200829964 九、發明說明： 【發明所屬之技術領域】 本發明是有關於一種彩色濾光片，且特別是有關於一 種具有面内平坦性之彩色濾光片的基材裝置及其製造方 法。 【先前技術】 彩色濾光片（Color Filter)為液晶顯示器中，主要的零 組件之一。目前彩色濾光片主要包含一基材、一黑色矩陣 (Black Matrix)、一 彩色層（Color Layer (RGB) Layer)、一 ITO導電膜以及一感光間隔物（Photo Spacer)層。基材主要 使用鍍鉻玻璃。基材上，會分別形成黑色矩陣、彩色層、 IT0導電膜等。 曰 請參照第1圖所示，現有的彩色濾光片的基材裝置， 包含一基材300、一樹脂黑色矩陣3 10以及一彩色光阻層 320。其中’彩色光阻層320包含r色彩元素光阻mi、〇 色彩元素光阻322、B色彩元素光阻323。 樹脂黑色矩陣310係形成於基材3〇〇上，並包含有複 數開口區311。彩色光阻層32〇係形成於基材3〇〇與樹脂 黑色矩陣310上。由於開口區311的影響，R色彩元素光 阻321、G色彩元素光阻322以及B色彩元素光阻323會 於舆樹月曰黑色矩陣3 1 〇重疊的部分，形成一凸出部340。 凸出部340造成了彩色光阻層32〇整體表面的平坦度不佳 的問題。平坦性不佳易造成液晶配向排列的問題，其影響 6 200829964 液晶顯示器晝面呈現之結果。 現有解決前述彩色光阻層32〇整體表面的平坦度不佳 的問題，是於彩色光阻層32〇再塗佈覆蓋一透明^阻^ 330。使用透明光阻33〇之方法，雖可然有效的解決表^ 平坦度不佳的問題，但是這種方法仍然具有其他的問題。 這些問題主要有缺陷（Defeet)放大問題、整體間距不良 (Total Pitch N.G·)問題等。 义 因此，需要一種可以提供較佳平坦度的彩色濾光片基 材裝置及其製造方法，來解決前述現有的問題。 【發明内容】 因此本發明的目的在提供一種彩色濾光片基材裝置 久六製造方法，該基材裝置可提保平坦度較佳的表面，保 彩色光阻層（即R、G、B光阻）形成於其上，使彩色光阻層 表面獲得較佳的平坦度。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter, and more particularly to a substrate device having a color filter having in-plane flatness and a method of fabricating the same. [Prior Art] A color filter is one of the main components in a liquid crystal display. Currently, the color filter mainly comprises a substrate, a black matrix, a color layer (RGB) layer, an ITO conductive film, and a photo spacer layer. The substrate is mainly made of chrome-plated glass. On the substrate, a black matrix, a color layer, an IT0 conductive film, and the like are formed, respectively.曰 Referring to FIG. 1, the substrate device of the conventional color filter includes a substrate 300, a resin black matrix 3 10, and a color photoresist layer 320. The color photoresist layer 320 includes an r color element photoresist mi, a 色彩 color element photoresist 322, and a B color element photoresist 323. The resin black matrix 310 is formed on the substrate 3 and includes a plurality of open regions 311. The color resist layer 32 is formed on the substrate 3A and the resin black matrix 310. Due to the influence of the opening region 311, the R color element photoresist 321, the G color element photoresist 322, and the B color element photoresist 323 may form a projection 340 at a portion where the eucalyptus moon black matrix 3 1 〇 overlaps. The projections 340 cause a problem that the flatness of the entire surface of the color resist layer 32 is poor. The poor flatness is likely to cause the alignment of the liquid crystal, and the effect thereof is 6 200829964. The conventional problem of solving the problem that the flatness of the entire surface of the color resist layer 32 is poor is that the color photoresist layer 32 is coated with a transparent film 330. The method of using the transparent photoresist 33 , can effectively solve the problem of poor flatness of the surface, but this method still has other problems. These problems are mainly defective (Defeet) amplification problems, poor overall pitch (Total Pitch N.G.) problems. Therefore, there is a need for a color filter substrate device that provides better flatness and a method of fabricating the same to solve the aforementioned problems. SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a method for manufacturing a color filter substrate device which can ensure a flat surface with a good flatness and a color resist layer (ie, R, G, B). A photoresist is formed thereon to obtain a better flatness of the surface of the color resist layer.
依據本發明的一彩色濾光片基材裝置包含一基材以 及一平坦層。平坦層係形成於基材上並具有-平坦二。平 坦層包含一樹脂黑色矩陣以及一透明層。樹脂黑色矩陣係 形成於該基材上，具有_第一表面，並包含複數開口區。 透明層係形成於該基材上並填充各該開nn，且具有—第 一表面。其中，該平坦面包含該第一表面以及該第二表面。 在一較佳的實施例中，透明層係為透明光阻。、 依據本發明的-彩色據光片基材裝置的製造方法係 1用於基材背面曝光方式，利用樹脂黑色矩陣當光罩，對 200829964 透明光阻進行曝光，來形成該平坦層。 本發明所達成之功效在於： 利用背面曝光方式，以樹脂黑色矩陣為光罩，使用透 月光阻與树月曰黑色矩陣構成一平坦面，平坦面提供了彩色 光阻層（即R、G、B光阻）形成於其上，使彩色光阻層表面 獲得較佳的平坦度RGB光阻跨在此一平坦面上，可解決現 有彩色光阻層表面平坦度不佳的問題。 【實施方式】 本發明較佳實施例之一彩色濾光片基材裝置及其製 造方法，其中，該基材裝置包含一基材以及一平坦層。平 坦層係形成於基材上並具有一平坦面。藉此，可提供平坦 度較佳的表面，供彩色光阻層（即R' G、β光阻）形成於其 上，使彩色光阻層表面獲得較佳的平坦度。而關於其製造 方法，係使用於基材背面曝光方式，來形成該平坦層。 請參照第2圖所示，本發明一較佳實施例的基材裝置 10，包含一基材100以及一平坦層13〇。平坦層13〇係形 成於該基材100上，具有一平坦面131。平坦層13〇包含 一樹脂黑色矩陣110以及一透明層120。 請參照第3圖所示，樹脂黑色矩陣丨1()係形成於該基 材1〇〇上，具有一第一表面，並包含複數開口區U1。 請進一步參照第4圖所示，透明層12〇係形成於該基 材100上，並形成於（如使用覆蓋或塗佈方式）各該開口區 1U，且具有一第二表面。透明層12〇係可為透明光阻，並 8A color filter substrate device in accordance with the present invention comprises a substrate and a flat layer. The flat layer is formed on the substrate and has a flat two. The flat layer comprises a resin black matrix and a transparent layer. A resin black matrix is formed on the substrate, has a first surface, and includes a plurality of open regions. A transparent layer is formed on the substrate and fills each of the openings nn and has a first surface. Wherein the flat surface comprises the first surface and the second surface. In a preferred embodiment, the transparent layer is a transparent photoresist. The method for manufacturing a color-light-based substrate device according to the present invention is for a substrate back-side exposure method, and the flat layer is formed by exposing a transparent photoresist of 200829964 using a resin black matrix as a mask. The effect achieved by the invention lies in: using a back exposure method, using a resin black matrix as a mask, using a moon-transparent photoresist and a tree matrix black matrix to form a flat surface, the flat surface providing a color photoresist layer (ie, R, G, The B photoresist is formed thereon to obtain a better flatness of the surface of the color photoresist layer. The RGB photoresist is spread across the flat surface, which solves the problem of poor surface flatness of the existing color photoresist layer. [Embodiment] A color filter substrate device and a method of manufacturing the same according to a preferred embodiment of the present invention, wherein the substrate device comprises a substrate and a flat layer. The flat layer is formed on the substrate and has a flat surface. Thereby, a surface having a better flatness can be provided for the color photoresist layer (i.e., R' G, β photoresist) to be formed thereon to obtain a better flatness of the surface of the color resist layer. Regarding the manufacturing method, the flat layer is formed by using a substrate back exposure method. Referring to Fig. 2, a substrate device 10 according to a preferred embodiment of the present invention comprises a substrate 100 and a flat layer 13A. A flat layer 13 is formed on the substrate 100 and has a flat surface 131. The flat layer 13A includes a resin black matrix 110 and a transparent layer 120. Referring to Fig. 3, a resin black matrix 丨 1 () is formed on the substrate 1 ,, has a first surface, and includes a plurality of open regions U1. Further, referring to Fig. 4, a transparent layer 12 is formed on the substrate 100 and formed (e.g., by covering or coating) each of the open regions 1U and has a second surface. The transparent layer 12 can be a transparent photoresist, and 8
200829964 #佈方式將透明光阻填人開口區U1中。 當透明光阻形成於開口區u 北 式，由基材H)0異於透明光阻的 使用月面曝光方 的透明光HBL瞧井.Bi 】，將位於開口區ln …先阻曝先。此時’樹脂黑色矩陣η。 用。較佳的狀況，需抑制掛 ’、、' 單 透明層心I:: 的第—表面與 U〇M、类昍昆 乂 、同平面，即控制樹脂黑色矩陣 110與透明層120的厚度相同。 可考慮製程上的因素，控制樹脂黑色矩陣110的第一 表面與透明層m第二表面間的—高度差小於或等於〇5 微米(㈣。同時，該平坦面131並包含該第一表面以及該 第二表面。控制使平坦層130的厚度界於約〇1微米(㈣ 到約3微米（μηα)範圍之間。 請參照第5圖與第6圖所示，藉此；平坦層13〇的平 坦面130提供平坦度較佳的表面，可供一彩色光阻層 形成於其上。彩色光阻層140的R色彩元素光阻141、^ 色彩兀素光阻142、B色彩元素光阻143可形成於平坦面 130上’使該些色彩元素光阻M1、142、143的表面不會 有凸出部分。而使彩色光阻層14〇整體表面獲得較佳的平 坦度。以利後續塗佈一 ITO層150於其上。 請參照第7圖所示，本發明一較佳實施例的基材裝置 的製造方法，主要於一基材上形成一樹脂黑色矩陣，使該 樹脂黑色矩陣具有一第一表面並包含複數開口區。再於該 基材上形成（可以使用塗佈或覆蓋方式）一透明光阻並再以 透明光阻塗佈各開口區，於該基材上係形成透明層，且使 200829964 透明光阻具有一第二表面β ⑨形成完透明光阻後，使用背面曝光方式，由該基材 二於該透明光阻的一側，將位於該些開口區的透明光阻曝 光（此時即利用樹脂黑色矩陣作為光罩使用）。 藉此，於該基材形成一平坦層，使該平坦層具有一平 坦面，平坦面包含該第一表面以及該第二表面，並可提供 平坦度較佳的表面，供彩色光阻層（即R、G、Β光阻）形成 於其上，使彩色光阻層表面獲得較佳的平坦度。 __然本發明已以-較佳實施例揭露如上，然其並非用 以限定本發明，任何熟習此技藝者，在不脫離本發明之精 神和範圍内，當可作各種之更動與潤飾，因此本發明之保 类fe圍當視後附之申請專利範圍所界定者為準。 【圖式簡單說明】 為讓本發明之上述和其他目的、特徵、優點與實施例 能更明顯易懂，所附圖式之詳細說明如下·· 第1圖現有彩色濾光片的基材裝置之剖面示意圖。 第2圖係繪示依照本發明一較佳實施例的剖面示意 圖。 第3圖係繪示第2圖中較佳實施例的製造流程示意 圖。 第4圖係繪示第2圖中較佳實施例的製造流程示意 圖。 200829964 弟5圖係緣示第2闰+ h 禾2圖令較佳實施例的使用狀態示意 弟6圖係繪示第2同+ 土 乐2圖中較佳實施例的使用狀態示意 第7圖係緣示第2圖中去丄乂土 — > / ^ , 口〒較佳貫施例的流程圖。 【主要元件符號說明】 10 :基材裝置 loo 基材 11(^樹脂黑色矩陣 111 :開口區 120 :透明層 13 0 :平坦層 131 :平坦面 140 :彩色光阻層 141 : R色彩元素光阻 142 : G色彩元素光阻 143 : Β色彩元素光阻 150 : ΙΤΟ 層 300 :基材 3 10 ·樹脂黑色矩陣 311 :開口區 320 :彩色光阻層 321 · R色彩元素光祖 322 · G色彩元素光阻 323 · Β色彩元素光阻 330 :透明光阻 340 :凸出部 11200829964 #布方式 The transparent photoresist is filled in the open area U1. When the transparent photoresist is formed in the open region u, the transparent light HBL, which is different from the transparent photoresist by the substrate H)0, is located in the open region ln ... first exposed. At this time, the resin black matrix η. use. In a preferred case, it is necessary to suppress the first surface of the single transparent layer I:: from the U 〇 M, the 昍 昍 , and the same plane, that is, the thickness of the control resin black matrix 110 and the transparent layer 120 are the same. Considering the factors in the process, the height difference between the first surface of the control resin black matrix 110 and the second surface of the transparent layer m is less than or equal to 〇5 μm ((4). Meanwhile, the flat surface 131 includes the first surface and The second surface is controlled such that the thickness of the flat layer 130 is between about 1 micrometer ((4) to about 3 micrometers (μηα). Please refer to FIGS. 5 and 6 to thereby; the flat layer 13〇 The flat surface 130 provides a flat surface with a flat surface for a color photoresist layer to be formed. The R color element photoresist 141 of the color photoresist layer 140, the color elemental photoresist 142, and the B color element photoresist 143 can be formed on the flat surface 130 so that the surface of the color element photoresists M1, 142, 143 does not have a convex portion, and the color photoresist layer 14 has a better flatness on the entire surface. An ITO layer 150 is coated thereon. Referring to FIG. 7, a method for fabricating a substrate device according to a preferred embodiment of the present invention mainly forms a resin black matrix on a substrate to make the resin black matrix. Having a first surface and comprising a plurality of open areas. Forming (using a coating or covering method) a transparent photoresist and coating each open area with a transparent photoresist, forming a transparent layer on the substrate, and making the 200829964 transparent photoresist have a second surface β 9 After the transparent photoresist is formed, the transparent photoresist located in the open areas is exposed from the side of the transparent photoresist by the back exposure method (in this case, the resin black matrix is used as the mask). Thereby, forming a flat layer on the substrate, the flat layer having a flat surface, the flat surface including the first surface and the second surface, and providing a flat surface with a better flatness for the color photoresist layer (ie, R, G, and yttrium photoresist) are formed thereon to obtain a better flatness of the surface of the color photoresist layer. __ However, the present invention has been disclosed in the preferred embodiment as above, but it is not intended to limit the present invention. The invention is to be construed as being limited by the scope of the invention, and the scope of the invention is defined by the scope of the appended claims. [Simple description of the map] The above and other objects, features, advantages and embodiments of the present invention will become more <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; BRIEF DESCRIPTION OF THE DRAWINGS FIG. 3 is a schematic cross-sectional view showing a preferred embodiment of the present invention. FIG. 4 is a schematic view showing a manufacturing process of the preferred embodiment of FIG. Schematic diagram of the manufacturing process. 200829964 Figure 5 shows the state of use of the preferred embodiment. Figure 6 shows the state of use of the preferred embodiment of the second and the same Fig. 7 is a flow chart showing the preferred embodiment of the method of removing the earth - > / ^ in Fig. 2. [Main component symbol description] 10: substrate device loo substrate 11 (^ resin Black matrix 111: open area 120: transparent layer 13 0 : flat layer 131 : flat surface 140 : color resist layer 141 : R color element photoresist 142 : G color element photoresist 143 : Β color element photoresist 150 : ΙΤΟ layer 300 : substrate 3 10 · resin black matrix 311 : open region 320 : color photoresist layer 321 · R Kuang-tsu 322 · G color elements of the color element 323 · Β color element photoresist resist 330: transparent resist 340: projecting portion 11