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TW202424008A - Binder composition for dielectric layer, slurry composition for dielectric layer, dielectric layer, and capacitor - Google Patents

Binder composition for dielectric layer, slurry composition for dielectric layer, dielectric layer, and capacitor Download PDF

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TW202424008A
TW202424008A TW112140230A TW112140230A TW202424008A TW 202424008 A TW202424008 A TW 202424008A TW 112140230 A TW112140230 A TW 112140230A TW 112140230 A TW112140230 A TW 112140230A TW 202424008 A TW202424008 A TW 202424008A
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dielectric layer
polymer
mass
binder composition
composition
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佐佐木智一
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日商日本瑞翁股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F236/00Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
    • C08F236/02Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
    • C08F236/04Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
    • C08F236/10Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated with vinyl-aromatic monomers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L9/00Compositions of homopolymers or copolymers of conjugated diene hydrocarbons
    • C08L9/06Copolymers with styrene
    • HELECTRICITY
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    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/30Stacked capacitors

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Abstract

The purpose of the present invention is to provide a binder composition for a dielectric layer, which is capable of imparting excellent blocking resistance to the dielectric layer. The present invention is a binder composition for a dielectric layer, said binder composition including a polymer and a solvent, wherein the polymer contains a conjugated diene monomer unit and has a glass transition temperature of -45 DEG C or higher.

Description

介電質層用黏結劑組成物、介電質層用漿料組成物、介電質層及電容器Dielectric layer binder composition, dielectric layer slurry composition, dielectric layer and capacitor

本發明係關於介電質層用黏結劑組成物、介電質層用漿料組成物、介電質層及電容器。The present invention relates to a binder composition for a dielectric layer, a slurry composition for a dielectric layer, a dielectric layer and a capacitor.

如堆疊陶瓷電容器等的電容器,一般可藉由形成陶瓷胚片(green sheet)等介電質層,將此介電質層疊合,並任意燒結來獲得。Capacitors such as stacked ceramic capacitors are generally obtained by forming dielectric layers such as ceramic green sheets, stacking the dielectric layers, and sintering them randomly.

上述介電質層,舉例而言,可藉由:首先製備包含黏結劑、介電質材料與溶媒的漿料組成物,隨後將此漿料組成物塗布於脫模基材上,之後乾燥來獲得。然後,所獲得之介電質層可使用於電容器之製造。The dielectric layer can be obtained, for example, by first preparing a slurry composition including a binder, a dielectric material and a solvent, then applying the slurry composition on a release substrate, and then drying. Then, the obtained dielectric layer can be used in the manufacture of a capacitor.

近年來,為了對電容器賦予優異的特性,使用於介電質層之製造的漿料組成物所包含之黏結劑的開發已有進展。In recent years, there has been progress in the development of binders included in slurry compositions used in the manufacture of dielectric layers in order to impart excellent characteristics to capacitors.

舉例而言,在專利文獻1中,提案有一種無機質燒結體製造用黏結劑,其在使用作為用以製作陶瓷胚片之黏結劑的情況下,在可實現高孔隙率的同時,具有指定之凝膠成分率且包含含有指定之複合樹脂的黏結劑樹脂組成物作為能夠製造於製造燒結體時不易產生裂痕等不良狀況的陶瓷胚片之熱裂解性優異的黏結劑。For example, in Patent Document 1, a binder for manufacturing an inorganic sintered body is proposed, which, when used as a binder for manufacturing ceramic green sheets, can achieve a high porosity while having a specified gel component ratio and comprising a binder resin composition containing a specified composite resin as a binder with excellent thermal decomposition properties that can manufacture ceramic green sheets that are not prone to defects such as cracks when manufacturing sintered bodies.

『專利文獻』 《專利文獻1》:日本專利公開第2018-165230號公報 "Patent Document" "Patent Document 1": Japanese Patent Publication No. 2018-165230

於此,陶瓷胚片等介電質層在形成於脫模基材上後,通常與脫模基材一併捲繞成卷狀。若捲繞成卷狀,則介電質層會與未形成介電質層之側的脫模基材表面(以下有時候稱作「脫模基材背面」。)成為密合的狀態,但若以此狀態保存,則有介電質層與脫模基材背面固著(所謂之結塊),並引起介電質層之斷裂等之虞。Here, after a dielectric layer such as a ceramic green sheet is formed on a release substrate, it is usually rolled up together with the release substrate. If rolled up, the dielectric layer will be in close contact with the surface of the release substrate on the side where the dielectric layer is not formed (hereinafter sometimes referred to as the "back side of the release substrate"). However, if stored in this state, the dielectric layer and the back side of the release substrate may be fixed (so-called agglomeration), and there is a risk of causing the dielectric layer to break.

本發明人以解決上述課題為目的潛心進行研究。然後,本發明人新發現到若使用係為包含含有指定之單體單元之聚合物與溶媒的介電質層用黏結劑組成物,該聚合物的玻璃轉移溫度為指定之溫度以上的介電質層用黏結劑組成物,則可解決上述課題,進而完成本發明。The inventors of the present invention have conducted intensive research with the purpose of solving the above-mentioned problems. Then, the inventors of the present invention have newly discovered that if a dielectric layer binder composition comprising a polymer containing a specified monomer unit and a solvent is used, and the glass transition temperature of the polymer is above the specified temperature, the above-mentioned problems can be solved, and the present invention has been completed.

亦即,此發明係以順利解決上述課題為目的者,[1]本發明係一種介電質層用黏結劑組成物,其係包含聚合物與溶媒的介電質層用黏結劑組成物,其中前述聚合物含有共軛二烯單體單元且玻璃轉移溫度為−45℃以上。That is, the purpose of this invention is to successfully solve the above-mentioned problems. [1] The present invention is a dielectric layer binder composition, which is a dielectric layer binder composition comprising a polymer and a solvent, wherein the aforementioned polymer contains a conjugated diene monomer unit and has a glass transition temperature of above -45°C.

若使用上述介電質層用黏結劑組成物,則可對介電質層賦予優異的抗結塊性。When the above-mentioned binder composition for a dielectric layer is used, excellent anti-blocking property can be imparted to the dielectric layer.

並且,若使用上述介電質層用黏結劑組成物,則可抑制形成於脫模基材上之介電質層非意圖自脫模基材剝離。換言之,若使用上述介電質層用黏結劑組成物,則可對介電質層賦予優異的接合性。Furthermore, when the above-mentioned adhesive composition for a dielectric layer is used, the dielectric layer formed on the release substrate can be prevented from being unintentionally peeled off from the release substrate. In other words, when the above-mentioned adhesive composition for a dielectric layer is used, excellent bonding properties can be imparted to the dielectric layer.

再者,若使用上述介電質層用黏結劑組成物,則可在電容器之製造中,於將介電質層與其他層疊合並將此加壓後,於自脫模基材剝離介電質層時,抑制介電質層殘留於脫模基材。換言之,若使用上述介電質層用黏結劑組成物,則可對介電質層賦予優異的轉印性。Furthermore, if the above-mentioned dielectric layer binder composition is used, when the dielectric layer is laminated with other layers and pressed, the dielectric layer can be peeled off from the release substrate in the production of capacitors, and the dielectric layer can be suppressed from remaining on the release substrate. In other words, if the above-mentioned dielectric layer binder composition is used, the dielectric layer can be given excellent transferability.

在本說明書中,聚合物的玻璃轉移溫度可依循實施例所記載之方法量測。In this specification, the glass transition temperature of a polymer can be measured according to the method described in the examples.

[2]在上述[1]之介電質層用黏結劑組成物中,前述玻璃轉移溫度以20℃以下為佳。[2] In the adhesive composition for a dielectric layer of the above-mentioned [1], the glass transition temperature is preferably below 20°C.

若玻璃轉移溫度為上述上限以下,則可提升介電質層的轉印性。If the glass transition temperature is below the upper limit, the transferability of the dielectric layer can be improved.

[3]在上述[1]或[2]之介電質層用黏結劑組成物中,前述聚合物的四氫呋喃不溶成分率以70質量%以上為佳。[3] In the binder composition for a dielectric layer of [1] or [2], the tetrahydrofuran-insoluble content of the polymer is preferably 70% by mass or more.

若聚合物的四氫呋喃(THF)不溶成分率為上述下限以上,則可提升介電質層的抗結塊性。When the tetrahydrofuran (THF) insoluble content of the polymer is greater than or equal to the above lower limit, the anti-blocking property of the dielectric layer can be improved.

在本說明書中,聚合物的THF不溶成分率可依循實施例所記載之方法量測。In this specification, the THF insoluble content of a polymer can be measured according to the method described in the Examples.

[4]在上述[1]~[3]之任一者的介電質層用黏結劑組成物中,以前述聚合物為粒子狀聚合物,前述粒子狀聚合物的平均粒徑為0.01 μm以上且1.0 μm以下為佳。[4] In the binder composition for a dielectric layer according to any one of [1] to [3] above, the polymer is a particulate polymer, and the average particle size of the particulate polymer is preferably not less than 0.01 μm and not more than 1.0 μm.

若聚合物係粒子狀聚合物,則由於於形成介電質層時,可將聚合物均勻分散於介電質層中,故可提升介電質層的性能。If the polymer is a particulate polymer, the polymer can be uniformly dispersed in the dielectric layer when the dielectric layer is formed, thereby improving the performance of the dielectric layer.

若粒子狀聚合物的平均粒徑為上述下限以上,則可提升介電質層的接合性及轉印性。When the average particle size of the particulate polymer is equal to or larger than the above lower limit, the bonding property and transferability of the dielectric layer can be improved.

另一方面,若粒子狀聚合物的平均粒徑為上述上限以下,則可提升介電質層的抗結塊性。On the other hand, when the average particle size of the particulate polymer is equal to or smaller than the upper limit, the anti-blocking property of the dielectric layer can be improved.

在本說明書中,粒子狀聚合物的平均粒徑可依循實施例所記載之方法量測。In this specification, the average particle size of the particulate polymer can be measured according to the method described in the examples.

[5]在上述[1]~[4]之任一者的介電質層用黏結劑組成物中,前述聚合物以更含有芳族乙烯單體單元為佳。[5] In the binder composition for a dielectric layer according to any one of [1] to [4] above, the polymer preferably further contains an aromatic vinyl monomer unit.

若聚合物更含有芳族乙烯單體單元,則可提升介電質層的抗結塊性。If the polymer further contains aromatic vinyl monomer units, the anti-blocking property of the dielectric layer can be improved.

[6]在上述[1]~[5]之任一者的介電質層用黏結劑組成物中,前述溶媒以水或水性溶媒為佳。[6] In the binder composition for a dielectric layer according to any one of [1] to [5] above, the solvent is preferably water or an aqueous solvent.

若溶媒係水或水性溶媒,則可提升介電質層的抗結塊性及轉印性。If the solvent is water or an aqueous solvent, the anti-blocking property and transferability of the dielectric layer can be improved.

[7]在上述[1]~[6]之任一者的介電質層用黏結劑組成物中,前述共軛二烯單體單元的含有比例,在將前述聚合物中所包含之全部單體單元定為100質量%的情況下,以20質量%以上且60質量%以下為佳。[7] In the binder composition for a dielectric layer according to any one of [1] to [6], the content of the covalent diene monomer units is preferably 20% by mass or more and 60% by mass or less, based on 100% by mass of all the monomer units contained in the polymer.

若共軛二烯單體單元的含有比例為上述下限以上,則可提升介電質層的接合性及轉印性。When the content ratio of the conjugated diene monomer unit is equal to or greater than the above lower limit, the bonding property and transferability of the dielectric layer can be improved.

另一方面,若共軛二烯單體單元的含有比例為上述上限以下,則可提升介電質層的抗結塊性。On the other hand, when the content ratio of the conjugated diene monomer unit is below the above upper limit, the anti-blocking property of the dielectric layer can be improved.

在本說明書中,聚合物中之各種重複單元(單體單元)的含有比例可使用 1H-NMR等核磁共振(NMR)法量測。 In this specification, the content ratio of various repeating units (monomer units) in a polymer can be measured using a nuclear magnetic resonance (NMR) method such as 1 H-NMR.

並且,此發明係以順利解決上述課題為目的者,[8]本發明係包含上述[1]~[7]之任一者的介電質層用黏結劑組成物與介電質材料的介電質層用漿料組成物。Furthermore, the present invention is aimed at successfully solving the above-mentioned problems. [8] The present invention is a dielectric layer binder composition comprising any one of the above-mentioned [1] to [7] and a dielectric layer slurry composition of a dielectric material.

若使用上述介電質層用漿料組成物,則可對介電質層賦予優異的抗結塊性。並且,若使用上述介電質層用漿料組成物,則可對介電質層賦予優異的接合性及轉印性。When the dielectric layer slurry composition is used, excellent anti-blocking property can be imparted to the dielectric layer. Also, when the dielectric layer slurry composition is used, excellent bonding property and transferability can be imparted to the dielectric layer.

並且,此發明係以順利解決上述課題為目的者,[9]本發明係將由上述[8]之介電質層用漿料組成物而成之塗布膜乾燥而成的介電質層。Furthermore, this invention is aimed at successfully solving the above-mentioned problems. [9] The present invention is a dielectric layer formed by drying a coating film made of the dielectric layer slurry composition described in [8] above.

上述介電質層因抗結塊性、接合性及轉印性優異,故操作容易,其結果,可有效率生產電容器。The dielectric layer is easy to handle due to its excellent anti-blocking properties, bonding properties and transferability, and as a result, capacitors can be efficiently produced.

並且,此發明係以順利解決上述課題為目的者,[10]本發明係使用上述[9]之介電質層而成的電容器。Furthermore, this invention is aimed at successfully solving the above-mentioned problem. [10] The present invention is a capacitor formed by using the dielectric layer of the above-mentioned [9].

上述電容器由於使用操作容易的介電質層,故生產性優異。The above capacitor has excellent productivity because it uses a dielectric layer that is easy to handle.

根據本發明,可提供得對介電質層賦予優異之抗結塊性的介電質層用黏結劑組成物。According to the present invention, an adhesive composition for a dielectric layer which can impart excellent anti-blocking properties to the dielectric layer can be provided.

並且,根據本發明,可提供得對介電質層賦予優異之抗結塊性的介電質層用漿料組成物。Furthermore, according to the present invention, a slurry composition for a dielectric layer which imparts excellent anti-caking properties to the dielectric layer can be provided.

並且,根據本發明,可提供將由上述介電質層用漿料組成物而成之塗布膜乾燥而成的介電質層。Furthermore, according to the present invention, a dielectric layer formed by drying a coating film formed of the above-mentioned dielectric layer slurry composition can be provided.

並且,根據本發明,可提供使用上述介電質層而成的電容器。Furthermore, according to the present invention, a capacitor formed using the above-mentioned dielectric layer can be provided.

以下詳細說明本發明的實施型態。The following is a detailed description of the implementation of the present invention.

於此,本發明之介電質層用黏結劑組成物(以下單純有時候稱作「黏結劑組成物」。)可使用於本發明之介電質層用漿料組成物(以下單純有時候稱作「漿料組成物」。)的製備。而且,本發明之漿料組成物可使用於電容器等製造所使用之介電質層的形成。再者,本發明之介電質層係將由本發明之漿料組成物而成之塗布膜乾燥而形成者。並且,本發明之電容器係使用「使用本發明之漿料組成物而形成的介電質層」而成者。Here, the binder composition for dielectric layer of the present invention (hereinafter simply referred to as "binder composition" sometimes) can be used for preparing the slurry composition for dielectric layer of the present invention (hereinafter simply referred to as "slurry composition" sometimes). Moreover, the slurry composition of the present invention can be used for forming a dielectric layer used in the manufacture of capacitors, etc. Furthermore, the dielectric layer of the present invention is formed by drying a coating film formed by the slurry composition of the present invention. Furthermore, the capacitor of the present invention is formed by using "the dielectric layer formed by using the slurry composition of the present invention".

(介電質層用黏結劑組成物)(Adhesive composition for dielectric layer)

本發明之介電質層用黏結劑組成物包含聚合物與溶媒,亦可任意包含聚合物及溶媒以外的成分(以下有時候稱作「其他成分」。)。然後,在本發明之黏結劑組成物中,聚合物含有共軛二烯單體單元且玻璃轉移溫度為−45℃以上。若使用此種黏結劑組成物,則可對介電質層賦予優異的抗結塊性。並且,若使用此種黏結劑組成物,則可對介電質層賦予優異的接合性及轉印性。此等之理由,可推想係因下述之故:聚合物所含有之共軛二烯單體單元對介電質層賦予優異的接合性及轉印性,然後,藉由將聚合物的玻璃轉移溫度做成−45℃以上,而聚合物的過度軟化會受抑制,可實現介電質層之優異的抗結塊性。The adhesive composition for the dielectric layer of the present invention includes a polymer and a solvent, and may also arbitrarily include components other than the polymer and the solvent (hereinafter sometimes referred to as "other components"). Then, in the adhesive composition of the present invention, the polymer contains a covalent diene monomer unit and the glass transition temperature is above -45°C. If such an adhesive composition is used, excellent anti-blocking properties can be imparted to the dielectric layer. In addition, if such an adhesive composition is used, excellent bonding and transfer properties can be imparted to the dielectric layer. The reasons for this are presumably as follows: the covalent diene monomer units contained in the polymer impart excellent bonding and transfer properties to the dielectric layer, and by making the glass transition temperature of the polymer above -45°C, excessive softening of the polymer is suppressed, thereby achieving excellent anti-blocking properties of the dielectric layer.

此外,在本說明書中,黏結劑組成物通常係不包含於後所述之介電質材料者。In addition, in this specification, the binder composition is generally not included in the dielectric material described later.

〈聚合物〉<polymer>

本發明之黏結劑組成物所包含之聚合物係得作為結合材發揮功能的成分,含有共軛二烯單體單元,亦可任意含有芳族乙烯單體單元、含酸基單體單元、含氰基單體單元。並且,聚合物亦可含有共軛二烯單體單元、芳族乙烯單體單元、含酸基單體單元及含氰基單體單元以外的單體單元(以下有時候稱作「其他單體單元」。)。The polymer contained in the adhesive composition of the present invention is a component that can function as a binder, and contains a conjugated diene monomer unit, and may also contain an aromatic vinyl monomer unit, an acid group-containing monomer unit, and a cyano group-containing monomer unit. In addition, the polymer may also contain monomer units other than the conjugated diene monomer unit, the aromatic vinyl monomer unit, the acid group-containing monomer unit, and the cyano group-containing monomer unit (hereinafter sometimes referred to as "other monomer units").

於此,作為含有共軛二烯單體單元的聚合物,可列舉例如:包含苯乙烯―丁二烯共聚物(SBR)等芳族乙烯單體單元及共軛二烯單體單元的共聚物、丁二烯橡膠(BR)、異戊二烯橡膠、丙烯酸橡膠(NBR)(包含含氰基單體單元及共軛二烯單體單元的共聚物)以及此等的氫化物等。Here, examples of polymers containing covalent diene monomer units include copolymers containing aromatic vinyl monomer units such as styrene-butadiene copolymers (SBR) and covalent diene monomer units, butadiene rubber (BR), isoprene rubber, acrylic rubber (NBR) (containing copolymers containing cyano group-containing monomer units and covalent diene monomer units), and hydrogenated products thereof.

《共軛二烯單體單元》《Conjugated diene monomer unit》

共軛二烯單體單元係得藉由共軛二烯單體來形成的單體單元。作為共軛二烯單體,可列舉例如:1,3-丁二烯、2-甲基-1,3-丁二烯(異戊二烯)、2,3-二甲基-1,3-丁二烯、2-氯-1,3-丁二烯、取代直鏈共軛戊二烯類、取代及側鏈共軛己二烯類。此等可單獨使用1種,亦可組合2種以上使用。此等之中,作為共軛二烯單體,以1,3-丁二烯及2-甲基-1,3-丁二烯(異戊二烯)為佳,以1,3-丁二烯為較佳。The conjugated diene monomer unit is a monomer unit formed by a conjugated diene monomer. Examples of the conjugated diene monomer include 1,3-butadiene, 2-methyl-1,3-butadiene (isoprene), 2,3-dimethyl-1,3-butadiene, 2-chloro-1,3-butadiene, substituted straight-chain conjugated pentadienes, and substituted and side-chain conjugated hexadienes. These can be used alone or in combination of two or more. Among these, 1,3-butadiene and 2-methyl-1,3-butadiene (isoprene) are preferred as the conjugated diene monomer, and 1,3-butadiene is more preferred.

共軛二烯單體單元的含有比例,在將聚合物中所包含之全部重複單元(全部單體單元)定為100質量%的情況下,以20質量%以上為佳,以25質量%以上為較佳,且以60質量%以下為佳,以55質量%以下為較佳。The content ratio of the covalent diene monomer unit is preferably 20 mass % or more, more preferably 25 mass % or more, and preferably 60 mass % or less, more preferably 55 mass % or less, when all repeating units (all monomer units) contained in the polymer are taken as 100 mass %.

若共軛二烯單體單元的含有比例為上述下限以上,則可提升介電質層的接合性及轉印性。When the content ratio of the conjugated diene monomer unit is greater than or equal to the above lower limit, the bonding property and transferability of the dielectric layer can be improved.

另一方面,若共軛二烯單體單元的含有比例為上述上限以下,則可提升介電質層的抗結塊性。On the other hand, when the content ratio of the conjugated diene monomer unit is below the above upper limit, the anti-blocking property of the dielectric layer can be improved.

《芳族乙烯單體單元》《Aromatic vinyl monomer unit》

芳族乙烯單體單元係得藉由芳族乙烯單體來形成的單體單元。作為芳族乙烯單體,可列舉例如:苯乙烯、α-甲基苯乙烯、乙烯基甲苯、二乙烯基苯。此等可單獨使用1種,亦可組合2種以上使用。此等之中,作為芳族乙烯基單體以苯乙烯為佳。The aromatic vinyl monomer unit is a monomer unit formed by an aromatic vinyl monomer. Examples of the aromatic vinyl monomer include styrene, α-methylstyrene, vinyltoluene, and divinylbenzene. These may be used alone or in combination of two or more. Among these, styrene is preferred as the aromatic vinyl monomer.

芳族乙烯單體單元的含有比例,在將聚合物中所包含之全部重複單元(全部單體單元)定為100質量%的情況下,以30質量%以上為佳,以40質量%以上為較佳,以45質量%以上為更佳,且以70質量%以下為佳,以65質量%以下為較佳。The content ratio of the aromatic vinyl monomer unit is preferably 30 mass % or more, more preferably 40 mass % or more, more preferably 45 mass % or more, and preferably 70 mass % or less, and more preferably 65 mass % or less, when all repeating units (all monomer units) contained in the polymer are taken as 100 mass %.

若芳族乙烯單體單元的含有比例為上述下限以上,則可提升介電質層的抗結塊性。When the content ratio of the aromatic vinyl monomer unit is greater than the above lower limit, the anti-blocking property of the dielectric layer can be improved.

另一方面,若芳族乙烯單體單元的含有比例為上述上限以下,則可提升介電質層的轉印性。On the other hand, when the content ratio of the aromatic vinyl monomer unit is below the above upper limit, the transferability of the dielectric layer can be improved.

《含酸基單體單元》《Acid-containing monomer unit》

含酸基單體單元係得藉由含酸基單體來形成的單體單元。作為含酸基單體,可列舉例如:含酸基單體、含磺酸基單體。The acid group-containing monomer unit is a monomer unit formed by an acid group-containing monomer. Examples of the acid group-containing monomer include an acid group-containing monomer and a sulfonic acid group-containing monomer.

作為含羧酸基單體單元,可列舉:單羧酸及其衍生物或二羧酸及其酸酐以及此等的衍生物。As the carboxylic acid group-containing monomer unit, there can be mentioned: monocarboxylic acid and its derivatives or dicarboxylic acid and its anhydride and their derivatives.

作為單羧酸,可列舉:丙烯酸、甲基丙烯酸、巴豆酸等。As monocarboxylic acids, there are acrylic acid, methacrylic acid, crotonic acid, and the like.

作為單羧酸衍生物,可列舉:2-乙基丙烯酸、異巴豆酸、α-乙醯氧基丙烯酸、β-反芳氧基丙烯酸、α-氯-β-E-甲氧基丙烯酸等。As the monocarboxylic acid derivatives, there can be mentioned 2-ethylacrylic acid, isocrotonic acid, α-acetoxyacrylic acid, β-transaryloxyacrylic acid, α-chloro-β-E-methoxyacrylic acid and the like.

作為二羧酸,可列舉:順丁烯二酸、反丁烯二酸、伊康酸等。Examples of dicarboxylic acids include maleic acid, fumaric acid, itaconic acid, and the like.

作為二羧酸衍生物,可列舉:甲基順丁烯二酸、二甲基順丁烯二酸、苯基順丁烯二酸、氯順丁烯二酸、二氯順丁烯二酸、氟順丁烯二酸或順丁烯二酸丁酯、順丁烯二酸壬酯、順丁烯二酸癸酯、順丁烯二酸十二酯、順丁烯二酸十八酯、順丁烯二酸氟烷酯等順丁烯二酸一酯。Examples of the dicarboxylic acid derivatives include methylmaleic acid, dimethylmaleic acid, phenylmaleic acid, chloromaleic acid, dichloromaleic acid, fluoromaleic acid, or maleic acid monoesters such as butyl maleate, nonyl maleate, decyl maleate, dodecyl maleate, octadecyl maleate, and fluoroalkyl maleate.

作為二羧酸的酸酐,可列舉:順丁烯二酸酐、丙烯酸酐、甲基順丁烯二酸酐、二甲基順丁烯二酸酐、檸康酸酐。Examples of the anhydride of dicarboxylic acid include maleic anhydride, acrylic anhydride, methyl maleic anhydride, dimethyl maleic anhydride, and conic anhydride.

並且,作為含羧酸基單體,亦可使用藉由水解來生成羧酸基的酸酐。Furthermore, as the carboxylic acid group-containing monomer, an acid anhydride which generates a carboxylic acid group by hydrolysis may be used.

再者,作為含羧酸基單體,亦可使用丁烯三羧酸等乙烯性不飽和多元羧酸或反丁烯二酸一丁酯、順丁烯二酸一(2-羥丙酯)等乙烯性不飽和多元羧酸之部分酯等。Furthermore, as the carboxylic acid group-containing monomer, ethylenically unsaturated polycarboxylic acids such as butenetricarboxylic acid or partial esters of ethylenically unsaturated polycarboxylic acids such as monobutyl fumarate and mono(2-hydroxypropyl)maleate may be used.

作為含磺酸基單體,可列舉例如:乙烯磺酸、甲基乙烯磺酸、(甲基)烯丙磺酸、3-烯丙氧基-2-羥基丙磺酸。Examples of the sulfonic acid group-containing monomer include ethylene sulfonic acid, methylethylene sulfonic acid, (methyl)allyl sulfonic acid, and 3-allyloxy-2-hydroxypropanesulfonic acid.

此外,在本說明書中,所謂「(甲基)烯丙基」,意謂烯丙基及/或甲基烯丙基。In addition, in this specification, the term "(meth)allyl group" means allyl group and/or methallyl group.

作為含酸基單體,以丙烯酸、甲基丙烯酸、伊康酸及乙烯磺酸為佳,以丙烯酸、甲基丙烯酸及伊康酸為較佳。As the acid group-containing monomer, acrylic acid, methacrylic acid, itaconic acid and vinyl sulfonic acid are preferred, and acrylic acid, methacrylic acid and itaconic acid are more preferred.

含酸基單體單元的含有比例,在將聚合物中所包含之全部重複單元(全部單體單元)定為100質量%的情況下,以0.1質量%以上為佳,以0.2質量%以上為較佳,且以10質量%以下為佳,以5質量%以下為較佳。The content ratio of the acid group-containing monomer unit is preferably 0.1 mass % or more, more preferably 0.2 mass % or more, and preferably 10 mass % or less, and more preferably 5 mass % or less, when all repeating units (all monomer units) contained in the polymer are defined as 100 mass %.

若含酸基單體單元的含有比例為上述下限以上,則可提升在黏結劑組成物及漿料組成物中之聚合物的分散穩定性。If the content ratio of the acid group-containing monomer unit is greater than the above lower limit, the dispersion stability of the polymer in the binder composition and the slurry composition can be improved.

另一方面,若含酸基單體單元的含有比例為上述上限以下,則可提升介電質層的抗結塊性。On the other hand, if the content ratio of the acid group-containing monomer unit is below the above upper limit, the anti-blocking property of the dielectric layer can be improved.

《含氰基單體單元》《Cyanide-containing monomers》

含氰基單體單元係得藉由含氰基單體來形成的單體單元。作為含氰基單體,可列舉例如:丙烯腈、甲基丙烯腈。此等可單獨使用1種,亦可以任意比率組合2種以上使用。此等之中,作為含氰基單體,以丙烯腈為佳。The cyano-containing monomer unit is a monomer unit formed by a cyano-containing monomer. Examples of the cyano-containing monomer include acrylonitrile and methacrylonitrile. These monomers may be used alone or in combination of two or more monomers at any ratio. Among these monomers, acrylonitrile is preferred as the cyano-containing monomer.

含氰基單體單元,在將聚合物中所包含之全部重複單元(全部單體單元)定為100質量%的情況下,以5質量%以上為佳,以10質量%以上為較佳,且以25質量%以下為佳,以20質量%以下為較佳。The cyano group-containing monomer unit is preferably 5 mass % or more, more preferably 10 mass % or more, and is preferably 25 mass % or less, and more preferably 20 mass % or less, when all repeating units (all monomer units) contained in the polymer are taken as 100 mass %.

若含氰基單體單元的含有比例為上述下限以上,則可提升介電質層的抗結塊性。If the content ratio of the cyano group-containing monomer unit is greater than the above lower limit, the anti-blocking property of the dielectric layer can be improved.

另一方面,若含氰基單體單元的含有比例為上述上限以下,則可提升介電質層的轉印性。On the other hand, when the content ratio of the cyano group-containing monomer unit is below the above upper limit, the transferability of the dielectric layer can be improved.

《其他單體單元》《Other individual units》

其他單體單元係得藉由其他單體來形成的單體單元。其他單體只要係能夠與於上已述之單體共聚合的單體,即非特別受限者。作為其他單體,可列舉:丙烯醯胺、甲基丙烯醯胺等含醯胺基單體;烯丙基環氧丙基醚、(甲基)丙烯酸烯丙酯、N-羥甲基丙烯醯胺等交聯性單體(能夠交聯的單體);乙烯、丙烯等烯烴類;氯乙烯、二氯亞乙烯等含鹵素原子單體;乙酸乙烯酯、丙酸乙烯酯、丁酸乙烯酯等乙烯酯類;甲基乙烯基醚、乙基乙烯基醚、丁基乙烯基醚等乙烯基醚類;甲基乙烯基酮、乙基乙烯基酮、丁基乙烯基酮、己基乙烯基酮、異丙烯基乙烯基酮等乙烯基酮類;N-乙烯吡咯啶酮、乙烯吡啶、乙烯咪唑等含雜環乙烯化合物;胺乙基乙烯基醚、二甲胺乙基乙烯基醚等含胺基單體;(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸三級丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸-2-乙基己酯等(甲基)丙烯酸辛酯等(甲基)丙烯酸酯單體;等。此等其他單體可單獨使用1種,亦可組合2種以上使用。Other monomer units are monomer units that can be formed by other monomers. Other monomers are not particularly limited as long as they are monomers that can be copolymerized with the monomers mentioned above. Examples of other monomers include: amide-containing monomers such as acrylamide and methacrylamide; crosslinking monomers (monomers capable of crosslinking) such as allyl glycidyl ether, allyl (meth)acrylate, and N-hydroxymethyl acrylamide; olefins such as ethylene and propylene; halogen atom-containing monomers such as vinyl chloride and vinylidene chloride; vinyl esters such as vinyl acetate, vinyl propionate, and vinyl butyrate; vinyl ethers such as methyl vinyl ether, ethyl vinyl ether, and butyl vinyl ether; methyl vinyl ketone, ethyl vinyl ketone, butyl vinyl ketone, hexyl vinyl ketone, isopropenyl vinyl ketone, etc. Vinyl ketones; N-vinylpyrrolidone, vinylpyridine, vinylimidazole and other heterocyclic vinyl compounds; aminoethyl vinyl ether, dimethylaminoethyl vinyl ether and other amine-containing monomers; (meth)acrylate monomers such as methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, n-butyl (meth)acrylate, tertiary butyl (meth)acrylate, pentyl (meth)acrylate, hexyl (meth)acrylate, heptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate and other octyl (meth)acrylates; etc. These other monomers may be used alone or in combination of two or more.

此外,在本說明書中,所謂「(甲基)丙烯酸酯」,意謂丙烯酸酯及/或甲基丙烯酸酯,所謂「(甲基)丙烯酸」,意謂丙烯酸及/或甲基丙烯酸。In the present specification, "(meth)acrylate" means acrylate and/or methacrylate, and "(meth)acrylic acid" means acrylic acid and/or methacrylic acid.

其他單體單元的含有比例,在將聚合物中所包含之全部重複單元(全部單體單元)定為100質量%的情況下,以10質量%以下為佳,以5質量%以下為較佳,以1質量%以下為更佳,以0質量%──即聚合物不含其他單體單元──更為較佳。The content ratio of other monomer units, when all repeating units (all monomer units) contained in the polymer is defined as 100 mass %, is preferably 10 mass % or less, more preferably 5 mass % or less, more preferably 1 mass % or less, and even more preferably 0 mass % (i.e., the polymer contains no other monomer units).

《聚合物的性狀》《Properties of polymers》

在本發明之黏結劑組成物中,聚合物的玻璃轉移溫度必須為−45℃以上。In the adhesive composition of the present invention, the glass transition temperature of the polymer must be above -45°C.

然後,聚合物的玻璃轉移溫度,以−30℃以上為佳,以−25℃以上為較佳,且以20℃以下為佳,以15℃以下為較佳。Then, the glass transition temperature of the polymer is preferably not less than −30°C, more preferably not less than −25°C, and preferably not more than 20°C, more preferably not more than 15°C.

若聚合物的玻璃轉移溫度為−30℃以上,則可提升介電質層的抗結塊性。If the glass transition temperature of the polymer is above −30°C, the anti-blocking property of the dielectric layer can be improved.

另一方面,若聚合物的玻璃轉移溫度為20℃以下,則可提升介電質層的轉印性。On the other hand, if the glass transition temperature of the polymer is 20° C. or lower, the transferability of the dielectric layer can be improved.

聚合物的THF不溶成分率以70質量%以上為佳,以75質量%以上為較佳,且以100質量%以下為佳,以98質量%以下為較佳。The THF-insoluble content of the polymer is preferably 70 mass % or more, more preferably 75 mass % or more, and is preferably 100 mass % or less, more preferably 98 mass % or less.

若聚合物的THF不溶成分率為上述下限以上,則可提升介電質層的抗結塊性。When the THF insoluble content of the polymer is greater than or equal to the above lower limit, the anti-blocking property of the dielectric layer can be improved.

另一方面,若聚合物的THF不溶成分率為上述上限以下,則可提升介電質層的接合性及轉印性。On the other hand, when the THF-insoluble content of the polymer is equal to or less than the upper limit, the bonding property and transferability of the dielectric layer can be improved.

本發明之黏結劑組成物所包含之聚合物以粒子狀聚合物為佳。若聚合物為粒子狀聚合物,則在形成介電質層時,可將聚合物均勻分散於介電質層中,故可提升介電質層的性能。The polymer contained in the binder composition of the present invention is preferably a particle-shaped polymer. If the polymer is a particle-shaped polymer, when forming a dielectric layer, the polymer can be uniformly dispersed in the dielectric layer, thereby improving the performance of the dielectric layer.

在黏結劑組成物中,在聚合物為粒子狀聚合物的情況下,粒子狀聚合物的平均粒徑以0.01 μm以上為佳,以0.02 μm以上為較佳,且以1.0 μm以下為佳,以0.8 μm以下為較佳,以0.5 μm以下為更佳。In the binder composition, when the polymer is a particulate polymer, the average particle size of the particulate polymer is preferably 0.01 μm or more, more preferably 0.02 μm or more, and preferably 1.0 μm or less, more preferably 0.8 μm or less, and even more preferably 0.5 μm or less.

若粒子狀聚合物的平均粒徑為上述下限以上,則可提升介電質層的接合性及轉印性。When the average particle size of the particulate polymer is equal to or larger than the above lower limit, the bonding property and transferability of the dielectric layer can be improved.

另一方面,若粒子狀聚合物的平均粒徑為上述上限以下,則可提升介電質層的抗結塊性。On the other hand, when the average particle size of the particulate polymer is equal to or smaller than the upper limit, the anti-blocking property of the dielectric layer can be improved.

《聚合物的聚合方法》《Polymerization method of polymer》

聚合物的聚合方法,並無特別限定,舉例而言,亦可使用溶液聚合法、懸浮聚合法、塊狀聚合法、乳化聚合法等任一方法。並且,作為聚合反應,可使用離子聚合、自由基聚合、活性自由基聚合等加成聚合。然後,得使用於聚合的聚合溶媒或乳化劑、分散劑、聚合起始劑、鏈轉移劑等添加劑,可使用一般者,其使用量亦可定為一般所使用的量。The polymerization method of the polymer is not particularly limited. For example, any method such as solution polymerization, suspension polymerization, bulk polymerization, emulsion polymerization, etc. can be used. In addition, as the polymerization reaction, addition polymerization such as ion polymerization, free radical polymerization, and living free radical polymerization can be used. Then, the polymerization solvent or emulsifier, dispersant, polymerization initiator, chain transfer agent and other additives used in the polymerization can be generally used, and the amount used can also be set to the amount generally used.

〈溶媒〉〈Solvent〉

作為本發明之黏結劑組成物所包含之溶媒,並不特別限定,可使用水及有機溶媒之任一者。作為有機溶媒,可使用例如:甲醇、乙醇、異丙醇等低級醇類等水性溶媒、甲基苯(甲苯)、二甲苯等非水性溶媒。The solvent included in the adhesive composition of the present invention is not particularly limited, and any of water and organic solvents can be used. As the organic solvent, aqueous solvents such as lower alcohols such as methanol, ethanol, and isopropanol, and non-aqueous solvents such as methylbenzene (toluene) and xylene can be used.

就可提升介電質層的抗結塊性及轉印性而言,溶媒以水或水性溶媒為佳。然後,就環境負荷減低、安全性及取得容易性之觀點而言,溶媒以水為尤佳。In terms of improving the anti-blocking property and transferability of the dielectric layer, water or an aqueous solvent is preferred as the solvent. In terms of reducing environmental load, safety, and easy availability, water is particularly preferred as the solvent.

〈其他成分〉〈Other ingredients〉

本發明之黏結劑組成物亦可包含其他成分。作為其他成分,可列舉例如:將聚合物聚合時所使用之上述添加劑或黏度調整劑等。此外,作為黏度調整劑,可使用聚乙烯丁醛等。The adhesive composition of the present invention may also contain other components. As other components, for example, the above-mentioned additives or viscosity modifiers used when polymerizing the polymer can be listed. In addition, polyvinyl butyral can be used as a viscosity modifier.

〈介電質層用黏結劑組成物的固體成分濃度〉〈Concentration of solid content in the binder composition for dielectric layer〉

黏結劑組成物的固體成分濃度以20質量%以上為佳,以30質量%以上為較佳,且以60質量%以下為佳,以50質量%以下為較佳。The solid content concentration of the binder composition is preferably 20 mass % or more, more preferably 30 mass % or more, and preferably 60 mass % or less, more preferably 50 mass % or less.

〈介電質層用黏結劑組成物的製備方法〉〈Method for preparing adhesive composition for dielectric layer〉

本發明之黏結劑組成物可藉由將於上已述之聚合物、溶媒及任意其他成分以已知的方法混合來製備。具體而言,可藉由使用球磨機、砂磨機、珠磨機、顔料分散機、擂潰機、超音波分散機、均質機、行星式攪拌機、薄膜旋迴攪拌機(FILMIX)、自轉公轉攪拌機等混合機將上述各成分混合,來製備黏結劑組成物。The binder composition of the present invention can be prepared by mixing the polymer, solvent and any other components mentioned above in a known manner. Specifically, the binder composition can be prepared by mixing the above components using a mixer such as a ball mill, a sand mill, a bead mill, a pigment disperser, a mortar, an ultrasonic disperser, a homogenizer, a planetary mixer, a film rotary mixer (FILMIX), a rotational-revolutionary mixer, or the like.

(介電質層用漿料組成物)(Slurry composition for dielectric layer)

本發明之介電質層用漿料組成物包含於上已述之本發明之黏結劑組成物與介電質材料。亦即,本發明之漿料組成物包含聚合物、溶媒與介電質材料。於此,漿料組成物所包含之溶媒可為全部源自黏結劑組成物者,亦可為與源自黏結劑組成物之溶媒不同而新加入至漿料組成物者。本發明之漿料組成物亦可包含聚合物、溶媒及介電質材料以外的成分(以下有時候稱作「其他成分」。)。The slurry composition for the dielectric layer of the present invention includes the binder composition and the dielectric material of the present invention described above. That is, the slurry composition of the present invention includes a polymer, a solvent and a dielectric material. Here, the solvent included in the slurry composition may be entirely derived from the binder composition, or may be different from the solvent derived from the binder composition and newly added to the slurry composition. The slurry composition of the present invention may also include components other than the polymer, the solvent and the dielectric material (hereinafter sometimes referred to as "other components").

而且,本發明之漿料組成物由於包含本發明之黏結劑組成物,故可對介電質層賦予優異的抗結塊性。並且,本發明之漿料組成物由於包含本發明之黏結劑組成物,故可對介電質層賦予優異的接合性及轉印性。Furthermore, the slurry composition of the present invention can provide excellent anti-caking properties to the dielectric layer because it contains the binder composition of the present invention. Furthermore, the slurry composition of the present invention can provide excellent bonding and transfer properties to the dielectric layer because it contains the binder composition of the present invention.

〈介電質材料〉〈Dielectric Materials〉

作為介電質材料,只要係具有介電性的材料即並非特別受限者,但以使用陶瓷材料為佳。作為陶瓷材料,可列舉例如:氧化鋯、矽酸鋁、氧化鈦、氧化鋅、鈦酸鋇、鋯酸鈣、鈦酸鈣、鈦酸鍶、氧化鎂、賽隆陶瓷、尖晶岩、碳化矽、氮化矽、氮化鋁等。此等陶瓷材料可單獨使用,亦可併用2種以上。The dielectric material is not particularly limited as long as it has dielectric properties, but ceramic materials are preferably used. Examples of the ceramic material include zirconium oxide, aluminum silicate, titanium oxide, zinc oxide, barium titanate, calcium zirconate, calcium titanate, strontium titanate, magnesium oxide, sialon ceramics, spinel, silicon carbide, silicon nitride, aluminum nitride, etc. These ceramic materials may be used alone or in combination of two or more.

於此,作為陶瓷材料,良佳為以由通式ABO 3所表示之鈣鈦礦結構為主相的陶瓷材料。作為該陶瓷材料,可列舉例如:鈦酸鋇(BaTiO 3)、鋯酸鈣(CaZrO 3)、鈦酸鈣(CaTiO 3)、鈦酸鍶(SrTiO 3)、形成鈣鈦礦結構之Ba 1−x−yCa xSr yTi 1−zZr zO 3(0≦x≦1,0≦y≦1,0≦z≦1)等。此等之中,作為以鈣鈦礦結構為主相的陶瓷材料,以鈦酸鋇為佳。 Here, as the ceramic material, a ceramic material having a calcite structure represented by the general formula ABO 3 as the main phase is preferably used. Examples of the ceramic material include barium titanate (BaTiO 3 ), calcium zirconate (CaZrO 3 ), calcium titanate (CaTiO 3 ), strontium titanate (SrTiO 3 ), and Ba 1−x−y Ca x Sry Ti 1−z Zr z O 3 (0≦x≦1, 0≦y≦1, 0≦z≦1) forming a calcite structure. Among these, barium titanate is preferably used as the ceramic material having a calcite structure as the main phase.

介電質材料的平均粒徑以0.01 μm以上為佳,以0.02 μm以上為較佳,以0.05 μm以上為更佳,以0.08 μm以上更為較佳,且以1 μm以下為佳,以0.8 μm以下為較佳,以0.5 μm以下為更佳,以0.3 μm以下更為較佳,以0.2 μm以下更進一步為佳。The average particle size of the dielectric material is preferably 0.01 μm or more, more preferably 0.02 μm or more, more preferably 0.05 μm or more, more preferably 0.08 μm or more, and preferably 1 μm or less, preferably 0.8 μm or less, more preferably 0.5 μm or less, more preferably 0.3 μm or less, and even more preferably 0.2 μm or less.

若介電質材料的平均粒徑為上述範圍內,則可提升在漿料組成物中之介電質材料的分散性及分散穩定性。然後,其結果,可製作介電質材料均勻分散的介電質層。If the average particle size of the dielectric material is within the above range, the dispersibility and dispersion stability of the dielectric material in the slurry composition can be improved. As a result, a dielectric layer in which the dielectric material is uniformly dispersed can be produced.

在本說明書中,介電質材料的平均粒徑,意謂在透過雷射繞射法量測而獲得之粒徑分布(體積基準)中,自小直徑側計算之累積體積成為50%的粒徑。In this specification, the average particle size of the dielectric material means the particle size at which the cumulative volume calculated from the small diameter side accounts for 50% of the particle size distribution (volume basis) measured by laser diffraction.

在漿料組成物中之介電質材料的含有比例,在將漿料組成物中的全部成分(亦包含溶媒)定為100質量%的情況下,以40質量%以上為佳,以50質量%以上為較佳,且以80質量%以下為佳,以70質量%以下為較佳。The content ratio of the dielectric material in the slurry composition is preferably 40 mass % or more, more preferably 50 mass % or more, and preferably 80 mass % or less, and more preferably 70 mass % or less, when all components in the slurry composition (including the solvent) are taken as 100 mass %.

〈溶媒〉〈Solvent〉

本發明之漿料組成物所包含之溶媒,可舉出與在上述之「介電質層用黏結劑組成物」的「溶媒」之項目說明的溶媒相同者。The solvent contained in the slurry composition of the present invention may be the same as the solvent described in the item "Solvent" of the "Binder composition for dielectric layer" mentioned above.

〈其他成分〉〈Other ingredients〉

作為得包含於本發明之漿料組成物的其他成分,可舉出與在上述之「介電質層用黏結劑組成物」的「其他成分」之項目說明者相同者。As other components that may be included in the slurry composition of the present invention, the same ones as those described in the item of "other components" of the above-mentioned "binder composition for dielectric layer" can be cited.

於此,在使用黏度調整劑作為其他成分的情況下,在漿料組成物中之黏度調整劑的含量(固體成分),在將漿料組成物中之介電質材料定為100質量份的情況下,以1質量份以上為佳,以3質量份以上為較佳,且以20質量份以下為佳,以15質量份以下為較佳,以10質量份以下為更佳。Here, when a viscosity adjuster is used as another component, the content (solid content) of the viscosity adjuster in the slurry composition is preferably 1 part by mass or more, more preferably 3 parts by mass or more, and preferably 20 parts by mass or less, more preferably 15 parts by mass or less, and even more preferably 10 parts by mass or less, based on 100 parts by mass of the dielectric material in the slurry composition.

〈介電質層用漿料組成物的固體成分濃度〉〈Solid content concentration of dielectric layer slurry composition〉

漿料組成物的固體成分濃度以20質量%以上為佳,以25質量%以上為較佳,且以90質量%以下為佳,以80質量%以下為較佳。The solid content concentration of the slurry composition is preferably 20 mass % or more, more preferably 25 mass % or more, and preferably 90 mass % or less, more preferably 80 mass % or less.

〈聚合物的含量〉〈Polymer content〉

在漿料組成物中之聚合物的含量(固體成分),在將漿料組成物中之介電質材料定為100質量份的情況下,以1質量份以上為佳,以2質量份以上為較佳,且以20質量份以下為佳,以10質量份以下為較佳,以7質量份以下為更佳。The content (solid content) of the polymer in the slurry composition is preferably 1 part by mass or more, more preferably 2 parts by mass or more, and preferably 20 parts by mass or less, more preferably 10 parts by mass or less, and even more preferably 7 parts by mass or less, based on 100 parts by mass of the dielectric material in the slurry composition.

〈介電質層用漿料組成物的製備方法〉〈Method for preparing slurry composition for dielectric layer〉

於上已述之漿料組成物,可藉由將上述各成分透過已知的混合方法混合來製備。作為使用於製備的混合機,可舉出上述之「介電質層用黏結劑組成物的製備方法」所列舉者。The slurry composition described above can be prepared by mixing the above-mentioned components by a known mixing method. As a mixer used for the preparation, the mixer listed in the above-mentioned "Preparation method of the binder composition for dielectric layer" can be cited.

(介電質層)(Dielectric layer)

本發明之介電質層係將由於上已述之本發明之漿料組成物而成的塗布膜乾燥而成者。本發明之介電質層通常係自由本發明之漿料組成物而成之塗布膜將溶媒部分或完全去除而獲得的乾燥膜。亦即,本發明之介電質層包含於上已述之聚合物與介電質材料,任意包含溶媒、其他成分。The dielectric layer of the present invention is formed by drying a coating film made of the slurry composition of the present invention. The dielectric layer of the present invention is usually a dried film obtained by partially or completely removing the solvent from the coating film made of the slurry composition of the present invention. That is, the dielectric layer of the present invention includes the polymer and dielectric material mentioned above, and optionally includes a solvent and other components.

於此,由於本發明之介電質層係將由本發明之漿料組成物而成之塗布膜乾燥而成者,故抗結塊性、接合性及轉印性優異。而且,因本發明之介電質層的抗結塊性、接合性及轉印性優異,故操作容易,其結果,可有效率生產電容器。Here, since the dielectric layer of the present invention is formed by drying a coating film formed by the slurry composition of the present invention, it has excellent anti-caking properties, bonding properties and transfer properties. In addition, since the dielectric layer of the present invention has excellent anti-caking properties, bonding properties and transfer properties, it is easy to operate, and as a result, capacitors can be efficiently produced.

在介電質層中之介電質材料的含有比例,在將介電質層中之全部成分定為100質量%的情況下,以70質量%以上為佳,以80質量%以上為較佳,以85質量%以上為更佳,且以98質量%以下為佳,以95質量%以下為較佳。The content ratio of the dielectric material in the dielectric layer is preferably 70 mass % or more, more preferably 80 mass % or more, more preferably 85 mass % or more, and preferably 98 mass % or less, and more preferably 95 mass % or less, when all components in the dielectric layer are taken as 100 mass %.

在介電質層中之聚合物的含量,在將介電質層中之介電質材料定為100質量份的情況下,以1質量份以上為佳,以2質量份以上為較佳,且以20質量份以下為佳,以10質量份以下為較佳,以7質量份以下為更佳。The content of the polymer in the dielectric layer is preferably 1 part by mass or more, more preferably 2 parts by mass or more, and preferably 20 parts by mass or less, more preferably 10 parts by mass or less, and even more preferably 7 parts by mass or less, based on 100 parts by mass of the dielectric material in the dielectric layer.

介電質層的厚度以0.1 μm以上為佳,以0.5 μm以上為較佳,且以10 μm以下為佳,以5 μm以下為較佳。The thickness of the dielectric layer is preferably 0.1 μm or more, more preferably 0.5 μm or more, and preferably 10 μm or less, more preferably 5 μm or less.

本發明之介電質層亦可於介電質層上形成有導電體層。導電體層之形成可應用網版印刷法、輪轉凹版印刷法、鈐式印刷法、噴墨印刷法及使用以此等形成之圖案的平版印刷法等各種印刷法、用以形成金屬蒸鍍膜的真空蒸鍍法等。The dielectric layer of the present invention may also have a conductive layer formed on the dielectric layer. The conductive layer may be formed by various printing methods such as screen printing, rotogravure printing, plate printing, inkjet printing, and lithography using patterns formed by these methods, and vacuum evaporation for forming a metal evaporation film.

於此,在藉由印刷法形成導電體層的情況下,可使用導電膠。導電膠可藉由以往眾所周知的方法來製備,舉例而言,可將金屬等導電性粉末、分散劑、塑化劑、溶劑等混合至聚乙烯縮醛樹脂來製備。Here, when the conductive layer is formed by printing, a conductive paste can be used. The conductive paste can be prepared by a conventionally known method, for example, by mixing conductive powder of metal or the like, a dispersant, a plasticizer, a solvent, etc., with polyvinyl acetal resin.

〈介電質層的製作方法〉〈Method for manufacturing dielectric layer〉

介電質層可藉由將本發明之漿料組成物塗布於脫模基材上,並使形成之塗布膜乾燥來製作。The dielectric layer can be manufactured by coating the slurry composition of the present invention on a release substrate and drying the formed coating film.

於此,製作介電質層時所使用的脫模基材係由具有可撓性的樹脂而成者。藉由脫模基材由具有可撓性的樹脂而成,可將漿料組成物塗布於脫模基材上,並將乾燥而獲得之介電質層所形成的脫模基材(堆疊薄膜)以捲繞成卷狀的狀態保存,視需求供應。Here, the release substrate used in making the dielectric layer is made of a flexible resin. Since the release substrate is made of a flexible resin, the slurry composition can be applied to the release substrate, and the release substrate (stacked film) formed by the dielectric layer obtained by drying can be stored in a rolled state and supplied according to demand.

作為脫模基材,並不特別限定,可舉出例如:包含聚對酞酸乙二酯、聚萘二甲酸乙二酯等聚酯、聚乙烯、聚丙烯、聚苯乙烯、聚醯亞胺、聚乙烯醇、聚氯乙烯等樹脂的基材。The release substrate is not particularly limited, and examples thereof include substrates made of polyesters such as polyethylene terephthalate and polyethylene naphthalate, polyethylene, polypropylene, polystyrene, polyimide, polyvinyl alcohol, polyvinyl chloride, and the like.

脫模基材以於形成有本發明之介電質層之側的面施有用以提升脫模性的表面處理為佳。作為表面處理,並不特別限定,可舉出例如:使用矽氧系脫模劑、氟系脫模劑、蠟系脫模劑等脫模劑的表面處理。The release substrate is preferably subjected to a surface treatment for improving release properties on the side on which the dielectric layer of the present invention is formed. The surface treatment is not particularly limited, and examples thereof include surface treatment using a silicone release agent, a fluorine release agent, a wax release agent, and the like.

脫模基材的厚度並非特別受限者,但通常為20 μm以上且100 μm以下。The thickness of the release substrate is not particularly limited, but is usually 20 μm or more and 100 μm or less.

作為將漿料組成物往脫模基材上塗布的方法,並不特別限定,可舉出例如:使用以塗布機或輪轉凹版塗布機及逗式刮刀塗布機(註冊商標)為代表之各種輥塗布機等之眾所周知的塗布方法。The method for coating the slurry composition on the release substrate is not particularly limited, and examples thereof include a well-known coating method using various roll coaters represented by a coater or a rotogravure coater and a doctor blade coater (registered trademark).

作為形成於脫模基材上之塗布膜的乾燥方法,並不特別限定,可舉出例如:使用熱風乾燥機之眾所周知的乾燥方法。此外,乾燥條件可因應塗布膜中之溶媒的含量、塗布膜的厚度等而適當設定,但乾燥溫度通常為80℃以上且150℃以下,乾燥時間通常為3分鐘以上且60分鐘以下。The drying method of the coating film formed on the release substrate is not particularly limited, and for example, a well-known drying method using a hot air dryer can be cited. In addition, the drying conditions can be appropriately set according to the content of the solvent in the coating film, the thickness of the coating film, etc., but the drying temperature is usually 80°C or more and 150°C or less, and the drying time is usually 3 minutes or more and 60 minutes or less.

此外,在將本發明之介電質層使用於電容器之製造時,得疊合多個介電質層,之後實施加熱壓接,但介電質層自於上已述之脫模基材之剝離,可於介電質層之疊合及加熱壓接之前實施,亦可於介電質層之疊合及加熱壓接之後實施。Furthermore, when the dielectric layer of the present invention is used in the manufacture of capacitors, multiple dielectric layers may be stacked and then heat-pressed. However, the peeling of the dielectric layer from the release substrate described above may be performed before the stacking and heat-pressing of the dielectric layers, or after the stacking and heat-pressing of the dielectric layers.

(電容器)(Capacitor)

本發明之電容器係使用於上已述之本發明之介電質層而成者。由於本發明之電容器使用操作容易的介電質層,故生產性優異。The capacitor of the present invention is made by using the dielectric layer of the present invention described above. Since the capacitor of the present invention uses the dielectric layer which is easy to handle, the productivity is excellent.

於此,作為本發明之電容器,可列舉:藉由將疊合有介電質層的堆疊體燒結而獲得者(燒結物)及未將疊合有介電質層的堆疊體燒結而獲得者(未燒結物)等。Here, as the capacitor of the present invention, there can be exemplified a capacitor obtained by sintering a stacked body having dielectric layers stacked thereon (sintered product) and a capacitor obtained by not sintering a stacked body having dielectric layers stacked thereon (unsintered product).

作為將上述堆疊體燒結而成的電容器,可舉出例如:堆疊陶瓷電容器等。As a capacitor formed by sintering the above-mentioned stacked body, for example, a stacked ceramic capacitor can be cited.

作為未將上述堆疊體燒結而獲得的電容器,可舉出例如:堆疊型金屬化薄膜電容器等。Examples of capacitors obtained without sintering the stack include stacked metallized thin film capacitors.

此外,以下針對電容器為堆疊陶瓷電容器的情形作為一例來說明,但本發明並非受限於下述一例者。In addition, the following description takes the case where the capacitor is a stacked ceramic capacitor as an example, but the present invention is not limited to the following example.

作為本發明之電容器的堆疊陶瓷電容器通常具備層狀的介電質、層狀的內部電極及外部電極,而且,該介電質係將疊合之本發明之介電質層燒結而成者。以下參照圖1說明作為本發明之電容器的堆疊陶瓷電容器之一例。The stacked ceramic capacitor as the capacitor of the present invention generally has a layered dielectric, a layered internal electrode and an external electrode, and the dielectric is formed by sintering the stacked dielectric layers of the present invention. An example of the stacked ceramic capacitor as the capacitor of the present invention is described below with reference to FIG. 1.

圖1係繪示作為本發明之電容器的堆疊陶瓷電容器之一例的概略剖面圖。圖1所繪示之堆疊陶瓷電容器10具備交替堆疊之層狀的介電質11與層狀的內部電極12,於介電質11及內部電極12之外側具備一對外部電極13。而且,沿堆疊方向包夾介電質11而相鄰的一對內部電極12之其中一者在堆疊陶瓷電容器10之內部中電性連接至一對外部電極13之其中一者,沿堆疊方向包夾介電質11而相鄰的一對內部電極12之其中另一者在堆疊陶瓷電容器10之內部中電性連接至一對外部電極13之其中另一者。藉此,一對外部電極13之間呈多個電容器元件電性上並聯連接的結構。此外,得於疊合本發明之介電質層時形成之介電質層彼此的分界面,因燒結而介電質層彼此一體化而消滅,故未繪示於圖1。Fig. 1 is a schematic cross-sectional view showing an example of a stacked ceramic capacitor as a capacitor of the present invention. The stacked ceramic capacitor 10 shown in Fig. 1 has alternately stacked layered dielectrics 11 and layered internal electrodes 12, and has a pair of external electrodes 13 outside the dielectrics 11 and the internal electrodes 12. Furthermore, one of the pair of inner electrodes 12 adjacent to each other along the stacking direction sandwiching the dielectric 11 is electrically connected to one of the pair of outer electrodes 13 in the interior of the stacked ceramic capacitor 10, and the other of the pair of inner electrodes 12 adjacent to each other along the stacking direction sandwiching the dielectric 11 is electrically connected to the other of the pair of outer electrodes 13 in the interior of the stacked ceramic capacitor 10. Thus, a structure in which a plurality of capacitor elements are electrically connected in parallel is formed between the pair of outer electrodes 13. In addition, the interface between the dielectric layers formed when the dielectric layers of the present invention are stacked is not shown in FIG. 1 because the dielectric layers are integrated and eliminated by sintering.

堆疊陶瓷電容器並不特別限定,可藉由以往眾所周知的方法來製造。舉例而言,堆疊陶瓷電容器可藉由下述來製造:將形成有得成為內部電極的導電體層之本發明之介電質層以介電質層與導電體層成為交互的方式疊合多片,將此加熱壓接以製作堆疊體,將此堆疊體中所包含之黏結劑成分等進行熱裂解來去除(脫脂處理),並進一步將此燒結,然後,於燒結而獲得之陶瓷燒結物的端面形成外部電極。The stacked ceramic capacitor is not particularly limited and can be manufactured by a conventionally known method. For example, the stacked ceramic capacitor can be manufactured by stacking a plurality of dielectric layers of the present invention having a conductive layer to be an internal electrode in such a manner that the dielectric layer and the conductive layer are alternately stacked, and the stack is heat-pressed to produce a stack, and the binder components and the like contained in the stack are removed by thermal decomposition (degreasing treatment), and the stack is further sintered, and then the external electrode is formed on the end surface of the ceramic sintered product obtained by sintering.

脫脂處理通常在氮氣環境中,以300℃以上且500℃以下的溫度進行。脫脂處理的時間通常為1小時以上且5小時以下。The degreasing treatment is usually performed in a nitrogen atmosphere at a temperature of 300° C. to 500° C. The degreasing treatment time is usually 1 hour to 5 hours.

此外,脫脂處理後之堆疊體之黏結劑成分的含量通常為50 ppm以下。In addition, the content of binder components in the degreased stack is usually less than 50 ppm.

經脫脂處理之堆疊體的燒結通常在氧分壓10 −9~10 −12MPa之H 2-N 2-H 2O氣體等還原性氣體環境中,以1000℃以上且1500℃以下的溫度進行。堆疊體的燒結時間通常為1小時以上且30小時以下。 The degreased stack is usually sintered in a reducing gas atmosphere such as H 2 -N 2 -H 2 O gas with an oxygen partial pressure of 10 −9 to 10 −12 MPa at a temperature of 1000°C to 1500°C. The sintering time of the stack is usually 1 hour to 30 hours.

外部電極可藉由將外部電極用材料塗布於燒結而獲得之陶瓷燒結物的端面,並將其烘烤來形成。藉此,舉例而言,可獲得圖1所繪示之作為電容器的堆疊陶瓷電容器。The external electrode can be formed by applying the external electrode material to the end surface of the ceramic sintered product obtained by sintering and baking it. In this way, for example, a stacked ceramic capacitor as a capacitor shown in FIG. 1 can be obtained.

作為外部電極用材料,可舉出例如:含有玻璃膠的Cu膠等。烘烤通常在氮氣環境中,以500℃以上且1500℃以下的溫度進行。此外,於外部電極之表面亦可施以Ni或Sn等的鍍覆。Examples of materials for the external electrode include Cu glue containing glass glue, etc. Baking is usually performed in a nitrogen atmosphere at a temperature of 500°C or higher and 1500°C or lower. In addition, the surface of the external electrode may be plated with Ni or Sn, etc.

『實施例』『Implementation example』

以下依據實施例具體說明本發明,但本發明並非受限於此等實施例者。此外,在以下說明中,表示量的「%」及「份」,除非特別註記,否則係質量基準。The present invention is specifically described below based on the embodiments, but the present invention is not limited to these embodiments. In addition, in the following description, "%" and "parts" representing the amount are based on mass unless otherwise noted.

並且,在聚合多種單體而製造的聚合物中,在聚合某單體而形成之單體單元的聚合物中之比例,除非另有註記,否則通常與使用於此聚合物之聚合的全部單體所占之該單體的比率(置入比)一致。Furthermore, in a polymer produced by polymerizing a plurality of monomers, the ratio of a monomer unit formed by polymerizing a certain monomer in the polymer is usually consistent with the ratio (incorporation ratio) of the monomer to all monomers used in the polymerization of the polymer, unless otherwise noted.

再者,在實施例及比較例中,藉由以下程序來量測及評價聚合物的玻璃轉移溫度、聚合物(粒子狀)的平均粒徑、聚合物的THF不溶成分率、抗結塊性、轉印性及接合性。Furthermore, in the Examples and Comparative Examples, the glass transition temperature of the polymer, the average particle size of the polymer (in particle form), the THF insoluble content of the polymer, the anti-caking property, the transferability and the bonding property were measured and evaluated by the following procedures.

〈聚合物的玻璃轉移溫度〉〈Glass transition temperature of polymers〉

使在實施例及比較例製備之聚合物的分散液(溶液)在50%溼度、25℃之環境下乾燥3天,獲得厚度1.0 mm的薄膜。使用真空乾燥機使此薄膜在60℃下乾燥10小時。之後,以經乾燥的薄膜為樣本,遵循JISK7121,在量測溫度−100℃~180℃、升溫速度5℃/分鐘的條件下,使用微差掃描熱量分析計(DSC6220,SII NanoTechnology Inc.製)量測玻璃轉移溫度(℃)。The dispersion (solution) of the polymer prepared in the examples and comparative examples was dried for 3 days at 50% humidity and 25°C to obtain a film with a thickness of 1.0 mm. The film was dried at 60°C for 10 hours using a vacuum dryer. Thereafter, the dried film was used as a sample and the glass transition temperature (°C) was measured using a differential scanning calorimeter (DSC6220, manufactured by SII NanoTechnology Inc.) in accordance with JIS K7121 at a measurement temperature of −100°C to 180°C and a heating rate of 5°C/min.

〈聚合物(粒子狀)的平均粒徑〉〈Average particle size of polymer (particles)〉

聚合物的平均粒徑藉由雷射繞射法如以下來量測。The average particle size of the polymer was measured by laser diffraction as follows.

首先,將在實施例製備之聚合物(粒子狀)的分散液調整至固體成分濃度0.1質量%以準備量測用試樣。然後,在使用雷射繞射式粒徑分布量測裝置(貝克曼庫爾特公司製,製品名「LS-230」)量測之粒徑分布(體積基準)中,將自小直徑側計算之累積體積成為50%的粒徑D50定為平均粒徑。First, the dispersion of the polymer (in particle form) prepared in Example was adjusted to a solid content concentration of 0.1 mass % to prepare a sample for measurement. Then, in the particle size distribution (volume basis) measured using a laser diffraction particle size distribution measuring device (manufactured by Beckman Coulter, product name "LS-230"), the particle size D50 at which the cumulative volume calculated from the small diameter side becomes 50% was determined as the average particle size.

〈聚合物的THF不溶成分率〉〈THF insoluble content of polymer〉

使在實施例及比較例製備之聚合物的分散液(溶液)在50%溼度、23~25℃之環境下乾燥,成膜成厚度約0.3 mm。將經成膜之薄膜裁切成3 mm見方並精秤。將藉由裁切獲得之薄膜片的質量定為w0。The polymer dispersion (solution) prepared in the Examples and Comparative Examples was dried in an environment of 50% humidity and 23-25°C to form a film with a thickness of about 0.3 mm. The film was cut into 3 mm squares and weighed accurately. The mass of the film obtained by cutting was defined as w0.

將上述薄膜片在25℃下浸漬於100 g的四氫呋喃(THF)24小時。之後,將自THF拉起的薄膜片在105℃下真空乾燥3小時,測量不溶成分的質量w1。The film piece was immersed in 100 g of tetrahydrofuran (THF) at 25° C. for 24 hours. Then, the film piece pulled up from THF was vacuum dried at 105° C. for 3 hours, and the mass w1 of the insoluble component was measured.

然後,依循下述式(1)算出THF不溶成分率(質量%)。 THF不溶成分率(質量%)=(w1/w0)×100 (1) Then, the THF insoluble content ratio (mass %) is calculated according to the following formula (1). THF insoluble content ratio (mass %) = (w1/w0) × 100 (1)

〈抗結塊性〉〈Anti-caking properties〉

自在實施例及比較例製造之附有介電質層的脫模基材將介電質層剝下,將剝下之介電質層裁切成幅寬5 cm×長度5 cm的正方形做成試片。準備聚對酞酸乙二酯(PET)薄膜,將PET薄膜與試片(介電質層)疊合,在40℃、10 kg/cm 2之加壓下放置24小時。以目視確認介電質層接合至放置24小時後之PET薄膜的狀態(結塊狀態),以下述基準評價抗結塊性。 A:介電質層不結塊於PET薄膜B:介電質層結塊於PET薄膜,但可剝下C:介電質層結塊於PET薄膜,且無法剝下 The dielectric layer is peeled off from the release substrate with a dielectric layer manufactured in the embodiments and comparative examples, and the peeled dielectric layer is cut into a square with a width of 5 cm and a length of 5 cm to make a test piece. A polyethylene terephthalate (PET) film is prepared, and the PET film and the test piece (dielectric layer) are overlapped and placed at 40°C and a pressure of 10 kg/ cm2 for 24 hours. The state (blocking state) of the dielectric layer bonded to the PET film after being placed for 24 hours is visually confirmed, and the anti-blocking property is evaluated according to the following criteria. A: The dielectric layer does not agglomerate on the PET film B: The dielectric layer agglomerates on the PET film, but can be peeled off C: The dielectric layer agglomerates on the PET film and cannot be peeled off

〈轉印性〉〈Transferability〉

將在實施例及比較例製造之附有介電質層的脫模基材裁切成幅寬5 cm×長度5 cm的正方形做成試片。The release substrate with a dielectric layer produced in the embodiment and the comparative example was cut into a square with a width of 5 cm and a length of 5 cm to prepare a test piece.

準備2個上述試片,以介電質層相向而對的方式彼此疊合,在40℃、5 kg/cm 2之加壓下加壓10秒鐘。 Two of the above test pieces were prepared, stacked with the dielectric layers facing each other, and pressed at 40°C and 5 kg/ cm2 for 10 seconds.

之後,剝下其中一者之試片的脫模基材,以目視確認介電質層的剝離狀態(轉印性),並以下述基準評價轉印性。 A:介電質層彼此維持接合的狀態,且介電質層未殘存於剝下之脫模基材的表面B:介電質層彼此維持接合的狀態,但介電質層部分殘存於剝下之脫模基材的表面C:介電質層彼此未接合,介電質層幾乎都殘存於脫模基材的表面 After that, the release substrate of one of the test pieces was peeled off, and the peeling state (transferability) of the dielectric layer was visually confirmed, and the transferability was evaluated according to the following criteria. A: The dielectric layers were bonded to each other, and the dielectric layer did not remain on the surface of the peeled release substrate.B: The dielectric layers were bonded to each other, but part of the dielectric layer remained on the surface of the peeled release substrate.C: The dielectric layers were not bonded to each other, and almost all of the dielectric layer remained on the surface of the release substrate.

〈接合性〉〈Joinability〉

將在實施例及比較例製造之附有介電質層的脫模基材裁切成幅寬10 mm×長度100 mm的長方形做成試片。將賽珞凡膠帶(JISZ1522所規定者)貼附於試片的介電質層。將賽珞凡膠帶於試驗台的水平面固定成攤平的狀態,將脫模基材之一端相對於賽珞凡膠帶面沿垂直方向以拉伸速度10 mm/分鐘拉伸以剝下,量測此時的應力。進行3次量測,求出其平均值將此定為剝離強度,藉由下述基準評價。剝離強度愈大,表示介電質層與脫模基材的接合性愈優異。 A:剝離強度為50 N/m以上B:剝離強度為10 N/m以上且未達50 N/mC:剝離強度未達10 N/m The release substrate with a dielectric layer manufactured in the embodiment and the comparative example was cut into a rectangle with a width of 10 mm and a length of 100 mm to make a test piece. A cellovan tape (specified in JISZ1522) was attached to the dielectric layer of the test piece. The cellovan tape was fixed on the horizontal surface of the test bench in a flat state, and one end of the release substrate was stretched vertically relative to the cellovan tape surface at a tensile speed of 10 mm/minute to be peeled off, and the stress at this time was measured. The measurement was performed 3 times, and the average value was calculated and determined as the peeling strength, which was evaluated by the following criteria. The greater the peeling strength, the better the bonding between the dielectric layer and the release substrate. A: Peeling strength is 50 N/m or moreB: Peeling strength is 10 N/m or more and less than 50 N/mC: Peeling strength is less than 10 N/m

(實施例1)(Example 1)

〈聚合物的分散液(黏結劑組成物)之製備〉〈Preparation of polymer dispersion (binder composition)〉

於附有攪拌機的5 MPa耐壓容器,加入作為單體組成物的1,3-丁二烯(BD)33份、伊康酸(IA)3.8份及苯乙烯(ST)63.2份、作為乳化劑的十二基苯磺酸鈉0.4份、離子交換水150份以及作為聚合起始劑的過氧二硫酸鉀0.5份,經充分攪拌後,加溫至50℃開始聚合。在聚合轉化率成為96%的時點冷卻並停止反應,獲得包含聚合物的混合物。In a 5 MPa pressure-resistant container equipped with a stirrer, 33 parts of 1,3-butadiene (BD), 3.8 parts of itaconic acid (IA), and 63.2 parts of styrene (ST) as monomer components, 0.4 parts of sodium dodecylbenzenesulfonate as an emulsifier, 150 parts of ion-exchanged water, and 0.5 parts of potassium peroxodisulfate as a polymerization initiator were added, and after sufficient stirring, the mixture was heated to 50°C to start polymerization. When the polymerization conversion rate reached 96%, the reaction was stopped by cooling to obtain a mixture containing a polymer.

於包含上述聚合物的混合物,添加5%氫氧化鈉水溶液,調整至pH 8後,藉由加熱減壓蒸餾來進行未反應單體之去除。之後,冷卻至30℃以下,獲得包含期望之聚合物的分散液(溶媒為水)。此外,分散液的固體成分濃度為40%。A 5% sodium hydroxide aqueous solution was added to the mixture containing the above polymer, and the pH was adjusted to 8, and then the unreacted monomers were removed by heating and reducing pressure distillation. After that, the mixture was cooled to below 30°C to obtain a dispersion containing the desired polymer (the solvent was water). In addition, the solid content concentration of the dispersion was 40%.

使用所獲得之分散液,量測聚合物的玻璃轉移溫度、聚合物(粒子狀)的平均粒徑及聚合物的THF不溶成分率。結果揭示於表1。The obtained dispersion was used to measure the glass transition temperature of the polymer, the average particle size of the polymer (in particle form), and the THF insoluble content of the polymer. The results are shown in Table 1.

〈漿料組成物之製備〉〈Preparation of pulp composition〉

將作為介電質材料之平均粒徑(d50)為0.1 μm的鈦酸鋇(堺化學工業股份有限公司製「BT-01」)100份、作為黏度調整劑之聚乙烯丁醛(積水化學工業公司製,BL-2H)的水溶液12.5份(以固體成分換算計5份)及作為溶媒之水20份與係為混合用珠之粒徑0.1 mm的氧化鋯珠(NIKKATO CORPORATION製)100份一併使用珠磨機(艾美科斯股份有限公司製「RMB-01」),以500 rpm攪拌20小時。之後,進一步加入水20份,以500 rpm攪拌10小時。濾掉氧化鋯珠,製備鈦酸鋇的分散液。100 parts of barium titanium oxide ("BT-01" manufactured by Sakai Chemical Industry Co., Ltd.) with an average particle size (d50) of 0.1 μm as a dielectric material, 12.5 parts of an aqueous solution of polyvinyl butyral ("BL-2H" manufactured by Sekisui Chemical Industry Co., Ltd.) as a viscosity adjuster (5 parts in terms of solid content), 20 parts of water as a solvent, and 100 parts of zirconia beads ("RMB-01" manufactured by NIKKATO CORPORATION) with a particle size of 0.1 mm as mixing beads were stirred at 500 rpm for 20 hours using a bead mill ("RMB-01" manufactured by Amicus Co., Ltd.). After that, 20 parts of water was further added and stirred at 500 rpm for 10 hours. The zirconia beads were filtered out to prepare a dispersion of barium titanium oxide.

於上述鈦酸鋇的分散液152.5份(含有100份鈦酸鋇),加入在上述製備之聚合物的分散液12.5份(含有5份聚合物),將此等使用自轉公轉攪拌機以1000 rpm攪拌3分鐘,製備漿料組成物。12.5 parts of the polymer dispersion prepared above (containing 5 parts of the polymer) were added to 152.5 parts of the barium titanium oxide dispersion (containing 100 parts of barium titanium oxide), and the mixture was stirred at 1000 rpm for 3 minutes using a rotary mixer to prepare a slurry composition.

〈介電質層之製作〉〈Fabrication of Dielectric Layer〉

將在上述獲得之漿料組成物以乾燥後之介電質層的厚度成為約1.0 μm之方式藉由輪轉凹版塗布機塗布於幅寬100 mm×長度100 mm之經脫模處理的薄膜(琳得科公司製,PET38AL-5),在大氣下以100℃使之乾燥5分鐘,於脫模基材上製作介電質層(陶瓷胚片法)。使用所獲得之附有介電質層的脫模基材,評價抗結塊性、轉印性及接合性。結果揭示於表1。The slurry composition obtained above was coated on a film (PET38AL-5 manufactured by Lintec Corporation) with a width of 100 mm and a length of 100 mm by a rotogravure coating machine in such a way that the thickness of the dielectric layer after drying was about 1.0 μm. It was dried at 100°C for 5 minutes in the atmosphere, and a dielectric layer was prepared on the release substrate (ceramic green sheet method). The release substrate with the dielectric layer obtained was used to evaluate the anti-blocking property, transferability and bonding property. The results are shown in Table 1.

(實施例2)(Example 2)

除了在聚合物的分散液之製備中使用包含1,3-丁二烯(BD)50份、伊康酸(IA)3.8份、苯乙烯(ST)31.2份及丙烯腈(AN)15份者作為單體組成物以外,比照實施例1實施各種操作、量測及評價。結果揭示於表1。Except that 50 parts of 1,3-butadiene (BD), 3.8 parts of itaconic acid (IA), 31.2 parts of styrene (ST) and 15 parts of acrylonitrile (AN) were used as the monomer composition in the preparation of the polymer dispersion, various operations, measurements and evaluations were carried out in accordance with Example 1. The results are shown in Table 1.

(實施例3)(Example 3)

除了在聚合物的分散液之製備及漿料組成物之製備中,使用甲苯作為溶媒──具體而言,比照以下方式製備聚合物的分散液及漿料組成物──以外,比照實施例1實施各種操作、量測及評價。結果揭示於表1。Except that toluene was used as a solvent in the preparation of the polymer dispersion and the slurry composition, specifically, the polymer dispersion and the slurry composition were prepared in the following manner, various operations, measurements and evaluations were performed in accordance with Example 1. The results are shown in Table 1.

〈聚合物的分散液(黏結劑組成物)之製備〉〈Preparation of polymer dispersion (binder composition)〉

於附有攪拌機的5 MPa耐壓容器,加入作為單體組成物的1,3-丁二烯(BD)33份、伊康酸(IA)3.8份及苯乙烯(ST)63.2份、作為乳化劑的十二基苯磺酸鈉0.4份、離子交換水150份以及作為聚合起始劑的過氧二硫酸鉀0.5份,經充分攪拌後,加溫至50℃開始聚合。在聚合轉化率成為96%的時點冷卻並停止反應,獲得包含聚合物的混合物。In a 5 MPa pressure-resistant container equipped with a stirrer, 33 parts of 1,3-butadiene (BD), 3.8 parts of itaconic acid (IA), and 63.2 parts of styrene (ST) as monomer components, 0.4 parts of sodium dodecylbenzenesulfonate as an emulsifier, 150 parts of ion-exchanged water, and 0.5 parts of potassium peroxodisulfate as a polymerization initiator were added, and after sufficient stirring, the mixture was heated to 50°C to start polymerization. When the polymerization conversion rate reached 96%, the reaction was stopped by cooling to obtain a mixture containing a polymer.

於包含上述聚合物的混合物添加甲苯,藉由加熱減壓蒸餾來去除未反應單體及離子交換水,進行溶媒取代。之後,冷卻至30℃以下,獲得包含期望之聚合物的分散液(溶媒為甲苯)。此外,分散液的固體成分濃度為40%。Toluene was added to the mixture containing the above polymer, and the unreacted monomers and ion exchange water were removed by heating and reducing pressure distillation to perform solvent replacement. After that, the mixture was cooled to below 30°C to obtain a dispersion containing the desired polymer (the solvent was toluene). In addition, the solid content concentration of the dispersion was 40%.

〈漿料組成物之製備〉〈Preparation of pulp composition〉

將作為介電質材料之平均粒徑(d50)為0.1 μm的鈦酸鋇(堺化學工業有限公司製「BT-01」)100份、作為黏度調整劑之聚乙烯丁醛(積水化學工業公司製,BL-2H)5份及作為溶媒之甲苯20份與係為混合用珠之粒徑0.1 mm的氧化鋯珠(NIKKATO CORPORATION製)100份一併使用珠磨機(艾美科斯股份有限公司製「RMB-01」)以500 rpm攪拌2小時。之後,進一步加入甲苯20份,以500 rpm攪拌1小時。濾掉氧化鋯珠,製備鈦酸鋇的分散液。100 parts of barium titanium oxide ("BT-01" manufactured by Sakai Chemical Industry Co., Ltd.) with an average particle size (d50) of 0.1 μm as a dielectric material, 5 parts of polyvinyl butyral ("BL-2H" manufactured by Sekisui Chemical Industry Co., Ltd.) as a viscosity adjuster, 20 parts of toluene as a solvent, and 100 parts of zirconia beads ("RMB-01" manufactured by NIKKATO CORPORATION) with a particle size of 0.1 mm as mixing beads were stirred at 500 rpm for 2 hours using a bead mill ("RMB-01" manufactured by Amicus Co., Ltd.). Then, 20 parts of toluene were further added and stirred at 500 rpm for 1 hour. The zirconia beads were filtered out to prepare a dispersion of barium titanium oxide.

於上述鈦酸鋇的分散液152.5份(含有100份鈦酸鋇),加入在上述製備之聚合物的分散液12.5份(含有5份聚合物),將此等使用自轉公轉攪拌機以1000 rpm攪拌3分鐘,製備漿料組成物。12.5 parts of the polymer dispersion prepared above (containing 5 parts of the polymer) were added to 152.5 parts of the barium titanium oxide dispersion (containing 100 parts of barium titanium oxide), and the mixture was stirred at 1000 rpm for 3 minutes using a rotary mixer to prepare a slurry composition.

(比較例1)(Comparison Example 1)

除了使用包含由1,3-丁二烯(BD)的均聚物而成之聚合物的溶液(溶媒為甲苯)代替聚合物的分散液以外,比照實施例3實施各種操作、量測及評價。結果揭示於表1。Except that a solution of a polymer composed of a homopolymer of 1,3-butadiene (BD) (the solvent is toluene) was used instead of the polymer dispersion, various operations, measurements and evaluations were performed in the same manner as in Example 3. The results are shown in Table 1.

此外,在比較例1中,由於聚合物溶解於甲苯,故未進行聚合物的平均粒徑之量測。In addition, in Comparative Example 1, since the polymer was dissolved in toluene, the average particle size of the polymer was not measured.

『表1』 實施例 比較例 1 2 3 1 黏結劑組成物 聚合物 組成 [質量%] BD 33 50 33 100 ST 63.2 31.2 63.2 IA 3.8 3.8 3.8 AN 15 玻璃轉移溫度[℃] 10 −5 10 −48 THF不溶成分率[質量%] 92 72 92 80 平均粒徑[µm] 0.12 0.15 0.16 溶媒 種類 甲苯 甲苯 固體成分濃度[質量%] 40 40 40 40 評價結果 抗結塊性 A B B C 轉印性 A A B C 接合性 A A A A "Table 1" Embodiment Comparison Example 1 2 3 1 Binder composition polymer Composition [mass %] BD 33 50 33 100 ST 63.2 31.2 63.2 - I A 3.8 3.8 3.8 - AN - 15 - - Glass transition temperature[℃] 10 −5 10 −48 THF insoluble content [mass %] 92 72 92 80 Average particle size [µm] 0.12 0.15 0.16 - Solvent Type water water Toluene Toluene Solid content concentration [mass %] 40 40 40 40 Evaluation results Anti-caking A B B C Transferability A A B C Gygosity A A A A

由表1可知,若使用實施例之聚合物的分散液(黏結劑組成物),則可對介電質層賦予優異的抗結塊性。As shown in Table 1, if the polymer dispersion (binder composition) of the embodiment is used, excellent anti-blocking properties can be imparted to the dielectric layer.

根據本發明,可提供得對介電質層賦予優異之抗結塊性的介電質層用黏結劑組成物。According to the present invention, an adhesive composition for a dielectric layer which can impart excellent anti-blocking properties to the dielectric layer can be provided.

並且,根據本發明,可提供得對介電質層賦予優異之抗結塊性的介電質層用漿料組成物。Furthermore, according to the present invention, a slurry composition for a dielectric layer which imparts excellent anti-caking properties to the dielectric layer can be provided.

並且,根據本發明,可提供將由上述介電質層用漿料組成物而成之塗布膜乾燥而成的介電質層。Furthermore, according to the present invention, a dielectric layer formed by drying a coating film formed of the above-mentioned dielectric layer slurry composition can be provided.

並且,根據本發明,可提供使用上述介電質層而成的電容器。Furthermore, according to the present invention, a capacitor formed using the above-mentioned dielectric layer can be provided.

10:堆疊陶瓷電容器 11:介電質 12:內部電極 13:外部電極 10: Stacked ceramic capacitor 11: Dielectric 12: Internal electrode 13: External electrode

〈圖1〉係繪示作為本發明之電容器的堆疊陶瓷電容器之一例的概略剖面圖。FIG. 1 is a schematic cross-sectional view showing an example of a stacked ceramic capacitor as the capacitor of the present invention.

無。without.

Claims (10)

一種介電質層用黏結劑組成物,其係包含聚合物與溶媒的介電質層用黏結劑組成物,其中前述聚合物含有共軛二烯單體單元且玻璃轉移溫度為−45℃以上。A dielectric layer binder composition is provided, which comprises a polymer and a solvent, wherein the polymer contains a conjugated diene monomer unit and has a glass transition temperature of above -45°C. 如請求項1所述之介電質層用黏結劑組成物,其中前述玻璃轉移溫度為20℃以下。The adhesive composition for a dielectric layer as claimed in claim 1, wherein the glass transition temperature is below 20°C. 如請求項1所述之介電質層用黏結劑組成物,其中前述聚合物的四氫呋喃不溶成分率為70質量%以上。The binder composition for a dielectric layer as claimed in claim 1, wherein the tetrahydrofuran-insoluble content of the polymer is 70% by mass or more. 如請求項1所述之介電質層用黏結劑組成物,其中前述聚合物為粒子狀聚合物,前述粒子狀聚合物的平均粒徑為0.01 μm以上且1.0 μm以下。The binder composition for a dielectric layer as claimed in claim 1, wherein the polymer is a particulate polymer, and the average particle size of the particulate polymer is greater than or equal to 0.01 μm and less than or equal to 1.0 μm. 如請求項1所述之介電質層用黏結劑組成物,其中前述聚合物更含有芳族乙烯單體單元。The binder composition for a dielectric layer as described in claim 1, wherein the polymer further contains aromatic vinyl monomer units. 如請求項1所述之介電質層用黏結劑組成物,其中前述溶媒係水或水性溶媒。The binder composition for a dielectric layer as described in claim 1, wherein the solvent is water or an aqueous solvent. 如請求項1至6之任一項所述之介電質層用黏結劑組成物,其中前述共軛二烯單體單元的含有比例,在將前述聚合物中所包含之全部單體單元定為100質量%的情況下,為20質量%以上且60質量%以下。The binder composition for a dielectric layer as claimed in any one of claims 1 to 6, wherein the content ratio of the covalent diene monomer units is 20 mass % or more and 60 mass % or less, when all the monomer units contained in the polymer are taken as 100 mass %. 一種介電質層用漿料組成物,其包含請求項1至7之任一項所述之介電質層用黏結劑組成物與介電質材料。A slurry composition for a dielectric layer, comprising the binder composition for a dielectric layer as described in any one of claims 1 to 7 and a dielectric material. 一種介電質層,其係將由請求項8所述之介電質層用漿料組成物而成之塗布膜乾燥而成者。A dielectric layer is formed by drying a coating film made of the dielectric layer slurry composition described in claim 8. 一種電容器,其係使用請求項9所述之介電質層而成者。A capacitor is formed using the dielectric layer described in claim 9.
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