TWI317964B - - Google Patents
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- Publication number
- TWI317964B TWI317964B TW093134485A TW93134485A TWI317964B TW I317964 B TWI317964 B TW I317964B TW 093134485 A TW093134485 A TW 093134485A TW 93134485 A TW93134485 A TW 93134485A TW I317964 B TWI317964 B TW I317964B
- Authority
- TW
- Taiwan
- Prior art keywords
- discharge vessel
- discharge
- glass
- temperature
- excimer lamp
- Prior art date
Links
- 239000011521 glass Substances 0.000 claims description 82
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 48
- 229910052799 carbon Inorganic materials 0.000 claims description 48
- 238000007789 sealing Methods 0.000 claims description 34
- 239000003990 capacitor Substances 0.000 claims description 10
- 238000012545 processing Methods 0.000 claims description 7
- 239000007789 gas Substances 0.000 description 30
- 238000010438 heat treatment Methods 0.000 description 20
- 238000012423 maintenance Methods 0.000 description 20
- 238000000034 method Methods 0.000 description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 16
- 230000002829 reductive effect Effects 0.000 description 7
- 230000002093 peripheral effect Effects 0.000 description 6
- 230000006378 damage Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000004566 IR spectroscopy Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 238000001069 Raman spectroscopy Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000001237 Raman spectrum Methods 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 238000011835 investigation Methods 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910001868 water Inorganic materials 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- RMTNSIBBWXZNDC-UHFFFAOYSA-N argon;hydrochloride Chemical compound Cl.[Ar] RMTNSIBBWXZNDC-UHFFFAOYSA-N 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- HASUVWMICRFLAS-UHFFFAOYSA-M fluororuthenium Chemical compound [Ru]F HASUVWMICRFLAS-UHFFFAOYSA-M 0.000 description 1
- 238000007496 glass forming Methods 0.000 description 1
- 238000005816 glass manufacturing process Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 description 1
- 238000000790 scattering method Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000035922 thirst Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
- H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
- H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/30—Vessels; Containers
- H01J61/302—Vessels; Containers characterised by the material of the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/24—Manufacture or joining of vessels, leading-in conductors or bases
- H01J9/245—Manufacture or joining of vessels, leading-in conductors or bases specially adapted for gas discharge tubes or lamps
- H01J9/247—Manufacture or joining of vessels, leading-in conductors or bases specially adapted for gas discharge tubes or lamps specially adapted for gas-discharge lamps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/24—Manufacture or joining of vessels, leading-in conductors or bases
- H01J9/26—Sealing together parts of vessels
- H01J9/265—Sealing together parts of vessels specially adapted for gas-discharge tubes or lamps
- H01J9/266—Sealing together parts of vessels specially adapted for gas-discharge tubes or lamps specially adapted for gas-discharge lamps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/38—Exhausting, degassing, filling, or cleaning vessels
- H01J9/385—Exhausting vessels
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Electromagnetism (AREA)
- Plasma & Fusion (AREA)
- Glass Compositions (AREA)
- Vessels And Coating Films For Discharge Lamps (AREA)
- Glass Melting And Manufacturing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004088655A JP4134927B2 (ja) | 2004-03-25 | 2004-03-25 | エキシマランプ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200532741A TW200532741A (en) | 2005-10-01 |
| TWI317964B true TWI317964B (ja) | 2009-12-01 |
Family
ID=35176071
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW093134485A TW200532741A (en) | 2004-03-25 | 2004-11-11 | Excimer lamp |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4134927B2 (ja) |
| KR (1) | KR100811391B1 (ja) |
| TW (1) | TW200532741A (ja) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4998832B2 (ja) * | 2008-03-19 | 2012-08-15 | ウシオ電機株式会社 | エキシマランプ |
| JP4748208B2 (ja) * | 2008-11-18 | 2011-08-17 | ウシオ電機株式会社 | エキシマ放電ランプおよびエキシマ放電ランプの製造方法 |
| JP5741603B2 (ja) * | 2013-01-30 | 2015-07-01 | ウシオ電機株式会社 | エキシマランプ |
| WO2017188015A1 (ja) * | 2016-04-28 | 2017-11-02 | 日本電気硝子株式会社 | 金属封着用ガラス管及び金属封着用ガラス |
| JP2021125437A (ja) * | 2020-02-10 | 2021-08-30 | 東芝ライテック株式会社 | バリア放電ランプモジュール、バリア放電ランプ、および紫外線照射装置 |
| CN116053112B (zh) * | 2022-12-20 | 2024-11-01 | 桑尼维尔新材料科技(南京)有限公司 | 一种222纳米准分子灯板及其制作方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0546196B1 (en) * | 1991-06-29 | 1997-05-02 | Shin-Etsu Quartz Products Co., Ltd. | Synthetic quartz glass optical member for excimer laser and production thereof |
| JP2775695B2 (ja) * | 1993-05-27 | 1998-07-16 | ウシオ電機株式会社 | 誘電体バリヤ放電ランプ |
| JP2951139B2 (ja) * | 1993-01-20 | 1999-09-20 | ウシオ電機株式会社 | 誘電体バリヤ放電ランプ |
| JP3189481B2 (ja) * | 1993-03-19 | 2001-07-16 | ウシオ電機株式会社 | 誘電体バリヤ放電ランプ |
| JP3025403B2 (ja) * | 1993-11-15 | 2000-03-27 | ウシオ電機株式会社 | 誘電体バリヤ放電ランプ |
| JP2980510B2 (ja) * | 1994-01-28 | 1999-11-22 | 信越石英株式会社 | 紫外線ランプ用高純度シリカガラスおよびその製造方法 |
| JP3171004B2 (ja) * | 1994-04-15 | 2001-05-28 | ウシオ電機株式会社 | 誘電体バリヤ放電ランプ |
| JP2000100389A (ja) * | 1998-09-18 | 2000-04-07 | Ushio Inc | 放電ランプ |
| JP3069562B1 (ja) * | 1999-10-19 | 2000-07-24 | 信越石英株式会社 | エキシマレ―ザ及びエキシマランプ用のシリカガラス光学材料及びその製造方法 |
| JP2002151013A (ja) * | 2000-11-13 | 2002-05-24 | Ushio Inc | フッ素レーザ装置用基準光源。 |
| JP2002289150A (ja) * | 2001-03-26 | 2002-10-04 | Harison Toshiba Lighting Corp | 誘電体バリヤ放電ランプおよび紫外線照射装置 |
| JP3582500B2 (ja) * | 2001-05-23 | 2004-10-27 | ウシオ電機株式会社 | 超高圧水銀ランプ |
-
2004
- 2004-03-25 JP JP2004088655A patent/JP4134927B2/ja not_active Expired - Lifetime
- 2004-11-11 TW TW093134485A patent/TW200532741A/zh not_active IP Right Cessation
- 2004-12-22 KR KR1020040110322A patent/KR100811391B1/ko active IP Right Review Request
Also Published As
| Publication number | Publication date |
|---|---|
| KR20050095540A (ko) | 2005-09-29 |
| JP4134927B2 (ja) | 2008-08-20 |
| TW200532741A (en) | 2005-10-01 |
| KR100811391B1 (ko) | 2008-03-07 |
| JP2005276640A (ja) | 2005-10-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK4A | Expiration of patent term of an invention patent |