TW200819501A - Polyimide-based resin composition, method of manufacturing thereof and metal laminate - Google Patents
Polyimide-based resin composition, method of manufacturing thereof and metal laminate Download PDFInfo
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- TW200819501A TW200819501A TW96133674A TW96133674A TW200819501A TW 200819501 A TW200819501 A TW 200819501A TW 96133674 A TW96133674 A TW 96133674A TW 96133674 A TW96133674 A TW 96133674A TW 200819501 A TW200819501 A TW 200819501A
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- resin
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- 239000011342 resin composition Substances 0.000 title claims abstract description 53
- 229920001721 polyimide Polymers 0.000 title claims abstract description 27
- 239000004642 Polyimide Substances 0.000 title claims abstract description 15
- 229910052751 metal Inorganic materials 0.000 title claims description 70
- 239000002184 metal Substances 0.000 title claims description 70
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 150000003949 imides Chemical class 0.000 claims abstract description 10
- 229920005989 resin Polymers 0.000 claims description 57
- 239000011347 resin Substances 0.000 claims description 57
- 150000004060 quinone imines Chemical class 0.000 claims description 48
- 239000000203 mixture Substances 0.000 claims description 46
- 150000002466 imines Chemical class 0.000 claims description 37
- 239000002253 acid Substances 0.000 claims description 31
- 239000002904 solvent Substances 0.000 claims description 24
- 150000001412 amines Chemical class 0.000 claims description 12
- 239000000126 substance Substances 0.000 claims description 9
- 230000009477 glass transition Effects 0.000 claims description 8
- 229920000642 polymer Polymers 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 20
- 238000012545 processing Methods 0.000 abstract description 5
- 230000008569 process Effects 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 83
- -1 gold imine Chemical class 0.000 description 68
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 65
- 230000015572 biosynthetic process Effects 0.000 description 59
- 238000003786 synthesis reaction Methods 0.000 description 56
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 37
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 36
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 29
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 26
- 239000002994 raw material Substances 0.000 description 25
- 239000000243 solution Substances 0.000 description 24
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 19
- 229920005575 poly(amic acid) Polymers 0.000 description 19
- 150000004985 diamines Chemical class 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 17
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 15
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 14
- 238000000576 coating method Methods 0.000 description 14
- 238000011156 evaluation Methods 0.000 description 14
- 238000010438 heat treatment Methods 0.000 description 13
- 239000002966 varnish Substances 0.000 description 13
- 229910052757 nitrogen Inorganic materials 0.000 description 12
- 239000012298 atmosphere Substances 0.000 description 11
- 239000003054 catalyst Substances 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 239000000178 monomer Substances 0.000 description 11
- 229910052707 ruthenium Inorganic materials 0.000 description 11
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 10
- 239000010931 gold Substances 0.000 description 10
- 239000002243 precursor Substances 0.000 description 10
- 239000000758 substrate Substances 0.000 description 10
- 150000008064 anhydrides Chemical class 0.000 description 9
- 239000000047 product Substances 0.000 description 9
- 229910000679 solder Inorganic materials 0.000 description 9
- 229910052727 yttrium Inorganic materials 0.000 description 9
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 8
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 8
- 229910052797 bismuth Inorganic materials 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 8
- 239000007789 gas Substances 0.000 description 8
- 229910052737 gold Inorganic materials 0.000 description 8
- 239000000853 adhesive Substances 0.000 description 7
- 230000001070 adhesive effect Effects 0.000 description 7
- 229910052786 argon Inorganic materials 0.000 description 7
- 239000011888 foil Substances 0.000 description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 7
- 239000009719 polyimide resin Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- 229920000768 polyamine Polymers 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 239000003570 air Substances 0.000 description 5
- QARVLSVVCXYDNA-UHFFFAOYSA-N bromobenzene Chemical compound BrC1=CC=CC=C1 QARVLSVVCXYDNA-UHFFFAOYSA-N 0.000 description 5
- 229910001873 dinitrogen Inorganic materials 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000002356 single layer Substances 0.000 description 5
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 229910000881 Cu alloy Inorganic materials 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- 238000005481 NMR spectroscopy Methods 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 4
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 4
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 229910021529 ammonia Inorganic materials 0.000 description 4
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 4
- 238000010030 laminating Methods 0.000 description 4
- 150000002632 lipids Chemical class 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 150000002923 oximes Chemical class 0.000 description 4
- 239000001294 propane Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical group NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 150000004984 aromatic diamines Chemical class 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- 239000004305 biphenyl Substances 0.000 description 3
- 235000010290 biphenyl Nutrition 0.000 description 3
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 3
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 3
- 125000006159 dianhydride group Chemical group 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 239000003623 enhancer Substances 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 108010026466 polyproline Proteins 0.000 description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- 239000005060 rubber Substances 0.000 description 3
- 229920005992 thermoplastic resin Polymers 0.000 description 3
- NSGXIBWMJZWTPY-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropane Chemical compound FC(F)(F)CC(F)(F)F NSGXIBWMJZWTPY-UHFFFAOYSA-N 0.000 description 2
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 2
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 2
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 2
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 2
- NKTOLZVEWDHZMU-UHFFFAOYSA-N 2,5-xylenol Chemical compound CC1=CC=C(C)C(O)=C1 NKTOLZVEWDHZMU-UHFFFAOYSA-N 0.000 description 2
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 2
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 2
- DVXYMCJCMDTSQA-UHFFFAOYSA-N 3-[2-(3-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=CC(N)=CC=1C(C)(C)C1=CC=CC(N)=C1 DVXYMCJCMDTSQA-UHFFFAOYSA-N 0.000 description 2
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 2
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 2
- ZYEDGEXYGKWJPB-UHFFFAOYSA-N 4-[2-(4-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=C(N)C=CC=1C(C)(C)C1=CC=C(N)C=C1 ZYEDGEXYGKWJPB-UHFFFAOYSA-N 0.000 description 2
- JYZPDAUOQGFBKT-UHFFFAOYSA-N 4-[2-[2-[2-(3,4-dicarboxyphenoxy)phenyl]propan-2-yl]phenoxy]phthalic acid Chemical compound C=1C=CC=C(OC=2C=C(C(C(O)=O)=CC=2)C(O)=O)C=1C(C)(C)C1=CC=CC=C1OC1=CC=C(C(O)=O)C(C(O)=O)=C1 JYZPDAUOQGFBKT-UHFFFAOYSA-N 0.000 description 2
- FKNQCJSGGFJEIZ-UHFFFAOYSA-N 4-methylpyridine Chemical compound CC1=CC=NC=C1 FKNQCJSGGFJEIZ-UHFFFAOYSA-N 0.000 description 2
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 2
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 description 2
- ZHBXLZQQVCDGPA-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)sulfonyl]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(S(=O)(=O)C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 ZHBXLZQQVCDGPA-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
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- UEXCJVNBTNXOEH-UHFFFAOYSA-N Ethynylbenzene Chemical compound C#CC1=CC=CC=C1 UEXCJVNBTNXOEH-UHFFFAOYSA-N 0.000 description 2
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- 229910052787 antimony Inorganic materials 0.000 description 2
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- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
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- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- UZILCZKGXMQEQR-UHFFFAOYSA-N decyl-Benzene Chemical compound CCCCCCCCCCC1=CC=CC=C1 UZILCZKGXMQEQR-UHFFFAOYSA-N 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
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- 210000003298 dental enamel Anatomy 0.000 description 2
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- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 2
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- 229910052734 helium Inorganic materials 0.000 description 2
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- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000010985 leather Substances 0.000 description 2
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- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 1
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- 229920002098 polyfluorene Polymers 0.000 description 1
- 239000004633 polyglycolic acid Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920006389 polyphenyl polymer Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
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- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- QPILZZVXGUNELN-UHFFFAOYSA-N sodium;4-amino-5-hydroxynaphthalene-2,7-disulfonic acid Chemical compound [Na+].OS(=O)(=O)C1=CC(O)=C2C(N)=CC(S(O)(=O)=O)=CC2=C1 QPILZZVXGUNELN-UHFFFAOYSA-N 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
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- 230000008022 sublimation Effects 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 description 1
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- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
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- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/02—Polyamines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/02—Polyamines
- C08G73/026—Wholly aromatic polyamines
- C08G73/0266—Polyanilines or derivatives thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/303—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups H01B3/38 or H01B3/302
- H01B3/306—Polyimides or polyesterimides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
- C08K5/3415—Five-membered rings
- C08K5/3417—Five-membered rings condensed with carbocyclic rings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
200819501 256Ui)plt 九、發明說明: 本申請案主張依據2006年9月u曰申請之申請案號 JP2006-244946 (日本特願2〇〇6·244946)之優先權。其 利說明書及圖式所記载之内容全部援帛於本案。 【發明所屬之技術領域】200819501 256Ui)plt IX. Description of the invention: This application claims priority based on the application No. JP2006-244946 (Japanese Patent No. 2 〇〇 6 244 946) filed in September 2006. The contents described in the manual and the drawings are all in support of this case. [Technical field to which the invention pertains]
本發明係關於聚酸亞胺系樹脂組成物及其製造方法、 以及包含由該樹脂組成物構成之樹脂層的金 【先前技術】 特性'電氣 j料使用於航空器之結構材料及纜線包覆 體封壯箄所好"、常適用作為使用於挽性印刷基板及半導 、衣荨所代表之電子領域之耐熱性接著劑。 屬浐:ί而:ϊΐ利用聚酿亞胺系接著劑作為樹脂層之金 亞胺金屬積層體;㈡焊料在此聚酸 件之曰衣曰曰片及電子零件,或卸下所謂備用愛 片冬件之情形。從近年來之環保觀點,在晶 裝上已逐漸使用無錯焊料,故殷切要: 〜末,異'「焊料耐熱性⑽derheat㈣st_)」。求 ,在所謂硬撓性及撓性多層基板之 稱在以往㈣求之料賴 性有^ 具備更高溫之耐·。 ,、了祕不足,希望 薄膜使曰用片亞胺系接著劑為樹脂層之金細 ,膜曰曰片接合體(以下簡稱「C 下马 配線之接合係使用内部導線接合機及覆月晶接 5 200819501The present invention relates to a polyamic acid imide resin composition, a method for producing the same, and a gold comprising a resin layer composed of the resin composition. [Prior Art] Characteristics 'Electrical materials used in aircraft structural materials and cable coating It is well-suited as a heat-resistant adhesive for use in the electronic field represented by the printed circuit board and semi-conductive and clothing.浐: 而 and: ϊΐ using a poly-imine-based adhesive as a resin layer of gold imine metal laminate; (2) solder in this polyacid piece of enamel and electronic parts, or remove the so-called spare love tablets The case of winter pieces. From the environmental point of view in recent years, the use of error-free solder has been gradually used in the crystal, so it is necessary to: ~ end, different '" solder heat resistance (10) derheat (four) st_)". In the so-called hard-flexible and flexible multilayer substrate, it has been known in the past (4) that it has a higher temperature resistance. Insufficient, it is desirable that the film is made of a bismuth-based imide-based adhesive as a fine layer of a resin layer, and a film-joined bonded body (hereinafter referred to as "C-mounting wire bonding" using an internal wire bonding machine and a moon bonding 5 200819501
ZDOUDpiIZDOUDpiI
Au-Au接合或Au_Sn接合進行。Au_Au接合或Au__ 要300 C以上之南溫條件,故即使在使用於c〇f之情形 希望使用焊料耐熱性優異之基材。 吧 工, 士 在近年采之聚酿亞胺系耐熱性接著劑中,從加Au-Au bonding or Au_Sn bonding is performed. Since Au_Au bonding or Au__ requires a south temperature condition of 300 C or more, it is desirable to use a substrate excellent in solder heat resistance even when used in c〇f.吧,工,士 In the recent years, the polyamine-based heat-resistant adhesive, from the plus
>'W 4寸!生方面δ之,除了耐熱特性以外,也逐漸要求 之ίίΓ:右在以往利用含特定聚_酸之樹脂組成物 :ϊ=而=。以上之接著溫度之情形,從低溫 窥2而a ’其特性尚未充分。 詞二ί著胺系接著難要求需兼顧耐熱性之提高 V:二“。作為具有充分之接著強度與耐埶性 胺㈣熱性接著劑,已·出由特定聚_酸企 亞胺所構成之樹脂組成物(例如參照專利文獻】 屬浐,由利用聚醯亞胺系接著劑作為樹脂層之金 造電r情形’有利用雷射加工施行通孔形 鹼性溶'夜二ΐ在通孔形成令’-般,需施行以 ww橋料被雷射加^全除去 邊」)之處理(又稱「去膠渣處理」)。從月層(又稱知 膠逢以迅麵除去(去_速度· ,郝^之, ,鹼性溶液之溶解性較高之聚醒亞胺系:著:期:能使 J尚低溫接著性後之聚醯亞胺系接著‘二二而二 易變慢。 渣速度部容 劑,ί報::二充f之低溫接著性之聚醯亞胺系接著 據報告有由雙馬來酿亞胺化合物與聚酿胺酸所構成之 200819501> 'W 4 inch! The raw aspect δ, in addition to the heat resistance characteristics, is also gradually required ίίΓ: Right in the past using a resin composition containing a specific poly-acid: ϊ = and =. In the case of the above temperature, the characteristics are not observed from the low temperature and the characteristics are not sufficient. The word ί 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺 胺The resin composition (for example, refer to the patent literature) belongs to the case where the use of a polyimide-based adhesive as a resin layer for the production of gold, and the use of laser processing to perform through-hole-type alkaline dissolution in the through-hole The formation of the treatment of "when the ww bridge material is removed by the laser plus the entire side" (also known as "de-slag treatment"). From the moon layer (also known as the glue to remove the surface of the fast surface (to _ speed ·, Hao ^,, the solubility of the alkaline solution is higher in the relaxation of the imine system: the: period: can make J still low temperature adhesion After the polyimine is followed by 'two two and two easy to slow. The slag speed part of the agent, ί:: two charge f low temperature adhesive polyimine series followed by reports from the double Malay Amine compound and poly-branched acid formed by 200819501
ZDOU^piI 樹脂組成物(爹照專利文獻5)。然而,將含雙馬來醯亞胺 之樹脂組成物使用於金屬積層體之樹脂層之情形,會因, 造條件而產生揮發物質(雙馬來醯亞胺)而有時會有生產 . 上之問題。又在塗佈或層壓樹脂組成物時,有揮發物當 . 對生產設備造成影響之虞。 为谭毛物貝 [專利文獻1]曰本特開平1-289862號公報 [專利文獻2]日本特開平6_145638號公報 [專利文獻3]日本特開平6_192639號公報 [專利文獻4]日本特開平2_274762號公報 [專利文獻5]日本特開2〇〇4_2〇9%2號公報 【發明内容】 本發明之目的在於—面維持聚酿亞胺系樹月旨組成物之 二去膠祕(加严去膠錢度)。又,本發明之目的在於 而提里—面抑制加工時之揮發物質之產生 谷易生叙異之聚醯亞胺系樹脂組成物。 利用本發明之樹脂組成物,提 4撓,印刷基板等之金屬積層體。 適用作 物。第!之本發明係關於以下所示之聚醯亞胺系樹月旨組成 乂 (!H種=亞料獅組成物,其係含有下列通式 錢亞胺樹月旨,以及下列通式⑵所示:^重胺:=之 7 200819501ZDOU^piI resin composition (refer to Patent Document 5). However, when the resin composition containing bismaleimide is used for the resin layer of the metal laminate, a volatile substance (bismaleimide) may be generated due to the conditions, and sometimes it may be produced. The problem. Also, when coating or laminating the resin composition, there is a volatile matter when it affects the production equipment. [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. [Patent Document 5] Japanese Patent Laid-Open Publication No. Hei 2〇〇4_2〇9% No. 2 [Invention] The object of the present invention is to maintain the second gelatinous composition of the composition of the polyurethane-based tree Go to the plastic money). Further, the object of the present invention is to suppress the generation of volatile substances during processing, and to form a polyimine-based resin composition. The metal laminate of the substrate or the like is printed by using the resin composition of the present invention. Applicable crops. The first! The present invention relates to a polyimine-based tree composition composition shown below (!H species = a lion-like composition, which contains the following general formula of the imiline tree, and the following general formula (2) :^Heavy amine:=7 200819501
JOLDpiTJOLDpiT
A Α2 ΟΛ\ηο ΟΛ^ΥΟ ΟΛ ϊο οαβϊο ? J.N) -2) [在式(Η)及式(1-2)中,A芬Δ γ 或(a2 ),既可互她同,村料;β aj 或(b2),既可互相相同,亦可相異]]2刀別為下式㈦Xr°O^0iy ··-A Α2 ΟΛ\ηο ΟΛ^ΥΟ ΟΛ ϊο οαβϊο ? JN) -2) [In the formula (Η) and (1-2), Afen Δ γ or (a2), both of them can be the same; β aj or (b2), which can be the same or different from each other]] 2 is not the following formula (7) Xr°O^0iy ··-
〇〇 Δ Λ Λ Α3~Ν Β3 Ν- ϊ If 〇〇 (a2) 〇 (b2) (bl)〇〇 Δ Λ Λ Α3~Ν Β3 Ν- ϊ If 〇〇 (a2) 〇 (b2) (bl)
⑵ [在式(2)中,Α3為下式(cl 為下式(dl)〜(d4)中 為1〜5之整數](2) [In the formula (2), Α3 is the following formula (cl is an integer of 1 to 5 in the following formula (dl) to (d4)]
〜(c4)中之一,b3 之一,z為下式(el)或(e2)M (c2) (cl)One of ~(c4), one of b3, z is the following formula (el) or (e2)M (c2) (cl)
(c3) (c4) 〔在式(cl )〜(c4)中,χ7〜12係選擇自包含單鍵〇〜、—S—、一 CO—、— COO—、〜c r 、〜 C(CFS)2 S02 NHCO-之群,既可互相相 8 200819501(c3) (c4) [In the formulas (cl) to (c4), χ7~12 are selected to contain single bonds 〇~, -S-, one CO-, -COO-, ~cr, ~C(CFS) 2 S02 NHCO- group, which can be mutually correlated 8 200819501
230UDpiI230UDpiI
亦可相異〕Can also be different]
Ve4 Υ1〇{|- (dl)Ve4 Υ1〇{|- (dl)
丫 7-·丫 7-·
• (d4) (d2) Υ9 Υΐ1 〔在式(dl)〜(d4)中,Υ7〜12係選擇自包含單鍵、 〇 S---CO COO---c (ch3) 2___ c(cf3)2 so2 NHC〇-之群,既可互相相同, 亦可相異〕 R1 (el)• (d4) (d2) Υ9 Υΐ1 [In the formulas (dl) to (d4), Υ7~12 are selected to contain a single bond, 〇S---CO COO---c (ch3) 2___ c(cf3) 2 so2 NHC〇- group, which can be the same or different) R1 (el)
(e2) 〔在式(el)或(e2)中,Rh係選擇自包含氫原子、鹵 素原子、及碳数1〜3之烷基之群,既可互相相同,亦可相 異,心係一0—、一S—、一CH2 co —或一coo—〕 c (CH3) 2-(e2) [In the formula (el) or (e2), Rh is selected from the group consisting of a hydrogen atom, a halogen atom, and an alkyl group having 1 to 3 carbon atoms, which may be the same as each other or different from each other. a 0-, an S-, a CH2 co- or a coo-] c (CH3) 2-
〔2〕如〔1〕之聚醯亞胺系樹脂組成物,其中前述通 式(1-1)之人】、及通式(1-2)之八2中之一方為(al), 另一方為(a2 )。 、,〔3〕如〔丨〕或〔2〕之聚醯亞胺系樹脂組成物,其中 前述通式(2)之1為1。 ^ 〔4〕如〔1〕至〔3〕中任一項之聚醯亞胺系樹脂組成 物,其中相對於前述聚醯亞胺樹脂1〇〇重量份,以前述通[2] The polyimine-based resin composition according to [1], wherein one of the person of the above formula (1-1) and one of the formula (1-2) of the formula (1-2) is (al), One party is (a2). [3] The polyimine-based resin composition of [2] or [2], wherein 1 of the above formula (2) is 1. [4] The polyimine-based resin composition according to any one of [1] to [3] wherein, in the above-mentioned by weight of the above-mentioned polyimine resin,
式(2)所示之醯亞胺低聚物含有5重量份以上、1〇〇 份以下。 S 〔5〕如〔1〕之聚亞胺糸樹脂組成物,其中玻璃轉 9 200819501 ZDOUDpn 移溫度為刚W、職以下之範圍。 物,其6中〕組成 B3係選擇自下式(du r '、]^式(D)或(C6), Γ )0C ·- 54乂1為1〜5之整數。dl°)之君為(e3: "t^r〇~O~〇-01- · · (〇5) (d7)The quinone imine oligomer represented by the formula (2) contains 5 parts by weight or more and 1 part or less. S [5] The polyimine oxime resin composition according to [1], wherein the glass transition temperature is a range of just W and below. The composition of the composition of B3 is selected from the following formula (du r ', ^^ (D) or (C6), Γ) 0C · - 54乂1 is an integer of 1 to 5. The prince of dl°) is (e3: "t^r〇~O~〇-01- · · (〇5) (d7)
(d9) ϋ 〔R3及R4之定義與前述式(e2)相同〕 〔7〕一種混合物,其係含有下列通式(n)所示$ 重複單位、及下列通式(3-2)所示之重複單位之聚醯胺趣 (poly amic acid)、以通式(2)所示之醯亞胺低聚物以及々 要時所需之溶劑。 (3-1) μ 〇 Ο Μ ' -Af Ν-4(d9) ϋ [The definitions of R3 and R4 are the same as those of the above formula (e2)] [7] A mixture containing the repeating unit represented by the following formula (n) and the following formula (3-2) The repeating unit of polyamic acid, the quinone imine oligomer represented by the formula (2), and the solvent required at the time. (3-1) μ 〇 Ο Μ ' -Af Ν-4
ΗΟπί ir0H 〇〇 10 200819501 ZDOU^pilΗΟπί ir0H 〇〇 10 200819501 ZDOU^pil
• * * (3-2) ^ [ff) (3Β;^ί } ^ 5 (al )Ϊ ^,= ’亦可相異,及B2分別為前述 气「) ΐ : 1 ’既可互相相同,亦可相異] Α3-ΝΛΒ, Ν Π 〇Λ γ 〇• * * (3-2) ^ [ff) (3Β;^ί } ^ 5 (al )Ϊ ^,= 'can also be different, and B2 is the aforementioned gas ") ΐ : 1 ' can be identical to each other, Can also be different] Α3-ΝΛΒ, Ν Π γ γ 〇
〇 χΥ I 〇 、、,[在式(2)巾’^為前述式(cl)〜(c4)中之一,Β, 為别述式(dl)〜(d4)中之一,7炎义、+、4、 2為刖述式(el)或(e2) 中,1為1〜5之整數] 〔㈦一種聚醯亞胺系樹脂硬化物之製造方法,苴係包 含加熱如〔7〕之混合物而使起醒亞胺化反應之步驟、。’、 〔9〕-麵,其係包含如⑴至⑷中任一項之聚 醯亞胺系樹脂組成物之硬化物。 一〔10〕一種金屬積層體,其係包含金屬層與樹脂層, 且前述樹脂層之至少一層係由如〔n至〔6〕中任一項之 聚酸亞胺系樹脂組成物之硬化物所構成。 义〔11〕一種金屬積層體,其係具有聚醯亞胺膜、形成 於韵述聚醯亞胺膜之單面或雙面之聚醯亞胺層、及積層於 前述聚醯亞胺層之一方或兩方之金屬層; 接觸於前述金屬層之聚醯亞胺層係樹脂層,其係由如 〔1〕至〔6〕中任一項之聚|藍亞胺糸樹脂組成物之硬化物 所構成。 l 12 禋接者溥片〇χΥ I 〇,,, [in the formula (2) towel '^ is one of the above formulas (cl) to (c4), Β, is one of the other formulas (dl) to (d4), 7 Yanyi , +, 4, 2 are in the elliptical formula (el) or (e2), and 1 is an integer of 1 to 5] [(7) A method for producing a cured polyimide resin, which comprises heating as in [7] The mixture is used to initiate the amination reaction. And [9]-face, which is a cured product of the polyamidene-based resin composition according to any one of (1) to (4). (10) A metal laminate comprising a metal layer and a resin layer, and at least one layer of the resin layer is a cured product of a polyamic acid imide resin composition according to any one of [n to [6] Composition. [11] A metal laminate comprising a polyimide film, a polyimide layer formed on one or both sides of a rhodium imine film, and a layer of the polyimide layer a metal layer of one or both of the layers; a polyimine layer-based resin layer which is in contact with the metal layer, which is cured by a poly-blue imine resin composition according to any one of [1] to [6] The composition of things. l 12 connector picture
200819501 -^OUDpn 述樹脂膜之單面或雙面之π、〕至、〔有6樹„積層於前 胺系樹脂組成物之硬化物所構成之樹月匕I ㉟之亞 本發明之雜錢_餘絲^溫 =生高。(去膠渣速度快),且可抑制在加上揮 又,可藉本發明之聚酿亞胺系樹脂組成 層與樹脂層而製造金屬積層體,在其接著中,不必使用f =加工溫度’減_以殘留在箱層與㈣亞胺界面二 :此得金屬層與樹脂層之高接著驗之金屬積層 -°所^•之金屬積層體可適合使用作為撓性印刷基板等: =得之金屬積層體、及金屬積層體之前驅物之接著薄 片、(無金屬層之狀態之薄片)之焊料耐熱性優異,故在 f概度條件嚴苛之LSI晶片或零件安裝製程、及該等之備用 令件製程中,也難以發生膨脹。 【實施方式】 1·聚醯亞胺系樹脂組成物 本叙明之聚醯亞胺糸樹脂組成物之特徵在於:含有聚 -亞版树月曰以及亞胺低聚物(如丨如〇lig〇mer)。 聚醢亞胺樹脂 • 聚醯亞胺系樹脂組成物所含的聚醯亞胺樹脂亦可為, 3有下列通式(μ〗)所示之重複單位與通式(丨_2)所示 之重複單位;或藉由醯亞胺化而產生下列通式(Μ)所示 之重複單位與通式(1_2)所示之重複單位的前驅物(也就 12 200819501 256ϋ5ριί 是聚醯胺酸(poly amic acid)) 〇 ο (1-1) (1-2) Δ ΛΑ200819501 -^OUDpn The π,] to the single-sided or double-sided of the resin film, [there are 6 trees „ layered in the hardened material of the pro-amine resin composition, which constitutes the money of the invention. _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Then, it is not necessary to use f = processing temperature 'minus _ to remain in the box layer and (iv) imine interface 2: the metal layer and the resin layer are higher than the metal layer - the metal layer can be suitable for use As a flexible printed circuit board or the like: = the metal laminated body and the succeeding sheet of the metal laminated body precursor, and the sheet (the sheet in the state without the metal layer) are excellent in solder heat resistance, so the LSI having strict f-preparation conditions is required. In the wafer or part mounting process, and in the spare parts manufacturing process, expansion is also difficult. [Embodiment] 1. Polyimine-based resin composition The polyimine resin composition described herein is characterized by: Contains poly-Asian tree sap and oligomers of imines (eg 〇lig Mer) The polyimine resin contained in the polyimine resin composition may also be a repeating unit and a formula represented by the following formula (μ). a repeating unit shown; or a precursor of a repeating unit represented by the following formula (Μ) and a repeating unit represented by the formula (1_2) by imidization (also 12 200819501 256ϋ5ριί is a polyfluorene) Poly amic acid 〇ο (1-1) (1-2) Δ ΛΑ
1 一 W 〇〇 〇〇 Δ Λ Λ ·Α2-Ν Β2 Ν- ϊ ίΐ 〇〇 式(1-1 )之Αι及式(1-2)之 Α 么 @ 士一# f # ^ t八2為具有二鄰亞本鍵 (tdphenyleneether)結構,其以下式(al) (al) W°W°Y^ ______ 〜〇、」$U2)表不。 (a2) A]&A2既可互相相同,亦可相異,較好的是、及、 之-方為(al),另-方為(a2)。域^均為⑷時, 有時去膠渣速度會變慢。另—方面,ΑιΑΑ2均為⑽時, 有時剝離強度及低溫接著性會降低。^及〜為⑶)盘 c; 之組合時,可取得去_速度與低溫接著性(玻璃轉移溫 度)之平衡,故聚醢亞胺所含之(al)與(a2)之個數 率較好為8 : 2〜5 : 5,更好為7 : 3。 又,式(1)之BAB2是以下式(Μ)或(b2)表示。 較好的是$及%中之-方或雙方為(Μ),及匕為(⑷ 與(b2)之組合時,樹脂組成物之去膠渣速度雖可提高, 但:另-方面,(b2)之比率過高時,有時在加濕環;下 之焊料耐熱性(solder heat resistance)會惡化。 II η1 W 〇〇〇〇 Λ Λ Λ Α Α Ν Ν Ν Ν Ν ϊ ( ( Ν Ν ( ( 1-1 1-1 1-1 1-1 Α Α 及 及 及 及 及 及 及 及 及 及 么 么 么 么 么 么 么 么 么 么 么 么 么 么 么 f f f f f It has a structure of two adjacent sub-bonds (tdphenyleneether), and the following formula (al) (al) W°W°Y^ ______ 〜, "$U2) indicates. (a2) A] & A2 may be identical to each other or different from each other. Preferably, the sum is - (al) and the other is (a2). When the field ^ is (4), sometimes the desmear speed will be slower. On the other hand, when ΑιΑΑ2 is (10), the peel strength and the low-temperature adhesion may be lowered. When the combination of ^ and ~ is (3)) disc c;, the balance between the de-speed and the low-temperature adhesion (glass transition temperature) can be obtained, so the ratio of (al) to (a2) contained in the polyimine is higher. Good for 8: 2~5: 5, better for 7: 3. Further, BAB2 of the formula (1) is represented by the following formula (Μ) or (b2). It is preferable that the degreasing speed of the resin composition can be improved when the combination of (a) or both of (or) and (b) is improved, but another aspect, When the ratio of b2) is too high, sometimes it is in the humidifying ring; the solder heat resistance will deteriorate. II η
lJ Uk ··- X)r§XX ··-) 本發明之聚醯亞胺系樹脂組成物所含的聚醯亞胺樹 13 200819501 256ϋ5ριί 所示之重複單位 脂,雖含有前述之式(1-1)及式(1-2) 但亦可含有其他之重複單位。 聚醯亞胺系樹脂組成物所含的聚醯亞胺樹脂之分子旦 =無特別限定,域所述,可解歸分(二胺(diami=) f 四羧酸二酐(tetracarb0Xylic dianhydride))的分子量及其 莫耳比加以調整。 〃 聚醯亞胺樹脂之製造lJ Uk ··- X)r§XX ··-) The polyimine tree 13 contained in the polyamidene resin composition of the present invention has a repeating unit lipid as shown in 200819501 256ϋ5ριί, although it contains the above formula (1) -1) and (1-2) but may also contain other repeating units. The molecular weight of the polyimine resin contained in the polyimide composition is not particularly limited, and the domain can be decomposed (diami=f tetracarboxylic acid dianhydride). The molecular weight and its molar ratio are adjusted.制造 Manufacture of polyimide resin
3聚醯亞胺系樹脂組成物所含的聚醯亞胺樹脂,較好的 疋由四竣酸二酐與二胺之原料加以製造。 在聚醯亞胺樹脂的原料中,較好的是包含四羧酸二酐 的 3,3’,4,4’_二苯甲酮四羧酸二酐(m+benzophen· tetracarboxylic dianhydride,BTDA)或雙(3,4_二羧基苯基) 石尹、酸一酐(bis(3,4-dicarboxphenyl) sulfonic dianhydride, DSDA) 〇 另外,在聚醯亞胺樹脂的原料中,也可包含1種或2種 以上之其他的四羧酸二酐。使該等共聚合化時,可以不損 失本發明效果的方式,施行聚醯亞胺樹脂之性能的改良及 改質。 在其他四羧酸二酐之例中,包含:苯均四酸二酐、 3,3’,4,4’-聯笨四羧酸二酐、雙(3,4-二羧基苯基)醚二酐、 雙(3,4-二羧基苯基)硫醚二酐、雙(3,4-二羧基苯基)甲 烧二野、2,2_雙(3,4-二羧基苯基)丙烷二酐、2,2_雙(3,4-二魏基苯基)-1,1,1,3,3,3_六氟丙烷二酐、1,3-雙(3,4-二羧 基苯氧基)笨二酐、1,4_雙(3,4-二羧基苯氧基)苯二酐、 14 200819501 256ϋί)ριί 1,4-雙(3,4-二羧基苯氧基)聯苯二酐、2,2-雙〔(3,4-二羧 基苯氧基)笨基〕丙烷二酐等。 另外,在其他四羧酸二酐之例中,包含:乙撐四羧酸 二酐、丁烷四羧酸二酐、環戍烷四羧酸二酐、1,1-雙(2,3-二羧基苯基)乙烷二酐、1,1-雙(3,4-二羧基苯基)乙烷二 酐、U-雙(2,3-二羧基苯基)乙烷二酐、1,2·雙(3,4-二羧 基苯基)乙统二針、1,2,5,6-奈四竣酸二針、3,4,9,10-花四 羧酸二酐、2,3,6,7-蒽四羧酸二酐、1,2,7,8-萘四羧酸二酐 等。此等四羧酸二酐也可單獨或組合2種以上使用。 另外,其他四羧酸二酐亦可為以氟基或三氟曱基取代 上述例示之四羧酸二酐之芳香環上之氫原子之一部分或全 部之四叛酸二酐。 在聚醯亞胺樹脂之原料中,較好為含有二胺之1,3-雙 (3-氨苯氧基)苯(ΑΡΒ)、或1,3-雙(4-氨苯氧基)苯 (APB-R),更好為含有任何一種。 在聚醯亞胺樹脂之原料中,亦可含有其他之二胺。其 他之二胺既可為芳香族二胺,亦可為脂肪族二胺。 在芳香族二胺中,含有間苯二胺、鄰苯二胺、對苯二 胺、3,3’-二氨基二苯醚、3,4’_二氨基二苯醚、4,扎二氨基二 苯醚、3,3’-二氨基二苯硫醚、3,4’_二氨基二苯硫醚、4,4’-二氨基二苯硫醚、3,3^二氨基二苯颯、3,4f•二氨基二苯颯、 4,4’-二氨基二苯颯、3,3’-二氨基二苯曱酮、3,3f-二氨基二苯 曱烷、3,4’_二氨基二苯甲烷、4,4’-二氨基二苯甲烷、2,2-雙(3-氨苯基)丙烷、2,2-雙(4-氨苯基)丙烷、2,2-雙(3- 15 200819501 256ϋ5ρΐί ^ ^33 H ,,六鼠丙垸、2,2·雙(4-氨苯基) -u,碰,、氟丙烷、砂二氨基二苯亞砜、3令二氨基 二笨亞颯、4’二氨基二笨亞石風、⑶雙(3_氨苯基)笨、 1,3:又(4-風苯基)苯、认雙(3_氨笨基)苯、以-雙㈠_ 〜雙(3·氨苯氧基)笨、1,4-雙(4-氨苯氧 Γ+ Ϊ ' 4雙(3_氨苯基硫醚)*、U_雙(4_氨苯基硫 ^ 雙⑷氨苯基硫⑹笨、雙(3·氨基苯硬)The polyimine resin contained in the composition of the polyamidene resin is preferably produced from a raw material of tetradecanoic dianhydride and diamine. Among the raw materials of the polyimine resin, 3,3',4,4'-benzophenonetetracarboxylic dianhydride (BTDA) containing tetracarboxylic dianhydride is preferred. Or bis(3,4-dicarboxyphenyl) sulfonic dianhydride (DSDA) 〇 In addition, one of the raw materials of the polyimide resin may also be included. Or two or more other tetracarboxylic dianhydrides. When these copolymerizations are carried out, the performance and modification of the properties of the polyimide resin can be carried out without damaging the effects of the present invention. In the case of other tetracarboxylic dianhydrides, it includes: pyromellitic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, bis(3,4-dicarboxyphenyl)ether Dianhydride, bis(3,4-dicarboxyphenyl) sulfide dianhydride, bis(3,4-dicarboxyphenyl)methanthine, 2,2-bis(3,4-dicarboxyphenyl) Propane dianhydride, 2,2_bis(3,4-diweilcyl)-1,1,1,3,3,3-hexafluoropropane dianhydride, 1,3-bis(3,4-di Carboxyphenoxy) succinic anhydride, 1,4_bis(3,4-dicarboxyphenoxy)phthalic anhydride, 14 200819501 256ϋί) ριί 1,4-bis(3,4-dicarboxyphenoxy) Biphenyl dianhydride, 2,2-bis[(3,4-dicarboxyphenoxy) phenyl] propane dianhydride, and the like. Further, in the case of other tetracarboxylic dianhydrides, ethylene tetracarboxylic dianhydride, butane tetracarboxylic dianhydride, cyclodecane tetracarboxylic dianhydride, 1,1-bis (2,3- Dicarboxyphenyl)ethane dianhydride, 1,1-bis(3,4-dicarboxyphenyl)ethane dianhydride, U-bis(2,3-dicarboxyphenyl)ethane dianhydride, 1, 2·bis(3,4-dicarboxyphenyl)ethane two-needle, 1,2,5,6-natetradecanoic acid two-needle, 3,4,9,10-flower tetracarboxylic dianhydride, 2, 3,6,7-decanetetracarboxylic dianhydride, 1,2,7,8-naphthalenetetracarboxylic dianhydride, and the like. These tetracarboxylic dianhydrides can also be used individually or in combination of 2 or more types. Further, the other tetracarboxylic dianhydride may be a part of the hydrogen atom on the aromatic ring of the above-exemplified tetracarboxylic dianhydride or a total of four tetrahydro acid dianhydrides, which may be substituted with a fluorine group or a trifluoromethyl group. Among the raw materials of the polyimine resin, 1,3-bis(3-aminophenoxy)benzene (hydrazine) or 1,3-bis(4-aminophenoxy)benzene containing diamine is preferred. (APB-R), better to contain any kind. The raw material of the polyimide resin may also contain other diamines. Other diamines may be either aromatic diamines or aliphatic diamines. In the aromatic diamine, it contains m-phenylenediamine, o-phenylenediamine, p-phenylenediamine, 3,3'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, and 4, diamino Diphenyl ether, 3,3'-diaminodiphenyl sulfide, 3,4'-diaminodiphenyl sulfide, 4,4'-diaminodiphenyl sulfide, 3,3 diaminodiphenyl hydrazine, 3,4f•diaminodiphenyl hydrazine, 4,4′-diaminodiphenyl hydrazine, 3,3′-diaminodibenzophenone, 3,3f-diaminodiphenyl decane, 3,4′ _ Aminodiphenylmethane, 4,4'-diaminodiphenylmethane, 2,2-bis(3-aminophenyl)propane, 2,2-bis(4-aminophenyl)propane, 2,2-dual ( 3- 15 200819501 256ϋ5ρΐί ^ ^33 H ,,6 垸 垸, 2,2·bis(4-aminophenyl)-u, thixo, fluoropropane, diaminodiphenyl sulfoxide, 3 dimethylamino Stupid Azolla, 4'-diamino-secondary stony wind, (3) bis(3-aminophenyl) stupid, 1,3: yet (4-northylphenyl)benzene, bis (3_aminophenyl)benzene, -Bis(I)_~bis(3.aminophenoxy) stupid, 1,4-bis(4-aminophenoxypurine + Ϊ '4 bis(3_aminophenyl sulfide)*, U_double (4_ Aminophenylsulfide^bis(4)aminophenylsulfur (6) stupid, bis(3.amino) Hard)
本、,-又(4-乳基苯碾)苯、认雙( 广雙尸:氨鮮)苯、U,(4_氨基竹苯、M_雙,心 氨基节)苯、1,3·雙(3·氨基_4•苯氧基苯曱醯)笨、3 3_ 雙(3-氨基笨氧基)聯苯、仏雙(4•氨基苯氧基)聯笨、 y又(3-氨基苯氧基)聯苯、4,4_雙(4_氨基苯氧基)聯 ^雙!:3· (3_氨基苯氧基)苯基〕峻、雙〔3- (4-氨基苯 乳基)本基〕_、雙〔4_ (3_氨基苯氧基)苯基〕醚、雙 (4-氣基苯氧基)苯基〕_、雙〔3· (3_氨基苯氧基) ,基〕酮、雙〔3- (4_氨基苯氧基)苯基〕酮、雙〔4· (3_ 氨基苯氧基)苯基〕酮、雙〔‘(4_氨基苯氧基)苯基〕 酮、雙〔3_ (3-氨基苯氧基)苯基〕硫醚、雙〔3_ (4_氨基 苯氧基)苯基〕硫醚、雙〔4- (3-氨基苯氧基)苯基〕硫 _、雙〔4- (4-氨基苯氧基)苯基〕硫醚、雙〔3_ (3_氨基 苯氧基)苯基〕砜、雙〔3- (4-氨基苯氧基)苯基〕砜Γ 雙〔4_ (3-氨基苯氧基)苯基〕颯、雙〔4- (4-氨基苯氧基) 本基〕石風、雙〔3- (3-氨基苯氧基)苯基〕甲烧、雙〔3_ (4-氣基本氧基)本基〕甲烧、雙〔‘(3-氨基苯氧基) 16 200819501 256U^pit Γ 苯基〕甲烷、雙〔4- (4-氨基苯氧基)苯基〕甲烷、2,2_ 雙(3-氨基苯氧基)苯基〕丙烷、2,2-雙〔3_ (4-氨基 苯氧基)苯基〕丙烷、2,2-雙〔4- (3-氨基苯氧基)苯基〕 丙院、2,2-雙〔本(4-氨基苯氧基)苯基〕丙炫、2,2_雙〔3_ (3-氨基苯氧基)苯基〕义^^六氟丙烷^孓雙㈡· (心氨基苯氧基)苯基〕_1,;[,1,3,3,3_六氟丙烷、2,2_雙〔4_ (3_氨基苯氧基)苯基〕_i,ij,3,3,3-六氟丙院、2,2_雙〔4_ (‘氨基苯氧基)苯基〕」,〗丄3,3,3_六氟丙烷等。此等芳 香族二胺也可使用一種或組合數種使用。 在聚醯亞胺樹脂之原料中,也可含有脂肪族二胺。脂 肪族二胺係用於施行性能之改良及改質。在脂肪族二胺之 例中,含有1,3-雙(3-氨丙基)四甲基二矽氧烷、丨,3_雙(4_ 氨丁基)四甲基二石夕氧院、α,ω雙(3一氨丙基)聚二甲基 二石夕氧烧、α,ω-雙(3.氨丁基)聚二甲基二魏燒、雙(氨 曱基)醚、1,2-雙(氨曱氧基)乙烷、雙〔(2_氨曱氧基) $基〕醚、1,2-雙〔(2_氨曱氧基)乙氧基〕乙烷、雙& 氨乙基)醚、雙(2·氨乙氧基)乙烧、雙〔2- (2-氨乙 乳基)乙基〕醚、雙〔2-(2_氨乙氧基)乙基〕乙烧、雙 3_說丙基)醚、乙二醇雙(域丙基)_、二乙二醇雙 (3,丙基)_、三乙二醇雙(3遍丙基)醚、乙二胺、 ^ ^ ^ i56- Γκ)、」:了飞基庚烧、Μ·二氨基辛烧、W二氨 十一烧、U一絲環己烧、1,3·二氨基環己烧、M-二 17 200819501 25605pif 氨基環己烧、1,2-二(2^ 7 ^ , 〇 苴、洋口 ^ i 、厶虱乙基)%己烷、u_二(2_Ben,, - (4-milylbenzene mill) benzene, double (Guang double corpse: ammonia fresh) benzene, U, (4_ amino bamboo benzene, M_ double, heart amino section) benzene, 1,3· Bis(3.amino-4-phenoxybenzoquinone) stupid, 3 3_bis(3-aminophenyloxy)biphenyl, anthracene bis(4•aminophenoxy) phenyl, y again (3-amino Phenoxy)biphenyl, 4,4_bis(4-aminophenoxy) linked ^ double! :3·(3—Aminophenoxy)phenyl] succinyl, bis[3-(4-aminophenyl) benzyl]-, bis[4-(3-aminophenoxy)phenyl]ether, double (4-cyclophenoxy)phenyl]-, bis[3·(3-aminophenoxy), yl] ketone, bis[3-(4-aminophenoxy)phenyl]one, bis[ 4·(3_Aminophenoxy)phenyl]one, bis['(4-aminophenoxy)phenyl]one, bis[3-(3-aminophenoxy)phenyl] sulfide, double [3_ (4-aminophenoxy)phenyl] sulfide, bis[4-(3-aminophenoxy)phenyl]sulfide, bis[4-(4-aminophenoxy)phenyl] sulfide, Bis[3-(3-aminophenoxy)phenyl]sulfone, bis[3-(4-aminophenoxy)phenyl]sulfone oxime bis[4-(3-aminophenoxy)phenyl]indole, double [4-(4-Aminophenoxy) benzyl] zephyr, bis[3-(3-aminophenoxy)phenyl]methyl ketone, bis[3_(4-gas basic oxy) benzyl] , bis['(3-aminophenoxy) 16 200819501 256U^pit Γ phenyl]methane, bis[4-(4-aminophenoxy)phenyl]methane, 2,2_bis(3-aminobenzene Oxy)phenyl]propane 2,2-bis[3_(4-aminophenoxy)phenyl]propane, 2,2-bis[4-(3-aminophenoxy)phenyl]propane, 2,2-bis[本( 4-aminophenoxy)phenyl]propanol, 2,2-bis[3_(3-aminophenoxy)phenyl]yi^^hexafluoropropane^(bis)·(cardoaminophenoxy)benzene Base]_1,;[,1,3,3,3_hexafluoropropane, 2,2_bis[4_(3-aminophenoxy)phenyl]_i,ij,3,3,3-hexafluoropropyl House, 2,2_bis[4_('aminophenoxy)phenyl], 丄3,3,3_hexafluoropropane, etc. These aromatic diamines may also be used one kind or in combination of several kinds. The raw material of the polyimide resin may also contain an aliphatic diamine. Aliphatic diamines are used for performance improvement and upgrading. In the case of an aliphatic diamine, it contains 1,3-bis(3-aminopropyl)tetramethyldioxane, hydrazine, and 3-bis(4-aminobutyl)tetramethyl oxalate. α,ω bis(3-aminopropyl)polydimethyl bismuth oxide, α,ω-bis(3.aminobutyl)polydimethyldiwei, bis(aminomethyl)ether, 1 , 2-bis(aminooxy)ethane, bis[(2-aminodecyloxy)$yl]ether, 1,2-bis[(2-aminodecyloxy)ethoxy]ethane, double & Aminoethyl)ether, bis(2.aminoethoxy)ethene, bis[2-(2-aminoethyl)ethyl]ether, bis[2-(2-aminoethoxy)B Ethyl bromide, double 3 _ propyl) ether, ethylene glycol bis (domain propyl) _, diethylene glycol bis (3, propyl) _, triethylene glycol bis (3 propyl) ether , Ethylenediamine, ^ ^ ^ i56- Γ κ), ": Feigen, Μ, diamino octyl, W diammonium, U-ring, 1,3-diaminocyclohexane , M-二17 200819501 25605pif Aminocyclohexane, 1,2-di (2^ 7 ^ , 〇苴, Yangkou ^ i, 厶虱ethyl)% hexane, u_二(2_
=衣 冬二(L氨乙基)環己烷、雙(4-氨美俨P 基^^6,(氨甲基)二環〔切〕狀、二= 曱土 一% 2,2,1〕庚烷等。此等二胺也可單獨使用一葙 或組合數種使用。 彳更用種 之分2胺系樹脂組成物所含之聚醯亞胺樹脂 里°度),與通常之縮聚合系聚合物之分早旦 同樣,可藉調節單體成分之莫耳比加以控制。也就 聚醯亞胺料,蝴於二胺為丨莫 莫耳之四羧酸二酐,更佳為含 • 95莫耳之四羧酸二酐,特佳為含有〇95莫耳〜〇995 莫耳之四羧酸二酐,最佳為含有〇 97莫耳〜〇 995之 羧酸二酐。 、卄乏四 …聚醯亞胺樹脂之原料(含二胺與四羧酸二酐之單體 料)較好先變成聚醯胺酸(聚醯亞胺前驅物),然後^ 成聚醯亞胺。為使單體原料變成聚醯胺酸,只 ^ 加入單體原料而加熱即可。 Θ 加入聚亞胺樹脂之單體原料之溶劑並無特別限制 但較好為非質子性極性溶劑(&?1*〇也1)〇1虹80^如〇,^好為 非質子性醯胺系溶劑。具體上,可例示凡队二甲替甲醯扩、、 N,N_一甲基乙醯胺、n,N-二乙基乙胺、n,n_二甲基”甲, 基乙醯胺、N-二甲基-2-吡咯烷酮、ι,3-二甲基-2_咪 氧 酮等。 I〜 另外,在加入聚醯亞胺樹脂之單體原料之溶劑中,也 18 200819501= 衣冬二(L-aminoethyl)cyclohexane, bis(4-aminomethine P-based ^^6, (aminomethyl)bicyclo[cut], two = 一1% 2,2,1 ~Heptane, etc. These diamines may also be used singly or in combination of several kinds. The bismuth imide resin contained in the 2-amine resin composition is more than the usual shrinkage. The polymerization polymer can be controlled by adjusting the molar ratio of the monomer component as early as possible. In other words, the polyimide material is a tetracarboxylic acid dianhydride which is a non-monoamine, more preferably contains 95 mol of tetracarboxylic dianhydride, and particularly preferably contains 〇95 mol 〇 〇 995 The tetracarboxylic dianhydride of Mo, preferably a carboxylic acid dianhydride containing 〇97 mol to 〇995. The lack of four... The raw material of the polyimine resin (the monomer containing diamine and tetracarboxylic dianhydride) preferably turns into poly-proline (polyimine precursor), and then becomes a poly amine. In order to make the monomer raw material into polyamic acid, it is only necessary to add the monomer raw material and heat it.溶剂 The solvent to which the monomer raw material of the polyimide resin is added is not particularly limited, but is preferably an aprotic polar solvent (&?1*〇1) 〇1虹80^如〇, ^ is an aprotic 醯Amine solvent. Specifically, it can be exemplified by the team of dimethyl thiophene, N,N-methylethyl decylamine, n,N-diethylethylamine, n,n-dimethyl"methyl acetamide , N-dimethyl-2-pyrrolidone, iota, 3-dimethyl-2-tomoxyl, etc. I~ In addition, in the solvent of the monomer raw material of the polyimine resin, 18 200819501
Z30U3piI 可進一步技卢女 一 中,含有絮、卞有以下所示之溶劑。在可共存之有機溶劑 氯甲笨:甲f、鄰二甲苯、間二甲苯、對二甲苯、鄰 溴甲笨一曰之甲笨、對氣甲苯、鄰溴甲苯、間溴甲苯、對 種以上使^、填苯等。此等有機溶劑可單獨使用或混合2 漆。聚胺前驅物而製造之聚酿胺酸係被用作清 心,更::羽區物之對數黏度祕,較好為〇.2 dl々〜2.0 醯亞胺前]·3⑴々〜1…dl/g ’最好為Q.4 dl/g〜0.9 dl/g。聚 前驅物之_之對數黏度,係以Q'5dl/g之濃度將聚酿亞胺 35°C之黏声谷解於-二甲基乙醯胺所得之溶液,在 由前^==前驅物之對數黏度設定於上述之範圍時, 金屬積帅 Μ脂硬化物變得較為牢固,容易形成膜及 裎中,、二 而且,在製造膜及金屬積層體之際之塗佈製 各易保持膜厚之均勻,相當理想。 釀亞胺低聚物 2 亞胺系樹脂組成物所含之醯亞胺低聚物具有式 為1時所J1"、之結構。式(2)中之1為1〜5。式(2)中之1 其紝果可進步提高醯亞胺低聚物之作為可塑劑之效果, 性。 了進步提兩聚醯亞胺系樹脂組成物之低溫接著 〇ΖΛ\Ν' Ο 〇 ο X If 〇〇 〇jf A3i〇Z Υ 〇 ⑵ 弋(2)中之Α3具有下式(cl)〜(c4)中之一所示之 19 200819501 joiopir ο f聋。另外,式⑺中之絲好具有下式(c5)或(c6) 中之-所示之結構。在式⑴)〜(' ),(:6) 自包含單鍵、一0 〜 )中X7〜12係廷擇Z30U3piI can be further used to provide a solvent and a solvent as shown below. In the organic solvent that can coexist, chlorine, stupid: a, f, o-xylene, m-xylene, p-xylene, o-bromo, stupid, p-toluene, o-bromotoluene, m-bromotoluene, above species Make ^, fill benzene, etc. These organic solvents can be used alone or in combination with 2 paints. The poly-araminic acid produced by the polyamine precursor is used as a clear heart, and more: the logarithmic viscosity of the plume is secret, preferably 〇.2 dl々~2.0 醯iamine before]·3(1)々~1...dl /g ' is preferably Q.4 dl/g to 0.9 dl/g. The logarithmic viscosity of the poly precursor is a solution obtained by dissolving the viscous yam at 35 °C in the concentration of Q'5dl/g in the solution of -dimethylacetamide. When the logarithmic viscosity of the substance is set within the above range, the metal squeezing and squeezing hardened material becomes firmer, and it is easy to form a film and a ruthenium, and the coating system is easy to maintain at the time of film and metal laminated body production. Uniform film thickness is quite ideal. The yttrium imide oligomer contained in the imine-based oligomer composition has a structure of J1" in the formula 1. 1 in the formula (2) is 1 to 5. The result of the formula (2) is that the effect of improving the effect of the quinone imine oligomer as a plasticizer can be improved. The progress of the two-component bismuth imide resin composition is low temperature followed by 〇ΖΛ\Ν' Ο Xο X If 〇〇〇jf A3i〇Z Υ 〇 (2) 弋 (2) Α 3 has the following formula (cl) ~ ( 19 200819501 joiopir ο f聋 shown in one of c4). Further, the filament in the formula (7) preferably has a structure as shown by the following formula (c5) or (c6). In the formula (1)) ~ ('), (: 6) self-contained single bond, a 0 ~) X7 ~ 12 system
S co 、一COO—、— c 既可互相相同,亦可相里。x 1 . —NHC0—之群, π样从/相異7〜12鍵結於構成笨環之碳中之 如,式⑵中之A3具有式(峨編) … CH, •C(CF3)2- so (cl) -x9--S co , a COO —, — c can be the same or the same. x 1 . — group of NHC0—, π-like from/different 7~12 is bonded to the carbon constituting the stupid ring, and A3 in the formula (2) has the formula (峨)... CH, • C(CF3)2 - so (cl) -x9--
X 10 JT-Xirf -χ12- (c4) -Q-o-0-0-0- ...(c£ (c6) O~°O-〇-〇m〇- ·X 10 JT-Xirf -χ12- (c4) -Q-o-0-0-0- ...(c£ (c6) O~°O-〇-〇m〇- ·
• · · (c7) 式⑵中之b3具有下式( 〜㈤0)中之一所示之結構3。;:具 (c8) 結構。另外,式(2)中n h 所不之 ;生與成本之觀點等力-選擇即可3。:欠 W系選擇自包含單鍵…〇…—s — C ⑽)Π (叫 r、—so「、— —之群,既可互她同,亦可相異〕。U結於構j 20 200819501 2^6UDpir %之石反原子中之一。又〜為-coo一或—NHC0 情鍵結之方向為任何方向皆可。 U …(dl) Y^v7-rr• (c7) b3 in the formula (2) has the structure 3 shown by one of the following formulas (~(5)0). ;: with (c8) structure. In addition, in the formula (2), n h is not; the force and cost are equal to the force - the choice is 3. :Under W series chooses self-contained single key...〇...—s — C (10))Π (called r, —so “,————————————————————————————————————————————————————————————————————————————————— 200819501 2^6 UDpir % of one of the anti-atoms of the stone. Also ~ is -coo or -NHC0 The direction of the bond is in any direction. U ...(dl) Y^v7-rr
• (d3) 一之 (d2) (d4) 11• (d3) one (d2) (d4) 11
»〇Ί〇ν〇^χχ .··_ h3c ch3 _Yi2〜CC ·.· )〇"c »°1〇:»〇Ί〇ν〇^χχ .··_ h3c ch3 _Yi2~CC ·.· )〇"c »°1〇:
(d9) (d6) (d8) 以下式(ei)或⑻表示,但以下 二群氫 N -C(CH3)2 co—或-coo-。&為—c⑻ 形,其鍵結之方向為任何方向皆可。” (el)(d9) (d6) (d8) The following formula (ei) or (8) represents the following two groups of hydrogen N-C(CH3)2 co- or -coo-. & is -c(8), and the direction of the bond can be in any direction. (el)
r3、 (e2) (e3) R4,^\ 你*本發明之聚輕㈣樹麵成物所含之醯亞胺低聚 ’較好具有1000以上、5_以下之重量平均分子量(又 21 200819501R3, (e2) (e3) R4, ^\ You * The oligomerization of quinone imine contained in the poly (tetra) tree surface of the present invention ‘ preferably has a weight average molecular weight of 1000 or more and 5 Å or less (also 21 200819501)
2^t)U3plI 稱Mw)。醯亞胺低聚物之重暑 透色譜法加以測定(測定條千=,可利用凝膠滲 四气哕喃,4、# ·彳"·牛為私測為·· RI,擴展觸媒: 四a夫南,机速.iml/mm,桎溫度·· 醯亞胺低聚物之重量平八 少加熱樹脂組成物時之蒸發】範圍時,可減 果,相當_ H *會降低可塑化之效 〜、另外攸抑制墓發量盘接古-^月w 4 丁 衡之觀點言之,重量 '、^里/、“可塑性之平 ο _。以下,更好為圆以上 上、3500以下。 3500以下’最好為1500以 酿亞胺低聚物之製法 物可系脂組成物所含之醯亞職 胺及二私蛛/衣1^。例如,可使含四綾酸二酐、二 反庫而二二酐;=及必要時添加之溶劑之原料起酿亞胺 酐:=ί:=制原料所含之各成分(四紐二 聚物(後述)。獨之莫耳比而獲得理想之酸亞胺低 中,=亞胺低聚物之原料中所含之四缓酸二酐之例 3 3,4 41 均四酸二軒、3,3',4,4L聯苯四幾酸二酐、 i酐:雔—四舰二酐、雙(3,4_二縣苯基)鱗 苯基)i二酐二竣t苯幻躺二針、雙(3,4-二縣 ^ ^ 又(3,4·一竣基苯基)曱烧二酐、2,2_雙 ]"-二,基苯基)喊二酐、2,2_雙(3,4_二縣苯基) H二氟丙烧二肝、(3,4_二縣苯氧基) •,又(3,4·—羧基笨氧基)苯二酐、1,4_雙(3,4- 22 200819501 ζ^ου^ριτ 二羧基苯氧基)聯苯二酐、2,2-雙〔(3,4-二羧基苯氧基) 苯基〕丙烷二酐等。醯亞胺低聚物之原料中所含之四羧 酸二酐為1或2種以上。 . 在醯亞胺低聚物之原料中所含之二胺之例中,含有 . 間苯二胺、鄰苯二胺、對苯二胺、3J-二氨基二苯醚、 3,4’-二氨基二苯醚、4,4’-二氨基二苯醚、3,3f-二氨基二苯 硫鍵、3,心二氨基二苯硫鍵、4,4f-二氨基二苯硫鍵、3,3f-二氨基二本礙、3,4’-二氨基二本^風、4,4’-二氨基二本石風、 ^ 3,3f-二氨基二苯曱酮、3,3’-二氨基二苯曱烷、3,4’-二氨基 二苯曱烷、4,仁二氨基二苯曱烷、2,2-雙(3_氨苯基)丙 烷、2,2-雙(4-氨苯基)丙烷、2,2-雙(3-氨苯基M,l,l,3,3,3-六敗丙统、2,2-雙(4-氨苯基)-1,1,1,3,3,3_六氣丙燒、3,3’_ 二氨基二苯亞颯、3,4’-二氨基二苯亞颯、4,4’-二氨基二苯 亞颯、1,3_雙(3-氨苯基)苯、1,3-雙(4-氨苯基)苯、 M-雙(3-氨苯基)苯、1,4-雙(4-氨苯基)苯、1,3-雙(3-氨苯氧基)苯、1,3-雙(‘氨苯氧基)苯、1,4-雙(3-氨 、 苯氧基)苯、1,4-雙(4-氨苯氧基)苯、1,3-雙(3_氨苯 基硫鱗)苯、1,3-雙(4-氣苯基硫喊)苯、1,4-雙(4-氣 苯基硫醚)苯、1,3-雙(3-氨基苯砜)苯、1,3-雙(4-氨 基苯颯)苯、1,4-雙(4-氨基苯砜)苯、1,3-雙(3-氨基 苄)苯、1,3-雙(4-氨基苄)苯、1,4-雙(4-氨基苄)苯、 ' U-雙(3-氨基-4-苯氧基苯曱醯)苯、3,3-雙(3-氨基笨 ‘ 氧基)聯苯、3,3-雙(4-氨基苯氧基)聯笨、4,4-雙(3- 氨基苯氧基)聯苯、4,4-雙(4-氨基苯氧基)聯苯、雙〔3_ 23 200819501 (3-氨基苯氧基)苯基〕醚、雙〔3_ (4_氨基笨氧基)苯 基〕醚、雙〔4_ (3-氨基苯氧基).笨基〕醚、雙& (4_ 氨基苯氧基)苯基〕鱗、雙〔3- (3_氨基苯氧基)苯基〕 * 酮、雙〔3- (4-氨基笨氧基)苯基〕酮、雙〔4_ (3_氨基 _ 苯氧基)苯基〕酮、雙〔冬(4-氨基苯氧基)苯基〕酮、 雙〔3- (3-氨基本氧基)苯基〕硫喊、雙〔3_ (‘氨基苯 氧基)苯基〕硫_、雙〔4· (3-氨基苯氧基)笨^妒 f、 醚、雙〔4_ 氨基苯氧基)苯基〕硫醚、雙(3_ 氨基苯氧基)苯基〕颯、雙〔3- (4-氨基苯氧基)苯基〕 颯、雙〔4- (3-氨基苯氧基)苯基〕砜、雙〔4_ (‘氨基 苯氧基)苯基〕砜、雙〔3_ (3_氨基苯氧基)笨基〕甲 烧雙〔> (4_氨基本氧基)苯基〕甲烧、雙〔4_ ( 3_ 氨基苯氧基)苯基〕甲院、雙〔4_ (4_氨基苯氧基)苯 基〕甲院、2,2-雙〔3-(3-氨基苯氧基)苯基〕丙烧、2,2_ 雙〔3- (4_氨基苯氧基)苯基〕丙烧、2,2_雙〔心(3_氨 基苯氧基)苯基〕丙烧、2,2-雙〇 (4-氨基苯氧基)苯 J 基〕丙烷、2,2"雙〔(3-氨基苯氧基)苯基〕-l,l,l,3,3,3- 六氟丙烷、2,2_雙〔3_(4_氨基苯氧基)苯基〕_1,1,1,3,3,3_ 六氟丙烷、2,2-雙〔4_ (1氨基苯氧基)苯基〕义u,3,3,’3_ 六氟丙烷、2,2_雙〔4- (4-氨基苯氧基)苯基〕·mm . 六氟丙烷等。醯亞胺低聚物之原料所含之二胺為丨或2種 以上。 在亞胺低聚物之原料所含之二幾酸酐之例中,含 有馬來酸酐、降冰片烯酸酐等。或者是,也可使用4 24 200819501 ^^bU^pit 乙炔基苯)鄰苯二曱酸酐、及4- (2-乙炔基)鄰苯二甲 酸酐等之藉由三量化而形成苯環之化合物。 醯亞胺低聚物之原料所含之溶劑以有機溶劑為佳, .在有機溶劑之例中,含有苯酚、鄰氯酚、間氯酚、對氯 _ 酚、鄰曱苯酚、間曱笨酚、對曱苯酚、2,3-二曱苯酚、2,4- 二曱苯酚、2,5-二甲苯酚、2,6-二曱苯酚、3,4-二曱苯酚、 3,5-二曱苯酚、N,N-二曱替甲醯胺、N,N-二曱基乙醯胺、 N,N-二乙基乙醯胺、N,N-二曱基甲氧基乙醯胺、N-二曱 f 基-2-吼洛:!:完酮、1,3-二甲基-2-味唾琳二酮、N-曱基己内 醯胺、1,2-二甲氧基乙烷、雙(2-曱氧基乙基)醚、1,2-雙(2-曱氧基乙氧基)乙烷、雙〔2- (2-甲氧基乙氧基) 醚、四氫呋喃、1,3_二噁烷、1,4-二噁烷、吡啶、皮考琳、 二甲基亞颯、二曱基颯、四甲基脲、六曱基磷醯胺、茴 香醚等。此等有機溶劑可單獨使用或混合2種以上使用。 在醯亞胺低聚物之原料中,也可進一步共存有以下 所示之溶劑。在可共存之有機溶劑中,含有苯、曱苯、 “ 鄰二甲苯、間二曱苯、對二甲苯、鄰氯曱苯、間氯甲苯、 對氯甲苯、鄰溴曱苯、間溴曱苯、對溴曱苯、氯苯、溴 苯等。 在醯亞胺低聚物之原料中,也可含有用來提高醯亞 胺化反應(後述)之觸媒,例如有機驗性觸媒。在有機 鹼性觸媒之例中,含有三乙胺、三丁胺、三戊胺、N,N-’ 二甲基苯胺、N,N-二乙基苯胺、吡啶、α-皮考啉、β·皮 考琳、丫_皮考琳、2,4_二曱吼。定、、啥琳、 25 200819501 256U5pit 異喹啉等,理想者為吡啶、γ-皮考啉。 在醯亞胺低聚物之原料中之觸媒含量,只要實質上 能提高聚合反應速度即可,並無特別限制,例如相對於 四羧酸二酐為1莫耳,其含量為0.001〜0.5.莫耳。 . 就製造醯亞胺低聚物之步驟而言,可列舉:(1 )使 一胺與四羧酸二酐反應後,添加二羧酸酐而使其持續反 應’或(2)加入二胺與二羧酸酐使其反應後,添加四羧 『酸二酐成分而使其持續反應,或(3)同時添加二胺化合 物、四緩酸一酐及二竣酸酐使其反應之步驟等,也可採 用其中任一步驟。 在醯亞胺反應之例中,含有熱醯亞胺化、化學醯亞 月女化、直接熱酿亞胺化。 所谓熱醯亞胺化,係使前述原料在1〇〇它以下之低 溫,具體上,在-20〜70°C,較好在〇〜6〇°c下反應而合 成醯亞胺低聚物前驅物,接著,將溫度提高至i〇〇〜2〇(rc 而使其醯亞胺化,藉以獲得醯亞胺低聚物之方法。所謂 , 化學醯亞胺化,係利用醋酐等醯亞胺化劑,以化學方式 將前述醯亞胺低聚物前驅物施行醯亞胺化之方法。 另一方面,所謂直接熱醯亞胺化,係混合二胺、四 羧酸二酐及二羧酸酐後,在有機鹼及/或共沸脫水用溶劑 之存在下或不存在下迅速升溫,直接使反應系統_產生 之S&亞胺低聚物前驅物酿亞胺化之方法。 醯亞胺化之反應時間因使用之單體種類、溶劑種 類、有機鹼觸媒之種類、共沸脫水用溶劑之種類、量及 26 200819501 反應^度而異,就目標而言,為j 時。 直接熱酿亞胺化之情形,就目標而言 至德出之水達到理論量(通常無法全部回收,,;為5= 率)’?常需要約數小時之反應時間。此情形, 一:又木以甲苯等共濟劑除去醯亞胺化所生之水之方 法’且此方法相當有效。2^t) U3plI is called Mw). The weight of the quinone imine oligomer is determined by the chromatographic method (determination of the strip thousand =, the gel can be used to infiltrate the four gas 哕 ,, 4, # · 彳 " · cattle for private measurement for · RI, extended catalyst : Four a funan, machine speed. iml / mm, 桎 temperature · 醯 imine oligomer weight flat eight less heating resin composition evaporation] range, can reduce fruit, equivalent _ H * will reduce plasticization The effect is ~, another 攸 攸 墓 墓 墓 - - - - - - - - - - - - - - - - - - - - - - - 丁 丁 丁 丁 丁 丁 丁 丁 丁 丁 丁 丁 , 丁 丁 丁 , , , , , 3500 or less 'preferably 1500 yttrium ylide oligomers can be used in the lipid composition to contain the sulfhydryl amine and the second private spider/coating. For example, it can be used to contain tetradecanoic dianhydride. The second anti-reservative and the dianhydride; = and the solvent to be added if necessary, starting from the imine anhydride: = ί: = each component contained in the raw material (four neodimer (described later). Example 3 of the four acid dianhydrides contained in the raw material of the acid imine low-alcohol, the raw material of the imine oligomer, 3,4 41 tetraisoxic acid, 3,3', 4,4L biphenyl Acid dianhydride, i anhydride: 雔 - four ships Di-anhydride, bis(3,4_two-phenyl) phenyl)i dianhydride diterpene benzene phantom two needles, double (3,4-two county ^ ^ again (3,4·1 decyl benzene) Base) bismuth dianhydride, 2,2_bis]"-di-ylphenyl) dianhydride, 2,2_bis (3,4_two phenyl) H difluoropropanthrene 3,4_二县phenoxy) •, (3,4·carboxyloxy)phthalic anhydride, 1,4_bis (3,4- 22 200819501 ζ^ου^ριτ dicarboxyphenoxy Biphenyl dianhydride, 2,2-bis[(3,4-dicarboxyphenoxy)phenyl]propane dianhydride, etc. The tetracarboxylic dianhydride contained in the raw material of the quinone imine oligomer is 1 Or two or more. Examples of the diamine contained in the raw material of the quinone imine oligomer include m-phenylenediamine, o-phenylenediamine, p-phenylenediamine, 3J-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether, 3,3f-diaminodiphenyl sulfide bond, 3, cardio diaminodiphenyl sulfide bond, 4,4f-diamino group Phenyl sulfide, 3,3f-diaminodibenz, 3,4'-diaminodibenzamine, 4,4'-diaminodicarbite, ^3,3f-diaminodibenzophenone, 3,3'-diaminodiphenyl decane, 3,4'-diaminodiphenyl Decane, 4, aryldiaminodiphenyl decane, 2,2-bis(3-aminophenyl)propane, 2,2-bis(4-aminophenyl)propane, 2,2-bis(3-ammonia Phenyl M, l, l, 3, 3, 3-hexafluoro, 2,2-bis(4-aminophenyl)-1,1,1,3,3,3_hexafluoropropene, 3 , 3'-diaminodiphenylarylene, 3,4'-diaminodiphenylarylene, 4,4'-diaminodiphenylarylene, 1,3_bis(3-aminophenyl)benzene, 1 , 3-bis(4-aminophenyl)benzene, M-bis(3-aminophenyl)benzene, 1,4-bis(4-aminophenyl)benzene, 1,3-bis(3-aminophenoxy) Benzene, 1,3-bis('aminophenoxy)benzene, 1,4-bis(3-ammonia, phenoxy)benzene, 1,4-bis(4-aminophenoxy)benzene, 1 , 3-bis(3_aminophenylsulfanium)benzene, 1,3-bis(4-phenylphenylsulfonate)benzene, 1,4-bis(4-phenylphenyl sulfide)benzene, 1,3 - bis(3-aminophenylsulfone)benzene, 1,3-bis(4-aminophenylhydrazine)benzene, 1,4-bis(4-aminophenylsulfone)benzene, 1,3-bis(3-aminobenzyl) Benzene, 1,3-bis(4-aminobenzyl)benzene, 1,4-bis(4-aminobenzyl)benzene, 'U-bis(3-amino-4-phenoxyphenylhydrazine)benzene, 3, 3-bis(3-aminost'oxy)biphenyl, 3,3-bis(4- Benzophenidyl, 4,4-bis(3-aminophenoxy)biphenyl, 4,4-bis(4-aminophenoxy)biphenyl, bis [3_ 23 200819501 (3-aminobenzene) Oxy)phenyl]ether, bis[3-(4-aminophenyloxy)phenyl]ether, bis[4-(3-aminophenoxy).phenyl]ether, bis & (4-aminophenoxy) Phenyl] scaly, bis[3-(3-aminophenoxy)phenyl]*one, bis[3-(4-aminophenyloxy)phenyl]one, bis[4_(3-amino-benzene) Oxy)phenyl]one, bis[冬(4-aminophenoxy)phenyl]one, bis[3-(3-amino-p-oxy)phenyl]sulfide, bis[3_('aminophenoxy) Phenyl]sulfinyl-, bis[4·(3-aminophenoxy)phenyl]f, ether, bis[4-aminophenoxy)phenyl]thioether, bis(3-aminophenoxy)benzene飒, bis[3-(4-aminophenoxy)phenyl]anthracene, bis[4-(3-aminophenoxy)phenyl]sulfone, bis[4-('aminophenoxy)phenyl Sulfone, bis[3-(3-aminophenoxy)phenyl]carbazide [> (4-amino)oxy]phenyl]methane, bis[4-(3-aminophenoxy)phenyl] A , bis[4-(4-aminophenoxy)phenyl]methyl, 2,2-bis[3-(3-aminophenoxy)phenyl]propane, 2,2_bis[3- (4_ Aminophenoxy)phenyl]propane, 2,2-bis[(3-aminophenoxy)phenyl]propane, 2,2-biguanide (4-aminophenoxy)benzene J) Propane, 2,2"bis[(3-aminophenoxy)phenyl]-l,l,l,3,3,3-hexafluoropropane, 2,2-bis[3_(4-aminophenoxy) Phenyl]_1,1,1,3,3,3-hexafluoropropane, 2,2-bis[4-(1aminophenoxy)phenyl]yi,3,3,'3_hexafluoropropane, 2 , 2_bis[4-(4-aminophenoxy)phenyl]·mm . hexafluoropropane, and the like. The diamine contained in the raw material of the quinone imine oligomer is cerium or two or more. Examples of the dibasic acid anhydride contained in the raw material of the imine oligomer include maleic anhydride, norbornene anhydride and the like. Alternatively, a compound which forms a benzene ring by three quantifications such as 4 24 200819501 ^^bU^pit ethynylbenzene) phthalic anhydride and 4-(2-ethynyl)phthalic anhydride may also be used. . The solvent contained in the raw material of the quinone imine oligomer is preferably an organic solvent. In the case of an organic solvent, it contains phenol, o-chlorophenol, m-chlorophenol, p-chlorophenol, o-nonylphenol, m-phenol , p-phenol, 2,3-dinonylphenol, 2,4-diphenylphenol, 2,5-xylenol, 2,6-diindol, 3,4-diindol, 3,5-di曱Phenol, N,N-dioxalylamine, N,N-dimercaptoacetamide, N,N-diethylacetamide, N,N-dimercaptomethoxyacetamide, N-dioxafluorene-2-indole: !: ketone, 1,3-dimethyl-2-sodium salindione, N-decyl caprolactam, 1,2-dimethoxy Ethane, bis(2-decyloxyethyl)ether, 1,2-bis(2-decyloxyethoxy)ethane, bis[2-(2-methoxyethoxy)ether, tetrahydrofuran 1, 1,3-dioxane, 1,4-dioxane, pyridine, picolin, dimethyl hydrazine, dimercaptopurine, tetramethylurea, hexamethylenephosphonamide, anisole and the like. These organic solvents may be used singly or in combination of two or more. In the raw material of the quinone imine oligomer, the solvent shown below may further coexist. In the organic solvent that can coexist, it contains benzene, toluene, "o-xylene, m-nonylbenzene, p-xylene, o-chlorophenyl, m-chlorotoluene, p-chlorotoluene, o-bromobenzene, m-bromobenzene , p-bromobenzene, chlorobenzene, bromobenzene, etc. The raw material of the quinone imine oligomer may also contain a catalyst for increasing the ruthenium reaction (described later), for example, an organic catalyst. In the case of an organic alkaline catalyst, it contains triethylamine, tributylamine, triamylamine, N,N-'dimethylaniline, N,N-diethylaniline, pyridine, α-picoline, β ·Picoline, 丫_Picoline, 2,4_二曱吼. Ding, 啥琳, 25 200819501 256U5pit isoquinoline, etc., ideally pyridine, γ-picoline. The content of the catalyst in the raw material of the material is not particularly limited as long as it can substantially increase the polymerization rate, and is, for example, 1 mol with respect to the tetracarboxylic dianhydride, and the content thereof is 0.001 to 0.5 mol. The step of producing the quinone imine oligomer includes (1) reacting a monoamine with a tetracarboxylic dianhydride, and then adding a dicarboxylic anhydride to continue the reaction' or (2) After adding a diamine and a dicarboxylic acid anhydride to react, a tetracarboxylic acid dianhydride component is added to continue the reaction, or (3) a diamine compound, a tetrasodium oxyacid anhydride, and a dicarboxylic anhydride are simultaneously added to cause a reaction. Steps, etc., may also be used in any of the steps. In the case of the quinone imine reaction, it contains hydrazine imidization, chemical hydrazine, and direct thermo-imidization. The raw material is synthesized at a low temperature below 1 〇〇, specifically, at -20 to 70 ° C, preferably at 〇 6 6 ° C to synthesize a quinone imine oligomer precursor, and then, the temperature is raised to I〇〇~2〇(rc is a method in which the oxime is imidized to obtain a quinone imine oligomer. The so-called chemical hydrazine imidization is chemically determined by using a hydrazine imiding agent such as acetic anhydride. The ruthenium imide precursor is subjected to a ruthenium imidization method. On the other hand, the direct hydrazine imidization is a mixture of a diamine, a tetracarboxylic dianhydride, and a dicarboxylic anhydride, followed by an organic base and/or Or rapidly increasing the temperature in the presence or absence of a solvent for azeotropic dehydration, directly causing the reaction system to produce a low S&imine A method for the imidization of a polymer precursor. The reaction time of ruthenium imidation depends on the type of monomer used, the type of solvent, the type of organic base catalyst, the type and amount of solvent for azeotropic dehydration, and 26 200819501 However, as far as the target is concerned, it is the case of j. Direct thermal brewing of imidization, in terms of the target, the water of the Germans reaches the theoretical amount (usually cannot be fully recovered,; 5 = rate). The reaction time is about several hours. In this case, one: the method of removing the water produced by the imidization by a co-agent such as toluene, and the method is quite effective.
44小時,通常為數小 fe亞胺化之反應壓力並無特別限制,通常只要為大 氣壓=可。gf亞胺化反應通常在含空氣、氮、氨、氛、 氬之環境氣體下進行,較好為在惰性氣體之氮及氯之環 境下進行,但並無特別限制。 、醯亞胺低雜之顯所含之單體成分之濃度(聚合 派度)亚恶特別限制,但_般約為1〇〜6〇树%。低於 wt%之情形,有時需要極端長之反應時間,且超過術心 之情形,有原料難以溶解,反應效率不良之虞。聚合 派度,較好為20〜50wt%,更好為3〇〜4〇wt%。 醢亞胺低聚物之分子量與通f之騎合彡聚合物之 分子量之情形相同,可_節_所含之單體成分之莫 耳比加以控制。醯亞胺低聚物之原射,相對於二胺為1 莫耳,含有〇.5〇〜請莫耳之四醜二酐相當重要,更好 為含有㈣〜謂莫耳之四_二酐,特好為含有0·50〜 〇·65莫耳之四紐二酐,最好為含有G.50〜0.60莫耳之四 缓酉文-酐。適且地控制單體成分之比率而製造時,如前 所述’可製造具有理想分子量之醯亞胺低聚物。 200819501 256ϋ5ριί 相對於二胺為丨莫耳之_酸二酐,含有低於〇·興 耳日守5 ^里地產生二胺與二羧酸酐組成之雙醯亞胺, 加熱時之蒸發量會增多,故並不理想。另一方面,超過 • 0.80莫耳日彳’ ϋ分子量增加,會降侧如仙作為可塑 - 劑之情形之可塑化效果,故並不理想。 又I亞胺低聚物之原料所含之二羧酸酐之莫耳數 Μ5與四羧酸二酐之莫耳數Μ3、及二胺之莫耳數綱滿足 以下之數式之關係相當重要。 (Μ4-Μ3) x2xl.〇^M5^ (Μ4-Μ3) χ2χ2.2 較好為滿足(Μ4-Μ3) x2xl.〇-M5S (Μ4—Μ3) χ2χ2·0之關係,更好為滿足(Μ4 —Μ3) χ2χ1·〇^Μ5$ (Μ4—Μ3) χ2χ1·5之關係;較好為滿足(Μ4—Μ3) χ2χ1·0^Μ5$ (Μ4-M3) χ2χ1·2之關係。 、(Μ4-M3) χ2χ1·〇>Μ5時,產生之醯亞胺低聚物會 殘留胺基,加熱時會著色,在外觀上不理想。另一方面, (Μ4— M3) ><2x2.0<]V15時,會多量地產生二胺與二羧酸 I 酐組成之雙醯亞胺,加熱時之蒸發量會增多,並不理想。 聚S&亞胺糸樹脂組成物 本發明之聚驗亞胺系樹脂組成物之特徵在於:包含含 有前述通式(1-1)所示之重複單位與通式(1-2)所示之 重複單位之聚醯亞胺樹脂,以及含有前述通式(2)所示之 醯亞胺低聚物。聚醯亞胺樹脂既可為硬化後之樹脂,亦可 為硬化時產生通式(1-1)所示之重複單位與通式(丨_2) 所示之重複單位之樹脂(聚醯胺酸)。 28 200819501For 44 hours, the reaction pressure of the imidization is usually not particularly limited, and usually it is atmospheric pressure = yes. The gf imidization reaction is usually carried out under an atmosphere of air, nitrogen, ammonia, atmosphere or argon, preferably in the atmosphere of nitrogen and chlorine of an inert gas, but is not particularly limited. The concentration of the monomer component contained in the low-molecular content of the hydrazine imine (polymerization degree) is particularly limited, but is generally about 1 〇 6 〇 % %. In the case of less than wt%, an extremely long reaction time is sometimes required, and in the case of exceeding the heart, there is a problem that the raw material is difficult to dissolve and the reaction efficiency is poor. The degree of polymerization is preferably from 20 to 50% by weight, more preferably from 3 to 4% by weight. The molecular weight of the quinone imine oligomer is the same as the molecular weight of the conjugated polymer of the group, and can be controlled by the molar ratio of the monomer component contained in the section. The original emission of the quinone imine oligomer is 1 mole relative to the diamine, and contains 〇.5 〇~ Please the four ugly dianhydrides of Moer are quite important, and it is better to contain (four) ~ ethical tetra- dianhydride Particularly preferred is a tetra-dianic anhydride containing 0. 50~ 〇·65 moles, preferably containing a G.50-0.60 mole. When it is produced by appropriately controlling the ratio of the monomer components, an yttrium imine oligomer having a desired molecular weight can be produced as described above. 200819501 256ϋ5ριί is a bismuth imide which is a bismuth acetal containing less than 二··············································· Therefore, it is not ideal. On the other hand, an increase in the molecular weight of more than • 0.80 moles 彳 会 will reduce the side of the plastic as a plasticizer, so it is not ideal. Further, the molar number of the dicarboxylic acid anhydride contained in the raw material of the imine oligomer Μ5 and the molar number 四3 of the tetracarboxylic dianhydride and the molar number of the diamine satisfy the relationship of the following formulas. (Μ4-Μ3) x2xl.〇^M5^ (Μ4-Μ3) χ2χ2.2 It is better to satisfy (Μ4-Μ3) x2xl.〇-M5S (Μ4—Μ3) χ2χ2·0 relationship, better to satisfy (Μ4 —Μ3) χ2χ1·〇^Μ5$ (Μ4—Μ3) χ2χ1·5 relationship; better to satisfy (Μ4—Μ3) χ2χ1·0^Μ5$ (Μ4-M3) χ2χ1·2. Μ(Μ4-M3) χ2χ1·〇> Μ5, the resulting quinone imine oligomer will leave an amine group, which will be colored when heated, and is not ideal in appearance. On the other hand, when (Μ4—M3) ><2x2.0<]V15, a large amount of bisinimide composed of a diamine and a dicarboxylic acid I anhydride is generated, and the amount of evaporation upon heating increases. ideal. The poly-S-imine resin composition of the present invention is characterized by comprising a repeating unit represented by the above formula (1-1) and a formula represented by the formula (1-2). The repeating unit of the polyimine resin and the quinone imine oligomer represented by the above formula (2). The polyimine resin may be either a hardened resin or a repeating unit represented by the formula (1-1) and a repeating unit represented by the formula (丨_2) when cured (polyamide). acid). 28 200819501
UbiDpir 在聚醯亞胺系樹脂組成物中,相對於前 份,前述通式(2)所示之酸亞胺低聚物 為3有5重里伤以上、100重量份以下,更好為含有職 份以上、90重量份以下,.最料含有戰量份以上、 r 量份以下。聚輕賴脂與酿亞胺低聚物之轉在 圍内時,《亞胺系_組成物之玻_移溫度變得充= 低’使用於需要低溫接著性之金屬積層體之情形特別: 用。另外,使聚酸亞胺系樹脂組成物硬化而作為膜及 情形’可降低其脆度’相當理想。 使本發明之聚醯亞胺系樹脂組成物硬化而使用作為挽 性印刷基板用之積層體或接著薄片之樹脂層之情形,聚萨 亞胺系樹脂組成物之玻璃轉移溫度以在1〇〇t以上、3〇〇< 以下之範n為佳。另外,從實現在低溫條件下之接著之 點百之,以100〜240 c為佳,1〇〇〜2〇〇〇c更佳。 本發明之聚醯亞胺系樹脂組成物在不損及本發明之目 的之範_ ’可包含其他任意之熱錄樹脂等。 —在任意之熱塑性樹脂之例中,含有聚乙稀、聚丙稀、 聚氯乙稀、聚偏二氯乙稀、聚丁二稀、聚苯乙歸、聚醋酸 乙烯酉旨:ABS樹脂、聚對苯二甲酸丁二醇醋、聚對苯二甲 酸乙二醇s旨、聚苯ϋ、聚碳酸§旨、PTFE、赛珞路、聚丙稀 酉欠酉s來醚腈、聚酏胺、聚硬、聚醚颯、聚醚酮、聚苯硫 醚、聚Sf輕胺、聚輕胺、改㈣苯驗聚醯亞胺等。 ^在任意之熱塑性樹脂之例中,含有熱硬化性聚丁二 烯甲醛树脂、胺基樹脂、聚氨酯、矽樹脂、SBR、、 29 200819501 25605pif 不飽和聚酯、環裊士士 ^ 醯亞胺等。 对知、#氰酸酯、酚醛樹脂及聚雙馬來 可依目的,蚀1 性樹脂藉由適者旦、Θ人或2種以上之熱塑性樹脂及熱可硬化 脂組成物,錢合金化而包含於㈣亞胺系樹 & 並無特別限定,可適用習知之方法。 在不缺本發明之目的之範圍内,也可 =物=各種填充劑或添加劑。在填充“添加 ^例中3有石墨、碳化矽、石粉、二硫化鉬、氟李榭 脂等耐磨損性烊%% 一卜 匕知氣糸树 性辦強,·、η + 二氧化銻、碳酸鎂、碳酸約等難燃 々曰六,陶土、雲母等電氣特性增強劑;石棉、二氧化 L、石墨等耐漏電性增強劑;硫酸鋇、二氧化碎、石夕酸詞 荨耐酸性增輸、鋅粉、姉、銅粉雜傳導度增 強劑;其他_細珠、_球、滑石、㈣土、氧化紹、 ,微粒土、、,水合氧“、金屬氧化物、著色料及顏料等。 混合方法並無特別限制,可適用習知之方法。 、本發明之聚醯亞胺系樹脂組成物,也可使包含含有前 述通,(3_1)所*之重複單位及前親^ (3_2)所示之 重複單位之聚醯胺酸(醯亞胺前驅物),以及與前述通式 (2)所不之醯亞胺低聚物之溶液之聚醯胺酸醯亞胺化,且 使醯亞胺《物反應而獲得。醯亞胺㈣物係使末端之雙 鍵彼此聚合而不可逆地高分子化。醯亞胺低聚物之聚合物 可利用IR確認雙鍵之存在而加以檢測。 尤其,將含有聚醒胺酸(酿亞胺前驅物)與酿亞胺低 聚物之溶液之塗佈膜加熱乾燥等而除絲劑,且使其酿亞 30 200819501 25605ριί 胺反應而硬化時,可獲得膜或層狀之聚醯亞胺系樹脂組成 物。 含有聚醯胺酸與醯亞胺低聚物之溶液之溶劑並無特別 - 限制,但較好為非質子性極性溶劑,更好為非質子性醯胺 系溶劑。具體上,可例示Ν,Ν-二曱替甲醯胺、ν,Ν-二甲基 乙醯胺、Ν,Ν-二乙基乙醯胺、Ν,Ν_:甲基甲氧基乙醯胺、 Ν_二曱基士吡咯烷酮、二曱基_2_咪唑啉二酮等。 含有聚醯胺酸與醯亞胺低聚物之溶液之黏度並無特別 限制。例如,使用E型黏度計在25它測定之黏度為100〜 20,000 mPa · s之範圍時,欲塗佈該溶液時,較容易控制塗 佈厚度。 ι 對含有聚醯胺酸與醯亞胺低聚物之溶液熱處理時,會 發生聚胺酸之醯亞胺化及醯亞胺低聚物彼此之反應,而 成為聚醯亞胺系樹脂硬化物。熱處理之壓力通常只要使用 大氣壓即已充分足夠,但也可在加壓下進行。熱處理之環 境氣體並無特別限制,通常為空氣、氮、氦、氖、氬,較 ^ 好為惰性氣體之氮及氬。 又,在含有聚si胺酸與酿亞胺低聚物之溶液中,基於 促進、或抑制熱處理所進行之交聯反應,或控制其反應速 度之目的,也可添加觸媒等之添加物。觸媒之例中,包括 含有叙、鍺、銦或錯之金屬觸媒;含有翻、猛、鎳、錢、 鈷、鉻、鐵、銅、錫或鉑等之過渡金屬觸媒;及磷化合物、 矽化合物、氮化合物或硫化合物等。 又,在含有聚si胺酸與醯亞胺低聚物之溶液中,基於 31 200819501 ^^OUDpll 同樣目的,也可施行紅外線、紫外線或α、線等放射 線、電子線及X線之照射,以及電漿處理或摻雜處理。UbiDpir In the polyimine-based resin composition, the acid imine oligomer represented by the above formula (2) is 3 or more, more than 100 parts by weight, more preferably 100 parts by weight, based on the former. It is more than 90 parts by weight, and most preferably contains more than a part by weight and less than a part of r. When the light-weight lysine and the brewing imine oligomer are rotated, the "imine-based composition of the imine-based composition becomes charged = low" is used in the case of a metal laminate requiring low-temperature adhesion. use. Further, it is preferable to cure the composition of the polyamicimide resin to form a film and to reduce the brittleness. In the case where the polyimine-based resin composition of the present invention is cured and a laminate of a laminate for a printed substrate or a resin layer for a sheet is used, the glass transition temperature of the polysamino resin composition is 1 Torr. t above, 3 〇〇 < The following range n is better. Further, from the point of achieving the next low temperature condition, 100 to 240 c is preferable, and 1 〇〇 to 2 〇〇〇 c is more preferable. The polyilylimine-based resin composition of the present invention may contain any other thermal recording resin or the like without impairing the object of the present invention. - In the case of any thermoplastic resin, it contains polyethylene, polypropylene, polyvinyl chloride, polyvinylidene chloride, polybutylene, polystyrene, polyvinyl acetate. ABS resin, poly Butylene terephthalate phthalate, polyethylene terephthalate s, polyphenyl hydrazine, polycarbonate, PTFE, celluloid, polypropylene oxime s to ether nitrile, polyamine, poly Hard, polyether oxime, polyether ketone, polyphenylene sulfide, poly-Sf light amine, poly-light amine, modified (tetra) benzene poly-imine. ^ In the case of any thermoplastic resin, it contains thermosetting polybutadiene formaldehyde resin, amine resin, polyurethane, enamel resin, SBR, 29 200819501 25605pif unsaturated polyester, 袅 袅 ^ ^ 醯 imide, etc. . For the purpose of knowing, #cyanate, phenolic resin, and polybamazet, the etchable resin may be alloyed by a suitable resin, a thermoplastic resin, or a thermosetting resin composition. The (iv) imine tree & is not particularly limited, and a conventional method can be applied. It is also possible to use various fillers or additives within the scope of the object of the present invention. In the case of filling "additional example 3, there are graphite, carbonized niobium, stone powder, molybdenum disulfide, fluorolipid, etc., etc. 耐%%% 一 匕 匕 性 性 性 性 性 η η η η η η η 二, magnesium carbonate, carbonic acid, etc., non-flammable 々曰6, clay, mica and other electrical property enhancers; asbestos, dioxide L, graphite and other leakage resistance enhancer; barium sulfate, dioxide, ash acid, acid resistance Increased transmission, zinc powder, antimony, copper powder hetero-conductivity enhancer; other _ fine beads, _ ball, talc, (four) soil, oxidation,, particulate soil,, hydrated oxygen, metal oxides, coloring materials and pigments, etc. . The mixing method is not particularly limited, and a conventional method can be applied. The polyamidene-based resin composition of the present invention may also comprise a polyaminic acid (an imine) containing a repeating unit represented by the above-mentioned (3_1)* and a repeating unit represented by the former parent (3_2). The precursor, and the polyphosphonium amide of the solution of the quinone imine oligomer of the above formula (2) are imidized, and obtained by reacting the quinone imine. The quinone imine (four) system polymerizes the terminal double bonds and polymerizes irreversibly. The polymer of the quinone imine oligomer can be detected by confirming the presence of a double bond by IR. In particular, when a coating film containing a solution of polyamidomic acid (bromoimine precursor) and a brewing imine oligomer is heated and dried to remove a silking agent, and it is hardened by reacting with an amine of 30 200819501 25605ριί, A film or layered polyimine-based resin composition can be obtained. The solvent containing the solution of the polyamic acid and the quinone imine oligomer is not particularly limited, but is preferably an aprotic polar solvent, more preferably an aprotic melamine solvent. Specifically, it can be exemplified by hydrazine, hydrazine-dioxime for meglumine, ν, Ν-dimethylacetamide, hydrazine, hydrazine-diethylacetamide, hydrazine, hydrazine: methyl methoxy acetamide Ν 曱 曱 曱 曱 曱 曱 咯 咯 咯 、 、 、 、 、 。 。 。 。 。 。 。 。 。. The viscosity of the solution containing the polyamido acid and the quinone imine oligomer is not particularly limited. For example, when an E-type viscometer is used in a range of 100 to 20,000 mPa · s in which the viscosity is measured, it is easier to control the coating thickness when the solution is to be applied. ι When heat-treating a solution containing a polyaminic acid and a quinone imine oligomer, a ruthenium imidization of polyamine and a reaction of the quinone imine oligomers occur, and the polyimine-based resin is cured. . The pressure of the heat treatment is usually sufficient as long as atmospheric pressure is used, but it can also be carried out under pressure. The ambient gas to be heat-treated is not particularly limited, and is usually air, nitrogen, helium, neon, or argon, and is preferably an inert gas of nitrogen and argon. Further, in the solution containing the polysilic acid and the brewing imine oligomer, an additive such as a catalyst may be added for the purpose of promoting or suppressing the crosslinking reaction by the heat treatment or controlling the reaction rate. Examples of catalysts include metal catalysts containing arsenic, antimony, indium or erroneous; transition metal catalysts containing tumbling, violent, nickel, money, cobalt, chromium, iron, copper, tin or platinum; and phosphorus compounds , hydrazine compounds, nitrogen compounds or sulfur compounds. Further, in the solution containing the polysilic acid and the quinone imine oligomer, irradiation of infrared rays, ultraviolet rays, α, rays, and the like, and electron beams and X-rays may be performed for the same purpose as 31 200819501 ^^OUDpll, and Plasma treatment or doping treatment.
本發明之聚醯亞胺系樹脂組成物也可形成膜。為了形 成膜,只要將含有聚醯胺酸與醯亞胺低聚物之溶液塗佈在 基材,而使所得之塗膜脫溶劑化及醯亞胺化反應而硬化 後,由基材加以剝離即可。在基材之例中,含有金屬箔或 玻璃等無機基板、或聚合物膜等。又,對基材之塗佈只要 利用塗佈機等進行即可。塗佈厚度受到含有聚 醯胺酸與醯 亞胺低聚物之溶液之固形份濃度所影響,脫溶劑化及醯亞 月女化反應後(也就是說,「硬域」)之㈣亞胺系樹脂 硬化物之膜厚以1 mm以下為宜。 贶浴劑化及亞胺化(也就是說,「硬化」)之方法 3=別_ ’只要在減壓下,或在氮、氦、氬等惰性環 广:下進灯即可。又,只要設定於使用之溶劑之濟點以 /^醯亞胺化反應進行之溫度以上即可,例如使用非質子 糸酿胺溶劑之倩形,只龙少ΟΛΑ。 、 亞胺化所〇以上即可。脫溶劑化及酿 分足夠。 寸別限制,通常只要2小時,即已充 2·金屬積層體 本I明之金屬積層體包含金續 體中包含1層或2層以上之料』屬i屬積層 声係由太癸昍夕取舻 树月日層。其中之一層以上之樹脂 二/^&亞胺系翻旨組成物之硬化物(又稱掏 形成W Α °金屬積層體絲好具有雜亞胺膜、 形成於««胺.單㈣雙蚊雜麵層、及積層 200819501 25605pif 於該聚輕胺層之-方或兩方之域層;接觸於金屬層之 聚醒亞胺層係由前述之本發明之聚輕胺祕脂組成物之 硬化物所構成。 樹脂層 如前所述,本發明之金屬積層體包含1層或2層以上之 聚酸亞胺娜層,射之丨層以上之細層係由本發明之聚 酸亞胺系娜組成物之硬化物所構成。含#2層以上之聚酸 亞胺樹脂層之情形’較好的是鄰接之層係由成分互異之聚 亞胺所構成。所謂聚酸亞胺之成分減,係指單體單位 之種類及/或含量相異之意。又,構成單層之雜亞胺層或 多層之聚酸亞胺層之層的至少巧,也可由2種以上之層之 聚酿亞胺賴奴組祕(混合物)所賴。 " /也就疋5兒,構成金屬積層體之聚醯亞胺層為單層之情 开二。亥層係由本發明之聚酿亞胺系樹脂組成物之硬化物所 ,成。另—方面’構成金屬積層體之聚醯亞胺層為多声之 ί形接==亞:!獻單面或雙面之多層聚‘層 ;盈_層之♦鉍亞胺層係由本發明之聚醯亞胺系 =月曰,成物之硬化物所構成之層。上述係為了提高與金屬 曰之讀性之故。接觸於金屬層之聚醯亞 =广_下’較好為。以上、1〇_=為 更好為0·1μηι以上、5μηι以下。 -厚:太=金屬積層體之聚醯亞胺層(單層或多層)之 =度,:,剛性會增強,而不能使用於需要彎曲等之 切日调衫卿能錢雜及操作财面使用之 33 200819501 限制。 為:b上金積層體所含之聚酿亞胺層之厚度合計較好 為3,以上、75μιη以下,更好為1〇师以上、 =好 之厚度在上述__,金騎層體且有⑦续 性、柔賴、作業冊異且縣低廉之傾向。〜,’,巴緣 聚醯亞胺膜 $如前所述,金屬積層體可具有聚酿亞胺膜、 醯,贿之單面或雙面之聚酿亞胺層、及積層於該聚酿= 二曰:之-方或兩方之金屬層。該金屬積層體所含之聚酿 ΐ膜ΓΤ為使塗佈非熱雜魏亞胺之前驅體乾燥而得之 J·生取妒可為市f之雜錄城亞賴。在市售之非敎塑 胺膜中,含有優匹列克斯s、優匹列克斯SG:: 】克斯SN (宇部興產株式會社f,註冊商標/商品 合私制aptonH、Kapton v、KaP_EN (東麗•杜邦株式 二二,註冊商標/商品名)、Apieal AH、ApkaiNpi、細㈤ ί, 朱式會社kaneka製,註冊商標/商品名)等。 主屬積層體所含之前述雜亞賴使用㈣之 亞胺膜之情形,其厚度通常為3,以上、75_ = 亞胺^為!.5哗以上、4〇哗以下之範圍。又,前述聚酿 、為使塗佈非熱塑性聚醯亞胺之前驅體乾燥而形成之 二、’其厚度為G.l_以上、卿m以下,較好為〇·5陣以 5μΠΐ以下,更好為0.5,以上、16,以下。 金屬層 “蜀%層體所含之金屬層並無特別限制,可選擇自銅 34 200819501 256ϋ3ριί 及銅合金、不銹鋤Β甘 叙;5叙人八μ鋼及金、鎳及鎳合金(亦含42合金)、 声。入^ ^寺之金屬層,較好為銅或銅合金之層、不銹鋼 可將金屬箔貼合於樹脂層而形成,也可利用 ;x明之聚醯亞胺系樹脂組成物所形成之樹脂 層。 你m 積層體所含之金屬層之厚度只要可將金屬積層體 使用作為膠帶之厚度,並無特別限制,通常為0·1_以上、 150μιη以下’較好為2μιη以上、丨m以 十、—,特好為一以上、3一以下,最子t3 = 上、12μιη以下之範圍。 金屬積層體之製法 本發明之金屬積層體只要在不損及本發明之效可 =地參,知之金屬積層體之製法加以製造’並無特別 限制。例如,可利用如以下之方法製造。 、、⑴加熱壓接單層或多層之聚醢亞胺膜與金屬箱之方 法0 / (2)將聚㈣㈣樹齡成物之清漆 使其乾燥之方法。 ,、至屬ν白後 以金屬層作為最外層之方式積層下列積層體:⑴ 次積層體U)、與下列積層體⑴或積層體(ii 脂層彼此相接疊合而積層)之方法·· ' ,層體⑴:僅在加熱壓接單層或多層之聚酿亞胺膜 /、孟屬箔而得之僅有一方之面具有金屬層之積層體。、 35 200819501 25605pif 積層體(11 :r㈣乾燥-===積漆 可 伯使用於金屬積層體之製造之金屬羯並無特別限制, 使用習知之金屬箔。在金屬噹 不鉉人八# 〃屬咱之例中,含有銅及銅合金、The polyimine-based resin composition of the present invention can also form a film. In order to form a film, a solution containing a polyamido acid and a quinone imine oligomer is applied to a substrate, and the obtained coating film is desolvated and yttrium imidized to be hardened, and then peeled off from the substrate. Just fine. In the example of the substrate, an inorganic substrate such as a metal foil or glass, or a polymer film or the like is contained. Further, the application to the substrate may be carried out by using a coater or the like. The coating thickness is affected by the solids concentration of the solution containing the polyamido acid and the quinone imine oligomer, after the desolvation and the sub-monthly reaction (that is, the "hard domain") The film thickness of the cured resin is preferably 1 mm or less. Method of bathing and imidization (that is, "hardening") 3 = No _ ' As long as it is under reduced pressure, or in an inert atmosphere such as nitrogen, helium or argon: the lamp can be turned down. Further, it is sufficient to set the temperature of the solvent to be used at a temperature higher than the temperature at which the imidization reaction is carried out. For example, the use of an aprotic amine solvent is only a few. The imidization can be above. Desolvation and brewing are sufficient. The limit of the inch is usually 2 hours, that is, the metal layered body of the present invention contains a metal slab containing one or more layers of the gold continuum. Eucalyptus moon layer. One of the above layers of resin II / ^ & imine is the hardening of the composition of the composition (also known as 掏 formation of W Α ° metal laminated body wire with a good imine film, formed in «« amine. Single (four) double mosquito a surface layer and a layer of 200819501 25605pif on the square layer of the polylight amine layer; or the layer of the polyamidamine contacting the metal layer is hardened by the aforementioned polylight amine secret lipid composition of the present invention The resin layer is as described above, and the metal laminate of the present invention comprises one or more layers of a polyamic acid imide layer, and the fine layer above the ruthenium layer is formed by the polyacid imide system of the present invention. The cured product of the composition is composed of a layer of a polyacid imide resin layer having a thickness of #2 or more. Preferably, the adjacent layer is composed of a polyimine having mutually different compositions. The composition of the so-called polyimine is reduced. , means that the type and/or content of the monomer units are different. Further, at least the layer of the monoimine layer or the multi-layered polyimide layer of the plurality of layers may be composed of two or more layers. It is based on the secret of the mixture of the imine and the genus. The layer is a single layer. The layer of the layer is formed by the hardened material of the polyaniline resin composition of the present invention. In other respects, the layer of polyimine which constitutes the metal laminate is multi-voiced.接==亚:! A single-layer or double-sided multilayer poly' layer; the yttrium layer of the yttrium layer is a layer composed of the polyimide of the present invention = a sputum, a cured product of the product. In order to improve the readability with the metal ruthenium, it is preferable to contact the metal layer of the metal layer = _ _ lower. The above, 1 〇 _ = is more preferably 0·1 μηι or more, 5 μηι or less. : too = the thickness of the polyimine layer (single layer or multi-layer) of the metal laminate, :, the rigidity will be enhanced, and it can not be used for the need to bend and so on. 33 200819501 Restriction: The total thickness of the polyimine layer contained in the gold layer on b is preferably 3 or more, 75 μmη or less, more preferably 1 〇 or more, = good thickness in the above __, gold Riding the layer body and having 7 continuity, soft lasing, workbooks and low county tendency. ~, ', Barry Polyimide film $ as mentioned above, metal product The body may have a poly-imine film, a crucible, a single-sided or double-sided polyimide layer, and a metal layer laminated on the square or both sides. The ΐ ΐ 含 ΓΤ ΓΤ ΓΤ ΓΤ 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布Included with Optimex s, Optimex SG:: 克斯 SN (Ube Industries, Ltd. f, registered trademark / commodity private system aptonH, Kapton v, KaP_EN (Toray Dupont model 22 , registered trademark / trade name), Apieal AH, ApkaiNpi, fine (five), Zhu-style club kaneka system, registered trademark / trade name). In the case where the imine film of (4) is used in the above-mentioned laminated body, the thickness thereof is usually 3 or more, and 75_ = imine is in the range of .5 Å or more and 4 Å or less. Further, the above-mentioned polymer is formed by drying the non-thermoplastic polyimide, and the thickness thereof is G.l_ or more, and the thickness is not more than 5, and preferably less than 5 μΠΐ. More preferably 0.5, above, 16, or below. Metal layer "The metal layer contained in the layer is not particularly limited, and can be selected from copper 34 200819501 256ϋ3ριί and copper alloy, stainless steel Gansu; 5 Syrian eight steel and gold, nickel and nickel alloy (also Containing 42 alloy), sound. The metal layer of ^^ Temple, preferably a layer of copper or copper alloy, stainless steel can be formed by bonding a metal foil to a resin layer, and can also be used; x Ming polyimine resin The resin layer formed by the composition. The thickness of the metal layer contained in the m-layered body is not particularly limited as long as the metal laminate can be used as the thickness of the tape, and is usually 0·1_ or more and 150 μm or less. 2μιη or more, 丨m is tens, -, particularly preferably one or more, 3 or less, and the most sub-t3 = upper, 12μηη or less. Method for Producing Metal Laminate The metal laminate of the present invention does not impair the present invention The effect = the ground ginseng, the method for producing the metal laminate is not particularly limited. For example, it can be produced by the following method. (1) Heating and crimping a single layer or a plurality of layers of a polyimide film and a metal case Method 0 / (2) will be poly (four) (four) tree age The method of drying the varnish to form a layered body in the form of a metal layer as the outermost layer: (1) the secondary layered body U), and the following laminated body (1) or laminated body (ii the lipid layer is connected to each other) Method of laminating and laminating) ·, 'Layer body (1): A laminate having a metal layer only on the surface of only one of the heat-treated single-layer or multi-layered polyiminoimide film/menor foil. , 35 200819501 25605pif Laminates (11: r (4) Drying -=== Accumulation of paints The metal crucibles used in the manufacture of metal laminates are not particularly limited, and the metal foils of the conventional use are used. In the case of bismuth, it contains copper and copper alloys.
合金(亦含42合金)、銘及紹合 =寺之金屬層’較好為銅_合金、或不軸。金屬唱之 ^只f:,:乍為膠帶之厚度,並無特別限制,通常為 以上、150_以下,較好為2陣以上、15〇陣以下, ^好為3陣以上、5〇陴以下,特好為以上、%降以下, =好、ΐ2μηι以下之範圍。製造金屬積層體之 :’塾接金Um亞闕之表面也可被騎電聚處理 或電暈放電處理。 、々製造本發明之金屬制體之際之加麵接只要利用以 ,等為熱狀加減介質加_加熱之金屬輥、或以橡膠 等鍍覆金屬輥表面之輥間施以層壓之方法、或利用熱壓機 之方法等施行即可。前者適合於連續之輥製品之製造,後 者適合於切片狀之散張製品之製造,可適宜地依用途加以 利用。 ^又,加熱壓接只要在空氣、氮、氬等之氣體環境下施 订即可。加熱溫度需要熱塑聚醯亞胺之玻璃移轉溫度以上 之溫度,較好為比玻璃移轉溫度高約2〇。〇以上之溫度,通 系為100〜400°C,較好為只要在150〜300。(:之間施行即 可。又,加熱時間較好為〇.01秒以上、15小時以下,加熱 36 200819501 25605pif 壓力只要御.l〜„a之關印可飞,吊^5〜ι〇ί^。 又,在加熱壓接後,基於進-步提高金屬積層體之密 接力之目的,也可利用高壓釜等施行後處理。後處理係以 如以下之條件進行。後處理溫度通常為15〇〜4〇〇它, 為2⑻〜^:,處_間為!分〜5〇小時,壓力為常^〜 3MPa之耗圍。南壓爸裝置内較好為真空或以氮或 氣體取代,以防止金屬箔之氧化。 、月14 在本發明之金屬積層體之製造方法中 聚麵系樹脂組成物之清漆(含有聚酸亞胺酸】=! ,聚物之溶液)之情形,可利用輥式塗佈機、口‘ = 機、凹版塗佈機、浸潰塗佈機、喷霧 ς ==、括條塗佈機等一般的塗佈裝置= 可依β^之黏度及塗佈厚度適宜選擇。 土 塗佈後之㈣亞㈣樹脂組成物 地利用以電氣加熱或油加熱之熱風或^ 2可適宜 金屬箱之氧化引起之變色之目的,必之變質、及 外’::氮、氬或氫等氣體取代乾燥環境氣體可在空氣以 塗佈後之聚醯亞胺系樹脂組成物之ί、=: 60〜6啊之溫度範时 燥較好在 止在乾燥中由塗膜起 ^幵皿度而進行。如此,可防 獲得膜厚均句:=:或在纖之膜表面產生凹凸, # / 尺寸穩定性更為優異之樹妒勝 胲之形成而言,相當理想 二,故對絕緣 度適宜選擇即可。 / /、要以〇·05〜500分程 200819501 25605pif 接者薄片 本發明之接著薄片係具有樹脂膜、形成於 早面或雙面之本發明之樹餘成物之硬所之 層。所謂樹顧,可.例示f知之樹 2成之树脂 ^好為了.料之聚酸亞胺膜。有關在樹脂膜 又面形成樹脂層之方法,也無㈣限制,好 5 金屬積層體之製造方法所示,利用 =剛述之 之清漆之塗佈及乾燥加以形成t ^亞㈣樹脂組成物 [實施例] 以下,依據實施例及比較例更詳細地說明本發明。 發明之範圍不因此而受任何限定及解釋。 在實施例及比較例中,是依照下列方法來測定各物 聚醯胺酸之評估 Ο對數黏度(rjinh):將聚醯胺酸清漆添加至 曱基乙醯胺溶劑中,而將固形份濃度調整至0.5岁出後,在 設定於35°C之恆溫槽内加以測定。 2) E型黏度··使用E型黏度計(r〇1〇5A,東機產業 株式會社)在25°C—定之條件下,以3。錐形旋轉器測定。 酿亞胺低聚物之評估 Ο對數黏度(riinh)·•將醯亞胺低聚物添加至n,N-二 曱基乙醯胺溶劑中,而將醯亞胺低聚物固形份濃度調整至 〇·5 g/dl。而且,將其溶液調整至35°C而測定對數黏度。 38 200819501 25605pif 2) 分子量(重量平均分子量Mw,數平均分子量Μη): 利用Shodex公司製GPCsystem-21H系列(檢測器:RI,擴 展觸媒:四氫吱喃,流速:1 ml/min,柱溫度:40°C )加 以測定。 3) 玻璃轉移溫度(Tg):利用島津製作所(株式會社) 製熱分析裝置DSC60系列,在含氮環境氣體下測定。 聚酸亞胺系樹脂組成物之評估 1 )玻璃轉移溫度(Tg ):利用島津製作所株式會社製 熱分析裝置DSC60系列,在含氮環境氣體下測定。 2) 去膠渣(desmear)速度:將聚醯胺酸溶液塗佈在玻 璃板上,在含氮環境氣體下,以30(TC加熱4小時而製作聚 醯亞胺膜。切下取出6x2 cm2之大小之試樣,作為測定用試 樣。蝕刻液,係混合MACUDAIZAR 9275 (日本MacDermid 公司製)50g、MACUDAIZAR 9276 (曰本MacDermid公司 製)50ml及離子交換水成為整體1公升所調製而成。將試 樣浸潰於蝕刻液中15分鐘後,沖洗、使其乾燥,由浸潰前 後之重量變化算得去膠渣速度。 3) 揮發性:相對於聚醯胺酸固形份1〇〇重量份,將醯 亞胺低聚物33重量份添加至聚醯胺酸清漆而調製溶液,使 其流延至玻璃基板上。將在含氮環境氣體下以24〇〇c加熱15 分鐘所得之膜剝離,切成5 cm見方。將此膜放入玻璃器皿, 而在含氮環境氣體下以280°C加熱30分鐘後,冷卻至室溫。 以目視觀察附著於玻璃器皿上蓋之析出物之量,而以〇(無 39 200819501 25605pif 析出物)、△(稍有析出物)、X (幾乎全面地有析出物)之 基準加以評估。 金屬積層體之評估 . 1) 剝離強度:依據jISC_6471測定。準備平行於金屬 箔之流動方向的長5〇 mm、寬! mm的試樣,在23。〇、相對The alloy (also containing 42 alloy), Ming and Shaohe = the metal layer of the temple is preferably copper-alloy or non-axis. Metal sings only f:,: 乍 is the thickness of the tape, there is no particular limitation, usually above, 150_ or less, preferably 2 or more, 15 以下 or less, ^ good for 3 or more, 5 〇陴In the following, it is particularly preferable that the above is less than or equal to %, and that the range is lower than ΐ2μηι. To make a metal laminate: 'The surface of the gold Um yttrium can also be treated by electrocoagulation or corona discharge. And the method of adding the surface of the metal body of the present invention by using a metal roll or a metal roll coated with a rubber or the like, or a method of laminating between the rolls of the surface of the metal roll by rubber or the like. Or by using a hot press method or the like. The former is suitable for the manufacture of continuous roll products, and the latter is suitable for the manufacture of sliced loose articles, which can be suitably used depending on the application. ^ Further, the heating and crimping may be carried out in a gas atmosphere such as air, nitrogen or argon. The heating temperature requires a temperature above the glass transition temperature of the thermoplastic polyimine, preferably about 2 Torr above the glass transition temperature. The temperature above 〇 is 100 to 400 ° C, preferably 150 to 300. (: between the implementation can be. Also, the heating time is better than 01.01 seconds or more, 15 hours or less, heating 36 200819501 25605pif pressure as long as the Royal.l~„a seal can fly, hang ^5~ι〇ί^ Further, after the heat and pressure bonding, the post-treatment may be performed by an autoclave or the like for the purpose of further improving the adhesion of the metal laminate. The post-treatment is carried out under the following conditions. The post-treatment temperature is usually 15 Torr. ~ 4 〇〇 it, for 2 (8) ~ ^:, at _ between: minutes ~ 5 〇 hours, the pressure is normal ^ ~ 3MPa consumption. The South pressure dad device is preferably vacuum or replaced by nitrogen or gas, to Oxidation of the metal foil is prevented. In the case of the method for producing a metal laminate of the present invention, in the case of a varnish (containing a polyacid imidic acid) of the surface resin composition (a solution of a polymer), a roll can be used. Coating machine, port '= machine, gravure coater, dip coater, spray ς ==, strip coater, etc. General coating device = suitable for β-viscosity and coating thickness The earth (4) sub- (four) resin composition is coated with hot air or electric heating by electric heating or oil heating. Suitable for the purpose of discoloration caused by oxidation of the metal box, must be deteriorated, and the external ':: nitrogen, argon or hydrogen gas instead of dry ambient gas can be coated with air after the coating of the polyimine resin composition, =: 60~6 The temperature of the temperature is better when the drying is carried out by the coating film. Therefore, it is possible to prevent the film thickness from being uniform: =: or the surface of the film is uneven. # / The better dimensional stability of the tree is better than the formation of the 妒 胲 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , Then, the sheet has a resin film and a hard layer formed on the early or both sides of the tree of the present invention. The so-called tree, can be exemplified by the resin of the tree of 2, which is good for the material. Acid imine film. There is no (4) limitation on the method of forming a resin layer on the resin film. The method of manufacturing the metal laminate is shown by the coating and drying of the varnish just described. (4) Resin composition [Examples] Hereinafter, according to Examples and Comparative Examples, The invention is not limited by the scope of the invention. In the examples and comparative examples, the evaluation of the poly-proline is determined according to the following method: logarithmic viscosity (rjinh): The acid varnish was added to the mercaptoacetamide solvent, and the solid content was adjusted to 0.5 years old, and then measured in a thermostat set at 35 ° C. 2) E-type viscosity · · E-type viscometer (r〇1〇5A, Toki Sangyo Co., Ltd.) was measured at a temperature of 25 ° C under a condition of 3. Cone rotator. Evaluation of yttrium oligomers Ο logarithmic viscosity (riinh) · • The amine oligomer was added to the n,N-dimercaptoacetamide solvent, and the solid concentration of the quinone imine oligomer was adjusted to 〇·5 g/dl. Further, the solution was adjusted to 35 ° C to measure the logarithmic viscosity. 38 200819501 25605pif 2) Molecular weight (weight average molecular weight Mw, number average molecular weight Μη): GPCsystem-21H series manufactured by Shodex Co., Ltd. (Detector: RI, extended catalyst: tetrahydrofuran, flow rate: 1 ml/min, column temperature : 40 ° C) was measured. 3) Glass transition temperature (Tg): The product was measured under a nitrogen-containing atmosphere using a DSC60 series of a thermal analysis device manufactured by Shimadzu Corporation. Evaluation of the composition of the polyimine-based resin 1) The glass transition temperature (Tg): It was measured under a nitrogen-containing atmosphere using a thermal analysis device DSC60 series manufactured by Shimadzu Corporation. 2) Desmear speed: The polyaminic acid solution was coated on a glass plate, and a polyimide film was prepared by heating at 30 °C for 4 hours under a nitrogen-containing atmosphere. Cut and remove 6x2 cm2. The sample of the size was used as a sample for measurement. The etching solution was prepared by mixing 50 g of MACUDAIZAR 9275 (manufactured by Japan's MacDermid Co., Ltd.), 50 ml of MACUDAIZAR 9276 (manufactured by MacDermid Co., Ltd.), and ion-exchanged water to a total of one liter. The sample was immersed in the etching solution for 15 minutes, rinsed, dried, and the desmear speed was calculated from the change in weight before and after the dipping. 3) Volatility: 1 part by weight relative to the polyglycolic acid solid portion 33 parts by weight of the quinone imine oligomer was added to the polyamic acid varnish to prepare a solution, which was cast onto a glass substrate. The film obtained by heating at 24 ° C for 15 minutes under a nitrogen-containing atmosphere was peeled off and cut into 5 cm square. The film was placed in a glassware, and heated at 280 ° C for 30 minutes under a nitrogen-containing atmosphere, and then cooled to room temperature. The amount of precipitates adhering to the lid of the glassware was visually observed, and evaluated based on 〇 (no 39 200819501 25605 pif precipitates), Δ (slightly precipitated), and X (almost completely precipitated). Evaluation of metal laminates 1) Peel strength: measured according to jISC_6471. Prepare a length of 5〇 mm and width parallel to the flow direction of the foil! The sample of mm is at 23. 〇, relative
濕度50%的環境下使金屬箔成9〇度的角度,以剝離速度5〇 mm/min從絕緣層剝離,測定其應力。 2) 焊料耐熱溫度:依據IPC-TM_650 (The institutefeThe metal foil was placed at an angle of 9 in an environment of a humidity of 50%, and peeled off from the insulating layer at a peeling speed of 5 〇 mm/min, and the stress was measured. 2) Solder heat resistance temperature: according to IPC-TM_650 (The institutefe
InterC()nnecting and Packaging Electronic Circuits ) N 〇·2·4·13測定。在24(rc至34(rc之間每隔1〇t,以不發生 膨脹及金屬與聚醯亞胺界面變色之最高溫度作為焊料ς熱 溫度。試樣使用在8VC、相對濕度85%之環境下保存48 時之試樣。 化學結構之確認,係使用日本電子株式會社製之核磁 共振(NMR)裝置ΕΧ4⑽加以確認。 實施例及比較例中使用之溶劑、二胺、四緩酸二肝、 二羧酸酐之簡稱如以下所述: — 1) 溶劑: DMAc : Ν,Ν-二甲基乙醯胺 2) 二胺: ΑΡΒ : 1,3-雙(3-氨苯氧基)苯、 APB-R ·· 1,3-雙(4-氨苯氧基)笨、 m-BP : 4,4’-雙(3-氨苯氧基)聯笨、 200819501 25605pif 3) 四羧酸二酐 BTDA · 3,3’,4,4’-二苯甲酮四羧酸二酐、 DSDA :雙(3,4-二羧基苯基)磺酸二酐、 ODPA :雙(3,4-二羧基苯基)醚二酐、 BPDA : 3,3’,4,4’-聯苯四羧酸二酐、 PMDA :苯均四酸二酐、 4) 二羧酸酐: MA :馬來酸酐 NDA :降冰片烯酸酐 [合成例1-1] 聚醯胺酸清漆的合成 在具有攪拌機及氮導入管的容器中,裝入DMAc (991g)作為溶劑後,於此裝入APB ( 146.25g)、APB-R (61.39g)而在至溫擾拌至溶解為止。接著,褒入btda (219.92g),在50 c擾拌6小時,而得聚酿胺酸清漆。 所獲得的聚醯胺酸清漆之聚醯胺酸固. 為祕,龍減編响,坑+调=為= [合成例1-2〜M5] 除了變更_酸二酐、二胺之種類及料 所示者二外,與合成例丨同樣地合成聚酸胺 與合成例1 一併揭示於表1。 將…果 41 200819501;InterC()nnecting and Packaging Electronic Circuits ) N 〇·2·4·13 determination. At 24 rc to 34 (every 1 〇 between rc, the maximum temperature at which no expansion and metal-polyimine interface discoloration occurs as the solder heat temperature. The sample is used in an environment of 8 VC and 85% relative humidity. The sample was stored for 48 hours. The chemical structure was confirmed by a nuclear magnetic resonance (NMR) apparatus ΕΧ 4 (10) manufactured by JEOL Ltd. The solvent, diamine, and tetrazoic acid used in the examples and comparative examples were used. The abbreviation of dicarboxylic anhydride is as follows: — 1) Solvent: DMAc : Ν, Ν-dimethylacetamide 2) Diamine: ΑΡΒ : 1,3-bis(3-aminophenoxy)benzene, APB -R ··1,3-bis(4-aminophenoxy) stupid, m-BP: 4,4'-bis(3-aminophenoxy) phenyl, 200819501 25605pif 3) tetracarboxylic dianhydride BTDA · 3,3',4,4'-benzophenone tetracarboxylic dianhydride, DSDA: bis(3,4-dicarboxyphenyl)sulfonic acid dianhydride, ODPA: bis(3,4-dicarboxybenzene Ether dianhydride, BPDA: 3,3',4,4'-biphenyltetracarboxylic dianhydride, PMDA: pyromellitic dianhydride, 4) Dicarboxylic anhydride: MA: maleic anhydride NDA: norbornene Alkene anhydride [Synthesis Example 1-1] Synthesis of polyamic acid varnish In a vessel having a stirrer and a nitrogen introduction tube, DMAc (991 g) was charged as a solvent, and then APB (146.25 g) and APB-R (61.39 g) were placed therein, and the mixture was stirred until dissolved. Next, btda (219.92 g) was poured in, and the mixture was stirred at 50 c for 6 hours to obtain a polyamic acid varnish. The obtained polyamic acid varnish obtained by polyamic acid glutamate. The secret is reduced, the pit + modulation = = [Synthesis Example 1-2~M5] except for the change of the type of acid dianhydride and diamine The synthesis of the polyamic acid in the same manner as in the synthesis example is shown in Table 1 together with the synthesis example 1. Will... fruit 41 200819501;
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/IV J!ds9s 〔om/om〕 a/v fe 01/0 01/0 Ui 寸/9 (n/8 0/01 0/01 0/01 0/01 0/01 0/01 0/0 ΐ 0/01 0/0 ΐ 0/01 vasa vasa vasa vasa vasa valOQ valPQ valm vaHs valCQ ValPQ ValOQ vaia vaHa vaia ValCQ ValCQ vaxa n丨i 寸ϊ丨l ει丨i (NI 丨 i I,i ow 6 二 8丨一 ΖτΙ 9丨1 彳一 tI £丨1 <Ν丨 I I丨一 200819501 256U5pif [合成例2-1] 醯亞胺低聚物的合成 在j有攪拌機、氮導入管、抽出器、冷卻器及 之k瓶中,裝入APB (29.23g,〇1〇m〇1)、〇DpA ( 15 〇,〇5Π^、馬來酸肝(以下稱MA) (11.77g,0.12m〇1)、$/IV J!ds9s [om/om] a/v fe 01/0 01/0 Ui inch/9 (n/8 0/01 0/01 0/01 0/01 0/01 0/01 0/0 ΐ 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 ΖτΙ 9丨1 彳一tI £丨1 <Ν丨II丨一200819501 256U5pif [Synthesis Example 2-1] Synthesis of quinone imine oligomers in J has a mixer, nitrogen introduction tube, extractor, cooler and In the k bottle, APB (29.23g, 〇1〇m〇1), 〇DpA (15 〇, 〇5Π^, maleic acid liver (hereinafter referred to as MA) (11.77g, 0.12m〇1), $
作為容η]之DMAc ( 132g )、作為脫水共沸溶劑之曱笨 (42g)。。其後,攪拌此溶液,一面通以氮氣,一面加熱至 130+〜135%。在内溫達到13(rc附近之同時,發生甲笨與水 之蒸,。利用冷卻器將該等之一部分凝縮而以抽出器將水 與:苯分離後,僅使甲苯回流至系統内,將一部分與流通 之氮氣同時由冷卻管上部蒸餾至系統外。 方e行7小時反應後,冷卻反應容器,停止聚合反應。 將反應混合物裝入於甲醇中而使醯亞胺低聚物析出後,利 用曱醇加以洗淨。其後,在氮氣流通下,以9〇。〇使其乾燥 12小時而得39.59g的醯亞胺低聚物(產率78%)。所得之醯 亞胺低聚物之對數黏度帀汕為〇.〇7dl/g,GPC測定之數平均 分子量(以下稱Μη)為2100,重量平均分子量(以下稱 ]^\¥)為3100,分子量分佈之指標之多分散度]^^舰11為1.5。 為確認所得之醯亞胺低聚物的結構,可透過NMR、 FD-MS測疋確$忍已產生具有目的結構之酿亞胺低聚物。此 酉&亞私低聚物之DSC測定的Tg為118°C。將此酿亞胺低聚物 以濃度40wt%在室溫下混合至DMAc的結果,可迅速溶解。 [合成例2-2〜2-7] 43 200819501 25605pif 除了變更四羧酸二酐、二胺之種類成為表2所示者以 外,與合成例16同樣地施行醯亞胺低聚物之合成、評估。 將結果與合成例2-1—併揭示於表2。 •[合成例2-8] . 在具有攪拌機、氮導入管、抽出器、冷卻器及溫度計 之燒瓶中,裝入APB ( 29.23g,O.lOmol)、〇DPA ( 15 51g 0.05mol)、NDA (9.85g,0.06mol)及作為溶劑之DMAc’ P (163g)。 搜拌所得之溶液,一面通以氮氣,一面加熱至。 在内溫達到160°c附近之同時,發生少量之DMAc與水之蒸 發。利用冷卻器將該等之一部分凝縮而以抽出器將其抽 出,將一部分與流通之氮氣同時由冷卻管上部蒸餾至系統 外。2小時後,將NDA (9.85g,0.06mol)裝入反應器内, 再加熱4小時。其後,冷卻反應容器,停止聚合反應。 將反應混合物裝入於曱醇中而使醯亞胺低聚物析出 後’利用曱醇加以洗淨。其後,在氮氣流通下,以9〇°c使 G 洗淨物乾燥12小時而得41.81g之醯亞胺低聚物(產率 73%)。所得之醯亞胺低聚物之對數黏度dl/g, GPC測定之數平均分子量Mn^1500,重量平均分子量Mw 為2100,分子量分佈之指標之多分散度。 為確認所得之醯亞胺低聚物的結構,可透過NMR、 FD-MS測定確認已產生具有目的結構之醯亞胺低聚物。此 醯亞胺低聚物之DSC測定之Tg為120°C。將此醯亞胺低聚 物以濃度40wt%在室溫下混合至DMAc之結果,可迅速溶 44 200819501 2560$pif 解。 [合成例2-9〜2-14] 除了變更四羧酸二酐、二胺之種類成為表2所示者以 外,與合成例2-6同樣地施行醯亞胺低聚物之合成、評估。 將結果匯總揭示於表2。 [合成例2-15及2_16] 〇 成, 雙醯亞胺之合成 利用日本特開平4_99764號公報所記載之方法加以合 並施行評估。將結果匯總揭示於表2。 45 200819501DMAc (132g) as a η] and 曱 (42g) as a dehydrated azeotropic solvent. . Thereafter, the solution was stirred and heated to 130 + - 135% while passing nitrogen gas. At the same time that the internal temperature reaches 13 (the vicinity of rc, the steaming of water and water is caused. After the part is condensed by a cooler and the water is separated from the benzene by the extractor, only the toluene is returned to the system, and A part of the nitrogen gas is distilled from the upper part of the cooling pipe to the outside of the system at the same time. After the reaction for 7 hours, the reaction vessel is cooled to stop the polymerization reaction. After the reaction mixture is charged in methanol to precipitate the ruthenium oligomer, This was washed with decyl alcohol, and then dried under a nitrogen atmosphere for 9 hours to obtain 39.59 g of a quinone imine oligomer (yield 78%). The logarithmic viscosity of the substance is 〇.〇7dl/g, the average molecular weight (hereinafter referred to as Μη) measured by GPC is 2100, and the weight average molecular weight (hereinafter referred to as ^^¥) is 3100, and the dispersion of the molecular weight distribution index is ] ^^ Ship 11 is 1.5. In order to confirm the structure of the obtained quinone imine oligomer, it can be confirmed by NMR and FD-MS that the brewed imine oligomer having the desired structure has been produced. The Tg of the sub-private oligomer has a Tg of 118 ° C. The brewing imine oligomer is at a concentration of 4 0 wt% was mixed with DMAc at room temperature, and it was rapidly dissolved. [Synthesis Example 2-2 to 2-7] 43 200819501 25605pif In addition to the modification of the type of tetracarboxylic dianhydride and diamine, it is shown in Table 2. The synthesis and evaluation of the quinone imine oligomer were carried out in the same manner as in Synthesis Example 16. The results are shown in Table 2 in the same manner as in Synthesis Example 2-1. • [Synthesis Example 2-8] The mixer and the nitrogen introduction tube were provided. In a flask of extractor, cooler and thermometer, APB (29.23 g, 0.1 mol), 〇DPA (15 51 g 0.05 mol), NDA (9.85 g, 0.06 mol) and DMAc' P (163 g) as a solvent were charged. The resulting solution is heated to the side while passing nitrogen gas. While the internal temperature reaches 160 ° C, a small amount of DMAc and water evaporation occurs. One part of the condensate is condensed by the cooler to the extractor. The mixture was withdrawn and a portion of the nitrogen gas was distilled from the upper portion of the cooling tube to the outside of the system. After 2 hours, NDA (9.85 g, 0.06 mol) was charged into the reactor and heated for another 4 hours. Thereafter, the reaction vessel was cooled. The polymerization reaction was stopped. The reaction mixture was charged in methanol to precipitate the ruthenium oligomer. After that, it was washed with decyl alcohol. Thereafter, the G washing material was dried at 9 ° C for 12 hours under a nitrogen gas flow to obtain 41.81 g of a quinone imine oligomer (yield 73%). The logarithmic viscosity dl/g of the quinone imine oligomer, the number average molecular weight Mn 1500 measured by GPC, the weight average molecular weight Mw is 2100, and the polydispersity of the molecular weight distribution index. The structure was confirmed by NMR and FD-MS to confirm that an imine oligomer having a desired structure was produced. The Tg of this quinone imine oligomer was determined to be 120 ° C by DSC. The quinone imine oligomer was mixed to DMAc at a concentration of 40% by weight at room temperature to rapidly dissolve the solution of 200820081501 2560$pif. [Synthesis Example 2-9 to 2-14] Synthesis and evaluation of the quinone imine oligomer were carried out in the same manner as in Synthesis Example 2-6 except that the type of the tetracarboxylic dianhydride or the diamine was changed as shown in Table 2. . A summary of the results is disclosed in Table 2. [Synthesis Examples 2-15 and 2_16] The synthesis of bis-imine was carried out by a method described in JP-A-H07-99764. A summary of the results is disclosed in Table 2. 45 200819501
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VM VOM VON VON VOM VON VOM VOM VON VIMvsvs vs VPMvs VPM sv OQdvde_s PHa丨日 jg-m sv svaPHv sv dCQ丨 sdm-s s丨日 sv PQdv sv rndv vom vas vdQo vasPH vsa vais vdao valm vas vso v_d vais vadOQ vdaoVM VOM VON VON VOM VON VOM VOM VON VIMvsvs vs VPMvs VPM sv OQdvde_s PHa丨 jg-m sv svaPHv sv dCQ丨 sdm-s s丨 sv PQdv sv rndv vom vas vdQo vasPH vsa vais vdao valm vas vso v_d vais vadOQ vdao
91 丨(N tnI 丨<N 寸 T<N ει 丨<N (NI 丨(N Π·(Ν 01 丨<N 6—(n 00丨<N L,z 9丨3 a 丨<N 寸丨<N s z丨τ I 丨<N 200819501 25605pif [實施例1] 在具有攪拌機、氮導入管及溫度計之燒瓶中,裝入人 成例1-1所得之聚醯胺酸清漆、合成例2-1所得之酸亞胺^ 聚物,而相對於聚醯胺酸清漆中之聚醯胺酸固形份1〇〇重旦 份,使醯亞胺低聚物含有33重量份。 加熱至4 0 °C並混合而裝入D M A c,獲得e型黏度叶中之 黏度為100〜1000之淡褐色透明之溶液。流延所得之溶液而 得之膜的Tg為177°C。又,依序前述程序測定之去膠洁速 度為2ug/cm2/min,揮發性試驗之評估為〇。 其次’在市售之聚醯亞胺樹脂膜(東麗•杜邦株式备 社製、商品名:Kapton 100EN)之雙面,利用輥式塗佈機 塗佈上述溶液,以70°C施行乾燥5分,l〇〇t:施行乾燥2分, 140 C施行乾燥2分,180°C施行乾燥2分,220°C施行乾燥1〇 分,乾炼後之厚度為4μηι。如此獲得在樹脂膜雙面積層聚 醯亞胺系樹脂組成物之聚醯亞胺絕緣膜。 將銅箔(古河Circuit FoH株式會社製、商品名·· 、厚9μιη)直接疊合於所得之絕緣膜之聚醯亞胺系 树脂硬化物層,而利用被覆石夕橡膠之輥式層壓機,在 240C、壓力1·4 MPa之條件下使其貼合。其後,利用溫度 3f°C、含氮環境氣體下之批式高壓蒼施行4小時之退火而 亞胺金屬積層體。聚邮胺金屬積賴之剝離強度 為咖跑’焊料耐熱溫度為3靴。 [實施例2〜29] 47 200819501 25605pif 、除了將聚醯胺酸清漆、醯亞胺低聚物之種類變更為表 3^A或表3B所不者以外,與實施例丨同樣地施行聚醯亞胺系 =月曰組成物之合成及評估,再製作及評估賴亞胺金屬積 層體。將結果揭示於表3A或表3B。 、 [比較例1]91 丨(N tnI 丨<N inch T<N ει 丨<N (NI 丨(N Π·(Ν 01 丨<N 6—(n 00丨<NL,z 9丨3 a 丨< N inch 丨<N sz丨τ I 丨<N 200819501 25605pif [Example 1] In a flask equipped with a stirrer, a nitrogen introduction tube, and a thermometer, the polyamic acid varnish obtained in Example 1-1 was placed. The acid imine oligomer obtained in Synthesis Example 2-1 was contained in an amount of 33 parts by weight based on the weight fraction of the polyamic acid in the polyamic acid varnish. The DMA c was mixed at 40 ° C and mixed to obtain a pale brown transparent solution having a viscosity of 100 to 1000 in the e-type viscosity leaf. The film obtained by casting the obtained solution had a Tg of 177 ° C. According to the above procedure, the degreasing speed was 2 ug/cm2/min, and the volatility test was evaluated as 〇. Next, the commercially available polyimine resin film (Dolly DuPont Co., Ltd., trade name: On both sides of Kapton 100EN), the above solution was applied by a roll coater, and dried at 70 ° C for 5 minutes, l〇〇t: dry 2 minutes, 140 C dry 2 minutes, 180 ° C dry 2 Points, 220 ° C to dry 1 dryness, and the thickness after drying is 4 μm. Thus, a polyimide film having a double-layered polyimide composition of a resin film is obtained. The copper foil (manufactured by Furukawa Circuit FoH Co., Ltd., trade name) ···、厚9μηη) directly laminated on the obtained polyimine-based resin cured layer of the insulating film, and using a roll-type laminator coated with Shishi rubber, under conditions of 240 C and a pressure of 1.4 MPa After that, it is annealed with a batch of high-pressure argon at a temperature of 3f ° C and a nitrogen-containing atmosphere for 4 hours, and the imide metal laminate is used. The temperature is 3 boots. [Examples 2 to 29] 47 200819501 25605pif, except that the types of polyamic acid varnish and quinone imine oligomer are changed to those of Table 3A or Table 3B, and Examples 丨Similarly, the synthesis and evaluation of the polyamidene-based ruthenium composition were carried out, and the lysine metal laminate was fabricated and evaluated. The results are disclosed in Table 3A or Table 3B. [Comparative Example 1]
—除了不使用醯亞胺低聚物以外,與實施例1同樣地施 仃life亞胺系樹脂組成物之合成及評估,再製作及評估聚 醯亞胺金屬積層體。將結果揭示於表3A。 [比較例2及3] 除了將聚醯胺酸清漆、含有交聯性基之添加劑之雙酸 ",之種類變更為表3B所示者以外,與實施例〗同樣地施 =酸亞胺系翻旨組成物之合纽評估,再製作及評估聚 齪亞胺金屬積層體。將結果揭示於表3B。- The synthesis and evaluation of the composition of the life imine resin composition were carried out in the same manner as in Example 1 except that the quinone imine oligomer was not used, and the polyimine metal laminate was produced and evaluated. The results are disclosed in Table 3A. [Comparative Examples 2 and 3] The acid imine was applied in the same manner as in the Example except that the type of the polyamic acid varnish and the diacid having the crosslinkable group-containing additive was changed to those shown in Table 3B. The evaluation of the composition of the composition of the composition, the production and evaluation of polyimine metal laminates. The results are disclosed in Table 3B.
48 200819501 f J!ds9s 【νε ί 焊料耐 献 溫度rc ) 340 340 340 340 300 340 340 300 320 300 330 320 300 290 〇 On (N 300 320 剝離強度 [kN/m ] 0000000000^00000 » •攀》 *»··«*··« r—^ r—Η τ—H f—^ τ—^ r—^ (N 〇 OC 〇 Ο 1 揮發性 試驗 〇〇〇〇〇〇〇〇〇〇〇〇〇〇 〇 〇 < 去膠渣速度 〔pg/cm2/min ] ? \ 1 i 寸 ^ V \_f 177 168 172 196 205 182 172 185 165 155 180 182 186 190 cn Ο (N 〇 0\ IT) ^ Η % ^ 锲 巧侧 100/33 100/33 100/33 100/33 100/33 100/33 100/33 100/33 100/33 100/33 100/33 100/33 100/33 100/33 100/0 100/11 100/150 通式⑵ 之1 r-H τ—Η τ-^Η τ—Η τ—Η ι—Η τ—Η τ—Η r—^ τ—Η r—Η r-H τ—Η 1 ,丨1 1 < r~H 醯亞胺低聚 物 合成例2-1 合成例2-1 合成例2-1 合成例2-1 合成例2-1 合成例2-1 合成例2-1 合成例2-1 合成例2-1 合成例2-1 合成例2-1 合成例2-1 合成例2-1 合成例2-1 1 合成例2-1 合成例2-1 聚醯胺酸 合成例Μ 合成例1-2 合成例1-3 合成例1-4 合成例1 -5 合成例1-6 合成例1-7 合成例1-8 合成例1-9 合成例1-10 合成例1_11 合成例1-12 合成例1-13 合成例1-14 合成例1-15 合成例1-1 合成例1 -1 實施例1 實施例2 實施例3 實施例4 實施例5 實施例6 實施例7 實施例8 實施例9 實施例10 實施例11 實施例12 實施例13 實施例14 比較例1 Η τ«·Η 6寸 200819501 〔。。〕ir?i〔 S/S〕 _| 〔.££/p5/3ZL〕〔。。〕 〔玉¥侧〕 審鉍绰鍩ftifg /拿染一一一^鍩饍龄 寸寸寸寸寸寸寸寸寸寸寸寸 寸 〇〇〇〇〇〇〇〇〇〇〇〇 ο • »»»#···»«♦» » ,丨· ! ( 气 I ( ψ i < , — i' < v-丨— f 崎 f H t_ 1 i 〇〇〇〇〇〇〇〇〇〇〇〇〇 τ τ τ τ ζ τ ζ τ τ ζ e τ ζ48 200819501 f J!ds9s [νε ί solder resistance temperature rc ) 340 340 340 340 300 340 340 300 320 300 330 320 300 290 〇 On (N 300 320 peel strength [kN/m ] 0000000000^00000 » • Pan” * »··«*··« r—^ r—Η τ—H f—^ τ—^ r—^ (N 〇OC 〇Ο 1 Volatile test〇〇〇〇〇〇〇〇〇〇〇〇〇〇 〇〇< Desizing speed [pg/cm2/min] ? \ 1 i inch ^ V \_f 177 168 172 196 205 182 172 185 165 155 180 182 186 190 cn Ο (N 〇0\ IT) ^ Η % ^ Smart side 100/33 100/33 100/33 100/33 100/33 100/33 100/33 100/33 100/33 100/33 100/33 100/33 100/33 100/33 100/0 100 /11 100/150 Formula 1 (2) 1 rH τ—Η τ—^Η τ—Η τ—Η ι—Η τ—Η τ—Η r—^ τ—Η r—Η rH τ—Η 1 ,丨1 1 < r~H 醯imino oligomer Synthesis Example 2-1 Synthesis Example 2-1 Synthesis Example 2-1 Synthesis Example 2-1 Synthesis Example 2-1 Synthesis Example 2-1 Synthesis Example 2-1 Synthesis Example 2 -1 Synthesis Example 2-1 Synthesis Example 2-1 Synthesis Example 2-1 Synthesis Example 2-1 Synthesis Example 2-1 Synthesis Example 2-1 1 Synthesis Example 2-1 Synthesis Example 2-1 Polyamine Synthesis Example Synthesis Example 1 2 Synthesis Example 1-3 Synthesis Example 1-4 Synthesis Example 1 - 5 Synthesis Example 1-6 Synthesis Example 1-7 Synthesis Example 1-8 Synthesis Example 1-9 Synthesis Example 1-10 Synthesis Example 1_11 Synthesis Example 1-12 Synthesis Example 1-13 Synthesis Example 1-14 Synthesis Example 1-15 Synthesis Example 1-1 Synthesis Example 1 - 1 Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Example 7 Example 8 Example 9 Example 10 Example 11 Example 12 Example 13 Example 14 Comparative Example 1 Η τ «·Η 6 inch 200819501 [.]ir?i[ S/S] _| [.££/p5/3ZL] [.] [Jade ¥ side] Review ftifg / get dyed one by one ^ 鍩 龄 inch inch inch inch inch inch inch inch inch inch inch inch inch •ο • »»»#· ··»«♦» » , 丨· ! ( gas I ( ψ i < , — i' < v-丨 — f 崎 f H t_ 1 i 〇〇〇〇〇〇〇〇〇〇〇〇〇τ τ τ τ ζ τ ζ τ τ ζ e τ ζ
寸001 ΖΟΟΙ <ΝοοΙ ZL\ S 6卜一 LLA ecoI 181 oool oz/i PI eil eil §oi §οϊ §01 §01 eil eii iol iol rnsoi §01 1Inch 001 ΖΟΟΙ <ΝοοΙ ZL\ S 6 Buyi LLA ecoI 181 oool oz/i PI eil eil §oi §οϊ §01 §01 eil eii iol iol rnsoi §01 1
./IV J!ds9s 【S <】 Η·(Νί#^φ U 丨<Νί4^φ <Νϊ-(Νί4^φ π-(Νί#^φ Οΐ 丨(Ν^^φ 3 OC丨(Νί#^φ ΖΓΓΝΙί卷噠命 9 丨<Νί#^φ ς 丨<Νί4^φ 寸丨2:苳噠^ 3 ϊ丨I冢噠命 1丨1 ί#^φ I丨 I ίφ^φ ϊ 丨 ίί4^φ ϊ 丨一 ί#^φ ι 丨 u#^4 I丨一 ί#^φ I 丨I ί4^φ I丨I革噠令 I丨一ί4^φ I 丨ϊ^^φ Ϊ丨I ί4^φ 6<Nf#^_ ocrsli# 嫁 # 9<Ni#^·s f#德㈣ 寸(Nf杳键^ eCNIf在衮 # <N(Nf#^· ιΓΝΙί冬嫁取 宕苳衮# 61罢嫁取 81革嫜取 ZJi#鸯取./IV J!ds9s [S <] Η·(Νί#^φ U 丨<Νί4^φ <Νϊ-(Νί4^φ π-(Νί#^φ Οΐ 丨(Ν^^φ 3 OC丨(Νί#^φ ΖΓΓΝΙί卷哒命9 丨<Νί#^φ ς 丨<Νί4^φ inch丨2:苳哒^ 3 ϊ丨I冢哒命1丨1 ί#^φ I丨I ίφ^ Φ ϊ 丨ίί4^φ 丨 丨一ί#^φ ι 丨u#^4 I丨一ί#^φ I 丨I ί4^φ I丨I leather 哒 I丨一ί4^φ I 丨ϊ^^φ Ϊ丨I ί4^φ 6<Nf#^_ ocrsli# Marriage #9<Ni#^·sf#德(四) 寸(Nf杳键^ eCNIf在衮# <N(Nf#^· ιΓΝΙί冬嫁取宕苳衮# 61 strikes to take 81 leather to take ZJi#
ο寸Γηs X τ d 8— ο 9Ι·<Νί4^<πΙ-ΙΜ5Φ^ si ο芝__5 X τ 091 81/001 0 ςΙ-<Ν¥^φΙ-Ι ί#^φ^ SS 200819501 25605pif 如表3所示,可知:使用不含醯亞胺低聚物之樹脂組 成物(比較例1)製造之金屬積層體之剝離強度較差。故有 時作為接著劑之性能不充分。 又,可知:含有雙醯亞胺以取代醯亞·胺低聚物之樹脂 ,成物(比較例2及3)之揮發性試驗之評估結果較差,曝 露於高溫度環境時,組合物之一部分(被認為是雙醯亞胺) 有昇華之虞。Γ inchΓηs X τ d 8— ο 9Ι·<Νί4^<πΙ-ΙΜ5Φ^ si ο芝__5 X τ 091 81/001 0 ςΙ-<Ν¥^φΙ-Ι ί#^φ^ SS 200819501 25605pif As shown in Table 3, it was found that the metal laminate produced by using the resin composition containing no quinone imine oligomer (Comparative Example 1) had poor peel strength. Therefore, sometimes the performance as an adhesive is insufficient. Further, it can be seen that the resin containing bisinimide to replace the quinone-amine oligomer has a poor evaluation result of the volatility test of the products (Comparative Examples 2 and 3), and is exposed to a high temperature environment as part of the composition. (Thinking to be a bismuth imine) There is a sublimation.
另一方面,如實施例1〜14所示,含有合成例M〜1 〜14所彳于之聚醯胺酸清漆中之一與醯亞胺低聚物之樹脂組 成物之揮H极之評估較高,使用此所製造之金屬積層 ,之剝離強度也相當充分。χ,如實施例15及16所示,不 =屬胺酸_份與醯亞胺低聚物之量比如何,本發明之 Τ/酉:亞私系树月曰組成物均顯示優異之物性,但聚醯胺酸固 形伤之里比過南(醯亞胺低聚物過少)時,剝離強度有劣 虞,fe亞胺低聚物之量比過高時,揮發性試驗之評估 有降低之虞。 〜又,如,施例17〜29所示,含有聚醯胺酸與合成例2_2 所付之醯亞胺低聚物中之一之樹脂組成物之揮發 驗之評估也較高,使用其所製造之金屬積層體之剝 強度也相當充分。 [產業上之可利用性] f么明之聚醯亞胺系樹脂組成物可使用於耐熱性 卩職缺半導難裝等。 【圖式間早說明】 益 51 200819501 25605pif 【主要元件符號說明】 益 /η、On the other hand, as shown in Examples 1 to 14, the evaluation of the H-pole of the resin composition containing one of the polyamic acid varnishes of the synthesis examples M to 1 to 14 and the quinone imine oligomer was carried out. Higher, using the metal laminate produced by this, the peel strength is also quite sufficient. χ, as shown in Examples 15 and 16, the ratio of the amount of the amide group to the quinone imine oligomer is not the same, and the Τ/酉: subtropical tree 曰 composition of the present invention exhibits excellent physical properties. However, when the poly-proline acid solid-shaped wound is less than the south (the yttrium oligomer is too small), the peel strength is inferior, and when the amount of fe-imine oligomer is too high, the evaluation of the volatility test is lowered. After that. Further, as shown in Examples 17 to 29, the evaluation of the volatility test of the resin composition containing one of the polyaminic acid and the quinone imine oligomer of Synthesis Example 2-2 is also high, and the use thereof is also high. The stripping strength of the fabricated metal laminate is also quite sufficient. [Industrial Applicability] The composition of the polyimine-based resin of f-Ming can be used for heat-resistance, blame, and refractory. [Description between the schemas] Benefit 51 200819501 25605pif [Key component symbol description] Benefit / η,
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TWI585156B (en) * | 2012-06-07 | 2017-06-01 | 三井化學股份有限公司 | Polyimide resin composition, film, adhesive and component |
CN112940251A (en) * | 2021-02-05 | 2021-06-11 | 西南科技大学 | Polyimide lubricating material under wide temperature range and preparation method thereof |
TWI817931B (en) * | 2016-08-03 | 2023-10-11 | 日商日產化學工業股份有限公司 | laminated body |
TWI821171B (en) * | 2017-01-27 | 2023-11-11 | 日商積水化學工業股份有限公司 | Curable resin composition, adhesive, imine oligomer, imine oligomer composition, and hardener |
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JP6949357B2 (en) * | 2016-07-20 | 2021-10-13 | ユニチカ株式会社 | Method for Producing Terminal Maleimided Oligoimide |
KR102501343B1 (en) * | 2017-01-27 | 2023-02-17 | 세키스이가가쿠 고교가부시키가이샤 | Curable resin composition, cured product, adhesive, adhesive film, coverlay film, flexible copper-clad laminate, and circuit board |
EP3778693A4 (en) | 2018-03-28 | 2021-12-22 | Sekisui Chemical Co., Ltd. | CURING RESIN COMPOSITION, ADHESIVE, ADHESIVE FOIL, CIRCUIT SUBSTRATE, INTERLAYER INSULATION MATERIAL AND CIRCUIT BOARD |
CN114685986B (en) * | 2020-12-25 | 2023-06-06 | 中国科学院化学研究所 | Polyimide film with good heat resistance, transparency and thermal conductivity |
CN114685987B (en) * | 2020-12-25 | 2023-05-16 | 中国科学院化学研究所 | Preparation method and application of polyimide film |
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TWI817931B (en) * | 2016-08-03 | 2023-10-11 | 日商日產化學工業股份有限公司 | laminated body |
TWI821171B (en) * | 2017-01-27 | 2023-11-11 | 日商積水化學工業股份有限公司 | Curable resin composition, adhesive, imine oligomer, imine oligomer composition, and hardener |
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