201100970 六、發明說明： 【發明所屬之技術領域】 本發明係有關一種曝光機之曝光顯影技術，旨在提供 -種可對曝光平台之特定區域進行曝光作業，相對較不會 產生聚熱現象，以及可以降低設備體積及成本之曝光 以及與其相關之曝光方法。 【先前技術】 〇 按 般印刷电路板或半導體晶片在進行曝光顯影製 程時’係先在被加工物表面上塗上一層光阻，再藉由光源 之照射將原稿上之電路佈線圖案映射至被加工物表面之光 阻層上/以使光阻層的化學性質因光源的照射而產生變 化’然後再利用去光阻劑將被光源照射過的光阻或未 ，的絲自被加工物表面去除，以形成對應於原稿之^ 〇 其巾執料絲f彡加卫製程之曝光機基本結構 圖所*主要具有—由機殼11構成之曝光室12， =設有-可相對進出曝光室12之曝光平台13，而且至 I晋該：ίΪ 12内部相對應於曝光平台13之上方或下方 平14;請㈣參照第二圖所示，該曝光 台:整體曝光物20與原稿(圖略Μα σ 3並藉由一組線性滑執15進出曝光室 16° 1光平台13連同被加卫物及原稿進人曝光室12至 疋〜够一般必須在曝光室12内部停留-段時間(約3 和不#)使被加工物射光源組Η之曝光光源照射， 201100970 待完成曝光之後再由曝光平台13將被加工物送出。 由於，一般習用曝光機多係採用曝光平台13停滯在曝 光室12内部的方式進行曝光作業，因此多係在其光源組 14設有大量採用陣列配置方式的燈泡141，藉以形成涵蓋 整個曝光平台13之平行光源；在大量燈泡141同時運作 下，將使機殼11内部產生嚴重之聚熱現象，需另外用水冷 系統散熱，致使設備成本偏高。 另有一種習用曝光機係透過複眼裝置將燈泡之光線修 0 正為所需之平行光及面積大小’其動作方式乃係讓光源燈 泡透過橢圓鏡將光線利用一組第一反射鏡投向複眼裝置使 其光線均勻化，再利用一組第二反射鏡將光線改變前進方 向，最後利用一組凸透鏡將光線修正為所需之平行光及面 積大小，進而投射出所須之曝光先源’並藉以減少燈泡之 數量。 如此之設計不但使整體曝光機之結構趨於複雜，且整 體曝光機之體機亦相對更趨龐大；再者，其同樣係採用涵 Q 蓋整個曝光平台之曝光光源對被加工物進行曝光顯影； 惟，在實際之曝光顯影製程中，並非所有被加工物之曝光 區域皆與曝光平台相當，亦即整個曝光平台之某些區域並 不需要被曝光光源照射，因此過度浪費許多不必要之加工 成本。 【發明内容】 有鑒於此’本發明之主要目的即在提供一種可對曝光 平台之特定Εΐ域進行曝光作業’相對較不會產生聚熱現 象，以及可以降低設備體積及成本之曝光機，以及與其相 5 201100970 關之曝光方法。 為達上揭目的’本發明之曝光機係具有一曝光平台供 承載被加工物及原稿，另於曝光平台上方處設有至少一光 源組用以產生朝向曝光平台照射曝光光源，該光源組並可 依照預設之路徑位移。 於實施時，曝光平台的兩個相對應侧係分別設有一第 一線性滑執，另有至少一第二線性滑軌跨設於兩個第一線 性滑軌之間，該光源組即配設於該至少一第二線性滑執 〇亡，以及，設有一第一驅動組件用以帶動第二線性滑執沿 著第一線性滑軌位移，設有第二驅動組件用以帶動光源組 沿著所屬第二線性滑軌位移。透過光源組沿著所屬第二滑 執位移，以及第二線性滑軌沿著第一線性滑軌位移的方 式，讓曝光光源到達曝光平台之預定區域，而對曝光平台 上的被加工物進行曝光顯影。 具體而言’本發明係具有下列功效： —1.用以產生曝光效果之光源係可以為單點光源，而非 ❹:盍整，曝光平台之大面積㈣，故可大幅減少光源組之 燈泡數量，相對縮減整體曝光機之體積，以及相對降低設 備成本。 ^所使用之控制電路可在曝光光源到達預定行程時， 再行調升光源組之功率，故可相對降低整體曝光機之聚執 現象。 士上3.整體曝光機，係可配合被加工物之規格變動，而適 f調整光驗之行程設定，可大幅提升曝光機之適用性及 實用性。 4.光源組僅通過曝光平台需要被曝光光源照射之區 6 201100970 域，因此不會浪費不必要之加工成本。 【實施方式】 〜本發明之特點，可參閱本案圖式及實施例之詳細說明 而獲得清楚地瞭解。 ^本發明旨在提供一種可對曝光平台之特定區域進行曝 光作業’相對較不會產生聚熱現象，m可以降低設備體 積及成本之曝光機，以及與其相關之曝光方法；其曝光方 Ο 士係首先在一供承載被加工物及原稿之曝光平台上方處， <有至少一光源組用以產生朝向該曝光平台照射曝光光 源’再以該光源組依照預設路徑位移之方式，讓曝光光源 到達該曝光平台之預定區域，而對該曝光平台上的被加工 物進行曝光顯影。 〇 如第三圖及第四圖所示，本發明之曝光機係包括有： :曝光平台30、兩個第一線性滑軌4卜至少一第二線性滑 執々42、至少一光源組5〇、至少一第一驅動組件6卜至少 一第二驅動組件62，以及一控制電路（圖略）；其中： 該曝光平台30，係供承載被加工物及原稿；該兩 一線性滑㈣係呈平行狀態分聽設在該曝辭a 個才目對應亦該至少-第二線性滑執42係橫跨於麵個第 線性滑軌41之間；該至少—光·5Q係設於該至少 二線性滑軌42上，各光源組5〇係具有單—光㈣（可 泡或發光二極體）用以產生朝向該曝光平台別照射之遇: 光源’該光源組5G亦可以具有至少—光㈣，八^ 示’由複數光源51來形成照射效果。 θ 該至少-第-驅動組件61係用以帶動該第二線性滑軌 7 201100970 42沿著該第一線性滑執41位移；該至少一第二驅動組件62 則係用以帶動各光源組50沿著所屬之第二線性滑執42位 移，如第五圖所示，整體曝光機即可透過所使用之控制電 路設定該至少一第二線性滑執42與該至少一光源組50之移 動行程與移動速度。 至於’該控制電路係供透過所使用之控制電路設定該 至少一第二線性滑執4 2與該至少一光源組5 〇之移動行程與 移動速度，以及可供設定該光源組50之功率，使得以在曝 ◎ 光光源到達預疋行红日，再行調升光源組之功率；若整體 曝光機設有複數光源組50時’如第七圖所示，該控制電路 亦可控制各第二線性滑執42上各光源組5〇間之間距3，以及 各光源組50上光源51之角度，以使整體曝光機不侷限於特 定尺寸之工作平台。 本發明之曝光機於使用時，係將被加工物2〇及原稿固 定在該曝光平台30上（或是藉由其他輸送裝置將被加工物 I原稿運送到達該曝光平台之定點處），再透過光源組5〇 ❹沿著所屬第二滑軌42位移，以及第二線性滑軌42沿著第一 線性滑軌位移41的方式，讓光源組5〇所產 時到達曝光平台30之預定區域，進而對該曝光=^= 被加工物20進行曝光顯影。 如第六圖所示本發明在具體實施時，係可在該兩個第 -線性滑軌41之間設有複數組第二線性滑軌似光源板 50，以及設有複數組用以個別帶動各第二線性滑⑽及各 光源組50位移之第一、第二驅動組件61、犯，在複數組 二線性滑執42及総組50之分卫作業下，可縮短被加工物 20進行曝光顯影之，或是同時對複數個被加工物進行 201100970 曝光顯影。 再者’整體曝光機係至少在其中一個第一線性滑軌41 兩端’以及在各第二線性滑轨42兩端設有斷電開關70，用 以限制各第二線性滑軌42以及各光源組50超出安全範圍， 避免相關構件因為遭受第二線性滑軌42或光源組50撞擊而 毁損。 如第九圖所示為本發明之另一實施例，其同樣設有一 曝光平台30、兩個第一線性滑軌41、至少一第二線性滑執 〇 42 '至少一光源組50、至少一第一驅動組件61，以及至少 一第二驅動組件62 ’而該第二線性滑軌42上裝設有一第二 線性滑轨43，而該至少一光源組50則設置於該第三線性滑 軌43上，使該至少—光源組5〇可由該第一線性滑執41進行 第一方向（X方向）之動作，由第二線性滑軌42進行第二方向 (Y方向）之動作，而由第三線性滑軌43進行第三方向（2方向） 之動作’且其中該曝光平台30可如圖所示為單一平面之艰 式’亦可以如第十圖所示，該曝光平台3〇設有複數支待^ 〇 31以及透空部32，該支撐部31係設於靠近第一線性滑軌41 用以設置被加工物2〇’而該透光部32則設於二第一線性滑 軌41間，各支撐部31及透空部32係上下排列，使上下之j 支撐部31得以分別設置多個被加工物20，且當其中〜被知 工物2 0完成加工輸出時，如第十一圖所示之實施例中，< 上方之被加工物20輸出後，該光源組50則藉由第三線性滑 軌43往下移動至下層被加工物20處進行加工’以大鴨增力 工作效率。 具體而言，本發明用以產生曝光效果之光源係圩以為 單點光源，而非涵蓋整個曝光平台之大面積光源，故▼大 9 201100970 幅減少光源組之燈泡數量，相對縮減整體曝光機之體積， =及相對降低a又備成本；而且所使用之控制電路係可在曝 光光源到達預定行程時，再行調升光源組之功率，故可相 對降低整體曝光機之聚熱現象。 尤其，整體曝光機，係可配合被加工物之規格變動， 光源级之行程設定’可大幅提升曝光機之適用 ❹ Ο 二加上光源組僅通過曝光平台需要被曝光光源 …射之Q域，因此不會浪費不必要之加工成本。 相關述，本發明提供—較佳可狀曝錢以及與其 相關之曝光方法’爰録提呈發明專利 技術内，咖巳揭示如上，然而熟悉:項:= 士仍可此基於本發明之揭示而作各種不#離本案發 之替換及修飾。因此，本發明之保護範 v、 . 更靶固應不限於實施例 所揭不者，而應、包括各種不背離本發明之替換及修 為以下之申請專利範園所涵蓋。 、’飾並 【圖式簡單說明】 第一圖係為一習用曝光機之結構剖視圖。 ^圖係為-f用曝光機之曝光平台外觀立體圖。 弟二圖係為本發明第一實施例之曝光 ;=r發明第一實施例之曝光機側面結 弟五圖係為本發明第一實施例之曝光機動 第六圖係為本發明第二實施例之曝光思。 第七圖係為本發明第二實施例之曝光機結 第八圖係為本發明光源組之結構示意圖。，。 第九圖係為本發明第三實施例之曝光機外觀立體圖。 201100970 第十圖係為本發明第四實施例之曝光機外觀立體圖。 第十一圖係為本發明第四實施例之曝光機動作示意圖。 【主要元件符號說明】 11機殼 32透空部 12曝光室 41第一線性滑軌 13曝光平台 42第二線性滑軌 14光源組 43第三線性滑轨 141燈泡 50光源組 15線性滑軌 51燈泡 20被加工物 61第一驅動組件 30曝光平台 62第二驅動組件 31支撐部 70斷電開關 〇 11201100970 VI. Description of the Invention: [Technical Field] The present invention relates to an exposure and development technology of an exposure machine, which aims to provide an exposure operation for a specific area of an exposure platform, and relatively less heat accumulation phenomenon. And exposures that reduce the size and cost of the device and the exposure methods associated with it. [Prior Art] When a printed circuit board or a semiconductor wafer is subjected to an exposure and development process, a photoresist is applied to the surface of the workpiece, and the circuit wiring pattern on the original is mapped to the processed by the illumination of the light source. The photoresist layer on the surface of the object is such that the chemical properties of the photoresist layer are changed by the illumination of the light source. Then, the photoresist or the light that has been irradiated by the light source is removed from the surface of the workpiece by using a photoresist. The basic structure of the exposure machine for forming the paper corresponding to the original 执 执 执 执 彡 彡 彡 彡 * * * * * * * * 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光 曝光Exposure platform 13, and to I: Ϊ Ϊ 12 internal corresponds to above or below the exposure platform 13 flat 14; Please (d) refer to the second figure, the exposure table: the overall exposure 20 and the original (Figure Μα σ 3 and enter and exit the exposure chamber 16° by a set of linear sliders 15 1 light platform 13 together with the object to be affixed and the original into the exposure chamber 12 to 疋~ enough to generally stay inside the exposure chamber 12 - a period of time (about 3 And not #) to make the processed object light source groupΗ The exposure light source is irradiated, 201100970, and the workpiece is sent out by the exposure stage 13 after the exposure is completed. Since the conventional exposure machine uses the exposure platform 13 to stagnate inside the exposure chamber 12, the exposure operation is performed. The light source group 14 is provided with a plurality of bulbs 141 in an array configuration manner, thereby forming a parallel light source covering the entire exposure platform 13; when a large number of bulbs 141 are operated simultaneously, a serious heat collecting phenomenon will be generated inside the casing 11, which requires additional water cooling. The system dissipates heat, resulting in high equipment cost. Another conventional exposure machine uses the compound eye device to correct the light of the bulb to the required parallel light and area. The way of operation is to let the light source bulb use the elliptical mirror to use the light. A set of first mirrors is directed to the compound eye device to homogenize the light, and then a set of second mirrors is used to change the light forward direction. Finally, a set of convex lenses is used to correct the light to the required parallel light and area, and then project out The exposure must be 'sourced' and used to reduce the number of bulbs. This design not only makes the overall exposure The structure tends to be complicated, and the body of the overall exposure machine is relatively larger; in addition, it is also exposed and developed by the exposure light source of the entire exposure platform of the han Q cover; however, in actual exposure development In the process, not all the exposed areas of the workpiece are equivalent to the exposure platform, that is, some areas of the entire exposure platform do not need to be illuminated by the exposure light source, so excessively wasted a lot of unnecessary processing costs. The 'main purpose of the present invention is to provide an exposure machine that can perform exposure operation on a specific area of the exposure platform, relatively less heat-generating phenomenon, and can reduce the size and cost of the device, and its phase 5 201100970 The exposure method of the present invention has an exposure platform for carrying the workpiece and the original, and at least one light source group is disposed above the exposure platform for generating an exposure light source toward the exposure platform. The light source group can be displaced according to a preset path. In implementation, the two corresponding side systems of the exposure platform are respectively provided with a first linear sliding, and at least one second linear sliding rail is disposed between the two first linear sliding rails, and the light source group is The second linear slider is disposed on the at least one second linear slider, and a first driving component is disposed to drive the second linear slider to be displaced along the first linear sliding rail, and the second driving component is disposed to drive the light source The group is displaced along the associated second linear slide. Passing the light source group along the second sliding displacement and the displacement of the second linear sliding rail along the first linear sliding rail, the exposure light source reaches a predetermined area of the exposure platform, and the workpiece on the exposure platform is performed. Exposure development. Specifically, the present invention has the following effects: - 1. The light source used to generate the exposure effect can be a single point light source, instead of ❹: 盍, the large area of the exposure platform (4), so the light source group can be greatly reduced. The quantity, the volume of the overall exposure machine is relatively reduced, and the equipment cost is relatively reduced. ^ The control circuit used can increase the power of the light source group when the exposure light source reaches a predetermined stroke, so that the phenomenon of the overall exposure machine can be relatively reduced. 3. The overall exposure machine can be adapted to the specifications of the workpiece, and the adjustment of the stroke setting of the light inspection can greatly improve the applicability and practicality of the exposure machine. 4. The light source group only passes through the area where the exposure platform needs to be illuminated by the exposure light source, so no unnecessary processing cost is wasted. [Embodiment] The features of the present invention can be clearly understood by referring to the detailed description of the drawings and the embodiments. The present invention is directed to providing an exposure machine that can perform exposure operations on a specific area of an exposure platform, which is relatively less likely to cause a heat collecting phenomenon, and which can reduce the volume and cost of the device, and an exposure method associated therewith; First, at a position above the exposure platform for carrying the workpiece and the original, <having at least one light source group for generating an exposure light source toward the exposure platform, and then exposing the light source group according to a preset path The light source reaches a predetermined area of the exposure platform, and the workpiece on the exposure platform is exposed and developed. For example, as shown in the third and fourth figures, the exposure machine of the present invention comprises: an exposure platform 30, two first linear slides 4, at least one second linear slider 42, at least one light source group. 5〇, at least a first driving component 6 and at least a second driving component 62, and a control circuit (not shown); wherein: the exposure platform 30 is for carrying the workpiece and the original; the two one linear sliding (four) In a parallel state, the listener is disposed in the exposure, and the at least the second linear slider 42 is spanned between the plurality of linear slides 41; the at least the light 5Q is disposed in the At least two linear slides 42, each light source group 5 has a single-light (four) (bubble or light-emitting diode) for generating a different illumination toward the exposure platform: the light source 'the light source group 5G may also have at least - Light (four), eight ^ shows 'the illumination effect is formed by the complex light source 51. θ The at least-the first driving component 61 is configured to drive the second linear sliding rail 7 201100970 42 to be displaced along the first linear sliding 41; the at least one second driving component 62 is configured to drive each light source group 50 is displaced along the associated second linear slider 42. As shown in FIG. 5, the overall exposure machine can set the movement of the at least one second linear slider 42 and the at least one light source group 50 through the control circuit used. Stroke and movement speed. The control circuit is configured to set a movement stroke and a moving speed of the at least one second linear slider 4 2 and the at least one light source group 5 through the control circuit used, and a power for setting the light source group 50, Therefore, the power of the light source group is adjusted after the exposure light source reaches the pre-existing red day; if the whole exposure machine is provided with the plurality of light source groups 50, as shown in the seventh figure, the control circuit can also control each The distance between the light source groups 5 on the two linear sliders 42 is 3, and the angle of the light source 51 on each of the light source groups 50 is such that the overall exposure machine is not limited to a working platform of a specific size. When the exposure machine of the present invention is used, the workpiece 2 and the original are fixed on the exposure platform 30 (or the workpiece I is conveyed to the fixed point of the exposure platform by other conveying means), and then By the displacement of the light source group 5 〇❹ along the associated second slide rail 42 and the displacement of the second linear slide rail 42 along the first linear slide rail 41, the source of the light source group 5 is reached at the time of reaching the exposure platform 30. The area is further exposed and developed to the exposure =^= workpiece 20. As shown in the sixth embodiment, in the specific implementation, a plurality of second linear slide-like light source plates 50 may be disposed between the two first linear slides 41, and a complex array is provided for individual driving. The second linear sliding (10) and the first and second driving components 61 of each of the light source groups 50 are displaced, and the workpiece 20 can be exposed to light under the processing operations of the complex array of the two linear sliders 42 and the group 50. Developing, or simultaneously performing 201100970 exposure development on a plurality of workpieces. Furthermore, the 'overall exposure system is provided at both ends of one of the first linear slides 41' and at both ends of each of the second linear slides 42 to provide a power-off switch 70 for limiting each of the second linear slides 42 and Each of the light source groups 50 is out of the safe range to prevent the associated components from being damaged by the impact of the second linear slide 42 or the light source set 50. As shown in the ninth embodiment, another embodiment of the present invention is further provided with an exposure platform 30, two first linear slides 41, at least one second linear slider 42', at least one light source group 50, at least a first driving component 61, and at least one second driving component 62', and the second linear sliding rail 42 is provided with a second linear sliding rail 43, and the at least one light source group 50 is disposed on the third linear sliding component On the rail 43, the at least one light source group 5 〇 can be operated by the first linear slide 41 in the first direction (X direction), and the second linear slide 42 can be moved in the second direction (Y direction). The operation of the third direction (2-direction) by the third linear slide 43 and wherein the exposure platform 30 can be a single plane as shown in the figure can also be as shown in the tenth figure, the exposure platform 3 The 〇 is provided with a plurality of ^ 31 and a permeable portion 32. The support portion 31 is disposed adjacent to the first linear slide 41 for setting the workpiece 2〇' and the transparent portion 32 is disposed at the second Between the linear slides 41, the support portions 31 and the transparent portions 32 are arranged one above the other, so that the upper and lower j support portions 31 are respectively separated. A plurality of workpieces 20 are disposed, and when the processing output is completed by the workpiece 20, as in the embodiment shown in FIG. 11, the light source group 50 is output after the upper workpiece 20 is output. Then, the third linear slide rail 43 is moved downward to the lower workpiece to be processed at the workpiece 20 to increase the working efficiency. Specifically, the light source system for generating an exposure effect of the present invention is a single-point light source, and does not cover a large-area light source of the entire exposure platform. Therefore, the number of the light bulbs of the light source group is reduced, and the overall exposure machine is relatively reduced. The volume, = and relative reduction of a and the cost; and the control circuit used can adjust the power of the light source group when the exposure light source reaches a predetermined stroke, so that the heat collecting phenomenon of the overall exposure machine can be relatively reduced. In particular, the overall exposure machine can be adapted to the specifications of the workpiece, and the stroke setting of the light source level can greatly improve the application of the exposure machine. Ο Two plus the light source group only needs to be exposed by the exposure platform... Therefore, unnecessary processing costs are not wasted. Related claims, the present invention provides a preferred method for exposing money and associated exposure methods. In the patented technology of the invention, the coffee is disclosed above, but familiar: item: = can still be based on the disclosure of the present invention. Make a variety of replacements and modifications from the case. Therefore, the protection of the present invention is not limited to the embodiments, and should be construed as including various alternatives and modifications of the present invention. [Description of the drawings] The first figure is a structural sectional view of a conventional exposure machine. ^ The figure is a stereoscopic view of the exposure platform of the exposure machine with -f. The second figure is the exposure of the first embodiment of the present invention; the fifth embodiment of the exposure machine of the first embodiment of the present invention is the second embodiment of the exposure maneuver according to the first embodiment of the present invention. The exposure of the example. The seventh figure is the exposure machine junction of the second embodiment of the present invention. The eighth figure is a schematic structural view of the light source group of the present invention. ,. The ninth drawing is a perspective view showing the appearance of the exposure machine of the third embodiment of the present invention. 201100970 The tenth drawing is an external perspective view of the exposure machine of the fourth embodiment of the present invention. Figure 11 is a schematic view showing the operation of the exposure machine of the fourth embodiment of the present invention. [Main component symbol description] 11 casing 32 vacant portion 12 exposure chamber 41 first linear slide 13 exposure platform 42 second linear slide 14 light source group 43 third linear slide 141 bulb 50 light source group 15 linear slide 51 bulb 20 workpiece 61 first drive assembly 30 exposure platform 62 second drive assembly 31 support 70 power off switch 〇 11