201219193 六、發明說明： 【發明所屬之技術頜威】 本發明係關於一種均勻施壓裝置，尤係關於一種捲對 板微奈米壓印之均勻施壓裝置。 【先前技術】 2010年起全球發光二極體（LED)市場將恢復兩位數的 高成長，預估將從2009年的69億美元成長至2013年的200 億美元。高亮度LED從2006年的68%成長到2009年的76%。 k昇LED發光效率的主流技術包括表面粗化、光子晶體， 以及背部反射鏡等方法，其中光子晶體還有控制偏極與光 場分佈，故可更提昇LED價值。目前在LED晶粒上製作光子 晶體結構，採平面單片式奈米壓印製程為主，產能低於3 〇 片/小時，若改採捲對板（roll-to-sheet)方式，產能至少提高 2倍以上。但由於硬質基板捲對板製程的壓印均勻性普遍不 佳。 是故’目前的生產方式大部分皆採用捲對捲 (Roll-to_Roll)製程生產（如下列專利所揭露：國際專利號 W02009107294 ;日本專利 JP2007203576 ;韓國專利 KR20090119545 ;日本專利 JP2008290330 ;日本專利 JP2009292008 ;中國專利CN24771538)，生產速度快且產能 高為其主要的製程特點。捲對板（R〇ll-t〇-Sheet)與捲對捲同 為滾壓成形技術，差異之處在於捲對捲製程之基材大多是 具可撓性膜材，利用膜材收放捲的張力控制，在壓印區可 獲得均勻的壓力分佈。捲對板製程則大多面臨硬質基板， [S] -4 - 201219193 例如LED晶圓（wafer)，玻璃面板等，當壓印區域變大或同 時壓印多片基杈時，傳統不具均壓效果之滾筒模具，將無 法使大範圍區域的成形品質一致並常導致成形不均勻。針 對未來產業所需要的大面積硬質基板滾壓成形製程，具均 堡功能之捲對板模具裝置的技術就顯得越來越重要。 於已知專利中’中華民國專利第1316466號「滾筒模具 結構及其製造方法」’該案揭露一種固定軟性金屬模仁包覆 於圓筒外表面之模具結構，乃利用一置於圓筒内部之心軸 ’藉由旋轉心軸，對軟性金屬模仁施以一張力，而使軟性 金屬模仁該貼附於圓筒外表面，惟該外表面結構為硬質結 構，故該滾筒對硬質基板並無均壓功能，從而無法使成形 的品質均勻。 已知日本專利（專利公告號為JP60264278)提出的「 Imprinting Apparatus」揭露一滾印裝置。該裝置利用一滾 壓輪對平面基板進行滾印製程，滾壓輪本身並無強調均壓 功效，在裝置其他部件部位設計許多機構及彈簣裝置，以 達到滾壓輪與基板間的壓力固定，然而此裝置並無法確認 每一滾壓輪與基板接觸區之壓力均相等，是故亦無法提升 壓印品質的均勻性。 已知國際專利號W〇2009107294文件揭露一種可快速 拆換滾筒裝置，操作方式類似氣脹軸之作動方式，主要由 三個部件組成，包括一簍空内軸，内軸内有一氣壓囊以及 滾筒模具。該裝置是利用氣壓囊撐住滾筒模具，若滾筒裝 置為硬式材質，則並無法完全順應性地接觸施壓於表面不 201219193 平坦的基板，若為軟式材質，則背壓會明顯不均勻，故此 亦無法提升壓印的均勻性。 由於傳統滾印成形製程之滾筒模具並無均壓效果，當 進行軟性基材捲對捲滾壓成形時，可經由背壓輪及基材收 捲的張力控制，並利用被壓印之軟性基材本身的撓曲變形 ，獲得良好的均壓效果。然而，當被壓印之基板為硬質時 ’則上述傳統滾筒模具無法達到均壓效果。亦即，上述專 利雖揭露各種壓印裝置，但卻無揭露對硬質基板具有均壓 的壓印裝置，因此捲對板微奈求壓印之均勻施壓裝置仍有 相當大的改善空間。 【發明内容】 本發明有別於先前技術所採用之滾筒模具及滾壓裝置 之設計，係提出一種利用流體之均壓特性為設計之具均壓 效果滾壓模具，利用此滾壓模具，即使是面對表面平坦度 不佳之硬質基板，仍可使滾壓模具與基板之每一接觸部位 ，其壓力均相等，如此可縮小成形結構之尺寸變異量達 到均勻的成形品質。 本發明提出一種捲對板壓印之均勻施壓裝置，其包含 圓筒、等壓裝置及軟性模具。等壓裝置設置於圓筒上並利 用專屢裝置内所含流體之本身具有的均壓特性，而製作具 均勻施壓功效之均勻施壓裝置，並利用軟性模具與等壓裝 置可分離地並於壓印時能緊密接觸的特性，以達到大面積 硬質基板均勻成形微奈米結構目的。 本發明所提出另一種捲對板壓印之均勻施壓裝置包含 201219193 種均勻施壓裝置與上述裝 附於等壓裝置上，隨等壓 圓筒、等壓裝置及軟性模具。此 置不同之處在於，軟性模具係貼 裝置同軸轉動。201219193 VI. Description of the Invention: [Technology of the Invention] The present invention relates to a uniform pressure applying device, and more particularly to a uniform pressure applying device for roll-to-plate micro-nano imprinting. [Prior Art] Since 2010, the global LED (LED) market will resume double-digit high growth, which is expected to grow from $6.9 billion in 2009 to $20 billion in 2013. High-brightness LEDs have grown from 68% in 2006 to 76% in 2009. The mainstream technologies for k-litre LED luminous efficiency include surface roughening, photonic crystals, and back mirrors. Photonic crystals also control polarization and light field distribution, which can increase the value of LEDs. At present, the photonic crystal structure is fabricated on the LED die. The planar single-chip nanoimprint process is mainly used, and the production capacity is less than 3 / piece/hour. If the roll-to-sheet method is adopted, the capacity is at least Increase by more than 2 times. However, the uniformity of imprinting of the hard substrate roll to the board process is generally poor. Therefore, most of the current production methods are produced by Roll-to-Roll process (as disclosed in the following patents: International Patent No. W02009107294; Japanese Patent JP2007203576; Korean Patent KR20090119545; Japanese Patent JP2008290330; Japanese Patent JP2009292008; China Patent CN24771538), the production speed and high productivity are the main process characteristics. The roll-to-plate (R〇ll-t〇-Sheet) and the roll-to-roll are the same as the roll forming technology. The difference is that the substrate of the roll-to-roll process is mostly made of flexible film, and the film is retracted and rolled. Tension control provides a uniform pressure distribution in the embossed area. The roll-to-board process mostly faces rigid substrates, such as LED wafers, glass panels, etc. When the embossed area becomes large or multiple substrates are embossed at the same time, the conventional method does not have a voltage equalization effect. In the drum mold, the molding quality in a wide range of areas cannot be uniform and often causes uneven formation. For the large-area hard substrate roll forming process required by the future industry, the technology of the roll-to-plate mold device with the uniform function is becoming more and more important. In the known patent, 'Republic of China Patent No. 1316466, "Roller Mold Structure and Method of Manufacturing the Same", discloses a mold structure in which a fixed soft metal mold is coated on the outer surface of a cylinder, and is placed inside the cylinder. The mandrel' exerts a force on the soft metal mold by rotating the mandrel, so that the soft metal mold is attached to the outer surface of the cylinder, but the outer surface structure is a hard structure, so the drum is on the hard substrate There is no pressure equalization function, so the quality of the forming cannot be uniform. The "Imprinting Apparatus" proposed by the Japanese Patent (Patent Publication No. JP60264278) discloses a printing apparatus. The device uses a rolling wheel to perform a rolling process on the flat substrate, and the rolling wheel itself does not emphasize the equalizing effect. Many mechanisms and elastic devices are designed in other parts of the device to achieve pressure fixing between the rolling wheel and the substrate. However, this device does not confirm that the pressure of each rolling wheel and the substrate contact area are equal, so that the uniformity of the imprint quality cannot be improved. The international patent number W〇2009107294 discloses a quick-changeable roller device that operates in a manner similar to that of an inflatable shaft. It consists mainly of three components, including a hollow inner shaft, a pneumatic bladder inside the inner shaft, and a roller. Mold. The device uses a pneumatic sac to hold the roller mold. If the roller device is made of a hard material, it cannot fully conform to the flat substrate that is pressed on the surface not 201219193. If it is a soft material, the back pressure will be significantly uneven. It is also impossible to improve the uniformity of the imprint. Since the roller mold of the conventional roll forming process does not have a pressure equalizing effect, when the soft substrate roll-to-roll roll forming is performed, the tension of the back pressure roller and the substrate can be controlled, and the soft base to be embossed is utilized. The deflection of the material itself gives a good pressure equalization effect. However, when the substrate to be imprinted is hard, the conventional roller mold described above cannot achieve the pressure equalization effect. That is, although the above-mentioned patent discloses various imprinting apparatuses, it does not disclose an imprint apparatus having a pressure equalization on a hard substrate, and therefore there is still considerable room for improvement in the uniform pressure applying apparatus for the roll-to-plate imprinting. SUMMARY OF THE INVENTION The present invention is different from the design of the drum mold and the rolling device used in the prior art, and proposes a rolling mold with a pressure equalizing effect designed by using the pressure equalization property of the fluid, and the rolling mold is used even if In the case of a hard substrate having a poor surface flatness, the pressure of the contact portion of the rolling mold and the substrate can be made equal, so that the dimensional variation of the formed structure can be reduced to achieve uniform forming quality. The present invention provides a roll-to-plate embossing uniform pressure device comprising a cylinder, an isostatic device and a flexible mold. The pressure equalizing device is disposed on the cylinder and utilizes the pressure equalizing characteristic of the fluid contained in the special device to produce a uniform pressure applying device with uniform pressure applying effect, and is separably separated by a soft mold and an equal pressure device. The characteristics of close contact when embossing can achieve the purpose of uniformly forming a micro-nano structure on a large-area hard substrate. Another uniform pressure-applying device for roll-to-plate imprinting according to the present invention comprises 201219193 uniform pressure applying devices and the above-mentioned attached pressure equalizing device, with an isostatic cylinder, an isobaric device and a soft mold. The difference is that the flexible mold attachment device rotates coaxially.
本發明所提出又一種捲對板壓印之均勻施壓裝置包含 圓筒、彈性膜及固定件。彈性膜設置於圓筒上，並和該圓 筒間有2間’而固定件可用來固定彈性膜於圓筒上，以 供流體注入彈性膜與圓筒之間的空間而產生上述的均壓特 性’進而達成先前技術無法達到的均勻成形品質。 上文已、盈概略地敍述本揭露之技術特徵，俾使下文之 本揭露詳心m獲得較佳瞭解。構成本揭露之申請專 利範圍標的之其它技術特徵將描述於下文。本揭露所屬技 術領域中具有通常知識者應可瞭解，下文揭示之概念與特 定實施範例可作為基礎而相#輕易地予以修改或設計其它 結構或製程而實現與本揭露相同之目的。本揭露所屬技術 領域中具㈣常知識者亦應可瞭解，這類等效的建構並無 法脫離後附之中請專利範圍所提出之本揭露的精神和範圍 【實施方式】 以下將參照隨附之圖式來描述本發明為達成目的所使 用的技術手段與功效，而以下圖式所列舉之實施例僅為輔 助說明，但本案之技術手段並不限於所列舉圖式。 如圖1之實施例所示，本發明之捲對板壓印的均勻施壓 裝置100包含圓筒110、等壓裝置130及軟性模具15〇。等壓 裝置130係設置於圓筒11〇上。具體而言，等壓裝置13〇係以 201219193 包覆圓筒…圓周的方式設置，然而在其他實施例中，亦可 因應不同設計需求而以不同方式將等壓裝置13〇設 筒m上。在此實施例中’等壓裝置⑽包含但不限於液壓 囊或氣壓囊，亦可包含其他可提供相同均壓功能的裝置 具體而言，等壓裝置13〇於此實施例中為液壓囊咖。由於 液壓囊13〇,中所含的流體為液體，且此液體可提供液壓囊 130’内每-單位表面積所受的壓力相# ’因此液壓囊咖 y具有等壓裝置m所提供均壓的功能。若以其他流體例如 亂體來取代液體時，等壓裝置13㈣為氣壓囊i3G·,，由於氣 體亦是流體’也可造成氣壓囊！，内每_單位表面積所= 的壓力相等，因此氣壓囊130"亦可具有等壓裝置13〇所提： 的均壓功自卜本發明藉由等壓袭置13()所提供的功能，而完 成具有均壓效果之捲對板壓印㈣Hsheet)之均勻施壓= 置。為了將軟性模具150表面所包含的微奈米圖案（圖未示） 均句麼印於硬質基板_上，如圖！所示之實施例中，軟性 模具150並未固定設置於圓筒1〇〇或等壓裝置13〇上而是與 等壓裝置130可分離地並於壓印時能緊密接觸。具體而言， 如圖2所示之均勻施壓裝置1〇〇，實施例中，軟性模具15〇係為 -扁平帶狀撓性材料’且其中單面或雙面具有微奈米圖案( 圖未示）。其主要是利用兩端以收放捲裝置8〇〇而作動，軟 1"生模具150收放捲的線速度將與圓筒11〇轉動時的等壓裝置 130表面切線方向速度相同，在此實施例中，等壓裝置13〇 可為氣壓囊130·，。由於本發明所提出具均壓效果之捲對板 壓印裝置設計，因硬質基板900設置在輸送帶裝置上，可使壓 201219193 印產能至少提高2倍以上，是故本發明未來不僅可用於led 產業’更可推廣至常用硬質基板的太陽能光電產業或面板 產業。 如圖3之實施例所示，圓筒200亦可呈現不同於上述實 施例所示的結構。在圖3之均勻施壓裝置1〇〇'，實施例的剖面 圖中，圓筒200包含筒狀部210以及設置於筒狀部21〇相對兩 端的兩個圓環部220。等壓裝置13〇(例如液壓囊130')則設置 於筒裝部210的外表面並於圓環部22〇的側緣相抵接。由於 液壓囊130'的剖面體積比圓環部220的頂緣221要突出，因此 硬質基板900並不會與圓筒200直接接觸，而造成成型不均 勻的不良結杲。 如圖3之實施例所示，圓筒2〇〇所包含的筒狀部21〇與圓 環部220沿圓筒200縱轴方向共軸心，且筒狀部21〇與圓環部 220之轴心處形成空腔400。然而在圖i及圖2所示的實施例 中，圓筒110與圖3之圓筒200相同，亦可為實心並無形成任 何空腔。由於圓筒200係與軟性膜具15〇可分離地並於壓印 時能緊密接觸，因此如圖3所示，軟性模具15〇的剖面只有 在圓筒200靠近硬質基板9〇〇的一側出現，在此實施例中可 以明顯地觀察到軟性模具150表面所包含的微奈米圖案151 。當均勻施壓裝置·㈣微奈米圖案151均句成形於硬質 基板900上時，通常需要將硬質基板9〇〇上的圖案（圖未示） 固化。 本發明的固化成形製程包含但不限於加熱固化成形製 程、紫外線固化成形製程或其他具有相似功能的固化成形 -9· 201219193 製程。若採加熱固化成形製程，熱源可設置於硬質基板9〇〇 下方或圓筒（較佳為轴心中空，但亦可將熱源與圓筒整合而 變成實心結構）内部；反之，若採紫外線固化成形製程，uv 燈源（圖未示）可設置於硬質基板9〇〇下方或圓筒（較佳為11乂 燈源設置於圓筒内部，但亦可將1；¥燈源與圓筒整合而變成 實心結構）内部。為了使UV燈源（圖未示）可照射到硬質基板 900上所成形的圖案，在UV燈源設置於圓筒内部的實施例（ 圖未示）中，圓筒的材質允許紫外線穿透，在此實施例（圖未 示）中，圓筒内部亦可包含一遮罩（圖未示）遮罩可避免紫外 線照射到其他尚未需要固化的Uv固化塗料，以利正常固化 程序進行；然而若是在UV燈源設置於硬質基板9〇〇下方的 實施例（圖未示）時，圓筒的材質亦可吸收多餘的紫外線，以 避免多餘的紫外線造成不必要的固化發生。 如圖4所不之實施例中，均勻施壓裝置1〇〇，，，包含圓筒 200、等壓裝置（例如氣壓囊13〇，，但不限於此，亦可為液壓 囊）及軟性模具25(^主要與上述實施例不同之處在於軟性 模具25 0係貼附於等壓裝置。因此在此實施例中，並不需要 如圖2中收放捲裝置800，且由圖4之剖面圖觀察，軟性模具 250在氣壓囊130'的上下兩側皆出現。換言之，軟性模具 環繞地貼㈣等壓裝置上。在此實施例中亦可明顯地觀察 到軟性模具250表面所包含的微奈米圖案251。 如圖5所示之實施例中，均勻施壓裝置3〇〇包含圓筒3⑺ 、彈性膜330及固定件350。彈性膜33〇設置於圓筒31〇上， 並和圓筒310間有一空間，且固定件35〇可供固定彈性膜 201219193 於圓筒310上。如圖6所示之實施例中，均勻施壓裝置3〇〇 進一步包含軟性模具370’軟性模具370與彈性膜33〇可分離 地並於壓印時能緊密接觸，是故在此實施例中，彈性膜33〇 需要兩端以收放捲裝置（圖未示）而如上述實施例方式作動。 在圖6之均勻施壓裝置300實施例的剖面圖中，圓筒31〇 包含筒狀部3U以及設置於筒狀部311相對兩端的兩個圓環 部312。彈性膜330則設置於圓環部312的外表面並以固定件 350固定。在此實施例中，固定件35〇係為扣環，扣環則挾 持彈性膜330於圓環部312。由於彈性膜33〇與筒狀部3ιι之 間的二間有填充流體（包含氣體或液體），因此彈性膜3 3 〇可 膨脹並比固定件350還要突出，因此硬質基板9〇〇並不會與 固定件350直接接觸，而造成成型不均勻的不良結果。又可 於該圓環部312外側設置一注氣孔313，故可藉由該注氣孔 313將氣體或液體充滿彈性膜33〇和筒狀部311及圓環部312 之間的空間。 如圖6之實施例所示，圓筒31〇所包含的筒狀部3ιι與圓 環部312沿圓筒310縱軸方向共軸心，且筒狀部3ιι與圓環部 312之軸心處形成空腔4〇〇。然而在圖！及圖2所示的實施例 中’圓筒no的軸心為實心並無形成任何空腔。由於圓筒31〇 係與軟性膜具370可分離地並於壓印時能緊密接觸，因此如 圖6所示，軟性模具37〇的圖案只有在圓筒31〇靠近硬質基板 9 0 0的一侧出現，在此實施例中可以明顯地觀察到軟性模具 3 70表面所包含的微奈米圖案37卜當均勻施壓裝置利用 微奈米圖案371均勻成形於硬質基板9〇〇上時，通常需要將 -11- 201219193 硬質基板900上的圖案（圖未示）固化。固化方式及相關所需 的組件以如上述實施例所述，故不再贅述。 如圖7所示之另一實施例中，均勻施壓裝置3〇〇,包含圓 筒31〇、彈性膜330及固定件350。主要與圖6實施例不同之 處在於彈性膜330包含軟性模具331。因此在此實施例中， 並不需要收放捲裝置’且由圖7之剖面圖觀察，軟性模具Mi 在彈性膜330的上下兩側皆出現。換言之，軟性模具33 i環 繞地形成於彈性膜330表面上。在此實施例中亦可明顯地觀 察到軟性模具331表面所包含的微奈米圖案333。又可於該 彈性膜330設置一注氣孔313,，故可藉由注氣孔313'將氣體 或液體充滿彈性膜330和筒狀部311及圓環部312之間的空 間。 不論是圖ό或圖7的實施例，彈性膜330與圓筒310之間 的空間需要填充流體’ 一般而言’所流體較佳係在彈性膜 330經由固定件350固定前所填充，因此並不需要流體注入 孔，然而在圖6或圖7的其他變化實施例中，流體注入孔可 形成於圓環部312、筒狀部311或彈性膜33 0上，以供彈性膜 330經由固定件350固定後再行填充流體（例如氣體或液體） 〇 如圖8所示之實施例中，圓筒2〇〇包含筒狀部21 〇及圓環 部220 ’液壓囊130'設置於筒狀部21〇上並與圓環部220側緣 抵觸’為了證明本發明均勻施屋裝置的均壓能力，利用上 述圓筒200於硬質基板900上的壓力感測紙7〇〇壓印，結果如 圖11所示之壓力感測紙700Α所示。此外，如圖9所示之習知 [S] -12- 201219193 金屬圓筒500直接於硬質基板900上的壓力感測紙7〇〇壓印 ，結果如圖11所示之壓力感測紙7〇〇c所示。再者，如圖1〇 所不之習知金屬圓筒500上包覆彈性橡膠6〇〇後，於硬質基 板900上的壓力感測紙7〇〇壓印，結果如圖u所示之壓力感 測紙700B所示。綜合上述圖8、圖9及圖1〇的壓印結果如圖 11所示，麼力感測纸7〇〇c顏色分佈不均勻，有些區塊呈現 ;未紅色，代表該區壓力較大，有些區塊則呈現白色，代表 籲 壓力相對小，因此壓印區之壓力分佈不均勻。而壓力感測 紙700B顯示顏色分佈均勻性有提升，但邊緣處之壓力仍較 大，代表均勻施壓效果仍有限。最後，壓力感測纸7〇〇A顯 不顏色分佈均勻，代表每個壓印區之壓力相當。是故本發 月之均勻施麼裝置的確具有均勻施壓的效果。 本發明之技術内容及技術特點已揭示如上，然而熟悉 本項技術之人士仍可能基於本發明之教示及揭示而作種種 不貪離本發明精神之替換及修飾。因此，本發明之保護範 • 圍應不限於實施例所揭示者，而應包括各種不背離本發明 之替換及修飾，並為以下之中請專利範圍所涵蓋。 【圖式簡單說明】 圖1為本發明之一實施例之均勻施壓裝置示意圖； 圖2為本發明之另一實施例之均勻施壓裝置側視圖； 圖3為本發明之一實施例之圓筒剖面圖； 圖4為本發明之另一實施例之圓筒剖面圖； 圖5為本發明之又一實施例之均勻施壓裝置示意圖； 圖ό為圖5實施例之圓筒剖面圖； [S] -13- 201219193 圖7為圖6變換實施例之圓筒剖面圖； 圖8為圖4變換實施例之圓筒剖面圖； 圖9為本發明對照組之金屬圓筒剖面圖； 圖10為本發明對照組之覆蓋彈性橡膠之金屬圓筒剖面 圖；以及 圖11為圖8'圖9及圖10壓印實施例之示意圖。 【主要元件符號說明】 100 均勻施壓裝置 ® 100'均勻施壓裝置 100" 均勻施壓裝置 100"'均勻施壓裝置 110 圓筒 130 等壓裝置 130'液壓囊 130" 氣壓囊 I 150 軟性模具 151 微奈米圖案 200 圓筒 210 筒狀部 220 圓環部 221 頂緣 250 軟性模具 251 微奈米圖案 300 均勻施壓裝置 [S] •14- 201219193 300' 310 311 312 313 313' 330 331 鲁 333 350 370 371 400 500 600 700 700A 700B 700C 800 900 均勻施壓裝置 圓筒 筒狀部 圓環部 注氣？L 注氣孔 彈性膜 軟性模具 微奈米圖案 固定件 軟性模具 微奈米圖案 空腔 金屬圓筒 彈性橡膠 壓力感測紙 壓力感測紙 壓力感測紙 壓力感測紙 收放捲裝置 硬質基板Another uniform pressure applying device for roll-to-plate imprinting according to the present invention comprises a cylinder, an elastic film and a fixing member. The elastic film is disposed on the cylinder and has two spaces between the cylinder and the fixing member can be used for fixing the elastic film on the cylinder to allow the fluid to be injected into the space between the elastic membrane and the cylinder to generate the above-mentioned pressure equalization. The characteristic 'in turn achieves a uniform forming quality that was not possible with prior art. The technical features of the present disclosure have been described in detail above, so that the present disclosure will be better understood. Other technical features that form the subject matter of the application of the present disclosure will be described below. It is to be understood by those of ordinary skill in the art that the concept and specific embodiments disclosed herein may be modified as a basis, and other structures or processes may be modified to achieve the same objectives as the present disclosure. It should be understood by those skilled in the art that the present invention is not limited to the spirit and scope of the present disclosure as set forth in the appended claims. The drawings illustrate the technical means and functions of the present invention for achieving the objects, and the embodiments illustrated in the following drawings are merely illustrative, but the technical means of the present invention are not limited to the illustrated figures. As shown in the embodiment of Fig. 1, the roll-to-plate embossed uniform pressure applying device 100 of the present invention comprises a cylinder 110, an isobaric device 130, and a soft mold 15A. The pressure equalizing device 130 is disposed on the cylinder 11''. Specifically, the isobaric device 13 is disposed in a circumferential manner of the 201219193 covering cylinder. However, in other embodiments, the equalizing device 13 may be disposed on the cylinder m in a different manner depending on different design requirements. In this embodiment, the 'isostatic device (10) includes, but is not limited to, a hydraulic bladder or a pneumatic bladder, and may also include other devices that provide the same equalizing function. Specifically, the isostatic device 13 is a hydraulic bladder in this embodiment. . Since the hydraulic bladder 13 is, the fluid contained therein is a liquid, and the liquid can provide a pressure phase per unit surface area in the hydraulic bladder 130'. Therefore, the hydraulic bladder y has a pressure equalization provided by the equal pressure device m. Features. When the liquid is replaced by another fluid such as chaos, the pressure equalizing device 13 (4) is the air pressure bladder i3G·, and the gas bladder can also be caused by the gas. The pressure per unit surface area is equal, so the air pressure bladder 130" can also have the pressure equalization device 13: the pressure equalization work of the present invention is provided by the isobaric attack 13 (), And the uniform pressure application of the roll-to-plate imprint (4) Hsheet with the pressure equalization effect is completed. In order to print the micro-nano pattern (not shown) on the surface of the flexible mold 150 on the hard substrate _, as shown in the figure! In the illustrated embodiment, the flexible mold 150 is not fixedly disposed on the cylinder 1 or the isostatic device 13A but is detachably separable from the isostatic device 130 and is in close contact with the embossing. Specifically, as shown in FIG. 2, the uniform pressure applying device 1〇〇, in the embodiment, the flexible mold 15 is a flat ribbon-shaped flexible material and wherein the single-sided or double-sided has a micro-nano pattern (Fig. Not shown). The main purpose is to use the two ends to actuate the winding device 8〇〇, and the soft 1" raw mold 150 rewinding and unwinding speed will be the same as the surface tangential speed of the isopipe device 130 when the cylinder 11 is rotated, here In an embodiment, the isostatic device 13A can be a pneumatic bladder 130. Due to the design of the roll-to-plate imprinting device with the equalizing effect proposed by the present invention, since the hard substrate 900 is disposed on the conveyor belt device, the printing capacity of the 201219193 printing can be increased by at least 2 times, so that the present invention can be used not only for the LED in the future. The industry can be extended to the solar photovoltaic industry or panel industry, which is commonly used for hard substrates. As shown in the embodiment of Fig. 3, the cylinder 200 can also exhibit a structure different from that shown in the above embodiment. In the uniform pressure applying device 1' of Fig. 3, in the cross-sectional view of the embodiment, the cylinder 200 includes a cylindrical portion 210 and two annular portions 220 provided at opposite ends of the cylindrical portion 21''. The pressure equalizing device 13 (e.g., the hydraulic bladder 130') is disposed on the outer surface of the tubular portion 210 and abuts against the side edges of the annular portion 22A. Since the cross-sectional volume of the hydraulic bladder 130' is larger than the top edge 221 of the annular portion 220, the rigid substrate 900 does not directly contact the cylinder 200, resulting in poor formation of uneven formation. As shown in the embodiment of FIG. 3, the cylindrical portion 21A and the annular portion 220 included in the cylinder 2 are coaxial with each other in the longitudinal direction of the cylinder 200, and the cylindrical portion 21 and the annular portion 220 are A cavity 400 is formed at the axis. However, in the embodiment shown in Figures i and 2, the cylinder 110 is identical to the cylinder 200 of Figure 3, and may be solid without forming any cavities. Since the cylinder 200 is separably separable and can be in close contact with each other during imprinting, as shown in FIG. 3, the cross section of the flexible mold 15 is only on the side of the cylinder 200 close to the hard substrate 9〇〇. It appears that the micro-nano pattern 151 contained on the surface of the flexible mold 150 can be clearly observed in this embodiment. When the uniform pressure applying means (4) micro-nano pattern 151 is formed on the rigid substrate 900, it is usually necessary to cure the pattern (not shown) on the rigid substrate 9A. The curing forming process of the present invention includes, but is not limited to, a heat curing forming process, an ultraviolet curing forming process, or other curing forming process having a similar function -9·201219193. If the heat curing forming process is adopted, the heat source may be disposed under the hard substrate 9 或 or the cylinder (preferably the axis is hollow, but the heat source may be integrated into the cylinder to become a solid structure); Forming process, uv light source (not shown) can be placed under the hard substrate 9〇〇 or cylinder (preferably 11 乂 light source is set inside the cylinder, but can also be 1; ¥ light source and cylinder integration And become a solid structure) inside. In order to make the UV light source (not shown) illuminate the pattern formed on the rigid substrate 900, in the embodiment (not shown) in which the UV light source is disposed inside the cylinder, the material of the cylinder allows ultraviolet rays to penetrate. In this embodiment (not shown), the inside of the cylinder may also include a mask (not shown) to prevent ultraviolet rays from being irradiated to other Uv curing coatings that have not yet been cured, so as to facilitate the normal curing process; When the UV lamp source is disposed under the rigid substrate 9 (not shown), the material of the cylinder can also absorb excess ultraviolet rays to prevent unnecessary ultraviolet rays from causing unnecessary curing. In the embodiment shown in FIG. 4, the uniform pressure applying device 1〇〇 comprises a cylinder 200, an equal pressure device (for example, a pneumatic bladder 13〇, but not limited thereto, or a hydraulic bladder) and a soft mold. 25(^ is mainly different from the above embodiment in that the flexible mold 25 is attached to the isostatic device. Therefore, in this embodiment, the rewinding device 800 as shown in Fig. 2 is not required, and the profile of Fig. 4 is not required. As can be seen, the flexible mold 250 appears on both the upper and lower sides of the pneumatic bladder 130'. In other words, the flexible mold is attached to the (four) isobaric device. In this embodiment, the micro-inclusion on the surface of the flexible mold 250 can also be clearly observed. The nano pattern 251. In the embodiment shown in Fig. 5, the uniform pressure applying device 3 includes a cylinder 3 (7), an elastic film 330, and a fixing member 350. The elastic film 33 is disposed on the cylinder 31, and the circle There is a space between the cylinders 310, and the fixing member 35〇 can fix the elastic film 201219193 on the cylinder 310. In the embodiment shown in Fig. 6, the uniform pressure applying device 3 further comprises a soft mold 370' soft mold 370 and The elastic film 33 is separably and in close contact with the stamp Therefore, in this embodiment, the elastic film 33 requires both ends to be operated by the winding and unwinding device (not shown) as in the above embodiment. In the cross-sectional view of the embodiment of the uniform pressure applying device 300 of Fig. 6, the circle The barrel 31A includes a cylindrical portion 3U and two annular portions 312 disposed at opposite ends of the cylindrical portion 311. The elastic film 330 is disposed on the outer surface of the annular portion 312 and fixed by the fixing member 350. In this embodiment The fixing member 35 is a buckle, and the buckle holds the elastic film 330 on the annular portion 312. Since the elastic film 33 is separated from the cylindrical portion 3 by a filling fluid (including gas or liquid), the elasticity is The film 3 3 〇 is swellable and protrudes more than the fixing member 350, so that the rigid substrate 9 〇〇 does not directly contact the fixing member 350, thereby causing a poor result of uneven molding. It can also be disposed outside the annular portion 312. A gas injection hole 313 is filled with gas or liquid through the gas injection hole 313 to fill the space between the elastic film 33 and the cylindrical portion 311 and the annular portion 312. As shown in the embodiment of Fig. 6, the cylinder 31〇 The cylindrical portion 3 ι and the annular portion 312 are included along the longitudinal axis of the cylinder 310. The core, and the cylindrical portion 3 ι and the axis of the annular portion 312 form a cavity 4 〇〇. However, in the embodiment shown in Fig. 2 and Fig. 2, the axis of the cylinder no is solid and does not form any space. Since the cylinder 31 and the flexible film 370 are detachably and in close contact with each other during imprinting, as shown in Fig. 6, the pattern of the flexible mold 37 is only in the cylinder 31 close to the hard substrate. One side appears, and in this embodiment, the micro-nano pattern 37 included in the surface of the flexible mold 370 can be clearly observed. When the uniform pressing device is uniformly formed on the hard substrate 9 by the micro-nano pattern 371 It is usually necessary to cure the pattern (not shown) on the hard substrate 900 of -11-201219193. The curing mode and related components are as described in the above embodiments, and therefore will not be described again. In another embodiment, as shown in Fig. 7, the uniform pressure applying device 3 includes a cylinder 31, an elastic film 330, and a fixing member 350. Mainly different from the embodiment of Fig. 6, the elastic film 330 includes a flexible mold 331. Therefore, in this embodiment, the winding and unwinding device </ RTI> is not required and the flexible mold Mi appears on both the upper and lower sides of the elastic film 330 as viewed in the cross-sectional view of Fig. 7 . In other words, the flexible mold 33 i is formed annularly on the surface of the elastic film 330. The micro-nano pattern 333 contained on the surface of the flexible mold 331 can also be clearly observed in this embodiment. Further, a gas injection hole 313 is provided in the elastic film 330, so that the gas or liquid can be filled with the space between the elastic film 330 and the cylindrical portion 311 and the annular portion 312 by the gas injection hole 313'. Regardless of the embodiment of FIG. 7, the space between the elastic film 330 and the cylinder 310 needs to be filled with a fluid 'generally'. The fluid is preferably filled before the elastic film 330 is fixed by the fixing member 350, and thus No fluid injection hole is required, however, in other variant embodiments of FIG. 6 or FIG. 7, the fluid injection hole may be formed on the annular portion 312, the cylindrical portion 311 or the elastic film 33 0 for the elastic film 330 to pass through the fixing member. After the 350 is fixed, the fluid is filled (for example, gas or liquid). In the embodiment shown in FIG. 8, the cylinder 2 includes a cylindrical portion 21 and a circular portion 220. The hydraulic bladder 130 is disposed in the cylindrical portion. 21 〇 并 并 并 圆环 圆环 圆环 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了 为了The pressure sensing paper 700 shown in Fig. 11 is shown. Further, as shown in FIG. 9, the metal cylinder 500 is directly stamped on the pressure sensing paper 7 on the rigid substrate 900, and as a result, the pressure sensing paper 7 shown in FIG. 〇〇c is shown. Furthermore, as shown in FIG. 1 , the metal cylinder 500 is covered with an elastic rubber 6 ,, and the pressure sensing paper 7 embossed on the rigid substrate 900, and the pressure is as shown in FIG. The sensing paper 700B is shown. The embossing results of the above-mentioned FIG. 8 , FIG. 9 and FIG. 1 如图 are shown in FIG. 11 , the color distribution of the force sensing paper 7 〇〇 c is uneven, and some blocks are presented; the red color is not red, indicating that the pressure in the area is large, Some blocks are white, indicating that the pressure is relatively small, so the pressure distribution in the embossed area is uneven. The pressure sensing paper 700B shows an increase in uniformity of color distribution, but the pressure at the edge is still large, indicating that the uniform pressure application is still limited. Finally, the pressure sensing paper 7〇〇A shows a uniform color distribution, representing a comparable pressure for each embossed area. Therefore, the uniform application of this month does have the effect of uniform pressure. The technical content and technical features of the present invention have been disclosed as above, but those skilled in the art can still make various substitutions and modifications without departing from the spirit and scope of the present invention. Therefore, the scope of the invention is not limited by the scope of the invention, and the invention is intended to cover various alternatives and modifications without departing from the scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view of a uniform pressure applying device according to an embodiment of the present invention; FIG. 2 is a side view of a uniform pressure applying device according to another embodiment of the present invention; Figure 4 is a cross-sectional view of a cylinder according to another embodiment of the present invention; Figure 5 is a schematic view of a uniform pressure applying device according to still another embodiment of the present invention; [S] -13- 201219193 Figure 7 is a cross-sectional view of the cylinder of the embodiment of Figure 6; Figure 8 is a cross-sectional view of the cylinder of the modified embodiment of Figure 4; Figure 9 is a cross-sectional view of the metal cylinder of the control group of the present invention; Figure 10 is a cross-sectional view of a metal cylinder covering the elastic rubber of the control group of the present invention; and Figure 11 is a schematic view of the embossing embodiment of Figure 8' Figure 9 and Figure 10. [Main component symbol description] 100 Uniform pressure device® 100' uniform pressure device 100" Uniform pressure device 100" 'Uniform pressure device 110 Cylinder 130 Isobaric device 130' Hydraulic bladder 130" Pneumatic bladder I 150 Soft mold 151 micro-nano pattern 200 cylinder 210 cylindrical part 220 annular part 221 top edge 250 soft mold 251 micro-nano pattern 300 uniform pressure device [S] •14- 201219193 300' 310 311 312 313 313' 330 331 Lu 333 350 370 371 400 500 600 700 700A 700B 700C 800 900 Uniform pressure device Cylindrical cylindrical annular injection? L Air injection hole Elastic film Soft mold Micro-nano pattern Fixings Soft mold Micro-nano pattern Cavity Metal cylinder Elastic rubber Pressure sensing paper Pressure sensing paper Pressure sensing paper Pressure sensing paper Rewinding and unwinding device Hard substrate