TW200426206A - Cerium-based abrasive - Google Patents
Cerium-based abrasive Download PDFInfo
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- TW200426206A TW200426206A TW093104559A TW93104559A TW200426206A TW 200426206 A TW200426206 A TW 200426206A TW 093104559 A TW093104559 A TW 093104559A TW 93104559 A TW93104559 A TW 93104559A TW 200426206 A TW200426206 A TW 200426206A
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- Taiwan
- Prior art keywords
- weight
- rare earth
- grinding
- oxide
- ratio
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- 229910052684 Cerium Inorganic materials 0.000 title abstract description 6
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 title abstract 5
- 239000003082 abrasive agent Substances 0.000 claims abstract description 65
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 38
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 27
- 239000011737 fluorine Substances 0.000 claims abstract description 27
- 229910001404 rare earth metal oxide Inorganic materials 0.000 claims abstract description 23
- PLDDOISOJJCEMH-UHFFFAOYSA-N neodymium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Nd+3].[Nd+3] PLDDOISOJJCEMH-UHFFFAOYSA-N 0.000 claims abstract description 10
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052777 Praseodymium Inorganic materials 0.000 claims abstract description 5
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims abstract 4
- 239000000463 material Substances 0.000 claims description 36
- 229910052772 Samarium Inorganic materials 0.000 claims description 12
- 238000006243 chemical reaction Methods 0.000 claims description 12
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 12
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum oxide Inorganic materials [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 claims description 12
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 claims description 12
- 229910052768 actinide Inorganic materials 0.000 claims description 10
- 150000001255 actinides Chemical class 0.000 claims description 10
- 229910052746 lanthanum Inorganic materials 0.000 claims description 10
- 239000011148 porous material Substances 0.000 claims description 9
- 238000002441 X-ray diffraction Methods 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 7
- 239000002689 soil Substances 0.000 claims description 3
- 229910052693 Europium Inorganic materials 0.000 claims description 2
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 claims description 2
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 2
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 2
- UJMWVICAENGCRF-UHFFFAOYSA-N oxygen difluoride Chemical compound FOF UJMWVICAENGCRF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052702 rhenium Inorganic materials 0.000 claims description 2
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 claims 2
- JRVCVMZVAVVPLX-UHFFFAOYSA-N O=[Os](=O)=O Chemical compound O=[Os](=O)=O JRVCVMZVAVVPLX-UHFFFAOYSA-N 0.000 claims 1
- 235000010627 Phaseolus vulgaris Nutrition 0.000 claims 1
- 244000046052 Phaseolus vulgaris Species 0.000 claims 1
- 229910000831 Steel Inorganic materials 0.000 claims 1
- 238000003801 milling Methods 0.000 claims 1
- 239000010959 steel Substances 0.000 claims 1
- 238000005498 polishing Methods 0.000 abstract description 37
- 239000011521 glass Substances 0.000 abstract description 16
- 229910052779 Neodymium Inorganic materials 0.000 abstract 1
- WMOHXRDWCVHXGS-UHFFFAOYSA-N [La].[Ce] Chemical compound [La].[Ce] WMOHXRDWCVHXGS-UHFFFAOYSA-N 0.000 abstract 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 abstract 1
- 238000000227 grinding Methods 0.000 description 83
- 230000000052 comparative effect Effects 0.000 description 38
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 23
- -1 cerium hydrazone Chemical class 0.000 description 17
- 150000002910 rare earth metals Chemical class 0.000 description 16
- 239000002994 raw material Substances 0.000 description 15
- 239000002002 slurry Substances 0.000 description 14
- 238000005259 measurement Methods 0.000 description 12
- 238000011156 evaluation Methods 0.000 description 11
- 239000000243 solution Substances 0.000 description 11
- 230000003647 oxidation Effects 0.000 description 9
- 238000007254 oxidation reaction Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 239000002245 particle Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 208000027418 Wounds and injury Diseases 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- ZCUFMDLYAMJYST-UHFFFAOYSA-N thorium dioxide Chemical compound O=[Th]=O ZCUFMDLYAMJYST-UHFFFAOYSA-N 0.000 description 6
- 238000011160 research Methods 0.000 description 5
- 229910003452 thorium oxide Inorganic materials 0.000 description 5
- 229910017488 Cu K Inorganic materials 0.000 description 4
- 229910017541 Cu-K Inorganic materials 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 239000012141 concentrate Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000007790 scraping Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 206010052428 Wound Diseases 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 229910000420 cerium oxide Inorganic materials 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 230000006378 damage Effects 0.000 description 3
- 208000014674 injury Diseases 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 238000000638 solvent extraction Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- BYMUNNMMXKDFEZ-UHFFFAOYSA-K trifluorolanthanum Chemical compound F[La](F)F BYMUNNMMXKDFEZ-UHFFFAOYSA-K 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 2
- 229910000013 Ammonium bicarbonate Inorganic materials 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
- 241000218691 Cupressaceae Species 0.000 description 2
- 241000196324 Embryophyta Species 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 235000012538 ammonium bicarbonate Nutrition 0.000 description 2
- 239000001099 ammonium carbonate Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- RGCKGOZRHPZPFP-UHFFFAOYSA-N Alizarin Natural products C1=CC=C2C(=O)C3=C(O)C(O)=CC=C3C(=O)C2=C1 RGCKGOZRHPZPFP-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 101100136092 Drosophila melanogaster peng gene Proteins 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 239000008186 active pharmaceutical agent Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- HFVAFDPGUJEFBQ-UHFFFAOYSA-M alizarin red S Chemical compound [Na+].O=C1C2=CC=CC=C2C(=O)C2=C1C=C(S([O-])(=O)=O)C(O)=C2O HFVAFDPGUJEFBQ-UHFFFAOYSA-M 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000000739 chaotic effect Effects 0.000 description 1
- 230000002925 chemical effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 150000001875 compounds Chemical group 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 238000010908 decantation Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000004945 emulsification Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012065 filter cake Substances 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 125000001475 halogen functional group Chemical group 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 235000012054 meals Nutrition 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 229910000487 osmium oxide Inorganic materials 0.000 description 1
- JIWAALDUIFCBLV-UHFFFAOYSA-N oxoosmium Chemical compound [Os]=O JIWAALDUIFCBLV-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- UZLYXNNZYFBAQO-UHFFFAOYSA-N oxygen(2-);ytterbium(3+) Chemical compound [O-2].[O-2].[O-2].[Yb+3].[Yb+3] UZLYXNNZYFBAQO-UHFFFAOYSA-N 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000011085 pressure filtration Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 229910052704 radon Inorganic materials 0.000 description 1
- SYUHGPGVQRZVTB-UHFFFAOYSA-N radon atom Chemical compound [Rn] SYUHGPGVQRZVTB-UHFFFAOYSA-N 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000001028 reflection method Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 210000000952 spleen Anatomy 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- 210000004243 sweat Anatomy 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 238000003809 water extraction Methods 0.000 description 1
- 229910003454 ytterbium oxide Inorganic materials 0.000 description 1
- 229940075624 ytterbium oxide Drugs 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
200426206 五、發明說明(l) 【發明所屬之技術領域】 即所謂的#系研 本發明係有關於以氣化枯 A U 礼化鈽為主成分 磨材料。 【先前技術】 :系研磨材料係將豐富地含有例如以 Π,等原料粉碎、培燒、根據需要分級:i 广、,所衣以的錦系研磨材料以氧化飾(Ce02等)為主成= •j(La2G3) 4鈽以外的稀土類元素之氧化物。200426206 V. Description of the invention (l) [Technical field to which the invention belongs] The so-called # 系 研 The present invention relates to a grinding material mainly composed of gaseous UA and cerium hydrazone. [Prior technology]: The grinding materials are rich in raw materials such as Π, crushed, roasted, and graded as needed: i ,,, and the brocade-based grinding materials used are mainly oxidized (Ce02, etc.) = • j (La2G3) oxides of rare earth elements other than 4 钸.
更咼研磨速度之研磨材右 作為付至J 如特開2002-0 9 745 7號公報)=之鈽系研磨材料(參照例 然而’作為研磨材,要求 能得到儘可能平滑的研磨面。.:f ft T-優&、研磨後 低末顯不。即是,作為研磨 j迓度之间 材料。且作為能得到平滑的研有更南的研磨速度之 面上不易發生刮傷 研磨面之研磨材料,要求研磨 但是,以往含有氟的鈽系 傷發生面出發,不一定且有人f t科,在研磨速度及刮 研磨材料的需求增大的領域:有精::!能雷:如’筛系 磨等用途,需要研磨速度;高成二的表面研 』1昜不易發生的研磨材。 【發明内容】 200426206 五、發明說明(2) 本發明係為了解決以上的問題點而產生的,以提供 高的研磨速度、刮傷的發生更少的鈽系研磨材料為課題更 本發明的發明者對於鈽系研磨材料之研磨速度或到 發生作了涊真的研究討論,發現以一定的比例含有氧化 歛’飾系研磨材料的研磨速度會更加提高, 發生,這樣形成了本發明。 〗傷更不易 本發明係一種鈽系研磨材料,除了含氟以外、稀土 元素至少含有鈽(Ce)、鑭(La)、镨(pr)及鈥(_)、以:員 類氧化物為主成分,氧化鈥佔全稀土類氧化物換算重=土 (以下稱為TRE0)的重量比例(Nd2〇3/TRE〇)在〇· 〇〇1 =量%里 重量%。且所謂的TRE0指的是將對象物中所含的各稀里土)翻 元素,以稀土類氧化物換算時的重量之總合重量, 乂 析、計算對象物之組成來求得。且#對象物的組成係2 時,TRE0係通過對試料實施溶解、稀釋等前處理(根據兩σ 要),其後將全部的稀土類元素作為草酸鹽沉澱,麸: 濾、乾燥、焙燒成稀土類氧化物後,再測之、方^ 求得的。 里貝里之方法來 一例如,專利文獻1中所記載的以往的鈽系研磨材 氧化鈦佔TRE0的重量比例(以下記載為含有率)^卢、 與此相比,本發明的鈽系研磨材料中氧化鈥之含有❶^ , 低。研究討論的結果,發現TRE◦中氧化 ( 述範圍之飾系研磨材料,具有更高的研磨速度里 易赉生。因此,使用本發明的研磨材來 對象面時’與使用以往的研磨材之情形相比破 第11頁 2169-6178-PF(N2).ptd 200426206 五、發明說明(3) ΓίΓ丨内完成研磨。且可以更確實地抑制研磨所得的研磨 發ί。另外,如先前所說明的,本發明的:Ϊ 研二材料中,氧化鈦佔TRE0的重量比例 容易Λ量%5重Γ。這是因為未滿0.001重量%,則刮傷 低,磨刮傷也容易發生之故。而且,為了在及 Γίη θ 係在2重量%以下,在0.5重量%以下更 好’ Ο · 1重罝%以下則更理想。 ③八的i + ϋ t研磨材料大致係將氟碳鈽精礦或以鈽為主 ^的稀土類&酸鹽或稀土類氧化物等原料粉碎、根據需 細無機酸處理或敦化處理等的濕式處理 燒、分級(根據需要)爽制、生μ α丄々 之扃料畀#尨"來衣每的。且本發明的鈽系研磨材料 ,最係對亂碳鈽精礦、單位(monoside)精礦、中 國=精礦等的稀土類精礦,實施以下的一系 理中 處理等的處理,得到f去” ^殿處理或分別溶解 、、容、m脾斟兮、: 兀素以外的雜質減少的稀土類 合生成厂、二=,;t衣/夜),與碳酸氫銨 '氨水等的沉澱劑混 i π 5丨二Μ#备精由過濾該沉澱物來實現分離等一系列處 培燒物(例如稀土類氧化 =5物(例如稀土類碳酸鹽)或其 離精製得到的稀土類容化夜且 10重《以上,精$^ /(^製液),_2〇3/TREO通常係 飾糸研磨材料用原料(像本發明這樣的 2169-6178-PF(N2).ptd 第12頁 200426206 五、發明說明(4)As for the polishing material with a higher polishing speed, the right side is given as J. JP 2002-0 9 745 7) = = series polishing material (refer to the example, but 'as the polishing material, it is required to obtain the smoothest possible polishing surface .. : F ft T-excellent & low after polishing. That is, it is used as a material for grinding between j 迓 degrees. And it is not easy to scratch the polished surface as it can obtain a smoother surface with a more southern polishing speed. Abrasive materials are required to be polished. However, in the past, the occurrence of samarium-based wounds containing fluorine was not necessarily caused by ft. In areas where the grinding speed and the demand for scraping abrasive materials have increased: fine ::! Sieve-based grinding and other applications require grinding speed; high-grade surface grinding "1" abrasive materials that are not easy to occur. [Abstract] 200426206 V. Description of the invention (2) The present invention is produced in order to solve the above problems, The subject of the present invention is to provide a high-speed grinding material with less occurrence of scratches. The present inventors have conducted research and discussion on the grinding speed of concrete-based abrasive materials or the occurrence of them. The grinding speed of the oxidized abrasive material will be further increased, and this will form the present invention. The wound is more difficult. The present invention is a samarium-based abrasive material. In addition to fluorine, the rare earth element contains at least europium (Ce), Lanthanum (La), praseodymium (pr) and "(_)" are mainly composed of member oxides, and the weight of the oxide's equivalent to the total rare earth oxide equivalent weight = soil (hereinafter referred to as TRE0) (Nd203) / TRE〇) in 〇 · 〇〇1 =% by weight. And the so-called TRE0 refers to the total weight of the rare earth oxides in the object when converted into rare earth oxides. The total weight is obtained by decantation and calculation of the composition of the object. In the case of #object composition system 2, the TRE0 system is subject to pretreatment such as dissolution and dilution (based on the two σ requirements), and then all the rare earth elements are precipitated as oxalate. Bran: filter, dry, and roast. After the formation of rare earth oxides, it can be measured and calculated. The method of Ribéry is, for example, the weight ratio (hereinafter referred to as the content rate) of titanium oxide to TRE0 in the conventional samarium-based abrasive material described in Patent Document 1. Compared with this, the samarium-based abrasive of the present invention The oxidation of the material contains ❶ ^, which is low. As a result of research and discussion, it was found that TRE◦ medium-range oxidized decorative abrasive materials have a higher polishing speed and are easier to grow. Therefore, when using the abrasive material of the present invention to target the surface, it is the same as that of conventional abrasive materials. Compared with the situation on page 11, 2169-6178-PF (N2) .ptd 200426206 V. Description of the invention (3) Grinding is completed in ΓίΓ 丨 and the grinding hair obtained by grinding can be more surely suppressed. In addition, as explained previously In the present invention: In the second material, the weight ratio of titanium oxide to TRE0 is easily Λ amount% 5 weight Γ. This is because less than 0.001% by weight, the scratch is low, and abrasion is easy to occur. For Γίη θ to be 2% by weight or less, it is more preferable to be 0.5% by weight or less. 〇 · 1% by weight or less is more preferable. ③ The i + ϋt abrasive material is roughly a fluorocarbon ore concentrate or Rare earth-based rare earth & acid salts or rare earth oxides are pulverized, wet processing such as fine inorganic acid treatment or chemical treatment is required for burning, classification (as required), and production of μ α 丄 々之 扃 料 畀 # 尨 " 来 衣 的 的。 And The invented samarium-based abrasive materials are most commonly used for rare earth concentrates such as random carbon agglomerates, monoside concentrates, and China = concentrates. ^ Hall processing or dissolving separately, volume, m, and spleen: Rare earth synthesis plant with reduced impurities other than woodycin, II =,; t / night), mixed with precipitants such as ammonium bicarbonate, ammonia, etc. i π 5 丨 二 M # prepares a series of burned materials (such as rare earth oxidation = 5 substances (such as rare earth carbonate)) or the rare earth-based capacitors obtained by ion purification to filter the precipitate to achieve separation. And 10 times "above, refined $ ^ / (^ 制 液), _2〇3 / TREO is usually used as raw materials for 糸 grinding materials (2169-6178-PF (N2) .ptd like this invention. Page 12 200426206 5 Description of the invention (4)
NdJVTREO在一定範圍)時的溶劑萃取,最好強化敍或比鈥 更重稀土側的稀土類之減少,來得到低斂稀土 如Nd2 03 /TRE0在5重量%以下)。 j 且本發明的鈽系研磨材料,鈽、鑭、鳍及歛的稀土類 氧化物之總重量佔TRE0的比例最好在97重量%以上。处 更確實地得到高研磨速度及刮傷發生防止效果。且i 確κ地得到這些效果,該比例值更好的在9 8重量%以、、、 99重量%以上則更理想。 TRE0中各稀土類氧化物的合適含有率,若根 類氧化物分別說明,則氧化鈽佔TRE〇的重量比 (Ce02/TRE0)最好係50重量%〜9〇重量%。氧化錦係全 氧化物中最具研磨作用的物質’帛重量比例 ,、 值,原料精製步驟中需要行;二面’若超過上限 本增高,生產性會變差^進dtr故時間或成 争辟卷π看旦0/ 舌旦。 乳化飾佔TRE0的重量比例 更好係55重里Ρ85重…6〇重量%〜8〇 。 氧化鑭佔TRE0的重詈士也丨M 彳又王心 %〜45重量%。氧化鑭係全稀土類β2 3 RE〇)取好係2重量 物質,存在於以飾為主成稀分土 :箭?/㈣ 氧化物(U0F或CeLa2〇3F3t = H貝氧化物中,或者以亂 璃研磨時會慢慢地放出氣化在研磨時,特別在玻 提高研磨速度之效果。m:們具有促進化學作用、 未滿上述的下限值,則轉定上佔tre〇的重量比例若 j &疋上述化作用的效果會降低,研 第13頁 2169-6178-PF(N2).ptd 200426206 五、發明說明(5) 磨所得的研磨面反而會變成粗糙面。另一方面, 限值,則無法得到足夠的研磨 。 ° Μ舌旦a 7丨击,. ^说迷度。因此’乳化鑭佔丁RE0 =比例更们系5重㈣量%,1〇重量%〜37. 5重量% 传〇 :重1旦化曰錯·Ε0的重量比例(Pr6〇ll/TREO)較好 係0· 1重夏%〜1〇重i重量%〜8重量%則更好。 曰且鈽系研磨材料中的氟含有率最好在〇· 5重量%〜丨〇重 。若未滿下限值,則無法得到足夠的研磨速度,若超 過上限值,研磨刮傷容易發生之故。且從研磨速度及研磨 刮傷兩方面考慮,》了得到更高的效果,氣含有率更好的 係1重量%〜8重量%,2重量%~7重量%則更理想。 另外,鈽系研磨材料中所含的氟(F)、與所含的鑭 (La)及镨(PR)之間的摩爾比(F/(La + Pr))最好係〇·2〜3。若 I,值未滿,在鈽系研磨材料保管時或研磨時,特別研磨 日π谷易生成氫氧化物之故。生成氫氧化物狀態下的研磨 材有研磨速度(研磨力)低之問題。且研磨中若容易生成 鐵i氧化物,則研磨開始後的短時間内研磨速度有降低之問 通另方面’如述摩爾比超過上限值的研磨材,研磨時 氟的化學作用過強,研磨後所得的研磨面會有變粗糙的問 題。 且,藉由使用Cu-Κ α線或Cu-Κ α!線作為χ射線源之叉射 線繞射法’測量X射線峰強度時,在2 (9 (繞射 角)=2Odeg〜3 0deg的範圍出現、且稀土類氟氧化物之X射線 峰強度中最強的X射線峰強度,與氧化鈽之X射線峰強度中 最強的X射線峰強度之強度比(稀土類氟氧化物/氧化鈽)係NdJVTREO solvent extraction at a certain range), it is best to strengthen the reduction of rare earths on the side of the rare earth or heavier than “, to obtain low-concentration rare earths such as Nd 2 03 / TRE0 below 5% by weight). j In the samarium-based abrasive material of the present invention, the ratio of the total weight of samarium, lanthanum, fins, and condensed rare earth oxides to TRE0 is preferably 97% by weight or more. It is possible to more reliably obtain a high polishing rate and a scratch prevention effect. In addition, i does obtain these effects, and the ratio value is more preferably 98% by weight or more, and 99% by weight or more. The appropriate content of each rare earth oxide in TRE0. If the root oxide is specified separately, the weight ratio (Ce02 / TRE0) of hafnium oxide to TRE0 is preferably 50% to 90% by weight. Oxidation bromide is the most abrasive substance in the total oxides' weight ratio, value, and needs to be carried out in the raw material refining step; on the other hand, if it exceeds the upper limit and the cost increases, the productivity will deteriorate ^ dtr time or contention Take a look at π to see 0 / tongue. The weight ratio of the emulsified decoration to TRE0 is more preferably 55 weights and 85 weights ... 60% by weight to 80%. Lanthanum oxide accounts for the heavy weight of TRE0, and the weight is also king heart% ~ 45% by weight. Lanthanum oxide series rare earth β2 3 RE〇) Take a good 2 weight of the substance, which exists in the rare earth that is mainly decorated with ornaments: arrows? / ㈣ Oxide (U0F or CeLa2 03F3t = H shell oxide, or it will slowly release gasification when grinding with chaotic glass. During grinding, especially in glass, it has the effect of increasing the grinding speed. M: They have a chemical effect. If the above lower limit is exceeded, the weight ratio of the conversion to tre0 will be reduced if j & 化 the effect of the above-mentioned effects will be reduced, research on page 13 2169-6178-PF (N2) .ptd 200426206 V. Invention Note (5) The ground surface obtained by grinding will instead become a rough surface. On the other hand, the limit value cannot be used to achieve sufficient grinding. ° M tongue Dan a 7 丨 hit, ^ said mystique. Therefore 'Emulsified lanthanum accounted for Ding RE0 = Proportion is 5% by weight, 10% by weight to 37.5% by weight. 0: 1% by weight. The weight ratio of Pr0 (Pr60ll / TREO) is preferably 0.1%. Xia% to 10% by weight and 8% by weight are more preferred. The fluorine content in the actinide-based abrasive material is preferably 0.5% by weight to 丨 0%. If the lower limit is not reached, it cannot be achieved. To obtain a sufficient grinding speed, if it exceeds the upper limit, grinding scratches easily occur. And from the two aspects of grinding speed and grinding scratches, " A higher effect is obtained, and the gas content is more preferably 1% to 8% by weight, and more preferably 2% to 7% by weight. In addition, the fluorine (F) contained in the actinide-based abrasive material and the content of The molar ratio (F / (La + Pr)) between lanthanum (La) and praseodymium (PR) is preferably 0.2 to 3. If I is less than the value, when the samarium-based abrasive is stored or ground In particular, the π valley is liable to generate hydroxides on the grinding day. The grinding material in the state of hydroxide generation has the problem of low grinding speed (grinding force). And if iron i oxide is easily formed during grinding, the There is another problem that the polishing rate is reduced in a short time. For example, if the molar ratio exceeds the upper limit, the chemical action of fluorine during polishing is too strong, and the polishing surface obtained after polishing may become rough. When the X-ray peak intensity is measured by a fork-ray diffraction method using Cu-K α line or Cu-K α! Line as a X-ray source, it appears in a range of 2 (9 (diffraction angle) = 2Odeg to 3 0deg, And the strongest X-ray peak intensity of the X-ray peak intensities of rare earth fluorine oxides and the strongest X-ray peak intensity of the X-ray peak intensities of thorium oxide The line intensity ratio of the peak intensity (rare earth fluoride oxide / cerium oxide) -based
II 2169-6l78-PF(N2).ptd 第14頁 200426206 五、發明說明(6) 0 · 0 5〜0 · 6的飾系研磨好永| 土類氟氧化物(LnOF),‘以::::f外’這裡所謂的稀 主成分的立方晶稀土類^^具f的說1指的是以錦為 度。ux0y通常i 5<y/x=化物αηΛ)之繞射X射線峰強II 2169-6l78-PF (N2) .ptd Page 14 200426206 V. Description of the invention (6) 0 · 0 5 ~ 0 · 6 The decorative system is ground well and permanently | Earth Fluorine Oxide (LnOF), 'to :: :: f 外 'Here the so-called rare earth component of the cubic crystal rare earth ^^ with f said 1 refers to the degree of brocade. ux0y is usually the diffraction X-ray peak intensity of i 5 < y / x = compound αηΛ)
〜h.a75、或Ce: C h 大的研二!:η Λ 2〇3/m〇 小而 叫爲5〇1.75、或CeQ7sNd ”被 4 為 e_^~ H.a75, or Ce: C h big Kenji! : Η Λ 2〇3 / m〇 is small and called 5〇1.75, or CeQ7sNd "is 4 as e_ ^
糸仆人私n °.75 a°.25〇u75)。廷時,鑑定為Ce-Nd-O 县钚注斜^ 物。發現上述強度比未滿下限值時,容 上p? #目|研ί造成不良影響的橘皮孔洞。1強度比若超過 上限值則研磨速度會下降 卜",。.2〜。.4“:L 刖度比更好的係〇. 於續射ί繞射測量係將上述這樣特性的χ射線入射 檢;::卜+ f研磨材料),沿著以試料為中心的圓周邊掃描 或半導體檢出器)、邊測量繞射的χ射線之 ^:解:斤所得的χ射線繞射強度曲線,來進行物質的鑑 二:接::作為Χ射線源’使用Cu-K α線或Cu-Κ αι線之情 I的角(2 θ)在20deg〜30deg的稀土類氟氧化物,其最 ^的=射線峰強度通常出現在26.5deg± 〇. 5deg的範圍 内’同範圍2氧化鈽(Ce02)最大之x射線峰強度在28. ldeg -1 · 0 d e g的範圍出現。 ^ ^述X射線繞射測量法測量所得的繞射X射線峰強度 干,右在2 0(繞射角)=24.2deg±〇5deg的範圍内出現最 第15頁 2169-6178-PF(N2).ptd 五、發明說明(7) 大峰,其稀土類氟化物的X射線峰強度,與氧化鈽(Ce%)之 X射線峰強度中最強的x射線峰強度之強度比(LnF3/Ce〇2)最 好未滿0. 04。該強度在〇· 〇4以上的情形,則研磨刮傷容易 ,生。且這裡所指的稀土類氟化物(LnFs )可以列舉出例如 氟化鑭(LaF3)。且繞射角(2 θ )在20deg〜30deg的範圍,稀 土類氟化物之最大峰並非在24· 2 ± 〇· 5deg的範圍、而是在 接近氧化鈽的最大峰之位置出現,但由於受到氧化鈽的最 大峰之衫響,對於稀土類氟化物最大修,有難以正確判斷 其強度之情形。因此本發明中,對於稀土類氟化物,使用 24,2deg± 〇.5deg的範圍之最大奪。 X射線繞射測量所使用的靶,考慮以銅(Cu)為代表, 鉬(Mo)、鐵(Fe)、鈷(co)、鎢(w)、銀(Ag)等的使用,但 最大的峰強度、進行更正確的測量之點出發, 束合適。 飾系研磨材料的細孔容積較好的係 〇土 0 0 2cmvg 〜〇· lcmVg,〇· 0 0 5 cm3/g〜0. 〇8cra3/g 則更理相。 =下限值時,研磨速度雖大’但研磨刮傷容易發生'且 =過上限值,研磨速度太低,#法得収夠的研磨速度 以上這樣,本發明之鈽系研磨材料,盆 高、研磨刮傷的發生更少。因此 八研磨速度更 Θ斤, 此 右使用這材料夾研磨祜 璃寻的研磨對象面,與使用以往的鈽系研磨材 比,可以用更短的時間完成研磨,"月/ 磨面上刮傷的發t。 总且可以更確實地抑制研 五、發明說明(8) 【實施方式】 以說明了對於本發明的鈽系研磨材料之最佳實施形態加 差1實施形熊 氧化作)為1純度的氧化鈽(Ce〇2)、氧化鑭(La2〇3)、 的各稀土 #4小4之條件下鍛燒而成之物。所準備 白ϋ各稀土類氧化物中的接I 片 未滿〇.1%。且,“ i卜的雜質之含有率 的對象稀土類氧化物之氧;匕/勿中其、純度(TRE0中 所^1^接〇_^重5比例)均在99.99重量%以上, Γ=ί氧化物中,除氧化欽以外的各稀土類氧化 重旦厂。且乳化鈥之重量比例(Nd2 03 /TRE0)未滿0.001 、·*· ΐ L +槪氣之合有率係0 ·0 01重量%未滿。適當地稱量 形離中,為了坪:了mg的混合原料。這樣本實施 二丄I: 鈽、氧化鑭、氧化鐯、氧化鈥 耸:3拉i1古率不同的各種錦系研磨材料之研磨性能 A肩+:中:1 :純度的稀土類氧化物來調製原才斗。-般認 類氧化物之含有率,與所製造的研磨材 Γ 二中At稀土類氧化物之重量比例相同,故省略了其 表不—(參知、表1)。且比較紹的原料中未混合氧化敛。 /0(4種總&)未達到1〇〇%,這意味著原料中混合有氧化 彭。 200426206糸 Servants private n ° .75 a ° .25〇75). At that time, it was identified as Ce-Nd-O county injection oblique object. When the above-mentioned intensity ratio is found to be less than the lower limit value, Rongshang p? # 目 | 研 ί has caused orange peel holes with adverse effects. 1 If the intensity ratio exceeds the upper limit, the grinding speed will decrease. .2~. .4 ": The system with a better L ratio. Yu Xia Ding's diffraction measurement system uses the x-rays with the above characteristics to check the incidence; :: bu + f abrasive material), along the periphery of the circle centered on the sample Scanning or semiconductor detector), measuring diffracted x-rays ^: solution: χ-ray diffraction intensity curve obtained by jin, for material identification II: then: using Cu-K α as X-ray source ' The angle (2 θ) of the line I or Cu-K αι line feeling I is 20deg ~ 30deg rare earth fluoride oxide, its maximum = the ray peak intensity usually appears in the range of 26.5deg ± 0.5deg. 'Same range 2 The maximum x-ray peak intensity of thorium oxide (Ce02) appears in the range of 28.1 deg · 0 deg. ^ ^ The diffraction X-ray peak intensity measured by the X-ray diffraction measurement method is dry, and the right is at 20 ( Diffraction angle) = 24.2deg ± 〇5deg appears most in the range of page 15 2169-6178-PF (N2) .ptd V. Description of the invention (7) Large peak, the intensity of X-ray peak of rare earth fluoride, and oxidation The intensity ratio (LnF3 / Ce〇2) of the strongest X-ray peak intensity of the X-ray peak intensity of 钸 (Ce%) is preferably less than 0.04. When the intensity is above 0.004, It is easy to grind and scratch. The rare earth fluorides (LnFs) referred to here include, for example, lanthanum fluoride (LaF3). The diffraction angle (2 θ) is in the range of 20deg to 30deg. The largest peak does not appear in the range of 24 · 2 ± 0. 5deg, but appears at a position close to the largest peak of thorium oxide. However, due to the ringing of the largest peak of thorium oxide, it is difficult to accurately determine the rare earth fluoride. Strength. Therefore, in the present invention, for the rare earth fluoride, the maximum range of 24,2 deg ± 0.5 deg. Is used. The target used for X-ray diffraction measurement is considered to be represented by copper (Cu), molybdenum (Cu) Mo), iron (Fe), cobalt (co), tungsten (w), silver (Ag), etc., but the largest peak intensity, from the point of more accurate measurement, the beam is suitable. The system with better pore volume 〇 soil 0 0 2cmvg ~ 〇 · lcmVg, 〇 0 0 5 cm3 / g ~ 0. 〇8cra3 / g is more rational. At the lower limit, the grinding speed is large, but the grinding scraping Injuries are easy to occur 'and = the upper limit value is exceeded, the grinding speed is too low, the # method can get enough grinding speed As described above, the rubbing-based abrasive material of the present invention has less pot height and less grinding scratches. Therefore, the eight grinding speed is more Θ pounds. This material is used to grind the surface of the object to be polished, which is different from the use of conventional rubbing materials. Compared with the abrasive material, it can finish grinding in a shorter period of time. "Month / Scratched hair on the abrasive surface. Totally and more reliably suppress the research. 5. Description of the invention (8) [Embodiment] In order to explain the The best embodiment of the samarium-based abrasive material of the present invention has a difference of 1 degree and a shape-bearing oxidation condition) is a purity of cerium oxide (CeO2), lanthanum oxide (La2O3), and each rare earth # 4 小 4 Burnt down. In the prepared rare earth oxides, the number of contact pieces in the rare earth oxides was less than 0.1%. In addition, the oxygen content of the target rare earth oxides, the content of impurities, and the purity (the ratio of ^ 1 ^ to 0_ ^ weight 5 in TRE0) are all 99.99% by weight or more, Γ = Among the oxides, all rare earth oxides other than oxides are oxidized in heavy denier plants. The weight ratio of emulsification (Nd2 03 / TRE0) is less than 0.001, and the combined rate of L + radon is 0 · 0 The weight is less than 01% by weight. Properly weigh the mixed raw materials in order to ping: mg of mixed raw materials. In this way, I: osmium, lanthanum oxide, ytterbium oxide, oxidation — 3 different types of different ancient rates Abrasive performance of brocade grinding materials A shoulder +: Medium: 1: Purity of rare earth oxides to modulate the original talents.-The general recognition of the content of the oxides, and the At rare earth oxidation of the manufactured abrasive material Γ Erzhong The weight ratio of the materials is the same, so the description is omitted— (refer to Table 1, Table 1). And the comparative raw materials are not mixed with oxidative convergence. / 0 (4 total &) does not reach 100%, which means The raw materials are mixed with Peng oxide.
將所得的原料(稀土類氧化物之混合物)與該原料重旦 的2倍重量之純水混合,用研磨機(at tr i tor)進行濕式於里 碎來得到漿體。研磨機中,使用直徑5mm的不銹鋼球作S 粉碎媒體。且粉碎時間為8小時。 接著,對所得的漿體添加1 〇 %的氫氟酸,調製漿體中 的氟成分之重量比(F/(TRE0 + F)),將該漿體攪拌3〇分鐘 (說化處理)。且除了實施例1 2、1 3以外的各實施例與除了 比較例5、6之外的各比較例中,調製各漿體使氟成分之重 昼比(F/(TRE0 + F))為6%。且分別調製氟成分之重量比,使 之在實施例1 2中為1 · 5%、實施例1 3中為1 0%、且比較例6中 為1 5 %。在比較例5中未實施該氟化處理。 其後,使固體成分沉澱,取出上層澄清液,添加純水 進行再成漿(repulp)洗淨,將洗淨後的漿體用壓濾法過 濾。且將所得的濾餅在140 t乾燥48小時。另外,將所得 的乾燥餅用輕式破碎機解碎,將所得的解碎品在9 5 〇。〇焙 燒1 8小時。用樣品磨機粉碎該焙燒品,將所得的粉碎品用 葉輪分級機(設定分級點於3 # m)分級,得到鈽系研磨材 料。所得的鈽系研磨材料之TRE0中的各稀土類氧化物的重 量比例如表1所示。 I濃度之測量 對於各實施例及比較例所得的鈽系研磨材料,測量其 氟含有率。氟濃度之測量,除了比較例5所得的研磨材 外’氟分析採用了驗炫融•溫水萃取·氟離子電極法。且The obtained raw material (a mixture of rare earth oxides) was mixed with pure water having a weight twice as much as that of the raw material, and wet-pulverized in a grinder (at tr i tor) to obtain a slurry. In the grinder, a stainless steel ball with a diameter of 5 mm was used as the S pulverizing medium. The crushing time was 8 hours. Next, 10% hydrofluoric acid was added to the obtained slurry to prepare a weight ratio (F / (TRE0 + F)) of the fluorine component in the slurry, and the slurry was stirred for 30 minutes (chemical treatment). In each of the examples other than Examples 1 and 2, and each of the comparative examples other than Comparative Examples 5 and 6, each slurry was prepared so that the weight-to-day ratio (F / (TRE0 + F)) of the fluorine component was 6%. In addition, the weight ratio of the fluorine component was adjusted to be 1.5% in Example 12, 10% in Example 13, and 15% in Comparative Example 6, respectively. This fluorination treatment was not performed in Comparative Example 5. Thereafter, the solid content was precipitated, the upper clear solution was taken out, pure water was added and repulp was washed, and the washed slurry was filtered by a pressure filtration method. And the obtained filter cake was dried at 140 t for 48 hours. The obtained dried cake was pulverized with a light crusher, and the obtained pulverized product was 950. 〇Baking for 18 hours. This baked product was pulverized with a sample mill, and the obtained pulverized product was classified with an impeller classifier (set a classification point at 3 # m) to obtain a milled-type ground material. Table 1 shows the weight ratio of each rare earth oxide in TRE0 of the obtained samarium-based abrasive material. Measurement of I Concentration The fluorine-containing content of the actinide-based abrasives obtained in each of Examples and Comparative Examples was measured. For the measurement of the fluorine concentration, in addition to the abrasive material obtained in Comparative Example 5, the fluorine analysis was performed by using the method of ionization, warm water extraction, and fluoride ion electrode. And
200426206 五、發明說明(1〇) 所得的研磨材之敦濃度測量,使用了熱加水分解 ^·吼機、茜素配位劑吸光光度法。測量結果如各表所 研磨 使用 試驗,實 價。評價 首先 製固形成 體’藉由 6 5_ "勺 各實施例及比較例所得的鈽系研磨材料進行研磨 施研磨速度、所得研磨面之刮傷評價及洗淨性評 結果如各表所示。 ϋ 平面板用 機係一邊 片將研磨 墊片對研 驗機的旋 之比例。 ’將粉末狀的飾系研磨材料粉末與純水混合,調 刀/辰度1 5重2: %之研磨材漿體。使用該研磨材漿^ 研磨試驗機(HSP-2ί型、台東精機(株)製)來研磨 平面板用玻璃的表面。且研磨終了後,用純水將 玻璃洗淨,並在無塵狀態下乾燥。且該研磨試驗 將研磨材漿體供給於研磨對象面,一邊用研磨塾 對象面研磨,研磨墊片使用聚氨酯製之物。研磨 磨面的壓力係5· 9 kPa(60g/cm2)。且設定研磨試 轉速度為1 0 0 rpm。研磨材漿體的供給量係5升/分 g磨速唐夕iyjg 曰 測置研磨前後的玻璃重量,求得因研磨引起的玻璃重 里之減少量’根據該數值來求得研磨值。本研磨試驗中, 使用該研磨值來評價研磨速度。且這裡,以使用比較例3 所得的研磨材料進行研磨時的研磨值為基準(1〇〇)。 第19頁 2169-6178-PF(N2).ptd 200426206 五、發明說明(π) 研磨匈傷之評價 且研磨終了後,對於用純水洗淨、在無塵狀態下 後的研磨面進行刮傷評價。刮傷之評價使用30萬勒克^二 鹵燈作為光源,用反射法觀察破璃表面,將較大的月 微細到傷之數目點數化,以滿點丨〇 〇點之減點方式來 價。該刮傷評價中以硬碟用或LCD用的玻璃基板之精細 磨所要求的研磨精度為判斷基準。具體的,在表丨〜表4 中,「◎」代表98點以上(非常適用於肋用·LC])用玻璃美 板之精細研磨),「〇」代表98點未滿95點以上(適用於^ 用玻璃基板之精細研磨),「△」代表95點未滿9〇 二上(可能使用於HD用.LCD用玻璃基板之精細研磨), 精細研^表9〇點未滿(不能用於仙用,用玻璃基板之 选淨性之評僧 且對於研磨材之洗淨性淮彳 ^ 先將洗淨·乾烨後& #與 洗淨性評價中,首 漿體中,-旦31 顯微鏡觀察用載片《潰於研磨材 器内,進行5—分鐘0立C乾燥/#後浸潰於裝有純水的容 中取出载片玻璃,用。姑曰卜波洗淨、。超音波洗淨後,從容器 載片玻璃。其後用光!^ 1 f行f水洗淨,得到觀察對象之 研磨材粒子之殘存旦予,彳政鏡觀察載片破螭表面上殘存的 中,「〇」代㈣㈣淨性。具體的,表1〜表4 又嬈$到研磨材粒子之殘存,非常適用於 2169-6178-PF(N2).ptd 第20頁 200426206200426206 V. Description of the invention (10) The measurement of the densities of the obtained abrasives was performed using a thermal hydrolysing method ^ · Hou machine, alizarin complexing agent photometric method. The measurement results are as shown in the tables. The evaluation first solidifies the formed body. The results are shown in the following tables using the lapping speed of the sacrificial abrasive materials obtained in each of the Examples and Comparative Examples. . ϋ The ratio of the rotation of the grinding pad to the testing machine on one side of the flat panel machine. 'Mix the powdery decorative abrasive powder with pure water and adjust the knife / chendo 15 weight 2: 2% abrasive slurry. This abrasive slurry was used to grind the surface of the glass for flat panels using a polishing tester (HSP-2ί type, manufactured by Taito Seiki Co., Ltd.). After the grinding is completed, the glass is washed with pure water and dried in a dust-free state. In this polishing test, a polishing material slurry was supplied to the surface to be polished, and the surface was polished with a polishing pad. The polishing pad was made of polyurethane. Grinding The pressure on the ground surface is 5.9 kPa (60 g / cm2). And set the grinding trial speed to 100 rpm. The supply amount of the abrasive slurry was 5 liters / minute. G Milling speed Tang Xi iyjg Measure the weight of the glass before and after grinding, and determine the reduction in glass weight due to grinding 'to obtain the grinding value based on this value. In this polishing test, the polishing value was used to evaluate the polishing rate. In addition, here, the polishing value at the time of polishing using the polishing material obtained in Comparative Example 3 was used as a reference (100). Page 19 2169-6178-PF (N2) .ptd 200426206 V. Description of the invention (π) After the evaluation of grinding Hungarian wound and the grinding is finished, the polished surface after washing with pure water and in a dust-free state is scratched. Evaluation. The evaluation of scratches uses 300,000 lux ^ dihalogen lamps as the light source, observes the surface of the broken glass by the reflection method, and counts the number of points from the larger month to the number of injuries, which is reduced by the full point price. In this scratch evaluation, the polishing accuracy required for fine polishing of a glass substrate for a hard disk or an LCD is used as a judgment criterion. Specifically, in Tables 丨 to 4, "◎" represents more than 98 points (very suitable for ribs and LC) fine polishing of glass slabs, and "〇" represents 98 points and less than 95 points (applicable) ^ Using glass substrate for fine grinding), "△" represents 95 points less than 902 (may be used for HD. LCD glass substrate for fine grinding), fine research ^ Table 90 points are not full (cannot be used For Xianxian, use the evaluation of the cleanliness of the glass substrate and the detergency of the abrasive material. ^ Wash and dry first &# and detergency evaluation, in the first slurry,- 31 Slide for microscope observation "Crush in a grinder, dry for 5 minutes at 0 ° C / #, and then immerse it in a container filled with pure water to take out the slide glass. Use it for washing. After ultrasonic cleaning, slide the glass from the container. Then wash it with light! ^ 1 f line f water to obtain the residual particles of the abrasive material of the observation object. Observe the residual on the broken surface of the slide In the table, “〇” is used to represent the cleanliness. Specifically, Tables 1 to 4 are used to describe the residue of the abrasive particles, which is very suitable for 2169-6178-PF (N2) .ptd. 20 200 426 206
2169-6178-PF(N2).ptd 200426206 五、發明說明(13) [表1] 鈽系研磨材料 硏磨性能 ※[八 ^2)treo TREO換算重量中各稀土類氧化物之 研磨 刮傷 性 有率 換算重量 f晕腳 速度 評價 (wt%) (wt%) Ce〇2 La2〇3 Pr6〇ll Nd2〇3 4種總合 比較例1 5.3 94.5 65.0 31.0 4.0 <0.001 100 128 Δ Δ I施例1 5.2 94.5 65.0 30.99 4.0 0.01 100 152 ◎ 0 富施例2 5.2 94.7 65.0 30.9 4.0 0.1 100 145 ◎ 0 冨施例3 5.2 94.5 65.0 30.5 4.0 0.5 100 138 (〇) 0 冨施例4 5.2 94.5 65.0 30.0 4.0 1.0 100 132 @ 0 冒施例5 5.2 94.3 65.0 28.0 4.0 3.0 100 121 0 0 比較例2 5.1 94.4 65.0 25.0 4.0 6.0 100 103 Δ Δ 比較例3 4.9 94.1 65.0 21.0 4.0 10.0 100 100 Δ Δ 冒施例3 52 94.5 65.0 30.5 4.0 0.5 100 138 ◎ 0 冒施例6 5.2 94.4 65.0 29.5 4.0 0.5 99.0 134 0 霣施例7 5.2 94.5 65.0 28.5 4.0 0.5 98.0 129 0 霣施例8 5.2 94.3 65.0 26.5 4.0 0.5 96.0 118 0 0 冒施例9 5.8 93.9 40.0 47.0 12.0 1.0 100 120 0 0 I施例4 5.2 94.5 65.0 30.0 4.0 1.0 100 132 @ 0 I施例10 4.3 95.1 80.0 15.0 4.0 1.0 100 147 (S) 0 霣施例U 2.5 97.0 95.0 3.0 1.0 1.0 100 135 0 Δ 富施例5 5.2 943 65.0 28.0 4.0 3.0 100 121 0 0 比較例4 52 94.0 65.0 32.0 0 3.0 100 104 Δ Δ ※工)氟元素重量佔研磨材童量之比例 ※刁TREO換算重量栢對於硏磨材重量之比例 如表1所示,實施例1〜5與比較例1〜3之研磨材,分別2169-6178-PF (N2) .ptd 200426206 V. Description of the invention (13) [Table 1] Honing performance of actinic grinding materials ※ [八 ^ 2) Grinding scratch of each rare earth oxide in treo TREO conversion weight Effective rate conversion weight f Evaluation of weight halo speed (wt%) (wt%) Ce〇2 La2〇3 Pr6〇ll Nd2〇3 4 kinds of combined comparative examples 1 5.3 94.5 65.0 31.0 4.0 < 0.001 100 128 Δ Δ I Example 1 5.2 94.5 65.0 30.99 4.0 0.01 100 152 ◎ 0 Rich Example 2 5.2 94.7 65.0 30.9 4.0 0.1 100 145 ◎ 0 冨 Example 3 5.2 94.5 65.0 30.5 4.0 0.5 100 138 (〇) 0 冨 Example 4 5.2 94.5 65.0 30.0 4.0 1.0 100 132 @ 0 Example 5 5.2 94.3 65.0 28.0 4.0 3.0 100 121 0 0 Comparative Example 2 5.1 94.4 65.0 25.0 4.0 6.0 100 103 Δ Δ Comparative Example 3 4.9 94.1 65.0 21.0 4.0 10.0 100 100 Δ Δ Example 3 52 94.5 65.0 30.5 4.0 0.5 100 138 ◎ 0 Example 6 5.2 94.4 65.0 29.5 4.0 0.5 99.0 134 0 Example 7 5.2 94.5 65.0 28.5 4.0 0.5 98.0 129 0 Example 8 5.2 94.3 65.0 26.5 4.0 0.5 96.0 118 0 0 Example 9 5.8 93.9 40.0 47.0 12.0 1.0 100 120 0 0 I Example 4 5.2 94.5 65.0 30.0 4.0 1.0 100 132 @ 0 I Example 10 4.3 95.1 80.0 15.0 4.0 1.0 100 147 (S) 0 霣 Example U 2.5 97.0 95.0 3.0 1.0 1.0 100 135 0 Δ Rich Example 5 5.2 943 65.0 28.0 4.0 3.0 100 121 0 0 Comparative Example 4 52 94.0 65.0 32.0 0 3.0 100 104 Δ Δ ※ Work) The proportion of the weight of fluorine element to the weight of the abrasive material. * The ratio of TREO conversion weight cypress to the weight of honing material is shown in Table 1. Examples 1 to 5 Different from the abrasives of Comparative Examples 1 to 3
2169-6178-PF(N2).ptd 第22頁 200426206 五、發明說明(14) TRE0中的氧化歛(% )之重量比例不同。其中,每> 1〜5的研磨材,其研磨速度高,且不易發生研磨刮^施。 ,相對,未混合氧化歛的比較例丨之研磨材,研磨 虽隹 σ重里7^的比較例2及3之研磨材,其研磨速度低, 易發生研磨刮傷。從這些結果可知,鈽系研磨材料中,氧 化=佔TRE0之重量比例(Nd2〇3/TRE〇)最好係〇· 〇〇1重量%』 重量^。且關於研磨速度,將各實施例作比較可知,tre〇 中的氧化歛之重量比例較好係2重量%以下,更好 重量%以下,〇 · 1重量%以下則更理想。 ” 且實施例6〜8之研磨材,分別4種氧化物「氧化鈽 (Ce02)、氧化鑭(La2〇3)、氧化镨、氧化鈥(n 的總重ϊ佔TRE0之比例在1〇〇重量%以下,且各實施例中該 =例值f不相同。從包含這些實施例的實施例1〜δ可知, 右總重$的比例在9 6重量%,則可以確保作為研磨材必要 的研磨速度,也可以防止研磨刮傷之發生。且總含有率若 f 97重量%以上,則可以確保更高的研磨速度,並能更確 貫地防止研磨刮傷之發生。 貫施例4與實施例1 〇,不僅氧化鈥佔TREO之比例 (Nd2 03 /TRE0)係合適值,Ce〇2/TRE〇、La2〇3/TRE〇、 ΡιΆ 1/TRE0亦係合適值,研磨速度高,幾乎無研磨刮傷發 生’也未觀察到研磨材之殘存。與此相對,實施例9與實 施例11 ’Nd2 03 /TRE0 係合適值,但Ce02/TRE0、2169-6178-PF (N2) .ptd Page 22 200426206 V. Description of the invention (14) The weight ratio of oxidized convergence (%) in TRE0 is different. Among them, each > 1 to 5 abrasives has a high grinding speed and is difficult to be subjected to grinding scraping. In contrast, the abrasives of Comparative Example 丨 without oxidative convergence were ground. Although the abrasives of Comparative Examples 2 and 3 of σσ are 7 ^, the grinding speed is low, and abrasive scratches are liable to occur. From these results, it is known that in the actinide-based abrasive material, oxidation = weight ratio of TRE0 (Nd203 / TRE0) is preferably 0.001% by weight. As for the polishing rate, when comparing the examples, it can be seen that the weight ratio of oxidative convergence in tre0 is preferably 2% by weight or less, more preferably 5% by weight, and more preferably 0.1% by weight or less. In addition, the abrasives of Examples 6 to 8 include four kinds of oxides, "Ce02", lanthanum oxide (La2O3), osmium oxide, and "(n), and the total weight of Tn0 accounts for 100% of TRE0. It is less than or equal to wt%, and the value of the example in each example is not the same. From Examples 1 to δ including these examples, it can be seen that the ratio of the total right weight $ is 96% by weight. The grinding speed can also prevent the occurrence of grinding scratches. If the total content rate is f 97% by weight or more, a higher grinding speed can be ensured and the occurrence of grinding scratches can be more surely prevented. In Example 10, not only the ratio of oxidation to TREO (Nd2 03 / TRE0) is a suitable value, but also Ce02 / TRE0, La2〇3 / TRE0, and P1Ά / TRE0 are suitable values. The grinding speed is high, almost No abrasive scratch occurred 'and no residual abrasive was observed. In contrast, Example 9 and Example 11' Nd2 03 / TRE0 are appropriate values, but Ce02 / TRE0,
La2 03 /TRE0、Pr6〇u/TRE〇中至少一項不是合適值,研磨速 第23頁 參 2169-6178-PF(N2).ptd 200426206At least one of La2 03 / TRE0, Pr6〇u / TRE〇 is not an appropriate value, the grinding speed is p. 23 See 2169-6178-PF (N2) .ptd 200426206
度、研磨刮傷、洗淨性中的至一 — 1 0差。i"曰還县μμ Μ Η η 、比貫施例4與實施例 優良。磨= 人摘值之故 nr ^ 禾3有鳍,Pr60u/TRE0並非 口通值之故,研磨性能比實施例5還差。6 u 根據鈽系研磨材料中的氟及各 之摩爾量(m〇l/L),管七鈽系;^ 0 #上類的母1 kg研磨材 及镨的她含有J二,材料中的氟含有率與鑭 Ϊ Ϊ ;2所(La + P〇)。算出的值如表2所 二/=二V“j及比較例之鈽系研磨材料^ ^Degree, abrasive scratch, and detergency. i " Huanxian μμM Η η is superior to Examples 4 and Examples. Grinding = the reason that the value of the person is nr ^ He3 has fins, Pr60u / TRE0 is not the reason for the mouth value, and the grinding performance is worse than that of Example 5. 6 u According to the fluorine in the actinide-based grinding material and its molar amount (m0l / L), tube seven actinides; ^ 0 #The above-mentioned mother 1 kg of abrasive material and actinide contain JII. Fluorine content and lanthanum osmium ytterbium; 2 (La + Po). The calculated values are as shown in Table 2. Two / = two V "j and the sacrificial abrasive material of the comparative example ^ ^
Ce02/TRE0 為 65 重量%、La2 03 /TRE0 為 3〇· 9 重量%、Ce02 / TRE0 is 65% by weight, La2 03 / TRE0 is 30.9% by weight,
Pr60n/TRE0 為 4. 〇 重量%、Nd2〇3/TRE〇 為 〇. i 重里 ^%。 【表2】 硏磨材 每1kg硏磨材之摩爾量 摩爾比 硏麵能 (mol/k 公) 籼氟含 粕避。 F La Pr Nd La/Pr Nd /Pr F /La 十 Pr 硏磨 刮傷 洗 有率 換算重量 速度 評價 淨 (wt%) (wt%) 件 比較例5 <0.001 99,8 <0.005 1,89 0,234 0,006 8.09 0.03 <0.001 35 〇 X 實施例12 1.2 98.4 0,63 1,87 0,231 0,006 8.08 0.03 0.30 123 ◎ 0 寳施例2 5.1 94.7 2.68 1,80 0,223 0.006 8,05 0.03 1.33 145 ◎ 0 實施例13 8,4 91,0 4.42 1.73 0.214 0,005 8.07 0.03 2.28 163 〇 0 比較例δ 12.5 87.9 6,58 1,67 0,207 0,005 8.05 0.03 3.51 166 X △ ※”氟元素寵佔硏磨材重較比例 ※之)丁REO g重量於硏磨材重&比例 如表2所示,實施例2、1 2、1 3與比較例5、6之研磨 材,各研磨材中氟的含有率不同。其中實施例2、1 2、1 3 之研磨材,研磨速度高,且研磨刮傷難以發生,係良好Pr60n / TRE0 is 4.0% by weight, and Nd203 / TRE0 is 0.1% by weight. [Table 2] The molar amount of honing material per 1kg of honing material. Molar ratio. Surface energy (mol / k). Fluorine-containing meal is to be avoided. F La Pr Nd La / Pr Nd / Pr F / La Ten Pr Honing Scratch Washing Efficiency Conversion Weight Speed Evaluation Net (wt%) (wt%) Comparative Example 5 < 0.001 99,8 < 0.005 1, 89 0,234 0,006 8.09 0.03 < 0.001 35 〇X Example 12 1.2 98.4 0,63 1,87 0,231 0,006 8.08 0.03 0.30 123 ◎ 0 Bao Shi 2 5.1 94.7 2.68 1,80 0,223 0.006 8,05 0.03 1.33 145 ◎ 0 Example 13 8,4 91,0 4.42 1.73 0.214 0,005 8.07 0.03 2.28 163 〇0 Comparative Example δ 12.5 87.9 6,58 1,67 0,207 0,005 8.05 0.03 3.51 166 X △ ※ "Fluorine element pets account for the proportion of the weight of honing materials ※ The ratio of the weight of Ding REO g to the weight of the honing material is shown in Table 2. For the abrasive materials of Examples 2, 1, 2, 13 and Comparative Examples 5 and 6, the fluorine content in each abrasive material is different. Among them, the abrasive materials of Examples 2, 1, 2, and 13 had high grinding speed, and it was difficult for grinding scratches to occur.
2169-6178-PF(N2).ptd 第24頁 200426206 五、發明說明(16) _ —--- 2命與此相對’幾乎未含有氟的比較例5之研磨材,研磨 :顯降低。且氟的含有率高的比較例6之研磨材,研 磨速度雖胃,但研磨刮傷容易發生。從這些結果可知 :士度及研磨刮傷兩方面出發,$ 了得到更高的效果 白、各有率更好的係2重量%〜7重量%。且氟的含有率與鑭及 錯的總含有率之摩爾比(F/(La + Pr))最好係0.2〜3。 居2實施形食、| ^使用與第1實施形態不同的原料製造本發明之鈽系研 磨材料’對於該研磨材料之最佳實施形態加以說明。 ^ 首先’準備以鈽為主成分的稀土類碳酸鹽(中國產)。 该稀土類碳酸鹽中,TRE0係52. 3重量%,Ce02/TRE0係 52·1%、La2〇3/TRE〇 係26.7%、Pr60u/TRE0 係7.2%、2169-6178-PF (N2) .ptd Page 24 200426206 V. Description of the invention (16) _ —--- 2 lifespan In contrast, the abrasive of Comparative Example 5 which contains almost no fluorine, was polished: significantly reduced. In the abrasive of Comparative Example 6, which has a high fluorine content, the grinding speed is stomach, but abrasive scratches easily occur. From these results, we can see that starting from the two aspects of degree and grinding scratch, the higher the effect is, the more white and the better the ratio is 2% to 7% by weight. The molar ratio (F / (La + Pr)) of the content ratio of fluorine to the total content ratio of lanthanum and copper is preferably 0.2 to 3. In the second embodiment, the first embodiment of the present invention will be described using a raw material different from that in the first embodiment to produce a milled grinding material of the present invention. ^ First, ‘prepared rare earth carbonate (produced in China) based on rhenium. Among the rare earth carbonates, TRE0 is 52.3% by weight, Ce02 / TRE0 is 52.1%, La203 / TRE0 is 26.7%, Pr60u / TRE0 is 7.2%,
Nd2〇3/TREO係13· 〇%。本實施形態的實施例14〜17及比較例 7山1 〇 (參照後面的表3及表4 )中,比較例7直接以該稀土類 碳酸鹽為原料。且實施例14〜17及比較例8〜10中,用鹽酸 將該稀土類碳酸鹽溶解,用溶劑萃取法將所得的碳酸鹽溶 解液分離精製,得到鈥或鑭降低的稀土類溶液(精製液), 將所得的稀土類溶液與碳酸氫銨水溶液(沉澱劑)混合,生 成稀土類碳酸鹽的沉澱後,使用離心分離機過濾·水洗, 得到作為原料使用的稀土類碳酸鹽(Nd2 03 /TRE0係0. 1重量 %〜6.3重量%)。 运裡’對本實施形態的溶劑%取作一說明。該溶劑萃Nd203 / TREO is 13.0%. In Examples 14 to 17 and Comparative Example 7 of this embodiment (see Tables 3 and 4 below), Comparative Example 7 directly used the rare earth carbonate as a raw material. Further, in Examples 14 to 17 and Comparative Examples 8 to 10, the rare earth carbonate was dissolved with hydrochloric acid, and the obtained carbonate solution was separated and purified by a solvent extraction method to obtain a lanthanum-reduced rare earth solution (refined solution). ), The obtained rare-earth solution is mixed with an aqueous ammonium bicarbonate solution (precipitant) to generate a precipitate of the rare-earth carbonate, and then filtered and washed with a centrifuge to obtain a rare-earth carbonate (Nd2 03 / TRE0) as a raw material. Department 0.1% ~ 6.3% by weight). Here, the solvent% in this embodiment will be described.该 solve extract
2169-6178-PF(N2).Ptd2169-6178-PF (N2) .Ptd
200426206 五、發明說明(17) 取中,作為有機溶劑,使用萃取劑(pC-88A ••大八 =製)與稀釋劑(依普溶膠出光石油化 匕:工 取劑/稀釋劑)1/2的比例混合所得 =里比(卒 .炭酸鹽溶解液(^EG24Gg/L)以流量比(有機 浴解液)8/1之狀態,使其逆流多段接觸(3〇段),二 ,素,至有機溶劑中。這時,實施例16中鑭的―:八: 留於水溶液中。且除此以外的實施例及比 : =乎全部萃取至有機溶劑中。萃取的調整係在= ,。其後’使含有稀土類元素的有機溶二; =溶液逆流多段接觸(3。段),將斂及比敍 L; 有機溶劑中的稀土類元素(釤至重稀土及妃⑺ 卒取至 ;於有機溶劑中,將鑭、錦、罐的大部分及斂的一部分萃 取至鹽酸水溶液中,得到精製液。1刀+ 變鹽酸水溶液之流量來進行(有機、、々 里曰、凋正通過改 3铖洛劑的流量係一定的)。 使用與第!實施形態同樣的步驟將所得 石厌酸鹽)製造成飾系研磨材料。從上述的記載可知,第2實 &形恶之原料與第1貫施形態之原料相比’相對於原料的 總重量之原料的丽比例低’第2實施形 同樣的,將原料重量的2倍重量之純水與原料混合得到; 混合物,用研磨m粉碎來得到漿體。研磨機之满式粉 碎時間為1〇小日夺。:在對濕式粉碎所得的漿體添加1〇%的 氫氟酸之氟化處王里中,冑製漿體使#中的氟成分 (F/(TR腳))為7%。且培燒步驟之 2169-6178-PF(N2).ptd 第26頁 200426206 五、發明說明(18) 1 7、1 8及比較例9、1 0以外,與第1實施形態同樣的為9 5 〇 °C。焙燒溫度在比較例9係6 5 0 °C、實施例1 7係7 5 0 °C、實 施例1 8係11 0 0 °C、比較例1 〇中係1 2 0 0 °C。除此以外的研磨 材料製造條件與第1實施形態相同。因此這裡,省略了研 磨材製造步驟之說明。 【表3] 鈽系研磨材料 硏磨性能 ^TREO TRE0換算童量中各稀土類氧化物之 研磨 刮傷 酵性 含有 換算 童畺比例(wt%) 連度 評價 率 章景 Ce〇2 La2〇3 Pr5〇ll Nd2〇3 (wt%) (wl%) 總合 比較例7 6.5 92.0 52.1 26.7 7.2 13.0 99.0 95 Δ Δ 比較例8 63 92.5 58.5 30.2 4.5 63 99.5 "7〇2 △ △ 冒施例W 6.4 92.6 60.4 31.5 3.6 4.2 99.Γ 120 〇 〇 富施例15 6.1 93.0 63.7 33.6 2.3 0.2 99.8 131 ◎ 〇 霣施例16 5.7 93.3 79.5 19.6 0.7 0.1 99.9 142 Γ\ ※丄)氟元素重量佔硏磨材重量之比例 —^ ^ 1 ^ 來2) TREO換f童量栖對於研磨材重量之比例 第2實施形態的最初原料之稀土類碳酸骑(200426206 V. Description of the invention (17) As the organic solvent, extractant (pC-88A • • Big Eight = manufactured) and diluent (eupsol extractive petrochemical dagger: extraction agent / diluent) 1 / The ratio of 2 is equal to the ratio of the ratio of the ratio of Lib (carbonate solution (^ EG24Gg / L) to the flow ratio (organic bath solution) of 8/1. Into an organic solvent. At this time, the lanthanum of Example 16 is left in an aqueous solution. And the other examples and ratios are: = almost all extracted into the organic solvent. The adjustment of the extraction is =. After that, the organic solvent containing rare earth elements is dissolved; = the solution is countercurrently contacted in multiple stages (3. stage), and the concentration and comparison are compared; the rare earth elements in the organic solvent (thorium to heavy rare earth and concubine are taken to; In an organic solvent, extract most of the lanthanum, brocade, and cans and a part of the tank into an aqueous solution of hydrochloric acid to obtain a refined solution. 1 knife + change the flow rate of the aqueous solution of hydrochloric acid to perform (organic, (3) The flow rate of gluant is constant.) Use the same steps as in the first embodiment. The obtained salt metaphosphate was made into a decorative abrasive material. From the above description, it can be seen that the raw material of the second solid & The ratio is low. In the second embodiment, pure water is mixed with the raw material twice the weight of the raw material to obtain the mixture; the mixture is pulverized by grinding to obtain a slurry. The full-grinding time of the grinder is 10 small days. : In the fluorinated virgin li with 10% hydrofluoric acid added to the slurry obtained by the wet pulverization, the slurry was made so that the fluorine component (F / (TR foot)) in # was 7%. No. 2169-6178-PF (N2) .ptd Page 26 200426206 V. Description of the Invention (18) 17 and 18 and Comparative Examples 9 and 10 are the same as the first embodiment at 95 ° C. The calcination temperature was 6500 ° C in Comparative Example 9, 7750 ° C in Example 1 and 7100 ° C in Example 1 and 1800 ° C in Example 1 and 120 ° C in Comparative Example 10. The manufacturing conditions of the other abrasive materials are the same as those of the first embodiment. Therefore, the description of the manufacturing steps of the abrasive materials is omitted here. [Table 3] Honing performance of the 钸 series abrasive materials ^ TREO T Grinding and scratching of each rare earth oxide in the RE0-converted amount of the child contains the converted ratio of children's maggots (wt%). Continuity evaluation rate Zhang Jing Ce〇2 La2〇3 Pr5〇ll Nd2〇3 (wt%) (wl% ) Total Comparative Example 7 6.5 92.0 52.1 26.7 7.2 13.0 99.0 95 Δ Δ Comparative Example 8 63 92.5 58.5 30.2 4.5 63 99.5 " 7〇2 △ △ Example W 6.4 92.6 60.4 31.5 3.6 4.2 99.Γ 120 〇〇 Rich Example 15 6.1 93.0 63.7 33.6 2.3 0.2 99.8 131 ◎ 〇 霣 Example 16 5.7 93.3 79.5 19.6 0.7 0.1 99.9 142 Γ \ ※ 丄) The proportion of the weight of fluorine element to the weight of honing material— ^ ^ 1 ^ 2) TREO exchange fThe ratio of the amount of the child to the weight of the abrasive
Nd^/TREO雖超過5%,通過溶劑萃取降低了二产产、j的 例14〜16之研磨材(Nd^/TREO在5%以下),星女辰古又的貝施 月匕。與此相對,Nd2 03 /TRE0超過5%的比較例7、smAlthough Nd ^ / TREO exceeds 5%, the abrasives of Examples 14 to 16 in which secondary production and j were reduced by solvent extraction (Nd ^ / TREO is less than 5%), and Xing Nu Chen Gu Beishi Moon Dagger. In contrast, Comparative Example 7, Nd2 03 / TRE0 exceeding 5%, sm
.^ ^7T 材,與貫施例的研磨材相比,研磨速度、刮 性均較差。 」傷汗扣及洗淨 且對於所製造的鈽系研磨材料,測量了 J、、>〇射λ射線峰 200426206. ^ ^ 7T material, compared with the grinding material of the examples, the grinding speed and scraping properties are poor. ”Sweat and buckle and wash. For the actinide-based abrasive material manufactured, J, > 0-ray λ-ray peak 200426206 was measured.
五、發明說明(19) 強度(Intensity)、平均粒徑(D 50 細孔容積之測量 線繞射測景 使用X射線繞射裝置(MaCScience (株)製、,對 ^鈽系研^材料進行Χ射線繞射分析,測量繞射1射線峰強 ^。本測量中,使用銅(Cu)靶,對繞射1射線(照射⑸―κ α 線所得的⑸一、Κ 線)圖案中的繞射角(2 在20deg〜30deg 内出現的峰進行解析。且其他的測量條件係管電壓4 〇 k v、 管電流150mA、測量範圍2 0=5〜8〇deg、樣品寬度 〇·〇2ά^δ、掃描速度4deg/分。且,將從各實施例及比較例 的鈽系研磨材料之X射線繞射測量結果讀得的、相對於氧 化鈽(je〇2)的X射線峰強度,氟氧化鑭(La〇F)的X射線峰強 度及氟化鑭(LAFS)的X射線峰強度之比如表4所示。 )之測詈 *使用雷射繞射•散亂法粒度分布測量裝置((株)島津 1作所製:SALD-20 0 0A),測量鈽系研磨材料之粒度分 布,求得平均粒徑((DS():從小粒徑側的累積體積為5 〇 %之 粒控)。 jg ,孔i容積之测詈 使用細孔容積測量裝置(C0ULTER SA3100)測量鈽系研 磨材料之細孔容積。 第28頁 2169-6178-PF(N2).ptd 200426206 五、發明說明(20) 【袠4] 鈽系研磨材料 X射線峰 mmm 研磨性能〜 強度比 風 m) 〇換算童量中各稀土 LaOF LaF3 平均粒 細孔 研磨 刮傷 含有 TREO 類氧化物之輋晕比例 /Ce〇2 /Ce〇2 徑(Dso) 容積 連度 評價 淨 率 換算 (wt%) (只m) (m3/g) 性 (wt%) 重量 Ce〇2 La2〇3 PreOn Nd2〇3 (wt%) 比g例9 6.7 93.0 63.7 33.6 2.3 02 0.02 0.05 0.47 0.132 25 Δ X 霣施例17 6.4 93.0 63.7 33.6 2.3 02 0.15 <0.01 0.69 0.092 115 0. 冒施例15 6.1 93.0 63.7 33.6 2.3 0.2 0.27 <0.01 0.97 0.047 131 © 〇" 霣施例18 5.7 93.0 63.7 33.6 2.3 0.2 0.43 <0.01 1.27 0.0055 155 0 6 比較例10 5.2 93.0 63.7 33.6 2.3 02 0.72 <0.01 2.05 0.0009 163 X 0· ---- ※丄)氟元素童量佔研磨材重量之比例 來2) TREO換算重量栢對於研磨材重量之比例 表4所示的實施例及比較例之研磨材中,X射線峰強度 的強度比(LaOF/Ce〇2)在〇.〇5〜0.6之實施例的研磨材,其研 磨速度雨’且研磨刮傷不易發生,係良好的。與此相對, 強度比(LaOF/Ce〇2)小的比較例9之研磨材,研磨速度明顯 降低,且有研磨刮傷的發生。且強度比大的比較例丨〇之研 磨材’研磨速度雖高,明顯有刮傷發生。從該結果可知, 最好係X射線峰強度之強度比(La〇F/Ce〇2)在〇· 〇5〜〇· 6之研 磨材料。 且細孔容積在〇· 〇〇2cm3/g〜〇·丨cmVg的實施例之研磨 材,其研磨速度高,且研磨刮傷不易發生,係良好的。與V. Description of the invention (19) Intensity, average particle size (D 50 pore volume measurement line diffraction surveying, X-ray diffraction device (made by MaCScience Co., Ltd.), X-ray diffraction analysis, measuring the peak intensity of diffraction 1 ray. In this measurement, a copper (Cu) target is used to diffract the diffraction in a pattern of diffraction 1 ray (the line ⑸-κ obtained by irradiating the ⑸-κ α line). The angle of incidence (2 peaks within 20deg ~ 30deg is analyzed. Other measurement conditions are tube voltage 40kv, tube current 150mA, measurement range 2 0 = 5 ~ 80 °, sample width 〇 · 〇2ά ^ δ The scanning speed is 4 deg / min. Further, the X-ray peak intensity of fluoridated oxide with respect to thorium oxide (je〇2), which is read from the X-ray diffraction measurement results of the samarium-based abrasives of each of the examples and comparative examples, is fluoridated The X-ray peak intensities of lanthanum (La〇F) and the X-ray peak intensities of lanthanum fluoride (LAFS) are shown in Table 4.) (Made by Shimadzu Corporation: SALD-20 0 0A), the particle size distribution of the actinide-based abrasive material is measured, and the average particle size ((DS ( ): The cumulative volume from the side of the small particle size is 50% of the particle size control.) Jg, the measurement of the volume of the hole i. The pore volume measurement device (C0ULTER SA3100) is used to measure the pore volume of the 研磨 series abrasive material. Page 2169 -6178-PF (N2) .ptd 200426206 V. Description of the invention (20) [袠 4] X-ray peak mmm of 钸 series abrasive material Grinding performance ~ intensity ratio wind m) 〇The average particle size of each rare earth LaOF LaF3 in the conversion of the amount Grinding scratches Contamination ratio containing TREO oxides / Ce〇2 / Ce〇2 Diameter (Dso) Volumetric Connectivity Evaluation Net Rate Conversion (wt%) (m only) (m3 / g) Properties (wt%) Weight Ce〇2 La2〇3 PreOn Nd2 03 (wt%) ratio g Example 9 6.7 93.0 63.7 33.6 2.3 02 0.02 0.05 0.47 0.132 25 Δ X Example 17 6.4 93.0 63.7 33.6 2.3 02 0.15 < 0.01 0.69 0.092 115 0. Example 15 6.1 93.0 63.7 33.6 2.3 0.2 0.27 < 0.01 0.97 0.047 131 © 〇 " Example 18 5.7 93.0 63.7 33.6 2.3 0.2 0.43 < 0.01 1.27 0.0055 155 0 6 Comparative Example 10 5.2 93.0 63.7 33.6 2.3 02 0.72 < 0.01 2.05 0.0009 163 X 0 · ---- ※ 丄) Fluorine The ratio of the child's weight to the weight of the abrasive material 2) The ratio of TREO conversion weight cypress to the weight of the abrasive material In the abrasive materials of the examples and comparative examples shown in Table 4, the intensity ratio of the X-ray peak intensity (LaOF / Ce〇2) The polishing material of the examples in the range of 0.05 to 0.6 has a good polishing speed, and abrasion scratches are unlikely to occur. In contrast, in the abrasive material of Comparative Example 9 having a small strength ratio (LaOF / Ce02), the polishing rate was significantly reduced, and polishing scratches occurred. In Comparative Example 丨 0, which has a large strength ratio, although the grinding speed was high, it was obvious that scratches occurred. From this result, it is understood that the grinding material having an intensity ratio (LaOF / Ce〇2) of X-ray peak intensity in the range of 0.05 to 0.6 is preferable. The abrasive material of the example having a pore volume of 0.002 cm3 / g to 0.005 cmVg has a high polishing speed, and abrasion scratches are unlikely to occur, which is good. versus
2169-6178-PF(N2).ptd 第29頁 200426206 五、發明說明(21) 此相對,細孔容積大的比較例9之研磨材,研磨速度明顯 降低。且細孔容積小的比較例1 〇之研磨材,有刮傷發生。 從該結果可知,細孔容積最好係〇.〇〇2cm3/g〜〇·1 cm3/g之 研磨材料。 產業上的可利性 本發明之錦系研磨材料 傷更少發生。若使用該鈽系 對象面,與使用以往的錦系 更短的時間完成研磨。且可 的發生。因此,很適用於精 件等的表面研磨等的用途。 ’其研磨速度更高,且研磨刮 研磨材料來研磨玻璃等的研磨 研磨材料之情形相比,可以用 以更確貫地抑制研磨面上 密儀器、電子儀器或這些的|2169-6178-PF (N2) .ptd Page 29 200426206 V. Description of the invention (21) In contrast, the abrasive of Comparative Example 9 with a large pore volume has a significantly reduced grinding speed. In the abrasive material of Comparative Example 10 having a small pore volume, scratches occurred. From this result, it is understood that the pore volume is preferably an abrasive material of 0.002 cm3 / g to 0.1 cm3 / g. Industrial Applicability The abrasive material of the brocade of the present invention has fewer injuries. If this surface is used, the polishing can be completed in a shorter time than with the conventional brocade. And it can happen. Therefore, it is very suitable for applications such as surface polishing of precision parts. ’Its grinding speed is higher, and it can be used to more accurately suppress the grinding surface, electronic equipment, or these when compared to the case of grinding materials such as glass and grinding materials by grinding scrapers and abrasives |
200426206 圖式簡單說明200426206 Schematic description
2169-6178-PF(N2).ptd 第31頁2169-6178-PF (N2) .ptd Page 31
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JP2003112763 | 2003-04-17 |
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TW200426206A true TW200426206A (en) | 2004-12-01 |
TWI313707B TWI313707B (en) | 2009-08-21 |
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TW093104559A TWI313707B (en) | 2003-04-17 | 2004-02-24 | Cerium-based abrasive |
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JP (1) | JP4401353B2 (en) |
KR (1) | KR100697682B1 (en) |
CN (1) | CN100447218C (en) |
TW (1) | TWI313707B (en) |
WO (1) | WO2004092297A1 (en) |
Cited By (3)
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TWI410479B (en) * | 2006-03-01 | 2013-10-01 | Mitsui Mining & Smelting Co | Lanthanum abrasive |
US11371131B2 (en) | 2015-02-10 | 2022-06-28 | Nippon Yttrium Co., Ltd. | Powder for film formation and material for film formation |
CN117655937A (en) * | 2024-02-02 | 2024-03-08 | 四川江天科技有限公司 | Rare earth polishing disc for polishing crystal glass and preparation method thereof |
Families Citing this family (17)
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JP3929481B2 (en) * | 2005-04-04 | 2007-06-13 | 昭和電工株式会社 | Cerium oxide-based abrasive, its production method and use |
KR101376057B1 (en) * | 2009-04-15 | 2014-03-19 | 솔베이 (차이나) 컴퍼니, 리미티드 | A cerium-based particle composition and the preparation thereof |
CN101899264B (en) * | 2009-05-25 | 2014-05-21 | 甘肃稀土新材料股份有限公司 | Rare earth polishing powder and preparation method thereof |
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JP4876183B1 (en) * | 2010-09-27 | 2012-02-15 | 三井金属鉱業株式会社 | Cerium-based abrasive |
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CN102925106A (en) * | 2012-11-14 | 2013-02-13 | 内蒙古科技大学 | Rare earth polishing powder and preparation method thereof |
CN103923604A (en) * | 2013-01-15 | 2014-07-16 | 安阳市岷山有色金属有限责任公司 | Cerium based abrasive material |
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KR102693955B1 (en) * | 2018-04-11 | 2024-08-09 | 삼성전자주식회사 | Polishing composition for polishing glass surface, polishing device using the polishing composition and polishing method |
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CN110256970A (en) * | 2019-07-06 | 2019-09-20 | 深圳市瑞来稀土材料有限公司 | A kind of polishing powder and preparation method thereof |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4273475B2 (en) * | 1999-09-21 | 2009-06-03 | 株式会社フジミインコーポレーテッド | Polishing composition |
EP1285956A4 (en) * | 2000-05-16 | 2004-09-29 | Mitsui Mining & Smelting Co | Cerium based abrasive material, raw material thereof and method for their preparation |
JP3365993B2 (en) * | 2000-05-16 | 2003-01-14 | 三井金属鉱業株式会社 | Cerium-based abrasives, raw materials therefor, and methods for producing them |
JP3392398B2 (en) * | 2000-09-20 | 2003-03-31 | 三井金属鉱業株式会社 | Cerium-based abrasive, its quality inspection method and manufacturing method |
JP3694478B2 (en) * | 2000-11-30 | 2005-09-14 | 昭和電工株式会社 | Cerium-based abrasive and method for producing the same |
-
2004
- 2004-02-24 TW TW093104559A patent/TWI313707B/en not_active IP Right Cessation
- 2004-03-12 KR KR1020047019949A patent/KR100697682B1/en active IP Right Grant
- 2004-03-12 JP JP2005505341A patent/JP4401353B2/en not_active Expired - Lifetime
- 2004-03-12 CN CNB2004800007749A patent/CN100447218C/en not_active Expired - Lifetime
- 2004-03-12 WO PCT/JP2004/003276 patent/WO2004092297A1/en active Application Filing
Cited By (4)
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TWI410479B (en) * | 2006-03-01 | 2013-10-01 | Mitsui Mining & Smelting Co | Lanthanum abrasive |
US11371131B2 (en) | 2015-02-10 | 2022-06-28 | Nippon Yttrium Co., Ltd. | Powder for film formation and material for film formation |
CN117655937A (en) * | 2024-02-02 | 2024-03-08 | 四川江天科技有限公司 | Rare earth polishing disc for polishing crystal glass and preparation method thereof |
CN117655937B (en) * | 2024-02-02 | 2024-04-26 | 四川江天科技有限公司 | Rare earth polishing disc for polishing crystal glass and preparation method thereof |
Also Published As
Publication number | Publication date |
---|---|
WO2004092297A1 (en) | 2004-10-28 |
KR100697682B1 (en) | 2007-03-20 |
CN1701108A (en) | 2005-11-23 |
JPWO2004092297A1 (en) | 2006-07-06 |
TWI313707B (en) | 2009-08-21 |
KR20050019733A (en) | 2005-03-03 |
CN100447218C (en) | 2008-12-31 |
JP4401353B2 (en) | 2010-01-20 |
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