201221229 六、發明說明： 【發明所屬之技術領域】 本發明係關於一種可防止在液體中混入氣泡與微粒的液 體自動供給機構及具備此機構之塗佈裝置。 【先前技術】 在製造液晶顯不益的步驟中’存在將二片相對向的基板貼 合並在其中間形成液晶層的面板步驟（亦稱為面板組裝步 驟）。尤其，當製造大型面板時，採用在對貼合前的其中一 基板滴下液晶後再進行貼合之滴下注入法。 在滴下注入法中，為了將液晶滴下於基板上，係使用具有 儲存液晶的容器，並從此容器所設置的喷嘴利用氣體壓力或 機械壓力的作用，一次流出既定量之所謂分配器（dispenser) 的裝置。 近年來，隨著液晶顯示器的大型化，其原材料的基板亦隨 之大型化。由於若基板大型化，則液晶的使用量亦會增加， 因此如習知作為分配器所使用的小型儲存容器（注射器）便 變得難以對應。因為若小型的儲存容器則液晶會迅速用盡， 導致容器等的更換趨於頻繁，就生產性、作業性的觀點會有 效率降低的緣故。又，當更換儲存容器之際，亦會有氣泡或 異物（以下稱為微粒）混入的危險。 相對於此，存在於裝置外設置大型儲槽，藉由從該大型儲 槽供給液體材料，以解決此等問題的各種嘗試。 100133333 3 201221229 例如於專利文獻1揭示有一種液滴吐出裝置，其特徵在於 具備有：裝置本體；載置部，其可載置工件；頭單元，其具 有對工件吐出液滴的複數個液滴吐出頭；頭單元支持體，其 支持頭單元；移動機構，其使工件載置部與頭單元支持體進 行相對移動；一次槽系統，其具有至少1個一次槽，該一次 槽係儲存從各液滴吐出頭所吐出的吐出液，並可更換及/或 補充吐出液；二次槽，其固設於頭單元支持體，且從一次槽 流入吐出液；一次流路，其將一次槽系統與二次槽相連接， 並從一次槽系統將吐出液供給至二次槽；及複數條二次流 路，其將二次槽與頭單元相連接，並從二次槽分別將吐出液 供給至各液滴吐出頭；且一次流路的條數係少於二次流路的 條數。 再者，於專利文獻2揭示有一種液晶滴下裝置，其特徵在 於包含有：平台，其用以放置基板；分配器頭，其具備可用 以對基板滴下或塗佈液晶之注射器與喷嘴；頭支持構件，其 設置於平台的周邊且支持分配器頭；供給管線，其對分配器 頭的注射器供給滴下或塗佈於基板上的液晶；收受管線，其 連接於分配器頭的注射器；及雜質物防止蓋，其係供給管線 及收受管線的連接部且設置於其中任一方側，防止當該等管 線相互連結或分離時發生雜質物流入之情形；且藉由頭支持 構件與分配器頭從平台上部分開並移動至供給管線所在位 置側，構成為收受管線連結於供給管線而可從液晶供給器對 100133333 4 201221229 注射器填充液晶。 [先行技術文獻] [專利文獻] /十、f W符開 2ϋϋ4-16743ϋ 專利文獻 專利文獻2 .日本專利特開2〇〇9_172585號公報 【發明内容】 (發明所欲解決之問題） 然而’於文獻1的裝置中，因為液體供給流路（ 儲槽連接至頭，因此於液體中不易混入氣泡與微粒， 顧為頭在進㈣對移動日抒路亦會—起移動，因“ 量其移動範圍而増長管路，使其具有餘裕而配 二'考 化的原因。心—編’此峨為管路提早劣 再者’於文獻2的货罢士 行分離/連結，因此關’ 成為在配管的途中能進 U此關於液體供給流 題’但相反地因為成為利用連結部接觸的問 :分的摩擦會成為產生微粒職㈣題。除此存在此 質物防止盍之鉸鏈或凸輪等零件亦本、構成雜 擦而成為產生微粒的原因。 ^本身動作部分的摩 而且，於文獻2的敦置中， 方直接注入注射器的機構，因此從上=係成為將液體從上 下方積蓄《的以，此時料致會撞擊 100133333 201221229 因此’本發明之目的在於提供一種可解決上述問題的液體 自動供給機構及具備此機構之塗佈裝置。 (解決問題之手段） 本發明者為解決液體材料儲存部與吐出裝置暫時性或平 時因物理性連接所造成之弊端’㈣用使液體材料儲存部與 吐出裝置平時分離的構造。而且，藉由設置解除因平以 體材料儲存部與吐出裝置分離所產生氣泡之料的氣^ 可提供氣泡不會流入吐出裝置的液體自動供給機構 及，、備此機構之塗佈裝置。 且=有第係關於—種液體自動供給機構，其特徵在於 -備有.讀儲存部，其儲存液體材料；供給部，其 給在液體儲存部·叙液雜料的供給 直 有接收從供給部 收又。卩’其具 =-_二==:::: 動至收觉口位於供仏 又。P移 ㈣㈣、$位置’從供給口接受液 "丨、，下供給，並將利用氣泡去除機構去 材料，供給至吐出裝置。 W稱去除乳泡的液體 =發明係如第1發明，其中，氣泡去除機構传I備有 就泡去除用”-存液赌料；流 t端=音 於氣泡，器所儲存的液體内，另一端則與收=: Udif ’其1係浸潰於氣泡 r 體内，另-端則與吐出裝置相連通。W所儲存的液 100133333 201221229 第3發明係如第2發明，其中，氣泡去除機構係具備有： 泵裝置，其係對氣泡去除用容器進行減壓；及作動氣體供給 官，其一端係連接於泵裝置，另一端則配置於氣泡去除用容 器内的空間。 第4發明係如第2或3發明，其中，其具備有檢測裳置， 用以檢測液體儲存部及/或氣泡去除用容器内液體材料的 量。 第5發明係如第卜2或3發明，其中，收受口係具有經 擴徑的開口，且為可暫時性儲存—定量之液體材料的形狀。 第6發明係就第卜2或3發明，其中，其具備有液體材 料承接構件，用以在位於供給口正下方的第丨位置、與不同 料1 & i❸第2位置進行進退動作。 第7發明係如第卜2或3發明，其中，其具備有控制從 液體儲存部朝供給部的液體材料供給量之夾緊閥、及/或控 制攸收又。[5朝吐出裝置的液體材料供給量之夾緊闊。 ^發__塗料置’係其具備有：架台，其配設有 …件的平口，吐出裂置，其具有吐出液體材料的喷 ^動裝置，其使吐出裝置與平台進行相對移動；及第、^ 或3發明的液體自動供給機構。 第9發明係如第8發明，其中’其具 複數個吐出裝Hu, ^ 沿樑的延設== 置，其將各吐出裝置設為 °移動自如，且上述收受部係設置有與吐出農 100133333 201221229 置相同數量。 第10發明係如第9發明，其中，上述供給部係配設有複 數個。 第11發明係如第8發明，其中，其具備有覆蓋平台與吐 出裝置的蓋體。 第12發明係如第9發明，其中，其具備有覆蓋著平台與 吐出裝置的蓋體。 第13發明係如第10發明，其中，其具備有覆蓋著平台與 吐出裝置的蓋體。 第14發明係如第11發明，其中，上述液體儲存部係配設 於上述蓋體的外侧。 第15發明係如第12發明，其中，上述液體儲存部係配設 於上述蓋體的外側。 第16發明係就第13發明，其中，上述液體儲存部係配設 於上述蓋體的外侧。 (發明效果） 根據本發明，因為並不需要將液體材料儲存部與吐出裝置 以物理性連接，且未配設有可隨吐出裝置的移動變化形狀的 液體供給流路（管路），因此可解決當配設液體供給流路時的 空間問題與液體供給流路的劣化問題。 再者，因為不需使液體材料儲存部側與吐出裝置側接觸就 可供給液體材料，因此可有效地防止微粒產生及混入。 100133333 8 201221229 而且，因為設有氣泡去除機構，因此可防止氣泡流入吐出 裝置。 【實施方式】 以下，針對為了實施本發明的一形態進行說明。 於圖1係表示說明本發明液體自動供給機構的示意圖。於 同圖中，實心箭頭係表示液體的流動，空心箭頭係表示氣體 的流動。 液體自動供給機構1，其主要構成要件係包含槽（液體材 料儲存部)4、供給部2、收受部3、及收受部驅動裝置；該 儲槽4係儲存液體材料26的大容量儲槽；該供給部2係具 備有將從儲槽4所送出的液體材料26排出之供給口 12;該 收受部3係與吐出裝置24 —體地設置在吐出裝置24上部， 且接收從供給部2所排出的液體材料26 ;該收受部驅動裝 置係使收受部3進行移動。此等之中，從儲槽4至供給部2 為止係利用配管8A相連結，從收受部3至吐出裝置24為 止係利用配管8B、8C相連結。供給部2與收受部3之間係 離開為開閉器15可自由通過的距離。又，在儲槽4與供給 部2途中的配管8A上，於供給部2附近設有控制對供給部 2的流動之閥A9，在儲槽4中設有用以檢測儲槽4内液體 材料26之殘量的檢測裝置7。藉由設置檢測裝置7，當液體 材料26低於既定量時，就可根據來自檢測裝置7的信號發 出警報。於此，作為檢測裝置7係可使用例如利用重量進行 100133333 9 201221229 檢測的荷重計等。除此之外，亦可使用例如：利用超音波檢 測液面的超音波感測器、或利用光量的差異檢測有無液體的 光感測器等。 在供給部2設置有具備供給口 12的供給管13，該供給口 12係用以將從儲槽4所送至的液體材料26排出。供給管13 係在排出側端朝下彎曲，並將液體材料26滴落而供給（滴下 供給）至收受部3。供給部2與收受部3並未利用配管進行 連結，且亦沒有供給部2下降、或收受部3上昇之情形。即， 供給口 12並未連接於收受口 16，而是從分開位置在非接觸 的狀態下供給液體材料，藉此可防止微粒產生，俾可防止微 粒混入液體材料26中。又，在供給管13下方具備有當從供 給口 12有多餘的液體材料26滴落時用以承接此多餘液體材 料26的開閉器15。開閉器15具有在上表面開口的儲存用 凹部，可沿水平方向進行滑動動作，且除了在供給時以外的 時間均位於供給口 12的正下方。又，開閉器15並未接觸到 供給口 12與收受口 16。此亦與上述同樣，係為了不使微粒 產生。[Technical Field] The present invention relates to a liquid automatic supply mechanism capable of preventing bubbles and fine particles from being mixed into a liquid, and a coating device having the same. [Prior Art] In the step of manufacturing a liquid crystal display, there is a step of attaching two opposite substrates to each other to form a liquid crystal layer (also referred to as a panel assembling step). In particular, when manufacturing a large panel, a dropping method in which liquid crystal is dropped on one of the substrates before bonding and then bonded is used. In the dropping injection method, in order to drop the liquid crystal onto the substrate, a container having a liquid crystal is used, and a nozzle of the container is used to discharge a predetermined amount of a so-called dispenser by a gas pressure or a mechanical pressure. Device. In recent years, with the increase in the size of liquid crystal displays, the substrates of their raw materials have also increased in size. When the size of the substrate is increased, the amount of liquid crystal used is also increased. Therefore, it is difficult to cope with a small storage container (syringe) used as a dispenser. In the case of a small storage container, the liquid crystal is quickly used up, and the replacement of the container or the like tends to be frequent, which results in a decrease in efficiency in terms of productivity and workability. Further, when the storage container is replaced, there is a risk that air bubbles or foreign matter (hereinafter referred to as "fine particles" may be mixed in. On the other hand, there are various attempts to solve such problems by providing a large storage tank outside the apparatus and supplying liquid material from the large storage tank. 100133333 3 201221229 For example, Patent Document 1 discloses a droplet discharge device including: a device body; a placement portion that can mount a workpiece; and a head unit having a plurality of droplets that discharge droplets to the workpiece a head unit support body supporting the head unit; a moving mechanism for relatively moving the workpiece mounting portion and the head unit support; the primary slot system having at least one primary slot, the primary slot system being stored from each The liquid droplets spit out the spit liquid discharged from the head, and can replace and/or replenish the discharge liquid; the secondary tank is fixed to the head unit support body and flows into the discharge liquid from the primary tank; the primary flow path, which will be the primary tank system Connected to the secondary tank, and supplies the discharge liquid to the secondary tank from the primary tank system; and a plurality of secondary flow paths that connect the secondary tank to the head unit and supply the discharge liquid from the secondary tank The droplets are discharged to the head; and the number of the primary flow paths is less than the number of the secondary flow paths. Further, Patent Document 2 discloses a liquid crystal dropping device characterized by comprising: a platform for placing a substrate; a dispenser head having a syringe and a nozzle for dropping or coating a liquid crystal to the substrate; a member disposed at a periphery of the platform and supporting the dispenser head; a supply line supplying the liquid crystal dropped or coated on the substrate to the syringe of the dispenser head; a receiving line connected to the syringe of the dispenser head; and an impurity a cover, which is a connection portion of the supply line and the receiving line, and is disposed on either side thereof to prevent the occurrence of the inflow of impurities when the lines are connected or separated from each other; and the head support member and the dispenser head from the platform The upper portion is separated and moved to the side of the supply line, and the receiving line is connected to the supply line to fill the liquid crystal from the liquid crystal supplier pair 100133333 4 201221229. [Provisional Technical Documents] [Patent Literature] /10, f W, 2, 4, 16, 743, pp. Patent Document 2, Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. 9-172585 (Invention) In the apparatus of Document 1, because the liquid supply flow path (the storage tank is connected to the head, it is difficult to mix air bubbles and particles in the liquid, and the head is moving forward (4), and the moving sun road will also move, because "the amount of movement The scope is long and the pipeline is long, so that it has the margin and the second is the reason for the examination. The heart-editing 'this is the pipeline is better than the earlier one', the separation and connection of the goods in the literature 2, so the 'become in On the way of the piping, it is possible to enter the liquid supply flow problem, but on the contrary, because it is contacted by the joint portion, the friction of the minute will become the problem of the generation of the particle (4). In addition, there are parts such as hinges or cams that prevent the shackles. The reason for the formation of the microparticles is to cause the generation of the microparticles. ^In the case of the self-operating part, the mechanism of directly injecting into the syringe is in the middle of the document 2, so that the liquid is stored from above and below. At this time, the material will hit 100133333 201221229. Therefore, the object of the present invention is to provide a liquid automatic supply mechanism and a coating device having the same that solve the above problems. (Means for Solving the Problem) The present inventors have solved the liquid material storage. (4) A structure in which the liquid material storage portion and the discharge device are normally separated from each other by the physical connection between the portion and the discharge device. Further, by disposing the separation between the body material storage portion and the discharge device The gas which generates the bubble material can provide the liquid automatic supply mechanism in which the bubble does not flow into the discharge device, and the coating device of the mechanism, and the first system relates to the automatic liquid supply mechanism, which is characterized in that a reading storage unit for storing a liquid material, and a supply unit for directly receiving the supply of the liquid storage unit and the liquid material from the supply unit. 卩'its ==_二==:::: To the gestation port is located in the supply 仏. P move (four) (four), $ position 'receive liquid from the supply port' 丨,, supply, and use the bubble removal mechanism to feed the material to the spit The device is referred to as the first invention, wherein the bubble removing mechanism transmits a "bubble" for the bubble removal; the stream t ends = the sound is stored in the bubble, and the device stores In the liquid, the other end is connected to the == Udif '1 is impregnated in the bubble r body, and the other end is connected to the discharge device. The liquid stored in the W 100133333 201221229 The third invention is the second invention, wherein The bubble removing mechanism includes a pump device that decompresses the bubble removing container, and an operating gas supply officer that is connected to the pump device at one end and to the space inside the bubble removing container at the other end. According to a second or third aspect of the present invention, there is provided a method of detecting a skirt for detecting a liquid material in a liquid storage portion and/or a bubble removing container. The invention of claim 5, wherein the receiving port has an enlarged diameter opening and is in a shape capable of temporarily storing a quantitative liquid material. According to a sixth aspect of the invention, there is provided a liquid material receiving member for performing a forward and backward movement at a second position directly under the supply port and at a second position of the different material 1 & According to a seventh aspect of the invention, there is provided the invention of the second or third aspect, wherein the clamping valve is provided with a supply amount of the liquid material from the liquid storage portion to the supply portion, and/or the control is collected. [5] The liquid material supply amount of the discharge device is wide. _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The automatic liquid supply mechanism of the invention of ^, or 3. According to a ninth aspect of the present invention, in the eighth aspect of the invention, the plurality of discharge devices Hu, ^ are arranged along the beam ==, and each of the discharge devices is set to be freely movable, and the receiving portion is provided with a spit out 100133333 201221229 Set the same quantity. According to a ninth aspect of the invention, in the ninth aspect, the plurality of supply units are provided. According to an eleventh aspect of the invention, the eighth aspect of the invention includes the cover body covering the platform and the discharge device. A twelfth invention is the ninth invention, which is provided with a lid covering the platform and the discharge device. According to a thirteenth aspect of the invention, in the tenth aspect of the invention, there is provided a cover body covering the platform and the discharge device. According to a fourteenth aspect, the liquid storage unit is disposed on an outer side of the lid body. According to a twelfth aspect of the invention, the liquid storage unit is disposed outside the lid body. According to a thirteenth invention, the liquid storage unit is disposed on an outer side of the lid body. (Effect of the Invention) According to the present invention, since it is not necessary to physically connect the liquid material storage portion and the discharge device, and the liquid supply flow path (pipe) which can change shape with the movement of the discharge device is not provided, The problem of space when the liquid supply flow path is disposed and the deterioration of the liquid supply flow path are solved. Further, since the liquid material can be supplied without contacting the liquid material storage portion side with the discharge device side, generation and mixing of particles can be effectively prevented. 100133333 8 201221229 Moreover, since the bubble removing mechanism is provided, it is possible to prevent air bubbles from flowing into the discharge device. [Embodiment] Hereinafter, an aspect of the present invention will be described. Fig. 1 is a schematic view showing the automatic liquid supply mechanism of the present invention. In the same figure, solid arrows indicate the flow of liquid, and open arrows indicate the flow of gas. The liquid automatic supply mechanism 1 mainly comprises a tank (liquid material storage portion) 4, a supply portion 2, a receiving portion 3, and a receiving portion driving device; the storage tank 4 is a large-capacity storage tank for storing the liquid material 26; The supply unit 2 includes a supply port 12 for discharging the liquid material 26 sent from the reservoir 4; the receiving unit 3 is integrally provided with the discharge device 24 on the upper portion of the discharge device 24, and is received from the supply unit 2 The discharged liquid material 26; the receiving portion driving device moves the receiving portion 3. Among these, the storage pipe 8 is connected to the supply unit 2 by the pipe 8A, and the receiving unit 3 to the discharge device 24 are connected by the piping 8B and 8C. The distance between the supply unit 2 and the receiving unit 3 is a distance through which the shutter 15 can pass freely. Further, in the pipe 8A in the middle of the storage tank 4 and the supply unit 2, a valve A9 for controlling the flow to the supply unit 2 is provided in the vicinity of the supply unit 2, and a liquid material 26 for detecting the liquid material in the storage tank 4 is provided in the storage tank 4. The detection device 7 of the remaining amount. By providing the detecting means 7, when the liquid material 26 is lower than the predetermined amount, an alarm can be issued based on the signal from the detecting means 7. Here, as the detecting device 7, for example, a load cell or the like which is detected by weight 100133333 9 201221229 can be used. In addition to this, for example, an ultrasonic sensor that detects a liquid level by ultrasonic waves or a photosensor that detects the presence or absence of a liquid using a difference in the amount of light can be used. The supply unit 2 is provided with a supply pipe 13 having a supply port 12 for discharging the liquid material 26 sent from the storage tank 4. The supply pipe 13 is bent downward at the discharge side end, and the liquid material 26 is dropped and supplied (dropped and supplied) to the receiving portion 3. The supply unit 2 and the receiving unit 3 are not connected by a pipe, and the supply unit 2 is not lowered or the receiving unit 3 is raised. Namely, the supply port 12 is not connected to the receiving port 16, but the liquid material is supplied from the separated position in a non-contact state, whereby generation of particles can be prevented, and the particles can be prevented from being mixed into the liquid material 26. Further, under the supply pipe 13, a shutter 15 for receiving the excess liquid material 26 when the excess liquid material 26 is dropped from the supply port 12 is provided. The shutter 15 has a storage recess opened at the upper surface, and is slidable in the horizontal direction, and is located immediately below the supply port 12 except for the time of supply. Further, the shutter 15 does not come into contact with the supply port 12 and the receiving port 16. This is also the same as described above in order not to cause particles to be generated.
收受部3配設有：漏斗17、氣泡去除用瓶18、及閥B10 與閥C11，且分別利用配管8進行連結。該漏斗17係具有 接收從供給部2所供給之液體材料26的收受口 16。該氣泡 去除用瓶18係暫時地積蓄所供給的液體材料26，並施行氣 泡的去除。該閥B10與閥C11係控制液體的流動。閥A〜C 100133333 10 201221229 係若考慮維護性，較佳係使用藉由夾入配管使配管產生彈性 變形用以進行流路開閉的夾緊閥。夾緊闕由於閥本身不會接 觸到液體，因此在執行配管更換等情況時可使作業較為容 易。又，亦不存在因閥動作所產生的微粒混入的情形。於此， 閥B10係對流入瓶18進行控制，而閥C11係對從瓶18的 流出進行控制。從漏斗17流入瓶18的液體材料26，係經 由流入管19所進行，而從瓶18對吐出裝置24的液體材料 26的送出則經由流出管20所進行。又，因為漏斗17配設 於比瓶18高的位置，因此液體材料26即便不借助於壓力等 亦可自然流下，俾可積蓄於容量比儲槽4小的瓶（氣泡去除 用容器）18中。 氣泡去除用的瓶18係與連接於作動氣體供給管21的增減 壓泵（未圖示）一起構成氣泡去除機構41。增減壓泵係供給當 從瓶18朝吐出裝置24送出液體材料26時所作用的壓縮氣 體、以及當將瓶18内的液體材料26之氣泡去除時所作用的 真空。增減壓泵亦可併用為供將工件吸附於平台上的真空 源。又，當可利用吐出裝置側的抽吸手段(例如柱塞)抽吸瓶 18内液體材料的情況時，亦可取代增減壓泵而使用減壓 泵。瓶18係由玻璃或硬質之樹脂等透明材質所製作，可確 認充滿内部的液材材料之液面位置、及氣泡混入狀況。又， 在瓶18的外側面附近，於上限位置（元件符號22)及下限位 置（元件符號23)設有檢測瓶18内之液面的感測器。於此， 100133333 11 201221229 作為感測器可使用利用光量不同檢測液體有無的光感測器 等。如後述，瓶18所連接各種管之關係，較佳為可正確地 捕捉到液面位置者。 收受部3利用收受部驅動裝置可沿水平方向移動，俾可在 供給口 12的正下方將位於收受口 16白勺中央設為供給位置。 在收受部3的下方配設有吐出裝置24，且利用配管叱與收 受部3進行連結。吐出裝置24係利用收受部3供給已去除 亂=液體材料26，並㈣嘴38進行液體材料％的流出。 種動上料止的雜自純'錢構1會進行何 二t與::槽液體材料26’並連接壓縮_ 雜斷可設置已填充_料二:=填充液 給壓縮氣體進行加壓(步驟2) : ’: …、後，使收受部3與吐出裝置24 方的供給位K牛 至供給部2下 鴨：：Λ後，_ 驟4)。如此一來，從供給口 12將 並經由收受部3 _σ16注人至漏;^料26, 事先將閥Β1()與閥C11開啟。其後次：此時， B則〜19流入至瓶18中(步驟 液體材料％雖然自然地流下，但若事先、^如則述’ 瓶18内抽真空’便可加速供給速度若11 ’並對 100133333 人右瓶18内的液The receiving unit 3 is provided with a funnel 17, a bubble removing bottle 18, a valve B10 and a valve C11, and are connected by a pipe 8 respectively. The funnel 17 has a receiving port 16 for receiving the liquid material 26 supplied from the supply unit 2. The bubble removing bottle 18 temporarily accumulates the supplied liquid material 26 and performs the removal of the bubble. The valve B10 and the valve C11 control the flow of the liquid. Valves A to C 100133333 10 201221229 In consideration of maintainability, it is preferable to use a pinch valve that elastically deforms a pipe by inserting a pipe to open and close a flow path. Since the clamp itself does not come into contact with the liquid, it is easier to perform the piping replacement. Moreover, there is no case where particles generated by the valve operation are mixed. Here, the valve B10 controls the inflow bottle 18, and the valve C11 controls the outflow from the bottle 18. The liquid material 26 flowing from the hopper 17 into the bottle 18 is carried by the inflow pipe 19, and the delivery of the liquid material 26 from the bottle 18 to the discharge device 24 is performed via the outflow pipe 20. Further, since the funnel 17 is disposed at a position higher than the bottle 18, the liquid material 26 can naturally flow down without being pressurized or the like, and can be stored in a bottle (bubble removing container) 18 having a smaller capacity than the reservoir 4. . The bottle 18 for removing bubbles constitutes a bubble removing mechanism 41 together with an increase/decrease pump (not shown) connected to the operating gas supply pipe 21. The pressure increasing and lowering pump supplies a compressed gas which acts when the liquid material 26 is sent from the bottle 18 to the discharge device 24, and a vacuum which acts when the air bubbles of the liquid material 26 in the bottle 18 are removed. The booster pump can also be used as a vacuum source for attaching the workpiece to the platform. Further, when the liquid material in the bottle 18 can be sucked by a suction means (for example, a plunger) on the discharge device side, a pressure reducing pump can be used instead of the pressure increasing and lowering pump. The bottle 18 is made of a transparent material such as glass or hard resin, and it is possible to confirm the liquid level of the liquid material filled inside and the state of air bubbles. Further, in the vicinity of the outer side surface of the bottle 18, a sensor for detecting the liquid level in the bottle 18 is provided at the upper limit position (element symbol 22) and the lower limit position (element symbol 23). Here, 100133333 11 201221229 As the sensor, a photo sensor or the like that detects the presence or absence of a liquid using a different amount of light can be used. As will be described later, the relationship between the various tubes to which the bottle 18 is attached is preferably such that the liquid level can be accurately captured. The receiving unit 3 is movable in the horizontal direction by the receiving unit driving device, and the center of the receiving port 16 can be set as the supply position directly under the supply port 12. A discharge device 24 is disposed below the receiving portion 3, and is connected to the receiving portion 3 by a pipe 叱. The discharge device 24 supplies the removed liquid material 26 by the receiving portion 3, and (4) the nozzle 38 performs the outflow of the liquid material %. The kind of feed from the pure material will be carried out by the two 't and:: trough liquid material 26' and connected to the compression _ miscellaneous can be set to fill _ material two: = filling liquid to pressurize the compressed gas ( Step 2): ': ..., after the supply position K of the receiving unit 3 and the discharge device 24 is supplied to the supply unit 2, the duck is lowered: Λ 骤 4). As a result, the supply port 12 is injected into the leak through the receiving portion 3_σ16, and the valve Β1() and the valve C11 are opened in advance. The next time: at this time, B then ~19 flows into the bottle 18 (the liquid material % flows naturally in the step, but if the vacuum is in the bottle 18 in advance, the supply speed can be accelerated by 11 ' and The liquid in the right bottle 18 of 100133333 people
12 201221229 體材料26到達上限感測器22位置，便關閉閥A9、閥BIO 及閥C11，使開閉器15進出，並關閉對儲槽4的加壓（步驟 7)。然後，利用作動氣體供給管21進行抽真空，並進行瓶 18内液體材料26之氣泡去除(步驟8)。於氣泡去除結束後， 再來便利用作動氣體供給管21供給壓縮氣體進行加壓（步 驟9)。接著，開啟閥C11，從流出管20將瓶18内的液體材 料26送出至吐出裝置24(步驟10)。若利用吐出裝置24所 進行的液體材料26填充完成時，便關閉閥C11，並停止對 瓶18的加壓（步驟11)。然後，利用吐出裝置24進行流出（步 驟12)。此時，在瓶18内的液體材料26到達下限感測器23 位置為止，每當吐出裝置24内的液體材料26變少就重複上 述步驟9至步驟11，對吐出裝置24填充液體材料26。又， 若瓶18内的液體材料26到達下限感測器23位置，便再度 執行上述步驟2至步驟8,將液體材料26供給至收受部3(步 驟13)。儲槽4内的液體殘量管理係利用檢測裝置7執行。 儲槽4的液體材料26之補充只要在供給動作以外的時間均 可進行。 如上述，即便未連結配管8，而從上方以滴落之方式進行 供給，因為會先利用收受部3的瓶18進行氣泡去除之後才 供給至吐出裝置24，因此氣泡不會流入吐出裝置24。又， 藉由未連結配管8，而從上方以滴落之方式進行供給，可在 進行供給時不會發生接觸與摩擦等，俾不會產生微粒。藉 100133333 13 201221229 此’因為可使用未混入氣泡與微粒混入的液體，故可進行精 密量的流出與對正確位置進行塗佈。 本發明可適用於液晶、油墨、有機EL材料、溶劑（乙醇、 丙酮等）、紫外線硬化樹脂等黏度在iOOOOcps以下的液體村 料’特別適用於黏度在l〇〇〇cps以下的液體材料。氣泡去除 機構係對應液體材料的種類，施加約50〜90kPa的負壓長約 1〜5分鐘。 以下，雖然已針對本發明之詳細内容利用實施例進行説 明’惟本發明並不因任何實施例而受限定者。 [實施例] 實施例係關於一種一邊使吐出裝置與保持工件的爭台進 行相對移動’一邊將液晶塗佈於工件上的塗佈裝置’使樑在 平台上移動之所謂「龍門式(gantry-type)」的塗佈裝置° 圖2所示係具備有實施例之液體自動供給機構的塗佈裝 置概略立體圖’而圖3所示係將實施例的自動供給機構主要 部分放大之圖式。以下，當說明圖2時，將設置有儲槽4 之側稱為「左」’將其對向側（元件符號9側)稱為「右」，將 設置有吐·出裝置24·之側稱為「前」’將其對向側稱為「％ …设」。 又，將左右方向設為「X方向」，將前後方向設為「γ 士丄 不向j 〇 塗佈裝置25 ’如圖2所示，係在架台29上設置平A & 並具備有使吐出液體材料26的吐出裝置24對平a α 進行 相對移動之樑驅動裝置（Υ驅動裝置)44及收受部驅動梦置 100133333 14 201221229 (X驅動裝置)43。該平台28係載置塗佈液體材料26的塗佈 對象物27(以下稱為「工件」）。Y驅動裝置44係具有支持 樑30的滑件、與在架台29上所配設的滑座，可使樑30在 平台28上沿前後方向（元件符號31)進行移動。吐出裝置24 係利用於樑30所設置的X驅動裝置43而可在樑30上沿左 右方向（元件符號32)進行移動。吐出裝置24係設置有複數 個相同物，所有的吐出裝置均可沿樑進行移動。再者，吐出 裝置24的數量係依照對工件27的塗佈方式所決定者，並不 受限於圖2所示數量。 而且，塗佈裝置25具備有覆蓋此等各裝置外周的蓋體 33。在以虛線所圖示的蓋體33，於前面側設有供作業者進 入内部的門（未圖示），俾於執行吐出裝置24等的維護作業 時使用。又，在蓋體33的頂板部分具備有將去除微粒的空 氣供給至蓋體33内的空氣清淨裝置34。於此，作為空氣清 淨裝置34係可使用例如具備有風扇過濾器單元，即 HEPA(高效率粒子空氣）過濾器、ULPA(超高效率空氣）過濾 器等之小型送風機等。藉此，可保持蓋體33内，特別係較 平台28更上方的空間之潔淨度。然而，在塗佈裝置25係設 置於無塵室内、或設置於與其為同等級之清淨空間的情況 時，亦可不設置空氣清淨裝置34而使頂板具有大開口或撤 除頂板，俾導入保有潔淨度的空氣。再者，亦可使蓋體33 與架台29構成為一體，而覆蓋架台29上之各要件。 100133333 15 201221229 液體自動供給機構1係具有上述圖1的構造者，主要之構 成要件係包含有儲槽4、供給部2、收受部3、及X驅動裝 置43與Y驅動裝置44。該儲槽4係收納液體材料26。該 供給部2係具備有將從儲槽4所送出的液體材料26進行排 出之供給口 12。該收受部3係在吐出裝置24的上部與吐出 裝置24設置為一體，並接收從供給部2所排出的液體材料 26。該X驅動裝置43與Y驅動裝置44係使收受部3與吐 出裝置24進行相對移動。在液體自動供給機構1中，收納 液體材料26的儲槽4係可拆卸地固設於蓋體33的外側，而 具備有將液體材料26排出之供給口 12的供給部2係固設於 蓋體33的内側。又，如圖3所示，在吐出裝置24的上方， 使接收從供給部2所排出液體材料26的收受部3係與吐出 裝置24設置為一體，並利用X驅動裝置43 —體地移動。 在利用Y驅動裝置44將樑30移動至收受部3附近，並利 用X驅動裝置43將與吐出裝置24為一體的收受部3移動 至供給部2下方的供給位置處，收受部3將接收從供給部2 的液體材料26之供給。如圖2所示，當吐出裝置24係設置 有複數個的情況，便在每個吐出裝置24個別設置收受部3。 從儲槽4至供給部2為止係利用配管8A進行連結，而從 收受部3至吐出裝置24為止係利用配管8B、8C進行連結， 且供給部2與收受部3間互相分開。在儲槽4與供給部2 之間，在蓋體33内側之對應於供給部2附近固設有控制供 100133333 16 201221229 給部2的流動之閥A9。在儲槽4的下方設有用以檢測儲槽 4内之液體材料26殘量的檢測裝置7。從儲槽4朝向供給部 2的配管8，係在臨近儲槽4處貫通蓋體33並進入蓋體33 内。即，僅有儲槽4與檢測裝置7設置於蓋體33外。藉由 將經常進行填充或更換等作業的儲槽4設置於蓋體33外， 可盡量減少微粒被帶入蓋體33内。除此之外，即便於塗佈 裝置25進行塗佈動作中亦可進行對儲槽4之作業。 液體自動供給機構1的供給口 12之數量，較佳為可配合 吐出裝置24的數量進行變更。這是因為當複數個吐出裝置 24緊密地排列於樑30之其中一侧時的合計寬度，超過左右 方向之行程長度的一半時，即便在樑上的1處設置供給口 12，仍無法將所有的吐出裝置24移動至此供給口 12處。於 此情況，在2處以上設置供給口 12，構成為使複數個吐出 裝置24可移動至任一供給口 12。 如上述，於實施例的塗佈裝置25中，因為供給部2與收 受部3之間互相分離，因此配管8不會與吐出裝置24或流 出部驅動裝置一起移動。所以，不會存在為了平順地驅動而 加長配設配管、或因配管移動導致提早劣化的問題。 其次，針對液體自動供給機構1的詳細内容一邊參照圖3 一邊進行說明。於同圖中，實心箭頭係表示液體的流動，空 心箭頭則表示氣體的流動。 在供給部2中設置有供給管13。該供給管13具備有將從 100133333 17 201221229 儲槽4所送至的液體材料26排出之供給口 12。供給管13 係在途中支持於支持構件14,且在供給口 12附近朝下彎 曲。於此從供給口 12至支持構件14為止的部分，係由金屬 等可保持形狀的材料所製成。在供給管14的下方，具備有 開閉器15。該開閉器15係當從供給口 12滴落多餘液體材 料26時用以接收該多餘液體材料26。開閉器15係形成為 上表面開口的柄杓狀（具有柄之容器狀），並進行滑動動作， 除了在供給以外的時間均位於供給口 12之正下方。 收受部3係由3個部位所構成，在最高位置處配設具有接 收從供給部3所供給之液體材料26之收受口 16的漏斗17, 在最低位置處配設有將所供給的液體材料26,暫時積蓄並 進行氣泡去除的瓶18。然後在漏斗17與瓶18的中間位置 處，排列地配設有控制液體流動的閥B10及閥C11。漏斗 17係以使上端成為收受口 16的方式開口，而使液體材料26 從供給口 12滴下供給。於此，因為蓋體33内保有潔淨度， 因此即便收受口 16朝上部開口，亦不存在微粒混入的危險。 氣泡去除用的瓶18係與作動氣體供給管21所連接的增減 壓泵（未圖示）一起構成氣泡去除機構41。增減壓泵係供給當 從瓶18朝吐出裝置24送出液體材料26時所作用的壓縮氣 體、及當將瓶18内的液體材料26之氣泡去除時所作用的真 空。 再者，在瓶18的外側面附近，於上限位置（元件符號22) 100133333 18 201221229 及下限位置（元件符號23)設有檢測瓶18内液面的感測器。 上限感測器22係配置於比作動氣體供給管21的出口下方之 位置，而下限感測器23則配置於比流出管20的入口上方之 位置。如此一來，可防止從作動氣體供給管21吸入液體材 料26、或從流出管20吸入氣體。 收受部3係設置於比供給部2低之位置，且當供給部2 移動至收受部3下方時不會接觸到供給部2的位置。在收受 部3的下方一體地配設有吐出裝置24。吐出裝置24係被供 給利用收受部3去除氣泡後的液體材料26，並進行對工件 27的流出。於本實施例中，雖然作為吐出裝置24係圖示柱 塞式之吐出裝置，但當然亦可使用柱塞式吐出裝置以外的吐 出裝置。可適用的吐出裝置例示有：對在前端設有喷嘴的注 射器内之液體材料，施加所需時間經調壓之空氣的空氣式 者；具有平面配管機構或旋轉配管機構的配管式者；利用螺 桿的旋轉吐出液體材料的螺桿式者；將經施加所需壓力的液 體材料利用閥之開閉進行流出控制的閥式者等。 本實施例的柱塞式吐出裝置24係具備有管形狀之計量部 36、内接於計量部36的柱塞35、具有流出口 39的喷嘴38、 及可切換計量部36與喷嘴38及計量部36與流入口 40的連 通之切換閥37。然後，使在計量部36内密接地進退移動的 柱塞35高速地進出移動，將液體材料26從流出口 39連續 (continuously projectile)流出。 100133333 19 201221229 混入 亦可藉由設置複數個氣泡去除機構41更確實地防止《、包 另外，亦可取縣實施儀^絲機構4ι =:所示不具有增減壓泵的簡易氣泡一 將』官20的入口設置於離開氣泡去除用容器^之底面的 上方’可防止沉積於底面、或在底面附近浮動的微粒似皮 吸入。該簡易的氣泡去除機構係於期望收受部3 常有效果。 i τ t 【圖式簡單說明】 圖1係說明本發明之顏自動供給機_示意圖。 略立體圖 圖2係具備實施例之液體自動供給機構的塗佈裝置之概 圖 放大圖。 係將實施例之賴自動供給機構社要部分放大之 圖4係表示實_之氣泡去除機構之另—態樣的側視圖。 【主要元件符號說明】 液體自動供給機構 : 供給部 收受部 儲槽(液體材料儲存部） 壓縮氣體供給管 ' 液體送出管 100133333 20 201221229 7 8、8A、8B、8C 9 * 10 - 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 檢測裝置 配管12 201221229 When the body material 26 reaches the position of the upper limit sensor 22, the valve A9, the valve BIO and the valve C11 are closed, the shutter 15 is moved in and out, and the pressurization of the reservoir 4 is closed (step 7). Then, evacuation is performed by the operating gas supply pipe 21, and bubble removal of the liquid material 26 in the bottle 18 is performed (step 8). After the bubble removal is completed, the compressed gas is supplied to the moving gas supply pipe 21 to be pressurized (step 9). Next, the valve C11 is opened, and the liquid material 26 in the bottle 18 is sent out from the outflow pipe 20 to the discharge device 24 (step 10). When the filling of the liquid material 26 by the discharge device 24 is completed, the valve C11 is closed and the pressurization of the bottle 18 is stopped (step 11). Then, the discharge is performed by the discharge device 24 (step 12). At this time, until the liquid material 26 in the bottle 18 reaches the position of the lower limit sensor 23, the above-described steps 9 to 11 are repeated every time the liquid material 26 in the discharge device 24 is reduced, and the discharge device 24 is filled with the liquid material 26. Further, if the liquid material 26 in the bottle 18 reaches the position of the lower limit sensor 23, the above steps 2 to 8 are again performed, and the liquid material 26 is supplied to the receiving portion 3 (step 13). The liquid residual amount management in the storage tank 4 is performed by the detecting device 7. The replenishment of the liquid material 26 of the reservoir 4 can be performed at any time other than the supply operation. As described above, even if the pipe 8 is not connected, the supply is performed by dripping from above, and since the bubble is removed by the bottle 18 of the receiving unit 3 before being supplied to the discharge device 24, the bubble does not flow into the discharge device 24. Further, by not connecting the pipe 8, the supply is dripped from above, so that contact, friction, and the like are not generated when the supply is performed, and no particles are generated. By 100133333 13 201221229 This is because a liquid that is not mixed with air bubbles and particles can be used, so that a precise amount of outflow can be performed and the correct position can be applied. The present invention is applicable to liquid materials such as liquid crystals, inks, organic EL materials, solvents (ethanol, acetone, etc.), ultraviolet curable resins and the like having a viscosity of less than iOOOOcps, which is particularly suitable for liquid materials having a viscosity of less than 10 cps. The bubble removing mechanism corresponds to the type of the liquid material, and a negative pressure of about 50 to 90 kPa is applied for about 1 to 5 minutes. In the following, the embodiments are described with reference to the details of the present invention. The invention is not limited by any embodiments. [Embodiment] The embodiment relates to a so-called "gantry-type" in which a coating device that applies a liquid crystal to a workpiece while moving a sheet between a discharge device and a workpiece is moved. The coating apparatus of the type "FIG. 2 is a schematic perspective view of the coating apparatus provided with the liquid automatic supply mechanism of the embodiment", and FIG. 3 is an enlarged view of the main part of the automatic supply mechanism of the embodiment. Hereinafter, when the description of FIG. 2 is described, the side on which the reservoir 4 is provided is referred to as "left", and the opposite side (on the side of the component symbol 9) is referred to as "right", and the side of the discharge/discharge device 24 is provided. It is called "front" and its opposite side is called "% ... set". In addition, the left-right direction is set to "X direction", and the front-rear direction is set to "γ 丄 丄 not to j 〇 coating device 25'. As shown in Fig. 2, the gantry 29 is provided with a flat A & The discharge device 24 that discharges the liquid material 26 moves the beam drive device (Υ drive device) 44 and the receiving portion to drive the flat device 100133333 14 201221229 (X drive device) 43. The platform 28 is placed on the coating liquid. The object 27 to be coated of the material 26 (hereinafter referred to as "workpiece"). The Y driving device 44 has a slider for supporting the beam 30 and a slider disposed on the gantry 29, so that the beam 30 can be moved on the platform 28 in the front-rear direction (element symbol 31). The discharge device 24 is movable on the beam 30 in the left-right direction (element symbol 32) by the X drive unit 43 provided in the beam 30. The discharge device 24 is provided with a plurality of identical objects, and all of the discharge devices are movable along the beam. Further, the number of the discharge devices 24 is determined in accordance with the manner of coating the workpieces 27, and is not limited to the number shown in Fig. 2. Further, the coating device 25 is provided with a lid 33 that covers the outer periphery of each of the devices. In the lid body 33 shown by a broken line, a door (not shown) for allowing the operator to enter the inside is provided on the front side, and is used when performing maintenance work such as the discharge device 24. Further, the top plate portion of the lid body 33 is provided with an air cleaning device 34 for supplying air for removing particulates into the lid body 33. Here, as the air cleaning device 34, for example, a small air blower including a fan filter unit, that is, a HEPA (High Efficiency Particle Air) filter, a ULPA (Ultra High Efficiency Air) filter, or the like can be used. Thereby, the cleanliness of the space inside the cover 33, in particular above the platform 28, can be maintained. However, when the coating device 25 is installed in a clean room or in a clean space of the same level, the air cleaning device 34 may not be provided, and the top plate may have a large opening or a top plate, and the cleanliness may be introduced. air. Further, the lid body 33 and the gantry 29 may be integrally formed to cover the respective components on the gantry 29. 100133333 15 201221229 The liquid automatic supply mechanism 1 has the structure of Fig. 1 described above, and the main constituent elements include a reservoir 4, a supply unit 2, a receiving unit 3, and an X driving unit 43 and a Y driving unit 44. This storage tank 4 accommodates the liquid material 26. The supply unit 2 is provided with a supply port 12 for discharging the liquid material 26 sent from the reservoir 4. The receiving unit 3 is integrally provided with the discharge device 24 at the upper portion of the discharge device 24, and receives the liquid material 26 discharged from the supply unit 2. The X drive unit 43 and the Y drive unit 44 relatively move the receiving unit 3 and the discharge unit 24. In the automatic liquid supply mechanism 1, the reservoir 4 that houses the liquid material 26 is detachably fixed to the outside of the lid body 33, and the supply portion 2 including the supply port 12 for discharging the liquid material 26 is fixed to the lid. The inside of the body 33. Further, as shown in Fig. 3, above the discharge device 24, the receiving portion 3 that receives the liquid material 26 discharged from the supply portion 2 is integrally formed with the discharge device 24, and is moved integrally by the X driving device 43. The beam drive 30 is moved to the vicinity of the receiving unit 3 by the Y driving device 44, and the receiving unit 3 integrated with the discharging device 24 is moved to the supply position below the supply unit 2 by the X driving device 43, and the receiving unit 3 receives the receiving unit. The supply of the liquid material 26 of the supply unit 2. As shown in Fig. 2, when a plurality of discharge devices 24 are provided, the receiving unit 3 is separately provided in each of the discharge devices 24. The connection from the storage tank 4 to the supply unit 2 is performed by the pipe 8A, and the connection is performed by the pipes 8B and 8C from the receiving unit 3 to the discharge device 24, and the supply unit 2 and the receiving unit 3 are separated from each other. Between the storage tank 4 and the supply unit 2, a valve A9 for controlling the flow of the supply portion 2 of the 100133333 16 201221229 is fixed to the inside of the lid body 33 corresponding to the vicinity of the supply portion 2. Below the reservoir 4 there is provided a detection device 7 for detecting the residual amount of liquid material 26 in the reservoir 4. The pipe 8 from the reservoir 4 toward the supply unit 2 penetrates the lid 33 and enters the lid 33 adjacent to the reservoir 4. That is, only the reservoir 4 and the detecting device 7 are disposed outside the lid 33. By arranging the storage tank 4, which is often subjected to filling or replacement, to the outside of the lid body 33, it is possible to minimize the introduction of particles into the lid body 33. In addition to this, the operation of the storage tank 4 can be performed even when the coating device 25 performs the coating operation. The number of the supply ports 12 of the liquid automatic supply mechanism 1 is preferably changed in accordance with the number of the discharge devices 24. This is because when the total width when a plurality of discharge devices 24 are closely arranged on one side of the beam 30 exceeds half the stroke length in the left-right direction, even if the supply port 12 is provided at one position on the beam, it is impossible to The discharge device 24 is moved to the supply port 12. In this case, the supply port 12 is provided at two or more positions, so that the plurality of discharge devices 24 can be moved to any of the supply ports 12. As described above, in the coating device 25 of the embodiment, since the supply unit 2 and the receiving unit 3 are separated from each other, the pipe 8 does not move together with the discharge device 24 or the discharge portion drive device. Therefore, there is no problem that the piping is lengthened to drive smoothly, or the piping is moved to cause early deterioration. Next, the details of the liquid automatic supply mechanism 1 will be described with reference to Fig. 3 . In the same figure, a solid arrow indicates the flow of liquid, and a hollow arrow indicates the flow of gas. A supply pipe 13 is provided in the supply unit 2. The supply pipe 13 is provided with a supply port 12 for discharging the liquid material 26 sent from the storage tank 4 of 100133333 17 201221229. The supply pipe 13 is supported on the support member 14 on the way and bent downward in the vicinity of the supply port 12. Here, the portion from the supply port 12 to the support member 14 is made of a material capable of retaining a shape such as metal. A shutter 15 is provided below the supply pipe 14. The shutter 15 is for receiving the excess liquid material 26 when the excess liquid material 26 is dropped from the supply port 12. The shutter 15 is formed in a shank shape (a container shape having a shank) having an open upper surface, and is slidably operated, and is located immediately below the supply port 12 except for the supply. The receiving unit 3 is composed of three parts, and a funnel 17 having a receiving port 16 for receiving the liquid material 26 supplied from the supply unit 3 is disposed at the highest position, and the supplied liquid material is disposed at the lowest position. 26. A bottle 18 that temporarily accumulates and performs bubble removal. Then, at a position intermediate the funnel 17 and the bottle 18, a valve B10 for controlling the flow of the liquid and a valve C11 are arranged in line. The funnel 17 is opened so that the upper end becomes the receiving port 16, and the liquid material 26 is dripped and supplied from the supply port 12. Here, since the inside of the lid body 33 is kept clean, there is no risk of particles being mixed even if the receiving port 16 is opened toward the upper portion. The bottle 18 for removing bubbles constitutes a bubble removing mechanism 41 together with an increase/decrease pump (not shown) connected to the operating gas supply pipe 21. The pressure increasing and lowering pump supplies a compressed gas which acts when the liquid material 26 is sent from the bottle 18 to the discharge device 24, and a vacuum which acts when the air bubbles of the liquid material 26 in the bottle 18 are removed. Further, in the vicinity of the outer side surface of the bottle 18, a sensor for detecting the liquid level in the bottle 18 is provided at the upper limit position (element symbol 22) 100133333 18 201221229 and the lower limit position (element symbol 23). The upper limit sensor 22 is disposed below the outlet of the actuating gas supply pipe 21, and the lower limit sensor 23 is disposed above the inlet of the outflow pipe 20. As a result, it is possible to prevent the liquid material 26 from being sucked from the operating gas supply pipe 21 or sucking the gas from the outflow pipe 20. The receiving unit 3 is disposed at a position lower than the supply unit 2, and does not contact the position of the supply unit 2 when the supply unit 2 moves below the receiving unit 3. A discharge device 24 is integrally disposed below the receiving portion 3. The discharge device 24 is supplied with the liquid material 26 from which the air bubbles are removed by the receiving unit 3, and flows out to the workpiece 27. In the present embodiment, the discharge device 24 is a plug type discharge device, but it is of course possible to use a discharge device other than the plunger discharge device. Examples of applicable discharge devices include: an air type that applies a time-regulated air to a liquid material in a syringe having a nozzle at a tip end; a pipe type having a flat piping mechanism or a rotary piping mechanism; The screw type that rotates and discharges the liquid material; the valve type that performs the outflow control by opening and closing the valve with the liquid material to which the required pressure is applied. The plunger type discharge device 24 of the present embodiment includes a tube-shaped measuring unit 36, a plunger 35 that is inscribed in the measuring unit 36, a nozzle 38 having an outflow port 39, and a switchable metering unit 36 and a nozzle 38 and a metering unit. A switching valve 37 that communicates with the inflow port 40. Then, the plunger 35 that moves forward and backward in the metering portion 36 is moved in and out at a high speed, and the liquid material 26 flows out continuously from the outlet port 39. 100133333 19 201221229 Mixing can also be more reliably prevented by setting a plurality of bubble removing mechanisms 41, and can also be used as a simple bubble that does not have a pressure increasing and lowering pump. The inlet of 20 is disposed above the bottom surface of the container for removing the bubble to prevent the particles deposited on the bottom surface or floating near the bottom surface from being sucked into the skin. This simple bubble removing mechanism is often effective in the desired receiving portion 3. i τ t [Simplified description of the drawings] Fig. 1 is a schematic view showing the automatic feeding machine of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 2 is an enlarged schematic view of a coating apparatus provided with a liquid automatic supply mechanism of an embodiment. In the embodiment, the automatic supply mechanism is partially enlarged. Fig. 4 is a side view showing another aspect of the bubble removing mechanism. [Explanation of main component symbols] Liquid automatic supply mechanism: Supply section receiving section storage tank (liquid material storage section) Compressed gas supply pipe ' Liquid delivery pipe 100133333 20 201221229 7 8,8A, 8B, 8C 9 * 10 - 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 Detection device piping
閥AValve A
閥BValve B
閥C 供給口 供給管 支持構件 開閉器 收受口 漏斗 瓶（氣泡去除用容器） 流入管 流出管 作動氣體供給管 上限感測器 下限感測器 吐出裝置 塗佈裝置 液體材料 塗佈對象物(工件） 平台 100133333 21 201221229 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 架台 樑 樑移動方向 吐出裝置移動方向 蓋體 空氣清淨裝置 柱塞 計量部 切換閥 喷嘴 流出口 流入口 氣泡去除機構 微粒 收受部驅動裝置(X驅動裝置) 樑驅動裝置(Y驅動裝置） 100133333 22Valve C Supply port supply pipe support member shutter receiver port funnel bottle (bubble removal container) Inflow pipe outflow pipe actuation gas supply pipe upper limit sensor lower limit sensor discharge device coating device liquid material coating object (workpiece) Platform 100133333 21 201221229 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 Rack beam beam moving direction spouting device moving direction cover body air purifying device plunger metering part switching valve nozzle outflow port inlet bubble removing mechanism particle receiving Drive unit (X drive unit) Beam drive unit (Y drive unit) 100133333 22