SU405972A1 - COMPOSITION FOR LOW-TEMPERATURE SILICIATION - Google Patents
COMPOSITION FOR LOW-TEMPERATURE SILICIATIONInfo
- Publication number
- SU405972A1 SU405972A1 SU1716467A SU1716467A SU405972A1 SU 405972 A1 SU405972 A1 SU 405972A1 SU 1716467 A SU1716467 A SU 1716467A SU 1716467 A SU1716467 A SU 1716467A SU 405972 A1 SU405972 A1 SU 405972A1
- Authority
- SU
- USSR - Soviet Union
- Prior art keywords
- composition
- temperature
- siliciation
- low
- fluoride
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000003638 chemical reducing agent Substances 0.000 description 4
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 4
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 4
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 235000003270 potassium fluoride Nutrition 0.000 description 2
- 239000011698 potassium fluoride Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 235000013024 sodium fluoride Nutrition 0.000 description 2
- 239000011775 sodium fluoride Substances 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910001515 alkali metal fluoride Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000006071 cream Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000005475 siliconizing Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Description
1one
Изобретение относнтс к химико-термической обработке металлов, в частности к нроцессам силицировани в жидки.х среда.х.The invention relates to the chemical heat treatment of metals, in particular, to siliconizing processes in liquids.
Известен состав дл силицировани , содержащий хлориды ихелочны.х металлов, фторид натри , кремиефтористый натрий и норонюк металлического кремни . Силинирование в изпестно.м составе провод т при температуре 800--950°С в течение 3-10 час.A composition for siliconization is known, containing the chlorides of alkali metal, sodium fluoride, sodium cremyifluoride and norony of metallic silicon. The silining in a local m composition is carried out at a temperature of 800--950 ° C for 3-10 hours.
Предлагае.мый состав отличаетс от известного тем, что, с целью снижени темнературы нроцесса, новышенн технологичности ои содержит фториды щелочных металлов, окись кре.мии и восстановитель при следующем соотношении ко.многгентов (в вес. %):The proposed composition differs from the well-known in that, in order to reduce the temperature of the process, the new manufacturability of the oxide contains alkali metal fluorides, silicon oxide and a reducing agent in the following ratio of co-agents (% by weight):
19-23 19-23
Фторид лити 7-10 Фторид натри Lithium fluoride 7-10 sodium fluoride
39-47 Фторид кали 5-10 Окись кремни 39-47 Potassium Fluoride 5-10 Silicon Oxide
15-25 Восстановитель15-25 Reducer
В качестве восстановител примен ют силикокальиий , силикомин1металл, карбид кремии , си л и ком ар ганец, силикоалюмипий.Silicone calcium, siliconomine-1-metal, cream carbide, silicone, silicon, silicon-aluminum are used as a reducing agent.
Силицироваиие провод т нри температуре 550-700 0 в течение 5-10 /ас.Silicization is carried out at a temperature of 550-700 0 for 5-10 / ac.
Так, нанример, пасьиценне в расплаве (вSo, for example, the melt melts are melted (in
вес. %):weight. %):
23 10 17 5 1523 10 17 5 15
(снлпкокальцнй)(snpkokaltsny)
позвол ет получить на стали 20 нрн 550°С в течение 8 час слой глубиной - 0,025 мм.It allows to obtain on steel 20 nrn 550 ° С for 8 hours a layer with a depth of 0.025 mm.
Предлагаемый состав может быть рекомендован дл унрочпепи деталей, работаюии1х li агресснвпой среде.The proposed composition can be recommended for unchippei parts, working 1 li aggressive environment.
Пред м е т и з о б р е т е и и PREPARATION AND RESULTS
Состав дл низкотемиературпого силици1К1вапи , содержащий фторид иатри , отличаю/иийс тем, что, с целью сииженн темнературы процесса и повыщени технологичности, в пего введепы фториды Л1гги и кали , окись кремни и восстановитель при следующем соoTnonjenini компоиептов в смеси (в вес. %);Composition for nizkotemieraturpogo silitsi1K1vapi containing fluoride iatri, wherein / iiys in that, for the purpose siizhenn temneratury process and the Enhance processability in pego vvedepy fluorides L1ggi and potassium, silica and the reductant at the next sooTnonjenini kompoieptov mixture (in wt.%);
Фторид лити 19-23Lithium fluoride 19-23
Фторид иатри 7-10Fluoride yatri 7-10
Фторид кали 39-47Potassium Fluoride 39-47
Окись кремпи 5-10Krempi oxide 5-10
Восстановитель15-25.Restorer 15-25.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SU1716467A SU405972A1 (en) | 1971-11-18 | 1971-11-18 | COMPOSITION FOR LOW-TEMPERATURE SILICIATION |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SU1716467A SU405972A1 (en) | 1971-11-18 | 1971-11-18 | COMPOSITION FOR LOW-TEMPERATURE SILICIATION |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SU405972A1 true SU405972A1 (en) | 1973-11-05 |
Family
ID=20493631
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SU1716467A SU405972A1 (en) | 1971-11-18 | 1971-11-18 | COMPOSITION FOR LOW-TEMPERATURE SILICIATION |
Country Status (1)
| Country | Link |
|---|---|
| SU (1) | SU405972A1 (en) |
-
1971
- 1971-11-18 SU SU1716467A patent/SU405972A1/en active
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