TWI457642B - Display device and manufacturing method thereof - Google Patents
Display device and manufacturing method thereof Download PDFInfo
- Publication number
- TWI457642B TWI457642B TW100136709A TW100136709A TWI457642B TW I457642 B TWI457642 B TW I457642B TW 100136709 A TW100136709 A TW 100136709A TW 100136709 A TW100136709 A TW 100136709A TW I457642 B TWI457642 B TW I457642B
- Authority
- TW
- Taiwan
- Prior art keywords
- transparent cover
- opaque
- electrode
- photoresist layer
- touch sensing
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 229920002120 photoresistant polymer Polymers 0.000 claims description 60
- 238000000034 method Methods 0.000 claims description 29
- 239000000463 material Substances 0.000 claims description 26
- 238000001459 lithography Methods 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 63
- 239000000976 ink Substances 0.000 description 15
- 238000007650 screen-printing Methods 0.000 description 10
- 239000011241 protective layer Substances 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229920001690 polydopamine Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Landscapes
- Position Input By Displaying (AREA)
Description
本發明有關於顯示元件，且特別是有關於顯示裝置及其製作方法。The present invention relates to display elements, and more particularly to display devices and methods of making the same.
隨著數位科技的進步，各種資訊處理設備以驚人的速度蓬勃發展，各種類型的多媒體隨時在生活中提供豐富的數位資訊，在此等數位資訊的浪潮下，觸控面板的應用早已成了多方關注的焦點。從PDA、手機用3吋小型液晶面板開始，至工業用設備以及商務終端產品所使用的10吋以上的中型液晶面板，觸控面板的應用範圍已經逐漸擴張，甚至有部分已延伸至10吋以上之大型面板的領域。With the advancement of digital technology, various information processing devices are booming at an alarming rate. Various types of multimedia provide rich digital information in life at any time. Under the wave of digital information, the application of touch panels has become a multi-party. The focus of attention. From 3D small LCD panels for PDAs and mobile phones, to medium-sized LCD panels of more than 10 inches used in industrial equipment and business terminal products, the application range of touch panels has gradually expanded, and some have even extended to more than 10 inches. The field of large panels.
目前，觸控式手機是當紅的電子產品，觸控式手機一般是將一玻璃蓋板(Cover Glass)與一顯示面板接合，其中玻璃蓋板之朝向顯示面板的表面上設置有一飾層(decoration layer)，用以遮蔽顯示面板的非顯示區，以避免使用者透過玻璃蓋板直接看到顯示面板的非顯示區。At present, the touch-type mobile phone is a popular electronic product. The touch-type mobile phone generally engages a cover glass (Cover Glass) with a display panel, wherein the glass cover is provided with a decorative layer on the surface of the display panel (decoration) The layer is used to shield the non-display area of the display panel to prevent the user from directly seeing the non-display area of the display panel through the glass cover.
形成飾層的方法一般為網印油墨，由於手機面板上的功能鍵圖案需要與周圍的飾層有顏色上的差異，例如功能鍵圖案為灰色(黑色油墨的厚度較小)而周圍的飾層為黑色(黑色油墨的厚度較大)，因此，需要進行多次網印製程才能形成不同厚度的飾層。再者，在每一次的網印製程之後，必須進行一次烘烤固化製程，以使油墨固化，如此才能進行下一次的網印製程。因此，網印油墨的方式相當費時。此外，在網印油墨時，容易有異物落入油墨中、油墨缺損、溢墨、偏移等問題，以致於降低製程良率。再者，用以進行網印油墨的網版由於使用壽命較短，故需經常更換。The method of forming the decorative layer is generally a screen printing ink, because the function key pattern on the mobile phone panel needs to have a color difference with the surrounding decorative layer, for example, the function key pattern is gray (the thickness of the black ink is small) and the surrounding decorative layer It is black (the thickness of the black ink is large), so it is necessary to perform multiple screen printing processes to form the decorative layers of different thicknesses. Furthermore, after each screen printing process, a baking curing process must be performed to cure the ink so that the next screen printing process can be performed. Therefore, the way of screen printing ink is quite time consuming. In addition, when screen printing ink, it is easy to have foreign matter falling into the ink, ink defect, ink overflow, offset and the like, so that the process yield is lowered. Moreover, the screen used for screen printing inks needs to be replaced frequently because of its short service life.
本發明一實施例提供一種顯示裝置，包括：一顯示面板，具有一顯示區與一非顯示區；一透光蓋板，覆蓋顯示面板，且具有一第一區對應顯示區與一第二區對應非顯示區；以及一不透光的光阻層，位於顯示面板與透光蓋板之間，並位於透光蓋板的第二區中，且具有至少一盲孔。An embodiment of the present invention provides a display device including: a display panel having a display area and a non-display area; a transparent cover covering the display panel and having a first area corresponding to the display area and a second area Corresponding to the non-display area; and an opaque photoresist layer between the display panel and the transparent cover, and located in the second area of the transparent cover, and having at least one blind hole.
本發明一實施例提供一種顯示裝置的製作方法，包括：提供一透光蓋板，透光蓋板具一第一區與一第二區；於透光蓋板上形成一不透光的光阻材料層，不透光的光阻材料層位於第二區中；利用一半色調光罩對不透光的光阻材料層進行一微影製程，以圖案化不透光的光阻材料層而成一不透光的光阻層，不透光的光阻層具有至少一盲孔；以及將透光蓋板連同不透光的光阻層接合至一顯示面板，其中不透光的光阻層位於顯示面板與透光蓋板之間，顯示面板具有一顯示區與一非顯示區，且透光蓋板的第一區與第二區分別對應顯示面板的顯示區與非顯示區。An embodiment of the present invention provides a method for fabricating a display device, including: providing a transparent cover plate, the transparent cover plate having a first region and a second region; forming an opaque light on the transparent cover plate a resistive material layer, the opaque photoresist material layer is located in the second region; using a halftone mask to perform a lithography process on the opaque photoresist material layer to pattern the opaque photoresist material layer Forming an opaque photoresist layer, the opaque photoresist layer has at least one blind hole; and bonding the transparent cover plate together with the opaque photoresist layer to a display panel, wherein the opaque photoresist layer The display panel has a display area and a non-display area, and the first area and the second area of the transparent cover respectively correspond to the display area and the non-display area of the display panel.
以下將詳細說明本發明實施例之製作與使用方式。然應注意的是，本發明提供許多可供應用的發明概念，其可以多種特定型式實施。文中所舉例討論之特定實施例僅為製造與使用本發明之特定方式，非用以限制本發明之範圍。此外，在不同實施例中可能使用重複的標號或標示。這些重複僅為了簡單清楚地敘述本發明，不代表所討論之不同實施例及/或結構之間具有任何關連性。再者，當述及一第一材料層位於一第二材料層上或之上時，包括第一材料層與第二材料層直接接觸或間隔有一或更多其他材料層之情形。在圖式中，實施例之形狀或是厚度可擴大，以簡化或是方便標示。再者，圖中未繪示或描述之元件，為所屬技術領域中具有通常知識者所知的形式。The manner of making and using the embodiments of the present invention will be described in detail below. It should be noted, however, that the present invention provides many inventive concepts that can be applied in various specific forms. The specific embodiments discussed herein are merely illustrative of specific ways of making and using the invention, and are not intended to limit the scope of the invention. Moreover, repeated numbers or labels may be used in different embodiments. These repetitions are merely for the purpose of simplicity and clarity of the invention and are not to be construed as a limitation of the various embodiments and/or structures discussed. Furthermore, when a first material layer is referred to or on a second material layer, the first material layer is in direct contact with or separated from the second material layer by one or more other material layers. In the drawings, the shape or thickness of the embodiment may be expanded to simplify or facilitate the marking. Furthermore, elements not shown or described in the figures are in the form known to those of ordinary skill in the art.
第1A圖至第1G圖繪示本發明一實施例之顯示裝置的製作方法。首先，請參照第1A圖，提供一透光蓋板110，透光蓋板110具一第一區112與一第二區114，其中第一區112與第二區114係分別對應之後將組裝於其上的顯示面板的顯示區與非顯示區。在本實施例中，第二區114係圍繞第一區112。透光蓋板110的材質例如為玻璃。1A to 1G are views showing a method of fabricating a display device according to an embodiment of the present invention. First, referring to FIG. 1A, a transparent cover 110 is provided. The transparent cover 110 has a first area 112 and a second area 114. The first area 112 and the second area 114 are respectively corresponding to each other and then assembled. The display area and the non-display area of the display panel thereon. In the present embodiment, the second zone 114 surrounds the first zone 112. The material of the transparent cover plate 110 is, for example, glass.
接著，在透光蓋板110的一表面S上全面形成一不透光的光阻材料層120a，以使不透光的光阻材料層120a覆蓋第一區112與第二區114。形成不透光的光阻材料層120a的方法例如為旋轉塗佈。在其他未繪示的實施例中，亦可例如用印刷的方式使不透光的光阻材料層120a僅形成在第二區114上，而不形成在第一區112上。不透光的光阻材料層120a的材質例如為可吸收可見光的材料，以阻擋可見光。不透光的光阻材料層120a例如為一黑色的光阻材料層。Then, an opaque photoresist layer 120a is formed on a surface S of the transparent cover 110 such that the opaque photoresist layer 120a covers the first region 112 and the second region 114. A method of forming the light-impermeable photoresist material layer 120a is, for example, spin coating. In other embodiments not shown, the opaque photoresist layer 120a may also be formed on the second region 114 only, for example, by printing, without being formed on the first region 112. The material of the opaque photoresist layer 120a is, for example, a material that absorbs visible light to block visible light. The opaque photoresist layer 120a is, for example, a black photoresist layer.
然後，提供一半色調光罩H，半色調光罩H具有全透光區A1(透光率100%)、半透光區A2(透光率1%～99%)、以及遮光區A3(透光率0%)。全透光區A1位於第一區112以及部分第二區114上，半透光區A2與遮光區A3位於部分第二區114上。利用半色調光罩H對不透光的光阻材料層120a進行一曝光製程，以使光線照射到位於第一區112以及部分第二區114中的光阻材料層120a。Then, a halftone mask H is provided, and the halftone mask H has a full light transmission area A1 (light transmittance: 100%), a semi-light transmission area A2 (light transmittance: 1% to 99%), and a light shielding area A3 (through Light rate 0%). The fully transparent region A1 is located on the first region 112 and the portion of the second region 114, and the semi-transmissive region A2 and the light-shielding region A3 are located on the portion of the second region 114. The opaque photoresist layer 120a is subjected to an exposure process using a halftone mask H to illuminate the photoresist layer 120a located in the first region 112 and a portion of the second region 114.
之後，請參照第1B圖，進行一顯影製程，以圖案化不透光的光阻材料層120a而成一不透光的光阻層120。不透光的光阻層120具有盲孔122、穿孔124、以及顯示區開口126，其中顯示區開口126暴露出第一區112，穿孔124暴露出部分的第二區114。之後，可對不透光的光阻層120進行一烘烤固化製程，以使不透光的光阻層120固化。Thereafter, referring to FIG. 1B, a developing process is performed to pattern the opaque photoresist material layer 120a to form an opaque photoresist layer 120. The opaque photoresist layer 120 has blind vias 122, vias 124, and display region openings 126, wherein the display region openings 126 expose the first regions 112 and the vias 124 expose portions of the second regions 114. Thereafter, a bake curing process may be performed on the opaque photoresist layer 120 to cure the opaque photoresist layer 120.
值得注意的是，相較於習知技術是採用油墨並搭配進行多次網印以及烘烤固化製程來製作不同厚度的飾層，本實施例是採用不透光的光阻材料並搭配使用半色調光罩進行曝光製程來製作飾層，故本實施例僅需進行一次微影製程即可製得不同厚度的飾層，進而可節省製程時間。此外，由於曝光製程的精確度較高，故可避免網印油墨所產生的油墨缺損、溢墨、以及偏移的問題，進而提昇製程良率。再者，本實施例可避免因網版的使用壽命較短以致於需經常更換所造成的不便。It is worth noting that, compared with the prior art, the ink is used in combination with multiple screen printing and baking curing processes to produce different thicknesses of the decorative layer. In this embodiment, an opaque photoresist material is used and used in combination. The color mask is subjected to an exposure process to produce a decorative layer. Therefore, in this embodiment, only one lithography process is required to obtain a decorative layer of different thicknesses, thereby saving process time. In addition, since the accuracy of the exposure process is high, the problem of ink defect, ink overflow, and offset generated by the screen printing ink can be avoided, thereby improving the process yield. Moreover, this embodiment can avoid the inconvenience caused by the short service life of the screen and the need for frequent replacement.
之後，在透光蓋板110的第一區112中形成一觸控感測元件。舉例來說，請參照第1C圖，於透光蓋板110上形成一第一電極132以及一與第一電極132分離的第二電極136a。第一電極132以及第二電極136a的材質為透明導電材料，如氧化銦錫(ITO)。然後，請參照第1D圖，第一電極132上覆蓋一絕緣層134，且絕緣層134分隔於第一電極132與第二電極136a之間。絕緣層134的材質例如為透光的光阻材料。Thereafter, a touch sensing element is formed in the first region 112 of the transparent cover 110. For example, referring to FIG. 1C, a first electrode 132 and a second electrode 136a separated from the first electrode 132 are formed on the transparent cover 110. The material of the first electrode 132 and the second electrode 136a is a transparent conductive material such as indium tin oxide (ITO). Then, referring to FIG. 1D, the first electrode 132 is covered with an insulating layer 134, and the insulating layer 134 is separated between the first electrode 132 and the second electrode 136a. The material of the insulating layer 134 is, for example, a light-transmitting photoresist.
接著，請參照第1E圖，於絕緣層134上形成一橋接部分136，其中橋接部分136與第一電極132重疊且與第二電極136a相連，絕緣層134分隔第一電極132與橋接部分136，其中第一電極132、第二電極136a、絕緣層134與橋接部分136構成一觸控感測元件130，其為一電容式觸控感測元件。橋接部分136的材質例如為金屬。觸控感測元件130例如為一透光元件。Next, referring to FIG. 1E, a bridging portion 136 is formed on the insulating layer 134. The bridging portion 136 is overlapped with the first electrode 132 and connected to the second electrode 136a. The insulating layer 134 separates the first electrode 132 from the bridging portion 136. The first electrode 132, the second electrode 136a, the insulating layer 134 and the bridge portion 136 form a touch sensing component 130, which is a capacitive touch sensing component. The material of the bridge portion 136 is, for example, metal. The touch sensing component 130 is, for example, a light transmissive component.
值得注意的是，第1E圖僅示範性地繪示一第一電極132與一第二電極136a，但並非用以限定本發明，舉例來說，在其他實施例中，觸控感測元件可由多個第一電極、多個第二電極以及分隔於第一電極與第二電極之間的絕緣層構成。It is to be noted that the first electrode 132 and the second electrode 136a are only exemplarily illustrated in FIG. 1E, but are not intended to limit the present invention. For example, in other embodiments, the touch sensing component may be The plurality of first electrodes, the plurality of second electrodes, and an insulating layer partitioned between the first electrode and the second electrode.
此外，在此係以電容式觸控感測元件為例作說明，但並非用以限定本發明，舉例來說，觸控感測元件亦可為電阻式觸控感測元件、光學式觸控感測元件、或是其他適合的觸控感測元件。In this case, the capacitive touch sensing component is taken as an example, but is not intended to limit the present invention. For example, the touch sensing component can also be a resistive touch sensing component and an optical touch. Sensing element, or other suitable touch sensing element.
接著，請參照第1F圖，可選擇性地於透光蓋板110的表面S上全面形成一絕緣的保護層P，以覆蓋並保護不透光的光阻層120以及觸控感測元件130。保護層P的材質例如為透光的光阻材料。Next, referring to FIG. 1F , an insulating protective layer P is selectively formed on the surface S of the transparent cover 110 to cover and protect the opaque photoresist layer 120 and the touch sensing component 130 . . The material of the protective layer P is, for example, a light-transmitting photoresist.
第2圖繪示第1G圖的顯示裝置的上視圖，第1G圖係繪示沿第2圖的I-I’線段的剖面圖。然後，請同時參照第1G圖與第2圖，翻覆透光蓋板110，並將透光蓋板110連同不透光的光阻層120接合至一顯示面板140，其中不透光的光阻層120位於顯示面板140與透光蓋板110之間。透光蓋板110例如採用硬質材料以保護其下的顯示面板140。Fig. 2 is a top view of the display device of Fig. 1G, and Fig. 1G is a cross-sectional view taken along line I-I' of Fig. 2. Then, referring to FIG. 1G and FIG. 2 simultaneously, flipping the transparent cover 110 and bonding the transparent cover 110 together with the opaque photoresist layer 120 to a display panel 140, wherein the opaque photoresist The layer 120 is located between the display panel 140 and the transparent cover 110. The light transmissive cover 110 is, for example, made of a hard material to protect the display panel 140 thereunder.
顯示面板140具有一顯示區142與一非顯示區144，且透光蓋板110的第一區112與第二區114分別位於顯示面板140的顯示區142與非顯示區144上。此時，已初步完成本實施例之顯示裝置100。顯示裝置100例如為一智慧型手機或平板電腦。The display panel 140 has a display area 142 and a non-display area 144, and the first area 112 and the second area 114 of the transparent cover 110 are respectively located on the display area 142 and the non-display area 144 of the display panel 140. At this time, the display device 100 of the present embodiment has been initially completed. The display device 100 is, for example, a smart phone or a tablet.
以下將詳細介紹第1G圖的顯示裝置100的結構。The structure of the display device 100 of Fig. 1G will be described in detail below.
請同時參照第1G圖與第2圖，本實施例之顯示裝置100包括一顯示面板140、一透光蓋板110、以及一不透光的光阻層120。顯示面板140具有一顯示區142與一非顯示區144。透光蓋板110覆蓋顯示面板140，且具有一第一區112對應顯示區142與一第二區114對應非顯示區144。Referring to FIG. 1G and FIG. 2 simultaneously, the display device 100 of the present embodiment includes a display panel 140, a transparent cover 110, and an opaque photoresist layer 120. The display panel 140 has a display area 142 and a non-display area 144. The transparent cover plate 110 covers the display panel 140 and has a first area 112 corresponding to the display area 142 and a second area 114 corresponding to the non-display area 144.
不透光的光阻層120位於顯示面板140與透光蓋板110之間，並位於透光蓋板110的第二區114中。不透光的光阻層120具有盲孔122、穿孔124、以及顯示區開口126，其中穿孔124暴露出部分第二區114，顯示區開口126暴露出第一區112(亦即顯示裝置100的可視區)。不透光的光阻層120例如為一體成形的結構。The opaque photoresist layer 120 is located between the display panel 140 and the transparent cover 110 and is located in the second region 114 of the transparent cover 110. The opaque photoresist layer 120 has a blind via 122, a via 124, and a display region opening 126, wherein the via 124 exposes a portion of the second region 114, and the display region opening 126 exposes the first region 112 (ie, the display device 100 Visual area). The opaque photoresist layer 120 is, for example, an integrally formed structure.
在一實施例中，盲孔122例如為顯示裝置100的功能鍵圖案，具體而言，盲孔122可為手機面板上的灰色功能鍵圖案。此外，穿孔124例如為顯示裝置100的訊號接收孔、發送訊號孔(如紅外線孔)、或是相機鏡頭孔、或是其他功能孔。當然，在其他實施例中，盲孔122亦可為訊號接收孔、發送訊號孔、或是相機鏡頭孔，而穿孔124亦可為顯示裝置100的功能鍵圖案。詳細而言，當盲孔122為訊號接收孔、或發送訊號孔時(如紅外線孔)，不透光的光阻層120可選擇一只會吸收可見光而不會吸收紅外光(亦即可讓紅外光穿透)的材料。In an embodiment, the blind hole 122 is, for example, a function key pattern of the display device 100. Specifically, the blind hole 122 may be a gray function key pattern on the mobile phone panel. In addition, the through hole 124 is, for example, a signal receiving hole of the display device 100, a transmission signal hole (such as an infrared ray hole), or a camera lens hole, or other function holes. Of course, in other embodiments, the blind hole 122 can also be a signal receiving hole, a transmitting signal hole, or a camera lens hole, and the through hole 124 can also be a function key pattern of the display device 100. In detail, when the blind hole 122 is a signal receiving hole or a signal hole (such as an infrared hole), the opaque photoresist layer 120 can select one to absorb visible light without absorbing infrared light (also allows Infrared light penetration) material.
在一實施例中，可在透光蓋板110上並於第一區112中配置一觸控感測元件130，例如為電容式觸控感測元件、電阻式觸控感測元件、或光學式觸控感測元件。觸控感測元件130係位於顯示區開口126中。In one embodiment, a touch sensing component 130 can be disposed on the transparent cover 110 and in the first region 112, such as a capacitive touch sensing component, a resistive touch sensing component, or an optical Touch sensing component. The touch sensing component 130 is located in the display area opening 126.
在一實施例中，觸控感測元件130為一電容式觸控感測元件，其包括一第一電極132、第二電極136a、絕緣層134與橋接部分136，第一電極132與第二電極136a係配置於透光蓋板110上且彼此分離。絕緣層134覆蓋第一電極132，並分隔於第一電極132與第二電極136a之間。橋接部分136配置於絕緣層134上，並與第一電極132重疊，且與第二電極136a相連，其中絕緣層134分隔第一電極132與橋接部分136。In one embodiment, the touch sensing component 130 is a capacitive touch sensing component including a first electrode 132, a second electrode 136a, an insulating layer 134 and a bridging portion 136, and a first electrode 132 and a second electrode. The electrodes 136a are disposed on the transparent cover plate 110 and separated from each other. The insulating layer 134 covers the first electrode 132 and is separated between the first electrode 132 and the second electrode 136a. The bridging portion 136 is disposed on the insulating layer 134 and overlaps the first electrode 132 and is connected to the second electrode 136a, wherein the insulating layer 134 separates the first electrode 132 from the bridging portion 136.
在一實施例中，可選擇性地於透光蓋板110的表面S上全面形成一絕緣的保護層P，以覆蓋並保護不透光的光阻層120以及觸控感測元件130。絕緣的保護層P係位於顯示面板140與不透光的光阻層120之間，並位於顯示面板140與觸控感測元件130之間。In an embodiment, an insulating protective layer P is selectively formed on the surface S of the transparent cover 110 to cover and protect the opaque photoresist layer 120 and the touch sensing element 130. The insulating protective layer P is located between the display panel 140 and the opaque photoresist layer 120 and is located between the display panel 140 and the touch sensing component 130.
綜上所述，本發明是採用不透光的光阻材料並搭配使用半色調光罩進行曝光製程來製作飾層，故本發明僅需進行一次微影製程即可製得不同厚度的飾層，進而可節省製程時間。再者，由於曝光製程的精確度較高，故可避免網印油墨所產生的諸多製程問題，進而大幅提昇製程良率。In summary, the present invention uses an opaque photoresist material and uses a halftone mask to perform an exposure process to produce a decorative layer. Therefore, the present invention only needs to perform a lithography process to obtain a decorative layer of different thicknesses. , in turn, can save process time. Moreover, since the accuracy of the exposure process is high, many process problems caused by the screen printing ink can be avoided, thereby greatly improving the process yield.
本發明雖以較佳實施例揭露如上，然其並非用以限定本發明的範圍，任何所屬技術領域中具有通常知識者，在不脫離本發明之精神和範圍內，當可做些許的更動與潤飾，因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。The present invention has been disclosed in the above preferred embodiments, and is not intended to limit the scope of the present invention. Any one of ordinary skill in the art can make a few changes without departing from the spirit and scope of the invention. The scope of protection of the present invention is therefore defined by the scope of the appended claims.
100．．．顯示裝置100. . . Display device
110．．．透光蓋板110. . . Transparent cover
112．．．第一區112. . . First district
114．．．第二區114. . . Second district
120．．．不透光的光阻層120. . . Opaque photoresist layer
120a．．．不透光的光阻材料層120a. . . Opaque photoresist layer
122．．．盲孔122. . . Blind hole
124．．．穿孔124. . . perforation
126．．．顯示區開口126. . . Display area opening
130．．．觸控感測元件130. . . Touch sensing component
132．．．第一電極132. . . First electrode
134．．．絕緣層134. . . Insulation
136．．．橋接部分136. . . Bridge part
136a．．．第二電極136a. . . Second electrode
140．．．顯示面板140. . . Display panel
142．．．顯示區142. . . Display area
144．．．非顯示區144. . . Non-display area
H．．．半色調光罩H. . . Halftone mask
P．．．保護層P. . . The protective layer
S．．．表面S. . . surface
第1A圖至第1G圖繪示本發明一實施例之顯示裝置的製作方法。1A to 1G are views showing a method of fabricating a display device according to an embodiment of the present invention.
第2圖繪示第1G圖的顯示裝置的上視圖，第1G圖係繪示沿第2圖的I-I’線段的剖面圖。Fig. 2 is a top view of the display device of Fig. 1G, and Fig. 1G is a cross-sectional view taken along line I-I' of Fig. 2.
100．．．顯示裝置100. . . Display device
110．．．透光蓋板110. . . Transparent cover
112．．．第一區112. . . First district
114．．．第二區114. . . Second district
120．．．不透光的光阻層120. . . Opaque photoresist layer
122．．．盲孔122. . . Blind hole
124．．．穿孔124. . . perforation
126．．．顯示區開口126. . . Display area opening
130．．．觸控感測元件130. . . Touch sensing component
132．．．第一電極132. . . First electrode
134．．．絕緣層134. . . Insulation
136．．．橋接部分136. . . Bridge part
136a．．．第二電極136a. . . Second electrode
140．．．顯示面板140. . . Display panel
142．．．顯示區142. . . Display area
144．．．非顯示區144. . . Non-display area
P．．．保護層P. . . The protective layer
S．．．表面S. . . surface
Claims (13)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW100136709A TWI457642B (en) | 2011-10-11 | 2011-10-11 | Display device and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW100136709A TWI457642B (en) | 2011-10-11 | 2011-10-11 | Display device and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201316082A TW201316082A (en) | 2013-04-16 |
| TWI457642B true TWI457642B (en) | 2014-10-21 |
Family
ID=48803020
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW100136709A TWI457642B (en) | 2011-10-11 | 2011-10-11 | Display device and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI457642B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109459879B (en) * | 2018-11-29 | 2020-04-28 | 武汉华星光电技术有限公司 | Liquid crystal display panel |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200633226A (en) * | 2005-03-09 | 2006-09-16 | Au Optronics Corp | Method for fabricating metal oxide semiconductor with lightly doped drain |
| TWM342556U (en) * | 2008-04-28 | 2008-10-11 | Dong-Nan Chen | Touch panel device |
| TW201022762A (en) * | 2008-12-11 | 2010-06-16 | Au Optronics Corp | Color filter touch sensing substrate and display panel and manufacturing methods of the same |
| US20110063782A1 (en) * | 2009-09-15 | 2011-03-17 | Seiko Epson Corporation | Conductive film stacked member, electro-optical device, and electronic apparatus |
| CN102013213A (en) * | 2010-10-08 | 2011-04-13 | 友达光电（苏州）有限公司 | Protective plate and electronic device applying same |
-
2011
- 2011-10-11 TW TW100136709A patent/TWI457642B/en not_active IP Right Cessation
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200633226A (en) * | 2005-03-09 | 2006-09-16 | Au Optronics Corp | Method for fabricating metal oxide semiconductor with lightly doped drain |
| TWM342556U (en) * | 2008-04-28 | 2008-10-11 | Dong-Nan Chen | Touch panel device |
| TW201022762A (en) * | 2008-12-11 | 2010-06-16 | Au Optronics Corp | Color filter touch sensing substrate and display panel and manufacturing methods of the same |
| US20110063782A1 (en) * | 2009-09-15 | 2011-03-17 | Seiko Epson Corporation | Conductive film stacked member, electro-optical device, and electronic apparatus |
| CN102013213A (en) * | 2010-10-08 | 2011-04-13 | 友达光电（苏州）有限公司 | Protective plate and electronic device applying same |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201316082A (en) | 2013-04-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103472944B (en) | Touch panel and manufacturing method thereof | |
| KR102079415B1 (en) | Touch panel and manufacturing method thereof | |
| TWI469026B (en) | Touch devices and fabrication methods thereof | |
| RU2510063C1 (en) | Liquid crystal display device and method for manufacturing same | |
| TWI553534B (en) | Capacitive touch panel, method of fabricating capacitive touch panel and touch display device | |
| WO2015143862A1 (en) | Touch screen and manufacturing method therefor and display device | |
| WO2010026682A1 (en) | Liquid crystal display device | |
| US20130038545A1 (en) | Touch-sensing panel and touch-sensing display apparatus | |
| US9733774B2 (en) | Touch-sensitive device and manufacturing method thereof | |
| CN103034354B (en) | Touch display device and forming method thereof | |
| US10365776B2 (en) | Touch substrate, touch panel, touch display apparatus, mask plate, and fabricating method | |
| TW201317852A (en) | Touch sensing device and fabricating method thereof | |
| TWI594154B (en) | Touch panel and manufacture method thereof | |
| JP2012068287A (en) | Color filter substrate and method of manufacturing the same | |
| JP2013008272A (en) | Decorative transparent protection substrate integrated touch panel and manufacturing method thereof | |
| TWI549047B (en) | Touch panels and fabrication methods thereof | |
| JP2012242928A (en) | Touch panel integrating decorated transparent protective substrate | |
| US20150185959A1 (en) | Touch light shielding substrate and touch display apparatus | |
| KR102264259B1 (en) | Method for fabricating a touch screen panel | |
| WO2015188539A1 (en) | Grating base plate and manufacturing method therefor, and display device | |
| TWI579742B (en) | Touch panels and fabrication methods thereof | |
| TWI457642B (en) | Display device and manufacturing method thereof | |
| CN103049122A (en) | Display device and manufacture method thereof | |
| US10310647B2 (en) | Touch-controlled panel, method of manufacturing the same, and display device | |
| CN102156561B (en) | Touch panel structure and manufacturing method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GD4A | Issue of patent certificate for granted invention patent | ||
| MM4A | Annulment or lapse of patent due to non-payment of fees |