SE419907B - Forfarande for upplinjering av ett monster innefattande exponering av ett negativt resistmaterial - Google Patents

Forfarande for upplinjering av ett monster innefattande exponering av ett negativt resistmaterial

Info

Publication number: SE419907B
Authority: SE; Sweden
Prior art keywords: uplining; procedure; resist material; negative resist; sample including
Prior art date: 1973-10-23

Application number

SE7412962A

Other languages

English (en)

Other versions

SE7412962L (sv

Inventor

E D Feit

L F Thompson

Original Assignee

Western Electric Co

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1973-10-23

Filing date

1974-10-15

Publication date

1981-08-31

1974-10-15 Application filed by Western Electric Co filed Critical Western Electric Co

1975-04-24 Publication of SE7412962L publication Critical patent/SE7412962L/xx

1981-08-31 Publication of SE419907B publication Critical patent/SE419907B/sv

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Electrophotography Using Other Than Carlson'S Method (AREA)
Epoxy Resins (AREA)
Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Materials For Photolithography (AREA)

SE7412962A 1973-10-23 1974-10-15 Forfarande for upplinjering av ett monster innefattande exponering av ett negativt resistmaterial SE419907B (sv)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US40892773A	1973-10-23	1973-10-23

Publications (2)

Publication Number	Publication Date
SE7412962L SE7412962L (sv)	1975-04-24
SE419907B true SE419907B (sv)	1981-08-31

Family

ID=23618345

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
SE7412962A SE419907B (sv)	1973-10-23	1974-10-15	Forfarande for upplinjering av ett monster innefattande exponering av ett negativt resistmaterial

Country Status (9)

Country	Link
JP (1)	JPS5929852B2 (sv)
BE (1)	BE821326A (sv)
CA (1)	CA1032392A (sv)
DE (1)	DE2450381C3 (sv)
FR (1)	FR2248289B1 (sv)
GB (1)	GB1484873A (sv)
IT (1)	IT1024658B (sv)
NL (1)	NL163633C (sv)
SE (1)	SE419907B (sv)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4130424A (en) *	1976-08-06	1978-12-19	Bell Telephone Laboratories, Incorporated	Process using radiation curable epoxy containing resist and resultant product
JPS5786830A (en) *	1980-11-20	1982-05-31	Fujitsu Ltd	Pattern forming material
JPS5786831A (en) *	1980-11-20	1982-05-31	Fujitsu Ltd	Pattern forming material
JPS57109943A (en) *	1980-12-26	1982-07-08	Nippon Telegr & Teleph Corp <Ntt>	Formation of submicron pattern using radiation sensitive resist
DE3114931A1 (de) *	1981-04-13	1982-10-28	Hoechst Ag, 6000 Frankfurt	Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial
GB2285141B (en) *	1993-12-23	1998-03-11	Motorola Ltd	Method of removing photo resist

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3770433A (en) *	1972-03-22	1973-11-06	Bell Telephone Labor Inc	High sensitivity negative electron resist

1974
- 1974-07-18 CA CA205,002A patent/CA1032392A/en not_active Expired
- 1974-10-15 SE SE7412962A patent/SE419907B/sv not_active IP Right Cessation
- 1974-10-21 FR FR7435316A patent/FR2248289B1/fr not_active Expired
- 1974-10-22 NL NL7413817.A patent/NL163633C/xx not_active IP Right Cessation
- 1974-10-22 BE BE149750A patent/BE821326A/xx not_active IP Right Cessation
- 1974-10-22 IT IT70139/74A patent/IT1024658B/it active
- 1974-10-23 JP JP49121557A patent/JPS5929852B2/ja not_active Expired
- 1974-10-23 GB GB45812/74A patent/GB1484873A/en not_active Expired
- 1974-10-23 DE DE2450381A patent/DE2450381C3/de not_active Expired

Also Published As

Publication number	Publication date
DE2450381A1 (de)	1975-04-24
NL7413817A (nl)	1975-04-25
IT1024658B (it)	1978-07-20
JPS5929852B2 (ja)	1984-07-24
NL163633C (nl)	1980-09-15
JPS5074427A (sv)	1975-06-19
NL163633B (nl)	1980-04-15
SE7412962L (sv)	1975-04-24
CA1032392A (en)	1978-06-06
BE821326A (fr)	1975-02-17
DE2450381C3 (de)	1984-09-20
DE2450381B2 (de)	1979-07-19
FR2248289B1 (sv)	1979-03-16
FR2248289A1 (sv)	1975-05-16
GB1484873A (en)	1977-09-08

Similar Documents

Publication	Publication Date	Title
SE422967B (sv)	1982-04-05	Sett och anordning for brytning av ett fast material
BR7500892A (pt)	1975-12-02	Material fotografico foto-sensivel
AT347975B (de)	1979-01-25	Lichtempfindliches kopiermaterial
SE429830B (sv)	1983-10-03	Artikel av ett vikbart arkmaterial
FI55972C (fi)	1979-11-12	Foerpackning bestaoende av ett yttre uppstoedjande hoelje och en inuti detta placerad behaollare av flexibelt material
AT345089B (de)	1978-08-25	Photographisches material
SE422631B (sv)	1982-03-15	Anordning vid fotoresistelement innefattande ett overskikt av fotokensligt material och ett underskikt av framkallarlosligt material
SE419105B (sv)	1981-07-13	Forfarande for elektropletering av ett zirkoniummaterial och aktiveringslosning for genomforande av forfarandet
SE416957B (sv)	1981-02-16	Fotopolymeriserbar komposition och sett att framstella ett polymert material herav
SE7601684L (sv)	1976-08-20	Forfarande och maskin for framstellning av bikaksmaterial
BE845585A (nl)	1977-02-28	Lichtgevoelig fotografisch kleurenmateriaal
SE7604453L (sv)	1976-10-25	Apparat for avlegsnande av fast material ur ett flode av kloakvatten eller annan vetska
SE7602945L (sv)	1976-09-08	Forfarande for tillverkning av ett gjutstycke
SE389981B (sv)	1976-11-29	Forfarande for framstellning av ett metalliskt filtermaterial
SE398069B (sv)	1977-12-05	Sett och anordning att tillverka en av arkmaterial och formsprutat material sammansatt behallare
SE420132B (sv)	1981-09-14	Sett och apparat for metning av hallfastheten hos ett material
SE419907B (sv)	1981-08-31	Forfarande for upplinjering av ett monster innefattande exponering av ett negativt resistmaterial
FI53664C (fi)	1978-07-10	Saett och anordning foer separering av suspenderat material ur en vaetskestroem
BE837537A (nl)	1976-07-14	Lichtgevoelig fotografisch kleurenmateriaal
SE412564B (sv)	1980-03-10	Av en sleplina dragen gripare for ankartrossar for sjominor
NO138446C (no)	1978-09-20	Fremgangsmaate ved fremstilling av et hydrofobt byggemateriale
FI64203B (fi)	1983-06-30	Inloppslaoda foer maskiner foer framstaellning av ett banformigt material
SE7506094L (sv)	1975-12-01	Sett och anordning for framstellning av ett av flera olika material sammansatt foremal
SE426079B (sv)	1982-12-06	Forfarande for beskiktning av ett band av hydrofilt material med en till storre delen vattenoloslig cellulosaeter
SE7600425L (sv)	1976-10-09	Anordning for reglering och forsterkning av ett fotomultiplikatorror

Legal Events

Date	Code	Title	Description
1995-01-31	NUG	Patent has lapsed	Ref document number: 7412962-8 Effective date: 19941110 Format of ref document f/p: F

Date

Code

Title

Description

1995-01-31

NUG

Patent has lapsed

Ref document number: 7412962-8

Effective date: 19941110

Format of ref document f/p: F