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TW201446526A - Attachment separation method and separation device - Google Patents

Attachment separation method and separation device Download PDF

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Publication number
TW201446526A
TW201446526A TW103115634A TW103115634A TW201446526A TW 201446526 A TW201446526 A TW 201446526A TW 103115634 A TW103115634 A TW 103115634A TW 103115634 A TW103115634 A TW 103115634A TW 201446526 A TW201446526 A TW 201446526A
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TW
Taiwan
Prior art keywords
substrate
sealing member
thin plate
bonded
support substrate
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TW103115634A
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Chinese (zh)
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TWI621535B (en
Inventor
Michiya Yokota
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Shinetsu Eng Co Ltd
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Publication of TW201446526A publication Critical patent/TW201446526A/en
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Publication of TWI621535B publication Critical patent/TWI621535B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/24Manufacture or joining of vessels, leading-in conductors or bases
    • H01J9/241Manufacture or joining of vessels, leading-in conductors or bases the vessel being for a flat panel display
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00Ancillary operations in connection with laminating processes
    • B32B38/10Removing layers, or parts of layers, mechanically or chemically
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381Details of chemical or physical process used for separating the auxiliary support from a device or wafer

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Liquid Crystal (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Laminated Bodies (AREA)

Abstract

The present invention provides an attachment separation method and a separation device which can easily and conveniently separate a thin substrate from a support substrate via vacuum destruction. Under atmospheric pressure, a penetration member is inserted into at least a portion of a sealed piece (3) of an attachment substrate (4) so as to create a passage. As a result, the airtight sealing of the vacuum space (S) inside the sealed piece (3) is broken, and air or liquid rushes into the vacuum space (S) which is accordingly opened to the atmosphere. Due to being opened to the atmosphere, the inner and exterior sides of the sealed piece (3) receive pressures from both the atmospheric pressure and the in-rush fluid pressure inside the vacuum space (S). Therefore, the thin substrate (1) can be easily separated from the support substrate (2) without deformation.

Description

貼合分離方法及分離裝置 Lamination separation method and separation device

本發明係有關一種在例如平板顯示器(FPD)或觸面面板或3D(3維)顯示器或電子書籍等中用於對薄壁的護罩玻璃或薄膜等薄板基板進行特定處理之貼合分離方法及用於實施該貼合分離方法之分離裝置。 The present invention relates to a method for attaching and separating a thin-plate substrate such as a thin-walled cover glass or a film, for example, in a flat panel display (FPD) or a touch panel or a 3D (3-dimensional) display or an electronic book. And a separation device for carrying out the method of the separation and separation.

以往,作為該種貼合分離方法及分離裝置,有如下貼合分離方法及分離裝置,亦即在透光性的絕緣性基板的表面上形成槽結構而構成之支持基板(第2基板)之上,將藉由特定紫外光的照射而黏著性降低之接合樹脂塗佈於槽的空間部份而形成接合層,在其上黏結包含透光性的絕緣性基板之薄板玻璃(第1基板)而形成貼合基板之後,用貼合基板形成電子組件(器件),其後,對貼合基板照射特定紫外光,藉此使貼合基板的接合層的黏結力下降,從而從電子組件剝下支持基板(例如參閱專利文獻1)。 Conventionally, as such a bonding and separating method and a separating apparatus, there is a bonding and separating method and a separating apparatus, that is, a supporting substrate (second substrate) formed by forming a groove structure on the surface of a light-transmitting insulating substrate. In the above, a bonding resin having a reduced adhesiveness by irradiation with a specific ultraviolet light is applied to a space portion of the groove to form a bonding layer, and a thin plate glass (first substrate) containing a light-transmitting insulating substrate is bonded thereon. After the bonding substrate is formed, an electronic component (device) is formed by the bonding substrate, and then the bonding substrate is irradiated with specific ultraviolet light, whereby the bonding strength of the bonding layer of the bonding substrate is lowered, thereby being peeled off from the electronic component. A support substrate (for example, refer to Patent Document 1).

[先行技術文獻] [Advanced technical literature] [專利文獻] [Patent Literature]

專利文獻1:日本專利公開2003-80658號公報 Patent Document 1: Japanese Patent Publication No. 2003-80658

然而,在該種習知的貼合分離方法及分離裝置中,對貼合基板照射特定紫外光,藉此能夠使配置於薄板玻璃與支持基板之間之接合層的黏著性降低而進行剝離,因此當支持基板包含遮光性材料時,不使接合層的黏著性降低就無法輕鬆地剝下薄板玻璃。 However, in the conventional bonding and separating method and the separating apparatus, the bonding substrate is irradiated with specific ultraviolet light, whereby the adhesion of the bonding layer disposed between the thin glass and the supporting substrate can be reduced and peeled off. Therefore, when the support substrate contains a light-shielding material, the thin plate glass cannot be easily peeled off without lowering the adhesion of the bonding layer.

其結果,支持基板的材料受限制,因此存在能夠製造之電子組件亦受制限之問題。 As a result, the material of the supporting substrate is limited, and thus there is a problem that the electronic component that can be manufactured is also limited.

並且,關於在將兩個貼合基板以薄板玻璃彼此對向之方式接合之後,從接合之薄板玻璃分別剝離支持基板之方法,由於支持基板不變形而難以實施。 Further, the method of peeling the support substrates from the joined thin plate glass after the two bonded substrates are joined to each other by the thin plate glass is difficult to perform because the support substrate is not deformed.

藉此,還存在難以製造將薄板玻璃彼此接合而成之層疊體之問題。 Therefore, there is a problem in that it is difficult to manufacture a laminate in which thin plate glasses are joined to each other.

本發明係以解決該種問題作為課題者,其目的在於藉由真空破壞,從支持基板毫不費勁地、輕鬆地分離薄板基板等。 The present invention has been made to solve such a problem, and an object thereof is to easily and easily separate a thin plate substrate or the like from a support substrate by vacuum destruction.

為了實現該種目的,本發明的貼合分離方法中,在薄板基板和加強用的支持基板被貼合之狀態下,進行特定處理,在該處理結束之後,將上述薄板基板和上述支持基板分離,上述貼合分離方法的特徵為,包括:重合步驟,在真空氣氛中,將上述薄板基板和上述支持基板以邊框狀的密封件夾在其間之方式進行接合而形成貼合基板;及分離步驟,在大氣壓氣氛中,除掉上述貼合基板的上述密封件的至少一部份,並且向形成於上述密封件的內側之真空空間放入流體而實現大氣開放,在上述分離步驟中,在上述密封件的至少一部份插入貫穿構件來開設出通孔,並且從上述通孔向上述真空空間導入大氣壓流體而使其大氣開放。 In order to achieve such an object, in the bonding and separating method of the present invention, a specific process is performed in a state where the thin plate substrate and the reinforcing supporting substrate are bonded together, and after the end of the process, the thin plate substrate and the supporting substrate are separated. The bonding and separating method is characterized in that the method includes a superposition step of joining the thin plate substrate and the support substrate with a frame-shaped sealing member interposed therebetween in a vacuum atmosphere to form a bonded substrate; and a separating step Removing at least a portion of the sealing member of the bonded substrate in an atmospheric pressure atmosphere, and introducing a fluid into a vacuum space formed inside the sealing member to open the atmosphere, in the separating step, At least a portion of the sealing member is inserted into the penetrating member to open a through hole, and an atmospheric pressure fluid is introduced into the vacuum space from the through hole to open the atmosphere.

並且,本發明的分離裝置中,對於在真空氣氛中薄板基板和加強用的支持基板夾住邊框狀的密封件接合而成之貼合基板,在大氣壓氣氛中將上述薄板基板和上述支持基板分離,上述分離裝置的特徵為,具備貫穿構件,上述貫穿構件被設置成與上述貼合基板的上述密封件對向且相對移動自如,上述貫穿構件係構成為,具有被插入至上 述密封件的至少一部份之刀尖,並且隨著上述刀尖相對於上述貼合基板之相對移動,在上述密封件的至少一部份開設通孔,並且從上述通孔向形成於上述密封件的內側之真空空間導入大氣壓流體而使其大氣開放。 Further, in the separation apparatus of the present invention, the bonded substrate in which the frame-shaped seal is joined by sandwiching the thin substrate and the reinforcing support substrate in a vacuum atmosphere separates the thin substrate from the support substrate in an atmospheric pressure atmosphere The separating apparatus is characterized in that the penetrating member is provided with a penetrating member, and the penetrating member is provided to be opposed to the sealing member of the bonded substrate, and the penetrating member is configured to be inserted into the upper member. a blade tip of at least a portion of the sealing member, and a through hole is formed in at least a portion of the sealing member along the relative movement of the blade edge relative to the bonding substrate, and is formed from the through hole toward the The vacuum space inside the seal is introduced into the atmospheric fluid to open the atmosphere.

具有上述特徵之本發明的貼合分離方法中,在大氣壓氣氛中除掉貼合基板的密封件的至少一部份,藉此,在此之前密封件的內側被氣密保持成真空狀態之真空空間的氣密被破壞,並且空氣或液體等流體一次性進入到真空空間內而被大氣開放。藉由該大氣開放,密封件從外側和內側這兩側被由大氣壓產生之來自外側的壓力和進入真空空間內之流體的壓力按壓,因此成為薄壁而無需使薄板基板變形就能夠從支持基板毫不費勁地進行剝離。 In the bonding and separating method of the present invention having the above characteristics, at least a portion of the sealing member to which the substrate is bonded is removed in an atmospheric pressure atmosphere, whereby the inside of the sealing member is vacuum-tightly maintained in a vacuum state before that. The airtightness of the space is destroyed, and a fluid such as air or liquid enters the vacuum space at one time and is opened to the atmosphere. By the opening of the atmosphere, the seal is pressed by the pressure from the outside and the pressure of the fluid entering the vacuum space from the outside and the inside, so that the seal is thin and can be removed from the support substrate without deforming the thin plate substrate. Stripping effortlessly.

因此,藉由真空破壞,能夠從支持基板毫不費勁地、輕鬆地分離薄板基板。 Therefore, the thin plate substrate can be easily and easily separated from the support substrate by vacuum destruction.

其結果,與藉由對貼合基板照射特定紫外光而使薄板玻璃與支持基板之間的接合層的黏著性降低之習知的方法相比,即使支持基板為遮光性材料亦能夠輕鬆地分離薄板基板。藉此,電子組件亦不會因為支持基板材料的限定而受限制,便利性優異。 As a result, the support substrate can be easily separated even if the support substrate is a light-shielding material, compared with a conventional method in which the bonding substrate is irradiated with specific ultraviolet light to reduce the adhesion of the bonding layer between the thin plate glass and the support substrate. Thin plate substrate. Thereby, the electronic component is not limited by the limitation of the support substrate material, and the convenience is excellent.

另外,將兩個貼合基板以薄板基板彼此對向之方式進行接合而形成貼合基板組,藉此即使薄板基板不變形,亦能夠從支持基板毫不費勁地分別剝離接合之薄板基板,因此能夠輕鬆地製造薄板基板彼此接合而成之層疊體。 Further, the two bonded substrates are bonded to each other so as to face each other to form a bonded substrate group, whereby even if the thin substrate is not deformed, the bonded thin substrate can be peeled off from the support substrate without any difficulty. It is possible to easily manufacture a laminate in which thin plate substrates are joined to each other.

尤其,在大氣壓氣氛中,在密封件的至少一部份插入貫穿構件來開設出通孔,藉此空氣或液體等流體從通孔一次性進入到真空空間內。隨此,密封件藉由由大氣壓產生之來自外側的壓力和進入真空空間內之流體的壓力而成為薄壁,從而能夠使薄板基板和支持基板毫不 費勁地剝離。 In particular, in an atmospheric pressure atmosphere, a through hole is formed in at least a portion of the seal member to open a through hole, whereby a fluid such as air or liquid enters the vacuum space from the through hole at a time. Accordingly, the seal member becomes thin by the pressure from the outside generated by the atmospheric pressure and the pressure of the fluid entering the vacuum space, so that the thin plate substrate and the support substrate can be made without Struggling to peel off.

因此,能夠用簡便的方法從支持基板可靠地分離薄板基板。 Therefore, the thin plate substrate can be reliably separated from the support substrate by a simple method.

並且,具有上述之特徵之本發明的分離裝置中,在大氣壓氣氛中,在貼合基板的密封件的至少一部份插入貫穿構件的刀尖來開設出通孔,藉此在此之前密封件的內側被氣密保持成真空狀態之真空空間的氣密被破壞,並且空氣或液體等流體一次性進入到真空空間內而被大氣開放。藉由該大氣開放,密封件從外側和內側這兩側被由大氣壓產生之來自外側的壓力和進入真空空間內之流體的壓力按壓,因此成為薄壁而無需使薄板基板變形就能夠從支持基板毫不費勁地進行剝離。 Further, in the separating apparatus of the present invention having the above-described features, in an atmospheric pressure atmosphere, at least a portion of the sealing member of the bonded substrate is inserted into the tip of the penetrating member to open the through hole, whereby the sealing member is formed before The inside of the vacuum space in which the inner side is kept in a vacuum state is destroyed, and a fluid such as air or liquid enters the vacuum space at one time and is opened to the atmosphere. By the opening of the atmosphere, the seal is pressed by the pressure from the outside and the pressure of the fluid entering the vacuum space from the outside and the inside, so that the seal is thin and can be removed from the support substrate without deforming the thin plate substrate. Stripping effortlessly.

因此,能夠以簡單的結構,藉由真空破壞從支持基板輕鬆地分離薄板基板。藉此,能夠降低裝置整體的製造成本。 Therefore, the thin plate substrate can be easily separated from the support substrate by vacuum destruction with a simple structure. Thereby, the manufacturing cost of the whole apparatus can be reduced.

其結果,與藉由對貼合基板照射特定紫外光而使薄板玻璃與支持基板之間的接合層的黏著性降低之習知的方法相比,即使支持基板為遮光性材料亦能夠輕鬆地分離薄板基板。藉此,電子組件亦不會因為支持基板材料的限定而受限制,便利性優異。 As a result, the support substrate can be easily separated even if the support substrate is a light-shielding material, compared with a conventional method in which the bonding substrate is irradiated with specific ultraviolet light to reduce the adhesion of the bonding layer between the thin plate glass and the support substrate. Thin plate substrate. Thereby, the electronic component is not limited by the limitation of the support substrate material, and the convenience is excellent.

另外,將兩個貼合基板以薄板基板彼此對向之方式進行接合而形成貼合基板組,藉此即使薄板基板不變形,亦能夠從支持基板毫不費勁地分別剝離接合之薄板基板,因此能夠輕鬆地製造薄板基板彼此接合而成之層疊體。 Further, the two bonded substrates are bonded to each other so as to face each other to form a bonded substrate group, whereby even if the thin substrate is not deformed, the bonded thin substrate can be peeled off from the support substrate without any difficulty. It is possible to easily manufacture a laminate in which thin plate substrates are joined to each other.

1、1'、1"‧‧‧薄板基板 1, 1', 1" ‧‧‧ thin plate substrate

1a、1a'、1a"‧‧‧外表面 1a, 1a', 1a"‧‧‧ outer surface

1b、1b'、1b"‧‧‧內表面 1b, 1b', 1b"‧‧‧ inner surface

2、2'、2"‧‧‧支持基板 2, 2', 2" ‧ ‧ support substrate

2a、2a'、2a"‧‧‧階差部 2a, 2a', 2a" ‧ ‧ step

2b、2b'、2b"‧‧‧抵接面 2b, 2b', 2b"‧‧‧ abutment

2c‧‧‧凹凸部(凸部) 2c‧‧‧dose (convex)

2d‧‧‧凹凸部(凹部) 2d‧‧‧ concave and convex (concave)

3、3'、3"‧‧‧密封件 3, 3', 3" ‧ ‧ seals

3a‧‧‧通孔 3a‧‧‧through hole

3b‧‧‧裂縫 3b‧‧‧ crack

4、4'、4"‧‧‧貼合基板 4, 4', 4" ‧ ‧ affixed substrate

5、5'‧‧‧貼合基板組 5, 5'‧‧‧ affixed substrate group

6‧‧‧層疊體 6‧‧‧Laminated body

11、12‧‧‧保持板 11, 12‧‧‧ Keep board

11a、12a‧‧‧保持面 11a, 12a‧‧‧ Keep face

12b‧‧‧黏著卡盤 12b‧‧‧Adhesive chuck

13‧‧‧升降驅動部 13‧‧‧ Lifting and Driving Department

14‧‧‧真空腔室 14‧‧‧vacuum chamber

15‧‧‧緩衝件 15‧‧‧ cushioning parts

20、20'、20"‧‧‧貫穿構件 20, 20', 20" ‧ ‧ through members

21、21'、21"、23、23'‧‧‧刀尖 21, 21', 21", 23, 23' ‧ ‧ cutting edge

22、24‧‧‧支持構件 22, 24‧‧‧ Supporting components

30‧‧‧液體槽 30‧‧‧Liquid tank

31、34‧‧‧小型液體槽 31, 34‧‧‧Small liquid trough

32、33、35、36‧‧‧大型液體槽 32, 33, 35, 36‧‧‧ large liquid tank

A、A1、A2‧‧‧貼合裝置 A, A1, A2‧‧‧ fitting device

B、B1、B2‧‧‧分離裝置 B, B1, B2‧‧‧ separation device

S、S'、S"‧‧‧真空空間 S, S', S" ‧ ‧ vacuum space

L‧‧‧溶解液 L‧‧‧Soluble

X、Y、Z‧‧‧方向 X, Y, Z‧‧ Direction

圖1係按步驟順序表示本發明的實施形態之貼合分離方法的整體結構之說明圖,(a)係初始狀態下的支持基板的前視圖,(b)係其俯視圖且局部表示其一部份,(c)係準備步驟中的支持基板的局部切口前視圖,(d)係其俯視圖且局部表示其一部份,(e)係重合步驟中的貼合基板的局部切口前視圖,(f)係分離步驟中的貼合基板的局部切口前視 圖,(g)係分離步驟後的薄板基板的縱剖面圖和支持基板的局部切口前視圖。 1 is an explanatory view showing an overall configuration of a bonding and separating method according to an embodiment of the present invention in a step sequence, wherein (a) is a front view of a support substrate in an initial state, (b) is a plan view thereof and partially shows a part thereof. And (c) is a partial slit front view of the support substrate in the preparation step, (d) is a top view thereof and partially shows a part thereof, and (e) is a partial slit front view of the bonded substrate in the overlapping step, ( f) a partial slit front view of the bonded substrate in the separation step Fig. (g) is a longitudinal sectional view of the thin plate substrate after the separation step and a partial slit front view of the support substrate.

圖2係表示本發明的實施形態之貼合裝置的整體結構之說明圖,(a)係表示重合步驟中的接合前的狀態之局部切口前視圖,(b)係表示接合時的狀態之局部切口前視圖,(c)係接合後的貼合基板的局部切口前視圖。 Fig. 2 is an explanatory view showing the entire configuration of a bonding apparatus according to an embodiment of the present invention, wherein (a) is a partial slit front view showing a state before joining in the superposing step, and (b) is a partial view showing a state at the time of joining. The front view of the slit, (c) is a partial cut front view of the bonded substrate after joining.

圖3係表示本發明的實施形態之分離裝置的整體結構之說明圖,(a)係表示在密封件上開設有通孔之狀態之局部切口前視圖,(b)係表示真空破壞之狀態之局部切口前視圖,(c)係表示真空破壞後的狀態之局部切口前視圖。 Fig. 3 is an explanatory view showing the entire configuration of a separating apparatus according to an embodiment of the present invention, wherein (a) shows a partial slit front view in a state in which a through hole is formed in the sealing member, and (b) shows a state in which vacuum is broken. A partial incision front view, (c) is a partial incision front view showing the state after vacuum failure.

圖4係表示分離裝置的變形例之說明圖,(a)係表示在密封件上開設有通孔之狀態之局部切口前視圖,(b)係表示真空破壞時及真空破壞後的狀態之局部切口前視圖。 Fig. 4 is an explanatory view showing a modification of the separating apparatus, wherein (a) shows a partial slit front view in a state in which a through hole is opened in the sealing member, and (b) shows a partial state in a state of vacuum breaking and vacuum breaking. Front view of the incision.

圖5係按步驟順序表示本發明的其他實施例之貼合分離方法的整體結構之說明圖,(a)係分離步驟中的貼合基板組的局部切口前視圖,(b)係分離步驟後的層疊體的縱剖面圖和支持基板的局部切口前視圖。 Figure 5 is an explanatory view showing the overall structure of the bonding and separating method of another embodiment of the present invention in the order of steps, (a) a partial slit front view of the bonded substrate group in the separating step, and (b) a separation step after the separation step A longitudinal section of the laminate and a partial cut front view of the support substrate.

圖6係表示本發明的其他實施例之貼合裝置的整體結構之說明圖,(a)係表示重合步驟中的接合前的狀態之局部切口前視圖,(b)係表示接合時的狀態之局部切口前視圖,(c)係接合後的貼合基板組的局部切口前視圖。 Fig. 6 is an explanatory view showing the entire configuration of a bonding apparatus according to another embodiment of the present invention, wherein (a) is a partial slit front view showing a state before joining in the superposing step, and (b) is a state at the time of joining. A partial incision front view, (c) a partial incision front view of the bonded substrate set after bonding.

圖7係表示本發明的其他實施例之分離裝置的整體結構之說明圖,(a)係表示在密封件上開設有通孔之狀態之局部切口前視圖、(b)係表示真空破壞之狀態之局部切口前視圖,(c)係表示真空破壞後的狀態之局部切口前視圖。 Fig. 7 is an explanatory view showing the entire configuration of a separating apparatus according to another embodiment of the present invention, wherein (a) shows a partial slit front view in a state in which a through hole is opened in the sealing member, and (b) shows a state in which vacuum destruction occurs. A partial incision front view, (c) is a partial incision front view showing the state after vacuum destruction.

圖8係表示分離裝置的變形例之說明圖,(a)係表示在密封件上開 設有通孔之狀態之局部切口前視圖,(b)係表示真空破壞時及真空破壞後的狀態之局部切口前視圖。 Fig. 8 is an explanatory view showing a modification of the separating device, and (a) shows the opening on the sealing member. A partial slit front view in a state in which a through hole is provided, and (b) is a partial cut front view showing a state in which the vacuum is broken and after the vacuum is broken.

圖9係表示支持基板的變形例之說明圖,(a)係準備步驟中的支持基板的局部切口前視圖,(b)係分離步驟中的貼合基板的局部切口前視圖。 Fig. 9 is an explanatory view showing a modification of the support substrate, wherein (a) is a partial slit front view of the support substrate in the preparation step, and (b) is a partial slit front view of the bonded substrate in the separation step.

圖10係表示支持基板的變形例之說明圖,(a)係準備步驟中的支持基板的局部切口前視圖,(b)係分離步驟中的貼合基板的局部切口前視圖。 Fig. 10 is an explanatory view showing a modification of the support substrate, wherein (a) is a partial slit front view of the support substrate in the preparation step, and (b) is a partial slit front view of the bonded substrate in the separation step.

圖11係表示支持基板的變形例之說明圖,(a)係分離步驟中的貼合基板組的局部切口前視圖,(b)係分離步驟後的層疊體的縱剖面圖和支持基板的局部切口前視圖。 Fig. 11 is an explanatory view showing a modification of the support substrate, wherein (a) is a partial slit front view of the bonded substrate group in the separating step, (b) is a longitudinal sectional view of the laminated body after the separating step, and a part of the supporting substrate Front view of the incision.

以下,依據附圖對本發明的實施形態進行詳細說明。 Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

如圖1(a)~(g)等所示,本發明的實施形態之貼合分離方法為用於在薄板基板1和加強用的支持基板2被貼合之狀態下,對薄板基板1進行膜面處理或與包括薄板基板1彼此在內之其他構件的貼合等特定處理,在該處理結束之後、使薄板基板1和支持基板2分離之方法。 As shown in Fig. 1 (a) to (g), the bonding and separating method according to the embodiment of the present invention is used to bond the thin plate substrate 1 to the thin substrate 1 in a state where the thin substrate 1 and the reinforcing supporting substrate 2 are bonded together. A method of separating the thin plate substrate 1 and the support substrate 2 after the end of the treatment by a specific treatment such as film surface treatment or bonding with other members including the thin plate substrates 1.

若詳細說明,本發明的實施形態之貼合分離方法包含以下步驟作為主要步驟:重合步驟,在真空氣氛中,將薄板基板1和支持基板2以邊框狀的密封件3夾在其間之方式進行接合而形成貼合基板4;及分離步驟,在大氣壓氣氛中,除掉貼合基板4的密封件3的至少一部份,並且向形成於密封件3的內側之真空空間S放入流體而實現大氣開放。 As described in detail, the bonding and separating method according to the embodiment of the present invention includes the following steps as a main step: a superposition step in which a thin plate substrate 1 and a support substrate 2 are sandwiched by a frame-shaped sealing member 3 in a vacuum atmosphere. Bonding to form the bonded substrate 4; and a separating step of removing at least a portion of the sealing member 3 of the bonded substrate 4 in an atmospheric pressure atmosphere, and placing a fluid into the vacuum space S formed on the inner side of the sealing member 3 Realize the opening of the atmosphere.

薄板基板1由例如用於液晶顯示器(LCD)、有機EL顯示器(OLED)、等離子體顯示器(PDP)、撓性顯示器等平板顯示器(FPD)或觸面面板或3D(3維)顯示器或電子書籍等中之、薄壁的護罩玻璃或屏障玻璃或薄膜等構成。 The thin plate substrate 1 is made of, for example, a flat panel display (FPD) or a touch panel or a 3D (3D) display or an electronic book for a liquid crystal display (LCD), an organic EL display (OLED), a plasma display (PDP), a flexible display, or the like. Or a thin-walled cover glass or barrier glass or film.

但是,薄板基板1的厚度相對於其外表面1a及內表面1b之表面積較薄而容易變形,因此難以保持平滑狀態的同時進行裝卸。其結果,具有無法可靠地進行薄板基板1的膜面處理或薄板基板1彼此的貼合或與其他構件的貼合等規定操作處理之缺點。 However, since the thickness of the thin plate substrate 1 is relatively thin with respect to the surface areas of the outer surface 1a and the inner surface 1b, it is easy to deform, and it is difficult to carry out attachment and detachment while maintaining a smooth state. As a result, there is a disadvantage that the film surface treatment of the thin-plate substrate 1 or the bonding of the thin-plate substrates 1 or the bonding with other members can not be reliably performed.

支持基板2由不易變形之玻璃或金屬或其他的、耐於上述之膜面處理或貼合等處理之剛性材料形成為與薄板基板1相等或大於薄板基板1,且與薄板基板1對向之表面為平滑的平面狀或曲面狀的板狀。 The support substrate 2 is formed of a non-deformable glass or metal or other rigid material resistant to the above-described film surface treatment or bonding, etc., to be equal to or larger than the thin plate substrate 1 and opposed to the thin plate substrate 1. The surface is a smooth flat or curved plate.

在支持基板2的表面上裝卸自如地設置後述之密封件3,經由該密封件3可裝卸地黏著保持有薄板基板1。 A sealing member 3 to be described later is detachably provided on the surface of the support substrate 2, and the thin plate substrate 1 is detachably adhered and held via the sealing member 3.

作為支持基板2的具體例,如圖1(a)、(b)所示,表面整體形成為平面狀,並且具有以邊框狀形成於表面外周部份之凹狀的階差部2a、及在除階差部2a以外之中央部份與薄板基板1之內表面1b對向且平滑地形成之抵接面2b,對階差部2a配置後述之密封件3為較佳。階差部2a被形成為與能夠將後述之密封件3從支持基板2的外周端面機械式切斷之厚度對應之深度。階差部2a的深度遍及邊框狀的整周被形成為相同尺寸,或者能夠僅切斷邊框狀的一部份之厚度。 As a specific example of the support substrate 2, as shown in Figs. 1(a) and 1(b), the entire surface is formed in a planar shape, and has a concave step portion 2a formed in a frame shape on the outer peripheral portion of the surface, and It is preferable to arrange the sealing member 3 to be described later on the step portion 2a except that the central portion other than the step portion 2a is opposed to the inner surface 1b of the thin plate substrate 1 and is formed to be smoothly formed. The step portion 2a is formed to have a depth corresponding to a thickness at which the seal 3 to be described later can be mechanically cut from the outer peripheral end surface of the support substrate 2. The depth of the step portion 2a is formed to have the same size over the entire circumference of the frame shape, or it is possible to cut only the thickness of a portion of the frame shape.

並且,作為其他例子雖未圖示,但亦能夠不在支持基板2上形成階差部2a或抵接面2b,在支持基板2的表面外周部份配置後述之密封件3。 Further, although not shown in the drawings, the step portion 2a or the contact surface 2b may not be formed on the support substrate 2, and the sealing member 3 to be described later may be disposed on the outer peripheral portion of the surface of the support substrate 2.

另外,在支持基板2中除階差部2a以外之中央部份的抵接面2b和與其對向之薄板基板1的內表面1b之中央部之間,以特定密度形成微細的凹凸部2c、2d為較佳。微細的凹凸部2c、2d藉由對抵接面2b或薄板基板1的內表面1b之中央部進行表面處理或表面加工,或者在抵接面2b上黏著墊片等間隙件等而構成。微細的凹凸部2c、2d的形成位置配置於從階差部2a僅相隔一定距離之內側為較佳。 Further, between the contact surface 2b of the central portion other than the step portion 2a of the support substrate 2 and the central portion of the inner surface 1b of the thin plate substrate 1 opposed thereto, a fine uneven portion 2c is formed at a specific density, 2d is preferred. The fine concavo-convex portions 2c and 2d are formed by surface-treating or surface-treating the abutting surface 2b or the central portion of the inner surface 1b of the thin-plate substrate 1, or by attaching a gap member such as a spacer to the abutting surface 2b. It is preferable that the formation positions of the fine uneven portions 2c and 2d are disposed on the inner side of the step portion 2a only by a predetermined distance.

作為其具體例,如圖1(a)~(e)所示,對支持基板2的表面進行蝕 刻處理或噴砂處理等,藉此同時形成階差部2a及抵接面2b和微細的凸部2c及凹部2d。 As a specific example, as shown in FIGS. 1(a) to (e), the surface of the support substrate 2 is etched. The step portion 2a and the abutting surface 2b, and the fine convex portion 2c and the concave portion 2d are simultaneously formed by engraving or sandblasting.

並且,作為其他例子雖未圖示,但亦能夠在支持基板2的抵接面2b以特定密度撒布成形為圓柱狀等之複數個墊片並藉由其後的加熱處理等進行黏著,藉此將微細的凸部2c及凹部2d與階差部2a個別形成,或者在薄板基板1的內表面1b之中央部以特定密度藉由印刷等設置壓花狀的微細凹凸。 Further, although not shown in the drawings, a plurality of spacers which are formed into a columnar shape or the like at a specific density on the contact surface 2b of the support substrate 2 can be adhered by heat treatment or the like thereafter. The fine convex portion 2c and the concave portion 2d are formed separately from the step portion 2a, or embossed fine concavities and convexities are provided at a central portion of the inner surface 1b of the thin plate substrate 1 by printing or the like at a specific density.

密封件3為經受上述之規定操作之具有黏著性之黏結劑,其沿著支持基板2的表面外周部份(階差部2a)被配置成邊框狀。 The sealing member 3 is an adhesive which is subjected to the above-described predetermined operation and is disposed in a frame shape along the outer peripheral portion (step portion 2a) of the surface of the support substrate 2.

作為密封件3的配置方法,使用例如分配器等液體定量吐出機進行塗佈,或者用印刷等其他方法被設置成在密封件3的內側的一部份劃分形成封閉空間。作為密封件3的配置狀態,將密封件3的表面位置配置於與支持基板2的抵接面2b或微細的凸部2c的表面位置相同的平面上為較佳。 As a method of arranging the sealing member 3, coating is performed using a liquid quantitative discharge machine such as a dispenser, or other means such as printing is provided to form a closed space at a portion inside the sealing member 3. As the arrangement state of the sealing member 3, it is preferable to arrange the surface position of the sealing member 3 on the same plane as the surface of the contact surface 2b of the support substrate 2 or the fine convex portion 2c.

作為密封件3的具體例,使用由能夠被溶解液L溶解之黏著材料構成之溶解性的黏結劑為較佳。 As a specific example of the sealing material 3, a binder which is soluble in an adhesive material which can be dissolved in the dissolution liquid L is preferably used.

並且,作為其他例子,還能夠使用非溶解性的密封件3。 Further, as another example, an insoluble seal 3 can also be used.

而且,在本發明的實施形態之貼合分離方法中,在重合步驟之前的準備步驟中,如圖1(c)、(d)所示,沿著支持基板2的表面外周部份(階差部2a)藉由塗佈等來黏著密封件3。 Further, in the bonding and separating method of the embodiment of the present invention, in the preparation step before the superposition step, as shown in Figs. 1(c) and (d), the outer peripheral portion of the surface of the support substrate 2 (step difference) The portion 2a) adheres to the sealing member 3 by coating or the like.

在其後的重合步驟中,藉由後述之貼合裝置A等,在保持於規定真空度之氣氛中,如圖1(e)所示,對支持基板2以夾住邊框狀的密封件3之方式接合薄板基板1,藉由密封件3的黏著力而成為貼合基板4。 In the subsequent superposition step, the bonding device 3 or the like to be described later holds the frame-like sealing member 3 on the support substrate 2 as shown in FIG. 1(e) in an atmosphere maintained at a predetermined degree of vacuum. The thin plate substrate 1 is bonded to the bonded substrate 3 by the adhesive force of the sealing member 3.

藉此,在貼合基板4中於邊框狀的密封件3的內側,在薄板基板1與支持基板2的抵接面2b之間的間隙、以及在支持基板2的階差部2a與密封件3之間的間隙分別劃分形成真空空間S。 Thereby, the gap between the contact surface 2b of the thin-plate substrate 1 and the support substrate 2, and the step portion 2a and the seal member of the support substrate 2 on the inside of the frame-shaped seal 3 in the bonded substrate 4 The gaps between 3 are respectively divided to form a vacuum space S.

在其後的分離步驟中,藉由後述之分離裝置B等,在大氣壓氣氛中,如圖1(f)所示,使用後述之貫穿構件20等器具對貼合基板4中的密封件3的至少一部份進行剪切等來除掉,以此空氣或液體等流體從此處進入。 In the subsequent separation step, the separator 3 in the bonded substrate 4 is used in an atmospheric pressure atmosphere by using an apparatus such as a penetrating member 20 to be described later in an atmospheric pressure atmosphere, as shown in FIG. At least a portion is cut or the like to be removed, and a fluid such as air or liquid enters therefrom.

藉此,在此之前密封件3的內側被氣密保持成真空狀態之真空空間S的氣密被破壞而一次性開放。亦即,大氣壓流體一次性進入到真空空間S內而被大氣開放(真空破壞)。 Thereby, the airtightness of the vacuum space S in which the inside of the sealing member 3 is hermetically held in a vacuum state is broken and opened at one time. That is, the atmospheric pressure fluid enters into the vacuum space S at one time and is opened to the atmosphere (vacuum destruction).

藉由該大氣開放(真空破壞),僅對密封件3的一部份進行剪切,密封件3亦會從外側和內側這兩側被由大氣壓產生之來自外側的壓力和進入真空空間S內之流體的壓力按壓,因此其厚壁尺寸變薄,遍及整周變得脆弱。 By the opening of the atmosphere (vacuum breaking), only a part of the sealing member 3 is sheared, and the sealing member 3 is also subjected to pressure from the outside and atmospheric pressure into the vacuum space S from both the outer side and the inner side. The pressure of the fluid is pressed, so that the thickness of the thick wall becomes thin and becomes weak throughout the entire circumference.

其結果,在密封件3上容易形成裂縫3b,如圖1(g)所示,即使不從裂縫3b對薄板基板1實施變形亦能夠從支持基板2毫不費勁地進行剝離。 As a result, the crack 3b is easily formed on the sealing member 3, and as shown in Fig. 1(g), the support substrate 2 can be peeled off without any difficulty even if the thin plate substrate 1 is not deformed from the crack 3b.

接著,對為了實施本發明的實施形態之貼合分離方法而使用之貼合裝置A進行說明。 Next, a bonding apparatus A used to carry out the bonding and separating method of the embodiment of the present invention will be described.

如圖2(a)~(c)所示,薄板基板1與支持基板2的貼合裝置A1具備如下要件作為主要構成要件:保持板11、12,將相互對向之薄板基板1和支持基板2分別保持成裝卸自如;升降驅動部13,使保持板11、12中的任意一個或兩個向相互靠近之方向相對移動而使薄板基板1和支持基板2重疊;真空腔室14,至少覆蓋保持在保持板11、12上之薄板基板1及支持基板2且將其周圍的氣氛維持為規定真空度;及控制部(未圖示),用於對升降驅動部13等進行作動控制。 As shown in FIGS. 2(a) to 2(c), the bonding apparatus A1 of the thin plate substrate 1 and the supporting substrate 2 has the following main components: the holding plates 11, 12, and the thin plate substrate 1 and the supporting substrate which face each other. 2, respectively, being detachably mounted; the lifting drive portion 13 is configured such that either or both of the holding plates 11, 12 are relatively moved toward each other to overlap the thin plate substrate 1 and the support substrate 2; the vacuum chamber 14 is covered at least The thin plate substrate 1 and the support substrate 2 held on the holding plates 11 and 12 are maintained at a predetermined degree of vacuum, and a control unit (not shown) is used to control the operation of the elevation driving unit 13 and the like.

保持板11、12包括例如用金屬或陶瓷等剛體被形成為不發生翹曲(撓曲)變形之厚度的平板狀之平台等,具有相互對向之平滑的保持面11a、12a。 The holding plates 11 and 12 include, for example, a flat plate-like platform formed of a rigid body such as metal or ceramic so as not to be warped (deflected), and have holding surfaces 11a and 12a which are smooth toward each other.

另外,保持板11、12往復移動自如地被支持為至少任意一個或兩個向上下方向(Z方向)使保持面11a、12a以平行狀態相互靠近或分離。 Further, the holding plates 11, 12 are reciprocally movably supported in at least one or two of the upward and downward directions (Z direction) so that the holding faces 11a, 12a approach or separate from each other in a parallel state.

在保持板11、12的保持面11a、12a上設置有例如黏著卡盤或吸引卡盤或靜電卡盤或它們的組合等,作為分別裝卸自如地保持薄板基板1和支持基板2之保持機構。 The holding faces 11a and 12a of the holding plates 11 and 12 are provided with, for example, an adhesive chuck, a suction chuck, an electrostatic chuck, or a combination thereof, as a holding mechanism for detachably holding the thin plate substrate 1 and the support substrate 2, respectively.

作為保持板11、12的具體例,如圖2(a)、(b)所示,係構成為,在上方的保持板12中的保持面12a上向Z方向移動自如地分別埋設有複數個黏著卡盤12b,藉由使黏著卡盤12b朝向保持面12a移動而與支持基板2接觸並黏著保持於保持面12a,並且藉由使黏著卡盤12b以遠離保持面12a之方式相反移動而使其從支持基板2剝下,從而從保持面12a釋放支持基板2。 As a specific example of the holding plates 11 and 12, as shown in Figs. 2(a) and 2(b), a plurality of the retaining surfaces 12a of the upper holding plate 12 are movably inserted in the Z direction. The adhesive chuck 12b is brought into contact with the support substrate 2 by the movement of the adhesive chuck 12b toward the holding surface 12a and adhered to the holding surface 12a, and is moved by the opposite movement of the adhesive chuck 12b away from the holding surface 12a. It is peeled off from the support substrate 2 to release the support substrate 2 from the holding surface 12a.

另外,設置有僅使配置於上方之保持板12向Z方向往復移動之升降驅動部13。 Further, the elevation drive unit 13 that reciprocates only the holding plate 12 disposed above in the Z direction is provided.

並且,作為其他例子雖未圖示,但亦能夠在上方的保持板12的保持面12a上設置不同結構的黏著卡盤,或者將吸引卡盤和靜電卡盤組合配置,或者用升降驅動部13僅使配置於下方之保持板11向Z方向往復移動,或者使保持板11、12這兩者向Z方向往復移動。 Further, although not shown in the drawings, an adhesive chuck having a different structure may be provided on the holding surface 12a of the upper holding plate 12, or the suction chuck and the electrostatic chuck may be arranged in combination, or the lifting drive unit 13 may be used. Only the holding plate 11 disposed below is reciprocated in the Z direction, or both of the holding plates 11 and 12 are reciprocated in the Z direction.

控制部為如下控制器,亦即不僅與保持板11、12的保持機構、升降驅動部13、真空腔室14的真空度調整機構(未圖示)電連接,依需要還與密封件3的塗佈機構(未圖示)、朝保持板11、12搬入薄板基板1和支持基板2之搬入機構(未圖示)、及用於將重疊之貼合基板4從保持板11、12搬出之搬出機構(未圖示)等電連接,並且按照預先設定之程序對該些依次進行作動控制。 The control unit is a controller that is electrically connected not only to the holding mechanism of the holding plates 11 and 12, the lifting/lowering driving unit 13 or the vacuum degree adjusting mechanism (not shown) of the vacuum chamber 14 but also to the sealing member 3 as needed. An application mechanism (not shown), a loading mechanism (not shown) for loading the thin plate substrate 1 and the support substrate 2 toward the holding plates 11 and 12, and a stacked substrate 4 for carrying out the overlapping bonding substrates 4 from the holding plates 11 and 12 The unloading mechanism (not shown) is electrically connected, and the actuation control is sequentially performed according to a preset program.

搬入機構和搬出機構包含輸送機械手等,尤其係薄板基板1的搬入機構將薄板基板1以單體輸送,或者使用托盤等使薄板基板1不變形 地進行搬入為較佳。 The loading mechanism and the unloading mechanism include a transport robot, and the like, in particular, the loading mechanism of the thin-plate substrate 1 transports the thin-plate substrate 1 as a single body, or the thin-plate substrate 1 is not deformed by using a tray or the like. It is better to carry in the ground.

作為控制部中所設定之程序的一例,薄板基板1與支持基板2的貼合裝置A1中,首先,從真空腔室14的外側,用輸送機構向真空腔室14的內側輸送薄板基板1、及藉由塗佈機構以邊框狀塗佈有密封件3之支持基板2,如圖2(a)所示,朝上下的保持板11、12搬入並使薄板基板1和支持基板2分別保持於保持面11a、12a的規定位置。與此同時,真空腔室14被封閉,其內部被減壓而完成準備步驟。 As an example of the program set in the control unit, in the bonding apparatus A1 of the thin-plate substrate 1 and the support substrate 2, first, the thin-plate substrate 1 is transported from the outside of the vacuum chamber 14 to the inside of the vacuum chamber 14 by the transport mechanism. And the support substrate 2 to which the seal 3 is applied by a coating mechanism in a frame shape, as shown in FIG. 2(a), is carried into the upper and lower holding plates 11 and 12, and the thin plate substrate 1 and the support substrate 2 are respectively held by The predetermined positions of the faces 11a and 12a are held. At the same time, the vacuum chamber 14 is closed, and the inside thereof is depressurized to complete the preparation step.

其後,在真空腔室14的內部達到規定真空度之時刻,開始重合步驟,如圖2(b)所示,藉由升降驅動部13使保持板11、12中的任意一個或兩個向相互靠近之方向移動,從而薄板基板1和支持基板2夾住邊框狀的密封件3接合而成為貼合基板4,並且在密封件3的內側形成真空空間S。 Thereafter, when the inside of the vacuum chamber 14 reaches a predetermined degree of vacuum, the superimposing step is started, and as shown in FIG. 2(b), either or both of the holding plates 11, 12 are moved by the elevation driving portion 13. Moving in the direction in which they are close to each other, the thin plate substrate 1 and the support substrate 2 are joined to each other by the frame-shaped seal 3 to form the bonded substrate 4, and a vacuum space S is formed inside the seal 3.

其後,如圖2(c)所示,用搬出機構向真空腔室14的外側搬出貼合步驟結束之貼合基板4。 Thereafter, as shown in FIG. 2(c), the bonded substrate 4 is unloaded to the outside of the vacuum chamber 14 by the unloading mechanism.

並且,真空腔室14的內壓被設定成,將在真空腔室14的內部在規定真空度下貼合之貼合基板4向真空腔室14的外部搬出而移動到大氣壓氣氛中時,薄板基板1的中央部份不會因其壓力差而膨出變形。 The internal pressure of the vacuum chamber 14 is set such that the bonded substrate 4 bonded to the inside of the vacuum chamber 14 under a predetermined degree of vacuum is moved to the outside of the vacuum chamber 14 and moved to an atmospheric pressure atmosphere. The central portion of the substrate 1 is not bulged and deformed due to the pressure difference therebetween.

另外,薄板基板1與支持基板2的貼合裝置A1中,在保持板11、12中在至少一個或兩個上設置包含能夠彈性變形之材料之緩衝件15,藉此即使為無剛性且容易變形之薄板基板1,亦能夠與支持基板2整面接合而可靠地進行整面貼合為較佳。緩衝件15使用在真空氣氛下不劣化之彈性材料為較佳。在緩衝件15的表面以規定間隔或密度形成細槽或微細凹凸,以能夠防止由薄板基板1的一端接觸引起之破損,同時無翹曲地整面貼合而防止產生靜電為較佳。 Further, in the bonding apparatus A1 of the thin plate substrate 1 and the supporting substrate 2, the cushioning members 15 including the elastically deformable material are provided on at least one or both of the holding plates 11, 12, whereby even if it is non-rigid and easy It is preferable that the deformed thin plate substrate 1 can be bonded to the entire surface of the support substrate 2 to reliably perform the entire surface bonding. The cushioning member 15 is preferably an elastic material which does not deteriorate under a vacuum atmosphere. It is preferable to form fine grooves or fine concavities and convexities at a predetermined interval or density on the surface of the cushioning member 15 so as to prevent breakage due to contact of one end of the thin plate substrate 1, and to prevent the generation of static electricity by bonding the entire surface without warping.

在圖2(a)、(b)所示之薄板基板1與支持基板2的貼合裝置A1中,僅在配置於下方之保持板11上設置緩衝件15。 In the bonding apparatus A1 of the thin-plate substrate 1 and the support substrate 2 shown in FIGS. 2(a) and 2(b), the buffer member 15 is provided only on the holding plate 11 disposed below.

並且,作為其他例子雖未圖示,但亦能夠在配置於下方之保持板12上設置緩衝件15,或者在保持板11、12這兩個上都分別進行設置。 Further, although not shown in the drawings, the cushioning member 15 may be provided on the holding plate 12 disposed below, or may be provided on both of the holding plates 11 and 12.

接著,對為了實施本發明的實施形態之貼合分離方法而使用之分離裝置B進行說明。 Next, a separating apparatus B used to carry out the bonding and separating method of the embodiment of the present invention will be described.

如圖3(a)~(c)或圖4(a)、(b)所示,薄板基板1與支持基板2的分離裝置B1為用於將在真空氣氛中薄板基板1和加強用的支持基板2夾住邊框狀的密封件3貼合而成之貼合基板4分離成薄板基板1與支持基板2之裝置。 As shown in FIGS. 3(a) to (c) or FIGS. 4(a) and 4(b), the separation device B1 of the thin plate substrate 1 and the support substrate 2 is used for supporting the thin plate substrate 1 and the reinforcement in a vacuum atmosphere. The substrate 2 is a device in which the bonded substrate 3 is bonded to the thin substrate 1 and the support substrate 2 by sandwiching the frame-shaped sealing member 3.

若詳細說明,分離裝置具備被設置成與貼合基板4的密封件3對向且相對移動自如之貫穿構件20,作為主要構成要件。 As described in detail, the separating device includes the penetrating member 20 that is disposed to face the sealing member 3 of the bonded substrate 4 and is relatively movable, and is a main constituent element.

貫穿構件20包括頂端突出之刀尖等,其被配置成在大氣壓空氣中或液體中相對於貼合基板4相對移動自如。並且構成為如下:隨著貼合基板4與貫穿構件20的相對移動,使貫穿構件20與密封件3的至少一部份接觸,藉此除掉密封件3的至少一部份,並且從此處朝形成於密封件3的內側之真空空間S導入作為大氣壓流體的空氣或液體等,隨此使密封件3的內側大氣開放。 The penetrating member 20 includes a tip or the like protruding from the tip end, which is configured to be relatively movable relative to the bonded substrate 4 in atmospheric air or in a liquid. And configured to: contact the at least one portion of the sealing member 20 with at least a portion of the sealing member 3 as the opposing movement of the bonding substrate 4 and the penetrating member 20, thereby removing at least a portion of the sealing member 3, and from here The air or liquid or the like which is an atmospheric pressure fluid is introduced into the vacuum space S formed inside the sealing member 3, and the inside air of the sealing member 3 is opened.

作為貫穿構件20的具體例,如圖3(a)、(b)或圖4(a)、(b)所示,在大氣壓液體中,使頂端突出之刀尖21作為貫穿構件20朝貼合基板4的密封件3往復移動而插入至密封件3的至少一部份中,藉此開設通孔3a,並且從該通孔3a朝密封件3的內側的真空空間S導入作為大氣壓流體的液體。 As a specific example of the penetrating member 20, as shown in Fig. 3 (a), (b) or Figs. 4 (a) and (b), in the atmospheric pressure liquid, the tip end 21 protruding from the tip end is fitted as the penetrating member 20 The sealing member 3 of the substrate 4 is reciprocated to be inserted into at least a portion of the sealing member 3, thereby opening the through hole 3a, and introducing a liquid as an atmospheric fluid from the through hole 3a toward the vacuum space S inside the sealing member 3. .

並且,作為其他例子雖未圖示,但亦能夠使用針狀或其他形狀的刀具等作為貫穿構件20,或者在大氣壓空氣中在密封件3的至少一部份開設通孔3a並且從通孔3a朝真空空間S導入大氣壓空氣,或者使插入至密封件3的一部份中之貫穿構件20遍及密封件3的整周移動,從 而使密封件3分離。 Further, although not shown in the drawings, a needle-shaped or other-shaped cutter or the like may be used as the penetrating member 20, or a through hole 3a may be formed in at least a portion of the sealing member 3 in the atmospheric air and from the through hole 3a. Introducing atmospheric air into the vacuum space S, or moving the penetrating member 20 inserted into a portion of the sealing member 3 over the entire circumference of the sealing member 3, from The seal 3 is separated.

依該種本發明的實施形態之貼合分離方法及分離裝置B,在大氣壓氣氛(空氣中或液體中)中,除掉貼合基板4的密封件3的至少一部份,藉此在此之前密封件3的內側被氣密保持成真空狀態之真空空間S的氣密被破壞,並且空氣或液體等流體一次性進入到真空空間S內而被大氣開放。藉由該大氣開放,密封件3從外側和內側這兩側被由大氣壓產生之來自外側的壓力和進入真空空間S內之流體的壓力按壓,因此成為薄壁而無需使薄板基板1變形就能夠從支持基板2毫不費勁地進行剝離。 According to the bonding and separating method and the separating apparatus B of the embodiment of the present invention, at least a part of the sealing member 3 of the bonded substrate 4 is removed in an atmospheric pressure atmosphere (in air or in a liquid). The airtightness of the vacuum space S in which the inside of the sealing member 3 is previously kept in a vacuum state is destroyed, and the fluid such as air or liquid enters the vacuum space S at one time and is opened to the atmosphere. By the opening of the atmosphere, the seal member 3 is pressed by the pressure from the outside and the pressure of the fluid entering the vacuum space S from the outside and the inside, so that the seal member 3 can be thinned without deforming the thin plate substrate 1. Peeling is performed without difficulty from the support substrate 2.

因此,藉由真空破壞,能夠從支持基板2毫不費勁地、輕鬆地分離薄板基板1。 Therefore, the thin-plate substrate 1 can be separated from the support substrate 2 without difficulty and easily by vacuum destruction.

尤其,在分離步驟中,當在密封件3的至少一部份插入貫穿構件20來開設出通孔3a,並且從通孔3a朝真空空間S導入大氣壓流體而使其大氣開放時,在大氣壓氣氛中,在密封件3的至少一部份開設通孔3a,藉此空氣或液體等流體從通孔3a一次性進入到真空空間S內。隨此,密封件3藉由由大氣壓產生之來自外側的壓力和進入真空空間S內之流體的壓力而成為薄壁,從而能夠使薄板基板1與支持基板2毫不費勁地剝離。 In particular, in the separating step, when the through hole 3a is opened by inserting the penetrating member 20 into at least a portion of the sealing member 3, and the atmospheric pressure fluid is introduced from the through hole 3a toward the vacuum space S to open the atmosphere, the atmosphere is at atmospheric pressure. The through hole 3a is formed in at least a portion of the sealing member 3, whereby fluid such as air or liquid enters the vacuum space S from the through hole 3a at a time. As a result, the seal member 3 is thinned by the pressure from the outside generated by the atmospheric pressure and the pressure of the fluid entering the vacuum space S, so that the thin plate substrate 1 and the support substrate 2 can be peeled off without difficulty.

因此,能夠用簡便的方法從支持基板2可靠地分離薄板基板1。 Therefore, the thin plate substrate 1 can be reliably separated from the support substrate 2 by a simple method.

另外,分離裝置B中,能夠以簡單的結構藉由真空破壞從支持基板2輕鬆地分離薄板基板1。藉此,能夠降低裝置整體的製造成本。 Further, in the separating device B, the thin plate substrate 1 can be easily separated from the support substrate 2 by vacuum destruction with a simple structure. Thereby, the manufacturing cost of the whole apparatus can be reduced.

另外,在重合步驟之前的準備步驟中,當對形成於支持基板2的外周部份之邊框狀且凹狀的階差部2a配置密封件3時,即使對階差部2a塗佈密封件3,密封件3亦不會從支持基板2的規定位置溢出,且被配置成規定形狀。 Further, in the preparation step before the superposition step, when the sealing member 3 is disposed on the frame-like and concave step portion 2a formed on the outer peripheral portion of the support substrate 2, even if the step portion 2a is coated with the sealing member 3 Further, the sealing member 3 does not overflow from a predetermined position of the support substrate 2, and is disposed in a predetermined shape.

因此,能夠輕鬆地進行密封件3的配置且縮短重疊前的準備時 間。 Therefore, the arrangement of the seal 3 can be easily performed and the preparation time before the overlap can be shortened. between.

其結果,能夠縮短整個行程的時間來實現高速化。 As a result, the time of the entire stroke can be shortened to achieve higher speed.

尤其,當在密封件3的一部份插入貫穿構件20來開設出通孔3a時,由於貫穿構件20的頂端能夠插入至與階差部2a碰撞之位置,因此即使密封件3由能夠變形之材料構成時,亦不會使密封件3的形狀變形而能夠順暢且可靠地貫穿開鑿出通孔3a。 In particular, when the through hole 3a is opened by inserting the through member 20 in a part of the sealing member 3, since the tip end of the penetrating member 20 can be inserted into a position colliding with the step portion 2a, even if the sealing member 3 is deformable In the material configuration, the shape of the seal 3 is not deformed, and the through hole 3a can be smoothly and reliably drilled.

其結果,可靠性得以提高。 As a result, reliability is improved.

並且,當在支持基板2中除階差部2a以外之抵接面2b和與其對向之薄板基板1的內表面1b之中央部之間以特定密度形成微細的凹凸部2c、2d時,即使異物進入到支持基板2的抵接面2b與薄板基板1之間,異物亦被誘導進入到凹部2d,藉此薄板基板1沿著支持基板2的抵接面2b被平滑地接合。 Further, even when the fine uneven portions 2c and 2d are formed at a specific density between the abutting surface 2b other than the step portion 2a and the central portion of the inner surface 1b of the thin plate substrate 1 opposed thereto in the support substrate 2, even if fine uneven portions 2c and 2d are formed at a specific density The foreign matter enters between the contact surface 2b of the support substrate 2 and the thin plate substrate 1, and foreign matter is also induced to enter the concave portion 2d, whereby the thin plate substrate 1 is smoothly joined along the contact surface 2b of the support substrate 2.

因此,能夠防止由異物的嚙入引起之薄板基板1的膨出變形。 Therefore, it is possible to prevent the bulging deformation of the thin plate substrate 1 caused by the engagement of the foreign matter.

尤其,當將微細的凹凸部2c、2d的形成位置配置於從階差部2a相隔一定距離之內側時,藉由塗佈等在階差部2a配置密封件3時,不存在密封件3誤進入到微細的凹部2d而不係進入到階差部2a之顧慮,密封件3的去除作業輕鬆且方便。 In particular, when the formation positions of the fine uneven portions 2c and 2d are arranged inside the predetermined distance from the step portion 2a, when the seal 3 is placed on the step portion 2a by coating or the like, there is no seal 3 error. The entry of the fine recess 2d without entering the step portion 2a makes the removal of the seal 3 easy and convenient.

[實施例1] [Example 1]

接著,依據附圖對本發明的各實施例進行說明。 Next, various embodiments of the present invention will be described with reference to the drawings.

如圖1~圖3或圖4所示,該實施例1中,密封件3由能夠被溶解液L溶解之黏著材料構成,在分離步驟中,將貼合基板4的密封件3的至少一部份浸漬於溶解液L中,從而在溶解液L中使真空空間S大氣開放。 As shown in FIG. 1 to FIG. 3 or FIG. 4, in the first embodiment, the sealing member 3 is composed of an adhesive material which can be dissolved by the dissolution liquid L, and at least one of the sealing members 3 to which the substrate 4 is bonded in the separating step. Part of the solution is immersed in the solution L to open the vacuum space S in the solution L.

如圖3或圖4所示,作為薄板基板1與支持基板2的分離裝置B1具備積存溶解液L之液體槽30、及在液體槽30內被設置成與浸漬於溶解液L中之貼合基板4的密封件3的至少一部份對向且相對移動自如之貫 穿構件20。 As shown in FIG. 3 or FIG. 4, the separation device B1 as the thin plate substrate 1 and the support substrate 2 is provided with a liquid tank 30 in which the dissolved liquid L is stored, and a liquid container 30 in the liquid tank 30 so as to be immersed in the dissolved liquid L. At least a portion of the seal 3 of the substrate 4 is opposite and relatively free to move The member 20 is worn.

在圖3(a)~(c)所示之例子中,作為溶解液L的液體槽30,備有放入貼合基板4的密封件3的至少一部份之小型液體槽31、及放入貼合基板4整體之大型液體槽32。在小型液體槽31中,相對於一部份被浸漬於溶解液L中之密封件3的一邊部份,將作為貫穿構件20的一個刀尖21和安裝有刀尖21之支持構件22這兩者設置成相對於小型液體槽31往復移動自如。 In the example shown in FIGS. 3(a) to 3(c), the liquid tank 30 as the dissolving liquid L is provided with a small liquid tank 31 into which at least a part of the sealing member 3 of the bonded substrate 4 is placed, and The large liquid tank 32 of the entire substrate 4 is bonded. In the small liquid tank 31, a part of the seal member 3 which is immersed in the solution L with respect to a portion is to be a blade tip 21 of the penetrating member 20 and a supporting member 22 to which the blade tip 21 is attached. It is provided to be reciprocally movable with respect to the small liquid tank 31.

在圖3(a)所示之第一分離步驟中,使刀尖21朝一部份被浸漬於小型液體槽31內的溶解液L中之密封件3的一邊部份靠近移動,並且插入至密封件3的一邊部份而開設通孔3a。在其次的圖3(b)所示之第二分離步驟中,使刀尖21從一部份被浸漬於溶解液L中之密封件3的一邊部份向相反方向分離移動,從而大量的溶解液L從通孔3a一次性流入到密封件3的內側的真空空間S。而且,在最後的圖3(c)所示之第三分離步驟中,將貼合基板4移到大型液體槽32而使密封件3整體被浸漬,從而被溶解液L溶解。 In the first separating step shown in Fig. 3 (a), the blade tip 21 is moved toward a portion of the portion of the sealing member 3 which is immersed in the solution L in the small liquid tank 31, and is inserted into the seal. A through hole 3a is formed in one side of the piece 3. In the second separation step shown in Fig. 3(b), the blade tip 21 is separated from a side portion of the sealing member 3 which is immersed in the solution L in the opposite direction, thereby dissolving a large amount of the solution. The liquid L flows into the vacuum space S inside the sealing member 3 from the through hole 3a at one time. Further, in the third separation step shown in the last FIG. 3(c), the bonded substrate 4 is moved to the large liquid tank 32, and the entire sealing member 3 is immersed, thereby being dissolved by the dissolved liquid L.

並且,作為其他例子雖未圖示,但亦能夠相對於小型液體槽31固定配置貫穿構件20的刀尖21,並且使一部份被浸漬於溶解液L中之貼合基板4朝刀尖21靠近移動而在密封件3的一邊部份開設通孔3a。 Further, although not shown in the drawings, the blade edge 21 of the penetrating member 20 may be fixedly disposed to the small liquid tank 31, and a portion of the bonding substrate 4 immersed in the solution L may be directed toward the blade edge 21. A through hole 3a is formed in a side portion of the sealing member 3 in proximity to movement.

另外,在圖4(a)、(b)所示之例子中,作為溶解液L的液體槽30,備有放入貼合基板4整體之大型液體槽33。大型液體槽33中,相對於被浸漬於溶解液L中之密封件3的一邊部份,將作為貫穿構件20的一個刀尖21和安裝有刀尖21之支持構件22這兩者設置成相對於大型液體槽33往復移動自如。 Further, in the example shown in FIGS. 4(a) and 4(b), the liquid tank 30 as the dissolved liquid L is provided with a large liquid tank 33 into which the entire bonded substrate 4 is placed. In the large liquid tank 33, both of the cutting edge 21 as the penetrating member 20 and the supporting member 22 to which the cutting edge 21 is attached are disposed opposite to each other with respect to one side of the sealing member 3 immersed in the dissolving liquid L. The large liquid tank 33 reciprocates freely.

在圖4(a)所示之第一分離步驟中,使刀尖21朝整體被浸漬於大型液體槽33內的溶解液L中之密封件3的一邊部份靠近移動,並且插入至密封件3的一邊部份來開設出通孔3a。在其次的圖4(b)所示之第二分 離步驟中,使刀尖21從整體被浸漬於溶解液L中之密封件3的一邊部份向相反方向分離移動,從而大量的溶解液L從通孔3a一次性流入到密封件3的內側的真空空間S,密封件3整體被溶解液L溶解。 In the first separating step shown in Fig. 4 (a), the blade tip 21 is moved toward the one side of the sealing member 3 which is immersed in the molten liquid L in the large liquid tank 33 as a whole, and is inserted into the sealing member. One side of the 3 is provided with a through hole 3a. Second point shown in Figure 4(b) In the step, the blade tip 21 is separated from the one side of the sealing member 3 which is entirely immersed in the solution L in the opposite direction, so that a large amount of the solution L flows from the through hole 3a to the inside of the sealing member 3 at a time. In the vacuum space S, the entire sealing member 3 is dissolved by the dissolved liquid L.

並且,作為其他例子雖未圖示,但亦能夠相對於大型液體槽33固定配置貫穿構件20的刀尖21,並且使整體被浸漬於溶解液L中之貼合基板4朝刀尖21靠近移動而在密封件3的一邊部份開設通孔3a。 Further, although not shown in the drawings, the blade edge 21 of the penetrating member 20 may be fixedly disposed with respect to the large-sized liquid tank 33, and the bonded substrate 4 immersed in the dissolved liquid L as a whole may move toward the blade edge 21. A through hole 3a is formed in one side of the sealing member 3.

依該種本發明的實施例1之貼合分離方法及分離裝置B1,在貼合基板4的至少一部份被浸漬於溶解液L中之狀態下,除掉貼合基板4的密封件3的至少一部份,或者用貫穿構件20開設通孔3a,藉此真空空間S的氣密被破壞,從而溶解液L一次性進入到真空空間S。隨此,密封件3藉由由溶解液L產生之來自外側的水壓和進入真空空間S內之溶解液L的壓力而成為薄壁,同時從外側和內側這兩側被溶解液L侵蝕,從而能夠使薄板基板1與支持基板2毫不費勁地剝離。 According to the bonding and separating method and the separating device B1 of the first embodiment of the present invention, the sealing member 3 of the bonded substrate 4 is removed in a state where at least a portion of the bonded substrate 4 is immersed in the solution L. At least a portion of the through hole 3a is opened by the penetrating member 20, whereby the airtightness of the vacuum space S is broken, so that the dissolved liquid L enters the vacuum space S at a time. With this, the sealing member 3 is thinned by the water pressure from the outside generated by the dissolved liquid L and the pressure of the dissolved liquid L entering the vacuum space S, and is eroded by the dissolved liquid L from both the outer side and the inner side. Thereby, the thin plate substrate 1 and the support substrate 2 can be peeled off without difficulty.

因此,能夠在分離薄板基板1及支持基板2的同時溶解去除密封件3。 Therefore, the sealing member 3 can be dissolved and removed while separating the thin plate substrate 1 and the support substrate 2.

其結果,無需另行增加密封件3的去除步驟,因此能夠簡化分離步驟的後步驟,具有能夠實現整個行程的縮短化之優點。 As a result, it is not necessary to separately increase the removal step of the sealing member 3, so that the subsequent steps of the separation step can be simplified, and the advantage that the entire stroke can be shortened can be achieved.

[實施例2] [Embodiment 2]

如圖5~圖7或圖8所示,該實施例2的如下結構與圖1~圖3或圖4所示之實施例1不同,除此以外的結構與實施例1相同,亦即,在重合步驟中,在將貼合基板4彼此接合而形成貼合基板組5之後,在分離步驟中,在大氣壓氣氛(空氣中或液體中)中分別除掉貼合基板組5中的各貼合基板4的密封件3的至少一部份而使真空空間S大氣開放,藉此剝離成薄板基板1彼此貼合而成之層疊體6和一對支持基板2。 As shown in FIG. 5 to FIG. 7 or FIG. 8, the configuration of the second embodiment is different from that of the first embodiment shown in FIG. 1 to FIG. 3 or FIG. 4, and the other configuration is the same as that of the first embodiment, that is, In the superposition step, after the bonded substrates 4 are joined to each other to form the bonded substrate group 5, in the separation step, the respective stickers in the bonded substrate group 5 are removed in an atmospheric pressure atmosphere (in air or in a liquid). At least a part of the sealing material 3 of the substrate 4 is opened, and the vacuum space S is opened to the atmosphere, whereby the laminated body 6 and the pair of supporting substrates 2 which are bonded to each other by the thin plate substrate 1 are peeled off.

對貼合基板4彼此的貼合裝置A2進行說明。 The bonding apparatus A2 which bonded the board|substrate 4 mutually is demonstrated.

作為在貼合裝置A2的控制部中所設定之程序的一例,首先,用 搬入機構將兩組貼合基板4從真空腔室14的外側向真空腔室14的內側輸送,如圖6(a)所示,朝上下的保持板11、12搬入,並且在保持面11a、12a的規定位置上以各自的薄板基板1彼此對向之方式進行保持。在這一階段,在兩組貼合基板4中對向之薄板基板1彼此中的任意一個或兩個上塗佈有黏結劑(未圖示)。並且,與此同時,真空腔室14被封閉,其內部被減壓而完成準備步驟。 As an example of the program set in the control unit of the bonding apparatus A2, first, The loading mechanism transports the two sets of bonded substrates 4 from the outside of the vacuum chamber 14 to the inside of the vacuum chamber 14, and as shown in Fig. 6(a), the holding plates 11 and 12 are carried in the upper and lower holding plates 11a, The predetermined position of 12a is held such that the respective thin plate substrates 1 face each other. At this stage, a binder (not shown) is applied to either or both of the opposing thin plate substrates 1 in the two sets of bonded substrates 4. And, at the same time, the vacuum chamber 14 is closed, and the inside thereof is depressurized to complete the preparation step.

其後,在真空腔室14的內部達到規定真空度之時刻,開始重合步驟,如圖6(b)所示,藉由升降驅動部13使保持板11、12中的任意一個或兩個向相互靠近之方向移動,從而兩組貼合基板4中的薄板基板1彼此夾住黏結劑而被接合,並藉由黏結劑而成為貼合基板組5。 Thereafter, when the inside of the vacuum chamber 14 reaches a predetermined degree of vacuum, the superimposing step is started, and as shown in FIG. 6(b), either or both of the holding plates 11, 12 are moved by the elevation driving portion 13. Moving in the direction in which they approach each other, the thin-plate substrates 1 in the two sets of bonded substrates 4 are bonded to each other with the bonding agent interposed therebetween, and are bonded to the substrate group 5 by the bonding agent.

其後,如圖5(a)及圖6(c)所示,用搬出機構向真空腔室14的外側搬出貼合步驟結束之貼合基板組5。 Thereafter, as shown in FIGS. 5(a) and 6(c), the bonded substrate group 5 in which the bonding step is completed is carried out to the outside of the vacuum chamber 14 by the carry-out mechanism.

並且,作為其他例子雖未圖示,但依層疊體6的貼合狀況,亦能夠在貼合基板4彼此的貼合裝置A2中不使用真空腔室14,而是在大氣壓氣氛中將貼合基板4彼此接合而製作貼合基板組5。 Further, although not shown in the drawings, depending on the bonding state of the laminated body 6, the vacuum chamber 14 can be used in the bonding apparatus A2 for bonding the substrates 4, but the atmosphere can be bonded in an atmospheric pressure atmosphere. The substrates 4 are bonded to each other to form a bonded substrate group 5.

而且,在本發明的實施例2之貼合分離方法中,對在大氣壓空氣中對藉由貼合裝置A2製作出之貼合基板組5進行分離步驟之情況進行說明。 Further, in the bonding and separating method of the second embodiment of the present invention, a case where the bonding substrate group 5 produced by the bonding apparatus A2 is subjected to a separation step in atmospheric air will be described.

在分離步驟中,在大氣壓空氣中,如圖5(a)所示,使用後述之貫穿構件20等器具對貼合基板組5中的各貼合基板4的密封件3的至少一部份分別進行剪切等來除掉。藉此,真空空間S的氣密被破壞,空氣等流體一次性進入到真空空間S內而分別被大氣開放(真空破壞)。 In the separation step, in the atmospheric air, as shown in FIG. 5(a), at least a part of the sealing member 3 of each of the bonded substrates 4 in the bonded substrate group 5 is respectively separated by an instrument such as the penetrating member 20 to be described later. Cut and so on to remove. Thereby, the airtightness of the vacuum space S is broken, and the fluid such as air enters the vacuum space S at one time and is opened by the atmosphere (vacuum destruction).

藉由該大氣開放(真空破壞),僅對各貼合基板4的密封件3的一部份進行剪切,各密封件3亦會從外側和內側這兩側被由大氣壓產生之來自外側的壓力和進入真空空間S內之流體的壓力按壓,因此其厚壁尺寸變薄,遍及整周變得脆弱。 By the opening of the atmosphere (vacuum breaking), only a part of the sealing member 3 of each of the bonded substrates 4 is sheared, and each of the sealing members 3 is also generated from the outside by the atmospheric pressure from both the outer side and the inner side. The pressure and the pressure of the fluid entering the vacuum space S are pressed, so that the thickness of the thick wall becomes thin and becomes weak throughout the entire circumference.

其結果,在密封件3上容易形成裂縫3b,如圖5(b)所示,即使不從裂縫3b對薄板基板1實施變形亦能夠從支持基板2毫不費勁地分別剝離薄板基板1彼此接合而成之層疊體6。 As a result, the crack 3b is easily formed on the sealing member 3, and as shown in Fig. 5(b), the thin plate substrate 1 can be peeled off from the supporting substrate 2 without any difficulty even if the thin plate substrate 1 is not deformed from the crack 3b. The laminated body 6 is formed.

另外,在圖5(a)所示之例子中,朝貼合基板組5中的各貼合基板4的密封件3,將作為貫穿構件20的頂端突出之兩個刀尖23設置成往復移動自如,從而在密封件3的一邊部份分別開設通孔3a。 Further, in the example shown in FIG. 5(a), the two blade tips 23 which protrude as the tips of the penetrating members 20 are disposed to reciprocate toward the sealing member 3 of each of the bonded substrates 4 in the bonded substrate group 5. Freely, a through hole 3a is formed in one side portion of the sealing member 3, respectively.

並且,作為其他例子雖未圖示,但亦能夠將成為貫穿構件20之兩個刀尖23固定配置,使貼合基板組5朝刀尖23靠近移動而在密封件3的一邊部份分別開設通孔3a。 Further, although not shown in the drawings, the two blade tips 23 serving as the penetrating members 20 can be fixedly arranged, and the bonded substrate group 5 can be moved toward the blade edge 23 to be opened on one side of the sealing member 3, respectively. Through hole 3a.

接著,對在液體中從貼合基板組5分離成薄板基板1彼此貼合而成之層疊體6和一對支持基板2之分離裝置B2進行說明。 Next, the laminate 6 in which the thin substrate 1 is bonded from the bonded substrate group 5 in the liquid and the separation device B2 of the pair of support substrates 2 will be described.

如圖7或圖8所示,分離裝置B2具備積存溶解液L之液體槽30、及在液體槽30內被設置成與浸漬於溶解液L中之貼合基板組5中各貼合基板4的密封件3的至少一部份對向且相對移動自如之貫穿構件20。 As shown in FIG. 7 or FIG. 8 , the separation device B2 includes a liquid tank 30 in which the dissolved liquid L is stored, and a bonded substrate 4 in the liquid crystal tank 30 and the bonded substrate group 5 immersed in the dissolved liquid L. At least a portion of the seal 3 is opposed to and relatively movable through the member 20.

在圖7(a)~(c)所示之例子中,作為溶解液L的液體槽30,備有放入貼合基板組5中各貼合基板4的密封件3的至少一部份之小型液體槽34、及放入貼合基板組5整體之大型液體槽35。在小型液體槽34中,相對於一部份被浸漬於溶解液L中之各密封件3的一邊部份,將作為貫穿構件20的兩個刀尖23和安裝有刀尖23之支持構件24這兩者設置成相對於小型液體槽34往復移動自如。 In the example shown in FIGS. 7(a) to 7(c), the liquid tank 30 as the dissolved liquid L is provided with at least a part of the sealing member 3 placed in each of the bonded substrates 4 in the bonded substrate group 5. The small liquid tank 34 and the large liquid tank 35 which is placed in the entire bonded substrate group 5 are provided. In the small liquid tank 34, with respect to a portion of one side of each of the seals 3 immersed in the solution L, the two tips 23 as the penetrating members 20 and the supporting members 24 to which the tips 23 are attached are provided. Both of these are arranged to reciprocate with respect to the small liquid tank 34.

在圖7(a)所示之第一分離步驟中,使刀尖23朝一部份被浸漬於小型液體槽34內的溶解液L中之各密封件3的一邊部份靠近移動,並且插入至密封件3的一邊部份而分別開設通孔3a。在其次的圖7(b)所示之第二分離步驟中,使刀尖23從一部份被浸漬於溶解液L中之各密封件3的一邊部份向相反方向分離移動,從而大量的溶解液L從通孔3a分別一次性流入到密封件3的內側的真空空間S。而且,在最後的圖7(c)所 示之第三分離步驟中,將貼合基板組5移到大型液體槽35而使密封件3整體分別被浸漬,從而被溶解液L溶解。 In the first separating step shown in Fig. 7 (a), the blade tip 23 is moved toward a portion of one side of each of the sealing members 3 immersed in the small liquid tank 34 in the small liquid tank 34, and is inserted into A through hole 3a is formed in one side of the sealing member 3, respectively. In the second separation step shown in FIG. 7(b), the blade tip 23 is separated from the one side of each of the seal members 3 immersed in the solution L in the opposite direction, thereby a large amount of The solution L flows into the vacuum space S inside the sealing member 3 from the through hole 3a at a time. Moreover, in the final Figure 7(c) In the third separation step shown, the bonded substrate group 5 is moved to the large liquid tank 35, and the entire sealing member 3 is immersed, respectively, to be dissolved by the dissolved liquid L.

並且,作為其他例子雖未圖示,但亦能夠相對於小型液體槽34固定配置貫穿構件20的刀尖23,並且使一部份被浸漬於溶解液L中之貼合基板組5朝刀尖23靠近移動而在密封件3的一邊部份分別開設通孔3a。 Further, although not shown in the drawings, the blade edge 23 of the penetrating member 20 may be fixedly disposed with respect to the small-sized liquid tank 34, and a portion of the bonded substrate group 5 immersed in the solution L may be directed toward the blade edge. 23 is moved closer to each other to open a through hole 3a in one side portion of the sealing member 3.

另外,在圖8(a)、(b)所示之例子中,作為溶解液L的液體槽30,備有放入貼合基板組5整體之大型液體槽36。在大型液體槽36中,相對於被浸漬於溶解液L中之各密封件3的一邊部份,將作為貫穿構件20的兩個刀尖23和安裝有刀尖23之支持構件24這兩者設置成相對於大型液體槽36往復移動自如。 Further, in the example shown in FIGS. 8(a) and 8(b), the liquid tank 30 as the dissolved liquid L is provided with a large liquid tank 36 into which the entire bonded substrate group 5 is placed. In the large liquid tank 36, the two cutting edges 23 as the penetrating member 20 and the supporting member 24 to which the cutting edge 23 is attached are used with respect to one side portion of each of the seal members 3 immersed in the dissolving liquid L. It is arranged to reciprocate with respect to the large liquid tank 36.

在圖8(a)所示之第一分離步驟中,使刀尖23朝整體被浸漬於大型液體槽36內的溶解液L中之各密封件3的一邊部份靠近移動,並且插入至密封件3的一邊部份而分別開設通孔3a。在其次的圖8(b)所示之第二分離步驟中,使刀尖23從整體被浸漬於溶解液L中之各密封件3的一邊部份向相反方向分離移動,從而大量的溶解液L從通孔3a分別一次性流入到密封件3的內側的真空空間S,密封件3整體被溶解液L溶解。 In the first separating step shown in Fig. 8(a), the blade tip 23 is moved toward the side of each of the seal members 3 of the solution L immersed in the large liquid tank 36 as a whole, and is inserted into the seal. A through hole 3a is formed in one side of the member 3. In the second separation step shown in FIG. 8(b), the blade edge 23 is separated from the one side of each of the sealing members 3 immersed in the solution L in the opposite direction, thereby dispersing a large amount of the solution. L flows into the vacuum space S inside the sealing member 3 from the through hole 3a at a time, and the entire sealing member 3 is dissolved by the dissolved liquid L.

並且,作為其他例子雖未圖示,但亦能夠相對於大型液體槽36固定配置貫穿構件20的刀尖23,並且使整體被浸漬於溶解液L中之貼合基板組5朝刀尖23靠近移動而在密封件3的一邊部份分別開設通孔3a。 Further, although not shown in the drawings, the blade edge 23 of the penetrating member 20 can be fixedly disposed with respect to the large-sized liquid tank 36, and the bonded substrate group 5 immersed in the solution L as a whole can be approached toward the blade edge 23. The through hole 3a is opened in one side portion of the sealing member 3 by moving.

依該種本發明的實施例2之貼合分離方法及分離裝置B2,將兩個貼合基板4以薄板基板1彼此對向之方式進行接合而形成貼合基板組5,藉此即使薄板基板1不變形,亦能夠從支持基板2毫不費勁地分別剝離接合之薄板基板1,因此存在能夠輕鬆地製造薄板基板1彼此貼合 而成之層疊體6之優點。 According to the bonding and separating method and the separating apparatus B2 of the second embodiment of the present invention, the two bonded substrates 4 are joined to each other such that the thin-plate substrates 1 face each other, thereby forming the bonded substrate group 5, whereby even the thin-plate substrate Since the bonded thin plate substrate 1 can be peeled off from the support substrate 2 without any difficulty, the thin plate substrate 1 can be easily fabricated. The advantages of the laminated body 6 formed.

另外,當在支持基板2中除階差部2a以外之抵接面2b和與其對向之薄板基板1的內表面1b之中央部之間以特定密度形成微細的凹凸部2c、2d時,在製造薄板基板1彼此貼合而成之層疊體6時,存在能夠使形成於薄板基板1彼此之間之間隙均勻化之優點。 Further, when the fine uneven portions 2c and 2d are formed at a specific density between the abutting surface 2b other than the step portion 2a and the central portion of the inner surface 1b of the thin plate substrate 1 opposed thereto in the support substrate 2, When the laminate 6 in which the thin plate substrates 1 are bonded to each other is produced, there is an advantage that the gap formed between the thin plate substrates 1 can be made uniform.

其結果,能夠以良好的成品率進行薄板基板1彼此的貼合等處理。 As a result, it is possible to perform processes such as bonding of the thin plate substrates 1 with a good yield.

並且,在製造作為薄板基板1的薄膜彼此貼合而成之層疊體6時,薄膜的表面上具有微細的凹凸之層疊體較多。存在即使在薄膜的表面具有微細的凹凸亦不受其影響,能夠以良好的成品率進行薄膜彼此的貼合等處理之優點。 In addition, when the laminate 6 in which the thin films of the thin-plate substrates 1 are bonded to each other is produced, a laminate having fine irregularities on the surface of the film is often used. There is an advantage that even if fine irregularities are formed on the surface of the film, the film can be bonded to each other with good yield.

另外,在前示實施例中,作為支持基板2使用了與薄板基板1對向之表面被形成為平面狀之支持基板,但不限於此,亦可以使用如圖9~圖11所示之變形例的表面被形成為曲面狀之支持基板2'、2"。 Further, in the above-described embodiment, the support substrate 2 is a support substrate which is formed in a planar shape on the surface opposite to the thin plate substrate 1. However, the present invention is not limited thereto, and deformation as shown in Figs. 9 to 11 may be used. The surface of the example is formed into a curved support substrate 2', 2".

圖9(a)、(b)所示之例子被形成為使支持基板2'的表面彎曲成圓弧狀而朝薄板基板1'之內表面1b'以凸狀突出。支持基板2'具有階差部2a'和曲面凸狀的抵接面2b'。在重合步驟中,在真空氣氛中對支持基板2'以夾住配置於階差部2a'之邊框狀的密封件3'之方式以曲面凸狀接合薄板基板1'之外表面1a'。藉此,能夠製作薄板基板1'以曲面狀突出之貼合基板4'。在分離步驟中,在大氣壓氣氛中,藉由貫穿構件20'(刀尖21')等對貼合基板4'中的密封件3'的至少一部份進行剪切等來除掉,並且從此處朝比密封件3'更靠內側之真空空間S'放入流體而實現大氣開放。藉此,能夠對以曲面狀突出之薄板基板1'進行特定處理。 The examples shown in Figs. 9(a) and 9(b) are formed such that the surface of the support substrate 2' is curved in an arc shape and protrudes convexly toward the inner surface 1b' of the thin plate substrate 1'. The support substrate 2' has a step portion 2a' and a curved surface abutting surface 2b'. In the superimposing step, the outer surface 1a' of the thin plate substrate 1' is convexly convexly joined to the support substrate 2' in a vacuum atmosphere so as to sandwich the frame-shaped seal member 3' disposed on the step portion 2a'. Thereby, the bonded substrate 4' in which the thin plate substrate 1' protrudes in a curved shape can be produced. In the separation step, in the atmospheric pressure atmosphere, at least a portion of the sealing member 3' in the bonded substrate 4' is cut or the like by the penetration member 20' (the blade tip 21') or the like, and is removed therefrom. The atmosphere is opened by placing a fluid into the vacuum space S' on the inner side of the seal 3'. Thereby, it is possible to perform a specific treatment on the thin plate substrate 1' that protrudes in a curved shape.

圖10(a)、(b)所示之例子被形成為使與薄板基板1"之內表面1b"對向之支持基板2"的表面彎曲成圓弧狀而以凹狀凹陷。支持基板2"具有階差部2a"和曲面凹狀的抵接面2b"。在重合步驟中,在真空氣氛中對 支持基板2"以夾住配置於階差部2a"之邊框狀的密封件3"之方式以曲面凹狀接合薄板基板1"之外表面1a"。藉此,能夠製作薄板基板1'以曲面狀凹陷之貼合基板4"。在分離步驟中,在大氣壓氣氛中,藉由貫穿構件20"(刀尖21")等對貼合基板4"中的密封件3"的至少一部份進行剪切等來除掉,並且從此處朝比密封件3"更靠內側之真空空間S"放入流體而實現大氣開放。藉此,能夠對以曲面狀凹陷之薄板基板1'進行特定處理。 The examples shown in Figs. 10(a) and (b) are formed such that the surface of the support substrate 2" opposed to the inner surface 1b of the thin plate substrate 1" is curved in an arc shape and recessed in a concave shape. "having a step portion 2a" and a concave contact surface 2b". In the overlap step, in a vacuum atmosphere The support substrate 2" is configured to sandwich the outer surface 1a" of the thin plate substrate 1" in a concavely curved manner so as to sandwich the seal member 3" disposed on the step portion 2a". Thereby, the thin plate substrate 1' can be made curved. The recessed bonded substrate 4". In the separation step, in the atmospheric pressure atmosphere, at least a portion of the sealing member 3" in the bonded substrate 4" is cut by the penetrating member 20" (the blade tip 21") or the like, and is removed therefrom. Atmospheric opening is achieved by placing a fluid into the vacuum space S" on the inner side of the seal 3". Thereby, it is possible to perform a specific treatment on the thin plate substrate 1' which is recessed in a curved shape.

圖11(a)、(b)所示之例子中,在重合步驟中,對使用表面為曲面凸狀之支持基板2'將薄板基板1'接合為曲面凸狀而成之貼合基板4'和使用表面為曲面凹狀之支持基板2"將薄板基板1"接合為曲面凹狀而成之貼合基板4"進行接合。藉此,能夠製作薄板基板1'以曲面狀彎曲之貼合基板組5'。 In the example shown in FIGS. 11(a) and 11(b), in the superposing step, the bonded substrate 4' in which the thin substrate 1' is joined to the curved surface of the support substrate 2' having a curved surface is used. And the bonding substrate 4 which is formed by bonding the thin-plate substrate 1 to the curved surface of the support substrate 2 which has a curved surface is joined, and the bonded substrate 4' can be formed by bending the curved substrate 1'. Group 5'.

在分離步驟中,在大氣壓氣氛中,藉由貫穿構件20'(刀尖23')等對貼合基板組5'中的貼合基板4'、4"的密封件3'、3"的至少一部份分別進行剪切等來除掉,並且從此處向比密封件3'、3"更靠內側之真空空間S'、S"放入流體而實現大氣開放。藉此,能夠輕鬆地製造以曲面狀彎曲之層疊體6。 In the separation step, in the atmospheric pressure atmosphere, at least the sealing members 3', 3" of the bonding substrates 4', 4" in the bonded substrate group 5' are bonded by the penetrating member 20' (the blade tip 23') or the like. A part is separately cut and the like to be removed, and from here, the fluid is opened by putting a fluid into the vacuum spaces S', S" on the inner side of the seals 3', 3". Thereby, the laminated body 6 curved in the curved shape can be easily manufactured.

並且,作為其他例子雖未圖示,但亦能夠不在支持基板2'、2"形成階差部2a'、2a"或抵接面2b'、2b",而將密封件3'、3"配置成邊框狀。 Further, although not shown in the drawings, the sealing members 3' and 3" may be disposed without forming the step portions 2a' and 2a" or the abutting surfaces 2b' and 2b" on the support substrates 2' and 2". Framed.

1‧‧‧薄板基板 1‧‧‧thin plate substrate

1a、1a'、1a"‧‧‧外表面 1a, 1a', 1a"‧‧‧ outer surface

1b、1b'、1b"‧‧‧內表面 1b, 1b', 1b"‧‧‧ inner surface

2‧‧‧支持基板 2‧‧‧Support substrate

2a‧‧‧階差部 2a‧‧‧Steps Department

2b‧‧‧抵接面 2b‧‧‧Abutment

2c‧‧‧凹凸部(凸部) 2c‧‧‧dose (convex)

2d‧‧‧凹凸部(凹部) 2d‧‧‧ concave and convex (concave)

3‧‧‧密封件 3‧‧‧Seal

3(3b)‧‧‧密封件(裂縫) 3(3b)‧‧‧Seal (crack)

3a‧‧‧通孔 3a‧‧‧through hole

4‧‧‧貼合基板 4‧‧‧Finished substrate

12‧‧‧保持板 12‧‧‧ Keeping board

20(21)‧‧‧貫穿構件(刀尖) 20(21)‧‧‧through members (knife tips)

S‧‧‧真空空間 S‧‧‧vacuum space

Claims (5)

一種貼合分離方法,其特徵在於:在薄板基板與加強用之支持基板貼合之狀態下,進行特定處理,於該處理結束之後,將上述薄板基板與上述支持基板分離;且包括:重合步驟,於真空氣氛中,將上述薄板基板與上述支持基板以邊框狀之密封件夾在其間之方式進行接合而形成貼合基板;及分離步驟,於大氣壓氣氛中,除掉上述貼合基板之上述密封件之至少一部份,並且向形成於上述密封件之內側之真空空間放入流體而實現大氣開放;於上述分離步驟中,在上述密封件之至少一部份插入貫穿構件而開設通孔,並且自上述通孔向上述真空空間導入大氣壓流體而使其大氣開放。 A method for laminating and separating, characterized in that a specific process is performed in a state where a thin plate substrate is bonded to a support substrate for reinforcement, and after the end of the process, the thin plate substrate is separated from the support substrate; and the step of superposing comprises And bonding the thin plate substrate and the support substrate with a frame-shaped seal therebetween to form a bonded substrate in a vacuum atmosphere; and separating step of removing the bonded substrate in an atmospheric pressure atmosphere At least a part of the sealing member, and inserting a fluid into the vacuum space formed inside the sealing member to open the atmosphere; in the separating step, inserting the through member at at least a portion of the sealing member to open the through hole And introducing an atmospheric pressure fluid into the vacuum space from the through hole to open the atmosphere. 如請求項1之貼合分離方法,其對形成於上述支持基板之外周部份之邊框狀且凹狀的階差部配置上述密封件。 In the bonding and separating method of claim 1, the sealing member is disposed on a frame-shaped and concave step portion formed on the outer peripheral portion of the support substrate. 如請求項2之貼合分離方法,其在上述支持基板中除上述階差部以外之抵接面和與其對向之上述薄板基板之內表面中央部之間,以特定密度形成微細之凹凸部。 The bonding method according to claim 2, wherein a fine uneven portion is formed at a specific density between the abutting surface other than the step portion and the central portion of the inner surface of the thin plate substrate opposite to the supporting substrate. . 如請求項1、2或3之貼合分離方法,其中上述密封件由可被溶解液溶解之黏著材料構成,於上述分離步驟中,將上述貼合基板之上述密封件之至少一部份浸漬於上述溶解液中,從而於上述溶解液中使上述真空空間大氣開放。 The method of claim 1, 2 or 3, wherein the sealing member is made of an adhesive material that is soluble in a solution, and in the separating step, at least a portion of the sealing member of the bonded substrate is impregnated In the above-mentioned solution, the vacuum space is opened in the above-mentioned solution. 一種分離裝置,其特徵在於:對於在真空氣氛中薄板基板與加強用之支持基板夾住邊框狀之密封件接合而成之貼合基板,於大氣壓氣氛中將上述薄板基板與上述支持基板分離;且具備: 貫穿構件,其係設置成與上述貼合基板之上述密封件對向且相對移動自如;上述貫穿構件係構成為,具有被插入至上述密封件之至少一部份之刀尖,並且隨著上述刀尖相對於上述貼合基板之相對移動,於上述密封件之至少一部份開設通孔,並且自上述通孔向形成於上述密封件的內側之真空空間導入大氣壓流體而使其大氣開放。 A separating apparatus for separating a thin plate substrate from the support substrate in an atmospheric pressure atmosphere in a bonded substrate in which a seal member is sandwiched between a thin plate substrate and a reinforcing support substrate in a vacuum atmosphere; And has: a penetrating member disposed to face and move relative to the sealing member of the bonding substrate; the through member is configured to have a blade tip inserted into at least a portion of the sealing member, and A through hole is formed in at least a portion of the sealing member with respect to the relative movement of the blade edge, and an atmospheric pressure fluid is introduced into the vacuum space formed inside the sealing member from the through hole to open the atmosphere.
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