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TW200722937A - Exposure apparatus - Google Patents

Exposure apparatus

Info

Publication number
TW200722937A
TW200722937A TW095145942A TW95145942A TW200722937A TW 200722937 A TW200722937 A TW 200722937A TW 095145942 A TW095145942 A TW 095145942A TW 95145942 A TW95145942 A TW 95145942A TW 200722937 A TW200722937 A TW 200722937A
Authority
TW
Taiwan
Prior art keywords
air
sidewall
supply port
exposure chamber
support frame
Prior art date
Application number
TW095145942A
Other languages
English (en)
Other versions
TWI366744B (zh
Inventor
Masahiko Funayama
Shinichiro Mizuguchi
Masaru Ise
Original Assignee
Orc Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orc Mfg Co Ltd filed Critical Orc Mfg Co Ltd
Publication of TW200722937A publication Critical patent/TW200722937A/zh
Application granted granted Critical
Publication of TWI366744B publication Critical patent/TWI366744B/zh

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW095145942A 2005-12-14 2006-12-08 Exposure apparatus TW200722937A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005361107A JP4472626B2 (ja) 2005-12-14 2005-12-14 露光装置

Publications (2)

Publication Number Publication Date
TW200722937A true TW200722937A (en) 2007-06-16
TWI366744B TWI366744B (zh) 2012-06-21

Family

ID=38165654

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095145942A TW200722937A (en) 2005-12-14 2006-12-08 Exposure apparatus

Country Status (3)

Country Link
JP (1) JP4472626B2 (zh)
CN (1) CN100495217C (zh)
TW (1) TW200722937A (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1036290A1 (nl) * 2007-12-19 2009-06-22 Asml Netherlands Bv Lithographic apparatus.
CN101276150B (zh) * 2008-03-21 2010-06-02 上海微电子装备有限公司 一种步进重复曝光装置
JP5290063B2 (ja) * 2009-06-17 2013-09-18 株式会社日立ハイテクノロジーズ プロキシミティ露光装置、プロキシミティ露光装置の基板温度制御方法、及び表示用パネル基板の製造方法
CN102231047B (zh) * 2011-06-23 2016-09-14 上海华虹宏力半导体制造有限公司 紫外光固设备及紫外光固设备报警方法
JP2015034846A (ja) * 2013-08-07 2015-02-19 株式会社清和光学製作所 縦型フィルム露光装置
JP7386742B2 (ja) * 2020-03-24 2023-11-27 株式会社Ｓｃｒｅｅｎホールディングス 露光装置

Also Published As

Publication number Publication date
TWI366744B (zh) 2012-06-21
JP4472626B2 (ja) 2010-06-02
CN100495217C (zh) 2009-06-03
JP2007163904A (ja) 2007-06-28
CN1983038A (zh) 2007-06-20

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees