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SE0200788D0 - Method using a movable micro-element - Google Patents

Method using a movable micro-element

Info

Publication number
SE0200788D0
SE0200788D0 SE0200788A SE0200788A SE0200788D0 SE 0200788 D0 SE0200788 D0 SE 0200788D0 SE 0200788 A SE0200788 A SE 0200788A SE 0200788 A SE0200788 A SE 0200788A SE 0200788 D0 SE0200788 D0 SE 0200788D0
Authority
SE
Sweden
Prior art keywords
movable
modulator element
movable modulator
electromagnetic radiation
present
Prior art date
Application number
SE0200788A
Other languages
Swedish (sv)
Inventor
Ulric Ljungblad
Torbjoern Sandstroem
Peter Duerr
Original Assignee
Micronic Laser Systems Ab
Fraunhofer Ges Forschung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micronic Laser Systems Ab, Fraunhofer Ges Forschung filed Critical Micronic Laser Systems Ab
Priority to SE0200788A priority Critical patent/SE0200788D0/en
Publication of SE0200788D0 publication Critical patent/SE0200788D0/en
Priority to PCT/SE2003/000428 priority patent/WO2003079091A1/en
Priority to AU2003212763A priority patent/AU2003212763A1/en

Links

Landscapes

  • Physics & Mathematics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)

Abstract

An aspect of the present invention includes a method for modulating at least one pulse of electromagnetic radiation with a spatial light modulator. At least one mechanically movable modulator element is provided. At least one actuating element capable to produce forces on said movable element is provided. A biasing signal is provided to said at least one movable modulator element. An address signal is provided to at least one first electrode belonging to said at least one movable modulator element to move said movable modulator element to a desired modulation state, where said electromagnetic radiation is impinged onto said at least one movable modulator element when being in said desired modulation state. Other aspects of the present invention are reflected in the detailed description, figures and claims.
SE0200788A 2002-03-15 2002-03-15 Method using a movable micro-element SE0200788D0 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
SE0200788A SE0200788D0 (en) 2002-03-15 2002-03-15 Method using a movable micro-element
PCT/SE2003/000428 WO2003079091A1 (en) 2002-03-15 2003-03-14 An adressing method of moveable microelements in a spatial light modulator (slm) for pattering of a workpiece
AU2003212763A AU2003212763A1 (en) 2002-03-15 2003-03-14 An adressing method of moveable microelements in a spatial light modulator (slm) for pattering of a workpiece

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0200788A SE0200788D0 (en) 2002-03-15 2002-03-15 Method using a movable micro-element

Publications (1)

Publication Number Publication Date
SE0200788D0 true SE0200788D0 (en) 2002-03-15

Family

ID=20287277

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0200788A SE0200788D0 (en) 2002-03-15 2002-03-15 Method using a movable micro-element

Country Status (3)

Country Link
AU (1) AU2003212763A1 (en)
SE (1) SE0200788D0 (en)
WO (1) WO2003079091A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE0100336L (en) 2001-02-05 2002-08-06 Micronic Laser Systems Ab Addressing method and apparatus using the same technical area
US7410736B2 (en) 2003-09-30 2008-08-12 Asml Holding N.V. Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones
US7023526B2 (en) 2003-09-30 2006-04-04 Asml Holding N.V. Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation
US6876440B1 (en) 2003-09-30 2005-04-05 Asml Holding N.V. Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
US10831018B2 (en) * 2017-12-08 2020-11-10 Texas Instruments Incorporated Methods and apparatus for increasing efficiency and optical bandwidth of a microelectromechanical system piston-mode spatial light modulator

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5212582A (en) * 1992-03-04 1993-05-18 Texas Instruments Incorporated Electrostatically controlled beam steering device and method
US5285196A (en) * 1992-10-15 1994-02-08 Texas Instruments Incorporated Bistable DMD addressing method
US5583688A (en) * 1993-12-21 1996-12-10 Texas Instruments Incorporated Multi-level digital micromirror device
US6046840A (en) * 1995-06-19 2000-04-04 Reflectivity, Inc. Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements
US6312134B1 (en) * 1996-07-25 2001-11-06 Anvik Corporation Seamless, maskless lithography system using spatial light modulator
US5771116A (en) * 1996-10-21 1998-06-23 Texas Instruments Incorporated Multiple bias level reset waveform for enhanced DMD control
US6266178B1 (en) * 1998-12-28 2001-07-24 Texas Instruments Incorporated Guardring DRAM cell

Also Published As

Publication number Publication date
WO2003079091A1 (en) 2003-09-25
AU2003212763A1 (en) 2003-09-29

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