TW201404822A - 無鹵素樹脂組合物及應用其之銅箔基板及印刷電路板 - Google Patents
無鹵素樹脂組合物及應用其之銅箔基板及印刷電路板 Download PDFInfo
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- TW201404822A TW201404822A TW102100223A TW102100223A TW201404822A TW 201404822 A TW201404822 A TW 201404822A TW 102100223 A TW102100223 A TW 102100223A TW 102100223 A TW102100223 A TW 102100223A TW 201404822 A TW201404822 A TW 201404822A
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- resin
- epoxy resin
- weight
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- bisphenol
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- 239000011342 resin composition Substances 0.000 title claims abstract description 63
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- 229910052802 copper Inorganic materials 0.000 title abstract description 7
- 239000010949 copper Substances 0.000 title abstract description 7
- 239000003822 epoxy resin Substances 0.000 claims abstract description 84
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 84
- 229920005989 resin Polymers 0.000 claims abstract description 80
- 239000011347 resin Substances 0.000 claims abstract description 80
- WOCGGVRGNIEDSZ-UHFFFAOYSA-N 4-[2-(4-hydroxy-3-prop-2-enylphenyl)propan-2-yl]-2-prop-2-enylphenol Chemical compound C=1C=C(O)C(CC=C)=CC=1C(C)(C)C1=CC=C(O)C(CC=C)=C1 WOCGGVRGNIEDSZ-UHFFFAOYSA-N 0.000 claims abstract description 28
- CMLFRMDBDNHMRA-UHFFFAOYSA-N 2h-1,2-benzoxazine Chemical compound C1=CC=C2C=CNOC2=C1 CMLFRMDBDNHMRA-UHFFFAOYSA-N 0.000 claims abstract description 25
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- 239000003795 chemical substances by application Substances 0.000 claims abstract 2
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- 239000011889 copper foil Substances 0.000 claims description 28
- 239000000758 substrate Substances 0.000 claims description 28
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 19
- 239000003063 flame retardant Substances 0.000 claims description 19
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- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 claims description 12
- 239000011256 inorganic filler Substances 0.000 claims description 11
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 11
- DWSWCPPGLRSPIT-UHFFFAOYSA-N benzo[c][2,1]benzoxaphosphinin-6-ium 6-oxide Chemical compound C1=CC=C2[P+](=O)OC3=CC=CC=C3C2=C1 DWSWCPPGLRSPIT-UHFFFAOYSA-N 0.000 claims description 9
- 239000005011 phenolic resin Substances 0.000 claims description 9
- DXZMANYCMVCPIM-UHFFFAOYSA-L zinc;diethylphosphinate Chemical compound [Zn+2].CCP([O-])(=O)CC.CCP([O-])(=O)CC DXZMANYCMVCPIM-UHFFFAOYSA-L 0.000 claims description 9
- PXKLMJQFEQBVLD-UHFFFAOYSA-N Bisphenol F Natural products C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 claims description 8
- 239000004843 novolac epoxy resin Substances 0.000 claims description 8
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 claims description 8
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- 229930185605 Bisphenol Natural products 0.000 claims description 6
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims description 6
- 239000007822 coupling agent Substances 0.000 claims description 6
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- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 5
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 claims description 5
- 239000011574 phosphorus Substances 0.000 claims description 5
- 229910052698 phosphorus Inorganic materials 0.000 claims description 5
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 claims description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 4
- 239000012948 isocyanate Substances 0.000 claims description 4
- AHNZVFVNAQKFBB-UHFFFAOYSA-N n-amino-n-(n-aminoanilino)aniline Chemical compound C=1C=CC=CC=1N(N)N(N)C1=CC=CC=C1 AHNZVFVNAQKFBB-UHFFFAOYSA-N 0.000 claims description 4
- KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 claims description 4
- BSYJHYLAMMJNRC-UHFFFAOYSA-N 2,4,4-trimethylpentan-2-ol Chemical compound CC(C)(C)CC(C)(C)O BSYJHYLAMMJNRC-UHFFFAOYSA-N 0.000 claims description 3
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 claims description 3
- 229910019142 PO4 Inorganic materials 0.000 claims description 3
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- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 claims description 2
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- 229920000877 Melamine resin Polymers 0.000 claims description 2
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- 229920001276 ammonium polyphosphate Polymers 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- UFZOLVFGAOAEHD-UHFFFAOYSA-N benzaldehyde;phenol Chemical compound OC1=CC=CC=C1.O=CC1=CC=CC=C1 UFZOLVFGAOAEHD-UHFFFAOYSA-N 0.000 claims description 2
- 239000004841 bisphenol A epoxy resin Substances 0.000 claims description 2
- 239000004842 bisphenol F epoxy resin Substances 0.000 claims description 2
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 claims description 2
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 claims description 2
- ZQKXQUJXLSSJCH-UHFFFAOYSA-N melamine cyanurate Chemical compound NC1=NC(N)=NC(N)=N1.O=C1NC(=O)NC(=O)N1 ZQKXQUJXLSSJCH-UHFFFAOYSA-N 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
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- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 2
- 229920000768 polyamine Polymers 0.000 claims description 2
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- 229920001955 polyphenylene ether Polymers 0.000 claims description 2
- 239000001205 polyphosphate Substances 0.000 claims description 2
- 235000011176 polyphosphates Nutrition 0.000 claims description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims 1
- ZYUVGYBAPZYKSA-UHFFFAOYSA-N 5-(3-hydroxybutan-2-yl)-4-methylbenzene-1,3-diol Chemical compound CC(O)C(C)C1=CC(O)=CC(O)=C1C ZYUVGYBAPZYKSA-UHFFFAOYSA-N 0.000 claims 1
- FMMWHPNWAFZXNH-UHFFFAOYSA-N Benz[a]pyrene Chemical compound C1=C2C3=CC=CC=C3C=C(C=C3)C2=C2C3=CC=CC2=C1 FMMWHPNWAFZXNH-UHFFFAOYSA-N 0.000 claims 1
- HTVITOHKHWFJKO-UHFFFAOYSA-N Bisphenol B Chemical compound C=1C=C(O)C=CC=1C(C)(CC)C1=CC=C(O)C=C1 HTVITOHKHWFJKO-UHFFFAOYSA-N 0.000 claims 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims 1
- PZBFGYYEXUXCOF-UHFFFAOYSA-N TCEP Chemical compound OC(=O)CCP(CCC(O)=O)CCC(O)=O PZBFGYYEXUXCOF-UHFFFAOYSA-N 0.000 claims 1
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- HJIDCURXVDBWEO-UHFFFAOYSA-N benzene;phosphoric acid Chemical compound OP(O)(O)=O.C1=CC=CC=C1 HJIDCURXVDBWEO-UHFFFAOYSA-N 0.000 claims 1
- GCKAMTHMSCXVIL-UHFFFAOYSA-N bis(2,3-dimethylphenyl) (3-hydroxyphenyl) phosphate Chemical compound P(=O)(OC1=C(C(=CC=C1)C)C)(OC1=C(C(=CC=C1)C)C)OC1=CC(O)=CC=C1 GCKAMTHMSCXVIL-UHFFFAOYSA-N 0.000 claims 1
- NHADDZMCASKINP-HTRCEHHLSA-N decarboxydihydrocitrinin Natural products C1=C(O)C(C)=C2[C@H](C)[C@@H](C)OCC2=C1O NHADDZMCASKINP-HTRCEHHLSA-N 0.000 claims 1
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- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
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- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
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- 239000011888 foil Substances 0.000 description 1
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
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- 239000008187 granular material Substances 0.000 description 1
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- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- ULYZAYCEDJDHCC-UHFFFAOYSA-N isopropyl chloride Chemical compound CC(C)Cl ULYZAYCEDJDHCC-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
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- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
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- 239000012046 mixed solvent Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- GKTNLYAAZKKMTQ-UHFFFAOYSA-N n-[bis(dimethylamino)phosphinimyl]-n-methylmethanamine Chemical compound CN(C)P(=N)(N(C)C)N(C)C GKTNLYAAZKKMTQ-UHFFFAOYSA-N 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 201000007614 neurodegeneration with brain iron accumulation 5 Diseases 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
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- 229910052697 platinum Inorganic materials 0.000 description 1
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- 229920006375 polyphtalamide Polymers 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
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- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
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- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 238000004227 thermal cracking Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 239000010455 vermiculite Substances 0.000 description 1
- 229910052902 vermiculite Inorganic materials 0.000 description 1
- 235000019354 vermiculite Nutrition 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/50—Amines
- C08G59/5033—Amines aromatic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
- C08J5/241—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres
- C08J5/244—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres using glass fibres
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
- C08J5/249—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs characterised by the additives used in the prepolymer mixture
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2363/00—Characterised by the use of epoxy resins; Derivatives of epoxy resins
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0104—Properties and characteristics in general
- H05K2201/012—Flame-retardant; Preventing of inflammation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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- Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
- Y10T428/31529—Next to metal
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- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Inorganic Chemistry (AREA)
- Laminated Bodies (AREA)
- Reinforced Plastic Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Abstract
本發明係提供一種無鹵素樹脂組合物,其包含:(A)100重量份之環氧樹脂;(B)10至100重量份之苯并噁嗪樹脂;(C)5至50重量份之二烯丙基雙酚A樹脂;以及(D)0.05至20重量份之胺類硬化劑。本發明借著包含特定之組成份及比例,以使可達到低介電常數、低介電損耗、高耐熱性及高耐燃性;可製作成半固化膠片或樹脂膜,進而達到可應用於銅箔基板及印刷電路板之目的。
Description
本發明涉及一種無鹵素樹脂組合物,尤指一種應用於銅箔基板及印刷電路板之無鹵素樹脂組合物。
為符合世界環保潮流及綠色法規,無鹵素(Halogen-free)為當前全球電子產業之環保趨勢,世界各國及相關電子大廠陸續對其電子產品,制定無鹵素電子產品的量產時程表。歐盟之有害物質限用指令(Restriction of Hazardous Substances,RoHS)實施後,包含鉛、鎘、汞、六價鉻、聚溴聯苯與聚溴二苯醚等物質,已不得用於製造電子產品或其零組件。印刷電路板(Printed Circuit Board,PCB)為電子電機產品之基礎,無鹵素以對印刷電路板為首先重點管制物件,國際組織對於印刷電路板之鹵素含量已有嚴格要求,其中國際電工委員會(IEC)61249-2-21規範要求溴、氯化物的含量必須低於900 ppm,且總鹵素含量必須低於1500 ppm;日本電子迴路工業會(JPCA)則規定溴化物與氯化物之含量限制均為900 ppm;而綠色和平組織現階段大力推動的綠化政策,要求所有的製造商完全排除其電子產品中之聚氯乙烯及溴系阻燃劑,以符合兼具無鉛及無鹵素之綠色電子。因此,材料的無鹵化成為目前業者的重點開發項目。
新時代的電子產品趨向輕薄短小,並適合高頻傳輸,因此電路板之配線走向高密度化,電路板之材料選用走向
更嚴謹的需求。高頻電子組件與電路板接合,為了維持傳輸速率及保持傳輸訊號完整性,電路板之基板材料必須兼具較低的介電常數(dielectric constant,Dk)及介電損耗(又稱損失因數,dissipation factor,Df)。同時,為了在高溫、高濕度環境下依然維持電子組件正常運作功能,電路板也必須兼具耐熱、難燃及低吸水性的特性。環氧樹脂由於接著性、耐熱性、成形性優異,故廣泛使用於電子零組件及電機機械之覆銅箔積層板或密封材。從防止火災之安全性觀點而言,要求材料具有阻燃性,一般係以無阻燃性之環氧樹脂,配合外加阻燃劑之方式達到阻燃之效果,例如,在環氧樹脂中藉由導入鹵素,尤其是溴,而賦予阻燃性,提高環氧基之反應性。另外,在高溫下經長時間使用後,可能會引起鹵化物之解離,而有微細配線腐蝕之虞。再者使用過後之廢棄電子零組件,在燃燒後會產生鹵化物等有害化合物,對環境亦不友善。為取代上述之鹵化物阻燃劑,有研究使用磷化合物作為阻燃劑,例如添加磷酸酯(中華民國專利公告I238846號)或紅磷(中華民國專利公告322507號)於環氧樹脂組合物中。然而,磷酸酯會因產生水解反應而使酸離析,導致影響其耐遷移性;而紅磷之阻燃性雖高,但在消防法中被指為危險物品,因為在高溫、潮濕環境下會產生微量之膦氣體。
習知之銅箔基板(或稱銅箔積層板)製作之電路板技術中,係利用環氧基樹脂與硬化劑作為熱固性樹脂組合物原料,將補強材(如玻璃纖維布)與該熱固性樹脂組成加熱結合
形成半固化膠片(prepreg),再將該半固化膠片與上、下兩片銅箔在高溫高壓下壓合而成。習知技術一般使用環氧基樹脂與具有羥基(-OH)之酚醛(phenol novolac)樹脂硬化劑作為熱固性樹脂組成原料,酚醛樹脂與環氧基樹脂結合會使環氧基開環後形成另一羥基,羥基本身會提高介電常數及介電損耗值,且易與水分結合,增加吸濕性。
中華民國專利公告第I297346號揭露了一種使用氰酸酯樹脂、二環戊二烯基環氧樹脂、矽石以及熱塑性樹脂作為熱固性樹脂組合物,此種熱固性樹脂組合物具有低介電常數與低介電損耗等特性。然而此製造方法於製作時必須使用含有鹵素(如溴)成分之阻燃劑,例如四溴環己烷、六溴環癸烷以及2,4,6-三(三溴苯氧基)-1,3,5-三氮雜苯,而這些含有溴成分之阻燃劑於產品製造、使用甚至回收或丟棄時皆很容易對環境造成污染。為了提升銅箔基板之耐熱阻燃性、低介電損耗、低吸濕性、高交聯密度、高玻璃轉化溫度、高接合性、適當之熱膨脹性,環氧樹脂、硬化劑及補強材的材料選擇成了主要影響因素。
就電氣性質而言,主要需考慮者包括材料之介電常數以及介電損耗。一般而言,由於基板的訊號傳送速度與基板材料之介電常數的平方根成反比,故基板材料之介電常數通常越小越好;另一方面,由於介電損耗越小代表訊號傳遞的損失越少,故介電損耗較小之材料所能提供之傳輸品質也較為良好。
因此,如何開發出具有低介電常數以及低介電損耗之
材料,並將其應用於高頻印刷電路板之製造,乃是現階段印刷電路板材料供應商亟欲解決之問題。
有鑒於上述習知技術之缺憾,發明人有感其未臻於完善,遂竭其心智悉心研究克服,憑其從事該項產業多年之累積經驗,進而研發出一種無鹵素樹脂組合物,以期達到低介電常數、低介電損耗、高耐熱性及高耐燃性之目的。
本發明之主要目的在於提供一種無鹵素樹脂組合物,其藉著包含特定之組成份及比例,以使可達到低介電常數、低介電損耗、高耐熱性及高耐燃性;可製作成半固化膠片或樹脂膜,進而達到可應用於銅箔基板及印刷電路板之目的。
為實現上述目的,本發明提供一種無鹵素樹脂組合物,其包含:(A)100重量份之環氧樹脂;(B)10至100重量份之苯并噁嗪樹脂;(C)5至50重量份之二烯丙基雙酚A樹脂;以及(D)0.05至20重量份之胺類硬化劑。
上述組合物之用途,係用於製造半固化膠片、樹脂膜、銅箔基板及印刷電路板。因此,本發明之無鹵素樹脂組合物,其藉著包含特定之組成份及比例,以使可達到低介電常數、低介電損耗、高耐熱性及高耐燃性等特性;可製作成半固化膠片或樹脂膜,進而達到可應用於銅箔基板及印刷電路板之目的。
本發明之無鹵素樹脂組合物中,該成分(A)環氧樹脂,
係下列其中一者或其組合:雙酚A(bisphenol A)環氧樹脂、雙酚F(bisphenol F)環氧樹脂、雙酚S(bisphenol S)環氧樹脂、雙酚AD(bisphenol AD)環氧樹脂、酚醛(phenol novolac)環氧樹脂、雙酚A酚醛(bisphenol A novolac)環氧樹脂、雙酚F酚醛(bisphenol F novolac)環氧樹脂、鄰甲酚(o-cresol novolac)環氧樹脂、三官能基(trifunctional)環氧樹脂、四官能基(tetrafunctional)環氧樹脂、多官能基(multifunctional)環氧樹脂、二環戊二烯(dicyclopentadiene,DCPD)環氧樹脂、含磷環氧樹脂、DOPO環氧樹脂、DOPO-HQ環氧樹脂、對二甲苯環氧樹脂(p-xylene epoxy resin)、萘型(naphthalene)環氧樹脂、苯并吡喃型(benzopyran)環氧樹脂、聯苯酚醛(biphenyl novolac)環氧樹脂、異氰酸酯改質(isocyanate modified)環氧樹脂、酚苯甲醛(phenol benzaldehyde epoxy)環氧樹脂及酚基苯烷基酚醛(phenol aralkyl novolac)環氧樹脂。其中,DOPO環氧樹脂可為DOPO-PN環氧樹脂、DOPO-CNE環氧樹脂、DOPO-BPN環氧樹脂,DOPO-HQ環氧樹脂可為DOPO-HQ-PN環氧樹脂、DOPO-HQ-CNE環氧樹脂、DOPO-HQ-BPN環氧樹脂。
本發明之無鹵素樹脂組合物中,該成分(B)苯并噁嗪樹脂係下列其中一者或其組合:雙酚A型苯并噁嗪樹脂、雙酚F型苯并噁嗪樹脂及酚酞型苯并噁嗪樹脂。更具體而言,其較佳選自下列通式(1)至(3)之至少一者:
其中X1及X2係分別獨立為R或Ar或-SO2-;R係選自-C(CH3)2-、-CH(CH3)-、-CH2-及經取代或未經取代之二環戊二烯基;Ar係選自經取代或未經取代之苯、聯苯、萘、酚醛、雙酚A、雙酚A酚醛、雙酚F及雙酚F酚醛官能基。如Huntsman販賣之商品名LZ-8270、LZ-8280或LZ-8290。
本發明之無鹵素樹脂組合物,以100重量份之環氧樹脂為基準,係添加10至100重量份之苯并噁嗪樹脂,於此
添加範圍內的苯并噁嗪樹脂含量,可使該無鹵素樹脂組合物達到預期之低介電損耗值(Df),若苯并噁嗪樹脂不足10重量份,則達不到預期之低介電損耗值要求,若超過100重量份,則該樹脂組合物製作之基板耐熱性變差。更具體地,本發明所述之無鹵素樹脂組合物,較佳係添加20至80重量份的苯并噁嗪樹脂。
本發明之無鹵素樹脂組合物中,該成分(C)二烯丙基雙酚A樹脂可為2,2’-二烯丙基雙酚A(2,2’-diallybisphenol A)樹脂、鄰-二烯丙基雙酚A(Ortho-diallybisphenol A)樹脂或對-二烯丙基雙酚A(Para-diallybisphenol A)樹脂。
本發明之無鹵素樹脂組合物,以100重量份之環氧樹脂為基準,係添加5至50重量份之二烯丙基雙酚A樹脂,於此添加範圍內,可使該無鹵素樹脂組合物達到良好的交聯性,並提升Tg及提升樹脂與銅箔之拉力值。若二烯丙基雙酚A樹脂之含量不足5重量份,則該無鹵素樹脂組合物達不到預期之交聯性、Tg及銅箔拉力提升,若超過50重量份,會造成該樹脂組合物製作之基板耐熱性降低及吸水率上升,造成基板物性降低。更具體地,本發明之無鹵素樹脂組合物,較佳係添加10至25重量份之二烯丙基雙酚A樹脂。
本發明之無鹵素樹脂組合物中,該成分(D)胺類硬化劑係具有氨基官能基(amino)之樹脂,較佳係具有雙氨官能基(diamino)之樹脂。更具體而言,胺類硬化劑係可為二氨基二苯碸(diamino diphenyl sulfone)、二氨基二苯基甲烷
(diamino diphenyl methane)、二氨基二苯醚(diamino diphenyl ether)、二氨基二苯硫醚(diamino diphenyl sulfide)、雙氰胺(dicyandiamide,DICY)之其中一者或其組合。其中,所述胺類硬化劑較佳係4,4’-二氨基二苯碸(4,4’-diamino diphenyl sulfone)、4,4’-二氨基二苯基甲烷(4,4’-diamino diphenyl methane)、4,4’-二氨基二苯醚(4,4’-diamino diphenyl ether)、4,4’-二氨基二苯硫醚(4,4’-diamino diphenyl sulfide)、雙氰胺(dicyandiamide,DICY)之其中一者或其組合。
本發明之無鹵素樹脂組合物,以100重量份之環氧樹脂為基準,係添加0.05至20重量份之胺類硬化劑,於此添加範圍內之胺類硬化劑含量,可使該無鹵素樹脂組合物提升與銅箔之拉力值,若胺類硬化劑之含量不足0.05重量份,則達不到預期之拉力提升,若超過20重量份,會造成該樹脂組合物製作之基板耐熱性降低及吸水率上升,造成基板物性降低。更具體地,本發明之無鹵素樹脂組合物,較佳係添加1至15重量份之胺類硬化劑。
本發明之無鹵素樹脂組合物中,可進一步包含酚樹脂,所述酚樹脂係可選擇性添加下列至少一種化合物,但並不以此為限:苯酚酚醛(phenolic novolac)樹脂、鄰-甲酚酚醛(o-cresol novolac)樹脂、酚-苯甲醛酚樹脂及雙環戊二烯酚樹脂等,但不以此為限。
本發明之無鹵素樹脂組合物中,可進一步包含無鹵阻燃劑,該無鹵阻燃劑係可使用含氮阻燃劑或含磷阻燃劑,
所述無鹵阻燃劑可選擇性添加下列至少一種化合物,但並不以此為限:雙酚聯苯磷酸鹽(bisphenol diphenyl phosphate)、聚磷酸銨(ammonium poly phosphate)、對苯二酚-雙-(聯苯基磷酸鹽)(hydroquinone bis-(diphenyl phosphate))、雙酚A-雙-(聯苯基磷酸鹽)(bisphenol A bis-(diphenylphosphate))、三(2-羧乙基)膦(tri(2-carboxyethyl)phosphine,TCEP)、三(異丙基氯)磷酸鹽、三甲基磷酸鹽(trimethyl phosphate,TMP)、二甲基-甲基磷酸鹽(dimethyl methyl phosphonate,DMMP)、間苯二酚雙二甲苯基磷酸鹽(resorcinol dixylenylphosphate,RDXP,如PX-200)、磷氮基化合物(phosphazene如SPB-100)、m-苯甲基膦(m-phenylene methylphosphonate,PMP)、聚磷酸三聚氰胺(melamine polyphosphate)、三聚氰胺氰尿酸酯(melamine cyanurate)及三-羥乙基異氰尿酸酯(tri-hydroxy ethyl isocyanurate)等,但並不以此為限。此外,無鹵阻燃劑亦可使用9,10-二氫-9-氧雜-10-磷雜菲-10-氧化物(9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide,DOPO)、含DOPO酚樹脂(如DOPO-HQ、DOPO-PN、DOPO-BPN)、含DOPO環氧樹脂、含DOPO-HQ環氧樹脂等,其中DOPO-BPN可為DOPO-BPAN、DOPO-BPFN、DOPO-BPSN等雙酚酚醛化合物。
本發明之無鹵素樹脂組合物,以100重量份之環氧樹脂為基準,係添加10至100重量份之無鹵阻燃劑,於此添加範圍內之無鹵阻燃劑含量,可使該無鹵素樹脂組合物達
到阻燃效果,若無鹵阻燃劑之含量不足10重量份,則達不到阻燃效果,若超過100重量份則吸水率上升且基板耐熱性變差。
本發明之無鹵素樹脂組合物,可再進一步包含無機填充物(filler)、硬化促進劑(curing accelerator)、矽烷偶合劑(silane coupling agent)、增韌劑(toughening agent)、溶劑(solvent)之其中一者或其組合。
本發明之無鹵素樹脂組合物進一步添加無機填充物之主要作用,在於增加樹脂組合物之熱傳導性、改良其熱膨脹性及機械強度等特性,且無機填充物較佳係均勻分佈於該樹脂組合物中。其中,無機填充物可包含二氧化矽(熔融態、非熔融態、多孔質或中空型)、氧化鋁、氫氧化鋁、氧化鎂、氫氧化鎂、碳酸鈣、氮化鋁、氮化硼、碳化鋁矽、碳化矽、二氧化鈦、氧化鋅、氧化鋯、雲母、勃姆石(boehmite,AlOOH)、煅燒滑石、滑石、氮化矽、煅燒高嶺土。且無機填充物可為球型、纖維狀、板狀、粒狀、片狀或針鬚狀,並可選擇性經由矽烷偶合劑預處理。
無機填充物可為粒徑100 μm以下之顆粒粉末,且較佳為粒徑1 nm至20 μm之顆粒粉末,最佳為粒徑1 μm以下之納米尺寸顆粒粉末;針鬚狀無機填充物可為直徑50 μm以下且長度1至200 μm之粉末。
本發明之無鹵素樹脂組合物,以100重量份之環氧樹脂為基準,係添加10至1000重量份之無機填充物。若無機填充物之含量不足10重量份,則無顯著之熱傳導性,且
未改善熱膨脹性及機械強度等特性;若超過1000重量份,則該樹脂物組合物之填孔流動性變差,與銅箔之接著變差。更具體地,本發明之無鹵素樹脂組合物,較佳係添加100至700重量份之無機填充物。
本發明所述之硬化促進劑係可包含路易士鹼或路易士酸等觸媒(catalyst)。其中,路易士鹼可包含咪唑(imidazole)、三氟化硼胺複合物、氯化乙基三苯基磷(ethyltriphenyl phosphonium chloride)、2-甲基咪唑(2-methylimidazole,2MI)、2-苯基咪唑(2-phenyl-1H-imidazole,2PZ)、2-乙基-4-甲基咪唑(2-ethyl-4-methylimidazole,2E4MI)、三苯基膦(triphenylphosphine,TPP)與4-二甲基氨基吡啶(4-dimethylaminopyridine,DMAP)中之一者或多者。路易士酸係可包含金屬鹽類化合物,如錳、鐵、鈷、鎳、銅、鋅等金屬鹽化合物,如辛酸鋅、辛酸鈷等金屬觸媒。
本發明所述之矽烷偶合劑,係可包含矽烷化合物(silane)及矽氧烷化合物(siloxane),依官能基種類又可分為氨基矽烷化合物(amino silane)、氨基矽氧烷化合物(amino siloxane)、環氧基矽烷化合物(epoxy silane)及環氧基矽氧烷化合物(epoxy siloxane)。
本發明所述之增韌劑,係選自:橡膠(rubber)樹脂、端羧基聚丁二烯丙烯腈(carboxyl-terminated butadiene acrylonitrile rubber,CTBN)、核殼聚合物(core-shell rubber)等添加物。
本發明所述之溶劑係可選自甲醇、乙醇、乙二醇單甲醚、丙酮、丁酮(甲基乙基酮)、甲基異丁基酮、環己酮、甲苯、二甲苯、甲氧基乙基乙酸酯、乙氧基乙基乙酸酯、丙氧基乙基乙酸酯、乙酸乙酯、二甲基甲醯胺、丙二醇甲基醚等溶劑或其混合溶劑。
本發明所述之無鹵素樹脂組合物,可再進一步包含下列樹脂之其中一者或其組合:聚苯醚(polyphenylene ether)樹脂、氰酸酯(cyanate ester)樹脂、異氰酸酯(isocyanate ester)樹脂、馬來醯亞胺(maleimide)樹脂、聚酯(polyester)樹脂、苯乙烯(styrene)樹脂、丁二烯(butadiene)樹脂、苯氧(phenoxy)樹脂、聚醯胺(polyamide)樹脂、聚醯亞胺(polyimide)樹脂。
本發明之再一個目的在於揭露一半固化膠片(prepreg),其具有低介電常數、低介電損耗、耐熱性、阻燃性、低吸濕性及不含鹵素等特性。據此,本發明所揭露之半固化膠片可包含一補強材及前述之無鹵樹脂組合物,其中該無鹵樹脂組合物係以含浸等方式附著於該補強材上,並經由高溫加熱形成半固化態。其中,補強材係可為纖維材料、織布及不織布,如玻璃纖維布等,其係可增加該半固化膠片之機械強度。此外,該補強材可選擇性經由矽烷偶合劑或矽氧烷偶合劑進行預處理,如經矽烷偶合劑預處理之玻璃纖維布。
前述之半固化膠片經由高溫加熱或高溫且高壓下加熱可固化形成固化膠片或是固態絕緣層,其中無鹵樹脂組合物若含有溶劑,則該溶劑會在高溫加熱程序中揮發移除。
本發明之又一個目的在於揭露一種銅箔基板(copper clad laminate),其具有低介電特性、耐熱性、阻燃性、低吸濕性及不含鹵素等特性,且特別適用於高速度高頻率訊號傳輸之電路板。據此,本發明提供一種銅箔基板,其包含兩個或兩個以上之銅箔及至少一絕緣層。其中,銅箔可進一步包含銅與鋁、鎳、鉑、銀、金等至少一種金屬之合金;絕緣層係由前述之半固化膠片於高溫高壓下固化而成,如將前述半固化膠片疊合於兩個銅箔之間且在高溫與高壓下進行壓合而成。
本發明所述之銅箔基板至少具有以下優點之一:低介電常數與低介電損耗、優良的耐熱性及阻燃性、低吸濕性、較高的熱傳導率及不含鹵素之環保性。該銅箔基板進一步經由製作線路等製程加工後,可形成電路板,且該電路板與電子組件接合後於高溫、高濕度等嚴苛環境下操作而並不影響其品質。
本發明之另一個目的在於揭露一種印刷電路板(printed circuit board),其具有低介電特性、耐熱性、阻燃性、低吸濕性及不含鹵素等特性,且適用於高速度高頻率的訊號傳輸。其中,該電路板係包含至少一個前述之銅箔基板,且該電路板係可由習知之製程製作而成。
為進一步揭露本發明,以使本發明所屬技術領域者具有通常知識者可據以實施,以下僅以數個實施例進一步說明本發明。然應當注意者,以下實施例僅係用以對本發明做進一步之說明,並非用以限制本發明之實施範圍,且任
何本發明所屬技術領域者具通常知識者在不違背本發明之精神下所得以達成之修飾及變化,均屬於本發明之範圍。
為充分瞭解本發明之目的、特徵及功效,茲藉由下述具體之實施例,對本發明做一詳細說明,說明如後:分別將實施例1至6之樹脂組合物列表於表一,比較例1至6之樹脂組合物列表於表三。
一種樹脂組合物,包括以下組成份:(A)100重量份之聯苯環氧樹脂(NC-3000);(B)70重量份之苯并噁嗪樹脂(LZ 8280);(C)10重量份之二烯丙基雙酚A樹脂(DABPA);(D)1重量份之二氨基二苯基甲烷(diamino diphenyl methane,DDM);(E)40重量份之磷腈化合物(SPB-100);(F)80重量份之熔融二氧化矽;(G)0.4重量份之氨基矽烷化合物(amino silane,AS);(H)0.1重量份之2-苯基咪唑(2PZ);(I)30重量份之甲基乙基酮(MEK);(J)20重量份之二甲基甲醯胺(DMF)。
一種樹脂組合物,包括以下組成份:(A)50重量份之二環戊二烯環氧樹脂(HP-7200H);
(B)50重量份之聯苯環氧樹脂(NC-3000);(C)20重量份之苯并噁嗪樹脂(LZ 8280);(D)5重量份之二烯丙基雙酚A樹脂(DABPA);(E)15重量份之二氨基二苯碸(DDS);(F)40重量份之磷腈化合物(SPB-100);(G)80重量份之熔融二氧化矽;(H)0.4重量份之氨基矽烷化合物(AS);(I)0.15重量份之2-苯基咪唑(2PZ);(J)20重量份之二甲基甲醯胺(DMF);(K)25重量份之甲基乙基酮(MEK)。
一種樹脂組合物,包括以下組成份:(A)60重量份之異氰酸酯改質環氧樹脂(SEC-365);(B)40重量份之聯苯環氧樹脂(NC-3000);(C)30重量份之苯并噁嗪樹脂(LZ 8280);(D)15重量份之二烯丙基雙酚A樹脂(DABPA);(E)1.5重量份之雙氰胺(DICY);(F)35重量份之磷腈化合物(SPB-100);(G)0.15重量份之2-苯基咪唑(2PZ);(H)80重量份之熔融二氧化矽;(I)0.4重量份之氨基矽烷化合物(AS);(J)20重量份之二甲基甲醯胺(DMF);(K)25重量份之甲基乙基酮(MEK)。
一種樹脂組合物,包括以下組成份:(A)40重量份之二環戊二烯環氧樹脂(HP-7200H);(B)60重量份之聯苯環氧樹脂(NC-3000);(C)50重量份之苯并噁嗪樹脂(LZ 8280);(D)10重量份之二烯丙基雙酚A樹脂(DABPA);(E)1重量份之雙氰胺(DICY);(F)20重量份之雙環戊二烯酚樹脂(PD-9110);(G)40重量份之磷腈化合物(SPB-100);(H)0.15重量份之2-苯基咪唑(2PZ);(I)80重量份之熔融二氧化矽;(J)0.4重量份之氨基矽烷化合物(AS);(K)30重量份之環己酮(CYC);(L)40重量份之甲基乙基酮(MEK)。
一種樹脂組合物,包括以下組成份:(A)30重量份之異氰酸酯改質環氧樹脂(SEC-365);(B)50重量份之二環戊二烯環氧樹脂(HP-7200H);(C)20重量份之聯苯環氧樹脂(NC-3000);(D)40重量份之苯并噁嗪樹脂(LZ 8280);(E)10重量份之二烯丙基雙酚A樹脂(DABPA);(F)1重量份之二氨基二苯基甲烷(diamino diphenyl methane,DDM);(G)10重量份之苯酚酚醛樹脂(phenolic novolac,PN);(H)40重量份之磷腈化合物(SPB-100);
(I)0.15重量份之2-苯基咪唑(2PZ);(J)80重量份之熔融二氧化矽;(K)0.4重量份之氨基矽烷化合物(AS);(L)20重量份之環己酮(CYC);(M)35重量份之甲基乙基酮(MEK)。
一種樹脂組合物,包括以下組成份:(A)50重量份之異氰酸酯改質環氧樹脂(SEC-365);(B)50重量之雙酚A酚醛環氧樹脂(BE188);(C)5.5重量份之雙氰胺(DICY);(D)30重量份之磷腈化合物(SPB-100);(E)0.1重量份之2-苯基咪唑(2PZ);(F)0.25重量份之氨基矽烷化合物(AS);(G)30重量份之二甲基甲醯胺(DMF)。
一種樹脂組合物,包括以下組成份:(A)70重量份之異氰酸酯改質環氧樹脂(SEC-365);(B)30重量份之雙酚A酚醛環氧樹脂(BE188);(C)45重量份之二烯丙基雙酚A樹脂(DABPA);(D)1重量份之二氨基二苯碸(DDS);(E)40重量份之磷腈化合物(SPB-100);(F)0.25重量份之2-苯基咪唑(2PZ);(G)80重量份之熔融二氧化矽;(H)0.4重量份之氨基矽烷化合物(AS);
(I)33重量份之環己酮(CYC);(J)40重量份之甲基乙基酮(MEK)。
一種樹脂組合物,包括以下組成份:(A)15重量份之雙酚A酚醛環氧樹脂(BE188);(B)40重量份之二環戊二烯環氧樹脂(HP-7200H);(C)45重量份之含DOPO-HQ環氧樹脂(PE-122);(D)70重量份之苯并噁嗪樹脂(LZ 8280);(E)8.5重量份之二氨基二苯碸(DDS);(F)30重量份之磷腈化合物(SPB-100);(G)0.4重量份之2-苯基咪唑(2PZ);(H)0.27重量份之氨基矽烷化合物(AS);(I)22重量份之環己酮(CYC);(J)12重量份之甲基乙基酮(MEK)。
一種樹脂組合物,包括以下組成份:(A)100重量份之含DOPO-HQ環氧樹脂(PE-122);(B)35重量份之二烯丙基雙酚A樹脂(DABPA);(C)2.5重量份之雙氰胺(DICY);(D)20重量份之磷腈化合物(SPB-100);(E)0.3重量份之2-苯基咪唑(2PZ);(F)0.25重量份之氨基矽烷化合物(AS);(G)43重量份之煅燒高嶺土;(H)30重量份之二甲基甲醯胺(DMF);
一種樹脂組合物,包括以下組成份:(A)60重量份之異氰酸酯改質環氧樹脂(SEC-365);(B)40重量份之二環戊二烯環氧樹脂(HP-7200H);(C)70重量份之苯并噁嗪樹脂(LZ 8280);(D)20重量份之二烯丙基雙酚A樹脂(DABPA);(E)40重量份之磷腈化合物(SPB-100);(F)0.25重量份之2-苯基咪唑(2PZ);(G)0.4重量份之氨基矽烷化合物(AS);(H)80重量份之熔融二氧化矽;(I)33重量份之環己酮(CYC);(J)40重量份之甲基乙基酮(MEK)。
一種樹脂組合物,包括以下組成份:(A)20重量份之異氰酸酯改質環氧樹脂(SEC-365);(B)20重量份之雙酚A酚醛環氧樹脂(BE188);(C)40重量份之二環戊二烯環氧樹脂(HP-7200H);(D)20重量份之含DOPO-HQ環氧樹脂(PE-122);(E)85重量份之苯并噁嗪樹脂(LZ 8280);(F)40重量份之磷腈化合物(SPB-100);(G)0.3重量份之2-苯基咪唑(2PZ);(H)54重量份之煅燒高嶺土;(I)0.27重量份之氨基矽烷化合物(AS);(J)22重量份之環己酮(CYC);
(K)12重量份之甲基乙基酮(MEK)。
將上述實施例1至5及比較例1至6之樹脂組合物,分批於攪拌槽中混合均勻後置入一含浸槽中,再將玻璃纖維布通過上述含浸槽,使樹脂組合物附著於玻璃纖維布,再進行加熱烘烤成半固化態而得半固化膠片。
將上述分批製得之半固化膠片,取同一批之半固化膠片四張及兩張18 μm銅箔,依銅箔、四片半固化膠片、銅箔之順序進行疊合,再於真空條件下經由220℃壓合2小時形成銅箔基板,其中四片半固化膠片固化形成兩銅箔間之絕緣層。
分別將上述含銅箔基板及銅箔蝕刻後之不含銅基板做物性量測,物性量測項目包含玻璃轉化溫度(Tg)、耐熱性T-288(clad & unclad,以熱機械分析儀(Thermomechanical analysis,TMA)測試含銅及不含銅基板於288℃下浸錫之耐熱性,以時間結果評判耐熱性,越長越好)、熱裂解溫度(Td,以TGA儀器測試,溫度(℃)越大越好)、吸水性(%)/PCT(2atm/1hr)(高溫高濕環境測試樣品吸水性,越低越好)、PCT(2atm/3hours)(高溫高濕環境測試樣品耐熱性)、介電常數(Dk越低越好)、介電損耗(Df越低越好)、耐燃性(flaming test,UL94,其中等級優劣排列為V-0>V-1>V-2)。分別將實施例1至5之樹脂組合物之量測結果列表於表二,比較例1至6之樹脂組合物之量測結果列表於表四。
由實施例1至5之資料顯示,本發明之樹脂組合物,所有物性皆達到預期規格水準,由實施例1及2相比,實施例2使用DDS可增加組合物之Tg;由實施例1及3相
比,實施例3使用DICY可增加剝離強度,且Dk更低;由實施例3及4相比,實施例4增加PD-9110,可維持較低Dk並提升剝離強度;由實施例1及5相比,實施例5增加PN可提升剝離強度。
比較實施例及比較例之資料,比較例1未使用苯并噁嗪樹脂及二烯丙基雙酚A樹脂,導致Df過高,且基板耐熱性較差(PCT爆板,T288(unclad)只有12分鐘即爆板,而T288(clad)1分鐘即爆板)。比較例2未使用苯并噁嗪樹脂,導致剝離強度過低,且PCT爆板。比較例3未使用二烯丙基雙酚A樹脂,導致Dk過高。比較例4未使用苯并噁嗪樹脂,導致耐熱性變差(T288及PCT爆板)。比較例5未使用胺類硬化劑,導致Dk過高及剝離強度過低。比較例6未使用二烯丙基雙酚A樹脂及胺類硬化劑,導致耐熱性很差。
如上所述,本發明完全符合專利三要件:新穎性、進步性和產業利用性。以新穎性和進步性而言,本發明之無鹵素樹脂組合物,其藉著包含特定之組成份及比例,以使可達到低介電常數、低介電損耗、高耐熱性及高耐燃性;可製作成半固化膠片或樹脂膜,進而達到可應用於銅箔基板及印刷電路板之目的;就產業上之可利用性而言,利用本發明所衍生之產品,當可充分滿足目前市場之需求。
本發明在上文中已以較佳實施例揭露,然本領域中具通常知識者應理解的是,該實施例僅用於描繪本發明,而不應理解為限制本發明之範圍。應注意的是,凡是與該實
施例等效之變化與置換,均應設為涵蓋於本發明之申請專利範圍內。因此,本發明之保護範圍當以下文之申請專利範圍所界定者為準。
Claims (12)
- 一種無鹵素樹脂組合物,其包含:(A)100重量份之環氧樹脂;(B)10至100重量份之苯并噁嗪樹脂;(C)5至50重量份之二烯丙基雙酚A樹脂;以及(D)0.05至20重量份之胺類硬化劑。
- 如申請專利範圍第1項所述之組合物,其中所述環氧樹脂係選自下列群組中之至少一者:雙酚A環氧樹脂、雙酚F環氧樹脂、雙酚S環氧樹脂、雙酚AD環氧樹脂、酚醛環氧樹脂、雙酚A酚醛環氧樹脂、雙酚F酚醛環氧樹脂、鄰甲酚環氧樹脂、三官能基環氧樹脂、四官能基環氧樹脂、多官能基環氧樹脂、二環戊二烯環氧樹脂、含磷環氧樹脂、含DOPO環氧樹脂、含DOPO-HQ環氧樹脂、對二甲苯環氧樹脂、萘型環氧樹脂、苯并哌喃型環氧樹脂、聯苯酚醛環氧樹脂、異氰酸酯改質環氧樹脂、酚苯甲醛環氧樹脂及酚基苯烷基酚醛環氧樹脂。
- 如申請專利範圍第1項所述之組合物,其中所述苯并噁嗪樹脂係選自下列群組中之至少一者:雙酚A型苯并噁嗪樹脂、雙酚B型苯并噁嗪樹脂及酚酞型苯并噁嗪樹脂。
- 如申請專利範圍第1項所述之組合物,其中所述二烯丙基雙酚A樹脂係選自下列群組中之至少一者:2,2’-二烯丙基雙酚A樹脂、鄰-二烯丙基雙酚A樹脂及對-二烯丙基雙酚A樹脂。
- 如申請專利範圍第1項所述之組合物,其中所述胺類硬化 劑係選自下列群組中之至少一者:二氨基二苯碸、二氨基二苯基甲烷、二氨基二苯醚、二氨基二苯硫醚及雙氰胺。
- 如申請專利範圍第1至5項中任一項所述之組合物,其進一步包含無鹵阻燃劑,所述無鹵阻燃劑係選自下列群組中之至少一者:雙酚聯苯磷酸鹽、聚磷酸銨、對苯二酚-雙-(聯苯基磷酸鹽)、雙酚A-雙-(聯苯基磷酸鹽)、三(2-羧乙基)膦、三(異丙基氯)磷酸鹽、三甲基磷酸鹽、二甲基-甲基磷酸鹽、間苯二酚雙二甲苯基磷酸鹽、磷氮基化合物、m-苯甲基膦、聚磷酸三聚氰胺、三聚氰胺氰尿酸酯及三-羥乙基異氰尿酸酯、9,10-二氫-9-氧雜-10-磷雜菲-10-氧化物(DOPO)、含DOPO酚樹脂、含DOPO環氧樹脂及含DOPO-HQ環氧樹脂。
- 如申請專利範圍第1至5項中任一項所述之組合物,其進一步包含選自下列群組中之至少一者:無機填充物、硬化促進劑、矽氧烷偶合劑、增韌劑及溶劑。
- 如申請專利範圍第1至5項中任一項所述之組合物,其進一步包含選自下列群組中之至少一者或其改質物:苯酚酚醛樹脂、鄰-甲酚酚醛樹脂、酚-苯甲醛酚樹脂及雙環戊二烯酚樹脂。
- 如申請專利範圍第1至5項中任一項所述之組合物,其進一步包含選自下列群組中之至少一者或其改質物:聚苯醚樹脂、氰酸酯樹脂、異氰酸酯樹脂、馬來醯亞胺、聚酯樹脂、苯乙烯樹脂、丁二烯樹脂、苯氧樹脂、聚醯胺及聚醯亞胺。
- 一種半固化膠片,其包含如申請專利範圍第1至9項中任一項所述之組合物。
- 一種銅箔基板,其包含如申請專利範圍第10項所述之半固化膠片。
- 一種印刷電路板,其包含如申請專利範圍第11項所述之銅箔基板。
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CN106700548B (zh) * | 2016-12-30 | 2019-04-30 | 广东生益科技股份有限公司 | 一种含有苯并噁嗪树脂组合物的制备方法及由其制成的预浸料和层压板 |
CN109233543B (zh) * | 2017-05-03 | 2020-09-22 | 中山台光电子材料有限公司 | 树脂组合物及由其制成的物品 |
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US20140023839A1 (en) | 2014-01-23 |
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