TW200628477A - Organometallic compounds and processes for preparation thereof - Google Patents
Organometallic compounds and processes for preparation thereofInfo
- Publication number
- TW200628477A TW200628477A TW094135730A TW94135730A TW200628477A TW 200628477 A TW200628477 A TW 200628477A TW 094135730 A TW094135730 A TW 094135730A TW 94135730 A TW94135730 A TW 94135730A TW 200628477 A TW200628477 A TW 200628477A
- Authority
- TW
- Taiwan
- Prior art keywords
- group
- organometallic compounds
- substituted
- unsubstituted
- pyrrolyl
- Prior art date
Links
- 150000002902 organometallic compounds Chemical class 0.000 title abstract 5
- 238000000034 method Methods 0.000 title abstract 2
- 125000000168 pyrrolyl group Chemical group 0.000 abstract 2
- 238000000231 atomic layer deposition Methods 0.000 abstract 1
- 238000005229 chemical vapour deposition Methods 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229910052752 metalloid Inorganic materials 0.000 abstract 1
- 150000002738 metalloids Chemical class 0.000 abstract 1
- -1 pentadienyl group Chemical group 0.000 abstract 1
- 239000002243 precursor Substances 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Landscapes
- Chemical Vapour Deposition (AREA)
Abstract
This invention relates to organometallic compounds represented by the formula LML' wherein M is a metal or metalloid, L is a substituted or unsubstituted cyclopentadienyl group or cyclopentadienyl-like group, a substituted or unsubstituted pentadienyl group or pentadienyl-like group, or a substituted or unsubstituted pyrrolyl group or pyrrolyl-like group, and L' is a substituted or unsubstituted pyrrolyl group or pyrrolyl-like group, a process for producing the organometallic compounds, and a method for producing a film or coating from the organometallic compounds. The organometallic compounds are useful in semiconductor applications as chemical vapor or atomic layer deposition precursors for film depositions.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US61880604P | 2004-10-15 | 2004-10-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200628477A true TW200628477A (en) | 2006-08-16 |
| TWI377208B TWI377208B (en) | 2012-11-21 |
Family
ID=48087825
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW94135730A TWI377208B (en) | 2004-10-15 | 2005-10-13 | Organometallic compounds and processes for preparation thereof |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI377208B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI416605B (en) * | 2007-06-04 | 2013-11-21 | Tokyo Electron Ltd | Film forming method and film forming device |
-
2005
- 2005-10-13 TW TW94135730A patent/TWI377208B/en active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI416605B (en) * | 2007-06-04 | 2013-11-21 | Tokyo Electron Ltd | Film forming method and film forming device |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI377208B (en) | 2012-11-21 |
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