JP2008266513A - Curable resin composition, prepreg, laminate, metal foil with adhesive layer, film sheet, and printed wiring board using these materials - Google Patents
Curable resin composition, prepreg, laminate, metal foil with adhesive layer, film sheet, and printed wiring board using these materials Download PDFInfo
- Publication number
- JP2008266513A JP2008266513A JP2007114150A JP2007114150A JP2008266513A JP 2008266513 A JP2008266513 A JP 2008266513A JP 2007114150 A JP2007114150 A JP 2007114150A JP 2007114150 A JP2007114150 A JP 2007114150A JP 2008266513 A JP2008266513 A JP 2008266513A
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- curable resin
- metal foil
- prepreg
- adhesive layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000011342 resin composition Substances 0.000 title claims abstract description 38
- 239000011888 foil Substances 0.000 title claims abstract description 19
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 17
- 239000002184 metal Substances 0.000 title claims abstract description 17
- 239000012790 adhesive layer Substances 0.000 title claims abstract description 10
- 239000000463 material Substances 0.000 title claims description 9
- 229920000800 acrylic rubber Polymers 0.000 claims abstract description 25
- 229920000058 polyacrylate Polymers 0.000 claims abstract description 25
- 229920005989 resin Polymers 0.000 claims abstract description 23
- 239000011347 resin Substances 0.000 claims abstract description 23
- 239000000758 substrate Substances 0.000 claims abstract description 19
- 239000000835 fiber Substances 0.000 claims abstract description 12
- 239000000945 filler Substances 0.000 claims abstract description 11
- 229920001187 thermosetting polymer Polymers 0.000 claims abstract description 8
- 238000012545 processing Methods 0.000 claims abstract description 4
- 239000003822 epoxy resin Substances 0.000 claims description 25
- 229920000647 polyepoxide Polymers 0.000 claims description 25
- 239000005011 phenolic resin Substances 0.000 claims description 11
- 239000004593 Epoxy Substances 0.000 claims description 8
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 7
- 238000001035 drying Methods 0.000 claims description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000010030 laminating Methods 0.000 claims description 2
- 238000003825 pressing Methods 0.000 claims description 2
- 239000000843 powder Substances 0.000 abstract description 9
- 239000002966 varnish Substances 0.000 description 14
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 10
- -1 acrylate amide Chemical class 0.000 description 8
- 239000011889 copper foil Substances 0.000 description 8
- 229920003986 novolac Polymers 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 229910052698 phosphorus Inorganic materials 0.000 description 5
- 239000011574 phosphorus Substances 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 3
- 239000004305 biphenyl Substances 0.000 description 3
- 235000010290 biphenyl Nutrition 0.000 description 3
- 229930003836 cresol Natural products 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 239000003063 flame retardant Substances 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 150000002460 imidazoles Chemical class 0.000 description 3
- 235000013824 polyphenols Nutrition 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- CDFCBRMXZKAKKI-UHFFFAOYSA-N 2-hydroxybenzaldehyde;phenol Chemical compound OC1=CC=CC=C1.OC1=CC=CC=C1C=O CDFCBRMXZKAKKI-UHFFFAOYSA-N 0.000 description 2
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 2
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 2
- FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 2
- 239000004342 Benzoyl peroxide Substances 0.000 description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 150000003014 phosphoric acid esters Chemical class 0.000 description 2
- 150000003018 phosphorus compounds Chemical class 0.000 description 2
- 229920000137 polyphosphoric acid Polymers 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 1
- BOJZPUPAXYETRK-UHFFFAOYSA-N 1,1-diphenylethane-1,2-diamine Chemical compound C=1C=CC=CC=1C(N)(CN)C1=CC=CC=C1 BOJZPUPAXYETRK-UHFFFAOYSA-N 0.000 description 1
- BHAYFXKTLWGHHO-UHFFFAOYSA-N 1-ethenylpyrrolidin-2-one;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.C=CN1CCCC1=O BHAYFXKTLWGHHO-UHFFFAOYSA-N 0.000 description 1
- GUQJTTJZPGRWIK-UHFFFAOYSA-N 1-ethenylpyrrolidin-2-one;prop-2-enoic acid Chemical compound OC(=O)C=C.C=CN1CCCC1=O GUQJTTJZPGRWIK-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- HFCUBKYHMMPGBY-UHFFFAOYSA-N 2-methoxyethyl prop-2-enoate Chemical compound COCCOC(=O)C=C HFCUBKYHMMPGBY-UHFFFAOYSA-N 0.000 description 1
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- SESYNEDUKZDRJL-UHFFFAOYSA-N 3-(2-methylimidazol-1-yl)propanenitrile Chemical compound CC1=NC=CN1CCC#N SESYNEDUKZDRJL-UHFFFAOYSA-N 0.000 description 1
- SZUPZARBRLCVCB-UHFFFAOYSA-N 3-(2-undecylimidazol-1-yl)propanenitrile Chemical compound CCCCCCCCCCCC1=NC=CN1CCC#N SZUPZARBRLCVCB-UHFFFAOYSA-N 0.000 description 1
- XUSNPFGLKGCWGN-UHFFFAOYSA-N 3-[4-(3-aminopropyl)piperazin-1-yl]propan-1-amine Chemical compound NCCCN1CCN(CCCN)CC1 XUSNPFGLKGCWGN-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- COCLLEMEIJQBAG-UHFFFAOYSA-N 8-methylnonyl 2-methylprop-2-enoate Chemical compound CC(C)CCCCCCCOC(=O)C(C)=C COCLLEMEIJQBAG-UHFFFAOYSA-N 0.000 description 1
- LVGFPWDANALGOY-UHFFFAOYSA-N 8-methylnonyl prop-2-enoate Chemical compound CC(C)CCCCCCCOC(=O)C=C LVGFPWDANALGOY-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
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- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
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- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
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- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
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- IAXXETNIOYFMLW-COPLHBTASA-N [(1s,3s,4s)-4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl] 2-methylprop-2-enoate Chemical compound C1C[C@]2(C)[C@@H](OC(=O)C(=C)C)C[C@H]1C2(C)C IAXXETNIOYFMLW-COPLHBTASA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
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- 239000010425 asbestos Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
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- 125000004122 cyclic group Chemical group 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
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- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
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- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical class [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
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- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
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- 238000000465 moulding Methods 0.000 description 1
- GKTNLYAAZKKMTQ-UHFFFAOYSA-N n-[bis(dimethylamino)phosphinimyl]-n-methylmethanamine Chemical class CN(C)P(=N)(N(C)C)N(C)C GKTNLYAAZKKMTQ-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
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- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 1
- FSAJWMJJORKPKS-UHFFFAOYSA-N octadecyl prop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C=C FSAJWMJJORKPKS-UHFFFAOYSA-N 0.000 description 1
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- 239000002245 particle Substances 0.000 description 1
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- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical compound C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- OPQYOFWUFGEMRZ-UHFFFAOYSA-N tert-butyl 2,2-dimethylpropaneperoxoate Chemical compound CC(C)(C)OOC(=O)C(C)(C)C OPQYOFWUFGEMRZ-UHFFFAOYSA-N 0.000 description 1
- PFBLRDXPNUJYJM-UHFFFAOYSA-N tert-butyl 2-methylpropaneperoxoate Chemical compound CC(C)C(=O)OOC(C)(C)C PFBLRDXPNUJYJM-UHFFFAOYSA-N 0.000 description 1
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 1
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- AYEKOFBPNLCAJY-UHFFFAOYSA-O thiamine pyrophosphate Chemical compound CC1=C(CCOP(O)(=O)OP(O)(O)=O)SC=[N+]1CC1=CN=C(C)N=C1N AYEKOFBPNLCAJY-UHFFFAOYSA-O 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Landscapes
- Reinforced Plastic Materials (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Abstract
Description
本発明は、硬化性樹脂組成物、プリプレグ、積層板、接着層付金属箔、フィルムシート及びこれらを使用したプリント配線板に関する。 The present invention relates to a curable resin composition, a prepreg, a laminate, a metal foil with an adhesive layer, a film sheet, and a printed wiring board using these.
近年、電子機器の小型化、高性能化が急速に進むのに伴って電子部品の搭載密度が高くなっている。そのため、プリント配線板の多層化、スルーホールの小径化及び穴間隔の減少等の要求が益々高まり、プリント配線板には電気絶縁特性が厳しく要求されている。電気絶縁性の樹脂としては、フェノール樹脂、エポキシ樹脂、ポリイミド樹脂、ポリアミドイミド樹脂、ビスマレイミド−トリアジン樹脂などのような熱硬化性樹脂が汎用され、フッ素樹脂、ポリフェノールエーテル樹脂等のような熱可塑性樹脂が用いられることもある。 In recent years, the mounting density of electronic components has increased as electronic devices have been rapidly reduced in size and performance. For this reason, demands for multilayered printed wiring boards, reduced through-hole diameters, and reduced hole spacing are increasing, and printed wiring boards are strictly required to have electrical insulation characteristics. As the electrically insulating resin, thermosetting resins such as phenol resins, epoxy resins, polyimide resins, polyamideimide resins, bismaleimide-triazine resins are widely used, and thermoplastic resins such as fluororesins and polyphenol ether resins are used. A resin may be used.
一方、プリント配線板の小型化、高密度化が進むことにより、その実装形態はピン挿入型から表面実装型へ、更にはプラステック基板を使用したBGA(ボールグリッドアレイ)に代表されるエリアアレイ型へと進んでいる。BGAのようなベアチップを直接実装する基板では、チップと基板の接続は、熱超音波圧着によるワイヤボンディングで行うのが一般的である。このため、ベアチップを実装する基板は150℃以上の高温にさらされることになり、基板中の電気絶縁性樹脂にはある程度の耐熱性が必要とされる。また、基板には一度実装したチップを外す、いわゆるリペアが可能であることも要求される場合がある。リペアにおいては、実装したチップを外す際、及び、再度チップを実装する際に、基板に対して最初のチップ実装時と同程度の熱が加えられる。従って、リペア性の必要とされる基板はサイクル的に加えられる熱履歴に耐える耐熱衝撃性も高めることが要求されるが、一般に電気絶縁性の樹脂は、この耐熱衝撃性の不足により、繊維基材と樹脂の間で剥離を起こすなどの不具合を生じる場合があった。この点でも基板中の電気絶縁性の樹脂には高い耐熱性が要求される。 On the other hand, with the progress of miniaturization and high density of printed wiring boards, the mounting form is changed from a pin insertion type to a surface mounting type, and further an area array represented by BGA (ball grid array) using a plastic substrate. Progressing to mold. In a substrate on which a bare chip such as a BGA is directly mounted, the connection between the chip and the substrate is generally performed by wire bonding by thermosonic bonding. For this reason, the board | substrate which mounts a bare chip will be exposed to 150 degreeC or more high temperature, and a certain amount of heat resistance is required for the electrically insulating resin in a board | substrate. In addition, it may be required that a so-called repair is possible, in which a chip once mounted is removed from the substrate. In the repair, when removing the mounted chip and mounting the chip again, the same amount of heat is applied to the substrate as in the first chip mounting. Therefore, a substrate that requires repairability is required to have improved thermal shock resistance that can withstand the heat history that is cyclically applied. In general, however, an electrically insulating resin has a fiber base due to the lack of thermal shock resistance. In some cases, there was a problem such as peeling between the material and the resin. Also in this respect, high heat resistance is required for the electrically insulating resin in the substrate.
また、環境問題の観点からはんだの鉛フリー化が進み、はんだの溶融温度が高温化するため、基板にはより高い耐熱性が要求される。材料にもハロゲンフリーの要求が高まり、臭素系難燃剤の使用が難しくなってきている。 In addition, from the viewpoint of environmental problems, the lead-free solder advances, and the melting temperature of the solder increases, so that higher heat resistance is required for the substrate. The demand for halogen-free materials has also increased, making it difficult to use brominated flame retardants.
本発明は、上記従来技術の問題点を解消し、金属箔や繊維基材との接着性に優れ、可とう性の高い樹脂を薄い繊維基材に含浸することで、寸法安定性、耐熱性に優れ、プリント配線板としたときに折り曲げ可能で、加工時の樹脂粉の脱落が生じることを防ぎ、歩留まりが良好なプリント配線板及び該プリント配線板を与える硬化性樹脂組成物、プリプレグ、積層板、接着層付金属箔、フィルムシートを提供するものである。 The present invention eliminates the above-mentioned problems of the prior art, and impregnates a thin fiber substrate with a highly flexible resin having excellent adhesion to a metal foil or a fiber substrate, thereby providing dimensional stability and heat resistance. Excellent printed circuit board that can be bent when used as a printed wiring board, prevents the resin powder from falling off during processing, and has a good yield, and a curable resin composition that gives the printed wiring board, prepreg, and lamination A plate, a metal foil with an adhesive layer, and a film sheet are provided.
本発明は次のものに関する。
1. アクリルゴム(A)と熱硬化性樹脂(B)とフィラー(C)を含む硬化性樹脂組成物。
2. アクリルゴム(A)とフィラー(C)の重量比率(A)/(C)が、0.1〜4.0の範囲にある項1に記載の硬化性樹脂組成物。
3. ハロゲンフリーである項1または2に記載の硬化性樹脂組成物。
4. アクリルゴム(A)が、グリシジル基を有し、エポキシ価は2〜18等量/kgである、項1〜3のいずれか一項に記載の硬化性樹脂組成物。
5. アクリルゴム(A)の重量平均分子量が、1万〜200万である、項1〜4のいずれか一項に記載の硬化性樹脂組成物。
6. 熱硬化性樹脂(B)が、エポキシ樹脂又はフェノール樹脂を含む、項1〜5のいずれか一項に記載の硬化性樹脂組成物。
7. フェノール樹脂が、フェノール性水酸基を2個以上有する、項6に記載の硬化性樹脂組成物。
8. 繊維基材に、項1〜7のいずれか一項に記載の硬化性樹脂組成物を含浸乾燥してなるプリプレグ。
9. 繊維基材の厚さが100μm以下である、項8記載のプリプレグ。
10. 項8又は9に記載のプリプレグを所定の枚数積層し、加熱加圧してなる積層板。
11. 金属箔と、前記金属箔上に設けられた項1〜7のいずれか一項に記載の硬化性樹脂組成物からなる接着層を有する接着層付金属箔。
12. 項1〜7のいずれか一項に記載の硬化性樹脂組成物からなるフィルムシート。
13. 項11記載の接着層付金属箔または請求項12記載のフィルムシートを使用してなる積層板。
14. 項10または13に記載の積層板に、配線加工してなるプリント配線板。
The present invention relates to the following.
1. A curable resin composition comprising an acrylic rubber (A), a thermosetting resin (B), and a filler (C).
2. Item 2. The curable resin composition according to Item 1, wherein the weight ratio (A) / (C) of the acrylic rubber (A) and the filler (C) is in the range of 0.1 to 4.0.
3. Item 3. The curable resin composition according to Item 1 or 2, which is halogen-free.
4). Item 4. The curable resin composition according to any one of Items 1 to 3, wherein the acrylic rubber (A) has a glycidyl group and has an epoxy value of 2 to 18 equivalents / kg.
5. Item 5. The curable resin composition according to any one of Items 1 to 4, wherein the acrylic rubber (A) has a weight average molecular weight of 10,000 to 2,000,000.
6). Item 6. The curable resin composition according to any one of Items 1 to 5, wherein the thermosetting resin (B) comprises an epoxy resin or a phenol resin.
7). Item 7. The curable resin composition according to Item 6, wherein the phenol resin has two or more phenolic hydroxyl groups.
8). A prepreg obtained by impregnating and drying the curable resin composition according to any one of Items 1 to 7 on a fiber substrate.
9. Item 9. The prepreg according to Item 8, wherein the fiber substrate has a thickness of 100 µm or less.
10. A laminate obtained by laminating a predetermined number of the prepregs according to Item 8 or 9, and heating and pressing the laminate.
11. Metal foil with an adhesive layer which has an adhesive layer which consists of metal foil and the curable resin composition as described in any one of Claims 1-7 provided on the said metal foil.
12 The film sheet which consists of curable resin composition as described in any one of claim | item 1 -7.
13. A laminate comprising the metal foil with an adhesive layer according to Item 11 or the film sheet according to Claim 12.
14 Item 14. A printed wiring board obtained by subjecting the laminated board according to Item 10 or 13 to wiring processing.
本発明におけるプリプレグで得られる金属張積層板及びプリント配線板は任意に折り曲げ可能でありハロゲンフリーで難燃性を示し、粉落ちが少なく、絶縁信頼性、寸法安定性、耐熱性に優れる。 The metal-clad laminate and printed wiring board obtained by the prepreg in the present invention can be arbitrarily bent, are halogen-free and show flame retardancy, have little powder fall, and are excellent in insulation reliability, dimensional stability, and heat resistance.
アクリルゴム(A)は、通常(メタ)アクリル酸アルキルエステルをモノマーとする共重合体からなるゴムである。共重合体は一般に、(メタ)アクリル酸アルキルエステルと2重結合を有する化合物とを共重合することにより生成される。(メタ)アクリル酸アルキルエステルにおいて、アルキル基が置換基を有していてもよい炭素数1〜20のアルキル基であることが好ましい。アルキル基の置換基としては、脂環式基、グリシジル基、水酸基を有する炭素数1〜6のアルキル基、含窒素環状基などが挙げられる。2重結合を有する化合物は、(メタ)アクリル酸アルキルエステルと共重合できる化合物であれば特に制限されない。 The acrylic rubber (A) is usually a rubber made of a copolymer having a (meth) acrylic acid alkyl ester as a monomer. The copolymer is generally produced by copolymerizing a (meth) acrylic acid alkyl ester and a compound having a double bond. In the (meth) acrylic acid alkyl ester, the alkyl group is preferably an alkyl group having 1 to 20 carbon atoms which may have a substituent. Examples of the substituent of the alkyl group include an alicyclic group, a glycidyl group, a C1-C6 alkyl group having a hydroxyl group, and a nitrogen-containing cyclic group. The compound having a double bond is not particularly limited as long as it is a compound that can be copolymerized with a (meth) acrylic acid alkyl ester.
(メタ)アクリル酸アルキルエステルの具体例としては、アクリル酸メチル、アクリル酸エチル、アクリル酸プロピル、アクリル酸ブチル、アクリル酸ヘキシル、アクリル酸2−エチルヘキシル、アクリル酸イソブチル、アクリル酸エチレングリコールメチルエーテル、アクリル酸シクロヘキシル、アクリル酸2−ヒドロキシエチル、アクリル酸2−ヒドロキシプロピル、アクリル酸イソボルニル、アクリル酸アミド、アクリル酸イソデシル、アクリル酸オクタデシル、アクリル酸ラウリル、アクリル酸アリル、アクリル酸N−ビニルピロリドン、メタクリル酸メチル、メタクリル酸エチル、メタクリル酸プロピル、メタクリル酸ブチル、メタクリル酸ヘキシル、メタクリル酸2−エチルヘキシル、メタクリル酸イソブチル、メタクリル酸エチレングリコールメチルエーテル、メタクリル酸シクロヘキシル、メタクリル酸2−ヒドロキシエチル、メタクリル酸2−ヒドロキシプロピル、メタクリル酸イソボルニル、メタクリル酸アミド、メタクリル酸イソデシル、メタクリル酸オクタデシル、メタクリル酸ラウリル、メタクリル酸アリル、メタクリル酸N−ビニルピロリドン、アクリロニトリル、ジメチルアミノエチルなどが例示できる。 Specific examples of the (meth) acrylic acid alkyl ester include methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, hexyl acrylate, 2-ethylhexyl acrylate, isobutyl acrylate, ethylene glycol methyl ether acrylate, Cyclohexyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, isobornyl acrylate, acrylate amide, isodecyl acrylate, octadecyl acrylate, lauryl acrylate, allyl acrylate, N-vinylpyrrolidone acrylate, methacryl Methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, hexyl methacrylate, 2-ethylhexyl methacrylate, isobutyl methacrylate, methacrylate Lenglycol methyl ether, cyclohexyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, isobornyl methacrylate, methacrylamide, isodecyl methacrylate, octadecyl methacrylate, lauryl methacrylate, allyl methacrylate, N methacrylate -Vinylpyrrolidone, acrylonitrile, dimethylaminoethyl and the like can be exemplified.
アクリルゴムはグリシジル基を有することが好ましく、(メタ)アクリル酸エステルとして(メタ)アクリル酸グリシジルを用いることが好ましい。アクリルゴムのエポキシ価は、(メタ)アクリル酸グリシジルとこれと共重合可能な他のモノマーとを共重合する際、共重合比を適宜調整することで調節可能である。 The acrylic rubber preferably has a glycidyl group, and glycidyl (meth) acrylate is preferably used as the (meth) acrylic ester. The epoxy value of the acrylic rubber can be adjusted by appropriately adjusting the copolymerization ratio when copolymerizing glycidyl (meth) acrylate and another monomer copolymerizable therewith.
アクリルゴムのエポキシ価は2〜18等量/kgであることが好ましく、2〜8等量/kgであることがより好ましい。エポキシ価が2等量/kg未満であると、硬化物のガラス転移温度の低下によって基板の耐熱性が低下する傾向があり、18等量/kgを超えると、貯蔵弾性率の上昇によって基板の寸法安定性が低下する傾向がある。通常、(メタ)アクリル酸グリシジル100重量部に対して、これ以外のモノマーの比率を5〜15重量部とすることで、2〜18等量/kgのエポキシ価を有するアクリルゴムが得られる。 The epoxy value of the acrylic rubber is preferably 2 to 18 equivalents / kg, more preferably 2 to 8 equivalents / kg. If the epoxy value is less than 2 equivalents / kg, the heat resistance of the substrate tends to decrease due to a decrease in the glass transition temperature of the cured product. Dimensional stability tends to decrease. Usually, an acrylic rubber having an epoxy value of 2 to 18 equivalents / kg is obtained by setting the ratio of other monomers to 5 to 15 parts by weight with respect to 100 parts by weight of glycidyl (meth) acrylate.
エポキシ基を有するアクリルゴムの市販品として、例えば「HTR−860」(ナガセケムテックス株式会社製、商品名、エポキシ価3.05)が入手可能である。アクリルゴムの重量平均分子量は、1万〜200万であることが好ましく、耐熱性を向上させる観点から5万〜150万であることがより好ましく、プリプレグのタックを低減させる観点から、30〜150万であることがより好ましい。上記の重量平均分子量は、ゲル浸透クロマトグラフィー(GPC)分析によって測定される値であって、標準ポリスチレン換算値のことを意味する。GPC分析は、テトラヒドロフラン(THF)を溶解液として用いて行うことができる。 As a commercial item of acrylic rubber having an epoxy group, for example, “HTR-860” (manufactured by Nagase ChemteX Corporation, trade name, epoxy value 3.05) is available. The weight average molecular weight of the acrylic rubber is preferably 10,000 to 2,000,000, more preferably 50,000 to 1,500,000 from the viewpoint of improving heat resistance, and 30 to 150, from the viewpoint of reducing the prepreg tack. More preferably, it is 10,000. The weight average molecular weight is a value measured by gel permeation chromatography (GPC) analysis and means a standard polystyrene equivalent value. The GPC analysis can be performed using tetrahydrofuran (THF) as a solution.
アクリルゴムは、一般的にはラジカルを発生させるラジカル重合開始剤を用いたラジカル重合により得られる。ラジカル開始剤としては、アゾビスイソブチロニトリル(AIBN)、過安息香酸tert−ブチル、過酸化ベンゾイル、過酸化ラウロイル、過硫酸カリウムなどの過硫酸塩、クメンヒドロペルオキシド、t−ブチルヒドロペルオキシド、ジクミルペルオキシド、ジt―ブチルペルオキシド、2,2’−アゾビス−2,4−ジメチルバレロニトリル、t―ブチルペルイソブチレート、t―ブチルペルピバレート、過酸化水素/第一鉄塩、過硫酸塩/酸性亜硫酸ナトリウム、クメンヒドロペルオキシド/第一鉄塩、過酸化ベンゾイル/ジメチルアニリン等が挙げられる。これらを単独で用いてもよいし、組み合わせてもよい。 The acrylic rubber is generally obtained by radical polymerization using a radical polymerization initiator that generates radicals. Examples of radical initiators include persulfates such as azobisisobutyronitrile (AIBN), tert-butyl perbenzoate, benzoyl peroxide, lauroyl peroxide, potassium persulfate, cumene hydroperoxide, t-butyl hydroperoxide, Dicumyl peroxide, di-t-butyl peroxide, 2,2′-azobis-2,4-dimethylvaleronitrile, t-butyl perisobutyrate, t-butyl perpivalate, hydrogen peroxide / ferrous salt Examples thereof include sulfate / sodium acid sulfite, cumene hydroperoxide / ferrous salt, benzoyl peroxide / dimethylaniline, and the like. These may be used alone or in combination.
アクリルゴムには、必要に応じて、イソシアネート、メラミンなどの架橋剤、エポキシ樹脂等の高分子化合物、ゴム系エラストマ、リン系化合物等の難燃剤、シリカ等の無機充填剤、導電性粒子、カップリング剤、顔料、レベリング剤、消泡剤、イオントラップ剤等を配合して用いてもよい。 As needed, acrylic rubber includes cross-linking agents such as isocyanate and melamine, polymer compounds such as epoxy resins, flame retardants such as rubber elastomers and phosphorus compounds, inorganic fillers such as silica, conductive particles, cups You may mix | blend and use a ring agent, a pigment, a leveling agent, an antifoamer, an ion trap agent, etc.
熱硬化性樹脂としてはエポキシ樹脂やフェノール樹脂が挙げられる。エポキシ樹脂やエポキシ基を有する化合物である多官能エポキシ化合物は、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、ビフェニル型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、ナフタレン骨格含有エポキシ樹脂、アラルキレン骨格含有エポキシ樹脂、フェノールビフェニルアラルキル型エポキシ樹脂、フェノールサリチルアルデヒドノボラック型エポキシ樹脂、低級アルキル基置換フェノールサリチルアルデヒドノボラック型エポキシ樹脂、ジシクロペンタジエン骨格含有エポキシ樹脂、多官能グリシジルアミン型エポキシ樹脂及び多官能脂環式エポキシ樹脂等が例示でき、これらの1種又は2種以上を用いることができる。また、ビフェニルアラルキル型エポキシ樹脂としてNC−3000H(日本化薬株式会社商品名)、リン含有エポキシ樹脂としてZX−1548(東都化成株式会社商品名)、クレゾールノボラック型エポキシ樹脂としてEPICLON N−660(大日本インキ株式会社商品名)が挙げられる。 Examples of the thermosetting resin include an epoxy resin and a phenol resin. Polyfunctional epoxy compounds that are epoxy resins or compounds having an epoxy group are bisphenol A type epoxy resins, bisphenol F type epoxy resins, bisphenol S type epoxy resins, biphenyl type epoxy resins, phenol novolac type epoxy resins, cresol novolac type epoxy resins. Bisphenol A novolak type epoxy resin, naphthalene skeleton containing epoxy resin, aralkylene skeleton containing epoxy resin, phenol biphenyl aralkyl type epoxy resin, phenol salicylaldehyde novolak type epoxy resin, lower alkyl group substituted phenol salicylaldehyde novolak type epoxy resin, dicyclopentadiene Examples include skeleton-containing epoxy resins, polyfunctional glycidylamine type epoxy resins, and polyfunctional alicyclic epoxy resins. It can be used alone or in combination of two or more. Moreover, NC-3000H (Nippon Kayaku Co., Ltd. trade name) as a biphenyl aralkyl type epoxy resin, ZX-1548 (Toto Kasei Co., Ltd. trade name) as a phosphorus-containing epoxy resin, and EPICLON N-660 (large) as a cresol novolac type epoxy resin Nippon Ink Co., Ltd. trade name).
フェノール樹脂は、架橋性官能基として、フェノール性水酸基を1分子当たり2個以上有する多官能のフェノール樹脂であることが好ましい。フェノール樹脂としては、例えば、フェノール樹脂、クレゾール樹脂等のフェノール環またはクレゾール環を複数個含有する化合物が挙げられる。これらは必要に応じて2種以上を組み合わせて用いてもよい。フェノール樹脂の市販品として、例えば、アミノトリアジン変性ノボラック樹脂のフェノライトLA−1356(大日本インキ株式会社社製、商品名)及び、ビフェニルノボラックのMEH−7851(明和化成株式会社社製、商品名)が挙げられる。 The phenol resin is preferably a polyfunctional phenol resin having two or more phenolic hydroxyl groups per molecule as a crosslinkable functional group. As a phenol resin, the compound containing multiple phenol rings or cresol rings, such as a phenol resin and a cresol resin, is mentioned, for example. You may use these in combination of 2 or more type as needed. Examples of commercially available phenolic resins include aminotriazine-modified novolak resin Phenolite LA-1356 (trade name, manufactured by Dainippon Ink Co., Ltd.) and biphenyl novolac MEH-7851 (trade name, manufactured by Meiwa Kasei Co., Ltd.). ).
リン化合物は難燃剤として硬化性樹脂組成物中に含有される。リン化合物として、例えば、モノマー型リン酸エステル、縮合型リン酸エステル、赤燐、ポリリン酸及びホスファゼン化合物が挙げられる。これらは単独で用いてもよいし、2種以上組み合わせてもよい。 The phosphorus compound is contained in the curable resin composition as a flame retardant. Examples of phosphorus compounds include monomeric phosphate esters, condensed phosphate esters, red phosphorus, polyphosphoric acid, and phosphazene compounds. These may be used alone or in combination of two or more.
リン化合物の市販品として、例えば、モノマー型リン酸エステルはレオフォスTPP(味の素ファインテクノ株式会社商品名)、縮合型リン酸エステルはレオフォスRDP,BAPP(味の素ファインテクノ株式会社商品名)、リン含有フィラーはOP930(クラリアントジャパン株式会社商品名)HCA−HQ(三光株式会社商品名)、赤燐はノーバクエル(燐化学工業株式会社商品名)やヒシガード(日本化学工業株式会社商品名)、ポリリン酸は、PMP100(日産化学株式会社商品名)やエクソリットOP1311(クラリアントジャパン株式会社商品名)、フォスファゼンはSBP100(大塚化学株式会社商品名)等が入手可能である。樹脂組成物中のリン含有量は0.1〜10重量%の範囲にあるのが好ましい。0.1重量%未満だと難燃性が低下し、10重量%を超えると可とう性が低下する。 Examples of commercially available phosphorous compounds include Leophos TPP (trade name of Ajinomoto Fine-Techno Co., Ltd.) as a monomer type phosphate ester, Reofos RDP, BAPP (trade name of Ajinomoto Fine-Techno Co., Ltd.), and phosphorus-containing filler. Is OP930 (trade name of Clariant Japan Co., Ltd.) HCA-HQ (trade name of Sanko Co., Ltd.), Red phosphorus is Novaquel (trade name of Rin Chemical Industry Co., Ltd.), Hishiguard (trade name of Nippon Chemical Industry Co., Ltd.), and polyphosphoric acid is PMP100 (Nissan Chemical Co., Ltd. trade name), Exorit OP 1311 (Clariant Japan Co., Ltd. trade name), and Phosphazen are available as SBP100 (Otsuka Chemical Co., Ltd. trade name). The phosphorus content in the resin composition is preferably in the range of 0.1 to 10% by weight. If it is less than 0.1% by weight, the flame retardancy is lowered, and if it exceeds 10% by weight, the flexibility is lowered.
熱硬化促進剤は、アミン類やイミダゾール類を例示することができる。アミン類は、ジシアンジアミド、ジアミノジフェニルエタン、グアニル尿素等が例示でき、イミダゾール類は、2−フェニルイミダゾール、1−シアノエチル−2−メチルイミダゾール、1−シアノエチル−2−ウンデシルイミダゾール、1−シアノエチル−2−フェニルイミダゾール、1−シアノエチル−2−フェニルイミダゾリウムトリメリテイト等のイミダゾール化合物、ベンゾイミダゾール等が例示できる。硬化促進剤の配合量は、樹脂組成物におけるオキシラン環の総量に応じて決定することができるが、一般的に樹脂組成物の樹脂固形分100重量部中、0.01〜10重量部とすることが好ましい。 Examples of the thermosetting accelerator include amines and imidazoles. Examples of amines include dicyandiamide, diaminodiphenylethane, guanylurea and the like, and imidazoles include 2-phenylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2. Examples thereof include imidazole compounds such as -phenylimidazole and 1-cyanoethyl-2-phenylimidazolium trimellitate, and benzimidazole. Although the compounding quantity of a hardening accelerator can be determined according to the total amount of the oxirane ring in a resin composition, it is generally 0.01-10 weight part in 100 weight part of resin solid content of a resin composition. It is preferable.
プリプレグは、耐熱性樹脂組成物のワニスを基材に含浸させ、80℃〜180℃の範囲で乾燥させて、製造する。基材は、金属張積層板や多層プリント配線板を製造する際に用いられるものであれば特に制限されないが、通常織布や不織布等の繊維基材が用いられる。繊維基材の材質は、ガラス、アルミナ、アスベスト、ボロン、シリカアルミナガラス、シリカガラス、チラノ、炭化ケイ素、窒化ケイ素、ジルコニア等の無機繊維やアラミド、ポリエーテルエーテルケトン、ポリエーテルイミド、ポリエーテルサルフォン、カーボン、セルロース等の有機繊維等及びこれら混抄系があり、100μm以下のガラスクロスが特に用いられる。更に、厚みが50μm以下のガラスクロスを用いることで任意に折り曲げ可能なプリント配線板を得ることが出来、製造プロセス上での温度、吸湿などに伴う寸法変化を小さくすることが可能となる。 The prepreg is produced by impregnating a base material with a varnish of a heat resistant resin composition and drying it in a range of 80 ° C to 180 ° C. Although a base material will not be restrict | limited especially if it is used when manufacturing a metal-clad laminated board and a multilayer printed wiring board, Usually fiber base materials, such as a woven fabric and a nonwoven fabric, are used. The material of the fiber substrate is glass, alumina, asbestos, boron, silica alumina glass, silica glass, tyranno, silicon carbide, silicon nitride, zirconia, and other inorganic fibers, aramid, polyether ether ketone, polyether imide, polyether sal There are organic fibers such as phon, carbon and cellulose, and mixed papers, and glass cloths of 100 μm or less are particularly used. Furthermore, by using a glass cloth having a thickness of 50 μm or less, a printed wiring board that can be bent arbitrarily can be obtained, and dimensional changes associated with temperature, moisture absorption, etc. in the manufacturing process can be reduced.
プリプレグの製造条件は特に制限するものではないが、ワニスに使用した溶剤が80重量%以上揮発していることが好ましい。このため、製造方法や乾燥条件等も制限はなく、乾燥時の温度は80℃〜180℃、時間はワニスのゲル化時間との兼ね合いで特に制限はない。また、ワニスの含浸量は、ワニス固形分と基材の総量に対して、ワニス固形分が30〜80重量%になるようにされることが好ましい。 The production conditions of the prepreg are not particularly limited, but it is preferable that the solvent used for the varnish is volatilized by 80% by weight or more. For this reason, there is no restriction | limiting also in a manufacturing method, drying conditions, etc., the temperature at the time of drying is 80 to 180 degreeC, and time does not have a restriction | limiting in particular by balance with the gelatinization time of a varnish. Moreover, it is preferable that the amount of impregnation of a varnish shall be 30-80 weight% with respect to a varnish solid content and the total amount of a base material.
絶縁板、積層板または金属張積層板の製造方法は、例えば、次の通りである。本発明におけるプリプレグ又はそれを複数枚、積層し必要に応じてその片面又は両面に金属箔を重ね、通常130〜250℃、好ましくは150℃〜210℃の範囲の温度で、通常0.5〜20MPa、好ましくは1〜8MPaの範囲の圧力で加熱加圧成形することにより絶縁板、積層体又は金属張積層板を製造することができる。金属箔を使用して金属張積層板とすることにより、これに回路(配線)加工を施してプリント配線板とすることができる。 The manufacturing method of an insulating board, a laminated board, or a metal-clad laminated board is as follows, for example. The prepreg or a plurality of the prepregs in the present invention are laminated, and a metal foil is laminated on one side or both sides as necessary, usually at 130 to 250 ° C., preferably at a temperature in the range of 150 ° C. to 210 ° C., usually 0.5 to An insulating plate, a laminate or a metal-clad laminate can be produced by heat and pressure molding at a pressure in the range of 20 MPa, preferably 1 to 8 MPa. By using a metal foil to form a metal-clad laminate, a circuit (wiring) process can be applied to this to obtain a printed wiring board.
本発明に用いられる金属箔は、銅箔やアルミニウム箔が一般的に用いられるが、通常積層板に用いられている1〜200μmのものを使用できる。また、ニッケル、ニッケルーリン、ニッケルースズ合金、ニッケルー鉄合金、鉛、鉛―スズ合金等を中間層とし、この両面に0.5〜15μmの銅層と10〜300μmの銅層を設けた3層構造の複合箔あるいはアルミニウムと銅箔を複合した2層構造複合箔を用いることが出来る。尚、本発明でいう「粉落ち」とは、フィラー成分の剥離や脱離のことを意味する。 As the metal foil used in the present invention, a copper foil or an aluminum foil is generally used, but one having a thickness of 1 to 200 μm which is usually used for a laminate can be used. Also, a three-layer structure in which nickel, nickel-phosphorus, nickel-suds alloy, nickel-iron alloy, lead, lead-tin alloy, etc. are used as intermediate layers, and 0.5 to 15 μm copper layers and 10 to 300 μm copper layers are provided on both sides. Or a two-layer composite foil in which aluminum and copper foil are combined. The “powder falling” as used in the present invention means peeling or detachment of the filler component.
以下に実施例を挙げて説明するが、本発明はこれらに限定されるものではない。
実施例1
アクリルゴムとしてHTR860−P3(ナガセケムテックス株式会商品名)20g、エポキシ樹脂としてEPICLON N−660(大日本インキ株式会社商品名)60g、硬化剤としてMEH−7851(明和化成株式会社商品名)の15g、硬化促進剤として2−フェニルイミダゾール0.2g、リン化合物としてPMP100(日産化学株式会社商品名)20g、フィラーとしてALH(河合石灰工業株式会社商品名)10g、メチルエチルケトンを加え700cPに希釈し、樹脂組成物ワニスを作製した。
Examples are described below, but the present invention is not limited to these examples.
Example 1
20g of HTR860-P3 (trade name of Nagase ChemteX Co., Ltd.) as an acrylic rubber, 60g of EPICLON N-660 (trade name of Dainippon Ink Co., Ltd.) as an epoxy resin, and MEH-7851 (trade name of Meiwa Kasei Co., Ltd.) as a curing agent 15 g, 0.2 g of 2-phenylimidazole as a curing accelerator, 20 g of PMP100 (product name of Nissan Chemical Co., Ltd.) as a phosphorus compound, 10 g of ALH (product name of Kawai Lime Industry Co., Ltd.) as a filler, diluted to 700 cP with addition of methyl ethyl ketone, A resin composition varnish was prepared.
実施例2
実施例1のアクリルゴムの配合量を40gに変更した以外は実施例1と同様にして樹脂組成物ワニスを作製した。
Example 2
A resin composition varnish was produced in the same manner as in Example 1 except that the blending amount of the acrylic rubber in Example 1 was changed to 40 g.
実施例3
実施例1のアクリルゴムの配合量を60gに変更した以外は実施例1と同様にして樹脂組成物ワニスを作製した。
Example 3
A resin composition varnish was prepared in the same manner as in Example 1 except that the blending amount of the acrylic rubber in Example 1 was changed to 60 g.
実施例4
実施例1のアクリルゴムの配合量を80gに変更した以外は実施例1と同様にして樹脂組成物ワニスを作製した。
Example 4
A resin composition varnish was produced in the same manner as in Example 1 except that the amount of the acrylic rubber in Example 1 was changed to 80 g.
実施例5
実施例1のフィラーの配合量を20gに変更した以外は実施例1と同様にして樹脂組成物ワニスを作製した。
Example 5
A resin composition varnish was produced in the same manner as in Example 1 except that the amount of the filler in Example 1 was changed to 20 g.
実施例6
実施例1のアクリルゴムの配合量を40gとし、フィラーの配合量を40gに変更した以外は実施例1と同様にして樹脂組成物ワニスを作製した。
Example 6
A resin composition varnish was prepared in the same manner as in Example 1 except that the amount of the acrylic rubber in Example 1 was changed to 40 g and the amount of the filler was changed to 40 g.
比較例1
実施例1のアクリルゴムを配合しない以外は、実施例1と同様にして樹脂組成物ワニスを作製した。
Comparative Example 1
A resin composition varnish was produced in the same manner as in Example 1 except that the acrylic rubber of Example 1 was not blended.
比較例2
実施例1のアクリルゴムの配合量を10gとし、フィラーの配合量を100gとした以外は、実施例1と同様にして樹脂組成物ワニスを作製した。
Comparative Example 2
A resin composition varnish was prepared in the same manner as in Example 1 except that the amount of the acrylic rubber in Example 1 was 10 g and the amount of the filler was 100 g.
(1)プリプレグ及び銅張り積層板の作製
実施例1〜6、比較例1〜2で作製したワニスを厚さ0.028mmのガラス布1037(旭シュエーベル株式会社製商品名)に含浸後、120℃20分間加熱、乾燥しプリプレグを得た。
プリプレグ8枚の両側に厚さ18μmの電解銅箔F2−WS−18(古河サーキットフォイル株式会社製商品名)を接着面がプリプレグと合わさるように重ね、200℃30分間4MPaの真空プレス条件で折り曲げ特性、半田耐熱性、銅箔接着性の評価試験用両面銅張積層板を作製した。
(1) Production of prepreg and copper-clad laminate After impregnating the varnish produced in Examples 1 to 6 and Comparative Examples 1 and 2 into a glass cloth 1037 having a thickness of 0.028 mm (trade name, manufactured by Asahi Schavel Co., Ltd.), 120 A prepreg was obtained by heating and drying at 20 ° C. for 20 minutes.
Overlap the eight prepregs on both sides with 18μm thick electrolytic copper foil F2-WS-18 (trade name, manufactured by Furukawa Circuit Foil Co., Ltd.) so that the adhesive surface is combined with the prepreg, and bend it at 200 ° C for 30 minutes under 4MPa vacuum press condition. A double-sided copper-clad laminate for evaluation tests of characteristics, solder heat resistance, and copper foil adhesion was produced.
(2)測定方法
粉落ちの評価は、プリプレグを20cm四方の正方形に切り出して試料片を作製した。ガラス板上で1分間手もみを行い、ガラス板上の粉の量により粉落ちを評価した。粉落ち無しを「○」、粉落ち有りを「×」で表した。
銅箔引き剥がし強さは、両面銅張積層板を用い、1mm幅の銅箔ラインをエッチングにより形成した試料を用いた。銅箔ラインを90°方向に50mm/分の速度で引き剥がしたときの強さを測定し、銅箔引き剥がし強さとした。
上記実施例及び比較例により得られた特性結果を下記表1に示した。
(2) Measuring method Evaluation of powder omission produced a sample piece by cutting a prepreg into a 20 cm square. Hand grinding was performed on the glass plate for 1 minute, and powder fall was evaluated by the amount of powder on the glass plate. “O” indicates that there was no powder falling, and “X” indicates that there was powder falling.
The copper foil peel strength was a sample in which a double-sided copper-clad laminate was used and a 1 mm wide copper foil line was formed by etching. The strength when the copper foil line was peeled off at a speed of 50 mm / min in the 90 ° direction was measured, and the copper foil peeling strength was obtained.
The characteristic results obtained by the above Examples and Comparative Examples are shown in Table 1 below.
また各実施例で用いた樹脂組成物中のハロゲン元素各々の含有量を、JPCA規格(JPCA−ES−01−1999)に準じて測定した結果、それらのハロゲン元素各々の含有量は0.25重量%以下であった。さらに各実施例で得られた両面銅張り積層板のハロゲン含有量を、同様にJPCA規格(JPCA−ES−01−1999)に従って測定した結果、それらの臭素含有量は0.02重量%以下、塩素含有量は0.01重量%以下であり、JPCAのハロゲンフリー規格0.09重量%以下を満たすものであった。 Moreover, as a result of measuring the content of each halogen element in the resin composition used in each example according to the JPCA standard (JPCA-ES-01-1999), the content of each of these halogen elements was 0.25. % By weight or less. Furthermore, as a result of measuring the halogen content of the double-sided copper-clad laminate obtained in each Example according to the JPCA standard (JPCA-ES-01-1999), the bromine content is 0.02% by weight or less, The chlorine content was 0.01% by weight or less, and the halogen-free standard of JPCA was 0.09% by weight or less.
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JP2010195030A (en) * | 2009-01-28 | 2010-09-09 | Hitachi Chem Co Ltd | Double-sided metal foil-clad laminated plate and flexible printed wiring board |
JP2012229362A (en) * | 2011-04-27 | 2012-11-22 | Hitachi Chemical Co Ltd | Resin composition for package substrate, prepreg using the resin composition, and laminate |
WO2014050034A1 (en) * | 2012-09-28 | 2014-04-03 | パナソニック株式会社 | Prepreg, metal-clad laminated sheet, printed wiring board |
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JPS61138680A (en) * | 1984-12-10 | 1986-06-26 | Sumitomo Bakelite Co Ltd | Adhesive and substrate for flexible printed circuit |
JPS6377927A (en) * | 1986-09-19 | 1988-04-08 | Fujitsu Ltd | Molding material for semiconductor sealing |
JP2006137942A (en) * | 2004-10-14 | 2006-06-01 | Hitachi Chem Co Ltd | Prepreg, laminated plate, metal foil-clad laminated plate and printed circuit board using the same |
JP2006274150A (en) * | 2005-03-30 | 2006-10-12 | Hitachi Chem Co Ltd | Curing resin composition, prepreg, substrate, laminated sheet lined with metal foil, and printed circuit-board |
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JPS61138680A (en) * | 1984-12-10 | 1986-06-26 | Sumitomo Bakelite Co Ltd | Adhesive and substrate for flexible printed circuit |
JPS6377927A (en) * | 1986-09-19 | 1988-04-08 | Fujitsu Ltd | Molding material for semiconductor sealing |
JP2006137942A (en) * | 2004-10-14 | 2006-06-01 | Hitachi Chem Co Ltd | Prepreg, laminated plate, metal foil-clad laminated plate and printed circuit board using the same |
JP2006274150A (en) * | 2005-03-30 | 2006-10-12 | Hitachi Chem Co Ltd | Curing resin composition, prepreg, substrate, laminated sheet lined with metal foil, and printed circuit-board |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010195030A (en) * | 2009-01-28 | 2010-09-09 | Hitachi Chem Co Ltd | Double-sided metal foil-clad laminated plate and flexible printed wiring board |
JP2012229362A (en) * | 2011-04-27 | 2012-11-22 | Hitachi Chemical Co Ltd | Resin composition for package substrate, prepreg using the resin composition, and laminate |
WO2014050034A1 (en) * | 2012-09-28 | 2014-04-03 | パナソニック株式会社 | Prepreg, metal-clad laminated sheet, printed wiring board |
JP2014070156A (en) * | 2012-09-28 | 2014-04-21 | Panasonic Corp | Prepreg, metal clad laminated board, print wiring board |
US9578734B2 (en) | 2012-09-28 | 2017-02-21 | Panasonic Intellectual Property Management Co., Ltd. | Prepreg, metal-clad laminate, and printed wiring board |
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