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TW223175B - - Google Patents

Info

Publication number
TW223175B
TW223175B TW081110013A TW81110013A TW223175B TW 223175 B TW223175 B TW 223175B TW 081110013 A TW081110013 A TW 081110013A TW 81110013 A TW81110013 A TW 81110013A TW 223175 B TW223175 B TW 223175B
Authority
TW
Taiwan
Prior art keywords
polymers
rays
region
several
production
Prior art date
Application number
TW081110013A
Other languages
Chinese (zh)
Original Assignee
Basf Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Ag filed Critical Basf Ag
Application granted granted Critical
Publication of TW223175B publication Critical patent/TW223175B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/16—Surface shaping of articles, e.g. embossing; Apparatus therefor by wave energy or particle radiation, e.g. infrared heating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
    • G03F7/2039—X-ray radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0844—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using X-ray
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2067/00—Use of polyesters or derivatives thereof, as moulding material
    • B29K2067/04—Polyesters derived from hydroxycarboxylic acids
    • B29K2067/043—PGA, i.e. polyglycolic acid or polyglycolide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2067/00—Use of polyesters or derivatives thereof, as moulding material
    • B29K2067/04—Polyesters derived from hydroxycarboxylic acids
    • B29K2067/046—PLA, i.e. polylactic acid or polylactide
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/109—Polyester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/167—X-ray
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/167—X-ray
    • Y10S430/168—X-ray exposure process

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Micromachines (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Laminated Bodies (AREA)
  • Materials For Photolithography (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Extrusion Moulding Of Plastics Or The Like (AREA)

Abstract

The invention relates to a process for the production of microstructure elements having structure depths of from several mu m into the mm region by imagewise irradiation of polymers with x-rays, where the polymers employed are aliphatic polyesters.
TW081110013A 1991-12-14 1992-12-14 TW223175B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4141352A DE4141352A1 (en) 1991-12-14 1991-12-14 METHOD FOR PRODUCING MICROSTRUCTURE BODIES

Publications (1)

Publication Number Publication Date
TW223175B true TW223175B (en) 1994-05-01

Family

ID=6447113

Family Applications (1)

Application Number Title Priority Date Filing Date
TW081110013A TW223175B (en) 1991-12-14 1992-12-14

Country Status (8)

Country Link
US (1) US5518865A (en)
EP (1) EP0547419B1 (en)
JP (1) JPH05273758A (en)
KR (1) KR930012919A (en)
AT (1) ATE163096T1 (en)
DE (2) DE4141352A1 (en)
ES (1) ES2111601T3 (en)
TW (1) TW223175B (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5234789A (en) * 1992-03-19 1993-08-10 Ocg Microelectronic Materials, Inc. Polylactide compounds as sensitivity enhancers for radiation sensitive mixtures containing o-quinonediazide photoactive compounds
DE4223888A1 (en) * 1992-07-21 1994-01-27 Basf Ag Process for the production of microstructure bodies
DE4229244A1 (en) * 1992-09-02 1994-03-03 Basf Ag Process for the production of microstructure bodies
DE4324079A1 (en) * 1993-07-19 1995-01-26 Basf Ag Process for the production of microstructure bodies
DE4424236A1 (en) * 1994-07-09 1996-01-18 Deutsche Bundespost Telekom Process for structuring a component surface, esp. a plate, made of a polymer
US6199318B1 (en) 1996-12-12 2001-03-13 Landec Corporation Aqueous emulsions of crystalline polymers for coating seeds
DE19741492A1 (en) * 1997-09-19 1999-03-25 Microparts Gmbh Process for the production of microstructure bodies
SE515104C2 (en) 1999-02-12 2001-06-11 Aamic Ab Method for producing a mold body as well as a mold body thus prepared
DE60007318T2 (en) * 1999-07-16 2004-10-14 Advanced Design Concepts Gmbh THERMOPLASTIC OBJECTS WITH A SURFACE STRIP STRUCTURE
US6946182B1 (en) 1999-07-16 2005-09-20 Allgeuer Thomas T Fringed surface structures obtainable in a compression molding process
DE19950452A1 (en) * 1999-10-20 2001-04-26 Creavis Tech & Innovation Gmbh Structured surfaces with cell adhesion and cell proliferation inhibiting properties
DE19953039A1 (en) 1999-11-03 2001-05-23 Hcd Gmbh Process for the production of a multilayer surface-structured semi-finished product from thermoplastic materials
US6872438B1 (en) 2000-07-17 2005-03-29 Advanced Design Concept Gmbh Profile or molding having a fringed surface structure

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3039110A1 (en) * 1980-10-16 1982-05-13 Siemens AG, 1000 Berlin und 8000 München METHOD FOR THE STRESS-FREE DEVELOPMENT OF IRRADIATED POLYMETHYL META ACRYLATE LAYERS
DE3246825A1 (en) * 1982-02-24 1983-09-01 Max Planck Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen POSITIVE RESIST MATERIAL
US4744365A (en) * 1986-07-17 1988-05-17 United States Surgical Corporation Two-phase compositions for absorbable surgical devices
ES2030409T3 (en) * 1986-10-24 1992-11-01 Boehringer Ingelheim Kg PROCEDURE FOR PREPARING AND PURIFYING THERMOLABILE COMPOUNDS.
JPS63236321A (en) * 1987-03-25 1988-10-03 Fujitsu Ltd X-ray exposure device
NL8702563A (en) * 1987-10-28 1989-05-16 Cca Biochem B V POLYMER LACTIDE, METHOD FOR PREPARING SUCH A POLYMER LACTIDE, AND A COMPOSITION CONTAINING SUCH POLYMER LACTIDE.
US5298367A (en) * 1991-03-09 1994-03-29 Basf Aktiengesellschaft Production of micromoldings having a high aspect ratio

Also Published As

Publication number Publication date
ES2111601T3 (en) 1998-03-16
EP0547419B1 (en) 1998-02-04
JPH05273758A (en) 1993-10-22
US5518865A (en) 1996-05-21
EP0547419A1 (en) 1993-06-23
KR930012919A (en) 1993-07-21
ATE163096T1 (en) 1998-02-15
DE59209181D1 (en) 1998-03-12
DE4141352A1 (en) 1993-06-17

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