TW201206696A - Flexible metal-clad laminate - Google Patents
Flexible metal-clad laminate Download PDFInfo
- Publication number
- TW201206696A TW201206696A TW100118483A TW100118483A TW201206696A TW 201206696 A TW201206696 A TW 201206696A TW 100118483 A TW100118483 A TW 100118483A TW 100118483 A TW100118483 A TW 100118483A TW 201206696 A TW201206696 A TW 201206696A
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- resin
- synthesis example
- clad laminate
- general formula
- Prior art date
Links
- 229920005989 resin Polymers 0.000 claims abstract description 163
- 239000011347 resin Substances 0.000 claims abstract description 163
- 150000001412 amines Chemical class 0.000 claims abstract description 29
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 claims description 33
- 239000002253 acid Substances 0.000 claims description 26
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims description 18
- 150000002466 imines Chemical class 0.000 claims description 16
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- 150000003949 imides Chemical class 0.000 claims description 7
- 238000001465 metallisation Methods 0.000 claims description 7
- 239000011888 foil Substances 0.000 claims description 3
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical group C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 claims description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims description 2
- 239000012965 benzophenone Substances 0.000 claims description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 1
- 239000006185 dispersion Substances 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 239000011733 molybdenum Substances 0.000 claims 1
- 238000005191 phase separation Methods 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 41
- 239000011889 copper foil Substances 0.000 abstract description 16
- 239000004962 Polyamide-imide Substances 0.000 abstract description 10
- 229920002312 polyamide-imide Polymers 0.000 abstract description 10
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 abstract description 6
- 210000000988 bone and bone Anatomy 0.000 abstract description 6
- 238000009434 installation Methods 0.000 abstract description 5
- 239000012790 adhesive layer Substances 0.000 abstract description 3
- 238000000059 patterning Methods 0.000 abstract description 3
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical compound C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 abstract 2
- 239000002932 luster Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 104
- 230000015572 biosynthetic process Effects 0.000 description 103
- 238000003786 synthesis reaction Methods 0.000 description 103
- 239000010408 film Substances 0.000 description 27
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 26
- 230000000052 comparative effect Effects 0.000 description 24
- 229910052802 copper Inorganic materials 0.000 description 24
- 239000010949 copper Substances 0.000 description 24
- 229920000642 polymer Polymers 0.000 description 22
- 239000002904 solvent Substances 0.000 description 18
- ZXHZWRZAWJVPIC-UHFFFAOYSA-N 1,2-diisocyanatonaphthalene Chemical compound C1=CC=CC2=C(N=C=O)C(N=C=O)=CC=C21 ZXHZWRZAWJVPIC-UHFFFAOYSA-N 0.000 description 17
- -1 bismuth imine Chemical class 0.000 description 16
- 239000000126 substance Substances 0.000 description 16
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 15
- 235000010290 biphenyl Nutrition 0.000 description 15
- 239000004305 biphenyl Substances 0.000 description 15
- 238000000034 method Methods 0.000 description 15
- 239000002966 varnish Substances 0.000 description 15
- 238000006243 chemical reaction Methods 0.000 description 14
- 238000001035 drying Methods 0.000 description 13
- 239000003973 paint Substances 0.000 description 13
- 239000000758 substrate Substances 0.000 description 13
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 12
- ICLCCFKUSALICQ-UHFFFAOYSA-N 1-isocyanato-4-(4-isocyanato-3-methylphenyl)-2-methylbenzene Chemical compound C1=C(N=C=O)C(C)=CC(C=2C=C(C)C(N=C=O)=CC=2)=C1 ICLCCFKUSALICQ-UHFFFAOYSA-N 0.000 description 11
- 238000000576 coating method Methods 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 11
- 239000003960 organic solvent Substances 0.000 description 11
- 238000003860 storage Methods 0.000 description 11
- 230000003746 surface roughness Effects 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 229920000768 polyamine Polymers 0.000 description 9
- 239000004922 lacquer Substances 0.000 description 7
- 229920001721 polyimide Polymers 0.000 description 7
- 239000011342 resin composition Substances 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- 230000008859 change Effects 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Substances NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- SBJCUZQNHOLYMD-UHFFFAOYSA-N 1,5-Naphthalene diisocyanate Chemical compound C1=CC=C2C(N=C=O)=CC=CC2=C1N=C=O SBJCUZQNHOLYMD-UHFFFAOYSA-N 0.000 description 5
- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 description 5
- 239000004642 Polyimide Substances 0.000 description 5
- 230000006837 decompression Effects 0.000 description 5
- 210000003298 dental enamel Anatomy 0.000 description 5
- 239000012948 isocyanate Substances 0.000 description 5
- 150000002513 isocyanates Chemical class 0.000 description 5
- 150000002576 ketones Chemical class 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 229910052727 yttrium Inorganic materials 0.000 description 5
- WOQLPPITHNQPLR-UHFFFAOYSA-N 1-sulfanylpyrrolidin-2-one Chemical compound SN1CCCC1=O WOQLPPITHNQPLR-UHFFFAOYSA-N 0.000 description 4
- 239000004952 Polyamide Substances 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 125000006267 biphenyl group Chemical group 0.000 description 4
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 4
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 4
- 229920002647 polyamide Polymers 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 229910052797 bismuth Inorganic materials 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- 229910052707 ruthenium Inorganic materials 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 125000003396 thiol group Chemical class [H]S* 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 241000282320 Panthera leo Species 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- 125000005442 diisocyanate group Chemical group 0.000 description 2
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 239000004575 stone Substances 0.000 description 2
- KZNICNPSHKQLFF-UHFFFAOYSA-N succinimide Chemical compound O=C1CCC(=O)N1 KZNICNPSHKQLFF-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 150000003628 tricarboxylic acids Chemical class 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- 239000000052 vinegar Substances 0.000 description 2
- 235000021419 vinegar Nutrition 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- DIIIISSCIXVANO-UHFFFAOYSA-N 1,2-Dimethylhydrazine Chemical compound CNNC DIIIISSCIXVANO-UHFFFAOYSA-N 0.000 description 1
- LBAANPWUYHUCJL-UHFFFAOYSA-N 1,2-dimethylhydrazine hydrazine Chemical compound CNNC.NN LBAANPWUYHUCJL-UHFFFAOYSA-N 0.000 description 1
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical compound NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 1
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical compound C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- IUPJVFAHVDYPFG-UHFFFAOYSA-N 1,4-dimethylcyclohexa-2,4-dien-1-amine Chemical compound CC1=CCC(C)(N)C=C1 IUPJVFAHVDYPFG-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- RLYCRLGLCUXUPO-UHFFFAOYSA-N 2,6-diaminotoluene Chemical compound CC1=C(N)C=CC=C1N RLYCRLGLCUXUPO-UHFFFAOYSA-N 0.000 description 1
- PXBFMLJZNCDSMP-UHFFFAOYSA-N 2-Aminobenzamide Chemical compound NC(=O)C1=CC=CC=C1N PXBFMLJZNCDSMP-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- AAMHBRRZYSORSH-UHFFFAOYSA-N 2-octyloxirane Chemical compound CCCCCCCCC1CO1 AAMHBRRZYSORSH-UHFFFAOYSA-N 0.000 description 1
- HUWXDEQWWKGHRV-UHFFFAOYSA-N 3,3'-Dichlorobenzidine Chemical compound C1=C(Cl)C(N)=CC=C1C1=CC=C(N)C(Cl)=C1 HUWXDEQWWKGHRV-UHFFFAOYSA-N 0.000 description 1
- HSSYVKMJJLDTKZ-UHFFFAOYSA-N 3-phenylphthalic acid Chemical compound OC(=O)C1=CC=CC(C=2C=CC=CC=2)=C1C(O)=O HSSYVKMJJLDTKZ-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- LFBALUPVVFCEPA-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C(C(O)=O)=C1 LFBALUPVVFCEPA-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- RYYUUQPLFHRZOY-UHFFFAOYSA-N 4-[2-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC=C1OC1=CC=C(N)C=C1 RYYUUQPLFHRZOY-UHFFFAOYSA-N 0.000 description 1
- ZYEDGEXYGKWJPB-UHFFFAOYSA-N 4-[2-(4-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=C(N)C=CC=1C(C)(C)C1=CC=C(N)C=C1 ZYEDGEXYGKWJPB-UHFFFAOYSA-N 0.000 description 1
- WXAIEIRYBSKHDP-UHFFFAOYSA-N 4-phenyl-n-(4-phenylphenyl)-n-[4-[4-(4-phenyl-n-(4-phenylphenyl)anilino)phenyl]phenyl]aniline Chemical compound C1=CC=CC=C1C1=CC=C(N(C=2C=CC(=CC=2)C=2C=CC=CC=2)C=2C=CC(=CC=2)C=2C=CC(=CC=2)N(C=2C=CC(=CC=2)C=2C=CC=CC=2)C=2C=CC(=CC=2)C=2C=CC=CC=2)C=C1 WXAIEIRYBSKHDP-UHFFFAOYSA-N 0.000 description 1
- GQTLREOWBPJABJ-UHFFFAOYSA-N 5-(2-phenylethenyl)benzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=CC=2C=CC=CC=2)=C1C(O)=O GQTLREOWBPJABJ-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- FFMTVUVNPGVRRL-UHFFFAOYSA-N COC1=CC=CC=C1N.N=C=O.N=C=O Chemical compound COC1=CC=CC=C1N.N=C=O.N=C=O FFMTVUVNPGVRRL-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical compound CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 description 1
- 241000255925 Diptera Species 0.000 description 1
- 108010068370 Glutens Proteins 0.000 description 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 235000000177 Indigofera tinctoria Nutrition 0.000 description 1
- OWIKHYCFFJSOEH-UHFFFAOYSA-N Isocyanic acid Chemical compound N=C=O OWIKHYCFFJSOEH-UHFFFAOYSA-N 0.000 description 1
- JMHQPTAFBUVYBA-UHFFFAOYSA-N N=C=O.N=C=O.CC1=CC=CC=C1N Chemical compound N=C=O.N=C=O.CC1=CC=CC=C1N JMHQPTAFBUVYBA-UHFFFAOYSA-N 0.000 description 1
- SYNHCENRCUAUNM-UHFFFAOYSA-N Nitrogen mustard N-oxide hydrochloride Chemical compound Cl.ClCC[N+]([O-])(C)CCCl SYNHCENRCUAUNM-UHFFFAOYSA-N 0.000 description 1
- 206010036790 Productive cough Diseases 0.000 description 1
- KLBDTWACTBHOBL-UHFFFAOYSA-N SN1C(N(CC1)S)=O Chemical compound SN1C(N(CC1)S)=O KLBDTWACTBHOBL-UHFFFAOYSA-N 0.000 description 1
- 241000124033 Salix Species 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- 241000270666 Testudines Species 0.000 description 1
- 244000269722 Thea sinensis Species 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- QAAXRTPGRLVPFH-UHFFFAOYSA-N [Bi].[Cu] Chemical compound [Bi].[Cu] QAAXRTPGRLVPFH-UHFFFAOYSA-N 0.000 description 1
- 210000001015 abdomen Anatomy 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- XLJMAIOERFSOGZ-UHFFFAOYSA-N anhydrous cyanic acid Natural products OC#N XLJMAIOERFSOGZ-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- SIKJAQJRHWYJAI-UHFFFAOYSA-N benzopyrrole Natural products C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- TUQQUUXMCKXGDI-UHFFFAOYSA-N bis(3-aminophenyl)methanone Chemical compound NC1=CC=CC(C(=O)C=2C=C(N)C=CC=2)=C1 TUQQUUXMCKXGDI-UHFFFAOYSA-N 0.000 description 1
- ZLSMCQSGRWNEGX-UHFFFAOYSA-N bis(4-aminophenyl)methanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=C(N)C=C1 ZLSMCQSGRWNEGX-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- RMGJBHYVRQUMMZ-UHFFFAOYSA-N buta-1,3-diene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C=C(C(O)=O)C(C(O)=O)=CC(O)=O RMGJBHYVRQUMMZ-UHFFFAOYSA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 206010008129 cerebral palsy Diseases 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- WOSVXXBNNCUXMT-UHFFFAOYSA-N cyclopentane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1CC(C(O)=O)C(C(O)=O)C1C(O)=O WOSVXXBNNCUXMT-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 229930004069 diterpene Natural products 0.000 description 1
- 150000004141 diterpene derivatives Chemical class 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000004299 exfoliation Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 210000000232 gallbladder Anatomy 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 235000021312 gluten Nutrition 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 229940097275 indigo Drugs 0.000 description 1
- COHYTHOBJLSHDF-UHFFFAOYSA-N indigo powder Natural products N1C2=CC=CC=C2C(=O)C1=C1C(=O)C2=CC=CC=C2N1 COHYTHOBJLSHDF-UHFFFAOYSA-N 0.000 description 1
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 1
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002632 lipids Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 210000004185 liver Anatomy 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- DOTMOQHOJINYBL-UHFFFAOYSA-N molecular nitrogen;molecular oxygen Chemical compound N#N.O=O DOTMOQHOJINYBL-UHFFFAOYSA-N 0.000 description 1
- 210000003205 muscle Anatomy 0.000 description 1
- YWWNNLPSZSEZNZ-UHFFFAOYSA-N n,n-dimethyldecan-1-amine Chemical compound CCCCCCCCCCN(C)C YWWNNLPSZSEZNZ-UHFFFAOYSA-N 0.000 description 1
- ZUBZDVCIXCTSIH-UHFFFAOYSA-N naphthalene dicyanide Chemical compound N#[C-].N#[C-].C1=CC=CC2=CC=CC=C12 ZUBZDVCIXCTSIH-UHFFFAOYSA-N 0.000 description 1
- KVQQRFDIKYXJTJ-UHFFFAOYSA-N naphthalene-1,2,3-tricarboxylic acid Chemical compound C1=CC=C2C(C(O)=O)=C(C(O)=O)C(C(=O)O)=CC2=C1 KVQQRFDIKYXJTJ-UHFFFAOYSA-N 0.000 description 1
- OLAPPGSPBNVTRF-UHFFFAOYSA-N naphthalene-1,4,5,8-tetracarboxylic acid Chemical compound C1=CC(C(O)=O)=C2C(C(=O)O)=CC=C(C(O)=O)C2=C1C(O)=O OLAPPGSPBNVTRF-UHFFFAOYSA-N 0.000 description 1
- DOBFTMLCEYUAQC-UHFFFAOYSA-N naphthalene-2,3,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 DOBFTMLCEYUAQC-UHFFFAOYSA-N 0.000 description 1
- 150000002790 naphthalenes Chemical class 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- VMPITZXILSNTON-UHFFFAOYSA-N o-anisidine Chemical compound COC1=CC=CC=C1N VMPITZXILSNTON-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 125000003544 oxime group Chemical group 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid group Chemical group C(C=1C(C(=O)O)=CC=CC1)(=O)O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 125000004424 polypyridyl Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ODLMAHJVESYWTB-UHFFFAOYSA-N propylbenzene Chemical compound CCCC1=CC=CC=C1 ODLMAHJVESYWTB-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 150000004060 quinone imines Chemical class 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 210000003802 sputum Anatomy 0.000 description 1
- 208000024794 sputum Diseases 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 229960002317 succinimide Drugs 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 229920006307 urethane fiber Polymers 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- NDKWCCLKSWNDBG-UHFFFAOYSA-N zinc;dioxido(dioxo)chromium Chemical compound [Zn+2].[O-][Cr]([O-])(=O)=O NDKWCCLKSWNDBG-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/28—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
- B32B27/281—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polyimides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/34—Layered products comprising a layer of synthetic resin comprising polyamides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/036—Multilayers with layers of different types
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/30—Properties of the layers or laminate having particular thermal properties
- B32B2307/304—Insulating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/30—Properties of the layers or laminate having particular thermal properties
- B32B2307/306—Resistant to heat
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/30—Properties of the layers or laminate having particular thermal properties
- B32B2307/306—Resistant to heat
- B32B2307/3065—Flame resistant or retardant, fire resistant or retardant
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/406—Bright, glossy, shiny surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/416—Reflective
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/538—Roughness
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/546—Flexural strength; Flexion stiffness
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/72—Density
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/732—Dimensional properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/08—PCBs, i.e. printed circuit boards
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
- B32B2457/202—LCD, i.e. liquid crystal displays
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Laminated Bodies (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
201206696 - 的導體圖案或晶片等而進行。例如,將400〜800nm左右的可見光 戶、?、射方;基板而將龜別圖案進行圖像處理等。因此,調整位置的準 確度,係由耐熱性薄膜的透明性或霧度(haze)值等所代表之所謂的 可見性大幅左右。 伴隨安裝密度之增加或細微間距化,圖案成形性或剝離強度 增加之同時,關於定位亦要求高準確度,而近年來的c〇F基板^ 人們係重視安.裝性、可見性、剝離強度、窄間距圖案成形性等特 性。 ’ COF基板,係於耐熱薄膜上令銅層所疊層的撓性覆銅疊層體 (FCCL)圖案成形而製造。—般而言’ FCCL根據其製造方法曰^ 分類成金屬化型、淹鑄型、疊層型之3個義。於前述中, 在COF用途中係使用金屬化型。 金屬化型係將Ci.等金屬藉由濺鍍等直接對聚醯亞胺薄膜蒸 鍍,並藉由無電鑛以及/或是麵_製造。金屬化型,由於使、 透明的聚S!亞胺薄膜,故可見性佳,但鑛敷層缺點多且欠缺 ,’並具有剝_度差之因製造方法而導致之根本的問題。例如, 專利文獻1巾,無論?繊亞胺_是否祕合加 的剝離強度。 Μ于个剃兄刀 ί 2決前述問題,人們積極地進行疊層型或輯型之研究。 而制ΐ 由與聚酿亞胺薄膜透過熱可塑性樹脂疊層 "見彳但因為圖案成形後的晶片安裝 性聚酿亞胺减魏碰財法,而熱可塑 «是聚酿胺- 型於其製造上,因為易展現剝離強声,农&。思 人們以前述剝離強度或安堯•馬穩脂’故 疋在目刖的清况下’除了安裝性及剝離強度以外,得不到兼 型於里奸卜,自上後猎由乾無•硬化而製造。请鑄 201206696 具可見性、圖案成形性的j?CCI。本必a丨* =存穩定性良好為前提’但得不到同,:^^ 例如’專利文獻3中有記葡將含 布於銅落上,並使聚酿胺-酸亞胺樹脂塗 度大的ϋϋί刻=後獻3中,由於使用表面粗糙 2現古數2 粗财大的_也造賴離強度 Γίί形:3 二低=====" '、本案比較例6所不,聚醯胺-醯亞胺樹脂薄膜層之 =熱性佳’㈣於轉縣 穩定性差之製造上的問題。 _聊曰t本身之保存 供々f^文獻4中有s己載一種繞性覆金屬疊層體,在表面粗糙度 H ΐί鏡面的Ϊ紅塗布聚邮胺前驅物_溶液後,藉由 日b而於銅紅具有由複數層組成的雜亞胺絕緣層。但 疊ΐ體對於裸晶的安裝性及光澤度或反射率高的銅 之冷=強度確實不足,而且,由於在聚醯亞胺前驅物樹脂溶液 布^ ’於高溫下進行乾燥•酿亞胺化,故加工性差。另外, ,為於向溫下熱處理’銅箱本身會再結晶化,而有不適於需要窄 間距的圖案成形性之用途,此為其問題。 毕文獻5中有記載一種覆金屬叠層體的製造方法,該撓性 =、、>屬豐層體在表面粗糙度較低的銅箔上塗布聚醯胺-醯亞胺樹脂 /谷液’亚具有兩層樹脂層,藉由對其第丨層塗布耐熱性高的樹脂, 士對其第2層塗布吸濕特性佳的樹脂,而可滿足安裝性、财濕可 加工性。但是,專利文獻5的方法中,在使用光澤度或反 率同之鏡面的銅箔時,亦如本案比較例7、比較例8所示,有剝 201206696 fr ΐί樹脂漆之保存穩定性差之f造上的門韻 研究可見性或圖案成形性之改良,但專利文及先=度,並 強度低 問題 嘛’而且,洗鑄的樹脂漆之保存穩定性差革此為其 [習知技術文獻] [專利文獻] [專利文獻:1]日本特開2〇〇7_35658號公報 [專利文獻2]日本特開2003-251741號公報 [專利文獻3]日本特開Mot! 1〇612號公報 [專利文獻4]曰本特開2〇〇7-214555號公報 [專利文獻5] PCT國際專利公開號w〇2〇〇9/〇63742 [專利文獻6]曰本特開2008-182222號公報 【發明内容】 [發明所欲解決的問題] 本發明之目的在於解決習知技術的問題,提供—種 間距化的高雜電路板贿之雜覆金屬麵體, ^ ^ 膜承載膠帶用之撓性覆金屬疊層體,具體而言,係廉價地 ^ 種撓性印刷基板所需之理想的撓性覆金屬疊層體,採声#八 用之樹脂漆具有良好的保存穩定性,且可見性、安,軔, 度、圖案成雜均佳。 、、獅強 [解決問題之技術手段] 本案發明人為了達成前述目的而仔細研究的結果,發現 在金屬箱上叠層兩種聚總胺-酸亞胺樹脂薄膜層,且該兩▲ 1 醯亞胺樹脂薄膜層包含:在靠近金屬箔處的層中含有特定 且規定數量平均分子量的兩種聚醯胺-醯亞胺樹脂;及在金 較遠層中含有特定胺成分的聚醯胺-醯亞胺樹脂,而可滿^洗以^ 樹脂漆之保存穩定性、安裝性、可見性、圖案成形性、以及剝离隹 201206696 強度之各特性’並達成本發明之目的。 詳言之本發明具有以下〇)〜(〗〇)之構成。 (1)一種撓性覆金屬疊層體,係為在銅箔上直接或 層疊層聚_福亞麟脂賴(A層),並在其上方^ 亞胺樹脂薄膜(Β層)的撓性覆金屬疊層體,其特徵為滿^以* _Βα ①〜(iv)之要件; ~ a卜 (i)A層,包含: 聚醯胺-醯亞胺樹脂(I),包含具有萘骨架(naphthalenes 的胺成分;以及 j 聚醯胺-醯亞胺樹脂(π) ’包含具有聯鄰甲苯胺骨架(〇_t〇lidine skeleton)的胺成分; 且聚醯胺-醯亞胺樹脂(I)/聚醯胺-醯亞胺樹脂⑼的重量比為 95〜70/5〜30 ; ’、、' (ii)聚醯胺-醯亞胺樹脂(I)的數量平均分子量為. 25000〜100000’且/或聚醯胺-酿亞胺樹脂(π)的數量平均分子量為 25000〜100000 ; (iii) B層,包含: 聚醯胺-醯亞胺樹脂,包含具有聯鄰曱苯胺骨架的胺成分;以 及 (iv) 面向銅箔A層側的表面粗链度為3μηι以下,光澤度為300 以上,而在400nm〜800nm之波長的光之反射率為20%以上。 (2)如⑴記載之撓性覆金屬疊層體,其中聚醯胺-醯亞胺樹脂(I) 包含下述通式[1]、通式[2]、以及通式[3]的重複單位; 201206696201206696 - Conductor pattern, wafer, etc. For example, a visible image of about 400 to 800 nm, a laser beam, a substrate, and a turtle pattern are image-processed. Therefore, the accuracy of the position adjustment is largely caused by the so-called visibility represented by the transparency or haze value of the heat-resistant film. With the increase in mounting density or fine pitch, the pattern formability or peel strength is increased, and high accuracy is required for positioning. In recent years, c〇F substrates have been paid attention to safety, visibility, and peel strength. Characteristics such as narrow pitch pattern formability. The COF substrate is produced by patterning a flexible copper-clad laminate (FCCL) in which a copper layer is laminated on a heat-resistant film. In general, FCCL is classified into three types: metallization type, flood casting type, and lamination type according to the manufacturing method. In the foregoing, a metallization type is used in COF applications. In the metallization type, a metal such as Ci. is directly vapor-deposited on a polyimide film by sputtering or the like, and is produced by electroless ore or/or surface. The metallization type has a good visibility because of the transparent and transparent poly S! imine film, but the mineral coating layer has many disadvantages and is lacking, and has a fundamental problem caused by a manufacturing method of peeling off. For example, Patent Document 1 discloses the peeling strength of the bismuth imine. Μ 个 个 剃 ί 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 And the enamel is made of a thermoplastic resin laminated with a polyimide film. "Because the wafer-mounted polyimine is reduced after the pattern is formed, the thermoplastic is a polyamine-type. Its manufacture, because it is easy to show the strong sound of peeling, agriculture & Thinking of the above-mentioned peeling strength or Anzhen·Ma-shenzhi's sputum, in addition to the installation and peeling strength, in addition to the installation and peeling strength, it is not possible to use the type in the traitor. Made by hardening. Please cast 201206696 j?CCI with visibility and pattern formability. This must be a 丨* = good stability is the premise 'but not the same,: ^^ For example, 'Patent Document 3, there is a note that the Portuguese will be covered with copper on the copper, and the polyamine-acid imide resin coated度 刻 刻 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后 后No, the polyimide layer of the polyamide-imine resin has a good thermal property. (4) The problem of the manufacturing stability of the poor stability of the county. _ 曰 曰 t itself saves 々 f ^ document 4 has a winding metal-clad laminate, after the surface roughness H And copper red has a hetero-imine insulating layer composed of a plurality of layers. However, the stacking property of the tantalum body is not sufficient for the mountability of the bare crystal and the copper or the high reflectance of the gloss or the reflectance. Moreover, since the polyimide solution of the polyimide precursor is dried at a high temperature, the imine is dried. It is not suitable for processing. Further, in order to heat-treat to the temperature, the copper box itself is recrystallized, and there is a problem that it is not suitable for pattern formability requiring a narrow pitch, which is a problem. Patent Document 5 discloses a method for producing a metal-clad laminate in which the flexible layer and the layered body are coated with a polyamide-imide resin/column solution on a copper foil having a low surface roughness. The sub-layer has two resin layers, and by coating the second layer with a resin having high heat resistance, the second layer is coated with a resin having good moisture absorption properties, thereby satisfying mountability and wet workability. However, in the method of Patent Document 5, when the copper foil having the same gloss or inverse rate as that of the mirror surface is used, as shown in Comparative Example 7 and Comparative Example 8 of the present invention, the storage stability of the peeled 201206696 fr ΐ 树脂 resin paint is poor. The door rhyme is studied to improve the visibility or pattern formability, but the patent text and the first degree, and the low strength problem? Moreover, the storage stability of the resin paint for washing is poor [this is a technical literature] [Patent Document 1] Japanese Laid-Open Patent Publication No. 2003-251741 [Patent Document 3] Japanese Patent Laid-Open No. Hei. [Patent Document 5] PCT International Patent Publication No. WO 〇 〇〇 〇〇 〇 〇 42 42 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 [Problem to be Solved by the Invention] The object of the present invention is to solve the problems of the prior art, and to provide a metal-coated body of a high-frequency circuit board with a pitch, ^ ^ a flexible metal-clad for a film-carrying tape The laminate, in particular, is required for inexpensive flexible printed substrates The ideal flexible metal-clad laminate has good storage stability and good visibility, security, flaw, degree and pattern. , 狮强 [Technical means to solve the problem] The inventors of the present invention carefully studied the results of the foregoing, and found that two kinds of polyamine-acid imide resin film layers were laminated on the metal box, and the two ▲ 1 醯The imide resin film layer comprises: two polyamido-imine resin containing a specific and specified number average molecular weight in a layer near the metal foil; and a polyamine containing a specific amine component in a farther layer of gold - The yttrium imine resin can be fully washed to maintain the storage stability, mountability, visibility, pattern formability, and peeling properties of the 201206696 strength and achieve the object of the present invention. In detail, the present invention has the following structure: (). (1) A flexible metal-clad laminate which is formed by directly or laminating a layer of copper on a copper foil, and having a flexibility of an imine resin film (ruthenium layer) thereon a metal-clad laminate characterized by a full range of * _ Β α 1 to (iv); a a (i) A layer comprising: a polyamine-quinone imine resin (I) comprising a naphthalene skeleton ( An amine component of naphthalenes; and j polyamine-quinone imine resin (π) 'containing an amine component having a t-toluidine skeleton; and polyamine-imine resin (I) / The weight ratio of the polyamidamine-imine resin (9) is 95 to 70/5 to 30; ',, ' (ii) The polyamidoamine-imine resin (I) has a number average molecular weight of 25000 to 100000' And/or the polyamido-resinimide resin (π) has a number average molecular weight of 25000 to 100000; (iii) a B layer comprising: a polyamidamine-quinone imine resin comprising an amine component having a phthalic acid skeleton And (iv) the surface roughness of the copper foil A layer side is 3 μm or less, the glossiness is 300 or more, and the light reflectance of the wavelength of 400 nm to 800 nm is 20% or more. (2) As described in (1) Flexible gold Laminate where polyamide - (PEI) resin (I) comprising the following general formula [1], general formula [2], and the general formula [3] of the repeating units; 201206696
201206696 聚醯胺-醯亞胺樹脂(ιι)係分散或是相分離。 (6)如(1)〜(5)中任一項之撓性覆金屬疊 的樹脂薄膜厚度比(A層/B層)為_〜·。U A層與B層 薄膜燒性覆金屬編,其中a層的齡 薄膜換性覆金屬疊層體,其中B層的樹脂 ⑼一種兩面撓性覆金屬疊層體,藉由黏 撓性覆金屬叠層體,俾使其於兩面形成金屬“之。員之 疊層種撓性印刷基板,係使用⑴〜⑼中任—項之撓性覆金屬 [發明之效果] 澤度 Z因^定疊層的A層及B層之聚酿胺·醯亞胺樹脂土的 置’所以樹脂漆的保存穩定性或對於鏡面的銅 ί^ ΐ。再者’洗鱗法所使用的樹脂組成物,由於 :2:== 需要於高溫下熱處理,而有助於廉價地製 Ρ刷,,且該撓性印刷基板可維持原本優異的 …叫賞賴*且,根據本發明之繞性 ==爾種性能,而有習知技術不容易⑶ 因此’根據本發明’可廉價地製造需要細微間距化的高 途之撓性_基板,制是CGF薄縣娜㈣途^ 使用之撓性印刷基板,且於工業上極為有利。 【實施方式】 ^圖1所示,本發明之撓性覆金屬#層體具有在鋪1上馬 曰永酿胺-驢亞胺樹脂薄膜(A卵,而且於其上方疊層聚酿胺遷^ 201206696 - 胺樹脂薄膜(B層)3之構成。A層2可直接疊層亦可透過黏合劑層 而疊層於銅箔1上。 聚醯胺-醯亞胺樹脂薄膜(A詹)包含:聚醯胺-醯亞胺樹脂(1), 包含具有萘骨架的胺成分;以及聚醯胺-St亞胺樹脂(Π) ’包含具有 聯鄰甲苯胺骨架的胺成分。 聚醯胺醯亞胺樹脂(I)包含下述通式[1]、通式[2]、以及通式[3] 的重複單位於分子鏈中較為理想。下述通式[1]、通式[2]、以及通 式[3]所代表的單位,各自可為i種亦可為2種以上,且萘骨架或 苯骨架上亦可鍵結取代基。201206696 Polyamido-imine resin (ιι) is dispersed or phase separated. (6) The thickness ratio (layer A/layer B) of the resin film of the flexible metal-clad laminate according to any one of (1) to (5) is _~·. UA layer and B layer film-foamed metal-clad, wherein a-layer age-old film-replaceable metal-clad laminate, wherein B-layer resin (9) is a two-sided flexible metal-clad laminate, by a viscous metal-clad stack A layered body, which is formed by forming a metal on both sides. The flexible printed circuit board of the laminated type is a flexible covering metal of any one of (1) to (9) [effect of the invention] Ze Z is laminated The A layer and the B layer of the polyamide-yttrium imide resin soil are set to 'the storage stability of the resin paint or the copper for the mirror surface. The resin composition used in the 'washing scale method', due to: 2:== It is necessary to heat-treat at a high temperature, which contributes to inexpensive brushing, and the flexible printed substrate can maintain the original excellent performance. However, it is not easy to use a conventional technique. (3) Therefore, according to the present invention, it is possible to inexpensively manufacture a high-transparency flexible substrate which requires fine pitch, and is a flexible printed substrate which is used by CGF Boonna (four). Industrially, it is extremely advantageous. [Embodiment] As shown in Fig. 1, the flexible metal-clad layer of the present invention has Paving a film of A. sinensis-yttrium imine resin (A egg, and stacking it on top of it) 201206696 - Amine resin film (B layer) 3. The layer A can be laminated directly. It can be laminated on the copper foil 1 through the adhesive layer. The polyamidamine-imine resin film (Azhan) comprises: a polyamide-imine resin (1) comprising an amine component having a naphthalene skeleton; Polyamine-St imine resin (Π) 'containing an amine component having a bi-toluidine skeleton. The polyamidoximine resin (I) comprises the following general formula [1], general formula [2], and The repeating unit of the formula [3] is preferably in the molecular chain. The units represented by the following general formula [1], the general formula [2], and the general formula [3] may be one type or two or more types. And the substituent may be bonded to the naphthalene skeleton or the benzene skeleton.
0 Λ0 Λ
22
[3] 聚酿胺-醯亞胺樹脂(1)中之通戍⑴/通式[2] /通式[3]的莫耳 201206696 比較理想之樣態為10〜5〇/2 2〇T;m〇i"5 5 25 35/5^;t12 〇 八之低於前述比例時,視通式[2]及通式[3]的成 二二1^有機溶劑的溶解性可能變差,而將本樹脂塗布 進層體成型時,必須以前驅物樹脂漆的形狀成型, n 下熱處理,加工性變差。結果造成能源成本變高。 i、^ ί二ϊ程對於銅_影響而造成銅層之結晶結構變化, ::ίίίΐί:並且,伴隨銅箔的氧化劣化等,而導致機械物 甘uf者丄通式[2]的莫耳比低於前述比例時,或是,通式[3]的莫 比時’樹脂的Tg會變低’在裸晶安裝時引線配線 L3 rl產生崩塌之問題。且’剝離強度有降低的傾向,並會 產生配線與樹脂層之剝離的情況。 “ 之較理想之樣態為來自苯偏三麟與以萘二異氰酸 二„複=立’通式[2]之較理想之樣態為來自聯苯四曱酸二酐與 酸酯之重複單位、以及來自二苯基酮四曱酸二酐與 能^酸酉旨之重複單位(作為通式[2’]),通式[3]之較理想之樣 心為來自均本_賴以萘二異氰義之重複單位。 销=i·醯f胺樹脂⑴中之通式[1]//通式[2,] /通式[2] /通 式[3]的莫耳比較理想之樣態為5〜6〇/1〜6〇/1〜4〇/1〜3〇,而更理 樣態為KM0/KM0/5〜3〇//5〜2〇,更加理想之樣態為 20〜40/30〜50/10〜3〇/5〜15。 通式[1]的莫耳比多於前述上限,通式[2]、通式p,]、通式⑶ 的莫耳比巾之任-項低於前述下限時,_旨的Tg會變低,並在裸 晶安裝時引線配線會於樹脂層產生崩塌之問題。且,剝離強度有 IV低的傾向’並會產生配線與樹脂層之剝離的情況。再者,通式⑴ 的莫耳比低於前述T限,通式[2] '通式[2,]、通式p]的莫耳比中 之任-項多於前述上限時,會缺乏對於錢溶_溶解性,而撓 性覆金屬疊層體的加工性可能變差。而且,摻合樹脂的保存穩定 性可能會變差。 201206696 ' 根據覆金屬疊層體的T 斗、εϊ & 胺-酿亞麵脂可溶解於 機溶劑可舉出:N_甲基如比=;f月^月曰亦為相同。再者,该有 甲美,醯m m甘比各疋酮、N,N-二甲基曱醯胺、N,N-二 γ 甲基坐細、四甲服、環丁石風、二甲亞石風、 細,且亦包含將該等化合物的一部份 味代的化合物。且,本發日种之可溶於有 態為=曰5 7溶解。10重量%以上,而較理想之樣 機溶劑’係含㈣重量%以上之至少.1種之該等^再^, 如下進行,樹脂為固體形狀時,在2〇〇ml的燒杯 二 通過8〇網目的樹脂粉末,將於坑下輕輕地攪 3,爾⑽。c下靜置24小時,若_化= 白濁、析出之任一情況,.則判斷為溶解。 之物旨(11),酸成分之總量為1〇0莫耳%、胺成分 態<80苴翁莫耳属’具有卿甲苯胺骨㈣單驗理想之樣 &^為to it’而更理想之樣態為120莫耳%以上,最理想 ΐ ΐ之樣恶為170莫耳%以下,最理想之樣態為⑽莫耳%以 外的量超過前述上限時’除了剝離強度降低以 JT對表有1谷劑的溶解性下降、贿穩定性惡化 。 的重通綱、蝴爾蝴 [4] 201206696 Ο[3] The generalized state of the polyamine-ruthenium imine resin (1) in the general formula (1) / general formula [2] / general formula [3] 201206696 is more ideally 10~5〇/2 2〇T ;m〇i"5 5 25 35/5^; when t12 is lower than the above ratio, the solubility of the organic solvent of the general formula [2] and the general formula [3] may be deteriorated, When the resin is applied to the layer body, it is necessary to form the shape of the resin paint of the precursor, and the heat treatment is performed under n, and the workability is deteriorated. As a result, energy costs are high. i, ^ ί ϊ 对于 对于 对于 对于 对于 对于 对于 对于 对于 :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: :: When the ratio is lower than the above ratio, or the Moby of the general formula [3], the Tg of the resin becomes low, the lead wiring L3 rl is collapsed during the bare crystal mounting. Further, the peel strength tends to decrease, and peeling of the wiring and the resin layer may occur. The preferred form is from benzoic acid and naphthalene diisocyanate. The preferred form of the formula [2] is derived from biphenyl tetraruthenic dianhydride and acid ester. The repeating unit, and the repeating unit derived from the diphenyl ketone tetraphthalic acid dianhydride and the acid anhydride (as the general formula [2']), the preferred core of the general formula [3] is from the uniform A repeating unit of naphthalene diisocyanide. The general formula [1] / / general formula [2,] / general formula [2] / general formula [3] in the pin = i · 醯 f amine resin (1) is preferably 5 to 6 〇 / 1~6〇/1~4〇/1~3〇, and the more reasonable form is KM0/KM0/5~3〇//5~2〇, more ideal form is 20~40/30~50/ 10~3〇/5~15. When the molar ratio of the general formula [1] is more than the above upper limit, when the term "term" of the general formula [2], the general formula p, and the general formula (3) is lower than the lower limit, the Tg of the formula becomes It is low, and the lead wiring may cause collapse in the resin layer during die mounting. Further, the peel strength tends to be lower than IV, and peeling of the wiring and the resin layer may occur. Further, the molar ratio of the general formula (1) is lower than the aforementioned T limit, and any of the molar ratios of the general formula [2] 'the general formula [2,] and the general formula p] is more than the aforementioned upper limit, and is lacking For the solubility of the solvent, the workability of the flexible metal-clad laminate may be deteriorated. Moreover, the storage stability of the blended resin may be deteriorated. 201206696 ' According to the metal-clad laminate, the T-bucket, εϊ & amine-flavored dough can be dissolved in the organic solvent: N_methyl as the ratio =; f month ^ month 曰 is also the same. Furthermore, there is a beauty, 醯mm, Gambian, ketone, N,N-dimethyl decylamine, N,N-di-gammamethyl, fine, four-coat, cyclopentide, dimethyl A stone that is fine, and also contains a portion of the compounds. Moreover, the soluble form of the present day is dissolved in 曰5 7 . 10% by weight or more, and the preferred prototype solvent contains at least one of (4)% by weight of the above-mentioned materials, and is carried out as follows. When the resin is in a solid shape, it passes through 8〇 in a 2〇〇ml beaker. The resin powder of the mesh will be gently stirred 3 times under the pit (10). It was allowed to stand under c for 24 hours, and if it was _ ̄ = white turbid or precipitated, it was judged to be dissolved. The object of the matter (11), the total amount of the acid component is 1 〇 0 mol%, the amine component state < 80 苴 莫 耳 ' ' has a clear toluene bone (four) single test ideal sample & ^ for to it' The more desirable state is 120% or more, and the most desirable ΐ 恶 is 170% or less. The most desirable form is when the amount other than (10) Mo % exceeds the above upper limit, except that the peel strength is lowered. JT has a decrease in the solubility of the granules and a deterioration in brittle stability. The heavy-duty, the butterfly [4] 201206696 Ο
(式[4]中之圮及尺6可相同亦可相異,夂 1〜4的烧基、或是絲基。) 各自獨立代表氫或碳數(In the formula [4], the crucible and the ruler 6 may be the same or different, and the crucible of the crucible 1 to 4 or the silk base.) Each independently represents hydrogen or carbon number.
r 0 -Nr 0 -N
[5][5]
1〜4的烧基、或是烧氧基 0 〇 N1 to 4 alkyl or alkoxy 0 〇 N
Lim可刪刪,蝴域表氮或碳數 C6] (式[6]中之R1及R2可相同亦可相異,夂 1〜4的烧基、或是烧氧基。又,Y表示直接自」二,或, 鍵鍵結(-0-)。) 糊口⑽本鍵結)、或; 聚醯胺遽亞胺樹脂(Π)中之it式[4]/通式[5] /通 耳比較理想之㈣為5G〜99/1〜50/uo,而更理想之樣莫 6〇〜9〇/5〜4〇/5〜3〇,更加理想之樣態為65〜85/1〇〜3〇〉5二2’、 通式[4]的莫耳比多於前述上限’通式[5]、通式[6]的莫 =之任一項低於前述下限時,對表面粗糙度低且光澤度及反射 向的銅狀瓣強度可能降低。肖者,通式[4]的莫耳比低 下限’通式[5]、通式[6]的莫耳比中之任一項多於前述上限時, 脂對於有機溶劑的溶解性降低,而混合樹脂之保存穩定性可能變 差。 聚醯胺-醯亞胺樹脂(II)較理想之樣態為包含苯偏三酸酐、二与 14 201206696 急聯苯四甲酸二酐之酸成分與具有聯鄰甲苯 月女月木的如成分。具體而言,酸成分為苯偏三 ===3,W聯苯四帽項之組合,且= 刀取里心之樣態為3,3,_二甲基_4,4,_二胺聯苯。 醢組於聚胺樹脂®中’令»胺_ L i f)域而製造。製造方法,藉由習知的方法進行即可, (II)二、容、=將Γ醯yf姻麵___聚_•咖安樹脂 ^ Γ摻合而製造。藉由將2種聚醢龍亞胺樹 二⑻成分之粒狀的相之大小而增加剝離強 層:樹 =;:=r原本凝聚力“二= ”戶 ==ίΐ;聚,醯亞胺樹脂(ι)、_分子量,a 斤嫌有因為增加分子量而使粒徑變大的傾向。 ,,、)後’&制粒徑可藉由規定2種樹脂之分子量而進行。 體含胺7==轉)/聚酿胺 =之前述«比少於前釘_,伴隨耐; 低且_度及反射率高的銅羯之剝 it ’摻合的樹脂溶液之保存穩定性會惡化。另 合有剝離胺樹脂®之前述重量比多於前述上限時, 曰有^強工父回的情況,但因為耐熱性下降,所以安裝 較理:ί==:數量更_而 :==r量平均分子 月::=_為3麵〜9麵,更理想之樣態為測0〜7麵。者= 純亞胺_)、_數量平均分子量小於祕下限時,^表= 201206696 粗糙度低且光澤度及反射率高的崎 均分子量越高越好,並無上限值。根據 :係降低。數量平 言,但100000左右的數量平均分子量便已足貌丨。’雖不能一概而 在聚酸胺-酿亞胺樹脂薄膜(A層),驻 ° 醯亞胺樹脂(II)成分的粒狀之相的最 ^ 離形成之聚醯胺- 算直徑於Ι.Ομιη以上,而更理想之樣熊A ’交理想之樣態為圓換 之樣態為2.5μιη以上。當圓換算直徑於針=以士 ’更加理想 糙度低且光澤度及反射率高的銅落離強,對表面粗 算直徑越高越好,並無上限值。根據會降低。圓換 但圓換算直徑為左右便已她生’料能—概而言, B層的聚醯胺-醯亞胺樹脂,酸成分之嵊 成分之總量為應莫耳%時,具有聯㈣““ 安 的面Lim can be deleted, the nitrogen or carbon number of the butterfly field is C6] (R1 and R2 in the formula [6] can be the same or different, 烧1~4 of the alkyl group or alkoxy group. Further, Y means direct From "2, or, bond (-0-).) (10) bond (), or; polyamine amide resin (Π) in the formula [4] / general formula [5] / pass The ear is ideal (4) is 5G~99/1~50/uo, and the more ideal one is 6〇~9〇/5~4〇/5~3〇, more ideally, it is 65~85/1〇 ~3〇>5 2 2', the molar ratio of the general formula [4] is more than the above upper limit. Any of the general formula [5] and the general formula [6] is lower than the lower limit, and the surface is rough. The strength of the copper flaps with low degrees of gloss and reflection may be reduced. In the case where the molar ratio lower limit of the general formula [4] and the molar ratio of the general formula [5] and the general formula [6] are more than the above upper limit, the solubility of the fat to the organic solvent is lowered. The storage stability of the mixed resin may be deteriorated. The polyamine-quinone imine resin (II) is preferably an acid component comprising benzotricarboxylic anhydride, bis and 14 201206696 sulphur benzene tetracarboxylic dianhydride, and a component having a linked toluene moon virgin wood. Specifically, the acid component is a combination of benzene partial three===3, W biphenyl four-hat items, and = the state of the knife is 3,3,_dimethyl_4,4,-diamine Biphenyl. The oxime group is produced in the polyamine resin® field of the amine _L i f). The manufacturing method can be carried out by a conventional method, and (II) two, Rong, = Γ醯yf 面___聚_•咖安树脂 ^ Γ blending and manufacturing. The exfoliation strong layer is increased by the size of the granular phase of the two (8) components of the polypyridyl imino tree: tree =;: = r original cohesive force "two =" household == ίΐ; poly, quinone imine resin (1), _ molecular weight, a kg is likely to increase the particle size due to the increase in molecular weight. The particle size of the post-&&> can be determined by specifying the molecular weight of the two resins. The body contains amine 7 == turn) / poly-handling amine = the above «more than the former nail _, accompanied by resistance; low and _ degree and high reflectivity of the copper bismuth it's storage stability of the blended resin solution Will deteriorate. When the above-mentioned weight ratio of the stripped amine resin® is more than the above-mentioned upper limit, there is a case where the strong father returns, but since the heat resistance is lowered, the installation is reasonable: ί==: the quantity is more _ and: ==r The average molecular month::=_ is 3 to 9 faces, and the more ideal is to measure 0 to 7 faces. = pure imine _), _ number average molecular weight is less than the lower limit, ^ table = 201206696 The roughness is low, and the higher the gloss and reflectance, the better the average molecular weight, there is no upper limit. According to : system is reduced. The number is flat, but the average molecular weight of around 100,000 is already awkward. 'Although it is not possible to use the polyamine-based imide resin film (layer A), the most condensed polyamine in the granular phase of the yttrium imine resin (II) is calculated to be in diameter. Ομιη above, and more ideally, the bear A' intersection ideal is a circle change of 2.5μιη or more. When the diameter of the circle is more than ideal for the needle = 士', the roughness is low and the gloss and reflectance are high. The higher the surface rough diameter, the better. There is no upper limit. According to it will be reduced. The round change but the round conversion diameter is about the left and right, she has been born 'material energy' - in general, the B layer of polyamido- quinone imine resin, the total amount of the acid component of the bismuth component is in the case of Mox%, with (4) "" An's face
J 吸濕尺寸變化率、暴居髀夕JJL 面性(低魅曲性)等特性亦有可能變差。再者, ^加 莫耳*下,最理想之㈣為16G料%町 胺骨架的,之量超過前述上限時,對於有機溶獅溶解 低’且保存穩定性亦有可能惡化。 B層的聚。醯胺-酿亞胺樹脂包含前述通式[4]、通式[习、以及通 ^[6]的,複單位於刀子鏈中較為理想。b層的聚自罐·醯亞胺樹脂 ^之通式[4]/通式[习/通式[句的莫耳比較理想之樣態為5〇〜99 /1〜50/1〜50,而更理想之樣態為6〇〜9〇//5〜4〇/5〜3〇,更加理 想之樣態為65〜85/10〜3〇/5〜20。 通式[4]的莫耳比多於前述上限,通式[5]、通式[6]的莫耳比 Ϊ之任二項低於前述下限時,對表面粗糙度低且光澤度及反射率 咼的銅沾之剝離強度有降低的傾向,而且,吸濕尺寸變化率、疊 層體之平面性(低翹曲性)等特性亦有可能變差。再者,通式[4]的 201206696 • J耳比少於前述下限,通式[5]、通式[6]的莫耳比中之任一項多於 前述上限時,對於有機溶劑的溶解性、.保存穩定性可能合織罢。R ,胺遵亞胺翻之喊分以及醜分讀縣之ϋ 與Α層的聚醯胺-醯亞胺樹脂(II)相同。 ^ 、 B層的聚醯胺-醯亞胺樹脂於N_甲基_2_吡 0^5〇Γ 〇51= It子量’而更理想之樣態為具有相當於對數黏度 S物性Γ能不足,而剝離強度亦有降二頃t 。知如述上限時,因為溶液黏度變高,所以成形加工有其 前述聚酿胺-醯亞胺樹脂之製造, 可舉出異氰酸酿法、胺法等,之方法合成。例如 脂需要可溶於有機溶劑,樹 塗布的異驗敝較為理想。 肚b日化·^亦可直接 香族由使,為原料的芳香族三缓酸酐、芳 量反應,而可彳曰刭、力、一異氰酸酯於有機溶劑中以概化學計. 羧酸;,可舉:苯偏:所使用的聚__醯亞胺樹脂。芳香族三 :;;:;?: 為理j: 氰容劑中進㈣4小時較 :r_、鹼金屬:==== 製造聚醯胺-醯亞勝抖 該聚義-醯亞胺樹脂的的聚合溶劑’係可使用能夠溶解 甲基-2-口比略伽、NN_有。_有機溶劑,例如可舉出N- ’一曱基曱_$、Ν,Ν·二甲基乙_安、ι,3- 17 201206696 二曱基-2-咪唑烷酮、四曱脲、環丁颯、二甲亞磾、γ_ 丁内醋、環 己酮、環戊酮等’而較理想之樣態為Ν-曱基-2-•比咯咬綱。^者^ 亦可將該等化合物的一部份以曱苯、二曱苯等烴系有機溶劑;二 甘醇二曱醚、三甘醇二曱醚、四氫呋喃等醚系有機溶劑;/曱乙綱' 曱基異丁酮等酮系有機溶劑取代。 ' 本發明的聚醯胺-醯亞胺樹脂為了取得耐熱性、難燃性、黏合 性、尺寸穩定性、彎曲性、絕緣性、吸濕特性等作為橈性覆^屬"1 疊層體之各種性能的平衡,在不損及本發明目的之範圍内,除了 前述所示的酸成分、異氰酸酯成分以外,可令以下所示的酸成^分、 胺成分共聚合。再者’於該等酸成分、胺成分之組合下,亦可 合另外聚合的樹脂而使用。 , 酸成分,可舉出:⑻三羧酸,二苯終3,3,,4'-三:羧酸、二苯礙 -3,3',4’-三羧酸、二苯曱酮_3,3',4,_三羧酸、萘三羧酸、一丁烷 -1,2,4-三羧酸等三羧酸等之單酐、酯化物等單獨或2種以上的混I 物;⑻凹羧酸,二苯砜_3,3,,4,拃四羧酸、萘-2,3,6,7-四羧酸、 -1,2,4,5-四羧酸、萘-l,4,5,8-四羧酸、丁烧-1,2,3,4-四羧酸、環戊烧 -1,2,3,4-四羧酸等之單酐、二酐、酯化物等單獨或2種以上^混合 物;.(c)二羧酸,對苯二曱酸、異苯二甲酸、聯苯二羧酸、二苯^ 二叛酸、二苯石風二羧酸、己二酸、壬二酸、癸二酸、環己烧[ 二羧酸之二魏酸、以及該等酸之單酐或自旨化物。 胺成分,例如可舉出:3,3,-二乙基-4,4,-二胺聯苯、2,2'_二曱基 -4,4’-二胺聯苯、2,2’-二乙基-4,4,_二胺聯苯、3,3,-二甲氧基_4,4,-二 月女聯苯、3,3 -一乙氧基_4,4’_二胺聯苯、對苯二胺、間苯二胺、3,仏 二胺,一苯醚、4,4'·二胺基二苯醚、4,4,-二胺基二苯砜、3,3,-二胺 基一苯颯、3,4’-二胺聯苯、3,3'-二胺聯苯、3,3,-二胺基苯甲醯苯胺、 4,4'-二胺基苯甲醯苯胺、4,4’-二胺基二苯甲酮、3,3'_二胺基二苯甲 酮、3^4'-二胺基二苯甲酮、2,6_甲苯二胺、2,4_曱苯二胺、4,拉二胺 基一笨硫轉、3,3'-二胺基二苯硫g迷、4,4,_二胺基二_丙烧、3,3,_二 胺巧一苯丙烷、3,3’-二胺基二苯曱烷、4,4'_二胺基二苯甲烷、對二 甲苯一胺、間二曱苯二胺、2,2’_雙(4_胺苯)丙烷、1,3_雙(3_胺苯氧 201206696 it 胺笨氧基)苯、^雙(4_胺苯氧基)苯、2,2-雙[4_(4_ Ϊίίί ]丙烷、雙[t(木胺苯氧基)笨基]砜、雙[4-(3-胺苯氧 i ϋι雙[4_(3_胺苯氧基)苯基]丙燒、4,4,_雙(4-胺苯氧基)聯 胺苯氧基)聯苯、四亞甲二胺、六亞甲二胺、異佛爾 己基甲烧二胺、環己垸],4_二胺、二胺魏烧、 iifi化合,二異氰酸酯單獨或2種以上的混合物。 理相兄之觀點’本發明的聚醯胺_醯亞胺樹脂較 理想之樣μ不含m麟鹵素之非錄系。 板的3 w: ΐ 2要/以良撓性覆金屬㈣體或是撓性印刷基 5勺各特性為目的’例如機械特性、電特性、光滑性 劑,、i Λ應而同時使用。例如可同時使用潤滑 笨车、$ μ二、碎4'黏合促進劑、難燃劑(填系或三氮雜 ^糸虱乳化铭專)、穩定劑(抗氧化劑 -;::::' ^ 樹脂、聚Jr ί丄!^旨、丙婦酸醋樹脂、胺基甲酸乙酯 纖、氧 胺、#夫#$ —& > 應/、所需,亦可添加脂肪族第三級 脂肪族酸酐、芳香纖、 胺-醯亞胺樹脂,較理相之檨^ 、仃選擇,但無論是哪種聚醯 樣態為㈣重秋重量/左右,而最理想之 者,由於該等溶劑亦為前述的有機溶劑。再 當的溶液黏度,在25t:h t觀胺-酿亞胺樹脂溶液之適 型黏度為1〜l〇〇〇dpa · S的範圍。 19 201206696 本电=之撓性覆金屬疊層體所使用的金屬镇為銅羯。銅羯的 表面上可實施有機防鏽處理(笨並噻唑、苯並三唑、咪唑等)、無機 =鏽,,(鋅二鉻、鋅合金等)、矽烷耦合劑處理(環氧系矽烷耦合 别、月女糸魏輪合劑、硫醇系魏耦合劑等)、包覆電鍵處理、鍛 燒電鑛處理等之處理。 面向於銅A層儀表面_胃的M面)之表面粗链度為 3·0μιη =下’而牵父理想之樣態為2 〇阿以下,更理想之樣態為[ο陣 以下。虽表面粗糙度超過前述上限時,圖案成形性差,而且,由 於將銅魏嫌去後的樹脂_層之紐 ^表面粗糙度之下限越低越好,並不限定,但〇1二= 足夠。 銅箔之光澤度為3〇〇以上,而較理想之樣態為·以上, 更理想之樣態為600以上。光澤度係根據肌Z874]_1997而測定, =射角60。照射’並測定6〇。下之反射光。光澤度越高,表面粗 奴度越低i而且,由於沒有反映於表面粗糙度的波紋等亦不多, 所以表面4得更平滑。因此,光澤度越高越好,但_左右便已 足夠。 、>人但光澤度,所謂的光澤值係於—定的人射触射測定光, 亚於一疋的角度測定相對於此的反射光之強度,例如, JIS-Z874]:1997 中有規定 2〇。、45。、6〇。、75。、85。等之入射角、 反射=。雜況下,若使用光澤度高的鋪,在撓性印刷基板中, ^銅4似彳除去後的基材触層係反映銅制表面狀態,並 漫射更少、透明性佳的薄膜層,而光澤度低的情關&其相反’。 但是,將該光澤度作為指標時之透明性,嚴密而言,係二定角度 下的入射角、反射狀-定肖度之散射光的量’故作絲材= 透明性的指標’係不實用。詳言之,⑺FA板之位置調整,例如 照射40〇nm〜800nm左右的可見光於基板上,藉由圖像處理 鑑別圖案,但未必是60。的角度’反倒是更接近於垂直的角度下之 入射角、反射角。因此,反映銅羯的表面狀態,將銅箱伽^ 後的基材細層巾,接近鼓的肖度之漫射的量,亦可能與光澤J moisture absorption dimensional change rate, and the characteristics of the JJL surface (low temperament) may also deteriorate. Further, under ^Momo*, the most desirable (four) is a 16G material% of the amine skeleton, and when the amount exceeds the above upper limit, the organic lion is dissolved low and the storage stability may be deteriorated. Poly layer B. The guanamine-containing imine resin comprises the above-mentioned general formula [4], the general formula [study, and the general [6], and the complex unit is preferably in the knife chain. The b layer of poly-tank yttrium imine resin ^ general formula [4] / general formula [study / general formula [sentence of the sentence is more ideally 5 〇 ~ 99 / 1 ~ 50/1 ~ 50, The more ideal form is 6〇~9〇//5~4〇/5~3〇, and the more ideal form is 65~85/10~3〇/5~20. The molar ratio of the general formula [4] is more than the above upper limit, and when any two of the molar ratios of the general formula [5] and the general formula [6] are lower than the aforementioned lower limit, the surface roughness is low and the gloss and reflection are low. The peel strength of the copper smear tends to decrease, and the characteristics such as the moisture absorbing dimensional change rate and the planarity (low warpage property) of the laminate may be deteriorated. Further, when the 201206696 • J ear ratio of the general formula [4] is less than the aforementioned lower limit, and any one of the molar ratios of the general formula [5] or the general formula [6] is more than the above upper limit, dissolution of the organic solvent Sex, storage stability may be woven. R, the amine is bound to the imide and the ugly count is the same as the bismuth layer of polyamine-imine resin (II). ^, layer B of polyamine-imine resin in N_methyl_2_pyr0^5〇Γ 〇51= It sub-quantity ', and more ideally, it has the equivalent of logarithmic viscosity S physical properties Insufficient, and the peel strength is also reduced by two. When the upper limit is reached, the viscosity of the solution is increased, so that the production of the above-mentioned polyamine-imine resin can be carried out by a method such as an isocyanic acid method or an amine method. For example, the lipid needs to be soluble in an organic solvent, and the tree coated coating is ideal. The belly b can be directly chemically reacted with the aromatic tri-salt anhydride and the aromatic amount, and the oxime, force, and monoisocyanate can be used in an organic solvent to determine the chemistry. It can be mentioned that the benzene is biased: the poly-_imine resin used. Aromatic three:;;:;?: For reason j: Cyanide agent in (4) 4 hours compared with: r_, alkali metal: ==== Manufacture of polyamido- 醯 胜 抖 该 该 该 该 该 该The polymerization solvent can be used to dissolve methyl-2-port ratios, NN_. _ organic solvent, for example, may be exemplified by N- '-indenyl hydrazine _$, hydrazine, hydrazine dimethyl hydrazine, ι, 3- 17 201206696 dimercapto-2-imidazolidinone, tetrahydrofuran, ring Ding 飒, dimethyl hydrazine, γ _ _ _ vine vinegar, cyclohexanone, cyclopentanone, etc., and the ideal form is Ν-mercapto-2- 比 咯 。. ^ ^ ^ may also be part of these compounds as a hydrocarbon-based organic solvent such as toluene, diphenylbenzene; diethylene glycol dioxime ether, triethylene glycol dioxime ether, tetrahydrofuran and other ether-based organic solvents; A ketone-based organic solvent such as thiol isobutyl ketone is substituted. The polyamine-imine resin of the present invention is used as a laminate for heat resistance, flame retardancy, adhesion, dimensional stability, flexibility, insulation properties, moisture absorption properties, and the like. In addition to the acid component and the isocyanate component shown above, the acid component and the amine component shown below can be copolymerized in the balance of the performance of the present invention. Further, in combination with the acid component and the amine component, it may be used in combination with a resin which is additionally polymerized. , the acid component, (8) tricarboxylic acid, diphenyl terminal 3, 3,, 4'-three: carboxylic acid, diphenyl -3,3', 4'-tricarboxylic acid, benzophenone _ a monoanhydride or an esterified product such as a tricarboxylic acid such as 3,3', 4,-tricarboxylic acid, naphthalenetricarboxylic acid or monobutane-1,2,4-tricarboxylic acid, or a mixture of two or more thereof. (8) a concave carboxylic acid, diphenyl sulfone _3, 3, 4, stilbene tetracarboxylic acid, naphthalene-2,3,6,7-tetracarboxylic acid, -1,2,4,5-tetracarboxylic acid, Naphthalene-1,4,5,8-tetracarboxylic acid, butadiene-1,2,3,4-tetracarboxylic acid, cyclopentane-1,2,3,4-tetracarboxylic acid, etc. Anhydride, esterified product, etc. alone or in combination of two or more; (c) dicarboxylic acid, terephthalic acid, isophthalic acid, biphenyl dicarboxylic acid, diphenyl ^ ditoxin, diphenyl stone Carboxylic acid, adipic acid, azelaic acid, sebacic acid, cyclohexene [dicarboxylic acid of dicarboxylic acid, and monoanhydride or self-agent of such acids. The amine component may, for example, be 3,3,-diethyl-4,4,-diamine biphenyl, 2,2'-dimercapto-4,4'-diamine biphenyl, 2,2' -diethyl-4,4,-diamine biphenyl, 3,3,-dimethoxy_4,4,-February female biphenyl, 3,3-ethoxy _4,4'_ Diamine biphenyl, p-phenylenediamine, m-phenylenediamine, 3,decylamine, monophenyl ether, 4,4'-diaminodiphenyl ether, 4,4,-diaminodiphenyl sulfone, 3 , 3,-diaminomonophenyl hydrazine, 3,4'-diamine biphenyl, 3,3'-diamine biphenyl, 3,3,-diaminobenzimidil, 4,4'-di Aminobenzamide, 4,4'-diaminobenzophenone, 3,3'-diaminobenzophenone, 3^4'-diaminobenzophenone, 2,6_ Toluene diamine, 2,4-nonylphenylenediamine, 4, succinimide, sulphur, 3,3'-diaminodiphenyl sulphide, 4,4, _diamine propylene , 3,3,-diamine, phenylpropan, 3,3'-diaminodiphenyl decane, 4,4'-diaminodiphenylmethane, p-xylene-amine, m-diphenylene diamine , 2,2'_bis(4-aminophenyl)propane, 1,3_bis(3-aminophenoxy 201206696 it amine oxy)benzene, bis(4-aminophenoxy)benzene, 2,2 -Double [4_(4_ Ϊίίί ]propane, bis[t(xylamine phenoxy)) Sulfhydryl, bis[4-(3-aminophenoxy i ϋι bis[4_(3-aminophenoxy)phenyl]propane, 4,4,_bis(4-aminophenoxy) hydrazine Phenoxy)biphenyl, tetramethylenediamine, hexamethylenediamine, isophorhexylamine diamine, cyclohexanyl], 4-diamine, diamine Wei, iifi, diisocyanate alone or Two or more kinds of mixtures. From the point of view of the brothers, the polyimine 醯 醯 imine resin of the present invention is more ideal than the non-recorded system of m-lin halogen. 3 w: ΐ 2 to be For the purpose of the metal-coated (four) body or the flexible printing base 5 spoons, for example, mechanical properties, electrical properties, smoothing agents, and i should be used at the same time. For example, the lubricating stupid car can be used at the same time, 4' Adhesive accelerator, flame retardant (filled or triazole), stabilizer (antioxidant-;:::: ^ ^ resin, poly Jr 丄 丄! ^ purpose, propyl acid Vinegar resin, ethyl urethane fiber, oxyamine, #夫#$ -&> should, if necessary, add aliphatic tertiary aliphatic anhydride, aromatic fiber, amine-imine resin, It is more reasonable to choose ,^, 仃, but no matter which kind of The mode is (4) heavy autumn weight / around, and most ideally, because the solvent is also the aforementioned organic solvent. The viscosity of the solution, the suitable viscosity of the 25t: ht amine-enamel resin solution is 1~l〇〇〇dpa · S range. 19 201206696 The metal used in the flexible metal-clad laminate is copper enamel. The surface of the copper enamel can be treated with organic rust (stupid thiazole, Benzotriazole, imidazole, etc., inorganic = rust, (zinc chrome, zinc alloy, etc.), decane coupling agent treatment (epoxy decane coupling, virgin virgin mixture, thiol-based couplant, etc.) ), coated electric key processing, calcined electric ore processing, and the like. The surface of the surface of the copper A-layer instrument _ stomach M is thicker than 3·0μιη = lower', and the ideal image of the father is 2 〇 or less, and the more ideal form is [O Array below. When the surface roughness exceeds the above upper limit, the pattern formability is inferior, and the lower limit of the surface roughness of the resin layer after the copper smear is not limited, but 〇1 2 is sufficient. The gloss of the copper foil is 3 Å or more, and the more desirable state is · or more, and more preferably 600 or more. Gloss was measured according to muscle Z874]_1997, = angle 60. Irradiated ' and measured 6 〇. The reflected light below. The higher the gloss, the lower the surface roughness, and the smoothness of the surface 4 is because there are not many corrugations or the like which are not reflected in the surface roughness. Therefore, the higher the gloss, the better, but _ is enough. , > human but the gloss, the so-called gloss value is determined by the measured light of the human-shot radiation, and the intensity of the reflected light relative to this is measured at an angle of, for example, JIS-Z874]: 1997 2〇. 45. 6〇. 75. 85. Wait for the angle of incidence, reflection =. Under the circumstance, if a high gloss cloth is used, in the flexible printed circuit board, the substrate layer of the copper 4-like ruthenium removal reflects the surface state of the copper, and the film layer with less diffusion and transparency is good. And the low gloss of the love & the opposite '. However, the transparency when the gloss is used as an index is strictly the angle of the incident angle at the two fixed angles and the amount of the scattered light at the reflection-fixation degree. Therefore, the wire material = the index of transparency is not practical. In detail, (7) the position adjustment of the FA plate, for example, irradiation of visible light of about 40 〇 nm to 800 nm on the substrate, and the pattern is discriminated by image processing, but it is not necessarily 60. The angle 'is rather the angle of incidence and angle of reflection closer to the vertical angle. Therefore, reflecting the surface state of the copper matte, the amount of the substrate of the copper box is close to the diffuse of the drum, and may also be glossy.
20 (D 201206696 ^之數值不相關。例如,於人射角為5。之垂直的反射角下,漫射 人亦推測表面狀態於人射角、反射角為⑹。下之漫射多, 土1 反之位置調整而言,前者較接近實用。 根據刖述觀點,選擇作為可見性更佳的][7(:(;^所需的銅箔, 除工該光秋财卜’錢照射4。。職〜_nm左抑可i光於基板 亡時的反射轉'為有效,且本發明之鋪的4GGnm〜_nm之可見 f區f中的反射率為2G%以上,而較理想之樣態為25%以上,更 樣恶為30%以上。反射率低時,可見性差。反射率越高 越好’但80%左右便已足夠。 柄斤關ΐΪί之厚度,並無特別限定,例如3〜5()μΓη較為理想。 t官帶狀’且其長度係無特別限^。再者,锻帶狀的 別限定,但—般而言為25〜左右,而最好為 本之撓性覆金屬疊層體,例如可藉由在該銅落上直 ,過黏^彻純序塗布該2種類的聚醯胺_亞胺樹脂(Α層:Β 4之j,並乾無塗膜(初期乾燥〉,且視情況施以熱處理·去溶 劑(二次乾燥)而製造。 H㉝上疊層2種類的聚g__輕胺樹脂之方法, 脂溶液’初期乾燥後’塗布B層樹脂溶液,初期乾 ,視情況而貫施二次乾_方法。或是,亦可 、 燥及二次乾燥後,塗布B層樹脂溶液,: ^-人綠。或是,亦可在塗布A層樹脂溶 1 ^ :樹 』刀二刮,塗佈機、凹版塗布機、模具塗布機、反:布 卓,在,上直接或透過黏合劑層塗布聚_屬亞胺广布機 稀橡使用巧ί劑’严無特別限定’可舉出丙婦曰腈丁二 少)糸、聚醯胺系、聚酯系、聚g旨型胺基甲酸乙醋系、環 201206696 氧樹脂系、丙烯酸樹脂系、聚醯亞 ^聚峨i亞卿旨料黏合劑。前^巾=^=^樹脂 =二戈;於該等樹脂中摻合環氧樹 合劑的厚度較理想之樣態為1〜30μ1Ώ左右。 為理想而勒 較理Si塗==使 的撓性印刷基板之趣曲亦會變大、。’而將别述電路加工 π時,乾燥時間會性再鴇溫度低於心 的種類而得-般_〜赋i 度因溶劑 之溶劑殘留率成為5〜40%左右的有f文時3於塗膜中 分鐘左右,最好為2〜15分鐘左右。、 ,而—般為1〜30 再者,二次乾燥條件亦無特別限定,於龙 沸點以上的溫度乾燥即可,而一般為、如二的:點附近或疋 為200。(:〜33(TC。去二p、w #,C〜400 C,較理想之樣態 會下降,而過高時w乾燥時間會變長,生產性 :脆的情況。而且,銅箔本身的結晶:二進:薄 下’於塗象= 數十小時左右。 ’ A f f柳可’❿-般為數分鐘〜 =力下進订’而更理想之樣態為在ίο·1〜島左右之壓力;進 22 ⑧ 201206696 初期乾妹、一次乾燥皆可垃田3习土 4a -採親支撐方式或浮動方用^揭不的乾燥方式,例如可 之連續熱處理、或於捲曲物狀自了 ’ ^採拉幅式等加熱爐 分批式之料下,較理批式的烘箱熱處理。 觸而,。又,加熱方;可採===:面:會, 紅外線加熱器、近紅外線加熱器等。 電爐瓜加熱益、运 本發明之撓性覆金屬疊層體中,A層斑 B層),較理想之樣態為_〜则 相日^層< 性差,而超過前述上限時广可見\達^下=,獅強度、安裝 聚酿胺-醯亞胺樹脂薄膜(A^ ft =佳二 ΜΟΟμιη =,聚醯胺_醯亞胺樹脂薄膜㈣)的厚度,較理G f。 25〜40μηι。a層及Β層的厚 / f „為 寸,率變大’而超過前述1限時日,可Πϊΐ : Ϊ 有穹曲性、耐折特性下降的傾向。 凡丨王a卜丨牛,且 過刚述上限時’撓性等之特性或加 居度起20 (D 201206696 ^ The value is irrelevant. For example, under the vertical reflection angle of the human angle of 5. The diffuser also speculates that the surface state is at the angle of the person and the angle of reflection is (6). 1 Conversely, in terms of position adjustment, the former is closer to practical. According to the point of view, choose as the better visibility] [7 (: (; ^ required copper foil, save the light autumn money] 'money irradiation 4. The position of the job is _nm, and the reflection of the substrate when the substrate is dead is effective, and the reflectance in the visible f-region f of 4GGnm~_nm of the present invention is 2G% or more, and the ideal state is 25% or more, more like evil, more than 30%. When the reflectance is low, the visibility is poor. The higher the reflectivity, the better, but about 80% is enough. The thickness of the handle is not limited, for example, 3~ 5 () μ Γ η is ideal. t official band shape 'and its length is not particularly limited ^. In addition, the forged band shape is not limited, but generally 25 ~ or so, and preferably the flexible cover The metal laminate, for example, can be coated on the copper by straight, over-adhesively coating the two kinds of polyamido-imine resins (Α layer: Β 4, and dried) The coating film (initial drying) and, if appropriate, heat treatment and solvent removal (secondary drying) are produced. The method of laminating two types of polyg__light amine resin on H33, the fat solution 'after initial drying' is applied to the B layer. The resin solution is initially dried, and the second dry method is applied as the case may be. Alternatively, the B layer resin solution may be applied after drying and secondary drying, : ^-human green, or may be coated A. Layer resin 1 ^ : tree knives two scraping, coating machine, gravure coater, die coater, reverse: cloth, on or directly coated with the adhesive layer to coat poly-imine wide-band machine巧 剂 剂 严 严 严 严 严 严 严 严 严 严 严 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 Department, poly 醯 ^ 峨 峨 亚 亚 亚 亚 亚 旨 旨 旨 亚 前 前 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 亚 前 亚 前 前 前 前Left and right. For the ideal, it is better to use the Si coating == to make the flexible printed circuit board more interesting, and when the other circuit is processed π, The drying time will be lower than the type of the heart, and the temperature will be about 5 to 40%. The solvent residual rate is about 5 to 40%, and the amount of time is about 3 minutes in the coating film, preferably 2 ~15 minutes or so, and -1 to 30. In addition, the secondary drying conditions are not particularly limited, and the temperature above the boiling point of the dragon can be dried, and generally, as the two: near the point or 疋 200 (:~33 (TC. Go to two p, w #, C~400 C, the ideal pattern will decrease, and when it is too high, w drying time will become longer, productivity: brittle condition. Moreover, copper foil Crystallization of itself: two into: thin under 'in the smear image = tens of hours or so. ' A ff willow '❿-like for a few minutes ~ = force under the order' and more ideal form is in ίο·1~ island The pressure of the left and right; into the 22 8 201206696 early dry sister, a dry can be used in the field 3 habit 4a - mining pro-support or floating side use the method of drying, such as continuous heat treatment, or in the shape of curled Under the condition that the batching type of the heating furnace is used, the oven heat treatment is better than the batch type. Touch, Also, heating side; can be used ===: face: meeting, infrared heater, near infrared heater, etc. In the flexible metal-clad laminate of the present invention, the layer A of the layer A of the present invention is preferably a layer of _~, and the layer of the layer is poor, and is more visible when the upper limit is exceeded.达^下=, the thickness of the lion, the thickness of the installed polyamine-imine resin film (A^ ft = good ΜΟΟμιη =, polyimide 醯 胺 imine resin film (4)), more reasonable G f. 25~40μηι. The thickness of the a layer and the enamel layer / f „ is the inch, the rate becomes larger, and when it exceeds the above-mentioned one-limit time, the Πϊΐ: Ϊ has a tendency to be distorted and the folding resistance is degraded. Just when the upper limit is stated, the characteristics or the degree of addition of flexibility etc.
3;;:,再者,本發明的撓性二 =需可要T 於兩==覆藉由貼合兩片叠層體,俾使其 扭用親疊層、擠壓疊層、帶式纏疊#等、3° ’可 23 201206696 恶為30〇c〜50〇c,更理想之樣態為35(rc〜450。 態為38〇t:〜430°c。更加理想之樣 辭以# ' 過低時,黏合性不足,而過高時, = i 特性下降的可能性。疊層的時間,並: 特別限疋,但通常為1。秒〜1()小時,而較理想 』 :過鐘〜3G分鐘。當時間過短時Γ黏合二足,、 合劑的;“=用f有機械特性下降的可能性。透過黏 使用在層之疊層時可使用的前述 等之=前撓性覆金屬#層體,例如藉由減法製程 路ί::4:ΐΓ程序’而可製造撓性印刷基板。以保 邊導體電路之叫#1為目㈣包覆表面的情況下 鱗難薄賴合於電路板(.電路形成 的方法、或將液狀的包覆劑以網版印刷法塗布於電路 胺系的油墨,而較理想之樣態為聚醯亞胺系。 f祕亞胺H之黏合片直接貼合於電路板。如前述而製造之 ^性,刷基板’可使用於需要細微間距化的高密度愈路板用途, 特別是平面顯轉、行動電話等之液晶螢幕_輸模 COF薄膜承載膠帶用途。 '' τ 電路的配線圖案,可形成任意的圖案。特別是在施以細微的 =線圖案之電路中,本發明之撓性印刷基板亦表現其高水準的性 能。具體而言,電路的配線之粗細可為50μΓη以下,甚至可為3〇^m 以下、20μιη以下、1〇μιη以下。配線之間隔可為5〇〖im以下,甚 至可為30μπι以下、20μιη以下、ΙΟμιη以下。 [實施例] 以下根據實施例而展現本發明之優異的效果,但本發明並不 限疋於該等實施例。 : ▲再者,實施例中之特性值的評鑑方法係如以下所述。而且, 砰鑑中使用之粉末狀的聚合物樣本,係以大量的丙酮將各實施 例、比較例所得到之聚合摻雜物再沉澱、精製而製成。、 24 ⑧ 201206696 • <黏合強度> 依照 IPC-FC241(IPC_TM-650,2.4. 9(A)),藉由減法製程而製 成電路圖案,並使用拉伸測試機(產品名ΓΤΕΝ8ΙΙΌ]Ν^ώ伸測試3;;:, Furthermore, the flexibility of the present invention is as follows: T is required to be applied to two laminates, and the two laminates are laminated, and the laminate is twisted, laminated, and laminated. Tangle #等, 3° '可23 201206696 The evil is 30〇c~50〇c, and the more ideal form is 35(rc~450. The state is 38〇t: ~430°c. More ideally # ' When the temperature is too low, the adhesion is insufficient, and when it is too high, the probability of the = i characteristic is lowered. The time of the lamination, and: the limit is particularly limited, but usually 1. seconds ~ 1 () hours, and ideal : After the clock ~ 3G minutes. When the time is too short, the two sides are bonded, and the mixture is mixed; "=The possibility of the mechanical properties being degraded by f. The above-mentioned etc. which can be used when the layer is laminated by the adhesive is used. The flexible metal-clad layer can be manufactured by a subtractive process circuit ί::4: ΐΓ program'. The edge of the edge-contained conductor circuit is called #1 (4). The thin film is applied to the circuit board (the method of forming the circuit, or the liquid coating agent is applied to the circuit amine-based ink by screen printing, and the preferred form is a polyamidene system.) Amine H bonding The film is directly attached to the circuit board. As described above, the brush substrate can be used for high-density road use applications requiring fine pitch, especially for liquid crystal screens such as flat display and mobile phones. The film-bearing tape is used. The wiring pattern of the '' τ circuit can form an arbitrary pattern. Especially in a circuit with a fine = line pattern, the flexible printed circuit board of the present invention also exhibits a high level of performance. In other words, the thickness of the wiring of the circuit may be 50 μΓη or less, or may be 3 μm or less, 20 μm or less, or less than 1 μmη. The interval of the wiring may be 5 〇 or less, or may be 30 μm or less, 20 μm or less, ΙΟμιη. [Embodiment] Hereinafter, the excellent effects of the present invention will be exhibited based on the examples, but the present invention is not limited to the embodiments. ▲ Further, the evaluation method of the characteristic values in the examples is as follows Further, the powdery polymer sample used in the method is prepared by reprecipitating and refining the polymerized dopants obtained in the respective examples and comparative examples in a large amount of acetone. 8 201206696 • <Adhesive strength> According to IPC-FC241 (IPC_TM-650, 2.4. 9(A)), a circuit pattern is formed by a subtractive process, and a tensile tester (product name ΓΤΕΝ8ΙΙΌ]Ν^ώ is used. Stretch test
機」、ToyoBaldwinCo.,Ltd.製)測定電路圖案與樹脂層之間的 合強度。 J <可見性> 可見性,將光線透群及值作為指標,絲透射率 以上且霧度25以下時評鑑為〇,除此之外評鑑為乂。 ,線,射率,係照射光線於已自撓性覆金屬疊層體剝除銅笛 後之树脂溥膜層’測定透射的光之強度。具體而言,對於入 的強度之對於透射光的強度之_係以百分率表* 製作所(股)製UV-3150進行,並於波長·〜12〇〇· 島^ 1600nm/分下測定。 吓钿迷度 除以,ίΐ以百分率表示樹脂層的散射光線透射率 =;=么曰本電色工業_麵。。。進行, 〈使用期限〉 ,用=,評鑑以5ΐ保存3個月後的溶液黏度之增加 加率在初期值之1.2倍以内時為0,超過時為χ。 田 ΤΟΚ膽C(股)製的β型黏度計以旋轉數阶 广狀係猎由 <圖案成形性> 將感光性光阻壘層於撓性覆金屬疊層體之銅絲面 缚膜上曝光、种、顯影而轉印2Q間 、士罩 3糊氯化銅溶液,蝴除去=二用 先阻藉由驗性物質而去除。圖案成形 =狀,形成之 據圖案的直線性或銅的殘根等^外觀等而判定传1之电路板,根 <安裴性> 玻4=:====^薄膜層之 Tg ^ TMA(^,^^„/Seik〇 Eps〇n 以 25 201206696 下條件測定。。 荷重:5g 樣本尺寸:4(寬)><20(長)mm 昇溫速度:l〇°C/分 環境:氮 <數量平均分子量> 藉由GPC(凝膠滲透層析儀)於以下條件測定數量平均分子量。 管柱:TSKgel GMTiXLx2 + TSKgel G2000HXL (TOSOI-I 製) 流速:0.7ml/min 測定溫度:40°C 溶劑:0.1%溴化鋰/DMAc溶液 檢量線:分子量以標準PEG換算而計算。peg分子量係使用 以下數值。 ’、 峰No PEG分子量 1 920000 2 250000 3 170000 4 140000 5 107000 6 50000 7 24000 8 4000 9 1080 <對數黏度> ' 準備粉末狀的聚合物樣本,將其溶解於N-甲基-2-吼咯。定酮, 俾使聚合物濃度成0.5g/d],於30。(:下藉由烏氏黏度管測定該溶液 的溶液黏度以及溶劑黏度,並以下述式計算。 對數黏度(dl/g) = [lnM/VdA^ 式中之表示測定的溶液黏度,%表示測定的溶劑黏度,而 Vl及V2係由^^合物溶液及溶劑(N-甲基_2-α比p各σ定酮)通過黏度管之 毛細現象的時間而求得。且’ V3為聚合物濃度(g/dl)。 201206696 - 〈光澤度〉 根,j!S-Z8741 -1997所記載之鏡面光澤度的測定方法 ,於入 射角60。照射光源,並於反射角6〇。測定反射的光之強度。在此之 入射角,係將相對於光之照射面的直角方向作為〇。。 測定機器係使用日本電色(股)之VG2〇〇光澤計。 <表面粗糙度> 根據JIS-B-0601而測定。 <反射率(正反射率)> 使用島津製作所(股)製鏡面反射測定設備(入射角5。用),以島 津製作所(股)製UV-3150於測定波長300〜1200nm、掃描速度 1600nm/分,測定角度5。時的正反射率。再者,反射率的值以55〇nm 作為代表值。 <蓝亞胺樹脂(Π)之最大粒徑> 聚醯胺-醯亞胺樹脂(Π)成分之粒狀的相之最大尺寸,係藉由使 用掃瞄式電子顯微鏡(SEM)於25。(:之溫度下觀察薄膜切斷面而測 定。 合成例1 在反應容器中加入苯偏三酸酐(;TMA)153g(^菱瓦斯化學(股) 製)、3,3',4,4'-二苯基酮四 f 酸二酐(BTDA)4〇g(DaicdchemicalThe machine, manufactured by Toyo Baldwin Co., Ltd., measures the bonding strength between the circuit pattern and the resin layer. J <Visibility> Visibility, the light penetration group and the value are used as indicators, and the silk transmittance is above and the haze is 25 or less, and the evaluation is 乂. The line, the rate of incidence, and the intensity of the transmitted light are measured by irradiating light onto the resin film layer after stripping the copper flute from the flexible metal-clad laminate. Specifically, the intensity of the transmitted light with respect to the intensity of the transmitted light was measured by a percentage table * manufactured by UV-3150, and measured at a wavelength of ~12 〇〇 · island ^ 1600 nm / min. Frightenedness is divided by, ΐ ΐ 表示 表示 表示 树脂 树脂 树脂 树脂 树脂 树脂 树脂 树脂 树脂 树脂 树脂 树脂 树脂 树脂 树脂 树脂 树脂 树脂 树脂 树脂 树脂 树脂 树脂 树脂. . Carry out, <use term>, use =, evaluate the increase in the viscosity of the solution after 3 months of storage at 5 为. The increase rate is 0 within 1.2 times of the initial value, and is χ when it exceeds. The β-type viscometer made by T. sinensis C (strand) is hunted by a number of rotations. <Pattern Formability> The photosensitive optical barrier layer is bonded to the copper wire of the flexible metal-clad laminate. Upper exposure, seeding, development and transfer of 2Q, Shishi 3 paste copper chloride solution, butterfly removal = two use first resistance by the test substance to remove. Pattern forming = shape, forming a circuit board according to the linearity of the pattern, the residual of copper, etc., etc., and the root <amplitude> Glass 4=:====^Tg of the film layer ^ TMA(^,^^„/Seik〇Eps〇n is determined under the conditions of 25 201206696. Load: 5g Sample size: 4 (width) >< 20 (length) mm Heating rate: l〇°C/min Environment: Nitrogen <Quantum Average Molecular Weight> The number average molecular weight was determined by GPC (gel permeation chromatography) under the following conditions: Column: TSKgel GMTiXLx2 + TSKgel G2000HXL (manufactured by TOSOI-I) Flow rate: 0.7 ml/min Temperature: 40 ° C Solvent: 0.1% lithium bromide / DMAc solution calibration line: The molecular weight is calculated in terms of standard PEG. The following values are used for the peg molecular weight. ', Peak No PEG molecular weight 1 920000 2 250000 3 170000 4 140000 5 107000 6 50000 7 24000 8 4000 9 1080 <Logarithmic viscosity> 'Prepare a powdery polymer sample and dissolve it in N-methyl-2-pyrrole. The ketone is ketone so that the polymer concentration is 0.5 g/d]. At 30. (: The viscosity of the solution and the viscosity of the solution are determined by Ubbelohde viscosity tube, and are calculated by the following formula Logarithmic viscosity (dl/g) = [lnM/VdA^ where the viscosity of the solution is measured, % indicates the measured solvent viscosity, and Vl and V2 are the solution and solvent (N-methyl _ 2-α ratio p σ deterministic ketone) is obtained by the time of the capillary phenomenon of the viscosity tube, and 'V3 is the polymer concentration (g/dl). 201206696 - <Gloss> Root, j!S-Z8741 -1997 The method for measuring the specular gloss is described as an incident angle of 60. The light source is irradiated at a reflection angle of 6 〇. The intensity of the reflected light is measured. The incident angle here is defined as a direction perpendicular to the irradiation surface of the light.测定. The measurement system uses a VG2 〇〇 gloss meter of Nippon Electric Co., Ltd. <Surface roughness> Measured according to JIS-B-0601. <Reflectance (positive reflectance)> Specular reflectance measuring device (for incident angle 5), which is measured by the UV-3150 manufactured by Shimadzu Corporation at a measurement wavelength of 300 to 1200 nm and a scanning speed of 1600 nm/min, and the positive reflectance at an angle of 5. The value of the reflectance is represented by 55 〇 nm. <Maximum particle diameter of blue imine resin (Π)> Polyamide-醯亚The maximum size of the particulate phase ([pi) of the resin component, based by the use of scanning electron microscope (SEM) at 25. (The temperature of the film was observed at the temperature of the cut surface. Synthesis Example 1 In the reaction vessel, 153 g of trimellitic anhydride (TMA) (manufactured by Rhombus Chemical Co., Ltd.), 3, 3', 4, 4' was added. -diphenyl ketone tetraf-acid dianhydride (BTDA) 4〇g (Daicdchemical
Industries,Ltd.製)、3,3’,4,4’-聯苯四曱酸二酐(3?〇八)22笆(三菱化學 (股)製)、聯鄰曱苯胺二異氰酸酯(T〇DI)264g(日本曹達(股)製)、三 伸乙基二胺6g(Nacalai Tesque,Inc.製)、以及N-曱基-2-吡咯啶酮 (NMP)720g(三菱化學(股)製X聚合物濃度15重量%),於2小時内 升溫至120°C為止,並使其維持此狀態反應5小時。接著,加入 NMP211g(聚合物濃度12重量%),並冷卻至室溫為止。得到之樹 脂漆為黃褐色透明,且聚合物溶解MNMP。合成例〗之樹脂漆的 樹脂成分、對數黏度、數量平均分子量示於表1。 合成例2 除了將樹脂成分改變為表1所示的内容以外,係與合成例1 相同而製成樹脂漆。合成例2之樹脂漆的樹脂成分、對數黏度、 27 201206696 數量平均分子量示於表1 [表1] 樹脂成分(莫耳比) — 合成例1 TMAyBTDA/BPDA/TODI=80/12.5/7.5/100 合成例2 TMA/BTDA/BPDA/PMA/NDI=30/40/20/l〇/l〇〇 ΤΜΑ :苯偏三酸針 1.8 1.2 數量平均 40100 31000 BTDA : 3,3,,4,4'-二苯基酮四曱酸二酐 BPDA : 3,3:4,4'-聯苯四曱酸二酐 PMA:均苯四酸酐 TODI :聯鄰曱苯胺二異氰酸酯 NDI : 1,5-萘二異氰酸酯 (比較例1〜4) 在具有如表2所示的銅箔Μ面特性之厚度]2〜]5μιη的 ,3面上使用刀式塗布機,塗布合成例2所得到之樹脂漆使白 去浴劑後的厚度(A層)成ΙΟμιπ ’並於100¾下乾燥5分鐘。接 並且採同樣的方法,塗布合成例丨所得到之樹脂漆,俾使 ’ ,的厚度(Β層)成25, ’並於1G(TC下乾燥1〇分鐘,而得到“ 乾燥之撓性覆金屬疊層體。 ^ 接著,將該初期乾燥之撓性覆金屬疊層體固定於金屬掣的 ^’。以真空乾燥機及惰性烤箱(hiert〇ven)於以下所示之條件^熱處 減壓乾燥條件:200°Cx24hr (根據溶劑之揮發,減壓度於10〜lOOPa之間變動) 氮氣下之加熱(流量;20L/分):260°C><10hr 最後得到的撓性覆金屬疊層體,已完全除去塗膜中的溶劑, 見性、剝離強度係如表2所示。根據表2,使用:鏡面的銅箔而 可得到可見性佳的撓性覆金屬疊層體,但難於兼具剝離強度。 201206696 [表2] 可見性Industries, Ltd.), 3,3',4,4'-biphenyltetraphthalic acid dianhydride (3?〇8) 22笆 (manufactured by Mitsubishi Chemical Corporation), and indole anilide diisocyanate (T〇) DI) 264g (made by Nippon Soda Co., Ltd.), 3g of ethyl diamine (made by Nacalai Tesque, Inc.), and 720g of N-mercapto-2-pyrrolidone (NMP) (Mitsubishi Chemical Co., Ltd.) The X polymer concentration was 15% by weight), and the temperature was raised to 120 ° C in 2 hours, and the reaction was maintained for 5 hours. Next, 211 g of NMP (polymer concentration: 12% by weight) was added and cooled to room temperature. The resulting resin is yellow-brown and the polymer dissolves MNMP. The resin component, logarithmic viscosity, and number average molecular weight of the resin varnish of the synthesis example are shown in Table 1. Synthesis Example 2 A resin lacquer was produced in the same manner as in Synthesis Example 1 except that the resin component was changed to the contents shown in Table 1. Resin composition of resin paint of Synthesis Example 2, logarithmic viscosity, 27 201206696 The number average molecular weight is shown in Table 1 [Table 1] Resin component (Mohr ratio) - Synthesis Example 1 TMAyBTDA/BPDA/TODI=80/12.5/7.5/100 Synthesis Example 2 TMA/BTDA/BPDA/PMA/NDI=30/40/20/l〇/l〇〇ΤΜΑ: benzene trimellitic acid needle 1.8 1.2 number average 40100 31000 BTDA : 3,3,,4,4'- Diphenyl ketone tetraphthalic acid dianhydride BPDA : 3,3:4,4'-biphenyltetraphthalic acid dianhydride PMA: pyromellitic anhydride TODI : ortho-anisidine diisocyanate NDI : 1,5-naphthalene diisocyanate (Comparative Examples 1 to 4) The resin paint obtained in the synthesis example 2 was applied to the surface of the copper foil having the thickness of the copper foil as shown in Table 2, 2 to 5 μm, using a knife coater. The thickness after the bath (layer A) was ΙΟμιπ ' and dried at 1003⁄4 for 5 minutes. Then, the same method was applied, and the resin varnish obtained in the synthesis example was applied, and the thickness of the layer was set to 25, ' and dried at 1 G (1 Torr for 1 minute to obtain a "dry flexible coating". Next, the initially dried flexible metal-clad laminate is fixed to a metal crucible. The vacuum dryer and the inert oven are used to reduce the heat in the following conditions. Press drying conditions: 200 ° C x 24 hr (variation according to the volatilization of the solvent, the degree of decompression between 10 and 100 Pa) Heating under nitrogen (flow rate; 20 L / min): 260 ° C >< 10 hr The finally obtained flexible metallization The laminate was completely removed from the solvent in the coating film, and the properties and peel strength were as shown in Table 2. According to Table 2, a mirror-coated copper foil was used to obtain a flexible metal-clad laminate having good visibility. However, it is difficult to have both peel strength. 201206696 [Table 2] Visibility
XX
X 〇 iifSMBiili' 表面粗糙度 (μηι)X 〇 iifSMBiili' Surface roughness (μηι)
厚度 (μηι) Ajf/B 層 10/25 10/25 10/25 10/25 剝離強度 (N/cm) 8.5_ 8.9 3.8 〇 合成例3 在反應容器中加入苯偏三酸酐(TMA)17 29g(9〇莫耳%,三其 瓦斯化學(股)製)、3,3’,4,4’-聯苯四甲酸二咐BpDA)2 94g(1〇莫 % ’三菱化學(股)製)、1,5-萘二異氰酸醋(M)I)21.〇g(1〇〇莫耳%, Sumitomo Bayer Urethane Co.,Ltd·製)、二氮雜雙環十一烯、 表聚口物辰反15重里%),於2小時内升溫至1〇〇t:為止 其維持此狀献應5小時。接著,加人6 重量⑹,並冷卻至室溫為止。得狀翻旨漆色; 合物溶解於NMP。 ~界們巴返5且聚 (比較例5) 在比較例4 面 ===俾使去溶劑後的厚度(二= 接口二撓性覆金屬疊層體。 铭罐,俾使塗布面成體蚊於内經16时的 所示之條件加熱處理Γ 4真工餘機及惰性烤箱於以下 減壓乾燥條件:2001x24^ (j艮j康溶劑之揮發,減壓度於1()〜膽& 流量;20L/分):260tx3hr 文 且圖====,=,”全料_的溶劑, 會變差,剝離強度亦==脂==裝二 29 201206696 有一成分(僅聚醯胺-酿亞胺樹脂(I))或是無B層之構成的疊層體不 能達成本發明的目的。 合成例4 在反應容器中加入苯偏三酸酐(TMA)192g(90莫耳%,三菱瓦 斯化學(股)製)、3,3',4,4匕聯苯四曱酸二酐(BPDA)29g(10莫耳%, 三菱化學(股)製)、1,5-萘二異氰酸酯(NDI)2].0g0:00莫耳%, Sumitomo Bayer Urethane Co” Ltd.製)、二氮雜雙環十一烯 ig(san -AproLtd.製)、以及N-曱基-2-°比洛咬酮(NMP)1944gg菱化學(股) 製,聚合物濃度15重量%),於2小時内升溫至l〇〇°c為止,並使 其維持此狀態反應5小時。接著,加入NMP 571g(聚合物淚度12 重量%)’並冷卻至室溫為止。得到之樹脂漆為黃褐色透明,且聚 合物溶解於NMP。合成例4之樹脂漆的樹脂成分與對數黏度示於 表3。 合成例5 在反應容器中加入苯偏三酸酐(TMA) 144g(三菱瓦斯化學(股) 製)、3,3',4,4f-二苯基酮四曱酸二酐(BTDA)64g(Daicel chemical Industries,Ltd.製)、3,3’,4,4’-聯苯四曱酸二酐(BPDA)15g(三菱化學 (股)製)、聯鄰曱苯胺二異氰酸酯(TODI)264g(日本曹達(股)製)、三 伸乙基'一月女3g(Nacalai Tesque,Inc.製)、以及]si-曱基-2-°比洛α定酉同 (NMP)23〇Og(三菱化學(股)製)(聚合物濃度1S重量%),於2小時内 升溫至100°C為止,並使其維持此狀態反應5小時。接著,加入 NMP 726g(聚合物激度12重量%),並冷卻至室溫為止。得到之樹 脂漆為黃褐色透明’且聚合物溶解於NMP。合成例5之樹脂漆的 樹脂成分與對數黏度示於表3。合成例5之樹脂漆的數量平均分子 量為24000。 合成例6 在反應容器中加入苯偏三酸酐(TMA)58g(30莫耳%,三菱瓦 斯化學(股)製)、3,3',4,4'-二苯基酮四曱酸二酐莫耳 %,Daicel chemical IndUstrieS,Ltd·製)、3,3,,4,4'-聯苯四曱酸^酐 (BPDA)59g(2〇莫耳%,三菱化學(股)製)、均苯四酸酐(卩嫩)22§(1〇 201206696 莫耳 %,Daicel chemical Industries,Ltd_ 製)、1,5-萘二異氰酸酉旨 (NDI)210g(100 莫耳%,Sumitomo Bayer Urethane Co.,Ltd.製)、二 氮雜雙環十一烯lg(San-Apro Ltd.製)、以及N-曱基-2-吡咯啶酮 (NMP)2210g(三菱化學(股)製X聚合物濃度15重量%) ,於2小時内 升溫至100°C為止,並使其維持此狀態反應5小時。接著,加入 NMP 650g(聚合物濃度12重量%),並冷卻至室溫為止。得到之樹 脂漆為黃褐色透明,且聚合物溶解於]^>。合成例6之樹脂漆的 樹脂成分與對數黏度示於表3。 合成例7〜9 除了將樹脂成分改變為表3所示的内容以外,係與合成例6 相同而製成樹脂漆。合成例7〜9之樹脂漆的樹脂成分與對數黏度 不於表3。 合成例10 在反應容器中加入笨偏三酸酐(TMA)19g(10莫耳%,三菱瓦 斯化學(股)製)、3,3’,4,4’-二苯基酮四曱酸二酐(BTDAUMgGo莫耳 % ’ Daicel chemical Iiidustries,Ltd·製)、3,3’,4,4’-聯苯四曱酸二酐 (BPDA)59g(20莫耳%,三菱化學(股)製)、均苯四酸酐(卩祖)22政1〇 莫耳%,Daicd chemical Industries,Ltd.製)、對苯二曱酸 (TPA)ng(2〇莫耳% ’三菱瓦斯化學(股)製)、u_萘二異氰酸酯 (NDI)210g(100 莫耳%,Sumitomo Bayer Urethane Co·, Ltd.製)、二 氮雜雙環十一烯lg(San-Apr〇Ltd.製)、以及N-曱基-2]吡咯啶酮 (NMP)2085g(二菱化學(股)製,聚合物濃度Μ重量%),於2小時 内升溫至l〇〇°C為止,並使其維持此狀態反應5小時。接著,加入 NMP 613g(聚合物濃度12重量%),並冷卻至室溫為止。得到之樹 脂漆為黃褐色透明,且聚合物溶解MNMP。接著,將合成例5所 得到之樹脂漆,以相對於聚醯胺-醯亞胺樹脂的固體含量1〇〇重量 分之20重罝%的比率摻合。合成例1〇之樹脂漆的樹脂成分示於 表3 ? 201206696 [表3] 樹脂成分(莫耳比) ---- 對數黏度 合成例4 TMA/BPDA/NDI=90/10/100 1.6 合成例5 TMA/BTDA/BPDA/]ODI=80/12.5/7.5/100 1.3 合成例6 TMA/BTDA/BPDA/PM:A/NDI=30/40/20/10/1.0〇 1.4 合成例7 TMA/BTDA/BPDA//TODI=70/10/20/100 1.5 合成例8 TMA/NDI/MDI=100/90/.10 ------- 1.7 合成例9 TMA/BTDA/BPDA/TODI=55/15/30/100 1.6 合成例10 TMA/BTDA/BPDA/PMA/TPA/NDI=10/40/20/10/20/100 +合成例5的樹脂 TMA :苯偏三酸酐 BTDA : 3,3VMT-二苯基酮四甲酸二酐 BPDA : 3,3',4,4'-聯苯四曱酸二酐 PMA .均苯四酸野 TODI :聯鄰甲苯胺二異氰酸酯 ΝΌΙ · 1,5-蔡二異氰酸酉旨 TPA :對苯二甲酸 (比較例6) VPU平乂列 ,比較m所採用的銅落之Μ面上使用刀式 ==,俾使去溶劑後的厚離層)成^,· 方、10=下,5分鐘,得到初期乾燥之撓性覆金屬叠層體。 鋪ϋ 乾燥之撓性覆金屬疊層翻定於,16对1 所〒之為外側’並以真空乾燥機及情“於幻 減壓乾燥條件:20〇t>241ir 量減變動) 而將该初期乾叙撓性覆金屬 、QCT|^ 5分鐘, 為外側,並以真^ '處理。紐,她梅“啦之顧^ 條 32 201206696 錢燦條件. 2艮據溶劑之揮發,減壓度於队聊 氮氣下之加熱(流量;2〇17分):26〇 3變動) (比較例7〜9) 斯 除了將A層、B層之樹脂漆的厚度 且將氮氣下的加熱時間改變為10小時以外,,表4所示的内容, 得到最後的撓性覆金屬疊層體。 係與比較例6相同而 比較例6〜9所得到的撓性覆金屬疊 全除去,且圖案成形性、可見性良好,而且灰犋中的溶劑已完 安裝性亦佳。但是,以上任一情況下,A声所=比較例6以外, 用期限短,且她強度㈣示健。〗W的樹脂漆之使 成分(僅聚醯胺-醯亞胺樹脂①)、或是雖二忐可知A層僅有一 樹脂(II)的分子量㈣,並*能達成本發 ^^雜胺-醯亞胺 [表41 巧的。 聚醯胺-醯亞 胺樹脂(I) Α層 ~^胺-醯亞 胺樹脂01) B層 厚菱、 (_) (A層/B層) 使用期限 比較例ό 比較例7 比較例8 比較例9 合成例^ 合成例6 合成例8 合成例11 合成例10 合成例5 合成例7 合成例9 合成例1 25/10 1^25~ 10/25 10/25Thickness (μηι) Ajf/B layer 10/25 10/25 10/25 10/25 Peel strength (N/cm) 8.5_ 8.9 3.8 Synthesis Example 3 Adding trimellitic anhydride (TMA) 17 29g to the reaction vessel ( 9〇莫耳%, Sanqi Gas Chemical Co., Ltd., 3,3',4,4'-biphenyltetracarboxylic acid diterpene BpDA) 2 94g (1〇莫% 'Mitsubishi Chemical Co., Ltd.), 1,5-naphthalene diisocyanate (M) I) 21. 〇g (1 〇〇 mol%, manufactured by Sumitomo Bayer Urethane Co., Ltd.), diazabicycloundecene, surface apex辰反15重里%), warmed up to 1〇〇t in 2 hours: it will last for 5 hours. Next, add 6 weights (6) and cool to room temperature. The paint is colored; the compound is dissolved in NMP. ~ 界巴巴回5和聚(Comparative Example 5) In Comparative Example 4 Surface ===俾The thickness after solvent removal (2 = interface two flexible metal-clad laminate. Ming can, make the coated surface into a body Mosquitoes are heat treated at the time indicated by the internal temperature of 164 真 4 real work machine and inert oven under the following conditions: 2001x24^ (j艮j Kang solvent volatilization, decompression degree at 1 () ~ gallbladder & Flow rate; 20L/min): 260tx3hr text and figure ====,=,"The solvent of all materials _ will deteriorate, the peel strength is also ==lip == 装二29 201206696 There is one ingredient (polyamide only - brewed The imide resin (I)) or the laminate having no B layer could not achieve the object of the present invention. Synthesis Example 4 193 g (90 mol%) of a trimellitic anhydride (TMA) was added to the reaction vessel, Mitsubishi Gas Chemical (share) system, 3,3',4,4 bisbiphenyltetraphthalic acid dianhydride (BPDA) 29g (10mol%, manufactured by Mitsubishi Chemical Corporation), 1,5-naphthalene diisocyanate (NDI) 2].0g0:00% by mol, manufactured by Sumitomo Bayer Urethane Co" Ltd., diazabicycloundecene ig (manufactured by San-Apro Ltd.), and N-mercapto-2-pyrrolidone ( NMP) 1944gg Ling Chemical Co., Ltd., polymer concentration 15% by weight ), the temperature was raised to l〇〇°c in 2 hours, and the reaction was maintained in this state for 5 hours. Next, NMP 571 g (polymer tears 12% by weight) was added and cooled to room temperature. The resulting resin paint was yellowish brown and the polymer was dissolved in NMP. The resin component and logarithmic viscosity of the resin varnish of Synthesis Example 4 are shown in Table 3. Synthesis Example 5 In the reaction vessel, trimellitic anhydride (TMA) 144 g (manufactured by Mitsubishi Gas Chemical Co., Ltd.), 3,3', 4,4f-diphenyl ketone tetraphthalic acid dianhydride (BTDA) 64 g (Daicel) was added. Chemical Industries, Ltd.), 3,3',4,4'-biphenyltetraphthalic acid dianhydride (BPDA) 15g (manufactured by Mitsubishi Chemical Corporation), and o-anisidine diisocyanate (TODI) 264g (Japan) Cao Da (share) system), Sanshen ethyl 'January female 3g (manufactured by Nacalai Tesque, Inc.), and ]si-mercapto-2-° piroxime α (NMP) 23〇Og (Mitsubishi Chemical) (Production) (polymer concentration: 1 S weight%), the temperature was raised to 100 ° C in 2 hours, and the reaction was maintained for 5 hours. Next, 726 g of NMP (polymer weight 12% by weight) was added and cooled to room temperature. The resulting tree was a yellow-brown transparent paint and the polymer was dissolved in NMP. The resin component and logarithmic viscosity of the resin varnish of Synthesis Example 5 are shown in Table 3. The number average molecular weight of the resin varnish of Synthesis Example 5 was 24,000. Synthesis Example 6 Addition of trimellitic anhydride (TMA) 58 g (30 mol%, manufactured by Mitsubishi Gas Chemical Co., Ltd.), 3,3',4,4'-diphenyl ketone tetraphthalic acid dianhydride to a reaction vessel Moer%, Daicel Chemical IndUstrieS, Ltd.), 3,3,,4,4'-biphenyltetradecanoic acid anhydride (BPDA) 59g (2〇 mol%, manufactured by Mitsubishi Chemical Corporation) Pyromellitic anhydride 22 § (1〇201206696 mol%, manufactured by Daicel Chemical Industries, Ltd.), 1,5-naphthalene diisocyanate (NDI) 210g (100 mol%, Sumitomo Bayer Urethane Co) , manufactured by Ltd., diazabicycloundecene lg (manufactured by San-Apro Ltd.), and N-mercapto-2-pyrrolidone (NMP) 2210 g (Mitsubishi Chemical Co., Ltd. X polymer concentration) 15% by weight), the temperature was raised to 100 ° C in 2 hours, and the reaction was maintained for 5 hours. Next, 650 g of NMP (polymer concentration: 12% by weight) was added and cooled to room temperature. The obtained resin is yellow-brown and transparent, and the polymer is dissolved in ]^>. The resin composition and logarithmic viscosity of the resin varnish of Synthesis Example 6 are shown in Table 3. Synthesis Examples 7 to 9 A resin lacquer was produced in the same manner as in Synthesis Example 6, except that the resin component was changed to the contents shown in Table 3. The resin composition and logarithmic viscosity of the resin varnishes of Synthesis Examples 7 to 9 are not shown in Table 3. Synthesis Example 10 19 g (10 mol%, manufactured by Mitsubishi Gas Chemical Co., Ltd.) and 3,3',4,4'-diphenyl ketone tetraphthalic acid dianhydride were added to a reaction vessel. (BTDAUMgGo Moer % ' Daicel chemical Iiidustries, Ltd.), 3,3',4,4'-biphenyltetradecanoic acid dianhydride (BPDA) 59g (20mol%, manufactured by Mitsubishi Chemical Corporation) Pyromellitic anhydride (卩祖) 22 政1〇莫耳%, manufactured by Daicd Chemical Industries, Ltd.), terephthalic acid (TPA) ng (2 〇 mol% 'Mitsubishi Gas Chemical Co., Ltd.), U_naphthalene diisocyanate (NDI) 210 g (100 mol%, manufactured by Sumitomo Bayer Urethane Co., Ltd.), diazabicycloundecene lg (manufactured by San-Apr〇 Ltd.), and N-fluorenyl group- 2] Pyrrolidinone (NMP) 2085 g (manufactured by Ershi Chemical Co., Ltd., polymer concentration Μ% by weight), and the temperature was raised to 10 ° C in 2 hours, and the reaction was maintained for 5 hours. Next, N613 613 g (polymer concentration: 12% by weight) was added and cooled to room temperature. The resulting resin is yellow-brown and the polymer dissolves MNMP. Next, the resin varnish obtained in Synthesis Example 5 was blended at a ratio of 20% by weight based on the solid content of the polyamide-imine resin. The resin component of the resin varnish of Synthesis Example 1 is shown in Table 3 ? 201206696 [Table 3] Resin component (Mohr ratio) - Logarithmic viscosity synthesis Example 4 TMA/BPDA/NDI = 90/10/100 1.6 Synthesis Example 5 TMA/BTDA/BPDA/]ODI=80/12.5/7.5/100 1.3 Synthesis Example 6 TMA/BTDA/BPDA/PM: A/NDI=30/40/20/10/1.0〇1.4 Synthesis Example 7 TMA/BTDA /BPDA//TODI=70/10/20/100 1.5 Synthesis Example 8 TMA/NDI/MDI=100/90/.10 ------- 1.7 Synthesis Example 9 TMA/BTDA/BPDA/TODI=55/ 15/30/100 1.6 Synthesis Example 10 TMA/BTDA/BPDA/PMA/TPA/NDI=10/40/20/10/20/100 + Resin TMS of Synthesis Example 5: trimellitic anhydride BTDA: 3, 3VMT- Diphenyl ketone tetracarboxylic dianhydride BPDA : 3,3',4,4'-biphenyltetradecanoic acid dianhydride PMA. Pyromellitic acid field TODI: o-toluidine diisocyanate ΝΌΙ · 1,5-Cai II Isocyanate TPA: terephthalic acid (Comparative Example 6) VPU flat , column, compare the use of the knife on the 落 surface of the copper drop used by m ==, 俾 to make the thick layer after solvent removal) , · square, 10 = lower, 5 minutes, to obtain an initial dry flexible metal-clad laminate. The dry and flexible metal-clad laminate is turned over, and the 16-to-1 set is the outer side, and the vacuum dryer and the vacuum drying machine are used to reduce the variation: 20 〇t > 241 ir Initial dry flexible metal coating, QCT|^ 5 minutes, for the outside, and treated with true ^ '. New, her plum "Liang Gu ^ strip 32 201206696 Qian Can conditions. 2 according to solvent volatilization, decompression The team talked about the heating under nitrogen (flow rate; 2〇17 points): 26〇3 change) (Comparative examples 7~9) In addition to the thickness of the resin paint of the A and B layers, the heating time under nitrogen was changed to The final flexible metal-clad laminate was obtained as shown in Table 4, except for 10 hours. In the same manner as in Comparative Example 6, the flexible metal-clad obtained in Comparative Examples 6 to 9 was completely removed, and the mold formability and visibility were good, and the solvent in the ash was also excellent in mountability. However, in either of the above cases, A sound = other than Comparative Example 6, the duration of use is short, and her intensity (4) shows health. 〖W resin lacquer composition (polyamide-imine resin 1), or even though the A layer has only one resin (II) molecular weight (four), and * can achieve this hair -醯 imine [Table 41 clever. Polyamide-imine resin (I) Α layer ~ ^ amine - quinone imine resin 01) B layer thick diamond, (_) (A layer / B layer) Comparison of use period ό Comparative example 7 Comparative example 8 Comparison EXAMPLE 9 Synthesis Example Synthesis Example 6 Synthesis Example 8 Synthesis Example 11 Synthesis Example 10 Synthesis Example 5 Synthesis Example 7 Synthesis Example 9 Synthesis Example 1 25/10 1^25~10/25 10/25
X X X X 剝離強度 (N/cm) 4 4 4 在反應谷器中加入苯偏三酸酐(TM^)58g(3〇莫耳%,三菱瓦 斯化學(股)製)、3,3',4,4’-二苯基酮四曱酸二酐(BTDA)129g(4〇莫耳 % ’ DaicelchemicalIndustries,Ltd.製)、3,3’,4,4’-聯苯四曱酸二酐 (BPDA)59g(2〇莫耳%,三菱化學(股)製)、均苯四酸酐砂^)2為(1〇 莫耳%,Daicel chemical Indus1:ries,Ltd.製)、1,5 -萘二異氰酸酯 (NDI)208g(99 莫耳%,Sumitomo Bayer Urethane Co” Ltd.製)、二 氮雜雙環十一烯lg(Saii-AproLtd.製)、以及N-曱基-2-吡咯啶酮 (NMP)2210gg菱化學(股)製X聚合物濃度15重量%),於2小時内 升溫至100°C為止’並使其維持此狀態反應5小時。接著,加入 33 201206696 NMP650g(聚合物濃度〗2重量%),並冷卻至室溫為止。得到之樹 脂漆為黃褐色透明,且聚合物溶解於NMP。合成例11之樹脂漆, 的樹脂成分、對數黏度、以及數量平均分子量示於表5。 合成例12〜15 除了將樹脂成分改變為表5所示的内容以外,係與合成例η 相同而製成樹脂漆。分子量係根據酸成分、異氰酸酯成分的莫耳 比、反應時間等,適當地改變而調整。合成例12〜15之樹脂漆的 樹脂成分、對數黏度、數量平均分子量示於表5。 [表5] 樹脂成分漠耳比) 對數黏度 ③量平均分子量 合成例11 TMA/BTDA/BPDA/PMA/NDI=30/40/20/10/100 0.9 23000 合成例12 TMA/BTDA/BPDA/PMA/NDT=30/40/20/10/1〇〇 1.2 * 31000 合成例13 TMA/BTDA/BPDA/PMA/NDI=30/40/20/1〇/1〇〇 1.5 ‘ 37000 合成例14 TMA/BTDA/BPDA/TODI=80/12.5/7.5/100 1.8 40000 合成例15 TMA/BTDA/BPDA/PMA/NDI=30/40/2O/10/]00 1.6 40000 (比較例10) 在合成例11所得到之樹脂漆中,將合成例14所得到之樹鹿 漆’以相對於聚醯胺-醯亞胺樹脂的固體含量1〇〇重量分之重^ =的比率摻合(聚醯胺-醯亞胺樹脂(1)/聚醯胺-醯亞胺樹脂 j 1%) = 80/20)。在比較例4所採用的銅箔之M面上使用 ί ^脑黍,俾使去溶劑後的厚度(A層)成1^ + 燥5》鐘’制初期錢之撓性覆金屬#卿。 接著,並且採同樣的方法,塗布合成例14所得到之 ,使去溶劑後的厚度(B層)成25μιη,並於謂。c下乾燥 得到初期乾燥之撓性覆金屬疊層體。 ”刀鐘 接J,將該初期乾燥之撓性覆金屬疊層體固定於金屬 ^後燥機及惰性烤箱於以下所示之條件加熱處理。、缺後 取後侍到表6所示之撓性覆金屬疊層體。 〜後 減壓乾燥條件:2〇〇t:x24hr =艮^康;谷冑1丨之揮發,減壓度於1G〜間變動 氮氧下之加熱(流量;20L/分):260t:xl0hr 34 ⑧ 201206696 (實施例1〜3) 除了將A層的難較變絲6所示 例卿同而得到撓性覆金屬疊層體。聚醢胺_酿二=, 胺-1賴__之摻合比雜蝴與細⑽=盛 々比較^、實施例Η所得到的撓性覆金屬叠層體之塗 的=劑已凡全除去,且圖案成雜、可見性、安裝性均佳。^是, 比較例10的Α層所使用的樹脂漆之使用期限短 度亦顯示獵1 順随。根據前述,可知a層; 胺-嶋樹輸设子量低時,Α層所形成的輯.二= (1^3粒從會變小,而結果為剝離強度或使用期限減少。再者, 聚酿胺·醯亞胺繼(I)的分子量高較為理想,*25_ 成本發明之目的。 1 [表6] 1 Ί Α層 B層 聚醯胺-醯 亞胺樹脂 ⑽之最大 粒徑 ----------j 使用期限 --------- 剝離強度 (N/cm) 聚醯胺-醯亞 胺樹脂(I) 聚醯胺-醯亞 胺樹脂(II) 比較例10 合成例11 合成例14 合成例14 0.3 X —— 5 實施例1 合成例12 合成例14 合成例14 2.0 〇 10 實施例2 合成例13 ----· 合成例14 合成例14 3.0 〇 10 實施例3 合成例15 合成例14 合成例14 3.1 〇 10 厚度:A 層/:8層=1〇/250111 合成例16〜20 除了將樹脂成分改變為表7所示的内容以外,係與合成例11 相同而製成樹脂漆。分子量係根據酸成分、異氰酸酯成分的莫耳 比、反應時間等,適當地改變而調整。合成例16〜20之樹脂漆的 樹脂成分、對數黏度、數量平均分子量示於表7。 [表7] .··. … s: 翻旨成分(莫耳比) 對數黏度 數量平均分 合成例16 TMA/BTDA/BPDA/PMA/NDI=30/40/20/10/100 -------- 1.3 31000 合成例17 TMA/BTDA/BPDA/TODI=80/12.5/7.5/100 — 1.6 34000 ~~ 合成例18~1 TMA/BTDA/BPDA/TODI=80/12.5/7.5/100 ------- 1.9 39000 〜~~ 合成例19 TMA/BTDA/BPDA/TODI=80/12.5/7.5/100 2.6 45000 35 201206696 合成例20 50000 (比較例11、實施例4〜7) 除了將A層樹脂漆的厚度改 比較例1G相同而得到撓性覆金屬叠層體/ _谷以外係與 比較例η、實施例4〜7所得到的換 ί U^/A層所使用的樹脂漆之使用期限短,®層體之剝離強 ^亦顯不之_低值。_前述,可知A層所使用之聚酿 胺-驢亞胺M,(I)的分子量低時,A層所形成的聚醯胺-酿亞胺樹脂 (Π)成分的粒控會變小,而結果為剝離強度或使用期限減少。再者, 聚醯胺-醯亞胺樹脂(II)的分子量高較為理想,而25〇〇〇以上即可達 成本發明之目的。 [表8] Α府 B層 聚醯胺-醯 亞胺樹脂 (II)之最大 粒徑 使用期限 剝離強度 (N/cm) 聚醯胺-醯亞 胺樹脂(I) 聚醯胺-醯亞 胺樹脂(Π) 比較例11 合成例16 合成例5 合成例14 0.35 X 5 «施例4 合成例16 合成例17 合成例14 1.5 〇 9 15施例5 合成例16 合成例18 合成例14 3.0 〇 10 實施例6 合成例16 合成例19 合成例14 3.8 〇 12 實施例7 合成例16 合成例20 合成例14 3.7 〇 11 厚度:A層/B層=〗〇/25μΓη 合成例21、22 除了將樹脂成分改變為表9所示的内容以外’係與合成例]1. 相同而製成樹脂漆。分子量係根據酸成分、異氰酸酯成分的莫耳 比、反應時間等,適當地改變而調整。合成例21、22之樹脂漆的 樹脂成分、對數黏度、數量平均分子量示於表9。 [表9] 樹脂成分(莫耳比) 對數黏度 數量年均肝量 合成例21 TMA/BTDA/BPDA/PMA/NDI=30/40/20/10/100 1.2 31000 合成例22 TMA/BTDA/BPDA/TODI=80/12.5/7.5/100 1.9 39000XXXX Peel strength (N/cm) 4 4 4 Add benzene trimellitic anhydride (TM^) 58g (3 〇 mol%, manufactured by Mitsubishi Gas Chemical Co., Ltd.), 3, 3', 4, 4 to the reaction bar. '-Diphenyl ketone tetraphthalic acid dianhydride (BTDA) 129 g (4 〇 mol % 'made by Daicel Chemical Industries, Ltd.), 3,3', 4,4'-biphenyltetraphthalic acid dianhydride (BPDA) 59 g (2% Moer%, manufactured by Mitsubishi Chemical Co., Ltd.), pyromellitic anhydride sand ^) 2 (1 〇 mol%, manufactured by Daicel Chemical Indus 1: ries, Ltd.), 1,5-naphthalene diisocyanate ( NDI) 208 g (99 mol%, manufactured by Sumitomo Bayer Urethane Co. Ltd.), diazabicycloundecene lg (manufactured by Saii-Apro Ltd.), and N-mercapto-2-pyrrolidone (NMP) 2210 gg The concentration of the X polymer in the chemical system was 15% by weight, and the temperature was raised to 100 ° C in 2 hours, and the reaction was maintained for 5 hours. Then, 33 201206696 NMP 650g (polymer concentration) 2% by weight was added. The resin paint was yellow-brown and transparent, and the polymer was dissolved in NMP. The resin composition, logarithmic viscosity, and number average molecular weight of the resin paint of Synthesis Example 11 are shown in Table 5. Synthesis Example 12~ 15 A resin lacquer was produced in the same manner as in the synthesis example η except that the resin component was changed to the content shown in Table 5. The molecular weight was appropriately adjusted according to the acid component, the molar ratio of the isocyanate component, the reaction time, and the like. The resin component, logarithmic viscosity, and number average molecular weight of the resin varnishes of Synthesis Examples 12 to 15 are shown in Table 5. [Table 5] Resin Component Mohr Ratio) Logarithmic Viscosity 3 Amount Average Molecular Weight Synthesis Example 11 TMA/BTDA/BPDA/PMA/ NDI=30/40/20/10/100 0.9 23000 Synthesis Example 12 TMA/BTDA/BPDA/PMA/NDT=30/40/20/10/1〇〇1.2 * 31000 Synthesis Example 13 TMA/BTDA/BPDA/PMA /NDI=30/40/20/1〇/1〇〇1.5 ' 37000 Synthesis Example 14 TMA/BTDA/BPDA/TODI=80/12.5/7.5/100 1.8 40000 Synthesis Example 15 TMA/BTDA/BPDA/PMA/NDI =30/40/2O/10/]00 1.6 40000 (Comparative Example 10) In the resin varnish obtained in Synthesis Example 11, the stag varnish obtained in Synthesis Example 14 was used in relation to polyamine-imine. The solid content of the resin is 1 〇〇 by weight and the ratio of ^ = is blended (polyamine-quinone imine resin (1) / polyamine-imine resin j 1%) = 80/20). In the M surface of the copper foil used in Comparative Example 4, ί^ cerebral palsy was used, and the thickness (layer A) after solvent removal was made into 1^ + dry 5" clock. Next, in the same manner as in the same manner, the thickness of the solvent-removed layer (B layer) was 25 μm, and it was obtained by the same method. Drying under c gives an initially dried flexible metal-clad laminate. "The knife and the bell are connected to J, and the initially dried flexible metal-clad laminate is fixed to a metal post-drying machine and an inert oven under the conditions shown below. After the lack, the service is shown in Table 6. The metal-clad laminate. After the decompression drying conditions: 2〇〇t: x24hr = 艮 ^ Kang; the volatility of the gluten 胄 1丨, the degree of decompression in 1G ~ between the variable nitrogen oxygen heating (flow; 20L / Sub)): 260t: xl0hr 34 8 201206696 (Examples 1 to 3) A flexible metal-clad laminate was obtained in addition to the case where the layer A was difficult to be compared with the example of the yarn 6. Polyamide amide 2, amine- 1 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The mounting property was good. ^Yes, the short-term use period of the resin lacquer used in the enamel layer of Comparative Example 10 also showed that Hunting 1 followed. According to the above, it is known that layer a; when the amount of amine-eucalyptus is low, Α The layer formed by the layer. II = (1 ^ 3 grains will become smaller, and the result is the peel strength or the use period is reduced. Moreover, the molecular weight of the polyamine (I) followed by (I) is ideal, *25_The purpose of the invention is 1 [Table 6] 1 Ί Α layer B layer polyamine-imine resin (10) maximum particle size ----------- j life-------- - Peel strength (N/cm) Polyamine-imine resin (I) Polyamine-imine resin (II) Comparative Example 10 Synthesis Example 11 Synthesis Example 14 Synthesis Example 14 0.3 X - 5 Example 1 Synthesis Example 12 Synthesis Example 14 Synthesis Example 14 2.0 〇10 Example 2 Synthesis Example 13 ----· Synthesis Example 14 Synthesis Example 14 3.0 〇10 Example 3 Synthesis Example 15 Synthesis Example 14 Synthesis Example 14 3.1 〇10 Thickness: A Layer /: 8 layers = 1 〇 / 250111 Synthesis Examples 16 to 20 A resin lacquer was produced in the same manner as in Synthesis Example 11 except that the resin component was changed to the content shown in Table 7. The molecular weight was based on the acid component and the isocyanate component. The molar ratio, reaction time, and the like were appropriately adjusted and adjusted. The resin component, logarithmic viscosity, and number average molecular weight of the resin varnish of Synthesis Examples 16 to 20 are shown in Table 7. [Table 7] . . . . Composition (Morby) Logarithmic viscosity number average synthesis Example 16 TMA/BTDA/BPDA/PMA/NDI=30/40/20/10/100 -------- 1.3 31000 Synthesis Example 17 TMA/BTDA/ BPDA/ TODI=80/12.5/7.5/100 — 1.6 34000 ~~ Synthesis Example 18~1 TMA/BTDA/BPDA/TODI=80/12.5/7.5/100 ------- 1.9 39000 ~~~ Synthesis Example 19 TMA /BTDA/BPDA/TODI=80/12.5/7.5/100 2.6 45000 35 201206696 Synthesis Example 20 50000 (Comparative Example 11, Example 4 to 7) The flexibility was obtained by changing the thickness of the A-layer resin varnish to the same as in Comparative Example 1G. The resin-coated lacquer used in the metal-clad laminate/ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ low value. _In the above, it can be seen that when the molecular weight of the polyamine-imine M used in the layer A is low, the particle size of the polyamine-containing imine resin (Π) component formed in the layer A becomes small. The result is a reduction in peel strength or life. Further, the polyamine-quinone imine resin (II) has a high molecular weight, and more than 25 Å can achieve the object of the invention. [Table 8] Maximum particle size of the B-layer polyamine-imine resin (II) of the Fufu period. Peel strength (N/cm) Polyamine-imine resin (I) Polyamide-imine Resin (Π) Comparative Example 11 Synthesis Example 16 Synthesis Example 5 Synthesis Example 14 0.35 X 5 «Example 4 Synthesis Example 16 Synthesis Example 17 Synthesis Example 14 1.5 〇 9 15 Example 5 Synthesis Example 16 Synthesis Example 18 Synthesis Example 14 3.0 〇 10 Example 6 Synthesis Example 16 Synthesis Example 19 Synthesis Example 14 3.8 〇12 Example 7 Synthesis Example 16 Synthesis Example 20 Synthesis Example 14 3.7 〇11 Thickness: A layer/B layer = 〇 25 / 25 μ Γ Synthesis Example 21, 22 In addition to The resin composition was changed to the content shown in Table 9 and the resin composition was prepared in the same manner as in the synthesis example 1. The molecular weight is adjusted as appropriate depending on the acid component, the molar ratio of the isocyanate component, the reaction time, and the like. The resin component, logarithmic viscosity, and number average molecular weight of the resin varnishes of Synthesis Examples 21 and 22 are shown in Table 9. [Table 9] Resin component (Mohr ratio) Logarithmic viscosity number Annual average liver mass synthesis Example 21 TMA/BTDA/BPDA/PMA/NDI=30/40/20/10/100 1.2 31000 Synthesis Example 22 TMA/BTDA/BPDA /TODI=80/12.5/7.5/100 1.9 39000
(D 201206696 ,(比較例12、13、實施例8、% 比較例12、13、實施例8、9所得到 已完全除去,且圖案成形性、可見性4二體之塗 3 層所使用的樹脂漆之使用期限短,疊^1 = 5N/cm 〇 X 5 12 根據刖述’可知A層所使用之聚酿胺醯 航乜。 使用期限、安裝性會下降。 …雕強度或 [表 10] A層 聚醯胺-醯亞 胺樹脂(1) 聚醯胺-醯亞 胺樹脂(Π) 聚醯胺-醯亞胺· 棚旨(I)/聚醯胺 -醯亞胺樹脂(II) 固體含量重量比 B層 使用期限 剝離強度 (N/cm) 比較例12 比較例13 實施例8 實施例9 合成例21 合成例21 合成例21 合成例21 合成例22 合成例22 合成例22 合成例22 60/40 97/3 80/20 85/15 合成例22 合成例22 合成例22 合成例22(D 201206696, (Comparative Examples 12, 13, 8, 8, % Comparative Examples 12, 13, and Examples 8 and 9 were completely removed, and the pattern forming property and the visibility of the four-body coating were used for the three layers. Resin paint has a short service life, stacking ^1 = 5N/cm 〇X 5 12 According to the description, it can be seen that the A-layer used in the A layer is used. The service life and mountability will decrease. ...The strength of the carving or [Table 10 A layer of polyamine-imine resin (1) Polyamido- quinone imine resin (Π) Polyamide - quinone imine · shed (I) / polyamine - quinone imine resin (II) Solid content weight ratio B layer lifespan Peel strength (N/cm) Comparative Example 12 Comparative Example 13 Example 8 Example 9 Synthesis Example 21 Synthesis Example 21 Synthesis Example 21 Synthesis Example 21 Synthesis Example 22 Synthesis Example 22 Synthesis Example 22 Synthesis Example 22 60/40 97/3 80/20 85/15 Synthesis Example 22 Synthesis Example 22 Synthesis Example 22 Synthesis Example 22
X X 〇 尽工 ‘ A 層/B 層=].〇/25μτη [產業上利用性] &本發明之撓性覆金屬疊層體,可使用於需要細微間距化的高 路板用途’特別是有助於廉價地製造可使用於C〇F薄膜承 載膠帶用途的撓性印刷基板,而於工業上有巨大的價值。 【圖式簡單說明】 [圖1]本發明之撓性覆金屬疊層體的剖面構成之概略圖。 ^'號說明 【主要元件符 37 201206696 1.....銅羯 2.. ...聚醯胺-醯亞胺樹脂薄膜(A層) 3.. ...聚醯胺-醯亞胺樹脂薄膜(B層) 201206696 發明專利說明# (本說明書格式、順序,請勿任意更動,※記號部分請勿 ※申請案號·· 1^0〖、' ※申請曰:(价t沦 ※工p C分類:b Ρ (2〇〇6·扎 (2006.01, 一、發明名_爯:(中文/英文) >7/1XX 〇 ' ' ' A layer / B layer =]. 〇 / 25μτη [Industrial use] & The flexible metal-clad laminate of the present invention can be used for high-speed board applications requiring fine pitching' It contributes to inexpensive manufacture of a flexible printed circuit board which can be used for a C〇F film-carrying tape, and is of great industrial value. BRIEF DESCRIPTION OF THE DRAWINGS [Fig. 1] A schematic view showing a cross-sectional structure of a flexible metal-clad laminate of the present invention. ^'No. Description [Main component code 37 201206696 1.....copper 羯2.. Polyamide- quinone imine resin film (layer A) 3.. Polyamide-quinone imine Resin film (B layer) 201206696 Patent description # (This manual's format and order, please do not change it arbitrarily. ※Please note the number of the mark ※Application number·· 1^0 〖, ' ※Application 曰: (price t沦※工p C classification: b Ρ (2〇〇6·Zha (2006.01, I. Invention name _爯: (Chinese / English) >7/1
*性覆金屬疊層體*Sexual metal-clad laminate
FLEXIBLE METAL-CLAD LAMINATE 二、中文發明摘要: 本發明係廉價地提供一種安裝性、可見性、圖案成 C)離強度均佳的撓性覆金屬疊層體。 〉 本發明係為在銅箔上直接或透過黏合劑層疊層聚醯胺_醯亞胺 樹脂薄膜(A層),並在其上方疊層聚醯胺_醯亞胺樹脂薄膜出層) 的疊層體,其中A層包含:聚醯胺-醯亞胺樹脂q,包含具有^骨 架的胺成分;以及聚醯胺-醯亞胺樹脂(II),包含具有聯鄰/曱苯&骨 架的胺成分,且(I)/ (II)的重量比為95〜70/5〜30 ; (I)以及/或 (Π)的數量平均分子量為25000〜100000,而B層包含:聚驗胺_酉藍 亞胺樹脂’包含具有聯鄰曱苯胺骨架的胺成分;且面向銅箱A層 侧的表面粗糙度為3μπι以下,而光澤度為300以上,4〇〇nm〜800nm t'、 之波長的光之反射率為20%以上。 三、英文發明摘要:FLEXIBLE METAL-CLAD LAMINATE II. Abstract of the Invention: The present invention provides a flexible metal-clad laminate which is excellent in mountability, visibility, and pattern C). 〉 The present invention is a laminate of a polyimide/imine resin film (layer A) laminated on a copper foil directly or through a binder, and a laminate of a polyamidamine film on top of it. a layer body, wherein the layer A comprises: a polyamidamine-quinone imine resin q comprising an amine component having a skeleton; and a polyamine-quinone imine resin (II) comprising a linked/anthracene & The amine component, and the weight ratio of (I) / (II) is 95 to 70/5 to 30; (I) and / or (Π) has a number average molecular weight of 25000 to 100000, and the layer B contains: a polyamine The indigo imine resin 'containing an amine component having a benzidine skeleton; and having a surface roughness of 3 μm or less on the side of the copper layer A layer and a wavelength of 300 or more and 4 to nm nm to 800 nm t' The reflectance of light is 20% or more. Third, the English invention summary:
This invention provides a flexible metal-clad laminate at a low cost that is excellent in feasibility of installation, visibility, patterning ability and peeling strength. In this laminate, a polyamide imide resin film(Layer A) is laminated on a copper foil directly or through the medium of an adhesive layer, and thereon another polyamide imide resin film (Layer B) is further laminated. Layer A includes a polyamide imide resin (I ) containing an amine component having a naphthalene bone and a polyamide imide resin (Π) containing anThis invention provides a flexible metal-clad laminate at a low cost that is excellent in feasibility of installation, visibility, patterning ability and peeling strength. In this laminate, a polyamide imide resin film(Layer A) is laminated on a copper foil directly or Layer A includes a polyamide imide resin (I ) containing an amine component having a naphthalene bone and a polyamide imide resin (Π) containing an alkali component containing a naphthalene bone and a polyamide imide resin An
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US9371233B2 (en) | 2013-12-17 | 2016-06-21 | Industrial Technology Research Institute | Polyamide-imides, graphite films and preparation for the graphite film |
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TW201411112A (en) * | 2012-05-21 | 2014-03-16 | Jx Nippon Mining & Metals Corp | Device for evaluating visibility of transparent substrate, device for positioning laminate, determination device, position detection device, device for evaluating surface state of metal foil, program, recording medium |
JP6240376B2 (en) * | 2012-07-13 | 2017-11-29 | タツタ電線株式会社 | Shield film and shield printed wiring board |
KR101995916B1 (en) * | 2012-07-19 | 2019-07-03 | 삼성전자주식회사 | Polyimide precursor composition, article prepared by using same, and display device including the article |
JP2014150133A (en) * | 2013-01-31 | 2014-08-21 | Panasonic Corp | Metal foil with resin, printed wiring board, and method for manufacturing printed wiring board |
JP6589887B2 (en) * | 2015-01-09 | 2019-10-16 | 東洋紡株式会社 | Polymer blend composition, flexible metal laminate and flexible printed circuit board |
JP2016131926A (en) * | 2015-01-19 | 2016-07-25 | 住友ベークライト株式会社 | Coating device, coating method, metal foil-clad substrate, circuit board, electronic component mounting substrate, and electronic apparatus |
JP6177299B2 (en) * | 2015-11-04 | 2017-08-09 | Jx金属株式会社 | Metal mask material and metal mask |
JP6177298B2 (en) * | 2015-11-04 | 2017-08-09 | Jx金属株式会社 | Metal mask material and metal mask |
WO2018225825A1 (en) * | 2017-06-08 | 2018-12-13 | 日産化学株式会社 | Method for producing substrate for flexible device |
TW202415541A (en) * | 2022-09-30 | 2024-04-16 | 日商日鐵化學材料股份有限公司 | Metal-clad laminated plate |
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JP4640409B2 (en) * | 2003-09-01 | 2011-03-02 | 東洋紡績株式会社 | Metal-clad laminate |
JP2005117058A (en) * | 2004-11-22 | 2005-04-28 | Sony Chem Corp | Metal-clad laminated board and its manufacturing method and flexible printed wiring board and its manufacturing method |
KR20080063159A (en) * | 2006-12-28 | 2008-07-03 | 미쓰이 긴조꾸 고교 가부시키가이샤 | Flexible Printed Wiring Boards and Semiconductor Devices |
WO2009063742A1 (en) * | 2007-11-12 | 2009-05-22 | Toyo Boseki Kabushiki Kaisha | Metal laminate |
JP5176886B2 (en) * | 2007-11-12 | 2013-04-03 | 東洋紡株式会社 | Flexible metal laminate and flexible printed circuit board |
JP5152028B2 (en) * | 2008-02-15 | 2013-02-27 | 東洋紡株式会社 | Polymer blend composition, film, and metal laminate |
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2011
- 2011-05-11 JP JP2011537090A patent/JP4883432B2/en not_active Expired - Fee Related
- 2011-05-11 WO PCT/JP2011/060860 patent/WO2011152178A1/en active Application Filing
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US9371233B2 (en) | 2013-12-17 | 2016-06-21 | Industrial Technology Research Institute | Polyamide-imides, graphite films and preparation for the graphite film |
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JP2012011388A (en) | 2012-01-19 |
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