TW200622494A - Photoresist composition for positive liquid crystal device - Google Patents
Photoresist composition for positive liquid crystal deviceInfo
- Publication number
- TW200622494A TW200622494A TW094133633A TW94133633A TW200622494A TW 200622494 A TW200622494 A TW 200622494A TW 094133633 A TW094133633 A TW 094133633A TW 94133633 A TW94133633 A TW 94133633A TW 200622494 A TW200622494 A TW 200622494A
- Authority
- TW
- Taiwan
- Prior art keywords
- substituted
- liquid crystal
- crystal device
- photoresist composition
- positive liquid
- Prior art date
Links
- 239000004973 liquid crystal related substance Substances 0.000 title abstract 2
- 229920002120 photoresistant polymer Polymers 0.000 title abstract 2
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- 125000003118 aryl group Chemical group 0.000 abstract 2
- 239000002253 acid Substances 0.000 abstract 1
- 125000003710 aryl alkyl group Chemical group 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 1
- 230000001678 irradiating effect Effects 0.000 abstract 1
- 239000003960 organic solvent Substances 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004285750 | 2004-09-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200622494A true TW200622494A (en) | 2006-07-01 |
Family
ID=36119069
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW094133633A TW200622494A (en) | 2004-09-30 | 2005-09-28 | Photoresist composition for positive liquid crystal device |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2006035926A1 (zh) |
| TW (1) | TW200622494A (zh) |
| WO (1) | WO2006035926A1 (zh) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105384739B (zh) * | 2014-09-02 | 2020-03-20 | 石药集团中奇制药技术（石家庄）有限公司 | 吡唑并[3,4-c]吡啶类衍生物 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3787271B2 (ja) * | 2000-11-20 | 2006-06-21 | 東京応化工業株式会社 | 微細レジストホールパターン形成方法 |
| US7015363B2 (en) * | 2001-07-13 | 2006-03-21 | Kyowa Yuka Co., Ltd. | Process for producing ether compound |
| JP2003330172A (ja) * | 2002-05-14 | 2003-11-19 | Fuji Photo Film Co Ltd | ポジ型感光性組成物 |
| US20030235775A1 (en) * | 2002-06-13 | 2003-12-25 | Munirathna Padmanaban | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds |
| JP3844069B2 (ja) * | 2002-07-04 | 2006-11-08 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| TWI283335B (en) * | 2002-08-20 | 2007-07-01 | Kyowa Yuka Kk | A composition with photo-sensibility of visible light |
| JP2004075864A (ja) * | 2002-08-20 | 2004-03-11 | Kyowa Yuka Co Ltd | 樹脂組成物 |
| JP4302585B2 (ja) * | 2003-10-08 | 2009-07-29 | 信越化学工業株式会社 | 重合性化合物、高分子化合物及びポジ型レジスト材料並びにこれを用いたパターン形成方法 |
-
2005
- 2005-09-28 TW TW094133633A patent/TW200622494A/zh unknown
- 2005-09-30 JP JP2006537830A patent/JPWO2006035926A1/ja not_active Withdrawn
- 2005-09-30 WO PCT/JP2005/018091 patent/WO2006035926A1/ja active Application Filing
Also Published As
| Publication number | Publication date |
|---|---|
| WO2006035926A1 (ja) | 2006-04-06 |
| JPWO2006035926A1 (ja) | 2008-05-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GT200600283A (es) | COMPUESTOS DE AMINO-5-HETEROARILO (5 MIEMBROS) IMIDAZOLONA Y SU USO PARA LA MODULACIÓN DE LA beta-SECRETASA | |
| ATE320252T1 (de) | 3-(2-hydroxy-phenyl)-1h-pyrazol-4-carbonsäuream d derivate als hsp90 inhibitoren zur behandlung von krebs | |
| CU20100021A7 (es) | Derivado de oxopirazina y herbicida | |
| EP1968131A4 (en) | MATERIAL FOR AN ORGANIC ELECTROLUMINESCENCE DEVICE AND ORGANIC ELECTROLUMINESCENCE DEVICE | |
| EP1906239A3 (en) | Positive resist composition and pattern forming method using the same | |
| MX2009013728A (es) | Derivados de bicicloanilina. | |
| AR072166A1 (es) | Derivado de piperidina y su uso como inhibidor de renina superior | |
| NI200700242A (es) | Derivados de cumarina sustituidos con tiadiazol y sus usos como inhibidores de la biosíntesis de leucotrienos. | |
| AR057088A1 (es) | Compuestos quimicos | |
| WO2009010789A3 (en) | Pyrimidine derivatives 934 | |
| ECSP088805A (es) | 2-(piridin-2-il)-pirimidinas como fungicidas | |
| CY1115256T1 (el) | Φαρμακευτικες ενωσεις | |
| ATE399168T1 (de) | Imidazopyridin-derivate und ihre verwendung als induzierbare no-synthase inhibitoren | |
| TW200740957A (en) | Materical for organic electroluminescent element, and organic electroluminescent element | |
| TW200622494A (en) | Photoresist composition for positive liquid crystal device | |
| EP1744212A3 (en) | Photosensitive composition | |
| WO2005097100A3 (en) | Antibacterial agents | |
| CO5690544A2 (es) | Derivados de acido alcanoico sustituido con cicloalquilo metodos para su produccion y su uso como medicamentos | |
| DE602004014630D1 (de) | Imidazopyridinderivate als inhibitoren der induzierbaren no-synthase | |
| MX2008002112A (es) | Proceso quimico. | |
| DK1807401T3 (da) | Fremgangsmåde til fremstilling af phenyl-2-pyrimidinylketoner samt deres nye mellemprodukter | |
| RU2009109569A (ru) | Способ защиты материалов от микробного разрушения | |
| TH81547B (th) | อนุพันธ์ไพริมิดีน | |
| TH84138B (th) | สารประกอบ n- ฟอร์มิล ไฮดรอกซีลามีน | |
| TH88755A (th) | สารประกอบทางเคมี |