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TW200725199A - Sealing-contact type exposure apparatus - Google Patents

Sealing-contact type exposure apparatus

Info

Publication number
TW200725199A
TW200725199A TW095127699A TW95127699A TW200725199A TW 200725199 A TW200725199 A TW 200725199A TW 095127699 A TW095127699 A TW 095127699A TW 95127699 A TW95127699 A TW 95127699A TW 200725199 A TW200725199 A TW 200725199A
Authority
TW
Taiwan
Prior art keywords
substrate
frame
sealing
suction
exposure apparatus
Prior art date
Application number
TW095127699A
Other languages
English (en)
Other versions
TWI383272B (zh
Inventor
Akira Igarashi
Yosuke Taguchi
Original Assignee
Adtec Eng Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adtec Eng Co Ltd filed Critical Adtec Eng Co Ltd
Publication of TW200725199A publication Critical patent/TW200725199A/zh
Application granted granted Critical
Publication of TWI383272B publication Critical patent/TWI383272B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW095127699A 2005-12-22 2006-07-28 密接型曝光裝置 TWI383272B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005370037A JP2007171621A (ja) 2005-12-22 2005-12-22 密着型露光装置

Publications (2)

Publication Number Publication Date
TW200725199A true TW200725199A (en) 2007-07-01
TWI383272B TWI383272B (zh) 2013-01-21

Family

ID=38184501

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095127699A TWI383272B (zh) 2005-12-22 2006-07-28 密接型曝光裝置

Country Status (4)

Country Link
JP (1) JP2007171621A (zh)
KR (1) KR20070066832A (zh)
CN (1) CN1987655A (zh)
TW (1) TWI383272B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI694540B (zh) * 2016-03-01 2020-05-21 日商牛尾電機股份有限公司 印刷基板用曝光裝置

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4651648B2 (ja) * 2007-09-12 2011-03-16 日立ビアメカニクス株式会社 密着露光の方法及びその装置
JP4949195B2 (ja) * 2007-10-26 2012-06-06 株式会社アドテックエンジニアリング 露光装置及び基板の矯正装置
JP6035670B2 (ja) * 2012-08-07 2016-11-30 株式会社ニコン 露光方法、フラットパネルディスプレイの製造方法、及びデバイス製造方法、並びに露光装置
KR101451094B1 (ko) * 2013-10-04 2014-10-15 주식회사 옵티레이 밀착형 노광 장치
KR101600810B1 (ko) 2014-05-12 2016-03-08 주식회사 옵티레이 노광 장치
CN104076619A (zh) * 2014-07-03 2014-10-01 无锡宏纳科技有限公司 一种接触式光刻机吸盘
CN104932208B (zh) * 2015-07-07 2017-01-18 仓和精密制造(苏州)有限公司 曝光治具及其工作过程
CN109143791B (zh) * 2018-08-29 2020-03-20 中国科学院光电技术研究所 一种用于柔性薄膜衬底接触式光刻的真空贴附装置
JP7239388B2 (ja) * 2019-05-09 2023-03-14 株式会社アドテックエンジニアリング 直描式露光装置
JP6789368B2 (ja) * 2019-12-25 2020-11-25 株式会社アドテックエンジニアリング プリント基板用露光装置
CN115623690A (zh) * 2022-07-20 2023-01-17 上海美维电子有限公司 印刷线路板自动曝光固定方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2850061B2 (ja) * 1991-04-04 1999-01-27 日立電子エンジニアリング株式会社 基板露光装置
JP3070012B1 (ja) * 1999-07-30 2000-07-24 株式会社オーク製作所 露光装置用スペ―サ
FR2842617B1 (fr) * 2002-07-17 2005-01-21 Automa Tech Sa Machine d'exposition de panneaux de circuit imprime
JP4192039B2 (ja) * 2003-06-06 2008-12-03 株式会社オーク製作所 露光装置の露光方法
JP4298399B2 (ja) * 2003-06-26 2009-07-15 キヤノン株式会社 電子線装置及び該電子線装置を用いた電子線描画装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI694540B (zh) * 2016-03-01 2020-05-21 日商牛尾電機股份有限公司 印刷基板用曝光裝置

Also Published As

Publication number Publication date
KR20070066832A (ko) 2007-06-27
JP2007171621A (ja) 2007-07-05
CN1987655A (zh) 2007-06-27
TWI383272B (zh) 2013-01-21

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