TW202126741A - Prepregs, prepregs with metal foils, laminates, metal-clad laminates, and printed circuit boards - Google Patents
Prepregs, prepregs with metal foils, laminates, metal-clad laminates, and printed circuit boards Download PDFInfo
- Publication number
- TW202126741A TW202126741A TW109130091A TW109130091A TW202126741A TW 202126741 A TW202126741 A TW 202126741A TW 109130091 A TW109130091 A TW 109130091A TW 109130091 A TW109130091 A TW 109130091A TW 202126741 A TW202126741 A TW 202126741A
- Authority
- TW
- Taiwan
- Prior art keywords
- resin
- phase
- prepreg
- component
- resin composition
- Prior art date
Links
- 239000011888 foil Substances 0.000 title claims description 50
- 229910052751 metal Inorganic materials 0.000 title claims description 46
- 239000002184 metal Substances 0.000 title claims description 46
- 239000011342 resin composition Substances 0.000 claims abstract description 54
- 229920005989 resin Polymers 0.000 claims abstract description 45
- 239000011347 resin Substances 0.000 claims abstract description 45
- 229920000058 polyacrylate Polymers 0.000 claims abstract description 36
- 239000000945 filler Substances 0.000 claims abstract description 22
- 238000005191 phase separation Methods 0.000 claims abstract description 20
- 229920001187 thermosetting polymer Polymers 0.000 claims abstract description 15
- 239000003822 epoxy resin Substances 0.000 claims description 54
- 229920000647 polyepoxide Polymers 0.000 claims description 54
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 27
- 239000002245 particle Substances 0.000 claims description 18
- 125000003700 epoxy group Chemical group 0.000 claims description 17
- 238000002156 mixing Methods 0.000 claims description 16
- 239000005011 phenolic resin Substances 0.000 claims description 16
- 239000000377 silicon dioxide Substances 0.000 claims description 11
- 230000008878 coupling Effects 0.000 claims description 8
- 238000010168 coupling process Methods 0.000 claims description 8
- 238000005859 coupling reaction Methods 0.000 claims description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- 239000004593 Epoxy Substances 0.000 claims description 4
- 238000010030 laminating Methods 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 24
- 239000002966 varnish Substances 0.000 description 20
- 239000011889 copper foil Substances 0.000 description 17
- 238000009413 insulation Methods 0.000 description 16
- 229920003986 novolac Polymers 0.000 description 14
- 239000000463 material Substances 0.000 description 13
- 125000000217 alkyl group Chemical group 0.000 description 12
- 239000002131 composite material Substances 0.000 description 11
- 125000000524 functional group Chemical group 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 11
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 238000001723 curing Methods 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 7
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 7
- 239000000853 adhesive Substances 0.000 description 7
- 230000001070 adhesive effect Effects 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 239000004744 fabric Substances 0.000 description 6
- 238000000465 moulding Methods 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 229910001128 Sn alloy Inorganic materials 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 229930003836 cresol Natural products 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- 238000010292 electrical insulation Methods 0.000 description 4
- 238000000635 electron micrograph Methods 0.000 description 4
- 230000009477 glass transition Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 238000003825 pressing Methods 0.000 description 4
- -1 that is Polymers 0.000 description 4
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 3
- FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 239000004305 biphenyl Substances 0.000 description 3
- 235000010290 biphenyl Nutrition 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 210000000887 face Anatomy 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 125000002560 nitrile group Chemical group 0.000 description 3
- 239000004848 polyfunctional curative Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000007870 radical polymerization initiator Substances 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical group C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical group C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- 239000004643 cyanate ester Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- CLDVQCMGOSGNIW-UHFFFAOYSA-N nickel tin Chemical compound [Ni].[Sn] CLDVQCMGOSGNIW-UHFFFAOYSA-N 0.000 description 2
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 2
- 229920003192 poly(bis maleimide) Polymers 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- BOJZPUPAXYETRK-UHFFFAOYSA-N 1,1-diphenylethane-1,2-diamine Chemical compound C=1C=CC=CC=1C(N)(CN)C1=CC=CC=C1 BOJZPUPAXYETRK-UHFFFAOYSA-N 0.000 description 1
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 description 1
- LGJCFVYMIJLQJO-UHFFFAOYSA-N 1-dodecylperoxydodecane Chemical compound CCCCCCCCCCCCOOCCCCCCCCCCCC LGJCFVYMIJLQJO-UHFFFAOYSA-N 0.000 description 1
- BHAYFXKTLWGHHO-UHFFFAOYSA-N 1-ethenylpyrrolidin-2-one;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.C=CN1CCCC1=O BHAYFXKTLWGHHO-UHFFFAOYSA-N 0.000 description 1
- GUQJTTJZPGRWIK-UHFFFAOYSA-N 1-ethenylpyrrolidin-2-one;prop-2-enoic acid Chemical compound OC(=O)C=C.C=CN1CCCC1=O GUQJTTJZPGRWIK-UHFFFAOYSA-N 0.000 description 1
- AKUNSTOMHUXJOZ-UHFFFAOYSA-N 1-hydroperoxybutane Chemical group CCCCOO AKUNSTOMHUXJOZ-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- OWEGMIWEEQEYGQ-UHFFFAOYSA-N 100676-05-9 Natural products OC1C(O)C(O)C(CO)OC1OCC1C(O)C(O)C(O)C(OC2C(OC(O)C(O)C2O)CO)O1 OWEGMIWEEQEYGQ-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- BJELTSYBAHKXRW-UHFFFAOYSA-N 2,4,6-triallyloxy-1,3,5-triazine Chemical compound C=CCOC1=NC(OCC=C)=NC(OCC=C)=N1 BJELTSYBAHKXRW-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical group C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- XYVAYAJYLWYJJN-UHFFFAOYSA-N 2-(2-propoxypropoxy)propan-1-ol Chemical compound CCCOC(C)COC(C)CO XYVAYAJYLWYJJN-UHFFFAOYSA-N 0.000 description 1
- KUBDPQJOLOUJRM-UHFFFAOYSA-N 2-(chloromethyl)oxirane;4-[2-(4-hydroxyphenyl)propan-2-yl]phenol Chemical compound ClCC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 KUBDPQJOLOUJRM-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- DICULBYFSUXYAH-UHFFFAOYSA-N 2-hydroxyethyl 2-methylprop-2-enoate;methyl 2-methylprop-2-enoate Chemical compound COC(=O)C(C)=C.CC(=C)C(=O)OCCO DICULBYFSUXYAH-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- YXYJVFYWCLAXHO-UHFFFAOYSA-N 2-methoxyethyl 2-methylprop-2-enoate Chemical compound COCCOC(=O)C(C)=C YXYJVFYWCLAXHO-UHFFFAOYSA-N 0.000 description 1
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 1
- HFCUBKYHMMPGBY-UHFFFAOYSA-N 2-methoxyethyl prop-2-enoate Chemical compound COCCOC(=O)C=C HFCUBKYHMMPGBY-UHFFFAOYSA-N 0.000 description 1
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- SESYNEDUKZDRJL-UHFFFAOYSA-N 3-(2-methylimidazol-1-yl)propanenitrile Chemical compound CC1=NC=CN1CCC#N SESYNEDUKZDRJL-UHFFFAOYSA-N 0.000 description 1
- BVYPJEBKDLFIDL-UHFFFAOYSA-N 3-(2-phenylimidazol-1-yl)propanenitrile Chemical compound N#CCCN1C=CN=C1C1=CC=CC=C1 BVYPJEBKDLFIDL-UHFFFAOYSA-N 0.000 description 1
- SZUPZARBRLCVCB-UHFFFAOYSA-N 3-(2-undecylimidazol-1-yl)propanenitrile Chemical compound CCCCCCCCCCCC1=NC=CN1CCC#N SZUPZARBRLCVCB-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- LDMRLRNXHLPZJN-UHFFFAOYSA-N 3-propoxypropan-1-ol Chemical compound CCCOCCCO LDMRLRNXHLPZJN-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 1
- JTHZUSWLNCPZLX-UHFFFAOYSA-N 6-fluoro-3-methyl-2h-indazole Chemical compound FC1=CC=C2C(C)=NNC2=C1 JTHZUSWLNCPZLX-UHFFFAOYSA-N 0.000 description 1
- COCLLEMEIJQBAG-UHFFFAOYSA-N 8-methylnonyl 2-methylprop-2-enoate Chemical compound CC(C)CCCCCCCOC(=O)C(C)=C COCLLEMEIJQBAG-UHFFFAOYSA-N 0.000 description 1
- LVGFPWDANALGOY-UHFFFAOYSA-N 8-methylnonyl prop-2-enoate Chemical compound CC(C)CCCCCCCOC(=O)C=C LVGFPWDANALGOY-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical class OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- GUBGYTABKSRVRQ-PICCSMPSSA-N Maltose Natural products O[C@@H]1[C@@H](O)[C@H](O)[C@@H](CO)O[C@@H]1O[C@@H]1[C@@H](CO)OC(O)[C@H](O)[C@H]1O GUBGYTABKSRVRQ-PICCSMPSSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- IAXXETNIOYFMLW-COPLHBTASA-N [(1s,3s,4s)-4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl] 2-methylprop-2-enoate Chemical compound C1C[C@]2(C)[C@@H](OC(=O)C(=C)C)C[C@H]1C2(C)C IAXXETNIOYFMLW-COPLHBTASA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- UFZOLVFGAOAEHD-UHFFFAOYSA-N benzaldehyde;phenol Chemical compound OC1=CC=CC=C1.O=CC1=CC=CC=C1 UFZOLVFGAOAEHD-UHFFFAOYSA-N 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- KQNZLOUWXSAZGD-UHFFFAOYSA-N benzylperoxymethylbenzene Chemical compound C=1C=CC=CC=1COOCC1=CC=CC=C1 KQNZLOUWXSAZGD-UHFFFAOYSA-N 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229920006026 co-polymeric resin Polymers 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 239000000805 composite resin Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- GPKFMIVTEHMOBH-UHFFFAOYSA-N cumene;hydrate Chemical compound O.CC(C)C1=CC=CC=C1 GPKFMIVTEHMOBH-UHFFFAOYSA-N 0.000 description 1
- MRIZMKJLUDDMHF-UHFFFAOYSA-N cumene;hydrogen peroxide Chemical class OO.CC(C)C1=CC=CC=C1 MRIZMKJLUDDMHF-UHFFFAOYSA-N 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- 239000013530 defoamer Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical group CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000004845 glycidylamine epoxy resin Substances 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- LNCPIMCVTKXXOY-UHFFFAOYSA-N hexyl 2-methylprop-2-enoate Chemical compound CCCCCCOC(=O)C(C)=C LNCPIMCVTKXXOY-UHFFFAOYSA-N 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 238000005040 ion trap Methods 0.000 description 1
- 229940119545 isobornyl methacrylate Drugs 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 150000008442 polyphenolic compounds Chemical class 0.000 description 1
- 235000013824 polyphenols Nutrition 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical compound C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000036632 reaction speed Effects 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 238000000790 scattering method Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Landscapes
- Reinforced Plastic Materials (AREA)
- Laminated Bodies (AREA)
Abstract
Description
本發明是有關一種預浸體、附有金屬箔之預浸體、積層板、覆金屬積層板及印刷電路基板。 The present invention relates to a prepreg, a prepreg with metal foil, a laminated board, a metal-clad laminated board, and a printed circuit board.
隨著資訊電子機器急速普及,電子機器的小型化及薄型化正在逐漸進展,且亦越來越要求對其中所裝載的印刷電路基板進行高密度化、高機能化。 With the rapid spread of information electronic equipment, the miniaturization and thinning of electronic equipment is gradually progressing, and there is an increasing demand for high-density and high-performance printed circuit boards mounted therein.
由於使作為基材之玻璃布的厚度更薄,例如使厚度成為30μm以下,即能夠更佳地達成印刷電路基板的高密度化,故最近正在開發且市面上開始販售具備這樣的玻璃布之預浸體。藉此,雖然印刷電路基板的高密度化逐漸進展,但會伴隨著難以確保印刷電路基板的充分的耐熱性、絕緣可靠性、及其中的線路層與絕緣層之間的黏著性等。 Since the thickness of the glass cloth as the base material is made thinner, for example, the thickness is 30μm or less, that is, the high density of the printed circuit board can be better achieved. Prepreg. As a result, although the density of printed circuit boards has gradually progressed, it is accompanied by difficulties in ensuring sufficient heat resistance, insulation reliability, and adhesion between the circuit layer and the insulating layer of the printed circuit boards.
目前對於這樣的高機能印刷電路基板中所使用的線路板材料,要求耐熱性、電絕緣性、長期可靠性及黏著性等。此外,此等高機能印刷電路基板中的一種,可舉例如可撓性的線路板材料,對於該可撓性的線路板材料,除了要求上述特性以外,亦要求低彈性。 At present, the circuit board materials used in such high-performance printed circuit boards are required to have heat resistance, electrical insulation, long-term reliability, and adhesion. In addition, one of these high-performance printed circuit boards includes, for example, a flexible circuit board material. In addition to the above-mentioned characteristics, the flexible circuit board material is also required to have low elasticity.
進一步,裝載有陶瓷零件之印刷電路基板中,有零件連接可靠性之問題,該問題是因下述原因而發生:陶瓷零件與印刷電路基板之間的熱膨脹係數的差異、及外部撞擊。作為此問題的解決方法,可舉例如:從印刷電路基板側進行應力鬆弛。 Furthermore, in the printed circuit board mounted with ceramic parts, there is a problem in the reliability of the connection of the parts, and this problem occurs due to the difference in the thermal expansion coefficient between the ceramic part and the printed circuit board, and external impact. As a solution to this problem, for example, stress relaxation is performed from the side of the printed circuit board.
作為滿足此等要求的線路板材料,已提出例如一種樹脂組成物,其是在使交聯性官能基進行共聚而成之高分子丙烯酸系聚合物中調配熱硬化性樹脂而成,該高分子丙烯酸系聚合物為丙烯腈-丁二烯系樹脂、含羧基之丙烯腈-丁二烯系樹脂等(例如參照專利文獻1~3)。 As a circuit board material that meets these requirements, for example, a resin composition has been proposed in which a polymer acrylic polymer obtained by copolymerizing a crosslinkable functional group is blended with a thermosetting resin. The acrylic polymer is an acrylonitrile-butadiene-based resin, a carboxyl group-containing acrylonitrile-butadiene-based resin, etc. (for example, refer to Patent Documents 1 to 3).
[先前技術文獻] [Prior Technical Literature]
(專利文獻) (Patent Document)
專利文獻1:日本特開平8-283535號公報 Patent Document 1: Japanese Patent Application Laid-Open No. 8-283535
專利文獻2:日本特開2002-134907號公報 Patent Document 2: Japanese Patent Laid-Open No. 2002-134907
專利文獻3:日本特開2002-371190號公報 Patent Document 3: Japanese Patent Laid-Open No. 2002-371190
將高分子丙烯酸系聚合物(其是使交聯性官能基進行共聚而成)與熱硬化性樹脂混合而成之聚丙烯酸酯環氧樹脂,其結構宛如是在相互連結並有規則地分散的狀態下,且高分子丙烯酸系聚合物的海相與環氧樹脂的島相會形成相分離結構,該海相的主成分為高分子丙烯 酸系聚合物,該島相的主成分為聚丙烯酸酯環氧樹脂。形成相分離結構且含有高分子丙烯酸系聚合物與聚丙烯酸酯環氧樹脂之樹脂組成物,雖期望兼具高分子丙烯酸系聚合物與環氧樹脂雙方的優異特徵,但尚無充分兼具雙方的優異特徵者。 A polyacrylate epoxy resin made by mixing a high molecular acrylic polymer (which is a crosslinkable functional group copolymerized) and a thermosetting resin. Its structure seems to be interconnected and regularly dispersed In the state, and the sea phase of the high molecular acrylic polymer and the island phase of the epoxy resin will form a phase separation structure, the main component of the sea phase is the high molecular propylene Acid-based polymer, the main component of the island phase is polyacrylate epoxy resin. A resin composition that forms a phase-separated structure and contains a high-molecular acrylic polymer and a polyacrylate epoxy resin. Although it is desired to have the excellent characteristics of both high-molecular acrylic polymer and epoxy resin, it has not yet fully achieved both Those with outstanding characteristics.
使交聯性官能基進行共聚而成之高分子丙烯酸系聚合物,其特徵在於:低彈性、延伸率高、及容易加入官能基等。另一方面,熱硬化性樹脂亦即環氧樹脂,其特徵在於:高絕緣可靠性、高耐熱性、及高玻璃轉移溫度(Tg)等。 The high molecular acrylic polymer formed by copolymerization of crosslinkable functional groups is characterized by low elasticity, high elongation, and easy addition of functional groups. On the other hand, the thermosetting resin, that is, epoxy resin, is characterized by high insulation reliability, high heat resistance, and high glass transition temperature (Tg).
當將高分子丙烯酸系聚合物(其是使交聯性官能基進行共聚而成)與環氧樹脂(熱硬化性樹脂)相互均勻混合而具有從外觀上來看是接近相溶的結構時,由於環氧樹脂會以奈米大小來分散在高分子丙烯酸系聚合物的海相的網眼中,故會偏向高分子丙烯酸系聚合物的特性,而無法充分顯現環氧樹脂所具有的高絕緣可靠性、高耐熱性、及高Tg。此外,與金屬箔之間的黏著強度相對較弱之高分子丙烯酸系聚合物的表面積會變大,而絕緣層與金屬箔之間的密合強度會降低。 When the high-molecular acrylic polymer (which is obtained by copolymerizing crosslinkable functional groups) and epoxy resin (thermosetting resin) are uniformly mixed with each other to have a structure that is close to miscible in appearance, Epoxy resin is dispersed in the sea-phase mesh of high molecular acrylic polymer in nanometer size, so it tends to the characteristics of high molecular acrylic polymer, and the high insulation reliability of epoxy resin cannot be fully demonstrated. , High heat resistance, and high Tg. In addition, the surface area of the high molecular acrylic polymer, which has relatively weak adhesive strength with the metal foil, will increase, and the adhesion strength between the insulating layer and the metal foil will decrease.
另一方面,在相分離結構中,當島相的特性較高時,會偏向環氧樹脂的島相的特性,而雖與金屬箔之間的密合強度會提高,但無法充分顯現高分子丙烯酸系聚合物所具有的低彈性及柔軟性。 On the other hand, in the phase separation structure, when the characteristics of the island phase are high, the characteristics of the island phase of the epoxy resin will be biased, and although the adhesion strength with the metal foil will increase, the polymer cannot be fully expressed Acrylic polymers have low elasticity and flexibility.
並且,目前為了賦予強度及耐熱性之目的而正在嘗試導入填料成分,但會導致成分凝集及沉積、樹脂組成物的高彈性化及耐熱性降低,而難以取得平衡。換言之,難以形成一種絕緣層,其充分滿足絕緣可靠性、高耐熱性、柔軟性及低彈性等。 In addition, attempts are currently being made to introduce filler components for the purpose of imparting strength and heat resistance. However, it may cause aggregation and deposition of the components, increase in elasticity of the resin composition, and decrease in heat resistance, making it difficult to achieve a balance. In other words, it is difficult to form an insulating layer that sufficiently satisfies insulation reliability, high heat resistance, flexibility, and low elasticity.
本發明之目的在於提供一種預浸體、附有金屬箔之預浸體、積層板、覆金屬積層板及印刷電路基板,該預浸體的低彈性、絕緣可靠性、耐熱性及與金屬箔之間的黏著性優異。 The object of the present invention is to provide a prepreg, a prepreg with metal foil, a laminate, a metal-clad laminate, and a printed circuit board. The prepreg has low elasticity, insulation reliability, heat resistance, and is compatible with metal foil The adhesion between them is excellent.
本發明是有關下述各事項。 The present invention relates to the following matters.
(1)一種預浸體,其含浸有樹脂組成物,該樹脂組成物的第1相與作為島相的第2相形成相分離結構,且前述島相的平均區域大小為1μm~10μm,並且該樹脂組成物含有(C)填料,其中,該第1相包含(A)丙烯酸系聚合物,該第2相包含(B)熱硬化性樹脂。 (1) A prepreg impregnated with a resin composition, the first phase of the resin composition and the second phase as the island phase form a phase separation structure, and the average domain size of the aforementioned island phase is 1 μm to 10 μm, and The resin composition contains (C) a filler, wherein the first phase contains (A) an acrylic polymer, and the second phase contains (B) a thermosetting resin.
(2)如(1)所述之預浸體,其中,當將前述(A)丙烯酸系聚合物與前述(B)熱硬化性樹脂的總量設為100質量份時,前述(A)丙烯酸系聚合物的調配量為10~70質量份。 (2) The prepreg according to (1), wherein when the total amount of the (A) acrylic polymer and the (B) thermosetting resin is 100 parts by mass, the (A) acrylic The blending amount of the polymer is 10 to 70 parts by mass.
(3)如(1)或(2)所述之預浸體,其中,該樹脂組成物含有(C-1)經耦合處理的填料來作為前述(C)填料。 (3) The prepreg according to (1) or (2), wherein the resin composition contains (C-1) a coupling-treated filler as the aforementioned (C) filler.
(4)如(1)至(3)中任一項所述之預浸體,其中,該樹脂組成物含有(C-2)未經耦合處理的填料來作為前述(C)填料。 (4) The prepreg according to any one of (1) to (3), wherein the resin composition contains (C-2) a filler without coupling treatment as the aforementioned (C) filler.
(5)如(1)至(4)中任一項所述之預浸體,其中,前述(B)熱硬化性樹脂包含(B-1)環氧樹脂與(B-2)酚樹脂。 (5) The prepreg according to any one of (1) to (4), wherein the (B) thermosetting resin includes (B-1) epoxy resin and (B-2) phenol resin.
(6)如(5)所述之預浸體,其中,前述(B-1)環氧樹脂含有在1分子內具有2個以上環氧基之環氧樹脂。 (6) The prepreg according to (5), wherein the (B-1) epoxy resin contains an epoxy resin having two or more epoxy groups in one molecule.
(7)如(5)或(6)所述之預浸體,其中,前述(B-1)環氧樹脂的重量平均分子量為200~1,000。 (7) The prepreg according to (5) or (6), wherein the weight average molecular weight of the (B-1) epoxy resin is 200 to 1,000.
(8)如(5)至(7)中任一項所述之預浸體,其中,前述(B-1)環氧樹脂的環氧當量為150~500。 (8) The prepreg according to any one of (5) to (7), wherein the epoxy equivalent of the (B-1) epoxy resin is 150 to 500.
(9)如(1)至(8)中任一項所述之預浸體,其中,前述(A)丙烯酸系聚合物的重量平均分子量為10,000~1,500,000。 (9) The prepreg according to any one of (1) to (8), wherein the (A) acrylic polymer has a weight average molecular weight of 10,000 to 1,500,000.
(10)如(5)至(9)中任一項所述之預浸體,其中,前述(B-2)酚樹脂含有在1分子內具有2個以上羥基之酚樹脂。 (10) The prepreg according to any one of (5) to (9), wherein the (B-2) phenol resin contains a phenol resin having two or more hydroxyl groups in one molecule.
(11)如(1)至(10)中任一項所述之預浸體,其中,含有氧化矽來作為前述(C)填料。 (11) The prepreg according to any one of (1) to (10), which contains silica as the aforementioned (C) filler.
(12)如(1)至(11)中任一項所述之預浸體,其中,前述(C-2)填料的體積平均粒徑為1.0μm~3.5μm。 (12) The prepreg according to any one of (1) to (11), wherein the volume average particle size of the filler (C-2) is 1.0 μm to 3.5 μm.
(13)一種附有金屬箔之預浸體,其是將(1)至(12)中任一項所述之預浸體與金屬箔積層而成。 (13) A metal foil-attached prepreg formed by laminating the prepreg described in any one of (1) to (12) and metal foil.
(14)一種積層板,其具有複數個(1)至(12)中任一項所述之預浸體。 (14) A laminated board having a plurality of prepregs according to any one of (1) to (12).
(15)一種覆金屬積層板,其是使(14)所述之積層板進一步具有金屬箔而成。 (15) A metal-clad laminated sheet obtained by further comprising the laminated sheet described in (14) with metal foil.
(16)一種印刷電路基板,其是使(14)所述之積層板進一步具有電路而成。 (16) A printed circuit board obtained by further including a circuit in the laminated board described in (14).
根據本發明,能夠提供一種預浸體、附有樹脂之金屬箔、及印刷電路基板,該預浸體的低彈性、絕緣可靠性、耐熱性及與金屬箔之間的黏著性優異。 According to the present invention, it is possible to provide a prepreg, a metal foil with resin, and a printed circuit board, which has low elasticity, insulation reliability, heat resistance, and excellent adhesion to the metal foil.
第1圖是顯示樹脂組成物的相分離結構為連續球狀結構的情形之模型圖。 Figure 1 is a model diagram showing a case where the phase separation structure of the resin composition is a continuous spherical structure.
第2圖是顯示樹脂組成物的相分離結構為海島結構的情形之模型圖。 Figure 2 is a model diagram showing a case where the phase separation structure of the resin composition is a sea-island structure.
第3圖是顯示樹脂組成物的相分離結構為複合分散相結構的情形之模型圖。 Figure 3 is a model diagram showing a case where the phase separation structure of the resin composition is a composite dispersed phase structure.
第4圖是顯示樹脂組成物的相分離結構為共連續相結構的情形之模型圖。 Figure 4 is a model diagram showing a case where the phase separation structure of the resin composition is a co-continuous phase structure.
第5圖是顯示作為本發明中所得的具有海島結構之樹脂組成物的一例的剖面結構之電子顯微鏡照片。 Fig. 5 is an electron micrograph showing a cross-sectional structure as an example of the resin composition having a sea-island structure obtained in the present invention.
第6圖是顯示作為本發明中所得的具有複合分散相結構之樹脂組成物的一例的剖面結構之電子顯微鏡照片。 Fig. 6 is an electron micrograph showing the cross-sectional structure of an example of the resin composition having a composite dispersed phase structure obtained in the present invention.
[實施發明的較佳形態] [Preferable form for implementing the invention]
以下,詳述本發明的一實施形態,但本發明並不受下述實施形態所限定。 Hereinafter, one embodiment of the present invention will be described in detail, but the present invention is not limited to the following embodiments.
(預浸體) (Prepreg)
本發明的實施形態的預浸體,其特徵在於:含浸有樹脂組成物,該樹脂組成物的第1相與作為島相的第2相形成相分離結構,且前述島相的平均區域大小為1μm~10μm,並且該樹脂組成物含有(C)填料(以下稱為「(C)成分」),該第1相包含(A)丙烯酸系聚合物(以下稱為「(A)成分」),該第2相包含(B)熱硬化性樹脂(以下稱為「(B)成分」)。 The prepreg of the embodiment of the present invention is characterized in that it is impregnated with a resin composition, the first phase of the resin composition and the second phase as the island phase form a phase separation structure, and the average domain size of the island phase is 1μm~10μm, and the resin composition contains (C) filler (hereinafter referred to as "(C) component"), and the first phase contains (A) acrylic polymer (hereinafter referred to as "(A) component"), This second phase contains (B) thermosetting resin (hereinafter referred to as "(B) component").
關於(A)成分不形成島相而是形成海相之理由,我們認為其原因如下:在分子量大而相互纏繞較多的(A)成分中,當(B)成分發生相分離時,(A)成分為了成為島相則必須將該相互纏繞或交聯網眼切斷,而不容易成為島相。 Regarding the reason why the component (A) does not form an island phase but a marine phase, we believe that the reason is as follows: in the component (A) which has a large molecular weight and is more entangled with each other, when the component (B) phase separates, (A) In order for the) component to become an island phase, the intertwining or interconnecting eye must be cut off, and it is not easy to become an island phase.
[樹脂組成物] [Resin composition]
[丙烯酸系聚合物:(A)成分] [Acrylic polymer: (A) component]
(A)成分為丙烯酸系聚合物,通常為以(甲基)丙烯酸烷酯作為單體之共聚物。作為共聚物,以使交聯性官能基進行共聚而成之丙烯酸系聚合物為佳。這樣的共聚物一般是藉由下述方式來生成:使(甲基)丙烯酸烷酯與具有交聯性官能基之共聚單體進行共聚。作為具有交聯性官能基之共聚單體,只要為能夠與(甲基)丙烯酸烷酯進行共聚之化合物,則無特別限制;作為交聯性官能基,以具有環氧基為佳,以具有縮水甘油基較佳。作為具有交聯性官能基之共聚單體,以(甲基)丙烯酸縮水甘油酯為佳。(甲基)丙烯酸烷酯中,烷基以碳數1~20的烷基為佳,且烷基可具有取代基。作為烷基之取代基,可舉例如:脂環基、縮水甘油基、具有羥基之碳數1~6的烷基、含氮環狀基等。 (A) Component is an acrylic polymer, usually a copolymer using alkyl (meth)acrylate as a monomer. As the copolymer, an acrylic polymer obtained by copolymerizing a crosslinkable functional group is preferred. Such copolymers are generally produced by copolymerizing alkyl (meth)acrylate and a comonomer having a crosslinkable functional group. As the comonomer having a crosslinkable functional group, there are no particular restrictions as long as it is a compound that can be copolymerized with alkyl (meth)acrylate; as the crosslinkable functional group, it is preferable to have an epoxy group, and to have Glycidyl is preferred. As a comonomer having a crosslinkable functional group, glycidyl (meth)acrylate is preferred. In the alkyl (meth)acrylate, the alkyl group is preferably an alkyl group having 1 to 20 carbon atoms, and the alkyl group may have a substituent. Examples of the substituent of the alkyl group include an alicyclic group, a glycidyl group, an alkyl group having 1 to 6 carbon atoms having a hydroxyl group, and a nitrogen-containing cyclic group.
作為(甲基)丙烯酸烷酯,可舉例如:丙烯酸甲酯、丙烯酸乙酯、丙烯酸丙酯、丙烯酸丁酯、丙烯酸己酯、丙烯酸2-乙基己酯、丙烯酸異丁酯、乙二醇單甲基醚丙烯酸酯、丙烯酸環己酯、丙烯酸2-羥基乙酯、丙烯酸2-羥基丙酯、丙烯酸異冰片酯、丙烯醯胺、丙烯酸異癸酯、丙烯酸十八烷酯、丙烯酸月桂酯、丙烯酸烯丙酯、丙烯酸N-乙烯基吡咯啶酮、甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸丙酯、甲基丙烯酸丁酯、甲基丙烯酸己酯、甲基丙烯酸2-乙基己酯、甲基丙烯酸異丁酯、乙二醇單甲基醚甲基丙烯酸酯、甲基丙烯酸環己酯、甲 基丙烯酸2-羥基乙酯、甲基丙烯酸2-羥基丙酯、甲基丙烯酸異冰片酯、甲基丙烯醯胺、甲基丙烯酸異癸酯、甲基丙烯酸十八烷酯、甲基丙烯酸月桂酯、甲基丙烯酸烯丙酯、甲基丙烯酸N-乙烯基吡咯啶酮、丙烯腈等。 Examples of alkyl (meth)acrylates include methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, hexyl acrylate, 2-ethylhexyl acrylate, isobutyl acrylate, ethylene glycol mono Methyl ether acrylate, cyclohexyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, isobornyl acrylate, acrylamide, isodecyl acrylate, stearyl acrylate, lauryl acrylate, acrylic acid Allyl ester, N-vinylpyrrolidone acrylate, methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, hexyl methacrylate, 2-ethyl methacrylate Hexyl ester, isobutyl methacrylate, ethylene glycol monomethyl ether methacrylate, cyclohexyl methacrylate, methyl methacrylate 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, isobornyl methacrylate, methacrylamide, isodecyl methacrylate, stearyl methacrylate, lauryl methacrylate , Allyl methacrylate, N-vinylpyrrolidone methacrylate, acrylonitrile, etc.
當(A)成分具有環氧基時,其環氧基值以2當量/kg~18當量/kg為佳,以2當量/kg~8當量/kg較佳。若環氧基值為2當量/kg以上,則能夠抑制硬化物的玻璃轉移溫度降低,而能夠充分確保基板的耐熱性,若環氧基值為18當量/kg以下,則儲存彈性模數不會過大,而有能夠保持基板的尺寸安定性之傾向。在使(甲基)丙烯酸縮水甘油酯與能夠和其進行共聚的其它單體進行共聚時,(A)成分的環氧基值能夠適當調整共聚比來調節。通常,相對於(甲基)丙烯酸縮水甘油酯100質量份,將其它單體的比例設為5質量份~15質量份,即能夠獲得具有2當量/kg~18當量/kg的環氧基值之高分子丙烯酸系聚合物。 When component (A) has an epoxy group, its epoxy group value is preferably 2 equivalents/kg to 18 equivalents/kg, preferably 2 equivalents/kg to 8 equivalents/kg. If the epoxy group value is 2 equivalent/kg or more, the glass transition temperature of the cured product can be suppressed, and the heat resistance of the substrate can be sufficiently ensured. If the epoxy group value is 18 equivalent/kg or less, the storage elastic modulus is not It will be too large, and there is a tendency to maintain the dimensional stability of the substrate. When glycidyl (meth)acrylate is copolymerized with another monomer that can be copolymerized therewith, the epoxy group value of the component (A) can be adjusted by appropriately adjusting the copolymerization ratio. Generally, relative to 100 parts by mass of glycidyl (meth)acrylate, the ratio of other monomers is set to 5 parts by mass to 15 parts by mass, that is, an epoxy group value with 2 equivalents/kg to 18 equivalents/kg can be obtained The high molecular acrylic polymer.
作為具有環氧基之(A)成分的市售物,能夠取得例如:「HTR-860」(Nagase ChemteX股份有限公司製,商品名,環氧基值3.1)、「KH-CT-865」(日立化成股份有限公司製,商品名,環氧基值3.0)、「HAN5-M90S」(根上工業股份有限公司製,商品名,環氧基值2.2)。從提高延伸率之觀點、及提高低彈性之觀點來看,(A)成分的重量平均分子量以10,000~1,500,000為佳,以50,000~1,500,000較佳,以 300,000~1,500,000更佳,以300,000~1,100,000特佳。若(A)成分的重量平均分子量為1,500,000以下,則有容易溶於溶劑中而容易處理之傾向。此外,若(A)成分的重量平均分子量為1,500,000以下,則有在調配(B)成分後不容易形成具有區域較大的共連續相之相分離結構之傾向,而有容易顯現高絕緣可靠性、高耐熱性、與金屬箔之間的高黏著性之傾向。若(A)成分的重量平均分子量為10,000以上,則有容易顯現(A)成分所具有的低彈性之傾向。 As a commercially available product of the component (A) having an epoxy group, for example, "HTR-860" (manufactured by Nagase ChemteX Co., Ltd., trade name, epoxy group value 3.1), "KH-CT-865" ( Hitachi Chemical Co., Ltd. product name, epoxy group value 3.0), "HAN5-M90S" (Negami Industry Co., Ltd. product name, epoxy group value 2.2). From the viewpoint of improving elongation and the viewpoint of improving low elasticity, the weight average molecular weight of component (A) is preferably 10,000 to 1,500,000, more preferably 50,000 to 1,500,000, and 300,000~1,500,000 is more preferred, and 300,000~1,100,000 is particularly preferred. If the weight average molecular weight of the component (A) is 1,500,000 or less, it tends to be easily dissolved in a solvent and easy to handle. In addition, if the weight average molecular weight of the component (A) is 1,500,000 or less, it tends to be difficult to form a phase-separated structure with a large co-continuous phase after the component (B) is formulated, and it is easy to exhibit high insulation reliability. , High heat resistance, the tendency of high adhesion to metal foil. If the weight average molecular weight of the component (A) is 10,000 or more, the low elasticity of the component (A) tends to be easily expressed.
(A)成分可將重量平均分子量不同的2種以上組合。 (A) The component can combine two or more types with different weight average molecular weights.
上述重量平均分子量,是藉由凝膠滲透層析法(GPC)分析來測定之值,且是意指以標準聚苯乙烯來換算之值。GPC分析能夠使用四氫呋喃(THF)來作為溶解液來進行。 The above-mentioned weight average molecular weight is a value measured by gel permeation chromatography (GPC) analysis, and means a value converted to standard polystyrene. GPC analysis can be performed using tetrahydrofuran (THF) as a dissolving liquid.
此外,為了在壓力鍋偏壓試驗(PCBT)等絕緣可靠性之加速試驗中獲得充分的特性,(A)成分以其鹼金屬離子濃度為500ppm以下為佳,以200ppm以下較佳,以100ppm以下更佳。 In addition, in order to obtain sufficient characteristics in accelerated insulation reliability tests such as pressure cooker bias test (PCBT), component (A) preferably has an alkali metal ion concentration of 500ppm or less, preferably 200ppm or less, and more preferably 100ppm or less. good.
一般而言,(A)成分是藉由下述方式來獲得:使用會使自由基產生之自由基聚合起始劑來使單體進行自由基聚合。作為自由基聚合起始劑,可舉例如:偶氮雙異丁腈(AIBN)、過苯甲酸三級丁酯、苯甲醯基過氧化物、月桂醯基過氧化物、過硫酸鉀等過硫酸鹽、枯烯氫過氧化物(cumene hydroxide)、三級丁基氫 過氧化物、二枯烯基過氧化物、二(三級丁基)過氧化物、2,2’-偶氮雙-2,4-二甲基戊腈、過異丁酸三級丁酯、過三甲基乙酸三級丁酯、過氧化氫/亞鐵鹽、過硫酸鹽/亞硫酸氫鈉、枯烯氫過氧化物/亞鐵鹽、苯甲醯基過氧化物/二甲基苯胺等。作為自由基聚合起始劑,可單獨使用,且亦可組合2種以上。 In general, component (A) is obtained by using a radical polymerization initiator that generates radicals to radically polymerize monomers. Examples of radical polymerization initiators include azobisisobutyronitrile (AIBN), tertiary butyl perbenzoate, benzyl peroxide, lauryl peroxide, potassium persulfate, etc. Sulfate, cumene hydroxide, tertiary butyl hydrogen Peroxide, dicumenyl peroxide, di(tertiary butyl) peroxide, 2,2'-azobis-2,4-dimethylvaleronitrile, tertiary butyl perisobutyrate , Tertiary Butyl Peroxytrimethylacetate, Hydrogen Peroxide/Ferrous Salt, Persulfate/Sodium Bisulfite, Cumene Hydroperoxide/Ferrous Salt, Benzoyl Peroxide/Dimethyl Aniline and so on. As a radical polymerization initiator, it can use individually, and can also combine 2 or more types.
本發明的實施形態的樹脂組成物中,當將(A)成分與(B)成分的總量設為100質量份時,(A)成分的調配量以10~70質量份為佳。若(A)成分的調配量未達10質量份,則有不會有效地顯現(A)成分之優異特徵亦即低彈性之傾向。此外,若(A)成分的調配量超過70質量份,則有無法獲得良好的與金屬箔之間的黏著強度之傾向、或難燃性會降低之傾向。 In the resin composition of the embodiment of the present invention, when the total amount of the (A) component and the (B) component is 100 parts by mass, the blending amount of the (A) component is preferably 10 to 70 parts by mass. If the blending amount of the component (A) is less than 10 parts by mass, there is a tendency that the excellent feature of the component (A), that is, low elasticity, will not be effectively expressed. In addition, if the blending amount of the component (A) exceeds 70 parts by mass, there is a tendency that good adhesive strength with the metal foil cannot be obtained, or the flame retardancy tends to decrease.
此外,特別是從設為低彈性之觀點來看,(A)成分與(B)成分的總量100質量份中,(A)成分的調配量以15質量份以上為佳,以20質量份以上較佳,以30質量份以上更佳。 In addition, especially from the viewpoint of low elasticity, in 100 parts by mass of the total amount of (A) component and (B) component, the blending amount of (A) component is preferably 15 parts by mass or more, and 20 parts by mass The above is preferable, and 30 parts by mass or more is more preferable.
此外,特別是從獲得良好的與金屬箔之間的黏著強度的觀點來看,(A)成分與(B)成分的總量100質量份中,(A)成分的調配量以60質量份以下為佳,以50質量份以下較佳,以40質量份以下更佳。 In addition, especially from the viewpoint of obtaining good adhesive strength with metal foil, the blending amount of (A) component is 60 parts by mass or less in the total amount of (A) component and (B) component 100 parts by mass More preferably, it is preferably 50 parts by mass or less, and more preferably 40 parts by mass or less.
[熱硬化性樹脂:(B)成分] [Thermosetting resin: (B) component]
作為本發明中所使用之(B)成分,適合選擇在與(A)成分組合硬化後會具有相分離結構之化合物。作為(B) 成分,並無特別限定,可舉例如:環氧樹脂、氰酸酯樹脂、雙馬來醯亞胺樹脂、雙馬來醯亞胺樹脂與二胺之加成聚合物、酚樹脂、甲階酚醛清漆(resol)樹脂、異氰酸酯樹脂、三烯丙基異氰脲酸酯樹脂、三烯丙基氰脲酸酯樹脂、及含乙烯基的聚烯烴化合物等。此等中,若考慮到耐熱性、絕緣性等性能之平衡,則以環氧樹脂或氰酸酯樹脂為佳。 As the (B) component used in the present invention, it is suitable to select a compound having a phase separation structure after being combined with the (A) component and hardened. As (B) The ingredients are not particularly limited. Examples include epoxy resins, cyanate ester resins, bismaleimide resins, addition polymers of bismaleimide resins and diamines, phenol resins, and resols. Varnish (resol) resin, isocyanate resin, triallyl isocyanurate resin, triallyl cyanurate resin, vinyl-containing polyolefin compound, etc. Among these, if the balance of heat resistance, insulation and other properties is considered, epoxy resin or cyanate ester resin is preferred.
(B)成分若使本發明的實施形態之樹脂組成物硬化,則能夠形成具有相分離結構之樹脂複合物,該(B)成分較佳為一種樹脂組成物,其包含:(B-1)環氧樹脂,其在1分子內具有2個以上環氧基(以下稱為「(B-1)」成分);及,(B-2)酚樹脂,其在1分子內具有2個以上羥基(以下稱為「(B-2)」成分)。 When the component (B) hardens the resin composition of the embodiment of the present invention, a resin composite having a phase separation structure can be formed. The component (B) is preferably a resin composition containing: (B-1) Epoxy resin, which has two or more epoxy groups in one molecule (hereinafter referred to as "(B-1)" component); and (B-2) phenol resin, which has two or more hydroxyl groups in one molecule (Hereinafter referred to as "(B-2)" component).
<在1分子內具有2個以上環氧基之環氧樹脂:(B-1)成分> <Epoxy resin having two or more epoxy groups in one molecule: (B-1) component>
(B)成分以包含(B-1)成分為佳。 The component (B) preferably contains the component (B-1).
(B-1)成分的重量平均分子量,以200~1,000為佳,以300~900較佳。若重量平均分子量為200以上,則有會與(A)成分形成相分離結構之傾向,若重量平均分子量為1,000以下,則有容易形成具有區域較小的第2相之相分離結構之傾向,而有容易顯現低彈性之傾向。 (B-1) The weight average molecular weight of the component is preferably 200 to 1,000, and more preferably 300 to 900. If the weight average molecular weight is 200 or more, it tends to form a phase-separated structure with component (A). If the weight average molecular weight is 1,000 or less, it tends to easily form a phase-separated structure with a smaller second phase. And there is a tendency to show low elasticity.
作為(B-1)成分的環氧當量,以150~500為佳,以150~450較佳,以150~300較佳。若環氧樹脂的環 氧當量在上述範圍內,則有第2相的平均區域大小不會過大的傾向。 The epoxy equivalent of the component (B-1) is preferably 150 to 500, preferably 150 to 450, and more preferably 150 to 300. If the epoxy ring If the oxygen equivalent is within the above range, the average domain size of the second phase tends not to be too large.
作為(B-1)成分,能夠使用習知物,可舉例如:雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、聯苯型環氧樹脂、苯酚酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂、雙酚A酚醛清漆型環氧樹脂、含磷環氧樹脂、含萘骨架的環氧樹脂、含伸芳烷基骨架的環氧樹脂、苯酚聯苯芳烷基型環氧樹脂、苯酚柳醛酚醛清漆型環氧樹脂、經低級烷基所取代的苯酚柳醛酚醛清漆型環氧樹脂、含雙環戊二烯骨架的環氧樹脂、多官能縮水甘油基胺型環氧樹脂、多官能脂環式環氧樹脂、四溴雙酚A型環氧樹脂等。能夠使用此等中之1種或2種以上。 As the (B-1) component, conventional materials can be used, and examples include bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, biphenyl type epoxy resin, and phenol Novolac type epoxy resin, cresol novolac type epoxy resin, bisphenol A novolac type epoxy resin, phosphorus-containing epoxy resin, epoxy resin containing naphthalene skeleton, epoxy resin containing aralkylene skeleton , Phenol biphenyl aralkyl type epoxy resin, phenol salic novolak epoxy resin, phenol salic novolak epoxy resin substituted by lower alkyl groups, epoxy resin containing dicyclopentadiene skeleton, Multifunctional glycidylamine epoxy resin, multifunctional alicyclic epoxy resin, tetrabromobisphenol A epoxy resin, etc. One or two or more of these can be used.
作為(B-1)成分之市售物,可舉例如:苯酚酚醛清漆型環氧樹脂「N770」(DIC股份有限公司製,商品名)、四溴雙酚A型環氧樹脂「EPICLON 153」(DIC股份有限公司製,商品名)、聯苯芳烷基型環氧樹脂「NC-3000H」(日本化藥股份有限公司製,商品名)、雙酚A型環氧樹脂「Epikote 1001」(三菱化學股份有限公司製,商品名)、含磷環氧樹脂「ZX-1548」(東都化成股份有限公司製,商品名)、甲酚酚醛清漆型環氧樹脂「EPICLON N-660」(DIC股份有限公司製,商品名)等。 Examples of commercially available products of the component (B-1) include phenol novolak type epoxy resin "N770" (manufactured by DIC Co., Ltd., trade name), and tetrabromobisphenol A type epoxy resin "EPICLON 153" (Manufactured by DIC Co., Ltd., trade name), biphenyl aralkyl epoxy resin "NC-3000H" (manufactured by Nippon Kayaku Co., Ltd., trade name), bisphenol A epoxy resin "Epikote 1001" ( Produced by Mitsubishi Chemical Corporation, trade name), phosphorous epoxy resin "ZX-1548" (manufactured by Toto Kasei Co., Ltd., trade name), cresol novolac type epoxy resin "EPICLON N-660" (DIC Co., Ltd.) Limited company system, trade name), etc.
<在1分子內具有2個以上羥基之酚樹脂:(B-2)成分> <Phenolic resin having two or more hydroxyl groups in one molecule: (B-2) component>
從確保與金屬箔之間的密合強度之觀點來看,(B)成分以包含(B-2)成分為佳。 From the viewpoint of ensuring the adhesion strength with the metal foil, the component (B) preferably contains the component (B-2).
作為(B-2)成分,能夠使用習知物,可舉例如:芳烷基型酚樹脂、雙環戊二烯型酚樹脂、柳醛型酚樹脂、由苯甲醛型酚樹脂與芳烷基型酚樹脂所得之共聚型樹脂、及酚醛清漆型酚樹脂等。能夠使用此等中之1種或2種以上。 As the component (B-2), conventional materials can be used. Examples include aralkyl phenol resins, dicyclopentadiene phenol resins, salicylic phenol resins, benzaldehyde phenol resins, and aralkyl phenol resins. Copolymer resins obtained from phenol resins, and novolac phenol resins, etc. One or two or more of these can be used.
從低吸水性之觀點來看,作為(B-2)成分,較佳是使用苯酚酚醛清漆等多元酚類。 From the viewpoint of low water absorption, as the component (B-2), it is preferable to use polyphenols such as phenol novolac.
作為(B-2)成分之市售物,可舉例如:甲酚酚醛清漆型樹脂「KA-1165」(DIC股份有限公司製,商品名)、及聯苯酚醛清漆型樹脂「MEH-7851」(明和化成股份有限公司製,商品名)等。 Examples of commercially available products of the component (B-2) include cresol novolac resin "KA-1165" (manufactured by DIC Co., Ltd., trade name), and biphenol novolac resin "MEH-7851" (Minghe Chemical Co., Ltd. system, trade name), etc.
(B-2)成分的調配比例,通常是以玻璃轉移溫度升高之方式決定其調配比。例如:當使用苯酚酚醛清漆型樹脂來作為(B-2)成分時,以相對於(B-1)成分之環氧基為0.5當量~1.5當量為佳。相對於(B-1)成分之環氧基為0.5當量~1.5當量,即能夠防止與外層銅之間的黏著性降低,且亦能夠防止玻璃轉移溫度(Tg)及絕緣性降低。 (B-2) The blending ratio of the components is usually determined by increasing the glass transition temperature. For example: when using a phenol novolak type resin as the component (B-2), the epoxy group of the component (B-1) is preferably 0.5 to 1.5 equivalents. The epoxy group of the component (B-1) is 0.5 to 1.5 equivalents, which can prevent the adhesion with the outer layer copper from decreasing, and can also prevent the glass transition temperature (Tg) and insulation from decreasing.
<(B)成分之硬化劑> <(B) component hardener>
本發明的樹脂組成物,可含有(B)成分之硬化劑。作為(B)成分之硬化劑,能夠使用習知物。可舉例如:雙氰胺、二胺基二苯基甲烷、二胺基二苯基碸等胺系硬化劑;均苯四甲酸酐、偏苯三甲酸酐、二苯甲酮四甲酸等酸酐硬化劑;或此等之混合物等。 The resin composition of the present invention may contain the curing agent of the component (B). As the curing agent of the component (B), conventional materials can be used. Examples include amine hardeners such as dicyandiamide, diaminodiphenylmethane, and diaminodiphenyl sulfide; acid anhydride hardeners such as pyromellitic anhydride, trimellitic anhydride, and benzophenone tetracarboxylic acid ; Or a mixture of these, etc.
本發明中,(B)成分與其硬化劑之組合,能夠依所使用之(A)成分、硬化條件、硬化劑及硬化觸媒來考慮各種組合。 In the present invention, the combination of the component (B) and its curing agent can be considered in various combinations depending on the component (A) used, curing conditions, curing agent, and curing catalyst.
一般而言,樹脂硬化物的相結構是由相分離速度與交聯反應速度之間的競爭反應所決定。若列舉環氧樹脂來作為例子,則控制觸媒物種及骨架結構等,並且將特性分別不同的環氧樹脂混合並使其硬化,即能夠形成平均區域大小為約1μm~10μm的相分離結構亦即海島結構。 Generally speaking, the phase structure of the resin cured product is determined by the competitive reaction between the phase separation speed and the crosslinking reaction speed. Taking epoxy resin as an example, controlling the catalyst species and skeleton structure, etc., and mixing and curing epoxy resins with different characteristics, can form a phase separation structure with an average domain size of about 1 μm to 10 μm. That is, the island structure.
[填料:(C)成分] [Filling: (C) component]
本發明的實施形態之樹脂組成物,較佳是含有1種以上氧化矽來作為(C)成分。此外,本發明的實施形態的樹脂組成物,較佳是含有1種以上(C-1)經耦合處理的填料(以下稱為「(C-1)成分」)來作為(C)成分。此外,本發明的實施形態的樹組成物,較佳是含有(C-2)未經耦合處理的填料(以下稱為「(C-2)成分」)來作為(C)成分。 The resin composition of the embodiment of the present invention preferably contains one or more types of silicon oxide as the (C) component. In addition, the resin composition of the embodiment of the present invention preferably contains one or more (C-1) coupling-treated fillers (hereinafter referred to as "(C-1) component") as the (C) component. In addition, the tree composition of the embodiment of the present invention preferably contains (C-2) a filler without coupling treatment (hereinafter referred to as "(C-2) component") as the (C) component.
本發明中所使用的(C)成分,較佳是含有1種以上(C-1)成分及1種以上(C-2)成分。使用經實施耦合 處理的化合物及未經實施耦合處理的(C-2)成分,即能夠控制樹脂組成物內的填料分散性,而能夠充分顯現(A)成分及(B)成分雙方之特徵。 The (C) component used in the present invention preferably contains one or more (C-1) components and one or more (C-2) components. Use the implemented coupling The treated compound and the component (C-2) that have not been subjected to the coupling treatment can control the filler dispersibility in the resin composition, and can fully express the characteristics of both the (A) component and the (B) component.
(C-1)成分的平均粒徑,以0.1μm~1.5μm為佳,以0.2μm~1.2μm較佳,以0.3μm~1.0μm更佳。若(C-1)成分的平均粒徑為0.1μm以上,則有在進行清漆化後填料彼此容易分散而不容易發生凝集之傾向,若(C-1)成分的平均粒徑為1.5μm以下,則有在進行清漆化時(C)成分不容易發生沉積之傾向。 (C-1) The average particle size of the component is preferably 0.1 μm to 1.5 μm, preferably 0.2 μm to 1.2 μm, and more preferably 0.3 μm to 1.0 μm. If the average particle size of the component (C-1) is 0.1μm or more, the fillers tend to disperse easily after varnishing and do not easily aggregate. If the average particle size of the component (C-1) is 1.5μm or less , There is a tendency that the component (C) is not easy to deposit during varnishing.
(C-2)成分的平均粒徑,以1.0μm~3.5μm為佳,以1.2μm~3.2μm較佳,以1.4μm~3.0μm更佳。若(C-2)成分的平均粒徑為1.0μm以上,則有填料彼此容易分散而不容易發生凝集之傾向,若(C-2)成分的平均粒徑為3.5μm以下,則有在進行清漆化時(C)成分不容易發生沉積之傾向。 (C-2) The average particle size of the component is preferably 1.0 μm to 3.5 μm, preferably 1.2 μm to 3.2 μm, and more preferably 1.4 μm to 3.0 μm. If the average particle size of the component (C-2) is 1.0μm or more, the fillers tend to disperse easily and not agglomerate. If the average particle size of the component (C-2) is 3.5μm or less, there is a tendency for The component (C) does not tend to deposit easily during varnishing.
此處,所謂平均粒徑,是指在將粒子的總體積設為100%來求出由粒徑所得之累積度數分布曲線時相當於體積50%之點的粒徑,且能夠藉由使用雷射繞射散射法的粒度分布測定裝置等來進行測定。 Here, the so-called average particle size refers to the particle size at the point equivalent to 50% of the volume when the total volume of the particles is set to 100% to obtain the cumulative power distribution curve obtained from the particle size. The measurement is performed by a particle size distribution measuring device of the diffraction scattering method.
本發明中所使用之(C)成分,能夠使用習知物。為了降低熱膨脹係數之目的、確保難燃性之目的,而較佳是添加無機系填料。作為無機系填料,可例如:氧化矽、氧化鋁、氧化鈦、氫氧化鋁、氫氧化鎂、碳酸鈣、碳酸鎂、矽酸鈣、氧化鈣、氧化鎂、氮化鋁、硼酸 鋁晶鬚、氮化硼、碳化矽等。其中,因介電常數低、線膨脹係數低,因此更佳是使用氧化矽。 The (C) component used in the present invention can be conventionally used. For the purpose of reducing the thermal expansion coefficient and ensuring the flame retardancy, it is preferable to add an inorganic filler. As inorganic fillers, for example: silicon oxide, aluminum oxide, titanium oxide, aluminum hydroxide, magnesium hydroxide, calcium carbonate, magnesium carbonate, calcium silicate, calcium oxide, magnesium oxide, aluminum nitride, boric acid Aluminum whiskers, boron nitride, silicon carbide, etc. Among them, since the dielectric constant is low and the linear expansion coefficient is low, it is more preferable to use silicon oxide.
作為本發明中所使用之氧化矽,能夠使用下述各種氧化矽:將以濕式法或乾式法來合成之各種合成氧化矽或矽石粉碎而成之粉碎氧化矽;使以濕式法或乾式法來合成之各種合成氧化矽或矽石暫時熔融而成之熔融氧化矽等。 As the silica used in the present invention, the following various silicas can be used: various synthetic silicas synthesized by a wet method or a dry method or pulverized silica obtained by pulverizing silica; using a wet method or A variety of synthetic silica synthesized by dry method or fused silica formed by temporary melting of silica.
本發明中,(C)成分的調配比,以所有樹脂組成物的固體成分的5質量%~40質量%為佳,以所有樹脂組成物的固體成分的10質量%~35質量%較佳,以所有樹脂組成物的固體成分的15質量%~30質量%更佳。(C)成分的調配比為40質量%以下,而有絕緣性樹脂不會變脆而能夠獲得充分的使(A)成分的交聯性官能基進行共聚而成之高分子丙烯酸系聚合物所具有的低彈性、柔軟性之傾向。此外,(C)成分的調配比為5質量%以上,而有線膨脹係數會降低而能夠獲得充分的耐熱性之傾向。 In the present invention, the blending ratio of component (C) is preferably 5 mass% to 40 mass% of the solid content of all resin compositions, and preferably 10 mass% to 35% by mass of the solid content of all resin compositions. It is more preferable to use 15% by mass to 30% by mass of the solid content of all resin compositions. The blending ratio of component (C) is 40% by mass or less, and the insulating resin does not become brittle and can obtain sufficient polymer acrylic polymer by copolymerizing the crosslinkable functional group of component (A) The tendency to have low elasticity and flexibility. In addition, when the blending ratio of the component (C) is 5 mass% or more, the linear expansion coefficient tends to decrease and sufficient heat resistance can be obtained.
本說明書中,所謂「固體成分」,是意指去除溶劑等會揮發之物質後餘留之非揮發份,且是表示在使該樹脂組成物乾燥後未揮發而殘留之成分,且亦包含在室溫為液狀、麥芽糖狀及蠟狀的成分。此處,本說明書中,所謂室溫,是表示25℃。 In this specification, the term "solid content" refers to the non-volatile content remaining after removing solvents and other volatile substances, and refers to the non-volatile components remaining after the resin composition is dried, and it is also included in It is liquid, maltose and waxy ingredients at room temperature. Here, in this specification, room temperature means 25°C.
<硬化促進劑> <hardening accelerator>
樹脂組成物可包含硬化促進劑。作為硬化促進劑,並無特別限定,以胺類或咪唑類為佳。胺類可例示如:雙氰胺、二胺基二苯基乙烷、甲脒基脲等。咪唑類可例示如:2-苯基咪唑、1-氰乙基-2-甲基咪唑、1-氰乙基-2-十一烷基咪唑、1-氰乙基-2-苯基咪唑、偏苯三甲酸1-氰乙基-2-咪唑鎓鹽、苯并咪唑等。 The resin composition may contain a hardening accelerator. The hardening accelerator is not particularly limited, but amines or imidazoles are preferred. Examples of amines include dicyandiamide, diaminodiphenylethane, formamidinourea, and the like. Examples of imidazoles include: 2-phenylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-phenylimidazole, Trimellitic acid 1-cyanoethyl-2-imidazolium salt, benzimidazole and the like.
硬化促進劑的調配量,能夠因應樹脂組成物中的環氧乙烷環的總量來決定,一般而言,在樹脂組成物的樹脂固形體成分100質量份中,以設為0.01質量份~10質量份為佳,以設為0.02質量份~9.0質量份較佳,以設為0.03質量份~8.0質量份更佳。 The blending amount of the hardening accelerator can be determined according to the total amount of the ethylene oxide ring in the resin composition. Generally speaking, it is set to 0.01 parts by mass in 100 parts by mass of the resin solid component of the resin composition. 10 parts by mass is preferable, preferably 0.02 parts by mass to 9.0 parts by mass, and more preferably 0.03 parts by mass to 8.0 parts by mass.
<其它成分> <Other ingredients>
本發明的樹脂組成物,可因應需要而含有例如:交聯劑、難燃劑、流動調整劑、導電性粒子、耦合劑、顏料、塗平劑、消泡劑、離子阱劑及抗氧化劑等,且能夠使用習知物。 The resin composition of the present invention may contain, as required, for example: crosslinking agent, flame retardant, flow regulator, conductive particles, coupling agent, pigment, leveling agent, defoamer, ion trap agent, antioxidant, etc. , And can use conventional objects.
<溶劑> <Solvent>
當使用本發明的樹脂組成物來製造預浸體等時,可製作成一種清漆,其為本發明的樹脂組成物的成分溶於或分散在有機溶劑中而成之狀態。 When the resin composition of the present invention is used to produce a prepreg, etc., it can be made into a varnish in which the components of the resin composition of the present invention are dissolved or dispersed in an organic solvent.
將本發明的樹脂組成物製作成清漆時,作為所使用之有機溶劑,並無特別限制,能夠使用:酮系、芳香族烴系、酯系、醯胺系、醇系等。 When the resin composition of the present invention is made into a varnish, the organic solvent used is not particularly limited, and ketone-based, aromatic hydrocarbon-based, ester-based, amide-based, alcohol-based, etc. can be used.
作為酮系溶劑,可舉例如:丙酮、甲基乙基酮、甲基異丁基酮、環己酮等。 Examples of the ketone solvent include acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone.
作為芳香族烴系溶劑,可舉例如:甲苯、二甲苯等。 As an aromatic hydrocarbon solvent, toluene, xylene, etc. are mentioned, for example.
作為酯系溶劑,可舉例如:乙酸甲氧基乙酯、乙酸乙氧基乙酯、乙酸丁氧基乙酯、乙酸乙酯等。 Examples of ester solvents include methoxyethyl acetate, ethoxyethyl acetate, butoxyethyl acetate, ethyl acetate, and the like.
作為醯胺系溶劑,可舉例如:N-甲基吡咯啶酮、甲醯胺、N-甲基甲醯胺、N,N-二甲基乙醯胺等。 Examples of amide-based solvents include N-methylpyrrolidone, formamide, N-methylformamide, N,N-dimethylacetamide, and the like.
作為醇系溶劑,可舉例如:甲醇、乙醇、乙二醇、乙二醇單甲基醚、乙二醇單乙基醚、二乙二醇、三乙二醇單甲基醚、三乙二醇單乙基醚、三乙二醇、丙二醇單甲基醚、二丙二醇單甲基醚、丙二醇單丙基醚、二丙二醇單丙基醚等。 Examples of alcohol-based solvents include methanol, ethanol, ethylene glycol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, diethylene glycol, triethylene glycol monomethyl ether, and triethylene glycol. Alcohol monoethyl ether, triethylene glycol, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, propylene glycol monopropyl ether, dipropylene glycol monopropyl ether, etc.
此等有機溶劑可使用1種或混合使用2種以上。 These organic solvents can be used singly or in combination of two or more.
[相分離結構] [Phase Separation Structure]
本發明中,所謂相分離結構,是指:海島結構、連續球狀結構、複合分散相結構、共連續相結構,且島相的平均區域大小為1μm~10μm,以1μm~9μm為佳,以2μm~8μm較佳。 In the present invention, the so-called phase separation structure refers to: sea-island structure, continuous spherical structure, composite dispersed phase structure, co-continuous phase structure, and the average domain size of the island phase is 1μm~10μm, preferably 1μm~9μm. 2μm~8μm is preferred.
若島相的平均區域大小未達1μm,則有難以顯現熱硬化性樹脂(B)所具有的良好的絕緣可靠性及高耐熱性之傾向。此外,有與金屬箔之間的黏著強度相對較弱的丙烯酸系聚合物的表面積會變大而無法獲得絕緣層與金屬箔之間的良好的黏著強度之傾向。 If the average domain size of the island phase is less than 1 μm, it tends to be difficult to express the good insulation reliability and high heat resistance of the thermosetting resin (B). In addition, there is a tendency that the surface area of the acrylic polymer, which has a relatively weak adhesive strength with the metal foil, becomes large, and good adhesive strength between the insulating layer and the metal foil cannot be obtained.
此外,若島相的平均區域大小超過10μm,則有難以顯現(A)成分所具有的低彈性之傾向。 In addition, if the average domain size of the island phase exceeds 10 μm, it tends to be difficult to express the low elasticity of the component (A).
此處,所謂島相的平均區域大小,是使用切片機(microtome)來對熱硬化後之該樹脂組成物的剖面進行平滑化後,使用電子顯微鏡,來從所獲得的剖面結構對70個以上島相分別測定最大寬度及最小寬度,並算出其平均值。 Here, the so-called average area size of the island phase refers to the use of a microtome to smooth the cross-section of the resin composition after heat curing, and an electron microscope to obtain more than 70 cross-sectional structures. The maximum width and minimum width of the island phase were measured, and the average value was calculated.
再者,關於作為相分離結構之海島結構、連續球狀結構、複合分散相結構及共連續相結構(亦稱為連續相結構),已在例如「聚合物合金」第325頁(1993)東京化學同人中詳細敘述,關於連續球狀結構,已在例如Keizo Yamanaka and Takashi Iniue,POLYMER,Vol.30,pp.662(1989)中詳細敘述。 In addition, the island structure, continuous spherical structure, composite dispersed phase structure, and co-continuous phase structure (also called continuous phase structure) as the phase separation structure have been described in, for example, "Polymer Alloys" page 325 (1993) Tokyo It is described in detail in chemistry colleagues, and the continuous spherical structure has been described in detail in, for example, Keizo Yamanaka and Takashi Iniue, POLYMER, Vol. 30, pp. 662 (1989).
第1圖~第4圖中表示模型圖,分別是顯示連續球狀結構、海島結構、複合分散相結構及共連續相結構。 Figures 1 to 4 show model diagrams, respectively showing continuous spherical structure, sea-island structure, composite dispersed phase structure and co-continuous phase structure.
這樣的微細的相分離結構是藉由下述方式來獲得:控制樹脂組成物之觸媒物種、反應溫度等硬化條件、或是樹脂組成物之各成分之間的相溶性。為了使相分離容易發生,能夠藉由下述方式來達成,例如:使用經烷基所取代之環氧樹脂來降低與高分子丙烯酸系聚合物之間的相溶性,或是當為相同組成系時,提高硬化溫度、或藉由選擇觸媒物種來降低硬化速度。 Such a fine phase separation structure is obtained by controlling the curing conditions such as the catalyst species and reaction temperature of the resin composition, or the compatibility between the components of the resin composition. In order to make the phase separation easy to occur, it can be achieved by the following methods, for example: using an epoxy resin substituted by an alkyl group to reduce the compatibility with the high-molecular acrylic polymer, or as the same composition system At the same time, increase the hardening temperature, or reduce the hardening speed by selecting the catalyst species.
第5圖中表示電子顯微鏡照片,是顯示以上述方式獲得之具有海島結構之樹脂組成物的一例的剖面結構。如圖所示,樹脂組成物具有一種海島結構,其是由丙烯酸系聚合物相及富含環氧樹脂相所構成。此外,由環氧樹脂所構成的島相的平均區域大小為約1μm~10μm。藉由具有這樣的相分離結構,即能夠兼具下述雙方之優異特徵:丙烯酸系聚合物所具有的低彈性;及,熱硬化性樹脂所具有的高絕緣可靠性、高耐熱性、與金屬箔之間的高黏著性。 Fig. 5 shows an electron micrograph showing the cross-sectional structure of an example of the resin composition having a sea-island structure obtained in the above-mentioned manner. As shown in the figure, the resin composition has a sea-island structure, which is composed of an acrylic polymer phase and an epoxy resin-rich phase. In addition, the average domain size of the island phase made of epoxy resin is about 1 μm to 10 μm. By having such a phase separation structure, it can have both the following excellent characteristics: low elasticity of acrylic polymer; and high insulation reliability, high heat resistance of thermosetting resin, and metal High adhesion between foils.
如上所述,本發明中所使用之樹脂組成物,當不在其中添加(C)成分時會形成海島結構或連續球狀結構,但藉由添加(C)成分,除了海島結構或連續球狀結構以外,亦能夠形成微細的共連續相結構或複合分散相結構之樹脂絕緣層。第6圖中表示電子顯微鏡照片,是顯示具有複合分散相結構之絕緣性樹脂的一例的剖面結構。 As mentioned above, the resin composition used in the present invention will form a sea-island structure or a continuous spherical structure when the component (C) is not added to it, but by adding the component (C), in addition to the sea-island structure or continuous spherical structure In addition, it can also form a fine co-continuous phase structure or a composite dispersed phase structure of the resin insulating layer. Fig. 6 shows an electron micrograph, showing a cross-sectional structure of an example of insulating resin having a composite dispersed phase structure.
[預浸體的製造方法] [Manufacturing method of prepreg]
本發明的預浸體,能夠以下述方式來製造:使上述樹脂組成物的清漆含浸於基材中,並在例如80℃~180℃的範圍內使其乾燥。 The prepreg of the present invention can be produced by impregnating the varnish of the above-mentioned resin composition in a base material, and drying, for example, in the range of 80°C to 180°C.
基材只要為製造覆金屬積層板、印刷電路基板等時所使用之基材,則無特別限制,通常是使用織布、不織布等纖維基材。作為纖維基材的材質,可舉例如:玻璃、氧化鋁、石棉、硼、矽鋁玻璃、矽玻璃、 Tyranno、碳化矽、氮化矽、氧化鋯等無機纖維;芳醯胺、聚醚醚酮、聚醚醯亞胺、聚醚碸、碳、纖維素等有機纖維;及此等之混合系等。此等中,以玻璃布為佳,以厚度為100μm以下的玻璃布較佳,以厚度為50μm以下的玻璃布特佳。若玻璃布的厚度為50μm以下,則能夠獲得能夠任意彎曲的印刷電路基板,而隨著製程中之溫度、吸濕等而發生的尺寸變化較小,故較佳。 The base material is not particularly limited as long as it is a base material used in the production of a metal-clad laminated board, a printed circuit board, etc., and a fibrous base material such as a woven fabric or a non-woven fabric is usually used. As the material of the fiber substrate, for example, glass, alumina, asbestos, boron, silica alumina glass, silica glass, Tyranno, silicon carbide, silicon nitride, zirconium oxide and other inorganic fibers; aramid, polyether ether ketone, polyether imide, polyether ash, carbon, cellulose and other organic fibers; and mixed systems of these. Among these, glass cloth is preferable, glass cloth having a thickness of 100 μm or less is preferable, and glass cloth having a thickness of 50 μm or less is particularly preferable. If the thickness of the glass cloth is 50 μm or less, a printed circuit board that can be bent arbitrarily can be obtained, and the dimensional change due to temperature, moisture absorption, etc. in the manufacturing process is small, which is preferable.
以所得之預浸體的清漆中所使用之有機溶劑已揮發80質量%以上為佳。若清漆中所使用之有機溶劑已揮發80質量%以上,則製造方法、乾燥條件等亦無限制,乾燥時,溫度為例如80℃~180℃,時間為兼顧清漆之凝膠化時間來適當設定。此外,較佳是相對於清漆固體成分與基材的總量,將清漆的含浸量設為使清漆的固體成分成為30質量%~80質量%。 It is preferable that the organic solvent used in the varnish of the obtained prepreg has volatilized more than 80% by mass. If the organic solvent used in the varnish has volatilized more than 80% by mass, there are no restrictions on the manufacturing method, drying conditions, etc. During drying, the temperature is, for example, 80°C to 180°C, and the time is appropriately set taking into account the gelation time of the varnish . In addition, it is preferable to set the impregnation amount of the varnish so that the solid content of the varnish becomes 30% by mass to 80% by mass relative to the total amount of the solid content of the varnish and the substrate.
(附有金屬箔之預浸體) (Prepreg with metal foil)
本發明的附有金屬箔之預浸體,較佳是:將上述預浸體與金屬箔積層而成。 The prepreg with metal foil of the present invention is preferably formed by laminating the above-mentioned prepreg and metal foil.
本發明的附有金屬箔之預浸體,能夠以下述方式製造,例如:將金屬箔重疊於本發明的預浸體的單面或雙面,並在通常為130℃~250℃、較佳為150℃~230℃之範圍之溫度,以通常為0.5MPa~20MPa、較佳為1MPa~8MPa的範圍的壓力來加熱加壓。加熱加壓之方法亦無特別限定,能夠使用例如:多段加壓、多段真空加壓、連續成形、高壓釜成形機等。 The prepreg with metal foil of the present invention can be manufactured in the following manner. For example, the metal foil is superimposed on one or both sides of the prepreg of the present invention, and the temperature is usually 130°C to 250°C, preferably The temperature is in the range of 150°C to 230°C, and it is heated and pressurized at a pressure in the range of usually 0.5 MPa to 20 MPa, preferably 1 MPa to 8 MPa. The method of heating and pressing is also not particularly limited, and for example, multi-stage pressurization, multi-stage vacuum pressurization, continuous molding, autoclave molding machine, etc. can be used.
此外,製造本發明的附有金屬箔之預浸體時,所使用之金屬箔並無特別限定,一般是使用例如:銅箔、鋁箔。金屬箔的厚度並無特別限定,能夠使用1μm~200μm的金屬箔。其它亦能夠使用例如:以鎳、鎳-磷、鎳-錫合金、鎳-鐵合金、鉛、鉛-錫合金等作為中間層並於其雙面設置0.5μm~15μm的銅層及10μm~300μm的銅層而成之3層結構之複合箔;或將鋁與銅箔複合而成之2層結構之複合箔。 Moreover, when manufacturing the prepreg with metal foil of this invention, the metal foil used is not specifically limited, For example, copper foil, aluminum foil is generally used. The thickness of the metal foil is not particularly limited, and a metal foil of 1 μm to 200 μm can be used. Others can also use, for example: nickel, nickel-phosphorus, nickel-tin alloy, nickel-iron alloy, lead, lead-tin alloy, etc. as the intermediate layer, with 0.5μm~15μm copper layer and 10μm~300μm on both sides A three-layer structure composite foil made of copper layers; or a two-layer structure composite foil made of aluminum and copper foil.
(積層板) (Laminate)
本發明的積層板,較佳是具有複數個上述預浸體。 The laminated board of the present invention preferably has a plurality of the above-mentioned prepregs.
本發明的積層板,例如是將本發明的預浸體積層並加熱加壓而成。加熱加壓的方法並無特別限定,能夠使用例如:多段加壓、多段真空加壓、連續成形、高壓釜成形機等。 The laminated sheet of the present invention is, for example, formed by heating and pressing the prepreg bulk layer of the present invention. The method of heating and pressing is not particularly limited, and, for example, multi-stage pressurization, multi-stage vacuum pressurization, continuous molding, autoclave molding machine, etc. can be used.
(覆金屬積層板) (Metal Clad Laminate)
本發明的覆金屬積層板,較佳是使上述積層板進一步具有金屬箔而成。 The metal-clad laminated sheet of the present invention is preferably formed by further including a metal foil on the laminated sheet.
本發明的覆金屬積層板,能夠以下述方式製造,例如:將金屬箔重疊於本發明的積層板的單面或雙面,並在通常為130℃~250℃、較佳為150℃~230℃的範圍的溫度,以通常為0.5MPa~20MPa、較佳為1MPa~8MPa的範圍的壓力來加熱加壓。加熱加壓之方法亦無特別限定,能夠使用例如:多段加壓、多段真空加壓、連續成形、高壓釜成形機等。 The metal-clad laminate of the present invention can be manufactured in the following manner, for example: a metal foil is laminated on one or both sides of the laminate of the present invention, and the temperature is usually 130°C to 250°C, preferably 150°C to 230°C. The temperature in the range of °C is generally heated and pressurized at a pressure in the range of 0.5 MPa to 20 MPa, preferably 1 MPa to 8 MPa. The method of heating and pressing is also not particularly limited, and for example, multi-stage pressurization, multi-stage vacuum pressurization, continuous molding, autoclave molding machine, etc. can be used.
此外,製造本發明的覆金屬積層板時,所使用之金屬箔並無特別限定,一般是使用例如:銅箔、鋁箔。金屬箔的厚度並無特別限定,能夠使用1μm~200μm的金屬箔。其它亦能夠使用例如:以鎳、鎳-磷、鎳-錫合金、鎳-鐵合金、鉛、鉛-錫合金等作為中間層並於其雙面設置0.5μm~15μm的銅層及10μm~300μm的銅層而成之3層結構之複合箔;或將鋁與銅箔複合而成之2層結構之複合箔。 Moreover, when manufacturing the metal-clad laminated board of this invention, the metal foil used is not specifically limited, For example, copper foil, aluminum foil is generally used. The thickness of the metal foil is not particularly limited, and a metal foil of 1 μm to 200 μm can be used. Others can also use, for example: nickel, nickel-phosphorus, nickel-tin alloy, nickel-iron alloy, lead, lead-tin alloy, etc. as the intermediate layer, with 0.5μm~15μm copper layer and 10μm~300μm on both sides A three-layer structure composite foil made of copper layers; or a two-layer structure composite foil made of aluminum and copper foil.
(印刷電路基板) (Printed circuit board)
本發明的印刷電路基板,較佳是上述積層板進一步具有電路。電路,較佳是對本發明的積層板進行電路加工而成。 In the printed circuit board of the present invention, it is preferable that the above-mentioned laminated board further has a circuit. The circuit is preferably formed by circuit processing the laminated board of the present invention.
本發明的印刷電路基板的製造方法並無特別限定,能夠藉由下述方式來製造:對單面或雙面設置有金屬箔之本發明的積層板(覆金屬積層板)的金屬箔實施電路(線路)加工。 The manufacturing method of the printed circuit board of the present invention is not particularly limited, and it can be manufactured by implementing a circuit on the metal foil of the laminate (metal-clad laminate) of the present invention provided with metal foil on one or both sides (Line) processing.
[實施例] [Example]
以下,列舉實施例來具體說明本發明,但本發明並不受此等實施例所限定。再者,下述例中的數值,只要未特別說明,即是意指質量%。 Hereinafter, examples are given to specifically illustrate the present invention, but the present invention is not limited by these examples. In addition, the numerical values in the following examples mean mass% unless otherwise specified.
[實施例1~實施例13] [Example 1~Example 13]
以表1所示的調配量來調配(A)成分、(B-1)成分、(B-2)成分、(C-1)成分、(C-2)成分,並使該等成分 溶於甲基乙基酮中後,依照表1來調配(D)成分、耦合劑,而獲得非揮發份40%的樹脂組成物清漆。 The (A) component, (B-1) component, (B-2) component, (C-1) component, and (C-2) component were blended in the blending amounts shown in Table 1, and these components After dissolving in methyl ethyl ketone, the component (D) and coupling agent were blended according to Table 1 to obtain a resin composition varnish with a non-volatile content of 40%.
[比較例1~比較例10] [Comparative Example 1~Comparative Example 10]
以表2所示的調配量來調配(A)成分、(B-1)成分、(B-2)成分、(C-1)成分、(C-2)成分,並使該等成分溶於甲基乙基酮中後,依照表2來調配(D)成分,而獲得非揮發份40%的樹脂組成物清漆。 Mix (A) component, (B-1) component, (B-2) component, (C-1) component, (C-2) component in the mixing amount shown in Table 2, and dissolve these components After in the methyl ethyl ketone, the component (D) was blended according to Table 2 to obtain a resin composition varnish with a non-volatile content of 40%.
[預浸體、附有樹脂之金屬箔、覆金屬積層板之製作] [Production of prepreg, metal foil with resin, and metal-clad laminate]
(1)預浸體之製作 (1) Production of prepreg
使實施例1~13、比較例1~10中所製得之清漆含浸於厚度0.028mm的玻璃布「1037」(Asahi-Schwebel股份有限公司製,商品名)中後,在140℃加熱10分鐘,並乾燥,而獲得預浸體。 The varnishes prepared in Examples 1 to 13 and Comparative Examples 1 to 10 were impregnated with a 0.028 mm thick glass cloth "1037" (manufactured by Asahi-Schwebel Co., Ltd., trade name), and heated at 140°C for 10 minutes , And dried to obtain a prepreg.
(2)附有樹脂之銅箔之製作 (2) Production of copper foil with resin
使用塗佈機,來於厚度18μm的電解銅箔「YGP-18」(日本電解股份有限公司製,商品名)對實施例1~13、比較例1~10中所製得之清漆進行塗佈成型,並在140℃進行熱風乾燥約6分鐘,而獲得塗佈厚度50μm的附有樹脂之銅箔。 Use a coater to coat the varnishes prepared in Examples 1 to 13 and Comparative Examples 1 to 10 on 18μm thick electrolytic copper foil "YGP-18" (manufactured by Nippon Electrolytic Co., Ltd., trade name) Molded and dried with hot air at 140°C for about 6 minutes to obtain a resin-coated copper foil with a coating thickness of 50μm.
(3)覆金屬積層板(覆銅積層板)之製作 (3) Production of metal-clad laminate (copper-clad laminate)
將(1)中所製成之預浸體重疊4片後,將厚度18μm的電解銅箔「YGP-18」(日本電解股份有限公司製,商品名)以使黏著面與預浸體密合之方式重疊於該經重疊之 預浸體的兩側,並在200℃ 60分鐘、4MPa之真空加壓條件下製作雙面覆銅積層板。此外,將附有樹脂之銅箔以使樹脂面相互面對面之方式重疊,並在200℃ 60分鐘、4MPa之真空加壓條件下製作雙面覆銅積層板。 After stacking 4 sheets of the prepreg made in (1), an 18μm thick electrolytic copper foil "YGP-18" (manufactured by Nippon Electrolytic Co., Ltd., trade name) is applied so that the adhesive surface and the prepreg are in close contact The way overlaps the overlapped On both sides of the prepreg, double-sided copper clad laminates were made under vacuum pressure at 200°C for 60 minutes and 4MPa. In addition, the resin-coated copper foil was overlapped so that the resin surfaces face each other, and a double-sided copper-clad laminate was fabricated under vacuum pressure conditions at 200°C for 60 minutes and 4 MPa.
[清漆、預浸體及覆金屬積層板之評估方法] [Evaluation method of varnish, prepreg and metal-clad laminate]
(1)清漆性 (1) Varnish properties
清漆性之評估,是將製得之清漆裝入透明容器中並藉由肉眼來觀察24小時後的外觀,觀察清漆成分的分離及沉積物。若清漆色相均勻,則判斷為未分離。此外,當以肉眼無法確認在容器底部有沉積物堆積時判斷為無沉積物。結果是如表1、2所示。 The evaluation of varnish properties is to put the prepared varnish into a transparent container and observe the appearance after 24 hours by naked eyes to observe the separation of varnish components and deposits. If the varnish has a uniform hue, it is judged as not separated. In addition, when it is impossible to visually confirm that there is deposit accumulation on the bottom of the container, it is judged that there is no deposit. The results are shown in Tables 1 and 2.
(2)預浸體的黏性 (2) The viscosity of the prepreg
預浸體的黏性之評估,是將製得之預浸體加工成250mm×250mm大小並重疊100片後放入能夠以密閉之方式密封的袋中,然後投入溫度25℃、濕度70%的恆溫恆濕環境中,觀察有無預浸體彼此發生密合。經過48小時後,將配置於最下方的預浸體及與其鄰接之預浸體剝下後,當各預浸體維持投入前的表面時,設為無發生密合,並判斷為黏性無問題。結果是如表1、2所示。 The evaluation of the viscosity of the prepreg is to process the prepared prepreg into a size of 250mm×250mm and overlap 100 pieces, then put it into a bag that can be sealed in a hermetically sealed manner, and then put it in a bag with a temperature of 25°C and a humidity of 70%. In a constant temperature and humidity environment, observe whether the prepregs adhere to each other. After 48 hours, after peeling off the prepreg arranged at the bottom and the prepreg adjacent to it, when each prepreg maintains the surface before being put in, it is determined that there is no adhesion, and it is judged that there is no adhesion. problem. The results are shown in Tables 1 and 2.
(3)預浸體的外觀(凝集物之有無) (3) The appearance of the prepreg (the presence or absence of agglomerates)
預浸體的外觀之評估,是使用20倍的放大鏡來觀察凝集物之產生。結果是如表1、2所示。 The appearance of the prepreg was evaluated by using a 20-fold magnifying glass to observe the generation of agglomerates. The results are shown in Tables 1 and 2.
(4)儲存彈性模數 (4) Storage elastic modulus
儲存彈性模數之評估,是對將附有樹脂之銅箔以使樹脂面相互面對面之方式重疊而製得之覆銅積層板的整面進行蝕刻而獲得積層板,並將該積層板切割成寬度5mm×長度30mm後,使用動態黏彈性測定裝置(UBM股份有限公司製)來算出儲存彈性模數。若25℃的儲存彈性模數為2.0×109Pa以下,則判斷為能夠顯現應力鬆弛效果。結果是如表1、2所示。 The evaluation of the storage elastic modulus is to etch the entire surface of the copper-clad laminate made by overlapping the resin-coated copper foil so that the resin faces face each other to obtain the laminate, and cut the laminate into After a width of 5 mm × a length of 30 mm, a dynamic viscoelasticity measuring device (manufactured by UBM Co., Ltd.) was used to calculate the storage elastic modulus. If the storage elastic modulus at 25°C is 2.0×10 9 Pa or less, it is judged that the stress relaxation effect can be expressed. The results are shown in Tables 1 and 2.
(5)抗拉伸長率(tensile elongation) (5) Tensile elongation
抗拉伸長率之評估,是對將附有樹脂之銅箔以使樹脂面相互面對面之方式重疊而製得之覆銅積層板的整面進行蝕刻而獲得積層板,並將該積層板切割成寬度10mm×長度100mm後,使用自動繪圖機(autograph)(島津製作所製)來算出抗拉伸長率。若25℃的抗拉伸長率為3%以上,則判斷為能夠顯現應力鬆弛效果。結果是如表1、2所示。 The evaluation of the tensile strength is to etch the entire surface of the copper-clad laminate made by overlapping the resin-coated copper foil so that the resin faces face each other to obtain the laminate, and cut the laminate into After a width of 10 mm × a length of 100 mm, an autograph (manufactured by Shimadzu Corporation) was used to calculate the elongation resistance rate. If the tensile length resistance at 25°C is 3% or more, it is judged that the stress relaxation effect can be expressed. The results are shown in Tables 1 and 2.
(6)耐熱性 (6) Heat resistance
將由經重疊4片的預浸體所製得之雙面覆銅積層板切割成四邊為50mm的正方形,而獲得試驗片。將該試驗片浸漬於260℃的焊料浴中,並測定從該時間點直到以肉眼能夠確認試驗片膨脹之時間點為止所經過之時間。經過時間的測定是設為直到300秒為止,300秒以上判斷為耐熱性充分。結果是如表1、2所示。 The double-sided copper-clad laminated board made of 4 overlapped prepregs was cut into a square with four sides of 50 mm to obtain a test piece. The test piece was immersed in a solder bath at 260°C, and the time elapsed from this point in time to the point in time when the test piece swelling can be confirmed with the naked eye was measured. The elapsed time was measured until 300 seconds, and it was judged that the heat resistance was sufficient for 300 seconds or more. The results are shown in Tables 1 and 2.
(7)金屬箔對基板之黏著性之評估 (7) Evaluation of the adhesion of metal foil to the substrate
對由經重疊4片的預浸體所製得之雙面覆銅積層板之銅箔的一部分進行蝕刻,而形成3mm寬的銅箔線。然後,對銅箔線測定以50mm/分鐘的速度來朝相對於黏著面為90°方向剝離時之載重後,設為銅箔剝離強度。若銅箔剝離強度為0.5kN/m以上,則判斷為與金屬箔之間的黏著性充分。結果是如表1、2所示。 A part of the copper foil of the double-sided copper-clad laminate made of 4 sheets of prepreg was etched to form a copper foil wire with a width of 3 mm. Then, after measuring the load when the copper foil wire is peeled in a direction of 90° with respect to the adhesive surface at a speed of 50 mm/min, it is set as the copper foil peeling strength. If the copper foil peel strength is 0.5 kN/m or more, it is judged that the adhesion to the metal foil is sufficient. The results are shown in Tables 1 and 2.
(8)相結構觀察試驗 (8) Phase structure observation test
島相的平均區域大小,是使用切片機來對將附有樹脂之銅箔以使樹脂面相互面對面之方式重疊而製得之覆銅積層板之樹脂絕緣層的剖面進行平滑化後,以過硫酸鹽溶液來進行蝕刻後,使用電子顯微鏡,來從所獲得的剖面結構對70個以上島相分別測定最大寬度及最小寬度,並算出其平均值。結果是如表1、2所示。 The average area size of the island phase is obtained by using a slicer to smooth the cross section of the resin insulating layer of the copper clad laminate made by overlapping the resin-coated copper foil so that the resin faces face each other. After etching with a sulfate solution, an electron microscope was used to measure the maximum width and minimum width of 70 or more island phases from the obtained cross-sectional structure, and calculate the average value. The results are shown in Tables 1 and 2.
(9)電絕緣可靠性 (9) Electrical insulation reliability
電絕緣可靠性,是使用以使貫穿孔的孔壁間隔成為350μm之方式對由經重疊4片的預浸體所製得之雙面覆銅積層板進行加工而成之試驗圖案,對各樣品經時地測定400個孔的絕緣電阻。測定條件是在85℃/85% RH的環境中施加100V來進行,測定直到發生導通破壞為止之時間。測定時間是設為直到2000小時為止,1000小時以上判斷為電絕緣可靠性充分。結果是如表1、2所示。 Electrical insulation reliability is a test pattern formed by processing a double-sided copper-clad laminate made of 4 sheets of prepreg so that the distance between the walls of the through-holes becomes 350μm. For each sample The insulation resistance of 400 holes was measured over time. The measurement condition is to apply 100V in an environment of 85°C/85% RH, and measure the time until conduction failure occurs. The measurement time was set to 2000 hours, and it was judged that the electrical insulation reliability was sufficient for 1000 hours or more. The results are shown in Tables 1 and 2.
[表1]
[表2]
※1:商品名「KH-CT-865」,日立化成股份有限公司製,(重量平均分子量:Mw=45×104~65×104,作為式(1)所示之化合物,含有在酯部分具有碳數5~10的環烷基之甲基丙烯酸酯且結構中不含腈基之丙烯酸系聚合物) ※1: Trade name "KH-CT-865", manufactured by Hitachi Chemical Co., Ltd., (weight average molecular weight: Mw=45×10 4 ~65×10 4 , as the compound represented by formula (1), containing in ester Part of the methacrylate with carbon 5-10 cycloalkyl and acrylic polymer without nitrile group in the structure)
※2:商品名「HTR-860P-3」,Nagase ChemteX股份有限公司製,(重量平均分子量:Mw=80×104,在結構中不含腈基之丙烯酸系聚合物) ※2: Trade name "HTR-860P-3", manufactured by Nagase ChemteX Co., Ltd. (weight average molecular weight: Mw=80×10 4 , acrylic polymer without nitrile group in the structure)
※3:商品名「HAN5-M90S」,根上工業股份有限公司製,(重量平均分子量:Mw=90×104,在結構中不含腈基之丙烯酸系聚合物) ※3: Trade name "HAN5-M90S", manufactured by Nejo Industrial Co., Ltd. (weight average molecular weight: Mw=90×10 4 , acrylic polymer without nitrile group in the structure)
※4:商品名「N770」,DIC股份有限公司製,(苯酚酚醛清漆型環氧樹脂) ※4: Trade name "N770", manufactured by DIC Co., Ltd. (phenol novolac type epoxy resin)
※5:商品名「EPICLON 153」,DIC股份有限公司製,(四溴雙酚A型環氧樹脂) ※5: Trade name "EPICLON 153", manufactured by DIC Co., Ltd. (Tetrabromobisphenol A epoxy resin)
※6:商品名「NC-3000H」,日本化藥股份有限公司製,(聯苯芳烷基型環氧樹脂) ※6: Trade name "NC-3000H", manufactured by Nippon Kayaku Co., Ltd. (Biphenyl aralkyl type epoxy resin)
※7:商品名「4005P」,三菱化學股份有限公司製,(雙酚F型環氧樹脂) ※7: Trade name "4005P", manufactured by Mitsubishi Chemical Corporation, (bisphenol F type epoxy resin)
※8:商品名「KA-1165」,DIC股份有限公司製,(甲酚酚醛清漆型樹脂) ※8: Trade name "KA-1165", manufactured by DIC Co., Ltd. (cresol novolac type resin)
※9:商品名「SC-2050KC」,Admatechs股份有限公司製,(熔融球狀氧化矽,矽烷耦合處理,平均粒徑0.5μm) ※9: Trade name "SC-2050KC", manufactured by Admatechs Co., Ltd. (Molten spherical silica, silane coupling treatment, average particle size 0.5μm)
※10:商品名「HK-001」,河合石灰股份有限公司製,(氫氧化鋁,平均粒徑4.0μm) ※10: Trade name "HK-001", manufactured by Kawai Lime Co., Ltd. (aluminum hydroxide, average particle size 4.0μm)
※11:商品名「F05-12」,福島窯業股份有限公司製,(粉碎氧化矽,平均粒徑2.5μm) ※11: Trade name "F05-12", manufactured by Fukushima Ceramics Co., Ltd. (Crushed silica, average particle size 2.5μm)
※12:商品名「F05-30」,福島窯業股份有限公司製,(粉碎氧化矽,平均粒徑4.2μm) ※12: Trade name "F05-30", manufactured by Fukushima Ceramics Co., Ltd. (Crushed silica, average particle size 4.2μm)
※13:商品名「2PZ」,四國化成工業股份有限公司製,(2-苯基咪唑) ※13: Trade name "2PZ", manufactured by Shikoku Chemical Industry Co., Ltd., (2-phenylimidazole)
※14:商品名「A-187」,Dow Corning Toray股份有限公司製,(矽烷耦合劑) ※14: Trade name "A-187", manufactured by Dow Corning Toray Co., Ltd. (Silane coupling agent)
由表1明顯可知,本發明的實施例之低彈性、耐熱性、與金屬箔之間的黏著性、絕緣可靠性全部優異。另一方面,比較例之低彈性、耐熱性、與金屬箔之間的黏著性、絕緣可靠性全部不優異。 It is clear from Table 1 that the examples of the present invention are all excellent in low elasticity, heat resistance, adhesion to metal foil, and insulation reliability. On the other hand, the comparative example is not excellent in low elasticity, heat resistance, adhesion to metal foil, and insulation reliability.
若藉由本發明的樹脂組成物、預浸體、附有金屬箔之預浸體、積層板、覆金屬積層板及印刷電路基板,則具有低彈性、高絕緣可靠性、高耐熱性及與金屬箔之間的高黏著性。 If the resin composition, prepreg, prepreg with metal foil, laminate, metal-clad laminate, and printed circuit board of the present invention are used, it has low elasticity, high insulation reliability, high heat resistance, and is compatible with metal High adhesion between foils.
Claims (16)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW109130091A TWI778410B (en) | 2016-05-13 | 2016-05-13 | Prepregs, Prepregs with Metal Foils, Laminates, Metal-Clad Laminates, and Printed Circuit Boards |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW109130091A TWI778410B (en) | 2016-05-13 | 2016-05-13 | Prepregs, Prepregs with Metal Foils, Laminates, Metal-Clad Laminates, and Printed Circuit Boards |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202126741A true TW202126741A (en) | 2021-07-16 |
TWI778410B TWI778410B (en) | 2022-09-21 |
Family
ID=77908844
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109130091A TWI778410B (en) | 2016-05-13 | 2016-05-13 | Prepregs, Prepregs with Metal Foils, Laminates, Metal-Clad Laminates, and Printed Circuit Boards |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI778410B (en) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011162615A (en) * | 2010-02-05 | 2011-08-25 | Kyocera Chemical Corp | Prepreg and metal-clad laminated plate |
JP5723505B2 (en) * | 2011-03-31 | 2015-05-27 | 東邦テナックス株式会社 | Resin composition, cured product, prepreg, and fiber reinforced composite material |
US20140309337A1 (en) * | 2011-12-27 | 2014-10-16 | Toray Industries, Inc. | Epoxy resin composition for fiber-reinforced composite materials, prepreg, and fiber-reinforced composite material |
-
2016
- 2016-05-13 TW TW109130091A patent/TWI778410B/en active
Also Published As
Publication number | Publication date |
---|---|
TWI778410B (en) | 2022-09-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US11691389B2 (en) | Resin composition, prepreg, metal foil with resin, laminate, printed wiring board, and method for producing resin composition | |
KR101776560B1 (en) | Resin composition, prepreg, metal-foil-clad laminated board, resin composite sheet, and printed circuit board | |
JP6277542B2 (en) | Prepreg, metal-clad laminate | |
TWI555792B (en) | Halogen-free resin composition and prepreg and laminate made thereof | |
TW201625722A (en) | Prepreg, metal-clad laminated board, and printed wiring board | |
JP2010209140A (en) | Prepreg, metal-clad laminate and printed circuit board | |
JP6996500B2 (en) | Prepreg, prepreg with metal foil, laminated board, metal-clad laminated board and printed circuit board | |
JP6451204B2 (en) | Resin composition, prepreg, metal foil with resin, and laminate and printed wiring board using these | |
JP6972651B2 (en) | Resin composition, prepreg, metal foil with resin, laminated board and printed wiring board | |
TWI764902B (en) | Resin composition for printed wiring board and resin sheet for printed wiring board using the same | |
JP5699742B2 (en) | Phosphorus-containing acrylic resin and method for producing the same, acrylic resin composition, resin film, prepreg, metal foil with resin, metal foil-clad laminate, and printed wiring board | |
TWI778410B (en) | Prepregs, Prepregs with Metal Foils, Laminates, Metal-Clad Laminates, and Printed Circuit Boards | |
TWI777919B (en) | Prepregs, Prepregs with Metal Foils, Laminates, Metal-Clad Laminates, and Printed Circuit Boards | |
JP7070074B2 (en) | Resin composition, prepreg, metal leaf with resin, laminated board and printed wiring board | |
JP4526783B2 (en) | Adhesive composition for laminating flexible printed wiring board and adhesive film | |
JP2022122082A (en) | Resin compositions, prepregs, resin-coated metal foils, laminates, printed wiring boards, and semiconductor packages | |
JP2008266513A (en) | Curable resin composition, prepreg, laminate, metal foil with adhesive layer, film sheet, and printed wiring board using these materials | |
KR20110005485A (en) | Resin composition for printed circuit board and printed circuit board using same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4A | Issue of patent certificate for granted invention patent |