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TWI656583B - Patterned liners used to create virtual solder masks in wafer level wafer size packages - Google Patents

Patterned liners used to create virtual solder masks in wafer level wafer size packages Download PDF

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Publication number
TWI656583B
TWI656583B TW106104408A TW106104408A TWI656583B TW I656583 B TWI656583 B TW I656583B TW 106104408 A TW106104408 A TW 106104408A TW 106104408 A TW106104408 A TW 106104408A TW I656583 B TWI656583 B TW I656583B
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Taiwan
Prior art keywords
pad
spoke
bracket
central
spokes
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TW106104408A
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Chinese (zh)
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TW201721782A (en
Inventor
波拉 巴洛葛盧
葛蘭 琳恩
克里斯托弗J 貝里
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美商艾馬克科技公司
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Publication of TW201721782A publication Critical patent/TW201721782A/en
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Publication of TWI656583B publication Critical patent/TWI656583B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/482Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body (electrodes)
    • H01L23/4824Pads with extended contours, e.g. grid structure, branch structure, finger structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L24/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/11Manufacturing methods
    • H01L2224/115Manufacturing methods by chemical or physical modification of a pre-existing or pre-deposited material
    • H01L2224/1152Self-assembly, e.g. self-agglomeration of the bump material in a fluid
    • H01L2224/11526Self-assembly, e.g. self-agglomeration of the bump material in a fluid involving the material of the bonding area, e.g. bonding pad or under bump metallisation [UBM]

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)

Abstract

晶圓級晶片尺寸封裝中用於建立虛擬焊料遮罩的圖案化襯墊之方法和裝置可以包括形成在半導體晶粒上的接觸襯墊,該接觸襯墊包括:中央襯墊、線路、從中央襯墊延伸出來的第一組輻線。支架可以包圍部分的第一輻線圖案和中央襯墊。焊球可以形成在中央襯墊和第一輻線圖案上但不在支架上。中央襯墊可以包括圓形金屬碟或環。包括一或更多條輻線的第二輻線圖案可以從支架延伸出來。第二支架可以包圍第一和第二輻線圖案、支架、中央襯墊。第一和第二輻線圖案可以具有不同的寬度,並且可以相對於中央襯墊而延伸在不同的角度。 The method and apparatus for creating a patterned pad of a virtual solder mask in a wafer-level chip size package may include a contact pad formed on a semiconductor die, the contact pad including: a central pad, a line, a central pad The first set of spokes extending from the pad. The bracket may surround a portion of the first spoke pattern and the center pad. Solder balls may be formed on the center pad and the first spoke pattern but not on the bracket. The center pad may include a circular metal dish or ring. A second spoke pattern including one or more spokes may extend from the bracket. The second bracket may surround the first and second spoke patterns, the bracket, and the center pad. The first and second spoke patterns may have different widths, and may extend at different angles with respect to the center pad.

Description

晶圓級晶片尺寸封裝中用於建立虛擬銲料遮罩的圖案化襯墊 Patterned pads used to create virtual solder masks in wafer-level chip-scale packages

本揭示的某些具體態樣關於半導體晶片封裝。更特定而言,本揭示的某些具體態樣關於晶圓級晶片尺寸封裝中用於建立虛擬焊料遮罩的圖案化襯墊之方法和系統。 Some specific aspects of the present disclosure relate to semiconductor chip packaging. More specifically, some specific aspects of the present disclosure relate to methods and systems for creating patterned pads for virtual solder masks in wafer-level chip scale packages.

半導體封裝保護積體電路或晶片免於實體損傷和外部應力。此外,它可以提供熱傳導路徑以有效率的移除晶片中所產生的熱,並且舉例而言也提供對於其他構件(例如印刷電路板)的電連接。用於半導體封裝的材料典型而言包括陶瓷或塑膠,並且形狀因子尤其已經從陶瓷扁平包裝和雙直列封裝進展到針腳格柵陣列和無引線晶片載體封裝。 Semiconductor packages protect integrated circuits or chips from physical damage and external stress. In addition, it can provide a heat conduction path to efficiently remove the heat generated in the wafer, and for example, also provide electrical connection to other components such as a printed circuit board. Materials used for semiconductor packaging typically include ceramic or plastic, and the form factor has progressed from ceramic flat packaging and dual in-line packaging to pin grid arrays and leadless chip carrier packaging, among others.

經由習用傳統的做法和參考圖式而列於本案其餘處的本揭示做比較,熟於此技術者將明白此種系統的進一步限制和缺點。 By comparing the present disclosure listed in the rest of the case by using traditional practices and reference drawings, those skilled in the art will understand further limitations and disadvantages of such a system.

本發明的某一方面是一種半導體封裝的方法,該方法包括在半導體晶粒上提供接觸襯墊,該接觸襯墊包括:中央襯墊;線路;以及第一輻線圖案,其包括從中央襯墊延伸出來的一或更多條輻線。 An aspect of the present invention is a method of semiconductor packaging, which includes providing a contact pad on a semiconductor die, the contact pad including: a center pad; a line; and a first spoke pattern including a liner from the center One or more spokes extending from the pad.

本發明的另一方面是一種電子裝置,該裝置包括在半導體晶 粒上的接觸襯墊,該接觸襯墊包括:中央襯墊;線路;以及第一輻線圖案,其包括從中央襯墊延伸出來的一或更多條輻線。 Another aspect of the invention is an electronic device including a semiconductor crystal A contact pad on the grain, the contact pad including: a central pad; a line; and a first spoke pattern including one or more spokes extending from the central pad.

100‧‧‧電互連 100‧‧‧Electrical interconnection

101‧‧‧金屬接觸 101‧‧‧Metal Contact

103‧‧‧半導體晶粒 103‧‧‧Semiconductor die

105A、105B‧‧‧接觸襯墊 105A, 105B‧‧‧contact pad

107‧‧‧線路 107‧‧‧ Line

109‧‧‧模製化合物 109‧‧‧Molding compound

111‧‧‧龜裂 111‧‧‧Crack

200‧‧‧電互連 200‧‧‧Electrical interconnection

201‧‧‧焊球、金屬接觸 201‧‧‧Solder ball, metal contact

205‧‧‧圖案化襯墊 205‧‧‧patterned liner

205A‧‧‧中央襯墊 205A‧‧‧Central pad

205B‧‧‧輻線 205B‧‧‧Spoke

205C‧‧‧支架 205C‧‧‧Bracket

207‧‧‧線路 207‧‧‧ Line

303‧‧‧輻線 303‧‧‧spoke

305‧‧‧中央襯墊 305‧‧‧Central pad

307‧‧‧線路 307‧‧‧ Line

309‧‧‧支架 309‧‧‧Bracket

400‧‧‧圖案化接觸襯墊 400‧‧‧patterned contact pad

405A‧‧‧中央襯墊 405A‧‧‧Central pad

405B‧‧‧輻線 405B‧‧‧Spoke

405C‧‧‧支架 405C‧‧‧Bracket

407‧‧‧線路 407‧‧‧ Line

500‧‧‧圖案化接觸襯墊 500‧‧‧patterned contact pad

507‧‧‧線路 507‧‧‧ Line

513‧‧‧外支架 513‧‧‧Outer bracket

515‧‧‧外輻線 515‧‧‧External spoke line

517‧‧‧第一內支架 517‧‧‧Inner bracket

519‧‧‧第一內輻線 519‧‧‧First inner spoke

521‧‧‧第二內支架 521‧‧‧Second inner bracket

523‧‧‧第二內輻線 523‧‧‧Second inner spoke

525‧‧‧開放襯墊核心 525‧‧‧Open pad core

600‧‧‧圖案化接觸襯墊 600‧‧‧patterned contact pad

603A、603B‧‧‧溝槽 603A、603B‧‧‧Trench

605A、605B‧‧‧(虛擬)襯墊 605A, 605B ‧‧‧ (virtual) pad

607A、607B‧‧‧線路 607A, 607B‧‧‧ line

610‧‧‧圖案化接觸襯墊 610‧‧‧patterned contact pad

905A、905B、905C‧‧‧中央襯墊、內襯墊 905A, 905B, 905C ‧‧‧ center pad, inner pad

907A、907B、907C‧‧‧輻線 907A, 907B, 907C ‧‧‧ spokes

909A、909B、909C‧‧‧(外)支架 909A, 909B, 909C‧‧‧ (outside) bracket

h1、h2‧‧‧厚度 h1, h2‧‧‧thickness

圖1A~1D示範依據本揭示的範例性具體態樣而形成於模製晶片尺寸封裝中之互連的多樣視圖。 FIGS. 1A-1D illustrate various views of interconnects formed in a molded chip-scale package according to the exemplary embodiments of the present disclosure.

圖2A~2B示範依據本揭示的範例性具體態樣而具有圖案化襯墊的電互連。 2A-2B demonstrate electrical interconnections with patterned pads according to exemplary embodiments of the present disclosure.

圖3A~3H示範依據本揭示的範例性具體態樣之多樣的圖案化接觸襯墊。 3A~3H illustrate various patterned contact pads according to exemplary embodiments of the present disclosure.

圖4A和4B示範依據本揭示的範例性具體態樣而呈現電流分散之圖案化接觸襯墊的俯視圖和斜角視圖。 4A and 4B demonstrate a top view and an oblique view of a patterned contact pad showing current dispersion according to an exemplary embodiment of the present disclosure.

圖5示範依據本揭示的範例性具體態樣而用於圖案化接觸襯墊中做電流分散的另一範例性結構。 FIG. 5 illustrates another exemplary structure for current dispersion in a patterned contact pad according to the exemplary embodiment of the present disclosure.

圖6A和6B示範依據本揭示的範例性具體態樣而利用切除的圖案化接觸襯墊。 FIGS. 6A and 6B demonstrate patterned contact pads utilizing cut-outs according to exemplary embodiments of the present disclosure.

圖7A~7H示範依據本揭示的範例性具體態樣之圖案化接觸襯墊的進一步範例。 7A-7H demonstrate further examples of patterned contact pads according to exemplary specific aspects of the present disclosure.

圖8A~8G示範依據本揭示的範例性具體態樣之接觸襯墊電流分散的進一步範例。 8A-8G illustrate further examples of contact pad current dispersion according to the exemplary embodiment of the present disclosure.

圖9A~9C示範依據本揭示的範例性具體態樣而具有旋翼輻線的圖案化接觸襯墊。 9A-9C illustrate a patterned contact pad with rotor spokes according to an exemplary embodiment of the present disclosure.

本揭示的特定方面可以發現於晶圓級晶片尺寸封裝中用於建立虛擬焊料遮罩的圖案化襯墊。本揭示的範例性方面可以包括形成在半導體晶粒上的接觸襯墊,該接觸襯墊包括:中央襯墊;第一輻線圖案,其從中央襯墊延伸出來;以及支架,其包圍至少部分的第一輻線圖案和中央襯墊。焊球可以形成在中央襯墊和第一輻線圖案上,但不須形成在支架上。中央襯墊可以包括圓形金屬碟或金屬環。第二輻線圖案可以從支架延伸出來。第二支架可以包圍至少部分的第二輻線圖案、支架、第一輻線圖案、中央襯墊。第一和第二輻線圖案可以具有不同的寬度。第一和第二輻線圖案可以相對於中央襯墊而延伸在不同的角度。線路可以電耦合於接觸襯墊。接觸襯墊和至少部分的焊球可以使用包封劑來包封。第一輻線圖案可以從中央襯墊延伸出來而呈旋翼形狀。 Certain aspects of the present disclosure can be found in patterned pads used to create virtual solder masks in wafer-level chip scale packages. Exemplary aspects of the present disclosure may include a contact pad formed on the semiconductor die, the contact pad including: a center pad; a first spoke pattern that extends from the center pad; and a bracket that surrounds at least a portion The first spoke pattern and the center liner. The solder balls may be formed on the center pad and the first spoke pattern, but need not be formed on the bracket. The center pad may include a circular metal dish or metal ring. The second spoke pattern may extend from the bracket. The second bracket may surround at least part of the second spoke pattern, the bracket, the first spoke pattern, and the center pad. The first and second spoke patterns may have different widths. The first and second spoke patterns may extend at different angles with respect to the central pad. The line may be electrically coupled to the contact pad. The contact pad and at least part of the solder balls can be encapsulated using an encapsulant. The first spoke pattern may extend from the center pad to have a rotor shape.

圖1A~1D示範依據本揭示的範例性具體態樣而形成於模製晶片尺寸封裝中之互連的多樣視圖。參見圖1A,顯示的是電互連100的截面圖,其包括金屬接觸101、接觸襯墊105A和105B、線路107、模製化合物109。 FIGS. 1A-1D illustrate various views of interconnects formed in a molded chip-scale package according to the exemplary embodiments of the present disclosure. Referring to FIG. 1A, a cross-sectional view of the electrical interconnect 100 is shown, which includes metal contacts 101, contact pads 105A and 105B, wiring 107, and molding compound 109.

金屬接觸101可以形成在耦合於線路107的接觸襯墊105A上,並且舉例而言可以包括焊球、銅柱或其他電接觸,其可以提供電連接給半導體晶粒103上的接觸襯墊105B。如在金屬接觸101之每一側上的模製化合物109之厚度h1和h2所示,注意到厚度h2大於厚度h1,這是由於至少有線路107之高度的緣故。 The metal contacts 101 may be formed on the contact pads 105A coupled to the wiring 107, and may include, for example, solder balls, copper pillars, or other electrical contacts, which may provide electrical connections to the contact pads 105B on the semiconductor die 103. As shown by the thicknesses h1 and h2 of the molding compound 109 on each side of the metal contact 101, it is noted that the thickness h2 is greater than the thickness h1 due to at least the height of the wiring 107.

模製化合物109繞著金屬接觸101而在離開線路107處有增加的厚度可以在熱循環期間於金屬接觸101上引起側向力,其可以導致如 圖1A所示之傾斜箭號所指的傾斜移動,而傾斜方向可以由模製化合物109受熱膨脹或者冷卻收縮來決定。舉例而言,這傾斜移動可以在靠近金屬接觸101與接觸襯墊105A和/或線路107之間的介面造成龜裂111。形成於電互連100中之任何導電結構的龜裂可以造成斷路或減少半導體晶粒103上的金屬接觸101和接觸襯墊105B之間電連接的可靠度。 The molding compound 109 around the metal contact 101 with an increased thickness at a distance from the line 107 can cause a lateral force on the metal contact 101 during thermal cycling, which can result in The tilting movement indicated by the tilting arrow shown in FIG. 1A, and the tilting direction can be determined by the thermal expansion or cooling contraction of the molding compound 109. For example, this tilting movement may cause a crack 111 near the interface between the metal contact 101 and the contact pad 105A and/or the wiring 107. Cracks in any conductive structure formed in the electrical interconnect 100 may cause a break or reduce the reliability of the electrical connection between the metal contact 101 on the semiconductor die 103 and the contact pad 105B.

圖1B是金屬接觸101的截面圖,其顯示成在模製化合物109裡是透明的並且結合於接觸襯墊105A。雖然接觸襯墊105A顯示成圓形,不過它可以包括多種形狀當中任一者,例如方形、矩形、卵形等等。圖1C是金屬接觸101的斜角視圖,其再次顯示成透明的以顯示底下的結構,並且金屬接觸101停留在接觸襯墊105A的整個頂面上。接觸襯墊105A是看得見的,而線路107從接觸襯墊105A延伸出來。 FIG. 1B is a cross-sectional view of the metal contact 101, which is shown to be transparent in the molding compound 109 and bonded to the contact pad 105A. Although the contact pad 105A is shown as a circle, it may include any of a variety of shapes, such as square, rectangular, oval, and so on. FIG. 1C is an oblique view of the metal contact 101, which is again shown transparent to show the underlying structure, and the metal contact 101 stays on the entire top surface of the contact pad 105A. The contact pad 105A is visible, and the line 107 extends from the contact pad 105A.

圖1D是從接觸襯墊105A所延伸之線路107的放大圖,而金屬接觸101(其顯示成透明的以顯示底下的結構)覆蓋接觸襯墊105A的整個表面。此種結構讓焊球覆蓋接觸襯墊105A的整個表面並且線路107從接觸襯墊105A之表面的一側延伸出來,則可以在金屬接觸101上造成傾斜移動,如上所述。 FIG. 1D is an enlarged view of the wiring 107 extending from the contact pad 105A, and the metal contact 101 (which is shown transparent to show the underlying structure) covers the entire surface of the contact pad 105A. This structure allows the solder balls to cover the entire surface of the contact pad 105A and the line 107 extends from one side of the surface of the contact pad 105A, which can cause a tilting movement on the metal contact 101, as described above.

圖2A和2B示範依據本揭示的範例性具體態樣而具有圖案化襯墊的電互連。參見圖2A,顯示的是電互連200的斜角視圖,其包括焊球201、圖案化襯墊205、線路207。金屬接觸201和線路207可以實質類似於有關圖1A~1D所述的金屬接觸101和線路107。圖2B顯示電互連200的俯視圖,其中金屬接觸201顯示成大多透明的以顯示圖案化襯墊205的底下結構。圖案化襯墊205可以包括中央襯墊205A、輻線205B、支架205C,其 中中央襯墊205A可以包括金屬襯墊,其具有輻線205B向外延伸到支架205C,而可以至少部分包圍中央襯墊205A。雖然金屬襯墊205A顯示成圓形,不過它舉例而言可以為其他形狀,例如方形、矩形或卵形。圖案化襯墊205的結構使輻線圖案205B繞著中央襯墊205A做對稱放置,則可以允許金屬接觸201的焊料僅覆蓋部分的圖案化襯墊205,而不須用於界定的遮罩開口。附帶而言,由於輻線205B繞著中央襯墊205A的對稱性,故可以沒有淨傾斜力施加在金屬接觸201上。 2A and 2B illustrate electrical interconnects with patterned pads according to exemplary embodiments of the present disclosure. Referring to FIG. 2A, an oblique view of the electrical interconnect 200 is shown, which includes solder balls 201, patterned pads 205, and wires 207. The metal contact 201 and the wiring 207 may be substantially similar to the metal contact 101 and the wiring 107 described in relation to FIGS. 1A to 1D. FIG. 2B shows a top view of electrical interconnect 200 in which metal contacts 201 are shown to be mostly transparent to show the underlying structure of patterned pad 205. The patterned pad 205 may include a central pad 205A, a spoke 205B, a bracket 205C, which The center center pad 205A may include a metal pad having a spoke 205B extending outward to the bracket 205C, and may at least partially surround the center pad 205A. Although the metal liner 205A is shown as a circle, it may be, for example, other shapes, such as square, rectangular, or oval. The structure of the patterned pad 205 allows the radial pattern 205B to be placed symmetrically around the central pad 205A, which allows the solder of the metal contact 201 to cover only part of the patterned pad 205 without the need for a defined mask opening . Incidentally, due to the symmetry of the spoke 205B around the center pad 205A, no net tilting force can be applied to the metal contact 201.

輻線圖案205B和/或支架205C也可以改善形成在圖案化襯墊205上而用於金屬接觸201之互連的附著性和導電度,其中支架205C可以經由每條輻線205B而允許電流更平均的分布,這可以緩和靠近接觸襯墊之線路的電遷移顧慮。可以實現上述此種利益,而不管圖案化襯墊205和/或金屬接觸201於相同或其他的具體態樣中是否要被模製化合物或其他材料所至少部分的包封。 The spoke pattern 205B and/or the bracket 205C can also improve the adhesion and conductivity formed on the patterned pad 205 for the interconnection of the metal contacts 201, wherein the bracket 205C can allow the current to pass through each spoke 205B Evenly distributed, this can alleviate the electromigration concerns of traces close to the contact pads. The above-mentioned benefits can be achieved regardless of whether the patterned pad 205 and/or the metal contacts 201 are to be at least partially encapsulated by the molding compound or other materials in the same or other specific aspects.

圖3A~3H示範依據本揭示的範例性具體態樣之多樣的圖案化接觸襯墊。圖3A~3H可以包括圖2所示之結構或做法的變化。圖3A~3C代表變化輻線303的數目而支架309包圍著輻線303,而圖3D和3E示範不同數目的輻線303但沒有支架。圖3H示範的結構則在中央襯墊之相對側上有單一輻線303和線路307,如果線路視為輻線的話或謂有二條輻線。圖3F和3G顯示經修改的支架圖案,其中輻線303可以繞著中央襯墊305做對稱指向,但是間歇或部分的支架309不須完全包圍中央襯墊305。用於特殊襯墊的圖案設計舉例而言可以基於電流大小、所要的電流分散、特色尺寸或金屬導電度而建構。 3A~3H illustrate various patterned contact pads according to exemplary embodiments of the present disclosure. 3A~3H may include changes in the structure or method shown in FIG. 2. 3A~3C represent the number of varying spokes 303 and the bracket 309 surrounds the spokes 303, while FIGS. 3D and 3E demonstrate different numbers of spokes 303 but no brackets. The structure illustrated in FIG. 3H has a single spoke 303 and a line 307 on opposite sides of the center pad, or two spokes if the line is regarded as a spoke. FIGS. 3F and 3G show a modified stent pattern in which the spokes 303 can be oriented symmetrically around the central pad 305, but the intermittent or partial stent 309 need not completely surround the central pad 305. The pattern design for the special liner can be constructed based on, for example, the magnitude of current, desired current dispersion, characteristic size, or metal conductivity.

圖4A和4B示範依據本揭示的範例性具體態樣之二個類似圖案化接觸襯墊的俯視圖和斜角視圖,其展現電流分散。參見圖4A,顯示的是圖案化接觸襯墊400的俯視圖,其包括中央襯墊405A、輻線405B、支架405C,而線路407耦合於圖案化接觸襯墊400。 FIGS. 4A and 4B illustrate a top view and an oblique view of two similarly patterned contact pads according to an exemplary embodiment of the present disclosure, which exhibit current dispersion. Referring to FIG. 4A, a top view of the patterned contact pad 400 is shown, which includes a central pad 405A, spokes 405B, and a bracket 405C, and the line 407 is coupled to the patterned contact pad 400.

圖4A是圖案化接觸襯墊400的俯視圖,其示範輻線圖案的電流分散能力,其中輸入電流(如指入線路407的箭號所示)可以經由支架405C而更平均的分散到每條輻線405B,如彎曲箭號所示。繞著襯墊405A的支架405C可以使電流分布成完全圍繞著中央襯墊405A,因而可以緩和電遷移,該電遷移可以由於穿過或靠近缺陷的電流而使金屬中的缺陷隨著時間遷移或膨脹。 4A is a top view of a patterned contact pad 400, which demonstrates the current dispersion capability of the spoke pattern, in which the input current (as indicated by the arrow pointing into the line 407) can be more evenly distributed to each spoke via the bracket 405C Line 405B, as shown by the curved arrow. The bracket 405C around the pad 405A can distribute current to completely surround the central pad 405A, and thus can ease electromigration, which can cause defects in the metal to migrate over time due to current passing through or near the defects or Swell.

圖4B示範在電互連200上之金屬接觸201的斜角視圖,其可以實質類似於圖案化接觸襯墊400,但有更多條輻線。因為輻線繞著金屬接觸201做對稱配置,所以當形成在輻線上時變化模製厚度可以不造成淨傾斜移動力。附帶而言,多個導電路徑可以提供繞著金屬接觸201的電流分散能力,如此則電流更平均的分散繞著襯墊,例如不從金屬接觸201的單一位置進入或離開,藉此緩和缺陷的電遷移。 FIG. 4B illustrates an oblique view of the metal contact 201 on the electrical interconnect 200, which may be substantially similar to the patterned contact pad 400, but with more spokes. Because the spokes are arranged symmetrically around the metal contacts 201, changing the molding thickness when formed on the spokes may not cause a net tilting force. Incidentally, multiple conductive paths can provide the current spreading ability around the metal contact 201, so that the current is more evenly distributed around the pad, such as not entering or leaving from a single position of the metal contact 201, thereby alleviating the defects Electromigration.

圖5示範依據本揭示的範例性具體態樣而用於分布電流繞著圖案化接觸襯墊的另一範例結構。參見圖5,顯示的是圖案化接觸襯墊500和線路507。圖案化接觸襯墊500可以包括外支架513、外輻線515、第一內支架517、第一內輻線519、第二內支架521、第二內輻線523和/或開放襯墊核心525。 FIG. 5 illustrates another exemplary structure for distributing current around the patterned contact pad according to the exemplary embodiment of the present disclosure. Referring to FIG. 5, a patterned contact pad 500 and a line 507 are shown. The patterned contact pad 500 may include an outer bracket 513, an outer spoke 515, a first inner bracket 517, a first inner spoke 519, a second inner bracket 521, a second inner spoke 523, and/or an open pad core 525 .

除了在原始襯墊周圍使用添加的輻線以分布電流,襯墊本身 也還可以劃分成朝向圖案化襯墊之中央的輻線,其可以允許電流路徑再做分布。圖案化接觸襯墊500示範帶往內部而朝向襯墊中央的電流分布,而電流路徑是在多個方向而與圖案化接觸襯墊500之中央有不同的徑向距離。開放襯墊核心525是「開放的」(open)意謂:於本範例性具體態樣,核心襯墊包括環而非實心圓形襯墊。 In addition to using the added spokes around the original pad to distribute the current, the pad itself It can also be divided into radial lines toward the center of the patterned pad, which can allow the current path to be redistributed. The patterned contact pad 500 exemplifies the current distribution brought inwards toward the center of the pad, and the current path is in multiple directions and has a different radial distance from the center of the patterned contact pad 500. The open pad core 525 is "open" meaning that in this exemplary embodiment, the core pad includes a ring rather than a solid circular pad.

圖6A和6B示範依據本揭示的範例性具體態樣而利用溝槽的圖案化接觸襯墊。參見圖6A,顯示的是圖案化接觸襯墊600和線路607A。圖案化接觸襯墊600可以包括襯墊605A和溝槽603A,其中溝槽603A可以包括金屬區域,其形成線路607A和/或圖案化接觸襯墊600而已經被移除或省略成一圖案,這於本範例中造成面對襯墊605A的半圓形前緣。 6A and 6B demonstrate patterned contact pads that utilize trenches according to exemplary embodiments of the present disclosure. Referring to FIG. 6A, a patterned contact pad 600 and a line 607A are shown. The patterned contact pad 600 may include a pad 605A and a trench 603A, where the trench 603A may include a metal region that forms a line 607A and/or the patterned contact pad 600 has been removed or omitted into a pattern, which is In this example, a semi-circular leading edge facing the pad 605A is created.

因此,溝槽603A的配置可以界定襯墊605A,如虛線圓所指出,其可以將對於選路性的衝擊減到最小,亦即不須將輻線、支架或其他特色界定成完全圍繞著襯墊以避免佔去過多的晶粒空間,同時增加襯墊的可靠性。 Therefore, the configuration of the groove 603A can define the liner 605A, as indicated by the dotted circle, it can minimize the impact on the routing, that is, it is not necessary to define the spokes, brackets or other features to completely surround the liner The pad avoids taking up too much die space, while increasing the reliability of the pad.

圖6B示範圖案化接觸襯墊610和線路607B。就如圖案化接觸襯墊600,虛擬襯墊605B可以由對稱形成在圖案化接觸襯墊610之相對側上的溝槽603B所界定。 FIG. 6B exemplifies patterned contact pad 610 and line 607B. Just like the patterned contact pad 600, the dummy pad 605B may be defined by the groove 603B formed symmetrically on the opposite side of the patterned contact pad 610.

溝槽603A和603B可以填充了絕緣材料,舉例而言例如焊料支架或氧化物。於其他範例,如果組件是從上面模製,則溝槽603A和/或603B可以維持空的以於稍後由模製化合物所填充。 The trenches 603A and 603B may be filled with an insulating material, for example, solder support or oxide. In other examples, if the component is molded from above, the trenches 603A and/or 603B may remain empty to be filled later by the molding compound.

圖7A~7H示範依據本揭示的範例性具體態樣之圖案化接觸襯墊的進一步範例。參見圖7A~7H,顯示的是圖案化接觸襯墊而具有變化 數目的輻線和/或變化的輻線寬度或厚度。厚度在本文中可以是指輻線在接觸的x-y平面上和/或從圖式平面出來之z方向上的寬度。舉例而言,圖7A和7B分別示範4輻線設計,而具有在x-y平面的變化寬度。6、8、10輻線設計的類似變化則顯示於圖7C~7H。輻線的數目和寬度舉例而言可以基於要經由接觸所轉移的最大電流來建構。 7A-7H demonstrate further examples of patterned contact pads according to exemplary specific aspects of the present disclosure. See Figures 7A~7H, which show changes in the patterned contact pads The number of spokes and/or the varying spoke width or thickness. Thickness in this context may refer to the width of the spoke in the x-y plane of contact and/or in the z direction coming out of the drawing plane. For example, FIGS. 7A and 7B respectively demonstrate a 4-spoke design, with varying widths in the x-y plane. Similar changes in the design of 6, 8, and 10 spokes are shown in Figures 7C~7H. The number and width of the spokes can for example be constructed based on the maximum current to be transferred via the contact.

圖8A~8G示範依據本揭示的範例性具體態樣之接觸襯墊電流分散的進一步範例。參見圖8A~8G,則有變化厚度的內輻線、變化組態的內輻線、變化組態的中央襯墊、不同數目和組態的支架等等。 8A-8G illustrate further examples of contact pad current dispersion according to the exemplary embodiment of the present disclosure. 8A~8G, there are internal spokes of varying thickness, internal spokes of varying configuration, central pads of varying configuration, different numbers and configurations of brackets, etc.

舉例而言,圖8A顯示實心中央襯墊設計,圖8B顯示增加斜角輻線的厚度,圖8C顯示增加垂直和水平之內輻線的寬度,並且圖8D顯示增加斜角與垂直/水平之輻線的寬度。圖8E顯示大致一致的輻線寬度,圖8F顯示增加實心襯墊核心的直徑,並且圖8G顯示較寬的斜角輻線以及增加實心襯墊核心的直徑。 For example, FIG. 8A shows a solid central liner design, FIG. 8B shows an increase in the thickness of the diagonal spoke, FIG. 8C shows an increase in the width of the vertical and horizontal inner spokes, and FIG. 8D shows an increase in the angle between the diagonal and vertical/horizontal. The width of the spoke. Figure 8E shows a roughly uniform spoke width, Figure 8F shows an increase in the diameter of the solid pad core, and Figure 8G shows a wider beveled spoke line and an increase in the diameter of the solid pad core.

圖8A~8G所示以及圖7A~7H所示的圖案化襯墊包括獨特的設計解決方案,其允許焊料僅覆蓋部分的襯墊而沒有界定的開口(例如焊料遮罩開口)。藉由調整此圖案化結構所提出之特色的寬度、長度、連接性,則該結構引入新的和獨特的設計空間以對付多樣的結構可靠性顧慮,例如線路龜裂和電遷移。 The patterned pads shown in FIGS. 8A-8G and FIGS. 7A-7H include a unique design solution that allows solder to cover only a portion of the pad without undefined openings (eg, solder mask openings). By adjusting the characteristic width, length, and connectivity of this patterned structure, the structure introduces new and unique design spaces to deal with various structural reliability concerns, such as circuit cracking and electromigration.

圖9A~9C示範依據本揭示的範例性具體態樣而具有旋翼輻線的圖案化接觸襯墊。參見圖9A,顯示的是旋翼結構,其中輻線907A可以延伸成彎曲路徑而從中央襯墊905A向外到支架909A。圖9B示範旋翼結構,其中輻線907B從內襯墊905B的外緣垂直延伸出來,然後採取彎曲路 徑到外支架909B。圖9C示範類似於圖9B的結構,但輻線907C採取斜角路徑而從垂直於中央襯墊905C的部分延伸出來。 9A-9C illustrate a patterned contact pad with rotor spokes according to an exemplary embodiment of the present disclosure. Referring to FIG. 9A, a rotor structure is shown in which the spoke 907A can extend into a curved path from the center pad 905A outward to the bracket 909A. 9B shows an exemplary rotor structure, in which the spoke 907B extends vertically from the outer edge of the inner pad 905B, and then takes a curved path Diameter to the outer bracket 909B. FIG. 9C exemplifies a structure similar to FIG. 9B, but the spoke 907C takes a beveled path and extends from a portion perpendicular to the center pad 905C.

旋翼輻線結構可以做到減少內襯墊905A~905C和外支架909A~909C之間的距離,而不必減少輻線907A~907C的長度,並且不必增加相鄰圖案化襯墊之間的間距。 The rotor-spoke structure can reduce the distance between the inner pads 905A~905C and the outer brackets 909A~909C without reducing the length of the spokes 907A~907C and without increasing the spacing between adjacent patterned pads.

於本揭示的具體態樣,揭示的是晶圓級晶片尺寸封裝中用於建立虛擬焊料遮罩的圖案化襯墊之方法和系統。就此而言,本揭示的多個方面可以包括形成在半導體晶粒上的接觸襯墊,該接觸襯墊包括:中央襯墊;第一輻線圖案,其包括從中央襯墊延伸出來的一或更多條輻線;以及支架,其環繞第一輻線圖案和中央襯墊。焊球可以形成在中央襯墊和第一輻線圖案上但不在支架上。中央襯墊可以包括圓形金屬碟或金屬環。包括一或更多條輻線的第二輻線圖案可以從支架延伸出來。 In a specific aspect of the present disclosure, a method and system for creating a patterned pad for a virtual solder mask in a wafer-level chip scale package is disclosed. In this regard, various aspects of the present disclosure may include contact pads formed on the semiconductor die, the contact pads including: a center pad; a first spoke pattern including one or more extending from the center pad More spokes; and a bracket that surrounds the first spoke pattern and the center pad. Solder balls may be formed on the center pad and the first spoke pattern but not on the bracket. The center pad may include a circular metal dish or metal ring. A second spoke pattern including one or more spokes may extend from the bracket.

第二支架可以環繞著第二輻線圖案、支架、第一輻線圖案、中央襯墊。第一和第二輻線圖案可以具有不同的寬度。第一和第二輻線圖案可以相對於中央襯墊而延伸在不同的角度。線路可以電耦合於接觸襯墊。接觸襯墊和至少部分的焊球可以使用包封劑來包封。第一輻線圖案可以從中央襯墊延伸出來而呈旋翼形狀。 The second bracket may surround the second spoke pattern, the bracket, the first spoke pattern, and the center pad. The first and second spoke patterns may have different widths. The first and second spoke patterns may extend at different angles with respect to the central pad. The line may be electrically coupled to the contact pad. The contact pad and at least part of the solder balls can be encapsulated using an encapsulant. The first spoke pattern may extend from the center pad to have a rotor shape.

雖然本揭示已經參考特定的具體態樣來描述,不過熟於此技術者將了解可以做出多樣的改變並且可以由等同者來取代,而不偏離本揭示的範圍。附帶而言,可以做出許多修改以使特殊的情況或材料適於本揭示的教導,而不偏離其範圍。因此,本揭示打算不限於所揭示的特殊具體態樣,本揭示而是將包括所有落於所附請求項之範圍裡的具體態樣。 Although the present disclosure has been described with reference to specific specific aspects, those skilled in the art will understand that various changes can be made and can be replaced by equivalents without departing from the scope of the present disclosure. Incidentally, many modifications can be made to adapt a particular situation or material to the teachings of this disclosure without departing from its scope. Therefore, this disclosure is not intended to be limited to the specific specific aspects disclosed, but this disclosure will include all specific aspects falling within the scope of the appended claims.

Claims (13)

一種用於半導體封裝的方法,該方法包括:提供電連接到半導體晶粒的接觸襯墊,該接觸襯墊包括:中央襯墊;支架,其包圍至少部份的該中央襯墊;以及第一輻線圖案,其包括從該中央襯墊延伸出來的一或更多條輻線,其中,該一或更多條輻線中的至少一條輻線具有:內輻線部分,其耦合至所述中央襯墊且被焊球覆蓋;以及外輻線部分,其被耦合至該內輻線部分且從該焊球曝露,該外輻線部分延伸通過該支架;以及提供包封劑層,其包封該外輻線部分和該焊球的一部分。A method for a semiconductor package, the method comprising: providing a contact pad electrically connected to a semiconductor die, the contact pad including: a central pad; a bracket that surrounds at least a portion of the central pad; and a first A spoke pattern including one or more spokes extending from the central pad, wherein at least one of the one or more spokes has: an inner spoke portion, which is coupled to the A central liner and covered by solder balls; and an outer spoke line portion coupled to and exposed from the inner spoke line portion, the outer spoke line portion extending through the bracket; and providing an encapsulant layer, which wraps Seal the outer spoke portion and the solder ball portion. 根據申請專利範圍第1項的方法,其中該中央襯墊包括金屬環。The method according to item 1 of the patent application scope, wherein the central gasket includes a metal ring. 根據申請專利範圍第1項的方法,其中該支架的表面是無焊料的。The method according to item 1 of the patent application scope, wherein the surface of the bracket is solder-free. 根據申請專利範圍第1項的方法,其中該接觸襯墊是在一層上,該層位於該半導體晶粒上。The method according to item 1 of the patent application scope, wherein the contact pad is on a layer that is located on the semiconductor die. 一種電子裝置,該裝置包括:電連接到半導體晶粒的接觸襯墊,該接觸襯墊包括:中央襯墊;支架,其包圍至少部份的該中央襯墊;以及第一輻線圖案,其包括從該中央襯墊延伸出來的一或更多條輻線,其中:該一或更多條輻線中的至少一條輻線具有:內輻線部分,其耦合至所述中央襯墊且被焊球覆蓋;以及外輻線部分,其被耦合至該內輻線部分且從該焊球曝露,該外輻線部分延伸超過該支架;以及包封劑層,其包封該外輻線部分和該焊球的一部分。An electronic device including: a contact pad electrically connected to a semiconductor die, the contact pad including: a central pad; a bracket that surrounds at least a portion of the central pad; and a first spoke pattern, which Including one or more spokes extending from the central pad, wherein: at least one of the one or more spokes has: an inner spoke portion, which is coupled to the central pad and is Solder ball coverage; and an outer spoke line portion, which is coupled to and exposed from the inner spoke line portion, the outer spoke line portion extends beyond the bracket; and an encapsulant layer, which encapsulates the outer spoke line portion And part of the solder ball. 根據申請專利範圍第5項的電子裝置,其中該中央襯墊包括金屬環。The electronic device according to item 5 of the patent application scope, wherein the central pad includes a metal ring. 根據申請專利範圍第5項的電子裝置,其中包括一或更多條輻線的第二輻線圖案從該支架延伸出來,並且具有以下至少一個特徵:該第一輻線圖案的輻線具有與該第二輻線圖案的輻線不同之寬度,以及該第一輻線圖案以與該第二輻線圖案不同的相對於該中央襯墊之角度延伸。An electronic device according to item 5 of the patent application scope, in which a second spoke pattern including one or more spokes extends from the bracket and has at least one of the following features: the spokes of the first spoke pattern have The widths of the spokes of the second spoke pattern are different, and the first spoke pattern extends at a different angle with respect to the central pad than the second spoke pattern. 根據申請專利範圍第5項的電子裝置,其中該支架的表面是無焊料的。The electronic device according to item 5 of the patent application scope, wherein the surface of the bracket is solder-free. 根據申請專利範圍第5項的電子裝置,其中該接觸襯墊是在一層上,該層位於該半導體晶粒上。The electronic device according to item 5 of the patent application scope, wherein the contact pad is on a layer that is located on the semiconductor die. 一種電子裝置,其包括:電連接至半導體晶粒的接觸襯墊,該接觸襯墊包括:中央襯墊,其包括朝向該中央襯墊的中央延伸之複數個中央輻線;第一輻線圖案,其包括從該中央襯墊延伸出來的一或更多條輻線;以及支架,其包圍至少部分的該中央襯墊和至少部分的該第一輻線圖案;以及包封劑層,其包封該第一輻線圖案的一部分;其中該一或更多條輻線中的至少一條輻線從該中央襯墊延伸通過該支架。An electronic device including: a contact pad electrically connected to a semiconductor die, the contact pad including: a central pad including a plurality of central spokes extending toward the center of the central pad; a first spoke pattern , Which includes one or more spokes extending from the central pad; and a bracket, which surrounds at least part of the central pad and at least part of the first spoke pattern; and an encapsulant layer, which encloses A portion of the first spoke pattern is enclosed; wherein at least one spoke of the one or more spokes extends from the central pad through the bracket. 根據申請專利範圍第10項的電子裝置,其中該接觸襯墊是在一層上,該層位於該半導體晶粒上。The electronic device according to item 10 of the patent application range, wherein the contact pad is on a layer that is located on the semiconductor die. 一種電子裝置,其包括:電連接至半導體晶粒的接觸襯墊,該接觸襯墊包括:內支架,其包括朝向該內支架的中央延伸之複數個中央輻線;第一輻線圖案,其包括從該內支架延伸出來的一或更多條輻線;以及外支架,其包圍至少部分的該內支架和至少部分的該第一輻線圖案。An electronic device including: a contact pad electrically connected to a semiconductor die, the contact pad including: an inner bracket including a plurality of central spokes extending toward a center of the inner bracket; a first spoke pattern, which It includes one or more spokes extending from the inner bracket; and an outer bracket that surrounds at least part of the inner bracket and at least part of the first spoke pattern. 根據申請專利範圍第12項的電子裝置,其中該外支架包括線路。The electronic device according to item 12 of the patent application scope, wherein the outer bracket includes a circuit.
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TW200614476A (en) * 2004-10-21 2006-05-01 Advanced Semiconductor Eng Package substrate with nsmd pads
TW200834845A (en) * 2006-10-20 2008-08-16 Texas Instruments Inc Partial solder mask defined pad design
TW201342556A (en) * 2012-04-11 2013-10-16 Taiwan Semiconductor Mfg Package for semiconductor device and method of packaging semiconductor device

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