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TW200632305A - Method and device for measuring optical anisotropy parameter - Google Patents

Method and device for measuring optical anisotropy parameter

Info

Publication number
TW200632305A
TW200632305A TW095102013A TW95102013A TW200632305A TW 200632305 A TW200632305 A TW 200632305A TW 095102013 A TW095102013 A TW 095102013A TW 95102013 A TW95102013 A TW 95102013A TW 200632305 A TW200632305 A TW 200632305A
Authority
TW
Taiwan
Prior art keywords
incidence
minimum value
detected
maximum value
measuring
Prior art date
Application number
TW095102013A
Other languages
Chinese (zh)
Other versions
TWI384213B (en
Inventor
Daisuke Tanooka
Original Assignee
Moritex Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2006004751A external-priority patent/JP4663529B2/en
Application filed by Moritex Corp filed Critical Moritex Corp
Publication of TW200632305A publication Critical patent/TW200632305A/en
Application granted granted Critical
Publication of TWI384213B publication Critical patent/TWI384213B/en

Links

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Spectrometry And Color Measurement (AREA)

Abstract

This invention provides a method and a device for measuring optical anisotropy parameter capable of rapidly and high precisely measuring direction and size of optical axis as well as film thickness of an optical anisotropic film, and performing a distribution measurement by two-dimensional light receiving element. In the present invention, a single color light of P polarized light is irradiated at a predetermined incidence angle from a plurality of incidence directions centering around normal line (Z) rising up on the measuring point (M) and set at a predetermined angle interval, and a reflection light intensity of S polarized light included in the reflection light is detected according to the incidence direction, such that a azimuth direction (ΦA) of the optical axis (OX) on measuring point (M) is determined according to incidence direction (v1) of which the minimum value (V1) is measured, wherein the minimum value (V1) interposed between two maxi mum values (Λ1,Λ2), which are largest peak among incidence directions showing minimum value of the reflection light intensity, has been detected and a pole angle direction (θ) is determined according to incidence direction (v1) of which the minimum value (V3) interposed between maximum value (Λ1), which is maximum peak and maximum value (Λ3) which is middle peak adjacent to the maximum value (Λ1), has been detected.
TW095102013A 2005-01-24 2006-01-19 Method and device for measuring optical anisotropy parameter TWI384213B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005015017 2005-01-24
JP2006004751A JP4663529B2 (en) 2005-01-24 2006-01-12 Optical anisotropy parameter measuring method and measuring apparatus

Publications (2)

Publication Number Publication Date
TW200632305A true TW200632305A (en) 2006-09-16
TWI384213B TWI384213B (en) 2013-02-01

Family

ID=37077460

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095102013A TWI384213B (en) 2005-01-24 2006-01-19 Method and device for measuring optical anisotropy parameter

Country Status (3)

Country Link
KR (1) KR101280335B1 (en)
CN (1) CN100570310C (en)
TW (1) TWI384213B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI467157B (en) * 2008-09-02 2015-01-01 Schott Moritex Corp Method and apparatus for measuring optically anisotropic parameters
CN112066896A (en) * 2020-07-22 2020-12-11 北京量拓科技有限公司 Method and device for positioning vertex of curved surface sample and ellipsometer

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CN101846819B (en) * 2009-03-27 2012-05-30 比亚迪股份有限公司 Detection method of screen marks in liquid crystal display manufacturing
JP5806837B2 (en) * 2011-04-11 2015-11-10 株式会社モリテックス Optical anisotropy parameter measuring device, measuring method and measuring program
JP6087751B2 (en) * 2013-07-05 2017-03-01 株式会社モリテックス Optical anisotropy parameter measuring device, measuring method and measuring program
WO2016131658A1 (en) * 2015-02-19 2016-08-25 Koninklijke Philips N.V. Infrared laser illumination device
CN104808586A (en) * 2015-04-20 2015-07-29 京东方科技集团股份有限公司 Coating machine
US9612212B1 (en) * 2015-11-30 2017-04-04 Samsung Electronics Co., Ltd. Ellipsometer and method of inspecting pattern asymmetry using the same
CN106841228B (en) * 2015-12-03 2020-10-30 特铨股份有限公司 Dust detection mechanism
CN105842889B (en) * 2016-06-21 2019-09-06 京东方科技集团股份有限公司 The detection device and method of light alignment substrates
JP6356372B1 (en) 2017-05-23 2018-07-11 浜松ホトニクス株式会社 Alignment characteristic measurement method, alignment characteristic measurement program, and alignment characteristic measurement apparatus
EP3633351B1 (en) * 2017-05-23 2023-03-29 Hamamatsu Photonics K.K. Orientation characteristic measurement method, orientation characteristic measurement program, and orientation characteristic measurement device
CN109342325B (en) * 2018-10-30 2023-12-19 南开大学 A method and device for anisotropic microscopic imaging of low-dimensional materials

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2776333B2 (en) * 1995-09-20 1998-07-16 日本電気株式会社 Liquid crystal alignment film inspection method and inspection apparatus
JP2000081371A (en) * 1998-09-07 2000-03-21 Nec Corp Method and device for evaluating thin-film molecular orientation and storage medium
JP2000121496A (en) * 1998-10-14 2000-04-28 Nec Corp Method and apparatus for evaluating orientation film and recording medium recording orientation film- evaluating program
JP3447654B2 (en) * 2000-03-24 2003-09-16 Ｎｅｃエレクトロニクス株式会社 Anisotropic thin film evaluation method and evaluation device
JP3425923B2 (en) * 2000-03-27 2003-07-14 Ｎｅｃエレクトロニクス株式会社 Evaluation method and evaluation device for anisotropic multilayer thin film structure
JP4802409B2 (en) * 2000-07-21 2011-10-26 コニカミノルタホールディングス株式会社 Optical compensation film, polarizing plate and liquid crystal display device using the same
JP2002162344A (en) * 2000-11-22 2002-06-07 Nec Corp Evaluation method of anisotropic thin film and its equipment

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI467157B (en) * 2008-09-02 2015-01-01 Schott Moritex Corp Method and apparatus for measuring optically anisotropic parameters
CN112066896A (en) * 2020-07-22 2020-12-11 北京量拓科技有限公司 Method and device for positioning vertex of curved surface sample and ellipsometer
CN112066896B (en) * 2020-07-22 2021-12-10 北京量拓科技有限公司 Method and device for positioning vertex of curved surface sample and ellipsometer

Also Published As

Publication number Publication date
TWI384213B (en) 2013-02-01
KR20060085574A (en) 2006-07-27
KR101280335B1 (en) 2013-07-01
CN100570310C (en) 2009-12-16
CN1847816A (en) 2006-10-18

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MM4A Annulment or lapse of patent due to non-payment of fees