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TWI357492B
TWI357492B TW97114543A TW97114543A TWI357492B TW I357492 B TWI357492 B TW I357492B TW 97114543 A TW97114543 A TW 97114543A TW 97114543 A TW97114543 A TW 97114543A TW I357492 B TWI357492 B TW I357492B
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Taiwan
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measuring
light source
image
curvature
amplitude
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TW97114543A
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TW200944749A (en
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1357492 . 九、發明說明: 【發明所屬之技術領域】 本發明係與測量物體表面曲率之裝置有關,特別是指 一種測量物體表面曲率之垂直反射式疊紋量測架構。 .【先前技術】 按,物體表面曲率量測是一種重要的量測技術,其應 用包含工業檢測、應力檢測、透鏡曲率量測、眼角膜曲率 ® 量測等。 一般用於量測物體表面曲率的方法有投射疊紋法、干 涉法、像差法以及雷射掃描三角定位法,其中疊紋量測技 * 術一般採用穿透式或斜向反射式以形成疊紋,雖具有低成 ' 本、系統架構簡單與穩定性高的優點,但穿透式量測架構 只適用於透明物體表面曲率之量測,因此並無法運用至不 具透光性之物體表面之曲率量測上;而斜向反射式則存在 理論計算複雜的缺點,並且受限於反射影像的強度較弱, ® 因此影像對比度差而將導致表面曲率之誤差值提高。 而干涉法、像差法以及雷射掃描三角定位法,其不僅 理論計算複雜,且其量測系統及裝置更是相當複雜且昂 貴’因此具有rlj成本之缺點。 有鑑於此,本案發明人乃憑藉多年之相關學術研究經 驗,本著研究創新之精神,並經潛心設計後,才終有本發 明之產生。 5 135-7492 [發明内容】 本發明之主要目的,在於提供一種 之垂直反射式纽量測_,其具有物體表面曲率 性高、條紋對比度高、低成本等優^〜構簡單、穩定 本發明之再-目的,在於提供一 之垂直反射式疊紋㈣_,其具有®物體表面曲率 以及不透光物體之表面曲率者。 以測量透光物體 為達前述之目的,本發明係提供一 率之垂直反射式疊紋量測架構,其包含有,.、彳讀體表面曲 :光源裝置,係產生一光源; . m器:係將光源形成—準直擴束光; 上形成一 自‘像·光柵係將準直擴束光於待測物體表面 至待測面係用以將穿透第-振幅型光柵之光束反射 帛-振幅型光柵’係與待測物冑反射所成之影像構 成一疊紋影像; 該旦彡推量'則裝置,係具有一影像感測器以及一計算單元, 感測器係用以接收該疊紋影像,並經該計算單元以 率鼻該疊纟文影像之則,藉此量測出該_物件之表面曲 本發明之上述及其他目的與優點,不難從下述所選用 1之詳細說明與附圖中,獲得深入了解。 虽然,本發明在某些另件上,或另件之安排上容許有 1357492 所不同,但所選用之實施例,則於本說明書中,予以詳細 說明,並於附圖中展示其構造。 【實施方式】 請配合參閱第1圖所示,圖中所示者為本發明所選用 之實施例結構,此僅供說明之用,在專利申請上並不受此 種結構之限制。 本發明係提供一種測量物體表面曲率之垂直反射式疊 • 紋量測架構,主要係由一光源裝置1 1、一光束準直器21 、一第一振幅型(Amplitude )光栅31、一分光器41、 一第二振幅型光柵5 1以及一量測裝置6 1所組成,其中 « •該光源裝置11與該光束準直器21,係可產生一準 直擴束光,該光源裝置1 1係可為一雷射光源、一 LED發 光源或其他可產生單一光源之元件所構成,該光束準直器 2 1主要由一顯微物鏡2 2、一針孔(pinhole ) 2 4以及 • 一透鏡2 6其它繞射元件所構成,而該顯微物鏡2 2、該 針孔2 4及該透鏡2 6係設於該光學軸線上,並依序位於 該光源裝置1 1之一側,以使由該光源裝置1 1所射出之 光源,得經由該顯微物鏡2 2、該針孔2 4及該透鏡2 6 之作用而形成一準直擴束光; 該第一振幅型光柵3 1,係設於該光學軸線上,且當 該光束準直器21所形成之準直擴束光經過該第一振幅型 光柵3 1時,再經一分光器4 1將此光束垂直反射至一待 1357492 測物體0表面’並形成一自成像(self_image),且該自成 像再經待測物體表面〇反射,成像於一第二振幅型光柵5 1上,構成一疊紋影像; 該量測裝置6 1,係具有一(CCD)影像感測器6 2 以及一計算單元6 4,該影像感測器6 2係用以接收該疊 紋影像’並經該計算單元6 4以運算該疊紋影像之傾角, 藉此里測出該待測物件〇之表面曲率。 然於此必須特別提出說明的是,本發明亦可用於檢測 具有透光性之物體表面曲率。 而利用本發明所提供之測量物體表面曲率之垂直反射 式疊紋量測架構,如第i圖所示,假設光傳播的方向為正 z-軸之方向,第一振幅型光栅3 、待測物體〇表面和第 二振幅型光柵5 1的座標位置分別為(々,力,-匀,(&,%,〇) 和〇2,乃’~);並假設第一振幅型光柵3丄在心軸方向上的 週期為A,波長λ的單色準直平面波垂直入射第一振幅型 光柵3 1,通過第一振幅型光栅3丄後的電場分佈方程式 (Α)可寫成: 工 = -d) = I[1 + c〇s(^i-)]. 2 Pi 而經分光器4 1反射至待測物體〇表面的電場分佈方 程式(Β)可表式為: ιπλά ^0(^0^0,2 = 0) = 1 + 6 P' c〇S( -^° )1357492. IX. Description of the Invention: [Technical Field] The present invention relates to a device for measuring the curvature of an object surface, and more particularly to a vertical reflection type overlay measurement structure for measuring the curvature of an object surface. [Prior Art] Press, surface curvature measurement is an important measurement technique, including industrial inspection, stress detection, lens curvature measurement, corneal curvature ® measurement. Generally, methods for measuring the curvature of an object surface include a projection lap method, an interference method, an aberration method, and a laser scanning triangulation method, wherein the embossing technique generally adopts a transmissive or oblique reflection type to form. Although the embossing has the advantages of low complexity, simple system structure and high stability, the penetrating measurement architecture is only suitable for measuring the curvature of the surface of transparent objects, so it cannot be applied to the surface of objects without transparency. The curvature measurement is on the other side; while the oblique reflection type has the disadvantage of being complicated by theoretical calculations, and is limited by the intensity of the reflected image, so the image contrast is poor and the error value of the surface curvature is increased. Interferometry, aberration method and laser scanning triangulation method are not only complicated in theoretical calculation, but also their measurement systems and devices are quite complicated and expensive. Therefore, they have the disadvantage of rlj cost. In view of this, the inventor of this case has relied on years of relevant academic research experience, in the spirit of research and innovation, and after careful design, will eventually have this invention. 5 135-7492 [ SUMMARY OF THE INVENTION [0009] The main object of the present invention is to provide a vertical reflection type measurement _, which has high curvature of the surface of the object, high contrast of the stripe, low cost, etc. The structure is simple and stable. The re-purpose is to provide a vertical reflective overlay (4), which has a surface curvature of the object and a surface curvature of the opaque object. For the purpose of measuring the light-transmitting object, the present invention provides a vertical reflection type overlay measuring structure, which comprises: a surface of a reading body: a light source device, which generates a light source; : forming a light source to collimate the beam; forming a self-image grating to collimate the light onto the surface of the object to be measured to reflect the beam of the first amplitude grating The image of the 帛-amplitude grating is formed by a reflection of the object to be measured, and the image is formed by an image sensor and a calculation unit, and the sensor is used for receiving The above-mentioned and other objects and advantages of the invention are measured by the calculation unit, and the surface of the object is measured by the calculation unit. The detailed description and the drawings are obtained in-depth. Although the present invention allows for differences from 1357492 on certain components or arrangements of parts, the preferred embodiment will be described in detail in the present specification and its construction is shown in the drawings. [Embodiment] Please refer to Fig. 1 for the structure of the embodiment selected for the present invention, which is for illustrative purposes only and is not limited by such structure in the patent application. The invention provides a vertical reflection type stacking and measuring structure for measuring the curvature of an object surface, mainly comprising a light source device 1 1 , a beam collimator 21 , a first amplitude type (Amplitude ) grating 31 , and a beam splitter. 41. A second amplitude type grating 5 1 and a measuring device 6 1 , wherein the light source device 11 and the beam collimator 21 generate a collimated beam expanding light, and the light source device 1 1 It can be composed of a laser light source, an LED light source or other components capable of generating a single light source. The beam collimator 2 1 is mainly composed of a microscope objective 2, a pinhole 2 4 and a The lens 26 is composed of other diffractive elements, and the microscopic objective lens 2, the pinhole 24 and the lens 26 are disposed on the optical axis, and are sequentially located on one side of the light source device 11 The light source emitted by the light source device 11 is configured to form a collimated beam of light through the action of the microscope objective 2, the pinhole 24 and the lens 26; the first amplitude grating 3 1 Is disposed on the optical axis, and the collimated beam expander formed by the beam collimator 21 When the first amplitude type grating 3 1 is used, the light beam is vertically reflected by a beam splitter 4 1 to a surface of the object 0 to be 1357492 and forms a self-image, and the self-image is further reflected by the surface of the object to be tested. The 〇 reflection is formed on a second amplitude grating 5 1 to form a lap image; the measuring device 161 has a (CCD) image sensor 6 2 and a computing unit 64, the image sense The detector 6 2 is configured to receive the moiré image and pass the calculation unit 64 to calculate the inclination of the moiré image, thereby measuring the surface curvature of the object to be tested. However, it must be particularly noted that the present invention can also be used to detect the curvature of an object having a light transmissive property. By using the vertical reflection type moiré measuring structure for measuring the surface curvature of the object provided by the present invention, as shown in the first figure, the direction of the light propagation is assumed to be the direction of the positive z-axis, and the first amplitude type grating 3 is to be tested. The coordinate positions of the object 〇 surface and the second amplitude type grating 5 1 are (々, force, - uniform, (&, %, 〇) and 〇 2, respectively, '~); and assume the first amplitude type grating 3丄The period in the direction of the mandrel is A, and the monochromatic collimated plane wave of the wavelength λ is perpendicularly incident on the first amplitude type grating 31. The electric field distribution equation (Α) after passing through the first amplitude type grating 3 can be written as: -==d ) = I[1 + c〇s(^i-)]. 2 Pi and the electric field distribution equation (Β) reflected by the beam splitter 4 1 to the surface of the object to be tested can be expressed as: ιπλά ^0(^0^ 0,2 = 0) = 1 + 6 P' c〇S( -^° )

Pi 由於待測物體o等效於一凸面鏡,經待測物體〇表面 1357492 反射後的振幅方程式(c)可表示為: "〇’(々’少〇;ζ = 0) = ί/0(χ。,少。,z = 〇)e[ 因此在位置(½,少心)處的振巾昌分佈之方程式⑼可 表示成: jl -/i£2?L _Md 2(X2,_V2,z) = ^-[l±e Pi e pi 2mnx2)] 上述方程式(D)又可改寫為方程式(E): uiix2^yi,z = ZN)~ -^-[1 + cos(2^-(—_L_)i^2.)]. f~ZN P\ 其中〜為待測物體〇表面到第二振幅型光栅5 i的距 離’其方程式(F)可表示為: …_^12/Pi Since the object to be measured o is equivalent to a convex mirror, the amplitude equation (c) after being reflected by the surface of the object to be tested 1351357492 can be expressed as: "〇'(々' less 〇; ζ = 0) = ί/0( χ., less., z = 〇)e[so the equation (9) of the vibration distribution at the position (1⁄2, less heart) can be expressed as: jl -/i£2?L _Md 2(X2,_V2,z ) = ^-[l±e Pi e pi 2mnx2)] The above equation (D) can be rewritten as equation (E): uiix2^yi,z = ZN)~ -^-[1 + cos(2^-(- _L_)i^2.)]. f~ZN P\ where ~ is the distance from the surface of the object to be tested to the second amplitude grating 5 i', and its equation (F) can be expressed as: ..._^12/

Npt + fX 由方程式(E)可得第一振幅型光柵3丄在^〜處的 成像週期為,因此選槔第二振幅型光柵5 i的週期 f ~~ ZN 、 巧~ / A’並旋轉第二振幅型光柵51使其與第一振幅 ,Ν 5L光柵3 1間夾-小角度心於是可得疊紋影像的傾角“ 方程式(G)為: aN ^tan-1 [-^2 ~^~zn)P\ cos9 (/~ζΝ)Ρι&ΐηθ ·*' 再由方程式(F)和⑹可得待測物體〇表面的曲率 9 135.74,92 C方程式(Η)為: C 一 1 _ Ά.Ρ\ (tan sin Θ + cos ^) - 3 一 Ϊ7 2Np2xp2 並經由上述方程式(H)可知,在參數;I、&、/72、0、 #和已知的條件下,即可求得待測物體0表面的曲率c。 為了驗證本發明之可行性,係採用曲率分別為1.326 mm·1和1.261mm_1的鋼珠球於室溫下(J=25°C)進行量測, 此曲率值與人眼角膜曲率相當。使用A=632.8 nm之He-Ne 雷射為量測光源,第一振幅型光柵3 1之規格為750 lines/inch,由於鋼珠球之曲率的差異,所以選擇搭配之第 二振幅型光柵5 1的規格分別為28 lines/inch和64 lines/inch’並如第2圖(a )( b )所示為實驗之疊紋影像, 其疊紋傾角〜分別為8.75。和5.62。,計算所得之鋼珠球曲 率分別為1.325 mm_1和1.260 mm-1,其與實際之曲率測量 值1.326 mm 1和1.261 mm·1,其量測百分誤差小於〇.〇8〇/0。 考慮光柵的週期誤差Δρι、Δ/?2與光柵夾角誤差ΔΘ, 由方程式(Η)可得待測物體〇曲率之量測誤差為: jlggc2 sin 0 2ΝΡιΡι △c 方程式(I) 其中根據方程式(G)可得 方程式(·〇 ΔαΝNpt + fX From the equation (E), the imaging period of the first amplitude type grating 3 丄 at ^~ is selected, so the period f ~~ ZN of the second amplitude type grating 5 i is selected, and Q / a ' is rotated The second amplitude type grating 51 is clamped to the first amplitude, Ν 5L grating 3 1 - a small angle of the heart to obtain the inclination of the moiré image. "The equation (G) is: aN ^tan-1 [-^2 ~^ ~zn)P\ cos9 (/~ζΝ)Ρι&ΐηθ ·*' From equations (F) and (6), the curvature of the surface of the object to be tested is 9 135.74, 92 C equation (Η) is: C -1 _ Ά .Ρ\ (tan sin Θ + cos ^) - 3 Ϊ7 2Np2xp2 and can be obtained from the above equation (H), under the parameters; I, &, /72, 0, # and known conditions, The curvature c of the surface of the object to be tested 0. In order to verify the feasibility of the present invention, steel balls having curvatures of 1.326 mm·1 and 1.261 mm_1 were respectively measured at room temperature (J=25° C.), and the curvature value was measured. It is equivalent to the corneal curvature of the human eye. The He-Ne laser with A=632.8 nm is used as the measuring light source. The size of the first amplitude grating 3 1 is 750 lines/inch. Due to the difference in the curvature of the steel ball, it is selected and matched. First The specifications of the two amplitude gratings 5 1 are 28 lines/inch and 64 lines/inch', respectively, and as shown in Fig. 2(a)(b), the experimental moiré images have a dip angle ~ 8.75, respectively. 5.62. The calculated curvature of the ball is 1.325 mm_1 and 1.260 mm-1, respectively, which is compared with the actual curvature measurements of 1.326 mm 1 and 1.261 mm·1, and the measured percentage error is less than 〇.〇8〇/0. Considering the period error Δρι, Δ/?2 of the grating and the angle error ΔΘ of the grating, the measurement error of the curvature of the object to be tested can be obtained by the equation (Η): jlggc2 sin 0 2ΝΡιΡι Δc Equation (I) where according to the equation (G ) can get the equation (·〇ΔαΝ

Pi esc θ - lmpxp2 cot θ + ρλ co\0 cos Θ + smO pxm csc0Pi esc θ - lmpxp2 cot θ + ρλ co\0 cos Θ + smO pxm csc0

Pi esc2 Θ - 2mp^p2 cot ^ esc ^ + pl cot Θ + 13574.92 2 2 px - (mp2pl -px cos Θ) cot 0 esc 0 _ + --~2-i-;-2 CSC Θ - 2/^/7,/72 cot Θ CSCΘ + β cor Θ + Θ 將相對應的誤差量 Δρι = 2.46xl0·4 cm,Δ;?2 = 4.23xlCT3 cm、Αθ= 0.0025°與相關實驗參數代入方程式(I)與(J), 即可得出本發明其待測物體0曲率的解析度Μ約為 3.72940-3 111111-1° 而本發明所提供之一種測量物體表面曲率之垂直反射 式疊紋量測架構,係用以測量物體的表面曲率,並藉由量 _ 測曲率與人眼角膜曲率相當的鋼珠球來驗證本發明的可行 性和準確性,量測所得誤差小於0.08%,曲率解析度更可 達 3.729xl0·3 mm·1; 综上所述,本發明之架構具有光學架構簡單、穩定性 高、條紋對比度高、低成本等優點,且可運用至測量透光 物件以及不透光物件之表面曲率,因而深具進步性及實用 性,實已符合專利法之規定,故本案發明人爰依法提出專 利申請。 11 1357492 【圖式簡單說明】 第1圖係本發明之裝置架構圖。 第2圖係經由本發明架構所測得之疊紋影像。 【主要元件符號說明】 光源裝置1 1 顯微物鏡2 2 透鏡2 6 分光器4 1 量測裝置6 1 計算單元6 4 光束準直器2 1 針孔2 4 第一振幅型光栅3 1 第一振幅型光棚 5 1 影像感測器6 2 待測物體0Pi esc2 Θ - 2mp^p2 cot ^ esc ^ + pl cot Θ + 13574.92 2 2 px - (mp2pl -px cos Θ) cot 0 esc 0 _ + --~2-i-;-2 CSC Θ - 2/^ /7,/72 cot Θ CSCΘ + β cor Θ + Θ The corresponding error amount Δρι = 2.46xl0·4 cm, Δ;?2 = 4.23xlCT3 cm, Αθ= 0.0025° and the relevant experimental parameters are substituted into equation (I) And (J), it can be obtained that the resolution of the curvature of the object to be tested of the present invention is about 3.72940-3 111111-1°, and the vertical reflection type overlay measurement structure for measuring the surface curvature of the object provided by the present invention The method is used to measure the surface curvature of an object, and the feasibility and accuracy of the invention are verified by measuring the curvature of the steel ball corresponding to the curvature of the human cornea. The measurement error is less than 0.08%, and the curvature resolution is more Up to 3.729xl0·3 mm·1; In summary, the architecture of the invention has the advantages of simple optical structure, high stability, high stripe contrast, low cost, etc., and can be applied to measuring light-transmitting objects and opaque objects. The curvature of the surface is therefore highly progressive and practical, and it has already met the requirements of the Patent Law. Therefore, the inventor of this case has proposed according to law. Patent applications. 11 1357492 [Simple description of the drawings] Fig. 1 is a diagram showing the structure of the apparatus of the present invention. Figure 2 is a picture of the overlay detected by the architecture of the present invention. [Main component symbol description] Light source device 1 1 Microscope objective lens 2 2 Lens 2 6 Beam splitter 4 1 Measuring device 6 1 Calculation unit 6 4 Beam collimator 2 1 Pinhole 2 4 First amplitude grating 3 1 First Amplitude light shed 5 1 Image sensor 6 2 Object to be tested 0

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Claims (1)

1357492 十、申請專利範圍: 1·一種測量物體表面曲率之垂直反射式疊紋量測架 構,其包含有: 一光源裝置,係產生一光源; 一光束準直器,係將光源形成一準直擴束光; » . 一第一振幅型光柵,係將準直擴束光於待測物體表面 上形成一自成像; 一分光器,係用以將穿透第一振幅型光柵之光束反射 0 至待測物體表面; 一第二振幅型光柵,係與待測物體反射所成之影像構 成·疊紋影像, '一量測裝置,係具有一影像感測器以及一計算單元, ,該影像感測器係用以接收該疊紋影像,並經該計算單元以 運算該疊紋影像之傾角,藉此量測出該待測物件之表面曲 率。 2·依申請專利範圍第1項所述之測量物體表面曲率 • 之垂直反射式疊紋量測架構,其中該光源裝置係可為一雷 射光源、一 LED發光源或其他可產生單一光源之元件所構 成。 3·依申請專利範圍第1項所述之測量物體表面曲率 之垂直反射式疊紋量測架構,其中該光束準直器主要由一 顯微物鏡、一針孔以及一透鏡所構成。 4·依申請專利範圍第1項所述之測量物體表面曲率 之垂直反射式疊紋量測架構,其中該待測物體係為一不透 13 1357492 光之物體。 5 ·依申請專利範圍第1項所述之測量物體表面曲率 之垂直反射式疊紋量測架構,其中該待測物體係為一具透 光性之物體。1357492 X. Patent Application Range: 1. A vertical reflection type overlay measurement structure for measuring the curvature of an object surface, comprising: a light source device for generating a light source; and a beam collimator for forming a light source for collimation Beam expander; a first amplitude grating that forms a self-image of the collimated beam on the surface of the object to be measured; a beam splitter that reflects the beam that penetrates the first amplitude grating To the surface of the object to be tested; a second amplitude type grating, which is formed by the image reflected by the object to be measured, and a moiré image, 'a measuring device having an image sensor and a calculating unit, the image The sensor is configured to receive the image of the overlay, and calculate the tilt angle of the image by the calculation unit, thereby measuring the surface curvature of the object to be tested. 2. The vertical reflective overlay measurement architecture for measuring the surface curvature of an object according to claim 1 of the patent application scope, wherein the light source device can be a laser light source, an LED light source or other single light source. Component composition. 3. The vertical reflection type moiré measuring structure for measuring the surface curvature of an object according to claim 1, wherein the beam collimator is mainly composed of a microscope objective, a pinhole and a lens. 4. The vertical reflection type moiré measuring structure for measuring the surface curvature of the object according to claim 1 of the patent application scope, wherein the object to be tested system is an object that does not penetrate 13 1357492 light. 5) A vertical reflection type overlay measuring structure for measuring the surface curvature of an object according to the first aspect of the patent application, wherein the object to be tested system is a light transmissive object.
TW97114543A 2008-04-21 2008-04-21 Vertical reflective type moire measurement structure for measuring the surface curvature of an object TW200944749A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9523572B2 (en) 2014-12-12 2016-12-20 Industrial Technology Research Institute Thin-film curvature measurement apparatus and method thereof
US9970880B2 (en) 2016-08-19 2018-05-15 Industrial Technology Research Institute Apparatus for measuring a curvature of a thin film and the method thereof

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI444587B (en) 2011-08-03 2014-07-11 Nat Univ Tsing Hua Curvature sensing structure without dissipation energy and method thereof
CN107121095B (en) * 2017-06-08 2019-10-18 杭州电子科技大学 A method and device for accurately measuring a super large radius of curvature
JP7296334B2 (en) * 2020-03-26 2023-06-22 住友重機械工業株式会社 Straightness measurement system, displacement sensor calibration method, and straightness measurement method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9523572B2 (en) 2014-12-12 2016-12-20 Industrial Technology Research Institute Thin-film curvature measurement apparatus and method thereof
US9970880B2 (en) 2016-08-19 2018-05-15 Industrial Technology Research Institute Apparatus for measuring a curvature of a thin film and the method thereof

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