TW350968B - A coating device - Google Patents

A coating device

Info

Publication number: TW350968B
Authority: TW; Taiwan
Prior art keywords: fluid; processing; processed object; gas; processed
Prior art date: 1994-09-29

Application number

TW084110033A

Other languages

English (en)

Inventor

Akihiro Fujimoto

Yasuhiro Sakamoto

Original Assignee

Tokyo Electron Kyushu Ltd

Tokyo Electron Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1994-09-29

Filing date

1995-09-26

Publication date

1999-01-21

1995-09-26 Application filed by Tokyo Electron Kyushu Ltd, Tokyo Electron Ltd filed Critical Tokyo Electron Kyushu Ltd

1999-01-21 Application granted granted Critical

1999-01-21 Publication of TW350968B publication Critical patent/TW350968B/zh

Classifications

- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
- B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1039—Recovery of excess liquid or other fluent material; Controlling means therefor

Landscapes

Coating Apparatus (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Details Or Accessories Of Spraying Plant Or Apparatus (AREA)

TW084110033A 1994-09-29 1995-09-26 A coating device TW350968B (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP25915494A JP3122868B2 (ja)	1994-09-29	1994-09-29	塗布装置

Publications (1)

Publication Number	Publication Date
TW350968B true TW350968B (en)	1999-01-21

Family

ID=17330097

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW084110033A TW350968B (en)	1994-09-29	1995-09-26	A coating device

Country Status (4)

Country	Link
US (1)	US5672205A (zh)
JP (1)	JP3122868B2 (zh)
KR (1)	KR100312037B1 (zh)
TW (1)	TW350968B (zh)

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TW317644B (zh) *	1996-01-26	1997-10-11	Tokyo Electron Co Ltd
US5769945A (en)	1996-06-21	1998-06-23	Micron Technology, Inc.	Spin coating bowl exhaust system
US5985031A (en)	1996-06-21	1999-11-16	Micron Technology, Inc.	Spin coating spindle and chuck assembly
JP3566475B2 (ja) *	1996-12-03	2004-09-15	東京エレクトロン株式会社	処理装置
TW419716B (en) *	1997-04-28	2001-01-21	Tokyo Electron Ltd	Processing apparatus
JPH113851A (ja) *	1997-06-11	1999-01-06	Tokyo Electron Ltd	液処理装置及び液処理方法
US6197385B1 (en) *	1998-02-04	2001-03-06	Tokyo Electron Limited	Film forming apparatus, substrate conveying apparatus, film forming method, and substrate conveying method
US6221787B1 (en) *	1998-04-20	2001-04-24	Tokyo Electron Limited	Apparatus and method of forming resist film
NL1009281C2 (nl) *	1998-05-29	1999-11-30	Od & Me Bv	Inrichting geschikt voor het aanbrengen van een laklaag op een schijfvormige registratiedrager alsmede een dergelijke werkwijze.
US6217936B1 (en)	1999-02-26	2001-04-17	Advanced Micro Devices	Semiconductor fabrication extended particle collection cup
KR100589914B1 (ko) *	2000-01-29	2006-06-15	삼성전자주식회사	외부기기와의 동기를 위한 스피너 제어장치 및 그 제어방법
JP3587776B2 (ja) *	2000-10-10	2004-11-10	東京エレクトロン株式会社	塗布装置及び塗布方法
US6616762B2 (en)	2000-10-13	2003-09-09	Tokyo Electron Limited	Treatment solution supply apparatus and treatment solution supply method
US6752544B2 (en) *	2002-03-28	2004-06-22	Dainippon Screen Mfg. Co., Ltd.	Developing apparatus and developing method
US20050026455A1 (en) *	2003-05-30	2005-02-03	Satomi Hamada	Substrate processing apparatus and substrate processing method
JP4305750B2 (ja) *	2003-10-14	2009-07-29	Ｏｋｉセミコンダクタ株式会社	スピンコート法
JPWO2006038472A1 (ja) *	2004-10-06	2008-05-15	株式会社荏原製作所	基板処理装置及び基板処理方法
US7579044B2 (en) *	2004-11-08	2009-08-25	Brewer Science Inc.	Process and device for coating the outer edge of a substrate during microelectronics manufacture
US7798764B2 (en)	2005-12-22	2010-09-21	Applied Materials, Inc.	Substrate processing sequence in a cartesian robot cluster tool
US7699021B2 (en)	2004-12-22	2010-04-20	Sokudo Co., Ltd.	Cluster tool substrate throughput optimization
US7819079B2 (en)	2004-12-22	2010-10-26	Applied Materials, Inc.	Cartesian cluster tool configuration for lithography type processes
US7396412B2 (en)	2004-12-22	2008-07-08	Sokudo Co., Ltd.	Coat/develop module with shared dispense
US7651306B2 (en)	2004-12-22	2010-01-26	Applied Materials, Inc.	Cartesian robot cluster tool architecture
JP2008000676A (ja) *	2006-06-22	2008-01-10	Seiko Epson Corp	スピンコート装置および反射防止層用組成物のコーティング方法
JP5006122B2 (ja)	2007-06-29	2012-08-22	株式会社Ｓｏｋｕｄｏ	基板処理装置
JP5133641B2 (ja) *	2007-09-27	2013-01-30	東京エレクトロン株式会社	塗布処理方法、塗布処理装置及びコンピュータ読み取り可能な記憶媒体
JP5128918B2 (ja)	2007-11-30	2013-01-23	株式会社Ｓｏｋｕｄｏ	基板処理装置
JP5179170B2 (ja) *	2007-12-28	2013-04-10	株式会社Ｓｏｋｕｄｏ	基板処理装置
JP5001828B2 (ja)	2007-12-28	2012-08-15	株式会社Ｓｏｋｕｄｏ	基板処理装置
JP5337180B2 (ja) *	2010-04-08	2013-11-06	東京エレクトロン株式会社	塗布処理方法、プログラム、コンピュータ記憶媒体及び塗布処理装置
JP5635452B2 (ja) *	2010-07-02	2014-12-03	東京エレクトロン株式会社	基板処理システム
JP5693439B2 (ja) *	2011-12-16	2015-04-01	東京エレクトロン株式会社	基板処理装置、基板処理方法および記憶媒体
US20140087073A1 (en) *	2012-09-24	2014-03-27	Igor Constantin Ivanov	Equipment and method of manufacturing for liquid processing in a controlled atmospheric ambient
US9446467B2 (en) *	2013-03-14	2016-09-20	Taiwan Semiconductor Manufacturing Company, Ltd.	Integrate rinse module in hybrid bonding platform
JP6237511B2 (ja) *	2014-07-11	2017-11-29	東京エレクトロン株式会社	薬液排出機構、液処理装置、薬液排出方法、記憶媒体
CN105944875B (zh) *	2016-06-21	2018-07-20	上海平耐实业有限公司	一种自动上漆装置及其上漆方法
JP7081979B2 (ja) *	2018-05-22	2022-06-07	株式会社ＳｃｒｅｅｎＳｐｅテック	基板処理装置
CN109453957A (zh) *	2018-10-15	2019-03-12	苏州优达科精密机械有限公司	一种自动收料机

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Publication number	Priority date	Publication date	Assignee	Title
US4564280A (en) *	1982-10-28	1986-01-14	Fujitsu Limited	Method and apparatus for developing resist film including a movable nozzle arm
US4788043A (en) *	1985-04-17	1988-11-29	Tokuyama Soda Kabushiki Kaisha	Process for washing semiconductor substrate with organic solvent
JP2930307B2 (ja) *	1988-09-20	1999-08-03	東京エレクトロン株式会社	基板処理装置における液排出機構
JP2982439B2 (ja) *	1991-10-29	1999-11-22	東京エレクトロン株式会社	処理液塗布装置及び処理液塗布方法
US5211753A (en) *	1992-06-15	1993-05-18	Swain Danny C	Spin coating apparatus with an independently spinning enclosure

1994
- 1994-09-29 JP JP25915494A patent/JP3122868B2/ja not_active Expired - Lifetime
1995
- 1995-09-25 US US08/533,396 patent/US5672205A/en not_active Expired - Lifetime
- 1995-09-26 TW TW084110033A patent/TW350968B/zh not_active IP Right Cessation
- 1995-09-29 KR KR1019950032780A patent/KR100312037B1/ko not_active IP Right Cessation

Also Published As

Publication number	Publication date
KR960010094A (ko)	1996-04-20
KR100312037B1 (ko)	2001-12-28
US5672205A (en)	1997-09-30
JPH0897134A (ja)	1996-04-12
JP3122868B2 (ja)	2001-01-09

Publication	Publication Date	Title
TW350968B (en)	1999-01-21	A coating device
WO2000074815A3 (en)	2001-04-12	Device for separating a mixture of gas with liuqid and/or solid material
NZ313104A (en)	1999-11-29	Separator
MY111234A (en)	1999-09-30	Liquid / solid separation.
AU1291001A (en)	2001-05-30	Improved pneumatic device
CA2168863A1 (en)	1995-02-16	Hydrocyclone separators
GB9902220D0 (en)	1999-03-24	Fluid processing
AU4580697A (en)	1998-05-05	Apparatus for screening
NZ324672A (en)	1999-11-29	A decanter centrifuge
WO2003099685A3 (en)	2004-02-26	An assembly for delivering solid particulate matter for loading
ATE195992T1 (de)	2000-09-15	Vorrichtung zum abführen des regenwassers von dächern
CA2529081A1 (en)	2005-01-13	Hydrocyclone roping detector and method
CA2243328A1 (en)	1997-08-07	Process for centrifugal separation of material
ES275209U (es)	1984-02-16	Tapon reutilizable para envases
GB2404698A (en)	2005-02-09	A dispenser
SE9602709D0 (sv)	1996-07-09	Flisficka
AU8055591A (en)	1992-01-07	Flotation cyclone
SE8501678L (sv)	1985-10-06	Avloppspropp for saniterobjekt
CN2227987Y (zh)	1996-05-29	一种水力旋流器
GB0413671D0 (en)	2004-07-21	Conveying device
ES2000336A6 (es)	1988-02-16	Dispositivo para la separacion selectiva de la fraccion no metalica yno de una fraccion metalica
ES8307636A1 (es)	1983-08-16	Perfeccionamientos en instalaciones de auto-descarga a bordo de barcos.
JPS5413170A (en)	1979-01-31	Device for sorting articles to be conveyed
FR2677559B1 (fr)	1993-10-08	Broyeur a marteaux de faible encombrement, pour le dechiquetage d'objets metalliques ou autres, a alimentation basse, automatique et continue.
EP0332466A3 (en)	1990-11-28	Liquid pump apparatus

Legal Events

Date	Code	Title	Description
2015-11-11	MK4A	Expiration of patent term of an invention patent