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SE356905B - - Google Patents

Info

Publication number
SE356905B
SE356905B SE800469A SE800469A SE356905B SE 356905 B SE356905 B SE 356905B SE 800469 A SE800469 A SE 800469A SE 800469 A SE800469 A SE 800469A SE 356905 B SE356905 B SE 356905B
Authority
SE
Sweden
Application number
SE800469A
Inventor
E Sussmann
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of SE356905B publication Critical patent/SE356905B/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
SE800469A 1968-06-05 1969-06-05 SE356905B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19681769520 DE1769520A1 (en) 1968-06-05 1968-06-05 Process for the epitaxial deposition of crystalline material from the gas phase, in particular for semiconductor purposes

Publications (1)

Publication Number Publication Date
SE356905B true SE356905B (en) 1973-06-12

Family

ID=5700164

Family Applications (1)

Application Number Title Priority Date Filing Date
SE800469A SE356905B (en) 1968-06-05 1969-06-05

Country Status (8)

Country Link
JP (1) JPS5149191B1 (en)
AT (1) AT288811B (en)
CH (1) CH521163A (en)
DE (1) DE1769520A1 (en)
FR (1) FR1597032A (en)
GB (1) GB1260233A (en)
NL (1) NL6906275A (en)
SE (1) SE356905B (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4096821A (en) * 1976-12-13 1978-06-27 Westinghouse Electric Corp. System for fabricating thin-film electronic components
DE2722545C2 (en) * 1977-05-18 1984-03-08 Kurt Dr.-Ing. 7802 Merzhausen Heber Diffusion furnace for the treatment of semiconductor substrates
DE2800574A1 (en) * 1978-01-07 1979-07-12 Stanley Electric Co Ltd Ear examination instrument with needle like probe - has battery housed in with socket to receive plug for electrode
DE2830589C2 (en) * 1978-07-12 1985-04-18 Ibm Deutschland Gmbh, 7000 Stuttgart Continuous furnace for processing semiconductor wafers
DE2849240C2 (en) * 1978-11-13 1983-01-13 Siemens Ag, 1000 Berlin Und 8000 Muenchen CVD coating device for small parts and their use
FR2498813A1 (en) * 1981-01-27 1982-07-30 Instruments Sa EQUIPMENT TREATMENT FACILITY FOR SEMICONDUCTOR PRODUCTION
DE3427057A1 (en) * 1984-07-23 1986-01-23 Standard Elektrik Lorenz Ag, 7000 Stuttgart SYSTEM FOR THE PRODUCTION OF SEMICONDUCTOR LAYER STRUCTURES BY EPITACTIC GROWTH
JPS6169116A (en) * 1984-09-13 1986-04-09 Toshiba Ceramics Co Ltd Susceptor for continuous cvd coating on silicon wafer
GB2196650A (en) * 1986-10-27 1988-05-05 Prutec Ltd Cadmium sulphide solar cells
DE3907610A1 (en) * 1989-03-09 1990-09-13 Telefunken Electronic Gmbh Epitaxial process
JP2999751B2 (en) 1997-06-27 2000-01-17 三星電子株式会社 Apparatus and method for producing silica film
JP5698059B2 (en) * 2011-04-08 2015-04-08 株式会社日立国際電気 Substrate processing apparatus and solar cell manufacturing method

Also Published As

Publication number Publication date
DE1769520A1 (en) 1972-03-02
GB1260233A (en) 1972-01-12
AT288811B (en) 1971-03-25
FR1597032A (en) 1970-06-22
JPS5149191B1 (en) 1976-12-24
NL6906275A (en) 1969-12-09
CH521163A (en) 1972-04-15

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