TW201500597A - Functional chromium layer with improved corrosion resistance - Google Patents

Abstract

The aqueous electroplating bath according to the present invention comprises chromium(VI) ions, sulfate ions and methane-trisulfonic acid or a salt thereof as the catalyst. The functional chromium layer deposited from the aqueous electroplating bath according to the present invention has an increased corrosion resistance.

Description

Functional chromium layer with improved corrosion resistance

This invention relates to a plating bath composition and a process for depositing a functional chromium layer by electroplating.

The functional chromium layer deposited by electroplating is used to improve wear and corrosion resistance of products such as shock absorbers, hydraulic pistons, and the like.

The plating bath composition used comprises chromic acid, sulfate ion, water, and an alkyl-sulfonic acid or a salt thereof.

With Moerby S:C A 1:3 alkyl-sulfonic acid catalyst is disclosed in EP 0 196 053 B1. Examples of suitable alkyl-sulfonic acids are methyl-sulfonic acid, ethyl-sulfonic acid, propyl-sulfonic acid, methane-disulfonic acid and 1,2-ethane-disulfonic acid. These alkyl-sulfonic acids improve cathode current efficiency during plating.

The use of alkyl-polysulfonic acids, halogenated alkyl-polysulfonic acids and corresponding salts (e.g., methane-disulfonic acid) to reduce corrosion of lead anodes during plating is disclosed in EP 0 452 471 B1.

Aromatic-trisulphonic acid as an additive in a plating bath composition for depositing a functional chromium layer is disclosed in U.S. Patent 2,195,409. The chromium layer obtained from the plating bath compositions is bright and uniform.

A plating bath composition for depositing a functional chromium layer having improved cathode current efficiency and comprising propane-1,2,3-trisulphonic acid is disclosed in DE 43 05 732 A1.

The object of the invention

It is an object of the present invention to provide a plating bath composition and a process for depositing a functional chromium layer having improved corrosion resistance using the plating bath composition.

This object is addressed by an aqueous electroplating bath for depositing a functional chromium layer comprising (i) a chromium (VI) ion source, (ii) a sulfate ion source and (iii) methane-trisulphonic acid or a salt thereof.

This object is further solved by a process for depositing a functional chromium layer onto a metal substrate, which comprises the steps of: (i) providing a metal substrate, (ii) providing the substrate with chromium (VI) An ion source, a source of sulfate ion, and an aqueous plating bath of methane-trisulphonic acid or a salt thereof, and (iii) applying an external current to the substrate as a cathode and thereby depositing a functional chromium layer on the substrate .

The functional chromium layer deposited from the aqueous plating bath and deposited by the process of the present invention has increased corrosion resistance as compared to a functional chromium layer deposited from a conventional electroplating bath composition comprising a known alkyl-sulfonic acid.

The aqueous electroplating bath of the present invention comprises a chromium (VI) ion source, a sulfate ion, methane-trisulfonic acid or a salt thereof, and optionally a surfactant.

The chromium (VI) ion source is preferably a chromium (VI) compound which is soluble in the plating bath, such as CrO ₃ , Na ₂ Cr ₂ O ₇ and K ₂ Cr ₂ O ₇ , and most preferably CrO ₃ . Preferably, the concentration of chromium (VI) ions in the electroplating bath of the present invention is in the range of from 80 g/l to 600 g/l, more preferably from 100 g/l to 200 g/l.

Sulfate ions present in the plating bath is preferably sulfuric acid or soluble sulfate plating bath (e.g. Na ₂ SO ₄₎ is added in the form of. The concentration of the sulfate ion in the plating bath is preferably in the range of from 1 g/l to 15 g/l, more preferably from 2 g/l to 6 g/l.

The concentration ratio (wt.-%) of chromic acid to sulfate is preferably in the range of 25 to 200, more preferably 60 to 150.

The alkyl-sulfonic acid in the electroplating bath is methane-trisulphonic acid (HC(SO ₂ OH) ₃ ) or a mixture of methane-trisulfonic acid and one or more other alkyl-sulfonic acids. Other alkyl-sulfonic acids suitable for the mixture with methane-trisulfonic acid include methane-sulfonic acid, methane-disulfonic acid, ethane-sulfonic acid, 1,2-ethane-disulfonic acid, propylsulfonic acid, 1,2-propane-disulfonic acid, 1,3-propane-disulfonic acid and 1,2,3-propane-trisulphonic acid. Instead of the free alkyl-sulfonic acid or the mixture of it and the free alkyl-sulfonic acid, it is also possible to use the corresponding salts of the aforementioned sulfonic acids (for example sodium, potassium and ammonium salts).

The methane-trisulphonic acid or its salt precursor which is oxidized to methane-trisulphonic acid or a salt thereof in the electroplating bath of the present invention can be used as a partial or sole source of methane-trisulphonic acid or a salt thereof.

The concentration of methane-trisulphonic acid or a salt thereof in the plating bath of the present invention is preferably in the range of 2 mmol/l to 80 mmol/l, more preferably 4 mmol/l to 60 mmol/l.

If a mixture of methane-trisulphonic acid and another alkyl-sulfonic acid is used, the total concentration of methane-trisulfonic acid and other alkyl-sulfonic acids or the aforementioned salts is preferably from 4 mmol/l to 160 mmol/l, more preferably It is in the range of 12 mmol/l to 120 mmol/l.

A high number of microscopic cracks within the deposited functional chromium layer are desirable because of the high corrosion resistance and desired mechanical properties (e.g., reduced internal stress). The microcracks do not extend to the surface of the underlying substrate as compared to the macroscopic cracks in the functional chromium layer and thus do not cause corrosion of the underlying substrate material, which is typically steel.

The composition of methane-trisulphonic acid or its salt or a mixture with other alkyl-sulfonic acids results in a high number of desired microscopic cracks in the range of 200 to 1000, more preferably 450 to 750 micro cracks per cm of the functional chromium layer surface. Within the range, it is measured by an optical microscope after etching in an aqueous solution containing sodium hydroxide and K ₃ [Fe(CN) ₆ ]. Count the number of microscopic cracks along each line and then count the number of micro cracks per cm using the following formula: Microcracks per cm = (average number of cracks per line): (line length in cm)

Compared with the methane-disulfonic acid sodium salt or the propane-1,2,3-trisulphonic acid sodium salt as the sole alkyl-sulfonic acid, the methane-trisulphonic acid or its salt is used as a catalyst to increase the micro crack number and Corrosion resistant. This is shown in Examples 1 to 3.

In addition, an increased number of desired microcracks are obtained at higher current densities (Example 3), while microcracks at higher current densities in the case of known alkyl-sulfonic acids (eg, methane-disulfonic acid) Reduced (Example 1). Higher current density values during plating are desirable because of the increased plating speed.

The electroplating bath of the present invention optionally further comprises a surfactant which reduces the formation of undesirable foams on top of the plating liquid. The surface active additive is selected from the group consisting of a perfluorinated sulfonate surfactant (tenside), a perfluorinated phosphate surfactant, a perfluorinated phosphonate surfactant, and a partially fluorinated sulfonate surface. An active agent, a partially fluorinated phosphate surfactant, a partially fluorinated phosphonate surfactant, and mixtures thereof.

The concentration of the optional surfactant is preferably in the range of from 0.05 g/l to 4 g/l, more preferably from 0.1 g/l to 2.5 g/l.

The current density applied during plating is preferably in the range of 10 A/dm ² to 250 A/dm ² , more preferably 40 A/dm ² to 200 A/dm ² . A substrate to be plated with a functional chromium layer is used as a cathode during electroplating.

The cathode current efficiency is the percentage of current actually used to deposit metal (chromium) at the cathode during the plating of the functional chromium layer.

The preferred current efficiency of the process of the invention is at a current density of 50 A/dm ² twenty two%.

The temperature of the electroplating bath of the present invention is preferably maintained in the range of 10 ° C to 80 ° C during the plating, more preferably in the range of 45 ° C to 70 ° C and most preferably 50 ° C to 60 ° C.

An inert anode is preferably used in the process of the present invention.

Suitable inert anodes are made, for example, from titanium or a titanium alloy coated with one or more platinum group metals, alloys thereof and/or oxides thereof. The coating preferably consists of platinum metal, cerium oxide or a mixture thereof. These inert anodes make it possible to have a higher current density during plating and thus a higher plating rate than lead anodes.

The plating bath of the present invention can also be operated using conventional lead anodes.

Chromium (III) ions are formed when such inert anodes are used. The methane-trisulphonic acid and/or its salt as an alkyl-sulfonic acid in a chromium (VI) ion-based functional chromium plating bath is extremely sensitive to chromium (III) ions.

In a preferred embodiment of the invention, a cation of another metal (e.g., silver ions, lead ions, and mixtures thereof) is added to the electroplating bath. Therefore, the negative effects of chromium (III) ions can be minimized. The concentration of the ion of the other metal is preferably in the range of from 0.005 g/l to 5 g/l, more preferably from 0.01 g/l to 3 g/l.

The present invention provides a functional chromium plating bath and a process for depositing a functional chromium layer onto a substrate to provide increased corrosion resistance also at high current densities.

Instance

The invention will now be illustrated with reference to the following non-limiting examples.

The number of microcracks was measured by an optical microscope after etching the surface of the chromium layer in an aqueous solution containing sodium hydroxide and K ₃ [Fe(CN) ₆ ]. The number of microscopic cracks along the number of lines having the same length was calculated for the average microscopic crack number, and then divided by the line length (given in cm) to provide "average micro crack number" (crack/cm).

The corrosion resistance of the functional chromium layer was determined according to ISO 9227 NSS (Neutral Salt Spray Test).

₃ using aqueous surface 3.2g / l of sulfate ion and 2ml / l of the active agents of the electroplating bath stock solution containing 250g / l CrO 3 in Example 1 to. Different amounts of alkyl-sulfonic acid were added to this stock solution and a functional chromium layer was deposited.

Example 1 (comparative)

The alkyl-sulfonic acid is added in a concentration of from 2 g/l to 12 g/l (7.6 mmol/l to 45.4 mmol/l). Add to the methane-disulfonic acid disodium salt in the stock solution. This alkyl-sulfonic acid is disclosed in EP 0 452 471 B1.

Table 1 summarizes the average number of microcracks measured at different concentrations of methane-disulfonic acid disodium salt as the sole alkyl-sulfonic acid (plating bath temperature: 58 ° C, current density: 50 A/dm ² ).

A high number of desired micro cracks are obtained only when a narrow concentration range of catalyst methane-disulfonic acid disodium salt is used in the stock solution.

Table 2 summarizes the average number of microcracks measured at different current densities for electroplating bath compositions having 18.9 mmol/l (5 g/l) of methane-disulfonic acid disodium salt as the sole alkyl-sulfonic acid.

It is expected that the number of micro cracks will decrease as the current density increases.

Undesired red rust was formed after a 192 h neutral salt spray test according to ISO 9227 NSS (>0.1% surface area after 192 h was covered with red rust).

Example 2 (comparative)

The alkyl-sulfonic acid is added to the stock solution at a concentration of 14.3 mmol/l (5 g/l). Alkane-1,2,3-trisulphonic acid trisodium salt. This alkyl-disulfonic acid is disclosed in DE 43 05 732 A1.

The current efficiency of 50 A/dm ² and the plating bath temperature of 55 ° C were 17.4% and the number of micro cracks in the chromium layer deposited under these conditions was 160 cracks/cm.

Undesired red rust was formed after a 24 h neutral salt spray test according to ISO 9227 NSS (>0.1% surface area after 24 h was covered with red rust).

Example 3 (invention)

The alkyl-sulfonic acid is a methane-trisulphonic acid trisodium salt added to the stock solution at a concentration of 6.2 mmol/l to 37.2 mmol/l (2 g/l to 12 g/l).

Table 3 summarizes the average number of microcracks measured at different concentrations of methane-trisulphonic acid trisodium salt as the sole alkyl-sulfonic acid (plating bath temperature: 58 ° C, current density: 50 A/dm ² ).

Table 4 summarizes the average number of microcracks measured at different current densities for an electroplating bath composition having 24.8 mmol/l (8 g/l) of methane-trisulphonic acid trisodium salt as the sole alkyl-sulfonic acid.

A high number of desired micro cracks are obtained over the entire range of current densities applied.

Undesired red rust formation was determined according to ISO 9227 NSS up to 552 h neutral salt spray test.

Claims (15)

An aqueous electroplating bath for depositing a functional chromium layer comprising (i) a chromium (VI) ion source, (ii) a sulfate ion source, and (iii) methane-trisulphonic acid or a salt thereof. An aqueous electroplating bath for depositing a functional chromium layer according to claim 1, wherein the concentration of chromium (VI) ions is in the range of from 80 g/l to 600 g/l. An aqueous plating bath for depositing a functional chromium layer according to claim 1 or 2, wherein the concentration of the sulfate ion is in the range of from 1 g/l to 15 g/l. An aqueous electroplating bath for depositing a functional chromium layer according to claim 1 or 2, wherein the salt of methane-trisulfonic acid is selected from the group consisting of sodium, potassium and ammonium salts. An aqueous plating bath for depositing a functional chromium layer according to claim 1 or 2, wherein the concentration of methane-trisulphonic acid or a salt thereof is in the range of 2 mmol/l to 80 mmol/l. An aqueous electroplating bath for depositing a functional chromium layer according to claim 1 or 2, which comprises methane-trisulfonic acid and one or more other alkyl-sulfonic acids selected from the group consisting of methane-sulfonic acid, methane- Disulfonic acid, ethane-sulfonic acid, 1,2-ethane-disulfonic acid, propylsulfonic acid, 1,2-propane-disulfonic acid, 1,3-propane-disulfonic acid and 1,2, 3-propane-trisulphonic acid. An aqueous plating bath for depositing a functional chromium layer according to claim 1 or 2, wherein the plating bath further comprises a surfactant selected from the group consisting of: a perfluorinated sulfonate surfactant (tenside), Fluorinated phosphate surfactants, perfluorinated phosphonate surfactants, partially fluorinated sulfonate surfactants, partially fluorinated phosphate surfactants, partially fluorinated phosphonate surfactants, and mixtures thereof. An aqueous plating bath for depositing a functional chromium layer according to claim 7, wherein the concentration of the surfactant is in the range of from 0.05 g/l to 4 g/l. A method for depositing a functional chromium layer onto a metal substrate, which is packaged in this order The method comprises the steps of: (i) providing a metal substrate, (ii) contacting the substrate with an aqueous plating bath according to any one of claims 1 to 8, and (iii) applying an external current to the substrate as a cathode And thereby depositing a functional chromium layer onto the substrate. A method for depositing a functional chromium layer onto a metal substrate according to claim 9, wherein the aqueous plating bath is maintained at a temperature in the range of 10 ° C to 80 ° C during use. A method for depositing a functional chromium layer onto a metal substrate according to claim 9 or 10, wherein a current density in the range of 10 A/dm ² to 250 A/dm ² is applied to the metal substrate during use. A method for depositing a functional chromium layer onto a metal substrate according to claim 9 or 10, wherein an inert anode is used in step (iii). A method for depositing a functional chromium layer onto a metal substrate according to claim 12, wherein the inert anode has a surface selected from the group consisting of platinum metal, cerium oxide, and mixtures thereof. The method of claim 12 for depositing a functional chromium layer onto a metal substrate, wherein the aqueous plating bath further comprises a cation selected from the group consisting of silver, lead, and mixtures thereof. The method of claim 14, wherein the concentration of the cations of the other metal is in the range of from 0.005 g/l to 5 g/l.