201219988 六、發明說明： 【發明所屬之技術領域】 本發明係關於一種曝光裝置，係對於支撐在平台上 之被曝光體經由光罩來照射曝光光線以曝光形成既定 圖案，詳而言之，係關於一種曝光裝置，能以高解析度 來進行大面積被曝光體之非周期性的圖案曝光。 【先前技術】 此種習知之曝光裝置，係對於以一定速度受到搬運 之被曝光體經由光罩來間歇性地照射曝光光線，使得光 罩之罩體圖案曝光於特定位置，具備有：第丨攝像機 構’係配置成為可對於上述光罩之曝光位置或是較該曝 光位置更接近上述被曝光體之搬運方向近側位置進行 攝，’具有在和上述搬運方向呈大致正交之方向上排列 之複數個X光元件；第2攝像機構，係配置成為可對於 上述光罩之曝光位置或是較該曝光位置更接近上述被 曝光體之搬運方向近侧位置進行攝像，具有在和上述搬 運方向呈大致平行排列之複數個受光元件；對準機構， 係使得上述被曝光體以及光罩在和上述搬運方向呈大 致正交之方向上進行相對移動來補正該光罩之曝光位 置；以及控制機構，當藉由上述第i攝像機構檢測出於 上述被曝光體上所預設之曝光位置補正用第！基準位 置，則據此控制上述對準機構之驅動，當藉由上述第^ 攝像機構檢測出於上述被曝光體上所預設之曝光光線 照射時機餘” 2鮮位置，㈣此㈣上述曝光光 201219988 線之照射時機（例如參照日本特開2〇〇8_767〇9號公 報）。 但是，此種習知之曝光裝置，當對於被曝光體（基 板）進行具周期性圖案之曝光的情況下，雖可一邊將基 板朝特定方向以一定速度搬運一邊以特定周期來控制 曝光光線之照射時機來輕易地進行，但非周期性圖案之 曝光則si難。此外於鮮相對於絲近接對向來進 行曝光，所以會因為照射於光罩之光源光中之視角（平 行光半角；collimationhalfangie)之存在，而有基板上 之圖案像_不清解減力降低、無法曝光形成微細圖 案之虞。 對於此種問題，雖可使用步進曝光裝置（將光罩之 像藉由成像透鏡來縮小投影而曝光於基板上）來因應， 惟當對於例如1m £方以上之大面積基板進行曝光之情 況，會有所使用之透鏡口徑需對應於基板大小而變大從 而成為昂貴之物的問題。 【發明内容】 是以，本發明因應於此種問題點，其目的在於提供 一種曝光裝置，能以尚解析度來進行大面積被曝光體之 非周期性圖案之曝光。 為了達成上述目的，本發明之曝光裝置，係具備有 透鏡構件，此透鏡構件在載置被曝光體之平台與形成有 罩體圖案之光罩之間是以可在和該被曝光體之面以及 該光罩之面相平行之面内進行移動的方式所形成，且在 ⑧ 201219988 二向! 呈交又方向上具有排列成一列之複數單 之罩體圖案之等，立透鏡構件係使得以可將該光罩 成之複數透鏡群在和該移動方向呈交叉方向： 位透列而形成為複數透鏡列；該各單 透户媒/ft 、 各透鏡列之各透鏡群能和相對於該 的二式將3動方向呈斜向交叉之軸線成為平行排列 互位^一：旦^鏡列在和該移動方向呈交叉方向上相 里形成，且將相互鄰接之端部切除成平行 =軸線’邱各透鏡列之透鏡群遍佈在該透鏡構件整 -係以一定的排列間距來排列配置著。 藉此’可將形成於光罩之罩體圖案之等倍正立像成 像於被曝光H表面之透鏡構件可_邊平行移動於光罩 之面-邊進行曝光，即使上述罩體圖案為非周期性圖案 亦能以續析度進行曝光。於此鋪況下，上述透鏡構 件之尺寸可比光罩之尺寸來得小。從*，即使光罩之尺 寸對應於大面積被曝光體而變大，仍可縮小所使用之透 鏡構件的財，可壓低零件成本。藉此，可壓低裝置之 製造成本。此外’由於透鏡構件乃複數之單位透鏡構件 排列成H相較於使得複數之單位透鏡構件互異排 列，可縮短魏構狀移動轉，可縮短曝光製程之生 產時間。 此外，該各單位透鏡構件係以從該透鏡構件之移動 方向觀看時該各透鏡群之一部份成為重疊之方式使得 201219988 各透制在和_動方向呈蚊方向上相絲移。. 此’即便是相較於透鏡尺寸為更大尺寸之罩體圖案也^ 會於中途4現巾斷，可連續地連接來進行曝光。 再者，該各單位透鏡構件係將於透明基板之表裏面 相互對應而形成有複數凸透鏡之第1、第2、第3以及 第4透鏡陣列之對應的各凸透鏡妹加以對齊而疊 合，且使得該光罩之罩體圖案之中間倒立像成像於該$ 2透鏡陣。列與該第3透鏡陣列之間。藉此，可輕易地形 成複數單位透鏡於面内作複數排列之透鏡構件。從而， 可壓低透鏡構件之製造成本。 此外，該各單位透鏡構件係近接於位處該第3透鏡 陣列之光行進方向上游側的凸透鏡表面而設置具有特 疋形狀開口之第1光圈，將透鏡群所形成之曝光區域限 制在透鏡之中央部。藉此，可排除透鏡之像差影響而將 光罩之罩體圖案之等倍正立像高精度地成像於被曝光 體表面。從而，可提升曝光圖案之形成精度。 此外，該第1光圈開口為俯視矩形狀之開口，且成 為當從該透鏡構件之移動方向觀看時，和鄰接之第i光 圈開口之一部份相重疊之部分的面積為該重疊部全體 面積之一半而使其一部份受到遮光之形狀。藉此，由於 曝光圖案相連接故即使是進行疊合曝光之情況，也可防 止過度曝光。從而，可更為提高曝光圖案之形成精度。 再者，該各單位透鏡構件係近接於位處該第4透鏡 陣列之光行進方向上游侧的透鏡表面而設有限制光束 ⑧ 201219988 徑之第2光圈。藉此’可限制 ^ , j丨艮制先束徑，可更為提高透鏡 構件之透鏡群所達成之解析度。 此外，該平台可將該被曝光體朝特定方向加以搬 運，該透鏡構件係在該平台之移動暫時停止之狀態下進 行移動。It此’可—邊連續供給被曝光體—邊進行曝 光，可提升曝光處理之效率。 【實施方式】 以下’基於所關式詳細說日月本發明之實施形態。 圖Η系顯示本發明之曝光裝置之實施形態之前視圖，圖 2係圖1之俯視圖。此曝光裝置係以高解析度進行大面 積被曝光體之非周期性圖案的曝光，具備有：搬運機構 1、第1曝光光學單元2、第2曝光光學單元3。此外， 於以下之說明’針對被曝光體為顯示裝置之薄膜電晶體 (以下稱為「TFT」）用基板之情況進行描述。 —圖3係本發日㈣❹之TFT用基板4之俯視圖， 藉由其他曝光裝置在顯示輯5内以特定周期縱橫交 又地形成複數訊號線以及掃描線之曝光圖案。此外，於 顯示區域5外侧在同圖中以虛線圍燒顯示之區域6乃形 成用以將複數訊號線與設於外部之訊號侧驅動電路加 以連接之訊侧料的區域’區域7乃形成用以將複數 掃描線與設於外部之掃描側驅動電路加以連接之掃打 側端子的區域。 田 上述搬運機構1係將塗佈有感光性樹脂之TFT用 基板4載置於平台δ之上面而朝特定方向（圖i所示箭 201219988 頭A方向）進行搬運者，藉由例如由馬達與齒輪等所級 合而構成之移動機構來移動平台8。或是，亦可於平f 8表面具備氣體之喷出口以及吸引口，使得氣體之噴二 力與吸引力保持平衡以使得TFT用基板4能於平台8 上在上浮特定量之狀態下進行搬運。此外，於搬運機構 1設有用以檢測平台8之移動距離的位置感應器（圖 省略）。 μ 於上述搬運機構1之上方設有第丨曝光光學單元 2。此第1曝光光學單元2係用以對TFT用基板4之區 域6曝光出訊號側端子之圖案，其構成上具備有光源裝 置9、訊號端子用光罩10、訊號端子用透鏡構件u、 移動機構12。 此處’上述光源裝置9係用以對後述之訊號端子用 光罩10照射具有均勻亮度分布之光源光的平行光，其 構成具備有：光源，係由例如超高壓水銀燈、氙燈等所 構成，例如光學積分器，用以使得從該光源所放射之光 源光党度分布能均勻化；聚光透鏡，係將亮度分布均勻 化之光源光調整為平行光。 此外，從上述光源裝置9所放射之光源光的下游側 設有訊號端子用光罩10。此訊號端子用光罩10係如圖 4所示般，於透明基板表面形成有和訊號側端子為相同 形狀之訊號端子用罩體圖案13,以形成有訊號端子用 罩體圖案13之面為下侧而被支樓於圖示省略之罩體平 台。此外，訊號端子用光罩1〇係依據所使用之感光性 ⑧ 201219988 樹脂之種類而分類為正型與負型，此處係針對正型之情 況來說明。從而，訊號端子用罩體圖案13係以不透明 膜所形成，光可穿透訊號端子用罩體圖案13之外側區 域。 於上述訊號端子用光罩10與搬運機構i之平台8 之間設有訊號端子用透鏡構件u。此訊號端子用透鏡 構件11係使得於訊號端子用光罩10所形成之訊號端子 用罩體圖案13之等倍正立像成像於TFT用基板4表 面，係形成為可藉由後述之移動機構12而朝圖2中以 箭頭A所示基板搬運方向之相反方向（圖2中之箭頭B 方向）來移動於和訊號端子用光罩10以及平台8相平 行之面内’如圖5所示般所具有之構成為複數訊號端子 用單位透鏡構件11A、11B、11C在和上述移動方向（箭 頭B方向）呈交叉方向上排列為一列。 此處，上述訊號端子用單位透鏡構件uA〜llc係 於，號端子用_丨。之法線方向上如圖6⑻所示般 使得配置了複數凸透鏡（微透鏡）14a〜所構成之透 鏡群15在和訊號端子用光罩1〇以及平台8之面為平行 之面内朝與上述移動方向（箭頭B方向）呈交叉之方向 以-定排列間距排列而形成複數透鏡列16，如圖5所 示般，各透鏡列16之各透鏡群15係以和相對於 子用透鏡構件11之移動方向（箭頭B方向）呈斜向^ 又之抽線為平行制的方式讓各透制16在箭 頭B方向之交又方向上相互位移既定量來形成，將相互 201219988 鄰接之端部 llAa、UBa、UBb、UCa 士 上述軸、線0-0，且各透鏡列16之透^除成為平行於 子用透鏡構件π之整體係以一定之1 15在訊號端 置。 11間距來排列配 更具體而言，訊號端子用單位透 係如圖6(a)所示般，在相對於訊號HUA〜11C 11之移動方向（箭頭B方向）呈正 透鏡構件 係於箭頭Β所示之移動方向上 透鏡列16 Ν ^ 0 h (例如 150μπι 間距）狄置3列’且以從上述移動方向（ 觀看各透鏡列16之各透鏡群15之一部份重晟 ° 互鄰接之透鏡列16當中之-透鏡列μ ^方式相 ^ 边現幻16在透鏡群15之 排列方向上係位移複數透鏡群15之排列間距匕之丨/^ (η為2以上之整數，於圖6中以n=3顯示）而設置。 此外，各訊號端子用單位透鏡構件uA〜UC如圖 6 (b)所示般，係使得於透明基板17之表裏面相互對 應形成有複數凸透鏡14之第1、第2、第3以及第4透 鏡陣列18a〜18d在相對應之各凸透鏡14的光軸對齊之 狀態下疊合而進行接合，且使得訊號端子用光罩1〇之 訊號端子用罩體圖案13之中間倒立像成像於第2透鏡 陣列18b與第3透鏡陣列18c之間。此種情況下，以彼 此光軸對齊而排列之8個凸透鏡14a〜14h來構成透鏡 群15。 此處，針對透鏡群15之各凸透鏡14的功能來說 201219988 明。首先，第1透鏡陣列18a之前側凸透鏡14a係扮演 增加通過訊號端子用光罩10之曝光光線朝透鏡群15内 之帶入量而將入射光之主光線聚光於第i透鏡陣列l8a 之後侧凸透鏡14b面上角色的場透鏡。此外，第丨透鏡 陣列18a之後侧凸透鏡14b與第2透鏡陣列i8b之前側 凸透鏡14c係合力作用扮演將訊號端子用光罩1〇之訊 號端子用罩體圖案13之像成像於第2透鏡陣列igb與 第3透鏡陣列18c之間來生成訊號端子用罩體圖案13 之中間倒立像之角色的成像透鏡。再者，第2透鏡陣列 18 b之後側凸透鏡14 d係扮演使得入射光之主光線能平 行於光軸之角色的場透鏡。此外，第3透鏡陣列i8c之 前側凸透鏡14e係扮演將入射光之主光線聚光於第3透 鏡陣列18c之後側凸透鏡14f面上之角色的場透鏡。再 者’第3透鏡陣列18c之後側凸透鏡I4f與第4透鏡陣 列18d之前侧凸透鏡Hg係合力作用扮演將訊號端子用 罩體圖案13之中間倒立像成像於TFT用基板4面上來 生成訊號端子用罩體圖案13之正立像之角色的成像透 鏡。此外，第4透鏡陣列1別之後侧凸透鏡14h係扮演 使得入射光之主光線能平行於光軸之角色的場透鏡。藉 此’可藉由透鏡群15來將訊號端子用光罩1〇之訊號端 子用罩體圖案13之等倍正立像成像於TFT用基板4表 面。 此外’各訊號端子用單位透鏡構件11A〜11C係如 圖6 (b)所示般，近接於第3透鏡陣列i8c之前側凸透 201219988 鏡14e表面處係設置具有特定形狀之開口 2〇的第i光 圈19,將透鏡群15所產生之曝光區域限制在透鏡之中 央部。藉此’可排除透鏡之像差的影響以高解析度來曝 光訊號端子用光罩10之訊號端子用單體圖案13。 於此種情況下’第1光圈19之開口 20如圖7所示 般，乃一具有四個角部21a、21b、21c、21(1之俯視矩 形狀之開口，從訊號端子用透鏡構件u之移動方向（箭 頭B方向）觀看，對應於與鄰接之第丨光圈19之開^ 20的一部份重疊之部分（以下稱為「交疊部)之 部分的面積係以成為交疊部22之全體面積之的方 式成為其一部份受到遮光之形狀。於本實施形態中，如 圖6 (a)所示般，第1光圈19之開口 出在透鏡列…心線上具有角部之六角現 第1光圈19之開口 20之對應於上述交疊部22之部分 積係成為交疊部22之全體面積之一半’對應於交 ，豐邛22之區域之平均曝光量成為必要曝光量之一半。 /用^對應於此交疊部22之區域，係藉由在訊號端子 透兄構件11之移動方向（箭頭B方向）上先後存在 之兩個透鏡群15之疊合曝光來進行一定量之曝光。因 此對應於交疊部22之區域不用擔心出現過度曝光。 此處，參照圖8更為詳細地說明在訊號端子用透鏡 構件11之移動中，對應於上述交疊部22之區域受到曝 光之狀況。 圖8 (a)係顯示在訊號端子用透鏡構件u之移動 ⑧ 12 201219988 方向（箭頭B方向）上先後存在之透鏡群15之俯視圖。 此外’同圖（b)係顯示同圖（a)中對應於交叠部22 外之點Ο之曝光的說明圖。此種情況下，點〇係受限 於第1光圈19之開口 20，從tl開始曝光而在t2結束曝 光。藉此，點0於上述t!〜t2之期間暴露在一定光量之 光’而被進行一定深度之曝光。 另一方面，圖8 (c)係顯示對應於交疊部22之點 P之曝光的說明圖。於此種情況下，點p係受限於第1 光圈19之開口 20之對應於交疊部22之部分，從、開 始曝光而於U暫時結束曝光之後，受限於後續之第i光 圈19之開口 20對應於交疊部22之部分而從t5開始再 认曝光於k結束曝光。藉此’點p於上述t3〜t4、〖5〜t6 之期間内暴露於一定光量之光，而被進行一定深度之曝 光。 此外’圖8 (d)係顯示對應於交疊部22之點Q之 曝光的說明圖。於此種情況下，點Q係受限於第丨光圈 19之開口 20之對應於交疊部22之部分，從t7開始曝 光而於ts暫時結束曝光之後，受限於後續之第1光圈 19之開口 20之對應於交疊部22之部分從。再度開始 曝光而於t1()結束曝光。藉此’點Q在上述t7〜t8、t9〜 tio之期間被暴露％ —定光量之光’而被進行一定深度之 曝光。 此外，第1光圈19之開口 20之形狀不限於上述六 角形，只要能以開口 20對應於交疊部22之部分的面積 13 201219988 成為交疊部22之全體面積一半的方式將其一部份予以 遮光，亦可為例如圖9所示般梯形狀等任何形狀。 此外，各訊號端子用單位透鏡構件11A〜lie，汝 圖6 (b)所示般，近接於第4透鏡陣列18d之光行 方向上游側之凸透鏡14g表面設置有第2光圈38(具= 對應於第1光圈19之開口 20的橢圓形狀開口），來 制通過透鏡群15之光的光束徑。 又 再者，各訊號端子用單位透鏡構件U A〜llc係將 第1透鏡陣列18a之前側凸透鏡14a之周圍予以遮光 於圖6(a)中，夾在兩條虛線間之透鏡形成區域外之部 分，於同圖中以箭頭B所示移動方向（箭頭A之相^ 方向）前後區域之同方向之寬度Wl係形成為至少和訊 號端子用光罩10之訊號端子用罩體圖案13形成區域在 箭頭A方向之寬度Wi (參照圖4)為相同。藉此，於 訊號端子用透鏡構件11之移動開始前以及移動結束後 可將通過訊號端子用光罩1〇之光予以完全遮光。 另設有可移動上述訊號端子用透鏡構件Η之移動 機構12。此移動機構12係使得訊號端子用透鏡構件^ 在和訊號端子用光罩10以及平台8相平行之面内朝圖 1中箭頭Β方向進行移動者，為例如電磁致動器、電動 平台等。 在上述平台8之上方，於第1曝光光學單元2之基 板搬運方向前方侧設有第2曝光光學單元3。此第2曝 光光學單元3係用以在TFT用基板4之區域7曝光出 201219988 掃描側端子之圖案’具備有：光源裝置23、掃描端子 用光罩24、掃描端子用透鏡構件25、移動機構26。 此處’上述光源裝置23係用以對後述之掃描端子 用光罩24照射具有均勻亮度分布之光源光的平行光， 相同於第1曝光光學單元2之光源裝置9,具備有·♦光 源’係由例如超高壓水銀燈、氙燈等所構成；例如光學 積分器’係使得從此光源所放射之光源光之亮度分布能 均勾化；以及聚光透鏡，係將亮度分布均勻化之光源光 調整為平行光。 此外 攸上述光源裝置23所放射之光源光之下游 側設有掃描端子用光罩24。此掃描端子用光罩24如圖 所示4又’係於透明基板表面形成有和掃描側端子為 相同形狀之掃描端子用罩體圖案27,以形成有掃描端 子，f體圖案27之面為下侧而被支樓在圖示省略之罩 。此外，掃描端子用光罩24係和訊號端子用罩 I3同樣地，隨所使用之感光性樹脂之種類而分 而與負型，此處係針對正型之情況來說明。從 可穿透子用罩體圖案27係以不透明膜所形成，光 了穿=描端子用罩體圖案2?之外側區域。 之間設有光單24與搬運機構1之平台8 構件25係用田'透鏡構件25。此掃描端子用透鏡 用罩體圖案 二=:，端子_ 24之掃描端子 者，係形Μ评像成像於TFT用基板4表面 曰後迷之移動機構26而朝和圖2中 201219988201219988 VI. Description of the Invention: [Technical Field] The present invention relates to an exposure apparatus for exposing exposure light to an exposed body supported on a platform via a photomask to form a predetermined pattern, in detail, With respect to an exposure apparatus, a non-periodic pattern exposure of a large-area exposed body can be performed with high resolution. [Prior Art] The conventional exposure apparatus is configured to intermittently illuminate an exposure light that is conveyed at a constant speed through a mask to expose a mask pattern of the mask to a specific position, and is provided with: The image pickup mechanism is disposed such that it can be photographed at an exposure position of the photomask or closer to the conveyance direction of the object to be exposed than the exposure position, and has a direction substantially orthogonal to the conveyance direction. a plurality of X-ray elements; the second imaging means is arranged to be capable of imaging the exposure position of the mask or the proximity of the exposure direction of the object to be exposed; a plurality of light receiving elements arranged in a substantially parallel manner; the alignment mechanism is configured to relatively move the exposed object and the mask in a direction substantially orthogonal to the transport direction to correct an exposure position of the mask; and a control mechanism And detecting, by the ith imaging unit, the exposure position correction for the preset on the exposed objecta reference position, wherein the driving of the alignment mechanism is controlled according to the above, and when the exposure of the exposure light preset on the exposed object is detected by the first imaging mechanism, the remaining position is "2", (4) the exposure light In the case of the conventional exposure apparatus, when the exposure apparatus (substrate) is subjected to exposure with a periodic pattern, It is easy to control the irradiation timing of the exposure light at a specific cycle while transporting the substrate at a certain speed in a specific direction, but the exposure of the non-periodic pattern is difficult. Further, the exposure is relatively close to the opposite direction of the wire. Therefore, due to the presence of the viewing angle (collimation half-angle) in the light source of the illuminating light, there is a problem that the pattern image on the substrate is reduced, and the fine pattern cannot be exposed to form a fine pattern. Although it is possible to use a stepper exposure device (exposing the image of the reticle to the substrate by reducing the projection by the imaging lens), In the case of exposing a large-area substrate having a size of, for example, 1 m £ or more, there is a problem that the lens aperture to be used becomes larger in accordance with the size of the substrate, which becomes an expensive object. [Invention] A problem is to provide an exposure apparatus capable of performing exposure of a non-periodic pattern of a large-area exposed object with a resolution. To achieve the above object, the exposure apparatus of the present invention includes a lens member. The lens member is formed between the stage on which the object to be exposed is placed and the mask on which the cover pattern is formed so as to be movable in a plane parallel to the surface of the object to be exposed and the surface of the mask, and In 8 201219988 two-way! Submitting a mask pattern having a plurality of sheets arranged in a row in a direction, the vertical lens member is such that the plurality of lens groups in which the mask is formed are in a direction intersecting the moving direction: a plurality of lens rows are formed through the through-column; each of the single-dense media/ft, each lens group of each lens row and an axis that obliquely intersects the three-direction direction with respect to the two-type The lines are arranged in parallel with each other. One: the mirror array is formed in a phase intersecting the moving direction, and the adjacent ends are cut into parallel=axis. The lens group of each lens column is spread over the lens. The components are arranged in a certain arrangement pitch. Thus, the lens member formed on the exposed H surface can be formed by the lens member formed on the mask surface of the mask can be moved in parallel to the mask. Exposure to the face-side, even if the cover pattern is a non-periodic pattern, can be exposed with a degree of continuation. In this case, the size of the lens member can be smaller than the size of the mask. From *, even the mask The size is increased corresponding to a large area of the exposed object, and the lens member used can be reduced, and the cost of the part can be reduced. Thereby, the manufacturing cost of the device can be reduced. Further, since the lens member is a plurality of unit lens members The arrangement of the H phase is such that the plurality of unit lens members are arranged differently, so that the Wei-shaped movement can be shortened, and the production time of the exposure process can be shortened. Further, each of the unit lens members is such that each of the lens groups overlaps in a direction in which the lens member is moved in the direction of movement of the lens member. This even if the cover pattern is larger than the lens size, it will be cut off in the middle, and can be continuously connected for exposure. Further, each unit lens member is aligned and overlapped by corresponding convex lens pairs of the first, second, third, and fourth lens arrays in which the plurality of convex lenses are formed corresponding to each other in the front surface of the transparent substrate, and The intermediate inverted image of the mask pattern of the reticle is imaged on the $2 lens array. Between the column and the third lens array. Thereby, it is possible to easily form a lens member in which a plurality of unit lenses are arranged in a plurality of planes. Thereby, the manufacturing cost of the lens member can be lowered. Further, each unit lens member is provided adjacent to the surface of the convex lens located on the upstream side in the light traveling direction of the third lens array, and a first aperture having a characteristic opening is provided, and the exposure region formed by the lens group is limited to the lens. Central Department. Thereby, the equal-fold erect image of the mask pattern of the reticle can be accurately imaged on the surface of the object to be exposed, excluding the influence of the aberration of the lens. Thereby, the formation precision of the exposure pattern can be improved. Further, the first aperture opening is an opening having a rectangular shape in plan view, and an area overlapping a portion of the adjacent i-th aperture opening when viewed from a moving direction of the lens member is an entire area of the overlapping portion. Half of it is partially obscured. Thereby, since the exposure patterns are connected, overexposure can be prevented even in the case of performing superimposed exposure. Thereby, the formation accuracy of the exposure pattern can be further improved. Further, each unit lens member is provided adjacent to the surface of the lens on the upstream side in the light traveling direction of the fourth lens array, and is provided with a second aperture which restricts the light beam 8 201219988. Therefore, the first beam diameter can be limited, and the resolution achieved by the lens group of the lens member can be further improved. Further, the platform can transport the object to be exposed in a specific direction, and the lens member moves in a state where the movement of the stage is temporarily stopped. It can be exposed to the exposed body continuously, which improves the efficiency of the exposure process. [Embodiment] Hereinafter, the embodiment of the present invention will be described in detail based on the closed type. Fig. 2 is a front view showing an embodiment of the exposure apparatus of the present invention, and Fig. 2 is a plan view of Fig. 1. This exposure apparatus exposes a non-periodic pattern of a large-area exposure object with high resolution, and includes a transport mechanism 1, a first exposure optical unit 2, and a second exposure optical unit 3. In the following description, the case of the substrate for a thin film transistor (hereinafter referred to as "TFT") in which the object to be exposed is a display device will be described. Fig. 3 is a plan view of the TFT substrate 4 of the present day (fourth), and the exposure patterns of the plurality of signal lines and the scanning lines are formed in the display frame 5 in a predetermined cycle by the other exposure means. In addition, the area 6 which is displayed on the outside of the display area 5 in the same figure by a broken line is formed to form a region 'region 7 for connecting the plurality of signal lines to the signal side material provided on the external signal side driving circuit. An area of the swept side terminal to which the plurality of scanning lines are connected to the external scanning side driving circuit. In the above-described transport mechanism 1 , the TFT substrate 4 coated with the photosensitive resin is placed on the upper surface of the stage δ and transported in a specific direction (heading 201220128 head A direction), for example, by a motor and A moving mechanism constituted by gears or the like is cascaded to move the platform 8. Alternatively, the gas ejection port and the suction port may be provided on the surface of the flat f 8 so that the gas ejection force and the attraction force are balanced so that the TFT substrate 4 can be carried on the platform 8 while floating up by a certain amount. . Further, a position sensor (not shown) for detecting the moving distance of the stage 8 is provided in the transport mechanism 1. The second exposure optical unit 2 is provided above the transport mechanism 1. The first exposure optical unit 2 is configured to expose a pattern of the signal side terminal to the region 6 of the TFT substrate 4, and is configured to include the light source device 9, the signal terminal mask 10, the signal terminal lens member u, and the movement. Agency 12. Here, the light source device 9 is configured to illuminate the signal terminal mask 10, which will be described later, with parallel light having a uniform brightness distribution of source light, and is configured to include a light source such as an ultrahigh pressure mercury lamp or a xenon lamp. For example, an optical integrator is used to make the light source distribution of the light source radiated from the light source uniform; and the collecting lens adjusts the light source light that uniformizes the brightness distribution to parallel light. Further, a signal terminal mask 10 is provided on the downstream side of the light source light emitted from the light source device 9. As shown in FIG. 4, the signal terminal cover 10 has a signal terminal cover pattern 13 having the same shape as the signal side terminal formed on the surface of the transparent substrate, and the surface of the signal terminal cover pattern 13 is formed. On the lower side, the slab is omitted from the illustration. Further, the signal terminal mask 1 is classified into a positive type and a negative type depending on the type of the photosensitive property used in the 2012201288 resin. Here, the description will be made for the positive type. Therefore, the signal terminal cover pattern 13 is formed by an opaque film, and the light can penetrate the outer side region of the signal terminal cover pattern 13. A signal terminal lens member u is provided between the signal terminal photomask 10 and the stage 8 of the transport mechanism i. The signal terminal terminal lens 11 is formed on the surface of the TFT substrate 4 by the equal-fold erect image of the signal terminal cover pattern 13 formed by the signal terminal mask 10, and is formed by a moving mechanism 12 which will be described later. 2, in the opposite direction of the substrate carrying direction indicated by the arrow A (the direction of the arrow B in FIG. 2), it moves in the plane parallel to the photomask 10 and the platform 8 as shown in FIG. The unit lens members 11A, 11B, and 11C for the complex signal terminals are arranged in a line in the direction intersecting the moving direction (the direction of the arrow B). Here, the signal terminal unit lens members uA to 11c are used for the number terminal. In the normal direction, as shown in FIG. 6 (8), the lens group 15 in which the plurality of convex lenses (microlenses) 14a are disposed is parallel to the surface of the signal terminal mask 1 and the surface of the stage 8 The moving direction (arrow B direction) is arranged in a direction of intersection at a predetermined arrangement pitch to form a complex lens array 16, and as shown in FIG. 5, each lens group 15 of each lens array 16 is aligned with respect to the sub-lens member 11. The moving direction (arrow B direction) is oblique and the drawing is parallel. The respective through-holes 16 are formed by the mutual displacement of the respective directions 16 in the direction of the arrow B, and the end portions llAa adjacent to each other 201219988 are formed. , UBa, UBb, UCa, the above axis, line 0-0, and the lens group 16 is separated from the sub-lens member π by a certain number of 15 at the signal end. 11 spacing arrangement and more specifically, the unit terminal of the signal terminal is as shown in FIG. 6( a ), and the positive lens member is attached to the arrow 相对 in the moving direction (arrow B direction) with respect to the signals HUA 11 11 C 11 In the moving direction, the lens array 16 Ν ^ 0 h (for example, 150 μπι) is placed in 3 columns ' and is adjacent to each other from the moving direction (seeing a portion of each lens group 15 of each lens array 16) In the column 16 - the lens column μ ^ mode phase edge imaginary 16 is arranged in the direction of the arrangement of the lens group 15 to shift the arrangement pitch of the complex lens groups 15 丨 / ^ (η is an integer of 2 or more, in Fig. 6 In addition, as shown in FIG. 6(b), the unit lens members uA to UC for the respective signal terminals are such that the first and the plurality of convex lenses 14 are formed corresponding to each other in the front and back surfaces of the transparent substrate 17. The second, third, and fourth lens arrays 18a to 18d are superimposed and joined in a state in which the optical axes of the respective convex lenses 14 are aligned, and the signal terminal cover pattern for the signal terminal mask 1 is used. The intermediate inverted image of 13 is imaged on the second lens array 18b and the third lens array In this case, the lens group 15 is constituted by eight convex lenses 14a to 14h arranged in alignment with each other. Here, the function of each convex lens 14 of the lens group 15 is 201219988. First, the first The front side convex lens 14a of the lens array 18a serves to increase the amount of exposure light passing through the photomask 10 to the lens group 15 and condense the main light of the incident light to the i-th lens array 18a. The field lens of the upper character lens. In addition, the second lens lens 18a and the second lens array i8b front side convex lens 14c are combined to form an image of the signal terminal cover pattern 13 for the signal terminal mask 1 An imaging lens that generates the intermediate inverted image of the signal terminal cover pattern 13 between the second lens array igb and the third lens array 18c. Further, the second lens array 18b rear side convex lens 14d serves to make it The main ray of the incident light can be parallel to the field lens of the role of the optical axis. Further, the front lens 1e of the third lens array i8c serves to condense the chief ray of the incident light to the third lens array 18c. The field lens of the character on the surface of the rear side convex lens 14f. Further, the combination of the 'the third lens array 18c rear side convex lens I4f and the fourth lens array 18d front side convex lens Hg acts as an intermediate inverted image of the signal terminal cover pattern 13. An imaging lens that is formed on the surface of the TFT substrate 4 to generate an erecting image of the signal terminal cover pattern 13. Further, the fourth lens array 1 is followed by the side convex lens 14h so that the chief ray of the incident light can be parallel to the optical axis. The field lens of the character can be used to image the equal-positive image of the signal terminal cover pattern 13 of the signal terminal mask 1 on the surface of the TFT substrate 4 by the lens group 15. Further, the unit lens members 11A to 11C for the respective signal terminals are as shown in Fig. 6(b), and the front side of the third lens array i8c is oscillated to the front surface of the second lens array i8c. The surface of the mirror 14e is provided with an opening 2 of a specific shape. The i-iris 19 limits the exposure area generated by the lens group 15 to the central portion of the lens. Thereby, the signal terminal unit pattern 13 of the signal terminal mask 10 is exposed with high resolution by eliminating the influence of the aberration of the lens. In this case, the opening 20 of the first diaphragm 19 has four corner portions 21a, 21b, 21c, and 21 (1 is a rectangular opening in a plan view, and the lens member for signal terminal is used as shown in FIG. When the moving direction (arrow B direction) is viewed, the area corresponding to a portion overlapping with a portion of the opening of the adjacent third aperture 19 (hereinafter referred to as "overlap portion" is the overlapping portion 22 In the present embodiment, as shown in FIG. 6(a), the opening of the first aperture 19 has a hexagonal corner at the center line of the lens row. Now, the portion of the opening 20 of the first aperture 19 corresponding to the overlapping portion 22 is one half of the entire area of the overlapping portion 22, which corresponds to the intersection, and the average exposure amount of the region of the peak 22 becomes one-half of the necessary exposure amount. / The area corresponding to the overlapping portion 22 is a certain amount by superimposing and exposing the two lens groups 15 which are successively present in the moving direction (arrow B direction) of the signal terminal through the armature member 11 Exposure. Therefore, there is no need to worry about the area corresponding to the overlap portion 22. Here, the state in which the region corresponding to the overlapping portion 22 is exposed during the movement of the signal terminal lens member 11 will be described in more detail with reference to Fig. 8. Fig. 8 (a) is shown for the signal terminal. Movement of the lens member u 8 12 201219988 The top view of the lens group 15 in the direction (arrow B direction). In addition, the same figure (b) shows the point corresponding to the overlap portion 22 in the same figure (a). In this case, the dot is limited to the opening 20 of the first aperture 19, and the exposure is started from t1 and the exposure is terminated at t2. Thus, the dot 0 is exposed to a certain period during the above t!~t2. The light of the amount of light is exposed to a certain depth. On the other hand, Fig. 8(c) is an explanatory view showing the exposure corresponding to the point P of the overlapping portion 22. In this case, the point p is limited to The opening 20 of the first aperture 19 corresponds to the portion of the overlapping portion 22, and after the exposure is started and the exposure is temporarily terminated by U, the opening 20 limited by the subsequent i-th aperture 19 corresponds to the portion of the overlapping portion 22. From t5, re-recognize the exposure at k to end the exposure. By this point, point p is above t3~t4 The light is exposed to a certain amount of light during the period from 5 to t6, and is exposed to a certain depth. Further, 'Fig. 8(d) shows an explanatory view of the exposure corresponding to the point Q of the overlapping portion 22. Next, the point Q is limited by the portion of the opening 20 of the second aperture 19 corresponding to the overlapping portion 22, and the exposure is started from t7 and after the exposure is temporarily terminated at ts, it is limited by the opening 20 of the subsequent first aperture 19. Corresponding to the portion of the overlapping portion 22, the exposure is resumed and the exposure is terminated at t1(). Thus, the 'point Q is exposed to the light of the fixed amount of light during the period from t7 to t8, t9 to tio'. Deep exposure. Further, the shape of the opening 20 of the first diaphragm 19 is not limited to the above-described hexagonal shape, as long as the opening 20 corresponds to the area 13 of the portion of the overlapping portion 22 201219988 as a part of the entire area of the overlapping portion 22 The light may be shielded, and may be any shape such as a trapezoidal shape as shown in FIG. Further, as shown in FIG. 6(b), each of the signal terminal unit lens members 11A to lie has a second diaphragm 38 provided on the surface of the convex lens 14g which is adjacent to the upstream side of the fourth lens array 18d in the light traveling direction. The beam diameter of the light passing through the lens group 15 is made in the elliptical opening of the opening 20 of the first aperture 19. Further, in the unit lens members UA to 11c for the respective signal terminals, the periphery of the front side convex lens 14a of the first lens array 18a is shielded from light in the vicinity of the lens forming region between the two broken lines in FIG. 6(a). In the same figure, the width W1 in the same direction as the direction of movement of the front and rear regions (the direction of the arrow A) is formed at least in the region of the signal terminal cover pattern 13 of the signal terminal mask 10. The width Wi (see FIG. 4) in the direction of the arrow A is the same. Thereby, the light passing through the photomask 1 can be completely shielded before the start of the movement of the signal terminal lens member 11 and after the end of the movement. Further, a moving mechanism 12 for moving the above-mentioned signal terminal lens member Η is provided. The moving mechanism 12 is such that the signal terminal lens member moves in the direction of the arrow 图 in Fig. 1 in a plane parallel to the signal terminal cover 10 and the stage 8, and is, for example, an electromagnetic actuator or an electric platform. Above the stage 8, a second exposure optical unit 3 is provided on the front side of the substrate transport direction of the first exposure optical unit 2. The second exposure optical unit 3 is configured to expose a pattern of the 201219988 scanning side terminal in the region 7 of the TFT substrate 4, and includes a light source device 23, a scanning terminal mask 24, a scanning terminal lens member 25, and a moving mechanism. 26. Here, the light source device 23 is configured to illuminate the scanning terminal mask 24, which will be described later, with parallel light having a uniform luminance distribution, and the light source device 9 of the first exposure optical unit 2 is provided with a light source. It is composed of, for example, an ultra-high pressure mercury lamp, a xenon lamp, etc.; for example, an optical integrator is configured to make the brightness distribution of the light source emitted from the light source uniform; and a collecting lens is used to adjust the brightness of the light source to uniformize the brightness distribution to Parallel light. Further, a scanning terminal mask 24 is provided on the downstream side of the light source light emitted from the light source device 23. As shown in FIG. 4, the scanning terminal photomask 24 is formed with a scanning terminal cover pattern 27 having the same shape as the scanning side terminal on the surface of the transparent substrate to form a scanning terminal, and the surface of the f-body pattern 27 is On the lower side, the hood is omitted from the illustration. In addition, the mask 24 for the scanning terminal is divided into a negative type depending on the type of the photosensitive resin to be used, similarly to the mask for the signal terminal I3. Here, the description will be made for the positive type. The permeable cover pattern 27 is formed of an opaque film, and the outer region of the cover pattern 2 for the terminal is light-passed. The platform 8 member 25 in which the light sheet 24 and the transport mechanism 1 are provided is a field lens member 25. This scanning terminal lens is used for the mask pattern 2 =:, the scanning terminal of the terminal _ 24, the Μ Μ 成像 成像 成像 成像 成像 成像 成像 成像 成像 成像 成像 成像 成像 成像 成像 成像 成像 移动 移动 移动 移动 移动 移动 2012 2012 2012 2012 2012 2012 2012 2012 2012
斤:基板搬運方向呈交叉方向(圖 2中之箭頭C " 於和掃描端子用光罩24以及平台8相平 _於婦描端子用光罩24之法線方向上如圖11 ，不般使得配置了複數凸透鏡（微透鏡）28a〜28h 所才^透鏡群29在和掃播端子用光罩24以及平台8 :面為平行之面：朝與上述移動方向(箭頭C方向)呈 =叉之方向以一定之排列間距排列而形成複數透鏡列 〇之複數掃描端子用單位透鏡構件25A、25B、25C在 與上述移動方向（箭頭C方向）呈交叉方向上排列為-列（參照圖2)。 此外’與圖5所示訊號端子用透鏡構件11同樣地， 各掃描端子用單位透鏡構件25A〜25C，各透鏡列30 之各透鏡群29係以和相對於掃描端子用透鏡構件25之 移動方向（箭頭C方向）呈斜向交又之軸線相平行排列 的方式讓各透鏡列30在和箭頭C呈交叉之方向上相互 位移一定量來形成，且將相互鄰接之端部25Aa、25Ba 以及25Bb、25Ca(參照圖2)切除成為平行於上述軸 線，且各透鏡列30之透鏡群29在掃描端子用透鏡構件 25之整體係以一定之排列間距來排列配置。 更具體而言’上述各掃描端子用透鏡構件25A〜 25C係如圖11 (a)所示般，在相對於掃描端子用透鏡 構件25之移動方向（同圖所示箭頭c方向）呈交叉方 向上以間距匕（例如150μπι間距）排列了複數透鏡群 29之透鏡列30係於箭頭C所示移動方向上以間距ρ 201219988 (例如150_間距）設置3歹卜且以從上述移 (箭頭C方向）觀看各透鏡列3〇之各透鏡群之一: 份重疊的方式相互鄰接之透鏡列30當中 部 〜^ 顆^歹ij 3 〇 在透鏡群29之排列方向上係位移複數透鏡群29之排 間距P3之l/m (m為2以上之整數，於圖1〇中以爪 =3顯不）而設置。 此外，各掃描端子用透鏡構件25A〜25C係如圖u (b)所示般’係使得於透明基板之表裏面相互對應形 成有複數凸透鏡28之第1、第2、第3以及第4透^ 列31a〜31d在相對應之各凸透鏡28之光軸對齊的狀態 下疊合而進行接合’且使得掃描端子用光罩24之掃描 端子用罩體圖案27之中間倒立像成像於第2透鏡陣列 31b與第3透鏡陣列31c之間。此種情況下，以彼此光 轴對齊而排列之8個凸透鏡28a〜28h來構成透鏡群 29。此外，由於掃描端子用透鏡構件25之構成相同於 第1曝光光學單元2之訊號端子用單位透鏡構件η'〜 11C之構成，故此處省略透鏡群29之具體構成以及各 凸透鏡28之功能的說明。此外，於圖η中，符發32 係表示第1光圈’符號33係表示第1光圈32之開口， 符號34係表示第2光圈。 再者，各掃描端子用透鏡構件25Λ〜25C係將第1 透鏡陣列31a之前側凸透鏡28a之周圍予以遮光，且於 圖11 (a)中夾在兩條虛線之透鏡形成區域外之部分， 於同圖中以箭頭C所示移動方向前後之區域之同方向 17 201219988 之寬度W2係形成為至少和掃描端子用光罩24之掃描端 子用罩體圖案27形成區域在箭頭A之正交方向之寬度 W2 (圖10參照）為相同。藉此，掃描端子用透鏡構件 25之移動開始前以及移動結束後可將通過掃描端子用 光罩24之光予以完全遮光。 另設有可移動上述掃描端子用透鏡構件25之移動 機構26。此移動機構26係用以使得掃描端子用透鏡構 件25在和掃描端子用光罩24以及平台8平行之面内於 圖2中朝箭頭c方向移動者，例如為電磁致動器、電動 平台等。 其-人，針對如此般構成之曝光裝置之動作進行說 明。 首先’藉由另外設置之透鏡構件之組裝調整裝置， =各單位魏構件之面㈣於基“在料值内成為 :打的方式進行組裝調整。具體上該調整係參照圖12 =明。此處’針對訊號端子_鏡構件u之組裝調 整來說明，而針對掃描端子親鏡構件25之組裝調整 由於同樣地進行即可故省略說明。 首先，於複數基準標記祝、3513以一定之排列間 ，p (P!之整數倍）來—直__成之基準基板36 上對向配置訊號端子料鏡構件^其次 端子用單位透鏡構件11A之其中—透铲雜1ς、Ίβίιι 微鏡37來對基準標記35a進行攝像二二=: 透鏡構件11移動於水平面内而於顧微鏡3; = : 201219988 對基準標記35a進行定位。接著， 上述其進炉々〇< <> ci 使件顯微鏡37以和 上述基丰“5己35a、35b之排列間距 基準標記35a、35b之排列方向作狡"、 ^ 7 m « .. ^ 乍水平移動，經由訊號 美準H 35b H牛UB之透鏡群15來觀察第2號之 == 號端子用單位透鏡構件仙 t 頭D ^向移如於顯微鏡37之視野 ―、4 2號之基準標記35b進行定位，之後固 二針對訊號端子用單位透鏡構件Μ也進行同 5^^此，減端刊魏構件U之各透鏡群 朝和圖5中讀頭b所示移動方向為交叉方向 排列間距ρι做一直線狀排列。 將以上述方式經過組裝調整之訊號端子用透鏡構 件π以及掃描端子用透鏡構件25分別設定於第1曝光 光學單元2以及第2曝光光學單元3。藉此，整備ς曝 光準備。 其次’將藉由其他曝光裝置於顯示區域5事先形成 了訊號線以及掃描線之曝光圖案之TFT用基板4定位 、；平σ 8上之特定位置而載置後，驅動搬運機構1使得 平口 8朝圖1之箭頭Α方向以一定速度移動，將 =基板4朝同方向搬運。此時，第1以及第2曝光光學 單元2、3之光源呈亮燈狀態。 接著’藉由相對於第1曝光光學單元2在基板搬運 方向之相反側離一定距離所設之圖示省略之攝像機 構’來檢測於TFT用基板4事先所設之圖示省略之基 201219988 準標記，以該基準標記之檢測時刻中上述平台8之位置 為基準，藉由位置感應”測量平台8之㈣距離。然 後’一旦平台8移動了事先設定之距離而使得TFT用 基板'之訊號側端子形成區域6啦第】曝光光學單元 2之訊號端子用光罩10之正下方則停止平台8之移動。 再者，驅動第1曝光光學單元2之移動機構12來 開始Λ號端子用透鏡構件11在圖1中朝箭頭B方向之 移動，以在同方向連續移動之複數透鏡群15(參照圖5) 來使得圖4所示訊號端子用光罩1〇之訊號端子用罩體 圖案13之等倍正立像投影於TFT用基板4面上，訊號 侧端子之曝光圖案形成於TFT用基板4之訊號側端子 形成區域6。 此時’如圖7所示般，在受限於透鏡群15之第1 光圈19之開口 20的曝光區域，對應於交疊部22之區 域係藉由同圖中以箭頭B所示訊號端子用透鏡構件u 之移動方向上先後存在之兩個透鏡群15而受到疊合曝 光。藉此’訊號侧端子之曝光圖案於中途並不會中斷而 連續地連接著。於此種情況下，由於在第1光圈19之 開口 20 ’對應於交疊部22之部分係以其面積為交疊部 22之全面積之一半的方式來形成，故藉由上述兩個透 鏡群15之疊合曝光來進行一定深度之曝光，不會有過 度曝光之虞。 一旦訊號端子用透鏡構件11移動特定距離而於 TFT用基板4之訊號側端子形成區域6形成訊號端子用 ⑧ 20 201219988 罩體圖案13之全曝光圖案’則停止移動機構12且開始 移動平台8來再次開始TFT用基板4之搬運。 汗σ 再者，一旦TFT用基板4移動一定距離使得TFT 用基板4之掃描側端子形成區域7到達第2曝光光與單 元3之掃描端子用光罩24之正下方則停止平台8 :移 動0 接著，驅動第2曝光光學單w之移動機構26來 使得掃描端子用透鏡構件25在圖2中朝箭頭c方向之 移動開始，藉由朝同方向連續移動之複數透鏡群Μ (史 照圖11)來將圖ίο所示之掃描端子用光罩24之掃扩 端子用罩Μ案27之等倍正立像投影於抓用基板田4 面上’使得掃描侧端子之曝光圖案形成於TFT用^板4 之掃描側端子形成區域7。 & 隹又丨氏於逛蜆砰29之第1光圈32之開口 33之曝光區域’對應於交疊部之區域係和圖 曝光光學單元2之訊號端子料鏡構件u之情況同樣 抑料料鏡構件 之移動方向先後存在之兩個透鏡群2 =:，掃描侧端子之曝光圖案不會在中途出斷 二 況下，第旧 之第/光分係和第1曝絲學單元2 二二/Τ，以其面積成為交疊部之全面積 ,故藉由上述兩個透鏡群29之疊 &進仃―定深度之曝光，不會有過度曝光之虞。 201219988 然後’一旦掃描端子用透鏡構件25移動一定距 離，於TFT用基板4之掃描側端子形成區域7形成掃 描端子用罩體圖案27之全曝光圖案，則停止移動機構 26使得對於TFT用基板4之曝光全部結束。之後，再 次開始平台8之移動使得TFT用基板4被排出於外部。 於本發明中，訊號端子用透鏡構件u以及掃描端 子用透鏡構件25係分別具有複數訊號端子用單斤: The substrate transport direction is in the cross direction (the arrow C " in Figure 2 is flush with the scan terminal with the reticle 24 and the platform 8 _ in the normal direction of the reticle terminal 24 as shown in Figure 11, not the same The plurality of convex lenses (microlenses) 28a to 28h are arranged such that the lens group 29 is parallel to the surface of the scanning terminal mask 24 and the stage 8 surface: toward the moving direction (arrow C direction) The unit lens members 25A, 25B, and 25C for the plurality of scanning terminals in which the plurality of scanning terminal terminals are formed at a certain arrangement pitch and arranged in a predetermined array pitch are arranged in a row in the direction intersecting the moving direction (arrow C direction) (see FIG. 2). In the same manner as the lens terminal 11 for the signal terminal shown in FIG. 5, each of the unit terminals 25A to 25C for scanning terminals, and the lens group 29 of each lens array 30 are moved relative to the lens member 25 for scanning terminals. The direction (the direction of the arrow C) is obliquely aligned and the axes are arranged in parallel so that the lens rows 30 are displaced by a certain amount in the direction intersecting with the arrow C, and the adjacent end portions 25Aa, 25Ba and 25Bb, 25Ca (see 2) The lens group 29 of each lens array 30 is arranged to be parallel to the above-mentioned axis, and the lens group 29 of each of the scanning terminal lens members 25 is arranged at a constant arrangement pitch. More specifically, the above-mentioned respective scanning terminal lens members are arranged. As shown in Fig. 11 (a), 25A to 25C are arranged at a pitch 匕 (for example, a pitch of 150 μπι) in a direction intersecting with respect to a moving direction of the scanning terminal lens member 25 (in the direction of an arrow c shown in the drawing). The lens array 30 of the lens group 29 is set at a pitch ρ 201219988 (for example, 150 Å pitch) in the moving direction indicated by an arrow C, and each lens group of each lens row 3 观看 is viewed from the above-described shift (arrow C direction). One of the lens arrays 30 adjacent to each other in the overlapping manner is a part of the lens group 30, and is arranged in the direction in which the lens group 29 is arranged. The row pitch P3 of the complex lens group 29 is l/m (m is 2 or more) In addition, each of the scanning terminal lens members 25A to 25C is configured to correspond to each other in the front and back of the transparent substrate as shown in Fig. 1(b). Forming the first and second sides of the complex convex lens 28 The third and fourth transparent columns 31a to 31d are stacked and joined in a state in which the optical axes of the respective convex lenses 28 are aligned, and the scanning terminal cover pattern 27 of the scanning terminal mask 24 is inverted. The image is formed between the second lens array 31b and the third lens array 31c. In this case, the lens group 29 is constituted by eight convex lenses 28a to 28h which are arranged in line with each other in the optical axis. Further, the lens member for the scanning terminal is used. Since the configuration of 25 is the same as that of the unit terminal members η' to 11C for the signal terminals of the first exposure optical unit 2, the specific configuration of the lens group 29 and the function of each of the convex lenses 28 will be omitted. Further, in Fig. η, the symbol 32 indicates that the first aperture 'symbol 33 indicates the opening of the first aperture 32, and the symbol 34 indicates the second aperture. Further, each of the scanning terminal lens members 25A to 25C shields the periphery of the front side convex lens 28a of the first lens array 31a, and is sandwiched between the two broken line lens forming regions in Fig. 11(a). In the same figure, the width W2 of the same direction in the direction of the movement direction indicated by the arrow C in the direction of the arrow 17 201219988 is formed at least in the direction orthogonal to the arrow A in the direction in which the scanning terminal cover pattern 27 of the scanning terminal mask 24 is formed. The width W2 (referenced in Fig. 10) is the same. Thereby, the light passing through the scanning terminal mask 24 can be completely shielded before the movement of the scanning terminal lens member 25 is started and after the movement is completed. Further, a moving mechanism 26 for moving the above-described scanning terminal lens member 25 is provided. The moving mechanism 26 is configured to move the scanning terminal lens member 25 in the direction of the arrow c in FIG. 2 in a plane parallel to the scanning terminal mask 24 and the stage 8, for example, an electromagnetic actuator, an electric platform, or the like. . The person-to-person describes the operation of the exposure apparatus thus constructed. Firstly, by means of the assembly adjustment device of the lens member provided separately, = the surface of each unit of the Wei component (4) is assembled and adjusted in the manner of "in the material value: in the manner of hitting. Specifically, the adjustment is as shown in Fig. 12 = Ming. In the description of the assembly adjustment of the signal terminal _ mirror member u, the assembly adjustment of the scanning terminal mirror member 25 is performed in the same manner, and the description thereof will be omitted. First, in the plural reference mark, 3513 is arranged in a certain order. , p (integer multiple of P!) - straight __ formed on the reference substrate 36 on the opposite side of the configuration signal terminal mirror member ^ second terminal unit lens member 11A - through the shovel ς ί ί ί ί ί ί ί ί ί ί The reference mark 35a performs imaging 22=: The lens member 11 moves in the horizontal plane and is positioned in the micromirror 3; = : 201219988 The reference mark 35a is positioned. Then, the above-mentioned furnace enters the furnace <<> ci The microscope 37 moves horizontally with the arrangement direction of the reference marks 35a and 35b of the above-mentioned bases "5 hex 35a, 35b", and ^ 7 m « .. ^ 乍 horizontally, via the signal U.S. H 35b H UB Lens group 15 to observe the second The number of the == terminal is united by the unit lens member, the head D ^ is moved as shown in the field of view of the microscope 37, and the reference mark 35b of the No. 4 2 is positioned, and then the unit lens member for the signal terminal is also subjected to the same 5 ^^In this case, the lens groups of the reduced-order Wei component U are aligned with the moving direction indicated by the reading head b in FIG. 5 in the intersecting direction arrangement pitch ρι. The signal terminal lens member π and the scanning terminal lens member 25 which have been assembled and adjusted in the above manner are set in the first exposure optical unit 2 and the second exposure optical unit 3, respectively. In this way, the preparation for exposure is prepared. Next, 'the TFT substrate 4 having the signal line and the exposure pattern of the scanning line formed in advance in the display region 5 by another exposure device is positioned, and after being placed at a specific position on the flat σ 8 , the transport mechanism 1 is driven to make the flat opening 8 Moving in the direction of the arrow 图 of Fig. 1 at a constant speed, the substrate 4 is transported in the same direction. At this time, the light sources of the first and second exposure optical units 2, 3 are turned on. Then, the imaging unit θ which is omitted from the opposite side of the first optical unit 2 in the direction in which the substrate is conveyed by a predetermined distance is used to detect the base of the TFT substrate 4, which is omitted in advance. The mark is used to measure the distance of the platform 4 by the position sensing based on the position of the platform 8 at the detection time of the reference mark. Then, the signal side of the substrate for the TFT is once the platform 8 is moved by a predetermined distance. In the terminal forming region 6 of the exposure optical unit 2, the movement of the stage 8 is stopped immediately below the photomask 10. Further, the moving mechanism 12 of the first exposure optical unit 2 is driven to start the lens member for the nickname terminal. 11 is moved in the direction of the arrow B in FIG. 1, and the plurality of lens groups 15 (see FIG. 5) continuously moving in the same direction are used to make the signal terminal cover pattern 13 of the signal terminal mask 1 shown in FIG. The equal-fold erect image is projected on the surface of the TFT substrate 4, and the exposure pattern of the signal-side terminal is formed on the signal-side terminal forming region 6 of the TFT substrate 4. At this time, as shown in FIG. 7, it is limited to the lens group 15. The exposed area of the opening 20 of the first aperture 19, the area corresponding to the overlapping portion 22 is received by the two lens groups 15 which are successively present in the moving direction of the signal terminal lens member u shown by the arrow B in the same figure. The exposure is superimposed, whereby the exposure pattern of the signal side terminal is continuously connected without interruption in the middle. In this case, since the opening 20' of the first aperture 19 corresponds to the portion of the overlapping portion 22 Since the area is formed as one half of the entire area of the overlapping portion 22, the exposure of the two lens groups 15 is performed at a certain depth, and there is no overexposure. The lens member 11 is moved by a specific distance to form a signal terminal for the signal terminal 8 in the signal side terminal forming region 6 of the TFT substrate 4. The full exposure pattern of the cover pattern 13 stops the moving mechanism 12 and starts moving the platform 8 to restart the TFT. The substrate 4 is transported. The sweat σ is moved so that the TFT substrate 4 is moved by a predetermined distance so that the scanning side terminal forming region 7 of the TFT substrate 4 reaches the second exposure light and the scanning terminal mask 24 of the unit 3. Immediately below, the stage 8 is stopped: movement 0. Next, the moving mechanism 26 of the second exposure optical unit w is driven to cause the scanning terminal lens member 25 to start moving in the direction of the arrow c in FIG. 2, and continuously move in the same direction. The multi-lens group 史 (history picture 11) projects the equal-right image of the scanning terminal cover 27 of the scanning terminal for the scanning terminal shown in Fig. 2 on the surface of the gripping substrate 4 to make the scanning side The exposure pattern of the terminal is formed on the scanning side terminal forming region 7 of the TFT panel 4. The exposure region of the opening 33 of the first aperture 32 of the 蚬砰29 corresponds to the region of the overlapping portion. And the case of the signal terminal mirror member u of the exposure optical unit 2 is the same as the two lens groups in which the moving direction of the mirror member is successively 2 =:, the exposure pattern of the scanning side terminal is not interrupted in the middle. , the first / light division and the first exposure unit 2 22 / Τ, with its area becoming the full area of the overlap, so by the stack of the above two lens groups 29 Deep exposure, there will be no overexposure. 201219988 Then, when the scanning terminal lens member 25 is moved by a certain distance and the scanning-side terminal forming region 7 of the TFT substrate 4 is formed with the full-exposure pattern of the scanning-terminal body pattern 27, the moving mechanism 26 is stopped so that the substrate 4 for the TFT is used. The exposure is all over. Thereafter, the movement of the stage 8 is started again so that the TFT substrate 4 is discharged to the outside. In the present invention, the signal terminal lens member u and the scanning terminal lens member 25 each have a plurality of signal terminal sheets.
構件UA〜HC、掃描端子用單錢鏡構件说〜25C 排列成一列而配置之構成，圖13所示各透鏡構件u、 25之移動距離L】係成為訊號端子用光罩1〇之訊號端子 用罩體圖案13形成區域在箭頭B方向之寬度與訊 號端子用透鏡構件U之透鏡形成區域在箭頭B方^之 ^相加之距離’以及掃描端子用光罩24之掃描端子 ㈠體圖帛27形成區域在箭頭c方向之寬度％與掃 =端子用透鏡構件25之透鏡形成區域在箭頭c方向之 見度相加之距離。 、 々四，矾唬端子用透鏡構件11以及掃描却 =透鏡構件25亦可為分別為具有複數訊號端子用身 9，構件UA〜11C、掃描端子用單位透鏡構件257 互異排列配置之構成。於此種情況下，圖14汽 置fn鏡構件11、25之移動距離L2係成為訊號端子用 之訊號端子用罩體圖案13形成區域在箭頭丑方 ^，度％1與訊號端子用單位透鏡構件11A以及訊號 子用單位透鏡構件11B之透鏡形成區域在箭頭^ ⑧ 22 201219988 之寬度相加之距離，以及掃描端子用光罩24之掃描端 子用罩體圖案27形成區域在箭頭C方向之寬度W2與 掃描端子用單位透鏡構件25A以及掃描端子用單位透 鏡構件25B之透鏡形成區域在箭頭C方向之寬度相加 之距離’變成比本發明之透鏡構件11、25之移動距離 Li 來得大（L! < L2)。 於以上之說明中，係針對於一個光罩形成一個罩體 圖案做了描述’惟本發明不限於此，亦可如圖15所示 般，於一個光罩形成複數種之罩體圖案。於此種情況 下，光罩朝和透鏡構件之移動方向為同方向來移動以選 擇所希望之罩體圖案。此外，圖15 (a)係顯示訊號端 子用光罩10’同圖（b)係顯示掃描端子用光罩24。 此外，於上述實施形態，係針對TFT用基板4藉 由其他曝光裝置而於顯示區域5内縱橫交叉地形成了 複數訊號線以及掃描線之曝光圖案的情況做了說明，惟 本發明不限定於此’亦可相對於第1曝光光學單元2在 基板搬運方向之相反侧離一定距離而具備用以於τρτ 用基板4形成上述訊號線以及掃插線之曝光圖案的第3 曝光光學單元。於此種情況下，上述f3#光光學單元 在形成於透明基板-面之遮光膜上，於m St二之搬運方向上先後形成有由薄膜電晶體之電 訊號線以及掃描線般要求解析度不同之2 對應案所構成之兩個罩體圖案群，於另一面則 對應於要求解析度不同之2 _之罩體圖案當中要求 23 201219988 解析度高之薄膜電晶體之電極配線之罩體圖案而形成 有用以將該罩體圖案縮小投影於TFT用基板4上之微 透鏡）以微透鏡側成為TFT用基板4側的方式來配置， 對該光罩以一定之時間間隔來間歇地照射光源光而對 於在圖1之箭頭A方向上以一定速度搬運中之tft用 基板4以一定周期來曝光上述光罩之2種類之罩體圖 案。 此處所使用之光罩之具體構成例，只要為具備複數 罩體圖案列（由要求解析度高之薄膜電晶體之電極配線 用罩體圖案所構成罩體圖案群在和TFT用基板4之搬 運方向（箭頭A方向）呈大致正交之方向上使得上述複 數罩體圖案以特定間距來一直線排列而形成），以由位 於TFT用基板4之搬運方向近側之上述罩體圖案列所 形成之複數曝光圖案之間能以後續之罩體圖案列所形 成之複數曝光圖案來補足的方式，使得後續之罩體圖案 列在上述複數罩體圖案之排列方向上分別錯開一定^ 寸來形成即可。 再者，於上述實施形態，針對一邊使得TFT基板4 朝特定方向移動一邊進行曝光之情況做了說明，惟本發 明不限砂此’亦可使得TFT基板4在二維平面内步 進移動來進行曝光。 此外，於以上之說明中，針對被曝光體為TFT用 基板4之情況做了插述，惟本發明不限定於此，被曝光 體只要為打算形成非周期性圖案者皆可。 ⑧ 24 201219988 【圖式簡單說明】 圖1係顯示本發明之曝光裝置之實施形態的前 圖。 圖2係圖1之俯視圖。 圖3係顯示本發明之曝光裝置所使用之薄膜電晶 體用基板之俯視圖。 μ 圖4係顯示本發明之曝光裝置所使用之訊號蠕子 用光罩之一構成例之俯視圖。 圖5係顯示本發明之曝光裝置所使用之訊號端子 用透鏡構件之一構成例之俯視圖。 圖6係顯示上述訊號端子用透鏡構件之訊號端子 用單位透鏡構件之一構成例之圖，（a)係俯視圖，（匕 係前視圖。 圖7係針對上述訊號端子用單位透鏡構件之透鏡 群之第1光圈開口進行說明之俯視圖。 兄 圖8係顯示於上述訊號端子用透鏡構件之移動方 向相鄰接之兩個透鏡群所進行之曝光之說明圖。 圖9係顯示上述第丨光圈開口之其他形狀之俯視 圖。 圖10係顯示本發明之曝光裝置所使用之掃描端子 用光罩之一構成例之俯視圖。 圖11係顯示本發明之曝光裝置所使用之掃描端子 用透鏡構件之掃描端子用單位透鏡構件之一構成例之 圖’（a)係俯視圖，（b)係前視圖。 25 201219988 圖12係針對上述訊號端子用透鏡構件以及掃描端 子用透鏡構件之組裝調整所顯示之說明圖。 圖13係針對將單位透鏡構件並排成為一列所構成 之訊號端子用透鏡構件以及掃描端子用透鏡構件之 動距離所顯示之說明圖。 圖14係針對將單位透鏡構件互異#列所構 號端子用透鏡構件以及掃描端子用透鏡構件 汛 離所顯示之說明圖。 動距 圖15係顯示於1片光罩形成有複數種罩 例之概略俯視圖，（a)係顯示訊號端子用光罩之/之 (b )係顯示掃描端子用光罩之例。 【主要元件符號說明】 1 2 3 4 5,6,7 8 9 10 11The members UA to HC and the scanning terminal are arranged in a single row by the single-lens mirror member. The moving distance L of each of the lens members u and 25 shown in Fig. 13 serves as a signal terminal for the signal terminal mask 1 The width of the region formed by the mask pattern 13 in the direction of the arrow B and the distance between the lens forming region of the signal terminal lens member U at the arrow B side and the scanning terminal of the scanning terminal mask 24 (a) The width % of the formation region in the direction of the arrow c is the distance from the visibility of the lens formation region of the scanning lens member 25 in the direction of the arrow c. Further, the 透镜4, 矾唬 terminal lens member 11 and the scanning lens unit 25 may be configured such that the body 9 having the plurality of signal terminals, the members UA to 11C, and the unit lens member 257 for the scanning terminals are arranged in a different arrangement. In this case, the moving distance L2 of the mirror-shaped fn mirror members 11 and 25 of Fig. 14 is formed into a region of the signal terminal for the signal terminal for the signal terminal 13 in the arrow ugly square, the degree %1 and the unit lens for the signal terminal. The distance between the lens forming region of the member 11A and the unit sub-unit lens member 11B at the width of the arrow ^ 8 22 201219988 and the width of the region formed by the scanning terminal cover pattern 27 of the photomask 24 for the scanning terminal in the direction of the arrow C The distance "W of the lens forming region of the unit lens member 25A for scanning terminals and the unit lens member 25B for scanning terminals in the direction of the arrow C" becomes larger than the moving distance Li of the lens members 11 and 25 of the present invention (L). ! < L2). In the above description, a mask pattern has been described for forming a mask. However, the present invention is not limited thereto, and as shown in Fig. 15, a plurality of mask patterns may be formed in one mask. In this case, the reticle is moved in the same direction as the moving direction of the lens member to select the desired hood pattern. Further, Fig. 15 (a) shows the signal terminal mask 10' and the scanning terminal mask 24 shown in Fig. 15(b). Further, in the above-described embodiment, the case where the TFT substrate 4 is formed with the plurality of signal lines and the scanning line exposure patterns in the display region 5 by the other exposure devices has been described, but the present invention is not limited thereto. In addition, the third exposure optical unit for forming the exposure pattern of the signal line and the sweep line on the substrate 4 for τρτ may be provided with respect to the first exposure optical unit 2 at a distance from the opposite side of the substrate conveyance direction. In this case, the f3# optical optical unit is formed on the transparent substrate-surface light-shielding film, and the electrical signal line and the scanning line-like resolution of the thin film transistor are successively formed in the transport direction of m St 2 . The two cover pattern groups formed by the different two corresponding cases correspond to the cover pattern of the electrode wiring of the thin film transistor with high resolution in the case of the cover pattern of 2 _ which requires different resolution. On the other hand, a microlens for reducing the projection of the cover pattern on the TFT substrate 4 is formed so that the microlens side becomes the TFT substrate 4 side, and the light source is intermittently irradiated with light at regular intervals. The cover pattern of the two types of the mask is exposed to the tft substrate 4 which is conveyed at a constant speed in the direction of the arrow A in FIG. In the specific configuration example of the reticle used in the present invention, the cover pattern group including the plurality of mask pattern rows (the electrode pattern cover pattern for the thin film transistor having a high resolution required) and the TFT substrate 4 are transported. The direction (the direction of the arrow A) is formed by arranging the plurality of mask patterns in a substantially orthogonal direction so as to be aligned at a specific pitch, and is formed by the mask pattern row located on the side opposite to the conveyance direction of the TFT substrate 4 The plurality of exposure patterns can be complemented by a plurality of exposure patterns formed by the subsequent mask pattern columns, so that the subsequent mask pattern columns are respectively formed by shifting a certain size in the arrangement direction of the plurality of mask patterns. . Further, in the above-described embodiment, the case where the TFT substrate 4 is exposed while moving in a specific direction has been described. However, the present invention is not limited to sand, and the TFT substrate 4 can be stepped in a two-dimensional plane. Exposure. Further, in the above description, the case where the object to be exposed is the TFT substrate 4 has been described, but the present invention is not limited thereto, and the object to be exposed may be any one in which a non-periodic pattern is intended to be formed. 8 24 201219988 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a front view showing an embodiment of an exposure apparatus of the present invention. Figure 2 is a plan view of Figure 1. Fig. 3 is a plan view showing a substrate for a thin film transistor used in the exposure apparatus of the present invention. Fig. 4 is a plan view showing an example of a configuration of a photoreceptor reticle used in the exposure apparatus of the present invention. Fig. 5 is a plan view showing an example of the configuration of a lens member for a signal terminal used in the exposure apparatus of the present invention. 6 is a view showing an example of a configuration of a unit lens member for a signal terminal of the signal terminal lens member, and (a) is a plan view (a front view of the system). FIG. 7 is a lens group for the unit lens member for the signal terminal. The front view of the first aperture opening will be described. Fig. 8 is an explanatory view showing exposure of two lens groups adjacent to each other in the moving direction of the lens terminal for the signal terminal. Fig. 9 shows the first aperture opening. Fig. 10 is a plan view showing a configuration example of a mask for a scanning terminal used in the exposure apparatus of the present invention. Fig. 11 is a view showing a scanning terminal of a lens member for a scanning terminal used in the exposure apparatus of the present invention. FIG. 12 is an explanatory view showing an assembly adjustment of the above-described signal terminal lens member and scanning terminal lens member. FIG. Fig. 13 is a lens member for a signal terminal and a lens for a scanning terminal which are formed by arranging unit lens members in a row. FIG. 14 is an explanatory view showing that the unit lens member is different from the unit lens terminal member and the scanning terminal lens member. A single mask is formed with a schematic plan view of a plurality of types of masks, and (a) shows a photomask for a signal terminal. (b) shows an example of a mask for a scanning terminal. [Description of main components] 1 2 3 4 5,6,7 8 9 10 11
11A，11B，11C llAa，llBa，llBb，llCa 搬運機構 第1曝光光學單元 第2曝光光學單元 TFT用基板 區域 平台 光源裝置 訊號端子用光罩 訊號端子用透鏡構件 單位透鏡構件 端部 26 201219988 12 13 14a〜14h 15 16 17 18a 18b 18c 18d 19 20 21a,21b,21c,21d 22 23 24 2511A, 11B, 11C llAa, llBa, llBb, llCa transport mechanism first exposure optical unit second exposure optical unit TFT substrate area platform light source device signal terminal photomask signal terminal lens member unit lens member end portion 26 201219988 12 13 14a~14h 15 16 17 18a 18b 18c 18d 19 20 21a, 21b, 21c, 21d 22 23 24 25
25A,25B,25C 25Aa,25Ba,25Bb,25Ca 26 27 28,28a〜28h 29 30 移動機構 訊號端子用罩體圖案 凸透鏡 透鏡群 透鏡列 透明基板 第1透鏡陣列 第2透鏡陣列 第3透鏡陣列 第4透鏡陣列 第1光圈 開口 角部 交疊部 光源裝置 掃描端子用光罩 掃描端子用透鏡構件 單位透鏡構件 端部 移動機構 掃描端子用罩體圖案 凸透鏡 透鏡群 透鏡列 27 201219988 31a 第1透鏡陣列 31b 第2透鏡陣列 31c 第3透鏡陣列 31d 第4透鏡陣列 32 第1光圈 33 開口 34 第2光圈 35a,35b 基準標記 36 基準基板 37 顯微鏡 38 第2光圈 ⑧ 2825A, 25B, 25C 25Aa, 25Ba, 25Bb, 25Ca 26 27 28, 28a to 28h 29 30 Moving mechanism signal terminal cover pattern convex lens lens group lens array transparent substrate first lens array second lens array third lens array fourth Lens array first aperture opening angle overlapping portion light source device scanning terminal photomask scanning terminal lens member unit lens member end moving mechanism scanning terminal cover pattern convex lens lens group lens array 27 201219988 31a 1st lens array 31b 2 lens array 31c third lens array 31d fourth lens array 32 first aperture 33 opening 34 second aperture 35a, 35b reference mark 36 reference substrate 37 microscope 38 second aperture 8 28