200918988 九、發明說明： t發明所届之-技術領織3 技術領域 本發明係有關於一種可邊運送例如大尺寸之液晶顯示 5 面板等的基板邊以處理液處理的基板處理裝置。 I：先前技術3 背景技術 被用於液晶顯示面板的玻璃製基板内可形成電路圖 案’且可採用光刻製程以在基板形成電路圖案。眾所周知， 10光刻製程係將抗蝕劑塗佈於前述基板後，會隔著步成有電 路圖案之遮罩將光照射至該抗蝕劑。 接著，除去抗勉劑之未被光照射部份或是被光照射部 份後，触刻已除去抗餘劑之部份。然後，藉由重複多數次 姓刻後從基板除去抗侧的-連串步驟，於前述基板形成 15 電路圖案。 在此種光刻製程中，前述基板需要藉由顯影液、姓刻 液或可在钱刻後除去抗_的剝離液等處理液處理基板的 步驟、甚至— 是闕處理液處理後再藉由洗淨液洗淨的步驟。 ^前《料、處職處理基板 時，為了要對基板板面全體均勻地進 處理液時的满濕（預濁濕)必須是均勾的。处理仏應基板 呈粒^飛使處雌從料，則處理液會 呈粒狀而氣散，故會有對於基板附著 經由處理液進行的預潤濕將無法均勻地I:的^兄亦即， J地進行。結果’會有 200918988 經由行之基板纽亦無法均勻地騎的情況。 如專利文獻1所示，將下端面形成有狹縫狀流出 部的處理液供應裝置，沿著與運送方向交叉之方向，即該 基板之寬度方向，配置在所運送之基板上方後，以由水位 5差所產生的壓力使前述處理液供應裝置所供應之處理液從 月〕述抓出也^出，對基板之寬度方向均勾地供應處理液。 此外，最近，被用於液晶顯示裝置的玻璃製基板有大 型化及薄型化的傾向。因此，一旦水平運送基板，則會有 土板的、曲因供應至基板的處理液重量而變大，無法順利 10地進行基板運送的情況。並且，在基板上面殘留大量處理 液的狀態下從處理部搬出基板後，回收處理液再利用時， 處理液的消耗量會變多，成為導致運轉成本上昇的原因之 為解決此種問題，最近，藉由以預定角度傾斜運送基 15板’使供應至基板板面的處理液順利地流出，以減少基板 的彎曲，或是減少與基板一起被帶離處理部的處理液液量 已實用化。 專利文獻2中揭示使基板傾斜運送時，將喷灑用管沿著 基板運送方向配置於其傾斜方向之上端側，並以液體承接 20 板承接從該喷灑用管流出之處理液後，從基板的傾斜方向 上端側沿著下端側流動來處理前述基板上面。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate processing apparatus capable of processing a substrate while transporting a substrate such as a large-sized liquid crystal display panel or the like. I: Prior Art 3 Background A circuit pattern can be formed in a glass substrate used for a liquid crystal display panel and a photolithography process can be employed to form a circuit pattern on the substrate. As is well known, the 10 lithography process applies a resist to the substrate, and then irradiates light to the resist through a mask having a circuit pattern. Next, after removing the portion of the anti-caries agent that has not been irradiated with light or the portion irradiated with light, the portion where the anti-surplus agent has been removed is engraved. Then, a circuit pattern of 15 is formed on the substrate by repeating the series-series step of removing the anti-side from the substrate after most of the last name. In such a photolithography process, the substrate needs to be processed by a developing solution, a surname or a treatment liquid which can remove the anti-stripping liquid after the engraving, or even a treatment liquid after the treatment. The step of washing the washing liquid. ^Before, when the substrate is processed and processed, the full wetness (pre-turbidity and wetness) must be evenly checked in order to uniformly feed the entire surface of the substrate. When the processing substrate is granulated and the female is discharged from the material, the treatment liquid will be granulated and dispersed, so that the pre-wetting of the substrate through the treatment liquid will not be uniform. , J is carried out. As a result, there will be a situation in which 200918988 will not be able to ride evenly through the substrate. As shown in Patent Document 1, a processing liquid supply device having a slit-like outflow portion formed on a lower end surface is disposed in a direction crossing the transport direction, that is, in a width direction of the substrate, above the substrate to be transported, and then The pressure generated by the difference in the water level is such that the processing liquid supplied from the processing liquid supply device is taken out from the month, and the processing liquid is supplied to the width direction of the substrate. Further, recently, a glass substrate used for a liquid crystal display device tends to be large and thin. Therefore, when the substrate is transported horizontally, the weight of the treatment liquid supplied to the substrate due to the earth plate is increased, and the substrate cannot be smoothly transported. In addition, when the substrate is carried out from the processing unit while a large amount of the processing liquid remains on the substrate, the amount of the processing liquid is increased when the processing liquid is reused, which causes a problem in that the operating cost is increased. By slanting the carrier 15 plate at a predetermined angle, the processing liquid supplied to the substrate surface smoothly flows out, thereby reducing the bending of the substrate, or reducing the amount of the processing liquid that is carried away from the processing portion together with the substrate has been put into practical use. . When the substrate is tilted and conveyed, Patent Document 2 discloses that the spray pipe is disposed on the upper end side in the oblique direction along the substrate conveyance direction, and receives the treatment liquid flowing out from the spray pipe with the liquid receiving plate 20, and then The upper end side of the substrate in the oblique direction flows along the lower end side to process the upper surface of the substrate.
【專利文獻1】特開2006-297274號公報 【專利文獻2】特開2004-153033號公報 t發明内容;J 200918988 發明揭示 發明欲解決之課題 如專利文獻2所示，-旦將喷讓用管沿著基板運送方向 配置於傾斜之基板的傾斜方向上端側並經由液體承接板使 5從該管流出之處理液供應至被傾斜運送之基板的傾斜方向 上端側，則處理液將不只流向基板的傾斜方向下方，亦會 因基板運送速度相對地往運送方向上游側（運送方向後端 側)在基板之上面流動。 因此，在基板運送方向的前端部中，會產生供給至基 10板的傾斜方向上端側的處理液難以流到傾斜方向底端的情 況，故會有無法藉由處理液均勻地處理基板上面全體的情 况特別疋’-旦為了使處理效率提高而加快基板運送速 度，則該傾向會變得十分顯著。 本發明係提供-種可對與被傾斜運送之基板上面 15送方向交叉之方向均句地且以相同廢力供應處理液，藉此 可均勻地處理基板上面全體的基板處理裝置。 解決課題之手段 本發明係-種基板處理裝置，係藉由從處理液供應機 構所供應之處理液處理以預定角度傾斜且往與其傾斜方向 2〇交又之方向被運送之基板的上面者， 且，前述處理液供應機構包含有： 容器本體’係沿著前述基板之傾斜方向配置，且内部 供應儲存前述處理液者； 流出部，係在該容器本體的下面開口而形成，且使容 200918988 器本體⑽供聽叙—著料絲板運送方向交 叉之方向直線狀地流出者；及 一引導構件，係設在前述容器本體之下面側’且且有往 前述基板運送方向下游側降低傾斜之傾斜面，同時該傾斜 面之下端緣傾斜而形成為與所運送之前述基板之傾斜上面 千灯地分附目對’独前賴斜面轉從前述流出部流出 之處理液，從魏斜面的τ端緣供應至前述基板之上面者。 發明效果 根據本發明’以引導構件承接從容器本體之流出部沿 10著與被傾斜運送之基板之傾斜方向交叉之方向直線狀地流 出的處理液。該引導構件往基板運送方向下游側降低傾 斜’且下知緣傾斜為與基板之上面平行地分開相對。 因此’經由引導構件供應至基板的處理液，可從與基 板之上面平行地分開相對的引導構件之下端緣全長對基板 15之上面以相同壓力且橫越與基板運送方向交叉之方向全長 均勻地供應，故可橫越全體均勻地進行被傾斜運送之基板 之上面的處理。 I：實施方式;j 實施發明之最佳型態 以下，邊參照圖式邊說明本發明之一實施型態。 第1圖係基板處理裝置的概略構造圖，且該處理裝置具 有腔室1。在該腔室1之長度方向一端水平地形成有同一圖 中以鏈線表示之搬入口2，且在另一端形成有與前述搬入口 2相同高度的未圖示之搬入口。 200918988 前述腔室1内設有運送機構4，且該運送機構4具有矩形 框狀的框架5。該框架5受到設在前述腔室1内之寬度方向一 端與另一端的承接構件6支撐，且一邊的承接構件6設有高 度調整構件7。藉此，前述框架5相對於腔室1之寬度方向以 5 預定角度傾斜著。 前述框架5相對於腔室1之長度方向以預定間隔設有多 數使轴線沿著腔室1之寬度方向的運送軸11 (僅圖示1根）。各 運送轴11的兩端受到設在前述框架5之寬度方向兩端的轴 承12支撐而可旋轉，且相對於腔室1之寬度方向以與前述框 10 架5相同之角度傾斜著。另外，運送軸11係由不會因顯影 液、剝離液或钱刻液等處理液而受到侵姓的金屬材料所形 成。 此外，各運送軸11於軸方向以預定間隔設有多數運送 幸昆13。前述運送軸11 一般係由對處理液具有对腐#性的不 15 銹鋼等金屬材料所形成，且前述運送輥13同樣係由具有耐 腐钱性的氯乙烯等合成樹脂所形成。 前述框架5之高度方向上端的一側外邊沿著腔室1之長 度方向設有傳動轴14，且該傳動軸14的中間部設有從動齒 輪15。該從動齒輪15咬合著驅動齒輪16，且該驅動齒輪16 20 裝配於設在腔室1外部的驅動源17之輸出軸18。 雖無詳細圖示，但位於前述運送轴11之前述傳動軸14 側的一端部設有第1傘齒輪，且該第1傘齒輪咬合著設在前 述運送轴11的第2傘齒輪。因此，一旦作動前述驅動源17經 由前述驅動齒輪16及從動齒輪15旋轉前述傳動軸14，則前 200918988 述運送軸11可經由前述第1、第2傘齒輪驅動旋轉。藉此， 從前述搬入口 2供應至腔室丨内且受到運送軸】】之運送輥13 支樓的液晶顯示面板等基板w得以被運往搬出口。 另外觉到運送輥13支撐而被運送的基板w之寬度方 5向兩端受到設在前述框架5的徑向軸承19支撐。藉此，基板 W得以相對於腔室1之寬度方向不蜿蜒地被運送。 前述腔室1内設有作為處理液供應機構的處理液供應 裝置31，且該處理液供應裝置31係將前述顯影液、剝離液 或蝕刻液等處理液L(第2圖所示）沿著與基板w之運送方向 10交叉之寬度方向直線狀地供應至藉由設在前述運送軸丨丨之 運送輥13所運送之基板w之上面者。 前述處理液供應裝置31如第2圖至第4圖所示般具有容 器本體32。該容器本體32係形成為沿著前述基板评之寬度 方向，亦即腔至1之寬度方向呈細長且上面有開口的箱型形 15狀。該容器本體32的寬度尺寸被設定成較前述基板W的寬 度尺寸長，且如第2圖所示般内部藉由沿著容器本體32之長 度方向設置的間隔物件33，在與該長度方向垂直之方向被 區劃成流入部34與儲液部35。本實施型態中，前述流入部 34位於第2圖及第4圖中箭頭所示之基板w之運送方向上游 2〇 側，且儲液部35位於下游側。 刖述流入部34之側壁34a的下部，沿著該側壁34a之寬 度方向於長度方向以等間隔設有多數供應口物件36(第2圖 僅圖示1個）。各供應口物件36連接有處理液L的供液管37之 一鈿，且供液管37之另一端連通於處理液[的供應部。藉 200918988 此韻容器本體32之流人部34得以從前述側㈣之下部 以預定壓力供應處理液。 *則述流入部34中，橫越作為容器本體32之長度方向的 寬度方向全長設有碰撞壁39，且該碰撞物㈣流入部％ 内區劃成位於前述供應口物件36側的第❻取、及位於前 述儲液部35側的第2室38b。 雨述碰撞壁39的高度被設定成較前述間隔物件33的高 度低。藉此，從前述供應口物件36供給至幻室撕的處理 液L在撞上碰撞壁39後會減弱流勢並且围積於第⑻以而 10使液面上昇。接著’-旦液面上昇到與碰撞壁％幾乎同高 度’則會如第2圖中箭頭所示般溢出該碰撞壁刊且流入第2 室 38b。 處理液L會因從供應口物件36急速地流入第1室3如，而 捲進空氣，成為氣泡產生的原因。但是，從供應口物件36 15流入第1室383的處理液L會撞上碰撞壁39而減弱流勢，並溢 出碰撞壁39且流入第2室38b。 亦即’處理液L雖會因流入第1室38a時的流勢而產生湍 流進而招致氣泡產生，但卻會在不產生湍流的情況下平穩 地流入第2室38b，故此時幾乎不會招致氣泡產生。 2〇 一旦處理液L溢流至第2室38b，且流入部34的液面與間 隔物件33的上端幾乎呈同高度，則處理液l會如第2圖中箭 頭所示般溢出間隔物件33且流入儲液部35。此時，處理液L 亦會因溢流而在不造成滿流的情況下平穩地流入儲液部 35，故不會招致湍流產生。 11 200918988 前述儲液部35之底壁35a中，沿著容器本體32之寬度方 向以預定間隔呈一列地形成有如第4圖所示般形成流出部 的多數噴嘴孔40。本實施型態中，前述噴嘴40被設定成孔 為0.5mm，且間距為〇.7mm。 5 藉此，處理液L會藉由因應儲存於容器本體32内之高度 的壓力從前述喷嘴孔40流出。從以間距〇 7mm所形成之相 鄰喷嘴孔40流出的處理液L會相連成一直線供應至基板w 之上面。亦即，即使藉由多數噴嘴孔4〇形成流出部，處理 液L也不會隨著每一噴嘴孔40而分歧，而是沿著基板w之寬 10 度方向相連成直線狀供應。 15 20 另外，處理液供應裝置31之容器本體32水平地配置於 前述腔室1内藉此’儲存於容器本體32内的處理液L的液 面问度橫越容器本體32之寬度方向全長均呈相同，故經由 攸开/成於儲液部35之底壁35a的各喷嘴孔40流出之處理液L 的水位差所產生之壓力會相同。亦即，從各喷嘴孔4〇流出 且相連成直線狀的處理液L橫越全長會呈大致均勻的壓力。 另外’ -旦容器本體32所供應之處理液[的液面高度變 得比側壁34a高，則會溢出其側壁％且流人排出糾，並 透過未圖示之排液管排出。藉此，容器本體&内的處理液L 的液面得以經常維持在一定的高度。 前述儲液部35之底壁3减有將從前㈣嘴孔4〇流出 之處理液L料至被傾斜運送之前述基板％之上面的引導 ΓΓ2 1該引導構件42如第2圖所示般係藉由螺絲44將形成 、’、上端部的折彎部43安I於前述底壁35a。該引導構件42 12 200918988 ’、有“』述基板w之運送方向下游側降低傾斜之傾斜面 且該傾斜面45之下端緣45a如第3圖所示般與被傾斜運 送之基板W之上面平行地分開相對。 水平地配置容器本體32時，為了使前述引導構件歡 5下U45a與基板上面平行地分開相對，其下端緣4^ 將不，、如第3圖所不般從正面來看是相對於基板〜之寬度 方向以角度0 1對水平面傾斜，亦如第4圖所示般從上方來 看是相對於與容器本體32之寬度方向平行之直線H以角度 02傾斜（往水平方向旋轉）。 1〇 接著’使刖述容器本體32於水平方向以角度6» 2旋轉配 置，以使前述引導構件42中從上方來看是於水平方向以角 度0 2傾斜之下端緣45a形成之直線相對於第4圖中箭頭X所 示之基板W之運送方向呈垂直。 根據此種構造的處理裝置，可使基板w以預定角度往 15作為與運送方向交叉之方向的寬度方向傾斜運送，且可藉 由處理液供應裝置31橫越與基板…之運送方向交叉之寬度 方向全長供應處理液L。 處理液供應裝置31之容器本體32中，於供應儲存處理 液L的儲液部35之底壁35a設有引導構件42。該引導構件 20具有承接彳心貫穿設置於前述底壁35a的多數喷嘴孔4〇直線 狀地流出的處理液L的傾斜面45。 耵述傾斜面45往基板W之運送方向下游側降低傾斜， 並且下端緣45a以角度0 1傾斜為相對於傾斜之基板w之上 面的寬度方向全長平行地分開相對。亦即，傾斜面45之下 13 200918988 端緣45a橫越基之上面的寬度方向全長以相 同間隔分 開相對。 因此’從前述噴嘴孔40流出至前述引導構件42之傾斜 面45的處理液L’可橫越基板w之寬度方向全長以相同壓力 5從其傾斜祕之下魏45a供給至基板w之上面。 並且’前述容器本體32係相對於傾斜之基板W水平地 设置。因此’容器本體32之儲液部35所供應儲存之處理液l 的液面咼度橫越基板w之寬度方向全長均呈相同。亦即， 從儲液部35直線狀地供應之處理液L，橫越其直線全長均呈 10相同壓力。因此，根據前述等，基板w將可藉由寬度方向 全長均為相同壓力之處理液L均勻地處理。 月il述引導構件42之傾斜面45之下端緣45a形成之直 線，在平面圖中相對於與容器本體32之寬度方向平行的直 線度Θ 2傾斜。而且’安裝有前述引導構件42的容器 15本體32配置成使前述引導構件42之傾斜面45之下端緣45a 與基板w之運送方向呈垂直。亦即，使容器本體32相對於 與基板W之運送方向垂直之方向，於水平方向以角度6»2旋 轉配置。 因此’將如第4圖中箭頭S所示般相對於與基板w之運 20送方向垂直之寬度方向全長，從引導構件42之傾斜面45之 下端緣45a同時供應處理液L。因此，藉由將基板w往與其 寬度方向垂直之方向運送至腔室丨内，處理液L將可均勻不 遺漏地供應至基板W的全面，故藉此將可均勻地處理基板 W的全面。 14 200918988 亦即，對被傾斜運送之基板w，可相對 方向垂直之傾斜方向的寬度方向全長同時供應處理液 可均勻地處理基板w之上面全體。 前述實施型態中雖藉由多數喷嘴孔形成處理液的流出 部，但亦可在儲液部之底壁形成狹縫(未圖示），使處理液從 該狹縫直線狀地流出。 又，雖使設有引導構件的容器本體，沿著引導構件之 傾斜面之下端緣與基板之運送方向垂直之方向，於水平方 向以角度Θ2旋轉配置，但前述引導構件之下端緣亦可不為 W相對於基板之寬度方向與運送方向垂直之角度，而是以預 定角度傾斜。亦即，只要可相對於與基板之運送方向交叉 之寬度方向全長同時供應處理液的話即可。 L圖式簡單明】 第1圖係將顯不本發明之-實施型態的處理裝置沿著 15與基板運送方向交又之方向截面後的圖。 第2圖係供應所運送之基板處理液的處理液供應裝置 的縱截面圖。 第3圖係處理液供應裝置的正视圖。 第4圖係處理液供應裝置的平面圖。 20 【主要元件符號說明】 1 腔室 6 2 搬入口 7 4 運送機構 11 5 框架 12 承接構件 高度調整構件 運送軸 軸承 15 200918988 13 運送粮 38b 第2室 14 傳動軸 39 石並撞壁 15 從動齒輪 40 喷嘴孔 16 驅動齒輪 41 排出部 17 驅動源 42 引導構件 18 輸出軸 43 折彎部 19 徑向轴承 44 螺絲 31 處理液供應裝置 45 傾斜面 32 容器本體 45a 下端緣 33 間隔物件 W 施 34 流入部 L 處理液 34a 側壁 Η 直線 35 儲液部 X 箭頭 35a 底壁 S 箭頭 36 供應口物件 θ\ 角度 37 供液管 Θ2 角度 38a 第1室 16[Patent Document 1] JP-A-2006- 297274 (Patent Document 2) JP-A-2004-153033, JP-A-2009-153033 DISCLOSURE OF THE INVENTION PROBLEMS TO BE SOLVED BY THE INVENTION As disclosed in Patent Document 2, The tube is disposed on the upper end side in the oblique direction of the inclined substrate along the substrate transport direction, and supplies the processing liquid flowing out of the tube through the liquid receiving plate to the upper end side in the oblique direction of the substrate to be obliquely transported, so that the processing liquid does not flow only to the substrate. Below the oblique direction, the substrate transport speed relatively flows toward the upstream side of the transport direction (the rear end side in the transport direction) on the upper surface of the substrate. Therefore, in the tip end portion of the substrate transporting direction, it is difficult for the processing liquid supplied to the upper end side in the oblique direction of the substrate 10 to flow to the bottom end in the oblique direction. Therefore, the entire surface of the substrate cannot be uniformly processed by the processing liquid. In particular, the tendency has become remarkable in order to increase the substrate transport speed in order to improve the processing efficiency. The present invention provides a substrate processing apparatus which can uniformly process the entire upper surface of the substrate by supplying the processing liquid uniformly in the direction intersecting the direction in which the substrate 15 is obliquely conveyed and supplying the same waste force. Means for Solving the Problems The present invention relates to a substrate processing apparatus which processes a substrate which is inclined at a predetermined angle by a processing liquid supplied from a processing liquid supply mechanism and which is transported in a direction opposite to the oblique direction 2 thereof, Further, the processing liquid supply mechanism includes: the container body ′ is disposed along an oblique direction of the substrate, and the inside of the container is supplied with the processing liquid; the outflow portion is formed by opening under the container body, and the capacity is 200918988 The main body (10) is configured to listen to the straight line in the direction in which the feeding direction of the feeding wire crosses; and a guiding member is disposed on the lower side of the container body and has a downward inclination toward the downstream side in the substrate conveying direction The inclined surface is formed, and the lower edge of the inclined surface is inclined to form a treatment liquid which is inclined from the inclined surface of the substrate to be transported, and the processing liquid which flows out from the front outflow portion, and the τ from the Wei slope The end edge is supplied to the upper side of the aforementioned substrate. According to the present invention, the guide member receives the treatment liquid which is linearly discharged from the outflow portion of the container body in a direction intersecting the oblique direction of the substrate to be obliquely conveyed. The guiding member is inclined downward toward the downstream side in the substrate conveying direction and the lower edge is inclined so as to be parallel to the upper surface of the substrate. Therefore, the processing liquid supplied to the substrate via the guiding member can be uniformly separated from the upper end edge of the opposite guiding member in parallel with the upper surface of the substrate, and the entire surface of the substrate 15 can be uniformly applied to the upper surface of the substrate 15 at the same pressure and across the entire direction of the substrate transport direction. Since it is supplied, the processing of the upper surface of the substrate which is obliquely transported can be uniformly performed across the entire surface. I: Embodiments; j. BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, an embodiment of the present invention will be described with reference to the drawings. Fig. 1 is a schematic structural view of a substrate processing apparatus, and the processing apparatus has a chamber 1. A carry-in port 2 indicated by a chain line in the same figure is formed horizontally at one end in the longitudinal direction of the chamber 1, and a transfer port (not shown) having the same height as the above-described carry-in port 2 is formed at the other end. 200918988 A transport mechanism 4 is provided in the aforementioned chamber 1, and the transport mechanism 4 has a frame 5 having a rectangular frame shape. The frame 5 is supported by a receiving member 6 provided at one end and the other end in the width direction of the chamber 1, and the receiving member 6 on one side is provided with a height adjusting member 7. Thereby, the frame 5 is inclined at a predetermined angle with respect to the width direction of the chamber 1. The frame 5 is provided with a plurality of transport shafts 11 (only one of which is shown) having an axis along the width direction of the chamber 1 at a predetermined interval with respect to the longitudinal direction of the chamber 1. Both ends of each of the transport shafts 11 are rotatably supported by the bearings 12 provided at both ends in the width direction of the frame 5, and are inclined at the same angle as the frame 5 of the frame 10 with respect to the width direction of the chamber 1. Further, the transport shaft 11 is formed of a metal material which is not invaded by a treatment liquid such as a developer, a peeling liquid or a money engraving liquid. Further, each of the transport shafts 11 is provided with a plurality of transports at a predetermined interval in the axial direction. The transport shaft 11 is generally formed of a metal material such as stainless steel which has a repellency to the treatment liquid, and the transport roller 13 is similarly formed of a synthetic resin such as vinyl chloride having corrosion resistance. One side of the upper end of the frame 5 in the height direction is provided with a transmission shaft 14 along the longitudinal direction of the chamber 1, and a driven portion 15 is provided at an intermediate portion of the transmission shaft 14. The driven gear 15 meshes with the drive gear 16, and the drive gear 16 20 is mounted to the output shaft 18 of the drive source 17 provided outside the chamber 1. Although not shown in detail, the first bevel gear is provided at one end of the transport shaft 11 on the side of the propeller shaft 14, and the first bevel gear meshes with the second bevel gear provided on the transport shaft 11. Therefore, when the drive source 17 is actuated to rotate the transmission shaft 14 via the drive gear 16 and the driven gear 15, the transport shaft 11 can be driven to rotate via the first and second bevel gears. Thereby, the substrate w such as a liquid crystal display panel which is supplied from the transfer port 2 to the inside of the chamber and is received by the transport roller 13 of the transport shaft is transported to the carry-out port. Further, it is felt that the width of the substrate w which is supported by the transport roller 13 and supported by the transport roller 13 is supported by the radial bearing 19 provided in the frame 5 at both ends. Thereby, the substrate W can be conveyed without being slid in the width direction of the chamber 1. A processing liquid supply device 31 as a processing liquid supply means is provided in the chamber 1, and the processing liquid supply device 31 is provided with a processing liquid L (shown in FIG. 2) such as the developing solution, the stripping liquid or the etching liquid. The width direction intersecting the conveyance direction 10 of the substrate w is linearly supplied to the upper surface of the substrate w conveyed by the conveyance roller 13 provided on the conveyance shaft. The processing liquid supply device 31 has a container body 32 as shown in Figs. 2 to 4 . The container body 32 is formed in a box-like shape 15 which is elongated along the width direction of the substrate, that is, the width direction of the cavity to 1 and has an opening on the upper surface. The width of the container body 32 is set to be longer than the width dimension of the substrate W, and as shown in FIG. 2, the spacer member 33 disposed along the longitudinal direction of the container body 32 is perpendicular to the length direction. The direction is divided into the inflow portion 34 and the liquid storage portion 35. In the present embodiment, the inflow portion 34 is located on the upstream side 2' in the transport direction of the substrate w indicated by the arrow in Figs. 2 and 4, and the liquid storage portion 35 is located on the downstream side. The lower portion of the side wall 34a of the inflow portion 34 is described, and a plurality of supply port members 36 are provided at equal intervals in the longitudinal direction along the width direction of the side wall 34a (only one is shown in Fig. 2). Each of the supply port members 36 is connected to one of the supply pipes 37 of the treatment liquid L, and the other end of the supply pipe 37 is connected to the supply portion of the treatment liquid. By means of 200918988, the flow portion 34 of the container body 32 is capable of supplying the treatment liquid at a predetermined pressure from the lower portion of the aforementioned side (4). * In the inflow portion 34, a collision wall 39 is provided across the entire length direction in the longitudinal direction of the container body 32, and the collision object (4) inflow portion % is divided into the third extraction portion on the side of the supply port member 36. And a second chamber 38b located on the side of the liquid storage unit 35. The height of the rain collision wall 39 is set to be lower than the height of the aforementioned spacer member 33. Thereby, the treatment liquid L supplied from the supply port member 36 to the theater chamber tearing weakens the flow potential after hitting the collision wall 39 and encloses the (8) to raise the liquid level. Then, the liquid level rises to almost the same height as the collision wall %, and the collision wall is overflowed as shown by the arrow in Fig. 2 and flows into the second chamber 38b. The treatment liquid L rapidly flows into the first chamber 3 from the supply port member 36, and is entangled with air to cause air bubbles. However, the treatment liquid L that has flowed into the first chamber 383 from the supply port member 36 15 collides with the collision wall 39 to weaken the flow potential, overflows the collision wall 39, and flows into the second chamber 38b. In other words, the treatment liquid L generates turbulence due to the flow potential flowing into the first chamber 38a, thereby causing bubble generation, but smoothly flows into the second chamber 38b without generating turbulence, so that it is hardly incurred at this time. Bubbles are generated. 2. Once the treatment liquid L overflows to the second chamber 38b, and the liquid level of the inflow portion 34 is almost the same height as the upper end of the spacer member 33, the treatment liquid 1 overflows the spacer member as indicated by the arrow in FIG. 33 and flows into the liquid storage portion 35. At this time, the treatment liquid L also smoothly flows into the liquid storage portion 35 without overflow due to overflow, so that turbulence does not occur. 11 200918988 In the bottom wall 35a of the liquid storage portion 35, a plurality of nozzle holes 40 which are formed as an outflow portion as shown in Fig. 4 are formed in a row at predetermined intervals along the width direction of the container body 32. In the present embodiment, the nozzle 40 is set to have a hole of 0.5 mm and a pitch of 〇.7 mm. 5 Thereby, the treatment liquid L flows out from the nozzle hole 40 by the pressure at a height stored in the container body 32. The treatment liquid L flowing out from the adjacent nozzle holes 40 formed at a pitch of mm 7 mm is connected in a straight line to the upper side of the substrate w. That is, even if the outflow portion is formed by the plurality of nozzle holes 4, the treatment liquid L does not divide with each nozzle hole 40, but is connected in a straight line along the width of the substrate w by 10 degrees. Further, the container body 32 of the processing liquid supply device 31 is horizontally disposed in the chamber 1 whereby the liquid level of the processing liquid L stored in the container body 32 is traversed across the width direction of the container body 32. Since they are the same, the pressure generated by the water level difference of the treatment liquid L which flows out through the nozzle holes 40 of the bottom wall 35a of the liquid storage portion 35 is the same. In other words, the processing liquid L which flows out from the nozzle holes 4 and which is connected in a straight line has a substantially uniform pressure across the entire length. Further, when the liquid level of the treatment liquid supplied from the container body 32 becomes higher than that of the side wall 34a, the side wall % is overflowed and the flow is discharged, and is discharged through a drain pipe (not shown). Thereby, the liquid level of the treatment liquid L in the container body & is always maintained at a constant height. The bottom wall 3 of the liquid storage portion 35 is reduced from the processing liquid L flowing out from the front (four) nozzle hole 4 to the upper surface of the substrate 100 which is obliquely transported. The guiding member 42 is as shown in Fig. 2 The bent portion 43 of the upper end portion is formed by the screw 44 to the bottom wall 35a. The guiding member 42 12 200918988 ' has a sloped surface on the downstream side in the transport direction of the substrate w, and the lower end edge 45a of the inclined surface 45 is parallel to the upper surface of the substrate W which is obliquely transported as shown in FIG. When the container body 32 is disposed horizontally, in order to separate the U45a in parallel with the upper surface of the substrate, the lower end edge 4^ will not be, as shown in FIG. It is inclined with respect to the width direction of the substrate to the horizontal plane at an angle of 0 1 , and as viewed from the top in FIG. 4 , it is inclined at an angle 02 with respect to a straight line H parallel to the width direction of the container body 32 (rotating in the horizontal direction) Then, the arrangement of the container body 32 in the horizontal direction at an angle of 6» 2 is made such that the aforementioned guiding member 42 is a straight line formed by the upper end edge 45a inclined at an angle of 0 2 in the horizontal direction as viewed from above. The conveyance direction of the substrate W is perpendicular to the direction indicated by the arrow X in Fig. 4. According to the processing apparatus of such a configuration, the substrate w can be inclined at a predetermined angle toward the width direction of the direction intersecting the conveyance direction. In the container body 32 of the processing liquid supply device 31, the liquid storage portion of the storage processing liquid L is supplied by the processing liquid supply device 31 across the width direction of the substrate. The bottom wall 35a of the 35 is provided with a guide member 42. The guide member 20 has an inclined surface 45 for receiving the processing liquid L through which a plurality of nozzle holes 4 provided in the bottom wall 35a are linearly flowed. The inclined surface 45 is described. The lower side is lowered toward the downstream side in the transport direction of the substrate W, and the lower end edge 45a is inclined at an angle of 0 1 so as to be parallel to the entire length direction of the upper surface of the inclined substrate w. That is, the inclined surface 45 is below the edge of 13 200918988. The entire length direction of the upper surface of the traverse base 45a is separated at the same interval. Therefore, the treatment liquid L' flowing out from the nozzle hole 40 to the inclined surface 45 of the guide member 42 can traverse the entire length of the substrate w at the same pressure. 5 is supplied from the slanting under the Wei 45a to the top of the substrate w. And 'the container body 32 is horizontally disposed with respect to the inclined substrate W. Therefore, the liquid of the container body 32 The liquid level of the processing liquid 1 stored and stored in the portion 35 is the same throughout the entire width direction of the substrate w. That is, the processing liquid L linearly supplied from the liquid storage portion 35 is traversed over the entire length of the straight line. 10, the same pressure is applied. Therefore, according to the foregoing, the substrate w can be uniformly treated by the treatment liquid L having the same pressure throughout the entire length direction. The straight line formed by the lower end edge 45a of the inclined surface 45 of the guide member 42 is The plan view is slanted with respect to the straightness Θ 2 parallel to the width direction of the container body 32. Further, the container 15 body 32 to which the above-described guide member 42 is attached is disposed such that the lower end edge 45a of the inclined surface 45 of the aforementioned guide member 42 and the substrate w The direction of transport is vertical. That is, the container body 32 is rotated and disposed at an angle of 6»2 in the horizontal direction with respect to the direction perpendicular to the conveyance direction of the substrate W. Therefore, as shown by the arrow S in Fig. 4, the processing liquid L is simultaneously supplied from the lower end edge 45a of the inclined surface 45 of the guiding member 42 with respect to the entire length in the width direction perpendicular to the direction in which the substrate w is transported. Therefore, by transporting the substrate w into the chamber 垂直 in a direction perpendicular to the width direction thereof, the processing liquid L can be uniformly supplied to the entire surface of the substrate W, whereby the entire surface of the substrate W can be uniformly processed. In the substrate w which is transported obliquely, the processing liquid can be supplied simultaneously with the entire length in the width direction perpendicular to the direction perpendicular to the direction, and the entire upper surface of the substrate w can be uniformly processed. In the above embodiment, the outflow portion of the treatment liquid is formed by a plurality of nozzle holes, but a slit (not shown) may be formed in the bottom wall of the liquid storage portion to allow the treatment liquid to flow straight out from the slit. Further, the container body provided with the guiding member is disposed to be rotated at an angle Θ2 in the horizontal direction along a direction in which the lower end edge of the inclined surface of the guiding member is perpendicular to the conveying direction of the substrate, but the lower edge of the guiding member may not be W is inclined at a predetermined angle with respect to the width direction of the substrate perpendicular to the conveyance direction. In other words, the processing liquid may be supplied simultaneously with the entire length in the width direction intersecting the transport direction of the substrate. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing a cross-sectional view of a processing apparatus of the present invention in an embodiment in which the processing apparatus of the present invention is placed in a direction parallel to the substrate transport direction. Fig. 2 is a longitudinal sectional view showing a processing liquid supply device for supplying a substrate processing liquid to be transported. Fig. 3 is a front view of the treatment liquid supply device. Fig. 4 is a plan view of the treatment liquid supply device. 20 [Description of main component symbols] 1 Chamber 6 2 Transfer inlet 7 4 Transport mechanism 11 5 Frame 12 Receiving member height adjustment member Transport shaft bearing 15 200918988 13 Transporting grain 38b 2nd room 14 Drive shaft 39 Stone and collision wall 15 Follower Gear 40 Nozzle hole 16 Drive gear 41 Discharge part 17 Drive source 42 Guide member 18 Output shaft 43 Bending part 19 Radial bearing 44 Screw 31 Treatment liquid supply unit 45 Inclined surface 32 Container body 45a Lower end edge 33 Spacer W Application 34 Inflow Part L Treatment liquid 34a Side wall 直线 Straight line 35 Reservoir part X Arrow 35a Bottom wall S Arrow 36 Supply port object θ\ Angle 37 Supply tube Θ 2 Angle 38a Room 1 16