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TWD172679S - Gas diffusion device for wafer box - Google Patents

Gas diffusion device for wafer box

Info

Publication number
TWD172679S
TWD172679S TW103303461F TW103303461F TWD172679S TW D172679 S TWD172679 S TW D172679S TW 103303461 F TW103303461 F TW 103303461F TW 103303461 F TW103303461 F TW 103303461F TW D172679 S TWD172679 S TW D172679S
Authority
TW
Taiwan
Prior art keywords
wafer box
design
gas diffusion
air inlet
accommodation space
Prior art date
Application number
TW103303461F
Other languages
Chinese (zh)
Original Assignee
家登精密工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 家登精密工業股份有限公司 filed Critical 家登精密工業股份有限公司
Priority to TW103303461F priority Critical patent/TWD172679S/en
Priority to US29/510,673 priority patent/USD749531S1/en
Publication of TWD172679S publication Critical patent/TWD172679S/en

Links

Abstract

【物品用途】;本設計物品係設置於晶圓盒內,用以將氣體均勻擴散至晶圓盒內。;【設計說明】;本設計晶圓盒之氣體擴散裝置,其中左側視圖與右側視圖相對稱,故省略左側視圖。;本設計晶圓盒之氣體擴散裝置,包括一本體,該本體具有一容置空間;一進氣部,位於容置空間底側;一檔止件位於容置空間,該檔止件與本體後側形成一間隙。;該檔止件面向本體前側具有一平面,該平面具有靠近進氣部之一第一部分(B’-B’端面剖視圖),及遠離進氣部之一第二部分(A’-A’端面剖視圖);該第一部分寬度不變,該第二部分寬度往遠離進氣部方向漸增。;綜上所述,本設計之晶圓盒擴散裝置,利用內部容置空間設計,完成氣體擴散均勻之效果。[Use of article]; This designed article is placed in the wafer box to evenly diffuse gas into the wafer box. ;[Design Description];In this design of the gas diffusion device of the wafer box, the left view and the right view are symmetrical, so the left view is omitted. ;The gas diffusion device of the wafer box of this design includes a body with an accommodation space; an air inlet located at the bottom side of the accommodation space; a stopper located in the accommodation space, and the stopper is in contact with the body A gap is formed on the back side. ;The stopper has a plane facing the front side of the body. The plane has a first part close to the air inlet (B'-B' end section view), and a second part far away from the air inlet (A'-A' end face). Cross-sectional view); the width of the first part remains unchanged, and the width of the second part gradually increases toward the direction away from the air inlet. ; In summary, the wafer box diffusion device of this design utilizes the internal accommodation space design to achieve uniform gas diffusion.

TW103303461F 2014-06-09 2014-06-09 Gas diffusion device for wafer box TWD172679S (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW103303461F TWD172679S (en) 2014-06-09 2014-06-09 Gas diffusion device for wafer box
US29/510,673 USD749531S1 (en) 2014-06-09 2014-12-02 Diffusion assembly for front opening unified pod

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW103303461F TWD172679S (en) 2014-06-09 2014-06-09 Gas diffusion device for wafer box

Publications (1)

Publication Number Publication Date
TWD172679S true TWD172679S (en) 2015-12-21

Family

ID=55275808

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103303461F TWD172679S (en) 2014-06-09 2014-06-09 Gas diffusion device for wafer box

Country Status (2)

Country Link
US (1) USD749531S1 (en)
TW (1) TWD172679S (en)

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD342529S (en) * 1992-04-30 1993-12-21 S & K Products Holder for carrying wafers
US5452795A (en) * 1994-11-07 1995-09-26 Gallagher; Gary M. Actuated rotary retainer for silicone wafer box
US5844683A (en) * 1996-05-22 1998-12-01 Applied Materials, Inc. Position sensor system for substrate holders
US5960959A (en) * 1998-01-13 1999-10-05 Industrial Technology Research Institute Wafer retaining mechanism
US6615994B2 (en) * 2001-09-18 2003-09-09 Intel Corporation Wafer boat
US6981594B1 (en) * 2003-06-17 2006-01-03 National Semiconductor Corporation Method and apparatus to facilitate transport of semiconductor wafers
KR100573896B1 (en) * 2004-08-16 2006-04-26 동부일렉트로닉스 주식회사 Wafer departure prevention apparatus and method
KR101075512B1 (en) * 2005-12-06 2011-10-21 후지쯔 세미컨덕터 가부시키가이샤 Semiconductor wafer storage case and method of storing wafers
FR2896912B1 (en) * 2005-12-09 2008-11-28 Alcatel Sa SEALED ENCLOSURE FOR TRANSPORTING AND STORING SEMICONDUCTOR SUBSTRATES
TWM309202U (en) * 2006-08-15 2007-04-01 Gudeng Prec Industral Co Ltd Wafer pod and wafer holding device thereof
TWD126123S1 (en) * 2007-06-06 2008-11-21 東京威力科創股份有限公司 Wafer holding member
TWD126122S1 (en) * 2007-06-06 2008-11-21 東京威力科創股份有限公司 Wafer holding member
USD594424S1 (en) * 2007-07-12 2009-06-16 Hiwin Mikrosystem Corp. Wafer carrier
US7857139B2 (en) * 2007-09-24 2010-12-28 Intel Corporation Invertible front opening unified pod
JP5524093B2 (en) * 2008-03-13 2014-06-18 インテグリス・インコーポレーテッド Wafer container with tubular control element
USD674366S1 (en) * 2011-01-20 2013-01-15 Tokyo Electron Limited Wafer holding member
USD674761S1 (en) * 2011-10-20 2013-01-22 Tokyo Electron Limited Wafer holding member
US8544651B2 (en) * 2012-01-20 2013-10-01 Taiwan Semiconductor Manufacturing Company, Ltd. Wafer transfer pod for reducing wafer particulate contamination

Also Published As

Publication number Publication date
USD749531S1 (en) 2016-02-16

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