Classifications

• • H—ELECTRICITY
  • H04—ELECTRIC COMMUNICATION TECHNIQUE
  • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
  • H04N5/00—Details of television systems
  • H04N5/76—Television signal recording
  • H04N5/91—Television signal processing therefor
  • H04N5/93—Regeneration of the television signal or of selected parts thereof
  • H04N5/95—Time-base error compensation
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
  • H10D30/00—Field-effect transistors [FET]
  • H10D30/01—Manufacture or treatment
  • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
  • H10D30/0223—Manufacture or treatment of FETs having insulated gates [IGFET] having source and drain regions or source and drain extensions self-aligned to sides of the gate
  • H10D30/0227—Manufacture or treatment of FETs having insulated gates [IGFET] having source and drain regions or source and drain extensions self-aligned to sides of the gate having both lightly-doped source and drain extensions and source and drain regions self-aligned to the sides of the gate, e.g. lightly-doped drain [LDD] MOSFET or double-diffused drain [DDD] MOSFET
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
  • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
  • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
  • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
  • H10D30/00—Field-effect transistors [FET]
  • H10D30/60—Insulated-gate field-effect transistors [IGFET]
  • H10D30/601—Insulated-gate field-effect transistors [IGFET] having lightly-doped drain or source extensions, e.g. LDD IGFETs or DDD IGFETs 
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
  • H10D64/00—Electrodes of devices having potential barriers
  • H10D64/01—Manufacture or treatment
  • H10D64/021—Manufacture or treatment using multiple gate spacer layers, e.g. bilayered sidewall spacers
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
  • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
  • H10D84/01—Manufacture or treatment
  • H10D84/0123—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
  • H10D84/0126—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
  • H10D84/0165—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs the components including complementary IGFETs, e.g. CMOS devices
  • H10D84/017—Manufacturing their source or drain regions, e.g. silicided source or drain regions

Landscapes

• Engineering & Computer Science (AREA)
• Multimedia (AREA)
• Signal Processing (AREA)
• Manufacturing & Machinery (AREA)
• Computer Hardware Design (AREA)
• Microelectronics & Electronic Packaging (AREA)
• Power Engineering (AREA)
• General Physics & Mathematics (AREA)
• Condensed Matter Physics & Semiconductors (AREA)
• Physics & Mathematics (AREA)
• Measurement Of Unknown Time Intervals (AREA)
• Tests Of Electronic Circuits (AREA)
• Testing, Inspecting, Measuring Of Stereoscopic Televisions And Televisions (AREA)
• Pulse Circuits (AREA)
• Test And Diagnosis Of Digital Computers (AREA)
• Measuring Phase Differences (AREA)
• Manipulation Of Pulses (AREA)

Applications Claiming Priority (1)

Publications (1)

Family

ID=25419475

Family Applications (1)

Country Status (9)

Families Citing this family (26)

Citations (2)

Family Cites Families (5)

• 1992
  • 1992-06-26 US US07/904,632 patent/US5309111A/en not_active Expired - Lifetime
• 1993
  • 1993-06-21 ES ES93109863T patent/ES2100395T3/es not_active Expired - Lifetime
  • 1993-06-21 DE DE69310030T patent/DE69310030T2/de not_active Expired - Fee Related
  • 1993-06-21 SG SG9602260A patent/SG92592A1/en unknown
  • 1993-06-21 EP EP93109863A patent/EP0575933B1/en not_active Expired - Lifetime
  • 1993-06-23 KR KR1019930011457A patent/KR100272626B1/ko not_active IP Right Cessation
  • 1993-06-24 FI FI932954A patent/FI107975B/sv active
  • 1993-06-25 JP JP5179803A patent/JPH0698354A/ja active Pending
  • 1993-06-25 CN CN93107665A patent/CN1045146C/zh not_active Expired - Fee Related

Patent Citations (2)

Also Published As

Similar Documents