TW202323429A - Liquid composition, laminate, and production methods therefor - Google Patents
Liquid composition, laminate, and production methods therefor Download PDFInfo
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- TW202323429A TW202323429A TW111145446A TW111145446A TW202323429A TW 202323429 A TW202323429 A TW 202323429A TW 111145446 A TW111145446 A TW 111145446A TW 111145446 A TW111145446 A TW 111145446A TW 202323429 A TW202323429 A TW 202323429A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
- B32B15/082—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising vinyl resins; comprising acrylic resins
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
- C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
- C08L27/18—Homopolymers or copolymers or tetrafluoroethene
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Abstract
Description
本發明係關於具有四氟乙烯系聚合物與氧化矽之液狀組成物及其製造方法、以及具有由該液狀組成物形成之聚合物層之積層體及其製造方法。The present invention relates to a liquid composition comprising a tetrafluoroethylene polymer and silicon oxide, a method for producing the same, a laminate having a polymer layer formed from the liquid composition, and a method for producing the same.
近年來,為了對應手機等行動通訊裝置之高速化、高頻化,對於通訊裝置之印刷基板材料正尋求高熱傳導、低線膨脹係數、低介電常數且低介電正切的材料,而低介電常數且低介電正切之四氟乙烯系聚合物正受到矚目。 為了得到包含四氟乙烯系聚合物且物性更為優異之材料而進行了各種檢討,例如,專利文獻1中揭示了一種積層體,該積層體係將包含四氟乙烯系聚合物與特定氧化矽粒子之液狀組成物塗佈於基材而形成。專利文獻2中記載了將包含聚四氟乙烯、陶瓷微粒子及特定氟系添加劑之非水系分散體添加至各種樹脂材料中的內容。 先前技術文獻 專利文獻 In recent years, in order to cope with the high speed and high frequency of mobile communication devices such as mobile phones, materials with high thermal conductivity, low linear expansion coefficient, low dielectric constant and low dielectric tangent are being sought for printed substrate materials for communication devices. Tetrafluoroethylene-based polymers with a low dielectric constant and a low dielectric tangent are attracting attention. Various studies have been conducted to obtain materials containing tetrafluoroethylene-based polymers with more excellent physical properties. For example, Patent Document 1 discloses a laminated body comprising tetrafluoroethylene-based polymers and specific silicon oxide particles. The liquid composition is coated on the substrate to form. Patent Document 2 describes adding a non-aqueous dispersion containing polytetrafluoroethylene, ceramic fine particles, and a specific fluorine-based additive to various resin materials. prior art literature patent documents
專利文獻1:日本專利特開2019-183005號公報 專利文獻2:日本專利特開2016-194017號公報 Patent Document 1: Japanese Patent Laid-Open No. 2019-183005 Patent Document 2: Japanese Patent Laid-Open No. 2016-194017
發明欲解決之課題 四氟乙烯系聚合物之表面張力低,且與無機粒子等其他成分之親和性低。因此,就由包含四氟乙烯系聚合物與無機粒子之組成物而形成之成形物而言,會有無機粒子之分散性不充分,且各成分之物性未充分展現的情況。 在專利文獻1中記載之液狀組成物方面,從以較少之氧化矽添加量來展現所得成形物之線膨脹抑制效果的觀點來看,氧化矽粒子適合選擇比表面積為6.5m 2/g以上之中孔洞氧化矽粒子、微孔氧化矽粒子、中空氧化矽粒子等。即,從提高氧化矽之添加量而使基於氧化矽之特性更加發揮的觀點來看,尚有改良的餘地。 專利文獻2中記載之非水系分散體,在增加作為無機粒子之陶瓷微粒子的種類、或陶瓷微粒子之添加量,或者進一步摻混其他成分時,有作為組成物之均一性與分散穩定性降低,難以獲得具有充分特性之聚合物層等成形物的問題。 Problems to be Solved by the Invention Tetrafluoroethylene-based polymers have low surface tension and low affinity with other components such as inorganic particles. Therefore, in a molded article formed of a composition including a tetrafluoroethylene-based polymer and inorganic particles, the dispersibility of the inorganic particles may not be sufficient, and the physical properties of each component may not be sufficiently exhibited. In terms of the liquid composition described in Patent Document 1, from the viewpoint of exhibiting the effect of suppressing the linear expansion of the resulting molded product with a small amount of silicon oxide added, it is appropriate to select silicon oxide particles with a specific surface area of 6.5 m 2 /g Among the above, porous silicon oxide particles, microporous silicon oxide particles, hollow silicon oxide particles, etc. That is, there is still room for improvement from the viewpoint of increasing the added amount of silicon oxide to further exhibit the characteristics based on silicon oxide. In the non-aqueous dispersion described in Patent Document 2, when the type of ceramic fine particles as inorganic particles is increased, or the amount of ceramic fine particles is added, or other components are further mixed, the uniformity and dispersion stability of the composition will decrease. The problem that it is difficult to obtain a molded article such as a polymer layer having sufficient properties.
本發明人等經觀察而得知藉由使用四氟乙烯系聚合物粒子與特定球狀氧化矽,可獲得一種均一性與分散穩定性優異,並且經抑制增黏之液狀組成物。又,可知由所述液狀組成物可形成一厚的聚合物層,其與基材之接著性、熱傳導性、耐熱性、介電正切等電氣特性優異,且具有該聚合物層之積層體係有用於作為印刷配線基板等的材料,而完成本發明。 本發明目的在於提供均一性及分散穩定性優異且為低黏性之液狀組成物、該液狀組成物之製造方法、具有由該組成物所得之聚合物層之積層體之製造方法、以及該積層體。 The inventors of the present invention have observed that by using tetrafluoroethylene polymer particles and specific spherical silica, a liquid composition with excellent uniformity and dispersion stability and suppressed viscosity increase can be obtained. In addition, it can be seen that a thick polymer layer can be formed from the above-mentioned liquid composition, which has excellent electrical properties such as adhesion to the substrate, thermal conductivity, heat resistance, and dielectric tangent, and a laminate system having the polymer layer It is used as a material for printed wiring boards and the like, and the present invention has been accomplished. The object of the present invention is to provide a low-viscosity liquid composition excellent in uniformity and dispersion stability, a method for producing the liquid composition, a method for producing a laminate having a polymer layer obtained from the composition, and The laminate.
用以解決課題之手段 本發明具有下述態樣。 [1]一種液狀組成物,包含:四氟乙烯系聚合物粒子;球狀氧化矽,其中值粒徑d(μm)大於0.6μm且為20μm以下,並且前述中值粒徑d與比表面積A(m 2/g)之積d×A為2.7~5.0μm・m 2/g;及液狀分散介質。 [2]如[1]之液狀組成物,其中前述四氟乙烯系聚合物為熱熔融性四氟乙烯系聚合物。 [3]如[1]或[2]之液狀組成物,其中前述四氟乙烯系聚合物係具有含氧極性基之四氟乙烯系聚合物,其包含以全氟(烷基乙烯基醚)為主體之單元。 [4]如[1]至[3]中任一項之液狀組成物,其中前述球狀氧化矽之比表面積為0.2~2.0m 2/g。 [5]如[1]至[4]中任一項之液狀組成物,其中前述球狀氧化矽表面之源自鍵結矽烷醇基且位在3300~3700cm -1之最大IR波峰強度為0.2以下。 MEANS TO SOLVE THE PROBLEM This invention has the following aspects. [1] A liquid composition comprising: tetrafluoroethylene-based polymer particles; spherical silica having a median diameter d (μm) greater than 0.6 μm and 20 μm or less, and the median diameter d (μm) and specific surface area The product d×A of A(m 2 /g) is 2.7~5.0μm・m 2 /g; and a liquid dispersion medium. [2] The liquid composition according to [1], wherein the tetrafluoroethylene polymer is a hot-melt tetrafluoroethylene polymer. [3] The liquid composition according to [1] or [2], wherein the aforementioned tetrafluoroethylene-based polymer is a tetrafluoroethylene-based polymer having an oxygen-containing polar group, which contains perfluoro(alkyl vinyl ether ) is the unit of the subject. [4] The liquid composition according to any one of [1] to [3], wherein the spherical silicon oxide has a specific surface area of 0.2 to 2.0 m 2 /g. [5] The liquid composition according to any one of [1] to [4], wherein the maximum IR peak intensity at 3300 to 3700 cm -1 originating from bonded silanol groups on the spherical silicon oxide surface is Below 0.2.
[6]如[1]至[5]中任一項之液狀組成物,其中相對於前述液狀組成物之整體質量,前述球狀氧化矽之含量為10~60質量%,前述四氟乙烯系聚合物粒子之含量為10~40質量%,且前述液狀分散介質之含量為5質量%以上。 [7]如[1]至[6]中任一項之液狀組成物,其中前述球狀氧化矽之含量較前述四氟乙烯系聚合物粒子之含量多。 [8]如[1]至[7]中任一項之液狀組成物,其進一步包含界面活性劑。 [9]如[1]至[8]中任一項之液狀組成物,其進一步包含芳香族聚合物。 [10]如[1]至[9]中任一項之液狀組成物,其進一步包含異於前述球狀氧化矽之無機填料。 [11]如[1]至[10]中任一項之液狀組成物,其黏度為50~1000mPa・s。 [6] The liquid composition according to any one of [1] to [5], wherein the content of the spherical silicon oxide is 10 to 60% by mass relative to the entire mass of the liquid composition, and the tetrafluoroethylene The content of the ethylene-based polymer particles is 10 to 40% by mass, and the content of the aforementioned liquid dispersion medium is 5% by mass or more. [7] The liquid composition according to any one of [1] to [6], wherein the content of the spherical silicon oxide is larger than the content of the tetrafluoroethylene-based polymer particles. [8] The liquid composition according to any one of [1] to [7], further comprising a surfactant. [9] The liquid composition according to any one of [1] to [8], further comprising an aromatic polymer. [10] The liquid composition according to any one of [1] to [9], further comprising an inorganic filler different from the aforementioned spherical silica. [11] The liquid composition according to any one of [1] to [10], which has a viscosity of 50 to 1000 mPa・s.
[12]一種如[1]至[11]中任一項之液狀組成物之製造方法,係混合前述四氟乙烯系聚合物粒子、前述球狀氧化矽及前述液狀分散介質來獲得液狀組成物。 [13]一種液狀組成物之製造方法,係製造如[1]至[11]中任一項之液狀組成物,該方法如下: 將含有前述四氟乙烯系聚合物粒子、前述球狀氧化矽及一部分前述液狀分散介質之組成物捏合而獲得捏合物,再進一步將殘餘之前述液狀分散介質添加至前述捏合物並混合而獲得前述液狀組成物。 [14]一種積層體之製造方法,係將如[1]至[11]中任一項之液狀組成物賦予基材表面,形成由前述液狀組成物所構成之液狀被膜,接著加熱而從前述液狀被膜去除前述液狀分散介質,而在前述基材表面上形成包含前述四氟乙烯系聚合物及前述球狀氧化矽之聚合物層。 [15]一種積層體,具有:基材;及聚合物層,其設於前述基材表面且係由如[1]~[11]中任一項之液狀組成物形成,包含四氟乙烯系聚合物及前述球狀氧化矽。 [12] A method for producing the liquid composition according to any one of [1] to [11], comprising mixing the aforementioned tetrafluoroethylene-based polymer particles, the aforementioned spherical silica, and the aforementioned liquid dispersion medium to obtain a liquid composition. shape composition. [13] A method for producing a liquid composition, which is to manufacture the liquid composition according to any one of [1] to [11], the method is as follows: Kneading a composition containing the aforementioned tetrafluoroethylene-based polymer particles, the aforementioned spherical silica, and a part of the aforementioned liquid dispersion medium to obtain a kneaded product, and further adding the remaining aforementioned liquid dispersion medium to the aforementioned kneaded material and mixing to form The aforementioned liquid composition was obtained. [14] A method for producing a laminate, comprising: applying the liquid composition according to any one of [1] to [11] to the surface of a substrate to form a liquid film composed of the liquid composition, followed by heating Then, the liquid dispersion medium is removed from the liquid film, and a polymer layer comprising the tetrafluoroethylene polymer and the spherical silicon oxide is formed on the surface of the substrate. [15] A laminate comprising: a substrate; and a polymer layer provided on the surface of the substrate and formed of the liquid composition according to any one of [1] to [11], including tetrafluoroethylene It is a polymer and the aforementioned spherical silica.
發明效果 根據本發明,可提供均一性及分散穩定性優異且為低黏性之液狀組成物、該液狀組成物之製造方法、積層體之製造方法、以及該積層體,該積層體具有由該組成物所得之聚合物層,且該聚合物層與基材之接著性、熱傳導性、耐熱性及電氣特性優異。 Invention effect According to the present invention, it is possible to provide a low-viscosity liquid composition having excellent uniformity and dispersion stability, a method for producing the liquid composition, a method for producing a laminate, and the laminate comprising the The polymer layer obtained from the composition has excellent adhesion to the substrate, thermal conductivity, heat resistance and electrical properties.
以下用語具有下列意義。 「聚合物之熔融溫度」係與以示差掃描熱量測定(DSC)法測定之融解波峰之最大值對應的溫度。 「聚合物之玻璃轉移點」係以動態黏彈性測定(DMA)法分析聚合物所測定之值。 「四氟乙烯系聚合物粒子之平均粒徑」係藉由雷射繞射・散射法測定所述粒子之粒徑,所得粒徑之體積基準累積50%粒徑(以下亦表記為「D50」)。即,藉由雷射繞射・散射法測定粒子之粒度分布,令粒子群之總體積為100%求出累積曲線後,於該累積曲線上累積體積成為50%之點的粒徑。 「粒子之比表面積」係藉由氣體吸附(定容法)BET多點法測定之值。 「黏度」係使用B型黏度計,在室溫下(25℃)且旋轉數為30rpm之條件下就分散液進行測定之值。重複測定3次,將3次測定值之平均值作為黏度。 「觸變比」(thixotropic ratio)係指在旋轉數為30rpm之條件下測定液狀組成物求得之黏度η1,除以在旋轉數為60rpm之條件下測定求得之黏度η2所算出之值(η1/η2)。 「以單體為主體之單元」意指藉由單體之聚合而形成之以前述單體1分子為主體之原子團。單元可為藉由聚合反應而直接形成之單元,亦可為藉由處理聚合物而使前述單元之一部分轉變成其他結構之單元。以下以單體a為主體之單元亦僅表記為「單體a單元」。 The following terms have the following meanings. The "melting temperature of a polymer" is a temperature corresponding to the maximum value of a melting peak measured by a differential scanning calorimetry (DSC) method. "Glass transition point of a polymer" is a value determined by analyzing a polymer with a dynamic viscoelasticity measurement (DMA) method. "Average particle size of tetrafluoroethylene-based polymer particles" is the particle size of the particles measured by the laser diffraction and scattering method, and the obtained particle size is the volume-based cumulative 50% particle size (hereinafter also expressed as "D50") ). That is, the particle size distribution of the particles is measured by the laser diffraction and scattering method, and the cumulative curve is calculated with the total volume of the particle group as 100%, and the particle diameter at the point where the cumulative volume becomes 50% on the cumulative curve. The "specific surface area of particles" is a value measured by the gas adsorption (constant volume method) BET multi-point method. "Viscosity" is a value measured for a dispersion liquid at room temperature (25° C.) and at a rotation speed of 30 rpm using a B-type viscometer. The measurement was repeated 3 times, and the average value of the 3 measurements was taken as the viscosity. "Thixotropic ratio" refers to the value calculated by dividing the viscosity η1 obtained by measuring the liquid composition at a rotation speed of 30 rpm by the viscosity η2 obtained by measuring the rotation speed at 60 rpm (η1/η2). The "unit mainly composed of a monomer" means an atomic group mainly composed of one molecule of the aforementioned monomer formed by polymerization of a monomer. The unit may be a unit directly formed by a polymerization reaction, or may be a unit in which a part of the aforementioned unit is converted into another structure by treating a polymer. In the following, the unit whose main component is monomer a is also simply expressed as "monomer a unit".
本發明之液狀組成物(以下亦表記為「本組成物」)包含:四氟乙烯系聚合物(以下亦表記為「F聚合物」)粒子(以下亦表記為「F粒子」);球狀氧化矽(以下亦表記為「本球狀氧化矽」),其中值粒徑d(μm)大於0.6μm且為20μm以下,並且前述中值粒徑d與比表面積A(m 2/g)之積d×A為2.7~5.0μm・m 2/g;及液狀分散介質。 本組成物為均一性及分散穩定性優異且為低黏性。又,由本組成物可獲得一厚的聚合物層,其與基材之接著性、熱傳導性、耐熱性及低介電正切等電氣特性優異。具有所述聚合物層之積層體係有用於作為具備接著性、熱傳導性及電氣特性之印刷配線基板等的材料。 本組成物特性展現之理由尚不明確,惟例如可如以下地推測。 The liquid composition of the present invention (hereinafter also referred to as "this composition") includes: tetrafluoroethylene polymer (hereinafter also referred to as "F polymer") particles (hereinafter also referred to as "F particle"); Shaped silica (hereinafter also referred to as "this spherical silica"), the median particle size d (μm) is greater than 0.6 μm and not more than 20 μm, and the aforementioned median particle size d and specific surface area A (m 2 /g) The product d×A is 2.7~5.0μm・m 2 /g; and a liquid dispersion medium. This composition is excellent in uniformity and dispersion stability and has low viscosity. In addition, a thick polymer layer can be obtained from this composition, which has excellent electrical properties such as adhesion to the substrate, thermal conductivity, heat resistance, and low dielectric tangent. The laminated system having such a polymer layer is useful as a material for a printed wiring board or the like having adhesiveness, thermal conductivity, and electrical properties. The reason why the properties of this composition are exhibited is not clear, but it can be speculated as follows, for example.
F聚合物之表面能低,其粒子彼此容易凝集。又,F聚合物與氧化矽等無機粒子之親和性低,在包含F聚合物與無機粒子之聚合物層中,無機粒子容易形成凝集物。所述傾向在無機粒子之含量多時容易變得顯著。 本組成物中使用之球狀氧化矽(本球狀氧化矽)具前述特定範圍之中值粒徑d,且前述中值粒徑d與比表面積A之積d×A為特定範圍。藉此,吾等判斷不僅本組成物中氧化矽彼此之凝集受到抑制,氧化矽與液狀分散介質之濕潤性亦受到調整,則球狀氧化矽與F聚合物之親和性相對地升高。吾等判斷這是因為促進了F粒子與本球狀氧化矽高度之相互作用,故本組成物之分散穩定性、低黏性等物性優異。 又,吾等亦推測就兩粒子處於高度相互作用狀態之本組成物而言,F粒子與本球狀氧化矽之自凝聚(self coagulation)容易受到促進,換言之,F粒子與球狀氧化矽之偽聚結粒子(pseudo-coalescent particle)之形成容易受到促進。吾等判斷這是因為提高了本組成物之均一性,故本組成物之分散穩定性、低黏性等物性優異。 The surface energy of F polymer is low, and its particles are easy to aggregate with each other. In addition, the affinity between the F polymer and inorganic particles such as silicon oxide is low, and the inorganic particles tend to form aggregates in the polymer layer containing the F polymer and the inorganic particles. This tendency tends to become prominent when the content of inorganic particles is large. The spherical silicon oxide used in this composition (this spherical silicon oxide) has the median particle size d in the aforementioned specific range, and the product d×A of the aforementioned median particle size d and the specific surface area A is in the specific range. From this, we judged that not only the aggregation of silicon oxides in this composition is suppressed, but also the wettability between silicon oxide and liquid dispersion medium is adjusted, and the affinity between spherical silicon oxide and F polymer is relatively increased. We judge that this is because the high degree of interaction between the F particles and the spherical silicon oxide is promoted, so the dispersion stability, low viscosity and other physical properties of the composition are excellent. In addition, we also speculate that for this composition in which the two particles are in a highly interactive state, the self-coagulation (self coagulation) of the F particles and the spherical silica is easily promoted. In other words, the self-coagulation of the F particles and the spherical silica The formation of pseudo-coalescent particles is easily promoted. We judge that this is because the uniformity of this composition is improved, so this composition has excellent physical properties such as dispersion stability and low viscosity.
並且,若為兩粒子高度相互作用且分散穩定性、低黏性等物性優異之本組成物,即便在對成形物加工時、或在加工後之成形物的狀態下,球狀氧化矽仍難以落粉,而在成形物中本球狀氧化矽亦容易高度地分散。結果,吾等判斷由本組成物可容易地形成成形物,該成形物高度地具備原本氧化矽及F聚合物各自具有之物性,且與基材之接著性、熱傳導性、耐熱性及低介電正切等電氣特性優異。Moreover, if the two particles highly interact with each other and have excellent physical properties such as dispersion stability and low viscosity, spherical silicon oxide is difficult to form even when the molded product is processed or in the state of the processed molded product. Falling powder, and the spherical silicon oxide is also highly dispersed in the molded product. As a result, we judged that this composition can easily form a molded product, which highly possesses the original physical properties of silicon oxide and F polymer, as well as adhesion to the substrate, thermal conductivity, heat resistance and low dielectric Excellent electrical properties such as tangent.
本組成物中之F聚合物係包含以四氟乙烯(TFE)為主體之單元(TFE單元)之聚合物。F聚合物可為熱熔融性亦可為非熱熔融性。就本組成物而言,宜使用熱熔融性F聚合物。 另外,熱熔融性聚合物意指荷重49N之條件下,在較聚合物之熔融溫度高20℃以上之溫度下,存在熔融流動速率達到1~1000g/10分鐘之溫度的聚合物。 F聚合物亦可使用2種以上。 The F polymer in this composition is a polymer containing units mainly composed of tetrafluoroethylene (TFE) (TFE unit). The F polymer may be thermally fusible or non-thermally fusible. For this composition, it is preferable to use a hot-melt F polymer. In addition, a hot-melt polymer means a polymer having a melt flow rate of 1 to 1000 g/10 minutes at a temperature 20° C. or higher than the melting temperature of the polymer under a load of 49 N. Two or more types of F polymers may be used.
熱熔融性F聚合物之熔融溫度宜為200℃以上,260℃以上更佳。F聚合物之熔融溫度宜為325℃以下,320℃以下較佳。所述情況下,由本組成物形成之成形物易於耐熱性優異。 F聚合物中之含氟量宜為70質量%以上,72~76質量%較佳。依據本方法,藉由上述作用機制,即便在使用含氟量高且與無機粒子之親和性低之F聚合物的情況下,仍容易獲得本球狀氧化矽之分散性優異之聚合物層。 F聚合物之玻璃轉移點宜為50℃以上,75℃以上較佳。F聚合物之玻璃轉移點宜為150℃以下,125℃以下較佳。 The melting temperature of the hot-melt F polymer is preferably above 200°C, more preferably above 260°C. The melting temperature of F polymer is preferably below 325°C, preferably below 320°C. In such a case, the molded article formed from this composition tends to be excellent in heat resistance. The fluorine content in the F polymer is preferably at least 70% by mass, preferably 72-76% by mass. According to this method, the polymer layer having excellent dispersibility of the spherical silica can be easily obtained even when the F polymer having a high fluorine content and a low affinity with inorganic particles is used due to the above-mentioned mechanism of action. The glass transition point of F polymer is preferably above 50°C, preferably above 75°C. The glass transition point of F polymer is preferably below 150°C, preferably below 125°C.
F聚合物可舉:包含聚四氟乙烯(PTFE)、TFE單元及乙烯單元之聚合物、包含TFE單元與丙烯單元之聚合物、包含TFE單元及以全氟(烷基乙烯基醚)(PAVE)為主體之單元(PAVE單元)之聚合物(PFA)、包含TFE單元及六氟丙烯單元之聚合物(FEP)、包含TFE單元與以氟烷基乙烯為主體之單元之聚合物、包含TFE單元與氯三氟乙烯單元之聚合物。PTFE可為非熱熔融性PTFE,亦可為熱熔融性PTFE。 F聚合物宜為PFA及FEP,PFA較佳。該等聚合物亦可進一步包含以其他共單體為主體之單元。 PAVE宜為CF 2=CFOCF 3、CF 2=CFOCF 2CF 3及CF 2=CFOCF 2CF 2CF 3(以下亦表記為PPVE),PPVE較佳。 F polymers include: polymers containing polytetrafluoroethylene (PTFE), TFE units and ethylene units, polymers containing TFE units and propylene units, polymers containing TFE units and perfluoro(alkyl vinyl ether) (PAVE ) as the main unit (PAVE unit) of the polymer (PFA), including TFE units and hexafluoropropylene units (FEP), including TFE units and fluoroalkylethylene as the main unit of the polymer, including TFE A polymer of units and chlorotrifluoroethylene units. PTFE may be non-thermofusible PTFE or thermofusible PTFE. The F polymer is preferably PFA and FEP, and PFA is more preferred. These polymers may further comprise units based on other comonomers. PAVE is preferably CF 2 =CFOCF 3 , CF 2 =CFOCF 2 CF 3 and CF 2 =CFOCF 2 CF 2 CF 3 (hereinafter also denoted as PPVE), and PPVE is preferred.
F聚合物宜具有含氧極性基。在F聚合物具有含氧極性基時,F粒子與本球狀氧化矽之親和性容易升高,本球狀氧化矽容易在聚合物層中良好地分散。又,吾等判斷加熱本組成物之際F聚合物之交聯容易形成,而容易獲得力學特性優異之聚合物層。尤其,只要使用所述F聚合物,便容易使上述作用機制、特別是使利用自凝聚之效果高度地展現。 含氧極性基可含在F聚合物中以單體為主體之單元上,亦可含在F聚合物主鏈之末端基上。後者之態樣可舉:具有將含氧極性基作為源自聚合引發劑、鏈轉移劑等之末端基的F聚合物、將F聚合物進行電漿處理或游離射線處理而獲得之具有含氧極性基的F聚合物。 The F polymer preferably has an oxygen-containing polar group. When the F polymer has an oxygen-containing polar group, the affinity between the F particles and the spherical silica tends to increase, and the spherical silica tends to be well dispersed in the polymer layer. In addition, we judged that when this composition is heated, crosslinking of the polymer F is easily formed, and a polymer layer having excellent mechanical properties is easily obtained. In particular, if the above F polymer is used, the above-mentioned mechanism of action, especially the effect utilizing self-aggregation can be easily exhibited to a high degree. The oxygen-containing polar group can be contained in the monomer-based unit in the F polymer, or it can be contained in the terminal group of the main chain of the F polymer. Examples of the latter include F polymers having oxygen-containing polar groups as terminal groups derived from polymerization initiators, chain transfer agents, etc., and oxygen-containing polar groups obtained by subjecting F polymers to plasma treatment or free ray treatment. Polar group F polymer.
在F聚合物具有含氧極性基時,F聚合物中含氧極性基的數量,相對於每主鏈之碳數1×10 6個,宜為100~10000個,500~5000個較佳。 含氧極性基宜為含羥基之基、含羰基之基及含異亞磷醯之基,從聚合物層中本球狀氧化矽之分散性的觀點來看,含羥基之基及含羰基之基較佳,含羰基之基更佳。 When the F polymer has oxygen-containing polar groups, the number of oxygen-containing polar groups in the F polymer is preferably 100-10000, more preferably 500-5000, relative to 1×10 6 carbons per main chain. The oxygen-containing polar group is preferably a hydroxyl-containing group, a carbonyl-containing group, and an isophosphorous acid-containing group. From the viewpoint of the dispersion of the spherical silica in the polymer layer, the hydroxyl-containing group and the carbonyl-containing group A group is preferable, and a group containing a carbonyl group is more preferable.
含羥基之基宜為含有醇性羥基之基,-CF 2CH 2OH、-C(CF 3) 2OH及1,2-二醇基(-CH(OH)CH 2OH)較佳。 含羰基之基係包含羰基(>C(O))之基,含羰基之基方面宜為羧基、烷氧羰基、醯胺基、異氰酸酯基、胺甲酸酯基(-OC(O)NH 2)、酸酐殘基(-C(O)OC(O)-)、醯亞胺殘基(-C(O)NHC(O)-等)及碳酸酯基(-OC(O)O-),酸酐殘基較佳。 前述含羰基之基可含在F聚合物中之單體單元上,亦可含在聚合物主鏈之末端基上。後者之態樣可舉具有將前述含羰基之基作為源自聚合引發劑、鏈轉移劑等之末端基的F聚合物。 在F聚合物具有含羰基之基時,F聚合物中含羰基之基的數量,相對於每主鏈之碳數1×10 6個,宜為100~10000個,500~5000個較佳,800~1500個更佳。此時,F聚合物與本球狀氧化矽之親和性容易提升。 另外,F聚合物中含羰基之基的數量可藉由聚合物之組成或國際公開第2020/145133號中記載之方法來定量。 The hydroxyl-containing group is preferably a group containing an alcoholic hydroxyl group, preferably -CF 2 CH 2 OH, -C(CF 3 ) 2 OH and 1,2-diol group (-CH(OH)CH 2 OH). The carbonyl-containing group is a group containing a carbonyl group (>C(O)), and the carbonyl-containing group is preferably a carboxyl group, an alkoxycarbonyl group, an amide group, an isocyanate group, a carbamate group (-OC(O)NH 2 ), anhydride residues (-C(O)OC(O)-), imide residues (-C(O)NHC(O)-, etc.) and carbonate groups (-OC(O)O-), Anhydride residues are preferred. The aforementioned carbonyl-containing group may be contained in the monomer unit in the F polymer, or may be contained in the terminal group of the polymer main chain. The latter aspect includes F polymer having the aforementioned carbonyl group-containing group as a terminal group derived from a polymerization initiator, a chain transfer agent, and the like. When the F polymer has carbonyl-containing groups, the number of carbonyl-containing groups in the F polymer is preferably 100 to 10,000, preferably 500 to 5,000, relative to 1×10 6 carbons per main chain. 800~1500 is better. At this time, the affinity between the F polymer and the spherical silica is easily improved. In addition, the number of carbonyl-containing groups in the F polymer can be quantified by the composition of the polymer or the method described in International Publication No. 2020/145133.
F聚合物宜為包含TFE單元及PAVE單元並具有含氧極性基之聚合物,包含TFE單元及PAVE單元並具有含羰基之基或含羥基之基之聚合物較佳,包含TFE單元、PAVE單元及以具有含羰基之基之單體為主體之單元之聚合物更佳。F聚合物相對於全單元,尤宜為分別包含90~99莫耳%之TFE單元、0.5~9.97莫耳%之PAVE單元、及0.01~3莫耳%之前述以具有含羰基之基之單體為主體之單元。 具有含羰基之基之單體宜為伊康酸酐、檸康酸酐及5-降莰烯-2,3-二羧酸酐(以下亦表記為「NAH」)。 所述聚合物之具體例可舉國際公開第2018/16644號中所記載之聚合物。 該等F聚合物不僅其粒子之分散穩定性優異,在由本組成物所得之成形物(聚合物層等)中,更容易細緻且均質地分布。進而,在成形物中容易形成微小球晶,與以本球狀氧化矽為首之其他成分的密著性容易升高。結果,更容易獲得電氣特性等各種物性優異之成形物。 F The polymer is preferably a polymer comprising TFE units and PAVE units and having oxygen-containing polar groups, preferably a polymer comprising TFE units and PAVE units and having carbonyl-containing groups or hydroxyl-containing groups, including TFE units and PAVE units And a polymer whose main unit is a monomer having a carbonyl group is more preferable. Relative to the total units, the F polymer preferably contains 90-99 mol% of TFE units, 0.5-9.97 mol% of PAVE units, and 0.01-3 mol% of the aforementioned units having carbonyl-containing groups. The body is the unit of the subject. The monomer having a carbonyl-containing group is preferably itaconic anhydride, citraconic anhydride, and 5-norbornene-2,3-dicarboxylic anhydride (hereinafter also referred to as "NAH"). Specific examples of the polymer include those described in International Publication No. 2018/16644. These F polymers are not only excellent in the dispersion stability of their particles, but also more finely and homogeneously distributed in the molded product (polymer layer, etc.) obtained from this composition. Furthermore, fine spherulites are easily formed in the molded product, and the adhesion with other components including the present spherical silicon oxide tends to increase. As a result, it becomes easier to obtain a molded article excellent in various physical properties such as electrical characteristics.
本組成物中F粒子之D50宜為25μm以下,10μm以下較佳,8μm以下更佳。F粒子之D50宜為0.1μm以上,大於0.3μm較佳,1μm以上更佳。此時,粒子之凝集抑制、與F粒子和本球狀氧化矽之相互作用達到高度均衡,本組成物之分散穩定性便容易提升。又,本球狀氧化矽容易高度地分散在聚合物層中。The D50 of the F particles in this composition is preferably 25 μm or less, preferably 10 μm or less, more preferably 8 μm or less. The D50 of F particles is preferably at least 0.1 μm, more preferably at least 0.3 μm, more preferably at least 1 μm. At this time, the aggregation inhibition of the particles and the interaction between the F particles and the spherical silicon oxide are highly balanced, and the dispersion stability of the composition is easily improved. In addition, the present spherical silicon oxide is easily and highly dispersed in the polymer layer.
F粒子之總體密度(bulk density)宜為0.15g/m 2以上。F粒子之總體密度宜為0.50g/m 2以下。 又,F粒子之比表面積宜為25m 2/g以下,8m 2/g以下較佳,5m 2/g以下更佳。F粒子之比表面積宜為1m 2/g以上。此時,粒子之凝集高度地受到抑制,F粒子和本球狀氧化矽之相互作用便容易提升。 The bulk density of F particles is preferably 0.15 g/m 2 or more. The overall density of F particles is preferably 0.50 g/m 2 or less. Also, the specific surface area of the F particles is preferably not more than 25 m 2 /g, preferably not more than 8 m 2 /g, more preferably not more than 5 m 2 /g. The specific surface area of the F particles is preferably not less than 1 m 2 /g. At this time, the aggregation of the particles is highly suppressed, and the interaction between the F particles and the spherical silicon oxide is easily enhanced.
F粒子亦可使用2種以上。在使用2種F粒子時,F粒子宜包含熱熔融性F聚合物粒子與非熱熔融性F聚合物粒子,較佳為包含熔融溫度為200~320℃之F聚合物(適合為上述包含TFE單元及PAVE單元並具有含氧極性基之聚合物)粒子與非熱熔融性PTFE粒子。並且,後者粒子之含量較前者粒子之含量多的態樣更佳。 此時,F聚合物一面保持物性一面適度地纖維化,在由本組成物形成之成形物中F粒子變得容易被載持,成形物之強度則容易進一步提升。 又,前者粒子在前者粒子與後者粒子之合計中所佔的比率宜為50質量%以下,25質量%以下較佳。又,此時的比率宜為0.1質量%以上,1質量%以上較佳。 所述本組成物不僅分散穩定性、均一性及處置性容易優異,亦容易形成基於非熱熔融性PTFE之物性優異的接著性成形物。 又,此時,宜為下述態樣:熔融溫度為200~320℃之F聚合物粒子之D50為0.1~1μm且非熱熔融性PTFE粒子之D50為0.1~1μm的態樣、或熔融溫度為200~320℃之F聚合物粒子之D50為1~4μm且非熱熔融性PTFE粒子之D50為0.1~1μm的態樣。 另外,非熱熔融性聚合物意指荷重49N之條件下,不存在熔融流動速率達到1g以上1000g以下/10分鐘之溫度的聚合物。 Two or more types of F particles may be used. When using two types of F particles, the F particles preferably include heat-melting F polymer particles and non-heat-melting F polymer particles, preferably F polymers with a melting temperature of 200-320°C (suitable for the above-mentioned TFE Units and PAVE units and polymers with oxygen-containing polar groups) particles and non-heat-melting PTFE particles. Furthermore, it is more preferable that the content of the latter particle is larger than the content of the former particle. At this time, the F polymer is appropriately fibrillated while maintaining the physical properties, and the F particles are easily supported in the molded article formed from this composition, and the strength of the molded article is easily further improved. Also, the ratio of the former particles to the total of the former particles and the latter particles is preferably 50% by mass or less, preferably 25% by mass or less. In addition, the ratio at this time is preferably at least 0.1% by mass, preferably at least 1% by mass. The present composition is not only easy to be excellent in dispersion stability, uniformity, and handling, but also easy to form an adhesive molded product with excellent physical properties based on non-thermal fusible PTFE. In addition, at this time, the following aspect is preferable: the D50 of the F polymer particles having a melting temperature of 200 to 320°C is 0.1 to 1 μm and the D50 of the non-thermally fusible PTFE particles is 0.1 to 1 μm, or the melting temperature The D50 of the F polymer particles at 200~320°C is 1~4μm and the D50 of the non-thermofusible PTFE particles is 0.1~1μm. In addition, the non-heat-melting polymer means a polymer that does not have a temperature at which the melt flow rate is 1 g or more and 1000 g or less per 10 minutes under a load of 49 N.
F粒子亦可包含F聚合物以外之樹脂或無機物,惟宜將F聚合物作為主成分。F粒子中F聚合物之含量宜為80質量%以上,100質量%較佳。The F particles may also contain resins or inorganic substances other than the F polymer, but it is preferable to use the F polymer as the main component. The content of the F polymer in the F particles is preferably at least 80% by mass, more preferably 100% by mass.
本組成物中之本球狀氧化矽為實心氧化矽,中值粒徑d(μm)大於0.6μm且為20μm以下,並且前述中值粒徑d與比表面積A(m 2/g)之積d×A位在2.7~5.0μm・m 2/g(2.7≦A×d50(μm・m 2/g)≦5.0)之範圍。 若中值粒徑d大於0.6μm,便可顯著地減少介電正切。另一方面,若中值粒徑d變大,則細度計(grind gauge)之值變大(以JIS K5400細度計法測定)。在將本組成物例如成形成聚合物層時,從控制所述聚合物層之最小厚度的觀點來看,中值粒徑d宜大於0.6μm且為10μm以下,更宜為1~5μm。 另外,本球狀氧化矽之中值粒徑d係藉由雷射繞射式粒度分布測定裝置(例如,Microtrac BEL有限公司製「MT3300EXII」)求得。具體而言,藉由在裝置內照射60秒之超音波3次,使球狀氧化矽粉末分散後,進行60秒之測定2次,求得其平均值。 The spherical silica in this composition is solid silica, the median particle size d (μm) is greater than 0.6 μm and not more than 20 μm, and the product of the aforementioned median particle size d and specific surface area A (m 2 /g) The d×A position is in the range of 2.7~5.0μm・m 2 /g (2.7≦A×d50(μm・m 2 /g)≦5.0). If the median particle size d is larger than 0.6 µm, the dielectric tangent can be significantly reduced. On the other hand, when the median diameter d becomes larger, the value of the grind gauge becomes larger (measured by the JIS K5400 grind gauge method). When forming this composition into a polymer layer, for example, from the viewpoint of controlling the minimum thickness of the polymer layer, the median particle size d is preferably greater than 0.6 μm and 10 μm or less, more preferably 1 to 5 μm. In addition, the median particle size d of the present spherical silica is obtained by a laser diffraction particle size distribution measuring device (for example, "MT3300EXII" manufactured by Microtrac BEL Co., Ltd.). Specifically, the spherical silicon oxide powder was dispersed by irradiating the apparatus with ultrasonic waves three times for 60 seconds, and then measured twice for 60 seconds to obtain the average value.
本球狀氧化矽之中值粒徑d與比表面積A之積d×A為2.7~5.0μm・m 2/g,宜為2.7~4.5μm・m 2/g,較佳為2.7~4.0μm・m 2/g。d×A之理論值為2.7(由比表面積=6/(氧化矽之真密度2.2×中值粒徑d)導出),其以下之值在現實中無法達成。由於d×A之值越大,每個粒徑之比表面積變得越大,會導致介電正切變大,故為了使介電正切在頻率1GHz下減少至0.0020以下左右,而令d×A為5.0μm・m 2/g以下。 The product d×A of the median particle diameter d of the spherical silica and the specific surface area A is 2.7~5.0μm・m 2 /g, preferably 2.7~4.5μm・m 2 /g, preferably 2.7~4.0μm ・m 2 /g. The theoretical value of d×A is 2.7 (derived from specific surface area=6/(true density of silicon oxide 2.2×median particle size d)), and values below it cannot be achieved in reality. Since the larger the value of d×A, the specific surface area of each particle size becomes larger, which will lead to a larger dielectric tangent, so in order to reduce the dielectric tangent to about 0.0020 or less at a frequency of 1GHz, d×A 5.0 μm・m 2 /g or less.
本球狀氧化矽之比表面積A宜在0.2~2.0m 2/g之範圍內。若比表面積為0.2m 2/g以上,在使本組成物含有本球狀氧化矽時,因充分具有與F聚合物之接觸點,故與F聚合物之適應性(fitness)變佳,若為2.0m 2/g以下,因可縮小介電正切,故由本組成物所得之成形物中可發揮優異之低介電正切,成形物中之分散性提升。又,吾等判斷就本球狀氧化矽而言,中值粒徑小之粒子或表面粗糙之存在少係有助於抑制本組成物之增黏。 比表面積A宜為1.5m 2/g以下,1.0m 2/g以下更佳,0.8m 2/g以下尤佳。另外,實質上係難以得到比表面積A小於0.2m 2/g之物。 另外,本球狀氧化矽之比表面積係藉由BET法求得,該BET法係基於使用了比表面積・細孔分布測定裝置(例如,Microtrac BEL公司製「BELSORP-miniII」、Micromeritics公司製「TriStar II」等)之氮氣吸附法。 The specific surface area A of the spherical silicon oxide is preferably in the range of 0.2~2.0m 2 /g. If the specific surface area is 0.2m 2 /g or more, when the present composition contains this spherical silica, since there are sufficient contact points with the F polymer, the adaptability (fitness) with the F polymer becomes better. If it is 2.0m 2 /g or less, the dielectric tangent can be reduced, so the molded product obtained from this composition can exhibit an excellent low dielectric tangent, and the dispersibility in the molded product can be improved. In addition, we judged that for the present spherical silica, the presence of particles with a small median particle size or surface roughness contributes to the suppression of thickening of the present composition. The specific surface area A is preferably not more than 1.5 m 2 /g, more preferably not more than 1.0 m 2 /g, and most preferably not more than 0.8 m 2 /g. In addition, it is substantially difficult to obtain a specific surface area A of less than 0.2 m 2 /g. In addition, the specific surface area of this spherical silica was obtained by the BET method based on the use of a specific surface area and pore distribution measuring device (for example, "BELSORP-miniIII" manufactured by Microtrac BEL, "BELSORP-miniIII" manufactured by Micromeritics Corporation, " TriStar II", etc.) nitrogen adsorption method.
本球狀氧化矽之真球度宜為0.75~1.0。若真球度變低則比表面積變大,故為了使介電正切變得容易上升,真球度宜為0.75以上。真球度為0.90以上較佳,0.93以上更佳,越接近1.0越佳。 另外,真球度可以算出最小徑(DS)相對於最大徑(DL)之比(DS/DL)的平均值來表示,該最大徑(DL)與最小徑(DS)之測定如下:針對利用掃描型電子顯微鏡(SEM)照相拍攝所得之照相投影圖中的任意100個粒子,測定個別之最大徑(DL)及與其正交之短徑(DS)。 The true sphericity of the spherical silicon oxide is preferably 0.75~1.0. When the sphericity becomes low, the specific surface area becomes large, so the sphericity is preferably 0.75 or more in order to make it easier to increase the dielectric tangent. The true sphericity is preferably 0.90 or more, more preferably 0.93 or more, and the closer to 1.0, the better. In addition, true sphericity can be expressed by calculating the average value of the ratio (DS/DL) of the smallest diameter (DS) to the largest diameter (DL). The measurement of the largest diameter (DL) and the smallest diameter (DS) is as follows: For any 100 particles in the photographic projection image captured by a scanning electron microscope (SEM), measure the individual maximum diameter (DL) and short diameter (DS) orthogonal to it.
本球狀氧化矽之介電正切在頻率1GHz下宜為0.0020以下,0.0010以下較佳,0.0008以下更佳。若前述介電正切為0.0020以下,因可得優異之介電損失抑制效果,故可獲得已提升高頻特性之基板或片材。因前述介電正切越小越可抑制電路之傳送損失,故並無特別限定下限值。 另外,介電正切可使用專用裝置(例如,使用KEYCOM有限公司製「向量網路分析儀E5063A」),並利用微擾方式共振器法測定(測定條件:試驗頻率1GHz、試驗溫度約24℃、濕度約45%、測定次數3次)。 The dielectric tangent of the spherical silicon oxide is preferably 0.0020 or less at a frequency of 1 GHz, preferably 0.0010 or less, and more preferably 0.0008 or less. If the above-mentioned dielectric tangent is 0.0020 or less, an excellent dielectric loss suppression effect can be obtained, so a substrate or sheet with improved high-frequency characteristics can be obtained. Since the smaller the dielectric tangent is, the lower the transmission loss of the circuit can be suppressed, so the lower limit value is not particularly limited. In addition, the dielectric tangent can be measured using a dedicated device (for example, using "Vector Network Analyzer E5063A" manufactured by KEYCOM Co., Ltd.) and using the perturbation method resonator method (measurement conditions: test frequency 1GHz, test temperature about 24°C, The humidity is about 45%, and the number of measurements is 3 times).
本球狀氧化矽宜為藉由下述測定方法測定之包含球狀氧化矽之捏合物之黏度成為5000mPa・s以下的球狀氧化矽。 測定方法:混合按JIS K 5421:2000中規定之熟亞麻仁油6質量份與球狀氧化矽8質量份,並以2000rpm捏合3分鐘而得到捏合物,使用旋轉式流變儀以剪切速度1s -1測定該捏合物30秒,求得在30秒時之黏度。 The present spherical silica is preferably spherical silica whose viscosity of the kneaded product containing spherical silica measured by the following measurement method is 5000 mPa·s or less. Measurement method: Mix 6 parts by mass of cooked linseed oil and 8 parts by mass of spherical silica according to JIS K 5421:2000, and knead at 2000rpm for 3 minutes to obtain a kneaded product. 1s -1 Measure the kneaded product for 30 seconds, and obtain the viscosity at 30 seconds.
本球狀氧化矽表面之源自孤立矽烷醇基之3746cm -1附近之IR波峰強度,宜為0.1以下,0.08以下較佳,0.06以下更佳。孤立矽烷醇基係指未與吸附於氧化矽粒子之水等鍵結的矽烷醇(Si-OH)基。氧化矽粒子表面之孤立矽烷醇(Si-OH)量係藉由IR測定來獲得。具體而言,將IR光譜在800cm -1標準化(standardization),並在3800cm -1使基線相合後,求算3746cm -1附近之Si-OH波峰強度的相對值。若本球狀氧化矽表面之源自孤立矽烷醇基之3746cm -1附近之IR波峰強度為0.1以下,即可減少介電損失。 The IR peak intensity around 3746 cm -1 originating from isolated silanol groups on the surface of the spherical silicon oxide is preferably less than 0.1, preferably less than 0.08, more preferably less than 0.06. The isolated silanol group refers to a silanol (Si—OH) group not bonded to water or the like adsorbed on the silicon oxide particles. The amount of isolated silanol (Si-OH) on the surface of silicon oxide particles is obtained by IR measurement. Specifically, after standardizing the IR spectrum at 800 cm -1 and aligning the baselines at 3800 cm -1 , the relative value of the Si-OH peak intensity around 3746 cm -1 was calculated. If the IR peak intensity around 3746 cm -1 originating from the isolated silanol group on the spherical silicon oxide surface is below 0.1, the dielectric loss can be reduced.
又,本球狀氧化矽表面之源自鍵結矽烷醇基且位在3300~3700cm -1之最大IR波峰強度,宜為0.2以下,0.17以下較佳,0.15以下更佳。鍵結矽烷醇基係指與吸附於氧化矽粒子之水、或氧化矽表面之矽烷醇等鍵結的矽烷醇(Si-OH)基。氧化矽粒子表面之鍵結矽烷醇(Si-OH)量係藉由IR測定來獲得。具體而言,將IR光譜在800cm -1標準化,並在3800cm -1使基線相合後,從位在3300~3700cm -1中之最大波峰求算鍵結Si-OH波峰強度的相對值。若本球狀氧化矽表面之源自鍵結矽烷醇基且位在3300~3700cm -1之最大IR波峰強度為0.2以下,即可減少介電損失。 另外,紅外線分光(IR)光譜之測定例如可使用IR Prestige-21(島津製作所公司製),使球狀氧化矽粉末分散於鑽石中,並以擴散反射法來進行(測定條件例:測定範圍400~4000cm -1、解析度4cm -1、累積次數128次)。 對鑽石粉末之稀釋,係定義為[質量稀釋率]=([試樣質量])/([鑽石質量]+[試樣質量]),令[質量稀釋率]=85-2.5×[BET比表面積]。 Also, the maximum IR peak intensity at 3300-3700 cm -1 originating from bonded silanol groups on the surface of the spherical silica is preferably 0.2 or less, preferably 0.17 or less, and more preferably 0.15 or less. The bonded silanol group refers to a silanol (Si-OH) group bonded to water adsorbed on silicon oxide particles or silanol on the surface of silicon oxide. The amount of bonded silanol (Si-OH) on the surface of silicon oxide particles is obtained by IR measurement. Specifically, after standardizing the IR spectrum at 800 cm -1 and aligning the baselines at 3800 cm -1 , the relative value of the bonded Si-OH peak intensity was calculated from the maximum peak at 3300 to 3700 cm -1 . If the maximum IR peak intensity at 3300~3700cm -1 originating from bonded silanol groups on the surface of the spherical silicon oxide is less than 0.2, the dielectric loss can be reduced. In addition, the measurement of infrared spectroscopy (IR) spectrum can be performed, for example, by using IR Prestige-21 (manufactured by Shimadzu Corporation), dispersing spherical silicon oxide powder in diamond, and performing the diffuse reflectance method (example of measurement conditions: measurement range 400 ~4000cm -1 , resolution 4cm -1 , cumulative times 128 times). The dilution of diamond powder is defined as [mass dilution rate]=([sample mass])/([diamond mass]+[sample mass]), so that [mass dilution rate]=85-2.5×[BET ratio surface area].
從介電正切等電氣物性、本組成物之黏度等物性的觀點來看,本球狀氧化矽宜為無孔質粒子。具體而言,本球狀氧化矽之吸油量宜為100ml/100g以下,70ml/100g以下較佳,50ml/100g以下最佳。From the viewpoint of electrical properties such as dielectric tangent and physical properties such as viscosity of the present composition, the present spherical silica is preferably non-porous particles. Specifically, the oil absorption of the spherical silica is preferably less than 100ml/100g, more preferably less than 70ml/100g, most preferably less than 50ml/100g.
本球狀氧化矽包含之鈦(Ti),宜在30~1500ppm之範圍內,100~1000ppm之範圍內包含較佳,100~500ppm之範圍內包含更佳。Titanium (Ti) contained in the spherical silicon oxide is preferably contained within the range of 30-1500 ppm, more preferably contained within the range of 100-1000 ppm, more preferably contained within the range of 100-500 ppm.
本球狀氧化矽亦可進一步包含其他元素。其他元素可舉例如:Na、K、Mg、Ca、Al、Fe。其他元素中鹼金屬與鹼土族金屬之含量,總和宜為2000ppm以下,1000ppm以下較佳,200ppm以下更佳。The present spherical silicon oxide may further contain other elements. Examples of other elements include: Na, K, Mg, Ca, Al, Fe. The total content of alkali metals and alkaline earth metals in other elements is preferably less than 2000ppm, more preferably less than 1000ppm, more preferably less than 200ppm.
本球狀氧化矽亦可利用矽烷耦合劑來處理。藉由利用矽烷耦合劑來處理本球狀氧化矽表面,則表面之矽烷醇基的殘留量變少,表面被疏水化,抑制水分吸附而可提升介電損失,且與F聚合物之親和性提升,分散性、或由本組成物所得之聚合物層等成形物的強度提升。 矽烷耦合劑可舉:胺基矽烷系耦合劑、環氧基矽烷系耦合劑、巰基矽烷系耦合劑、有機矽氮烷化合物等。該等亦可併用2種以上。 矽烷耦合劑之附著量宜設為存在於本球狀氧化矽表面之矽烷醇基可全部反應之程度的量。具體而言,相對於本球狀氧化矽100質量份,宜為0.01質量份以上,0.05質量份以上更佳,又,2質量份以下較佳,1質量份以下更佳。 The spherical silica can also be treated with silane coupling agent. By using a silane coupling agent to treat the surface of the spherical silicon oxide, the residual amount of silanol groups on the surface will be reduced, the surface will be hydrophobized, and the dielectric loss will be increased by inhibiting moisture adsorption, and the affinity with F polymer will be improved. , dispersibility, or the strength of molded products such as polymer layers obtained from this composition is improved. Examples of silane coupling agents include: aminosilane-based coupling agents, epoxy-based silane-based coupling agents, mercaptosilane-based coupling agents, organic silazane compounds, and the like. These can also use 2 or more types together. The attachment amount of the silane coupling agent is preferably set to an amount at which all the silanol groups existing on the surface of the spherical silica can react. Specifically, it is preferably at least 0.01 parts by mass, more preferably at least 0.05 parts by mass, and preferably at most 2 parts by mass, more preferably at most 1 part by mass, based on 100 parts by mass of the present spherical silica.
本球狀氧化矽宜為藉由將利用濕式法形成之球狀氧化矽前驅物進行熱處理而獲得之球狀氧化矽。 濕式法係指包含後述步驟的方式:藉由使用液體之物作為氧化矽來源,並使其凝膠化而獲得球狀氧化矽粉末之原料的步驟。 濕式法可舉例如:噴霧法、乳液・凝膠化法等。 The present spherical silicon oxide is preferably spherical silicon oxide obtained by heat-treating a spherical silicon oxide precursor formed by a wet method. The wet method refers to a method including the following steps: a step of obtaining a raw material of spherical silicon oxide powder by using a liquid as a silicon oxide source and gelling it. Wet methods include, for example, spray methods, emulsion and gelation methods, and the like.
利用濕式法而獲得之球狀氧化矽前驅物的細孔容積宜為0.3~2.2ml/g。 在此,細孔容積係藉由BJH法求得,該BJH法係基於使用比表面積・細孔分布測定裝置(例如,Microtrac BEL公司製「BELSORP-miniII」、Micromeritics公司製「TriStar II」等)之氮氣吸附法者。 利用濕式法而獲得之氧化矽前驅物的燒失量宜為5.0~15.0質量%。 在此,燒失量係依據JIS K0067,以在850℃下將1g之氧化矽前驅物予以加熱乾燥0.5小時後的質量損失來求得。 The pore volume of the spherical silicon oxide precursor obtained by the wet method is preferably 0.3-2.2ml/g. Here, the pore volume is obtained by the BJH method based on the use of a specific surface area and pore distribution measuring device (for example, "BELSORP-miniIII" manufactured by Microtrac BEL, "TriStar II" manufactured by Micromeritics, etc.) The nitrogen adsorption method. The loss on ignition of the silicon oxide precursor obtained by the wet method is preferably 5.0-15.0% by mass. Here, the loss on ignition is determined as the mass loss after heating and drying 1 g of the silicon oxide precursor at 850° C. for 0.5 hours in accordance with JIS K0067.
在熱處理中,燒固(densification)球狀氧化矽粉末,進行殼體之細緻化並同時減少表面之矽烷醇基量,以使介電正切降低。熱處理之溫度宜為700~1600℃。 前述熱處理之方式可舉例如:利用靜置方式所行之熱處理、利用旋轉窯方式所行之熱處理、利用噴霧燃燒所行之熱處理等方式。 During the heat treatment, the spherical silicon oxide powder is densified to refine the shell and at the same time reduce the amount of silanol groups on the surface to lower the dielectric tangent. The temperature of heat treatment should be 700~1600℃. The aforementioned heat treatment methods include, for example: heat treatment by standing still, heat treatment by rotary kiln, heat treatment by spray combustion, etc.
亦可將藉由所述方法而獲得之本球狀氧化矽以矽烷耦合劑進行表面處理,使存在於本球狀氧化矽表面之矽烷醇基與矽烷耦合劑反應。 矽烷耦合劑可舉前述化合物,亦可組合2種以上使用。矽烷耦合劑之處理量,相對於本球狀氧化矽100質量份宜為0.01~5質量份。 以矽烷耦合劑進行表面處理之方法可舉例如:對本球狀氧化矽噴霧矽烷耦合劑的乾式法、或使本球狀氧化矽分散於溶劑中再加入矽烷耦合劑使其反應的濕式法。 The surface of the spherical silicon oxide obtained by the method described above can also be treated with a silane coupling agent, so that the silanol groups present on the surface of the spherical silicon oxide can react with the silane coupling agent. As the silane coupling agent, the above-mentioned compounds may be mentioned, and two or more types may be used in combination. The treatment amount of the silane coupling agent is preferably 0.01 to 5 parts by mass relative to 100 parts by mass of the present spherical silicon oxide. The method of surface treatment with silane coupling agent can be, for example, the dry method of spraying the silane coupling agent on the spherical silicon oxide, or the wet method of dispersing the spherical silicon oxide in a solvent and then adding the silane coupling agent to react.
本組成物包含之液狀分散介質係具有將F粒子或本球狀氧化矽溶解、分散、或凝膠化之功能的液體,本組成物通常為漿狀或凝膠狀。另外,液體意指在25℃下之黏度為10mPa・s以下。 從令構成後述積層體之聚合物層中本球狀氧化矽的分布為均一,且抑制空隙的觀點來看,液狀分散介質宜進行脫氣。 The liquid dispersion medium contained in the composition is a liquid capable of dissolving, dispersing, or gelling the F particles or the spherical silicon oxide, and the composition is usually in the form of slurry or gel. In addition, liquid means that the viscosity at 25°C is 10 mPa・s or less. From the viewpoint of making the distribution of the present spherical silica uniform in the polymer layer constituting the laminate described later and suppressing voids, the liquid dispersion medium is preferably degassed.
液狀分散介質可為水,亦可為非水系分散介質。又,液狀分散介質可為非質子性分散介質,亦可為質子性分散介質。 液狀分散介質為在大氣壓下、25℃下為液體之化合物,可舉例如:水、醇、醯胺、酮及酯。 醇可舉:甲醇、乙醇、異丙醇、二元醇(乙二醇、丙二醇、1,3-丙二醇、二乙二醇、二丙二醇、三乙二醇、三丙二醇等)。 醯胺可舉:N-甲基-2-吡咯啶酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N,N-二甲基丙醯胺、3-甲氧-N,N-二甲基丙醯胺、3-丁氧-N,N-二甲基丙醯胺、N,N-二乙基甲醯胺、六甲基磷酸三醯胺、1,3-二甲-2-咪唑啶酮等。 酮可舉:丙酮、甲基乙基酮、甲基異丙基酮、甲基異丁基酮、甲基正戊基酮、甲基異戊基酮、2-庚酮、環戊酮、環己酮、環庚酮。 酯可舉:乙酸甲酯、乙酸乙酯、乙酸丁酯、乳酸甲酯、乳酸乙酯、丙酮酸甲酯、丙酮酸乙酯、甲氧基丙酸甲酯、乙氧基丙酸乙酯、3-乙氧基丙酸乙酯、γ-丁內酯、γ-戊內酯。 The liquid dispersion medium may be water or a non-aqueous dispersion medium. In addition, the liquid dispersion medium may be an aprotic dispersion medium or a protic dispersion medium. The liquid dispersion medium is a compound that is liquid at 25°C under atmospheric pressure, such as water, alcohol, amide, ketone and ester. Examples of the alcohol include methanol, ethanol, isopropanol, and glycols (ethylene glycol, propylene glycol, 1,3-propanediol, diethylene glycol, dipropylene glycol, triethylene glycol, tripropylene glycol, etc.). Examples of amides include: N-methyl-2-pyrrolidone, N,N-dimethylformamide, N,N-dimethylacetamide, N,N-dimethylacrylamide, 3 -Methoxy-N,N-dimethylpropionamide, 3-butoxy-N,N-dimethylpropionamide, N,N-diethylformamide, hexamethyl triamide phosphate, 1,3-dimethyl-2-imidazolidinone, etc. Examples of ketones: acetone, methyl ethyl ketone, methyl isopropyl ketone, methyl isobutyl ketone, methyl n-amyl ketone, methyl isoamyl ketone, 2-heptanone, cyclopentanone, cyclopentanone, Hexanone, Cycloheptanone. Examples of esters include: methyl acetate, ethyl acetate, butyl acetate, methyl lactate, ethyl lactate, methyl pyruvate, ethyl pyruvate, methyl methoxy propionate, ethyl ethoxy propionate, Ethyl 3-ethoxypropionate, gamma-butyrolactone, gamma-valerolactone.
液狀分散介質亦可併用2種以上。併用2種以上時,異種之液狀分散介質以可相溶為佳。 液狀分散介質之沸點宜在50~240℃之範圍內。 本組成物中液狀分散介質之含量,相對於本組成物之整體質量,宜為5質量%以上,20質量%以上較佳,40質量%以上更佳。液狀分散介質之含量宜為80質量%以下,70質量%以下較佳。在所述範圍中,本組成物可適合作為分散液狀之液狀、或糊狀來處置,其分散穩定性與塗敷性更容易提升。 The liquid dispersion medium may use 2 or more types together. When two or more types are used together, it is better that the liquid dispersion media of different types are compatible. The boiling point of the liquid dispersion medium should be within the range of 50~240°C. The content of the liquid dispersion medium in the composition is preferably at least 5% by mass, preferably at least 20% by mass, and more preferably at least 40% by mass, relative to the overall mass of the composition. The content of the liquid dispersion medium is preferably not more than 80% by mass, preferably not more than 70% by mass. Within the above range, the present composition can be handled as a dispersion liquid or a paste, and its dispersion stability and applicability can be improved more easily.
本組成物中F粒子之含量,相對於本組成物之整體質量,宜為10質量%以上,20質量%以上較佳。從本組成物之分散穩定性的觀點來看,F粒子之含量,相對於本組成物之整體質量,宜為40質量%以下,30質量%以下較佳。 本組成物中本球狀氧化矽之含量,相對於本組成物之整體質量,宜為10質量%以上,20質量%以上較佳。從本組成物之分散穩定性的觀點來看,本球狀氧化矽之含量,相對於本組成物之整體質量,宜為60質量%以下,50質量%以下較佳。 The content of F particles in this composition is preferably at least 10% by mass, preferably at least 20% by mass, relative to the overall mass of this composition. From the viewpoint of the dispersion stability of the composition, the content of the F particles is preferably 40% by mass or less, preferably 30% by mass or less, based on the overall mass of the composition. The content of the spherical silicon oxide in the composition is preferably at least 10% by mass, preferably at least 20% by mass, relative to the overall mass of the composition. From the viewpoint of the dispersion stability of the composition, the content of the spherical silica is preferably 60% by mass or less, preferably 50% by mass or less, based on the overall mass of the composition.
又,相對於本組成物之整體質量,本球狀氧化矽之含量為10~60質量%,宜為20~50質量%之範圍,且F粒子之含量為10~40質量%,宜為10~30質量%之範圍。進而,本組成物中本球狀氧化矽之含量宜較F粒子之含量多。若為所述範圍,便容易獲得抑制黏度增加又不失分散穩定性優異之本組成物,且容易由本組成物形成任意厚度之聚合物層,尤其是厚的聚合物層。Also, relative to the overall mass of this composition, the content of the spherical silicon oxide is 10-60% by mass, preferably in the range of 20-50% by mass, and the content of F particles is 10-40% by mass, preferably 10% by mass. ~30% by mass. Furthermore, the content of the spherical silicon oxide in the present composition is preferably higher than the content of the F particles. If it is within the above-mentioned range, it is easy to obtain the present composition which suppresses the increase in viscosity without losing excellent dispersion stability, and it is easy to form a polymer layer with any thickness, especially a thick polymer layer, from this composition.
本組成物中F粒子與本球狀氧化矽之合計含量,相對於本組成物之整體質量,宜為20質量%以上,50質量%以上較佳。F粒子與本球狀氧化矽之合計含量,相對於本組成物之整體質量,宜為95質量%以下,75質量%以下較佳。The total content of the F particles and the spherical silicon oxide in this composition is preferably at least 20% by mass, preferably at least 50% by mass, based on the overall mass of the composition. The total content of the F particles and the spherical silicon oxide is preferably not more than 95% by mass, preferably not more than 75% by mass, relative to the overall mass of the composition.
因應需求,本組成物亦可進一步含有異於本球狀氧化矽之無機填料。前述無機填料係異於本球狀氧化矽之填料,可舉例如:氮化硼填料、氮化鋁填料、氧化鈹填料、矽酸鹽填料(氧化矽填料、矽灰石填料、滑石填料)、金屬氧化物(氧化鈰、氧化鋁、氧化鎂、氧化鋅、氧化鈦等)填料及偏矽酸鎂(塊滑石)填料。該等填料亦可為經燒成之陶瓷填料。 前述無機填料亦可於其表面之至少一部分以矽烷耦合劑進行表面處理。所述經表面處理之無機填料與F粒子之親和性優異,容易使本組成物之分散性提升。 As required, this composition may further contain an inorganic filler other than the spherical silica. The aforementioned inorganic fillers are different from the spherical silica fillers, for example: boron nitride fillers, aluminum nitride fillers, beryllium oxide fillers, silicate fillers (silicon oxide fillers, wollastonite fillers, talc fillers), Metal oxide (cerium oxide, aluminum oxide, magnesium oxide, zinc oxide, titanium oxide, etc.) filler and magnesium metasilicate (talc) filler. The fillers may also be fired ceramic fillers. The aforementioned inorganic filler can also be surface-treated with a silane coupling agent on at least a part of its surface. The surface-treated inorganic filler has excellent affinity with the F particles, and it is easy to improve the dispersibility of the composition.
從更加提升分散穩定性與處理性的觀點來看,本組成物亦可進一步含有界面活性劑。界面活性劑宜為非離子性。 界面活性劑之親水部位宜具有氧伸烷基或醇性羥基。 界面活性劑之疏水部位宜具有乙炔基、聚矽氧烷基、全氟烷基或全氟烯基。換言之,界面活性劑宜為乙炔系界面活性劑、聚矽氧系界面活性劑或氟系界面活性劑,聚矽氧系界面活性劑較佳。 From the viewpoint of further improving dispersion stability and handleability, this composition may further contain a surfactant. The surfactant is preferably nonionic. The hydrophilic portion of the surfactant preferably has an oxyalkylene group or an alcoholic hydroxyl group. The hydrophobic part of the surfactant preferably has an ethynyl group, a polysiloxane group, a perfluoroalkyl group or a perfluoroalkenyl group. In other words, the surfactant is preferably an acetylene-based surfactant, a polysiloxane-based surfactant or a fluorine-based surfactant, and a polysiloxane-based surfactant is more preferred.
所述界面活性劑之具體例可舉:「Ftergent(註冊商標)」系列(有限公司NEOS公司製)、「Surflon(註冊商標)」系列(AGC Seimi Chemical公司製)、「Megafac(註冊商標)」系列(DIC有限公司製)、「UNIDYNE(註冊商標)」系列(DAIKIN工業有限公司製)、「BYK-347」、「BYK-349」、「BYK-378」、「BYK-3450」、「BYK-3451」、「BYK-3455」、「BYK-3456」(BYK Japan有限公司製)、「KF-6011」、「KF-6043」(信越化學工業有限公司製)、「Tergitol」系列(Dow Chemical公司製、「Tergitol TMN-100X」等)。 本組成物含有界面活性劑時,其量宜為本組成物中之1~15質量%之範圍。此時,成分間之親和性增強,本組成物之分散穩定性與處理性更容易提升。 Specific examples of the surfactant include: "Ftergent (registered trademark)" series (manufactured by NEOS Co., Ltd.), "Surflon (registered trademark)" series (manufactured by AGC Seimi Chemical), "Megafac (registered trademark)" Series (manufactured by DIC Co., Ltd.), "UNIDYNE (registered trademark)" series (manufactured by DAIKIN Industry Co., Ltd.), "BYK-347", "BYK-349", "BYK-378", "BYK-3450", "BYK -3451", "BYK-3455", "BYK-3456" (manufactured by BYK Japan Co., Ltd.), "KF-6011", "KF-6043" (manufactured by Shin-Etsu Chemical Industry Co., Ltd.), "Tergitol" series (manufactured by Dow Chemical Company system, "Tergitol TMN-100X", etc.). When the composition contains a surfactant, the amount is preferably in the range of 1 to 15% by mass of the composition. At this time, the affinity between the components is enhanced, and the dispersion stability and handleability of the composition are more easily improved.
本組成物亦可進一步包含芳香族聚合物。芳香族聚合物可為熱塑性,亦可為熱硬化性。芳香族聚合物亦可以其前驅物型態含在本組成物中。芳香族聚合物亦可以粒子型態含在本組成物中,亦可溶解於液狀分散介質中。本組成物包含水時,芳香族聚合物宜為水溶性。The present composition may further include an aromatic polymer. Aromatic polymers may be thermoplastic or thermosetting. Aromatic polymers can also be contained in the composition in the form of their precursors. The aromatic polymer may be contained in the present composition in the form of particles, or may be dissolved in a liquid dispersion medium. When the present composition contains water, the aromatic polymer is preferably water-soluble.
芳香族聚合物可舉:芳香族聚醯亞胺、芳香族聚醯亞胺前驅物(聚醯胺酸或其鹽)、芳香族聚醯胺醯亞胺、芳香族聚醯胺醯亞胺前驅物、芳香族聚醚醯亞胺、芳香族聚醚醯亞胺前驅物、芳香族硫化物系樹脂、芳香族碸系樹脂、酚醛樹脂、芳香族環氧樹脂、芳香族聚酯樹脂(液晶性芳香族聚酯等)、芳香族聚酯醯胺(液晶性芳香族聚酯醯胺等)、芳香族順丁烯二醯亞胺、聚苯醚,宜為芳香族聚醯亞胺前驅物、芳香族聚醯胺醯亞胺及芳香族聚醯胺醯亞胺前驅物。 此時,芳香族聚合物容易與F聚合物相互作用,甚至由本組成物形成之成形物與金屬箔等基材之接著性或UV吸收性容易變得優異。 在本組成物包含水時,宜為水溶性芳香族聚醯胺醯亞胺之前驅物及水溶性芳香族聚醯亞胺之前驅物。 Examples of aromatic polymers include: aromatic polyimide, aromatic polyimide precursor (polyamic acid or its salt), aromatic polyamide imide, aromatic polyamide imide precursor Aromatic polyetherimide, aromatic polyetherimide precursor, aromatic sulfide resin, aromatic sulfide resin, phenolic resin, aromatic epoxy resin, aromatic polyester resin (liquid crystal aromatic polyester, etc.), aromatic polyester amide (liquid crystalline aromatic polyester amide, etc.), aromatic maleimide, polyphenylene ether, preferably aromatic polyimide precursor, Aromatic polyamide imide and aromatic polyamide imide precursor. In this case, the aromatic polymer is likely to interact with the F polymer, and even the molded article formed of this composition tends to have excellent adhesion to substrates such as metal foils or UV absorption. When the composition contains water, it is preferably a water-soluble aromatic polyimide precursor and a water-soluble aromatic polyimide precursor.
芳香族聚醯亞胺前驅物可舉:使四羧酸二酐與二胺在溶劑中聚合之聚醯胺酸、或使該聚醯胺酸與氨水或有機胺反應之聚醯胺酸鹽。芳香族聚醯亞胺或其前驅物之具體例可舉:「Neopulim(註冊商標)」系列(三菱瓦斯化學公司製)、「SPIXAREA(註冊商標)」系列(SOMAR公司製)、「Q-PILON(註冊商標)」系列(PIRD技術研究所製)、「WINGO」系列(WINGO TECHNOLOGY公司製)、「Tomaido(註冊商標)」系列(T&K TOKA公司製)、「KPI-MX」系列(河村產業公司製)、「UPIA(註冊商標)-AT」系列(宇部興產公司製)。Examples of the aromatic polyimide precursor include polyamic acid in which tetracarboxylic dianhydride and diamine are polymerized in a solvent, or polyamic acid salt in which the polyamic acid is reacted with ammonia water or organic amine. Specific examples of aromatic polyimides or their precursors include: "Neopulim (registered trademark)" series (manufactured by Mitsubishi Gas Chemical Co., Ltd.), "SPIXAREA (registered trademark)" series (manufactured by SOMAR Corporation), "Q-PILON (registered trademark)” series (manufactured by PIRD Technology Research Institute), “WINGO” series (manufactured by WINGO TECHNOLOGY Co., Ltd.), “Tomaido (registered trademark)” series (manufactured by T&K TOKA Co., Ltd.), “KPI-MX” series (manufactured by Kawamura Sangyo Co., Ltd. Manufactured), "UPIA (registered trademark)-AT" series (manufactured by Ube Industries, Ltd.).
芳香族聚醯胺醯亞胺或其前驅物可舉:使二異氰酸酯及/或二胺、與作為酸成分之三元酸酐(或三元酸氯化物)反應而獲得之聚醯胺醯亞胺樹脂或其前驅物。 芳香族聚醯胺醯亞胺或其前驅物之具體例可舉:「HPC-1000」、「HPC-2100D」(以上,昭和電工材料公司製)。 Examples of aromatic polyamide imides or their precursors include polyamide imides obtained by reacting diisocyanates and/or diamines with tribasic acid anhydrides (or tribasic acid chlorides) as acid components Resins or their precursors. Specific examples of aromatic polyamideimide or its precursor include "HPC-1000" and "HPC-2100D" (manufactured by Showa Denko Materials Co., Ltd. above).
本組成物進一步包含芳香族聚合物時,其含量相對於本組成物之整體質量,宜為0.01質量%以上,1質量%以上較佳。芳香族聚合物之含量宜為5質量%以下,3質量%以下較佳。 本組成物中芳香族聚合物之含量,相對於本組成物中F聚合物之含量,宜為小於10質量%,5質量%以下較佳。芳香族聚合物之含量,相對於F聚合物之含量,宜為0.1質量%以上。 在本組成物包含芳香族聚合物時,芳香族聚合物可作為本球狀氧化矽與F聚合物之分散劑或黏合劑發揮功能,容易成為緻密之聚合物層,且本球狀氧化矽容易高度地分散在聚合物層中。 只要芳香族聚合物之含量在所述之低範圍內,聚合物層之電氣特性便容易優異。 When the composition further contains an aromatic polymer, the content thereof is preferably at least 0.01% by mass, preferably at least 1% by mass, based on the overall mass of the composition. The content of the aromatic polymer is preferably not more than 5% by mass, more preferably not more than 3% by mass. The content of the aromatic polymer in the composition is preferably less than 10% by mass, preferably 5% by mass or less, relative to the content of the F polymer in the composition. The content of the aromatic polymer is preferably 0.1% by mass or more relative to the content of the F polymer. When the composition contains an aromatic polymer, the aromatic polymer can function as a dispersant or binder between the spherical silica and the F polymer, and it is easy to form a dense polymer layer, and the spherical silica is easy to Highly dispersed in the polymer layer. As long as the content of the aromatic polymer is within the low range mentioned above, the electrical characteristics of the polymer layer are easy to be excellent.
本組成物除了無機填料、界面活性劑、芳香族聚合物以外,亦可進一步含有:觸變性賦予劑、黏度調節劑、消泡劑、矽烷耦合劑、脫水劑、塑化劑、耐候劑、抗氧化劑、熱穩定劑、滑劑、抗靜電劑、增白劑、著色劑、導電劑、脫模劑、表面處理劑、阻燃劑等添加劑。In addition to inorganic fillers, surfactants, and aromatic polymers, the composition may further contain: thixotropy-imparting agents, viscosity regulators, defoamers, silane coupling agents, dehydrating agents, plasticizers, weather-resistant agents, Additives such as oxidizing agent, heat stabilizer, slip agent, antistatic agent, whitening agent, coloring agent, conductive agent, release agent, surface treatment agent, flame retardant, etc.
本組成物之黏度宜為10mPa・s以上,50mPa・s以上較佳。本組成物之黏度宜為10000mPa・s以下,1000mPa・s以下較佳,500mPa・s以下更佳。 本組成物之黏度宜在50~1000mPa・s之範圍內。此時,因本組成物之塗敷性優異,故由本組成物容易形成具有任意厚度之聚合物層等成形物。 本組成物之觸變比宜為1以上。本組成物之觸變比宜為3以下,2以下較佳。此時,本組成物不僅塗敷性優異,其均質性亦優異,故容易形成較細緻之聚合物層等成形物。 The viscosity of this composition should be above 10mPa・s, preferably above 50mPa・s. The viscosity of this composition is preferably below 10000mPa・s, preferably below 1000mPa・s, more preferably below 500mPa・s. The viscosity of this composition should be in the range of 50~1000mPa・s. In this case, since this composition is excellent in applicability, it is easy to form a molded article such as a polymer layer having an arbitrary thickness from this composition. The thixotropic ratio of this composition is preferably 1 or more. The thixotropic ratio of the composition is preferably 3 or less, preferably 2 or less. In this case, this composition is not only excellent in coatability, but also excellent in homogeneity, so it is easy to form molded objects such as finer polymer layers.
本組成物可混合F粒子、本球狀氧化矽及液狀分散介質來製造。 混合方法只要為可均一地混合F粒子、本球狀氧化矽、液狀分散介質及因應需求之其他成分之方法的話,並無特別限制,可舉:(a)一次添加或依序添加各成分而混合之方法、(b)分別預先混合F粒子與液狀分散介質、本球狀氧化矽與液狀分散介質,再進一步將所得之二種混合物混合之方法、(c)預先混合F粒子與本球狀氧化矽作成粉體混合物,再將所得之粉體混合物與液狀分散介質混合之方法等。從所得之本組成物容易成為均質物的觀點來看,宜為上述(b)或(c)之方法。 另外,在使本組成物進一步含有無機填料、界面活性劑、芳香族聚合物及亦可任意添加之其他成分等時,宜在混合液狀分散介質、F粒子及本球狀氧化矽前,預先添加至液狀分散介質。在本組成物包含芳香族聚合物時,亦可以芳香族聚合物之清漆(varnish)型態來與F粒子混合。構成清漆之溶劑可舉N-甲基-2-吡咯啶酮、環己酮、甲苯。 This composition can be produced by mixing F particles, this spherical silicon oxide, and a liquid dispersion medium. The mixing method is not particularly limited as long as it is a method that can uniformly mix the F particles, the present spherical silicon oxide, the liquid dispersion medium, and other components according to the needs. Examples include: (a) adding each component at a time or sequentially And the method of mixing, (b) pre-mixing the F particles and the liquid dispersion medium, the spherical silicon oxide and the liquid dispersion medium respectively, and then further mixing the two obtained mixtures, (c) pre-mixing the F particles and the A method of making the spherical silicon oxide into a powder mixture, and then mixing the obtained powder mixture with a liquid dispersion medium, etc. The method of (b) or (c) above is preferable from the viewpoint that the obtained composition is easily homogeneous. In addition, when making this composition further contain inorganic fillers, surfactants, aromatic polymers, and other components that may be added arbitrarily, it is preferable to pre-mix the liquid dispersion medium, F particles, and the spherical silica before mixing. Add to liquid dispersion medium. When the present composition contains an aromatic polymer, it can also be mixed with F particles in a varnish form of the aromatic polymer. Examples of the solvent constituting the varnish include N-methyl-2-pyrrolidone, cyclohexanone, and toluene.
為了獲得本組成物而使用之混合裝置可舉:具備葉片之攪拌裝置(亨歇爾攪拌機(Henschel mixer)、加壓捏揉機、班布里攪拌機(Banbury mixer)、行星式攪拌機(Planetary mixer)等)、具備介質之磨碎裝置(球磨機、磨碎機、籃式磨機、混砂機(sand mill)、砂研磨機(sand grinder)、動力磨機(dyno-mill)、分散器(dispermat)、SC磨機、釘磨機(spike mill)或攪拌研磨機(agitator mill)等)、及具備其他機構之分散裝置(微細流體均質機(microfluidizer)、奈米化機(nanomizer)、高壓均質機(ultimaizer)、超音波均質機、混合攪拌機(dissolver)、分散機(disper)、高速葉輪、自轉公轉攪拌機(planetary centrifugal mixer)、膠體磨機、薄膜旋轉型高速攪拌機等)。The mixing device used in order to obtain the composition includes: a stirring device equipped with a blade (Henschel mixer, pressurized kneader, Banbury mixer (Banbury mixer), planetary mixer (Planetary mixer), etc. ), milling devices with media (ball mill, attritor, basket mill, sand mill, sand grinder, dyno-mill, disperser , SC mill, spike mill or agitator mill, etc.), and dispersion devices with other mechanisms (microfluidizer, nanomizer, high-pressure homogenizer (ultimaizer, ultrasonic homogenizer, mixer (dissolver), disperser (disper), high-speed impeller, planetary centrifugal mixer, colloid mill, film rotary high-speed mixer, etc.).
又,本組成物之較佳製造方法可舉下述之製造方法:預先將F粒子、本球狀氧化矽及一部分液狀分散介質捏合而獲得捏合物,再進一步將殘餘之液狀分散介質添加至前述捏合物並混合而獲得本組成物。捏合與添加時使用之液狀分散介質可為同種類之液狀分散介質,亦可為不同種類之液狀分散介質。在本組成物進一步包含無機填料、界面活性劑、芳香族聚合物等其他成分時,其他成分可在捏合時混合,亦可在將殘餘之液狀分散介質添加至捏合物時混合。 預先將F粒子、本球狀氧化矽及一部分液狀分散介質捏合時各成分之混合方法可舉例如上述(a)、(b)或(c)之方法。從所得之本組成物容易成為均質物的觀點來看,宜為上述(b)或(c)之方法。 捏合時之混合宜利用行星式攪拌機來進行。行星式攪拌機為具有相互進行自轉與公轉之2軸攪拌葉片的攪拌裝置。添加時之混合宜利用薄膜旋轉型高速攪拌機來進行。薄膜旋轉型高速攪拌機為使F粒子與液狀分散介質沿著圓筒形攪拌槽之內壁面旋轉而呈薄膜狀地展開,一邊使離心力發揮作用一邊混合的攪拌裝置。 In addition, the preferred production method of this composition may include the following production method: knead F particles, this spherical silicon oxide and a part of the liquid dispersion medium in advance to obtain a kneaded product, and then further add the remaining liquid dispersion medium to the aforementioned kneaded mixture and mixed to obtain the present composition. The liquid dispersion medium used for kneading and addition may be the same type of liquid dispersion medium, or may be a different type of liquid dispersion medium. When the composition further includes other components such as inorganic fillers, surfactants, and aromatic polymers, the other components may be mixed during kneading, or may be mixed when adding the remaining liquid dispersion medium to the kneaded mixture. When the F particles, the present spherical silica, and a part of the liquid dispersion medium are kneaded in advance, the mixing method of each component may be, for example, the method of (a), (b) or (c) above. The method of (b) or (c) above is preferable from the viewpoint that the obtained composition is easily homogeneous. Mixing during kneading is preferably carried out using a planetary mixer. A planetary mixer is a stirring device having two shaft stirring blades which rotate and revolve mutually. Mixing at the time of addition is preferably performed using a thin-film rotary type high-speed stirrer. The thin-film rotary high-speed mixer is a stirring device that rotates the F particles and the liquid dispersion medium along the inner wall surface of a cylindrical stirring tank to spread them into a thin film, and mixes them while exerting centrifugal force.
藉由捏合所得之捏合物可為糊狀(黏度為1000~100000mPa・s之糊料等),亦可為濕粉狀(利用毛細管流變儀(Capilograph)測定之黏度為10000~100000Pa・s之濕粉(捏合粉)等)。 另外,利用毛細管流變儀測定之黏度係指使用毛細管長度為10mm、毛細管半徑為1mm之毛細管,令爐體徑為9.55mm、荷重元(load cell)容量為2t,且令溫度為25℃、剪切速率為1s -1來測定之值。 The kneaded product obtained by kneading can be paste (viscosity of 1000~100000mPa・s, etc.), or wet powder (viscosity of 10000~100000Pa・s measured by capillary rheometer (Capilograph) Wet powder (kneading powder), etc.). In addition, the viscosity measured by a capillary rheometer refers to the use of a capillary with a capillary length of 10mm and a capillary radius of 1mm, the furnace body diameter is 9.55mm, the load cell capacity is 2t, and the temperature is 25°C, The shear rate is 1s -1 to determine the value.
本組成物有用於作為用以賦予絕緣性、耐熱性、抗腐蝕性、耐藥品性、耐水性、耐衝擊性、熱傳導性的塗覆材料。 具體而言,本組成物可使用於:印刷配線板、熱介面材料、電源模組用基板、馬達等動力裝置中使用之線圈、汽車引擎、熱交換器、小玻璃瓶(vial bottle)、注射筒(注射器)、安瓿、醫用線材(medical wire)、鋰離子電池等二次電池、鋰電池等一次電池、自由基電池、太陽電池、燃料電池、鋰離子電容器、混合式電容器、電容器(capacitor)、電容(condenser)(鋁電解電容、鉭電解電容等)、電致變色元件、電化學開關元件、電極之黏結劑、電極之隔板、電極(正極、負極)。 又,本組成物係有用於作為接著零件之接著劑。具體而言,本組成物可使用於:陶瓷零件之接著、金屬零件之接著、半導體元件或模組零件之基板中之IC晶片或電阻、電容等電子零件之接著、電路基板與散熱板之接著、LED晶片對基板之接著。 This composition is useful as a coating material for imparting insulation, heat resistance, corrosion resistance, chemical resistance, water resistance, impact resistance, and thermal conductivity. Specifically, this composition can be used in: printed wiring boards, thermal interface materials, substrates for power modules, coils used in power devices such as motors, automotive engines, heat exchangers, vial bottles, injection Cartridges (syringes), ampoules, medical wires, secondary batteries such as lithium-ion batteries, primary batteries such as lithium batteries, radical batteries, solar batteries, fuel cells, lithium-ion capacitors, hybrid capacitors, capacitors ), capacitors (condenser) (aluminum electrolytic capacitors, tantalum electrolytic capacitors, etc.), electrochromic components, electrochemical switching components, electrode binders, electrode separators, electrodes (positive and negative). Also, this composition is useful as an adhesive for bonding parts. Specifically, this composition can be used for: the bonding of ceramic parts, the bonding of metal parts, the bonding of IC chips or electronic components such as resistors and capacitors in the substrate of semiconductor elements or module parts, the bonding of circuit boards and heat sinks , Bonding of LED chip to substrate.
尤其,本組成物係有用於作為印刷配線板,具體而言,係有用於作為用以形成附聚合物層之銅箔中之聚合物層的材料,該附聚合物層之銅箔在銅箔表面具有由本組成物形成之聚合物層。如下表1所示,球狀氧化矽本身原本之電氣特性(尤其是介電正切性)與低線膨脹性優異,惟在附聚合物層之銅箔中之聚合物層中卻難以使所述物性高度地展現。只要使用本組成物,藉由上述作用機制,便可容易地獲得具有聚合物層之附聚合物層之銅箔,該聚合物層具備所述球狀氧化矽物性與F聚合物物性。In particular, this composition is useful as a printed wiring board, specifically, as a material for a polymer layer in a copper foil for forming a polymer layer attached to a copper foil. The surface has a polymer layer formed from the composition. As shown in Table 1 below, spherical silicon oxide itself has excellent electrical properties (especially dielectric tangent) and low linear expansion, but it is difficult to make the polymer layer in the copper foil with the polymer layer attached. The physical properties are highly displayed. As long as the present composition is used, copper foil with a polymer layer attached to the polymer layer can be easily obtained through the above-mentioned mechanism. The polymer layer has the properties of the spherical silicon oxide and the F polymer.
[表1] [Table 1]
本組成物適合作為下述組成物來使用:藉由賦予至基材之至少其中一表面並加熱,來使包含F聚合物及本球狀氧化矽之聚合物層(以下亦表記為「F層」)形成的組成物。 例如,將本組成物賦予基材表面,形成由本組成物所構成之液狀被膜(濕膜),接著加熱而從液狀被膜去除液狀分散介質,而可在前述基材表面上形成包含F聚合物及本球狀氧化矽之聚合物層。 宜進一步燒成所得之聚合物層之F聚合物。只要加熱而燒成F聚合物,便可製造具有基材層與聚合物層之積層體,該聚合物層位在基材層表面並包含經燒成之F聚合物及本球狀氧化矽。另外,可連續地進行用以去除液狀介質之加熱與用以燒成F聚合物之加熱。 This composition is suitable for use as the following composition: by applying to at least one of the surfaces of the base material and heating, the polymer layer (hereinafter also referred to as "F layer") comprising the F polymer and the present spherical silicon oxide is suitably used. ”) formed composition. For example, this composition is given to the surface of the substrate to form a liquid film (wet film) composed of this composition, and then heated to remove the liquid dispersion medium from the liquid film, and the composition containing F can be formed on the surface of the substrate. Polymer and the polymer layer of the spherical silica. It is preferable to further calcinate the F polymer of the obtained polymer layer. As long as the F polymer is fired by heating, a laminate having a substrate layer and a polymer layer can be manufactured. The polymer layer is located on the surface of the substrate layer and includes the fired F polymer and the spherical silicon oxide. In addition, the heating for removing the liquid medium and the heating for firing the F polymer can be performed continuously.
基材可舉:銅、鎳、鋁、鈦及該等之合金等金屬箔等金屬基板;以四氟乙烯系聚合物、聚醯亞胺、聚芳酯、聚碸、聚烯丙基碸(polyallyl sulfone)、聚醯胺、聚醚醯胺、聚苯硫醚、聚烯丙基醚酮、聚醯胺醯亞胺、液晶性聚酯、液晶性聚酯醯胺等耐熱性樹脂構成之耐熱性樹脂膜;屬纖維強化樹脂基板之前驅物的預浸體;碳化矽、氮化鋁、氮化矽等陶瓷基板;及玻璃基板。 基材之形狀可舉平面狀、曲面狀、凹凸狀。又,基材之形狀可為箔狀、板狀、膜狀、纖維狀中之任一者。 Substrates include metal substrates such as copper, nickel, aluminum, titanium and their alloys and other metal foils; tetrafluoroethylene-based polymers, polyimides, polyarylates, polystyrene, polyallyl foil ( Polyallyl sulfone), polyamide, polyetheramide, polyphenylene sulfide, polyallyl ether ketone, polyamide imide, liquid crystalline polyester, liquid crystalline polyester amide and other heat resistant resins Resin films; prepregs that are precursors of fiber-reinforced resin substrates; ceramic substrates such as silicon carbide, aluminum nitride, and silicon nitride; and glass substrates. The shape of the substrate can be flat, curved, or concave-convex. In addition, the shape of the base material may be any of foil shape, plate shape, film shape, and fiber shape.
基材表面之十點平均粗度宜小於0.1μm,0.05μm以下較佳。前述十點平均粗度宜為0.001μm以上。即便為所述無粗化基材,只要依據本方法仍可獲得均一性優異之聚合物層,故可獲得剝離強度優異之積層體。另外,基材表面之十點平均度為按JIS B 0601:2013之附錄JA中規定之值。 基材之厚度宜為2~100μm。在基材為金屬箔時,基材之厚度宜為1~35μm。又,基材亦可為隔著剝離層積層於載體銅箔上之極薄銅箔(厚度2~5μm)的附載體之銅箔。在基材為聚醯亞胺膜時,基材之厚度宜為10~50μm。 The ten-point average roughness of the substrate surface should be less than 0.1 μm, preferably less than 0.05 μm. The aforementioned ten-point average roughness is preferably not less than 0.001 μm. Even if it is the said non-roughened base material, as long as the polymer layer excellent in uniformity can be obtained according to this method, the laminated body excellent in peel strength can be obtained. In addition, the ten-point average of the substrate surface is a value specified in Appendix JA of JIS B 0601:2013. The thickness of the base material is preferably 2-100 μm. When the base material is metal foil, the thickness of the base material is preferably 1-35 μm. In addition, the base material may be a copper foil with a carrier, which is an ultra-thin copper foil (thickness 2 to 5 μm) laminated on a carrier copper foil via a release layer. When the base material is a polyimide film, the thickness of the base material is preferably 10-50 μm.
為了使積層體之低線膨脹性與接著性更加提升,基材之最表面亦可進一步進行表面處理。 表面處理之方法可舉:退火處理、電暈處理、電漿處理、臭氧處理、準分子處理、矽烷耦合劑處理。 退火處理之條件宜令溫度為120~180℃、壓力為0.005~0.015MPa、時間為30~120分鐘。 用於電漿處理之氣體可舉:氧氣、氮氣、稀有氣體(氬等)、氫氣、氨氣、乙酸乙烯酯。該等氣體亦可併用2種以上。 In order to further improve the low linear expansion and adhesiveness of the laminate, the outermost surface of the substrate can be further surface treated. Surface treatment methods include: annealing treatment, corona treatment, plasma treatment, ozone treatment, excimer treatment, silane coupling agent treatment. The annealing conditions should be temperature 120~180°C, pressure 0.005~0.015MPa, and time 30~120 minutes. Examples of gases used in plasma treatment include oxygen, nitrogen, rare gases (argon, etc.), hydrogen, ammonia, and vinyl acetate. These gases may be used in combination of two or more.
將本組成物賦予基材表面之方法,只要為可於基材表面形成由本組成物所構成之穩定之液狀被膜(濕膜)的方法即可,可舉塗佈法、液滴吐出法、浸漬法,宜為塗佈法。只要使用塗佈法,便可以簡單之設備有效率地於金屬基板表面形成液狀被膜。 塗佈法可舉:噴塗法、輥塗法、旋塗法、凹版塗佈法、微凹版塗佈法、凹版平板法、刮刀塗佈法、接觸塗佈法、棒塗法、模塗法、噴泉式邁耶繞線棒塗佈(fountain meyer bar)法、狹縫式模塗法。 The method of applying this composition to the surface of the substrate may be any method as long as it can form a stable liquid film (wet film) composed of this composition on the surface of the substrate, and examples include coating methods, droplet discharge methods, The dipping method is preferably a coating method. As long as the coating method is used, a liquid film can be efficiently formed on the surface of the metal substrate with simple equipment. Coating methods include: spray coating, roll coating, spin coating, gravure coating, micro gravure coating, gravure flat plate, doctor blade coating, contact coating, rod coating, die coating, Fountain Meyer bar coating (fountain meyer bar) method, slot die coating method.
F層宜在藉由加熱而從前述液狀被膜(濕膜)去除液狀分散介質後,進一步加熱至高溫燒成聚合物而形成。液狀分散介質之去除溫度宜儘可能為低溫,宜為較液狀分散介質之沸點低50~150℃之溫度。例如在使用了沸點為約200℃之N-甲基-2-吡咯啶酮時,以150℃以下,宜以100~120℃加熱。亦可在除去液狀分散介質之步驟中吹附空氣,藉由風乾來促進液狀分散介質之去除。此時之加熱中,液狀分散介質未必需要完全去除,只要去除直到藉由F粒子堆積所形成之層可維持自支撐膜(Self-supporting film)的程度為止即可。The F layer is preferably formed by heating to a high temperature to burn the polymer after removing the liquid dispersion medium from the liquid film (wet film) by heating. The removal temperature of the liquid dispersion medium should be as low as possible, preferably 50~150°C lower than the boiling point of the liquid dispersion medium. For example, when N-methyl-2-pyrrolidone having a boiling point of about 200°C is used, it should be heated at 150°C or lower, preferably 100 to 120°C. In the step of removing the liquid dispersion medium, air may be blown to facilitate the removal of the liquid dispersion medium by air drying. During the heating at this time, the liquid dispersion medium does not necessarily have to be completely removed, and it is only necessary to remove until the layer formed by the accumulation of F particles can maintain a self-supporting film (Self-supporting film).
去除液狀分散介質後,宜將基材上之聚合物層加熱至F聚合物燒成之溫度區域來形成包含F聚合物之燒成物的F層,例如宜在300~400℃之範圍內燒成F聚合物。F層宜包含F聚合物之燒成物。 各個加熱中之加熱裝置可舉烘箱、通風乾燥爐。裝置中之熱源可為接觸式熱源(熱風、熱板等),亦可為非接觸式熱源(紅外線等)。 各個加熱可在常壓下進行,亦可在減壓下進行。 各個加熱中之氣體環境亦可為空氣環境、非活性氣體(氦氣、氖氣、氬氣、氮氣等)氣體環境中之任一者。 F層是在經過將本組成物賦予基材表面、加熱之步驟而形成。以獲得厚的F層為目的,亦可重複複數次本組成物之賦予與加熱而形成F層。例如,亦可將本組成物賦予基材表面並加熱而形成F層,再進一步將本組成物賦予前述F層之表面並加熱而形成第2層F層。又,在將本組成物賦予基材表面並加熱去除了液狀分散介質之階段中,亦可進一步將本組成物賦予其表面並加熱而形成F層。 After removing the liquid dispersion medium, it is advisable to heat the polymer layer on the substrate to the temperature range where the F polymer is fired to form the F layer containing the fired product of the F polymer, for example, it is preferably in the range of 300~400°C Firing F polymer. The F layer preferably contains a fired product of the F polymer. The heating device in each heating can be an oven and a ventilated drying furnace. The heat source in the device can be a contact heat source (hot air, hot plate, etc.), or a non-contact heat source (infrared rays, etc.). Each heating may be performed under normal pressure or under reduced pressure. The gas environment in each heating can also be any one of air environment, inert gas (helium, neon, argon, nitrogen, etc.) gas environment. The F layer is formed through the steps of applying this composition to the surface of the substrate and heating. For the purpose of obtaining a thick F layer, the application and heating of the present composition may be repeated multiple times to form the F layer. For example, this composition may be applied to the surface of the base material and heated to form the F layer, and further this composition may be applied to the surface of the F layer and heated to form the second layer F layer. In addition, in the step of applying the present composition to the surface of the substrate and heating to remove the liquid dispersion medium, the F layer may be formed by further applying the present composition to the surface and heating.
F層之厚度宜為50μm以上,100μm以上較佳。F層之厚度宜為1000μm以下。即便在F層較厚之情況下,藉由上述作用機制仍可獲得本球狀氧化矽之分散性優異之聚合物層。The thickness of the F layer is preferably at least 50 μm, preferably at least 100 μm. The thickness of the F layer is preferably 1000 μm or less. Even when the F layer is relatively thick, the polymer layer with excellent dispersibility of the spherical silica can still be obtained through the above mechanism.
F層與基材層之剝離強度宜為10N/cm以上,15N/cm以上較佳。上述剝離強度宜為100N/cm以下。 又,F層之拉伸強度宜為5MPa以上,10MPa以上較佳。上述拉伸強度宜為100MPa以下。 只要使用本組成物,便可在不損害F層中F聚合物之物性的情況下,容易地形成如是F層與基材層之剝離強度、及F層之拉伸強度優異之積層體。 The peel strength between the F layer and the substrate layer should be above 10N/cm, preferably above 15N/cm. The aforementioned peel strength is preferably 100 N/cm or less. In addition, the tensile strength of the F layer is preferably 5 MPa or more, preferably 10 MPa or more. The aforementioned tensile strength is preferably 100 MPa or less. By using this composition, it is possible to easily form a laminate excellent in the peel strength between the F layer and the substrate layer and the tensile strength of the F layer without impairing the physical properties of the F polymer in the F layer.
本組成物可僅賦予至基材之其中一表面,亦可賦予至基材之兩面。前者的情況下,可獲得具有基材層、及位在所述基材層單個表面之F層的積層體,後者的情況下,可獲得具有基材層、及位在所述基材層兩個表面之F層的積層體。 積層體之較佳具體例可舉:具有金屬箔、及位在該金屬箔至少其中一表面之F層的金屬包層積層體;具有聚醯亞胺膜、及位在該聚醯亞胺膜兩個表面之F層的多層膜。該等積層體由於電氣特性等諸物性優異,故適合作為印刷基板材料等,可使用於可撓性印刷基板或剛性印刷基板之製造。 The composition may be applied to only one surface of the substrate, or may be applied to both surfaces of the substrate. In the former case, a laminate having a substrate layer and an F layer located on a single surface of the substrate layer can be obtained, and in the latter case, a laminate having a substrate layer and an F layer positioned on both surfaces of the substrate layer can be obtained. A laminate of F layers on the surface. A preferred specific example of the laminate can be mentioned: a metal clad laminate having a metal foil and an F layer positioned on at least one surface of the metal foil; Multilayer film of F layers on both surfaces. Since these laminates are excellent in various physical properties such as electrical characteristics, they are suitable as materials for printed circuit boards and the like, and can be used in the manufacture of flexible printed circuit boards or rigid printed circuit boards.
亦可進一步在積層體之最表面積層其他基板。 其他基板可舉:金屬基板、耐熱性樹脂膜、屬纖維強化樹脂板之前驅物的預浸體、具有耐熱性樹脂膜層之積層體、具有預浸體層之積層體。金屬基板可舉上述金屬基板。耐熱性樹脂膜為包含1種以上之耐熱性樹脂之膜,耐熱性樹脂可舉上述樹脂。 進而,亦可從積層體去除基材。此時,可獲得由單獨之F層所構成之膜。 Other substrates may be further laminated on the outermost surface of the laminate. Examples of other substrates include metal substrates, heat-resistant resin films, prepregs that are precursors of fiber-reinforced resin boards, laminates with heat-resistant resin films, and laminates with prepreg layers. Examples of the metal substrate include the above-mentioned metal substrates. The heat-resistant resin film is a film containing one or more heat-resistant resins, and examples of the heat-resistant resin include the above-mentioned resins. Furthermore, the base material can also be removed from a laminated body. In this case, a film composed of a single F layer can be obtained.
積層體、積層體與其他基材之積層物及由F層所構成之膜係有用於作為天線零件、印刷基板、飛機用零件、汽車用零件、運動器材、食品工業用品、塗料、化妝品等。 具體而言,亦可適合作為以下例子來使用:電線被覆材(飛機用電線等)、電動汽車等之馬達等所使用的漆包線被覆材、電絕緣帶、鑽油用絕緣帶、印刷基板用材料、分離膜(精密過濾膜、超過濾膜、逆滲透膜、離子交換膜、透析膜、氣體滲透膜等)、電極黏結劑(鋰二次電池用、燃料電池用等)、複印滾筒(copy roll)、家具、汽車用儀表板、家電製品等之殼罩、滑動構件(荷重軸承、滑移軸、閥、培林(bearing)、軸襯、封件、推力墊圈、耐磨件、活塞、滑動開關、齒輪、凸輪、帶式輸送機、食品輸送帶等)、耐磨墊、耐磨條、管形燈、測試插座、晶圓導件、離心泵之磨損零件、烴/藥品及水供給泵、工具(鏟子、銼刀、錐子、鋸子等)、鍋爐、加料漏斗(hopper)、管件、烘箱、烤模、滑槽(chute)、模具、便器、容器被覆材、功率元件、電晶體、閘流體、換向器、變壓器、功率MOS FET、CPU、散熱片、金屬散熱器、風車或風力發電設備或飛機等之葉片、汽車適用之散熱基板、無線通訊裝置(例如,國際公開第2020/008691號與國際公開第2020/031419號中記載之無線通訊裝置)之散熱構件。 Laminates, laminates of laminates and other substrates, and films composed of F layers are used as antenna parts, printed substrates, aircraft parts, automotive parts, sports equipment, food industry supplies, paints, cosmetics, etc. Specifically, it can also be suitably used as the following examples: wire covering materials (aircraft wires, etc.), enameled wire covering materials used in motors such as electric vehicles, electrical insulating tapes, insulating tapes for oil drilling, materials for printed circuit boards , separation membrane (precision filtration membrane, ultrafiltration membrane, reverse osmosis membrane, ion exchange membrane, dialysis membrane, gas permeation membrane, etc.), electrode binder (for lithium secondary battery, fuel cell, etc.), copy roll (copy roll ), furniture, automotive dashboards, housings for home appliances, sliding components (load bearings, sliding shafts, valves, bearings, bushings, seals, thrust washers, wear-resistant parts, pistons, sliding Switches, gears, cams, belt conveyors, food conveyor belts, etc.), wear pads, wear strips, tube lights, test sockets, wafer guides, wear parts of centrifugal pumps, hydrocarbon/pharmaceutical and water supply pumps , tools (shovels, files, awls, saws, etc.), boilers, hoppers, pipe fittings, ovens, baking molds, chutes, molds, toilets, container covering materials, power components, transistors, thyristors , commutators, transformers, power MOS FETs, CPUs, heat sinks, metal radiators, blades of windmills or wind power generation equipment or aircraft, heat dissipation substrates for automobiles, wireless communication devices (for example, International Publication No. 2020/008691 and the heat dissipation member of the wireless communication device described in International Publication No. 2020/031419).
以上,針對本組成物、本組成物之製造方法、具有由本組成物形成之聚合物層之積層體之製造方法、及該積層體進行了說明,惟本發明不受上述實施形態之構成所限定。 例如,本組成物及前述積層體在上述實施形態構成中可追加其他任意構成,亦可與可發揮相同功能之任意構成置換。又本組成物之製造方法、及前述積層體之製造方法在上述實施形態構成中可追加具有其他任意步驟,亦可與產生相同作用之任意步驟置換。 實施例 The composition, the method for producing the composition, the method for producing a laminate having a polymer layer formed of the composition, and the laminate have been described above, but the present invention is not limited to the configurations of the above embodiments. . For example, this composition and the above-mentioned laminate may add other arbitrary structures to the structure of the above-mentioned embodiment, and may replace it with the arbitrary structure which can exhibit the same function. In addition, the manufacturing method of this composition and the manufacturing method of the said laminated body may add other arbitrary steps in the structure of the said embodiment, and may replace with the arbitrary steps which produce the same effect. Example
以下,藉由實施例詳細說明本發明,惟本發明不受該等所限定。 1.各成分之準備 [F粒子] F粒子1:由F聚合物1所構成之粒子(D50:2.1μm),該F聚合物1以97.9莫耳%、0.1莫耳%、2.0莫耳%依序包含TFE單元、NAH單元及PPVE單元,含氟量為76質量%,且相對於每主鏈碳數1×10 6個具有1000個含羰基之基。 F粒子2:由F聚合物2所構成之粒子(D50:2.5μm),該F聚合物2以97.5莫耳%、2.5莫耳%依序包含TFE單元及PPVE單元,含氟量為76質量%,且相對於每主鏈碳數1×10 6個,含羰基之基小於25個。 [球狀氧化矽] 球狀氧化矽1:將經濕式法製造之氧化矽粉末(AGC Si-Tech公司製「H-31」,中值粒徑d=3.5μm,Ti含量300ppm)在1300℃下加熱處理1小時後之球狀氧化矽粉末(中值粒徑d=3μm,比表面積1.3m 2/g) 球狀氧化矽2:經VMC法製造之從原料氧化矽製造之球狀氧化矽(Admatechs公司製「SC-04」,中值粒徑d=1.5μm,比表面積4.5m 2/g,Ti含量28ppm) 球狀氧化矽3:中值粒徑d=0.6μm、比表面積6.2m 2/g之球狀氧化矽 [液狀分散介質] NMP:N-甲基吡咯啶酮 [界面活性劑] 界面活性劑1:非離子性界面活性劑(Ftergent710FL) Hereinafter, the present invention will be described in detail by means of examples, but the present invention is not limited thereto. 1. Preparation of each component [F particle] F particle 1: a particle (D50: 2.1 μm) composed of F polymer 1, the F polymer 1 is 97.9 mol%, 0.1 mol%, 2.0 mol% Contains TFE unit, NAH unit and PPVE unit in sequence, fluorine content is 76% by mass, and has 1000 carbonyl-containing groups relative to 1×10 6 carbons per main chain. F particle 2: a particle (D50: 2.5 μm) composed of F polymer 2, the F polymer 2 contains TFE unit and PPVE unit in order of 97.5 mole % and 2.5 mole %, and the fluorine content is 76 mass %, and relative to 1×10 6 carbons per main chain, the number of carbonyl-containing groups is less than 25. [Spherical silica] Spherical silica 1: Silica powder ("H-31" manufactured by AGC Si-Tech Co., Ltd., median diameter d = 3.5 μm, Ti content 300 ppm) produced by a wet method was prepared at 1300 Spherical silicon oxide powder after heat treatment at ℃ for 1 hour (median particle size d=3μm, specific surface area 1.3m 2 /g) Spherical silicon oxide 2: Spherical silicon oxide produced from raw material silicon oxide by VMC method Silicon ("SC-04" manufactured by Admatechs Co., Ltd., median particle size d=1.5 μm, specific surface area 4.5 m 2 /g, Ti content 28 ppm) spherical silicon oxide 3: median particle size d=0.6 μm, specific surface area 6.2 m 2 /g of spherical silica [liquid dispersion medium] NMP: N-methylpyrrolidone [surfactant] Surfactant 1: non-ionic surfactant (Ftergent710FL)
2.液狀組成物之製造例 [例1] 以自轉公轉攪拌機(脫泡練太郎,THINKY公司製)將25質量份之F粒子1、50質量份之球狀氧化矽1、5質量份之界面活性劑1及20質量份之NMP捏合而獲得糊狀之捏合物,再進一步將55質量份之NMP添加至該捏合物並以2000rpm攪拌5分鐘,而獲得液狀組成物1。所得之液狀組成物1之黏度小於100mPa・s。 [例2] 除了使用50質量份之球狀氧化矽2來取代50質量份之球狀氧化矽1以外,以與例1相同之方式而獲得液狀組成物2。所得之液狀組成物2之黏度大於100mPa・s。 [例3] 除了使用50質量份之球狀氧化矽3來取代50質量份之球狀氧化矽1以外,以與例1相同之方式而獲得液狀組成物3。所得之液狀組成物3之黏度大於100mPa・s。 [例4] 除了使用25質量份之F粒子2來取代25質量份之F粒子1以外,以與例1相同之方式而獲得液狀組成物液狀組成物4。所得之液狀組成物4之黏度小於100mPa・s。 2. Production example of liquid composition [example 1] Obtained by kneading 25 parts by mass of F particles 1, 50 parts by mass of spherical silicon oxide 1, 5 parts by mass of surfactant 1, and 20 parts by mass of NMP with a self-rotating and revolving mixer (defoaming Rentaro, manufactured by THINKY Co., Ltd.) 55 parts by mass of NMP was further added to the pasty kneaded mixture and stirred at 2000 rpm for 5 minutes to obtain a liquid composition 1 . The viscosity of the obtained liquid composition 1 is less than 100mPa・s. [Example 2] Liquid composition 2 was obtained in the same manner as in Example 1 except that 50 parts by mass of spherical silicon oxide 2 was used instead of 50 parts by mass of spherical silicon oxide 1 . The viscosity of the obtained liquid composition 2 is greater than 100 mPa·s. [Example 3] Liquid composition 3 was obtained in the same manner as in Example 1, except that 50 parts by mass of spherical silicon oxide 3 was used instead of 50 parts by mass of spherical silicon oxide 1 . The viscosity of the obtained liquid composition 3 is greater than 100 mPa·s. [Example 4] Liquid composition Liquid composition 4 was obtained in the same manner as in Example 1, except that 25 parts by mass of F particle 2 was used instead of 25 parts by mass of F particle 1 . The viscosity of the obtained liquid composition 4 is less than 100mPa·s.
3.積層體之製造例 [例4] 在銅箔(厚度:18μm)表面塗佈液狀組成物1而形成濕膜。接著,將形成有該濕膜之金屬箔在120℃下通過乾燥爐5分鐘,藉由加熱使其乾燥而獲得乾膜。之後,在氮氣烘箱中將乾膜在380℃下加熱3分鐘。藉此,製造附聚合物層之銅箔即積層體1,該附聚合物層之銅箔具有銅箔、及作為成形物之聚合物層(厚度:50μm),該聚合物層位在銅箔表面並包含F聚合物及球狀氧化矽1。 [例5~7] 除了變更使用之液狀組成物以外,以與例4相同之方式分別由液狀組成物2獲得積層體2(例5),由液狀組成物3獲得積層體3(例6),由液狀組成物4獲得積層體4(例7)。 3. Manufacturing example of laminated body [Example 4] The liquid composition 1 was applied on the surface of copper foil (thickness: 18 μm) to form a wet film. Next, the metal foil on which the wet film was formed was passed through a drying oven at 120° C. for 5 minutes, and dried by heating to obtain a dry film. Afterwards, the dry film was heated at 380° C. for 3 minutes in a nitrogen oven. In this way, a laminate 1 of copper foil with a polymer layer is produced. The copper foil with a polymer layer has a copper foil and a polymer layer (thickness: 50 μm) as a molded product. The polymer layer is located on the copper foil. The surface also contains F polymer and spherical silicon oxide 1 . [Example 5~7] In the same manner as in Example 4, except for changing the liquid composition used, laminate 2 was obtained from liquid composition 2 (Example 5), laminate 3 was obtained from liquid composition 3 (Example 6), and laminate 3 was obtained from liquid composition 3 (Example 6). Laminated body 4 was obtained from composition 4 (Example 7).
4.評價 4-1.液狀組成物之分散穩定性 將各液狀組成物在25℃下靜置30天後,以目視觀察分散狀態,並依據下述基準來評價長期分散穩定性。將結果示於表2。 <評價基準> 〇:未增黏且未確認到成分沉降 △:雖可確認層分離,但可容易地再分散後,且亦未確認到再分散後之增黏 ×:可確認增黏或成分沉降 4. Evaluation 4-1. Dispersion stability of liquid composition After each liquid composition was left to stand at 25° C. for 30 days, the dispersion state was observed visually, and the long-term dispersion stability was evaluated based on the following criteria. The results are shown in Table 2. <Evaluation criteria> 〇: Viscosity is not increased and component sedimentation is not confirmed △: Although layer separation can be confirmed, it can be easily redispersed, and viscosity increase after redispersion is not confirmed. ×: Viscosity increase or component sedimentation can be confirmed
[表2] [Table 2]
4-2.積層體之評價例 以目視確認各個積層體中聚合物層之表面的結果,其平滑性由高至低依序為積層體1、積層體4、積層體3、積層體2。 又,針對各個積層體以氯化鐵水溶液蝕刻去除其銅箔,而獲得單獨之聚合物層,裁切出180mm四方的四角試驗片,依據JIS C 6471:1995中規定之線膨脹係數之測定方法來測定線膨脹係數的結果,線膨脹係數由低至高依序為積層體1之聚合物層、積層體4之聚合物層、積層體3之聚合物層、積層體2之聚合物層。 進而,利用SPDR(Split Post Dielectric Resonator:分離後介電質共振器法,測定頻率:10GHz)測定各個聚合物層之介電正切的結果,積層體1之聚合物層之介電正切為最低。 4-2. Evaluation example of laminated body As a result of visually confirming the surface of the polymer layer in each laminate, the order of smoothness was laminate 1, laminate 4, laminate 3, and laminate 2 in descending order. In addition, for each laminate, the copper foil was removed by etching with an aqueous solution of ferric chloride to obtain a separate polymer layer, and a 180 mm square test piece was cut out, and the linear expansion coefficient was measured according to JIS C 6471: 1995. As a result of measuring the linear expansion coefficient, the order of the linear expansion coefficient from low to high is the polymer layer of laminate 1, the polymer layer of laminate 4, the polymer layer of laminate 3, and the polymer layer of laminate 2. Furthermore, as a result of measuring the dielectric tangent of each polymer layer by SPDR (Split Post Dielectric Resonator: split post dielectric resonator method, measurement frequency: 10 GHz), the dielectric tangent of the polymer layer of laminate 1 is the lowest.
4.膜之製造例 [例8] 除了令作為成形物之聚合物層之厚度為150μm以外,以與例4相同之方式由各個液狀組成物製造附聚合物層之銅箔,再進一步蝕刻去除銅箔,而製造單獨之膜。所得之膜的表面平滑性以由液狀組成物1形成之膜為最高。 4. Example of film production [Example 8] Except that the thickness of the polymer layer as a molding was 150 μm, copper foil with a polymer layer was produced from each liquid composition in the same manner as in Example 4, and the copper foil was further etched away to produce a separate film. The surface smoothness of the obtained film was the highest for the film formed from the liquid composition 1.
產業上之可利用性 根據本發明,可獲得一種均一性及分散穩定性優異且為低黏性之液狀組成物。由該液狀組成物所得之積層體之低介電正切等電氣特性優異,例如可適合作為印刷配線基板之材料來使用。 另外,在此引用2021年11月30日提申之日本專利申請案2021-193907號之說明書、申請專利範圍及摘要之所有內容,並納入作為本發明說明書之揭示。 Industrial availability According to the present invention, a liquid composition with excellent uniformity and dispersion stability and low viscosity can be obtained. A laminate obtained from this liquid composition has excellent electrical properties such as low dielectric tangent, and can be suitably used as a material for a printed wiring board, for example. In addition, all contents of the specification, scope of claims and abstract of Japanese Patent Application No. 2021-193907 filed on November 30, 2021 are cited here, and incorporated as the disclosure of the specification of the present invention.
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