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TW200512808A - Method of manufacturing electrothermal film - Google Patents

Method of manufacturing electrothermal film

Info

Publication number
TW200512808A
TW200512808A TW092126937A TW92126937A TW200512808A TW 200512808 A TW200512808 A TW 200512808A TW 092126937 A TW092126937 A TW 092126937A TW 92126937 A TW92126937 A TW 92126937A TW 200512808 A TW200512808 A TW 200512808A
Authority
TW
Taiwan
Prior art keywords
manufacturing
electrothermal film
metal layer
sputtering
layer
Prior art date
Application number
TW092126937A
Other languages
Chinese (zh)
Other versions
TWI232501B (en
Inventor
Cheng-Tao Wu
Shih-Yao Sun
Shih-Lun Lo
Chung-Yin Lin
Chin-Min Wu
Original Assignee
Helix Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Helix Technology Inc filed Critical Helix Technology Inc
Priority to TW92126937A priority Critical patent/TWI232501B/en
Publication of TW200512808A publication Critical patent/TW200512808A/en
Application granted granted Critical
Publication of TWI232501B publication Critical patent/TWI232501B/en

Links

Landscapes

  • Formation Of Insulating Films (AREA)
  • Resistance Heating (AREA)
  • Surface Heating Bodies (AREA)

Abstract

A method of manufacturing an electrothermal film is disclosed. First, an insulating substrate is applied, and a first metal layer is formed on the insulating substrate by sputtering. Then, a dielectric layer is formed on the first metal layer by sputtering. And a second metal layer is formed on the dielectric layer by sputtering. Finally, a passivation layer is formed on the second metal layer by plasma spraying or chemical vapor deposition. Wherein the manufacturing method by plasma spraying can increase the manufacturing speed of the electrothermal film and reduce the manufacturing cost of the electrothermal film. And the manufacturing method by chemical vapor deposition can apply an electrothermal film in high quality.
TW92126937A 2003-09-30 2003-09-30 Method of manufacturing electrothermal film TWI232501B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW92126937A TWI232501B (en) 2003-09-30 2003-09-30 Method of manufacturing electrothermal film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW92126937A TWI232501B (en) 2003-09-30 2003-09-30 Method of manufacturing electrothermal film

Publications (2)

Publication Number Publication Date
TW200512808A true TW200512808A (en) 2005-04-01
TWI232501B TWI232501B (en) 2005-05-11

Family

ID=36320041

Family Applications (1)

Application Number Title Priority Date Filing Date
TW92126937A TWI232501B (en) 2003-09-30 2003-09-30 Method of manufacturing electrothermal film

Country Status (1)

Country Link
TW (1) TWI232501B (en)

Also Published As

Publication number Publication date
TWI232501B (en) 2005-05-11

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees