-connected transistor, the first diode-connected transistor and the second diode-connected transistor are respectively coupled to the first of the plurality of operable voltage signals An operable voltage signal and a second operable voltage signal, wherein the first diode connected to the transistor is configured to obtain a first current from the first operable voltage signal at startup to adjust the maximum An operable voltage signal to compensate for the fluctuation of the maximum operable voltage signal, and wherein the second diode connection transistor is set to obtain a second operation voltage signal from the second operable voltage signal when activated. Current to adjust the maximum operable voltage signal to compensate for the fluctuation of the maximum operable voltage signal. 如申請專利範圍第1項所述的選擇電路,其中所述多個電晶體包括:第一電晶體,經設置以從所述多個可操作電壓信號中選擇性地提供第一可操作電壓信號;以及第二電晶體,經設置以從所述多個可操作電壓信號中選擇性地提供第二可操作電壓信號, 其中所述最大可操作電壓信號選擇性地施加於所述第一電晶體的第一基極端及所述第二電晶體的第二基極端。 The selection circuit according to claim 1, wherein the plurality of transistors include: a first transistor configured to selectively provide a first operable voltage signal from the plurality of operable voltage signals And a second transistor configured to selectively provide a second operable voltage signal from the plurality of operable voltage signals, The maximum operable voltage signal is selectively applied to the first base terminal of the first transistor and the second base terminal of the second transistor. 如申請專利範圍第1項所述的選擇電路,其中所述第一電晶體的第一臨限電壓以及所述第二電晶體的第二臨限電壓大於所述第一二極體連接電晶體的第三臨限電壓以及所述第二二極體連接電晶體的第四臨限電壓。 The selection circuit according to item 1 of the scope of patent application, wherein the first threshold voltage of the first transistor and the second threshold voltage of the second transistor are greater than the first diode-connected transistor The third threshold voltage of and the fourth threshold voltage of the second diode connected to the transistor. 如申請專利範圍第3項所述的選擇電路,其中當所述最大可操作電壓信號小於所述第一可操作電壓信號時,所述第一二極體連接電晶體經設置以藉由所述第一二極體連接電晶體的所述第三臨限電壓啟動,以及其中當所述最大可操作電壓信號小於所述第二可操作電壓信號時,所述第二二極體連接電晶體經設置以藉由所述第二二極體連接電晶體的所述第四臨限電壓啟動。 The selection circuit described in item 3 of the scope of the patent application, wherein when the maximum operable voltage signal is less than the first operable voltage signal, the first diode connected transistor is configured to use the The third threshold voltage of the first diode connected to the transistor is activated, and wherein when the maximum operable voltage signal is less than the second operable voltage signal, the second diode is connected to the transistor via It is set to start by connecting the second diode to the fourth threshold voltage of the transistor. 一種選擇電路,用於記憶體儲存系統,所述選擇電路包括:開關電路,具有多個電晶體,經設置以將從多個可操作電壓信號中選擇的可操作電壓信號提供至所述記憶體儲存系統;以及閂鎖預防電路,具有第一二極體連接電晶體及第二二極體連接電晶體,經設置以將從所述多個可操作電壓信號中選擇的最大可操作電壓信號施加於所述第一二極體連接電晶體的第一基極端及所述第二二極體連接電晶體的第二基極端,其中所述第一二極體連接電晶體及所述第二二極體連接電晶體分別耦接至所述多個可操作電壓信號當中的第二可操作電壓信號及第三可操作電壓信號, 其中所述第一二極體連接電晶體經設置以在啟動時設置自所述第二可操作電壓信號獲得第一電流,以調節所述第二可操作電壓信號,以補償所述最大可操作電壓信號的波動,以及其中所述第二二極體連接電晶體經設置以在啟動時設置自所述第三可操作電壓信號獲得第二電流,以調節所述第二可操作電壓信號,以補償所述最大可操作電壓信號的所述波動。 A selection circuit for a memory storage system, the selection circuit comprising: a switch circuit having a plurality of transistors, and is configured to provide an operable voltage signal selected from a plurality of operable voltage signals to the memory A storage system; and a latch-up prevention circuit, having a first diode connected transistor and a second diode connected transistor, set to apply a maximum operable voltage signal selected from the plurality of operable voltage signals The first base terminal of the transistor is connected to the first diode and the second base terminal of the transistor is connected to the second diode, wherein the first diode is connected to the transistor and the second diode The pole body connection transistor is respectively coupled to the second operable voltage signal and the third operable voltage signal among the plurality of operable voltage signals, The first diode connected to the transistor is configured to obtain a first current from the second operable voltage signal when it is activated, so as to adjust the second operable voltage signal to compensate for the maximum operable The fluctuation of the voltage signal, and wherein the second diode connected to the transistor is set to obtain a second current from the third operable voltage signal at startup to adjust the second operable voltage signal to Compensating for the fluctuation of the maximum operable voltage signal. 如申請專利範圍第5項所述的選擇電路,其中所述閂鎖預防電路進一步經設置以將所述最大可操作電壓信號施加於所述多個電晶體當中的至少一個電晶體的至少一個基極端,其中所述第二可操作電壓信號經設置以反向偏置位於所述至少一個電晶體的源極端與所述至少一個電晶體的井區之間的寄生二極體。 The selection circuit according to claim 5, wherein the latch-up prevention circuit is further configured to apply the maximum operable voltage signal to at least one base of at least one of the plurality of transistors Terminal, wherein the second operable voltage signal is configured to reverse bias a parasitic diode located between the source terminal of the at least one transistor and the well region of the at least one transistor. 如申請專利範圍第5項所述的選擇電路,其中所述開關電路經設置以從所述多個可操作電壓信號中選擇性地提供所述最大可操作電壓信號作為所述可操作電壓信號,以將所述記憶體儲存系統的讀取/寫入速度最大化,或從所述多個可操作電壓信號中選擇性地提供最小可操作電壓信號作為所述可操作電壓信號,以將所述記憶體儲存系統的功率消耗最小化。 The selection circuit according to item 5 of the scope of patent application, wherein the switch circuit is configured to selectively provide the maximum operable voltage signal as the operable voltage signal from the plurality of operable voltage signals, In order to maximize the read/write speed of the memory storage system, or selectively provide a minimum operable voltage signal from the plurality of operable voltage signals as the operable voltage signal, to convert the The power consumption of the memory storage system is minimized. 如申請專利範圍第5項所述的選擇電路,其中所述多個電晶體當中的第一電晶體經設置以從所述多個可操作電壓信號中選擇性地提供所述最大可操作電壓信號作為所述可操作電壓信號,以及其中所述多個電晶體當中的第二電晶體經設置以從所述多個可操作電壓信號中選擇性地提供最小可操作電壓信號作為所述可操作電壓信號。 The selection circuit according to claim 5, wherein the first transistor among the plurality of transistors is configured to selectively provide the maximum operable voltage signal from the plurality of operable voltage signals As the operable voltage signal, and wherein a second transistor among the plurality of transistors is configured to selectively provide a minimum operable voltage signal as the operable voltage from the plurality of operable voltage signals Signal. 一種用於預防記憶體儲存系統閂鎖的方法,所述方法包括:藉由所述記憶體儲存系統,將從多個可操作電壓信號中選擇的最大可操作電壓信號施加於所述記憶體儲存系統的至少一個電晶體的至少一個基極區及施加於所述至少一個電晶體的至少一個閘極區;以及當所述最大可操作電壓信號在所述多個可操作電壓信號當中的第一可操作電壓信號下方波動時,藉由所述記憶體儲存系統自所述第一可操作電壓信號獲得電流,以增加所述最大可操作電壓信號。 A method for preventing latch-up of a memory storage system, the method comprising: by the memory storage system, applying a maximum operable voltage signal selected from a plurality of operable voltage signals to the memory storage At least one base region of at least one transistor of the system and at least one gate region applied to the at least one transistor; and when the maximum operable voltage signal is the first among the plurality of operable voltage signals When the operable voltage signal fluctuates, the memory storage system obtains current from the first operable voltage signal to increase the maximum operable voltage signal.
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Citations (3)

* Cited by examiner, † Cited by third party
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US20100301820A1 (en) * 2009-05-28 2010-12-02 Panasonic Corporation High withstand voltage semiconductor device and current control device using the same
US20140062204A1 (en) * 2012-08-31 2014-03-06 SK Hynix Inc. Power voltage selection device
US20180175033A1 (en) * 2016-12-16 2018-06-21 Intel Corporation Memory with single-event latchup prevention circuitry

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100301820A1 (en) * 2009-05-28 2010-12-02 Panasonic Corporation High withstand voltage semiconductor device and current control device using the same
US20140062204A1 (en) * 2012-08-31 2014-03-06 SK Hynix Inc. Power voltage selection device
US20180175033A1 (en) * 2016-12-16 2018-06-21 Intel Corporation Memory with single-event latchup prevention circuitry

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