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TW201425863A - Curvature measurement system and method thereof - Google Patents

Curvature measurement system and method thereof Download PDF

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Publication number
TW201425863A
TW201425863A TW101149023A TW101149023A TW201425863A TW 201425863 A TW201425863 A TW 201425863A TW 101149023 A TW101149023 A TW 101149023A TW 101149023 A TW101149023 A TW 101149023A TW 201425863 A TW201425863 A TW 201425863A
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Taiwan
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curvature
incident
reflected
detecting
light
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TW101149023A
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Chinese (zh)
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Chia-Liang Yeh
Chih-Jung Chiang
Fu-Cheng Yang
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Ind Tech Res Inst
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Publication of TW201425863A publication Critical patent/TW201425863A/en

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Abstract

A curvature measurement method adapted to get the curvature of a sample, includes: generating a first incident light beam and a second incident light beam and emitting those beams to the surface of the sample to form a first reflected light beam and a second reflected light beam; amplifying the first reflected light beam and the second reflected light beam to form a first testing light beam and a second testing light beam; and getting the first testing light beam and the second testing light beam to derive the curvature based on the measured light-spot offset of the incident light beams.

Description

曲率量測系統及其方法 Curvature measurement system and method thereof

一種曲率量測系統及其方法,尤指一種量測樣品曲率的方法與系統。 A curvature measuring system and method thereof, in particular, a method and system for measuring the curvature of a sample.

現有的曲率量測方式,其係將一雷射光通過一可旋轉的鏡片、一分光鏡與一聚焦透鏡,而形成一平行光束,再藉由一反射鏡打在一樣品上。 The existing curvature measurement method is to pass a laser beam through a rotatable lens, a beam splitter and a focusing lens to form a parallel beam, and then hit a sample by a mirror.

若樣品具有一曲率,該曲率將使反射光偏移,反射光回到分光鏡,再反射至一電荷耦合元件(Charge-coupled Device,CCD),並旋轉該鏡片以掃描樣品的曲率。 If the sample has a curvature that will shift the reflected light, the reflected light returns to the beam splitter, is reflected back to a Charge-coupled Device (CCD), and the lens is rotated to scan the curvature of the sample.

上述之雷射掃描方式,雖可量測樣品的曲率,但量測時需不斷調整各鏡片的角度,而曲率的解析度係與掃描的點數有關,掃描位置太多則耗費時間,掃描位置太少則解析度不足,故現有的曲率量測方式仍有改善的空間。 The above-mentioned laser scanning method can measure the curvature of the sample, but the angle of each lens needs to be constantly adjusted during the measurement, and the resolution of the curvature is related to the number of points scanned, and the scanning position is too much, which takes time and scan position. Too small, the resolution is insufficient, so there is still room for improvement in the existing curvature measurement method.

於一實施例,本揭露之技術手段在於提供一種曲率量測方法,其包括:產生一第一入射光束與一第二入射光束,並投射至該樣品,以形成一第一反射光束與一第二反射光束;放大該第一反射光束與該第二反射光束,以形成一第一檢測光束與一第二檢測光束;以及擷取該第一檢測光束與該第二檢測光束,以得出該些入射光束之一光點偏移 量,並計算出一曲率。 In one embodiment, the technical method of the present disclosure is to provide a curvature measuring method, including: generating a first incident beam and a second incident beam, and projecting to the sample to form a first reflected beam and a first a second reflected beam; amplifying the first reflected beam and the second reflected beam to form a first detection beam and a second detection beam; and extracting the first detection beam and the second detection beam to obtain the One of the incident beams Quantity and calculate a curvature.

於一實施例,本揭露提供一種曲率量測系統,其包含有:一光源;一分光鏡;一角度放大單元;一影像擷取模組;以及一分析單元;其中,該光源係產生一第一入射光束與一第二入射光束,該分光鏡係設於該第一入射光束與該第二入射光束之路徑,並形成一第一反射光束與一第二反射光束,該角度放大單元係設於該第一反射光束與該第二反射光束之路徑,並形成一第一檢測光束與一第二檢測光束,該影像擷取模組係設於第一檢測光束與第二檢測光束之路徑,以擷取該第一檢測光束與該第二檢測光束,並傳送一訊號予該分析單元以計算出一曲率。 In one embodiment, the present disclosure provides a curvature measurement system including: a light source; a beam splitter; an angle magnifying unit; an image capturing module; and an analyzing unit; wherein the light source generates a An incident beam and a second incident beam, the beam splitter is disposed on the path of the first incident beam and the second incident beam, and forms a first reflected beam and a second reflected beam, and the angle amplifying unit is configured a path of the first reflected beam and the second reflected beam, and forming a first detecting beam and a second detecting beam, wherein the image capturing module is disposed on a path of the first detecting beam and the second detecting beam, The first detection beam and the second detection beam are captured, and a signal is transmitted to the analysis unit to calculate a curvature.

以下係藉由特定的具體實施例說明本揭露之實施方式,所屬技術領域中具有通常知識者可由本說明書所揭示之內容,輕易地瞭解本揭露。 The embodiments of the present disclosure are described below by way of specific embodiments, and those skilled in the art can easily understand the disclosure by the contents disclosed in the specification.

請配合參考圖1所示,本揭露係一種曲率量測系統之第一實施例,其具有一光源10、一分光鏡11、一角度放大單元12、一影像擷取模組13與一分析單元14。 Referring to FIG. 1 , the disclosure is a first embodiment of a curvature measuring system, which has a light source 10 , a beam splitter 11 , an angle amplifying unit 12 , an image capturing module 13 and an analyzing unit . 14.

一光源10係產生一第一入射光束100與一第二入射光束101,光源10為一單波長光源或一雷射光源,第一入射光束100與第二入射光束101為二平行的光束,該光源10具有一波長,舉例,該波長為627至638nm,較佳為632.8nm,該光源10所產生的一光束係經過一入射45度角 之玻璃(未圖示),而產生第一入射光束100與第二入射光束101。 A light source 10 generates a first incident light beam 100 and a second incident light beam 101. The light source 10 is a single-wavelength light source or a laser light source. The first incident light beam 100 and the second incident light beam 101 are two parallel light beams. The light source 10 has a wavelength, for example, the wavelength is 627 to 638 nm, preferably 632.8 nm, and a light beam generated by the light source 10 passes through an incident angle of 45 degrees. The glass (not shown) produces a first incident beam 100 and a second incident beam 101.

分光鏡11係設於第一入射光束100與第二入射光束101的路徑,第一入射光束100與第二入射光束101係通過分光鏡11,並投射至一樣品15,以形成一第一反射光束102與一第二反射光束103,第一反射光束102與第二反射光束103係由該樣品15反射回分光鏡11。 The beam splitter 11 is disposed on the path of the first incident beam 100 and the second incident beam 101. The first incident beam 100 and the second incident beam 101 pass through the beam splitter 11 and are projected to a sample 15 to form a first reflection. The beam 102 and a second reflected beam 103, the first reflected beam 102 and the second reflected beam 103 are reflected by the sample 15 back to the beam splitter 11.

角度放大單元12係設於第一反射光束102與第二反射光束103之路徑,第一反射光束102與第二反射光束103係通過角度放大單元12,以形成一第一檢測光束104與一第二檢測光束105,角度放大單元12舉例為一三菱鏡。 The angle amplifying unit 12 is disposed on the path of the first reflected beam 102 and the second reflected beam 103. The first reflected beam 102 and the second reflected beam 103 pass through the angle amplifying unit 12 to form a first detecting beam 104 and a first The second detecting beam 105, the angle amplifying unit 12 is exemplified by a Mitsubishi mirror.

影像擷取模組13係設於第一檢測光束104與第二檢測光束105之路徑,擷取第一檢測光束104與第二檢測光束105以產生一訊號。 The image capturing module 13 is disposed on the path of the first detecting beam 104 and the second detecting beam 105, and takes the first detecting beam 104 and the second detecting beam 105 to generate a signal.

分析單元14係電性耦接影像擷取模組13,接收來自影像擷取模組13之一訊號以計算出一曲率。 The analyzing unit 14 is electrically coupled to the image capturing module 13 and receives a signal from the image capturing module 13 to calculate a curvature.

請配合參考圖2所示,本揭露曲率量測系統之第二實施例,其具有一光源20、一分光鏡21、一凹透鏡23、一反射鏡24、一影像擷取模組25與一分析單元26。 Referring to FIG. 2, a second embodiment of the present invention provides a light source 20, a beam splitter 21, a concave lens 23, a mirror 24, an image capturing module 25, and an analysis. Unit 26.

光源20係產生一第一入射光束200與一第二入射光束201,第一入射光束200與第二入射光束201為二平行的光束,光源20之波長與種類可等同於光源10。 The light source 20 generates a first incident beam 200 and a second incident beam 201. The first incident beam 200 and the second incident beam 201 are two parallel beams. The wavelength and type of the source 20 can be equal to the source 10.

分光鏡21係設於第一入射光束200與第二入射光束201之路徑上,二光束200,201通過分光鏡21後,投射至樣品22,以形成一第一反射光束202與一第二反射光束 203,第一反射光束202與第二反射光束203係由該樣品22反射回分光鏡21,該樣品22舉例為晶圓或玻璃。 The beam splitter 21 is disposed on the path of the first incident beam 200 and the second incident beam 201. The two beams 200, 201 pass through the beam splitter 21 and are projected to the sample 22 to form a first reflected beam 202 and a second reflected beam. 203. The first reflected beam 202 and the second reflected beam 203 are reflected by the sample 22 back to the beam splitter 21, and the sample 22 is exemplified by a wafer or a glass.

凹透鏡23係設於第一反射光束202與第二反射光束203之路徑,通過凹透鏡23之第一反射光束202與第二反射光束203,形成一第一發散光束204與一第二發散光束205。 The concave lens 23 is disposed on the path of the first reflected light beam 202 and the second reflected light beam 203, and passes through the first reflected light beam 202 and the second reflected light beam 203 of the concave lens 23 to form a first divergent light beam 204 and a second divergent light beam 205.

反射鏡24係設於第一發散光束204與第二發散光束205之路徑,第一發散光束204與第二發散光束205經過反射鏡24反射,以形成一第一檢測光束206與一第二檢測光束207。 The mirror 24 is disposed on the path of the first divergent beam 204 and the second divergent beam 205. The first divergent beam 204 and the second divergent beam 205 are reflected by the mirror 24 to form a first detection beam 206 and a second detection. Light beam 207.

影像擷取模組25係設於第一檢測光束206與第二檢測光束207之路徑,以擷取第一檢測光束206與第二檢測光束207,並產生一訊號。 The image capturing module 25 is disposed on the path of the first detecting beam 206 and the second detecting beam 207 to capture the first detecting beam 206 and the second detecting beam 207 and generate a signal.

分析單元26係電性耦接影像擷取模組25,接收該訊號以計算出一曲率。 The analyzing unit 26 is electrically coupled to the image capturing module 25 and receives the signal to calculate a curvature.

請配合參考圖3所示,本揭露曲率量測系統之第三實施例,於本實施例中,元件係沿用上述之第二實施例,僅將上述之凹透鏡23變更為凸透鏡27。 Referring to FIG. 3, a third embodiment of the present invention discloses a third embodiment of the curvature measuring system. In the present embodiment, the second embodiment of the present invention is used to change only the concave lens 23 described above to the convex lens 27.

如圖3所示,凸透鏡27係設於第一反射光束202與第二反射光束203之路徑,通過凸透鏡27之第一反射光束202與第二反射光束203,形成一第一聚焦光束270與一第二聚焦光束271。 As shown in FIG. 3, the convex lens 27 is disposed on the path of the first reflected light beam 202 and the second reflected light beam 203, and passes through the first reflected light beam 202 and the second reflected light beam 203 of the convex lens 27 to form a first focused light beam 270 and a The second focused beam 271.

反射鏡24係設於第一聚焦光束270與第二聚焦光束271之路徑,第一聚焦光束270與第二聚焦光束271經過反射鏡24反射,以形成一第一檢測光束206與一第二檢測 光束207。 The mirror 24 is disposed on the path of the first focused beam 270 and the second focused beam 271, and the first focused beam 270 and the second focused beam 271 are reflected by the mirror 24 to form a first detection beam 206 and a second detection. Light beam 207.

此外,本揭露係一種曲率量測方法,其包含有:請再配合參考圖1所示,一第一入射光束100與一第二入射光束101係由一光源10所產生,並通過一分光鏡11,以投射於一樣品15,第一反射光束102與第二反射光束103係由該樣品15反射回分光鏡11,其中,該光源10所產生的一光束係經過一入射45度角之玻璃,而產生第一入射光束100與第二入射光束101,舉例該樣品15為晶圓或玻璃。 In addition, the present disclosure is a curvature measuring method, which includes: together with reference to FIG. 1, a first incident beam 100 and a second incident beam 101 are generated by a light source 10 and passed through a beam splitter. 11. Projected on a sample 15, the first reflected light beam 102 and the second reflected light beam 103 are reflected by the sample 15 back to the beam splitter 11 , wherein a light beam generated by the light source 10 passes through a glass incident at a 45 degree angle. The first incident beam 100 and the second incident beam 101 are generated. For example, the sample 15 is a wafer or a glass.

若為上述之第一實施例,如圖1所示,第一反射光束102與第二反射光束103係通過角度放大單元12,以形成一第一檢測光束104與一第二檢測光束105。 In the first embodiment described above, as shown in FIG. 1, the first reflected beam 102 and the second reflected beam 103 pass through the angle amplifying unit 12 to form a first detecting beam 104 and a second detecting beam 105.

第一檢測光束104與第二檢測光束105係被一影像擷取模組13所擷取,並將所擷取的訊號轉換後,傳送至一分析單元14。 The first detecting beam 104 and the second detecting beam 105 are captured by an image capturing module 13 , and the captured signals are converted and transmitted to an analyzing unit 14 .

若為上述之第二實施例,如圖2所示,通過凹透鏡23之第一反射光束202與第二反射光束203,形成一第一發散光束204與一第二發散光束205,其中,該凹透鏡23係舉例為一透鏡,該第一發散光束204係能夠視為一第一光束,第二發散光束205係能夠視為一第二光束。 In the second embodiment described above, as shown in FIG. 2, a first divergent beam 204 and a second divergent beam 205 are formed by the first reflected beam 202 and the second reflected beam 203 of the concave lens 23, wherein the concave lens The 23 series is exemplified by a lens, the first divergent beam 204 can be regarded as a first beam, and the second divergent beam 205 can be regarded as a second beam.

第一發散光束204與第二發散光束205經過反射鏡24反射,以形成一第一檢測光束206與一第二檢測光束207。 The first divergent beam 204 and the second divergent beam 205 are reflected by the mirror 24 to form a first detection beam 206 and a second detection beam 207.

第一檢測光束206與第二檢測光束207係被一影像擷取模組25所擷取,並將所擷取的訊號傳送至一分析單元26。 The first detecting beam 206 and the second detecting beam 207 are captured by an image capturing module 25, and the captured signals are transmitted to an analyzing unit 26.

若為上述之第三實施例,如圖3所示,通過凸透鏡27之第一反射光束202與第二反射光束203,形成一第一聚焦光束270與一第二聚焦光束271,其中,該凸透鏡舉例為一透鏡,該第一聚焦光束270係能夠視為一第一光束,該第二聚焦光束271係能夠視為一第二光束。 In the third embodiment, as shown in FIG. 3, a first focused beam 270 and a second focused beam 271 are formed by the first reflected beam 202 and the second reflected beam 203 of the convex lens 27, wherein the convex lens For example, a lens, the first focused beam 270 can be regarded as a first beam, and the second focused beam 271 can be regarded as a second beam.

第一聚焦光束270與第二聚焦光束271經過一反射鏡24反射,以形成一第一檢測光束206與一第二檢測光束207,其係被影像擷取模組25所擷取,並將所擷取的訊號轉換後,傳送至分析單元26以求出一曲率。 The first focused beam 270 and the second focused beam 271 are reflected by a mirror 24 to form a first detection beam 206 and a second detection beam 207, which are captured by the image capturing module 25, and After the captured signal is converted, it is sent to the analyzing unit 26 to find a curvature.

承上所述,以圖1為例,若樣品15具有一曲率(舉例由應變所引起之彎曲),當第一入射光束100與第二入射光束101投射至樣品15之後,光束的光點(舉例為質心或形心)會有偏移的情況,故會產生有一光點偏移量,故第一檢測光束104與第二檢測光束105將產生偏移的情況。 As described above, taking FIG. 1 as an example, if the sample 15 has a curvature (for example, a curve caused by strain), when the first incident beam 100 and the second incident beam 101 are projected to the sample 15, the spot of the beam ( For example, the centroid or the centroid may be offset, so that a spot offset is generated, so that the first detecting beam 104 and the second detecting beam 105 will be offset.

分析單元14係藉由雙入射光束於量測曲率所產生的光點偏移量,與曲率為零時之間距的比值,以及影像擷取模組13與樣品15之間的距離,而求出曲率R,該曲率R的公式如下: The analyzing unit 14 is obtained by using a double incident beam to measure the curvature, and the ratio of the distance between the curvature and the curvature is zero, and the distance between the image capturing module 13 and the sample 15 is obtained. The curvature R, the formula of the curvature R is as follows:

其中,L為樣品15與影像擷取模組13之間的距離,ψ為樣品15表面與入射光束100、101之夾角,δ d為所量測到的光點偏移量,d為曲率為零時之二光束光點之間距。 Where L is the distance between the sample 15 and the image capturing module 13, ψ is the angle between the surface of the sample 15 and the incident light beams 100, 101, δ d is the measured spot offset, and d is the curvature The distance between the two light beam spots.

綜合上述,如上述之第一實施例,本揭露係利用一角度放大單元於一有限的距離,使用光學方法放大該光點偏移量與該曲率為零時之間距的比值,故可將最小的曲率量測值與解析度提升,而量測一樣品的曲率,如晶圓、玻璃等。 In summary, as described above, the first embodiment of the present invention utilizes an angle amplifying unit to enlarge the ratio of the distance between the spot offset and the curvature to zero at a limited distance, so that the minimum value can be minimized. The curvature measurement and resolution are improved, and the curvature of a sample, such as wafer, glass, etc., is measured.

同上,如上述之第二實施例與第三實施例,本揭露係利用一透鏡,如凹透鏡或凸透鏡,以改變檢測光束的發散或聚焦,而於有限的距離使用光學方法量測一樣品的曲率。 As above, as in the second embodiment and the third embodiment described above, the present disclosure utilizes a lens such as a concave lens or a convex lens to change the divergence or focus of the detection beam, and optically measures the curvature of a sample at a limited distance. .

惟以上所述之具體實施例,僅係用於例釋本揭露,而非用於限定本揭露之可實施範疇,於未脫離本揭露上揭之精神與技術範疇下,任何運用本揭露所揭示內容而完成之等效改變及修飾,均仍應為下述之申請專利範圍所涵蓋。 However, the specific embodiments described above are only used to illustrate the disclosure, and are not intended to limit the scope of the disclosure, and may be disclosed without departing from the spirit and scope of the disclosure. Equivalent changes and modifications to the content are still covered by the scope of the patent application below.

10‧‧‧光源 10‧‧‧Light source

100‧‧‧第一入射光束 100‧‧‧First incident beam

101‧‧‧第二入射光束 101‧‧‧second incident beam

102‧‧‧第一反射光束 102‧‧‧First reflected beam

103‧‧‧第二反射光束 103‧‧‧second reflected beam

104‧‧‧第一檢測光束 104‧‧‧First detection beam

105‧‧‧第二檢測光束 105‧‧‧Second detection beam

11‧‧‧分光鏡 11‧‧‧beam splitter

12‧‧‧角度放大單元 12‧‧‧Angle magnification unit

13‧‧‧影像擷取模組 13‧‧‧Image capture module

14‧‧‧分析單元 14‧‧‧Analysis unit

15‧‧‧樣品 15‧‧‧ samples

20‧‧‧光源 20‧‧‧Light source

200‧‧‧第一入射光束 200‧‧‧First incident beam

201‧‧‧第二入射光束 201‧‧‧second incident beam

202‧‧‧第一反射光束 202‧‧‧First reflected beam

203‧‧‧第二反射光束 203‧‧‧second reflected beam

204‧‧‧第一發散光束 204‧‧‧First divergent beam

205‧‧‧第二發散光束 205‧‧‧Second divergent beam

206‧‧‧第一檢測光束 206‧‧‧First detection beam

207‧‧‧第二檢測光束 207‧‧‧second detection beam

21‧‧‧分光鏡 21‧‧‧beam splitter

22‧‧‧樣品 22‧‧‧ samples

23‧‧‧凹透鏡 23‧‧‧ concave lens

24‧‧‧反射鏡 24‧‧‧Mirror

25‧‧‧影像擷取模組 25‧‧‧Image capture module

26‧‧‧分析單元 26‧‧‧Analysis unit

27‧‧‧凸透鏡 27‧‧‧ convex lens

270‧‧‧第一聚焦光束 270‧‧‧First focused beam

271‧‧‧第二聚焦光束 271‧‧‧second focused beam

圖1為本揭露之一種曲率量測系統之第一實施例之示意圖。 1 is a schematic view of a first embodiment of a curvature measuring system according to the present disclosure.

圖2為本揭露之曲率量測系統之第二實施例之示意圖。 2 is a schematic view of a second embodiment of the curvature measuring system of the present disclosure.

圖3為本揭露之曲率量測系統之第三實施例之示意圖。 3 is a schematic view of a third embodiment of a curvature measuring system according to the present disclosure.

10‧‧‧光源 10‧‧‧Light source

100‧‧‧第一入射光束 100‧‧‧First incident beam

101‧‧‧第二入射光束 101‧‧‧second incident beam

102‧‧‧第一反射光束 102‧‧‧First reflected beam

103‧‧‧第二反射光束 103‧‧‧second reflected beam

104‧‧‧第一檢測光束 104‧‧‧First detection beam

105‧‧‧第二檢測光束 105‧‧‧Second detection beam

11‧‧‧分光鏡 11‧‧‧beam splitter

12‧‧‧角度放大單元 12‧‧‧Angle magnification unit

13‧‧‧影像擷取模組 13‧‧‧Image capture module

14‧‧‧分析單元 14‧‧‧Analysis unit

15‧‧‧樣品 15‧‧‧ samples

Claims (27)

一種曲率量測方法,以量測一樣品之曲率,其包括:產生一第一入射光束與一第二入射光束,並投射至該樣品,以形成一第一反射光束與一第二反射光束;放大該第一反射光束與該第二反射光束,以形成一第一檢測光束與一第二檢測光束;以及擷取該第一檢測光束與該第二檢測光束,以得出該些入射光束之一光點偏移量,並計算出一曲率。 A curvature measuring method for measuring a curvature of a sample, comprising: generating a first incident beam and a second incident beam, and projecting to the sample to form a first reflected beam and a second reflected beam; Amplifying the first reflected beam and the second reflected beam to form a first detection beam and a second detection beam; and extracting the first detection beam and the second detection beam to obtain the incident beam A spot offset and a curvature is calculated. 如申請專利範圍第1項所述之曲率量測方法,其中該第一入射光束與該第二入射光束係由一光源所產生。 The method of measuring curvature according to claim 1, wherein the first incident beam and the second incident beam are generated by a light source. 如申請專利範圍第2項所述之曲率量測方法,其中該光源具有一波長。 The curvature measuring method of claim 2, wherein the light source has a wavelength. 如申請專利範圍第3項所述之曲率量測方法,其中該波長為627nm至638nm。 The method of measuring curvature according to claim 3, wherein the wavelength is from 627 nm to 638 nm. 如申請專利範圍第2項所述之曲率量測方法,其中該光源係產生一光束,該光束經過一玻璃,以產生該第一入射光束與該第二入射光束。 The curvature measuring method of claim 2, wherein the light source generates a light beam that passes through a glass to generate the first incident light beam and the second incident light beam. 如申請專利範圍第5項所述之曲率量測方法,其中該玻璃為一入射45度角之玻璃。 The method of measuring curvature according to claim 5, wherein the glass is a glass incident at a 45 degree angle. 如申請專利範圍第1項所述之曲率量測方法,其中該第一入射光束與該第二入射光束為二平行光束。 The curvature measuring method of claim 1, wherein the first incident beam and the second incident beam are two parallel beams. 如申請專利範圍第1項所述之曲率量測方法,其中該第一反射光束與該第二反射光束係由一角度放大單元,以形成該第一檢測光束與該第二檢測光束。 The curvature measuring method according to claim 1, wherein the first reflected beam and the second reflected beam are caused by an angle amplifying unit to form the first detecting beam and the second detecting beam. 如申請專利範圍第1項所述之曲率量測方法,其中放 大該第一反射光束與該第二反射光束係由一凹透鏡與一反射鏡,以形成該第一檢測光束與該第二檢測光束。 For example, the method for measuring curvature according to claim 1 of the patent application scope The first reflected beam and the second reflected beam are separated by a concave lens and a mirror to form the first detection beam and the second detection beam. 如申請專利範圍第1項所述之曲率量測方法,其中放大該第一反射光束與該第二反射光束係由一凸透鏡與一反射鏡,以形成該第一檢測光束與該第二檢測光束。 The curvature measuring method of claim 1, wherein the first reflected beam and the second reflected beam are enlarged by a convex lens and a mirror to form the first detecting beam and the second detecting beam. . 如申請專利範圍第1項所述之曲率量測方法,其中係以一影像擷取模組擷取該第一檢測光束與該第二檢測光束,並傳送一訊號予一分析單元計算該曲率。 The curvature measuring method according to claim 1, wherein the first detecting beam and the second detecting beam are captured by an image capturing module, and a signal is transmitted to an analyzing unit to calculate the curvature. 如申請專利範圍第11項所述之曲率量測方法,其中該曲率R為: L為該樣品與該影像擷取模組之間的距離,ψ為該樣品與該些入射光束之夾角,δ d為所量測到的光點偏移量,d為曲率為零時之二該入射光束光點之間距。 The curvature measuring method according to claim 11, wherein the curvature R is: L is the distance between the sample and the image capturing module, where ψ is the angle between the sample and the incident beams, δ d is the measured spot offset, and d is the curvature zero. The distance between the incident beam spots. 一種曲率量測系統,以量測一樣品之曲率,其包括:一光源;一分光鏡;一角度放大單元;一影像擷取模組;以及一分析單元;其中,該光源係產生一第一入射光束與一第二入射光束,該分光鏡係設於該第一入射光束與該第二入射光束之路徑,並形成一第一反射光束與一第二反射 光束,該角度放大單元係設於該第一反射光束與該第二反射光束之路徑,並形成一第一檢測光束與一第二檢測光束,該影像擷取模組係設於第一檢測光束與第二檢測光束之路徑,以擷取該第一檢測光束與該第二檢測光束,並傳送一訊號予該分析單元以計算出一曲率。 A curvature measuring system for measuring a curvature of a sample, comprising: a light source; a beam splitter; an angle magnifying unit; an image capturing module; and an analyzing unit; wherein the light source generates a first An incident beam and a second incident beam, the beam splitter is disposed on the path of the first incident beam and the second incident beam, and forms a first reflected beam and a second reflection a beam, the angle amplifying unit is disposed on the path of the first reflected beam and the second reflected beam, and forms a first detecting beam and a second detecting beam, wherein the image capturing module is disposed on the first detecting beam And a path of the second detecting beam to capture the first detecting beam and the second detecting beam, and transmitting a signal to the analyzing unit to calculate a curvature. 如申請專利範圍第13項所述之曲率量測系統,其中再包括一玻璃,該玻璃係設於該光源所產生一光束之路徑,以形該第一入射光束與該第二入射光束。 The curvature measuring system of claim 13, further comprising a glass disposed on a path of a light beam generated by the light source to shape the first incident light beam and the second incident light beam. 如申請專利範圍第14項所述之曲率量測系統,其中該玻璃為一入射45度角之玻璃。 The curvature measuring system of claim 14, wherein the glass is a glass incident at a 45 degree angle. 如申請專利範圍第13項所述之曲率量測系統,其中該光源具有一波長。 The curvature measuring system of claim 13, wherein the light source has a wavelength. 如申請專利範圍第16項所述之曲率量測系統,其中該波長為627至638nm。 A curvature measuring system according to claim 16, wherein the wavelength is 627 to 638 nm. 如申請專利範圍第13項所述之曲率量測系統,其中該第一入射光束與該第二入射光束為二平行光束。 The curvature measuring system of claim 13, wherein the first incident beam and the second incident beam are two parallel beams. 如申請專利範圍第13項所述之曲率量測系統,其中該角度放大單元為一三菱鏡。 The curvature measuring system of claim 13, wherein the angle amplifying unit is a Mitsubishi mirror. 一種曲率量測系統,以量測一樣品之曲率,其包括:一光源;一分光鏡;一透鏡;一反射鏡;一影像擷取模組;以及 一分析單元;其中,該光源係產生一第一入射光束與一第二入射光束,該分光鏡係設於該第一入射光束與該第二入射光束之路徑,以形成一第一反射光束與一第二反射光束,該透鏡係設於該第一反射光束與該第二反射光束之路徑,以形成一第一光束與一第二光束,該反射鏡係設於該第一光束與該第二光束之路徑,以形成一第一檢測光束與一第二檢測光束,該影像擷取模組係設於該第一檢測光束與該第二檢測光束之路徑,以擷取該第一檢測光束與該第二檢測光束,並傳送一訊號予該分析單元以計算出一曲率。。 A curvature measuring system for measuring a curvature of a sample, comprising: a light source; a beam splitter; a lens; a mirror; an image capturing module; An analysis unit, wherein the light source generates a first incident beam and a second incident beam, and the beam splitter is disposed on a path of the first incident beam and the second incident beam to form a first reflected beam and a second reflected light beam, the lens is disposed on the path of the first reflected light beam and the second reflected light beam to form a first light beam and a second light beam, wherein the mirror is disposed on the first light beam and the first light beam a path of the two beams to form a first detecting beam and a second detecting beam, wherein the image capturing module is disposed on the path of the first detecting beam and the second detecting beam to capture the first detecting beam And the second detecting beam, and transmitting a signal to the analyzing unit to calculate a curvature. . 如申請專利範圍第20項所述之曲率量測系統,其中該透鏡為一凹透鏡,該第一光束為一第一發散光束,該第二光束為一第二發散光束。 The curvature measuring system of claim 20, wherein the lens is a concave lens, the first light beam is a first divergent light beam, and the second light beam is a second divergent light beam. 如申請專利範圍第20項所述之曲率量測系統,其中該透鏡為一凸透鏡,該第一光束為一第一聚焦光束,該第二光束為一第二聚焦光束。 The curvature measuring system of claim 20, wherein the lens is a convex lens, the first beam is a first focused beam, and the second beam is a second focused beam. 如申請專利範圍第20項所述之曲率量測系統,其中再包括一玻璃,該玻璃係設於該光源所產生一光束之路徑,以形該第一入射光束與該第二入射光束。 The curvature measuring system of claim 20, further comprising a glass disposed on a path of a light beam generated by the light source to shape the first incident light beam and the second incident light beam. 如申請專利範圍第23項所述之曲率量測系統,其中該玻璃為一入射45度角之玻璃。 The curvature measuring system of claim 23, wherein the glass is a glass incident at a 45 degree angle. 如申請專利範圍第20項所述之曲率量測系統,其中該光源具有一波長。 The curvature measuring system of claim 20, wherein the light source has a wavelength. 如申請專利範圍第25項所述之曲率量測系統,其中該 波長為627nm至638nm。 The curvature measuring system according to claim 25, wherein the The wavelength is from 627 nm to 638 nm. 如申請專利範圍第20項所述之曲率量測系統,其中該第一入射光束與該第二入射光束為二平行光束。 The curvature measuring system of claim 20, wherein the first incident beam and the second incident beam are two parallel beams.
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9523572B2 (en) 2014-12-12 2016-12-20 Industrial Technology Research Institute Thin-film curvature measurement apparatus and method thereof
TWI579524B (en) * 2015-12-29 2017-04-21 德律科技股份有限公司 Optical inspection apparatus
TWI632341B (en) * 2014-03-27 2018-08-11 紐富來科技股份有限公司 Curvature measureing device and curvature measuring method
CN110739246A (en) * 2019-09-03 2020-01-31 福建晶安光电有限公司 method for measuring warping degree of wafer

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI632341B (en) * 2014-03-27 2018-08-11 紐富來科技股份有限公司 Curvature measureing device and curvature measuring method
US9523572B2 (en) 2014-12-12 2016-12-20 Industrial Technology Research Institute Thin-film curvature measurement apparatus and method thereof
TWI579524B (en) * 2015-12-29 2017-04-21 德律科技股份有限公司 Optical inspection apparatus
US10600174B2 (en) 2015-12-29 2020-03-24 Test Research, Inc. Optical inspection apparatus
CN110739246A (en) * 2019-09-03 2020-01-31 福建晶安光电有限公司 method for measuring warping degree of wafer

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