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TWI455873B - 具有多孔性中空奈米球體之塗漆製作方法 - Google Patents

具有多孔性中空奈米球體之塗漆製作方法 Download PDF

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Publication number
TWI455873B
TWI455873B TW101150728A TW101150728A TWI455873B TW I455873 B TWI455873 B TW I455873B TW 101150728 A TW101150728 A TW 101150728A TW 101150728 A TW101150728 A TW 101150728A TW I455873 B TWI455873 B TW I455873B
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TW
Taiwan
Prior art keywords
porous hollow
cerium oxide
coating
stirred
hollow
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TW101150728A
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English (en)
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TW201425212A (zh
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Univ Chienkuo Technology
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Priority to TW101150728A priority Critical patent/TWI455873B/zh
Publication of TW201425212A publication Critical patent/TW201425212A/zh
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Publication of TWI455873B publication Critical patent/TWI455873B/zh

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  • Paints Or Removers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Manufacturing Of Micro-Capsules (AREA)

Claims (1)

  1. 一種具有多孔性中空奈米球體之塗漆製作方法，其包括提供一奈米二磷酸鈣作為中心核體，接著在中心核體外層添加二氧化矽作為包裹層，加入強酸陽離子交換樹脂，使包裹層內部呈中空狀，並且該包裹層產生微小孔隙，將具有二氧化矽之包裹層產物加入具有檸檬酸之塗漆中，製造流程包含下列步驟：步驟1：量取乙醇60g、二磷酸鈣之溶膠30g、以及四乙氧基矽烷，添加氨水溶液使PH=10，於20℃下攪拌6小時，得到具有核殼微粒子混合劑；步驟2：將得到具有核殼微粒子混合劑加入強酸性陽離子交換樹脂，攪拌1小時使PH=4後，藉由過濾去除強酸陽離子交換樹脂，即得到多孔性中空狀二氧化矽奈米中空球體混散液體；步驟3：加入所得多孔性中空狀二氧化矽奈米中空球體混散液23g，乙醇65g，作為基質成分之以硝酸使四乙氧基矽烷進行水解而得矽酸低聚物溶液10g，非離子之界面活性劑2g，攪拌10分鐘接著倒入具有含檸檬酸0.5%~2.5%之塗料中攪拌3小時，藉此得到具有多孔性中空奈米球體之塗漆。
TW101150728A 2012-12-28 2012-12-28 具有多孔性中空奈米球體之塗漆製作方法 TWI455873B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW101150728A TWI455873B (zh) 2012-12-28 2012-12-28 具有多孔性中空奈米球體之塗漆製作方法

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TW101150728A TWI455873B (zh) 2012-12-28 2012-12-28 具有多孔性中空奈米球體之塗漆製作方法

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TW201425212A TW201425212A (zh) 2014-07-01
TWI455873B true TWI455873B (zh) 2014-10-11

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114560470B (zh) * 2022-04-01 2023-10-24 湖北航聚科技股份有限公司 一种二氧化硅空心纳米球、其制备方法及应用

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200706240A (en) * 2005-08-11 2007-02-16 Chung How Paint Factory Co Ltd Method for manufacturing hollow silica particles
TW201034958A (en) * 2008-12-18 2010-10-01 Jgc Catalysts & Chemicals Ltd Chain-shaped silica-based hollow fine particles and process for producing same, coating fluid for transparent coating film formation containing the fine particles, and substrate with transparent coating film
TW201040576A (en) * 2009-02-17 2010-11-16 Konica Minolta Opto Inc Low reflection member, anti-reflection film, polarizing plate, and image display device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200706240A (en) * 2005-08-11 2007-02-16 Chung How Paint Factory Co Ltd Method for manufacturing hollow silica particles
TW201034958A (en) * 2008-12-18 2010-10-01 Jgc Catalysts & Chemicals Ltd Chain-shaped silica-based hollow fine particles and process for producing same, coating fluid for transparent coating film formation containing the fine particles, and substrate with transparent coating film
TW201040576A (en) * 2009-02-17 2010-11-16 Konica Minolta Opto Inc Low reflection member, anti-reflection film, polarizing plate, and image display device

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