[go: up one dir, main page]

TW200533983A - Flat panel display apparatus - Google Patents

Flat panel display apparatus Download PDF

Info

Publication number
TW200533983A
TW200533983A TW094100271A TW94100271A TW200533983A TW 200533983 A TW200533983 A TW 200533983A TW 094100271 A TW094100271 A TW 094100271A TW 94100271 A TW94100271 A TW 94100271A TW 200533983 A TW200533983 A TW 200533983A
Authority
TW
Taiwan
Prior art keywords
layer
organic light
electrode
organic
emitting element
Prior art date
Application number
TW094100271A
Other languages
Chinese (zh)
Other versions
TWI388895B (en
Inventor
Hoon Kim
Jae-Hoon Chung
Joon-Hoo Choi
Sang-Pil Lee
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020040009302A external-priority patent/KR101007722B1/en
Priority claimed from KR1020040009308A external-priority patent/KR100976978B1/en
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of TW200533983A publication Critical patent/TW200533983A/en
Application granted granted Critical
Publication of TWI388895B publication Critical patent/TWI388895B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00Nanooptics, e.g. quantum optics or photonic crystals
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/87Passivation; Containers; Encapsulations
    • H10K59/874Passivation; Containers; Encapsulations including getter material or desiccant
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301Details of OLEDs
    • H10K2102/331Nanoparticles used in non-emissive layers, e.g. in packaging layer
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/87Passivation; Containers; Encapsulations
    • H10K59/873Encapsulations
    • H10K59/8731Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biophysics (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

A flat panel display apparatus includes a main plate, an organic light emitting element, a protecting layer and an attachable-detachable layer. The organic light emitting element includes a first electrode, a second electrode corresponding to the first electrode, and an organic light emitting layer disposed between the first and second electrodes to generate a light based on a current that flows between the first and second electrodes through the organic light emitting layer. The organic light emitting element is on the main plate. The protecting layer is on the organic light emitting element to protect the organic light emitting element. The attachable-detachable layer is on the protecting layer. Therefore, an image display quality is improved, and a manufacturing cost is decreased.

Description

200533983 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種平面顯示裝置及一種製造該平面顯示 衣置之方法。更具體而言,本發明係關於一種能夠改良影 像顯示品質並減小製造成本之平面顯示裝置及一種製造該 平面顯示裝置之方法。 【先前技術】 -有機發光顯示(〇LED)裝置之有機發光元件包括一陽 極、-陰極及-有機發光層。該陽極所提供之電洞與該陰 極所提供之電子於該有機發光層巾結合以產生具有受激態 之激子。當該激子自-激發態變成—基態時,該發光層即 產生光。 〇LED裝置具有各種特性,例如高亮度、寬視角、薄々 度二低功耗等。0LED裝置具有較諸如陰極射線管(CR以 置等其他顯不裝置簡單之結構’因而0LED裝置之製造成 本較CRT裝置之製造成本低。除此之外,⑽D裝置係一 么光U不衣置,因此無論視角如何皆可顯示高品質影 像。另外,〇LED裝置可具錢性面板,其可朝—大致垂 直於該板之表面之方向彎曲。 田,機lx光層暴路於水或氧氣中時,該有機發光層會與 水或乳氣反應,從而破壞該有機發光層之電化學特性。爲 吏〆有機么光層與水或氧隔離,該有機發光層處於一封閉 。另—選擇係’0LED裝置可包括-保護該有機發 光層免文水及氧影響之保護層。 98542.doc 200533983 一金屬罐、一玻璃基板等可位於該有機發光元件上以形 成該封閉空間。#該有機發光層係處於該封閉$間内時, 會使OLED裝置之製程複雜化,且會增加〇led裝置之製造 成本此外,〇LED裝置厚度之增加致使〇LED裝置之撓性 降低。 % 於該有機發光元件上塗佈一有機材料形成該保護層。另 -選擇係,可於該有機發光元件上沈積一無機材料开咖 保護層。 當保護層中聚合物之分子量增加時,保護層之滲透性合 增加。此外,當在高溫下形成具有聚合物之保護層時二 合物中可能會形成裂紋。 ♦ 當該無機層直接形成於該有機發光元件上時,該 光元件可能會因沈積製程中所產生之熱量而劣化:因:發 應在低溫下形成與有機發光元件接觸之層。然而,♦, 溫下形成該有機層時,會增加該有機層之滲透性。田在低 該有機層或無機層可形成諸如液晶(LCD)裝置、電將 示面板(PDP)顯示裝置等平面顯示裝置之保護層或觸:顯 板。 、面 【發明内容】 本發明提供-種能夠改良影像顯示品質並降低 之平面顯示裝置。 成本 本發明亦提供一種製造該平面顯示裝置之方法。 根據本發明之-態樣,-平面顯示裝置包括: 一有機發光元件、一保護層及_可附加_可分離層 ^ ,k ^ ^ 王才反、 該有 98542.doc 200533983 機發光元件包括··一第一一 二雨福、一 子應於該第一電極之第 雷厂位於該第一電極與第二電極之間用以基於-在 弟電極與第二電極之間流動穿過哕有媸 產心 ^力4有機發光層之電流來 發光層。财機發光元件位於該主板上。 忒保4層位於該有機發光 兮y m 士 1干上以保濩该有機發光元件。 及了附加-可分離層位於該保護層上。 根據:發明之另一態樣,一平面顯示裝置包括 板、一有機發光元件、一保護層 元件包括1 d輔助板。該有機發光 “ 弟一'極、一對應於該第-電極之第二電 一電極斑當-币 玉棧/、弟—电極之間用以基於一在第 ± , 、孩有機發光層之電流來產 生先的有機發光層。該有機發光元件位㈣ 護層位於該有機發光元件… 。保 辅助板位於該保護層上。“有機發光元件。該 根據本發明之再一態樣’一平面顯示裝置包括 板、-有機發光元件'一合 : 發光元件包括:一第一電極、一 S 4層。该有機 恭炻„ ° ’應於該第一電極之第二 私極、及一位於該第一電極盥 + 第一 + ~ 〜 电極之間用以基於一在 L 電極之間流動穿過該有機發光層之電流t 產生光的有機發光層。該有機發弁_ ^ 該合成緩衝層位於有機發光 亥主板上。 古撼a 尤凡件上。該合成緩衝層包括一 Γ層及複數個位於該有機層中之無機絕緣粒子。二 層位於該合成緩衝層上以保護該有機發光元件。 根據本發明之-態樣,提供—種如下製造該平面 98542.doc 鬌 200533983 置之方法。在一主板上形成— . 元件包括一第-電極、元件,該有機發光 極、及-位於該第一電極與第對應 電極之第二電 -電極與第二電極之間流動:a用以基於-在第 , 勤牙過5亥有機發光層之電流來產 有機發光層。在—輔助板上形成一可附加-可分 力/可。八Γ有機發光元件與該保護層結合。使用該可附 σ刀離層自該保護層上移除該辅助板。 :=之:一態樣’提供-種如下製造該等平面顯 發光元件包括:一第一電極、—^光兀件,該有機 °對應於該第一電極之第二 於該第-電極與第二電極之間用以基於-在 二電極之間流動穿過該有機發光層之 機發光層。在—輔助板上形成—保護層。將 μ有機舍光兀件與該保護層結合。 根據提供本發明之再一態樣,提供 顯示裝置之方法。在一主板上形 ji:斜面 機發光元件包括:一笛…、.有機發光几件,該有 二恭極 、一對應於該第一電極之第 在:二一位於該第一電極與第二電極之間用以基於一 來產生Γ與弟二電極之間流動穿過該有機發光層之電流 成^ 有機發光層。在—有機發光元件上形成一合 機岸:層j合成緩衝層包括—有機層及複數個位於該有 以機絕緣粒子。在該合成緩衝層上形成-保護層 从保護該有機發光元件。 又日 該平面顯示裝置包括—有機發光顯示裝置。 98^2.d〇c 200533983 oled裝置分類爲—主動型〇led裝置及—被動型⑽d裝· 置。 ’ 口此使用輔助板形成該平面顯示裝置之保護層,以減 J有块毛光元件之熱預算。此外,該保護層可於高溫下形 成以牦加忒保護層之滲透性,藉此改良平面顯示裝置之 11顯示a質。況且’可在氧氣氣氛下形成該保護層,以 減小平面顯示裝置之製造成本。 此外°亥等平面顯示裝置包括一具有無機絕緣粒子之有 機緩衝層,以保護該有機發光元件免受來自外界之雜質污 木或對名有機發光元件之撞擊,藉此減少該有機發光元件 之熱預算。 【實施方式】 應瞭解可以諸多不同方式改變或修改下文所述本發明 之實例性實施例,且不脫離本文所揭示之發明原理,因此 本發明之範疇並不侷限於下述該等特定實施例。相反,提 供該等實施例旨在使所揭示内容全面且完整,並以實例而 非限制方式將本發明之概念完全傳達給熟習此項技術者。 下文將參考附圖詳細闡述本發明。 圖1係一顯不本發明一實例性實施例之平面顯示裝置之 平面圖。圖2係一沿圖丨中線Μ,剖切之截面圖。 參考圖1及圖2,該平面顯示裝置包括一主板1〇〇、一有 機發光元件150、一儲存電容器1〇3及一保護膜總成16()。 主板1〇〇包括玻璃、三乙醯基纖維素(TAC)、聚碳酸酯 (PC) t _礙(PES)、聚對苯二甲酸乙二醇脂(pet)、聚苯二 98542.doc 10 200533983 酸乙二醇脂(PEN)、$乙稀醇(PVA)、聚甲基丙稀酸甲脂 (PMMA)、環烯烴聚合物(c〇p)等或其組合。 有機發光元件150包括一閘電極絕緣層1〇la、一無機絕 緣層UHb、—陽極102、一斜坡1〇4、一有機發光層⑽、 一開關電晶體107、一驅動電晶體1〇9及一陰極1]:〇。 開關電晶體1〇7包括一第一源電極1〇殳、一第一閘電極 105b、-第-汲電極1()53及_第—半導體層圖樣。第—源 電極H)5e電連接至—資料線心,以使—驅動積體電路 (未圖示)經由資料線丨05c,向第一源電極1〇紅輸出一資料信 號。第-閘電極105b位於主板100上,且第一閘電極獅 電連接至-閘極線105b,,以使驅動積體電路經由閉極線 l〇5b’輸出-閘極電壓至第—閘電極i咖。第_沒電極論 與第一源電極1〇5c隔開。第一半導體層圖樣位於第一汲電 極105a與第一源電極105c之間。 驅動電晶體1 09包括-第二源電極1〇8a、一第二間電極 嶋、-第二汲電極職及_第二半導體層圖樣。第二源 電極iOh電連接至一沒極電壓線1〇仏,以接收一沒極電壓。 第二間電極祕位於主板剛上,且第二閘電極祕經由 -輔:接觸孔電連接至開關電晶體1〇7之第一汲電極難 上第一汲电極i〇8c與第二源電極1〇8a隔開。第二半導體 層圖樣位於第二汲電極·與第二源電極驗之間。 當資料電壓及閘極電壓分別施加至資料線1〇5。,及閘極線 105b上日守,貧料電壓經由第一源電極丨〇氕、第一半導體層 圖樣及第一汲電極105a施加至第二閘電極1〇讣。當資料電 98542.doc -11 - 200533983 壓施加至第二閘電極1〇8]3時,於該第二半導體層圖樣中形 成一通道,從而將汲極電壓施加至第二汲電極丨〇計。 閘電極絕緣層l〇la將第一閘電極1〇5b、閘極線l〇5b,及第 二閘電極108b電絕緣於第一源電極1〇5a、資料線1〇兄,、第 ;及電極105c、第二源電極i〇8a、汲極電壓線1〇8a,及第二 /及屯極1 08c。閘電極絕緣層丨〇丨a包括透明絕緣材料,例如 氧化矽、氮化矽等。 無機絕緣層101b位於主板100上,主板1〇〇包括:開關電 晶體107、驅動電晶體109、閘極線1〇5b,、資料線1〇化,及 汲極電壓線108a,。無機絕緣層1〇lb包括一接觸孔,經由該 接觸孔第二汲電極l〇8c電連接至陽極1〇2。無機絕緣層 l〇lb包括一透明絕緣材料,例如氧化矽、氮化矽等。 第二閘電極108b與汲極電壓線丨〇8a,部分重疊以形成儲存 電容器103。儲存電容器103於陽極1〇2與陰極11〇之間保持 一訊框之電壓差。 陽極102位於主板1〇〇上—由汲極電壓線1〇8^、閘極線 105b'及貧料線l〇5c’界定之區域中。陽極1〇2包括一導電材 料,例如-金屬。另-選擇係、,該汲電極可位於該有機發 光層上,而陰極可位於該無機絕緣層上並電連接至該第: 汲電極。 斜坡104位於具有陽極102之無機絕緣層⑺“上,以在陽 極102之一中央部分形成一凹陷部分。 有機發光層106位於由斜坡1〇4形成之凹陷部分中。於1 實例性實施例中’該有機發光層1〇6包括_(三_基: 98542.doc - 12- 200533983 啉酸)鋁)。有機發光層106包括一紅色有機發光部分、一綠 色有機發光部分及一藍色有機發光部分。於該實例性實施 例中,紅色發光部分包括二氯甲(DCM)、4-(二腈伸甲基)_ 2 -甲基6(1,1,7,7,-四甲基外洛尼定_9-基)-411-°比喃(DCJT)、 4-(二腈伸甲基)_2·甲基_6(1,1,7,7,_四甲基外洛尼定_9_基> 4H-处喃(DCJB)等。且綠色發光部分包括香豆素6、二羥基 啥琳並吖咬(Qd)等。 陰極110位於有機發光層106及斜坡1〇4上,以接收一公 用電壓。陰極110包括一透明導電材料,例如氧化銦錫 (ITO)、氧化錫(TO)、氧化銦鋅(ιζο)、氧化鋅(z〇)等。 加加至第一汲電極1 〇 8 c之沒極電壓經由該接觸孔施加至 陽極102。因此,電流於陽極102與陰極112之間流動穿過 有機發光層1 08。陽極1 02所提供之電洞與陰極1丨〇所提供 之電子於有機發光層108中結合,以產生具有受激態之分 子。當該等分子之狀態自受激態變成基態時,該等分子即 產生光。 保護膜總成160包括一黏結層112、一保護層114及一可 附加-可分離層11 6。保護膜總成1 60位於有機發光元件150 上。 黏結層112位於陰極110上,以使保護層114與有機發光 元件1 50結合。於該實例性實施例中,黏結層丨丨2包括一可 光固化樹脂或可熱固化樹脂。當波長約爲200 nm至約500 nm 之紫外線照射進可光固化樹脂時,可光固化樹脂固化。可 熱固化樹脂於約25 °C至約200°C之溫度下固化。黏結層112 98542.doc -13- 200533983 可用作一輔助保護層,以保護有機發光元件15〇免受水或 氧氣之影響。 雖然可將紫外線或熱量施加至已固化黏結層11 2,但不 可使已固化黏結層液化,以使保護層114與有機發光元件 150結合。 保護層114位於黏結層112上,以保護該有機發光元件 15 0免受來自外界之雜質污染或對該有機發光元件15 〇之撞 擊。保護層114將有機發光元件15〇之有機發光層1〇6與水 或氧氣隔開,且保護層114可吸收水。 保護層114包括一無機保護層、一有機保護層、一吸濕 層等或一具有其混合物之合成層。 無機保護層包括鋁(A1)、鉬(Mo)、鈦(Ti)、鉻(Cr)、金 (Ag)、氧化石夕、氮化石夕、氧氮化石夕、氧化鎖、氧化鋁、氮 化銘、氧化鈦等或其組合。有機保護層包括聚合物樹月旨、 聚對二甲苯樹脂等。 聚合物樹脂具有低滲透性。該聚合物樹月旨包括環氧樹 脂、聚矽氧樹脂、氟化樹脂、丙烯酸樹脂、氨基甲酸酿樹 脂、㈣樹脂、聚乙烯樹脂、聚丙烯樹脂、聚苯乙歸樹 脂、聚甲基丙烯酸甲酯樹脂、聚脲樹脂、聚醯亞 或其組合。 該吸濕層包括無機碎、碳化發、活性碳#或其組合。 可附加-可分離層116位於保護層114上。可附加二 層116之黏結性可根據光、熱㈣力而改變,因此 或分離該可附加·可分離層116。舉例而言,當該可附加; 98542.doc 200533983 分離層116包括光阻劑且當光線照射至該可附加-可分離廣 116上時,可附加-可分離層116之可黏結性降低。另一選 擇係,可附加-可分離層116可包括異氰酸酯、乙酸乙烯樹 脂、聚酯、聚乙烯醇、丙烯酸脂、環氧樹脂、合成橡膠、 熱塑樹脂等。舉例而言,當可附加-可分離層116包括乙酸 乙烯樹脂時,若溫度高於約401:,其黏結性大大降低。於 该貫例性實施例中,可附加-可分離層丨丨6包括由日本 Sekisui公司製造的r selfa膠帶」。 黏結層112及/或可附加_可分離層丨丨6可用作一輔助保護 層來保護有機發光元件150免受水或氧氣影響。 圖3至圖6係截面圖,其顯示根據本發明一實例性實施俠 製造一平面顯示裝置之方法。 >考圖3,於主板1 〇〇上沈積一金屬。部分蝕刻所沈積之 至屬以形成該第一閘電極105b、閘極線i〇5b,及第二閘電 極 108b。 於具有忒第一閘電極1〇5b、閘極線1〇5b,及第二閘電極; =8b之主板上沈積透明絕緣材料。部分姓刻所沈積之透明 彖材料以形成具有輔助接觸孔之閘電極絕緣層1〇la,200533983 IX. Description of the invention: [Technical field to which the invention belongs] The present invention relates to a flat display device and a method for manufacturing the flat display device. More specifically, the present invention relates to a flat display device capable of improving image display quality and reducing manufacturing cost, and a method of manufacturing the flat display device. [Prior Art]-An organic light emitting element of an organic light emitting display (OLED) device includes an anode, a cathode, and an organic light emitting layer. The hole provided by the anode and the electron provided by the anode are combined with the organic light emitting layer to generate an exciton having an excited state. When the exciton self-excited state becomes the -ground state, the light-emitting layer generates light. 〇LED devices have various characteristics, such as high brightness, wide viewing angle, low power consumption and so on. The 0LED device has a simpler structure than other display devices such as cathode ray tubes (CR, etc.). Therefore, the manufacturing cost of the 0LED device is lower than the manufacturing cost of the CRT device. In addition, the ⑽D device is a light-emitting device Therefore, high-quality images can be displayed regardless of the angle of view. In addition, the LED device can be a rich panel, which can be bent in a direction that is approximately perpendicular to the surface of the board. Field, machine lx light layer is exposed to water or oxygen In the middle, the organic light-emitting layer will react with water or milk gas, thereby destroying the electrochemical characteristics of the organic light-emitting layer. In order to isolate the organic light-emitting layer from water or oxygen, the organic light-emitting layer is in a closed state. The '0LED device may include a protective layer that protects the organic light-emitting layer from the effects of cultural water and oxygen. 98542.doc 200533983 A metal can, a glass substrate, etc. may be located on the organic light-emitting element to form the enclosed space. #The organic When the light-emitting layer is in the closed space, it will complicate the manufacturing process of the OLED device, and increase the manufacturing cost of the OLED device. In addition, the increase in the thickness of the OLED device causes the flexibility of the OLED device. Low.% An organic material is coated on the organic light-emitting element to form the protective layer. Alternatively, an organic material can be deposited on the organic light-emitting element to form a protective layer. When the molecular weight of the polymer in the protective layer increases The permeability of the protective layer is increased. In addition, cracks may be formed in the compound when a protective layer with a polymer is formed at a high temperature. ♦ When the inorganic layer is directly formed on the organic light emitting element, the light element It may be deteriorated by the heat generated during the deposition process: due to the fact that the layer in contact with the organic light-emitting element should be formed at low temperature. However, when the organic layer is formed at warm temperature, the permeability of the organic layer will be increased. Tian Zai This organic or inorganic layer can form a protective layer or touch of a flat display device such as a liquid crystal (LCD) device, a display panel (PDP) display device, etc .: display panel. [Summary of the Invention] The present invention provides- A flat display device capable of improving the image display quality and reducing the cost. The present invention also provides a method for manufacturing the flat display device. According to the aspect of the present invention, the flat The display device includes: an organic light-emitting element, a protective layer, and an _attachable_ separable layer ^, k ^ ^ Wang Caifan, there are 98542.doc 200533983 organic light-emitting elements include ... The sub-electrode should be located between the first electrode and the second electrode of the first electrode so as to flow between the first electrode and the second electrode through the organic light emitting layer. The current comes to the light-emitting layer. The financial light-emitting element is located on the main board. The 4 layers of security are located on the organic light-emitting diode and the organic light-emitting element is protected. The additional-detachable layer is located on the protective layer. : In another aspect of the invention, a flat display device includes a board, an organic light emitting element, and a protective layer element includes a 1 d auxiliary board. The organic light emitting "diode" pole, a second electric one electrode corresponding to the first-electrode, and the coin-jade stack /, the di-electrode are used to The current generates the first organic light-emitting layer. The organic light-emitting element has a protective layer located on the organic light-emitting element .... The auxiliary board is located on the protective layer. "Organic light-emitting element. The flat display device according to still another aspect of the present invention includes a panel, an organic light emitting element, and a light emitting element including a first electrode and an S 4 layer. The organic respect "°" should be between the second private electrode of the first electrode and a electrode located between the first electrode + the first + ~ ~ electrode based on a flow between the L electrodes through the An organic light-emitting layer that generates light with the current t of the organic light-emitting layer. The organic light-emitting layer is located on the main board of the organic light-emitting layer. The ancient buffer a is particularly useful. The synthetic buffer layer includes a Γ layer and a plurality of layers. The inorganic insulating particles in the organic layer. Two layers are located on the synthetic buffer layer to protect the organic light-emitting element. According to the aspect of the present invention, a method for manufacturing the plane 98542.doc 鬌 200533983 is provided as follows. Formed on the main board-the element includes a first electrode, the element, the organic light emitting electrode, and a second electric-electrode and a second electrode located between the first electrode and the corresponding electrode: a is used to First, the organic light-emitting layer is produced by passing the current of the organic light-emitting layer in 5th hour. An auxiliary light-emitting component can be formed on the auxiliary plate. An organic light-emitting element is combined with the protective layer. Using this attachable σ Knife separation layer moves up from the protective layer The auxiliary plate: ==: a kind of 'provided-a kind of manufacturing such flat display and light emitting elements as follows: a first electrode, a light element, the organic ° corresponding to the second electrode of the first electrode and the The organic light-emitting layer between the first electrode and the second electrode is based on-flowing between the two electrodes through the organic light-emitting layer. A protective layer is formed on the -auxiliary plate. The mu organic light-emitting element and the protection are formed. According to another aspect of the present invention, a method for providing a display device is provided. A light emitting element of a bevel plane on a main board includes: a flute, organic light emitting elements, which have two respectable poles, one corresponding In the first position of the first electrode, two one is located between the first electrode and the second electrode to generate a current flowing through the organic light emitting layer between the two electrodes based on one to form an organic light emitting layer. An organic light-emitting element is formed on the organic light-emitting element: the layer j synthetic buffer layer includes an organic layer and a plurality of organic insulating particles located on the organic light-emitting element. A protective layer is formed on the synthetic buffer layer to protect the organic light-emitting element. The flat display device includes— 98 ^ 2.d〇c 200533983 oled devices are classified into—active OLED devices and—passive OLED devices. ”This is the use of auxiliary boards to form the protective layer of the flat display device to reduce J There is a thermal budget for a matte element. In addition, the protective layer can be formed at a high temperature to increase the permeability of the protective layer, thereby improving the 11 display quality of the flat display device. Moreover, it can be formed under an oxygen atmosphere. A protective layer to reduce the manufacturing cost of the flat display device. In addition, flat display devices such as Hai include an organic buffer layer with inorganic insulating particles to protect the organic light-emitting element from impurities from the outside world or organic light emission. The impact of the device reduces the thermal budget of the organic light emitting device. [Embodiments] It should be understood that the exemplary embodiments of the invention described below can be changed or modified in many different ways without departing from the principles of the invention disclosed herein, so the scope of the invention is not limited to the specific embodiments described below . Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concept of the invention to those skilled in the art by way of example and not limitation. Hereinafter, the present invention will be explained in detail with reference to the drawings. FIG. 1 is a plan view showing a flat display device according to an exemplary embodiment of the present invention. Fig. 2 is a cross-sectional view taken along the center line M of the figure. 1 and 2, the flat display device includes a main board 100, an organic light emitting element 150, a storage capacitor 103, and a protective film assembly 16 (). The main board 100 includes glass, triethyl cellulose (TAC), polycarbonate (PC) t_blocker (PES), polyethylene terephthalate (pet), polyphenylene 98542.doc 10 200533983 Ethylene glycol ester (PEN), ethylene glycol (PVA), polymethyl methacrylate (PMMA), cycloolefin polymer (cop), etc., or a combination thereof. The organic light emitting element 150 includes a gate electrode insulating layer 101a, an inorganic insulating layer UHb, an anode 102, a slope 104, an organic light emitting layer ⑽, a switching transistor 107, a driving transistor 109, and One cathode 1]: 0. The switching transistor 107 includes a first source electrode 10A, a first gate electrode 105b, a -drain electrode 1 () 53, and a first semiconductor layer pattern. The first source electrode 5e is electrically connected to the data line core, so that the drive integrated circuit (not shown) outputs a data signal to the first source electrode 10 red via the data line 05c. The first gate electrode 105b is located on the main board 100, and the first gate electrode is electrically connected to the -gate line 105b, so that the driving integrated circuit outputs the -gate voltage to the first gate electrode via the closed-pole line 105b '. i coffee. The first electrode theory is separated from the first source electrode 105c. The first semiconductor layer pattern is located between the first drain electrode 105a and the first source electrode 105c. The driving transistor 109 includes a second source electrode 108a, a second inter electrode 嶋, a second drain electrode, and a second semiconductor layer pattern. The second source electrode iOh is electrically connected to an electrodeless voltage line 10 仏 to receive an electrodeless voltage. The second electrode is located on the main board, and the second gate electrode is via the auxiliary: the contact hole is electrically connected to the first drain electrode of the switching transistor 107, and the first drain electrode 108 and the second source are difficult to connect. The electrodes 108a are separated. The second semiconductor layer pattern is located between the second drain electrode and the second source electrode. When the data voltage and the gate voltage are applied to the data line 105 respectively. And gate gate 105b, the lean voltage is applied to the second gate electrode 10k through the first source electrode 10a, the first semiconductor layer pattern, and the first drain electrode 105a. When the data voltage 98542.doc -11-200533983 is applied to the second gate electrode 108, a channel is formed in the second semiconductor layer pattern, so that the drain voltage is applied to the second drain electrode. . The gate electrode insulating layer 101a electrically insulates the first gate electrode 105b, the gate line 105b, and the second gate electrode 108b from the first source electrode 105a, the data line 110, and the first; and The electrode 105c, the second source electrode 108a, the drain voltage line 108a, and the second and / or the pole 108c. The gate electrode insulating layer a includes a transparent insulating material, such as silicon oxide, silicon nitride, and the like. The inorganic insulating layer 101b is located on the main board 100. The main board 100 includes: a switching transistor 107, a driving transistor 109, a gate line 105b, a data line 10b, and a drain voltage line 108a. The inorganic insulating layer 10lb includes a contact hole through which the second drain electrode 108c is electrically connected to the anode 102. The inorganic insulating layer 101b includes a transparent insulating material, such as silicon oxide, silicon nitride, and the like. The second gate electrode 108b and the drain voltage line 108a partially overlap to form a storage capacitor 103. The storage capacitor 103 maintains a frame voltage difference between the anode 102 and the cathode 110. The anode 102 is located on the main board 100-in an area defined by a drain voltage line 108b, a gate line 105b ', and a lean line 105c'. Anode 102 includes a conductive material, such as a metal. Alternatively, the drain electrode may be located on the organic light emitting layer, and the cathode may be located on the inorganic insulating layer and electrically connected to the second drain electrode. The slope 104 is located on the inorganic insulating layer ⑺ "having the anode 102 to form a recessed portion in a central portion of the anode 102. The organic light emitting layer 106 is located in the recessed portion formed by the slope 104. In 1 example embodiment, 'The organic light-emitting layer 106 includes _ (tri-group: 98542.doc-12- 200533983 phosphonate) aluminum). The organic light-emitting layer 106 includes a red organic light-emitting portion, a green organic light-emitting portion, and a blue organic light-emitting portion. In this exemplary embodiment, the red light-emitting portion includes chloroform (DCM), 4- (dinitrilemethyl) _2-methyl 6 (1,1,7,7, -tetramethyl) Lonidine_9-yl) -411- ° biran (DCJT), 4- (dinitrilemethyl) _2 · methyl_6 (1,1,7,7, _tetramethylexodonidine _9_ group> 4H-Chran (DCJB), etc., and the green light emitting part includes coumarin 6, dihydroxy selenium and acridine (Qd), etc. The cathode 110 is located on the organic light emitting layer 106 and the slope 104 To receive a common voltage. The cathode 110 includes a transparent conductive material, such as indium tin oxide (ITO), tin oxide (TO), indium zinc oxide (ιζο), zinc oxide (z〇), and the like. An electrode voltage of a drain electrode 108 is applied to the anode 102 through the contact hole. Therefore, a current flows between the anode 102 and the cathode 112 through the organic light emitting layer 108. The hole provided by the anode 102 and the cathode The electrons provided by 1 丨 〇 are combined in the organic light-emitting layer 108 to generate molecules having an excited state. When the state of these molecules changes from the excited state to the ground state, the molecules generate light. The protective film assembly 160 It includes an adhesive layer 112, a protective layer 114, and an attachable-detachable layer 116. The protective film assembly 160 is located on the organic light emitting element 150. The adhesive layer 112 is located on the cathode 110, so that the protective layer 114 and organic light-emitting The elements 1 50 are combined. In this exemplary embodiment, the adhesive layer 2 includes a photo-curable resin or a heat-curable resin. When ultraviolet rays having a wavelength of about 200 nm to about 500 nm are irradiated into the photo-curable resin, The photo-curable resin is cured. The thermo-curable resin is cured at a temperature of about 25 ° C to about 200 ° C. The adhesive layer 112 98542.doc -13- 200533983 can be used as an auxiliary protective layer to protect the organic light emitting element 15. Protected from water or oxygen Although ultraviolet or heat may be applied to the cured adhesive layer 112, the cured adhesive layer may not be liquefied so that the protective layer 114 is combined with the organic light emitting element 150. The protective layer 114 is located on the adhesive layer 112 to protect the organic The light-emitting element 150 is protected from impurities from the outside or from being hit by the organic light-emitting element 150. The protective layer 114 separates the organic light-emitting layer 106 of the organic light-emitting element 150 from water or oxygen, and the protective layer 114 may Absorb water. The protective layer 114 includes an inorganic protective layer, an organic protective layer, a moisture-absorbing layer, etc. or a synthetic layer having a mixture thereof. Inorganic protective layer includes aluminum (A1), molybdenum (Mo), titanium (Ti), chromium (Cr), gold (Ag), oxide stone, nitride stone, oxynitride stone, oxide lock, aluminum oxide, nitride Ming, titanium oxide, etc. or a combination thereof. The organic protective layer includes a polymer tree, a parylene resin, and the like. The polymer resin has low permeability. The purpose of the polymer tree includes epoxy resin, silicone resin, fluorinated resin, acrylic resin, urethane resin, resin, polyethylene resin, polypropylene resin, polystyrene resin, and polymethyl methacrylate. Ester resin, polyurea resin, polyfluorene, or a combination thereof. The hygroscopic layer includes inorganic particles, carbonized hair, activated carbon #, or a combination thereof. The attachable-detachable layer 116 is on the protective layer 114. The adhesion of the attachable and detachable layer 116 can be changed according to light and heat. Therefore, the attachable and detachable layer 116 may be separated. For example, when the attachable; 98542.doc 200533983 separation layer 116 includes a photoresist and when light is irradiated onto the attachable-detachable layer 116, the adhesiveness of the attachable-detachable layer 116 decreases. Alternatively, the attachable-detachable layer 116 may include isocyanate, vinyl acetate resin, polyester, polyvinyl alcohol, acrylate, epoxy resin, synthetic rubber, thermoplastic resin, and the like. For example, when the attachable-detachable layer 116 includes a vinyl acetate resin, if the temperature is higher than about 401 ° C, its adhesion is greatly reduced. In this exemplary embodiment, the attachable-detachable layer 6 includes an r selfa tape manufactured by Japan's Sekisui Company. The adhesive layer 112 and / or an additional detachable layer 6 can be used as an auxiliary protection layer to protect the organic light emitting element 150 from water or oxygen. 3 to 6 are sectional views showing a method for manufacturing a flat display device according to an exemplary embodiment of the present invention. > Consider FIG. 3, and deposit a metal on the motherboard 100. The deposited material is partially etched to form the first gate electrode 105b, the gate line 105b, and the second gate electrode 108b. A transparent insulating material is deposited on the main board having a first gate electrode 105b, a gate line 105b, and a second gate electrode 8b. Part of the deposited transparent yttrium material is used to form a gate electrode insulation layer 10a with auxiliary contact holes,

、經由該輔助接觸孔琴楚 ^ ^ L 安蜩扎β弟一汲電極l〇5a可電連接至該第二閘 電極10 8 b。 圖樣及位於該等無定形砍圖樣上之N+非晶碎圖j :料成於對應於該第—閘電極1㈣及該第二閘電極j 二^閘兒極絕緣層101a上,以形成該第一半導體層圖搛 及該第二半導體層圖樣。 | 98542.doc 200533983 於一具有第一及第二半導體層圖樣之閘電極絕緣層上沈 #貝一金屬。部分钱刻所沈積之金屬,以形成第一源電極 105c、資料線i05c’、第一汲電極1〇5a、第二源電極1〇以及 儲存電容器103。因此,於主板1〇〇上形成具有第一源電極 105c、第一閘電極l〇5b、第一汲電極l〇5a及第一半導體層 圖樣之開關電晶體1〇7及具有第二源電極1〇8c、第二閘電 極108b第一汲電極108a及第二半導體層圖樣之驅動電晶 體 109。 於具有開關電晶體1〇7、驅動電晶體1〇9、閘極線 105b’、資料線1〇5c,及汲極電壓線1〇8a,之主板上沈積透明 絕緣材料。部分蝕刻所沈積之透明絕緣材料,以形成具有 接觸孔之無機絕緣層l〇lb,該第二汲電極l〇8c經由該接觸 孔部分地暴露出來。 於無機絕緣層l01b上沈積一金屬。部分蝕刻所沈積之金 屬以形成陽極102。陽極1〇2經由該接觸孔電連接至第二汲 電極108c。 將具有光阻劑之有機材料塗佈於具有陽極1〇2之無機絕 、、彖層101 b上。藉由一光學製程部分地移除所塗佈之有機材 料,以形成具有凹陷部分之斜坡1〇4。光學製程包括一曝 光步驟及一顯影步驟。 將形成有機發光層1〇6之材料藉由一喷墨製程滴入該凹 陷部分,以形成有機發光層100。 將透明導電材料沈積於有機發光層106及斜坡104上以形 成陰極110。 98542.doc 16 200533983 由此,使具有閘電極絕緣層101&、無機絕緣層ι〇α、陽 極102、斜坡104、有機發光層106、開關電晶體107、驅動 電晶體109及陰極110之有機發光元件15〇完整無缺。 將具有可光固化樹脂之黏結層塗佈於具有有機發光元件 ’ 150之主板1〇〇上。已塗佈之黏結材料112,未固化。另一選 擇係,可將黏結材料112,塗佈於形成於可附加_可分離^ 116上之保護層U4上。 曰 參考圖4,在輔助板120上形成「Selfa膠帶」,以形成 • 可附加-可分離層11 6。 於該實例性實施例中,辅助板120係一撓性板。辅助板 12()&括玻璃 '導電材m、三乙醯基纖維素(TAC)、 聚碳酸酯(PC)、聚醚砜(PES)、聚對苯二甲酸乙二醇脂 (PET)、聚苯二酸乙二醇腊(pEN)、聚乙稀醇㈣a)、聚歹 基丙稀酸甲脂(PMMA)、環烯烴聚合物(c〇p)等或其組合。 輔助板120可具有一導熱材料。 • 當光或熱輻射至可附加-可分離層U6上時,可附加_可分 離層116之黏結性降低,從而可附加.可分離層η 6可與辅 助板120分離。 於可附加-可分離層116上沈積氧切以形成無機保護 層。於錢機保護層上塗佈環氧樹脂以形成有機保護層。 口此保4層! 14包括—具有無機保護層及有機保護層之 雙層#構°在位於辅助板120上之可附加_可分離層ιι6上 形成保護層1 14,以便可於古、、w k γ A 4、 ^ 災j,皿、水氣汛或氧氣氣氛下形 成保護層114。因& ’可在高於約20CTC之溫度下於可附 98542.doc -17- 200533983 力可刀離層1 1 6上沈積氧化矽,且可在高於約2〇〇。〇之溫 度下將%氧樹脂塗佈於該無機保護層上,以降低保護層 1 14之參透性。另一選擇係可於該有機保護層上形成另一 無機保護層。 茶考圖5及圖6 ’具有有機發光元件150及黏結層110之主 板1〇〇與具有可附加_可分離層116及保護層丨14之辅助板 120結合,以使圖3之黏結材料ιΐ2,面向保護層η#。在一上 ^輪142與一下輥輪140之間擠壓已結合之板100與120。上 幸把輪142以相反於下輥輪丨4〇之方向滾動。於該實例性實施 例中’上輥輪142外表面與下輥輪14〇外表面之間的間距大 致等於主板1〇〇、發光元件15〇及辅助板12〇之總厚度。 紫外線輻照於上輥輪142與下輥輪14〇之間。當紫外線輻 照至可附加-可分離層Π6及圖3之黏結材料112,内時,圖3 之黏結材料112,固化,從而保護層114與有機發光元件15〇 結合,反之,可附加-可分離層U6之黏結性減小,從而可 φ 將可附加-可分離層與輔助板120分離。亦即,當紫外 線輻照至圖3之未固化黏結材料丨丨2,内時,圖3之黏結材料 112’固化,從而使可附加_可分離層116及保護層114與有機 發光元件150結合。另一選擇係,亦可將可附加-可分離層 116與輔助板12〇—起自保護層1丨4上移除。 因此,於有機發光元件15〇上形成具有可附加-可分離層 116、保護層114及黏結層112之保護膜總成16〇,以使該平 面顯示裝置完整。 根據實例性實施例,於辅助板120上形成保護層114之 98542.doc -18- 200533983 後,將保護才反114附加至有機發光元件15〇上,然後使用可 附加-可分離層116自保護層114上移除辅助板12〇。因此, 可減小有機發光元件15〇之熱預算,並減小保護層ιΐ4之渗 透性。此外,可於氧氣氣氛下形成保護層114。 使用輔助板120亦可形成諸如液晶顯示(LCD)裝置、電漿 顯示面板(PDP)顯示裝置等其他平面顯示裝置用諸如有機 層、無機層及塗層等薄膜或觸摸面板。 ,圖7係透視圖,其顯示根據本發明另一實例性實施例 ’ t造一平面顯示裝置之方法。圖7之平面顯示裝置除一壓 縮製私外白與圖1至圖6之平面顯示裝置相同。因此,文中 將使用相同之參考編號指代與圖丨至圖6中相同或相似之部 分並省卻進一步之闡述。 參考圖1至圖7,該平面顯示裝置包括一主板1〇〇、一有 機發光元件150、一儲存電容器103及一保護膜總成16〇。 有機發光元件150包括一閘電極絕緣層i〇ia、一無機絕 φ 緣層101b、一陽極102、一斜坡104、一有機發光層106、 一開關電晶體107、一驅動電晶體1〇9及一陰極110。 保護膜總成160包括一黏結層112、一保護層114及一可 附加-可分離層116。保護膜總成160位於有機發光元件150 上。 . 參考圖7,具有有機發光元件150及黏結層110之主板1〇〇 係與具有可附加-可分離層116及保護層114之辅助板120相 灞 結合,因此圖3之黏結材料112,面向保護層114。在一上壓 力機146與一下壓力機144之間擠壓已結合板1〇〇與120。上 98542.doc -19- 200533983 壓力機146以與下壓力機M4相反之方向擠壓結合板1〇〇與 120。於該實例性實施例中,上壓力機146與下壓力機144 之外表面間距大致等於主板100、發光元件15〇及辅助板 120之厚度總和。 紫外線輻照於上壓力機146及下壓力機144之間。另一選 擇係’可加熱上壓力機146及下壓力機144,以便可加熱黏 結層116及可附加-可分離層丨12。當紫外線輻照至可附加· 可勿肖隹層11 6及黏結材料π 2 ’内時,黏結材料112,固化,以 使保護層114與有機發光元件15〇結合,反之,可附加_可 分離層116之黏結性降低,以使可附加_可分離層丨丨6與辅 助板120相分離。 降低上壓力機146,以使辅助板12〇與可附加-可分離層 116分離。 因此,在有機發光元件15〇上形成具有可附加_可分離層 116、保護層114及黏結層112之保護膜總成16〇,以形成平 面顯示裝置。 根據該實例性實施例,使用上壓力機丨46、下壓力機丨44 及輔助板120可簡化平面顯示裝置之製程。此外,可改良 平面顯示裝置之影像顯示品質。 圖8係一顯不本發明另一實例性實施例之平面顯示裝置 之截面圖。圖8之平面顯示裝置除辅助黏結層及輔助板之 外皆與圖1及圖2之平面顯示裝置相同。因此,文中將使用 相同之參考編號指代與圖丨及圖2中相同或相似之部分並省 卻進一步之闡述。 98542.doc >20- 200533983 參考圖1及圖8,該平面顯示裝置包括一主板10〇、一有 機發光元件150、一儲存電容器1〇3、一保護膜總成162及 一輔助板120。 有機發光元件150包括一閘電極絕緣層i〇ia、一無機絕 緣層101b、一陰極11〇’、一斜坡1〇4、一有機發光層1〇6、 一開關電晶體107、一驅動電晶體1〇9及一陽極1〇2,。 陰極110’位於無機絕緣層l〇lb上,並包括一透明導電材 料,例如氧化銦錫(ITO)、氧化錫(TO)、氧化銦鋅(IZ0)、 ® 氧化辞(Z0)等。陽極1〇2’位於有機發光層ι〇6上,並包括一 導電材料,例如一金屬。另一選擇係,陰極可位於有機發 光層上’陽極可位於無機絕緣層上並電連接至驅動電晶體 之第二汲電極上。 保護膜總成162包括一黏結層112、一保護層114及一輔 助黏結層118。保護膜總成162位於有機發光元件15〇上。 黏結層112位於陽極1〇2,上,以使保護層U4與有機發光 φ 元件I50結合。該黏結層112包括一可光固化樹脂或可熱固 化樹脂。 保護層114位於黏結層112上,以保護有機發光元件15() 免叉來自外界之雜質污染或對有機發光元件i 5〇之撞擊。 辅助黏結層118位於保護層114上。辅助黏結層118包括 可光固化樹脂或可熱固化樹脂。 使用輔助黏結層11 8使輔助板120與保護層!丨4結合。辅 助板120包括玻璃、三乙醯基纖維素(TAC)、聚碳酸酯 (PC)、驗石風(PES)、聚對苯二甲酸乙二醇脂(pE丁)、聚苯 98542 j〇c 21 200533983 二酸乙二醇脂(PEN)、聚乙烯醇(PVA)、聚甲基丙烯酸甲脂 (PMMA)、環烯烴聚合物(c〇P)等或其組合。 當將有機發光元件1 5 0所產生之光引導至辅助板丨2 〇内 時,辅助板120具有一透明材料且辅助板ι2〇具光學各向同 性。然而’當將有機發光元件1 5 0所產生之光引導至主板 100内時,輔助板120可具有一不透明材料。 圖9至12係截面圖’其顯示根據本發明另一實例性實施 例製造一平面顯示裝置之方法。 * 參考圖9,於主板1〇〇上形成閘電極絕緣層1〇u、無機絕 緣層l〇lb、開關電晶體107、驅動電晶體1〇9、陰極11〇,、 斜坡104、有機發光層ι〇6及陽極1〇2,,以使有機發光元件 150完整。 將具有可光固化樹脂之可黏結材料塗佈於具有有機發光 元件150之主板上。所塗佈之黏結材料122,未固化。 茶考圖10,在輔助板12〇上塗佈一可光固化材料,且於 φ 該已塗佈可光固化材料上形成保護層114。使光輻照至已 塗佈之可光固化材料中,以固化該可光固化材料,從而形 成辅助黏結層11 8。 麥考圖11及圖12,將具有有機光發光元件150及黏結材 料122’之主板1〇〇與具有輔助黏結層118及保護層U4之輔助 • 板120結合,以使黏結材料112,面向保護層114。在上輥輪 . 142與下輥輪14〇之間擠壓已結合之板1〇〇與12〇。 使紫外線輻照於上輥輪142及下輥輪140之間。當紫外線 幸5照至輔助黏結層118及黏結材料112,内時,黏結材料112, 98542.doc -22- 200533983 固化’以使保護層114與有機發光元件15〇結合,反之,輔 助黏結層118之黏結性不變以使保護層114與輔助板12〇結 合0 因此’於有機發光元件15〇上形成具有辅助黏結層118、 保濩層114及黏結層112之保護膜總成162,以使該平面顯 不裝置完整。 根據該實例性實施例,該平面顯示裝置包括位於保護層 114上之輔助板120以保護有機發光元件15〇免受水、氧氣 及外界對平面顯示裝置撞擊之影響,此外,平面顯示裝置 之製程得以簡化。 圖13係一顯示本發明另一實例性實施例之一平面顯示裝 置之截面圖。圖13之平面顯示裝置除一黏結層外皆與圖i 及圖2之平面顯示裝置相同。因此,文中將使用相同之參 考編號指代與圖1及圖2中相同或相似之部分並省卻進一步 之闡述。 參考圖1及圖13,該平面顯示裝置包括一主板1〇〇、一有 機發光元件150、一儲存電容器1〇3及一保護膜總成164。 有機發光元件150包括一閘電極絕緣層1〇u、一無機絕 緣層101b、一陽極102、一斜坡1〇4、一有機發光層⑺“ 一開關電晶體107、一驅動電晶體1〇9及一陰極。 保護膜總成164包括一保護層115及一可附加_可分離層 116。保護膜總成160位於該有機發光元件15〇上。 保護層115位於有機發光元件15〇上以保護有機發光元件 150免受來自外界之雜質污染或對該有機發光元件15〇之撞 98542.doc -23- 200533983 擊。保遵層115包括一弟一保護部分及一第二保護部 分 115b。 第一保護部分115a位於有機發光元件15〇上,且包括一 可光固化樹脂或一可熱固化樹脂。第二保護部分丨15b位於 第一保護部分115a上。第二保護層115可包括一無機保護 層或一有機保護層。另一選擇係,第二保護層n5可具有 一具有無機保護層及有機保護層之多層結構。 可附加-可分離層116位於保護層115上。可附加-可分離 層116之黏結性可因光、熱或壓力而改變,因而可附加·可 分離層116可被附加或分離。可附加-可分離層U6可包括 一光阻劑。 圖14至1 7係截面圖,其顯示根據本發明另一實例性實施 例製造一平面顯示裝置之方法。 筝考圖14,在主板1〇〇上形成閘電極絕緣層1〇u、無機 絕緣層101b、開關電晶體107、驅動電晶體1〇9、無機絕緣 層101b、陽極102、斜坡104、有機發光層1〇6及陰極u〇, 以使有機發光元件15 0完整。 參考圖15,「Selfa膠帶」位於輔助板12〇上以形成可附 加-可分離層116。當光或熱輻照至可附加-可分離層1丨6内 時’可附加-可分離層116之黏結性降低,使可附加-可分離 層116與輔助板120分離。 在了附加-可分罐層116上形成無機保護層、有機保護層 專以形成该弟一保護部分11 5 b。於第二保護部分11 $七上 塗佈可光固化樹脂。已塗佈之可光固化樹脂U5a,未固化。 98542.doc -24- 200533983 參考圖16及圖17,使具有有機發光元件150之主板loo與 具有已塗佈可光固化樹脂115a,、第二保護層115b及可附 加可分離層116之輔助板120結合,以使有機發光元件150 面向已塗佈之可光固化樹脂115a,。在上輥輪142與下輥輪 140之間擠壓已結合板100與120。 使紫外線輻照於上輥輪142及下輥輪140之間。當紫外線 輻照至可附加-可分離層116及已塗佈可光固化樹脂U5a,内 時’已塗佈可光固化樹脂n5a,固化,從而使保護層115與 有機發光元件150結合,反之,可附加·可分離層116之黏 結性減小’從而使可附加-可分離層116與辅助板120分 離。 因此’於有機發光元件150上形成具有可附加-可分離層 116及保護層115之保護膜總成164,以使平面顯示裝置完 整。 根據該實例性實施例,可省卻一黏結層,且保護層i 15 可直接附加至有機發光元件15〇上,以簡化平面顯示裝置 之製程。 圖1 8係一顯示本發明另一實例性實施例之一平面顯示裝 置之截面圖。圖18之平面顯示裝置除可附加·可分離層及 輔助板外皆與圖丨及圖2之平面顯示裝置相同。因此,文中 將使用相同之參考編號指代與圖丨及圖2中相同或相似之部 分並省卻進一步之闡述。 參考圖1及圖18,該平面顯示裝置包括—主板1〇〇、一有 機發光元件15G、i存電容器⑻、—保護膜總成166及 98542.doc -25- 200533983 一辅助板120。 有機發光元件150包括一閘電極絕緣層101a、一無機絕 緣層101b、一陽極102、一斜坡104、一有機發光層1〇6、 一開關電晶體107、一驅動電晶體1 〇9及一陰極丨丨〇。 保遵膜總成16 6包括一保護層π 4及一黏結層112。保護 膜總成166位於有機發光元件150上。 保護層114位於黏結層112上以使有機發光元件15〇免受 來自外界之雜質污染或對有機發光元件15〇之撞擊。 輔助板120位於保護層114上,且輔助板12〇接觸保護層 114 〇 另一選擇係,可省卻辅助板12〇,且可附加-可分離層 (未圖示)可位於保護層1 14上。 其後,根據本發明之另一實例性實施例之平面顯示裝置 製造如下。 在主板100上形成閘電極絕緣層1〇la、無機絕緣層 1〇lb、開關電晶體1〇7、驅動電晶體1〇9、陽極ι〇2、斜坡 1⑽、有機發光層106及陰極U〇,則吏有機發光元件15〇完 整。 在具有有機發光元件150之主板100上塗佈具有可光固化 樹脂之黏結材料。所塗佈之材料(未圖示)未固化。 於輔助板12G_h沈積氧切以形成無機保護層。於無機 保4層上塗佈具有低滲透性之環氧樹脂以形成有機保護 層。因此’於輔助板12G上形成具有由無機保護層及有機 保護層構叙雙層結構㈣護層m,藉此即絲護層114 98542.doc -26- 200533983 於局溫、水氣氛或氧氣氣氛下形成,其亦不會損壞有機發 光元件1 50。於該實例性實施例中,保護層n 4於高於約 200 C之溫度下形成,以減小保護層114之滲透性。另一選 擇係,可於辅助板120上形成有機保護層,且可於有機保 護層上形成無機保護層。 使具有有機發光元件150及黏結材料(未圖示)之主板i〇〇 與具有保護層114之辅助板120結合,以使黏結材料(未圖 示)面向保護層114。於圖n所示之上輥輪142與下輥輪14〇 之間擠壓已結合板100與120。 使紫外線輻照於圖丨丨所示之上輥輪142與下輥輪14〇之 間。當紫外線輻照至辅助黏結層118及黏結材料(未圖示)内 時,黏結材料(未圖示)固化,以使保護層114與有機發光元 件150結合。 因此,在有機發光元件150上形成具有保護層114及黏結 層112之保濩膜總成丨66,以使該平面顯示裝置完整。 根據4貫例性實施例,直接於辅助板上形成保護層 114,以簡化平面顯示裝置之製程。 圖19係顯不本發明另一實例性實施例之一平面顯示裝 置之平面圖。圖2〇係_沿圖19中線Π-Π,剖切之截面圖。圖 及圖20之平面顯示裝置除有機層及辅助板夕卜皆與圖1及 圖2之平面顯+壯m ”、、…、衣置相同。因此,文中將使用相同之參考 編號指代與圖1及? ^ 圖2中相同或相似之部分並省卻進一步之 闡述。 參考圖19及2〇,兮不 °亥平面顯示裝置包括一主板丨〇〇、一有 98542.doc -27- 200533983 機發光元件150、一合成緩衝層u3及一保護層IK。 有機發光元件150包括一間電極絕緣層1〇u、一無機絕 緣層鶴、一陽極102、一斜坡1〇4、一有機發光層⑽、 一開關電晶體107、一驅動電晶體;[09及一陰極Η 〇。 開關電晶體107包括一第一源電極1〇5c、_第一閘電極 1㈣、-第-汲電m〇5a及一第—半導體層圖樣。第:源 電極1〇5C電連接至資料線敝I以使驅動積體電路(未圖示) 經由資料線W5C·向第一源電極10化輸出—資料信號。第一Through the auxiliary contact Kong Qinchu ^ ^ L 蜩 蜩 弟 β dip electrode 105a can be electrically connected to the second gate electrode 10 8 b. The pattern and the N + amorphous fragment pattern j located on the amorphous cut patterns are formed on the insulating layer 101a corresponding to the first gate electrode 1 and the second gate electrode j to form the first gate electrode. A semiconductor layer pattern and the second semiconductor layer pattern. 98542.doc 200533983 sinks a #bei metal on a gate electrode insulating layer having a first and a second semiconductor layer pattern. The deposited metal is partly carved to form a first source electrode 105c, a data line i05c ', a first drain electrode 105a, a second source electrode 10, and a storage capacitor 103. Therefore, a switching transistor 107 having a first source electrode 105c, a first gate electrode 105b, a first drain electrode 105a, and a first semiconductor layer pattern and a second source electrode are formed on the motherboard 100. 108c, the second gate electrode 108b, the first drain electrode 108a, and the driving transistor 109 of the second semiconductor layer pattern. A transparent insulating material is deposited on the main board having the switching transistor 107, the driving transistor 109, the gate line 105b ', the data line 105c, and the drain voltage line 108a. The deposited transparent insulating material is partially etched to form an inorganic insulating layer 10lb having a contact hole, and the second drain electrode 108c is partially exposed through the contact hole. A metal is deposited on the inorganic insulating layer 101b. The deposited metal is partially etched to form the anode 102. The anode 102 is electrically connected to the second drain electrode 108c via the contact hole. An organic material having a photoresist is coated on an inorganic insulating layer 101b having an anode 102. The applied organic material is partially removed by an optical process to form a slope 104 having a recessed portion. The optical process includes an exposure step and a development step. A material forming the organic light emitting layer 106 is dropped into the recessed portion through an inkjet process to form the organic light emitting layer 100. A transparent conductive material is deposited on the organic light emitting layer 106 and the slope 104 to form a cathode 110. 98542.doc 16 200533983 In this way, organic light emission having a gate electrode insulating layer 101 &, an inorganic insulating layer ια, an anode 102, a slope 104, an organic light emitting layer 106, a switching transistor 107, a driving transistor 109, and a cathode 110 is made. Component 15 is complete. An adhesive layer having a photo-curable resin is coated on a motherboard 100 having an organic light emitting element '150. The coated adhesive material 112 is not cured. Alternatively, the adhesive material 112 may be coated on the protective layer U4 formed on the attachable / detachable ^ 116. Referring to FIG. 4, a "Selfa tape" is formed on the auxiliary plate 120 to form an attachable-detachable layer 116. In the exemplary embodiment, the auxiliary plate 120 is a flexible plate. Auxiliary plate 12 () & glass including conductive material m, triethyl cellulose (TAC), polycarbonate (PC), polyethersulfone (PES), polyethylene terephthalate (PET) , Polyethylene wax terephthalate (pEN), polyethylene fluorene a), polymethyl methacrylate (PMMA), cycloolefin polymer (cop), etc., or a combination thereof. The auxiliary plate 120 may have a thermally conductive material. • When light or heat is radiated to the attachable-detachable layer U6, the adhesion of the attachable-detachable layer 116 is reduced, so that it can be attached. The separable layer η 6 can be separated from the auxiliary plate 120. An oxygen cut is deposited on the attachable-detachable layer 116 to form an inorganic protective layer. An epoxy resin is coated on the protective layer of the coin machine to form an organic protective layer.口 本 保 4 层! 14 Includes—a double-layer structure with an inorganic protective layer and an organic protective layer. A protective layer 1 14 is formed on the attachable / detachable layer ι6 located on the auxiliary plate 120 so that it can be used in ancient, wk γ A 4, and ^ In a disaster, a protective layer 114 is formed under a dish, water, gas, or oxygen atmosphere. Because & 'can deposit silicon oxide at a temperature higher than about 20 CTC on the attachable layer 1 16 of 98542.doc -17- 200533983, and can be higher than about 200. A% oxygen resin is coated on the inorganic protective layer at a temperature of 0 to reduce the permeability of the protective layer 114. Another option is to form another inorganic protective layer on the organic protective layer. Fig. 5 and Fig. 6 'The main board 100 with the organic light-emitting element 150 and the adhesive layer 110 is combined with the auxiliary board 120 with the attachable and detachable layer 116 and the protective layer 14 to make the adhesive material of Fig. 3 , Facing the protective layer η #. The combined plates 100 and 120 are squeezed between an upper roller 142 and a lower roller 140. Fortunately, the wheel 142 is rolled in a direction opposite to the lower roller 4o. In this exemplary embodiment, the distance between the outer surface of the upper roller 142 and the outer surface of the lower roller 14o is substantially equal to the total thickness of the main board 100, the light emitting element 150, and the auxiliary board 120. Ultraviolet rays are irradiated between the upper roller 142 and the lower roller 140. When the ultraviolet ray is irradiated into the attachable-detachable layer Π6 and the bonding material 112 in FIG. 3, the bonding material 112 in FIG. 3 is cured, so that the protective layer 114 is combined with the organic light-emitting element 15o, otherwise, it can be attached- The adhesiveness of the separation layer U6 is reduced, so that the attachable-detachable layer can be separated from the auxiliary plate 120 by φ. That is, when ultraviolet rays are irradiated into the uncured bonding material 2 in FIG. 3, the bonding material 112 ′ in FIG. 3 is cured, so that the detachable layer 116 and the protective layer 114 can be combined with the organic light-emitting element 150. . Alternatively, the attachable-detachable layer 116 and the auxiliary plate 120 can be removed from the protective layer 1-4. Therefore, a protective film assembly 160 having an attachable-detachable layer 116, a protective layer 114, and an adhesive layer 112 is formed on the organic light emitting device 15 to complete the flat display device. According to an exemplary embodiment, after the protective layer 114 of 98542.doc -18-200533983 is formed on the auxiliary board 120, the protective film 114 is attached to the organic light emitting element 15 and then self-protected using the attachable-detachable layer 116 The auxiliary board 120 is removed from the layer 114. Therefore, the thermal budget of the organic light emitting element 150 can be reduced, and the permeability of the protective layer ι4 can be reduced. In addition, the protective layer 114 may be formed under an oxygen atmosphere. The auxiliary board 120 can also be used to form a thin film or a touch panel for other flat display devices such as a liquid crystal display (LCD) device, a plasma display panel (PDP) display device, and the like, such as an organic layer, an inorganic layer, and a coating layer. FIG. 7 is a perspective view showing a method of constructing a flat display device according to another exemplary embodiment of the present invention. The flat display device of FIG. 7 is the same as the flat display device of FIGS. 1 to 6 except that it is compressed. Therefore, the same reference numbers will be used in the text to refer to the same or similar parts as those in Figures 丨 to 6 and further explanation will be omitted. 1 to 7, the flat display device includes a main board 100, an organic light emitting element 150, a storage capacitor 103, and a protective film assembly 160. The organic light-emitting element 150 includes a gate electrode insulating layer IOia, an inorganic insulating edge layer 101b, an anode 102, a slope 104, an organic light-emitting layer 106, a switching transistor 107, a driving transistor 109, and A cathode 110. The protective film assembly 160 includes an adhesive layer 112, a protective layer 114, and an attachable-detachable layer 116. The protective film assembly 160 is located on the organic light emitting element 150. Referring to FIG. 7, the main board 100 having the organic light-emitting element 150 and the adhesive layer 110 is combined with the auxiliary board 120 having the attachable-detachable layer 116 and the protective layer 114. Therefore, the adhesive material 112 of FIG. 3 faces Protective layer 114. The bonded plates 100 and 120 are pressed between an upper press 146 and a lower press 144. The upper 98542.doc -19-200533983 press 146 presses the joint plates 100 and 120 in the opposite direction to the down press M4. In this exemplary embodiment, the distance between the outer surfaces of the upper press 146 and the lower press 144 is substantially equal to the sum of the thicknesses of the main board 100, the light emitting element 150, and the auxiliary board 120. Ultraviolet rays are irradiated between the upper and lower presses 146 and 144. Alternatively, the upper press 146 and the lower press 144 can be heated so that the bonding layer 116 and the attachable-detachable layer 12 can be heated. When ultraviolet rays are irradiated into the attachable and irreversible layer 116 and the adhesive material π 2 ', the adhesive material 112 is cured so that the protective layer 114 is combined with the organic light-emitting element 15o. Otherwise, it can be attached_ separable The adhesion of the layer 116 is reduced, so that the attachable / detachable layer 6 is separated from the auxiliary plate 120. The upper press 146 is lowered to separate the auxiliary plate 120 from the attachable-detachable layer 116. Therefore, a protective film assembly 160 having an attachable / detachable layer 116, a protective layer 114, and an adhesive layer 112 is formed on the organic light emitting element 15 to form a flat display device. According to this exemplary embodiment, the use of the upper press 46, the lower press 44, and the auxiliary plate 120 can simplify the manufacturing process of the flat display device. In addition, the image display quality of the flat display device can be improved. FIG. 8 is a cross-sectional view showing a flat display device according to another exemplary embodiment of the present invention. The flat display device of FIG. 8 is the same as the flat display device of FIG. 1 and FIG. 2 except for the auxiliary adhesive layer and the auxiliary plate. Therefore, the same reference numerals will be used in the text to refer to the same or similar parts as those in Fig. 丨 and Fig. 2 and the further explanation will be omitted. 98542.doc > 20-200533983 With reference to FIGS. 1 and 8, the flat display device includes a main board 100, an organic light emitting element 150, a storage capacitor 103, a protective film assembly 162, and an auxiliary board 120. The organic light emitting element 150 includes a gate electrode insulating layer 101a, an inorganic insulating layer 101b, a cathode 110 ′, a slope 104, an organic light emitting layer 106, a switching transistor 107, and a driving transistor. 109 and an anode 102. The cathode 110 'is located on the inorganic insulating layer 10lb and includes a transparent conductive material such as indium tin oxide (ITO), tin oxide (TO), indium zinc oxide (IZ0), ® oxide (Z0), and the like. The anode 102 'is located on the organic light-emitting layer 106 and includes a conductive material, such as a metal. Alternatively, the cathode may be located on the organic light emitting layer and the anode may be located on the inorganic insulating layer and electrically connected to the second drain electrode of the driving transistor. The protective film assembly 162 includes an adhesive layer 112, a protective layer 114, and an auxiliary adhesive layer 118. The protective film assembly 162 is located on the organic light emitting element 150. The bonding layer 112 is located on the anode 102, so that the protective layer U4 is combined with the organic light emitting φ element I50. The bonding layer 112 includes a photo-curable resin or a thermo-curable resin. The protective layer 114 is located on the bonding layer 112 to protect the organic light-emitting element 15 () from foreign impurities or impact on the organic light-emitting element i50. The auxiliary adhesion layer 118 is located on the protective layer 114. The auxiliary adhesion layer 118 includes a photo-curable resin or a heat-curable resin. Use the auxiliary adhesive layer 11 8 to make the auxiliary plate 120 and the protective layer!丨 4 combination. The auxiliary plate 120 includes glass, triethyl cellulose (TAC), polycarbonate (PC), stone test wind (PES), polyethylene terephthalate (pEbutyl), polybenzene 98542 j〇c 21 200533983 Diacid glycol (PEN), polyvinyl alcohol (PVA), polymethyl methacrylate (PMMA), cycloolefin polymer (coP), etc., or a combination thereof. When the light generated by the organic light-emitting element 150 is guided into the auxiliary plate 200, the auxiliary plate 120 has a transparent material and the auxiliary plate 20 is optically isotropic. However, when the light generated by the organic light emitting element 150 is guided into the main board 100, the auxiliary board 120 may have an opaque material. 9 to 12 are sectional views' showing a method of manufacturing a flat display device according to another exemplary embodiment of the present invention. * Referring to FIG. 9, a gate electrode insulating layer 10u, an inorganic insulating layer 10lb, a switching transistor 107, a driving transistor 107, a cathode 110, a slope 104, and an organic light emitting layer are formed on the main board 100. ι〇6 and anode 102, to complete the organic light emitting element 150. An adhesive material having a photo-curable resin is coated on a motherboard having an organic light-emitting element 150. The applied bonding material 122 is not cured. As shown in Fig. 10, a photo-curable material is coated on the auxiliary plate 120, and a protective layer 114 is formed on the coated photo-curable material. Light is irradiated into the coated photo-curable material to cure the photo-curable material, thereby forming an auxiliary adhesion layer 118. Figure 11 and Figure 12 show the combination of a motherboard 100 with an organic light emitting element 150 and an adhesive material 122 'and an auxiliary plate 120 with an auxiliary adhesive layer 118 and a protective layer U4, so that the adhesive material 112 faces the protection. Layer 114. The bonded plates 100 and 120 are pressed between the upper roller 142 and the lower roller 140. Ultraviolet rays are irradiated between the upper roller 142 and the lower roller 140. When ultraviolet rays are applied to the auxiliary adhesive layer 118 and the adhesive material 112, the adhesive material 112, 98542.doc -22- 200533983 is cured to bond the protective layer 114 to the organic light emitting element 15o. Otherwise, the auxiliary adhesive layer 118 The adhesiveness is not changed so that the protective layer 114 is combined with the auxiliary plate 120. Therefore, a protective film assembly 162 having an auxiliary adhesive layer 118, a protective layer 114, and an adhesive layer 112 is formed on the organic light-emitting element 15 so that The plane display is not complete. According to this exemplary embodiment, the flat display device includes an auxiliary plate 120 on the protective layer 114 to protect the organic light emitting element 15 from the impact of water, oxygen, and the outside on the flat display device. In addition, the flat display device manufacturing process Simplified. Fig. 13 is a sectional view showing a flat display device according to another exemplary embodiment of the present invention. The flat display device of FIG. 13 is the same as the flat display device of FIG. I and FIG. 2 except for an adhesive layer. Therefore, the same reference numbers will be used in the text to refer to the same or similar parts as those in Fig. 1 and Fig. 2 and further explanation will be omitted. 1 and 13, the flat display device includes a main board 100, an organic light emitting element 150, a storage capacitor 103, and a protective film assembly 164. The organic light-emitting element 150 includes a gate electrode insulating layer 10u, an inorganic insulating layer 101b, an anode 102, a slope 104, an organic light-emitting layer, "a switching transistor 107, a driving transistor 109, and A cathode. The protective film assembly 164 includes a protective layer 115 and an attachable / detachable layer 116. The protective film assembly 160 is located on the organic light emitting element 150. The protective layer 115 is located on the organic light emitting element 150 to protect the organic The light-emitting element 150 is protected from contamination by impurities from the outside or hitting the organic light-emitting element 150. 98542.doc -23- 200533983. The compliance layer 115 includes a protection part 115 and a second protection part 115b. First protection The portion 115a is located on the organic light emitting element 15 and includes a photo-curable resin or a heat-curable resin. The second protection portion 15b is located on the first protection portion 115a. The second protection layer 115 may include an inorganic protection layer or An organic protective layer. Another option is that the second protective layer n5 may have a multilayer structure having an inorganic protective layer and an organic protective layer. The attachable-detachable layer 116 is located on the protective layer 115. The attachable-separate layer The adhesiveness of the layer 116 can be changed by light, heat or pressure, so it can be attached. The separable layer 116 can be attached or separated. The attachable-detachable layer U6 can include a photoresist. Figures 14 to 17 are cross sections The figure shows a method for manufacturing a flat display device according to another exemplary embodiment of the present invention. Consider FIG. 14 and form a gate electrode insulating layer 10u, an inorganic insulating layer 101b, and a switching transistor 107 on a main board 100. , Driving transistor 109, inorganic insulating layer 101b, anode 102, slope 104, organic light emitting layer 106, and cathode u0 to complete the organic light emitting element 150. Referring to FIG. 15, "Selfa tape" is located on the auxiliary board 120 to form an attachable-detachable layer 116. When light or heat is irradiated into the attachable-detachable layer 1 丨 6, the adhesion of the attachable-detachable layer 116 is reduced, and the attachable-detachable layer 116 is separated from the auxiliary plate 120. An inorganic protective layer and an organic protective layer are formed on the additional separable can layer 116 to form the protective portion 11 5 b. A photo-curable resin was coated on the second protective portion 11 $ 7. Coated photocurable resin U5a, uncured. 98542.doc -24- 200533983 Referring to FIG. 16 and FIG. 17, the main board loo with the organic light-emitting element 150 and the auxiliary board with the photocurable resin 115a, the second protective layer 115b, and the separable layer 116 can be added. 120 is combined so that the organic light emitting element 150 faces the coated photocurable resin 115a. The bonded plates 100 and 120 are pressed between the upper roller 142 and the lower roller 140. Ultraviolet rays are irradiated between the upper roller 142 and the lower roller 140. When ultraviolet rays are irradiated to the attachable-detachable layer 116 and the photocurable resin U5a has been coated, the photocurable resin n5a has been coated and cured, so that the protective layer 115 is combined with the organic light emitting element 150, and vice versa, The adhesion of the attachable / detachable layer 116 is reduced, so that the attachable-detachable layer 116 is separated from the auxiliary plate 120. Therefore, a protective film assembly 164 having an attachable-detachable layer 116 and a protective layer 115 is formed on the organic light emitting element 150 to complete the flat display device. According to this exemplary embodiment, an adhesive layer can be omitted, and the protective layer i 15 can be directly attached to the organic light emitting element 15 to simplify the manufacturing process of the flat display device. FIG. 18 is a sectional view showing a flat display device according to another exemplary embodiment of the present invention. The flat display device of FIG. 18 is the same as the flat display device of FIG. 丨 and FIG. 2 except that a detachable layer and an auxiliary plate can be added. Therefore, the same reference numerals will be used in the text to refer to the same or similar parts as those in Figures 丨 and 2 and the further explanation will be omitted. Referring to Fig. 1 and Fig. 18, the flat display device includes-a main board 100, an organic light emitting element 15G, an i storage capacitor ⑻,-a protective film assembly 166 and 98542.doc -25-200533983 an auxiliary board 120. The organic light emitting element 150 includes a gate electrode insulating layer 101a, an inorganic insulating layer 101b, an anode 102, a slope 104, an organic light emitting layer 106, a switching transistor 107, a driving transistor 10, and a cathode.丨 丨 〇. The compliance film assembly 16 6 includes a protective layer π 4 and an adhesive layer 112. The protective film assembly 166 is located on the organic light emitting element 150. The protective layer 114 is located on the adhesive layer 112 to protect the organic light emitting element 15 from contamination from external impurities or the impact on the organic light emitting element 15. The auxiliary board 120 is located on the protective layer 114, and the auxiliary board 120 contacts the protective layer 114. Alternatively, the auxiliary board 120 may be omitted, and a detachable layer (not shown) may be located on the protective layer 114. . Thereafter, a flat display device according to another exemplary embodiment of the present invention is manufactured as follows. On the main board 100, a gate electrode insulating layer 101a, an inorganic insulating layer 10lb, a switching transistor 107, a driving transistor 109, an anode 102, a slope 10, an organic light emitting layer 106, and a cathode U are formed. The organic light-emitting element 15 is complete. On the main board 100 having the organic light emitting element 150, an adhesive material having a photocurable resin is applied. The applied material (not shown) is not cured. An oxygen cut is deposited on the auxiliary plate 12G_h to form an inorganic protective layer. An epoxy resin with low permeability is coated on the inorganic protective layer to form an organic protective layer. Therefore, a protective layer m with a double-layer structure composed of an inorganic protective layer and an organic protective layer is formed on the auxiliary plate 12G, thereby forming a silk protective layer 114 98542.doc -26- 200533983 at a local temperature, water atmosphere or oxygen atmosphere It does not damage the organic light emitting element 150 as it is formed. In this exemplary embodiment, the protective layer n 4 is formed at a temperature higher than about 200 C to reduce the permeability of the protective layer 114. Alternatively, an organic protective layer may be formed on the auxiliary plate 120, and an inorganic protective layer may be formed on the organic protective layer. The main board iOO with the organic light-emitting element 150 and a bonding material (not shown) is combined with the auxiliary board 120 with the protective layer 114 so that the bonding material (not shown) faces the protective layer 114. The bonded plates 100 and 120 are squeezed between the upper roller 142 and the lower roller 14o as shown in FIG. Ultraviolet rays were irradiated between the upper roller 142 and the lower roller 14o as shown in FIG. When ultraviolet rays are irradiated into the auxiliary bonding layer 118 and the bonding material (not shown), the bonding material (not shown) is cured, so that the protective layer 114 is combined with the organic light-emitting element 150. Therefore, a protective film assembly 66 having a protective layer 114 and an adhesive layer 112 is formed on the organic light emitting element 150 to complete the flat display device. According to the four exemplary embodiments, the protective layer 114 is formed directly on the auxiliary board to simplify the manufacturing process of the flat display device. Fig. 19 is a plan view showing a flat display device according to another exemplary embodiment of the present invention. FIG. 20 is a cross-sectional view taken along the line Π-Π in FIG. 19. Except for the organic layer and auxiliary board, the flat display device of FIG. And FIG. 20 are the same as the flat display of FIG. 1 and FIG. 2 ”, ..., and the clothes. Therefore, the same reference numbers are used in the text to refer to The same or similar parts in Fig. 1 and Fig. 2 are omitted and further explanation is omitted. With reference to Figs. 19 and 20, the flat display device includes a main board and a 98542.doc -27- 200533983 machine. Light-emitting element 150, a synthetic buffer layer u3, and a protective layer IK. The organic light-emitting element 150 includes an electrode insulating layer 10u, an inorganic insulating layer crane, an anode 102, a slope 104, and an organic light-emitting layer. A switching transistor 107 and a driving transistor; [09 and a cathode Η 〇. The switching transistor 107 includes a first source electrode 105c, a first gate electrode 1a, a -th-current drain m05a, and A first-semiconductor layer pattern. The first: the source electrode 105C is electrically connected to the data line I to drive the integrated circuit (not shown) to output the data signal to the first source electrode 10 via the data line W5C. One

閘電極H)5b位於主板_上,以使第—閘電極祕電連接 =閑極線lG5b’,以使該驅動積體電路經由閉極線觸,向 第閘電極105b輸出閘極電壓。第一汲電極1〇化與第一源 2極105c隔開。第一半導體層圖樣位於第一汲電極l〇5a與 第一源電極105c之間。 驅動電晶體109包括一第二源電極! 〇8a、_第二閘電極 l〇8b—第二汲電極1〇8()及一第二半導體層圖樣。第二源電 極l〇8a電連接至汲極電壓線1〇8a,以接收一汲極電壓。第二 閘電極108b位於主板100上,且第二閘電極1〇讣經由一輔 助接觸孔電連接至開關電晶體1〇7之第一汲電極i〇5a。第 二汲電極l〇8c與第二源電極108a隔開。第二半導體層圖樣 位於第二汲電極丨08c與第二源電極丨〇8&之間。 *貝料私壓及閘極電壓分別施加至資料線i 〇5c,及閘極線 l〇5b'時,資料電壓經由第一源電極1〇殳、第一半導體圖樣 及第一汲電極105a施加至第二閘電極丨〇8b。當資料電壓施 加至第二閘電極1〇813時,於第二半導體層圖樣中形成一通 98542.doc -28 - 200533983 道,以使該汲極電壓施加至第二汲電極1〇8c。 閘電極絕緣層lGla使第—閘電極1G5b、閘極㈣,及第 二閘電極108b電絕緣於第一源電極丨〇5a、資料線丨〇5c,第一 汲電極105c、第二源電極1〇8a、汲極電壓線1〇8&|及第二汲 電極108c。閘電極絕緣層1〇la包括一透明絕緣材料,例如 氧化矽、氮化矽等。 無機絕緣層101b位於主板100上,主板1〇〇具有開關電晶 體107驅動私晶體109、閘極線105b’、資料線i〇5cf及汲 極電壓線108a,。無機絕緣層1〇lb包括一接觸孔,經由該接 觸孔第一;及笔極電連接至陽極1 。無機絕緣層1 〇 1 b包括 透明絕緣材料,例如氧化石夕、氮化石夕等。 第二閘電極108b部分覆蓋汲極電壓線1〇8a,以形成儲存電 合器103。儲存電容器103於陽極1〇2與陰極丨1〇之間保持一 一訊框之電壓差。 陽極102位於主板1〇〇上由汲極電壓線1〇8&,、閘極線 105b1及資料線i〇5c’所界定之區域内。陽極1〇2包括導電材 料,例如一金屬。另一選擇係,陽極! 〇2可包括一透明導 電材料,例如氧化銦錫(ITO)、氧化錫(το)、氧化銦辞 (ΙΖΟ)、氧化鋅(ζ〇)等。 斜坡104位於具有陽極1〇2之無機絕緣層101|3上,以在陽 極102之中央部分形成一凹陷部分。 有機發光層106位於由斜坡1〇4形成之凹陷部分中。 陰極110位於有機發光層106及斜坡1〇4上,以接收一公 用電壓。陰極110包括一透明導電材料,例如氧化銦錫 98542.doc -29· 200533983 (ITO)、氧化錫(TO)、氧化銦辞(IZ0)、氧化辞⑺等。 施加至第二汲電極l〇8c之汲極電壓經由接觸孔施加至陽 極1 02。因此,電流於陽極! 02及陰極i丨〇之間流動穿過有 機發光層108,以於有機發光層ι〇8中產生光。 合成緩衝層113包括複數個無機絕緣粒子丨丨扑及一有機 絕緣層113a。無機絕緣粒子U3b位於有機層丨丨“中。具有 無機絕緣粒子113b及有機層ii3a之合成緩衝層113較無無 機絕緣粒子113b之緩衝層具有低滲透性。合成緩衝層113 具有以體積計僅約5%之無機絕緣粒子11313。當合成緩衝層 113具有以體積計僅約5%之無機絕緣粒子113b時,合成緩 衝層113之撓性及黏結性會減小,以使合成緩衝層113可與 有機發光元件150分離。 無機絕緣粒子113b包括碳化矽、氧化鋰、氧化鎂、氧化 鈣、氧化矽、矽膠、氧化鋁、氧化鈦、氧氮化矽、氮化 矽、氮化鋁等或其組合。 於該實例性實施例中,每一無機絕緣粒子丨丨补之尺寸爲 約5 nm至約1〇 μιη。當每一無機絕緣粒子丨丨儿之尺寸增加 日守,合成緩衝層113之滲透性增加。當每一無機絕緣粒子 113b之尺寸大於10 4〇1時,合成緩衝層113具有大致等於該 緩衝層無無機絕緣粒子U3b時之滲透性。當每一無機絕緣 粒子113b之尺寸小於約5 nm時,無機絕緣粒子丨丨扑之製造 成本會大大增加。另一選擇係每一無機絕緣粒子之尺寸可 大於約10 μχη或小於約5 nm。 雖然不欲受理論之限制,但下文將依據合成緩衝層丨Η 98542.doc -30- 200533983 之一結構來閣釋爲何合成緩衝層113具有較無無機絕緣粒 子113b之緩衝層爲低之滲透性之一可能之原因。有機層 113a具有一線性形狀或網形形狀,因此有機層“Μ具有複 數個空穴。當無機絕緣粒子1131)與有機層U3a混合時,無 機絕緣粒子113b填充有機層113a之空穴,從而減小合成緩 衝層113之滲透性。 有機層113a具有低滲透性。有機層丨丨仏包括環氧樹脂、 聚矽氧樹脂、一氟化樹脂、丙烯酸樹脂、氨基甲酸酯樹 脂、酚醛樹脂、聚乙烯樹脂、聚丙烯樹脂、聚苯乙烯樹 脂、聚甲基丙烯酸甲酯樹脂、聚脲樹脂、聚醯亞氨樹脂、 聚合物樹脂等或其組合。 合成緩衝層113之滲透性由無機絕緣粒子丨丨孙之種類及 數量、有機層113a之種類、合成緩衝層113之厚度等決 定。於該實例性實施例中’合成緩衝層113之渗透性爲約 0.1 g/m2天至 1〇〇 g/m2天。 保護層114位於合成緩衝層113上,以保護有機發光元件 150免文來自外界之雜質污染或對有機發光元件15〇之撞 擊。保護層114使有機發光元件15〇之有機發光層1〇6與水 或氧氣隔離,且保護層114可吸收水。 保護層114包括-無機保護層、_有機保護層、一吸濕 層等或一具有其組合之合成層。 圖21至23係截面圖,其顯示根據本發明另一實例性實施 例製造一平面顯示裝置之方法。 參考圖21,於主板100上形成閘電極絕緣層i〇ia、無機 9S542.doc -31 - 200533983 絕緣層l〇lb、開關電晶體107、驅動電晶體109、陽極 102、斜坡1〇4、有機發光層1〇6及陰極11〇,以使有機發光 元件150完整。 參考圖22,在有機發光元件15〇上形成具有無機絕緣粒 子113b及有機層113a之合成緩衝層113。 爲形成合成緩衝層113 ’形成有機層113 a之材料與無機 絕緣粒子113b混合。形成有機層113a之材料與無機絕緣粒 子113b之混合物具有流動性。另一選擇係,可將形成有機 層113a之材料與無機絕緣粒子1131)之混合物加熱或用一光 輻照,以使形成有機層113a之材料與無機絕緣粒子丨丨扑之 混合物具有流動性。將形成有機層U3a之材料與無機絕緣 粒子113b之混合物塗佈於有機發光元件15〇上。使形成有 機層113a之材料與無機絕緣粒子丨Ub之已塗佈混合物固化 以形成合成緩衝層113。另一選擇係,可於圖4及圖5所示 輔助板120上形成合成緩衝層113,以便可藉由圖6中所示 黏結層112使合成緩衝層113與有機發光元件⑼結合。 參考圖23,於合成緩衝層113上沈積氧化矽以形成無機 ㈣層’從而形成保護層114。另—選擇係,可將環氧樹 脂塗佈於無機保護層上以形成保護層114。保護層114並不 直接形成於有機發光元件15()上,而形成於合成緩衝層⑴ 便可於尚溫、水氣氛或氧氣氣氛下形成保護 114 〇 方^古、、w ~~ 、门邮下形成之保護層114具有較於低溫下形成之伴 護層爲低之滲透性。 a之保 根據該實例性實施例,該平面顯示裝置包括具有無機絕 98542.doc -32- 200533983 緣粒子113b之合成緩衝層113,以保護有機發光元件15〇免 受來自外界之雜質污染或對有機發光元件15〇之撞擊。此 外’會降低有機發光元件150之熱預算。 圖24係一顯示本發明另一實例性實施例之一平面顯示裝 置之截面圖。圖24之平面顯示裝置除一保護層外皆與圖1〇 及11之平面顯示裝置相同。因此,文中將使用相同之參考 編號扣代與圖1 0及圖11中相同或相似之部分並省卻進一步 之闡述。 參考圖10及24,該平面顯示裝置包括一主板1〇〇、一有 機發光元件150、一合成緩存層U3及一保護層115。 有機發光元件150包括一閘電極絕緣層1〇u、一無機絕 緣層101b、一陽極102、一斜坡104、一有機發光層1〇6、 一開關電晶體107、一驅動電晶體109及一陰極丨丨〇。 合成缓衝層113位於有機發光元件15〇上,以保護有機發 光元件150免受於保護層115形成期間所產生熱之影響及外 界對有機發光元件15 0之雜質污染。 合成缓衝層113包括複數個無機絕緣粒子丨丨3b及一有機 層113a。無機絕緣粒子113b位於有機層113a中。 保護層115位於合成緩衝層丨丨3上,以保護有機發光元件 150免受來自外界之雜質污染或對有機發光元件15〇之撞 擊。保護層115使有機發光元件15〇之有機發光層1〇6與水 或氧氣分離,且保護層115可吸收水。 保護層115包括一無機保護部分丨15c及一位於該無機保 護部分115 c上之有機保護部分1丨5 d。另一選擇係,保護層 98542.doc -33 - 200533983 ^ 於5亥貫例性實施例中,無機保護 及無機矽石,且有機保護部分115d包 圖2 5至2 8係截面圖,立显— Q 其顯不根據本發明另一實例性實施 例製造一平面顯示裝置之方法。 、 ”參考圖25 ’在主板1GG上形成閘電極絕緣層101a、無機 彖曰01b開關電晶體107、驅動電晶體i〇9、陽極The gate electrode 5b is located on the main board _ so that the first gate electrode is electrically connected to the idler line lG5b ', so that the driving integrated circuit outputs the gate voltage to the first gate electrode 105b through the closed electrode line contact. The first drain electrode 101 is separated from the first source electrode 105c. The first semiconductor layer pattern is located between the first drain electrode 105a and the first source electrode 105c. The driving transistor 109 includes a second source electrode 108a, a second gate electrode 108b, a second drain electrode 108 (), and a second semiconductor layer pattern. The second source electrode 108a is electrically connected to the drain voltage line 108a to receive a drain voltage. The second gate electrode 108b is located on the main board 100, and the second gate electrode 10b is electrically connected to the first drain electrode 105a of the switching transistor 107 via an auxiliary contact hole. The second drain electrode 108c is separated from the second source electrode 108a. The second semiconductor layer pattern is located between the second drain electrode 08c and the second source electrode 088. * When the material pressure and gate voltage are applied to the data line i 05c and the gate line 105b ', respectively, the data voltage is applied through the first source electrode 10 电极, the first semiconductor pattern, and the first drain electrode 105a. To the second gate electrode 丨 〇8b. When the data voltage is applied to the second gate electrode 1081, a pass 98542.doc -28-200533983 is formed in the pattern of the second semiconductor layer, so that the drain voltage is applied to the second drain electrode 108c. The gate electrode insulating layer 1Gla electrically insulates the first gate electrode 1G5b, the gate electrode ㈣, and the second gate electrode 108b from the first source electrode 丨 5a, the data line 丨 05c, the first drain electrode 105c, and the second source electrode 1 〇8a, the drain voltage line 108 and the second drain electrode 108c. The gate electrode insulating layer 101a includes a transparent insulating material, such as silicon oxide, silicon nitride, and the like. The inorganic insulating layer 101b is located on the main board 100. The main board 100 has a switching transistor 107 to drive the private crystal 109, a gate line 105b ', a data line 105c, and a drain voltage line 108a. The inorganic insulating layer 10lb includes a contact hole through which the contact hole is first; and the pen electrode is electrically connected to the anode 1. The inorganic insulating layer 101b includes a transparent insulating material, such as oxidized stone and nitrided stone. The second gate electrode 108b partially covers the drain voltage line 108a to form a storage capacitor 103. The storage capacitor 103 maintains a frame-to-frame voltage difference between the anode 102 and the cathode 110. The anode 102 is located in the area defined by the drain voltage line 108 and the gate line 105b1 and the data line 105c 'on the main board 100. The anode 102 includes a conductive material such as a metal. Another option, anode! 〇2 may include a transparent conductive material, such as indium tin oxide (ITO), tin oxide (το), indium oxide (IZO), zinc oxide (ζ〇), and the like. The slope 104 is located on the inorganic insulating layer 101 | 3 having the anode 102 to form a recessed portion in the central portion of the anode 102. The organic light emitting layer 106 is located in a recessed portion formed by the slope 104. The cathode 110 is located on the organic light emitting layer 106 and the slope 104 to receive a common voltage. The cathode 110 includes a transparent conductive material, such as indium tin oxide 98542.doc -29 · 200533983 (ITO), tin oxide (TO), indium oxide (IZ0), oxide rhenium, and the like. The drain voltage applied to the second drain electrode 108c is applied to the anode 102 through the contact hole. Therefore, the current flows to the anode! The organic light-emitting layer 108 flows between 02 and the cathode i0 to generate light in the organic light-emitting layer 108. The synthetic buffer layer 113 includes a plurality of inorganic insulating particles and an organic insulating layer 113a. The inorganic insulating particles U3b are located in the organic layer. The synthetic buffer layer 113 having the inorganic insulating particles 113b and the organic layer ii3a has a lower permeability than the buffer layer without the inorganic insulating particles 113b. The synthetic buffer layer 113 has only about 5% of the inorganic insulating particles 11313. When the synthetic buffer layer 113 has only about 5% of the inorganic insulating particles 113b by volume, the flexibility and adhesion of the synthetic buffer layer 113 will be reduced, so that the synthetic buffer layer 113 can communicate with The organic light emitting element 150 is separated. The inorganic insulating particles 113b include silicon carbide, lithium oxide, magnesium oxide, calcium oxide, silicon oxide, silicon gel, aluminum oxide, titanium oxide, silicon oxynitride, silicon nitride, aluminum nitride, or the like, or a combination thereof. In this exemplary embodiment, the size of each inorganic insulating particle is about 5 nm to about 10 μm. When the size of each inorganic insulating particle is increased, the penetration of the synthetic buffer layer 113 is increased. When the size of each inorganic insulating particle 113b is greater than 104, the synthetic buffer layer 113 has a permeability substantially equal to that of the buffer layer without inorganic insulating particles U3b. When each inorganic insulating particle 113b When the size of the particles 113b is less than about 5 nm, the manufacturing cost of the inorganic insulating particles will greatly increase. Another option is that the size of each inorganic insulating particle may be greater than about 10 μχη or less than about 5 nm. Restrictions, but the following will explain one of the possible reasons why the synthetic buffer layer 113 has a lower permeability than the buffer layer without inorganic insulating particles 113b according to one of the structures of the synthetic buffer layer 98542.doc -30- 200533983 The organic layer 113a has a linear shape or a mesh shape, so the organic layer "M has a plurality of holes. When the inorganic insulating particles 1131) are mixed with the organic layer U3a, the inorganic insulating particles 113b fill the holes of the organic layer 113a, thereby reducing the permeability of the synthetic buffer layer 113. The organic layer 113a has low permeability. Organic layer including epoxy resin, polysiloxane resin, monofluorinated resin, acrylic resin, urethane resin, phenolic resin, polyethylene resin, polypropylene resin, polystyrene resin, polymethacrylic acid An ester resin, a polyurea resin, a polyimide resin, a polymer resin, or the like, or a combination thereof. The permeability of the synthetic buffer layer 113 is determined by the type and number of the inorganic insulating particles, the type of the sun, the type of the organic layer 113a, the thickness of the synthetic buffer layer 113, and the like. The permeability of the 'synthetic buffer layer 113 in this exemplary embodiment is about 0.1 g / m2 days to 100 g / m2 days. The protective layer 114 is located on the synthetic buffer layer 113 to protect the organic light-emitting element 150 from external pollution or impact on the organic light-emitting element 150. The protective layer 114 isolates the organic light emitting layer 106 of the organic light emitting element 150 from water or oxygen, and the protective layer 114 can absorb water. The protective layer 114 includes an inorganic protective layer, an organic protective layer, a hygroscopic layer, etc. or a composite layer having a combination thereof. 21 to 23 are sectional views showing a method of manufacturing a flat display device according to another exemplary embodiment of the present invention. Referring to FIG. 21, a gate electrode insulating layer i0ia, an inorganic 9S542.doc -31-200533983 insulating layer 10lb, a switching transistor 107, a driving transistor 109, an anode 102, a slope 104, an organic layer, and an organic layer are formed on the main board 100. The light emitting layer 106 and the cathode 11 are completed to complete the organic light emitting element 150. Referring to Fig. 22, a synthetic buffer layer 113 having inorganic insulating particles 113b and an organic layer 113a is formed on the organic light emitting element 15o. The material forming the organic layer 113a to form the synthetic buffer layer 113 'is mixed with the inorganic insulating particles 113b. The mixture of the material forming the organic layer 113a and the inorganic insulating particles 113b has fluidity. Alternatively, the mixture of the material forming the organic layer 113a and the inorganic insulating particles 1131) may be heated or irradiated with light, so that the mixture of the material forming the organic layer 113a and the inorganic insulating particles may be fluid. A mixture of a material forming the organic layer U3a and the inorganic insulating particles 113b is coated on the organic light-emitting element 15o. The coated mixture of the material forming the organic layer 113a and the inorganic insulating particles Ub is cured to form a synthetic buffer layer 113. Alternatively, a synthetic buffer layer 113 may be formed on the auxiliary plate 120 shown in FIG. 4 and FIG. 5 so that the synthetic buffer layer 113 can be combined with the organic light emitting element ⑼ through the adhesive layer 112 shown in FIG. 6. Referring to FIG. 23, silicon oxide is deposited on the synthetic buffer layer 113 to form an inorganic hafnium layer 'to form a protective layer 114. Alternatively, an epoxy resin may be coated on the inorganic protective layer to form the protective layer 114. The protective layer 114 is not directly formed on the organic light-emitting element 15 (), but is formed on a synthetic buffer layer. The protective layer 114 can be formed in a still temperature, water atmosphere, or oxygen atmosphere. The protective layer 114 formed below has a lower permeability than the accompanying protective layer formed at a lower temperature. Guarantee of a According to the exemplary embodiment, the flat display device includes a synthetic buffer layer 113 having inorganic particles 98542.doc -32- 200533983 edge particles 113b to protect the organic light-emitting element 15 from contamination from external impurities or against The impact of the organic light emitting element 150. In addition, it will reduce the thermal budget of the organic light emitting element 150. Fig. 24 is a sectional view showing a flat display device according to another exemplary embodiment of the present invention. The flat display device of FIG. 24 is the same as the flat display device of FIGS. 10 and 11 except for a protective layer. Therefore, the same reference numerals will be used in the text to denote the same or similar parts as those in FIG. 10 and FIG. 11 and omits further explanation. 10 and 24, the flat display device includes a main board 100, an organic light emitting element 150, a synthetic buffer layer U3, and a protective layer 115. The organic light emitting element 150 includes a gate electrode insulating layer 10u, an inorganic insulating layer 101b, an anode 102, a slope 104, an organic light emitting layer 106, a switching transistor 107, a driving transistor 109, and a cathode.丨 丨 〇. The synthetic buffer layer 113 is located on the organic light emitting element 150 to protect the organic light emitting element 150 from the heat generated during the formation of the protective layer 115 and the external pollution of the organic light emitting element 150. The synthetic buffer layer 113 includes a plurality of inorganic insulating particles 3b and an organic layer 113a. The inorganic insulating particles 113b are located in the organic layer 113a. The protective layer 115 is located on the synthetic buffer layer 3 to protect the organic light-emitting element 150 from impurities from the outside or to impact the organic light-emitting element 150. The protective layer 115 separates the organic light emitting layer 106 of the organic light emitting element 150 from water or oxygen, and the protective layer 115 can absorb water. The protective layer 115 includes an inorganic protective portion 15c and an organic protective portion 115d located on the inorganic protective portion 115c. Another option is the protective layer 98542.doc -33-200533983 ^ In the example of the 50th century, the inorganic protection and inorganic silica, and the organic protection part 115d includes a cross section of Figures 2 to 28, showing — Q It shows a method for manufacturing a flat display device according to another exemplary embodiment of the present invention. "" Referring to FIG. 25 ′ On the main board 1GG, a gate electrode insulating layer 101a, an inorganic transistor 01b switching transistor 107, a driving transistor 107, and an anode are formed.

1〇2、斜坡104、有機發光層1〇6及陰極11〇,以使有機發光 元件150完整。 >考圖26,在有機發光元件15〇上形成具有無機絕緣粒 子113b及有機層113a之合成緩衝層ι13。102, the slope 104, the organic light emitting layer 106, and the cathode 11 to complete the organic light emitting element 150. > With reference to Fig. 26, a synthetic buffer layer 13 having inorganic insulating particles 113b and an organic layer 113a is formed on the organic light-emitting element 15o.

可進一步包括一吸濕 部分115c包括氧化石夕 括環氧樹脂。 參考圖27,於合成緩衝層113上沈積氧化矽以形成無機 保護部分115c。無機保護部分115c不直接形成於有機發光 元件15 0上而形成於合成緩衝層n 3上,以便可於高溫、水 氣氣或氧氣氣氣下形成無機保護部分115c。另一選擇係, 可於無機保護部分115c上形成吸濕層(未圖示)。 參考圖28,於無機保護部分115c上塗佈環氧樹脂以形成 有機保護部分11 5 d。因此,可使具有一具有無機保護部分 115c及有機保護部分11 5d之雙層結構之保護部分115完 整。另一選擇係,保護層11 5可具有一具有若干無機保護 部分及有機保護部分之多層結構。 根據該實例性實施例,保護層115包括無機保護部分 115c及有機保護部分115d,以降低保護層115之滲透性。 圖2 9係一顯示本發明另一實例性實施例之一平面顯示裝 98542.doc -34- 200533983 置之截面圖。圖29之平面狀嬰 面頌不叙置除保護層及合成緩衝層 外皆與圖10及11之平面顯示裝置相同。因,匕,文中將使用It may further include a hygroscopic portion 115c including oxidized stone and epoxy resin. Referring to FIG. 27, silicon oxide is deposited on the synthetic buffer layer 113 to form an inorganic protective portion 115c. The inorganic protective portion 115c is not directly formed on the organic light-emitting element 150, but is formed on the synthetic buffer layer n3 so that the inorganic protective portion 115c can be formed under high temperature, water gas or oxygen gas. Alternatively, a moisture-absorbing layer (not shown) may be formed on the inorganic protective portion 115c. Referring to FIG. 28, an epoxy resin is coated on the inorganic protective portion 115c to form an organic protective portion 115d. Therefore, the protective portion 115 having a double-layered structure having an inorganic protective portion 115c and an organic protective portion 115d can be completed. Alternatively, the protective layer 115 may have a multilayer structure having a plurality of inorganic protective portions and organic protective portions. According to this exemplary embodiment, the protective layer 115 includes an inorganic protective portion 115c and an organic protective portion 115d to reduce the permeability of the protective layer 115. Fig. 9 is a sectional view showing a plane display device 98542.doc -34- 200533983, which is another exemplary embodiment of the present invention. The planar baby mask of Fig. 29 is the same as the flat display device of Figs. 10 and 11 except for the protective layer and the synthetic buffer layer. Because, dagger, will be used in the text

相同之參考編號指代與圖1Q , IS1 ιυ及圖11中相同或相似之部分並 省卻進一步之闡述。 參考圖Η)及圖29,該平面顯示裝置包括—主板⑽、一 有機發光元件150及一合成緩衝層113,。 有機發光元件150包括一閘電極絕緣層l〇u、一無機絕The same reference numerals refer to the same or similar parts as those in Fig. 1Q, IS11 and Fig. 11 and omit further explanation. Referring to FIG. 29) and FIG. 29, the flat display device includes a main board ⑽, an organic light emitting element 150, and a synthetic buffer layer 113 ′. The organic light emitting element 150 includes a gate electrode insulating layer 10u, an inorganic insulator

緣層嶋、一陽極102、_斜坡ι〇4、一有機發光層⑽、 一開關電晶體107、一驅動電晶體1〇9及一陰極丨丨〇。 位於有機發光元件150上之合成緩衝層⑴,用於保護有機 發光元件15G免受於保護層115形成期間所產生之熱及來自 外界之對有機發光元件150之雜質污染。該雜質可係水或 氧氣等。 合成緩衝層113,包括複數個無機絕緣粒子丨丨几及一有機 層H3a。無機絕緣粒子113b位於有機層丨丨以中。於該實例 f生貝知例中,無機絕緣粒子丨丨3b包括氧化石夕,且有機層 113a保護環氧樹脂。另—選擇係,無機絕緣粒子可包括一 吸濕材料,例如無機矽石、氧化矽、活性碳等。 合成緩衝層113,用作一保護層,以使平面顯示裝置可不 匕括任何領外之保護層。合成緩衝層1 1 3,具有較圖1 〇及1 1 中所示合成緩衝層113爲厚之厚度。 圖30至31係截面圖,其顯示根據本發明另一實例性實施 例製造一平面顯示裝置之方法。 參考圖30,在主板1〇〇上形成閘電極絕緣層1〇la、無機 98542.doc -35- 200533983 絕緣層101b、開關電晶體107、驅動電晶體1〇9、陽極 102斜坡104、有機發光層及陰極丨丨〇,以使有機發光 元件150完整。 參考圖31,在有機發光元件15〇上形成具有無機絕緣粒 子113b及有機層113 a之合成緩衝層 113’。 根據该實例性實施例,合成緩衝層113,用作保護層,以 簡化平面纟、、員示衣置之製程,並減小平面顯示裝置之製造成 本0 根據本發明,使用輔助板形成平面顯示裝置之保護層, 以減小有機發光元件之熱預算。此外,可於高溫下形成該 保護層,以增加保護層之滲透性,從而改良平面顯示裝置 之影像顯示品質。另外,可附加-可分離層可用作輔助保 4層而且,可於氧氣氛下形成該保護層以減少平面顯示 裝置之製造成本。 此外,孩平面顯示裝置包括具有無機絕緣粒子之有機緩 衝層,以保濩有機發光元件免受來自外界之雜質污染或對 4有機發光疋件之撞擊,從而減小該有機發光元件之熱預 异。而且,可省卻該黏結層、可附加-可分離層或保護 層,從而減化平面顯示裝置之製程。 本文已參考該等實例性實施例對本發明進行闡述,然 而,很明顯,熟習此項技術者根據上述闡釋將易得出各種 修改及改變。因此,本發明包含所有此等歸屬於附屬申請 專利範圍之精神及範®壽内的替代修改及改變。 【圖式簡單說明】 98542.doc -36- 200533983 藉由參考該等附圖詳細關琉太 〒、、田鬧迷本發明之實例性實施例,將 更顯見本發明之上述及其他優點。 圖1係一顯示本發明一實例性眚 員w f王貝轭例之一平面顯示裝置 之平面圖; 圖2係一沿圖1中線W剖切之截面圖; 實例性實施例 圖3至圖6係截面圖,其顯示根據本發明 製造一平面顯示裝置之方法; 圖7係一透視圖,JL顯+栖祕 , …、、貝不根據本發明另-實例性實施例 製造一平面顯示裝置之方法; 圖8係一顯示本發明另一實 只1』Γ生汽轭例之平面顯示裝置 之截面圖; 只丁衣1 例性實施 圖9至12係截面圖’其顯示根據本發明另一實 例製造一平面顯示裝置之方法; 圖13係一顯示本發明另一實 、J Γ生只施例之一平面顯示裝 置之截面圖; 例性實施 圖14至17係截面圖,其顯示根據本發明另一實 例製造一平面顯示裝置之方法; 例性實施例之一平面顯示裝 圖1 8係 '一顯不本發明另一實 置之截面圖; 圖19係顯不本發明另一實例性實你彳彳 貝J Γ生貝施例之一平面顯示裝 置之平面圖; 圖20係一沿圖19中線η_π,剖切之截面圖; 圖2 1至圖2 3係截面圖,並顯示妒 ,、”、、貝不根據本發明另一實例性實 施例製造一平面顯示裝置之方法; 98542.doc -37- 200533983 圖24係一顯示本發明另—實例性實施例之 置之截面圖; 圖25至28係截面圖,其顯示根據本發明另 例製造一平面顯示裝置之方法; 圖29係-顯示本發明另—實例性實施例之一 置之截面圖; 圖3 0及圖3 1係截面圖,复題 一顯不根據本發明另 施例製造一平面顯示裝置之方法。The edge layer 嶋, an anode 102, _ ramp 〇4, an organic light emitting layer ⑽, a switching transistor 107, a driving transistor 109, and a cathode 丨 丨. The synthetic buffer layer ⑴ on the organic light emitting element 150 is used to protect the organic light emitting element 15G from heat generated during the formation of the protective layer 115 and contamination of the organic light emitting element 150 from the outside with impurities. The impurities may be water or oxygen. The synthetic buffer layer 113 includes a plurality of inorganic insulating particles and an organic layer H3a. The inorganic insulating particles 113b are located in the organic layer. In this example, the inorganic insulating particles 3b include stone oxide, and the organic layer 113a protects the epoxy resin. Alternatively, the inorganic insulating particles may include a hygroscopic material, such as inorganic silica, silica, activated carbon, and the like. The synthetic buffer layer 113 is used as a protective layer, so that the flat display device can not cover any outer protective layer. The synthetic buffer layer 1 1 3 is thicker than the synthetic buffer layer 113 shown in FIGS. 10 and 11. 30 to 31 are sectional views showing a method of manufacturing a flat display device according to another exemplary embodiment of the present invention. Referring to FIG. 30, a gate electrode insulating layer 101a, an inorganic 98542.doc -35- 200533983 insulating layer 101b, a switching transistor 107, a driving transistor 10, an anode 102 slope 104, and organic light emitting are formed on a main board 100. Layers and cathodes to complete the organic light emitting element 150. Referring to FIG. 31, a synthetic buffer layer 113 'having an inorganic insulating particle 113b and an organic layer 113a is formed on the organic light emitting element 15o. According to this exemplary embodiment, a synthetic buffer layer 113 is used as a protective layer to simplify the manufacturing process of flat screens and display clothing and reduce the manufacturing cost of flat display devices. 0 According to the present invention, a flat display is formed using an auxiliary board The protective layer of the device to reduce the thermal budget of the organic light emitting element. In addition, the protective layer can be formed at a high temperature to increase the permeability of the protective layer, thereby improving the image display quality of the flat display device. In addition, an attachable-detachable layer can be used as an auxiliary protective layer. Further, the protective layer can be formed under an oxygen atmosphere to reduce the manufacturing cost of the flat display device. In addition, the flat display device includes an organic buffer layer having inorganic insulating particles to protect the organic light-emitting element from impurities from the outside or the impact of the organic light-emitting element, thereby reducing the thermal pre-difference of the organic light-emitting element. . Moreover, the adhesive layer, the separable layer or the protective layer can be omitted, thereby reducing the manufacturing process of the flat display device. The present invention has been described herein with reference to these exemplary embodiments, however, it is apparent that those skilled in the art will readily be able to make various modifications and changes based on the above explanations. Accordingly, this invention includes all such modifications and alterations which fall within the spirit and scope of the appended patent claims. [Brief description of the drawings] 98542.doc -36- 200533983 By referring to these drawings in detail, the above-mentioned and other advantages of the present invention will be more apparent in the exemplary embodiments of the invention. FIG. 1 is a plan view showing a flat display device of an example of a wf wang yoke example of the present invention; FIG. 2 is a cross-sectional view taken along the line W in FIG. 1; an exemplary embodiment is shown in FIGS. 3 to 6 7 is a cross-sectional view showing a method for manufacturing a flat display device according to the present invention; FIG. 7 is a perspective view, JL display + habitat, ..., which is not according to another-exemplary embodiment of the present invention to manufacture a flat display device Method; FIG. 8 is a cross-sectional view of a planar display device showing another example of a steam yoke according to the present invention; FIG. 8 is a cross-sectional view of FIG. 9 to 12 as an example. An example of a method for manufacturing a flat display device; FIG. 13 is a cross-sectional view showing a flat display device according to another embodiment of the present invention, which is only one embodiment; FIG. 14 to 17 are cross-sectional views showing an example according to the present invention. A method for manufacturing a flat display device according to another example of the invention; a flat display device according to one of the exemplary embodiments; FIG. 18 is a cross-sectional view showing another embodiment of the present invention; FIG. 19 is another example of the present invention; One of the examples of the real shellfish J Γ raw shell display Fig. 20 is a cross-sectional view taken along line η_π in Fig. 19; Figs. 21 to 23 are cross-sectional views showing jealousy, "", and "Be" according to another exemplary embodiment of the present invention. A method for manufacturing a flat display device; 98542.doc -37- 200533983 Fig. 24 is a cross-sectional view showing another example of the present invention; Figs. 25 to 28 are cross-sectional views showing another example according to the present invention. Method for manufacturing a flat display device; FIG. 29 is a cross-sectional view showing another embodiment of the present invention; FIG. 30 and FIG. 31 are cross-sectional views. Method for manufacturing a flat display device.

【主要元件符號說明】 100 主板 101a 閘電極絕緣層 101b 無機絕緣層 102 陽極 102, 陽極 103 儲存電容器 104 斜坡 105a 第一汲電極 105b 第一閘電極 105bf 閘極線 105c 第一源電極 105cf 資料線 106 有機發光層 107 開關電晶體 108a 第二源電極[Description of main component symbols] 100 Main board 101a Gate electrode insulating layer 101b Inorganic insulating layer 102 Anode 102, Anode 103 Storage capacitor 104 Slope 105a First drain electrode 105b First gate electrode 105bf Gate line 105c First source electrode 105cf Data line 106 Organic light emitting layer 107 Switching transistor 108a Second source electrode

平面顯示裝 、實例性實施 平面顯示裝 一實例性實 98542.doc -3ΰ - 200533983Plane display device, example implementation Plane display device, an example example 98542.doc -3ΰ-200533983

108af 汲極電壓線 108b 第二閘電極 108c 第二汲電極 109 驅動電晶體 110 陰極 110f 陰極 112 陰極 112? 黏結材料 113 合成緩衝層 113f 合成緩衝層 113a 有機絕緣層 113b 無機絕緣粒子 114 保護層 115 保護層 115a 第一保護部分 115af 可光固化樹脂 115b 第二保護部分 115c 無機保護部分 115d 有機保護部分 116 可附加-可分離層 118 輔助黏結層 120 輔助板 140 下輥輪 142 上輥輪 98542.doc -39- 200533983 144 下 壓 力 機 146 上 壓 力 機 150 有 機 發光元件 160 保 護 膜 總 成 162 保 護 膜 總 成 164 保 護 膜 總 成 166 保 護 膜 總 成 98542.doc -40-108af Drain voltage line 108b Second gate electrode 108c Second drain electrode 109 Driving transistor 110 Cathode 110f Cathode 112 Cathode 112? Bonding material 113 Synthetic buffer layer 113f Synthetic buffer layer 113a Organic insulating layer 113b Inorganic insulating particles 114 Protective layer 115 Protection Layer 115a first protective portion 115af photocurable resin 115b second protective portion 115c inorganic protective portion 115d organic protective portion 116 attachable-detachable layer 118 auxiliary bonding layer 120 auxiliary plate 140 lower roller 142 upper roller 98542.doc- 39- 200533983 144 Down press 146 Up press 150 Organic light emitting element 160 Protective film assembly 162 Protective film assembly 164 Protective film assembly 166 Protective film assembly 98542.doc -40-

Claims (1)

200533983 十、申請專利範圍·· 1 · 一種平面顯示裝置,其包括: 一主板; -電極之第二電極,及—位於該第::對應於該第 間用以基於—在該第_+ 电極與弟二電極之 隹豕弟電極與第二電極 有機發光層之電流產生-光的有機發光層=穿過該 元件形成於該主 板上; * 3 ,該有機發光 一位於該有機發光元件上以 護層;及 機發光元件之保 保護層上之可糾^ 、 9上之了附加·可分離層。 •根據❺求項k平面顯示裝置 之黏結性依據—輕昭 八μ可附加-可分離層 變。 亥可附加-可分離層内的光而改 3. 根據π月求項2之平面顯示裝置, 包括一光阻劑。 ,、T W亥可附加-可分離層 4. 根據請求項1之 十面顯不裝置,苴中兮 之黏結性依據該可附Λ叮γ τ 5亥可附加-可分離層 I付加·可分离鱼&amp;夕、、w 5. 根據請求項4之 9 /皿度而改變。 十面顯不裝置,苴中兮 m。磾0日、—聚酯、一聚乙;) %軋樹脂、一合成橡膠或一熱塑,1 包括-異氰酸黯、—醋酸…:中4可附加-可分離層 醇、一丙烯酸酯、一 / 、―曰、—聚酯、一聚乙弗 橡膠。 6 ·根據請求項1之 、 平面顯示裝置,豆中兮#“ 於該有機發光元 — /、中该保護層包括一&lt; 上之弟—保護部分及—位於該第一名 98542.doc 200533983 護部分上之第二保護部分。 7 ·根據請求Jg &amp; 員6之平面顯示裝置,其中該第一 括-有機材料,且該第二保護部分包括―::護部分包 無機材料或其一混合物。 七材料、一 根據明求項7之平面顯示裝置’其中該有機材 可光固化槲心士、 喊材料包括一 匕树月曰或一可熱固化樹脂。 9. 根據請求項!之平面顯示裝置,其進 有機發光元件與該保護層之間的黏結層,位於該 與該有機發光元件結合。 使该保護層 10. 根據請求項9之平面顯示裝置,其 光固化樹脂或一熱可固化樹脂。 “。層包括一可 11· 一種平面顯示裝置,其包括·· 一主板; 一有機發光元件,並包括一筮千i -電極之第二、: 對應於該第 門用以其位於該第-電極與第二電極之 間用以基於一在該第一電極與第二電極* 有機發光層之電流產生_ ::牙過該 元件形成於該主板上; 彳機U層,该有機發光 :位於該有機發光元件上以保護該有機發光元件之保 墁增;及 12. 一位於該保護層上之輔 根據請求項11之平面顯示 有機發光元件與該保護層 發光元件結合的黏結層。 助板。 裝置,其進一步包括一位於該 之間用於使該保護層與該有機 98542.doc 200533983 1 3 ·根據請求項1 1之平面顯 囬硝不叙置,其進一步包括一位 輔助板與該保護層之間用 …X 门用於使该保護層與該輔助 的辅助黏結層。 攸…口 14. 一種平面顯示裝置,其包括: 一主板; 一有機發光元件,其肖# 锋 ^l 、包括一第一電極、一對應於該第 一電極之弟二電極’及—位於該第-電極與第二電極之 門用以基⑨在忒第_電極與第二電極之間流動穿過該 有機發光層之電流産生一水^ 以 光的有機發光層,該有機發光 元件形成於該主板上; Χ -位於該有機發光元件上之合成緩衝層,其包括一有 機層及複數個位於該有機層中之無機絕緣粒子;及 一位於該合錢衝層hx㈣該有機發光元件之保護 層0 15·根據請求項14之平面顯Μ置,其中料無機絕緣粒子 …粒子均包括碳化石夕、氧化鋰、氧化鎮、氧化辦、 减石夕、/膠、氧化1呂、氧化鈦、氧氮切、氮化石夕、 氣化铭或其組合之至少之一。 16 ·根據請求項14之平面顧干驻罢 甘 — 卞卸,、肩不瓜置,其中該等無機絕緣粒子 之每一粒子之尺寸爲約5 n m至約1 〇 μ m。 1 7·根據請求項14之平面顯千狀 卸”、、員不裊置,其中該有機層包括一環 氧樹脂、-聚石夕氧樹脂、一氟化樹脂、一丙稀酸樹脂、 一氨基甲酸酉旨樹脂、一祕樹月旨、一聚乙烯樹脂、一聚 丙稀樹脂、一聚苯乙婦樹脂、一聚f基丙烯酸f㈣ 98542.doc 200533983 少之一 $ 亞氨樹脂樹脂等或其組合之至 18·根據請求項14之平面顯 ”、、貝不破置,其中該保護層包括一盔 機保護層、一有機保護声 ^ &amp;席或一具有一無機保護部分及一 有機保護部分之多層。 19.根據請求項14之平面顯 七〇 田.,、、員不衣置,其中該保護層包括一具 μ寻無機絶緣粒子之有機 _ . ^ ’钱保禮層,且該有機保護層與 该β成緩衝層係一體構成。 20· —種製造一平面顯 衣罝之方法,該方法包括: 於主板上形成一有機發朵分处 右皆'先70件,该有機發光元件具 有一弟一電極、—對應於該第— 位於該第一電極與第_ —電極,及一 極盘第-電…: 間用以基於-在該第-電 吓上/、乐一冤極之間流動宗 ^ L動牙過该有機發光層 光的有機發光層; 曰之电机產生一 於—輔助板上形成-可附加-可分離層; 於該可附加·可分離層上形成―保護層,· 使該有機發光元件與該保護層結合;及 使用該可附加-可分離層自該保護層 21.根據請求項20之方法,直 ,于、μ輔助板。 一 /、Υ猎由如下方式主 元件與該保護層結合·· 便垓有機發光 在兩個彼此以相對方向旋轉之輕輪 對應於該主板之該辅助板;及 &quot;屋該主板及 於該主板與該辅助板之間輻照一光。 22.根據請求項20之方法,1 有機發光 〒猎由如下方式使該 98542.doc 200533983 元件與該保護層結合: 1 -上壓力機及一對應於該上壓力機之下虔力機之間 擠麼该主板及對應於該主板之該辅助板;及 用一光輻照該主板與該輔助 層及該保護層。 《__附加_可分離 23. 根據請求項2〇之方法,发 上形成一黏結層。〃仏括於該有機發光元件 24. 根據請求項23之方法,爱 元件與該保護層結合··由如下方式使該有機發光 在兩個彼此以相對方向旋轉之輥輪 對應於該主板之該輔助板;&amp; ^ $主板及 用-光輻照該主板與職助板之㈣ 層及該黏結層。 附加-可为離 25·根據請求項2〇之方法,其 .^ 了附加&quot;可分離層句;^一 s 虱酸酯、一乙酸乙烯樹脂、一 匕括” 、膝缺此 日、一聚乙烯醇、一而 …、-合成橡膠、一環氧樹脂、 丙 合之至少之一。 』柯月曰或其組 26·根據請求項2〇之方法,其中藉由如 、 層: 下方式形成該保護 於該可附加-可分離層上形成—第二保護 . 於該第二保護部分上形成一第—保護部〃刀,及 27.根據請求項26之方法,其中該第—保護部:。 機材料、 材料,且該第二保護部分包括一有 I括一有機 無機材料 或其一混合物 98542.doc 200533983 28·根據請求項27之方法,复击 Τ该有機松 樹脂或一可熱固化樹脂。 料包括一可光固化 29. —種製造一平面顯示裝置 於-主板上形成-有機發:元件該::有包括: 有一第一電極、一對應於 -有機發光元件具 、邊弟_電極一 位於該第一電極與第二 弟二電極,及一 包蚀之間用 極與第二電極之間流動穿 土於一在該第一電 光的有機發光層; 戍&amp;先層之電流產生一 於一輔助板上形成一保護層;及 使該有機發光元件與該保‘層結合。 30. 根據請求項29之方法,复進— 上形成一黏結層。’包括於該有機發光元件 31·根據請求項29之方法,复推 止 ν包括在該辅助板盘該伴 護板之間形成一輔助黏結層。 保 32. —種製造一平面顯示裝置 直之方法,該方法包括: 於一主板上形成一有機發朵 Ί先件,該有機發光元件具 有一第一電極、一對應於該第_ ^ 电極之弟二電極,及一 位於該第一電極與第二電極 兒枝之間用以基於一在該第一電 極與第二電極之間流動穿讲# 士 ^ 勒牙過该有機發光層之電流産生一 光的有機發光層; 於該有機發光元件上形成_人士 〜戍合成緩衝層,該合成緩衝 層包括一有機層及複數個位於兮女丨成 位於该有機層中之無機絕緣粒 子;及 於該合成緩衝層上形成一仅1 a 、丨&amp; &amp; ^ 保達層,以保護該有機發光 98542.doc 200533983 元件 形成該合成缓 33.根據請求項32之方法,其中藉由如下方式 衝層: 使一形成該有機層之材料與該等無機絕緣粒子混合,· 加熱形成該有機層之材料與該等無機絕緣粒子之混合 物;及 於違有機發光元件上塗佈該已加熱混合物。200533983 X. Patent application scope ·· 1 · A flat display device, comprising: a main board;-a second electrode of the electrode, and-located in the section: corresponding to the section to be based on-in the section _ + The current generation of the organic light-emitting layer between the second electrode and the second electrode of the second electrode and the second electrode-organic light-emitting layer of light = formed on the main board through the element; * 3, the organic light-emitting element is located on the organic light-emitting element A protective layer; and a rectifiable layer on the protective layer of the organic light-emitting element, and an additional and detachable layer on the 9 layer. • According to the adhesiveness of the k-plane display device—Qiao Zhao, 8 μ can be added-separable layer change. It can be changed by adding light in the separable layer. 3. The flat display device according to π month term 2 includes a photoresist. , TW HAI can be attached-separable layer 4. According to the ten-face display device of claim 1, the adhesiveness of Xi Zhongxi is based on this attachable Λ 丁 γ τ 5 Hai can be attached-separable layer I added and separable Fish &amp; evening, w 5. It is changed according to the item 4-9 / dish. Ten faces are not installed, and the middle m.日 0days,-polyester, polyethylene;)% rolling resin, a synthetic rubber or a thermoplastic, 1 including-isocyanate,-acetic acid ...: in 4 can be added-separable layer alcohol, an acrylate 、 一 / 、 said,-polyester, a polyethene rubber. 6 · According to claim 1, the flat display device, Dou Zhongxi # “In the organic light-emitting element — /, the protective layer includes a &lt; brother of the first-protection part and-located in the first place 98542.doc 200533983 The second protection part on the protection part. 7 · According to the request, the flat display device of Jg &amp; member 6, wherein the first protection part is an organic material, and the second protection part includes ::: the protection part includes an inorganic material or one of the protection parts. Mixture. Seven materials, a flat display device according to claim 7, where the organic material is light-curable mistletoe, and the material includes a dagger tree or a heat-curable resin. 9. According to the request! Plane A display device having an adhesive layer between the organic light-emitting element and the protective layer, which is located in combination with the organic light-emitting element. The protective layer is provided. 10. The flat display device according to claim 9, the light-curable resin or a thermal Cured resin. ". The layer includes a flat display device, which includes a main board, an organic light emitting element, and a second i-electrode, which corresponds to the first gate and is located on the first-electrode and The second electrode is used to generate a current based on the current between the first electrode and the second electrode * organic light-emitting layer. _ :: The element is formed on the main board; 彳 U layer, the organic light-emitting: located on the organic A protection layer on the light-emitting element to protect the organic light-emitting element; and 12. an adhesive layer on the protective layer supporting the planar display of the organic light-emitting element and the protective layer light-emitting element according to claim 11. Help board. The device further comprises a protective layer and the organic layer that are located between the protective layer and the organic layer 98542.doc 200533983 1 3 according to claim 11 and further includes an auxiliary board and the protection. X-gates are used between layers to make the protective layer and the auxiliary auxiliary bonding layer. 14. A flat display device comprising: a main board; an organic light emitting element, which includes a first electrode, a second electrode corresponding to the first electrode of the first electrode, and-located in the The gate of the first-electrode and the second-electrode is based on a current flowing between the first-electrode and the second-electrode through the organic light-emitting layer to generate a water-light organic light-emitting layer. The organic light-emitting element is formed on On the main board; χ-a synthetic buffer layer on the organic light-emitting element, which includes an organic layer and a plurality of inorganic insulating particles in the organic layer; and a protection layer hx 位于 on the organic light-emitting element Layer 0 15 · According to the plan display of claim 14, the inorganic insulating particles are included ... The particles all include carbonized carbide, lithium oxide, oxidized town, oxidized office, minus stone, / glue, oxidized oxide, titanium oxide, At least one of oxy-nitrogen cut, nitrided stone cut, gasification cut, or a combination thereof. 16 · According to the plan of claim 14, the plan is to stay in the air — to remove it, not to shoulder it, wherein the size of each of the inorganic insulating particles is about 5 nm to about 10 μm. 1 7 · The flat display is unloaded in accordance with claim 14 ", and the members are not disposed, wherein the organic layer includes an epoxy resin, a polysilica resin, a fluorinated resin, an acrylic resin, and Urethane resin, a secret tree moon purpose, a polyethylene resin, a polypropylene resin, a polystyrene resin, a polyacrylic acid f㈣ 98542.doc 200533983 one less Combination of 18 · Plane display according to claim 14 ", and not broken, wherein the protective layer includes a helmet protective layer, an organic protective sound sheet, or an inorganic protective portion and an organic protective portion Of multiple layers. 19. According to claim 14, the flat display of Qitian. ,,, and other personnel, wherein the protective layer includes an organic _. ^^ Qianbaoli layer with inorganic insulating particles, and the organic protective layer and The β forms a buffer layer. 20 · —A method for manufacturing a flat display garment, the method includes: forming an organic hairpin branch on the main board, first 70 pieces, the organic light-emitting element has a brother and an electrode, —corresponding to the first— Located between the first electrode and the first electrode, and a polar plate of the -electron ...: based on-flowing between the -electrical scare /, Leyi and the innocent electrode ^ L moving through the organic light Layer of organic light-emitting layer; that is, the motor is produced on an auxiliary board to form an attachable-detachable layer; a protective layer is formed on the attachable and detachable layer, so that the organic light-emitting element and the protective layer Combining; and using the attachable-detachable layer from the protective layer 21. According to the method of claim 20, a straight, μ, and auxiliary plate. First, the hunting is combined by the main component and the protective layer in the following manner: The organic light emitting device rotates in two opposite directions to each other corresponding to the auxiliary board of the main board; and &quot; the main board and the A light is radiated between the main board and the auxiliary board. 22. According to the method of claim 20, 1 the organic light emitting hunter combines the 98542.doc 200533983 element with the protective layer by: 1-between the upper press and a god machine corresponding to the upper press Squeeze the main board and the auxiliary board corresponding to the main board; and irradiate the main board with the auxiliary layer and the protective layer with a light. << _ Addition_Releasable 23. According to the method of claim 20, a cohesive layer is formed. Included in the organic light-emitting element 24. According to the method of claim 23, the love element is combined with the protective layer ... The two wheels that rotate the organic light-emitting device in opposite directions from each other correspond to the Auxiliary board; &amp; ^ $ Main board and light-irradiate the main layer and the adhesive layer of the main board and the auxiliary board. Attachment-can be from 25. According to the method of claim 20, it has an additional &quot; separable layer sentence; ^ a lice acid ester, a vinyl acetate resin, a dagger ", the lack of this day, a Polyvinyl alcohol, at least one of-synthetic rubber, an epoxy resin, and propylene. "Ke Yueyue or its group 26. The method according to claim 20, wherein: Forming the protection on the attachable-detachable layer to form a second protection. Forming a first-protection part trowel on the second protection part, and 27. the method according to claim 26, wherein the first-protection part : Organic materials, materials, and the second protective part includes an organic and inorganic material or a mixture thereof 98542.doc 200533983 28. According to the method of claim 27, re-hit the organic pine resin or a heatable Cured resin. Materials include a photo-curable 29.-a kind of flat display device is formed on-the main board-organic hair: components the :: includes: a first electrode, a corresponding-organic light emitting device, side brother _Electrode one is on the first A second electrode and a second electrode, and an encapsulation electrode between the electrode and the second electrode flow through the soil in an organic light-emitting layer in the first electro-optic; the current of the first layer is generated in an auxiliary plate A protective layer is formed on top; and the organic light-emitting element is combined with the protective layer. 30. According to the method of claim 29, the method is repeated—forming an adhesive layer on top of the organic light-emitting element 31. According to the request 29 The method includes repeatedly forming an auxiliary adhesive layer between the auxiliary plate and the companion board. 32. A method for manufacturing a flat display device, the method includes: forming an organic hair on a main board; In the prior art, the organic light-emitting element has a first electrode, a second electrode corresponding to the first electrode, and a second electrode located between the first electrode and the second electrode to be based on a Flow through between the first electrode and the second electrode # 士 ^ The current passing through the organic light-emitting layer generates a light organic light-emitting layer; a synthetic buffer layer is formed on the organic light-emitting element, and the synthetic buffer layerThe layer includes an organic layer and a plurality of inorganic insulating particles located in the organic layer; and forming a 1a, &amp; &amp; ^ Baoda layer on the synthetic buffer layer to protect the organic Luminescence 98542.doc 200533983 The method for forming the composition is 33. The method according to claim 32, wherein the layer is punched by: mixing a material forming the organic layer with the inorganic insulating particles, and heating to form the organic layer A mixture of a material and the inorganic insulating particles; and coating the heated mixture on the organic light emitting element. 98542.doc98542.doc
TW094100271A 2004-02-12 2005-01-05 Flat display device and method of manufacturing same TWI388895B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020040009302A KR101007722B1 (en) 2004-02-12 2004-02-12 Flat Panel Display and Manufacturing Method
KR1020040009308A KR100976978B1 (en) 2004-02-12 2004-02-12 Flat Panel Display and Manufacturing Method

Publications (2)

Publication Number Publication Date
TW200533983A true TW200533983A (en) 2005-10-16
TWI388895B TWI388895B (en) 2013-03-11

Family

ID=34863609

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094100271A TWI388895B (en) 2004-02-12 2005-01-05 Flat display device and method of manufacturing same

Country Status (2)

Country Link
TW (1) TWI388895B (en)
WO (1) WO2005076756A2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7863601B2 (en) 2005-10-20 2011-01-04 Samsung Mobile Display Co., Ltd. Organic light emitting display, method of fabricating the same, and mobile display including the organic light emitting display
CN110752312A (en) * 2019-10-30 2020-02-04 京东方科技集团股份有限公司 A display panel, its manufacturing method and display device
TWI761881B (en) * 2009-05-02 2022-04-21 日商半導體能源研究所股份有限公司 Electronic book

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100889625B1 (en) 2007-07-19 2009-03-20 삼성모바일디스플레이주식회사 Bonding method and manufacturing method of organic light emitting display device using the same
WO2021119969A1 (en) * 2019-12-17 2021-06-24 浙江精一新材料科技有限公司 Suspended particle light valve having protection layer

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6992439B2 (en) * 2001-02-22 2006-01-31 Semiconductor Energy Laboratory Co., Ltd. Display device with sealing structure for protecting organic light emitting element
KR100834342B1 (en) * 2001-12-29 2008-06-02 엘지디스플레이 주식회사 Active matrix organic electroluminescent device and manufacturing method thereof
JP4071652B2 (en) * 2002-03-04 2008-04-02 株式会社 日立ディスプレイズ Organic EL light emitting display

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7863601B2 (en) 2005-10-20 2011-01-04 Samsung Mobile Display Co., Ltd. Organic light emitting display, method of fabricating the same, and mobile display including the organic light emitting display
TWI761881B (en) * 2009-05-02 2022-04-21 日商半導體能源研究所股份有限公司 Electronic book
US11513562B2 (en) 2009-05-02 2022-11-29 Semiconductor Energy Laboratory Co., Ltd. Electronic book
US11803213B2 (en) 2009-05-02 2023-10-31 Semiconductor Energy Laboratory Co., Ltd. Electronic book
TWI835106B (en) * 2009-05-02 2024-03-11 日商半導體能源研究所股份有限公司 Electronic book
US12228971B2 (en) 2009-05-02 2025-02-18 Semiconductor Energy Laboratory Co., Ltd. Electronic book
CN110752312A (en) * 2019-10-30 2020-02-04 京东方科技集团股份有限公司 A display panel, its manufacturing method and display device
US11581509B2 (en) 2019-10-30 2023-02-14 Boe Technology Group Co., Ltd. Display panel including fluoro-polymeric layer

Also Published As

Publication number Publication date
WO2005076756A2 (en) 2005-08-25
WO2005076756A3 (en) 2006-08-31
TWI388895B (en) 2013-03-11

Similar Documents

Publication Publication Date Title
JP7635351B2 (en) Display device
KR102334815B1 (en) Light-emitting device and peeling method
CN103426904B (en) A kind of flexible organic light emitting diode display and preparation method thereof
CN103872070B (en) Organic light emitting diode display device having built-in touch panel and method of manufacturing same
TWI441120B (en) Flexible display
TWI266558B (en) Image display apparatus and process for its production
TWI375193B (en)
JP6336569B2 (en) ORGANIC LIGHT-EMITTING ELEMENT AND MANUFACTURING METHOD
WO2016041280A1 (en) Organic electroluminescent device and manufacturing method therefor, and display apparatus
US20100109519A1 (en) Organic electroluminescence device
JP2011248072A (en) Method of manufacturing image display device
TW200924550A (en) Organic electro luminescence apparatus and manufacturing method thereof
CN103794628A (en) Organic light emitting display device and method of fabricating the same
KR20140088335A (en) Organic light emitting display device and manufacturing method thereof
CN206758438U (en) Display device
TW201242414A (en) Planate light emitting device
TW201204172A (en) Electro-optical device
KR20090128301A (en) Organic light emitting diode display device
TW201013922A (en) Display device and manufacturing method of display device
KR20130117112A (en) Method of fabricating organic light emitting device
US7312569B2 (en) Flat panel display apparatus
WO2017166330A1 (en) Graphene liquid crystal display apparatus, graphene light-emitting element and manufacturing method thereof
TW201134290A (en) System for displaying images
KR102000152B1 (en) Conducting material, method of fabricating electrode, and display device
KR20100112383A (en) Flexible display substrate

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees