TW202531434A - Multi plenum showerhead without faceplate - Google Patents

Abstract

A showerhead includes a plate and a baffle. The plate includes a first surface and an opening at a center of the first surface. The baffle is disposed in the opening of the plate. The baffle extends into the plate through the opening. The baffle includes a second surface that lies in a plane parallel to the first surface of the plate and includes a first set of holes and a second set of holes in the second surface. The first set of holes and the second set of holes are not in fluid communication with each other. The baffle includes a connecting plate to connect the baffle to the showerhead, a stem extending from the connecting plate, and a gas delivery plate extending from the stem and including the first and second sets of holes to deliver one or more gases.

Description

Panelless multi-aeration shower head

[Related Applications] This application claims priority to U.S. Provisional Patent Application No. 63/543,203, filed on October 9, 2023. The entire contents of the aforementioned application are incorporated herein by reference.

The present disclosure generally relates to substrate processing systems, and more particularly, to a panelless multi-plenum showerhead for use in substrate processing systems.

The background description provided here is for the purpose of generally presenting the present disclosure. To the extent described in this prior art section, the work of the presently named inventors and any aspects of the description that may not otherwise be considered prior art at the time the application was filed do not constitute an admission, either express or implied, of prior art that adversely affects the present disclosure.

A substrate processing system (also called a tool) is used to process substrates such as semiconductor wafers. The substrate processing system includes a processing chamber. The processing chamber includes a plurality of processing modules (also called stations). Each processing module can process a substrate. For example, processing can include deposition, etching, cleaning, and/or other substrate processing. During processing, the substrate is arranged on a substrate support in the processing module. A gas delivery system introduces one or more gases and/or vaporized precursors into the processing module via a gas delivery device. For example, the gas delivery device can be a showerhead, an injector, etc. In some processes, plasma can be used to trigger chemical reactions. Examples of processes include chemical vapor deposition (CVD), atomic layer deposition (ALD), plasma-enhanced (PE) CVD (PECVD), and PEALD.

A showerhead includes a plate and a baffle. The plate includes a first surface and an opening in the center of the first surface. The baffle is positioned in the opening of the plate and extends through the opening into the plate. The baffle includes a second surface located in a plane parallel to the first surface of the plate and including a first set of holes and a second set of holes in the second surface. The first set of holes and the second set of holes are not in fluid communication with each other.

In an additional feature, the second surface of the baffle is coplanar with the first surface of the plate.

In an additional feature, the nine holes in the first set of holes form a first square around the center of the second surface of the baffle. One or more holes in the first set of holes are located within the first square. None of the holes in the second set of holes are located within the first square.

In an additional feature, the four holes in the second set of holes form a second square that is larger than the first square. The second square has a center that coincides with the center of both the first square and the second surface of the baffle. Each of the four holes is located radially outward from one of the nine holes at a corner of the first square.

In an additional feature, the second surface of the baffle further comprises a third set of holes having a diameter that is smaller than or equal to the diameter of the first set of holes and the second set of holes. At least four holes in the third set of holes are located inside the second square and outside the first square.

In an additional feature, at least one hole in the third set of holes and two holes in the first set of holes form a triangle, and no other holes are within the triangle.

In an additional feature, the third set of holes is located in a circle that is concentric with the centers of the first and second squares and the center of the second surface of the baffle. The corners of the first square are located on the circle.

In an additional feature, the third set of holes is in fluid communication with the second set of holes, but not in fluid communication with the first set of holes.

In an additional feature, two diameters of the second surface of the baffle are perpendicular to each other and intersect at the center of the second surface of the baffle to form four quadrants on the second surface of the baffle. These two diameters contain only the first set of holes. Each quadrant contains one or more holes of the third set of holes.

In the additional feature, each diameter contains nine holes from the first set of holes.

In an additional feature, the showerhead is configured to supply one or more gases directly to the processing chamber through the baffle.

In an additional feature, the showerhead is configured to supply one or more gases through the baffle to the substrate facing the plate. The showerhead does not include a face plate having holes facing the substrate.

In an additional feature, the showerhead is configured to supply a first gas through a first set of holes and a second gas through a second set of holes to the substrate facing the plate.

In the additional feature, the first set of holes and the second set of holes have the same diameter.

In an additional feature, the first set of holes and the second set of holes are arranged along concentric circles. The holes on at least one circle have a different diameter than the holes on at least one other circle.

In the additional feature, the first set of holes and the second set of holes are arranged in rows and columns.

In an additional feature, the baffle is coupled to the plate by one or more fasteners.

Among the additional features, the plate and guard are integrated.

In an additional feature, the baffle includes a ring surrounding the second surface of the baffle. The showerhead further includes a gap between an outer diameter of the ring and an inner diameter of the opening of the plate.

In an additional feature, the baffle includes a ring surrounding the second surface of the baffle, wherein the outer diameter of the ring is smaller than the inner diameter of the opening of the plate.

In an additional feature, the edge of the first surface of the plate is rounded along the inner diameter of the opening of the plate.

In an additional feature, the baffle includes a ring surrounding the second surface of the baffle. The showerhead further includes a gap between an outer diameter of the ring and an inner diameter of the opening in the plate. The first set of holes in the baffle are configured to supply a first gas. The second set of holes in the baffle do not intersect the first set of holes and are configured to supply a second gas. The gap is configured to allow the second gas to pass through.

In an additional feature, the first set of holes and the second set of holes are arranged in an alternating pattern.

In an additional feature, each hole in the first set of holes and the second set of holes is separated from adjacent holes in the first set of holes and the second set of holes by a predetermined distance.

In an additional feature, the diameter of the second surface of the baffle is 75-99% of the diameter of the opening.

In an additional feature, the diameter of the second surface of the baffle is 0.5-50% of the diameter of the first surface of the plate.

Among the additional features, the diameter of the opening is 0.5-50% of the diameter of the board.

In an additional feature, the showerhead further includes a rod connected to a second surface of the plate, the second surface being opposite the first surface. The rod includes a base coupled to a central region of the second surface of the plate and includes a vertical portion extending vertically upward from the base.

In additional features, the second surface of the plate (i) extends vertically upward from the outer diameter of the first surface a first distance, (ii) after the first distance, extends radially inward at an angle relative to the first surface of the plate a second distance, and (iii) after the second distance, extends radially inward parallel to the first surface of the plate a third distance to the base of the rod.

Among other features, a baffle for a showerhead includes a connecting plate, a rod, and a gas delivery plate. The connecting plate is configured to connect the baffle to the showerhead. The rod extends from the connecting plate. The gas delivery plate extends from the rod and includes a first set of holes and a second set of holes for delivering one or more gases. The first set of holes and the second set of holes are not in fluid communication with each other.

Among the additional features, the connecting plates, rods, and gas delivery plates are cylindrical and have different diameters.

In an additional feature, at least one of the connecting plate, the rod, and the gas delivery plate has a different shape than the others of the connecting plate, the rod, and the gas delivery plate.

In additional features, at least one of the connector plate, the rod, and the gas delivery plate has different dimensions than the others of the connector plate, the rod, and the gas delivery plate.

Among the additional features, the connection plate and the gas delivery plate have the same dimensions.

Among the additional features, the connecting plate, rods, and gas delivery plate are integrated.

In an additional feature, the connecting plate, the rod, and the gas delivery plate are coupled to each other using one or more fasteners.

Among the additional features, the gas delivery plate has a larger diameter than the rod. The connector plate has a larger diameter than the gas delivery plate.

In an additional feature, the baffle further includes an opening extending through the center of the connecting plate and the rod, and which extends into the gas delivery plate through the central portion of the gas delivery plate.

In an additional feature, the connecting plate includes a plurality of arcuate slits extending through the connecting plate. The plurality of arcuate slits are located radially outward from the rod.

In an additional feature, the gas delivery plate includes a first set of holes and a second set of holes arranged in an alternating pattern. The first set of holes is configured to deliver a first gas, and the second set of holes is configured to deliver a second gas different from the first gas.

In the additional feature, the first set of holes and the second set of holes have the same diameter.

In an additional feature, the first set of holes and the second set of holes are arranged along concentric circles. The holes on at least one circle have a different diameter than the holes on at least one other circle.

In the additional feature, the first set of holes and the second set of holes are arranged in rows and columns.

In an additional feature, one hole in the first set of holes is located at the center of the gas delivery plate. Nine holes in the first set of holes form a first square at the center of the gas delivery plate. One or more holes in the first set of holes are located within the first square. None of the holes in the second set of holes are located within the first square.

In an additional feature, the four holes in the second set of holes form a second square whose center coincides with the center of both the first square and the gas delivery plate. Each of the four holes is located radially outward from one of the nine holes at a corner of the first square.

In an additional feature, the gas delivery plate further comprises a third set of holes having a diameter that is smaller than or equal to the diameter of each of the first set of holes and the second set of holes. At least four holes in the third set of holes are located inside the second square and outside the first square.

In an additional feature, at least one hole in the third set of holes and two holes in the first set of holes form a triangle, and no other holes are within the triangle.

In an additional feature, the third set of holes is located in a circle that is concentric with the centers of the first and second squares and the center of the gas delivery plate. The corners of the first square are located on the circle.

In an additional feature, the third set of holes is in fluid communication with the second set of holes, but not in fluid communication with the first set of holes.

In an additional feature, two diameters of the gas delivery plate are perpendicular to each other and intersect at the center of the gas delivery plate to form four quadrants. The two diameters contain only the first set of holes. Each quadrant contains two holes from the third set of holes.

In the additional feature, each diameter contains nine holes from the first set of holes.

In an additional feature, the rod includes a fourth set of holes along the edge of the rod and a plurality of channels extending radially inward at an angle relative to a vertical axis through the rod and through the gas delivery plate between the third and fourth sets of holes. The third and fourth sets of holes are in fluid communication with each other, the second set of holes, the plurality of arcuate slits, and an annular volume surrounding the rod and between the connector plate and the gas delivery plate.

In additional features, the second set of holes, the third set of holes, the fourth set of holes, the plurality of arcuate slits, and the annular volume are not in fluid communication with the first set of holes.

In an additional feature, the gas delivery plate includes a plate, a frustoconical portion, and a ring attached to the plate, the ring surrounding the frustoconical portion and defining a gap therebetween.

In an additional feature, the smaller end of the truncated cone is attached to the plate. As the ring extends toward the plate, the inner diameter of the ring tapers inwardly.

In an additional feature, the larger end of the truncated cone is attached to the plate. As the ring extends toward the plate, the inner diameter of the ring tapers outward.

In an additional feature, the frustoconical portion includes a fifth set of holes positioned transversely through the frustoconical portion. The first set of holes passes through the frustoconical portion and is vertically connected to the fifth set of holes.

In an additional feature, the baffle further includes an opening extending through the center of the connecting plate and the rod, and extending through the central portion of the gas delivery plate into the gas delivery plate. The opening is in fluid communication with the first set of holes and the fifth set of holes, and the gap between the frustoconical portion and the ring.

In additional features, the opening, the first set of holes, the fifth set of holes, and the gap are not in fluid communication with the second, third, and fourth sets of holes, the plurality of arcuate slits, and the annular volume surrounding the rod and between the connecting plate and the gas delivery plate.

In an additional feature, each hole in the third and fourth sets of holes and each channel in the plurality of channels has the same diameter. The angle is 45-85 degrees.

In additional features, the diameters of the first and second groups of holes are 1-25% of the diameter of the fifth group of holes. The diameters of the third and fourth groups of holes and the plurality of channels are 10-100% of the diameters of the first and second groups of holes.

Among the additional features, the thickness of the rod is less than the thickness of the connecting plate. The thickness of the gas delivery plate is less than the thickness of the rod.

Among other features, the showerhead includes a base plate and a baffle. The base plate includes a first surface and an opening located in the center of the first surface. The baffle is disposed within the opening of the base plate and extends into the base plate through the opening. The baffle includes a second surface located in a plane parallel to the first surface of the base plate and including a first set of holes and a second set of holes in the second surface. The first set of holes and the second set of holes are not in fluid communication with each other.

In an additional feature, the showerhead is configured to supply one or more gases directly into the processing chamber through the baffle.

In an additional feature, the showerhead is configured to supply one or more gases through the baffle to the substrate facing the base plate. The showerhead does not include a face plate having holes facing the substrate.

In an additional feature, the second surface of the baffle is coplanar with the first surface of the base.

In an additional feature, the guard is connected to the base plate by one or more fasteners.

Among the additional features, the base plate and guard are integrated.

Among the additional features, the diameter of the opening is 0.5-50% of the base plate diameter.

In an additional feature, the diameter of the second surface of the baffle is 0.5-50% of the diameter of the first surface of the base.

In an additional feature, the diameter of the second surface of the baffle is 75-95% of the diameter of the opening.

In an additional feature, the showerhead is configured to supply a first gas through a first set of holes and a second gas through a second set of holes to the substrate facing the base plate.

In an additional feature, the base plate includes a first slit located in a second surface of the base plate. The second surface is opposite to the first surface. The showerhead further includes a first component and a second component. The first component includes a first base disposed in the first slit and a first vertical portion extending from the first base. The first vertical portion includes a conduit. The second component includes a second base disposed in the first slit on the first base and a second vertical portion extending from the second base. The second vertical portion includes an inlet. The first base and the second base have the same diameter as the first slit. The diameter of the second vertical portion is larger than the diameter of the first vertical portion. The second vertical portion surrounds the first vertical portion, defining a first annular volume therebetween. The first annular volume is in fluid communication with the inlet and is not in fluid communication with the conduit.

In an additional feature, the opening has a first diameter. The first slit has a second diameter. The first base includes a second slit facing the opening and having a third diameter that is larger than the first diameter and smaller than the second diameter. The baffle is disposed within the second slit.

In an additional feature, the baffle includes a connecting plate disposed in the second slit, a rod extending from the connecting plate, and a gas delivery plate extending from the rod. The connecting plate, the rod, and the gas delivery plate have different diameters.

Among the additional features, the connecting plate, rods and gas delivery plate are all integrated.

In an additional feature, the connecting plate, the rod, and the gas delivery plate are connected to each other using one or more fasteners.

Among the additional features, the diameter of the gas delivery plate is larger than the diameter of the rod. The diameter of the connecting plate is larger than the diameter of the gas delivery plate.

Among the additional features, the rod thickness is less than the connecting plate thickness. The gas delivery plate thickness is less than the rod thickness.

In an additional feature, the connecting plate includes a plurality of arcuate slits arranged in a circle having a larger diameter than the rod. The first vertical portion includes a plurality of angular holes extending radially inward and downward through the first base portion to the second slit. The angular holes are in fluid communication with the first annular volume and coincide with the arcuate slits.

In an additional feature, the gas delivery plate includes a plate, a truncated cone portion attached to a smaller end of the plate, and a ring surrounding the truncated cone portion and attached to the plate. The inner portion of the ring tapers parallel to the truncated cone portion, thereby defining a gap therebetween.

In an additional feature, the guard includes a third set of holes and a fifth set of holes. The third set of holes extends radially outward at an angle through the truncated cone into the rod, thereby forming a fourth set of holes on the edge of the rod. The fifth set of holes is positioned horizontally through the truncated cone. The first set of holes extends perpendicularly through the truncated cone to connect to the fifth set of holes.

In an additional feature, the conduit extends through the connecting plate, the rod, and the center of the plate into the frustoconical portion and is in fluid communication with the first set of holes and the fifth set of holes and with the gap between the frustoconical portion and the ring.

In an additional feature, the connecting plate and the gas delivery plate define a second annular volume therebetween and around the rod. A second set of holes extends through the plate and the truncated cone. The second set of holes, the third set of holes, and the fourth set of holes are in fluid communication with the second annular volume.

In an additional feature, the conduit, the first and fifth sets of holes, and the gap (296) between the truncated cone and the ring are in fluid communication with each other and define a first aerated portion of the showerhead. The inlet, the first and second annular volumes, the corner holes, the arcuate slits, the second, third, and fourth sets of holes, and the second gap between the gas delivery plate and the opening are in fluid communication with each other and define a second aerated portion of the showerhead.

In additional features, a portion of the conduit extends through the connecting plate, the rod, and the center of the plate into the truncated cone portion; the first and fifth sets of holes; and the gap between the truncated cone portion and the ring are in fluid communication with each other and define a first plenum portion of the baffle; and the second annular volume, the arcuate slit, and the second, third, and fourth sets of holes are in fluid communication with each other and define a second plenum portion of the baffle.

In the additional feature, the first set of holes and the second set of holes have the same diameter.

In an additional feature, the first set of holes and the second set of holes are arranged along concentric circles, and the holes on at least one circle have a different diameter than the holes on at least one other circle.

In an additional feature, the edge of the first surface of the base plate is rounded along the inner diameter of the opening in the base plate.

In an additional feature, the first set of holes and the second set of holes are arranged in an alternating pattern.

In an additional feature, each hole in the first set of holes and the second set of holes is spaced a predetermined distance from an adjacent hole in the first set of holes and the second set of holes.

In an additional feature, the first and second groups of holes have a smaller diameter than the fifth group of holes. The third and fourth groups of holes have a diameter that is smaller than or equal to the diameter of the first and second groups of holes.

Further areas of applicability of the present disclosure will become apparent from the detailed description, claims, and accompanying drawings. The detailed description and specific examples are intended for illustrative purposes only and are not intended to limit the scope of the present disclosure.

During deposition processes, showerheads are typically used to deliver process gases to a vacuum chamber in a controlled and uniform manner. A showerhead typically consists of a backing plate and a faceplate attached to the backing plate. The faceplate is typically equal to or larger in diameter than the substrate and equal to or smaller than the backing plate. The faceplate contains thousands of through-holes distributed throughout the faceplate, through which process gases are introduced into the chamber.

Many factors influence showerhead design, including but not limited to gas characteristics, deposition chemistry and uniformity, temperature, pressure, and throughput. Single-plenum and dual-plenum showerheads with varying overall dimensions and hole patterns on the faceplate are commonly used to deliver process gases to the processing chamber. These designs are often complex and require advanced manufacturing techniques, making showerheads expensive components of the gas delivery system. For example, in a dual-plenum showerhead, the through-holes are cross-drilled, which involves orthogonal drilling through the base plate of the showerhead, an expensive process. Showerhead design has a direct impact on throughput, which in turn is directly related to semiconductor manufacturing costs.

The present disclosure provides a simple and cost-effective design for a multi-plenum showerhead that eliminates the faceplate and allows up to three different gases to be delivered to a process chamber. More specifically, the state-of-the-art includes single-plenum and dual-plenum showerheads with a variety of hole sizes and patterns in the faceplate. In some designs, the showerhead is mounted (or suspended) above a pedestal in the process chamber, with a gap between the bottom surface of the showerhead (i.e., the faceplate) and the substrate mounted on the pedestal. In other designs, the showerhead and pedestal are reversed, allowing process gases to flow from the bottom of the process chamber, through the substrate support, and to the top of the chamber. The showerhead can also be used to generate and deliver plasma. In these applications, in addition to delivering gas to the process chamber, the showerhead also serves as the electrode (the ground or active electrode of the RF generation system).

In a single-plenum showerhead, all gases flow individually or together through a common path, while in a dual-plenum showerhead, two separate paths allow for two independent gas flows. In either design, the showerhead consists of a faceplate with many (e.g., thousands) of holes distributed across the faceplate, through which process gases are delivered to the process chamber. Showerheads can be actively heated using various technologies, such as heating elements, or passively heated through radiation, convection, and conduction from components in the process chamber that are hotter than the showerhead.

Showerheads can be a source of failure, in part due to their complex and customized design. When using single-plenum showerheads, the shared gas delivery path can lead to particle formation due to residual (stagnant) gas from previously supplied chemistries in multiple chemical processes. In addition, uneven deposition and low throughput are directly related to the showerhead design. Showerhead failures, such as clogged through-holes in the faceplate, increase the non-productive time (downtime) of the processing chamber. For example, clogged through-holes in the faceplate require regular cleaning, which increases downtime. In addition, the cleaning process can change the size of the holes over time, requiring the showerhead to be replaced. Due to the high cost of showerheads, frequent replacement of showerheads increases the overall cost of semiconductor manufacturing.

The faceless multi-aeration section shower head of the present disclosure solves the above-mentioned problems as described below. Unlike conventional shower heads that include a panel with thousands of through-holes distributed throughout the panel, the multi-aeration section shower head of the present disclosure does not include a panel. The faceless multi-aeration section shower head of the present disclosure does not have a panel and is therefore called a faceless multi-aeration section shower head (or simply a faceless shower head), where faceless means without a panel or without a panel. In a faceless shower head, a baffle is used instead of a panel. The baffle provides one or more aeration sections and corresponding through-holes. The baffle is disposed in the back panel of the shower head.

A faceless showerhead consists only of a backplate and a baffle, not a faceplate. The baffle's diameter is smaller than the diameters of the backplate, substrate, and faceplate, which are not used in faceless showerheads but are used in conventional showerheads. For example, the baffle's diameter is less than 50% of the diameters of the backplate, substrate, and faceplate. Multiple (e.g., two or more) separate plenums in the baffle allow for the simultaneous or sequential delivery of multiple (e.g., two or more) separate process gas streams. The number of through-holes in the baffle (e.g., approximately one hundred) is also much smaller than the number of through-holes in the faceplate. Thus, compared to conventional showerheads having faceplates, faceless showerheads deliver process gas from a significantly smaller area at the bottom of the faceless showerhead (e.g., 0.5%-50% of the area at the bottom of the faceless showerhead).

Compared to traditional showerhead designs, faceless showerheads reduce or eliminate particle generation and increase output by reducing the time required to transport and purify gas through multiple plenums. Faceless showerheads are also easier to clean than traditional faceplate showerheads. For example, faceless showerheads can be cleaned by mechanically treating the bottom surface, which is easier than cleaning a clogged through-hole in a traditional showerhead faceplate.

Furthermore, unlike faceplates, baffles are easier to manufacture and cheaper to replace. For example, baffles can be manufactured using multilayer manufacturing techniques such as 3D printing, which eliminates the expensive cross-drilling process required to drill through holes and reduces the manufacturing and replacement costs of baffles compared to faceplates. Therefore, faceless showerheads are a simpler and more cost-effective design compared to traditional showerhead designs.

More specifically, a faceless showerhead uses a baffle design rather than a typical face plate with a pattern of holes to achieve uniform gas flow from each plenum. The faceless showerhead design minimizes gas stagnation in the process chamber, resulting in faster purge times than when using traditional showerheads. The faceless showerhead design can be used for active and passive heating applications and for RF or non-RF applications. The faceless showerhead can be actively or passively heated and cooled. As a result, compared to traditional showerheads, the faceless showerhead design increases process speeds by delivering multiple, separate gases, reduces costs by eliminating complex manufacturing techniques, and reduces non-productive time (downtime) in the process chamber due to increased reliability. These and other features of the present disclosure are described in more detail below.

This disclosure is divided into two parts as follows. Part I contains Figures 1-16. Part II contains Figures 17-25. In Part I, the internal and external features of the showerhead and baffle are shown and described in detail. In Part II, only the external features of the showerhead and baffle are shown and briefly described. In Part I, an example substrate processing system in which a faceless showerhead according to this disclosure may be used is first shown and described with reference to Figure 1. The showerhead and its components including the baffle are shown and described with reference to Figures 2-9. The baffle of the showerhead is described in detail with reference to Figures 10A-16. In Part II, various views of the showerhead and baffle are shown. Some views in Part II are also shown and described in Part I. However, because the figures in Part I include reference numerals, some views from Part I are shown again in Part II to illustrate the exterior features of the showerhead and baffle, and other views of the showerhead and baffle are shown without reference numerals. Part I: Interior and Exterior Features of the Showerhead

In the following description, as shown in Figure 2-16, the axis parallel to the plane of the showerhead backing plate (also called the bottom plate) and the baffle is called the horizontal axis, the x-axis, or the first axis; the axis perpendicular to the plane of the showerhead backing plate and the baffle is called the vertical axis, the z-axis, the showerhead axis, or the second axis. When the substrate is placed on the substrate support for processing, the x-axis is also parallel to the plane of the substrate. The x-axis is also parallel to the diameter of the backing plate and the showerhead baffle. The x-axis also extends along the diameter of the backing plate and the showerhead baffle. In addition, examples of various dimensions of different components of the showerhead and the baffle and their technical advantages are described at the end.

Furthermore, throughout this disclosure, showerheads including baffles are generally described as comprising multiple components. These components can be attached to one another using suitable fasteners, as described below. Alternatively, these components can be diffusely bonded together. In some examples, showerheads including baffles can be manufactured as a single, integrated component using a variety of manufacturing techniques, such as 3D printing. Furthermore, throughout this disclosure, baffles are generally described as comprising multiple components. These components can be attached to one another using suitable fasteners, as described below. Alternatively, these components can be diffusely bonded together. In some examples, baffles can be manufactured as a single, integrated component using a variety of manufacturing techniques, such as 3D printing. The baffle can then be connected to the remainder of the showerhead using suitable fasteners or diffuse bonding.

Furthermore, all or some components of the showerhead and/or baffles may comprise the same or different materials. Examples of materials include metallic materials (e.g., metals and alloys) and ceramic materials. For example, ceramic materials have the advantage of being non-corrosive to certain chemistries used to process substrates, while metallic materials can be used in high-temperature applications. Example Substrate Processing System

FIG1 illustrates an example of a substrate processing system 100 in which a faceless showerhead with baffles as described above can be used, as further described below with reference to FIG2-16 . The substrate processing system 100 includes a station (also referred to as a processing module or chamber) 112 in which substrates are processed. While only one station 112 is shown as an example, the substrate processing system 100 may include a plurality of stations 112. Each station 112 may utilize a faceless showerhead with baffles according to the present disclosure. For example, substrates may be processed sequentially in the stations 112. The faceless showerhead with baffles disclosed herein can be used to perform various processes on substrates in different stations, such as atomic layer deposition (ALD), chemical vapor deposition (CVD), plasma-enhanced ALD (PEALD), plasma-enhanced CVD (PECVD), and thermal ALD (T-ALD).

The station 112 includes a pedestal (also called a substrate support) 114 and a showerhead 116. The pedestal 114 includes a base (also called a bottom plate) 118 and a rod 120. The rod 120 extends from the bottom 118 and is coupled to the bottom of the station 112. During processing, a substrate 124 is placed on the top surface of the base 118 of the pedestal 114.

The substrate 124 may be clamped to the top surface of the base 118 of the pedestal 114 using a clamping mechanism, such as a vacuum clamp. Alternatively, although not shown, the pedestal 114 may use another type of clamping mechanism. For example, the pedestal 114 may include an electrostatic chuck (ESC). The ESC may be disposed in the base 118 of the pedestal 114. The ESC includes clamping electrodes placed near the top surface of the base 118 of the pedestal 114. The clamping electrodes electrostatically clamp the substrate 124 to the top surface of the base 118 of the pedestal 114. Examples of other clamping mechanisms include mechanical clamping, small miniature contact areas (MCAs) placed on the top surface of the base 118 of the pedestal 114, and the like. In certain processes (e.g., ALD), regardless of the clamping scheme used, the pedestal 114 with the substrate 124 can be moved close to the bottom of the showerhead 116 by the actuator 121.

The showerhead 116 is described in detail below with reference to Figures 2-16. Briefly, the showerhead 116 includes a base (also referred to as a bottom plate) 126 and a stem (or rod) 128. The bottom plate 126 of the showerhead 116 is generally cylindrical. The diameter of the bottom plate 126 of the showerhead 116 is greater than or equal to the diameter of the base plate 124. The stem 128 of the showerhead 116 is also generally cylindrical. The diameter of the stem 128 of the showerhead 116 is smaller than the diameter of the bottom plate 126 of the showerhead 116. The stem 128 of the showerhead 116 extends from the bottom plate 126 of the showerhead 116. The rod 128 of the showerhead 116 is attached to the ceiling of the station 112. Although the showerhead 116 is shown as a pendant-style showerhead including the rod 128 attached to the ceiling of the station 112, the showerhead 116 can be any other type (e.g., mounted flush to the ceiling of the station 112).

The rod 128 of the showerhead 116 receives various gases (e.g., process gases, vaporized precursors, purge gases, clean gases, etc.) from a gas delivery system 150 via a manifold 152. The base plate 126 of the showerhead 116 does not include a faceplate (not shown) with through-holes or slots through which gases are introduced into the station 112. Instead, the base plate 126 of the showerhead 116 includes a baffle 127, which has a diameter that is much smaller than the base plate 126 (see dimensions below). Consequently, the diameter of the baffle 127 is also much smaller than the diameter of the substrate 124 (see dimensions below). The baffle 127 includes two non-intersecting plenum portions and a plurality of holes for allowing gas to pass through and be introduced into the station 112. The showerhead 116 and the baffle 127 will be described in detail below with reference to Figures 2-16.

The substrate processing system 100 includes a gas delivery system 150. The gas delivery system 150 includes a gas source 154, a valve 156, and a mass flow controller (MFC) 158. The gas source 154 provides a variety of gases, such as process gas, inert gas (also known as purge gas, edge gas, carrier gas), cleaning gas, etc. The valve 156 is connected to the gas source 154 and the MFC 158. The valve 156 can be controlled to deliver gas from the gas source 154 to the MFC 158. The MFC 158 regulates the flow of gas to the manifold 152. Gas is supplied to the showerhead 116 and the baffle 127 through the manifold 152, as further described below with reference to Figures 2-16.

Additionally, in some applications, the substrate processing system 100 includes another delivery system configured to deliver a vaporized precursor through corresponding valves, collectively referred to as a vaporized precursor and valve 151. The vaporized precursor and valve 151 delivers the vaporized precursor to a manifold 152. The manifold 152 supplies the gas or gas mixture from the gas delivery system 150 and/or the vaporized precursor from the vaporized precursor and valve 151 to the showerhead 116. Thus, the gas delivery system 150 and the vaporized precursor and valve 151 can supply different chemical substances to the showerhead 116 and the baffle 127, as described in further detail below with reference to Figures 2-16.

The substrate processing system 100 further includes a radio frequency (RF) power supply 160. In some processes, when plasma is used, the RF power supply 160 provides RF power to the showerhead 116 during processing of the substrate 124 and during cleaning stations 112 where the susceptor 114 is grounded or floating. Although not shown, in some applications, the RF power supply 160 provides RF power to the susceptor 114 during processing of the substrate 124 and during cleaning stations 112 where the showerhead 116 is grounded or floating. The RF power supply excites gases (e.g., process gases, vaporized precursors, cleaning gases, etc.) introduced into the station 112 via the showerhead 116 and the baffle 127 to generate a plasma between the showerhead 116 and the susceptor 114. The plasma may be used to treat the substrate 124 and clean various components within the station 112 (e.g., the pedestal 114, the sidewalls of the station 112, etc.).

The base 118 of the susceptor 114 includes a heater 162. The heater 162 heats the base 118 of the susceptor 114, which in turn heats the substrate 124. The base 118 of the susceptor 114 includes a temperature sensor 164 for sensing the temperature of the susceptor 114. Although not shown, the bottom plate 126 of the showerhead 116 may also include a heater for heating the gas, gas mixture, and/or vaporized precursor introduced into the station 112 through the showerhead 116. The bottom plate 126 of the showerhead 116 may also include a temperature sensor 168 for sensing the temperature of the showerhead 116.

The substrate processing system 100 further includes a vacuum pump 172 and a valve 170. The vacuum pump 172 creates a vacuum on the top surface of the susceptor 114 when the substrate 124 is chucked to the susceptor 114 using vacuum chucking. The vacuum pump 172 also evacuates gases and reactants from the station 112. The vacuum pump 172 also maintains pressure (e.g., vacuum) within the station 112 during processing of the substrate 124.

The substrate processing system 100 further includes a controller 180. The controller 180 controls the valves 156 and 170, the MFC 158, the heaters in the pedestal 114 and the showerhead 116, the actuator 121, the RF power supply 160, and the vacuum pump 172. The controller 180 monitors the temperature of the pedestal 114 and the showerhead 116 using the temperature sensors 164 and 168 in the pedestal 114 and the showerhead 116. The controller 180 controls the temperature of the pedestal 114 and the showerhead 116 by controlling the heaters in the pedestal 114 and the showerhead 116. Furthermore, although not shown, the substrate processing system 100 may also include a cooling system that supplies coolant to cooling channels in the pedestal 114 and the showerhead 116. Controller 180 controls the supply of coolant to cooling channels in base 114 and showerhead 116 to control the temperatures of base 114 and showerhead 116. Showerhead Example

Figures 2-5 show various views of an example showerhead 116 according to the present disclosure. Figures 6-9 show various views of example components of the showerhead 116. Figures 10A-16 show an example of a baffle 127 of the showerhead 116 in more detail. The showerhead 116 and baffle 127 will now be described in more detail with reference to Figures 2-16.

Referring to Figures 2-4, Figure 2 shows a perspective view of the showerhead 116. Figure 3 shows a side view of the showerhead 116. Figure 4 shows a bottom view of the showerhead 116. In Figures 2 and 3, the showerhead 116 includes a base plate 126 and a rod 128 extending vertically upward (along the z-axis) from the base plate 126. The base plate 126 and the rod 128 are generally cylindrical. The diameter of the rod 128 is smaller than the diameter of the base plate 126. The base plate 126 and the rod 128 are further described in detail in Figures 5 and 6. The rod 128 includes a housing 190 and a tube 192, both of which are further described in detail with reference to Figures 7A-9.

In Figures 2 and 3 , rod 128 is broadly shown connected to the upper surface of base plate 126. Rod 128 includes a base portion 200 and a vertical portion 202, which form (define) housing 190. Rod 128 further includes a tube 192. Base 200 is coupled to a central region of the upper surface of base plate 126. Vertical portion 202 of rod 128 extends vertically upward (along the z-axis) from base 200 of rod 128. Gas is supplied to showerhead 116 via tube 192 and inlet 194. Gas received via tube 192 and inlet 194 is supplied to station 112 via various plenums in baffle 127 (see Figure 5 ), as described in detail below.

Figure 3 shows a side view of showerhead 116. For example, the upper surface of base plate 126 has the following shape. The upper surface of base plate 126 extends vertically upward (along the z-axis) from the outer diameter (OD) of the lower surface of base plate 126 for a first distance. Following the first distance, the upper surface of base plate 126 extends radially inward (along the x-axis) at an angle relative to the lower surface of base plate 126 (i.e., relative to the x-axis) for a second distance. Following the second distance, the upper surface of base plate 126 extends radially inward (along the x-axis) toward rod 128, parallel to the lower surface of base plate 126 (along the x-axis) for a third distance.

FIG4 shows a bottom view of the showerhead 116. The lower surface of the base plate 126 includes an opening 204 at the center of the lower surface of the base plate 126. A baffle 127 is disposed within the opening 204 of the base plate 126. As described in further detail below with reference to FIG5 and FIG6, the baffle 127 extends through the opening 204 (along the z-axis) into the base plate 126. The diameters of both the opening 204 and the lower surface of the baffle 127, visible in the bottom view of the showerhead 116, are significantly smaller (e.g., less than or equal to half the diameter of the base plate 126) than the diameter of the base plate 126. The base plate 126 does not have any holes between the outer diameter of the opening 204 and the outer diameter (OD) of the base plate 126 that could supply gas to the station 112.

The lower surface of baffle 127 lies in a plane parallel to the lower surface of base plate 126. For example, the lower surface of baffle 127 can be coplanar with the lower surface of base plate 126. In some examples, the lower surface of baffle 127 can be recessed or offset upward along the z-axis from opening 204. The lower surface of baffle 127 includes at least a first set of holes and a second set of holes. The at least first and second sets of holes are generally shown as 212 and 210 in the lower surface of baffle 127 in FIG. The layout and geometric arrangement of the first and second sets of holes 212, 210 are described in detail below with reference to FIG. 15.

The first set of holes 212 and the second set of holes 210 are in fluid communication with the inner and outer plenums of the showerhead 116, respectively, as shown and described in more detail below with reference to Figures 5-16. The first set of holes 212 and the second set of holes 210 are not in fluid communication with each other. The baffle 127 includes a variety of additional holes, which are shown as the third, fourth, and fifth sets of holes at 262, 264, and 260 in Figures 10A-16, respectively. These holes in the baffle 127 are shown and described in more detail below with reference to Figures 10A-16.

FIG5 shows a cross-sectional view of showerhead 116. Showerhead 116 includes base plate 126, baffle 127, and rod 128. Baffle 127 is described in detail with reference to FIG10A-16. Therefore, when describing certain components (features) of baffle 127, reference may also be made to FIG10A-16 as needed.

The rod 128 includes a housing 190 and a tube 192. The base plate 126, the housing 190, and the tube 192 are shown and described in detail with reference to Figures 6-9. Therefore, when describing some components (features) of the base plate 126, the housing 190, and the tube 192, reference will also be made to Figures 6-9 as needed.

Generally speaking, as described in detail below, the housing 190 and the tube 192 are cylindrical components that are concentric about the axis of the showerhead 116, and the housing 190 surrounds the tube 192. Therefore, the tube 192 may also be generally referred to as the first or inner component of the rod 128 or showerhead 116, and the housing 190 may also be generally referred to as the second or outer component 190 of the rod 128 or showerhead 116.

Housing 190 includes a base 200 and a vertical portion 202. Vertical portion 202 of housing 190 extends vertically upward (along the z-axis) from the center of base 200. Both base 200 and vertical portion 202 of housing 190 are cylindrical. The diameter of vertical portion 202 of housing 190 is smaller than the diameter of base 200 of housing 190.

Tube 192 also includes a base portion 220 and a vertical portion 222. Vertical portion 222 of tube 192 extends vertically upward (along the z-axis) from the center of base portion 220. Both base portion 220 and vertical portion 222 of tube 192 are cylindrical. The diameter of vertical portion 222 of tube 192 is smaller than the diameter of base portion 220 of tube 192.

Housing 190 is a single, integrated, one-piece component. Tube 192 is also a single, integrated, one-piece component. Base plate 126, housing 190, and tube 192 can be distinct components that can be connected to each other using fasteners or diffusely bonded to each other. Alternatively, base plate 126, housing 190, and tube 192 can be fabricated as a single, integrated, one-piece component.

The base plate 126 includes a cylindrical slit 230 formed through the upper surface of the base plate 126. The slit 230 extends vertically (along the z-axis) approximately halfway through the base plate 126. The slit 230 does not extend completely through the lower surface of the base plate 126. The base 220 of the tube 192 is disposed within the slit 230. The diameter of the base 220 of the tube 192 is the same as the diameter of the slit 230. The height (thickness) of the base 220 of the tube 192 (measured along the z-axis) is less than the depth of the slit 230 (also measured along the z-axis).

The base 200 of the housing 190 is positioned within the slit 230 on top of the base 220 of the tube 192. The diameter of the base 200 of the housing 190 is the same as the diameter of the base 220 of the tube 192. The diameter of the base 200 of the housing 190 is the same as the diameter of the slit 230.

The height (thickness) of the base 200 of the housing 190 (measured along the z-axis) is less than the depth of the slit 230. The height of the base 200 of the housing 190 is less than the height of the base 220 of the tube 192. The height of the base 220 of the tube 192 is greater than the height of the base 200 of the housing 190 to accommodate the connecting plate 240 of the baffle 127 within the base 220 of the tube 192, as described in detail below. The sum of the heights of the base 200 of the housing 190 and the base 220 of the tube 192 is equal to the depth of the slit 230.

The upper surface of the base 200 of the housing 190 forms (defines) the upper surface of the bottom plate 126. The diameters of the slit 230, the base 220 of the tube 192, and the base 200 of the housing 190 are equal, larger than the diameter of the opening 204, larger than the diameter of the connecting plate 240 of the baffle 127, and smaller than the diameter of the bottom plate 126.

The height of the vertical portion 222 of the tube 192 from the base 220 of the tube 192 (measured along the z-axis) is less than the height of the vertical portion 202 of the housing 190 from the base 200 of the housing 190 (measured along the z-axis). The outer diameter (OD) of the vertical portion 202 of the housing 190 is greater than the outer diameter (OD) of the vertical portion 222 of the tube. The vertical portion 222 of the tube 192 is hollow at the center, which starts at the top end of the vertical portion 222 of the tube 192 and passes through the top end of the vertical portion 222 of the tube 192 and the bottom end of the base 220 of the tube 192. The hollow portion of the tube 192 is cylindrical.

The vertical portion 202 of the housing 190 is partially hollow at its center. The partially hollow portion of the housing 190 is also cylindrical. The partially hollow portion of the housing 190 extends through the bottom end of the base 200 of the housing 190. The partially hollow portion of the housing 190 does not extend through the top end of the vertical portion 202 of the housing 190.

The height of the partially hollow portion of the vertical portion 202 of the housing 190 (measured along the z-axis) is equal to the height of the vertical portion 222 of the tube 192. The partially hollow portion of the housing 190 surrounds and encloses the vertical portion 222 of the tube 192. Therefore, the vertical portion 202 of the housing 190 surrounds and encloses the vertical portion 222 of the tube 192. Generally speaking, the housing 190 partially surrounds and encloses the tube 192. In other words, generally speaking, the housing 190 surrounds and encloses the vertical portion 222 of the tube 192.

The inner diameter (ID) of the partially hollow portion of the vertical portion 202 of the housing 190 is larger than the OD of the vertical portion 222 of the tube 192. The ID of the partially hollow portion of the vertical portion 202 of the housing 190 and the OD of the vertical portion 222 of the tube 192 define an annular volume 232. The inlet 194 is connected to the annular volume 232 via a passage (shown as 237 in FIG. 7C ) and an opening 236 in the vertical portion 202 of the housing 190. The passage 237 is not visible in FIG. 5 but is shown in FIG. 7A-7E . The opening 236 is located along the ID of the partially hollow portion of the vertical portion 202 of the housing 190 and near the upper end of the partially hollow portion of the vertical portion 202 of the housing 190. The passage 237 extends from the inlet 194 to the opening 236 in the vertical portion 202 of the housing 190. The passage 237 and the opening 236 will be described in detail below with reference to Figures 7A-7E.

Vertical portion 222 of tube 192 includes a groove 238 surrounding vertical portion 222 of tube 192 near its upper end. For example, groove 238 is located on the same horizontal plane (along the x-axis) as opening 236. Groove 238 is circular and extends around the entire tube 192. Opening 236 can extend around the entire housing 190 or be located within a portion of housing 190. Groove 238 is in fluid communication with annular volume 232.

Vertical portion 202 of housing 190 also includes a groove 239 surrounding the ID of a portion of the hollow portion of vertical portion 202 of housing 190 near its lower end. Groove 239 is also in fluid communication with annular volume 232. For example, by varying the inner diameter of vertical portion 202 of housing 190 and the outer diameter of vertical portion 222 of tube 192, annular volume 232 can be tuned for different applications. Gas from inlet 194 flows into annular volume 232 through passage 237 and opening 236. Groove 239 can be larger than groove 238 to facilitate uniform gas flow as the gas passes downward through annular volume 232 toward baffle 127. The grooves 238 and 239 are configured to adjust the direction and speed of the gas.

The height of the vertical portion 222 of the tube 192 is less than the height of the vertical portion 202 of the housing 190 (along the z-axis). The upper end of the vertical portion 222 of the tube 192 is located within and below the upper end of the vertical portion 202 of the housing 190 (along the z-axis). The upper end of the vertical portion 222 of the tube 192 extends radially inward (along the x-axis), narrows in diameter, and extends vertically upward (along the z-axis) to form a conduit 224. The vertical portion 202 of the housing 190 includes an opening 225 at the center of the vertical portion 202 of the housing 190 (as shown in FIG. 7B ). The conduit 224 extends through the opening 225.

The ID of conduit 224 is equal to the ID of the hollow portion of vertical portion 222 of tube 192. Conduit 224 passes through the top end of vertical portion 202 of base 200. Conduit 224 is in fluid communication with the hollow portion of tube 192. Conduit 224 is not in fluid communication with annular volume 232 between tube 192 and housing 190. Gas supplied through conduit 224 flows into the hollow portion of tube 192 and enters baffle 127, as described in detail below. Gas supplied through conduit 224 does not flow through annular volume 232. Gas supplied through annular volume 232 does not flow through conduit 224. Annular volume 232 does not intersect the hollow portions of conduit 224 and tube 192.

The baffle 127 is described in detail below with reference to Figures 10A-16. Briefly, the baffle 127 includes a connection plate 240, a rod 242, and a gas delivery plate 244. The connection plate 240 connects the baffle 127 to the showerhead 116, as described below. The connection plate 240 is connected to the rod 242. The rod 242 is connected to the gas delivery plate 244. The connection plate 240, the rod 242, and the gas delivery plate 244 can be separate components that can be connected together using fasteners or can be diffusely bonded together. Alternatively, the connection plate 240, the rod 242, and the gas delivery plate 244 can be manufactured as a single, integrated, and unitary component.

In some embodiments, the baffle 127 is connected to the showerhead 116 as follows. The base 220 of the tube 192 includes a cylindrical slit 246 formed through the lower surface of the base 220 of the tube 192. The slit 246 extends vertically (along the Z axis) approximately halfway to one-third of the base 220 of the tube 192. The slit 246 does not extend completely through the upper surface of the base 220 of the tube 192. The base 220 of the tube 192 includes an alignment pin 285 that mates with a corresponding hole 286 in the top surface of the connecting plate 240 of the baffle 127. The alignment pin 285 and hole 286 orient the baffle 127 as described in detail below.

The lower surface of the base plate 126 includes an opening 204 located at the center of the base plate 126. The diameter of a slit 246 is larger than the diameter of the opening 204. The slit 230 in the base plate 126 and the slit 246 in the base 220 of the tube 192 are concentric with the opening 204. Therefore, when the base 220 of the tube 192 is positioned in the slit 230, an annular step 207 is formed in the base plate 126 above the opening 204. In some examples, the diameter of the connecting plate 240 of the baffle 127 is larger than the diameter of the opening 204. The diameter of the connecting plate 240 of the baffle 127 is equal to the diameter of the slit 246. The height (measured along the z-axis) of the connecting plate 240 of the baffle 127 is equal to the depth (measured along the z-axis) of the slit 246. Therefore, when the connecting plate 240 of the baffle 127 is placed into the base plate 126 of the showerhead 116 through the opening 204, the outer lower edge of the connecting plate 240 of the baffle 127 rests on the annular step 207. The rod 242 and gas delivery plate 244 of the baffle 127 extend downward (along the z-axis) through the opening 204.

A gap 250 is maintained between the opening 204 in the base plate 126 and the bottom of the baffle 127. The size of the gap 250 (i.e., its width along the x-axis) can be varied based on application requirements by changing the ID of the opening 204 and/or the OD of the ring 294 of the baffle 127 (as shown and described below with reference to Figures 10A-16). For example, the ratio of the OD of the ring 294 of the baffle 127 to the ID of the opening 204 can be 75-99%. The gap 250 provides radial outward flow to the edge of the substrate 124, improving process uniformity across the substrate 124. If a particular application does not require uniform deposition/etching across the entire substrate 124 and only requires processing of the central region of the substrate 124, the gap 250 can be eliminated entirely. Furthermore, the diameter of the bottom surface of baffle 127 can be 0.5-50% of the diameter of the bottom surface of base plate 126. The diameter of the bottom surface of baffle 127 is selected based on the diameter of substrate 124 and the focal area of uniformity on substrate 124. The size of the bottom surface of baffle 127 is configured to be within 50% of the bottom surface of base plate 126 so that the gas transport rate at the edge of baffle 127 is more uniform than the gas transport rate around the center of baffle 127. The edge of the lower surface of base plate 126 at opening 204 can be rounded, as shown by 205 in FIG. 5 . The rounded edges of the lower surface of the base plate 126 at the opening 204 facilitate gas flow radially outward through the gap 250 toward the outer diameter (OD) of the lower surface of the base plate 126 .

The diameter of gas delivery plate 244 is larger than that of rod 242. The diameter of connecting plate 240 is larger than that of gas delivery plate 244. The diameter of gas delivery plate 244 is smaller than that of opening 204. Therefore, a gap 250 exists between gas delivery plate 244 and opening 204. An annular volume 252 is defined by connecting plate 240 and gas delivery plate 244 around rod 242. Annular volume 252 is in fluid communication with gap 250.

The lower surface of the gas delivery plate 244 is coplanar with the lower surface of the base plate 126. In some examples, the lower surface of the gas delivery plate 244 is coplanar and flush with the lower surface of the base plate 126. In other examples, the lower surface of the gas delivery plate 244 is slightly concave or offset vertically upward (along the z-axis) relative to the lower surface of the base plate 126.

In some examples, the shape of at least one of connecting plate 240, rod 242, and gas delivery plate 244 may differ from the shapes of the other of connecting plate 240, rod 242, and gas delivery plate 244. For example, any of connecting plate 240, rod 242, and gas delivery plate 244 may be square, rectangular, hexagonal, octagonal, circular, cylindrical, or any other polygonal shape. In some examples, the dimensions (e.g., dimensions measured along the x-axis and/or along the z-axis) of at least one of connecting plate 240, rod 242, and gas delivery plate 244 may differ from the dimensions of the other of connecting plate 240, rod 242, and gas delivery plate 244. For example, the dimensions may include any dimensions that define area and volume. The shape and size of the slit 246 in the base 220 of the tube 192 can correspond to the shape and size of the connecting plate 240. Any combination of shapes and sizes can be used to implement the connecting plate 240, rods 242, and gas delivery plate 244.

The baffle 127 can be connected to the showerhead 116 using fasteners, or can be diffusely bonded to each other. For example, the connecting plate 240 can be fixed or diffusely bonded to the base plate 126 at the annular step 207 and to the slit 246. Alternatively, the baffle 127 and the showerhead 116 can be made as a single, integrated component.

Baffle 127 includes several different holes, described herein as first through fifth groups of holes. The first through fifth groups of holes are shown as 212, 210, 262, 264, and 260 in FIG. 5 and FIG. 10-16, respectively. Although some holes are not visible in FIG. 5, they are shown and described in detail in FIG. 10A-16. These holes are briefly described below so that the flow path of gas through showerhead 116 and baffle 127 can be described with reference to FIG. 5. Furthermore, throughout this disclosure, although the holes in each group are shown as circular, the holes in each group do not need to be circular and can have other polygonal shapes. Furthermore, the ends of the holes can be flared. For example, the ends of the circular holes may be conical, wherein, for each hole, the radius of the conical end is larger than the radius of the hole. The flared ends of the holes help to properly distribute the gas discharged from the holes, avoid clogging of the holes and facilitate cleaning.

The gas delivery plate 244 is shown and described in detail below with reference to Figures 10A-16. Briefly, the gas delivery plate 244 includes at least the first and second sets of holes 212, 210 generally shown in Figure 4 in the lower surface of the baffle 127. Of the first and second sets of holes 212, 210, only the first set of holes 212 is visible in the view shown in Figure 5. The second set of holes 210 is not visible in Figure 5 but is visible in Figures 10A-16. The second set of holes 210 extends through the gas delivery plate 244 (see Figures 10A-16). The second set of holes 210 is in fluid communication with an annular volume 252 between the connecting plate 240 and the gas delivery plate 244, and with a gap 250 between the gas delivery plate 244 and the opening 204 in the bottom plate 126 (see FIG10A-16). Additionally, the gas delivery plate 244 includes a third set of holes, which are also not visible in FIG5 but are shown as 262 in FIG10A-16. The third set of holes 262 has fewer holes than the first and second sets of holes 212 and 210, as described in detail below with reference to FIG10A-16. In some embodiments, the first and second sets of holes 212 and 210 have the same diameter when measured from the bottom side of the baffle 127, but the third set of holes 262 has a smaller diameter.

The rod 242 of the baffle 127 further includes a fourth set of holes, which are also not visible in the view of FIG5 , but are shown as 264 in FIG10A-16 and described in detail with reference to FIG10A-16 . As described below, the fourth set of holes 264 extend radially inward and downward at an angle from the rod 242, through the lower surface of the gas delivery plate 244, to the third set of holes 262 on the lower surface of the gas delivery plate 244. As shown below and described, each of the third and fourth sets of holes 262, 264 is a single, angled (slanted), continuous hole. The third and fourth sets of holes 262 , 264 are in fluid communication with the annular volume 252 between the connecting plate 240 and the gas delivery plate 244 , and are in fluid communication with the gap 250 between the gas delivery plate 244 and the opening 204 in the bottom plate 126 .

The gas delivery plate 244 includes a fifth set of holes 260. As described in detail below with reference to FIG. 14 , the fifth set of holes 260 is positioned transversely along the x-axis through the frusto-conical portion 292 of the gas delivery plate 244 shown in FIG. 10A-16 . The first set of holes 212 extends from the lower surface of the gas delivery plate 244 to the fifth set of holes 260, as shown in FIG. 5 and FIG. 10A-16 . According to some embodiments, the first and fifth sets of holes 212, 260 are in fluid communication with each other. The first and fifth groups of holes 212, 260 are not in fluid communication with the second, third, and fourth groups of holes 210, 262, 264, the annular volume 252 between the connecting plate 240 and the gas delivery plate 244, and the gap 250 between the gas delivery plate 244 and the opening 204 in the bottom plate 126.

The connecting plate 240 and rod 242 of the baffle 127 are hollow at the center. In some examples, the hollow portion of the connecting plate 240 and rod 242 has the same diameter as the hollow portion of the vertical portion 222 of the tube 192. In some examples, the diameter of the hollow portion of the connecting plate 240 is larger or smaller than the diameter of the hollow portion of the vertical portion 222. The hollow portion of the connecting plate 240 and rod 242 of the baffle 127 is concentric with the hollow portion of the vertical portion 222 of the tube 192.

The connecting plate 240 of the baffle 127 has an opening 245 at the center of its top surface (see Figures 10A-16), which is connected to the rod 242 of the baffle 127. The opening 245 at the center of the top surface of the connecting plate 240 is concentric with the hollow portion of the connecting plate 240 and the rod 242 of the baffle 127. The opening 245 at the center of the top surface of the connecting plate 240 is also concentric with the hollow portion of the vertical portion 222 of the tube 192. In some examples, the diameter of the opening 245 in the top surface of the connecting plate 240 is the same as the diameter of the hollow portion of the connecting plate 240 and the rod 242 of the baffle 127. The diameter of the opening 245 in the top surface of the connecting plate 240 is also equal to the diameter of the hollow portion of the vertical portion 222 of the tube 192. In some examples, the above portions have different diameters.

The opening 245 at the center of the top surface of the connecting plate 240 and the hollow portion of the connecting plate 240 and rod 242 extend partially (less than the midpoint) into the gas delivery plate 244. The hollow portion of the connecting plate 240 and rod 242, as well as the hollow portion of the vertical portion 222 of the tube 192, are in fluid communication with the fifth set of holes 260. Therefore, the conduits 224 of the tube 192 of the showerhead 116 are in fluid communication with the fifth set of holes 260 in the baffle 127.

Thus, the conduit 224, the hollow portion of the vertical portion 222 of the tube 192, the connecting plate 240, the rod 242, the hollow portion of the gas delivery plate 244, the fifth set of holes 260, and the first set of holes 212 are in fluid communication with one another. The conduit 224, the hollow portion of the vertical portion 222 of the tube 192, the connecting plate 240, the rod 242, the hollow portion of the gas delivery plate 244, the fifth set of holes 260, and the first set of holes 212 define an internal flow path for supplying gas to the showerhead 116 through the conduit 224. The internal flow path may also be referred to as the inner plenum of the showerhead 116.

The hollow portion of the gas delivery plate 244, the fifth set of holes 260, and the first set of holes 212 define the inner plenum of the baffle 127. The internal flow path of the showerhead 116 is in fluid communication with the inner plenum of the baffle 127. The internal flow path does not intersect or is in fluid communication with the second, third, and fourth sets of holes 210, 262, 264, the annular volume 252 between the connecting plate 240 and the gas delivery plate 244, or the gap 250 between the gas delivery plate 244 and the opening 204 in the base plate 126.

Near the lower end of the vertical portion 222 of the tube 192 are a plurality of angular holes 270. The angular holes 270 are located radially opposite the recess 239 in the housing 190 along the x-axis. The angular holes 270 are in fluid communication with the annular volume 232 between the vertical portion 202 of the housing 190 and the vertical portion 222 of the tube 192. The angular holes 270 extend radially inward and downward from the lower edge of the vertical portion 222 of the tube 192 at an angle relative to the z-axis. The angular holes 270 extend through the base 220 of the tube 192 to the slit 246 in the base 220 of the tube 192.

The connecting plate 240 of the baffle 127 includes a plurality of arcuate slits, shown as 272-1, 272-2, and 272-3 in Figures 10A-10B and 12 (collectively, arcuate slits 272). Arcuate slits 272 are described in detail below with reference to Figure 12. In the view shown in Figure 5, only two arcuate slits 272-1 and 272-2 are visible. Arcuate slits 272 extend along the z-axis through the connecting plate 240 of the baffle 127. Arcuate slits 272 are arranged around the hollow portion at the center of the connecting plate 240 of the baffle 127. Arc slit 272 is located on a circle having a larger diameter than rod 242 of baffle 127. Therefore, arc slit 272 is in fluid communication with annular volume 252 between connecting plate 240 and gas delivery plate 244 of baffle 127. Arc slit 272 is also in fluid communication with the second, third, and fourth groups of holes 210, 262, and 264 in gas delivery plate 244 of baffle 127.

The arcuate slit 272 has an arcuate length and radial width configured to direct gas flow at an appropriate velocity into the annular volume 252 between the connecting plate 240 and the gas delivery plate 244 of the baffle 127. The shape of the arcuate slit 272 typically conforms to the overall shape of the baffle 127, which is cylindrical in this example. Conversely, if the baffle 127 is square or rectangular, which can be manufactured using additive manufacturing techniques (e.g., 3D printing), the shape of the slit 272 can also be square or rectangular to conform to the corresponding overall shape of the baffle 127. The shape of the slit 272 needs to conform to the overall shape of the baffle 127 to provide consistent and uniform gas flow through the baffle 127.

The corner holes 270 are arranged in groups around the lower edge of the vertical portion 222 of the tube 192 according to the position of the arcuate slit 272 in the connecting plate 240 of the baffle 127. The corner holes 270 are in fluid communication with the annular volume 252 between the connecting plate 240 of the baffle 127 and the gas delivery plate 244. Therefore, the inlet 194, the passage 237 and the opening 236 in the vertical portion 202 of the housing 190, the groove 238 in the vertical portion 222 of the tube 192, the annular volume 232 between the vertical portion 222 of the tube 192 and the vertical portion 202 of the housing 190, the groove 239 in the vertical portion 202 of the housing 190, the corner holes 270, the arcuate slit 272, the baffle 127 The annular volume 252 between the connecting plate 240 and the gas delivery plate 244 of the baffle 127, the second, third, and fourth groups of holes 210, 262, 264 in the gas delivery plate 244 of the baffle 127, and the gap 250 between the gas delivery plate 244 and the opening 204 in the base plate 126 define an external flow path for supplying gas to the showerhead 116 through the inlet 194. The external flow path may also be referred to as the outer plenum of the showerhead 116. The outer flow path does not intersect with or is fluidly connected to the inner flow path. In other words, the outer plenum of the showerhead 116 is not fluidly connected to the inner plenum of the showerhead 116.

The arcuate slits 272 in the connecting plate 240 of the baffle 127 and the second, third, and fourth groups of holes 210, 262, and 264 in the gas delivery plate 244 of the baffle 127 form (define) the outer plenum of the baffle 127. The outer flow path of the showerhead 116 is in fluid communication with the outer plenum of the baffle 127. The outer plenum of the baffle 127 does not intersect with or is not in fluid communication with the inner plenum of the baffle 127. Therefore, the inner and outer flow paths (i.e., the inner and outer plenums) of the showerhead 116 and the baffle 127 do not intersect with each other (i.e., are not in fluid communication with each other). Therefore, the gases flowing through the inner and outer flow paths (i.e., the inner and outer plenums) of the showerhead 116 and the baffle 127 do not mix in the showerhead 116 and the baffle 127.

For convenience, the inner flow path and inner plenum of the shower head 116 and the baffle 127 may be referred to as the first flow path and the first plenum of the shower head 116 and the baffle 127, respectively. The outer flow path and the outer plenum of the shower head 116 and the baffle 127 may be referred to as the second flow path and the second plenum of the shower head 116 and the baffle 127, respectively. The first gas supplied to the shower head 116 through the conduit 224 flows through the first flow path and the first plenum of the shower head 116 and the baffle 127. The second gas supplied to the shower head 116 through the inlet 194 flows through the second flow path and the second plenum of the shower head 116 and the baffle 127. The first gas does not mix with the second gas in showerhead 116 and baffle 127. In some examples, the first gas and the second gas can be the same. For example, the same gas can be supplied simultaneously, sequentially, or in some other manner through the first and second plenums. Example Showerhead Assembly

Figures 6-9 show examples and various views of the base plate 126, housing 190, and tube 192 of the showerhead 116. Figure 6 shows the base plate 126. Figures 7A-7E show the housing 190. Figures 8 and 9 show the tube 192. The baffle 127 of the showerhead 116 is shown and described in detail with reference to Figures 10A-16.

FIG6 shows a top perspective view of the bottom plate 126. The bottom surface of the bottom plate 126 includes an opening 204 through which the baffle 127 is positioned in the showerhead 116, as described above. The top surface of the bottom plate 126 includes a slit 230. The bases 220 and 200 of the tube 192 and the housing 190 are positioned in the slit 230, as described above. When the bottom plate 126, the housing 190, and the tube 192 are manufactured as separate components, the bottom plate 126 includes a circular groove 280 in the slit 230. The circular groove 280 surrounds the opening 204. A sealing element, such as an O-ring, is positioned in the circular groove 280 to seal the bottom of the base 220 of the tube 192 to the slit 230. When the showerhead 116 (eg, the base plate 126, the housing 190, and the tube 192) is manufactured as a single, unitary component (eg, using an additive manufacturing technique such as 3D printing), the circular groove 280 is not necessary and may be eliminated.

Figures 7A-7E show various views of the housing 190. Figure 7A shows a side view of the housing 190, illustrating the base 200 and vertical portion 202 of the housing 190. The side view also shows the arcuate member 284 (shown in Figure 7E) covering the opening 236 in the vertical portion 202 of the housing 190. A cross-sectional view along line AA is shown in Figure 7C and will be described below.

FIG7B shows a top view of housing 190, illustrating inlet 194 and opening 225. A cross-sectional view along line BB is shown in FIG7D, described below. FIG7C shows inlet 194, opening 236, and groove 239 in vertical portion 202 of housing 190. FIG7C also shows channel 237 in vertical portion 202 of housing 190 connecting inlet 194 to opening 236.

FIG7D shows opening 225, inlet 194, and channel 237 in vertical portion 202 of housing 190. FIG7D also shows opening 282 in the sidewall of vertical portion 202 of housing 190. Opening 282 provides an inlet for forming channel 237 in vertical portion 202 of housing 190. After channel 237 is formed, opening 282 is closed with arcuate member 284, shown in FIG7E. When showerhead 116 (e.g., base plate 126, housing 190, and tube 192) is manufactured as a single, unitary component (e.g., using a process such as 3D printing), opening 282 and arcuate member 284 can be eliminated.

Figures 8 and 9 show various views of the tube 192. Figure 8 shows a side view of the tube 192, showing the conduit 224, the base 220 with the slit 246, and the corner hole 270 in the vertical portion 222 around the edge of the vertical portion 222. Figure 8 also shows an alignment pin 285 in the slit 246 that engages a hole 286 in the top surface of the connecting plate 240 of the baffle 127, for orienting the baffle 127 so that the other end of the corner hole 270 at the slit 246 is aligned with the arcuate slit 272 in the connecting plate 240 of the baffle 127.

In some examples, alignment pins 285 can be provided on the top surface of the connecting plate 240 of the baffle 127, and holes 286 can be provided in the slit 246 in the base 220 of the tube 192. Furthermore, when the showerhead 116 and the baffle 127 are manufactured as a single, unitary structure (e.g., using 3D printing), the alignment pins 285 and holes 286 can be eliminated.

Figure 9 shows a bottom view of tube 192, illustrating slit 246 in base 220 of tube 192, with the other ends of corner holes 270 located at slit 246. Corner holes 270 are arranged around the edge of vertical portion 222 of tube 192. Figure 9 also shows that corner holes 270 are grouped so that the other ends of corner holes 270 in slit 246 align with arcuate slit 272 in connecting plate 240 of baffle 127. The other ends of corner holes 270 at slit 246 in base 220 of tube 192 mate with arcuate slit 272 in connecting plate 240 of baffle 127. Baffle Example

Figures 10A-16 show the baffle 127 in detail. Figures 10A-10C show different perspective views of the baffle 127. Figures 11A and 11B show side views of the baffle 127. Figures 12 and 15 show top and bottom views of the baffle 127, respectively. Figures 13, 14, and 16 show different cross-sectional views of the baffle 127.

FIG10A shows a top perspective view of the baffle 127. FIG10B shows a side perspective view of the baffle 127. FIG10C shows a bottom perspective view of the baffle 127. For the sake of brevity, elements (features) of the baffle 127 are labeled with the same reference numbers and are not repeated here because they have been described above.

In Figures 10A and 10B, baffle 127 includes connecting plate 240, rod 242, and gas delivery plate 244, as described above with reference to Figure 5. Connecting plate 240, rod 242, and gas delivery plate 244 are all cylindrical and have different diameters. For example, the diameter of rod 242 is smaller than that of gas delivery plate 244, which in turn is smaller than that of connecting plate 240. Rod 242 is not visible in Figures 10A-10C but is visible in Figures 11A, 11B, 13, and 16. Gas delivery plate 244 includes plate 290, a truncated cone portion 292 (visible in Figure 10C), and a ring 294. Plate 290 and ring 294 have the same outer diameter. The thickness (height) of the connecting plate 240, the rods 242, and the gas delivery plate 244, as measured along the z-axis, is also different. For example, the thickness of the rods 242 is smaller than the thickness of the connecting plate 240, and the thickness of the gas delivery plate 244 is smaller than the thickness of the rods 242.

Although plate 290, truncated cone portion 292, and ring 294 are shown and described as distinct components of gas delivery plate 244, gas delivery plate 244 is a single, unitary component. Furthermore, although baffle 127 is described as including connecting plate 240, rod 242, and gas delivery plate 244, baffle 127 may be fabricated as a single, unitary component (e.g., using additive manufacturing techniques such as 3D printing).

The top surface of the connecting plate 240 includes an opening 245, an arcuate slit 272, holes 286 that mate with the alignment pins 285, and the second set of holes 210, all of which are described above with reference to FIG5 . The top surface of the connecting plate 240 includes an annular slit 247 that circumscribes the opening 245, which in turn is surrounded by the arcuate slit 272. A sealing element (e.g., an O-ring) is disposed within the annular slit 247 to seal the top surface of the connecting plate 240 to the bottom of the base 220 of the tube 192. Annular slit 247 is not required and may be eliminated when baffle 127 is diffusely bonded to the bottom of base 220 of tube 192, or when showerhead 116 (e.g., base plate 126, housing 190, and tube 192) and baffle 127 are manufactured as a single, unitary component (e.g., using 3D printing).

FIG10C shows another perspective view of baffle 127, showing baffle 127 in an inverted (upside-down) position. The truncated cone portion 292 and ring 294 of gas delivery plate 244 are shown in detail. The diameter of the first end of truncated cone portion 292 (i.e., the upper end when baffle 127 is installed in showerhead 116) is smaller than the diameter of the second end of truncated cone portion 292 (i.e., the lower end when baffle 127 is installed in showerhead 116). The upper end of truncated cone portion 292 is connected to the bottom of plate 290, as can be more clearly seen in FIG11A, 13, and 16. The lower end of truncated cone portion 292 defines the bottom of baffle 127. The lower end of the truncated cone portion 292 includes the first, second and third sets of holes 212, 210, 262 described above with reference to Figure 5. A fifth set of holes 260 around the edge of the truncated cone portion 292 is formed in the truncated cone portion 292 as described with reference to Figure 14.

When baffle 127 is installed in showerhead 116, ring 294 extends vertically downward from the outer diameter (OD) of plate 290. The OD of ring 294 is the same as the OD of plate 290. Ring 294 surrounds frustoconical portion 292, as more clearly seen in Figures 11A and 11B. The inner portion of ring 294 tapers radially outward, parallel to the outer periphery or circumference of frustoconical portion 292, which also tapers radially outward (see Figures 11A, 13, and 16). The outer periphery of frustoconical portion 292 and the inner portion of ring 294 define a gap 296 between frustoconical portion 292 and ring 294. Gas flowing through the fifth set of holes 260 passes through gap 296 and is directed downward ( FIG. 10C shows baffle 127 in an inverted or upside-down position) toward substrate 124 (shown in FIG. 1 ). For example, the size of gap 296 (i.e., its width along the x-axis) can be varied by changing the ID of ring 294 and/or the OD of the bottom of truncated cone 292. Depending on the application, gap 296 can be reduced or increased to restrict or increase gas flow from the fifth set of holes 260 and gap 296 toward substrate 124. Therefore, the fifth set of holes 260 forms an inner plenum of the baffle 127. The fifth set of holes 260, the gap 296, and the tapered portion of the truncated cone 292 and the ring 294 guide the gas flowing through the inner plenum of the baffle 127 downward toward the substrate 124.

In the example of baffle 127 shown in Figures 10A-16, the truncated cone portion 292 is shown with its first end, having a smaller diameter, connected to the connecting plate 290. However, in other examples, the second end, having a larger diameter, of the truncated cone portion 292 can be connected to the connecting plate 290. In such a design, the inner portion of the ring 294 tapers radially inwardly and is parallel to the outer portion or periphery of the truncated cone portion 292. In other examples, the element 292 can be cylindrical rather than truncated cone, in which case the ring 294 is also cylindrical or annular, and the inner portion of the ring 294 is vertical (i.e., parallel to the z-axis and parallel to the outer portion or periphery of the cylindrical element 292).

Figures 11A and 11B show side views of baffle 127. Figure 11A partially shows ring 294 to illustrate the fifth set of holes 260 around the edge of frustoconical portion 292. Figure 11A also shows the inner portion of ring 294 tapering parallel to the outer periphery of frustoconical portion 292. Figure 11B shows ring 294 covering the fifth set of holes 260 around the edge of frustoconical portion 292. The side views in Figures 11A and 11B also show rod 242 and annular volume 252 between connector plate 240 and gas delivery plate 244, as described above with reference to Figure 5. The side views also show a fourth set of holes 264 on the edge of the rod 242, which will be described in detail below.

FIG12 shows a top view of baffle 127. Arc-shaped slits 272 and holes 286 corresponding to alignment pins 285 are visible, as described above with reference to FIG5 . Some of the second set of holes 210 in plate 290 of baffle 127 are visible through arc-shaped slits 272. As described above with reference to FIG5 , openings 245 in connecting plate 240 extend through connecting plate 240 and rod 242, and partially through gas delivery plate 244. Openings 245 extend through plate 290 into the upper end of truncated cone portion 292. Therefore, the upper end of truncated cone portion 292 is visible through openings 245 in the top view of baffle 127. Furthermore, at least one of the first set of holes 212 located at the bottom center of baffle 127 (i.e., at the center of the lower end of truncated cone portion 292) is also visible through opening 245 in the top view of baffle 127. In some examples, multiple holes in the first set of holes 212 may be located near the hole located at the bottom center of baffle 127 (i.e., at the center of the lower end of truncated cone portion 292). A cross-section of baffle 127 taken along line CC is shown in FIG13 .

FIG13 shows a cross-sectional view of baffle 127 taken along line CC shown in FIG12 . Arc-shaped slit 272-1 extending along the z-axis through connector plate 240 is visible. Opening 245 extending along the z-axis through connector plate 240 and rod 242, through plate 290, and partially extending into truncated cone portion 292 is visible. Ring 294 circumferentially surrounding truncated cone portion 292 and tapering parallel thereto is visible. First set of holes 212 extending from the lower end of truncated cone portion 292 to fifth set of holes 260 is visible. A cross-sectional view of truncated cone portion 292 taken along line DD is shown in FIG14 .

FIG14 shows a cross-sectional view of the truncated cone portion 292 taken along line DD shown in FIG13 . The fifth set of holes 260 is positioned transversely (along the x-axis) in the truncated cone portion 292 . For example, the fifth set of holes 260 is defined by forming two sets of orthogonal channels transversely (along the x-axis) in the truncated cone portion 292 . In some examples, the two sets of orthogonal channels can be formed by cross-drilling the fifth set of holes 260 radially through the truncated cone portion 292 . However, the cumbersome cross-drilling process can be eliminated by using additive manufacturing techniques (such as 3D printing) to manufacture the baffle 127 or at least the gas delivery plate 244 . The use of multilayer fabrication also allows for the formation of more complex channels (such as spiral channels), which are not feasible with the CNC processing typically used to form orthogonal channels.

A first set of holes 212 is formed from the lower end of the frusto-conical portion 292, connecting the first set of holes 212 to the fifth set of holes 260. The second set of holes 210 extends through the plate 290 and the frusto-conical portion 292. A third set of holes 262 extends radially outward at an angle from the lower end of the frusto-conical portion 292 to the edge of the rod 242 of the baffle 127, as described in further detail below with reference to FIG. The third set of holes 262 is arranged along a circle (see also 304 in FIG. 15 ), as described in further detail below with reference to FIG. When manufacturing the baffle 127 using 3D printing, the first, second, and third sets of holes 212, 210, 262 can also be formed together when forming other components of the baffle 127.

FIG15 shows a bottom view of the baffle 127. Visible are the first, second, and third groups of holes 212, 210, 262. The layout and geometry of the first, second, and third groups of holes 212, 210, 262 will now be described in further detail. The following description of these holes will be presented from the perspective of, first, the showerhead 116, which includes the showerhead and baffle 127, and second, the baffle 127 alone. Therefore, the following description from the perspective of the showerhead 116 will overlap (i.e., be redundant) with the description from the perspective of the baffle 127.

From the perspective of showerhead 116, the nine holes in the first set of holes 212 form a first square 300 (also referred to as a first square area) around the center of the lower surface of baffle 127. The lower surface of baffle 127 is the lower surface of gas delivery plate 244 or the lower surface of truncated cone portion 292 of baffle 127. One or more holes in the first set of holes 212 are located within first square 300. In one example, depending on the process recipe, hole 212 is located at the center of first square 300, as shown. In another example, although not shown, depending on the process recipe, hole 212 at the center of first square 300 may be optional and may be omitted. None of the second set of holes 210 are located within first square 300. The four holes in the second set of holes 210 form a second square 302 (also referred to as a second square area) that is larger than the first square 300 and surrounds the first square 300. The center of the second square 302 coincides with the center of the first square 300 and the center of the lower surface of the baffle 127. Each of the four holes in the second set of holes 210 is located radially outward from one of the nine holes in the first set of holes 212 at a corner of the first square 300.

The lower surface of baffle 127 further includes a third set of holes 262 having a diameter smaller than or equal to the diameters of the first and second sets of holes 212, 210. At least four of the third set of holes 262 are located within second square 302 and outside first square 300. In some examples, eight of the third set of holes 262 are located within second square 302 and outside first square 300. The at least one third set of holes 262 and the two first set of holes 212 form a triangular pattern, with no other holes located within the second square 302.

The third set of holes 262 is located on a circle 304 that is concentric with the center of the first square 300, the second square 302, and the lower surface of the baffle 127. The corners of the first square 300 are located on the circle 304. The second square 302 circumscribes the circle 304 and the first square 300. The third set of holes 262 is in fluid communication with the second set of holes 210, but not with the first set of holes 212.

The result of the aforementioned hole pattern is a uniform flow and distribution of gases from baffle 127 to substrate 124. Specifically, if gases are supplied simultaneously through these holes (e.g., in a CVD process), the hole pattern allows for mixing of the gases between baffle 127 and substrate 124 without requiring a panel with holes distributed across the entire panel to achieve gas mixing. Furthermore, the hole pattern relationship between the first, second, and third groups of holes (including spaces designated as having no holes) improves the uniformity of gas delivery across at least two non-intersecting delivery channels. For example, the hole pattern relationship allows some process recipes to more uniformly mix one or more gases beyond the lower surface of baffle 127, providing approximately equal concentrations of different gases at any given area of substrate 124. Alternatively, if gases are supplied sequentially through these holes (e.g., in an ALD process), the hole pattern provides uniform gas flow and distribution from baffle 127 to substrate 124, thereby improving process uniformity in the center region of substrate 124 without requiring a panel with holes distributed across the entire panel to achieve process uniformity. The number of holes in the above hole pattern is an example. A different number of holes can be selected to provide uniform gas flow and distribution from baffle 127 to substrate 124, depending on process requirements and the diameter of substrate 124.

Two diameters 306-1 and 306-2 (collectively referred to as diameters 306) on the bottom surface of baffle 127 are perpendicular to each other and intersect at the center of the bottom surface of baffle 127, forming four quadrants on the bottom surface of baffle 127. Both diameters 306 contain only the first set of holes 212. Each quadrant contains one or more third sets of holes 262. Each diameter contains nine first sets of holes 212.

The first and second groups of holes 212, 210 are arranged in an alternating pattern. Each hole in the first and second groups of holes 212, 210 is spaced a predetermined distance from adjacent holes in the first and second groups of holes. In some examples, the first and second groups of holes 212, 210 have the same diameter. The first and second groups of holes 212, 210 are arranged in rows and columns, as shown in FIG15 . In some examples, although not shown, the first and second groups of holes 212 and 210 may have different diameters. Furthermore, in some examples, although not shown, the first and second groups of holes 212, 210 may be arranged along concentric circles of increasing radius, wherein the diameter of the holes in at least one circle is different from the diameter of the holes in at least one other circle. In other examples, the first and second groups of holes 212, 210 may be arranged in a variety of patterns. For example, the first and second groups of holes 212, 210 can be arranged in a radially expanding shape, which can be any polygonal shape.

From the perspective of baffle 127, gas delivery plate 244 (i.e., the lower surface of truncated cone portion 292 of baffle 127) includes a first set of holes 212 and a second set of holes 210 arranged in an alternating pattern. The first and second sets of holes 212, 210 have the same diameter. In some examples, although not shown, the first set of holes 212 and the second set of holes 210 may have different diameters. Furthermore, in some examples, although not shown, the first and second sets of holes 212, 210 may be arranged along concentric circles of increasing radius, wherein the diameter of the holes on at least one circle is different from the diameter of the holes on at least one other circle.

One of the first set of holes 212 is located at the center of the gas delivery plate 244. The eight first set of holes 212 form a first square 300 at the center of the gas delivery plate 244. One or more of the first set of holes 212 are located within the first square 300. None of the second set of holes 210 are located within the first square 300. The four second set of holes 210 form a second square 302, the center of which coincides with the center of the first square 300 and the center of the gas delivery plate 244. Each of the four second set of holes 210 is located radially outward from one of the eight first set of holes 212 at a corner of the first square 300.

Gas delivery plate 244 further includes a third set of holes 262 having a diameter less than or equal to the diameter of each of the first and second sets of holes 212, 210. At least four of the third set of holes 262 are located within second square 302 and outside first square 300. At least one third set of holes 262 and two first set of holes 212 form a triangle with no other holes located within the triangle. The third set of holes 262 is arranged along a circle 304 that is concentric with the centers of first square 300, second square 302, and the center of gas delivery plate 244. The corners of first square 300 are located on circle 304. Second square 302 circumscribes circle 304 and first square 300. The third set of holes 262 is in fluid communication with second set of holes 210, but not with first set of holes 212. Two diameters 306 of the gas delivery plate 244 are perpendicular to each other and intersect at the center of the gas delivery plate 244, forming four quadrants. These two diameters 306 contain only the first set of holes 212. Each of the four quadrants contains two third sets of holes 262. Each diameter contains nine first sets of holes 212.

FIG16 shows a cross-sectional view of baffle 127 taken along line EE shown in FIG15 . Baffle 127 is shown inverted. The fourth set of holes 264 extends inward and downward at an angle from the edge of rod 242, through plate 290 and truncated cone portion 292 of gas delivery plate 244, to the third set of holes 262 on the lower surface of gas delivery plate 244. A passage 266 connects each of the third and fourth sets of holes 262, 264. The passage 266 has the same diameter as the third and fourth sets of holes 262, 264. Each of the third and fourth sets of holes 262, 264 is a single, angled, continuous hole.

The third and fourth sets of holes 262, 264 and passage 266 are in fluid communication with the annular volume 252 between the connecting plate 240 and the gas delivery plate 244, the arcuate slit 272, the second set of holes 210, and the gap 250 between the gas delivery plate 244 and the opening 204 in the base plate 126 (see FIG. 5). The third and fourth groups of holes 262, 264 and passages 266 are not in fluid communication with the following: the openings 245 in the connecting plate 240, the hollow portions of the connecting plate 240 and rods 242, the partial hollow portion of the gas delivery plate 244, the fifth group of holes 260, the first group of holes 212 connected to the fifth group of holes 260 (not visible in the view shown), and the gap 296 between the ring 294 and the truncated cone portion 292 of the gas delivery plate 244.

The first gas flowing through the openings 245 in the connecting plate 240 flows through the hollow portions of the connecting plate 240 and rods 242, the partially hollow portion of the gas delivery plate 244, the fifth set of holes 260, the first set of holes 212 (not visible in the illustrated view) connected to the fifth set of holes 260, and the gap 296 between the ring 294 and the truncated cone portion 292 of the gas delivery plate 244. The second gas flowing through the arcuate slits 272 flows through the annular volume 252 between the connecting plate 240 and the gas delivery plate 244, the third and fourth sets of holes 262, 264, the second set of holes 210, and the gap 250 between the gas delivery plate 244 and the openings 204 in the base plate 126 (see FIG. 5 ). Therefore, the first gas and the second gas do not mix in baffle 127. Dimensional Example

The dimensions of the various components and features of the showerhead 116 and baffle 127 are dependent on, and therefore a function of, the dimensions of the substrate 124. These dimensions can vary based on the dimensions of the substrate 124. For example, the diameter of the base plate 126 is greater than or equal to the diameter of the substrate 124 to ensure proper flow and control of the precursor over the substrate 124. The diameters of the opening 204 in the base plate 126 and the baffle 127 (i.e., the diameters of the connector plate 240, rods 242, and gas delivery plate 244) vary as the diameter of the base plate 126 varies, which in turn varies based on the diameter of the substrate. Therefore, the following provides examples of the dimensions of various components and features of the showerhead 116 and the baffle 127 in relative terms. That is, the dimensions of two components or features are expressed as a ratio or percentage of one another. However, regardless of the variations, the above descriptions of the dimensions of various components and features of the showerhead 116 and the baffle 127, including "greater than," "less than," "equal to," or "the same as," "greater than or equal to," and "less than or equal to," remain unchanged.

For example, the diameter of the lower surface of baffle 127 (i.e., gas delivery plate 244) is 0.5-50% of the diameter of the lower surface of base plate 126 of showerhead 116. This dimensional relationship is not merely a design choice; it defines the area or radius of substrate 124, relative to the center of substrate 124, that can receive gas supplied by baffle 127. For example, if the diameter of baffle 127 is less than 5%, the gas flow from baffle 127 may cause undesirable spraying from the center of substrate 124 (concentrated gas delivery leading to uneven gas delivery).

In some manufacturing processes, having a small baffle 127 offers some advantages in terms of deposition speed. However, there are practical limitations to manufacturing baffle 127 when it is made as a separable component. For example, when manufacturing baffle 127 by welding separately manufactured components 240, 242, 244, the size of baffle 127 cannot be reduced beyond this limit. In other applications, baffle 127 can be larger to help with airflow uniformity.

While the gas from baffle 127 is primarily distributed toward the center of substrate 124, the base plate 126 of showerhead 116 requires a larger bottom surface for a variety of reasons and technical benefits. For example, the bottom surface of base plate 126 of showerhead 116 serves several purposes: First, the bottom surface of base plate 126 provides thermal management, as it absorbs heat from susceptor 114. Second, the bottom surface of base plate 126 provides a surface above substrate 124 to hold and direct precursors to the area of interest on substrate 124, rather than allowing the precursors to spread throughout processing chamber 112. To achieve these goals, the bottom surface of base plate 126 can have a variety of dimensions depending on the size of substrate 124 and process parameters.

Furthermore, typical showerheads with faceplates have gas delivery holes throughout the entire faceplate to accommodate the size of substrate 124. However, as mentioned above, these showerheads suffer from the problem of the holes in the faceplate becoming clogged over time, requiring maintenance (cleaning) and, ultimately, replacement of the showerhead, which not only increases costs but also increases tool downtime and throughput. In contrast, showerhead 116 including baffle 127 only requires holes in the center area of showerhead 116 to address the issue of showerhead clogging and cleaning. Furthermore, baffle 127 can be replaced or cleaned more easily and cost-effectively without having to replace the entire showerhead. Furthermore, wafer throughput may be increased using a showerhead 116 with a baffle 127 because the baffle 127 can deliver the precursor at a faster flow rate, which can be deposited onto the substrate 124 more quickly, compared to a typical showerhead with a panel having hundreds (or thousands) of holes, which would require cleaning thousands of holes between different precursor dosings, adding lengthy rinsing times.

Like the baffle 127, the diameter of the opening 204 in the base plate of the showerhead 116 is also 0.5-50% of the diameter of the showerhead base plate 126. This size relationship is not only a design choice, but also makes it consistent with the size of the baffle 127 and the gap 250 between the baffle 127 and the base plate 126, which is important for directing airflow through the gap 250 toward the base plate 124. Therefore, the size of the opening 204 is not only suitable for installing the baffle 127 in the showerhead 116, but also provides the appropriate gap 250.

The diameter of the lower surface of baffle 127 (i.e., gas delivery plate 244) is 75-95% of the diameter of opening 204 in base plate 126 of showerhead 116. This dimensional relationship is not merely a design choice; it also defines a gap 250 between baffle 127 and base plate 126, which is important for directing airflow through gap 250 toward substrate 124. In some embodiments, the lower surface of baffle 127 is not flat. For example, the bottom surface may include one or more concave or convex areas.

In baffle 127, the diameters of the first and second groups of holes 212, 210 are 1-25% of the diameter of the fifth group of holes 260. The diameters of the third and fourth groups of holes 262, 264 and the passage 266 are 10-100% of the diameters of the first and second groups of holes 212, 210. The diameters of these holes are not merely a design choice; they determine the flow rate and pressure at which gas flows out of these holes onto substrate 124. This is important for preventing undesirable blasting (uneven gas delivery caused by concentrated gas delivery) from the center of substrate 124. Although the third group of holes 262 is shown smaller than the first and second groups of holes 212, 210, it is intended that the third group of holes 262 be as close to the size of the first and second groups of holes 212, 210 as possible. However, the dimensions of the third set of holes 262 cannot be too large, and the angle of the channels 266 associated with the third set of holes 262 cannot allow the third set of holes 262 to penetrate the outer plenum portion of the baffle 127. Furthermore, the angle of the channels 266 connecting the third and fourth sets of holes 262 and 264 (e.g., 45-85 degrees relative to the z-axis) is also configured to direct gas from the annular volume 252 through the third set of holes 262 to the center portion of the substrate 124, thereby ensuring process uniformity in the center portion of the substrate 124.

The number of holes in each group described above also serves a specific purpose. For example, while only one hole 212 of the first group of holes 212 is shown in the center of the lower surface of the baffle 127, more holes 212 may be provided near the center hole 212 (e.g., within the first square 300), depending on the application. However, in some applications, providing more holes 212 in the central region of the lower surface of the baffle 127 may result in a jetting effect, which can adversely affect deposition uniformity on the substrate 124. Whether one or more holes 212 are located in the central region of the lower surface of the baffle 127 also depends on the size of the first and second groups of holes 212, 210. If the diameters of the first and second groups of holes 212, 210 are larger, fewer holes 212 may be placed in the central region of the lower surface of the baffle 127. Because the baffle 127 can be a removable component of the showerhead 116 , the baffle 127 can have different hole sizes and patterns to accommodate different process applications (e.g., thermal ALD vs. CVD, or larger holes for more viscous precursor molecules, etc.).

In baffle 127, the fifth set of holes 260 is larger than the first set of holes 212 for the following reason. As described above, the fifth set of holes 260 is arranged transversely within the truncated cone portion 292 of the gas delivery plate 244 of baffle 127. Thus, the fifth set of holes 260 provides a passage for gas to pass through the inner plenum of baffle 127, while the first set of holes 212 are separate holes. Therefore, the fifth set of holes 260 must be larger than the first set of holes 212 to deliver fluid to the smaller first set of holes 212 and the gap 250 between the baffle 127 and the opening 204 in the lower surface of the base plate 126 of the showerhead 116.

Grooves 238, 239 in tube 192 and housing 190 are configured to reduce the velocity of gas flowing through annular volume 232 between tube 192 and housing 190 and enhance flow uniformity. The angle of corner holes 270 and the arc length and radial width of arcuate slits 272 are also configured to direct the gas flow at an appropriate velocity to annular volume 252 between connecting plate 240 and gas delivery plate 244 of baffle 127. Furthermore, the angle of channel 266 connecting the third and fourth sets of holes 262, 264 (e.g., 45-85 degrees relative to the z-axis) is also configured to direct gas from annular volume 252 through the third set of holes 262 to the central portion of substrate 124. Furthermore, the inner portion of the ring 294 and the outer periphery of the truncated cone portion 292 taper at an angle (e.g., 15-45 degrees) that is also configured to direct gas from the fifth set of holes 260 through the gap 296 between the ring 294 and the truncated cone portion 292 and radially outward onto the substrate 124. Part II: External Features of the Showerhead and Baffle

Figures 17-25 show various example views of the showerhead 116 and baffle 127. Some of the views shown in Figures 17-25 have already been shown and described above with reference to Figures 1-16. However, because Figures 1-16 already include reference numbers, some views shown in Figures 1-16 and other views of the showerhead 116 and baffle 127 that are shown again in Figures 17-25 are not labeled with reference numbers.

FIG17 shows an example perspective view of the showerhead 116 with the baffle 127. FIG17 is similar to FIG2 and shows the base 126 and rod 128 of the showerhead 116, which are described in detail above with reference to FIG1-16. FIG18 shows an example side view of the showerhead 116 shown in FIG17. FIG18 is similar to FIG3 and therefore will not be described again for the sake of brevity. FIG19 shows an example top view of the showerhead 116 shown in FIG17. FIG19 shows an example of an optional fastener for connecting the housing 190 and the tube 192 together and to the base 126 of the showerhead 116. FIG20 shows an example bottom view of the showerhead 116 shown in FIG17. FIG20 is similar to FIG4 and therefore will not be described again for the sake of brevity.

FIG21 shows an example perspective view of the baffle 127 of the showerhead 116 shown in FIG17 , with the baffle 127 upright. FIG21 is similar to FIG10B and, for the sake of brevity, will not be described again. FIG22 shows an example perspective view of the baffle 127 of the showerhead 116 shown in FIG17 , with the baffle 127 inverted. FIG22 is similar to FIG10C and, for the sake of brevity, will not be described again. FIG23 shows an example side view of the baffle 127 shown in FIG22 . FIG23 is similar to FIG11B and, for the sake of brevity, will not be described again. FIG24 shows an example top view of the baffle 127 shown in FIG22 . FIG24 is similar to FIG12 and, for the sake of brevity, will not be described again. Figure 25 shows an example of a bottom view of the baffle 127 shown in Figure 22. Figure 25 is similar to Figure 15 and therefore will not be described again for the sake of brevity.

The foregoing description is merely illustrative in nature and is in no way intended to limit the present disclosure, its application, or uses. The broad teachings of the present disclosure can be implemented in a variety of forms. Therefore, although the present disclosure includes specific examples, the true scope of the present disclosure should not be so limited, as other modifications will become apparent upon a study of the drawings, the specification, and the appended claims.

It should be understood that one or more steps within a method can be performed in a different order (or simultaneously) without altering the principles of the present disclosure. Furthermore, while each of the examples is described above as having certain features, any one or more of those features described for any example in this disclosure can be implemented in and/or combined with features of any other example, even if that combination is not explicitly described. In other words, the described examples are not mutually exclusive, and substitution of one or more examples for one another remains within the scope of this disclosure.

Various terms are used herein to describe spatial and functional relationships between components (e.g., between modules, circuit elements, semiconductor layers, etc.), including "connected," "joined," "coupled," "adjacent," "near," "on," "above," "below," and "disposed on." Unless explicitly described as "directly," a relationship between a first component and a second component described in the above disclosure may be a direct relationship with no intervening components between the first and second components, or an indirect relationship with one or more intervening components (spatially or functionally) between the first and second components. As used herein, the phrase at least one of A, B, and C should be interpreted using the non-exclusive logical "OR" to mean the logical (A or B or C) and should not be interpreted as meaning "at least one A, at least one B, and at least one C."

In some embodiments, the controller is part of a system, which can be part of the examples described above. Such a system can include semiconductor processing equipment, which includes one or more processing tools, one or more chambers, one or more processing platforms, and/or specific processing components (wafer pedestals, airflow systems, etc.). These systems can be integrated with electronic equipment to control operations before, during, and after processing of semiconductor wafers or substrates. This electronic equipment, which may be referred to as a "controller," can control various components or subcomponents of one or more systems.

Depending on the process requirements and/or the type of system, the controller can be programmed to control any of the processes disclosed herein, including the delivery of process gases, temperature settings (e.g., heating and/or cooling), pressure settings, vacuum settings, power settings, radio frequency (RF) generator settings, RF matching circuit settings, frequency settings, flow rate settings, fluid delivery settings, position and operation settings, wafer transfer into and out of tools and other transfer tools and/or load locks connected to or interfaced with a particular system.

Broadly speaking, a controller can be defined as an electronic device with various integrated circuits, logic, memory, and/or software that receives commands, issues commands, controls operations, enables cleaning operations, enables endpoint measurements, etc. Integrated circuits can include chips in the form of firmware that stores program instructions, digital signal processors (DSPs), chips defined as application-specific integrated circuits (ASICs), and/or one or more microprocessors or microcontrollers that execute program instructions (e.g., software).

Program instructions may be instructions delivered to a controller in the form of various individual settings (or program files) that define operating parameters for performing specific processes on or for a semiconductor wafer or system. In some examples, the operating parameters may be part of a recipe defined by a process engineer to perform one or more processing steps during the fabrication of one or more of the following: layers, materials, metals, oxides, silicon, silicon oxides, surfaces, circuits, and/or dies of the wafer.

In some embodiments, the controller can be part of or coupled to a computer that is integrated into, coupled to, or networked with the system, or a combination thereof. For example, the controller can be in the "cloud" or in all or part of a wafer fab computer mainframe system, thereby allowing remote access to wafer processing. The computer can initiate remote access to the system to monitor the current progress of manufacturing operations, review the history of past manufacturing operations, review trends or performance indicators from multiple manufacturing operations, change parameters of a current process, set processing steps to continue a current process, or start a new process.

In some examples, a remote computer (e.g., a server) can provide process recipes to the system via a network, which can include a local area network (LAN) or the Internet. The remote computer can include a user interface that allows parameters and/or settings to be entered or programmed, and then transmitted from the remote computer to the system. In some examples, the controller receives instructions in the form of data that defines parameters for each process step to be performed during one or more operations. It should be understood that the parameters are specific to the type of process to be performed and the type of tool to which the controller is connected or controlled.

Thus, as described above, the controller can be distributed, for example, by including one or more discrete controllers that are networked together and work toward a common purpose, such as the processing and control described herein. An example of a distributed controller for such a purpose is one or more integrated circuits in a chamber that communicate with one or more integrated circuits remotely (e.g., at a platform level or as part of a remote computer), which combine to control the processing in the chamber.

System examples may include, without limitation, plasma etch chambers or modules, deposition chambers or modules, spin cleaning chambers or modules, metal plating chambers or modules, clean chambers or modules, bevel edge etch chambers or modules, physical vapor deposition (PVD) chambers or modules, chemical vapor deposition (CVD) chambers or modules, atomic layer deposition (ALD) chambers or modules, atomic layer etch (ALE) chambers or modules, ion implantation chambers or modules, pathlength chambers or modules, and any other semiconductor processing system associated with or used in semiconductor wafer fabrication and/or production.

As described above, depending on the process step or steps to be performed by the tool, the controller may communicate with one or more of the following: other tool circuits or modules, other tool components, cluster tools, other tool interfaces, adjacent tools, neighboring tools, tools located throughout the factory, a host computer, another controller, or tools used for material transport that may move wafer containers to and from tool locations and/or load ports in a semiconductor fabrication facility.

100: Substrate Processing System 112: Station (also called a processing module or chamber) 114: Pedestal 116: Showerhead 118: Base 120: Rod 121: Actuator 124: Substrate 126: Base Plate 127: Baffle 128: Rod 150: Gas Delivery System 151: Vaporization Propellant and Valve 152: Manifold 154: Gas Source 156: Valve 158: Mass Flow Controller (MFC) 160: RF Power Supply 162: Heater 164: Temperature Sensor 168: Temperature Sensor 170: Valve 172: Vacuum Pump 180: Controller 190: Housing 192: Tube 194: Inlet 200: Base 202: Vertical portion 204: Opening 205: Edge of surface below opening 204 207: Annular step 210: Second set of holes 212: First set of holes 220: Base 222: Vertical portion 224: Conduit 225: Opening 230: Slit 232: Annular volume 236: Opening 237: Channel 238: Groove 239: Groove 240: Connector plate 242: Rod 244: Gas delivery plate 245: Opening 246: Slit 247: Annular slit 250: Gap 252: Annular volume 260: Fifth set of holes 262: Third set of holes 264: Fourth set of holes 266: Channel 270: Corner hole 272, 272-1, 272-2, 272-3: Arc-shaped slit 280: Circular groove 282: Opening 284: Arc-shaped member 285: Alignment pin 286: Hole 290: Plate 292: Truncated cone 294: Ring 296: Gap 300: First square 302: Second square 304: Circle 306, 306-1, 306-2: Diameter

The following detailed description and accompanying diagrams will provide a more comprehensive understanding of this disclosure, including:

FIG. 1 illustrates an example substrate processing system for processing a substrate using a showerhead without a faceplate and including a baffle according to the present disclosure.

FIG2 shows an example perspective view of a shower head according to the present disclosure; and

FIG3 shows an example of a side view of a shower head according to the present disclosure.

FIG4 shows an example of a bottom view of a shower head according to the present disclosure.

FIG5 shows an example cross-sectional view of a shower head according to the present disclosure.

FIG6 shows an example of a base plate of a shower head according to the present disclosure.

7A-7E, 8 and 9 show examples of various components of a shower head according to the present disclosure.

10A-10C show various perspective views of examples of a baffle of a showerhead according to the present disclosure.

11A and 11B show side view examples of a baffle of a showerhead according to the present disclosure.

FIG. 12 shows an example of a top view of a baffle of a showerhead according to the present disclosure.

FIG. 13 shows a first example of a cross-sectional view of a baffle of a shower head according to the present disclosure.

FIG14 shows a second example of a partial cross-sectional view of a baffle of a shower head according to the present disclosure.

FIG. 15 shows an example bottom view of a baffle of a shower head according to the present disclosure.

FIG. 16 shows a third example of a cross-sectional view of a baffle of a shower head according to the present disclosure.

FIG. 17 shows a perspective view of a showerhead with a baffle for use in a substrate processing system according to the present disclosure.

FIG18 is a side view of the shower head shown in FIG17.

FIG19 is a top view of the shower head shown in FIG18.

FIG20 is a bottom view of the shower head shown in FIG19.

FIG21 is a perspective view of the baffle of the shower head shown in FIG17 , wherein the baffle is upright.

FIG22 is a perspective view of the baffle of the shower head shown in FIG17 , wherein the baffle is inverted.

FIG23 is a side view of the baffle shown in FIG22.

FIG24 is a top view of the baffle shown in FIG22; and

FIG25 is a bottom view of the baffle shown in FIG22.

Among the drawings, graphic labels may be reused to identify similar and/or identical elements.

100: Substrate processing system

112: Station (also called processing module or processing room)

114: Base

116: Shower head

118: Base

120: Rod

121: Actuator

124:Substrate

126: Baseboard

127: Block

128: Rod

150: Gas delivery system

151: Carburization pre-driver and valve

152: Manifold

154: Gas Source

156: Valve

158: Mass Flow Controller (MFC)

160:RF power supply

162: Heater

164: Temperature sensor

168: Temperature sensor

170: Valve

172: Vacuum Pump

180: Controller

Claims (62)

A showerhead comprises: a plate comprising a first surface and an opening centered in the first surface; and a baffle disposed in the opening of the plate, the baffle extending into the plate through the opening, the baffle comprising a second surface lying in a plane parallel to the first surface of the plate and comprising a first set of holes and a second set of holes in the second surface, the first set of holes and the second set of holes being not in fluid communication with each other. The showerhead of claim 1 , wherein the second surface of the baffle is coplanar with the first surface of the plate. The showerhead of claim 1, wherein: nine holes in the first set of holes form a first square around the center of the second surface of the baffle; one or more holes in the first set of holes are located within the first square; and none of the holes in the second set of holes are located within the first square. The showerhead of claim 3, wherein: the four holes in the second set of holes form a second square that is larger than the first square, the second square having a center that coincides with the centers of both the first square and the second surface of the baffle; and each of the four holes is located radially outward of one of the nine holes at a corner of the first square. The showerhead of claim 4, wherein the second surface of the baffle further comprises a third set of holes having a diameter that is less than or equal to the diameter of the first set of holes and the second set of holes, and wherein at least four holes in the third set of holes are located inside the second square and outside the first square. A shower head as in claim 5, wherein at least one hole in the third set of holes and two holes in the first set of holes form a triangle, and there are no other holes in the triangle. The showerhead of claim 5 , wherein the third set of holes is located in a circle that is concentric with the centers of the first and second squares and the center of the second surface of the baffle, and wherein the corners of the first square are located on the circle. A showerhead as in claim 5, wherein the third set of holes is in fluid communication with the second set of holes but not in fluid communication with the first set of holes. The showerhead of claim 5, wherein: two diameters of the second surface of the baffle are perpendicular to each other and intersect at the center of the second surface of the baffle to form four quadrants on the second surface of the baffle; the two diameters contain only the first set of holes; and each quadrant contains one or more holes of the third set of holes. The showerhead of claim 9, wherein each of the diameters comprises nine holes of the first set of holes. The showerhead of claim 1, wherein the showerhead is configured to supply one or more gases directly to a processing chamber through the baffle. The showerhead of claim 1, wherein the showerhead is configured to supply one or more gases through the baffle to a substrate facing the plate, and wherein the showerhead does not include a face plate having holes facing the substrate. The showerhead of claim 1 , wherein the showerhead is configured to supply a first gas through the first set of holes and a second gas through the second set of holes to a substrate facing the plate. The shower head of claim 1, wherein the first set of holes and the second set of holes have the same diameter. The showerhead of claim 1 , wherein the first set of holes and the second set of holes are arranged along concentric circles, and wherein the holes on at least one circle have a different diameter than the holes on at least one other circle. The shower head of claim 1 , wherein the first set of holes and the second set of holes are arranged in rows. The showerhead of claim 1 , wherein the baffle is coupled to the plate by one or more fasteners. The shower head of claim 1, wherein the plate and the baffle are integral. The showerhead of claim 1, wherein the baffle comprises a ring surrounding the second surface of the baffle, the showerhead further comprising a gap between an outer diameter of the ring and an inner diameter of the opening of the plate. The showerhead of claim 1, wherein the baffle comprises a ring surrounding the second surface of the baffle, and wherein an outer diameter of the ring is smaller than an inner diameter of the opening of the plate. The showerhead of claim 1 , wherein an edge of the first surface of the plate is rounded along an inner diameter of the opening of the plate. The showerhead of claim 1, wherein the baffle comprises a ring surrounding the second surface of the baffle, the showerhead further comprising: a gap between an outer diameter of the ring and an inner diameter of the opening of the plate; wherein the first set of holes in the baffle is configured to supply a first gas; wherein the second set of holes in the baffle is non-intersecting with the first set of holes and is configured to supply a second gas; and wherein the gap is configured to allow the second gas to pass therethrough. The shower head of claim 1 , wherein the first set of holes and the second set of holes are arranged in an alternating pattern. The showerhead of claim 1 , wherein each hole in the first set of holes and the second set of holes is separated from an adjacent hole in the first set of holes and the second set of holes by a predetermined distance. The shower head of claim 1, wherein a diameter of the second surface of the baffle is 75-99% of a diameter of the opening. The shower head of claim 1, wherein a diameter of the second surface of the baffle is 0.5-50% of a diameter of the first surface of the plate. The shower head of claim 1, wherein a diameter of the opening is 0.5-50% of a diameter of the plate. The showerhead of claim 1 further comprising: A rod connected to a second surface of the plate, the second surface being opposite the first surface, wherein the rod includes a base coupled to a central region of the second surface of the plate and includes a vertical portion extending vertically upward from the base. A showerhead as in claim 28, wherein the second surface of the plate (i) extends vertically upward from an outer diameter of the first surface a first distance, (ii) after the first distance, extends radially inward at an angle relative to the first surface of the plate a second distance, and (iii) after the second distance, extends radially inward parallel to the first surface of the plate a third distance to the base of the rod. A baffle for a showerhead includes: a connecting plate configured to connect the baffle to the showerhead; a rod extending from the connecting plate; and a gas delivery plate extending from the rod, comprising a first set of holes and a second set of holes for delivering one or more gases, the first set of holes and the second set of holes not being in fluid communication with each other. As for the baffle plate for a shower head of claim 30, the connecting plate, the rod, and the gas delivery plate are cylindrical and have different diameters. A baffle for a shower head as in claim 30, wherein at least one of the connecting plate, the rod, and the gas delivery plate has a different shape than the other of the connecting plate, the rod, and the gas delivery plate. A baffle for a showerhead as in claim 30, wherein at least one of the connecting plate, the rod, and the gas delivery plate has a different size than the others of the connecting plate, the rod, and the gas delivery plate. A baffle for a shower head as claimed in claim 30, wherein the connecting plate and the gas delivery plate have the same size. A baffle for a shower head as claimed in claim 30, wherein the connecting plate, the rod, and the gas delivery plate are integrated. A baffle for a showerhead as claimed in claim 30, wherein the connecting plate, the rod, and the gas delivery plate are coupled to each other using one or more fasteners. A baffle for a shower head as claimed in claim 31, wherein the gas delivery plate has a larger diameter than the rod, and wherein the connecting plate has a larger diameter than the gas delivery plate. The baffle for a shower head of claim 31 further comprising an opening extending through the center of the connecting plate and the rod and into the gas delivery plate through a center portion of the gas delivery plate. A baffle for a shower head as claimed in claim 31, wherein the connecting plate includes a plurality of arcuate slits extending through the connecting plate, the plurality of arcuate slits being located radially outward from the rod. A baffle for a showerhead as claimed in claim 31, wherein the gas delivery plate comprises a first set of holes and a second set of holes arranged in an alternating pattern, wherein the first set of holes is configured to deliver a first gas and the second set of holes is configured to deliver a second gas different from the first gas. The baffle for a showerhead of claim 40, wherein the first set of holes and the second set of holes have the same diameter. A baffle for a showerhead as in claim 40, wherein the first set of holes and the second set of holes are arranged along concentric circles, and wherein the holes on at least one circle have a different diameter than the holes on at least one other circle. A baffle for a showerhead as claimed in claim 40, wherein the first set of holes and the second set of holes are arranged in rows. The baffle for a showerhead of claim 40, wherein: a hole in the first set of holes is located at a center of the gas delivery plate; nine holes in the first set of holes form a first square at the center of the gas delivery plate; one or more holes in the first set of holes are located within the first square; and none of the holes in the second set of holes are located within the first square. The baffle for a showerhead of claim 44, wherein: the four holes in the second set of holes form a second square having a center that coincides with the centers of both the first square and the gas delivery plate; and each of the four holes is located radially outward from one of the nine holes at a corner of the first square. A baffle for a showerhead as in claim 45, wherein the gas delivery plate further comprises a third set of holes having a diameter that is less than or equal to the diameter of each of the first set of holes and the second set of holes, and wherein at least four holes in the third set of holes are located inside the second square and outside the first square. A baffle for a shower head as claimed in claim 46, wherein at least one hole in the third set of holes and two holes in the first set of holes form a triangle, and there are no other holes within the triangle. A baffle for a showerhead as claimed in claim 46, wherein the third set of holes is located in a circle that is concentric with the centers of the first and second squares and the center of the gas delivery plate, and wherein the corners of the first square are located on the circle. A baffle for a showerhead as claimed in claim 46, wherein the third set of holes is in fluid communication with the second set of holes but not in fluid communication with the first set of holes. The baffle for a showerhead of claim 46, wherein: the two diameters of the gas delivery plate are perpendicular to each other and intersect at the center of the gas delivery plate to form four quadrants; the two diameters contain only the first set of holes; and each quadrant contains two holes of the third set of holes. The baffle for a showerhead of claim 50, wherein each of the diameters comprises nine holes of the first set of holes. The baffle for a showerhead of claim 46, wherein: the rod includes a fourth set of holes along an edge of the rod and a plurality of channels extending radially inward at an angle relative to a vertical axis passing through the rod and the gas delivery plate between the third set of holes and the fourth set of holes; and the third set of holes and the fourth set of holes are in fluid communication with each other, the second set of holes, the plurality of arcuate slits, and an annular volume surrounding the rod and between the connecting plate and the gas delivery plate. A baffle for a shower head as claimed in claim 52, wherein the second set of holes, the third set of holes, the fourth set of holes, the plurality of arcuate slits, and the annular volume are not in fluid communication with the first set of holes. The baffle plate for a showerhead as claimed in claim 52, wherein the gas delivery plate comprises: a plate; and a truncated conical portion and a ring attached to the plate, wherein the ring surrounds the truncated conical portion and defines a gap therebetween. The baffle for a showerhead of claim 54, wherein: a smaller end of the truncated conical portion is attached to the plate; and an inner portion of the ring tapers radially inwardly as the ring extends toward the plate. The baffle for a showerhead of claim 54, wherein: a larger end of the frustoconical portion is attached to the plate; and an inner portion of the ring tapers radially outward as the ring extends toward the plate. The baffle for a showerhead as claimed in claim 54, wherein the truncated conical portion comprises: a fifth set of holes positioned transversely through the truncated conical portion, wherein the first set of holes passes through the truncated conical portion and is vertically connected to the fifth set of holes. The baffle for a showerhead as claimed in claim 57 further comprises: An opening extending through the center of the connecting plate and the rod and extending into the gas delivery plate through a central portion of the gas delivery plate, wherein the opening is in fluid communication with the first set of holes and the fifth set of holes, and the gap between the frustoconical portion and the ring. A baffle for a shower head as claimed in claim 58, wherein the opening, the first set of holes and the fifth set of holes, and the gap are not in fluid communication with the second, third, and fourth sets of holes, the plurality of arcuate slits, and the annular volume surrounding the rod and between the connecting plate and the gas delivery plate. The baffle for a showerhead of claim 52, wherein: the diameter of each of the third and fourth sets of holes and each of the plurality of channels is the same; and the angle is 45-85 degrees. The baffle for a showerhead as claimed in claim 57, wherein: a diameter of the first and second groups of holes is 1-25% of a diameter of the fifth group of holes; and a diameter of the third and fourth groups of holes and the plurality of channels is 10-100% of a diameter of the first and second groups of holes. The baffle for a shower head as claimed in claim 30, wherein: a thickness of the rod is less than a thickness of the connecting plate; and a thickness of the gas delivery plate is less than the thickness of the rod.