[go: up one dir, main page]

TW200731031A - Exposure apparatus - Google Patents

Exposure apparatus

Info

Publication number
TW200731031A
TW200731031A TW095136982A TW95136982A TW200731031A TW 200731031 A TW200731031 A TW 200731031A TW 095136982 A TW095136982 A TW 095136982A TW 95136982 A TW95136982 A TW 95136982A TW 200731031 A TW200731031 A TW 200731031A
Authority
TW
Taiwan
Prior art keywords
mask
substrate
color filter
photo mask
optical distance
Prior art date
Application number
TW095136982A
Other languages
Chinese (zh)
Other versions
TWI446122B (en
Inventor
Koichi Kajiyama
Yoshio Watanabe
Original Assignee
V Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by V Technology Co Ltd filed Critical V Technology Co Ltd
Publication of TW200731031A publication Critical patent/TW200731031A/en
Application granted granted Critical
Publication of TWI446122B publication Critical patent/TWI446122B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7038—Alignment for proximity or contact printer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The present invention includes respectively capturing a substrate side alignment mark formed on a color filter substrate 6 and a mask side alignment mark formed on a photo mask 7 within one field of vision and taking images by an imaging means 3; based on each of the images retrieved for the substrate side and mask side alignment marks, moving a stage 1 and a mask stage 2 relatively and correspondingly; aligning the color filter substrate 6 and the photo mask 7 and performing exposure; and including an optical distance compensating means 4 used for making optical distance between a line CCD 22 of the imaging means 3 and the color filter substrate 6, and optical distance between a line CCD 22 of the imaging means 3 and the photo mask 7 substantially identical. Thus, the processing time for aligning the substrate and the photo mask can be reduced.
TW95136982A 2005-10-07 2006-10-05 Exposure apparatus TWI446122B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005295056A JP4754924B2 (en) 2005-10-07 2005-10-07 Exposure equipment

Publications (2)

Publication Number Publication Date
TW200731031A true TW200731031A (en) 2007-08-16
TWI446122B TWI446122B (en) 2014-07-21

Family

ID=37942575

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95136982A TWI446122B (en) 2005-10-07 2006-10-05 Exposure apparatus

Country Status (5)

Country Link
JP (1) JP4754924B2 (en)
KR (1) KR101205522B1 (en)
CN (1) CN101258448B (en)
TW (1) TWI446122B (en)
WO (1) WO2007043324A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI512388B (en) * 2010-06-17 2015-12-11 V Technology Co Ltd Photomask, laser beam annealing apparatus and exposure apparatus therewith

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5076233B2 (en) * 2007-05-16 2012-11-21 株式会社ブイ・テクノロジー Method for adjusting initial position and orientation of exposure mask
JP2009210598A (en) * 2008-02-29 2009-09-17 Nsk Ltd Glass substrate, and proximity scan exposure apparatus, and proximity scan exposure method
JP2009251290A (en) * 2008-04-07 2009-10-29 V Technology Co Ltd Exposure apparatus
JP5261665B2 (en) * 2008-05-27 2013-08-14 株式会社ブイ・テクノロジー Proximity exposure equipment
CN102047152B (en) 2008-05-28 2012-12-26 凸版印刷株式会社 Method for producing color filter, method for producing substrate with pattern, and small photomask
JP5499398B2 (en) * 2009-05-11 2014-05-21 Ｎｓｋテクノロジー株式会社 Exposure apparatus and exposure method
JP5471046B2 (en) 2009-06-03 2014-04-16 株式会社ブイ・テクノロジー Laser annealing method and laser annealing apparatus
JP2011003605A (en) * 2009-06-16 2011-01-06 Hitachi High-Technologies Corp Proximity aligner, alignment method for proximity aligner, and manufacturing method for display panel board
JP5633021B2 (en) * 2009-06-29 2014-12-03 株式会社ブイ・テクノロジー Alignment method, alignment apparatus, and exposure apparatus
JP5351287B2 (en) * 2010-01-21 2013-11-27 シャープ株式会社 Substrate, exposure method for substrate, photo-alignment processing method
JPWO2011105461A1 (en) * 2010-02-24 2013-06-20 Ｎｓｋテクノロジー株式会社 Light irradiation apparatus for exposure apparatus, exposure apparatus, exposure method, substrate manufacturing method, mask, and substrate to be exposed
JP5382456B2 (en) * 2010-04-08 2014-01-08 株式会社ブイ・テクノロジー Exposure method and exposure apparatus
JP5843191B2 (en) * 2011-08-03 2016-01-13 株式会社ブイ・テクノロジー Photo mask
JP6002898B2 (en) * 2011-08-10 2016-10-05 株式会社ブイ・テクノロジー Alignment device for exposure equipment
CN103858208B (en) * 2011-08-10 2016-08-24 株式会社V技术 The alignment device of exposure device and alignment mark
JP5874900B2 (en) * 2011-09-09 2016-03-02 株式会社ブイ・テクノロジー Alignment device for exposure equipment
KR101552923B1 (en) * 2012-10-12 2015-09-14 주식회사 옵티레이 Exposure apparatus
SG11201700008WA (en) * 2014-07-23 2017-02-27 Heptagon Micro Optics Pte Ltd Light emitter and light detector modules including vertical alignment features
CN105159037B (en) * 2015-09-30 2017-06-30 合肥芯碁微电子装备有限公司 A kind of angle calibration method of direct-write type lithography machine pattern generator
CN107145043A (en) * 2017-07-11 2017-09-08 上海镭慎光电科技有限公司 The exposure device and exposure method of silicon chip alignment mark
CN109324486A (en) * 2018-11-07 2019-02-12 惠科股份有限公司 Method and device for correcting exposure offset of yellow light process
JP7266864B2 (en) * 2019-07-19 2023-05-01 株式会社ブイ・テクノロジー Exposure device and exposure method
CN113132621B (en) * 2020-01-10 2022-04-26 长鑫存储技术有限公司 System and method for correcting position of shooting device

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5211774A (en) * 1975-07-17 1977-01-28 Canon Inc Method of detecting relative position of patterns
JP2775519B2 (en) * 1990-08-21 1998-07-16 住友重機械工業株式会社 Dual focus device using reference reticle
JPH04262523A (en) * 1991-02-18 1992-09-17 Toshiba Corp Aligner
JPH06224101A (en) * 1993-01-26 1994-08-12 Fujitsu Ltd Bifocal lens and alignment device
JPH09199387A (en) * 1996-01-12 1997-07-31 Canon Inc Position sensor, and semiconductor-element manufacturing method using the sensor
JP2001338867A (en) * 2000-05-30 2001-12-07 Nikon Corp Lighting device, position-measuring device, and aligner and exposure method
JP2004103644A (en) * 2002-09-05 2004-04-02 Sumitomo Heavy Ind Ltd Apparatus and method for detecting position of approaching mask and wafer
JP4390512B2 (en) * 2003-09-22 2009-12-24 大日本印刷株式会社 Exposure method and substrate alignment method used in the method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI512388B (en) * 2010-06-17 2015-12-11 V Technology Co Ltd Photomask, laser beam annealing apparatus and exposure apparatus therewith

Also Published As

Publication number Publication date
KR20080053481A (en) 2008-06-13
CN101258448A (en) 2008-09-03
CN101258448B (en) 2012-05-30
KR101205522B1 (en) 2012-11-28
JP2007102094A (en) 2007-04-19
TWI446122B (en) 2014-07-21
WO2007043324A1 (en) 2007-04-19
JP4754924B2 (en) 2011-08-24

Similar Documents

Publication Publication Date Title
TW200731031A (en) Exposure apparatus
TW200720855A (en) Exposure method and exposure apparatus
ATE381038T1 (en) METHOD AND DEVICE FOR CORRECTING LENS DEFECTS OF A STEREOSCOPIC CAMERA SYSTEM WITH ZOOM
EP1139706A3 (en) Positioning apparatus used in a process for producing multi-layered printed circuit board and method of using the same
TW200501729A (en) Method of aligning lens and sensor of camera
TW200626887A (en) Optical inspection of test surfaces
ATE354497T1 (en) DEVICE FOR MONITORING THE SURROUNDINGS OF A VEHICLE AND METHOD FOR ADJUSTING THE SAME
WO2003011103A3 (en) Apparatus and methods for in vivo imaging
TW200632588A (en) Exposure device, exposure method and production method of a micro-device
TW200509205A (en) Exposure method and device-manufacturing method
EP0957642A3 (en) Image correction apparatus for stereo camera
ATE371916T1 (en) DEVICE AND METHOD FOR THREE-DIMENSIONAL IMAGE MEASURING
WO2007110697A3 (en) Method and device for identifying and calibrating panoramic optical systems
WO2007064495A3 (en) Adjusting digital image exposure and tone scale
TW200705133A (en) Lithographic apparatus and device manufacturing method
MY144978A (en) Vision system for positioning a bonding tool
TW200951423A (en) System and method for sorting polarization films
TW200735249A (en) Visual inspection apparatus
JP2008300394A5 (en)
WO2008042832A3 (en) Calibration apparatus and method for fluorescent imaging
WO2006079963A3 (en) Device for registering images
TW200608135A (en) Digital camera
TW200508786A (en) A method of calibrating a lithographic apparatus, an alignment method, a computer program, a lithographic apparatus and a device manufacturing method
EP1447718A3 (en) Exposure apparatus and method
TW200707139A (en) Exposure apparatus and exposed substance