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TWI580724B - Composition for etching mask and pattern forming method - Google Patents

Composition for etching mask and pattern forming method Download PDF

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Publication number
TWI580724B
TWI580724B TW101143091A TW101143091A TWI580724B TW I580724 B TWI580724 B TW I580724B TW 101143091 A TW101143091 A TW 101143091A TW 101143091 A TW101143091 A TW 101143091A TW I580724 B TWI580724 B TW I580724B
Authority
TW
Taiwan
Prior art keywords
mask
composition
pattern
etching
printing
Prior art date
Application number
TW101143091A
Other languages
English (en)
Chinese (zh)
Other versions
TW201339236A (zh
Inventor
Hiroaki Tomida
Yasuhiro Yoshii
Takaaki Hirai
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW201339236A publication Critical patent/TW201339236A/zh
Application granted granted Critical
Publication of TWI580724B publication Critical patent/TWI580724B/zh

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Photovoltaic Devices (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
TW101143091A 2011-12-06 2012-11-19 Composition for etching mask and pattern forming method TWI580724B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011267390 2011-12-06
JP2012230129A JP6068085B2 (ja) 2011-12-06 2012-10-17 エッチングマスク用組成物およびパターン形成方法

Publications (2)

Publication Number Publication Date
TW201339236A TW201339236A (zh) 2013-10-01
TWI580724B true TWI580724B (zh) 2017-05-01

Family

ID=49038116

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101143091A TWI580724B (zh) 2011-12-06 2012-11-19 Composition for etching mask and pattern forming method

Country Status (2)

Country Link
JP (1) JP6068085B2 (ja)
TW (1) TWI580724B (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116426170B (zh) * 2022-01-04 2024-12-27 新应材股份有限公司 树脂组成物、抗蚀刻层以及蚀刻方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200937127A (en) * 2007-11-12 2009-09-01 Rohm & Haas Elect Mat Coating compositions for use with an overcoated photoresist
TW201042384A (en) * 2009-04-24 2010-12-01 Nippon Steel Chemical Co Photosensitive resin composition, cured film, and seperator

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH063802B2 (ja) * 1986-02-24 1994-01-12 富士写真フイルム株式会社 半導体基板表面保護剤
JP2507936B2 (ja) * 1986-09-18 1996-06-19 日本合成ゴム株式会社 集積回路の製造方法
JPH0813948B2 (ja) * 1988-05-18 1996-02-14 東洋インキ製造株式会社 印刷インキ
JP3214175B2 (ja) * 1993-07-19 2001-10-02 ジェイエスアール株式会社 保護膜材料溶液
JP2004029840A (ja) * 2003-07-24 2004-01-29 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物、感光性膜付基板およびレジストパターンの形成方法
JP2007505487A (ja) * 2003-09-09 2007-03-08 シーエスジー ソーラー アクチェンゲゼルシャフト 有機樹脂材料に開口部を形成する方法の改良
DE102005039479B3 (de) * 2005-08-18 2007-03-29 Infineon Technologies Ag Halbleiterbauteil mit gedünntem Halbleiterchip und Verfahren zur Herstellung des gedünnten Halbleiterbauteils
JP2008034543A (ja) * 2006-07-27 2008-02-14 Kyocera Corp 光電変換素子およびその製造方法
JP5507039B2 (ja) * 2007-05-28 2014-05-28 ＡｚエレクトロニックマテリアルズＩｐ株式会社 高精細印刷用光硬化性インキ組成物、およびそれを用いた電子部品の製造法
JP2010254917A (ja) * 2009-04-28 2010-11-11 Hitachi Chem Co Ltd レジストインキおよびそれを用いたレジストパターンの形成方法
MY163052A (en) * 2009-10-30 2017-08-15 Merck Patent Gmbh Process For The Production Of Solar Cells Comprising A Selective Emitter

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200937127A (en) * 2007-11-12 2009-09-01 Rohm & Haas Elect Mat Coating compositions for use with an overcoated photoresist
TW201042384A (en) * 2009-04-24 2010-12-01 Nippon Steel Chemical Co Photosensitive resin composition, cured film, and seperator

Also Published As

Publication number Publication date
JP6068085B2 (ja) 2017-01-25
TW201339236A (zh) 2013-10-01
JP2013140943A (ja) 2013-07-18

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MM4A Annulment or lapse of patent due to non-payment of fees