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SE7415572L - - Google Patents

Info

Publication number
SE7415572L
SE7415572L SE7415572A SE7415572A SE7415572L SE 7415572 L SE7415572 L SE 7415572L SE 7415572 A SE7415572 A SE 7415572A SE 7415572 A SE7415572 A SE 7415572A SE 7415572 L SE7415572 L SE 7415572L
Authority
SE
Sweden
Prior art keywords
pyridone
dimethyl
vinyl
polymers
methacryloylamino
Prior art date
Application number
SE7415572A
Other languages
Unknown language ( )
Other versions
SE407221B (en
Inventor
H Furrer
H Steppan
G Lohaus
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of SE7415572L publication Critical patent/SE7415572L/
Publication of SE407221B publication Critical patent/SE407221B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

1489551 Photosensitive polymers HOECHST AG 18 Dec 1974 [20 Dec 1973] 54729/74 Heading C3P [Also in Division G2] Light sensitive polymers contain units having a substituted or unsubstituted 2-pyridone side group attached to the polymer chain via a linking member. They are produced by polymerization of an appropriate monomer or by introducing the side group into a preformed polymer. In examples monomers polymerized are 4,6 - dimethyl - 1 - (21 - methacryloyloxyethyl) pyridone - 2 - methacryloylamino- 4,6 - dimethyl pyridone - 2, 3 - methacryloylamino - 1,4,6 - trimethyl pyridone - 2, and 1 - (2<SP>1</SP> - methacryloyloxyethyl) - pyridone - 2. They are copolymerized with vinyl toluene, hexyl methacrylate, 4-vinyl pyridine, dimethyl methacryloyloxymethyl phosphinic acid, 4,6- dimethyl - 1 - vinyl pyridone - 2, or butyl methacrylate. Styrene-maleic anhydride copolymer is reacted with 4,6 - dimethyl - 1 - (2<SP>1</SP> - hydroxyethyl)- pyridone-2 to introduce side groups. Coatings of the polymers are applied to aluminium from solution, exposed to light through a wedge, developed by immersion in butanone, acetone, methanol, 2N-hydrochloric acid, trichloroethylene, or dimethyl formamide and tinted with fat-soluble black HB or methylene blue. A sensitizer, e.g. Michler's ketone or acetophenone may be included in the coating.
SE7415572A 1973-12-20 1974-12-12 LIGHT CLEANING POLYMER CONTAINING SIDE SIDE 2-PYRIDONE GROUPS SE407221B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732363513 DE2363513C2 (en) 1973-12-20 1973-12-20 Light-crosslinkable polymers and their use in light-curable copying compounds

Publications (2)

Publication Number Publication Date
SE7415572L true SE7415572L (en) 1975-06-23
SE407221B SE407221B (en) 1979-03-19

Family

ID=5901401

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7415572A SE407221B (en) 1973-12-20 1974-12-12 LIGHT CLEANING POLYMER CONTAINING SIDE SIDE 2-PYRIDONE GROUPS

Country Status (6)

Country Link
BE (1) BE823538A (en)
CA (1) CA1038537A (en)
DE (1) DE2363513C2 (en)
FR (1) FR2255322B1 (en)
GB (1) GB1489551A (en)
SE (1) SE407221B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3641024A1 (en) * 1986-12-01 1988-06-16 Merck Patent Gmbh NITROGEN SIX-RING CONNECTIONS
US9499650B2 (en) 2013-03-19 2016-11-22 Eastman Kodak Company Thiosulfate polymers
US8986924B2 (en) 2013-03-19 2015-03-24 Eastman Kodak Company Method of sequestering metals using thiosulfate polymers
US9772552B2 (en) 2013-03-19 2017-09-26 Eastman Kodak Company Thiosulfate polymer compositions and articles
US9005878B2 (en) 2013-03-19 2015-04-14 Eastman Kodak Company Forming patterns using thiosulfate polymer compositions
US8916336B2 (en) 2013-03-19 2014-12-23 Eastman Kodak Company Patterning method using thiosulfate polymer and metal nanoparticles

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1087416A (en) * 1964-09-02 1967-10-18 Agfa Gevaert Nv Photochemical cross-linking of polymers

Also Published As

Publication number Publication date
DE2363513A1 (en) 1975-07-10
BE823538A (en) 1975-06-18
GB1489551A (en) 1977-10-19
FR2255322B1 (en) 1980-04-30
FR2255322A1 (en) 1975-07-18
DE2363513C2 (en) 1982-12-23
SE407221B (en) 1979-03-19
CA1038537A (en) 1978-09-12

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