TWI481638B - 二環戊烷并苯二噻吩及二環戊烷并二哂吩聚合物及其作為有機半導體之用途 - Google Patents
二環戊烷并苯二噻吩及二環戊烷并二哂吩聚合物及其作為有機半導體之用途 Download PDFInfo
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- TWI481638B TWI481638B TW098127633A TW98127633A TWI481638B TW I481638 B TWI481638 B TW I481638B TW 098127633 A TW098127633 A TW 098127633A TW 98127633 A TW98127633 A TW 98127633A TW I481638 B TWI481638 B TW I481638B
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- 229920000642 polymer Polymers 0.000 title claims description 109
- 239000004065 semiconductor Substances 0.000 title description 16
- NIKLLBFAZFYRTL-UHFFFAOYSA-N benzene;thiophene Chemical compound C=1C=CSC=1.C=1C=CSC=1.C1=CC=CC=C1 NIKLLBFAZFYRTL-UHFFFAOYSA-N 0.000 title 1
- -1 2,1,3-benzothiadiazole-4,7-diyl Chemical group 0.000 claims description 109
- 239000000203 mixture Substances 0.000 claims description 68
- 239000010410 layer Substances 0.000 claims description 57
- 239000000463 material Substances 0.000 claims description 43
- 125000004432 carbon atom Chemical group C* 0.000 claims description 32
- 125000000217 alkyl group Chemical group 0.000 claims description 29
- 239000002904 solvent Substances 0.000 claims description 26
- 125000003118 aryl group Chemical group 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 20
- 229910052801 chlorine Inorganic materials 0.000 claims description 19
- 238000002360 preparation method Methods 0.000 claims description 18
- 239000010408 film Substances 0.000 claims description 17
- 229910052731 fluorine Inorganic materials 0.000 claims description 16
- 239000000178 monomer Substances 0.000 claims description 15
- 238000012546 transfer Methods 0.000 claims description 15
- 229910052736 halogen Inorganic materials 0.000 claims description 13
- 150000002367 halogens Chemical class 0.000 claims description 13
- 229920002959 polymer blend Polymers 0.000 claims description 13
- 238000009472 formulation Methods 0.000 claims description 12
- 125000001072 heteroaryl group Chemical group 0.000 claims description 12
- 229910052739 hydrogen Inorganic materials 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 11
- 210000004027 cell Anatomy 0.000 claims description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Substances C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 9
- 238000013086 organic photovoltaic Methods 0.000 claims description 9
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 9
- 229910052794 bromium Inorganic materials 0.000 claims description 8
- 229910052740 iodine Inorganic materials 0.000 claims description 8
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 claims description 7
- 230000005669 field effect Effects 0.000 claims description 7
- 125000005842 heteroatom Chemical group 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 claims description 7
- 238000002347 injection Methods 0.000 claims description 6
- 239000007924 injection Substances 0.000 claims description 6
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 claims description 5
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 claims description 5
- 230000000903 blocking effect Effects 0.000 claims description 5
- 229920000547 conjugated polymer Polymers 0.000 claims description 5
- 125000004122 cyclic group Chemical group 0.000 claims description 5
- 230000027756 respiratory electron transport chain Effects 0.000 claims description 5
- 125000003860 C1-C20 alkoxy group Chemical group 0.000 claims description 4
- 239000004305 biphenyl Substances 0.000 claims description 4
- 239000003990 capacitor Substances 0.000 claims description 4
- 239000000470 constituent Substances 0.000 claims description 4
- 239000011229 interlayer Substances 0.000 claims description 4
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 4
- 229910052711 selenium Inorganic materials 0.000 claims description 4
- 239000011669 selenium Substances 0.000 claims description 4
- 125000004434 sulfur atom Chemical group 0.000 claims description 4
- 239000010409 thin film Substances 0.000 claims description 4
- 108091028043 Nucleic acid sequence Proteins 0.000 claims description 3
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 3
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 claims description 3
- 238000005801 aryl-aryl coupling reaction Methods 0.000 claims description 3
- 229910052698 phosphorus Inorganic materials 0.000 claims description 3
- 125000003107 substituted aryl group Chemical group 0.000 claims description 3
- 238000000018 DNA microarray Methods 0.000 claims description 2
- 125000005605 benzo group Chemical group 0.000 claims description 2
- 239000007772 electrode material Substances 0.000 claims description 2
- 210000004508 polar body Anatomy 0.000 claims description 2
- 239000005518 polymer electrolyte Substances 0.000 claims description 2
- 238000006467 substitution reaction Methods 0.000 claims description 2
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 claims 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 48
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 33
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 30
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 25
- 239000000243 solution Substances 0.000 description 23
- 238000005481 NMR spectroscopy Methods 0.000 description 19
- 235000019439 ethyl acetate Nutrition 0.000 description 18
- 150000001875 compounds Chemical class 0.000 description 16
- 238000006116 polymerization reaction Methods 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 14
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 12
- 239000000306 component Substances 0.000 description 12
- 229910052799 carbon Inorganic materials 0.000 description 11
- 239000002800 charge carrier Substances 0.000 description 11
- 229920001519 homopolymer Polymers 0.000 description 11
- 125000001183 hydrocarbyl group Chemical group 0.000 description 11
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 10
- 239000012043 crude product Substances 0.000 description 10
- 239000000047 product Substances 0.000 description 10
- 125000001424 substituent group Chemical group 0.000 description 10
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 9
- 238000004770 highest occupied molecular orbital Methods 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- 229920001577 copolymer Polymers 0.000 description 8
- 238000010168 coupling process Methods 0.000 description 8
- 238000005859 coupling reaction Methods 0.000 description 8
- 239000002019 doping agent Substances 0.000 description 8
- 238000001914 filtration Methods 0.000 description 8
- COIOYMYWGDAQPM-UHFFFAOYSA-N tris(2-methylphenyl)phosphane Chemical compound CC1=CC=CC=C1P(C=1C(=CC=CC=1)C)C1=CC=CC=C1C COIOYMYWGDAQPM-UHFFFAOYSA-N 0.000 description 8
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N DMSO Substances CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 7
- 125000003545 alkoxy group Chemical group 0.000 description 7
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 7
- OJCSPXHYDFONPU-UHFFFAOYSA-N etoac etoac Chemical compound CCOC(C)=O.CCOC(C)=O OJCSPXHYDFONPU-UHFFFAOYSA-N 0.000 description 7
- 230000006870 function Effects 0.000 description 7
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 7
- 229930192474 thiophene Natural products 0.000 description 7
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 230000008878 coupling Effects 0.000 description 6
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- 239000002244 precipitate Substances 0.000 description 6
- 229920006395 saturated elastomer Polymers 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 125000003342 alkenyl group Chemical group 0.000 description 5
- 125000000304 alkynyl group Chemical group 0.000 description 5
- AIXAANGOTKPUOY-UHFFFAOYSA-N carbachol Chemical group [Cl-].C[N+](C)(C)CCOC(N)=O AIXAANGOTKPUOY-UHFFFAOYSA-N 0.000 description 5
- 150000001721 carbon Chemical class 0.000 description 5
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 5
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 238000005227 gel permeation chromatography Methods 0.000 description 5
- 238000007641 inkjet printing Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000007639 printing Methods 0.000 description 5
- MABNMNVCOAICNO-UHFFFAOYSA-N selenophene Chemical group C=1C=C[se]C=1 MABNMNVCOAICNO-UHFFFAOYSA-N 0.000 description 5
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 4
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 4
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 4
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 230000002950 deficient Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000000284 extract Substances 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- MFRIHAYPQRLWNB-UHFFFAOYSA-N sodium tert-butoxide Chemical compound [Na+].CC(C)(C)[O-] MFRIHAYPQRLWNB-UHFFFAOYSA-N 0.000 description 4
- 125000006850 spacer group Chemical group 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 3
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 125000002015 acyclic group Chemical group 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 229920001400 block copolymer Polymers 0.000 description 3
- ZADPBFCGQRWHPN-UHFFFAOYSA-N boronic acid Chemical compound OBO ZADPBFCGQRWHPN-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 125000004093 cyano group Chemical group *C#N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 3
- 125000003709 fluoroalkyl group Chemical group 0.000 description 3
- 229910052732 germanium Inorganic materials 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 238000003306 harvesting Methods 0.000 description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Chemical group C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 150000002500 ions Chemical group 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 229920002521 macromolecule Polymers 0.000 description 3
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 3
- 235000019341 magnesium sulphate Nutrition 0.000 description 3
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 150000003384 small molecules Chemical class 0.000 description 3
- 229910000029 sodium carbonate Inorganic materials 0.000 description 3
- 229920006301 statistical copolymer Polymers 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 125000004001 thioalkyl group Chemical group 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- CYPYTURSJDMMMP-WVCUSYJESA-N (1e,4e)-1,5-diphenylpenta-1,4-dien-3-one;palladium Chemical compound [Pd].[Pd].C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1.C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1.C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1 CYPYTURSJDMMMP-WVCUSYJESA-N 0.000 description 2
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- FNQJDLTXOVEEFB-UHFFFAOYSA-N 1,2,3-benzothiadiazole Chemical compound C1=CC=C2SN=NC2=C1 FNQJDLTXOVEEFB-UHFFFAOYSA-N 0.000 description 2
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 2
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 2
- KVNYFPKFSJIPBJ-UHFFFAOYSA-N 1,2-diethylbenzene Chemical compound CCC1=CC=CC=C1CC KVNYFPKFSJIPBJ-UHFFFAOYSA-N 0.000 description 2
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- SSIRIPMSRVYJAH-UHFFFAOYSA-N 2,5-dithiophen-2-ylterephthalic acid Chemical compound OC(=O)C=1C=C(C=2SC=CC=2)C(C(=O)O)=CC=1C1=CC=CS1 SSIRIPMSRVYJAH-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- 239000005964 Acibenzolar-S-methyl Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910020366 ClO 4 Inorganic materials 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 2
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 2
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 2
- 229910018286 SbF 6 Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 238000006619 Stille reaction Methods 0.000 description 2
- 238000006069 Suzuki reaction reaction Methods 0.000 description 2
- MOYAFQVGZZPNRA-UHFFFAOYSA-N Terpinolene Chemical compound CC(C)=C1CCC(C)=CC1 MOYAFQVGZZPNRA-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- MCEWYIDBDVPMES-UHFFFAOYSA-N [60]pcbm Chemical compound C123C(C4=C5C6=C7C8=C9C%10=C%11C%12=C%13C%14=C%15C%16=C%17C%18=C(C=%19C=%20C%18=C%18C%16=C%13C%13=C%11C9=C9C7=C(C=%20C9=C%13%18)C(C7=%19)=C96)C6=C%11C%17=C%15C%13=C%15C%14=C%12C%12=C%10C%10=C85)=C9C7=C6C2=C%11C%13=C2C%15=C%12C%10=C4C23C1(CCCC(=O)OC)C1=CC=CC=C1 MCEWYIDBDVPMES-UHFFFAOYSA-N 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 2
- 125000005194 alkoxycarbonyloxy group Chemical group 0.000 description 2
- 125000002877 alkyl aryl group Chemical group 0.000 description 2
- 125000004448 alkyl carbonyl group Chemical group 0.000 description 2
- 125000005196 alkyl carbonyloxy group Chemical group 0.000 description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
- 229920005603 alternating copolymer Polymers 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- 238000002484 cyclic voltammetry Methods 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- TXCDCPKCNAJMEE-UHFFFAOYSA-N dibenzofuran Chemical compound C1=CC=C2C3=CC=CC=C3OC2=C1 TXCDCPKCNAJMEE-UHFFFAOYSA-N 0.000 description 2
- IYYZUPMFVPLQIF-UHFFFAOYSA-N dibenzothiophene Chemical compound C1=CC=C2C3=CC=CC=C3SC2=C1 IYYZUPMFVPLQIF-UHFFFAOYSA-N 0.000 description 2
- MTZQAGJQAFMTAQ-UHFFFAOYSA-N ethyl benzoate Chemical compound CCOC(=O)C1=CC=CC=C1 MTZQAGJQAFMTAQ-UHFFFAOYSA-N 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 125000004428 fluoroalkoxy group Chemical group 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 239000005457 ice water Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- PQNFLJBBNBOBRQ-UHFFFAOYSA-N indane Chemical compound C1=CC=C2CCCC2=C1 PQNFLJBBNBOBRQ-UHFFFAOYSA-N 0.000 description 2
- 239000000543 intermediate Substances 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- CTAPFRYPJLPFDF-UHFFFAOYSA-N isoxazole Chemical compound C=1C=NOC=1 CTAPFRYPJLPFDF-UHFFFAOYSA-N 0.000 description 2
- XMGQYMWWDOXHJM-UHFFFAOYSA-N limonene Chemical compound CC(=C)C1CCC(C)=CC1 XMGQYMWWDOXHJM-UHFFFAOYSA-N 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- XKBGEWXEAPTVCK-UHFFFAOYSA-M methyltrioctylammonium chloride Chemical compound [Cl-].CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC XKBGEWXEAPTVCK-UHFFFAOYSA-M 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- WXHIJDCHNDBCNY-UHFFFAOYSA-N palladium dihydride Chemical class [PdH2] WXHIJDCHNDBCNY-UHFFFAOYSA-N 0.000 description 2
- LXNAVEXFUKBNMK-UHFFFAOYSA-N palladium(II) acetate Substances [Pd].CC(O)=O.CC(O)=O LXNAVEXFUKBNMK-UHFFFAOYSA-N 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- RDOWQLZANAYVLL-UHFFFAOYSA-N phenanthridine Chemical compound C1=CC=C2C3=CC=CC=C3C=NC2=C1 RDOWQLZANAYVLL-UHFFFAOYSA-N 0.000 description 2
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 125000006239 protecting group Chemical group 0.000 description 2
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- XSCHRSMBECNVNS-UHFFFAOYSA-N quinoxaline Chemical compound N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 2
- 229920005604 random copolymer Polymers 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 229910052714 tellurium Inorganic materials 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- IIYFAKIEWZDVMP-UHFFFAOYSA-N tridecane Chemical compound CCCCCCCCCCCCC IIYFAKIEWZDVMP-UHFFFAOYSA-N 0.000 description 2
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 2
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- NWZSZGALRFJKBT-KNIFDHDWSA-N (2s)-2,6-diaminohexanoic acid;(2s)-2-hydroxybutanedioic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O.NCCCC[C@H](N)C(O)=O NWZSZGALRFJKBT-KNIFDHDWSA-N 0.000 description 1
- ZFXBERJDEUDDMX-UHFFFAOYSA-N 1,2,3,5-tetrazine Chemical compound C1=NC=NN=N1 ZFXBERJDEUDDMX-UHFFFAOYSA-N 0.000 description 1
- JRFGJQVSDCDWOW-UHFFFAOYSA-N 1,2,3-benzothiadiazole;thiophene Chemical compound C=1C=CSC=1.C1=CC=C2SN=NC2=C1 JRFGJQVSDCDWOW-UHFFFAOYSA-N 0.000 description 1
- UGUHFDPGDQDVGX-UHFFFAOYSA-N 1,2,3-thiadiazole Chemical compound C1=CSN=N1 UGUHFDPGDQDVGX-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- HTJMXYRLEDBSLT-UHFFFAOYSA-N 1,2,4,5-tetrazine Chemical compound C1=NN=CN=N1 HTJMXYRLEDBSLT-UHFFFAOYSA-N 0.000 description 1
- BBVIDBNAYOIXOE-UHFFFAOYSA-N 1,2,4-oxadiazole Chemical compound C=1N=CON=1 BBVIDBNAYOIXOE-UHFFFAOYSA-N 0.000 description 1
- YGTAZGSLCXNBQL-UHFFFAOYSA-N 1,2,4-thiadiazole Chemical compound C=1N=CSN=1 YGTAZGSLCXNBQL-UHFFFAOYSA-N 0.000 description 1
- FYADHXFMURLYQI-UHFFFAOYSA-N 1,2,4-triazine Chemical compound C1=CN=NC=N1 FYADHXFMURLYQI-UHFFFAOYSA-N 0.000 description 1
- UDGKZGLPXCRRAM-UHFFFAOYSA-N 1,2,5-thiadiazole Chemical compound C=1C=NSN=1 UDGKZGLPXCRRAM-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- DIIIISSCIXVANO-UHFFFAOYSA-N 1,2-Dimethylhydrazine Chemical compound CNNC DIIIISSCIXVANO-UHFFFAOYSA-N 0.000 description 1
- MBIZXFATKUQOOA-UHFFFAOYSA-N 1,3,4-thiadiazole Chemical compound C1=NN=CS1 MBIZXFATKUQOOA-UHFFFAOYSA-N 0.000 description 1
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical compound C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 1
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
- 125000001989 1,3-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([H])C([*:2])=C1[H] 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- HNTGIJLWHDPAFN-UHFFFAOYSA-N 1-bromohexadecane Chemical compound CCCCCCCCCCCCCCCCBr HNTGIJLWHDPAFN-UHFFFAOYSA-N 0.000 description 1
- VMKOFRJSULQZRM-UHFFFAOYSA-N 1-bromooctane Chemical compound CCCCCCCCBr VMKOFRJSULQZRM-UHFFFAOYSA-N 0.000 description 1
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- QCWXDVFBZVHKLV-UHFFFAOYSA-N 1-tert-butyl-4-methylbenzene Chemical compound CC1=CC=C(C(C)(C)C)C=C1 QCWXDVFBZVHKLV-UHFFFAOYSA-N 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- TZMSYXZUNZXBOL-UHFFFAOYSA-N 10H-phenoxazine Chemical compound C1=CC=C2NC3=CC=CC=C3OC2=C1 TZMSYXZUNZXBOL-UHFFFAOYSA-N 0.000 description 1
- QWENRTYMTSOGBR-UHFFFAOYSA-N 1H-1,2,3-Triazole Chemical group C=1C=NNN=1 QWENRTYMTSOGBR-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- KAESVJOAVNADME-UHFFFAOYSA-N 1H-pyrrole Natural products C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 1
- ZKAMEFMDQNTDFK-UHFFFAOYSA-N 1h-imidazo[4,5-b]pyrazine Chemical compound C1=CN=C2NC=NC2=N1 ZKAMEFMDQNTDFK-UHFFFAOYSA-N 0.000 description 1
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- UXGVMFHEKMGWMA-UHFFFAOYSA-N 2-benzofuran Chemical compound C1=CC=CC2=COC=C21 UXGVMFHEKMGWMA-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 1
- XSBINRYSUHFKST-UHFFFAOYSA-N 2-naphthalen-1-yl-1h-imidazole Chemical compound C1=CNC(C=2C3=CC=CC=C3C=CC=2)=N1 XSBINRYSUHFKST-UHFFFAOYSA-N 0.000 description 1
- MHIITNFQDPFSES-UHFFFAOYSA-N 25,26,27,28-tetrazahexacyclo[16.6.1.13,6.18,11.113,16.019,24]octacosa-1(25),2,4,6,8(27),9,11,13,15,17,19,21,23-tridecaene Chemical compound N1C(C=C2C3=CC=CC=C3C(C=C3NC(=C4)C=C3)=N2)=CC=C1C=C1C=CC4=N1 MHIITNFQDPFSES-UHFFFAOYSA-N 0.000 description 1
- VHMICKWLTGFITH-UHFFFAOYSA-N 2H-isoindole Chemical compound C1=CC=CC2=CNC=C21 VHMICKWLTGFITH-UHFFFAOYSA-N 0.000 description 1
- CMLFRMDBDNHMRA-UHFFFAOYSA-N 2h-1,2-benzoxazine Chemical compound C1=CC=C2C=CNOC2=C1 CMLFRMDBDNHMRA-UHFFFAOYSA-N 0.000 description 1
- YSSRLOJIPKHGCY-UHFFFAOYSA-N 3-amino-n-cyclohexyl-3-sulfanylidenepropanamide Chemical compound NC(=S)CC(=O)NC1CCCCC1 YSSRLOJIPKHGCY-UHFFFAOYSA-N 0.000 description 1
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 1
- GAMYYCRTACQSBR-UHFFFAOYSA-N 4-azabenzimidazole Chemical compound C1=CC=C2NC=NC2=N1 GAMYYCRTACQSBR-UHFFFAOYSA-N 0.000 description 1
- 125000001255 4-fluorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1F 0.000 description 1
- NSPMIYGKQJPBQR-UHFFFAOYSA-N 4H-1,2,4-triazole Chemical group C=1N=CNN=1 NSPMIYGKQJPBQR-UHFFFAOYSA-N 0.000 description 1
- BPMFPOGUJAAYHL-UHFFFAOYSA-N 9H-Pyrido[2,3-b]indole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=N1 BPMFPOGUJAAYHL-UHFFFAOYSA-N 0.000 description 1
- 241000913992 Aprion Species 0.000 description 1
- 229910017008 AsF 6 Inorganic materials 0.000 description 1
- FMMWHPNWAFZXNH-UHFFFAOYSA-N Benz[a]pyrene Chemical compound C1=C2C3=CC=CC=C3C=C(C=C3)C2=C2C3=CC=CC2=C1 FMMWHPNWAFZXNH-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N Benzoic acid Natural products OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- XOBXYQLCFFLQOE-UHFFFAOYSA-N C(C1=CC=CC=C1)=CC(=O)C=CC1=CC=CC=C1.NN Chemical compound C(C1=CC=CC=C1)=CC(=O)C=CC1=CC=CC=C1.NN XOBXYQLCFFLQOE-UHFFFAOYSA-N 0.000 description 1
- SNNVSEONCOCCRZ-UHFFFAOYSA-N C1CC=CCCC=C1[Ni]C1=CCCC=CCC1 Chemical compound C1CC=CCCC=C1[Ni]C1=CCCC=CCC1 SNNVSEONCOCCRZ-UHFFFAOYSA-N 0.000 description 1
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical class C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 1
- YKZBDEWUCZPXIA-UHFFFAOYSA-N C=1C=NON=1.C1=NN=CO1 Chemical compound C=1C=NON=1.C1=NN=CO1 YKZBDEWUCZPXIA-UHFFFAOYSA-N 0.000 description 1
- QUUSJBVGHUICRS-UHFFFAOYSA-N CC1=C(C=CC=C1)P.[Ru] Chemical group CC1=C(C=CC=C1)P.[Ru] QUUSJBVGHUICRS-UHFFFAOYSA-N 0.000 description 1
- 244000025254 Cannabis sativa Species 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 241000237858 Gastropoda Species 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- YHBTXTFFTYXOFV-UHFFFAOYSA-N Liquid thiophthene Chemical compound C1=CSC2=C1C=CS2 YHBTXTFFTYXOFV-UHFFFAOYSA-N 0.000 description 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- RQBUTOJMUJXVKY-UHFFFAOYSA-N N1=CC=CC2=CC=CN=C12.C1=CC=CC2=NC3=CC=CC=C3N=C12 Chemical compound N1=CC=CC2=CC=CN=C12.C1=CC=CC2=NC3=CC=CC=C3N=C12 RQBUTOJMUJXVKY-UHFFFAOYSA-N 0.000 description 1
- 229910019800 NbF 5 Inorganic materials 0.000 description 1
- LYXFCGCYJQCSRL-UHFFFAOYSA-N OOSO Chemical compound OOSO LYXFCGCYJQCSRL-UHFFFAOYSA-N 0.000 description 1
- 229920000144 PEDOT:PSS Polymers 0.000 description 1
- 241000282320 Panthera leo Species 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical group C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- 229910018287 SbF 5 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000003477 Sonogashira cross-coupling reaction Methods 0.000 description 1
- XBDYBAVJXHJMNQ-UHFFFAOYSA-N Tetrahydroanthracene Natural products C1=CC=C2C=C(CCCC3)C3=CC2=C1 XBDYBAVJXHJMNQ-UHFFFAOYSA-N 0.000 description 1
- DPOPAJRDYZGTIR-UHFFFAOYSA-N Tetrazine Chemical compound C1=CN=NN=N1 DPOPAJRDYZGTIR-UHFFFAOYSA-N 0.000 description 1
- AVRWEULSKHQETA-UHFFFAOYSA-N Thiophene-2 Chemical compound S1C=2CCCCCC=2C(C(=O)OC)=C1NC(=O)C1=C(F)C(F)=C(F)C(F)=C1F AVRWEULSKHQETA-UHFFFAOYSA-N 0.000 description 1
- 229910007926 ZrCl Inorganic materials 0.000 description 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 description 1
- OIPILFWXSMYKGL-UHFFFAOYSA-N acetylcholine Chemical compound CC(=O)OCC[N+](C)(C)C OIPILFWXSMYKGL-UHFFFAOYSA-N 0.000 description 1
- 229960004373 acetylcholine Drugs 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000002671 adjuvant Substances 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 125000005248 alkyl aryloxy group Chemical group 0.000 description 1
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 125000005427 anthranyl group Chemical group 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000005129 aryl carbonyl group Chemical group 0.000 description 1
- 125000005199 aryl carbonyloxy group Chemical group 0.000 description 1
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 description 1
- 125000005200 aryloxy carbonyloxy group Chemical group 0.000 description 1
- 125000002648 azanetriyl group Chemical group *N(*)* 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- RFRXIWQYSOIBDI-UHFFFAOYSA-N benzarone Chemical compound CCC=1OC2=CC=CC=C2C=1C(=O)C1=CC=C(O)C=C1 RFRXIWQYSOIBDI-UHFFFAOYSA-N 0.000 description 1
- UGYRYNXDEOFIQB-UHFFFAOYSA-N benzene thiophene Chemical compound S1C=CC=C1.C1=CC=CC=C1.C1=CC=CC=C1 UGYRYNXDEOFIQB-UHFFFAOYSA-N 0.000 description 1
- WMUIZUWOEIQJEH-UHFFFAOYSA-N benzo[e][1,3]benzoxazole Chemical compound C1=CC=C2C(N=CO3)=C3C=CC2=C1 WMUIZUWOEIQJEH-UHFFFAOYSA-N 0.000 description 1
- FZICDBOJOMQACG-UHFFFAOYSA-N benzo[h]isoquinoline Chemical compound C1=NC=C2C3=CC=CC=C3C=CC2=C1 FZICDBOJOMQACG-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- ZDZHCHYQNPQSGG-UHFFFAOYSA-N binaphthyl group Chemical group C1(=CC=CC2=CC=CC=C12)C1=CC=CC2=CC=CC=C12 ZDZHCHYQNPQSGG-UHFFFAOYSA-N 0.000 description 1
- YNHIGQDRGKUECZ-UHFFFAOYSA-L bis(triphenylphosphine)palladium(ii) dichloride Chemical compound [Cl-].[Cl-].[Pd+2].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 YNHIGQDRGKUECZ-UHFFFAOYSA-L 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 125000000480 butynyl group Chemical group [*]C#CC([H])([H])C([H])([H])[H] 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 230000021615 conjugation Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920006037 cross link polymer Polymers 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000000392 cycloalkenyl group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000001162 cycloheptenyl group Chemical group C1(=CCCCCC1)* 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000522 cyclooctenyl group Chemical group C1(=CCCCCCC1)* 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000002433 cyclopentenyl group Chemical group C1(=CCCC1)* 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- 125000005594 diketone group Chemical group 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- QXAFZEQRMJNPLY-UHFFFAOYSA-N dimethyl 2,5-dibromobenzene-1,4-dicarboxylate Chemical compound COC(=O)C1=CC(Br)=C(C(=O)OC)C=C1Br QXAFZEQRMJNPLY-UHFFFAOYSA-N 0.000 description 1
- PKSHOIIKOPKUJR-UHFFFAOYSA-N dimethyl 2,5-dithiophen-2-ylbenzene-1,4-dicarboxylate Chemical compound COC(=O)C=1C=C(C=2SC=CC=2)C(C(=O)OC)=CC=1C1=CC=CS1 PKSHOIIKOPKUJR-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 125000005982 diphenylmethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- RZCSPUKVPNZXPV-UHFFFAOYSA-N dithieno[3,2-a:2',3'-d]pyridine Chemical compound S1C=CC2=C1C=NC1=C2SC=C1 RZCSPUKVPNZXPV-UHFFFAOYSA-N 0.000 description 1
- HKNRNTYTYUWGLN-UHFFFAOYSA-N dithieno[3,2-a:2',3'-d]thiophene Chemical compound C1=CSC2=C1SC1=C2C=CS1 HKNRNTYTYUWGLN-UHFFFAOYSA-N 0.000 description 1
- KWKXNDCHNDYVRT-UHFFFAOYSA-N dodecylbenzene Chemical compound CCCCCCCCCCCCC1=CC=CC=C1 KWKXNDCHNDYVRT-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 125000005745 ethoxymethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])* 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- RMBPEFMHABBEKP-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2C3=C[CH]C=CC3=CC2=C1 RMBPEFMHABBEKP-UHFFFAOYSA-N 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 125000003800 germyl group Chemical group [H][Ge]([H])([H])[*] 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 125000005980 hexynyl group Chemical group 0.000 description 1
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine monohydrate Substances O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- PJULCNAVAGQLAT-UHFFFAOYSA-N indeno[2,1-a]fluorene Chemical group C1=CC=C2C=C3C4=CC5=CC=CC=C5C4=CC=C3C2=C1 PJULCNAVAGQLAT-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- ZLTPDFXIESTBQG-UHFFFAOYSA-N isothiazole Chemical compound C=1C=NSC=1 ZLTPDFXIESTBQG-UHFFFAOYSA-N 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 229940087305 limonene Drugs 0.000 description 1
- 235000001510 limonene Nutrition 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000004768 lowest unoccupied molecular orbital Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 description 1
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 1
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 1
- 229940078552 o-xylene Drugs 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- 125000005447 octyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000005069 octynyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C#C* 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical compound C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 125000005981 pentynyl group Chemical group 0.000 description 1
- 125000005005 perfluorohexyl group Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)* 0.000 description 1
- 125000005007 perfluorooctyl group Chemical group FC(C(C(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)* 0.000 description 1
- 150000008379 phenol ethers Chemical class 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920000301 poly(3-hexylthiophene-2,5-diyl) polymer Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 229910000160 potassium phosphate Inorganic materials 0.000 description 1
- 235000011009 potassium phosphates Nutrition 0.000 description 1
- RMXUDXHAJSELLC-UHFFFAOYSA-N prop-1-ene;toluene Chemical compound CC=C.CC1=CC=CC=C1 RMXUDXHAJSELLC-UHFFFAOYSA-N 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 125000002568 propynyl group Chemical group [*]C#CC([H])([H])[H] 0.000 description 1
- CPNGPNLZQNNVQM-UHFFFAOYSA-N pteridine Chemical compound N1=CN=CC2=NC=CN=C21 CPNGPNLZQNNVQM-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical class O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- JWVCLYRUEFBMGU-UHFFFAOYSA-N quinazoline Chemical compound N1=CN=CC2=CC=CC=C21 JWVCLYRUEFBMGU-UHFFFAOYSA-N 0.000 description 1
- 150000003254 radicals Chemical group 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- WWGXHTXOZKVJDN-UHFFFAOYSA-M sodium;n,n-diethylcarbamodithioate;trihydrate Chemical compound O.O.O.[Na+].CCN(CC)C([S-])=S WWGXHTXOZKVJDN-UHFFFAOYSA-M 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 125000003003 spiro group Chemical group 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000012258 stirred mixture Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 1
- APBDREXAUGXCCV-UHFFFAOYSA-L tetraethylazanium;carbonate Chemical compound [O-]C([O-])=O.CC[N+](CC)(CC)CC.CC[N+](CC)(CC)CC APBDREXAUGXCCV-UHFFFAOYSA-L 0.000 description 1
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 1
- 150000003536 tetrazoles Chemical group 0.000 description 1
- NMFKEMBATXKZSP-UHFFFAOYSA-N thieno[3,2-b]thiophene Chemical compound S1C=CC2=C1C=CS2.S1C=CC2=C1C=CS2 NMFKEMBATXKZSP-UHFFFAOYSA-N 0.000 description 1
- 125000004055 thiomethyl group Chemical group [H]SC([H])([H])* 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 150000003623 transition metal compounds Chemical class 0.000 description 1
- UKTDFYOZPFNQOQ-UHFFFAOYSA-N tributyl(thiophen-2-yl)stannane Chemical compound CCCC[Sn](CCCC)(CCCC)C1=CC=CS1 UKTDFYOZPFNQOQ-UHFFFAOYSA-N 0.000 description 1
- 125000002827 triflate group Chemical group FC(S(=O)(=O)O*)(F)F 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- RMNIZOOYFMNEJJ-UHFFFAOYSA-K tripotassium;phosphate;hydrate Chemical compound O.[K+].[K+].[K+].[O-]P([O-])([O-])=O RMNIZOOYFMNEJJ-UHFFFAOYSA-K 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 238000002424 x-ray crystallography Methods 0.000 description 1
- 150000003738 xylenes Chemical class 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
- C08G61/122—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides
- C08G61/123—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
- C08G61/122—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides
- C08G61/123—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds
- C08G61/126—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds with a five-membered ring containing one sulfur atom in the ring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
- H01B1/12—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
- H01B1/124—Intrinsically conductive polymers
- H01B1/127—Intrinsically conductive polymers comprising five-membered aromatic rings in the main chain, e.g. polypyrroles, polythiophenes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
- H01B1/12—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
- H01B1/124—Intrinsically conductive polymers
- H01B1/128—Intrinsically conductive polymers comprising six-membered aromatic rings in the main chain, e.g. polyanilines, polyphenylenes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
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Description
本發明係關於包括二環戊烷并苯二噻吩或二環戊烷并苯硒吩單元或其衍生物之共軛聚合物,關於其製備方法,關於其中所使用之新穎單體單元,關於該等聚合物在有機電子(OE)裝置中之用途,且關於包括該等聚合物之OE裝置。
近年來,業內已研究出多種有機半導電(OSC)材料以製造更具通用性的低成本電子裝置。此等材料可應用於寬範圍裝置或設備中,包含(僅列舉幾個)有機場效電晶體(OFET)、有機發光二極體(OLED)、光檢測器、有機光電伏打(OPV)電池、感測器、記憶元件及邏輯電路。有機半導電材料通常以薄層形式(例如厚度小於1微米)存在於電子裝置中。
OFET裝置之性能主要係基於半導電材料之電荷載流子遷移率及電流導通/關斷比,因而理想的半導體在斷開狀態下應具有低導電率,並同時具有高電荷載流子遷移率(>1×10-3
cm2
V-1
s-1
)。此外,重要的是,半導電材料對氧化作用相對穩定,即,其具有高電離電位,此乃因氧化作用會導致裝置性能降低。半導電材料之其他要求係良好的加工性,尤其對於薄層及期望圖案之大規模製造、及高穩定性、薄膜均勻性及有機半導體層之完整性。
在先前技術中,有人已提出可將多種材料作為OSC用於OFET中,包含如(例如)并五苯之小分子及如(例如)聚己基噻吩之聚合物。然而,迄今為止所研究之材料及裝置仍具有多種缺點,且其特性尤其加工性、電荷載流子遷移率、導通/關斷比及穩定性仍存在進一步改良之餘地。
一種頗具前景的共軛聚合物係基於茚并茀單元。及合作者[S. Setayesh,D. Marsitzky及K.,Macromolecules,
2000,33,
2016]首先報導,在電致發光應用中茚并茀之均聚物係發射藍光之候選材料。業內亦已建議將茚并茀共聚物作為OSC應用於電晶體裝置中[WO 2007/131582 A1]。
然而,先前技術中所揭示之OSC材料的性能仍不能總是滿足對該等材料之當前需求,且存在進一步改良之餘地。
具體而言,業內仍需求展示高電荷載流子遷移率之OSC材料。此外,對於在OFET中之使用,業內需求改良電荷自源極-汲極電極至聚合物半導電層之注入之OSC材料。對於在OPV電池中之使用,業內需求具有低帶隙之OSC材料,其能藉由光活性層改良光收穫且可產生較高的電池效能。
本發明之一個目的係提供用於電子裝置中之新OSC材料,其具有上文所述之期望特性,且尤其展示良好的加工性、高電荷載流子遷移率、高導通/關斷比、高氧化穩定性及在電子裝置中之較長壽命。另一目的係擴展OSC材料庫以供專業人員使用。專業人員可自以下詳細說明立即看出本發明之其他目的。
本發明之發明者已發現該等目的可藉由提供如下文所述之材料來達成。該等材料係基於包括一或多個s-二環戊烷并苯二噻吩或s-二環戊烷并苯二硒吩單元或其衍生物之聚合物,如由下式所表示:
s-二環戊烷并苯[1,2-b:5,6-b']二噻吩/硒吩
s-二環戊烷并苯[1,2-b:7,6-b']二噻吩/硒吩(其中X係S或Se且R1-4
表示(例如)烴基)。
已發現,該等聚合物適於作為OSC材料用於電子裝置中,尤其用於OFET及OPV電池中,且作為電荷轉移層或夾層材料用於聚合物發光二極體(PLED)中,此乃因其具有良好的加工性且同時展示高電荷載流子遷移率及高氧化穩定性。
亦已發現,用噻吩環替代茚并茀中之末端苯環可增加共軛核心之電子豐富性,且因此增大所得均聚物聚(2,7-s-二環戊烷并苯[1,2-b:5,6-b']二噻吩)之HOMO能級。在聚(2,8-茚并茀)中,HOMO能級極低(EHOMO
=-5.49eV,如藉由循環伏安法所測定)。當在場效電晶體中使用時,較低HOMO能量之此增加容許改良電荷自源極-汲極電極(通常由金製成,其功函數為約5.1eV)至聚合物半導電層之注入。
此外,可利用此另外電子豐富性來製備新穎低帶隙聚合物用於光電伏打應用。藉由使富電子之s-二環戊烷并苯[1,2-b:5,6-b']二噻吩單元與缺電子單元(例如,苯并噻二唑)組合,所得共聚物具有低帶隙(Eg
<2eV)。在本體異質接面光電伏打電池中低帶隙半導電聚合物係有利的,此乃因其能藉由光活性層改良光收穫,此可潛在地產生較高的電池效能。
在先前技術中,有人報導s-二環戊烷并苯[1,2-b:5,6-b']二噻吩,但其僅作為小分子材料[K-T. Wong,T-C. Chao,L-C. Chi,Y-Y. Chu,A. Balaiah,S-F. Chiu,Y-H. Liu及Y. Wang,Org
.Lett
.,2006,8
,5033]。亦有人報導s-二環戊烷并苯[1,2-b:5,6-b']二噻吩之均聚物[X. M. Hong及D. M. Collard,Polymer Preprints
,2000,41(1)
,189],然而,其係在橋接4,9-位而非在末端2,7-位聚合,如下文所述。
另外,有人報導4,9-二氫-s-二環戊烷并苯[1,2-b:5,6-b’]二噻吩-4,9-二酮共聚物[C. Zhao,X. Chen,Y. Zhang及M-K,Ng,J
.Polym
.Sci
.,Part A:Polym
.Chem
.,2008,46
,2680.]應用於本體異質接面光電伏打中。然而,其中所報導之共聚物包括富電子之基於噻吩的共單體,而非如本發明所期望將產生較低帶隙聚合物之缺電子共單體。
另外,有人報導4,4,9,9-四芳基-s-二環戊烷并苯[1,2-b:5,6-b’]二噻吩均聚物及共聚物[S-H. Chan,C-P. Chen,T-C. Chao,C. Ting,C-S. Lin及B-T Ko,Macromolecules
,2008,在線發表],其亦應用於本體異質接面光電伏打中。然而,所報導共聚物亦包括富電子之基於噻吩的共單體,而非將產生較低帶隙聚合物之缺電子共單體。此外,4-及9-橋接位之四芳基取代基在溶解聚合物方面將不如直鏈或具支鏈烷基取代基有效。另外,四芳基取代基將導致聚合物鏈較差的固態堆積。此係由於該等芳基環將因空間相互作用而使聚合物骨架之平面扭轉,且因此將阻止聚合物鏈緊密堆積並產生較低的電荷載流子遷移率。
本發明係關於包括一或多個相同或不同的式I單體單元之共軛聚合物
其中A1
及A2
中的一個係單鍵且另一個係CR1
R2
,A3
及A4
中的一個係單鍵且另一個係CR3
R4
,U1
及U2
中的一個係-CH=或=CH-且另一個係-X-,U3
及U4
中的一個係-CH=或=CH-且另一個係-X-,前提條件係若Ai
係單鍵,則相應的Ui
係X(其中i係上標1-4),X 在每一情況下皆獨立地選自-S-及-Se-,R1-4
係相同或不同的相互獨立地選自下列之基團:H、鹵素、-CN、-NC、-NCO、-NCS、-OCN、-SCN、-C(=O)NR0
R00
、-C(=O)X0
、-C(=O)R0
、-NH2
、-NR0
R00
、-SH、-SR0
、-SO3
H、-SO2
R0
、-OH、-NO2
、-CF3
、-SF5
、P-Sp-、視情況經取代之甲矽烷基、或具有1-40個C原子之碳基或烴基,其視情況經取代且視情況包括一或多個雜原子,P 係可聚合基團,Sp 係間隔基團或單鍵,X0
係鹵素,R0
及R00
相互獨立地係H或視情況經取代之碳基或烴基,其視情況包括一或多個雜原子,Ar1
及Ar2
相互獨立地係視情況經取代之芳基或雜芳基、-CY1
=CY2
-或-C≡C-,Y1
及Y2
相互獨立地係H、F、Cl或CN,m1及m2 相互獨立地係0或1、2、3或4。
本發明進一步係關於調配物,其包括一或多種本發明聚合物或聚合物摻合物及一或多種較佳地選自有機溶劑之溶劑。
本發明進一步係關於聚合物摻合物,其包括一或多種本發明聚合物及一或多種較佳地選自具有半導電、電荷轉移、電洞/電子轉移、電洞/電子阻擋、導電、光導或發光特性之聚合物的聚合物。
本發明進一步係關於本發明聚合物、聚合物摻合物及調配物之用途,其係作為電荷轉移、半導電、導電、光導或發光材料用於光學、電光、電子、電致發光或光致發光組件或裝置中。
本發明進一步係關於包括一或多種本發明聚合物、聚合物摻合物或調配物之電荷轉移、半導電、導電、光導或發光材料或組件。
本發明進一步係關於包括一或多種本發明聚合物、聚合物摻合物、調配物、組件或材料之光學、電光或電子組件或裝置。
光學、電光、電子、電致發光及光致發光組件或裝置包含(但不限於)有機場效電晶體(OFET)、薄膜電晶體(TFT)、積體電路(IC)、邏輯電路、電容器、射頻識別(RFID)標籤、裝置或組件、有機發光二極體(OLED)、有機發光電晶體(OLET)、平板顯示器、顯示器之背光、有機光電伏打裝置(OPV)、太陽能電池、雷射二極體、光電導體、光檢測器、電子照相裝置、電子照相記錄裝置、有機記憶裝置、感測器裝置、聚合物發光二極體(PLED)中之電荷注入層、電荷轉移層或夾層、Schottky二極體、平坦化層、抗靜電膜、聚合物電解質隔膜(PEM)、導電基板、導電圖案、蓄電池中之電極材料、配向層、生物感測器、生物晶片、安全標記、安全裝置、及用來檢測及鑑別DNA序列之組件或裝置。
本發明聚合物呈現多種有利特性:
- s-二環戊烷并苯[1,2-b:5,6-b']二噻吩單元呈現共平面結構,如藉由參考文獻3中所闡述之小分子實例的X-射線結晶學分析所證實。此外,均聚物聚(2,7-s-二環戊烷并苯[1,2-b:5,6-b']二噻吩)在兩個末端噻吩之3-位處不存在原本將導致聚合物骨架之空間誘導的扭轉的取代基的情況下,其個別聚合物鏈亦將採用呈固態形式之高度共平面結構。均聚物具有更容易自溶液調配及處理之優點,且具有組織成有益於電荷轉移之緊密堆積的薄膜形態的能力。
- 與聚(2,8-茚并茀)(PIF)(其HOMO能級極低(EHOMO
=-5.49eV,如藉由循環伏安法所量測))相比,均聚物聚(2,7-s-二環戊烷并苯[1,2-b:5,6-b']二噻吩)之HOMO能級稍有升高。當應用於場效電晶體裝置中時,此可改良電荷自源極-汲極電極(通常由金製成,其功函數為約5.1eV)至聚合物半導電層之注入。另外,均聚物之HOMO能級固有地低於P3HT及其他聚噻吩材料之HOMO能級,因此該聚合物具有經改良的氧化穩定性。
- 電子能(HOMO及LUMO能級)之額外的微調,其係藉由經由供電子或吸電子取代基進一步直接改變s-二環戊烷并苯[1,2-b:5,6-b']二噻吩核心之電子能、或藉由與適當缺電子共單體(例如,苯并噻二唑)共聚來達成,此可獲得由於改良光收穫而對本體異質接面光電伏打電池有利的低帶隙聚合物。此可產生較高的本體異質接面電池效能。
共軛聚合物較佳地選自式II
其中U1-4
、A1-4
、Ar1,2
、m1及m2皆具有式I之含義且n係>1之整數。
尤佳者係式IIa之聚合物
其中U1-4
、A1-4
、Ar1,2
、m1、m2及n皆具有式II之含義,且R5
及R6
相互獨立地具有R1
中之一種含義或表示H、鹵素、-CH2
Cl、-CHO、-CH=CH2
、-SiR'R"R"'、-SnR'R"R"'、-BR'R"、-B(OR')(OR")、-B(OH)2
或P-Sp,其中P及Sp皆如上文所定義,且R'、R"及R'"皆相互獨立地具有上文所給R0
中之一種含義,且R'及R"亦可與其所連接之雜原子一起形成環。
尤佳者係式I之單元及式II及IIa之聚合物,其中
- X係S,
- R1-4
相互獨立地選自較佳直鏈或具支鏈、C1
-C20
-烷基、C1
-C20
-烷氧基、C2
-C20
-烯基、C2
-C20
-炔基、C1
-C20
-硫代烷基、C1
-C20
-甲矽烷基、C1
-C20
-酯、C1
-C20
-胺基及C1
-C20
-氟烷基,
- R1-4
係H,
- m1及m2為0,
- m1及m2為1或2,
- m2為0且m1為1或2,
- Ar1
及Ar2
相互獨立地係芳基或雜芳基,較佳地選自由下列組成之群:2,1,3-苯并噻二唑-4,7-二基、2,1,3-苯并硒二唑-4,7-二基、2,3-二氰基-1,4-伸苯基、2,5-二氰基,1,4-伸苯基、2,3-二氟-1,4-伸苯基、2,5-二氟-1,4-伸苯基、2,3,5,6-四氟-1,4-伸苯基、3,4-二氟噻吩-2,5-二基、噻吩并[3,4-b]吡嗪-2,5-二基、喹喔啉-5,8-二基、硒吩-2,5-二基、噻吩-2,5-二基、噻吩并[3,2-b]噻吩-2,5-二基、噻吩并[2,3-b]噻吩-2,5-二基、硒吩并[3,2-b]硒吩-2,5-二基、硒吩并[2,3-b]硒吩-2,5-二基、硒吩并[3,2-b]噻吩-2,5-二基、硒吩并[2,3-b]噻吩-2,5-二基、1,4-伸苯基、吡啶-2,5-二基、嘧啶-2,5-二基、p-p'-聯苯基、萘-2,6-二基、苯并[1,2-b:4,5-b']二噻吩-2,6-二基、2,2-二噻吩、2,2-二硒吩、噻唑及噁唑,其全部皆可未經取代、較佳地經如上文所定義之R1
單取代或多取代,且甚至較佳地m為1或2,
- n係2-5000、較佳10-5000、最佳100-1000間之整數,
- 分子量(Mw)為5000-300,000、尤其20,000-200,000,
- R5
及R6
係選自H、鹵素、-CH2
Cl、-CHO、-CH=CH2
、-SiR'R"R"'、-SnR'R"R"'、-BR'R"、-B(OR')(OR")、-B(OH)2
、P-Sp、C1
-C20
-烷基、C1
-C20
-烷氧基、C2
-C20
-烯基、C1
-C20
-氟烷基及視情況經取代之芳基或雜芳基,
- R1-4
中至少一個、較佳地一或兩個表示P-Sp-,
式I之單體單元較佳地係選自由下列子式組成之群:
其中R1-4
皆如式I中所定義且Ar具有上文及下文所給Ar1
中之一種含義。
尤佳者係該等子式之單體單元,其中Ar係2,1,3-苯并噻二唑-4,7-二基或2,1,3-苯并硒二唑-4,7-二基,具體而言彼等具有式I2、I4、I13及I14者。
本發明聚合物較佳地包括一或多個相同或不同的選自由子式I1-I16組成之群之單體單元,極佳地由其組成。
本發明聚合物包含均聚物及共聚物,如統計或無規共聚物、交替共聚物及嵌段共聚物以及其組合。
式II聚合物較佳地選自由下列子式組成之群:
其中R1-4
及n皆如式II中所定義,且Ar具有上文及下文所給Ar1
中之一種含義。
尤佳者係該等子式之聚合物,其中Ar係2,1,3-苯并噻二唑-4,7-二基或2,1,3-苯并硒二唑-4,7-二基,具體而言彼等具有式I2、I4、I13及I14者。
尤佳者係具有下式之聚合物:
其中R具有如上文所給R1
中之一種含義,且較佳地選自由下列組成之群:C1
-C20
-烷基、C1
-C20
-烷氧基、C2
-C20
-烯基、C2
-C20
-炔基、C1
-C20
-硫代烷基、C1
-C20
-甲矽烷基、C1
-C20
-酯、C1
-C20
-胺基及C1
-C20
-氟烷基,其全部皆為直鏈或具支鏈。
進一步較佳者係式IIa1之聚合物:
R5
-鏈-R6
IIa1
其中R5
及R6
皆如式IIa中所定義,且「鏈」係選自由子式II1-II10及II2a組成之群之聚合物鏈。
在本發明聚合物中,重複單元之總數n較佳地為、極佳地、最佳地,且較佳地最高達500、極佳地最高達1,000、最佳地最高達2,000,包含前文所述n之下限及上限的任一組合。
術語「聚合物」通常意指具有較高之相對分子質量的分子,其結構實質上包括多個實際上或概念上衍生自具有較低相對分子質量之分子的重複單元(PAC,1996,68,2291)。術語「寡聚物」通常意指具有中間相對分子質量之分子,其結構實質上包括少量複數個實際上或概念上衍生自具有相對較低分子質量之分子的單元(PAC,1996,68,2291)。本發明之較佳意義中,聚合物意指具有>1、較佳地>10個重複單元之化合物,且寡聚物意指具有>1且<20、較佳地個重複單元之化合物。
術語「重複單元」意指組成重複單元(CRU),其係最小的組成單元,其重複可組成規則大分子、規則寡聚物分子、規則嵌段或規則鏈(PAC,1996,68,2291)。
術語「離去基團」意指自認為參與指定反應之分子的殘餘或主要部分中之原子分開的原子或基團(帶電荷或不帶電荷)(亦參見PAC,1994,66,1134)。
術語「共軛」意指主要含有具有sp2
-混成作用(或視情況亦可sp-混成作用)之C原子的化合物,該等C原子亦可由雜原子取代。在最簡單情況下,其係(例如)具有交替C-C單鍵及雙鍵(或三鍵)之化合物,但亦可包含具有如1,3-伸苯基等單元的化合物。就此而言「主要」意指具有天然地(自發地)存在可干擾共軛之缺陷的化合物仍視為共軛化合物。
除非另有說明,否則分子量以數量平均分子量Mn
或重量平均分子量MW
形式給出,其係藉由凝膠滲透層析法(GPC)對照聚苯乙烯標準品來測定。聚合度(n)意指數量平均聚合度,以n=Mn
/MU
形式給出,其中MU
係單一重複單元之分子量。
如上文及下文所使用之術語「碳基」表示任何單價或多價有機基團部分,其包括至少一個碳原子而不含任何非碳原子(如,例如-C≡C-)、或視情況組合有至少一個非碳原子(例如N、O、S、P、Si、Se、As、Te或Ge)(例如羰基等)。術語「烴基」表示另外含有一或多個H原子且視情況含有一或多個(例如)N、O、S、P、Si、Se、As、Te或Ge之雜原子之碳基基團。
包括3個或3個以上C原子之鏈之碳基或烴基亦可呈直鏈、具支鏈及/或環狀,包含螺及/或稠合環。
較佳之碳基及烴基包含烷基、烷氧基、烷基羰基、烷氧基羰基、烷基羰氧基及烷氧基羰氧基(其每一個皆可視情況經取代且具有1-40個、較佳地1-25個、極佳地1-18個C原子)、進一步視情況經取代之具有6-40個、較佳地6-25個C原子之芳基或芳氧基、進一步烷基芳氧基、芳基羰基、芳氧基羰基、芳基羰氧基及芳氧基羰氧基(其每一個皆可視情況經取代且具有6-40、較佳地7-40個C原子)。
碳基或烴基可係飽和的或不飽和的非環狀基團、或飽和的或不飽和的環狀基團。不飽和的非環狀或環狀基團較佳,尤其芳基、烯基及炔基(尤其乙炔基)。當C1
-C40
碳基或烴基呈非環狀時,該基團可直鏈或具支鏈。C1
-C40
碳基或烴基包含(例如):C1
-C40
烷基、C2
-C40
烯基、C2
-C40
炔基、C3
-C40
烯丙基、C4
-C40
烷基二烯基、C4
-C40
多烯基、C6
-C18
芳基、C2
-C18
雜芳基、C6
-C40
烷基芳基、C6
-C40
芳基烷基、C4
-C40
環烷基、C4
-C40
環烯基及諸如此類。在前述基團中較佳者分別係C1
-C20
烷基、C2
-C20
烯基、C2
-C20
炔基、C3
-C20
烯丙基、C4
-C20
烷基二烯基、C6
-C12
芳基、C2
-C12
雜芳基及C4
-C20
多烯基。亦包含具有碳原子之基團與具有雜原子之基團的組合,例如經甲矽烷基、較佳地三烷基甲矽烷基取代之炔基、較佳地乙炔基。
其他較佳之碳基及烴基包含具有1-40、較佳地1-25個C原子之直鏈、具支鏈或環狀烷基,其可未經取代、經F、Cl、Br、I或CN單取代或多取代,且其中一或多個非毗鄰CH2
基團可視情況在每一情況下皆相互獨立地經下列取代:-O-、-S-、-NH-、-NR0
-、-SiR0
R00
-、-CO-、-COO-、-OCO-、-O-CO-O-、-S-CO-、-CO-S-、-SO2
-、-CO-NR0
-、-NR0
-CO-、-NR0
-CO-NR00
-、-CY1
=CY2
-或-C≡C-,其取代方式係O及/或S原子不直接相互連接,其中Y1
及Y2
相互獨立地係H、F、Cl或CN,且R0
及R00
相互獨立地係H或視情況經取代之具有1-20個C原子之脂肪族或芳香族烴。
R0
及R00
較佳地選自H、具有1-12個C原子之直鏈或具支鏈烷基或具有6-12個C原子之芳基。
-CY1
=CY2
-較佳地係-CH=CH-、-CF=CF-或-CH=C(CN)-。
鹵素係F、Cl、Br或I。
較佳之烷基包含(但不限於)甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、2-甲基丁基、正戊基、第二戊基、環戊基、正己基、環己基、2-乙基己基、正庚基、環庚基、正辛基、環辛基、十二烷基、十四烷基、十六烷基、三氟甲基、全氟-正丁基、2,2,2-三氟乙基、全氟辛基、全氟己基等。
較佳之烯基包含(但不限於)乙烯基、丙烯基、丁烯基、戊烯基、環戊烯基、己烯基、環己烯基、庚烯基、環庚烯基、辛烯基、環辛烯基等。
較佳之炔基包含(但不限於)乙炔基、丙炔基、丁炔基、戊炔基、己炔基、辛炔基等。
較佳之烷氧基包含(但不限於)甲氧基、乙氧基、2-甲氧基乙氧基、正丙氧基、異丙氧基、正丁氧基、異丁氧基、第二丁氧基、第三丁氧基、2-甲基丁氧基、正戊氧基、正己氧基、正庚氧基、正辛氧基等。
較佳之胺基包含(但不限於)二甲基胺基、甲基胺基、甲基苯基胺基、苯基胺基等。
芳基可係單環即僅具有一個芳香族環(如苯基或伸苯基),或多環即具有兩個或兩個以上的芳香族環,其可經稠合(例如,萘基或伸萘基)、個別地共價連接(例如,聯苯基)及/或稠合與個別連接芳香族環之組合。較佳地,芳基係實質上在實質上整個基團上共軛之芳香族基團。
芳基及雜芳基較佳地表示具有多達25個C原子之單-、二-或三環狀芳香族或雜芳香族基團,其亦可包括稠合環且視情況經取代。
較佳之芳基包含(但不限於)苯、聯苯、聯伸三苯、[1,1':3',1"]聯三苯-2'-伸基、萘、蒽、聯萘、菲、芘、二氫芘、、苝、并四苯、并五苯、苯并芘、茀、茚、茚并茀、螺二茀等。
較佳之雜芳基包含(但不限於)5-員環,如吡咯、吡唑、咪唑、1,2,3-三唑、1,2,4-三唑、四唑、呋喃、噻吩、硒吩、噁唑、異噁唑、1,2-噻唑、1,3-噻唑、1,2,3-噁二唑、1,2,4-噁二唑、1,2,5-噁二唑、1,3,4-噁二唑、1,2,3-噻二唑、1,2,4-噻二唑、1,2,5-噻二唑、1,3,4-噻二唑;6-員環如吡啶、嗒嗪、嘧啶、吡嗪、1,3,5-三嗪、1,2,4-三嗪、1,2,3-三嗪、1,2,4,5-四嗪、1,2,3,4-四嗪、1,2,3,5-四嗪;及稠合系統如咔唑、吲哚、異吲哚、吲嗪、吲唑、苯并咪唑、苯并三唑、嘌呤、萘并咪唑、菲并咪唑、吡啶并咪唑、吡嗪并咪唑、喹喔啉并咪唑、苯并噁唑、萘并噁唑、蒽并噁唑、菲并噁唑、異噁唑、苯并噻唑、苯并呋喃、異苯并呋喃、二苯并呋喃、喹啉、異喹啉、蝶啶、苯并-5,6-喹啉、苯并-6,7-喹啉、苯并-7,8-喹啉、苯并異喹啉、吖啶、吩噻嗪、吩噁嗪、苯并嗒嗪、苯并嘧啶、喹喔啉、吩嗪、萘啶、氮雜咔唑、苯并哢啉、菲啶、菲咯啉、噻吩并[2,3b]噻吩、噻吩并[3,2b]噻吩、二噻吩并噻吩、二噻吩并吡啶、異苯并噻吩、二苯并噻吩、苯并噻二唑噻吩或其組合。雜芳基可經烷基、烷氧基、硫代烷基、氟、氟烷基或其他芳基或雜芳基取代基取代。
較佳之芳基烷基包含(但不限於)2-甲苯基、3-甲苯基、4-甲苯基、2,6-二甲基苯基、2,6-二乙基苯基、2,6-二-異丙基苯基、2,6-二-第三丁基苯基、鄰-第三丁基苯基、間-第三丁基苯基、對-第三丁基苯基、4-苯氧基苯基、4-氟苯基、3-羰甲氧基苯基、4-羰甲氧基苯基等。
較佳之烷基芳基包含(但不限於)苄基、乙基苯基、2-苯氧基乙基、丙基苯基、二苯基甲基、三苯基甲基或萘基甲基。
較佳之芳氧基包含(但不限於)苯氧基、萘氧基、4-苯基苯氧基、4-甲基苯氧基、聯苯氧基、蒽基氧基、菲基氧基等。
該等芳基、雜芳基、碳基及烴基視情況包括一或多個較佳地選自下列之取代基:甲矽烷基、磺基、磺醯基、甲醯基、胺基、亞胺基、次氮基、巰基、氰基、硝基、鹵素、C1-12
烷基、C6-12
芳基、C1-12
烷氧基、羥基及/或其組合。該等可選取代基在同一基團中可包括所有化學上可能的組合及/或複數個(較佳地兩個)上述基團(舉例而言,若胺基及磺醯基直接相互連接,則其表示胺磺醯基)。
較佳之取代基包含(但不限於)F、Cl、Br、I、-CN、-NO2
、-NCO、-NCS、-OCN、-SCN、-C(=O)NR0
R00
、-C(=O)X0
、-C(=O)R0
、-NR0
R00
、視情況經取代之甲矽烷基、具有6-40個、較佳地6-20個C原子之芳基、具有2-40個、較佳地2-20個C原子之雜芳基、及具有1-20個、較佳地1-12個C原子之直鏈或具支鏈烷基、烷氧基、烷基羰基、烷氧基-羰基、烷基羰氧基或烷氧基羰氧基,其中一或多個H原子可視情況經F或Cl取代,其中R0
及R00
如上文所定義且X0
係鹵素。
尤佳之取代基係選自烷基、烷氧基、烯基、氧雜烷基、硫代烷基、氟烷基及氟烷氧基,如下文針對較佳基團R1,2
所定義。
若R1-4
中的一個係烷基或烷氧基,即,其中末端CH2
基團由-O-取代,則其可係直鏈或具支鏈基團。其較佳地係直鏈基團,具有2-8個碳原子,且因此較佳係乙基、丙基、丁基、戊基、己基、庚基、辛基、乙氧基、丙氧基、丁氧基、戊氧基、己氧基、庚氧基或辛氧基、其亦可係(例如)甲基、壬基、癸基、十一烷基、十二烷基、十三烷基、十四烷基、十五烷基、壬氧基、癸氧基、十一烷氧基、十二烷氧基、十三烷氧基或十四烷氧基。尤佳者係正己基及正十二烷基。
若R1-4
中的一個係其中一或多個CH2
基團由-CH=CH-替代之烷基,則其可係直鏈或具支鏈。其較佳係直鏈,具有2-12個C原子且因此較佳係乙烯基、丙-1-烯基或丙-2-烯基、丁-1-烯基、丁-2-烯基或丁-3-烯基、戊-1-烯基、戊-2-烯基、戊-3-烯基或戊-4-烯基、己-1-烯基、己-2-烯基、己-3-烯基、己-4-烯基或己-5-烯基、庚-1-烯基、庚-2-烯基、庚-3-烯基、庚-4-烯基、庚-5-烯基或庚-6-烯基、辛-1-烯基、辛-2-烯基、辛-3-烯基、辛-4-烯基、辛-5-烯基、辛-6-烯基或辛-7-烯基、壬-1-烯基、壬-2-烯基、壬-3-烯基、壬-4-烯基、壬-5-烯基、壬-6-烯基、壬-7-烯基或壬-8-烯基、癸-1-烯基、癸-2-烯基、癸-3-烯基、癸-4-烯基、癸-5-烯基、癸-6-烯基、癸-7-烯基、癸-8-烯基或癸-9-烯基、十一-1-烯基、十一-2-烯基、十一-3-烯基、十一-4-烯基、十一-5-烯基、十一-6-烯基、十一-7-烯基、十一-8-烯基、十一-9-烯基或十一-10-烯基、十二-1-烯基、十二-2-烯基、十二-3-烯基、十二-4-烯基、十二-5-烯基、十二-6-烯基、十二-7-烯基、十二-8-烯基、十二-9-烯基、十二-10-烯基或十一-11-烯基。烯基可包括具有E-或Z-構型之C=C-鍵或其混合。
若R1-4
中的一個係氧雜烷基即其中一個CH2
基團經-O-替代,則其較佳係(例如)直鏈2-氧雜丙基(=甲氧基甲基)、2-(=乙氧基甲基)或3-氧雜丁基(=2-甲氧基乙基)、2-、3-或4-氧雜戊基、2-、3-、4-或5-氧雜己基、2-、3-、4-、5-或6-氧雜庚基、2-、3-、4-、5-、6-或7-氧雜辛基、2-、3-、4-、5-、6-、7-或8-氧雜壬基或2-、3-、4-、5-、6-、7-、8-或9-氧雜癸基。
若R1-4
中的一個係硫代烷基即其中一個CH2
基團由-S-替代,則其較佳地係直鏈硫甲基(-SCH3
)、1-硫乙基(-SCH2
CH3
)、1-硫丙基(=-SCH2
CH2
CH3
)、1-(硫丁基)、1-(硫戊基)、1-(硫己基)、1-(硫庚基)、1-(硫辛基)、1-(硫壬基)、1-(硫癸基)、1-(硫十一烷基)或1-(硫十二烷基),其中較佳地毗鄰sp2
混成乙烯基碳原子的CH2
基團經替代。
若R1-4
中的一個係氟烷基或氟烷氧基,則其較佳地係直鏈基團(O)Ci
F2i+1
,其中i係1-15間之整數,具體而言CF3
、C2
F5
、C3
F7
、C4
F9
、C5
F11
、C6
F13
、C7
F15
或C8
F17
,極佳地C6
F13
或相應的氟烷氧基。
聚合物亦可經在形成聚合物之過程期間視情況加以保護之可聚合或反應性基團取代。此類尤佳聚合物係式I之彼等,其中R1
表示P-Sp。該等聚合物尤其可用作半導體或電荷轉移材料,此乃因其可經由基團P(例如)藉由在將聚合物加工成薄膜用於半導體組件期間或之後原位聚合而交聯,以產生具有高電荷載流子遷移率及高熱、機械及化學穩定性的交聯聚合物薄膜。
較佳地,可聚合或反應性基團P係選自CH2
=CW1
-COO-、CH2
=CW1
-CO-、 、CH2
=CW2
-(O)k1
-、CH3
-CH=CH-O-、(CH2
=CH)2
CH-OCO-、(CH2
=CH-CH2
)2
CH-OCO-、(CH2
=CH)2
CH-O-、(CH2
=CH-CH2
)2
N-、(CH2
=CH-CH2
)2
N-CO-、HO-CW2
W3
-、HS-CW2
W3
-、HW2
N-、HO-CW2
W3
-NH-、CH2
=CW1
-CO-NH-、CH2
=CH-(COO)k1
-Phe-(O)k2
-、CH2
=CH-(CO)k1
-Phe-(O)k2
-、Phe-CH=CH-、HOOC-、OCN-及W4
W5
W6
Si-,且W1
係H、F、Cl、CN、CF3
、苯基或具有1-5個C原子之烷基,尤其係H、Cl或CH3
,W2
及W3
相互獨立地為H或具有1-5個C原子之烷基,尤其係H、甲基、乙基或正丙基,W4
、W5
及W6
相互獨立地為Cl、具有1-5個C原子之氧雜烷基或氧雜羰基烷基,W7
及W8
相互獨立地為H、Cl或具有1-5個C原子之烷基,Phe係視情況經一或多個如上所定義基團L取代之1,4-伸苯基,且k1
及k2
相互獨立地為0或1。
或者P係該等基團之受保護衍生物,其在針對本發明方法所述之條件下不具反應性。適宜的保護基團已為普通專業人員所習知並闡述於文獻中,例如闡述於Green「Protective Groups in Organic Synthesis」,John Wiley及Sons,New York(1981)中,例如縮醛或縮酮。
尤佳基團P係CH2
=CH-COO-、CH2
=C(CH3
)-COO-、CH2
=CH-、CH2
=CH-O-、(CH2
=CH)2
CH-OCO-、(CH2
=CH)2
CH-O-、、或其受保護衍生物。
基團P之聚合可根據為普通專業人員所習知且闡述於文獻、例如闡述於D. J. Broer;G. Challa;G. N. Mol,Macromol. Chem
,1991,192,59中之方法來實施。
術語「間隔基團」在先前技術中已習知,且適宜的間隔基團Sp已為普通專業人員所習知(參見,例如Pure Appl. Chem. 73(5),888(2001))。間隔基團Sp較佳地具有式Sp'-X',以使P-Sp-係P-Sp'-X'-,其中Sp' 係具有至多30個C原子之伸烷基,其可未經取代或經F、Cl、Br、I或CN單取代或多取代,一或多個非毗鄰CH2
基團亦可在每一情況下相互獨立地由下列替代:-O-、-S-、-NH-、-NR0
-、-SiR0
R00
-、-CO-、-COO-、-OCO-、-OCO-O-、-S-CO-、-CO-S-、-CH=CH-或-C≡C-,其替代方式係O及/或S原子不直接相互連接,X' 係-O-、-S-、-CO-、-COO-、-OCO-、-O-COO-、-CO-NR0
-、-NR0
-CO-、-NR0
-CO-NR00
-、-OCH2
-、-CH2
O-、-SCH2
-、-CH2
S-、-CF2
O-、-OCF2
-、-CF2
S-、-SCF2
-、-CF2
CH2
-、-CH2
CF2
-、-CF2
CF2
-、-CH=N-、-N=CH-、-N=N-、-CH=CR0
-、-CY1
=CY2
-、-C≡C-、-CH=CH-COO-、-OCO-CH=CH-或單鍵,R0
及R00
相互獨立地係H或具有1-12個C原子之烷基,及Y1
及Y2
相互獨立地係H、F、Cl或CN。
X'較佳係-O-、-S-、-OCH2
-、-CH2
O-、-SCH2
-、-CH2
S-、-CF2
O-、-OCF2
-、-CF2
S-、-SCF2
-、-CH2
CH2
-、-CF2
CH2
-、-CH2
CF2
-、-CF2
CF2
-、-CH=N-、-N=CH-、-N=N-、-CH=CR0
-、-CY1
=CY2
-、-C≡C-或單鍵,具體而言-O-、-S-、-C≡C-、-CY1
=CY2
-或單鍵。在另一較佳實施例中,X'係能形成共軛系統之基團,例如-C≡C-或-CY1
=CY2
-,或係單鍵。
典型的基團Sp'係(例如)-(CH2
)p
-、-(CH2
CH2
O)q
-CH2
CH2
-、-CH2
CH2
-S-CH2
CH2
-或-CH2
CH2
-NH-CH2
CH2
-或-(SiR0
R00
-O)p
-,其中p係2-12間之整數,q係1-3間之整數,且R0
及R00
具有上文給定的含義。
較佳之基團Sp'係(例如)伸乙基、伸丙基、伸丁基、伸戊基、伸己基、伸庚基、伸辛基、伸壬基、伸癸基、伸十一烷基、伸十二烷基、伸十八烷基、伸乙基氧基伸乙基、亞甲基氧基伸丁基、伸乙基-硫基伸乙基、伸乙基-N-甲基-亞胺基伸乙基、1-甲基伸烷基、伸乙烯基、伸丙烯基及伸丁烯基。
本發明聚合物可根據已為熟練技術人員所習知且闡述於文獻中之方法或與其類似之方法來合成。其他製備方法可自實例獲得。舉例而言,其可適宜地藉由芳基-芳基偶合反應(例如Yamamoto偶合、Suzuki偶合、Stille偶合、Sonogashira偶合或Heck偶合)來製備。Suzuki偶合及Yamamoto偶合尤佳。
經聚合以形成聚合物重複單元之單體可根據為熟練技術人員所習知之方法來製備。
較佳地,該等聚合物由式Ia之單體來製備
其中U1-4
、A1-4
、Ar1,2
、m1及m2具有上文所給之含義,且R7
及R8
較佳相互獨立地選自由下列組成之群:Cl、Br、I、O-甲苯磺酸酯基、O-三氟甲磺酸酯基、O-甲磺酸酯基、O-九氟丁磺酸酯基、-SiMe2
F、-SiMeF2
、-O-SO2
Z、-B(OZ1
)2
、-CZ2
=C(Z2
)2
、-C≡CH及-Sn(Z3
)3
,其中Z及Z1-3
係選自由烷基及芳基組成之群,其各自皆可視情況經取代,且兩個基團Z1
亦可形成環狀基團。
式Ia之新穎單體係本發明之另一態樣。
本發明之另一態樣係藉由在聚合反應中使一或多種相同或不同的以式I單元為主之單體相互偶合來製備聚合物的方法。
本發明之又一態樣係藉由在聚合反應、較佳地芳基-芳基偶合反應中使一或多種相同或不同的以式I、較佳地選自式Ia之單元為主之單體相互偶合及/或與一或多種共單體偶合來製備聚合物的方法。
適宜及較佳之共單體係具有下式之彼等:
R7
-Ar1
-R8
R7
-Ar2
-R8
其中Ar1,
、Ar2
、R7
及R8
皆如式Ia中所定義。
較佳之聚合方法係彼等產生C-C-偶合或C-N-偶合者,如Suzuki聚合,如(例如)WO 00/53656中所述;Yamamoto聚合,如(例如)T. Yamamoto等人,Progress in Polymer Science 1993,17,1153-1205中或WO 2004/022626 A1中所述;及Stille偶合。舉例而言,當藉由Yamamoto聚合合成線性聚合物時,較佳地使用如上所述具有兩個反應性鹵代基團R7,8
之單體。當藉由Suzuki聚合合成線性聚合物時,較佳地使用如上所述其中至少一個反應性基團R7,8
係硼酸或硼酸衍生基團之單體。
Suzuki聚合可用來製備均聚物以及統計、交替及嵌段無規共聚物。統計或嵌段共聚物可由(例如)其中反應性基團R7
及R8
中的一個係鹵素且另一個反應性基團係硼酸或硼酸衍生基團之上文式II單體來製備。統計、交替及嵌段共聚物之合成詳細闡述於(例如)WO 03/048225 A2或WO 2005/014688 A2中。
Suzuki聚合使用Pd(0)錯合物或Pd(II)鹽。較佳之Pd(0)錯合物係彼等具有至少一個膦配體者,例如Pd(Ph3
P)4
。另一較佳膦配體係叁(鄰
-甲苯基)膦,即Pd(o-Tol)4
。較佳之Pd(II)鹽包含乙酸鈀,即Pd(OAc)2
。Suzuki聚合係在鹼(例如碳酸鈉、磷酸鉀)或有機鹼(例如四乙基碳酸銨)存在下實施。Yamamoto聚合使用Ni(0)錯合物,例如雙(1,5-環辛二烯基)鎳(0)。
作為如上所述之鹵素的替代方案,可使用式-O-SO2
Z之離去基團,其中Z如上所述。此等離去基團之具體實例係甲苯磺酸酯基、甲磺酸酯基及三氟甲磺酸酯基。
式I及Ia之單體單元及單體及式II及IIa之其均聚物及共聚物的尤其適宜及較佳合成方法闡釋於下文所示之合成反應圖中。其中R具有式I中所給R1
中之一種含義。
4,4,9,9-四烷基s-二環戊烷并苯[1,2-b:5,6-b']二噻吩之較佳合成方法例示性闡釋於反應圖1中。
相應的s-二環戊烷并苯[1,2-b:5,6-b']二硒吩化合物可以類似方式藉由在上文所示之第二反應步驟中使用2-經取代之硒吩離析物替代2-經取代之噻吩來製備。
因此,相應的具有一個噻吩及一個硒吩環之「混合」二環戊烷并苯化合物(例如彼等具有上文式I9或I13者)可根據反應圖1中第二個反應步驟但分兩個單獨階段來製備。首先係2-經取代之噻吩離析物之反應及中間產物之分離,隨後係2-經取代之硒吩之第二反應以得到「混合」產物。
4,4,9,9-四烷基s-二環戊烷并苯[1,2-b:5,6-b']二噻吩之官能化例示性闡釋於反應圖2中。
4,4,9,9-四烷基s-二環戊烷并苯[1,2-b:5,6-b']二噻吩之均聚反應例示性闡釋於反應圖3中。
4,4,9,9-四烷基s-二環戊烷并苯[1,2-b:5,6-b']二噻吩之共聚例示性闡釋於反應圖4中。
s-二環戊烷并苯[1,2-b:7,6-b']二噻吩/硒吩化合物可如反應圖5中所闡釋來製備。
製備如上文及下文所述之聚合物的新穎方法係本發明之另一態樣。
本發明聚合物作為電荷轉移、半導電、導電、光導或發光材料用於光學、電光、電子、電致發光或光致發光組件或裝置中。
尤佳之裝置係OFET、TFT、IC、邏輯電路、電容器、RFID標籤、OLED、OLET、OPV、太陽能電池、雷射二極體、光電導體、光檢測器、電子照相裝置、電子照相記錄裝置、有機記憶裝置、感測器裝置、電荷注入層、Schottky二極體、平坦化層、抗靜電膜、導電基板及導電圖案。在該等裝置中,本發明聚合物通常作為薄層或薄膜使用。
其中有機半導電(OSC)材料作為薄膜佈置於閘極介電質與汲極及源極電極之間的OFET通常已習知,且闡述於(例如)US 5,892,244、WO 00/79617、US 5,998,804中及背景技術部分中所引用之參考文獻中。由於使用本發明聚合物之溶解度特性可具有多個優點(如低生產成本)以及由此所致的大表面可加工性,故,該等FET之較佳應用係(例如)積體電路、TFT顯示器及安全應用。
本發明聚合物亦可以聚合物摻合物形式使用,例如與具有電荷轉移、半導電、導電、光導及/或發光半導電特性之其他聚合物、或(例如)與具有電洞阻擋或電子阻擋特性之聚合物一起作為夾層或電荷阻擋層用於OLED裝置中。因而,本發明之另一態樣係關於包括一或多種本發明聚合物及具有一或多種上述特性之一或多種其他聚合物的聚合物摻合物。該等摻合物可藉由闡述於先前技術中且為熟練技術人員所習知之習用方法來製備。通常,使該等聚合物相互混合或溶於適宜溶劑中並合併該等溶液。
本發明之另一態樣係關於包括一或多種如上文及下文所述之聚合物或聚合物摻合物及一或多種有機溶劑的調配物。
適宜及較佳有機溶劑之實例包含(但不限於)二氯甲烷、三氯甲烷、單氯苯、鄰-二氯苯、四氫呋喃、苯甲醚、嗎啉、甲苯、鄰-二甲苯、間-二甲苯、對-二甲苯、1,4-二噁烷、丙酮、甲基乙基酮、1,2-二氯乙烷、1,1,1-三氯乙烷、1,1,2,2-四氯乙烷、乙酸乙酯、乙酸正丁酯、二甲基甲醯胺、二甲基乙醯胺、二甲基亞碸、四氫化萘、萘烷、二氫化茚、苯甲酸甲酯、苯甲酸乙酯、三甲基苯及/或其混合物。
溶液中聚合物之濃度較佳地為0.1-10重量%、更佳地0.5-5重量%。視情況,該溶液亦可包括一或多種黏結劑以調節流變學特性,如(例如)WO 2005/055248 A1中所述。
適當混合及老化後,用下列種類之一種來評價溶液:完全溶液、邊界溶液(borderline solution)或不溶。繪製等值線以描述溶解度參數-氫鍵結限值來劃分溶解性及不溶解性。屬於溶解區域範圍內的‘完全’溶劑可根據(例如)「Crowley,J.D.,Teague,G.S. Jr及Lowe,J.W. Jr.,Journal of Paint Technology,38,No 496,296(1966)」中所公佈之文獻值來選擇。亦可使用溶劑摻合物且其可如「Solvents,W.H.Ellis,Federation of Societies for Coatings Technology,p9-10,1986」中所述來確定。此程序可產生將溶解本發明兩種聚合物之「非」溶劑的摻合物,但期望在摻合物中具有至少一種真正的溶劑。
本發明聚合物亦可用於裝置之圖案化OSC層中,如上文及下文所述。對於在現代微電子中之應用而言,通常需要產生小結構或圖案以降低成本(更大的裝置/單元面積)及功率消耗。包括本發明聚合物之薄層的圖案化可(例如)藉由光微影法、電子束微影法或雷射圖案化來實施。
對於作為薄層在電子或光電裝置中之使用,本發明聚合物、聚合物摻合物或調配物可藉由任何適宜方法來沈積。裝置之液體塗佈比真空沈積技術合意。溶液沈積方法尤佳。本發明調配物能使用多種液體塗佈技術。較佳之沈積技術包含(但不限於)浸塗、旋塗、噴墨印刷、凸版印刷、絲網印刷、刮刀塗佈、輥印刷、反向輥印刷、膠版微影印刷、柔性版印刷、捲筒印刷、噴塗、刷塗或移動印刷。噴墨印刷由於其容許製備高解析度層及裝置而尤佳。
本發明之經選擇調配物可藉由噴墨印刷或微量分配施加至所製造的裝置基板。較佳地,工業壓電印刷頭(例如,但不限於彼等由Aprion,Hitachi-Koki,InkJet Technology,On Target Technology,Picojet,Spectra,Trident,Xaar供應者)可用來將有機半導體層施加至基板。另外,可使用半工業化印刷頭(例如彼等由Brother,Epson,Konica,Seiko Instruments Toshiba TEC所製造者)或單噴嘴微量分配器(例如,彼等由Microdrop及Microfab所製造者)
為了藉由噴墨印刷或微量分配來施加,聚合物應首先溶於適宜溶劑中。溶劑須滿足上述要求且須不對所選印刷頭產生任何有害影響。另外,溶劑之沸點應>100℃、較佳地>140℃且更佳地>150℃,以防止出現由於溶液在印刷頭內乾燥引起之可操作性問題。除上述溶劑外,適宜溶劑包含經取代及未經取代之二甲苯衍生物、二-C1-2
-烷基甲醯胺、經取代及未經取代之苯甲醚及其他酚-醚衍生物、經取代雜環(例如經取代之吡啶、吡嗪、嘧啶、吡咯啶酮)、經取代及未經取代之N,N
-二-C1-2
-烷基苯胺及其他氟代或氯代芳香族。
藉由噴墨印刷用來沈積本發明聚合物之較佳溶劑包括具有經一或多個取代基取代之苯環的苯衍生物,其中一或多個取代基中碳原子的總數量至少為3。舉例而言,苯衍生物可經丙基或三個甲基取代,在任一情況下碳原子之總數至少為3。此溶劑能形成包括溶劑與聚合物之噴墨流體,其能減輕或防止噴射期間射流阻塞及組份分離。該(等)溶劑可包含彼等選自下列實例者:十二烷基苯、1-甲基-4-第三丁基苯、萜品醇、檸檬烯、異杜烯、萜品油烯、異丙甲苯、二乙基苯。該溶劑可係溶劑混合物,即兩種或更多種溶劑之組合,每一溶劑之沸點較佳地>100℃、更佳地>140℃。此(等)溶劑亦可提高所沈積層中之薄膜形成並減少該層中之缺陷。
噴墨流體(即溶劑、黏結劑及半導電化合物之混合物)之黏度在20℃下較佳地為1-100mPa‧s、更佳地1-50mPa‧s且最佳地1-30mPa‧s。
本發明聚合物或調配物可另外包括一或多種其他組份,例如表面活性化合物、潤滑劑、潤濕劑、分散劑、疏水劑、黏合劑、流動改良劑、消泡劑、除氣劑、可具反應性或不具反應性之稀釋劑、輔助劑、著色劑、染劑或顏料、敏化劑、穩定劑、奈米粒子或抑制劑。
本發明OFET裝置較佳地包括:
-源極電極,
-汲極電極,
-閘極電極,
-有機半導電(OSC)層,
-一或多個閘極絕緣體層,
-視情況基板,
其中OSC層包括一或多種本發明聚合物。
OFET裝置中之閘極、源極及汲極電極及絕緣及半導電層可以任何順序佈置,前提條件係源極及汲極電極係藉由絕緣層而與閘極電極分開,閘極電極及半導體層二者皆接觸絕緣層,且源極電極及汲極電極二者皆接觸半導電層。OFET裝置可係頂部閘極裝置或底部閘極裝置。OFET裝置之適宜結構及製造方法已為業內熟習此項技術者所瞭解並闡述於(例如)WO 03/052841等文獻中。
本發明OPV裝置較佳地包括:
- 低功函數電極(例如鋁),
- 高功函數電極(例如ITO),其中一個係透明的。
- 由電洞轉移及電子轉移材料組成之雙層;該雙層可作為兩個不同層、或經摻合混合物存在(參見,例如Coakley,K. M.及McGehee,M. D.Chem. Mater.
2004,16
,4533),
- 可選導電聚合物層(例如,PEDOT:PSS)以改變高功函數電極之功函數,以為電洞提供歐姆式接觸,
- 高功函數電極上可選塗層(例如LiF)以為電子提供歐姆式接觸。
摻合物中之電洞轉移聚合物係本發明聚合物中之一種。電子轉移材料可係無機材料(例如氧化鋅或硒化鎘)或有機材料,例如富勒烯(fullerene)衍生物(例如PCBM[(6,6)-苯基C61-丁酸甲基酯]或聚合物,參見(例如)Coakley,K. M.及McGehee,M. D.Chem. Mater
.2004,16
,4533)。若該雙層係摻合物,則可能需要可選退火步驟來最佳化裝置性能。
在安全應用中,OFET及採用本發明半導電材料之其他裝置(如電晶體或二極體)可用於RFID標籤或安全標記以證明及禁止仿造有價單證,例如,鈔票、信用卡或ID卡、國家ID文件、許可證或任何具有貨幣價值的產品,例如,郵票、票證、股票、支票等。
或者,本發明材料可用於(例如)顯示器應用中之有機發光裝置或二極體(OLED)中或用作(例如)液晶顯示器之背光。常用的OLED係使用多層結構達成。發射層通常夾在一或多個電子轉移層及/或電洞轉移層之間。藉由施加電壓可使作為電荷載流子之電子及電洞朝向發射層運動,並在此處重新組合以激發包含於發射層中之發光團單元並由此使該等單元發光。本發明化合物、材料及薄膜可用於一或多個電荷轉移層及/或發射層中,此端視其電性及/或光學特性而定。而且,若本發明之化合物、材料及薄膜自身顯示出電致發光特性或包括電致發光基團或化合物,則其用於發射層中特別有利。對用於OLED中之適宜單體、寡聚物及聚合物化合物或材料之選擇、定性以及處理通常已為熟習此項技術者所習知,參見(例如)Meerholz,Synthetic Materials,111-112,2000,31-34、Alcala,J. Appl. Phys.,88,2000,7124-7128及其中所引用之文獻。
根據另一用途,本發明材料(尤其彼等顯示出光致發光特性者)可用作(例如)顯示器裝置之光源材料,例如在EP 0 889 350 A1中或C. Weder等人在Science,279,1998,835-837中所闡述。
本發明之其他態樣係關於本發明聚合物之氧化及還原形式二者。失去或獲得電子均會導致形成具有高電導係數之高度離域離子形式。此可在暴露於普通摻雜物時發生。適宜的摻雜物及摻雜方法已為彼等熟習此項技術者所習知,例如,可自EP 0 528 662、US 5,198,153或WO 96/21659中得知。
摻雜製程通常意味著在氧化還原反應中使用氧化或還原劑來處理半導電材料以在材料中形成離域離子中心,同時自所用摻雜物獲得相應的抗衡離子。適宜的摻雜方法包括(例如)在大氣壓力或低壓下暴露於摻雜蒸氣,在含有摻雜物的溶液中實施電化學摻雜,使摻雜物與擬熱擴散之半導電材料接觸,及將此摻雜物離子移植於此半導電材料中。
當電子用作載流子時,適宜的摻雜物係(例如)鹵素(例如,I2
、Cl2
、Br2
、ICl、ICl3
、IBr及IF)、路易士酸(Lewis acid)(例如,PF5
、AsF5
、SbF5
、BF3
、BCl3
、SbCl5
、BBr3
及SO3
)、質子酸、有機酸、或胺基酸(例如,HF、HCl、HNO3
、H2
SO4
、HClO4
、FSO3
H及ClSO3
H)、過渡金屬化合物(例如,FeCl3
、FeOCl、Fe(ClO4
)3
、Fe(4-CH3
C6
H4
SO3
)3
、TiCl4
、ZrCl4
、HfCl4
、NbF5
、NbCl5
、TaCl5
、MoF5
、MoCl5
、WF5
、WCl6
、UF6
及LnCl3
(其中Ln係鑭系元素)、陰離子(例如,Cl-
、Br-
、I-
、I3 -
、HSO4 -
、SO4 2-
、NO3 -
、ClO4 -
、BF4 -
、PF6 -
、AsF6 -
、SbF6 -
、FeCl4 -
、Fe(CN)6 3-
)及各種磺酸陰離子,例如芳基-SO3 -
)。當電洞用作載流子時,摻雜物之實例係陽離子(例如,H+
、Li+
、Na+
、K+
、Rb+
及Cs+
)、鹼金屬(例如,Li、Na、K、Rb及Cs)、鹼土金屬(例如,Ca、Sr及Ba)、O2
、XeOF4
、(NO2 +
)(SbF6 -
)、(NO2 +
)(SbCl6 -
)、(NO2 +
)(BF4 -
)、AgClO4
、H2
IrCl6
、La(NO3
)3
6H2
O、FSO2
OOSO2
F、Eu、乙醯膽鹼、R4
N+
(R係烷基)、R4
P+
(R係烷基)、R6
As+
(R係烷基)、及R3
S+
(R係烷基)。
本發明聚合物之導電形式可作為有機「金屬」用於多種應用場合,例如(但不限於)OLED應用中之電荷注入層及ITO平面化層、平板顯示器及觸摸屏幕之薄膜、抗靜電膜、諸如印刷電路板及電容器等電子應用中的印刷導電基板、圖案或跡線。
根據另一用途,本發明材料可單獨或與其他材料一起用於LCD或OLED裝置中或用作其中之配向層,如(例如)US 2003/0021913中所述。使用本發明電荷轉移化合物可增大配向層之導電係數。當用於LCD中時,此增大的導電係數可降低可切換LCD單元中不利的殘餘直流效應並抑制(例如)鐵電型LCD中之圖像黏滯或降低由切換鐵電型LC之自發極化電荷所產生的殘餘電荷。當用於包括發光材料(其提供於配向層上)之OLED裝置中時,此增大的導電係數可增強發光材料之電致發光特性。具有液晶原性或液晶特性的本發明化合物或材料可形成如上所述的各向異性定向薄膜,其特別可用作配向層以引發或增強液晶介質(其提供於該各向異性薄膜上)中之配向。本發明材料亦可與光可異構化化合物及/或發色團組合用於或用作光配向層,如US 2003/0021913中所述。
根據另一用途,本發明材料尤其其水溶性衍生物(例如具有極性或離子側鏈基團者)或離子摻雜形式可用作化學感測器或材料用來偵測及鑑別DNA序列。此等用途闡述於(例如)L. Chen,D. W. McBranch,H. Wang,R. Helgeson,F. Wudl及D. G. Whitten,Proc. Natl. Acad. Sci. U.S.A.(1999,96,12287)中、D. Wang,X. Gong,P. S. Heeger,F. Rininsland,G. C. Bazan及A. J. Heeger,Proc. Natl. Acad. Sci. U.S.A.(2002,99,49)中、N. DiCesare,M. R. Pinot,K. S. Schanze及J. R. Lakowicz,Langmuir(2002,18,7785)中、D. T. McQuade,A. E. Pullen,T. M. Swager,Chem. Rev.(2000,100,2537)中。
除非上下文另外明確指明,否則本文術語之本文所用複數形式應視為包含單數形式且反之亦然。
在本說明書之闡述及技術方案中,詞語「包括(comprise)」及「含有(contain)」及該等詞語之變化形式例如「包括(comprising及comprises)」意指「包含但不限於」,且並非意欲(且不)將其他組份排除在外。
應瞭解,可對本發明之前述實施例作出修改,同時仍屬於本發明之範圍。除非另有說明,否則本說明書中所揭示之每一特徵皆可由適合於相同、等價或類似目的之替代特徵所代替。因此,除非另有說明,否則每一所揭示特徵僅係一類相當或類似特徵的一個實例。
本說明書中所揭示之全部特徵可以任一組合進行組合,只是其中至少某些此等特徵及/或步驟相互排斥之組合除外。具體而言,本發明之較佳特徵適用於本發明之全部態樣且可以任一組合使用。同樣地,非必需組合中所闡述之特徵可單獨使用(不組合使用)。
現在將參照以下實例更詳細地闡述本發明,其僅具闡釋性且不限制本發明之範圍。
將2,5-二溴對苯二甲酸二甲基酯(6.09克,17.30毫莫耳)溶於無水THF(100公分3
)中,隨後添加2-噻吩基溴化鋅(0.50M存於THF中,90公分3
,45.0毫莫耳)及Pd(PPh3
)4
(0.50克,0.43毫莫耳)。將該混合物在67℃下加熱2小時。冷卻後,將反應混合物倒入水中。藉由過濾收集沉澱並用水、甲醇及二乙醚進行洗滌,隨後在真空中乾燥,以得到呈淺黃色固體之產物(5.41克,87%)。1
H NMR(300MHz,CDCl3
):δ(ppm)7.82(s,2H,Ar-H),7.40(dd,J=4.8及1.4Hz,2H,Ar-H),7.07-7.12(m,4H,Ar-H),3.78(s,6H,CH3
);13
C NMR(75MHz,CDCl3
):δ(ppm)168.1(C=O),140.3(q),133.6(q),133.4(q),131.9(CH),127.5(CH),127.0(CH),126.7(CH),52.6(CH3
);MS(m/e
):358(M+
,100%),327,299,240,195。
將氫氧化鈉(4.80克,120.0毫莫耳)溶於水(30公分3
)中,隨後添加乙醇(250公分3
)及2,5-二噻吩-2-基對苯二甲酸二甲基酯(5.30克,14.8毫莫耳)。將該混合物在78℃下加熱過夜。在減壓下將溶劑蒸發至初始體積的約一半,隨後添加水。用濃鹽酸中和所得混合物。藉由過濾收集沉澱且用水及乙醇洗滌,隨後在真空中乾燥,以得到呈灰白色固體之產物(4.13克,84%)。1
H NMR(300MHz,DMSO-d6
):δ(ppm)13.46(s,2H,COOH),7.72(s,2H,Ar-H),7.70(dd,J=5.1及1.1Hz,2H,Ar-H),7.28(dd,J=3.6及1.1Hz,2H,Ar-H),7.17(m,2H,Ar-H);13
C NMR(75MHz,DMSO-d6
):δ(ppm)168.7(C=O),139.7(q),134.5(q),131.4(q),130.2(CH),127.9(CH),127.5(CH),127.1(CH)。
在0℃下向2,5-二噻吩-2-基對苯二甲酸(4.06克,12.29毫莫耳)及草醯氯(3.12克,24.58毫莫耳)溶於DCM(100公分3
)之溶液中添加DMF(1公分3
)。10分鐘後,使該混合物溫熱至23℃並攪拌過夜。在減壓下去除溶劑,以得到呈黃色油狀物之粗產物(4.38克,97%)。1
H NMR(300MHz,CDCl3
):δ(ppm)7.90(s,2H,Ar-H),7.51(dd,J=4.9及1.4Hz,2H,Ar-H),7.13-7.20(m,4H,Ar-H)。該產物未經進一步純化即用於下一步驟。
在0℃下將2,5-二噻吩-2-基對苯二甲醯氯(4.38克,11.93毫莫耳)溶於DCM(100公分3
)之溶液添加至無水AlCl3
(5.0克,37.5毫莫耳)存於DCM(100公分3
)之懸浮液中。將所得混合物進一步攪拌30分鐘,隨後在23℃下攪拌過夜。將反應混合物倒入冰冷2M HCl溶液中。收集沉澱且用2M HCl及水洗滌,隨後在真空中乾燥,以得到呈深藍色固體之產物(2.91克,83%)。MS(m/e
):294(M+
,100%),281,266,207,193;IR:ν(cm-1
)1704(C=O)。
將水合肼(11.9公分3
,245毫莫耳)添加至4,9-二氫-s
-二環戊烷并苯[1,2-b
:5,6-b
']二噻吩-4,9-二酮(9.6克,32.6毫莫耳)及KOH(5.5克,97.8毫莫耳)存於二乙二醇(100公分3
)之懸浮液中。將混合物加熱至180℃持續6小時,且隨後使其冷卻至23℃過夜。添加NH3
/H2
O(1:1,200公分3
)並將混合物攪拌30分鐘。藉由過濾收集固體,用H2
O(2×300公分3
)及IMS(2×300公分3
)洗滌,並在真空下乾燥以得到呈褐色固體之產物(6.89克,79%)。1
H NMR(300MHz,d6
-DMSO):δ(ppm)7.71(s,2H,Ar-H),7.55(d,J=4.9Hz,2H),7.21(d,J=4.9Hz,2H,Ar-H),3.77(s,4H,CH2
)。
向3-頸燒瓶中添加4,9-二氫-s
-二環戊烷并苯[1,2-b
:5,6-b
']二噻吩(3.0克,11.3毫莫耳)及無水DMSO(60公分3
)並將混合物脫氣20分鐘。逐份向該混合物中添加第三-丁醇鈉(6.69克,68.9毫莫耳)並將該混合物加熱至80℃。經30分鐘逐滴添加1-溴辛烷(12公分3
,69.5毫莫耳),以確保反應混合物溫度不會升高至90℃以上。隨後將混合物在85℃下加熱3小時。使混合物冷卻至70℃並倒入冰水(100公分3
)中。用DCM(2×200公分3
)萃取產物且經合併有機物用水(3×200公分3
)洗滌,用無水硫酸鎂乾燥,過濾並在真空中去除溶劑。藉由管柱層析(洗脫液:石油醚40-60)對粗產物實施純化,以得到呈黃色油狀物之產物,將其結晶成黃色固體(2.83克,28%)。1
H NMR(300MHz,CDCl3
):δ(ppm)7.27(s,2H,Ar-H),7.25(d,J=4.9Hz,2H,Ar-H),6.96(d,J=4.9Hz,2H,Ar-H),1.79-2.02(m,8H,CH2
),1.02-1.34(m,40H,CH2
),0.71-0.93(m,20H,CH3
& CH2
).13
C NMR(75MHz;CDCl3
):δ(ppm)155.1,153.2,141.6,135.6,126.1,121.7,113.1,53.7,39.2,31.8,30.0,29.33,29.25,24.2,22.6,14.1。
向4,9-二氫-4,4,9,9-四辛基-s
-二環戊烷并苯[1,2-b
:5,6-b
']-二噻吩(2.0克,2.2毫莫耳)溶於無水THF(100公分3
)之溶液中添加NBS(0.98克,5.5毫莫耳)並將該溶液在50℃下加熱2小時,且隨後在40℃下加熱17小時。使該混合物冷卻並倒入水(100公分3
)中。用DCM(2×100公分3
)萃取產物且經合併有機萃取物用無水硫酸鎂乾燥,過濾並在真空中去除溶劑。藉由管柱層析(洗脫液:石油醚40-60)隨後自DCM/MeOH再結晶對粗產物實施純化,以得到呈橙紅色結晶固體之產物(1.81克,93%)。1
H NMR(300MHz,CDCl3
):δ(ppm)7.17(s,2H,Ar-H),6.96(s,2H,Ar-H),1.75-2.01(m,8H,CH2
),1.04-1.35(m,40H,CH2
),0.71-0.92(m,20H,CH3
& CH2
).13
C NMR(75MHz,CDCl3
):δ(ppm)154.1,152.2,141.9,135.5,124.8,113.0,112.4,54.7,39.0,31.8,30.0,29.3,24.1,22.6,14.1。
向3-頸250公分3
燒瓶中添加1(3.00克,11.3毫莫耳)及無水DMSO(60公分3
)並將該混合物脫氣(將N2
鼓泡通入攪拌混合物中)20分鐘。逐份向其中添加第三-丁醇鈉(6.69克,68.9毫莫耳)且隨後將混合物加熱至80℃。經30分鐘逐滴添加1-溴十六烷(21.9公分3
,69.5毫莫耳),確保該反應混合物不會升高至90℃以上。隨後將混合物在85℃下加熱3小時。使混合物冷卻至70℃並倒入冰水(100公分3
)中。用DCM(2×200公分3
)萃取產物且經合併有機物用水(3×200公分3
)洗滌,用無水硫酸鎂乾燥,過濾並在真空中去除溶劑。藉由管柱層析(洗脫液:石油醚40-60)隨後自DCM再結晶對粗產物實施純化,以得到呈灰白色固體之產物(1.45克,11%)。1
H NMR(300MHz,CDCl3
):δ(ppm)7.27(s,2H,Ar-H),7.25(d,J=4.9Hz,2H,Ar-H),6.96(d,J=4.9Hz,Ar-H),1.77-2.06(m,8H,CH2
),1.01-1.35(m,104H,CH2
),0.76-0.92(m,20H,CH3
& CH2
).13
C NMR(75MHz,CDCl3
):δ(ppm)155.1,153.2,141.7,135.6,126.1,121.7,113.1,53.7,39.1,32.0,30.0,29.7,29.6,29.4,24.2,22.7,14.1。
向1(1.00克,0.86毫莫耳)溶於無水THF(50公分3
)之溶液中添加NBS(0.32克,1.8毫莫耳)並將該溶液在50℃下加熱2小時,且隨後在40℃下加熱17小時。使混合物冷卻且倒入水(50公分3
)中並用DCM(2×50公分3
)萃取產物。經合併有機萃取物用無水硫酸鎂乾燥,過濾並在真空中去除溶劑。藉由管柱層析(洗脫液:石油醚40-60至EtOAc)隨後自DCM/MeOH再結晶對粗產物實施純化,以得到呈淺橙紅色固體之產物(0.70克,62%)。1
H NMR(300MHz,CDCl3
):δ(ppm)7.17(s,2H,Ar-H),6.96(s,2H,Ar-H),1.75-2.01(m,8H,CH2
),1.03-1.43(m,104H,CH2
),0.70-0.97(m,20H,CH3
& CH2
).13
C NMR(75MHz;CDCl3
):δ(ppm)154.1,152.2,141.9,135.5,124.8,113.0,112.4,54.7,39.0,32.0,29.9,29.7,29.6,29.4,29.3,24.1,22.7,14.1。
向2,7-二溴-4,9-二氫-4,4,9,9-四(十六烷基)-s
-二環戊烷并苯[1,2-b
:5,6-b
']二噻吩(4.81克,3.64毫莫耳)及2-(三丁基甲錫烷基)噻吩(2.68公分3
,8.0毫莫耳)溶於無水DMF(150公分3
)之脫氣混合物中添加雙(三苯基膦)二氯化鈀(II)(0.13克,0.18毫莫耳)並使該混合物進一步脫氣。將該混合物在100℃下加熱17小時。使混合物冷卻且倒入水(500公分3
)中並用DCM(3×300公分3
)萃取產物。經合併有機萃取物用無水硫酸鎂乾燥,過濾並在真空中去除溶劑。藉由管柱層析(洗脫液:石油醚40-60)對粗產物實施純化,以得到呈黃色固體之產物(4.09克,85%)。1
H NMR(300MHz,CDCl3
):δ(ppm)7.22(s,2H,Ar-H),7.18-7.22(m,4H,Ar-H),7.05(s,2H,Ar-H),7.01-7.05(dd,J=3.6,5.1Hz,2H,Ar-H),1.79-2.05(m,8H,CH2
),1.04-1.34(m,104H,CH2),0.74-0.97(m,20H,CH2
& CH3
).13
C NMR(75MHz;CDCl3
):δ(ppm)155.7,153.0,140.6,138.7,138.6,135.6,127.9,123.7,122.8,118.4,112.9,54.1,39.1,32.0,30.0,29.8,29.7,29.6,29.4,24.2,22.7,14.2。
向2,7-雙(2-噻吩基)-4,9-二氫-4,4,9,9-四(十六烷基)-s
-二環戊烷并苯[1,2-b
:5,6-b
']二噻吩(2.00克,1.5毫莫耳)溶於無水THF(100公分3
)之溶液中添加NBS(0.54克,3.0毫莫耳)並將該溶液在23℃下攪拌17小時。將混合物倒入水(300公分3
)中並用DCM(2×250公分3
)萃取產物。經合併有機萃取物用無水硫酸鎂乾燥,過濾並在真空中去除溶劑。藉由管柱層析(洗脫液:石油醚40-60)隨後自MeCN/甲苯再結晶對粗產物實施純化,以得到呈黃色固體之產物(1.95克,87%)。1
H NMR(300MHz,CDCl3
):δ(ppm)7.22(s,2H,Ar-H),6.98(s,2H,Ar-H),6.97(d,J=3.8Hz,2H,Ar-H),6.94(d,J=3.8Hz,2H,Ar-H),1.78-2.05(m,8H,CH2
),1.03-1.36(m,104H,CH2
),0.72-0.96(m,20H,CH2
& CH3
).13
C NMR(75MHz;CDCl3
):δ(ppm)155.8,153.1,141.0,140.2,137.6,135.6,130.6,122.8,118.5,113.1,110.2,54.2,39.0,32.0,30.0,29.8,29.7,29.6,29.4,29.3,24.1,22.7,14.2。
向2,7-二溴-4,9-二氫-4,4,9,9-四(十六烷基)-s
-二環戊烷并苯[1,2-b
:5,6-b
']二噻吩(0.60克,0.45毫莫耳)、4,7-雙(4,4,5,5-四甲基-1,3,2-二氧硼-2-基)-2,1,3-苯并噻二唑(0.176克,0.45毫莫耳)、三(二亞苄基丙酮)二鈀(0)(8.3毫克,0.009毫莫耳)、三(鄰-甲苯基)膦(11毫克,0.04毫莫耳)及甲苯(15公分3
)之混合物中添加Aliquat 336(0.10克)並對該混合物實施脫氣。向該混合物中添加碳酸鈉(2.0M,0.7公分3
)之脫氣水溶液並使混合物進一步脫氣。將該混合物在110℃下加熱17小時。使混合物冷卻並倒入甲醇(100公分3
)中。藉由過濾收集粗產物並用甲醇(100公分3
)、水(100公分3
)及甲醇(100公分3
)進行洗滌。將粗產物在水(100公分3
)中攪拌1小時,過濾並用甲醇(200公分3
)進行洗滌。將固體吸收於甲苯(20公分3
)中並沉澱至攪拌的甲醇(60公分3
)中。藉由過濾收集沉澱,以得到呈紫色固體之聚合物1(0.52克,88%)。1
H NMR如所預期結果。GPC(PhCl,60℃)Mw=79,000克/莫耳,Mn=31,000克/莫耳,λmax
(DCM)656奈米。
向2,7-雙(5-溴噻吩2-基)-4,9-二氫-4,4,9,9-四(十六烷基)-s
-二環戊烷并苯[1,2-b
:5,6-b
']二噻吩(1.00克,0.67毫莫耳)、4,7-雙(4,4,5,5-四甲基-1,3,2-二氧硼-2-基)-2,1,3-苯并噻二唑(0.26克,0.67毫莫耳)、叁(二亞苄基丙酮)二鈀(0)(12毫克,0.013毫莫耳)、三(鄰-甲苯基)膦(16毫克,0.05毫莫耳)及甲苯(25公分3
)之混合物中添加Aliquat 336(0.10克)並對混合物實施脫氣。向混合物中添加碳酸鈉(2.0M,1.0公分3
)之脫氣水溶液並使混合物進一步脫氣。將該混合物在110℃下加熱17小時。使混合物冷卻並倒入甲醇(100公分3
)中。藉由過濾收集粗產物並用甲醇(100公分3
)、水(50公分3
)及甲醇(50公分3
)洗滌。將固體吸收於溫熱甲苯(75公分3
)中並沉澱至攪拌的甲醇(250公分3
)中。藉由過濾收集沉澱,用甲醇(50公分3
)、水(50公分3
)及甲醇(50公分3
)洗滌。藉由用庚烷、丙酮進行索式(soxhlet)洗滌並用環己烷萃取來對聚合物實施進一步純化。將環己烷混合物在真空下濃縮至150公分3
並沉澱至攪拌的甲醇(600公分3
)中。藉由過濾收集聚合物並用甲醇(100公分3
)進行洗滌,以得到呈暗紅色固體之聚合物2(0.86克,87%)。1H NMR如所預期結果。GPC(PhCl,60℃)Mw=101,000克/莫耳,Mn=34,000克/莫耳。λmax
(PhCl)608奈米。
向2,7-二溴-4,9-二氫-4,4,9,9-四辛基-s
-二環戊烷并苯[6,2-b
:5,6-b
']二噻吩(1.250克,1.432毫莫耳)、4,4-雙(4,4,5,5-四甲基-1,3,2-二氧硼-2-基)-N
,N
-二苯基-N
-(4-(1-甲基丙基)苯基)胺(0.792克,1.43毫莫耳)、甲苯基硼酸酯(1.7毫克,0.01毫莫耳)及磷酸鉀單水合物(1.45克,6.3毫莫耳)之混合物中添加脫氣甲苯(14公分3
)、脫氣1,4-二噁烷(14公分3
)及脫氣水(14公分3
)。將該混合物進一步脫氣並將其放低至105℃之預熱油浴中。當混合物開始回流時,添加乙酸鈀(II)(2.6毫克,0.01毫莫耳)及三(鄰-甲苯基)膦(20.9毫克,0.07毫莫耳)溶於脫氣1,4-二噁烷(2公分3
)之脫氣溶液。將混合物在105℃下劇烈攪拌2小時。向該混合物中添加甲苯基硼酸酯(5.5毫克,0.03毫莫耳)及乙酸鈀(II)(2.6毫克,0.01毫莫耳)及三(鄰-甲苯基)膦(20.9毫克,0.07毫莫耳)溶於脫氣1,4-二噁烷(2公分3
)之脫氣溶液。將混合物在105℃下劇烈攪拌1小時。使混合物冷卻至65℃並添加二乙基二硫代胺基甲酸鈉三水合物水溶液(14公分3
,10%)及甲苯(14公分3
)。將該混合物在65℃下攪拌17小時。使混合物冷卻,添加甲苯(20公分3
)並用水(3×200公分3
)洗滌有機層。將混合物沉澱至攪拌的甲醇(150公分3
)中並藉由過濾收集沉澱。在30℃下將粗產物溶於甲苯(40公分3
)中並經由矽藻土墊過濾且用溫熱甲苯(2×80公分3
)洗滌。將經合併溶液沉澱至攪拌的甲醇(500公分3
)中並藉由過濾收集聚合物,用甲醇(30公分3
)洗滌,以得到呈橙色固體之聚合物3(1.13克,78%)。1H NMR如所預期結果。GPC(PhCl,60℃)Mw=65,000克/莫耳,Mn=32,000克/莫耳。λmax
(DCM)476奈米。
在具有熱生長二氧化矽(SiO2
)絕緣層之經高度摻雜的矽基板上製造薄膜有機場效電晶體(OFET),其中該基板作為共用閘極電極。電晶體源極-汲極金電極係以光微影技術界定在SiO2
層上。在有機半導體沈積之前,用辛基三氯矽烷(OTS)處理FET基板。隨後藉由將溶於二氯苯(1重量%)中之聚合物溶液旋塗在FET基板上而沈積半導體薄膜。隨後使樣品乾燥並在100℃下於氮氣下實施退火10分鐘。在乾燥氮氣及大氣環境下使用電腦控制的Agilent 4155C半導體參數分析儀來實施電晶體裝置之電性定性。
實例4及5之聚合物1及2的電晶體裝置特徵分別係薄膜上量測且該等裝置展示典型的p型行為,其具有良好的電流調變、及良好界定的線性及飽和區域(saturation regime)。計算飽和區域中之聚合物1及2的電荷載流子遷移率(μsat
)並示於表1中。使用方程式(1)計算飽和區域(Vd
>(Vg
-V0
))中的場效遷移率:
dId sat
/dVg
=μsat*
(W*
Ci
/L)*
(Vg
-V0
) (1)
其中W係溝道寬度,L係溝道長度,Ci
係絕緣層之電容,Id
係飽和區域中之源極-汲極電流,Vd
係源極-汲極電壓,Vg
係閘極電壓,V0
係導通電壓,且μsat
係飽和區域中之電荷載流子遷移率。導通電壓(V0
)在源極-汲極電流開始時確定。
Claims (16)
- 一種共軛聚合物,其包括一或多個相同或不同的式I之單體單元
- 如請求項1之聚合物,其特徵在於其係選自式II
- 如請求項2之聚合物,其特徵在於其係選自式IIa
- 如請求項1至3中任一項之聚合物,其特徵在於其係選自由下列子式組成之群:
- 如請求項1至3中任一項之聚合物,其係選自下式:
- 如請求項1至3中任一項之聚合物,其係選自式IIa1:R5 -鏈-R6 IIa1其中R5 及R6 皆如請求項3中所定義,且「鏈」係選自由如請求項4及5中所定義之子式II1-II10及II2a組成之群之聚合物鏈。
- 如請求項1至3中任一項之聚合物,其特徵在於R1-4 相互獨立地選自直鏈或具支鏈C1 -C20 -烷基、C1 -C20 -烷氧基、C2 -C20 -烯基、C2 -C20 -炔基、C1 -C20 -硫代烷基、C1 -C20 -甲矽烷基、C1 -C20 -酯、C1 -C20 -胺基、C1 -C20 -氟烷基。
- 如請求項1至3中任一項之聚合物,其特徵在於Ar1 及Ar2 相互獨立地選自由下列組成之群:2,1,3-苯并噻二唑-4,7-二基、2,1,3-苯并硒二唑-4,7-二基、2,3-二氰基-1,4-伸苯基、2,5-二氰基-1,4-伸苯基、2,3-二氟-1,4-伸苯基、2,5-二氟-1,4-伸苯基、2,3,5,6-四氟-1,4-伸苯基、3,4-二氟噻吩-2,5-二基、噻吩并[3,4-b]吡嗪-2,5-二基、喹喔啉-5,8-二基、硒吩-2,5-二基、噻吩-2,5-二基、噻吩并[3,2-b]噻吩-2,5-二基、噻吩并[2,3-b]噻吩-2,5-二基、硒吩并[3,2-b]硒吩-2,5-二基、硒吩并[2,3-b]硒吩-2,5-二基、硒吩并[3,2-b]噻吩-2,5-二基、硒吩并[2,3-b]噻吩-2,5-二基、1,4-伸苯基、吡啶-2,5-二基、嘧啶-2,5-二基、p-p'-聯苯基、萘-2,6-二基、苯并[1,2-b:4,5-b']二噻吩-2,6-二基、2,2-二噻吩、2,2-二硒吩、噻唑及噁唑,其全部皆可未經取代、經如請求項1中所定義之R1 單取代或多取代。
- 一種聚合物摻合物,其包括一或多種如請求項1至8中任一項之聚合物及一或多種選自具有半導電、電荷轉移、電洞/電子轉移、電洞/電子阻擋、導電、光導或發光特性之聚合物的聚合物。
- 一種調配物,其包括一或多種如請求項1至9中任一項之聚合物或聚合物摻合物及一或多種溶劑。
- 一種如請求項1至10中任一項之聚合物、聚合物摻合物或調配物之用途,其作為電荷轉移、半導電、導電、光導或發光材料用於光學、電光、電子、電致發光或光致發光組件或裝置中。
- 電光或電子組件或裝置,其包括一或多種如請求項1至10中任一項之聚合物、聚合物摻合物或調配物。
- 如請求項12之組件或裝置,其特徵在於其係選自由下列組成之群:有機場效電晶體(OFET)、薄膜電晶體(TFT)、積體電路(IC)、邏輯電路、電容器、射頻識別(RFID)標籤、裝置或組件、有機發光二極體(OLED)、有機發光電晶體(OLET)、平板顯示器、顯示器之背光、有機光電伏打裝置(OPV)、太陽能電池、雷射二極體、光電導體、光檢測器、電子照相裝置、電子照相記錄裝置、有機記憶裝置、感測器裝置、聚合物發光二極體(PLED)中之電荷注入層、電荷轉移層或夾層、Schottky二極體、平坦化層、抗靜電膜、聚合物電解質隔膜(PEM)、導電基板、導電圖案、蓄電池中之電極材料、配向層、生物感測器、生物晶片、安全標記、安全裝置、及用來檢測及鑑別DNA序列之組件或裝置。
- 如請求項13之組件或裝置,其係本體異質接面OPV裝置。
- 一種製備如請求項1-8中任一項之聚合物之方法,其係藉由使一或多種式Ia單體未與或與一或多種式R7 -Ar1 -R8 及/或R7 -Ar2 -R8 之單體進行芳基-芳基偶合反應來達成:
- 一種式Ia單體
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JP (2) | JP5647121B2 (zh) |
KR (1) | KR101562423B1 (zh) |
CN (1) | CN102124044B (zh) |
DE (1) | DE112009001505T5 (zh) |
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GB201103364D0 (en) | 2011-04-13 |
RU2011110114A (ru) | 2012-09-27 |
JP2012500308A (ja) | 2012-01-05 |
WO2010020329A1 (en) | 2010-02-25 |
JP5951707B2 (ja) | 2016-07-13 |
EP2315793B1 (en) | 2013-08-21 |
CN102124044B (zh) | 2014-09-10 |
JP2015038210A (ja) | 2015-02-26 |
JP5647121B2 (ja) | 2014-12-24 |
CN102124044A (zh) | 2011-07-13 |
US20110226999A1 (en) | 2011-09-22 |
KR20110058796A (ko) | 2011-06-01 |
KR101562423B1 (ko) | 2015-10-21 |
TW201012840A (en) | 2010-04-01 |
GB2474623B (en) | 2012-08-29 |
DE112009001505T5 (de) | 2011-07-14 |
EP2315793A1 (en) | 2011-05-04 |
US9017577B2 (en) | 2015-04-28 |
GB2474623A (en) | 2011-04-20 |
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