TWI541616B - Objective lens support device and lithography machine - Google Patents
Objective lens support device and lithography machine Download PDFInfo
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- TWI541616B TWI541616B TW103145771A TW103145771A TWI541616B TW I541616 B TWI541616 B TW I541616B TW 103145771 A TW103145771 A TW 103145771A TW 103145771 A TW103145771 A TW 103145771A TW I541616 B TWI541616 B TW I541616B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/80—Etching
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
本發明係關於光刻機，特別係關於一種物鏡支撐裝置及光刻機。 The present invention relates to a lithography machine, and more particularly to an objective lens support device and a lithography machine.
光刻機系統在工作過程中，工件台和光罩台分別以投影物鏡的兩面一軸(物面、焦面和光軸)為基準，在控制系統的驅動下，按要求的精度實現工件台與光罩台之間的相對位置以及兩者相對物鏡的位置。由於光刻機具有高定位精度、高同步運動精度的特點，任何外界振動的傳入和內部振動的干擾，都會引起兩者之間或者兩者相對物鏡位置的短暫錯位，這將會嚴重影響光刻品質。引起系統內部微振動並引發錯位的主要因素有地基振動的傳入，步進或者掃描過程中產生的反作用力和力矩以及內部世界(包括：氣液管路和氣膜的振動)和外部世界的隨機噪音等。為了消除各種振動因素對光刻機曝光品質的影響，就要對整機系統採取有效的隔振和減振措施。通常的解決辦法是設法將光刻機的曝光單元(主要包括照明系統、光罩台、物鏡和工件台)通過一套減振器同地基隔離開來，這樣就可以避免外界的振動通過地基傳給曝光單元。 In the working process of the lithography machine system, the workpiece table and the reticle table are respectively based on the two sides and one axis (object surface, focal plane and optical axis) of the projection objective lens, and the workpiece table and the reticle are realized according to the required precision under the driving of the control system. The relative position between the stages and the position of the opposite objective lens. Due to the high positioning accuracy and high synchronous motion accuracy of the lithography machine, any external vibration and internal vibration interference will cause a temporary misalignment between the two or the objective lens position, which will seriously affect the light. Engraved quality. The main factors causing micro-vibration inside the system and causing misalignment are the introduction of ground-based vibration, the reaction forces and moments generated during stepping or scanning, and the internal world (including: gas-liquid pipeline and gas film vibration) and the external world. Noise, etc. In order to eliminate the influence of various vibration factors on the exposure quality of the lithography machine, it is necessary to take effective vibration isolation and vibration reduction measures for the whole system. The usual solution is to try to isolate the exposure unit of the lithography machine (mainly including the illumination system, the reticle stage, the objective lens and the workpiece stage) from the foundation through a set of dampers, so as to avoid external vibrations passing through the foundation. Give the exposure unit.
隨著大型積體電路器件積體度的提高，光刻工作解析度要求愈來愈高，即要求光刻機曝光系統的穩定性、測量系統的準確性和運動平臺的精度也得愈來愈高，同時工作波長也愈來愈短。 進入奈米精度後，光刻解析度對振動的影響已相當敏感。投影物鏡作為光刻機中最精密部件及基準，對環境振動的要求非常苛刻，通過減振器實現的單級減振已不能滿足其性能需求。 With the increase of the integrated body of large integrated circuit devices, the resolution of lithography work is getting higher and higher, that is, the stability of the exposure system of the lithography machine, the accuracy of the measurement system, and the accuracy of the motion platform are also getting more and more. High, while the working wavelength is getting shorter and shorter. After entering the nanometer precision, the resolution of the lithography is quite sensitive to the effects of vibration. As the most precise part and benchmark in the lithography machine, the projection objective lens is very demanding on environmental vibration. The single-stage vibration reduction achieved by the damper can no longer meet its performance requirements.
通常情況下，物鏡通過不銹鋼塊支撐在主基板上，物鏡上設有安裝凸緣，凸緣垂向設置在靠近物鏡重心處，不銹鋼塊一端安裝在凸緣面上，另一端與主基板連接，實現物鏡的支撐。由於佈局空間、機械結構或其他原因限制，物鏡安裝凸緣垂向安裝面不能完全與物鏡重心等高，物鏡整體一、二階振型(或前六階振型之二)表現為以凸緣安裝面為中心整體繞水平向(X方向或Y方向)轉動。 Usually, the objective lens is supported on the main substrate by a stainless steel block, and the objective lens is provided with a mounting flange. The flange is vertically disposed near the center of gravity of the objective lens, and one end of the stainless steel block is mounted on the flange surface, and the other end is connected to the main substrate. Realize the support of the objective lens. Due to the limitation of layout space, mechanical structure or other reasons, the vertical mounting surface of the objective lens mounting flange cannot be completely equal to the center of gravity of the objective lens. The first and second modes of the objective lens (or the second six-order mode) are flange mounted. The surface is rotated centrally in the horizontal direction (X direction or Y direction).
因此，無論採用柔性或剛性連接的方法，僅在凸緣安裝面處將物鏡與主基板連接，都不可避免的造成物鏡整體一階振型表現為繞水平向(X方向或Y方向)轉動，使物鏡頂端、中心、底端間的位移響應產生動態差值，危害物鏡動態穩定性，影響曝光精度。 Therefore, regardless of the flexible or rigid connection method, connecting the objective lens to the main substrate only at the flange mounting surface inevitably causes the first-order mode shape of the objective lens to rotate in a horizontal direction (X direction or Y direction). The displacement response between the top, center and bottom of the objective lens produces a dynamic difference, which jeopardizes the dynamic stability of the objective lens and affects the exposure accuracy.
本發明提供一種物鏡支撐裝置及光刻機，用於消除以物鏡凸緣安裝面為中心整體繞水平向轉動模態振型。 The invention provides an objective lens supporting device and a lithography machine for eliminating a rotating mode vibration mode around a lens flange mounting surface as a whole.
為解決上述技術問題，本發明提供一種用於光刻機的物鏡支撐裝置，上述光刻機包括一物鏡系統和內部框架，上述內部框架包括一主基板，上述物鏡系統安裝在主基板上，上述物鏡系統包括物鏡主體和物鏡凸緣，其中，上述物鏡支撐裝置包括：一個或多個垂向設置的主支撐裝置和一個或多個水平向設置的輔助支撐裝置；其中，每個上述主支撐裝置的一端與物鏡凸緣相連，另一端 安裝在主基板上；每個上述輔助支撐裝置的一端與物鏡主體連接，另一端安裝在上述內部框架上。 In order to solve the above technical problem, the present invention provides an objective lens supporting device for a lithography machine, the lithography machine comprising an objective lens system and an inner frame, the inner frame includes a main substrate, and the objective lens system is mounted on the main substrate, The objective lens system includes an objective lens body and an objective lens flange, wherein the objective lens support device includes: one or more vertically disposed main support devices and one or more horizontally disposed auxiliary support devices; wherein each of the main support devices One end is connected to the objective lens flange and the other end Mounted on the main substrate; one end of each of the above auxiliary supporting devices is connected to the objective lens main body, and the other end is mounted on the inner frame.
較佳為，上述主支撐裝置為剛性支撐或柔性支撐。 Preferably, the main support device is a rigid support or a flexible support.
較佳為，上述物鏡支撐裝置包括1組或3至6組上述主支撐裝置。 Preferably, the objective lens supporting device includes one set or three to six sets of the above main support means.
較佳為，上述3至6組主支撐裝置與物鏡凸緣的安裝面垂向在同一高度。 Preferably, the above-mentioned 3 to 6 sets of main support means are perpendicular to the mounting surface of the objective lens flange at the same height.
較佳為，上述內部框架還包括測量支架和光罩台支架，每個上述輔助支撐裝置的另一端通過連接件安裝在主基板、測量支架或光罩台支架上。 Preferably, the inner frame further includes a measuring bracket and a reticle stage bracket, and the other end of each of the auxiliary supporting devices is mounted on the main substrate, the measuring bracket or the reticle stage bracket by a connecting member.
較佳為，上述輔助支撐裝置為剛性支撐或柔性支撐。 Preferably, the auxiliary support device is a rigid support or a flexible support.
較佳為，上述輔助支撐裝置包含柔性鉸鏈。 Preferably, the auxiliary support device comprises a flexible hinge.
較佳為，上述輔助支撐裝置為1組或3至6組。 Preferably, the auxiliary support device is one set or three to six sets.
較佳為，上述3至6組輔助支撐裝置垂向在同一高度。 Preferably, the above 3 to 6 sets of auxiliary support devices are vertically at the same height.
較佳為，上述主支撐裝置與輔助支撐裝置之間滿足下式：
較佳為，上述輔助支撐裝置位於上述主支撐裝置正上方。 Preferably, the auxiliary support device is located directly above the main support device.
較佳為，上述物鏡支撐裝置還包括分別位於上述主支撐裝置和輔助支撐裝置一側的阻尼器。 Preferably, the objective lens supporting device further includes a damper on a side of the main supporting device and the auxiliary supporting device, respectively.
本發明還提供了採用上述物鏡支撐裝置的光刻機。 The present invention also provides a lithography machine using the above objective lens supporting device.
與現有技術相比，本發明具有以下優點：1.在物鏡凸緣處及物鏡主體處分別設置主支撐裝置和輔助支撐裝置，從而消除以物鏡凸緣安裝面為中心整體繞水平向轉動模態振型，提高各階振型的模態頻率值，縮減物鏡頂端、中心、底端間的位移響應差值，提高曝光精度；2.輔助支撐裝置與主支撐裝置共存可以避免物鏡重量造成的柔性支撐結構應力集中，降低結構應力，提高疲勞壽命；3.結構簡單，適用於各種機型的光刻機，並且方便對現有機型光刻機物鏡安裝方式進行改造。 Compared with the prior art, the present invention has the following advantages: 1. The main supporting device and the auxiliary supporting device are respectively disposed at the objective lens flange and the objective lens main body, thereby eliminating the overall horizontal rotation mode centering on the objective lens flange mounting surface. The vibration mode improves the modal frequency value of each mode, reduces the displacement response difference between the top, center and bottom of the objective lens, and improves the exposure accuracy. 2. The auxiliary support device coexists with the main support device to avoid the flexible support caused by the objective lens weight. Structural stress concentration, reduce structural stress, improve fatigue life; 3. Simple structure, suitable for various types of lithography machines, and easy to modify the installation method of the existing model lithography machine objective lens.
100‧‧‧光刻機 100‧‧‧lithography machine
101‧‧‧主支撐裝置 101‧‧‧Main support device
102‧‧‧輔助支撐裝置 102‧‧‧Auxiliary support device
103‧‧‧物鏡主體 103‧‧‧ Objective body
104‧‧‧物鏡凸緣 104‧‧‧ objective lens flange
105‧‧‧阻尼器 105‧‧‧damper
106‧‧‧連接件 106‧‧‧Connecting parts
107‧‧‧主基板 107‧‧‧Main substrate
108‧‧‧減振器 108‧‧‧ Shock Absorber
109‧‧‧基礎框架 109‧‧‧Basic Framework
200‧‧‧光刻機 200‧‧‧lithography machine
201‧‧‧主支撐裝置 201‧‧‧Main support device
202‧‧‧輔助支撐裝置 202‧‧‧Auxiliary support device
203‧‧‧物鏡主體 203‧‧‧ objective body
204‧‧‧物鏡凸緣 204‧‧‧ objective lens flange
205‧‧‧阻尼器 205‧‧‧damper
206‧‧‧連接件 206‧‧‧Connecting parts
207‧‧‧主基板 207‧‧‧Main substrate
208‧‧‧減振器 208‧‧‧ Shock Absorber
209‧‧‧主基板支架 209‧‧‧Main substrate holder
圖1為實施例1中物鏡支撐裝置安裝在分體框架式光刻機上的結構示意圖。 1 is a schematic view showing the structure of an objective lens supporting device mounted on a split frame type lithography machine in Embodiment 1.
圖2為實施例1中主支撐裝置和輔助支撐裝置的垂向位置示意圖。 2 is a schematic view showing the vertical position of the main supporting device and the auxiliary supporting device in the first embodiment.
圖3為實施例1中物鏡支撐裝置與物鏡主體重心垂向距離示意圖。 3 is a schematic view showing the vertical distance between the objective lens supporting device and the center of gravity of the objective lens body in the first embodiment.
圖4為實施例1中物鏡主支撐水平向位置示意圖。 4 is a schematic view showing the horizontal position of the main support of the objective lens in Embodiment 1.
圖5為實施例1中物鏡輔助支撐水平向位置示意圖。 Fig. 5 is a schematic view showing the horizontal position of the objective lens auxiliary support in the first embodiment.
圖6為實施例2中物鏡支撐裝置安裝在整體框架式光刻機上的結構示意圖。 Fig. 6 is a schematic view showing the structure of the objective lens supporting device mounted on the integral frame type lithography machine in the second embodiment.
為使本發明的上述目的、特徵和優點能夠更加明顯易懂，下面結合附圖對本發明的具體實施方式做詳細的說明。需說明的是，本發明附圖均採用簡化的形式且均使用非精準的比例，僅用以方便、明晰地輔助說明本發明實施例的目的。 The above described objects, features and advantages of the present invention will become more apparent from the aspects of the appended claims. It should be noted that the drawings of the present invention are in a simplified form and both use non-precise proportions, and are merely for convenience and clarity to assist the purpose of the embodiments of the present invention.
以圖1所示的分體框架式光刻機100為例，上述光刻機100放置在地基上，包括照明系統、投影物鏡、工件台、光罩台等主要部件，由於本發明主要涉及物鏡的支撐裝置，為簡單起見，圖中省略了照明系統、工件台、光罩台等部件，然而這並不影響本領域技術人員理解本發明。如圖1所示，主基板107通過減振器108安裝在基礎框架109上，投影物鏡安裝在主基板107上，投影物鏡包括物鏡主體103和物鏡凸緣104。在本實施例的分體框架式光刻機100中，工件台(圖中未示出)和主基板107採用不同的減振器支撐，本實施例中採用減振器108支撐主基板107。請結合參閱圖2至圖5，本發明的物鏡支撐裝置，包括一個或多個垂向(Z方向)設置的主支撐裝置101和一個或多個水平向(XY平面內)設置的輔助支撐裝置102，其中，每個上述主支撐裝置101的一端與物鏡凸緣104相連，另一端安裝在主基板107上；每個上述輔助支撐裝置102的一端與物鏡主體103連接，另一端安裝在內部框架上，具體為主基板107、測量支架、光罩台或內部框架的其他位置；本實施例中，上述輔助支撐裝置102的另一端通過連接件106安裝在主基板107上。本發明的物鏡支撐裝置將主支撐裝置101和輔助支撐裝置102分別安裝在物鏡凸緣104處 和物鏡主體103處，可以消除以物鏡凸緣104安裝面為中心整體繞水平向(X方向或Y方向)轉動模態振型，提高各階振型的模態頻率值，縮減物鏡主體103頂端、中心、底端間的位移響應差值，提高曝光精度。 Taking the split frame lithography machine 100 shown in FIG. 1 as an example, the lithography machine 100 is placed on a foundation, and includes main components such as an illumination system, a projection objective lens, a workpiece stage, a reticle stage, etc., since the present invention mainly relates to an objective lens. The support device, for the sake of simplicity, illuminates the components of the illumination system, the workpiece table, the reticle stage, etc., but this does not affect the understanding of the present invention by those skilled in the art. As shown in FIG. 1, the main substrate 107 is mounted on a base frame 109 by a damper 108 mounted on a main substrate 107, which includes an objective lens main body 103 and an objective lens flange 104. In the split frame lithography machine 100 of the present embodiment, the workpiece stage (not shown) and the main substrate 107 are supported by different dampers. In the present embodiment, the damper 108 is used to support the main substrate 107. Referring to FIG. 2 to FIG. 5 together, the objective lens supporting device of the present invention comprises one or more main support devices 101 arranged in the vertical (Z direction) and one or more auxiliary support devices disposed in the horizontal direction (in the XY plane). 102, wherein one end of each of the main supporting devices 101 is connected to the objective lens flange 104, and the other end is mounted on the main substrate 107; one end of each of the auxiliary supporting devices 102 is connected to the objective lens main body 103, and the other end is mounted on the inner frame. In the embodiment, the other end of the auxiliary supporting device 102 is mounted on the main substrate 107 via the connecting member 106. The objective lens supporting device of the present invention mounts the main supporting device 101 and the auxiliary supporting device 102 at the objective lens flange 104, respectively. And the objective lens main body 103 can eliminate the rotational mode shape of the entire horizontal direction (X direction or Y direction) centering on the mounting surface of the objective lens flange 104, improve the modal frequency value of each mode shape, and reduce the top end of the objective lens body 103, The displacement response difference between the center and the bottom end improves the exposure accuracy.
請繼續參照圖1至圖5，主支撐裝置101可為剛性支撐或柔性支撐，上述主支撐裝置101為1組或3至6組，上述3至6組主支撐裝置101與物鏡凸緣104的安裝面垂向在同一高度。同樣地，輔助支撐裝置102也可為剛性支撐或柔性支撐，由單組實現或3至6組組合實現，3至6組輔助支撐裝置102垂向在同一高度。較佳地，輔助支撐裝置102的組數與主支撐裝置101的組數相同且設置位置相應。 1 to 5, the main supporting device 101 may be a rigid support or a flexible support, and the main supporting device 101 is a group or a group of 3 to 6, and the above-mentioned 3 to 6 sets of the main supporting device 101 and the objective lens flange 104 The mounting faces are perpendicular to the same height. Likewise, the auxiliary support device 102 can also be a rigid support or a flexible support, implemented as a single set or as a combination of 3 to 6 sets, with 3 to 6 sets of auxiliary support devices 102 being vertically at the same height. Preferably, the number of sets of the auxiliary support devices 102 is the same as the number of sets of the main support device 101 and the set positions are corresponding.
具體地，請參照圖4及圖5，並結合圖1，在本實施例中，物鏡凸緣104與主基板107之間採用三組主支撐裝置101連接，三組主支撐裝置101均勻排布在物鏡主體103外周，且相對於物鏡主體103的中心軸兩兩呈120°角分佈。物鏡主體103與主基板107之間採用三組輔助支撐裝置102連接，三組輔助支撐裝置102的延伸線重合於位於物鏡主體103的中心軸上的一點，且兩兩呈120°角分佈，輔助支撐裝置102位於主支撐裝置101正上方。進一步的，輔助支撐裝置102中帶有柔性鉸鏈結構，保證其在水平方向有較大剛度，垂向剛度則儘量小。通常，輔助支撐裝置102垂向(Z方向)總剛度(即所有的輔助支撐裝置102的Z方向剛度之和)小於水平向總剛度，通常小於108N/m，可以避免內部框架的振動向物鏡主體103傳遞。 Specifically, referring to FIG. 4 and FIG. 5, and in conjunction with FIG. 1, in the embodiment, the objective lens flange 104 and the main substrate 107 are connected by three sets of main supporting devices 101, and the three sets of main supporting devices 101 are evenly arranged. The outer circumference of the objective lens main body 103 is distributed at an angle of 120° with respect to the central axis of the objective lens main body 103. The objective lens main body 103 and the main substrate 107 are connected by three sets of auxiliary supporting devices 102. The extension lines of the three sets of auxiliary supporting devices 102 are coincident with a point on the central axis of the objective lens main body 103, and the two are distributed at an angle of 120°. The support device 102 is located directly above the main support device 101. Further, the auxiliary support device 102 has a flexible hinge structure to ensure a large rigidity in the horizontal direction and a vertical stiffness as small as possible. In general, the vertical (Z-direction) total stiffness of the auxiliary support device 102 (i.e., the sum of the Z-direction stiffness of all of the auxiliary support devices 102) is less than the horizontal total stiffness, typically less than 10 8 N/m, to avoid vibration of the internal frame. The objective lens main body 103 is delivered.
請重點參照圖3，設主支撐裝置101的X方向總剛度(即所有的主支撐裝置101的X方向剛度之和)為K x1 ，物鏡凸緣104的安裝面，即物鏡凸緣104的底部所在的平面，與物鏡主體103重心O垂
向距離為l 1 ，輔助支撐裝置102的X方向總剛度(即所有的輔助支撐裝置102的X方向剛度之和)為K x2 ，輔助支撐裝置102與物鏡主體103重心O垂向距離為l 2 ，滿足以下條件：
請參照圖1，較佳的，為避免與主支撐裝置101和輔助支撐裝置102的固有頻率相近的振動頻率引起主支撐裝置101或輔助支撐裝置102的共振，對隔振產生的影響，上述主支撐裝置101和輔助支撐裝置102的一側還分別設置有阻尼器105。 Referring to FIG. 1, preferably, in order to avoid the resonance of the main support device 101 or the auxiliary support device 102 caused by the vibration frequency close to the natural frequencies of the main support device 101 and the auxiliary support device 102, the influence on the vibration isolation is as described above. One side of the support device 101 and the auxiliary support device 102 is also provided with a damper 105, respectively.
採用傳統物鏡支撐裝置與採用本實施例物鏡支撐裝置的投影物鏡的隨機響應計算結果比較如表1所示：
如圖6所示，本實施例中以整體框架式光刻機200為例，其工件台和主基板207採用相同的減振器208支撐。圖6中與圖1相同的部件採用相似的符號表示。 As shown in FIG. 6, in the embodiment, the integral frame type lithography machine 200 is taken as an example, and the workpiece stage and the main substrate 207 are supported by the same damper 208. The same components in Fig. 6 as those in Fig. 1 are denoted by like symbols.
與實施例1相同，物鏡支撐裝置包括：一個或多個垂向設置的主支撐裝置201和一個或多個水平向設置的輔助支撐裝置202，其中，上述主支撐裝置201的一端與物鏡凸緣204相連，另一端安裝在主基板207上；上述輔助支撐裝置202的一端與物鏡主體203連接，另一端通過連接件206安裝在內部框架上，具體為主基板、測量支架、光罩台或內部框架的其他位置。由於本實施例中物鏡支撐裝置的作用與實施例1相同，此處不再贅述。 As in Embodiment 1, the objective lens supporting device includes: one or more vertically disposed main supporting devices 201 and one or more horizontally disposed auxiliary supporting devices 202, wherein one end of the main supporting device 201 and the objective lens flange 204 is connected, and the other end is mounted on the main substrate 207; one end of the auxiliary supporting device 202 is connected to the objective lens main body 203, and the other end is mounted on the inner frame through the connecting member 206, specifically as a main substrate, a measuring bracket, a photomask table or an inner portion. Other locations of the frame. Since the function of the objective lens supporting device in this embodiment is the same as that of the first embodiment, it will not be described herein.
綜上所述，本發明的物鏡支撐裝置，安裝在光刻機上，包括：主支撐裝置和輔助支撐裝置；其中，上述主支撐裝置的一端與物鏡凸緣相連，上述主支撐裝置的另一端安裝在主基板上；上述輔助支撐裝置的一端與物鏡主體連接，上述輔助支撐裝置的另一端安裝在內部框架上。本發明的物鏡支撐裝置，通過在物鏡凸緣處及物鏡主體處分別設置主支撐裝置和輔助支撐裝置，從而消除以物鏡凸緣安裝面為中心整體繞水平向(X方向或Y方向)轉動模態 振型，提高各階振型的模態頻率值，縮減物鏡頂端、中心、底端間的位移響應差值，提高曝光精度。還可以避免物鏡重量造成的柔性支撐結構應力集中，降低結構應力，提高疲勞壽命。此外本發明的結構簡單，適用於各種機型的光刻機，並且方便對現有機型光刻機物鏡安裝方式進行改造。 In summary, the objective lens supporting device of the present invention is mounted on a lithography machine, comprising: a main supporting device and an auxiliary supporting device; wherein one end of the main supporting device is connected to the objective lens flange, and the other end of the main supporting device Mounted on the main substrate; one end of the auxiliary support device is connected to the objective lens main body, and the other end of the auxiliary support device is mounted on the inner frame. In the objective lens supporting device of the present invention, the main supporting device and the auxiliary supporting device are respectively disposed at the objective lens flange and the objective lens main body, thereby eliminating the entire horizontal (X-direction or Y-direction) rotational mode centering on the objective lens flange mounting surface. state The vibration mode improves the modal frequency value of each mode shape, reduces the displacement response difference between the top, center and bottom ends of the objective lens, and improves the exposure accuracy. It can also avoid the stress concentration of the flexible support structure caused by the weight of the objective lens, reduce the structural stress and improve the fatigue life. In addition, the invention has simple structure, is suitable for various types of lithography machines, and is convenient for modifying the installation mode of the objective lens of the existing model lithography machine.
顯然，本領域的技術人員可以對發明進行各種改動和變型而不脫離本發明的精神和範圍。這樣，倘若本發明的這些修改和變型屬於本發明申請專利範圍及其等同技術的範圍之內，則本發明也意圖包括這些改動和變型在內。 It will be apparent to those skilled in the art that various modifications and variations can be made in the invention without departing from the spirit and scope of the invention. Thus, it is intended that the present invention cover the modifications and variations of the inventions
101‧‧‧光刻機 101‧‧‧lithography machine
102‧‧‧輔助支撐裝置 102‧‧‧Auxiliary support device
103‧‧‧物鏡主體 103‧‧‧ Objective body
104‧‧‧物鏡凸緣 104‧‧‧ objective lens flange
105‧‧‧阻尼器 105‧‧‧damper
106‧‧‧連接件 106‧‧‧Connecting parts
107‧‧‧主機板 107‧‧‧ motherboard
108‧‧‧減振器 108‧‧‧ Shock Absorber
109‧‧‧基礎框架 109‧‧‧Basic Framework
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| CN201310752319.5A CN104749904B (en) | 2013-12-31 | 2013-12-31 | Object lens support meanss and litho machine |
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| TW201531814A TW201531814A (en) | 2015-08-16 |
| TWI541616B true TWI541616B (en) | 2016-07-11 |
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| CN (1) | CN104749904B (en) |
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| CN105425354B (en) * | 2015-12-21 | 2018-11-02 | 中国工程物理研究院应用电子学研究所 | A kind of hard and soft combined support isolation mounting for optical transmission system |
| CN106931290B (en) * | 2015-12-30 | 2019-01-29 | 上海微电子装备（集团）股份有限公司 | A kind of vibration insulating system and its adjusting method |
| CN111380464B (en) * | 2018-12-28 | 2021-05-07 | 上海微电子装备（集团）股份有限公司 | Installation device and installation method of grating ruler, grating measurement system and photoetching machine |
| CN111692994B (en) * | 2020-06-02 | 2021-06-22 | 中国科学院西安光学精密机械研究所 | An angle measuring device assembly structure and method |
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| JP3031947B2 (en) * | 1990-04-12 | 2000-04-10 | キヤノン株式会社 | Exposure equipment |
| JP3493682B2 (en) * | 1993-04-14 | 2004-02-03 | 株式会社ニコン | Barrel support device and exposure device |
| JP2003318080A (en) * | 2002-04-22 | 2003-11-07 | Hitachi High-Technologies Corp | Electron beam lithography system |
| US6977713B2 (en) * | 2003-12-08 | 2005-12-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7545478B2 (en) | 2004-05-05 | 2009-06-09 | Asml Netherlands B.V. | Lithographic apparatus, thermal conditioning system, and method for manufacturing a device |
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| CN101042539A (en) * | 2006-12-22 | 2007-09-26 | 上海微电子装备有限公司 | Hanger bearing image-forming system and light scribing device |
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