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TW244391B - - Google Patents

Info

Publication number
TW244391B
TW244391B TW081110366A TW81110366A TW244391B TW 244391 B TW244391 B TW 244391B TW 081110366 A TW081110366 A TW 081110366A TW 81110366 A TW81110366 A TW 81110366A TW 244391 B TW244391 B TW 244391B
Authority
TW
Taiwan
Application number
TW081110366A
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Application granted granted Critical
Publication of TW244391B publication Critical patent/TW244391B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
TW081110366A 1991-12-06 1992-12-24 TW244391B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/804,872 US5333049A (en) 1991-12-06 1991-12-06 Apparatus and method for interferometrically measuring the thickness of thin films using full aperture irradiation

Publications (1)

Publication Number Publication Date
TW244391B true TW244391B (zh) 1995-04-01

Family

ID=25190073

Family Applications (1)

Application Number Title Priority Date Filing Date
TW081110366A TW244391B (zh) 1991-12-06 1992-12-24

Country Status (7)

Country Link
US (1) US5333049A (zh)
EP (1) EP0545738B1 (zh)
JP (1) JP2788158B2 (zh)
KR (1) KR960013677B1 (zh)
DE (1) DE69225117T2 (zh)
IL (1) IL104001A (zh)
TW (1) TW244391B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9752866B2 (en) 2015-11-23 2017-09-05 Industrial Technology Research Institute Measurement system

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US5956355A (en) * 1991-04-29 1999-09-21 Massachusetts Institute Of Technology Method and apparatus for performing optical measurements using a rapidly frequency-tuned laser
IL109589A0 (en) * 1993-05-14 1994-08-26 Hughes Aircraft Co Apparatus and method for performing high spatial resolution thin film layer thickness metrology
US5452953A (en) * 1993-10-12 1995-09-26 Hughes Aircraft Company Film thickness measurement of structures containing a scattering surface
US5471303A (en) * 1994-04-29 1995-11-28 Wyko Corporation Combination of white-light scanning and phase-shifting interferometry for surface profile measurements
US5563709A (en) * 1994-09-13 1996-10-08 Integrated Process Equipment Corp. Apparatus for measuring, thinning and flattening silicon structures
US5515167A (en) 1994-09-13 1996-05-07 Hughes Aircraft Company Transparent optical chuck incorporating optical monitoring
US5555474A (en) * 1994-12-21 1996-09-10 Integrated Process Equipment Corp. Automatic rejection of diffraction effects in thin film metrology
US5729343A (en) * 1995-11-16 1998-03-17 Nikon Precision Inc. Film thickness measurement apparatus with tilting stage and method of operation
US5640242A (en) * 1996-01-31 1997-06-17 International Business Machines Corporation Assembly and method for making in process thin film thickness measurments
US5909282A (en) * 1996-05-31 1999-06-01 Tropel Corporation Interferometer for measuring thickness variations of semiconductor wafers
GB9616853D0 (en) 1996-08-10 1996-09-25 Vorgem Limited An improved thickness monitor
US5717490A (en) * 1996-10-17 1998-02-10 Lsi Logic Corporation Method for identifying order skipping in spectroreflective film measurement equipment
US8293064B2 (en) 1998-03-02 2012-10-23 Cepheid Method for fabricating a reaction vessel
US6184974B1 (en) * 1999-07-01 2001-02-06 Wavefront Sciences, Inc. Apparatus and method for evaluating a target larger than a measuring aperture of a sensor
US6624896B1 (en) * 1999-10-18 2003-09-23 Wavefront Sciences, Inc. System and method for metrology of surface flatness and surface nanotopology of materials
US7151609B2 (en) * 2000-07-06 2006-12-19 Filmetrics, Inc. Determining wafer orientation in spectral imaging
US7286242B2 (en) * 2001-09-21 2007-10-23 Kmac Apparatus for measuring characteristics of thin film by means of two-dimensional detector and method of measuring the same
IL150438A0 (en) * 2002-06-26 2002-12-01 Nova Measuring Instr Ltd Method of thin films measurement
US20050098264A1 (en) * 2003-10-14 2005-05-12 Rudolph Technologies, Inc. Molecular airborne contaminants (MACs) film removal and wafer surface sustaining system and method
US20050112853A1 (en) * 2003-11-26 2005-05-26 Raymond Kuzbyt System and method for non-destructive implantation characterization of quiescent material
KR100984697B1 (ko) * 2003-12-24 2010-10-01 동부일렉트로닉스 주식회사 웨이퍼의 필름 두께 측정 시스템의 레퍼런스 블록
WO2006078471A2 (en) * 2005-01-07 2006-07-27 Filmetrics, Inc. Determining wafer orientation in spectral imaging
WO2007144777A2 (en) * 2006-03-30 2007-12-21 Orbotech, Ltd. Inspection system employing illumination that is selectable over a continuous range angles
US7623251B2 (en) 2006-04-07 2009-11-24 Amo Wavefront Sciences, Llc. Geometric measurement system and method of measuring a geometric characteristic of an object
EP2251453B1 (en) 2009-05-13 2013-12-11 SiO2 Medical Products, Inc. Vessel holder
JP5444823B2 (ja) * 2009-05-01 2014-03-19 信越半導体株式会社 Ｓｏｉウェーハの検査方法
US7985188B2 (en) * 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
JP5387451B2 (ja) * 2010-03-04 2014-01-15 信越半導体株式会社 Ｓｏｉウェーハの設計方法及び製造方法
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
JP5365581B2 (ja) 2010-05-28 2013-12-11 信越半導体株式会社 薄膜付ウェーハの評価方法
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
WO2013071138A1 (en) 2011-11-11 2013-05-16 Sio2 Medical Products, Inc. PASSIVATION, pH PROTECTIVE OR LUBRICITY COATING FOR PHARMACEUTICAL PACKAGE, COATING PROCESS AND APPARATUS
EP2846755A1 (en) 2012-05-09 2015-03-18 SiO2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US20150297800A1 (en) 2012-07-03 2015-10-22 Sio2 Medical Products, Inc. SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS
JP6509734B2 (ja) 2012-11-01 2019-05-08 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド 皮膜検査方法
WO2014078666A1 (en) 2012-11-16 2014-05-22 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
WO2014085348A2 (en) 2012-11-30 2014-06-05 Sio2 Medical Products, Inc. Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like
US9662450B2 (en) 2013-03-01 2017-05-30 Sio2 Medical Products, Inc. Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus
KR102167557B1 (ko) 2013-03-11 2020-10-20 에스아이오2 메디컬 프로덕츠, 인크. 코팅된 패키징
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
US9863042B2 (en) 2013-03-15 2018-01-09 Sio2 Medical Products, Inc. PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases
JP6107353B2 (ja) * 2013-04-12 2017-04-05 株式会社島津製作所 表面処理状況モニタリング装置
US11066745B2 (en) 2014-03-28 2021-07-20 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
EP3124912B1 (en) * 2015-07-30 2019-01-16 Unity Semiconductor GmbH Method and assembly for determining the thickness of a layer in a stack of layers
US10132612B2 (en) 2015-07-30 2018-11-20 Hseb Dresden Gmbh Method and assembly for determining the thickness of a layer in a sample stack
CN108138316A (zh) 2015-08-18 2018-06-08 Sio2医药产品公司 具有低氧气传输速率的药物和其他包装
US10563973B2 (en) * 2016-03-28 2020-02-18 Kla-Tencor Corporation All surface film metrology system
CN112461838B (zh) * 2019-09-09 2023-03-10 芯恩（青岛）集成电路有限公司 晶圆缺陷检测装置及方法
DE102020100565A1 (de) 2020-01-13 2021-07-15 Aixtron Se Verfahren zum Abscheiden von Schichten
CN112697080A (zh) * 2020-12-16 2021-04-23 长江存储科技有限责任公司 薄膜层厚度的测量方法

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JPS5031852A (zh) * 1973-07-20 1975-03-28
JPS5245455U (zh) * 1975-09-27 1977-03-31
JPS5535214A (en) * 1978-09-04 1980-03-12 Asahi Chem Ind Co Ltd Method and device for film-thickness measurement making use of infrared-ray interference
JPS6171305A (ja) * 1984-09-14 1986-04-12 Agency Of Ind Science & Technol 膜厚測定装置
JPS6175203A (ja) * 1984-09-20 1986-04-17 Oak Seisakusho:Kk 膜厚測定装置
JPS6176904A (ja) * 1984-09-21 1986-04-19 Oak Seisakusho:Kk 膜厚測定方法
JPS6453101A (en) * 1987-05-25 1989-03-01 Kurashiki Boseki Kk Equal tilt angle interference type film thickness gauge
US4909631A (en) * 1987-12-18 1990-03-20 Tan Raul Y Method for film thickness and refractive index determination
JPH01206203A (ja) * 1988-02-12 1989-08-18 Toshiba Corp 膜厚不良検査方法
US5042949A (en) * 1989-03-17 1991-08-27 Greenberg Jeffrey S Optical profiler for films and substrates

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9752866B2 (en) 2015-11-23 2017-09-05 Industrial Technology Research Institute Measurement system

Also Published As

Publication number Publication date
EP0545738A2 (en) 1993-06-09
EP0545738B1 (en) 1998-04-15
IL104001A0 (en) 1993-05-13
KR930013681A (ko) 1993-07-22
JP2788158B2 (ja) 1998-08-20
EP0545738A3 (zh) 1994-01-05
US5333049A (en) 1994-07-26
JPH05248825A (ja) 1993-09-28
KR960013677B1 (ko) 1996-10-10
DE69225117D1 (de) 1998-05-20
IL104001A (en) 1995-01-24
DE69225117T2 (de) 1998-08-06

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