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SG97232A1 - Adherent film recovering device and method of recovering adherent film - Google Patents

Adherent film recovering device and method of recovering adherent film

Info

Publication number
SG97232A1
SG97232A1 SG200201807A SG200201807A SG97232A1 SG 97232 A1 SG97232 A1 SG 97232A1 SG 200201807 A SG200201807 A SG 200201807A SG 200201807 A SG200201807 A SG 200201807A SG 97232 A1 SG97232 A1 SG 97232A1
Authority
SG
Singapore
Prior art keywords
recovering
adherent film
adherent
film
recovering device
Prior art date
Application number
SG200201807A
Inventor
Sawae Kiyoshi
Sakono Ikuo
Oka Hiroshi
Yamamoto Keizo
Sakuhana Yoshikazu
Ueno Mutsuhiro
Ueno Ryuzoh
Original Assignee
Sharp Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Kk filed Critical Sharp Kk
Publication of SG97232A1 publication Critical patent/SG97232A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/002—Details of cleaning machines or methods involving the use or presence of liquid or steam the liquid being a degassed liquid

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
SG200201807A 2001-03-29 2002-03-30 Adherent film recovering device and method of recovering adherent film SG97232A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001097306A JP2002292346A (en) 2001-03-29 2001-03-29 Method and apparatus for recovering deposited film

Publications (1)

Publication Number Publication Date
SG97232A1 true SG97232A1 (en) 2003-07-18

Family

ID=18951109

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200201807A SG97232A1 (en) 2001-03-29 2002-03-30 Adherent film recovering device and method of recovering adherent film

Country Status (5)

Country Link
JP (1) JP2002292346A (en)
KR (1) KR100447369B1 (en)
CN (1) CN1223411C (en)
SG (1) SG97232A1 (en)
TW (1) TW531452B (en)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050028838A1 (en) * 2002-11-25 2005-02-10 Karl Brueckner Cleaning tantalum-containing deposits from process chamber components
US7964085B1 (en) 2002-11-25 2011-06-21 Applied Materials, Inc. Electrochemical removal of tantalum-containing materials
KR100629073B1 (en) 2004-12-29 2006-09-26 엘지전자 주식회사 Prefabricated baffle plate
JP4895859B2 (en) * 2007-02-23 2012-03-14 大日本スクリーン製造株式会社 Substrate processing apparatus and substrate processing method
TWI479559B (en) * 2007-06-28 2015-04-01 Quantum Global Tech Llc Methods and apparatus for cleaning deposition chamber parts using selective spray etch
KR101324131B1 (en) * 2007-06-28 2013-11-01 삼성코닝정밀소재 주식회사 Tin oxide powder, manufacturing method for producing the same and reaction apparatus for producing the same
JP5180661B2 (en) * 2008-04-18 2013-04-10 株式会社ディスコ Spinner cleaning device and processing device
ITLE20100001A1 (en) * 2010-03-19 2010-06-18 Antonio Andrea Gentile METAL SYSTEM FOR THE COLLECTION-RECOVERY OF METALS IN EQUIPMENT FOR FILM DEPOSITION.
JP5726450B2 (en) * 2010-07-16 2015-06-03 信越化学工業株式会社 Reactor cleaning apparatus and reactor cleaning method
CN103270186B (en) 2010-12-23 2015-01-14 夏普株式会社 Method of recovering film-forming material
WO2012090774A1 (en) 2010-12-27 2012-07-05 シャープ株式会社 Deposition device, and collection device
KR101260657B1 (en) 2011-09-16 2013-05-10 주식회사 에스엠이씨 Joint arm robot type elevation apparatus
CN103302598B (en) * 2012-03-09 2016-06-08 海纳微加工股份有限公司 Vacuum differential pressure micromachining device and method
JP5779132B2 (en) * 2012-03-28 2015-09-16 株式会社日立産機システム Clean system
KR102034763B1 (en) * 2012-10-09 2019-10-22 삼성디스플레이 주식회사 Lamination apparatus with air pressure and method for non-contact lamination using lamination apparatus
CN103170486B (en) * 2013-03-29 2016-01-06 北京七星华创电子股份有限公司 A kind of self-cleaning cavity
CN105834917B (en) * 2016-04-28 2018-09-18 浙江工业大学 A kind of gas-liquid-solid three-phase abrasive Flow cyclic process method
DE102017208329A1 (en) * 2017-05-17 2018-11-22 Ejot Gmbh & Co. Kg Non-contact cleaning device
US11486042B2 (en) 2018-01-18 2022-11-01 Viavi Solutions Inc. Silicon coating on hard shields
CN108972363A (en) * 2018-07-20 2018-12-11 合肥研新离合器有限公司 A kind of clutch terminal pad ball blast process equipment
CN109018578B (en) * 2018-07-27 2024-05-03 江苏云天高胜机器人科技有限公司 Film removing device for protective film of upper shell of storage battery
CN111318969B (en) * 2020-04-22 2024-09-24 东莞吉川机械科技股份有限公司 Automatic sand blasting equipment of spray gun rotation type
CN113878501B (en) * 2021-09-02 2023-12-19 宁海县勇昊汽车部件有限公司 Surface treatment system based on electromagnetic wave monitoring and control method
CN115138626A (en) * 2022-07-28 2022-10-04 美的集团股份有限公司 Method and device for cleaning paint film of object
KR102549958B1 (en) 2023-04-24 2023-06-30 신만영 Separators for air compressor
CN118061090B (en) * 2024-04-16 2024-07-09 成都晨发泰达航空科技股份有限公司 Thermal barrier coating repairing device and method for APU combustion chamber

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2912763A1 (en) * 1979-03-30 1980-10-09 Licentia Gmbh Separating photoconductive layer from carrier - directing water jet at high pressure at one end
US5619898A (en) * 1991-07-12 1997-04-15 Witt; Georg Process and device for mechanically removing a layer from the substrate material of a disk-shaped information carrier

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6118958A (en) * 1984-07-04 1986-01-27 Mitsubishi Electric Corp Cleaning method of glass mask for semiconductor device
JPS61113061A (en) * 1984-11-07 1986-05-30 Mitsubishi Electric Corp Mask washing device
JPH0594268U (en) * 1992-05-22 1993-12-24 東芝硝子株式会社 Thin film forming equipment
JPH06196465A (en) * 1992-12-24 1994-07-15 Kawasaki Steel Corp Semiconductor wafer cleaning device
JPH0747483A (en) * 1993-08-05 1995-02-21 Nachi Fujikoshi Corp Industrial robot controller
JPH07153729A (en) * 1993-08-18 1995-06-16 Air Prod And Chem Inc Washing device of sold surface
JP3351082B2 (en) * 1994-01-14 2002-11-25 ソニー株式会社 Substrate drying method, substrate drying tank, wafer cleaning apparatus, and method of manufacturing semiconductor device
JP3298326B2 (en) * 1994-09-19 2002-07-02 富士通株式会社 Method for removing phosphorus-containing silicon oxide film on quartz
JPH0969509A (en) * 1995-09-01 1997-03-11 Matsushita Electron Corp Cleaning/etching/drying system for semiconductor wafer and using method thereof
JPH09289185A (en) * 1996-04-22 1997-11-04 Hitachi Ltd Semiconductor wafer cleaning equipment
JP3394143B2 (en) * 1996-12-16 2003-04-07 大日本スクリーン製造株式会社 Substrate cleaning method and apparatus
US6120614A (en) * 1997-11-14 2000-09-19 Ez Environmental Solutions Corporation Method and apparatus for pressure washing
JP3013932B2 (en) * 1997-12-26 2000-02-28 キヤノン株式会社 Semiconductor member manufacturing method and semiconductor member
JPH11297652A (en) * 1998-04-14 1999-10-29 Dainippon Screen Mfg Co Ltd Substrate treatment apparatus
JPH11340144A (en) * 1998-05-22 1999-12-10 Hitachi Ltd Method for manufacturing semiconductor device
JP3772056B2 (en) * 1998-10-12 2006-05-10 株式会社東芝 Semiconductor substrate cleaning method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2912763A1 (en) * 1979-03-30 1980-10-09 Licentia Gmbh Separating photoconductive layer from carrier - directing water jet at high pressure at one end
US5619898A (en) * 1991-07-12 1997-04-15 Witt; Georg Process and device for mechanically removing a layer from the substrate material of a disk-shaped information carrier

Also Published As

Publication number Publication date
TW531452B (en) 2003-05-11
CN1396042A (en) 2003-02-12
KR20020077165A (en) 2002-10-11
CN1223411C (en) 2005-10-19
KR100447369B1 (en) 2004-09-08
JP2002292346A (en) 2002-10-08

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