TWI503869B - Chamber components and chemical vapor deposition equipment containing their organic compounds - Google Patents

Description

Chamber assembly and metal organic compound chemical vapor deposition device containing same

The present invention relates to the field of semiconductor technology, and more particularly to a chamber assembly and a metal organic compound chemical vapor deposition apparatus comprising the same.

MOCVD (Metal-organic Chemical Vapor Deposition) equipment is a key device for the production of LED epiwafers. The operating principle of the MOCVD apparatus is that an organometallic gas enters the reaction chamber, a high temperature chemical reaction occurs on the surface of the high temperature substrate, and a thin film is deposited on the surface of the substrate. By adjusting the process gas and process time, various films can be deposited on the LED substrate sheet using MOCVD equipment, including a multi-quantum well structure that determines the LED's luminescent properties. In the process of depositing multiple quantum wells, in order to ensure the uniformity of the film, the temperature uniformity of the surface of the substrate is generally required to be extremely high. Therefore, how to improve the uniformity of the surface temperature of the substrate is a technical problem faced by those skilled in the art.

A chamber assembly according to an embodiment of an aspect of the present invention includes: a chamber outer cylinder surrounding an outer cylinder chamber; an induction coil disposed around an outer side of the chamber outer cylinder; and a graphite sleeve, The graphite sleeve is sleeved in an outer cylinder cavity of the chamber outer cylinder.

According to the chamber assembly of the embodiment of the present invention, a graphite sleeve is disposed between the tray and the induction coil. Since the graphite sleeve is closer to the induction coil than the tray, the graphite sleeve is inductively heated by the induction coil before the tray, thus The graphite sleeve can form a hot wall around the tray, so that the tray is very easy to be heated and insulated, thereby improving the induction heating efficiency of the tray.

In addition, the chamber assembly according to the embodiment of the present invention further has the following additional technical feature: the chamber assembly further includes an intra-chamber cylinder that is sleeved in the outer cylinder chamber of the chamber outer cylinder to The outer cylinder cavity is divided into an annular space between the inner cylinder and the outer cylinder of the chamber and an inner cylinder formed by the inner cylinder, wherein the graphite sleeve is disposed in the annular space.

According to the chamber assembly of the embodiment of the invention, by providing the inner cylinder, an annular space can be formed in the reaction chamber, thereby easily shielding and sealing the graphite sleeve disposed in the annular space, that is, the graphite sleeve and the graphite sleeve The process gas in the inner cylinder of the reaction chamber is isolated to prevent the graphite sleeve from being oxidized in the process gas or air.

In one embodiment of the invention, the chamber assembly further includes a cooling device disposed in the annular space for cooling the graphite sleeve.

Alternatively, the graphite sleeve includes a plurality of sub-graphite graphite sleeves disposed in the annular space spaced apart from each other in the axial direction of the chamber outer cylinder to adjust temperature uniformity between the multi-layer trays.

Specifically, the cooling device includes a plurality of sub-cooling devices respectively corresponding to the multi-segment graphite sleeve to independently cool the multi-segment graphite sleeve to independently control the temperature of the multi-segment graphite sleeve.

According to the chamber assembly of the embodiment of the present invention, the temperature of the plurality of sub-graphite sleeves can be separately adjusted by using a plurality of sub-cooling devices that independently cool the plurality of sub-graphite sleeves, respectively, so that the multi-layer trays arranged along the axial direction of the chamber of the chamber can be arranged. The temperature between them is even.

Alternatively, the graphite sleeve comprises a three-segment graphite sleeve. Thereby, the three-stage graphite sleeve divides the temperature field of the reaction chamber provided with the multi-layer tray into upper, middle and lower regions, and is respectively adjusted by three sub-cooling devices corresponding thereto, thereby making the outdoor cavity The temperature between the multi-layer trays of the axial arrangement of the cylinder is uniform.

The chamber outer cylinder, the chamber inner cylinder and the graphite sleeve are coaxial.

The chamber assembly further includes an inflator and an exhaust device, wherein the inflator is disposed in the annular space for charging an inert gas into the annular space, and the exhaust device is disposed in the annular space for inerting Gas is discharged from the annular space.

According to the chamber assembly of the embodiment of the present invention, by providing the inflator and the exhaust device, the inert gas can be charged and discharged into the annular space, thereby preventing the graphite sleeve from being oxidized in the air or the process gas by the inert gas, thereby increasing The life of the chamber assembly.

The chamber outer cylinder and the chamber inner cylinder are made of a quartz material.

A metal organic compound chemical vapor deposition apparatus according to another embodiment of the present invention, comprising: a chamber assembly which is a chamber assembly according to an embodiment of the aspect of the invention; and a multi-layer tray The axial spacing of the outer barrel of the chamber assembly is disposed within the reaction chamber.

The additional features and advantages of the present invention will be set forth in part in the description in the description in Description

The embodiments of the present invention are described in detail below, and the examples of the embodiments are illustrated in the drawings, wherein the same or similar reference numerals are used for the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are intended to be illustrative, and are not to be construed as limiting.

In the description of the present invention, the orientations or positional relationships indicated by the terms "inside", "outside", "upper", "lower" and the like are based on the orientation or positional relationship shown in the drawings, and are merely for convenience of description of the present invention. The invention is not to be construed as being limited to the details of the invention.

A chamber assembly provided in accordance with an embodiment of the present invention is described below with reference to FIGS. 1 through 3. The chamber assembly provided by the embodiments of the present invention can be used in a metal organic chemical chemical vapor deposition apparatus to heat a tray carrying a substrate. Of course, the chamber assembly provided by the present invention is not limited thereto.

As shown in FIGS. 1 through 3, a chamber assembly 100 according to an embodiment of the present invention includes a chamber outer cylinder 1, an induction coil 2, and a graphite sleeve 3.

Specifically, the chamber outer cylinder 1 surrounds the outer cylinder chamber, wherein the outer cylinder chamber is preferably provided with a multi-layer tray 200 such as a graphite tray along its axial direction (ie, the upper and lower directions in FIG. 1), and adjacent thereto There is a certain spacing between the trays 200. The induction coil 2 is disposed outside the chamber outside the chamber 1 to inductively heat the multilayer tray 200. For example, the induction coil 2 may surround the outer wall of the chamber 1 , but the present invention is not limited thereto, and the induction coil 2 may not be in contact with the outer wall of the chamber 1 . The induction coil 2 is preferably connected to a medium to high frequency RF power source to produce a magnetic field that changes over time. The graphite sleeve 3 is sleeved in an outer cylinder cavity formed by the outer chamber 1 of the chamber.

According to the chamber assembly 100 provided by the embodiment of the present invention, since the graphite sleeve 3 is disposed between the tray 200 and the induction coil 2, the graphite sleeve 3 is closer to the induction coil 2 than the tray 200. In this way, the graphite sleeve 3 is inductively heated by the induction coil 2 prior to the tray 200, so that a hot wall can be formed around the tray 200, so that the tray 200 is very easily heated and insulated, thereby improving the tray 200. And the induction heating efficiency of the substrate carried by it.

A chamber assembly 100 in accordance with one embodiment of the present invention is described below with reference to FIGS. 2 and 3. As shown in FIG. 2 and FIG. 3, the chamber assembly 100 according to this embodiment of the present invention further includes an intraluminal cylinder 4 which is sleeved in an outer cylinder cavity formed by the chamber outer cylinder 1 to The chamber is divided into two parts: an annular space 5 between the chamber inner cylinder 4 and the chamber outer cylinder 1 and an inner cylinder chamber 40 formed by the chamber inner cylinder 4. Among them, the graphite sleeve 3 is disposed in the annular space 5; the multi-layer tray 200 is placed in the inner cylinder chamber 40 serving as a reaction chamber to inductively heat the multilayer tray 200 such as a graphite tray by the induction coil 2.

The graphite sleeve 3 disposed in the annular space 5 is shielded by providing the intracavity inner cylinder 4 in the outer cylinder chamber, thereby sealing the graphite sleeve 3 in the annular space 5, thereby reacting the graphite sleeve 3 with The process gas within the inner barrel 40 of the chamber is isolated, thereby preventing the graphite sleeve 3 from being oxidized in the process gas or air. For example, the upper cover 7 and the lower cover 8 may be respectively disposed on the upper surface and the lower surface of the chamber 1 and the inner cylinder 4 and the annular space 5 may be sealed by the inner cylinder 4, respectively. The graphite sleeve 3 is sealed in the annular space 5. Of course, it will be understood by those of ordinary skill in the art that the inner barrel 40 and the annular space 5 can also be sealed by other means.

In a preferred embodiment of the present invention, the chamber outer cylinder 1, the chamber inner cylinder 4 and the graphite sleeve 3 are coaxial, so that the uniformity of the radiant heating of the graphite sleeve 3 for each layer of the tray 200 can be improved, thereby improving the tray. Uniformity of temperature distribution inside 200.

In some embodiments of the invention, the chamber outer cylinder 1 and the chamber inner cylinder 4 are made of a quartz material.

In some embodiments of the invention, to control the temperature of the graphite sleeve 3, the chamber assembly 100 further includes a cooling device 6 disposed within the annular space 5 for cooling the graphite sleeve 3. For example, the cooling device 6 may be a cooling water pipe that is wound around the outer wall of the graphite sleeve 3.

As shown in FIG. 1, the magnetic force line M distributed in the outer cylinder chamber by the magnetic field generated by the induction coil 2 can penetrate the graphite sleeve 3 along the axial direction of the chamber outer cylinder 1, and the magnetic field line M is in the entire process of penetrating the graphite sleeve 3. The portion of the atmosphere (or vacuum) that passes through is much smaller than the portion of the atmosphere (or vacuum) through which it passes through the multi-layer tray 200, so that most of the power for induction heating is consumed by the graphite sleeve 3, and only the rest A small portion of the power is consumed by the tray 200, i.e., the graphite sleeve 3 is rapidly heated, whereby the tray 200 is inductively heated while being affected by the magnetic field generated by the induction coil 2, and the radiation is radiated by the graphite sleeve 3 While being heated, and since the graphite sleeve 3 consumes most of the power of the induction heating, the temperature uniformity of the graphite sleeve 3 along the axial direction of the chamber 1 has the temperature uniformity between the multilayer trays 200 important influence.

Thereby, in order to adjust the temperature uniformity between the multi-layer trays 200, in some embodiments of the present invention, the graphite sleeve 3 may be provided in a plurality of stages, that is, the graphite sleeve 3 includes a plurality of sub-graphite sleeves, And the plurality of pieces of graphite sleeves are disposed in the annular space 5 at intervals from each other in the axial direction of the chamber (1, the upper and lower directions in FIG. 1).

Since the temperature between the plurality of sub-graphite sleeves after heating may be different, the temperature between the multi-layer trays 200 arranged along the axial direction of the chamber 1 may be different. Therefore, in an embodiment of the present invention, the cooling device 6 can also be arranged in a plurality of stages, that is, the cooling device 6 includes a plurality of sub-cooling devices that can be separately temperature-controlled, and the multi-stage sub-cooling device and the multi-segment graphite The sleeve corresponds to independently cooling the plurality of sub-graphite sleeves, thereby independently controlling the temperature of the plurality of sub-graphite sleeves, thereby independently adjusting the temperature of the region of the reaction chamber corresponding to each segment of the graphite sleeve.

By setting a multi-stage sub-cooling device capable of independent temperature control, the temperature of the multi-segment graphite sleeve corresponding thereto can be separately adjusted, thereby independently controlling the temperature of different regions in the reaction chamber corresponding to different sub-graphite sleeves, Further, the temperature between the multilayer trays 200 arranged in the axial direction of the chamber outside the chamber 1 is made uniform.

In one example of the present invention, as shown in FIG. 1, the graphite sleeve 3 includes a three-segment graphite sleeve, that is, includes an upper sub-graphite sleeve 31, a mid-segment graphite sleeve 32, and a lower sub-graphite sleeve 33. Wherein, in the annular space 5, the upper section graphite sleeve 31 is provided with an upper section cooling device 61 to control the temperature of the upper section graphite sleeve 31; and the middle section graphite sleeve 32 is provided with a middle section cooling device 62 for controlling the middle section graphite. The temperature of the sleeve 32; corresponding to the lower stage graphite sleeve 33 is provided with a lower stage cooling device 63 to control the temperature of the lower stage graphite sleeve 33. According to this, the temperature field in the reaction chamber provided with the multi-layer tray 200 can be divided into upper, middle and lower regions and can be separately adjusted, so that the multi-layer trays 200 arranged along the axial direction of the chamber outside the chamber 1 can be arranged. The temperature is even.

For example, when the temperatures of the upper sub-graphite sleeve 31 and the lower sub-graphite sleeve 33 are relatively low, the temperature of the middle-stage graphite sleeve 32 can be appropriately lowered by the middle-stage cooling device 62 to make the middle-stage graphite sleeve The temperature of 32 tends to coincide with the temperature of the upper sub-graphite sleeve 31 and the lower sub-graphite sleeve 33, thereby making the temperature between the upper sub-graphite sleeve 31, the middle-stage graphite sleeve 32 and the lower-stage graphite sleeve 33 uniform. Finally, the temperature in the axial direction of the chamber outside the chamber 1 is uniformly made so that the temperature of the multilayer tray 200 and the substrate carried therein along the axial direction of the chamber 1 are uniform.

In addition, the chamber assembly 100 according to the embodiment of the present invention can also change the magnetic field distribution in the reaction chamber by adjusting the density of the induction coil 2 along the axial direction of the chamber 1 to adjust the reaction chamber to some extent. The temperature distribution inside.

In another embodiment of the invention, the chamber assembly 100 further includes an inflator and an exhaust (not shown). Wherein, the inflator is disposed in the annular space 5 for filling the annular space 5 with an inert gas such as nitrogen, helium (He), neon (Ne), or argon (Ar); and the exhaust device is disposed in the annular space 5 For discharging the inert gas from the annular space 5. By providing an inflator and an exhaust device, an inert gas can be charged or discharged into the annular space 5 to prevent the graphite sleeve 3 from being oxidized in the air or the process gas by the inert gas, thereby increasing the chamber assembly 100. Service life.

A metal organic compound chemical vapor deposition (MOCVD) apparatus according to an embodiment of the present invention will be described below with reference to FIGS. 1 and 2.

A metal organic compound chemical vapor deposition apparatus according to an embodiment of the present invention is for processing an LED substrate and includes a chamber assembly 100 and a multi-layer tray 200, wherein the chamber assembly 100 is referred to the chamber assembly 100 described in the above embodiments. The multi-layer trays 200 are disposed in the reaction chamber along the axial direction of the chamber outer cylinder 1 of the chamber assembly 100 (i.e., the upper and lower directions in Fig. 1).

In an example of the present invention, in use, the LED substrate may not be placed on the uppermost tray and the lowermost tray in the multi-layer tray 200, thereby being more advantageous between the uppermost tray and the lowermost tray. Temperature uniformity of each tray and the substrate it carries.

According to the metal organic compound chemical vapor deposition apparatus of the embodiment of the present invention, in the axial direction of the chamber 1 (upper and lower directions in FIG. 1), the temperature distribution in the reaction chamber is uniform, and therefore, the multilayer tray 200 and its The temperature of the substrate sheet carried is also uniform, thereby improving the quality of the processed product.

The metal organic compound chemical vapor deposition apparatus shown in FIG. 1 is placed in the longitudinal direction. It should be understood that the present invention is not limited thereto. For example, as shown in FIG. 3, the metal organic compound chemical vapor deposition apparatus according to the embodiment of the present invention is also It may be placed horizontally, in which case the multi-layer trays 200 are arranged in the horizontal direction in the reaction chamber.

Other configurations and operations of the metal organic compound chemical vapor deposition apparatus according to embodiments of the present invention are known to those of ordinary skill in the art and will not be described in detail herein.

In the description of the present specification, the description of the terms "one embodiment", "some embodiments", "illustrative embodiment", "example", "specific example", or "some examples", etc. Particular features, structures, materials or features described in the examples or examples are included in at least one embodiment or example of the invention. In the present specification, the schematic representation of the above terms does not necessarily mean the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in a suitable manner in any one or more embodiments or examples.

While the embodiments of the present invention have been disclosed and described, it will be understood by those skilled in the art that the invention may be variously modified, modified, substituted and modified without departing from the spirit and scope of the invention. The scope is defined by the scope of the patent application and its equivalents.

1. . . Cavity tube

100. . . Chamber assembly

2. . . Induction coil

200. . . tray

3. . . Graphite sleeve

31. . . Upper section graphite sleeve

32. . . Middle section graphite sleeve

33. . . Lower section graphite sleeve

4. . . Chamber tube

40. . . Inner cylinder

5. . . Ring space

6. . . Cooling device

61. . . Upper section cooling unit

62. . . Middle section cooling unit

63. . . Lower section cooling device

7. . . Upper cover

8. . . lower lid

M. . . Magnetic line of force

1 is a schematic view of a metal organic compound chemical vapor deposition apparatus according to an embodiment of the present invention, in which a reaction tray of a chamber assembly is provided with a multi-layer tray.

2 is a top plan view of the metal organic compound chemical vapor deposition apparatus shown in FIG. 1.

3 is a schematic diagram of a metal organic compound chemical vapor deposition apparatus in which a multilayer tray is horizontally disposed within a reaction chamber of a chamber assembly, in accordance with one embodiment of the present invention.

1. . . Cavity tube

100. . . Chamber assembly

2. . . Induction coil

200. . . tray

3. . . Graphite sleeve

31. . . Upper section graphite sleeve

32. . . Middle section graphite sleeve

33. . . Lower section graphite sleeve

4. . . Chamber tube

40. . . Inner cylinder

5. . . Ring space

6. . . Cooling device

61. . . Upper section cooling unit

62. . . Middle section cooling unit

63. . . Lower section cooling device

7. . . Upper cover

8. . . lower lid

M. . . Magnetic line of force

Claims (9)

A metal organic compound chemical vapor deposition apparatus comprising: a chamber assembly, the chamber assembly comprising: a cavity outer cylinder surrounding the outer cylinder cavity; an induction coil, the induction coil surrounding the The outer side of the chamber is disposed outside; and a graphite sleeve is sleeved in the outer cylinder of the chamber, and the graphite sleeve is hollow cylindrical; the multi-layer tray is along the chamber The axial spacing of the outer barrel of the assembly is disposed within the reaction chamber. The metal organic compound chemical vapor deposition apparatus according to claim 1, wherein the chamber assembly further comprises an intracavity cylinder sleeved in the outer cylinder cavity of the chamber outer cylinder to The outer cylinder cavity is divided into an annular space between the inner cylinder and the outer cylinder of the chamber and an inner cylinder formed by the inner cylinder, wherein the graphite sleeve is disposed in the annular space. The metal organic compound chemical vapor deposition apparatus of claim 2, wherein the chamber assembly further comprises a cooling device disposed in the annular space for cooling the graphite sleeve. The metal organic compound chemical vapor deposition apparatus according to claim 3, wherein the graphite sleeve comprises a plurality of sub-graphite graphite sleeves, and the plurality of sub-graphite graphite sleeves are spaced apart from each other along an axial direction of the chamber outer cylinder. Inside the annular space. The metal organic compound chemical vapor deposition apparatus according to claim 4, wherein the cooling device comprises a multi-stage subcooling device, A plurality of sub-cooling devices respectively correspond to the multi-segment graphite sleeve to independently cool the multi-segment graphite sleeve, thereby independently controlling the temperature of the multi-segment graphite sleeve. The metal organic compound chemical vapor deposition apparatus of claim 5, wherein the graphite sleeve comprises a three-segment graphite sleeve. The metal organic compound chemical vapor deposition apparatus according to claim 2, wherein the chamber outer cylinder, the chamber inner cylinder and the graphite sleeve are coaxial. The metal organic compound chemical vapor deposition apparatus of claim 2, wherein the chamber assembly further comprises an inflator and an exhaust device, wherein the inflator is disposed in the annular space for the ring The space is filled with an inert gas, and the exhaust device is disposed in the annular space for discharging inert gas from the annular space. The metal organic compound chemical vapor deposition apparatus according to claim 2, wherein the chamber outer cylinder and the chamber inner cylinder are made of a quartz material.